device for generating microwave radiation over a large area

FR3152219A1Active Publication Date: 2025-02-28POSTEL-HOLDING
View PDF 4 Cites 0 Cited by

Patent Information

Application Number
FR2023008823
Authority / Receiving Office
FR · FR
Patent Type
Applications
Current Assignee / Owner
Filing Date
2023-08-21
Publication Date
2025-02-28
Estimated Expiration
2043-08-21

Smart Images

  • Figure 00000000_0000_ABST
    Figure 00000000_0000_ABST
Patent Text Reader

Abstract

The invention relates to a microwave processing device (10), said microwave processing device (10) comprising: - a main module (100), extending from a base to a main end (102) along an elongation axis XX', the generating module being configured to emit a plasma jet in which a microwave field propagates, through an aperture (105) disposed at its main end (102); - a metallic grid (500), advantageously essentially planar, of extent S, and coupled to the main module (100) such that when the main module (100) is in operation, the plasma jet reaches said metallic grid (500) and the microwave radiation emitted by the main module (100) is absorbed by the metallic grid (500), which uniformly re-emits said radiation over its entire extent. Figure 1
Need to check novelty before this filing date? Find Prior Art

Claims

module principal (100).

7. Device according to claim 6, wherein the main module (100) comprises: - an external casing (110) of cylindrical shape, which extends along the elongation axis, between an external base and the main end (102), and forming a housing (104), said housing (104) being open by the main end (102); - a central electrode (200) of cylindrical shape, arranged coaxially with the external casing (110) in the housing (104) and which extends from the external base towards one of its ends called the free end (201), said central electrode (200) comprising, at its free end (201), a tip, the central electrode (200) defining with the external casing (110) an annular space (300); - means for injecting, into the housing (104), a main gas capable of forming a cold plasma when it is subjected to an electric field greater than a so-called breakdown field;- microwave means (400) configured to transmit a microwave field to the central electrode (200), and so that said microwave field propagates in the annular space (300) along the elongation axis XX' towards the opening (105), the tip ensuring the focusing of said microwave field so that the field near the tip is greater than the breakdown field.;

8. Device according to claim 7, in which the central electrode (200) comprises at its free end (201) a conical section.

9. Device according to one of claims 7 or 8, in which the central electrode (200) is hollow and forms a channel for circulation of the main gas to the free end (201). [Fig. 4] 504 [Fig. 5]

Citation Information

Patent Citations

  • Cold plasma generating apparatus and multi-cold plasma array apparatus comprising the same

    US11264211B2

  • Plasma Source

    US20080237484A1

  • Gas plasma disinfection and sterilisation apparatus

    US20140319382A1

  • High density microwave plasma apparatus

    WO2017111535A1