Functional substrate manufacturing method and functional substrate manufacturing system

JP2024175530AInactive Publication Date: 2024-12-18FUJIFILM CORP
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Patent Information

Application Number
JP2023093382
Authority / Receiving Office
JP · JP
Patent Type
Applications
Current Assignee / Owner
Filing Date
2023-06-06
Publication Date
2024-12-18
Estimated Expiration
Not applicable · inactive patent

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Abstract

To provide a functional substrate manufacturing method and a functional substrate manufacturing system that compatibly remove a film of functional liquid with efficiency and reduce damage to a substrate where the film of functional liquid is formed.SOLUTION: A functional substrate manufacturing method comprises: printing a pattern of functional liquid on a substrate (S14); vaporizing a solvent of functional liquid to form an unfinished film of functional liquid (S16); and irradiating the unfinished film with laser light to remove a part of the unfinished film (S18).SELECTED DRAWING: Figure 1
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