Manufacturing process for wettable edge electronic components

Abstract

Method for manufacturing electronic components with wettable sides Method for manufacturing electronic components with wettable sides from a substrate (301) covered by connection pads (107) and in which chips (103) are formed, the method comprising the following steps: a) soldering connection pads onto the connection pads (107), b) coating the connection pads with a layer of insulating resin (121), c) thinning the layer of insulating resin (121) until reaching the connection pads, d) forming cavities by removing part of the connection pads and part of the layer of insulating resin (121), so as to make part of the sides of the components accessible, e) depositing a layer of conductive material (122) on the sides of the components and on the connection pads, f) separating the chips (103). Figure for abstract: Fig. 2E

Description

Title of the invention: Method for manufacturing electronic components with wettable sides Technical field

[0001] The present description relates to the manufacture of electronic components. It relates more particularly to the manufacture of so-called surface-mount components, i.e. comprising, on at least one side, one or more connection metallizations intended to be soldered to corresponding connection pads of an external device, for example a printed circuit board or another component. Prior art

[0002] In some applications, there is a need for surface-mount components in which connection metallizations intended to be soldered to an external device extend to the sides of the components. These are referred to as wettable flank components. When mounting the component in its environment (for example, on a printed circuit board), the connection metallizations (also called electrical contacts) are soldered or welded to corresponding metal tracks or elements on the printed circuit side. A portion of the solder material then rises up the sides of the components, which allows for a visual inspection of the quality of the connections.

[0003] This need exists for example in the automotive or medical fields and, more generally, in fields where it is desired to guarantee the reliability of electrical connections, once the circuits are mounted in their environment. Summary of the invention

[0004] There is a need to improve at least in part certain aspects of known methods for manufacturing electronic components with wettable sides.

[0005] This aim is achieved by a method for manufacturing electronic components with wettable sides from a substrate covered by connection pads and in which chips are formed, the method comprising the following steps: a) soldering connection pads onto the connection pads of the chips, b) coating the connection pads with a layer of insulating resin, c) thinning the layer of insulating resin until it reaches the connection pads, d) forming cavities by removing part of the connection pads and part of the layer of insulating resin, so as to make part of the sides of the components accessible, e) deposit a layer of conductive material on the sides of the components and on the connection pads, f) separate the chips at the cavities.

[0006] According to one embodiment, the connection pads comprise an electrically conductive core, covered by a layer of solderable material.

[0007] According to one embodiment, the brazable material is Sn or a tin alloy such as SnAg or SnAgCu.

[0008] According to one embodiment, the electrically conductive core is made of copper.

[0009] According to one embodiment, the conductive material and the brazable material are identical.

[0010] According to one embodiment, step e) is carried out by printing.

[0011] This object is also achieved by an electronic component with wettable sides comprising a chip having connection pages protected by a package comprising a first main face, sides and a second main face, a layer of conductive material covering part of the sides and extending over the first main face, the layer of conductive material being electrically connected to the electrical connection pads of the chip by means of connection pads soldered onto the connection pads.

[0012] According to one embodiment, the connection pads comprise an electrically conductive core covered at least partially by a layer of material soldered onto the connection pads.

[0013] According to one embodiment, the layer of conductive material is Sn or a tin alloy, such as SnAg or SnAgCu.

[0014] According to one embodiment, a layer of insulating resin covers the first main face of the chip between the connection pads. Brief description of the drawings

[0015] These characteristics and advantages, as well as others, will be explained in detail in the following description of particular embodiments given without limitation in relation to the attached figures among which:

[0016] [Fig.l] represents, schematically and in section, an electronic component with wettable sides according to a particular embodiment;

[0017] [Fig.2A], [Fig.2B], [Fig.2C], [Fig.2D], [Fig.2E] and [Fig.2F] represent sectional views illustrating steps of a method of manufacturing an electronic component with a wettable sidewall according to a particular embodiment;

[0018] [Fig. 3] represents an electronic component with a wettable side, in top view, obtained by the method of FIGS. 2A to 2F;

[0019] [Fig.4A] and [Fig.4B] represent sectional views illustrating steps of a method of manufacturing an electronic component with a wettable sidewall according to another particular embodiment;

[0020] [Fig.5] represents an electronic component with a wettable side, in top view, obtained by the method of figures 4A and 4B;

[0021] [Fig.6] is a photograph obtained using a scanning electron microscope (SEM) representing a spherical connection pad with a core-shell structure according to a particular embodiment. Description of the embodiments

[0022] The same elements have been designated by the same references in the different figures. In particular, the structural and / or functional elements common to the different embodiments may have the same references and may have identical structural, dimensional and material properties.

[0023] For the sake of clarity, only the steps and elements useful for understanding the described embodiments have been shown and are detailed.

[0024] Unless otherwise specified, when referring to two elements connected to each other, this means directly connected without intermediate elements other than conductors, and when referring to two elements connected (in English "coupled") to each other, this means that these two elements can be connected or be connected by means of one or more other elements.

[0025] In the following description, when reference is made to absolute position qualifiers, such as the terms "front", "back", "top", "bottom", "left", "right", etc., or relative position qualifiers, such as the terms "above", "below", "upper", "lower", etc., or to orientation qualifiers, such as the terms "horizontal", "vertical", etc., reference is made unless otherwise specified to the orientation of the figures or to a ... in a normal position of use.

[0026] Unless otherwise specified, the expressions "about", "approximately", "substantially", and "of the order of" mean to within 10%, preferably to within 5%.

[0027] Electronic components find applications in many industrial fields, and in particular, in the automotive field or the medical field.

[0028] [Fig.l] illustrates, by a partial and schematic sectional view, an electronic component 100.

[0029] The electronic component 100 is formed of an electronic chip 103 and a housing 109. According to one example, the electronic chip 103 is formed from a semiconductor substrate, for example silicon. It may also be SiC. Alternatively, the substrate may be glass or sapphire.

[0030] The chip comprises a front face 105 (also called first face or front face), a rear face 104 (also called second face or rear face) and sides 106 (also called side faces). The lower face 104 is opposite the upper face 105.

[0031] One or more connection pads 107 (also called electrical contacts) are formed on the upper face 105 of the electronic chip 103 and allow it to be connected to other elements (chips or electronic devices).

[0032] The electrical connection pads 107 are also called “UBM” (for the English expression “Under Bump Metallization”). The electrical connection pads 107 are made of a conductive material specifically adapted to receive the connection pads 117, and in particular having good adhesion with the pads 177. The electrical connection pads 107 comprise at least one of the following elements: gold, titanium, nickel, copper, silver, tin or tungsten. Preferably, they comprise gold or copper. The connection pads 107 may be covered with a metal layer (“plating”).

[0033] The electrical connection pads 107 are, for example, at a distance of 10 to 50 pm, or even 10 to 30 pm from the side wall of the chip. The distance will depend on the size of the connection pads 117. The electrical connection pads 107 can be positioned on the upper face 105 of the chip 103 or be flush with the upper face (i.e. reach the level of the upper face 105 of the chip 103).

[0034] The chip 103 may comprise one or more discrete components. The discrete component(s) are, for example, chosen from transistors, diodes, thyristors, triacs, filters, etc. The chip 103 may comprise one or more electronic circuits. The chip 103 makes it possible to implement different electronic functions.

[0035] Component 100 is a so-called integrated component.

[0036] The chip 103 is protected by the housing 109. More particularly, the housing 109 covers at least the upper face 105. Preferably, as shown in [Fig.l], it can also cover the sides 106 of the chip 103 and / or the lower face 105 of the chip 103.

[0037] The housing 109 is made of an electrically insulating material.

[0038] In order to be able to connect the component 100 to other components and / or electronic circuits, the housing 109 further comprises connection pads 117 (also called housing contacts or contact connections). The connection pads 117 are positioned on the upper face 105 of the chip 103. Each connection pad 117 is connected to an electrical connection pad 107 of the chip 103.

[0039] The connection pads 117 may be metallic elements.

[0040] The connection pads 117 are, for example, metal balls. They may be balls made of copper, nickel or any other non-fusible material.

[0041] The connection pads 117 may be elements comprising an electrically conductive core 118 covered by a layer 116 (also called a shell) of solderable material.

[0042] Preferably, the electrically conductive core 118 is made of copper.

[0043] Preferably, the brazable material is tin or one of its alloys, such as SnAgCu or SnAg. The layer 116 acts as a barrier layer to oxidation.

[0044] The electrical connection pads 107 of the chip 103 and the connection pads 117 are positioned in openings of a layer of insulating resin 121 covering the chip 103.

[0045] The component 100 is a wettable sidewall component, i.e. at least part of its sides is covered by a layer of a wettable and / or weldable material, i.e. a material on which it is possible to solder or carry out another mechanical fixing method (conductive glue, sintering for example).

[0046] The layer 122 of wettable material covers a portion of the sides 119 of the component 100 and extends over the first main face 115 of the component 100. This layer forms a continuous layer of which a first portion 122A covers a portion of the first face 115 of the component 100 and of which a second portion 122B covers a portion of the sides 119 of the component 100.

[0047] The wettable material is in direct contact with the connection pads 117. By direct contact, it is meant that there is no element between the connection pads 117 and the wettable material. It is in direct contact at the flanks 119 and at the first main face 115.

[0048] The wettable material is preferably a brazable material, such as Sn, SnAg or SnAgCu, or another higher melting point material.

[0049] We will now describe in more detail the method of manufacturing such a component 100 with reference to FIGS. 2A to 2F.

[0050] The method is carried out from a substrate 301 covered by connection pads 107 and in which chips 103 are formed.

[0051] The method comprises the following steps: a) soldering connection pads 117 onto the connection pads 107, the connection pads 117 preferably comprising an electrically conductive core 118, covered by a coating layer 116 made of a solderable material ([Fig.2A]), b) depositing a layer of insulating resin 121 onto the substrate 301, the layer of insulating resin 121 coating the connection pads 117 and the connection pads 107 ([Fig.2B]), c) thinning the insulating resin layer 121 until it reaches the connection pads 117, and where appropriate, the core 118 of the connection pads 117 ([Fig.2C]), d) forming cavities 311 between the chips 103 by locally removing part of the connection pads 117 and part of the insulating resin layer 121, so as to make part of the sides 119 of the components 100 accessible ([Fig.2D]), e) depositing a layer of conductive material 122 on the sides 119 of the components 100 and on the connection pads ([Fig.2E]), f) separating the chips 103 by cutting into the cavities 311 ([Fig.2F]), whereby components 100 with wettable sides are obtained.

[0052] In step a), the manufacturing of the discrete component(s) and / or integrated circuits forming the components 100 is completed. The components 100 are formed from the same substrate 301, and have not yet been individualized. The chips 103 are delimited by a dotted line in the substrate 301. The substrate 301 comprises a first face 305 (upper face or front face) and a second face 303 (or rear face).

[0053] The substrate 301 is, for example, a semiconductor substrate, for example made of silicon, or SiC.

[0054] The substrate 301 has, for example, a thickness of between 300 and 900 μm, for example a thickness of approximately 725 μm.

[0055] In addition, electrical connection pads 107, described in relation to [Fig. 1], have been formed on an upper face 305 of the substrate 301 ([Fig. 2A]).

[0056] During step a), the connection pads 117 are soldered onto the connection pads 107.

[0057] As shown in Figures 2A to 2F and 3, the connection pads 117 may be balls (i.e., spherical in shape). It is evident that the drawings are schematic representations and that, in reality, the connection pads 117 and the connection pads 107 have a contact surface larger than a simple contact point when they are soldered to each other.

[0058] Alternatively, as shown in Figures 4A, 4B and 5, the connection pads may be columns. They may be pillars of square, circular or rectangular section.

[0059] Preferably, the connection pads 117 comprise a core 116 made of a first material and a shell (or coating) 118 made of a second material.

[0060] The shell 118 preferably continuously covers the core. The shell has, for example, a thickness of between 10 and 20 μm.

[0061] The electrically conductive core 116 is preferably made of copper.

[0062] The shell 118 or coating is made of a material that can be soldered onto the connection pads. In particular, it is tin or a tin alloy, such as SnAg or SnAgCu.

[0063] [Fig. 6] represents, for illustrative and non-limiting purposes, an SEM image of a spherical connection pad 117 having a copper core and a shell made of a tin-based alloy.

[0064] In a variant not shown, the connection pads are metal balls. The balls are not covered by a shell. They can be copper balls, nickel.

[0065] During step b), a layer of insulating resin 121 is deposited on the substrate 301.

[0066] More particularly, the insulating resin layer 121 is deposited on the first face 305 of the substrate 301 and on the pads 117. Thus, the pads 117 are arranged within the resin. The insulating resin layer 121 forms a first part of the component housing 100. For example, the layer 121 can be deposited by screen printing, by compression or by injection. This first part of the housing therefore protects the upper face of the components 100.

[0067] The resin is an electrically insulating resin. More particularly, the resin comprises at least one base material to which electrically insulating particles are added. The base material is chosen from the group comprising: epoxy type resins, and phenolic type resins, acrylic type resins. Preferably, it is an epoxy type resin. The particles are, for example, oxide particles, and in particular alumina or silica particles.

[0068] The polymerization is, for example, carried out under ultraviolet (UV) radiation or by thermal activation. Annealing may be carried out before step c).

[0069] During step c), a thinning step is carried out from the front face in order to remove the part of the insulating resin 121 covering the connection pads 117 and the upper part of the connection pads 117 until reaching the core 116 of the connection pads 117.

[0070] The front face thinning step can be carried out by polishing ('grinding'). A mechanical type polishing is preferably chosen.

[0071] During step d), the cavities 311 are formed between the chips 103 in order to remove a portion of the resin layer 121 and a portion of the connection pads 117. The core 116 of the connection pads 117 is thus also laterally accessible.

[0072] The cavities 311 obtained extend from the front face and over a depth corresponding at least to the height of the layer of conductive material 122 covering the sides of the components 100 described below. The height of the cavity 311 is less than the thickness of the layer of insulating resin 121 in order to isolate the wettable sides of the substrate 301.

[0073] Step d) is carried out by means of a cutting device. The cutting device is, for example, a mechanical cutting tool such as a saw, or a laser engraving tool. According to a preferred embodiment, the cutting device is a laser. In addition, when the cutting device is a laser, the cutting technique used may be a laser direct structuring (LDS) type technique.

[0074] During step e), a layer 122 of conductive material is deposited so as to cover at least part of the sides 119 of the components 100 and the pads of connection 117.

[0075] The layer 122 of conductive material can be deposited by a printing method, an additive deposition method or by immersion in a bath. It is, for example, possible to deposit an antioxidant material on the metal surfaces. The deposition is selective.

[0076] The layer 122 of conductive material is advantageously deposited locally by a dispensing type technique, and preferably by screen printing, in particular through a mask.

[0077] Alternatively, it can be deposited as a full plate.

[0078] At the end of step e), the cavities 311 are filled with the conductive material and the core 116 of the connection pads 117 is covered by the layer 122 of conductive material. The core 116 is thus completely covered by a protective layer formed partly from the shell 118 and partly from the layer 122. The core is thus protected from the external environment, and in particular from oxidation, which is particularly advantageous in the case of a core 116 made of copper.

[0079] During step f), the components 100 are individualized by making a cut at the cavities 311. The components 100 are thus separated from each other.

[0080] It is also possible to carry out the steps in the following order: a), b), c), d), f) and e). After the formation of the cavities 311, it is possible to continue with a total cutting (step f)) then to carry out the deposition of the layer of conductive material 122 (step e)). The deposited layer is, advantageously, an organic layer. It also serves as a protective layer against oxidation.

[0081] The method may also comprise a rear face thinning step. For this, the structure is turned over and fixed by its front face, i.e. face 305, on a support. The support is, for example, a strip of adhesive tape. The structure is then thinned by its rear face 303 so that the substrate 301 has its final thickness.

[0082] The method may, advantageously, comprise a step during which an additional insulating layer is deposited on the rear face 303 of the structure to form the rear face of the package 111 and / or on the side faces 106 of the chip 103.

[0083] The additional insulating layer is a layer made of an electrically insulating material, for example a resin, for example a resin of the same type as the resin of layer 121. According to another example, the materials of the layers are different.

[0084] At the end of the process, the components 100 obtained are surface-mount components (or SMD for “surface-mounting device”) of the “flip-chip” type, that is to say they can be fixed on an external device, for example, a printed circuit board or another component, by their upper face, that is to say the face on in which the contacts 117 of the housing 109 are arranged.

[0085] For this, a brazing material is positioned between the component 100 and the external device. During brazing, the brazing material rises along the sides 119 of the components 100, which makes it possible to verify that the brazing has been carried out correctly.

[0086] Such components 100 are particularly interesting for guaranteeing the reliability of the electrical connections, once the circuits are mounted in their environment.

[0087] Various embodiments and variations have been described. Those skilled in the art will understand that certain features of these various embodiments and variations could be combined, and other variations will occur to those skilled in the art.

[0088] Finally, the practical implementation of the embodiments and variants described is within the reach of those skilled in the art from the functional indications given above.

Claims

Claims

1. A method of manufacturing electronic components (100) with wettable sides from a substrate (301) covered by connection pads (107) and in which chips (103) are formed, the method comprising the following steps: a) soldering connection pads (117) onto the connection pads (107) of the chips (103), b) coating the connection pads (117) with a layer of insulating resin (121), the layer of insulating resin (121) forming a first part of a housing protecting the chip (103), c) thinning the layer of insulating resin (121) until it reaches the connection pads (117), d) forming cavities (311) by removing a part of the connection pads (117) and a part of the layer of insulating resin (121), so as to make accessible a part of the sides (119) of the components (100), e) depositing a layer of conductive material (122) on the sides (119) of the components (100) and on the connection pads (117),f) separating the chips (103) at the cavities (311).,

2. The method of claim 1, wherein the connection pads (117) comprise an electrically conductive core (116), covered by a layer of solderable material (118).

3. A method according to the preceding claim, wherein the brazable material is Sn or a tin alloy such as SnAg or SnAgCu.

4. Method according to one of claims 2 and 3, in which the electrically conductive core (116) is made of copper.

5. A method according to any one of claims 2 to 4, wherein the conductive material and the solderable material are the same.

6. A method according to any preceding claim, wherein step e) is carried out by printing.

7. Electronic component (100) with wettable sides comprising a chip (103) having connection pages (107), the chip (103) being protected by a package (109) comprising a first main face (115), sides (119) and a second main face, a layer of conductive material (122) covering a portion of the sides (119) and extending over the first main face (115), the layer of conductive material (122) being electrically connected to the electrical connection pads (107) of the chip (103) by means of pads of connection (117) soldered on the connection pads (107), a layer of insulating resin (121) covering the chip (103) between the connection pads (117) and forming a first part of the housing (109).

8. Component according to claim 7, in which the connection pads (117) comprise an electrically conductive core (116) covered at least partially by a layer of material (118) soldered onto the connection pads (107).

9. An electronic component (100) according to claim 7 or 8, wherein the conductive material layer (122) is Sn or a tin alloy, such as SnAg or SnAgCu.

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