Horizontal monitoring structure of machine tool equipment and photovoltaic silicon wafer slicing machine

Abstract

The utility model relates to the technical field of silicon wafer processing, and specifically discloses a horizontal monitoring structure of machine tool equipment and a photovoltaic silicon wafer slicing machine, the equipment comprises a workbench and a support frame arranged below the workbench, a horizontal monitoring assembly for monitoring the levelness of the workbench is arranged on the support frame, the horizontal monitoring assembly comprises a base and a level meter, the base comprises a monitoring base platform, the level meter is arranged on the monitoring base platform, and an adjusting assembly for adjusting the levelness of the monitoring base platform is arranged between the base and the support frame. The equipment can realize real-time monitoring of the levelness of the workbench without interfering with the normal production operation of the workbench, the levelness of the equipment is convenient to monitor, and the stability and reliability of the levelness monitoring are good.

Description

Technical Field

[0001] This utility model relates to the field of silicon wafer processing technology, and in particular to a horizontal monitoring structure for machine tool equipment and a photovoltaic silicon wafer slicing machine. Background Technology

[0002] Photovoltaic silicon wafers are a crucial material for manufacturing crystalline silicon photovoltaic cells, and wafer slicing is a critical step in the production process. The photovoltaic silicon wafer slicing machine, which performs this step, is a large, high-speed, multi-wire cutting device. The horizontal alignment of this machine plays a key role in its stability and even its cutting performance. Since slicing machines operate continuously, current methods for leveling require stopping the machine and waiting for the guide rollers to come to a complete stop before placing the leveling device on them. This is cumbersome, especially since the guide rollers are processed monthly with varying dimensional tolerances, hindering stable level measurement. Furthermore, placing the leveling device on the guide rollers during adjustments makes real-time observation of the level difficult. Utility Model Content

[0003] The purpose of this utility model is to provide a horizontal monitoring structure for machine tool equipment and a photovoltaic silicon wafer slicing machine, in response to the existing technical situation.

[0004] This equipment can monitor the levelness of the workbench in real time without interfering with the normal production operation of the workbench. The equipment is convenient for levelness monitoring and has excellent stability and reliability.

[0005] To achieve the above objectives, the present invention adopts the following technical solution:

[0006] On one hand, this utility model provides a horizontal monitoring structure for machine tool equipment. The equipment includes a worktable and a support frame located below the worktable. The support frame is provided with a horizontal monitoring component for monitoring the horizontality of the worktable. The horizontal monitoring component includes a base and a level. The base includes a monitoring platform. The level is located on the monitoring platform. An adjustment component for adjusting the horizontality of the monitoring platform is provided between the base and the support frame.

[0007] In some embodiments, the base includes a connecting section with an adjustment hole, the adjustment assembly includes a rotating adjustment member that can move along the axial direction of the adjustment hole, the rotating adjustment member is rotatably connected to the adjustment hole, the support frame is provided with a top abutment portion for the rotating adjustment member to abut, and the rotating adjustment member can pass through the adjustment hole and abut against the top abutment portion.

[0008] In some embodiments, the support frame includes a mounting wall, the top abutment is disposed on the mounting wall, and the connecting segment is connected to the mounting wall by a rotatable connector.

[0009] In some embodiments, the mounting wall extends vertically.

[0010] In some embodiments, the adjustment assembly includes a plurality of the rotary adjustment elements arranged in a horizontal direction; and / or,

[0011] The adjustment assembly includes a plurality of rotary adjustment elements arranged in a vertical direction.

[0012] In some embodiments, the connecting segment is perpendicular to the monitoring base; and / or,

[0013] A reinforcing rib is provided between the connecting section and the monitoring base. The two ends of the reinforcing rib are respectively connected to the connecting section and the monitoring base. The reinforcing rib extends from top to bottom in a direction away from the connecting section.

[0014] In some embodiments, the monitoring base is planar, and the roughness Ra of the monitoring base is ≤0.1 μm; and / or,

[0015] An adhesive component is provided between the level and the monitoring base.

[0016] In some embodiments, the level includes a first bar level and a second bar level arranged perpendicularly to each other.

[0017] In some embodiments, the support frame includes a plurality of height-adjustable support units, at least one of the support units being connected to the level monitoring component.

[0018] In some embodiments, the support unit includes a base and a support seat disposed below the base. The base is connected to the workbench, and the horizontal monitoring component is disposed on the base. A height adjustment component is provided between the base and the support seat for adjusting the relative distance between the two in the vertical direction.

[0019] In some embodiments, the base includes a main frame, the main frame has an inner cavity, the bottom of the inner cavity has a first adjustment connection hole, the support base has a second adjustment connection hole, the first adjustment connection hole and the second adjustment connection hole are coaxially arranged, the height adjustment component includes an adjustment screw and a locking component sleeved on the adjustment screw, the adjustment screw is rotatably connected to the first adjustment connection hole and the second adjustment connection hole respectively.

[0020] On the other hand, this utility model provides a photovoltaic silicon wafer slicing machine, including the horizontal monitoring structure of the above-mentioned machine tool equipment.

[0021] The beneficial effects of this utility model are as follows:

[0022] In this invention, the level monitoring component is mounted on a support frame. During initial installation, the level of the monitoring base is adjusted to match the level of the workbench, ensuring that subsequent monitoring data reflects the actual level of the workbench and guaranteeing accurate level monitoring. After calibration, the base is fixed, and the level is placed on the monitoring base. Because the entire level monitoring component is mounted on the support frame, routine monitoring by the level will not interfere with the normal production operation of the workbench. The level can be stably installed on the equipment for a long period, enabling real-time monitoring of the workbench's level. This facilitates regular inspections of the equipment's level accuracy by maintenance personnel and allows for timely detection and adjustment when the equipment's level accuracy declines, effectively ensuring the product processing effect of the equipment. Furthermore, it avoids the problem of unstable level measurement caused by the monthly processing of the guide rollers and main rollers in existing technologies. Attached Figure Description

[0023] Figure 1 This is one of the front schematic diagrams of a horizontal monitoring structure for a machine tool according to an embodiment of the present utility model.

[0024] Figure 2 This is a second front view of a horizontal monitoring structure for a machine tool according to an embodiment of the present invention.

[0025] Figure 3 This is a side view of a horizontal monitoring structure for a machine tool according to an embodiment of the present invention.

[0026] Figure 4 This is a schematic diagram of the assembly of the support unit and the horizontal monitoring component according to an embodiment of the present utility model.

[0027] Figure 5 This is an exploded view of a horizontal monitoring structure (excluding the worktable) for a machine tool according to an embodiment of the present invention.

[0028] Figure 6 This is a structural diagram of the side of the support unit equipped with the horizontal monitoring component in an embodiment of the present invention.

[0029] Figure 7 for Figure 6 AA-direction cross-section.

[0030] Figure 8 for Figure 6 CC-direction cross-section. Detailed Implementation

[0031] To make the objectives, technical solutions, and advantages of this utility model clearer, the present utility model will be further described in detail below with reference to the accompanying drawings and embodiments. Examples of the embodiments are shown in the accompanying drawings, wherein the same or similar reference numerals denote the same or similar elements or elements having the same or similar functions throughout. The embodiments described below with reference to the accompanying drawings are exemplary and are only used to explain this utility model, and should not be construed as limiting this utility model. Furthermore, it should be understood that the specific embodiments described herein are merely for explaining this utility model and are not intended to limit this utility model.

[0032] In the description of this utility model, the terms "first," "second," etc., are used for descriptive purposes only and should not be construed as indicating or implying relative importance or implicitly specifying the number of indicated technical features. Therefore, features defined with "first," "second," etc., may explicitly or implicitly include one or more of the stated features. In the description of this utility model, "multiple" or "several" means two or more, unless otherwise explicitly specified.

[0033] In the description of this utility model, unless otherwise expressly specified and limited, the first feature "above" or "below" the second feature may include the first feature and the second feature being in direct contact, or the first feature and the second feature not being in direct contact but being in contact through another feature between them.

[0034] First, see Figures 1 to 4 As shown, this utility model discloses a horizontal monitoring structure for machine tool equipment. The equipment includes a workbench 1 and a support frame 2 located below the workbench 1. The support frame 2 is provided with a horizontal monitoring component 3 for monitoring the horizontality of the workbench 1. The horizontal monitoring component 3 includes a base 31 and a level 32. The base 31 includes a monitoring platform 311. The level 32 is located on the monitoring platform 311. An adjustment component 4 for adjusting the horizontality of the monitoring platform 311 is provided between the base 31 and the support frame 2.

[0035] In this embodiment, the level monitoring component 3 is mounted on the support frame 2. Upon initial installation, the level of the monitoring base 311 is adjusted using the adjustment component 4 to ensure it aligns with the level of the workbench 1. This ensures that subsequent monitoring data from the level instrument 32 reflects the actual level of the workbench 1, guaranteeing the accuracy of level monitoring. After calibration, the base 31 is fixed, and the level instrument 32 is placed on the monitoring base 311. Since the level monitoring component 3 is entirely mounted on the support frame 2, daily monitoring by the level instrument 32 will not interfere with the normal production operation of the workbench 1. The level instrument 32 can be stably mounted on the equipment for a long period, enabling real-time monitoring of the level of the workbench 1. This facilitates regular inspections of the equipment's level accuracy by maintenance personnel and allows for timely detection and adjustment when the equipment's level accuracy declines, effectively ensuring the product processing effect of the equipment. Furthermore, it avoids the problem of unstable level measurement caused by the monthly processing of the guide rollers in existing technologies, resulting in excellent stability of level monitoring.

[0036] Understandably, the workbench 1 is equipped with processing devices to perform cutting and other processing operations. Figure 1 and Figure 2 This is only an illustration of the assembly structure of the workbench 1 and the support frame 2; the processing device is not shown.

[0037] In some embodiments, see Figure 4 , Figure 5 and Figure 8 As shown, the base 31 includes a connecting section 312, and the connecting section 312 is provided with an adjustment hole 313. The adjustment assembly 4 includes a rotating adjustment member 41 that can move along the axial direction of the adjustment hole 313. The rotating adjustment member 41 is rotatably connected to the adjustment hole 313. The support frame 2 is provided with a top abutment part 21 for the rotating adjustment member 41 to abut against. The rotating adjustment member 41 can pass through the adjustment hole 313 and abut against the top abutment part 21.

[0038] For example, the rotary adjustment member 41 may be a headless screw, and the inner wall of the adjustment hole 313 and the headless screw are both provided with corresponding threads, but it is not limited to this.

[0039] When adjusting component 4, one end of the rotating adjusting member 41 (hereinafter referred to as the "top abutment end") passes through the adjusting hole 313, and the top abutment end abuts against the top abutment part 21. By rotating the rotating adjusting member 41 in both directions, the distance between the top abutment end and the adjusting hole 313 is adjusted, so as to adjust the relative distance between the position of the adjusting hole 313 on the base 31 and the top abutment part 21. The end of the monitoring base away from the support frame 2 swings vertically until the monitoring base and the monitoring base 311 are parallel and the base 31 is fixed. The level adjustment structure of the monitoring base 311 is simple, and through the setting of this adjustment structure, it is ensured that the data subsequently monitored by the level instrument 32 can reflect the actual level of the workbench 1, and the accuracy of level monitoring is guaranteed.

[0040] In some embodiments, see Figures 4 to 6 As shown, the support frame 2 includes a mounting wall 22, a top abutment 21 is provided on the mounting wall 22, and the connecting section 312 is connected to the mounting wall 22 by a rotating connector 5.

[0041] For example, the rotary connector 5 may be a capped screw, but is not limited thereto.

[0042] Understandably, the connecting section 312 and the mounting wall 22 are provided with mounting holes that mate with the rotating connector 5.

[0043] In some embodiments, see Figure 4 and Figure 6 As shown, the mounting wall 22 extends vertically.

[0044] Understandably, in the actual production of parts, there are machining errors in workpieces such as the mounting wall 22. Therefore, by using the mounting wall 22, which extends vertically, in conjunction with the adjustment component 4 for fine-tuning, it can be ensured that the data subsequently monitored by the level instrument 32 can reflect the actual levelness of the workbench 1. The vertical extension of the mounting wall 22 helps to reduce the difficulty of adjusting the levelness of the monitoring base.

[0045] In some embodiments, see Figure 5 and Figure 6 As shown, the adjustment assembly 4 includes a plurality of rotary adjustment elements 41 arranged in a horizontal direction; and / or,

[0046] The adjustment assembly 4 includes several rotating adjustment elements 41 arranged in the vertical direction.

[0047] For example, two or more sets of rotating adjustment components 41 arranged in the vertical direction can be provided, and each set of rotating adjustment components 41 includes several rotating adjustment components 41 arranged in the horizontal direction, but is not limited thereto.

[0048] By working together, multiple rotating adjustment elements 41 arranged horizontally and / or vertically can improve the accuracy of the level adjustment of the monitoring base 311 and enhance the support of the monitoring base 311 to ensure that the monitoring base 311 can remain at the level after adjustment.

[0049] In some embodiments, see Figure 4 and Figure 7 As shown, the connecting section 312 is perpendicular to the monitoring base 311, which helps to reduce the difficulty of adjusting the level of the monitoring base.

[0050] In some embodiments, the connecting section 312 and the monitoring base 311 can be integrally formed, consisting of a metal plate with an L-shaped structure, wherein the transverse wall of the L-shaped structure is the monitoring base 311 and the longitudinal wall is the connecting section 312.

[0051] In some embodiments, see Figure 4 and Figure 7 As shown, a reinforcing rib 314 is provided between the connecting section 312 and the monitoring base 311. The two ends of the reinforcing rib 314 are connected to the connecting section 312 and the monitoring base 311 respectively. The reinforcing rib 314 extends from top to bottom in a direction away from the connecting section 312.

[0052] By setting a reinforcing rib 314 between the connecting section 312 and the monitoring base 311, the firmness of the base 31 is strengthened, ensuring that the monitoring base 311 will not deform, and further ensuring that the monitoring base 311 can be kept at the same level.

[0053] For example, the reinforcing rib 314 can be one or more plates, and the shape of the plates can be triangular, rectangular, etc., but is not limited thereto. For example, the reinforcing rib 314 can be a rectangular plate, with its upper and lower ends connected to the connecting section 312 and the monitoring base 311, respectively; the reinforcing rib 314 can also be multiple triangular plates arranged along the same straight line, with one side of the triangular plate connected to the connecting section 312 and the other side connected to the monitoring base 311.

[0054] In some embodiments, see Figure 7 As shown, the monitoring base 311 is planar, and the roughness Ra of the monitoring base is ≤0.1μm. It is a finely machined plane to avoid the monitoring base being too rough and affecting the monitoring accuracy of the level 32 placed on it.

[0055] In some embodiments, see Figure 7 As shown, an adhesive component (not shown) is provided between the level 32 and the monitoring base 311 to ensure that the level 32 does not shift relative to the monitoring base 311, thereby further ensuring the stability and reliability of levelness monitoring.

[0056] In some embodiments, see Figure 4 and Figure 6 As shown, the level 32 includes a first strip level 321 and a second strip level 322 arranged perpendicularly to each other.

[0057] By using two mutually perpendicular bar-type levels 32, the levelness change data in two directions are simultaneously fed back, realizing two-dimensional orthogonal monitoring of the levelness of the workbench 1. This not only helps maintenance personnel to quickly locate the source of deviation (such as loose support structure in a certain direction), but also provides a quantitative basis for precise adjustment.

[0058] For example, in one embodiment, one of the first bar level 321 and the second bar level 322 can be set along the length direction of the workbench 1 and the other is set along the width direction of the workbench 1. This setting makes it easier to monitor and adjust the levelness of the workbench 1. In another embodiment, one of the first bar level 321 and the second bar level 322 can form a first angle with the length direction of the workbench 1 and the other can form a first angle with the width direction of the workbench 1.

[0059] In some embodiments, see Figures 1 to 3 As shown, the support frame 2 includes several height-adjustable support units 23, and at least one support unit 23 is connected to a horizontal monitoring component 3.

[0060] Understandably, a set of level monitoring components 3 can be installed on each of its support units 23, or a set of level monitoring components 3 can be installed on one or more of the support units 23 as needed, so as to facilitate the levelness monitoring and adjustment of the workbench 1.

[0061] When it is necessary to adjust the level of the workbench 1, the tilt is analyzed according to the level instrument 32, and then the overall height of the different support units 23 is adjusted. The level monitoring component 3 is set on the support unit 23, which makes it easy to observe whether the level of the current workbench 1 meets the standard while adjusting, making the level adjustment more convenient and faster.

[0062] Understandably, support frame 2 may include two sets of support unit groups (such as...) Figure 2 As shown), it may also include three or more sets of support unit groups (such as...). Figure 1 As shown), each support unit group includes two support units 23 arranged along its width direction.

[0063] In some embodiments, see Figures 1 to 3 As shown, the support unit 23 includes a base 231 and a support seat 232 located below the base 231. The base 231 is connected to the workbench 1, and the horizontal monitoring component 3 is located on the base 231. A height adjustment component 233 is provided between the base 231 and the support seat 232 to adjust the relative distance between the two in the vertical direction.

[0064] When it is necessary to adjust the level of the workbench 1, the tilt of the workbench 1 is analyzed according to the level instrument 32, and the overall height of the different support units 23 is adjusted by using the height adjustment component 233. This adjusts the height of the corresponding position of the workbench 1 above the support unit 23, thereby adjusting the level of the workbench 1.

[0065] In some embodiments, see Figures 1 to 3 and Figure 7As shown, the base 231 includes a main frame, the main frame has an inner cavity 2311, the bottom of the inner cavity 2311 has a first adjustment connection hole, the support base 232 has a second adjustment connection hole 2321, the first adjustment connection hole and the second adjustment connection hole 2321 are coaxially arranged, the height adjustment component 233 includes an adjustment screw 2331 and a locking component 2332 sleeved on the adjustment screw 2331, the adjustment screw 2331 is rotatably connected to the first adjustment connection hole and the second adjustment connection hole 2321 respectively.

[0066] For example, the locking element 2332 may be a lock nut.

[0067] Understandably, the outer wall of the adjusting screw 2331 can be continuously threaded throughout, or it can be threaded with multiple intervals.

[0068] In some embodiments, the locking member 2332 includes a first locking nut and a second locking nut, a first adjusting connection hole is disposed between the first locking nut and the second locking nut, and the three are coaxially arranged.

[0069] When adjusting the height of the support unit 23, the adjusting screw 2331 is rotated in both directions to move the adjusting screw 2331 up and down relative to the bottom of the inner cavity 2311, thereby adjusting the relative distance between the base 231 and the support seat 232 in the vertical direction. With the locking part 2332, the support unit 23 can be stably maintained at the adjusted height setting so that the worktable 1 can be stably maintained at the adjusted level.

[0070] On the other hand, this utility model provides a photovoltaic silicon wafer slicing machine, including the horizontal monitoring structure of the above-mentioned machine tool equipment.

[0071] In the description of this specification, references to terms such as "some embodiments," "exemplary," "example," or "for example," etc., indicate that a specific feature, structure, material, or characteristic described in connection with an embodiment or example is included in at least one embodiment or example of this application. In this specification, the illustrative expressions of the above terms do not necessarily refer to the same embodiment or example. Furthermore, the specific features, structures, materials, or characteristics described may be combined in any suitable manner in one or more embodiments or examples.

[0072] The above description is merely a preferred embodiment of the present utility model and is not intended to limit the present utility model in any way. Although the present utility model has been disclosed above with reference to a preferred embodiment, it is not intended to limit the present utility model. Any person skilled in the art can make some modifications or alterations to the above-described technical content to create equivalent embodiments without departing from the scope of the present utility model. Any simple modifications, equivalent changes, and alterations made to the above embodiments based on the technical essence of the present utility model without departing from the scope of the present utility model shall still fall within the scope of the present utility model.

Claims

1. A horizontal monitoring structure for machine tool equipment, characterized in that, The device includes a workbench and a support frame located below the workbench. The support frame is equipped with a level monitoring component for monitoring the levelness of the workbench. The level monitoring component includes a base and a level. The base includes a monitoring platform. The level is located on the monitoring platform. An adjustment component for adjusting the levelness of the monitoring platform is provided between the base and the support frame.

2. The horizontal monitoring structure for machine tool equipment according to claim 1, characterized in that, The base includes a connecting section with an adjustment hole. The adjustment assembly includes a rotating adjustment member that can move along the axis of the adjustment hole. The rotating adjustment member is rotatably connected to the adjustment hole. The support frame has a top abutment for the rotating adjustment member to abut against. The rotating adjustment member can pass through the adjustment hole and abut against the top abutment.

3. The horizontal monitoring structure for machine tool equipment according to claim 2, characterized in that, The support frame includes a mounting wall, the top abutment is disposed on the mounting wall, and the connecting section is connected to the mounting wall by a rotating connector.

4. The horizontal monitoring structure for machine tool equipment according to claim 3, characterized in that, The mounting wall extends vertically.

5. The horizontal monitoring structure for machine tool equipment according to claim 2, characterized in that, The adjustment assembly includes a plurality of the rotary adjustment elements arranged in a horizontal direction; and / or, The adjustment assembly includes a plurality of rotary adjustment elements arranged in a vertical direction.

6. The horizontal monitoring structure for machine tool equipment according to claim 2, characterized in that, The connecting section is perpendicular to the monitoring base; and / or A reinforcing rib is provided between the connecting section and the monitoring base. The two ends of the reinforcing rib are respectively connected to the connecting section and the monitoring base. The reinforcing rib extends from top to bottom in a direction away from the connecting section.

7. The horizontal monitoring structure for machine tool equipment according to claim 1, characterized in that, The monitoring base is planar, and the roughness Ra of the monitoring base is ≤0.1μm; and / or, An adhesive component is provided between the level and the monitoring base.

8. The horizontal monitoring structure for machine tool equipment according to claim 1, characterized in that, The level includes a first-bar level and a second-bar level arranged perpendicularly to each other.

9. The horizontal monitoring structure for machine tool equipment according to claim 1, characterized in that, The support frame includes several height-adjustable support units, and at least one of the support units is connected to the level monitoring component.

10. The horizontal monitoring structure for machine tool equipment according to claim 8, characterized in that, The support unit includes a base and a support seat located below the base. The base is connected to the workbench, and the horizontal monitoring component is located on the base. A height adjustment component is provided between the base and the support seat to adjust the relative distance between them in the vertical direction.

11. The horizontal monitoring structure for machine tool equipment according to claim 10, characterized in that, The base includes a main frame, the main frame has an inner cavity, the bottom of the inner cavity has a first adjustment connection hole, the support base has a second adjustment connection hole, the first adjustment connection hole and the second adjustment connection hole are coaxially arranged, the height adjustment component includes an adjustment screw and a locking component sleeved on the adjustment screw, the adjustment screw is rotatably connected to the first adjustment connection hole and the second adjustment connection hole respectively.

12. A photovoltaic silicon wafer slicing machine, characterized in that, Includes a horizontal monitoring structure for machine tool equipment according to any one of claims 1 to 11.

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