High temperature hot plate
CN309147990SActive Publication Date: 2025-03-04JIANGSU SHIWEI SEMICON TECH CO LTD
View PDF 0 Cites 0 Cited by
Patent Information
- Application Number
- CN202430351067.4
- Authority / Receiving Office
- CN · China
- Patent Type
- Designs(China)
- Current Assignee / Owner
- Filing Date
- 2024-06-07
- Publication Date
- 2025-03-04
- Estimated Expiration
- 2039-06-07
Smart Images
Figure 000006_ABST
Abstract
1. The name of the product of this design: high temperature hot plate. 2. Purpose of the product with this appearance design: The product with this appearance design is used to heat the mask of a photolithography machine, heating the mask coated with colloid to a certain temperature to meet the process requirements. 3. The design key point of this appearance design product lies in the shape. 4. The picture or photo that best illustrates the key points of the design: main view.
Need to check novelty before this filing date? Find Prior Art