Gas supply nozzle for substrate processing apparatus

JP1706319SActive Publication Date: 2025-02-04KOKUSAI DENKI KK
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Patent Information

Application Number
JP2021012874D
Authority / Receiving Office
JP · JP
Patent Type
Designs
Current Assignee / Owner
Filing Date
2021-06-16
Publication Date
2025-02-04
Estimated Expiration
2046-06-16

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Abstract

The present article is a gas supply nozzle used in a substrate processing apparatus that processes substrates held in multiple stages vertically inside a reaction tube.
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