Microwave plasma reactor and method of operation

The microwave plasma reactor uses infrared radiation interference sensing to optimize CVD diamond growth parameters, addressing the challenge of early-stage quality assessment and enhancing efficiency and yield.

GB2700698APending Publication Date: 2026-03-04ELEMENT SIX TECH LTD
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Patent Information

Authority / Receiving Office
GB · GB
Patent Type
Applications
Current Assignee / Owner
Filing Date
2025-03-26
Publication Date
2026-03-04

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Abstract

A microwave plasma chemical vapour deposition (CVD) reactor 1 for manufacturing synthetic diamond material comprises a microwave generator 8, a plasma chamber 2, a microwave coupling configuration 12
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Citation Information

Patent Citations

  • Film thickness monitoring method and apparatus

    JP1994034328A