Water gun (for semiconductor cleaning equipment)
CN309619507SActive Publication Date: 2025-11-21海普瑞(常州)洁净系统科技有限公司
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Patent Information
- Application Number
- CN202430792028.8
- Authority / Receiving Office
- CN · China
- Patent Type
- Designs(China)
- Current Assignee / Owner
- Filing Date
- 2024-12-13
- Publication Date
- 2025-11-21
- Estimated Expiration
- 2039-12-13
Smart Images
Figure 000001_ABST
Abstract
1. Name of the design product: water gun (for semiconductor cleaning equipment). 2. Use of the design product: used for spraying cleaning liquid on the surface of silicon wafer to remove impurities on the surface during the production process of semiconductor equipment. 3. Design points of the design product: in shape. 4. Picture or photo best indicating the design points: perspective view.
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