High-cleanliness vacuum displacement stage

Abstract

The utility model belongs to displacement platform technical field especially relates to a high clean vacuum displacement platform, including base, the both ends fixed mounting of base have bearing seat, be equipped with slide rail on base, the movable installation of slide rail has displacement platform, be equipped with buffer mechanism in displacement platform. This high clean vacuum displacement platform, in precision and stability, through the linkage design of spring and damper, makes the vertical direction self -adaptation adjustment of gyro wheel frame can be realized with load weight, and the buffer gap cooperation damper of buffer groove and slide rail limiting edge attenuates the outside vibration impact energy in short time, compared with traditional rigid structure, the precision and stability are improved obviously, in clean and durability, the contact surface of slide rail and sliding block is coated with molybdenum disulfide self -lubricating wear -resisting coating, reduces the friction coefficient and reduces the generation of debris, prolongs the service life of displacement component, and the coating does not volatilize, does not absorb the impurity in vacuum environment, can steadily play lubricating effect, satisfies the use demand of high clean vacuum environment.

Description

Technical Field

[0001] This utility model relates to the field of displacement stage technology, specifically a high-cleanliness vacuum displacement stage. Background Technology

[0002] The following prominent problems are commonly found in existing high-cleanliness vacuum displacement stage technologies: Traditional displacement stages mostly adopt a rigid contact structure between the slide rail and the slider, lacking an adaptive buffer design. When the weight of the workpiece changes or it encounters external vibrations (such as the start and stop of the vacuum pump or the operation of adjacent equipment), the rigid connection is prone to causing the slider to stop suddenly or the entire displacement stage to vibrate, resulting in a significant increase in positioning error (the positioning error of traditional structures is usually more than ±10μm). For example, in the semiconductor wafer transport scenario, the micron-level offset caused by vibration of the rigid displacement stage may lead to wafer alignment failure, affecting the yield of the photolithography process. In addition, the traditional structure cannot automatically adjust the contact pressure according to the load, and is prone to scratches on the slide rail surface or deformation of the slider due to overload, further aggravating the deterioration of accuracy.

[0003] Furthermore, the existing displacement stage relies primarily on sliding friction between the slide rail and slider, resulting in a friction coefficient as high as 0.1-0.3. Long-term operation generates a large amount of metal debris (the amount of debris in a single reciprocating motion can reach 1-5mg). These particulate contaminants (mostly 5-50μm in diameter) easily contaminate the high-cleanliness vacuum environment, leading to problems such as short circuits in semiconductor chips and damage to the surface of optical components. At the same time, traditional lubrication methods rely on grease-based lubricants, which are prone to volatilization in a vacuum environment, generating oil vapor. This not only contaminates the chamber but may also adsorb dust to form composite contaminants. Frequent replacement of core components is required, resulting in high maintenance costs and affecting the continuous operation of the equipment. Therefore, there is an urgent need to improve a high-cleanliness vacuum displacement stage to solve the above problems. Utility Model Content

[0004] The purpose of this invention is to provide a high-cleanliness vacuum displacement stage to solve the problems mentioned in the background art.

[0005] To achieve the above objectives, this utility model provides the following technical solution: a high-cleanliness vacuum displacement stage, comprising a base, bearing seats fixedly installed at both ends of the base, the left bearing seat being fixedly installed at the left end of the base by two sets of support columns, and a motor mounting seat being fixedly installed at the other end of the support columns, the motor mounting seat being fixedly installed with screws; the high-cleanliness vacuum displacement stage includes a buffer mechanism and a fixing mechanism, the buffer mechanism including a base, the base being provided with two sets of slide rails, the slide rails being "T"-shaped, and the displacement stage being movably installed on the slide rails.

[0006] Preferably, the bottom of the displacement stage is provided with a buffer groove that cooperates with the slide rail, and the buffer height of the buffer groove is slightly greater than the thickness of the limiting edge of the slide rail.

[0007] Preferably, the displacement stage has a mounting cavity, a damper is fixedly installed in the mounting cavity, a roller frame is fixedly installed at the end of the piston rod of the damper, a rotating shaft is movably installed in the roller frame, a roller is fixedly installed on the rotating shaft, and the roller is in contact with the upper surface of the slide rail.

[0008] Preferably, the rotating shaft passes through the roller frame, the displacement table is provided with a limiting groove, the rotating shaft is movably installed in the limiting groove, a spring is fixedly installed between the roller frame and the displacement table, and the displacement table is provided with a mounting groove for installing the spring.

[0009] Preferably, the slide rail and roller surfaces are coated with a wear-resistant coating. Molybdenum disulfide is selected as the coating material here. Molybdenum disulfide does not volatilize or adsorb impurities and can stably perform lubrication in a vacuum environment.

[0010] Preferably, the fixing mechanism includes a displacement platform, four sets of mounting slots are provided in the middle of the displacement platform, a slider is provided below the displacement platform, a screw is provided in the mounting slot, the screw passes through the displacement platform and is fixedly mounted on the slider by threads, and a spring is provided between the lower edge of the screw and the displacement platform.

[0011] Preferably, the slider is movably mounted on the lead screw via a thread, the two ends of the lead screw are fixedly mounted on the inner ring of the bearing, the outer ring of the bearing is fixedly mounted in the bearing housing, and the lead screw is connected to the output shaft of the motor via a coupling.

[0012] Compared with the prior art, the beneficial effects of this utility model are:

[0013] 1. This high-cleanliness vacuum displacement stage, through the linkage design of spring and damper, allows the roller frame to float up and down with the load weight. The buffer groove and the limiting edge of the slide rail reserve a buffer gap to achieve adaptive adjustment in the vertical direction. When encountering external vibration (such as the start and stop of the vacuum pump), the damper can attenuate the impact energy in a short time. Combined with the rolling friction of the roller, the displacement stage reduces positioning errors in scenarios such as semiconductor wafer transfer, and improves accuracy and stability compared with traditional rigid structures.

[0014] 2. This high-cleanliness vacuum displacement stage reduces the sliding friction coefficient by coating the contact surface of the slide rail and slider with a molybdenum disulfide self-lubricating and wear-resistant coating. Compared with traditional metal contact, it can reduce the generation of debris and extend the service life of the displacement components. At the same time, the molybdenum disulfide coating will not volatilize or adsorb impurities during use and can stably play a lubricating role in a vacuum environment. Attached Figure Description

[0015] Figure 1 This is a three-dimensional schematic diagram of the present invention;

[0016] Figure 2This is an exploded view of the present invention;

[0017] Figure 3 This is a half-sectional schematic diagram of the present invention;

[0018] Figure 4 This is a partial cross-sectional view of the buffer mechanism of this utility model;

[0019] Figure 5 This is a partially enlarged schematic diagram A of the present invention;

[0020] Figure 6 This is a partially enlarged schematic diagram B of the present invention;

[0021] Figure 7 This is a cross-sectional view of the fixing mechanism of this utility model.

[0022] In the diagram: 1. Base, 2. Bearing seat, 3. Displacement stage, 4. Support column, 5. Motor mounting base, 6. Motor, 7. Bearing, 8. Lead screw, 9. Slider, 10. Coupling, 11. Screw 1, 201. Slide rail, 202. Buffer groove, 203. Limit groove, 204. Mounting cavity, 205. Damper, 206. Spring 1, 207. Roller frame, 208. Rotating shaft, 209. Roller, 210. Mounting groove, 211. Screw 2, 212. Spring 2. Detailed Implementation

[0023] The technical solutions of the present utility model will be clearly and completely described below with reference to the accompanying drawings of the embodiments. Obviously, the described embodiments are only some embodiments of the present utility model, and not all embodiments. Based on the embodiments of the present utility model, all other embodiments obtained by those of ordinary skill in the art without creative effort are within the protection scope of the present utility model.

[0024] Example 1:

[0025] Based on existing technology, traditional displacement stages mostly adopt a rigid contact structure between the slide rail and the slider, lacking an adaptive buffer design. When the weight of the workpiece changes or it encounters external vibrations (such as the start-up and shutdown of a vacuum pump or the operation of adjacent equipment), the rigid connection is prone to causing sudden stop impacts on the slider or overall vibration of the displacement stage, resulting in a significant increase in positioning error (the positioning error of traditional structures is typically ±10μm or more). For example, in semiconductor wafer transport scenarios, the micron-level displacement caused by vibration of the rigid displacement stage may lead to wafer alignment failure, affecting the yield of the photolithography process. In addition, traditional structures cannot automatically adjust the contact pressure according to the load, and are prone to scratches on the slide rail surface or deformation of the slider due to overload, further exacerbating the deterioration of accuracy. Therefore, this device is equipped with a buffer mechanism. Please refer to [link / reference]. Figures 1-6This utility model provides a technical solution: a high-cleanliness vacuum displacement stage, including a base 1, bearing seats 2 are fixedly installed at both ends of the base 1, the left bearing seat 2 is fixedly installed at the left end of the base 1 by two sets of support columns 4, and a motor mounting seat 5 is fixedly installed at the other end of the support column 4. A motor 6 is fixedly installed on the motor mounting seat 5 by screws; the high-cleanliness vacuum displacement stage includes a buffer mechanism and a fixing mechanism, the buffer mechanism includes a base 1, and two sets of slide rails 201 are provided on the base 1. The slide rails 201 are "T" shaped, and a displacement stage 3 is movably installed on the slide rails 201.

[0026] The bottom of the displacement stage 3 is provided with a buffer groove 202 that cooperates with the slide rail 201. The buffer height of the buffer groove 202 is slightly greater than the thickness of the limiting edge of the slide rail 201.

[0027] The displacement stage 3 has a mounting cavity 204, in which a damper 205 is fixedly installed. A roller frame 207 is fixedly installed at the end of the piston rod of the damper 205. A rotating shaft 208 is movably installed in the roller frame 207. A roller 209 is fixedly installed on the rotating shaft 208. The roller 209 is in contact with the upper surface of the slide rail 201.

[0028] The rotating shaft 208 passes through the roller frame 207. The displacement table 3 is provided with a limiting groove 203. The rotating shaft 208 is movably installed in the limiting groove 203. A spring 206 is fixedly installed between the roller frame 207 and the displacement table 3. The displacement table 3 is provided with a mounting groove for installing the spring 206.

[0029] When the displacement table 3 carries the workpiece, the load is transmitted to the roller frame 207 through the displacement table, compressing the spring 206 and causing the roller 209 to roll along the upper surface of the slide rail 201. Figure 4 At this time, the reserved gap between the buffer groove 202 and the limiting edge of the slide rail, and the height of the buffer groove 202 being slightly greater than the thickness of the limiting edge of the slide rail 201, allows the displacement table to float slightly in the vertical direction by ±1.5mm. The impact generated by the load change is absorbed by the elastic deformation of the spring 1. When external vibrations, such as the start and stop of the vacuum pump, are transmitted to the base 1, the piston rod of the damper 205 moves synchronously, and the vibration energy is rapidly attenuated by the internal damping medium, such as magnetorheological fluid.

[0030] Example 2:

[0031] Based on Example 1, the existing displacement stage relies primarily on sliding friction between the slide rail and slider, resulting in a friction coefficient as high as 0.1-0.3. Long-term operation generates a large amount of metal debris (1-5 mg per reciprocating motion). These particulate contaminants (mostly 5-50 μm in diameter) easily pollute the high-cleanliness vacuum environment, leading to problems such as short circuits in semiconductor chips and damage to the surface of optical components. Furthermore, traditional lubrication methods rely on grease-based lubricants, which easily evaporate in a vacuum environment, generating oil vapor. This not only contaminates the chamber but may also attract dust, forming composite contaminants. Frequent replacement of core components is necessary, resulting in high maintenance costs and affecting continuous equipment operation. Therefore, this device applies a wear-resistant coating to the contact surface between the slide rail and the roller. Please refer to [link to relevant documentation]. Figures 1-7 This utility model provides a technical solution: a high-cleanliness vacuum displacement stage, wherein the slide rail 201 and the roller surface are coated with a wear-resistant coating, and molybdenum disulfide is selected as the coating material.

[0032] The fixing mechanism includes a displacement platform 3, with four sets of mounting slots 210 in the middle of the displacement platform 3. A slider 9 is provided below the displacement platform 3. A screw 211 is provided in the mounting slot 210. The screw 211 passes through the displacement platform 3 and is fixedly installed on the slider 9 by threads. A spring 212 is provided between the lower edge of the screw 211 and the displacement platform 3.

[0033] The slider 9 is movably mounted on the lead screw 8 via a thread. The two ends of the lead screw 8 are fixedly mounted on the inner ring of the bearing 7, and the outer ring of the bearing 7 is fixedly mounted in the bearing seat 2. The lead screw 8 is connected to the output shaft of the motor 6 via a coupling 10.

[0034] The sliding friction between the traditional slider and the slide rail (friction coefficient 0.1-0.3) is replaced by the rolling friction between the roller 209 and the slide rail 201. Combined with the molybdenum disulfide coating (thickness 5-8μm) on the surface, the friction coefficient is reduced to below 0.01, and the amount of debris generated in a single reciprocating motion is <0.1mg, which reduces the amount of contaminant particles by more than 95% compared with the traditional structure.

[0035] The elastic connection structure of screw 211 and spring 212 forms a flexible interface between the displacement stage 3 and the slider 9. When the motor 6 drives the lead screw 8 to start and stop, the relative movement between the displacement stage and the slider can be suppressed by spring 2, which, together with the transmission of the ball screw, improves the positioning accuracy.

[0036] Motor 6 drives lead screw 8 to rotate through coupling 10, slider 9 moves along lead screw axis, driving displacement table 3 to move linearly along slide rail 201, and the cooperation between bearing seat 2 and bearing 7 ensures coaxiality of lead screw rotation.

[0037] It should be noted that, in this document, relational terms such as "first" and "second" are used only to distinguish one entity or operation from another, and do not necessarily require or imply any such actual relationship or order between these entities or operations. Furthermore, the terms "comprising," "including," or any other variations thereof are intended to cover non-exclusive inclusion, such that a process, method, article, or apparatus that comprises a list of elements includes not only those elements but also other elements not expressly listed, or elements inherent to such a process, method, article, or apparatus. Without further limitations, an element defined by the phrase "comprising one..." does not exclude the presence of other identical elements in the process, method, article, or apparatus that includes said element.

Claims

1. A high-cleanliness vacuum displacement stage, comprising a base (1), characterized in that: Bearing seats (2) are fixedly installed at both ends of the base (1). The left bearing seat (2) is fixedly installed at the left end of the base (1) by two sets of support columns (4). A motor mounting seat (5) is fixedly installed at the other end of the support column (4). A motor (6) is fixedly installed on the motor mounting seat (5) by screws. The high-cleanliness vacuum displacement stage includes a buffer mechanism and a fixing mechanism. The buffer mechanism includes a base (1) and two sets of slide rails (201) on the base (1). The slide rails (201) are T-shaped and the displacement stage (3) is movably installed on the slide rails (201).

2. The high-cleanliness vacuum displacement stage according to claim 1, characterized in that: The bottom of the displacement stage (3) is provided with a buffer groove (202) that cooperates with the slide rail (201). The buffer height of the buffer groove (202) is slightly greater than the thickness of the limiting edge of the slide rail (201).

3. The high-cleanliness vacuum displacement stage according to claim 2, characterized in that: The displacement stage (3) is provided with an installation cavity (204), and a damper (205) is fixedly installed in the installation cavity (204). A roller frame (207) is fixedly installed at the end of the piston rod of the damper (205). A rotating shaft (208) is movably installed in the roller frame (207), and a roller (209) is fixedly installed on the rotating shaft (208). The roller (209) is in contact with the upper surface of the slide rail (201).

4. The high-cleanliness vacuum displacement stage according to claim 3, characterized in that: The rotating shaft (208) passes through the roller frame (207), and the displacement platform (3) is provided with a limiting groove (203). The rotating shaft (208) is movably installed in the limiting groove (203). A spring (206) is fixedly installed between the roller frame (207) and the displacement platform (3). The displacement platform (3) is provided with an installation groove for installing the spring (206).

5. A high-cleanliness vacuum displacement stage according to claim 4, characterized in that: The slide rail (201) and roller surfaces are coated with a wear-resistant coating, and molybdenum disulfide is selected as the coating material.

6. A high-cleanliness vacuum displacement stage according to claim 5, characterized in that: The fixing mechanism includes a displacement platform (3), which has four sets of mounting slots (210) in the middle position. A slider (9) is provided below the displacement platform (3). A screw (211) is provided in the mounting slot (210). The screw (211) passes through the displacement platform (3) and is fixedly installed on the slider (9) by threads. A spring (212) is provided between the lower edge of the screw (211) and the displacement platform (3).

7. A high-cleanliness vacuum displacement stage according to claim 6, characterized in that: The slider (9) is movably mounted on the lead screw (8) by a thread. The two ends of the lead screw (8) are fixedly mounted on the inner ring of the bearing (7). The outer ring of the bearing (7) is fixedly mounted in the bearing seat (2). The lead screw (8) is connected to the output shaft of the motor (6) through a coupling (10).

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