Atomization device

Abstract

To provide an atomization device which continuously performs primary atomization achieved with shear force and impulsive force generated by high speed jetting and secondary atomization achieved with collapsing force and friction force generated by using a rotary nozzle.SOLUTION: An atomization device includes: a liquid supply pump P which supplies a material M; a booster 3 which compresses the material M supplied from the liquid supply pump P; a high pressure filter 4 which performs filter processing of the compressed material M; and a jet chamber 5 configured to jet the material M which has been subject to the filter processing, the jet chamber 5 having a jet nozzle 10 which jets the material M, and a rotary nozzle 11 connected to the jet nozzle 10 and including a crushing chamber 11b having a plurality of hard bodies 11C, with which the material M jetted from the jet nozzle 10 collides, therein.SELECTED DRAWING: Figure 1

Description

[Technical field]

[0001] The present invention relates to an atomizer which primarily atomizes raw material by high-pressure jet from a jet nozzle, and then secondarily atomizes the raw material in a rotary nozzle. [Background technology]

[0002] Conventionally, there are known atomizers that atomize raw materials by utilizing the impact generated when the raw materials are sprayed at high pressure. In addition, in order to atomize raw materials and improve the efficiency of the work, there are also known hybrid atomizers that combine a wet jet mill and a bead mill, and atomizers that collide raw materials with a rotor having teeth.

[0003] The fluid impact device described in Japanese Patent No. 3686528 (hereinafter referred to as "Patent Document 1") utilizes the impact force on a hard body. In the fluid impact device of Patent Document 1, a high-pressure fluid injected from an injection nozzle is made to impact a hard sphere rotatably supported in an eccentric state within a chamber. Then, the ball is rotated to release the impact force by the ball's rotation, and the atomization process is performed.

[0004] The micronization device described in Japanese Patent No. 5628228 (hereinafter referred to as "Patent Document 2") combines wet milling (jet mill, homogenizer) with milling and dispersion processing using a bead mill or ball mill when micronizing raw material particles.

[0005] The atomization device described in JP 2011-50913 A (hereinafter referred to as "Patent Document 3") has a rotor with teeth on its outer edge that rotates at high speed, and a nozzle that sprays a mixture of raw material particles and liquid premixed toward the approaching teeth of the rotor.The mixture is then collided with the teeth of the rotor to atomize the raw material particles dispersed in the liquid. Summary of the Invention [Problem to be solved by the invention]

[0006] Patent Documents 1 to 3 do not improve the grinding power of each device that combines wet grinding (jet mill, homogenizer) with grinding and dispersion treatment using a bead mill or ball mill. Therefore, the cost of each device, including maintenance costs, is high, and the control and process for connecting each device are complicated. In addition, each device requires time and space for operation.

[0007] An object of the present invention is to provide an atomization device which successively performs primary atomization by the shear force and impact force of high-speed jet, and secondary atomization by the crushing force and friction force of a rotating nozzle. [Means for solving the problem]

[0008] The first aspect of the present invention is A feed pump for supplying raw material; a pressure booster that pressurizes the raw material supplied from the liquid supply pump; a high-pressure filter for filtering the pressurized raw material; an injection chamber for injecting the filtered material, A jet nozzle for spraying the raw material; a rotary nozzle connected to the jet nozzle, the rotary nozzle having a grinding chamber (11b) having a plurality of hard bodies therein against which the raw material jetted from the jet nozzle is collided; an ejection chamber having It is an atomization device having the above structure. Effect of the Invention

[0009] According to the atomization device of the present invention, primary atomization by the shearing force and impact force of high-speed jetting and secondary atomization by the crushing force and friction force using a rotating nozzle can be carried out consecutively. [Brief description of the drawings]

[0010] [Figure 1] FIG. 1 is a diagram showing the configuration of an atomization device according to an embodiment of the present invention; [Diagram 2] 1 is a top cross-sectional view of an injection chamber according to an embodiment; [Diagram 3] FIG. 13 is a top cross-sectional view of an ejection chamber according to another embodiment; [Figure 4] FIG. 13 is a top cross-sectional view of an ejection chamber according to another embodiment; [Diagram 5] (a) A schematic diagram of the inside of a grinding chamber according to an embodiment, (b) a cross-sectional view of the inside of a grinding chamber according to an embodiment, (c) a schematic diagram of the inside of a grinding chamber according to another embodiment, (d) a cross-sectional view of the inside of a grinding chamber according to another embodiment, (e) a schematic diagram of a grinding chamber according to another embodiment, (f) a schematic diagram of a grinding chamber according to another embodiment, and (g) a cross-sectional view of the inside of a grinding chamber according to another embodiment. [Figure 6] FIG. 1A is a perspective view of an ejection chamber according to an embodiment; FIG. 1B is a side cross-sectional view of the ejection chamber according to an embodiment; [Figure 7] FIG. 1 is a side cross-sectional view of a jet nozzle according to an embodiment. [Figure 8] Schematic diagram of an atomization device according to another embodiment. DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS

[0011] Hereinafter, the embodiments will be described with reference to the drawings as appropriate.

[0012] 1, the atomization device 1 of this embodiment performs pulverization, dispersion, emulsification, etc. of a raw material M to be processed. The atomization device 1 has a raw material tank 2, a liquid supply pump P, a pressure booster 3, a high-pressure filter 4, an injection chamber 5, a heat exchanger 6, and an outlet 7.

[0013] The raw material tank 2 stores the raw material M. The shape and size of the raw material tank 2 can be changed in consideration of the physical properties (acidity, alkalinity), amount, etc. of the raw material M. The liquid supply pump P supplies the raw material M supplied from the raw material tank 2 to the pressure booster 3.

[0014] The pressure intensifier 3 increases or decreases the pressure in the pressurizing chamber by reciprocating the piston, thereby increasing the pressure of the fluid passing through the atomization device 1 within the range of 10 to 300 MPa. The high-pressure filter 4 removes contaminants such as coarse particles and impurities present in the raw material M pressurized by the pressure booster 3.

[0015] 2 to 4, the ejection chamber 5 ejects the raw material M from the jet nozzle 10, from which contaminants such as coarse particles and impurities have been removed by the high-pressure filter 4. As a result, the ejection chamber 5 primarily atomizes the raw material M.

[0016] The heat exchanger 6 adjusts the temperature of the raw material M after the atomization process so that the temperature is appropriate. For most raw materials M, excessively high temperatures can adversely affect the physical properties. For this reason, it is desirable to adjust the temperature of the raw material M to 5 to 35°C.

[0017] The discharge port 7 discharges the raw material M processed in the injection chamber 5. When the raw material M is processed only once, the raw material M discharged from the discharge port 7 is stored in a recovery tank (not shown). When the raw material M is processed multiple times, the raw material M discharged from the discharge port 7 is returned to the injection chamber 5, and after the raw material M is subjected to atomization processing again, the raw material M discharged from the discharge port 7 is stored in a recovery tank (not shown).

[0018] The ejection chamber 5 (5A, 5B, 5C) will be described in detail with reference to Figs. 2 to 4. The ejection chamber 5 has a jet nozzle 10 and a rotary nozzle 11. The jet nozzle 10 has a jet nozzle tip 10a. The jet nozzle 10 primarily atomizes the raw material M by passing the raw material M through the jet nozzle tip 10a. The jet chamber 5 may have a plurality of jet nozzles 10. The jet nozzle 10A and the jet nozzle 10B may have the same structure. The jet nozzle tip 10Aa and the jet nozzle tip 10Ba may have the same structure. The raw material M supplied from the pressure intensifier 3 may be branched and introduced into a plurality of jet nozzles 10. By using a plurality of jet nozzles 10, the amount of the raw material M that can be atomized can be increased.

[0019] The rotary nozzle 11 secondarily atomizes the raw material M that has been primarily atomized by the jet nozzle 10. The rotary nozzle 11 has a main body 11a, a grinding chamber 11b, a hard body 11c, an introduction passage 11d, and a discharge port 11f. The main body 11a is a base of the rotary nozzle 11. The grinding chamber 11b is disposed inside the main body 11a. The main body 11a also serves as a base for the injection chamber 5 for atomizing the raw material M.

[0020] The grinding chamber 11b secondarily pulverizes the raw material M. The grinding chamber 11b is a grinding space formed in the main body 11a. The grinding chamber 11b has a circular cross section. The grinding chamber 11b has a cross section that is approximately the same size as the diameter of the hard body 11c. The raw material M is supplied into the grinding chamber 11b, and the hard bodies 11c continue to move within the grinding chamber 11b, thereby pulverizing the raw material M.

[0021] For example, as shown in FIG. 5(a) and (b), a plurality of hard bodies (spheres) 11c are accommodated in an annular grinding chamber 11b. The diameter of the spheres 11c is smaller than the diameter of the cross section of the grinding chamber 11b. The annular grinding chamber 11b having a circular cross section makes it easier for the spheres 11c to rotate inside the grinding chamber 11b. When the spheres 11c rotate inside the grinding chamber 11b, the raw material M is ground in the gap between the spheres 11c and the grinding chamber 11b. The cross section of the grinding chamber 11b may be not only circular but also elliptical. The spheres 11c have a spherical surface. When the spheres 11c rotate inside the grinding chamber 11b, the spheres 11c also rotate, so that the position of the spherical surface of the spheres 11c rotates 360 degrees. Therefore, the raw material M is always ground in different places, and the number of contacts of the raw material M increases. This allows secondary atomization to be performed by adding coarse crushing energy to the raw material M that has been temporarily atomized by the jet.

[0022] As another example of the grinding chamber 11b, as shown in FIG. 5(c) and (d), the grinding chamber 11b may have a polygonal (square, rectangular, etc.) cross section. A plurality of hard bodies (cylinders) 11cd may be accommodated inside the grinding chamber 11b. The height and width of the cylinder 11cd are smaller than the height and width of the cross section of the grinding chamber 11b. The circular grinding chamber 11b having a polygonal cross section makes it easier for the cylinder 11cd to rotate inside the grinding chamber 11b. When the cylinder 11cd rotates inside the grinding chamber 11b, the raw material M is ground in the gap between the cylinder 11cd and the grinding chamber 11b. The cylinder 11cd has circular upper and lower surfaces and a cylindrical side surface. When the cylinder 11cd rotates inside the grinding chamber 11b, the cylinder 11cd moves while sliding inside the grinding chamber 11b. Therefore, a sufficient amount of the raw material M can be ground between the side surface of the cylinder 11cd and the grinding chamber 11b. This allows secondary atomization to be performed by adding grinding energy to the raw material M that has been temporarily atomized by the jet flow.

[0023] As another example of the grinding chamber 11b, as shown in FIG. 5(e), an uneven portion 11h may be formed on the inner surface of the grinding chamber 11b. This allows the raw material M to be more crushed. The uneven portion 11h is not limited to uneven grooves, and may be a dimple shape or a rough surface shape. In the case of a concave uneven portion 11h, the uneven portion 11h may have a minute groove depth and width such that the hard body 11c does not fit into it. In the case of a convex uneven portion 11h, the uneven portion 11h may have a height that allows the hard body 11c to pass through the grinding chamber 11b. By the raw material M entering and exiting the unevenness of the uneven portion 11h, not only the friction using the rotation of the hard body 11c in the grinding chamber 11b but also more complex effects are added to the raw material M, thereby promoting secondary atomization.

[0024] As another example of the grinding chamber 11b, as shown in FIG. 5(f), the grinding chamber 11b may be spiral. This makes the movement of the spheres 11c irregular, and prevents the raw material M and the spheres 11c from staying at a specific part inside the grinding chamber 11b. By making the grinding chamber 11b spiral, the grinding chamber 11b has a twisted shape. At the twisted part, the flow rate of the raw material M tends to be lower than at other parts, and the raw material M and the spheres 11c temporarily stay there. On the other hand, other raw material M and the spheres 11c rotate in the grinding chamber 11b, and a stronger flow can be generated at the timing when the stuck raw material M and the spheres 11c are pushed out. Therefore, the raw material M that cannot be atomized and remains in the grinding chamber 11b can be reduced.

[0025] As another example of the grinding chamber 11b, as shown in FIG. 5(g), the grinding chamber 11b may be curved. This makes the movement of the spheres 11c irregular, and prevents the raw material M and the spheres 11c from staying in a specific part inside the grinding chamber 11b. By making the grinding chamber 11b curved, the grinding chamber 11b has a twisted shape. At the twisted part, the flow rate of the raw material M tends to be lower than at other parts, and the raw material M and the spheres 11c temporarily stay there. On the other hand, other raw material M and the spheres 11c rotate in the grinding chamber 11b, and a stronger flow can be generated at the timing when the stuck raw material M and the spheres 11c are pushed out. Therefore, the raw material M that cannot be atomized and remains in the grinding chamber 11b can be reduced.

[0026] The hard body 11c atomizes the particle size of the raw material M. The hard body 11c has a size that allows it to move within the grinding chamber 11b. The hard body 5c is, for example, a sphere as shown in FIG. 5(a) or a cylinder as shown in FIG. 5(c). The hard body 5c may also be a fine sphere such as a bead as shown in FIG. 4. The size of the hard body 5c is 0.1 to 20 mm, and more preferably 0.5 to 10 mm. In order to minimize the inclusion of contaminants such as coarse particles and impurities, it is desirable that the material of the hard body 11c is resin or ceramic.

[0027] The introduction path 11d introduces the raw material M sprayed from the jet nozzle 10 into the rotary nozzle 11. The introduction path 11d is formed in the main body 11a. The diameter, length, eccentricity, etc. of the introduction path 11d may be set to a specified value, or may be structured to be appropriately changeable. For example, if the diameter of the introduction path 11d is small, the raw material M introduced from the jet nozzle 10 is squeezed out, and atomization is promoted. If the length of the introduction path 11d is short, the distance of collision with the sphere 11c is short. Therefore, the pulverization energy due to collision with the sphere 11c is increased, and atomization is promoted. Also, if the distance of collision with the sphere 11c is short, the eccentricity can be adjusted to reduce damage to the sphere 11c.

[0028] Since the discharge port 11f is perpendicular to the flow path 11i, the raw material M is prevented from simply passing through, and the raw material M is discharged stably. The diameter of the flow path 11i is preferably the same as that of the discharge port 11f, but may be larger or smaller than that of the discharge port 11f. In the case where there is a possibility of contact with the raw material M at the connection portion between the flow path 11i and the grinding chamber 11b or there is a stress concentration at the connection portion, the connection portion between the flow path 11i and the grinding chamber 11b may be made into an arc shape or a notch may be formed. Similarly, at the connection portion between the flow path 11i and the discharge port 11f, the connection portion between the flow path 11i and the discharge port 11f may be made into an arc shape or a notch may be formed.

[0029] The discharge port 11f discharges the raw material M processed in the grinding chamber 11b. As shown in Figs. 2 to 4, a flow path 11i connected to the discharge port 11f is formed inside the grinding chamber 11b. The raw material M processed in the grinding chamber 11b is discharged from the discharge port 11f. The discharge amount of the processed raw material M may be adjusted by an opening / closing unit (not shown) at a time interval adjusted in advance or in real time.

[0030] When the beads 11cc shown in Fig. 4 are used, the rotary nozzle 11 may have a bead filter 11g. The bead filter 11g prevents the beads 11cc from being discharged together with the processed raw material M. The bead filter 11g is, for example, a filter with a mesh structure smaller than the particle size of the beads 11cc.

[0031] The rotary nozzle 11 has a flow rate adjusting section 12 that introduces the fluid W supplied from the flow rate adjusting source F into the pulverization chamber 11b. As with the jet nozzle 10, the flow rate adjusting section 12 is, for example, a nozzle tip or an orifice-shaped member. The flow rate adjusting section 12 is for promoting the circulatory rotation of the hard body 11c in the pulverization chamber 11b, and does not require a pulverizing force like the jet nozzle 10. The flow rate adjusting section 12 introduces the fluid W into the interior at a lower pressure than the jet nozzle 10.

[0032] The atomization device 1 may have a first flow rate adjustment unit 12A and a second flow rate adjustment unit 12B. This increases the amount of movement of the hard body 11c in the grinding chamber 11b compared to the case where the fluid W is introduced from one place. Therefore, the hard body 11c rotates more in the grinding chamber 11b, and grinding into the raw material M is promoted. In this case, the fluid W is introduced into the grinding chamber 11b from the first flow rate adjustment unit 12A through the first adjustment path 11ea, and the fluid W is introduced into the grinding chamber 11b from the second flow rate adjustment unit 12B through the second adjustment path 11eb. This can accelerate the flow rate. In addition, either the first flow rate adjustment unit 12A or the second flow rate adjustment unit 12B may be controlled to be temporarily stopped. This makes the rotation speed in the grinding chamber 11b random, and the processing method of the raw material M can be changed.

[0033] The amount of fluid W supplied from flow rate adjustment unit 12 is within a range that does not affect the processing of raw material M. Depending on the raw material M, the concentration of raw material M may be important. In that case, the concentration of raw material M may be adjusted using bead filter 11g. Specifically, a concentration sensor or the like is added to bead filter 11g, and the optimal concentration of raw material M is determined by control device 13. Then, control device 13 discharges the processed raw material M so that the concentration does not fall below the lower limit of the optimal concentration. For example, by adjusting the mesh diameter formed in the bead filter 11g, the amount of raw material M and fluid W in the grinding chamber 11b is reduced, so that the concentration of the raw material M finally discharged does not decrease. Alternatively, the mesh may be made of two or three sheets, and the overlapping of the meshes may be adjusted based on the instruction of the control device 13 to adjust the discharge amount of raw material M.

[0034] The bead filter 11g may be used to adjust not only the concentration but also the pressure. The opening and closing of the bead filter 11g is controlled by the control device 13, so that the amount of the raw material M and the fluid W in the grinding chamber 11b can be adjusted. Therefore, the addition of the fluid W can prevent a drop in pressure.

[0035] Also, by switching between opening and closing the bead filter 11g, the discharge of the raw material M from the grinding chamber 11b is stopped, and the rotary nozzle 11 may be operated in a state where the supply of the raw material M from the jet nozzle 10 is stopped. This allows only the secondary atomization in the grinding chamber 11b to be repeated.

[0036] The positions of the bead filter 11g and the flow path 11i may be adjusted. The raw material M discharged from the grinding chamber 11b is subjected to secondary atomization by the hard body 11c in the grinding chamber 11b. Here, the optimal discharge position may differ depending on the grinding chamber 11b. Therefore, by adjusting the positions of the bead filter 11g and the flow path 11i, the raw material M can be optimally atomized.

[0037] Next, the results of a verification test will be described regarding the processing performance of only the jet nozzle 10, the first injection chamber 5A shown in Fig. 2, the second injection chamber 5B shown in Fig. 3, and the third injection chamber 5C shown in Fig. 4. Performance evaluation was carried out for only the jet nozzle 10, the first injection chamber 5A, the second injection chamber 5B, and the third injection chamber 5C under the same conditions of the target of the raw material M, the supply amount, the pressure, the speed, the number of times of processing, etc.

[0038] As a result, it was found that the first injection chamber 5A, the second injection chamber 5B, and the third injection chamber 5C had higher atomization performance in the initial stage (up to 10 passes) than atomization using only the jet nozzle 10. This is thought to be because not only was there primary atomization by the jet, but secondary atomization due to collisions with the hard body 11c and the like was also included. In terms of atomization performance in the initial stage (10 passes), the first injection chamber 5A was most effective, followed by the second injection chamber 5B and the third injection chamber 5C.

[0039] FIG. 6(a) is a perspective view of the injection chamber 5. FIG. 6(b) is a side cross-sectional view of the injection chamber 5. As shown in FIG. 6(b), the grinding chamber 10b is integrally formed in the main body 11a of the rotary nozzle 11. The grinding chamber 10b may be formed by connecting the upper member 30a for the grinding chamber and the lower member 30b for the grinding chamber. The upper member 30a for the grinding chamber and the lower member 30b for the grinding chamber are paired to form the annular grinding chamber 10b. The upper member 30a for the grinding chamber and the lower member 30b for the grinding chamber each have a groove that is semicircular in a top cross-sectional view and semicircular in a side cross-sectional view. The upper member 30a for the grinding chamber and the lower member 30b for the grinding chamber are connected by a connector (not shown). The connector may be embedded in the upper member 30a for the grinding chamber and the lower member 30b for the grinding chamber themselves, or may be connected from the outside.

[0040] As shown in FIG. 7, a second jet nozzle 20 called a slit nozzle may be used as a modified example of the jet nozzle 10. The second jet nozzle 20 has a water guide nozzle 21, an upstream nozzle 22, a downstream nozzle 23, and a load receiving nozzle 24. The upstream nozzle 22 and the downstream nozzle 23 each have a groove or a through hole formed on one side or both sides. The groove extends vertically or horizontally. The through hole extends horizontally. By passing the raw material M through the groove or the through hole, the raw material M is atomized in a narrow stepped area. The second jet nozzle 20 has more collision points for the raw material M than the jet nozzle 10, so that more detailed processing such as emulsification can be achieved.

[0041] As another embodiment, the atomization device 1 may have a plurality of ejection chambers 5 in one system as shown in Fig. 8. Specifically, the atomization device 1 has a first ejection chamber 5A shown in Fig. 2, a second ejection chamber 5B shown in Fig. 3, and a third ejection chamber 5C shown in Fig. 4.

[0042] The first injection chamber 5A has a jet nozzle 10 having a jet nozzle tip 10a and a rotary nozzle 11 that places a plurality of hard bodies (spheres) 11c in a crushing chamber 11b. The second injection chamber 5B has a jet nozzle 10 having a jet nozzle tip 10a and a rotary nozzle 11 that places a plurality of hard bodies (spheres) 11cb in the crushing chamber 11b. Here, the spheres 11cb are smaller than the spheres 11c of the first injection chamber 5A. The third injection chamber 5C has a jet nozzle 10 with a jet nozzle tip 10a and a rotary nozzle 11 that places a plurality of hard bodies (beads) 11cc in the crushing chamber 11b. Here, the beads 11cc are smaller than the spheres 11cb of the second injection chamber 5B. Since the atomization device 1 has a plurality of injection chambers 5 each having a rotary nozzle 11 with a hard body 11c having different diameters and sizes, the injection chamber 5 having the optimum shape can be selected according to the raw material M.

[0043] The atomization device 1 has an inlet side on-off valve 8 and a discharge side on-off valve 9 that switch between starting and stopping the supply of raw material M to the multiple injection chambers 5. This allows optimization of switching of the processing of raw material M. The inlet side on-off valve 8 is disposed upstream of the injection chambers 5 and switches between starting and stopping the supply of raw material M upstream. The discharge side on-off valve 9 is disposed downstream of the injection chambers 5 and switches between starting and stopping the supply of raw material M downstream.

[0044] As shown in FIG. 8, the atomization device 1 may have a first flow path L1, a second flow path L2, a third flow path L3, and a circulation flow path L4. The first flow path L1 passes through the first ejection chamber 5A. The second flow path L2 passes through the second ejection chamber 5B. The third flow path L3 passes through the third ejection chamber 5C. The circulation flow path L4 circulates at least one of the first to third flow paths L1 to L3. Thereby, when performing multiple atomization processes, atomization can be promoted by circulating the raw material M.

[0045] In another embodiment, the atomization device 1 may have a plurality of (for example, three) identical injection chambers 5. Even if one chamber breaks down during operation, the other chambers remain in operation, and there is no need to stop the processing operation.

[0046] The atomization device 1 may have a control device 13 that controls the operation of the atomization device 1. The control device 13 controls the supply amount of the raw material M from the raw material tank 2, the rotation speed of the feed pump P and the supply amount of the raw material M, the number of reciprocating movements and the pressurizing pressure of the booster 3, the supply amount, pressure and speed of the fluid W from the flow rate adjustment source F, the opening and closing of the inlet side opening and closing valve 8 and the outlet side opening and closing valve 9, etc.

[0047] The atomization process procedure in the atomization device 1 of this embodiment will be described below. First, the raw material M to be treated is charged into the raw material tank 2 and adjusted to a slurry state. Next, the raw material M in the raw material tank 2 is supplied to the pressure intensifier 3 by the liquid supply pump P. The supplied raw material M is pressurized by the pressure intensifier 3. The pressurized raw material M passes through a high-pressure filter 4, and is then supplied to the injection chamber 5 and injected. This process may be repeated multiple times.

[0048] Here, the procedure of the atomization process in the ejection chamber 5 will be described in detail. First, the raw material M is collided from the jet nozzle 10 toward the spheres 11c arranged in the pulverization chamber 11b. This causes the particles to disperse and at the same time creates a fluid flow in the pulverization chamber 11b. Since multiple spheres 11c are arranged in the pulverization chamber 11b, the raw material M is further pulverized by the multiple spheres 11c and the inner wall of the pulverization chamber 11b.

[0049] If the flow of the raw material M and the spheres 11c is not sufficient, the flow of the fluid can be optimized by supplying the fluid W from the flow rate adjustment source F through the flow rate adjustment unit 12 into the grinding chamber 11b.

[0050] Also, like first to third ejection chambers 5A to 5C shown in FIG. 8, multiple flow paths may be used to accommodate complex processing.

[0051] As described above, the present invention is not limited to the above-described embodiment, and it goes without saying that the present invention can be modified appropriately without departing from the spirit and scope of the present invention. [Explanation of symbols]

[0052] 1 Atomization device 2 Raw material tank 3. Booster 4 High Pressure Filter 5. Injection chamber 6 Heat exchanger 7 Outlet 8. Inlet side opening and closing valve 9. Discharge side opening and closing valve 10 Jet Nozzle 11 Rotating nozzle 12 Flow rate adjustment section 13 Control device 20 Second jet nozzle 21 Water nozzle 22 Upstream nozzle 23 Downstream nozzle 24 Load-receiving nozzle P Liquid supply pump F flow rate adjustment source L1 First channel L2 Second flow path L3 Third flow path L4 Circulation flow path M Raw material

Claims

1. A feed pump for supplying raw material; a pressure booster that pressurizes the raw material supplied from the liquid supply pump; a high-pressure filter for filtering the pressurized raw material; an injection chamber for injecting the filtered material, A jet nozzle for spraying the raw material; A rotary nozzle connected to the jet nozzle, the rotary nozzle having a grinding chamber having a plurality of hard bodies therein against which the raw material jetted from the jet nozzle is collided; an ejection chamber having An atomization device having the above structure.

2. The flow rate adjusting unit further includes a flow rate adjusting unit that introduces the fluid supplied from the flow rate adjusting source into the grinding chamber. The atomization device according to claim 1 .

3. The grinding chamber has a circular cross section.

3. The atomization device according to claim 1 or 2.

4. The hard body is a sphere or a cylinder.

3. The atomization device according to claim 1 or 2.

5. The grinding chamber has an inner surface having an uneven portion.

3. The atomization device according to claim 1 or 2.

6. The rotary nozzle is connected to an outlet for discharging the raw material after processing, a filter disposed between the rotary nozzle and the outlet; 3. The atomization device according to claim 1 or 2.

7. The grinding chamber is composed of an upper member for the grinding chamber and a lower member for the grinding chamber.

3. The atomization device according to claim 1 or 2.

8. The ejection chamber includes a first ejection chamber and a second ejection chamber, the first injection chamber and the second injection chamber each have an inlet side on-off valve and a discharge side on-off valve for switching between supply and stop of the raw material; 3. The atomization device according to claim 1 or 2.

9. a first flow path through the first ejection chamber; a second flow path through the second ejection chamber; and a circulation flow path that circulates at least one of the first flow path or the second flow path; The atomization device of claim 8 further comprising:

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