Method and apparatus for valve assembly
The UV-activated valve assembly addresses thermal ALD limitations by enhancing chemical reactivity and wafer surface sites, improving film properties through UV light activation in semiconductor manufacturing.
Patent Information
- Application Number
- JP2024102995
- Authority / Receiving Office
- JP · JP
- Patent Type
- Applications
- Current Assignee / Owner
- Priority Date
- 2023-06-29
- Filing Date
- 2024-06-26
- Publication Date
- 2025-01-20
AI Technical Summary
Thermal ALD reactions face limitations in activating chemicals and generating OH radicals to enhance wafer surface sites, necessitating alternative methods to increase chemical reactivity.
A valve assembly that utilizes UV light to activate chemicals by emitting light through transparent connectors and manifolds, enhancing chemical reactivity and generating reactive radicals before introduction into the reaction chamber.
The UV-activated chemicals improve film properties on wafers by increasing reactivity and active surface sites, thereby optimizing semiconductor manufacturing processes.
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Figure 2025009972000001_ABST
Abstract
Description
[Technical field]
[0001] The present disclosure relates generally to methods and apparatus for valve assemblies and, more particularly, to valve assemblies used in semiconductor manufacturing tools. [Background technology]
[0002] The valve assembly may be used to pulse chemicals and / or inert gases into the reaction chamber. The valve assembly may also be configured to mix multiple chemicals before flowing the chemicals into the reaction chamber. Some thermal ALD (atomic layer deposition) reactions may be limited or difficult to achieve by thermal means alone. Therefore, it may be desirable to activate the chemical molecules to increase the reactivity of the chemicals before flowing them into the reaction chamber. It may also be desirable to generate OH radicals to enhance active surface sites on the wafer. Summary of the Invention
[0003] Various embodiments of the present technology may provide a valve assembly that activates a chemical using UV light. The valve assembly includes a primary valve manifold connected to a secondary valve manifold. A transparent connector may be disposed between the primary valve manifold and the secondary valve manifold. The UV light may be disposed adjacent to the transparent connector.
[0004] According to one aspect, an apparatus includes a primary valve manifold including a main channel, a first subchannel having a first end and a second end connected to the main channel at a connection point, and a second subchannel having a third end and a fourth end connected to the main channel and the first subchannel at a connection point, a first connector connected to the valve manifold and including a first gas channel, the first connector being formed from a transparent material, a first ultraviolet (UV) light source adjacent to the first connector, and a first secondary manifold including a first plurality of inlets connected to the first connector and connected to the second gas channel.
[0005] In one embodiment of the above apparatus, the first gas channel is connected to a second end of the first subchannel.
[0006] In one embodiment of the above device, the first gas channel is connected to the second gas channel.
[0007] In one embodiment, the above apparatus further comprises a second connector connected to the primary valve manifold and comprising a third gas channel, the second connector being formed from a transparent material.
[0008] In one embodiment, the apparatus further comprises a second secondary manifold connected to the second connector and comprising a fourth gas channel connected thereto and a second plurality of inlets connected to the fourth gas channel.
[0009] In one embodiment of the above apparatus, one inlet from the first plurality of inlets is configured to connect to a first source vessel containing a first chemical and one inlet from the second plurality of inlets is configured to connect to a second source vessel containing a second chemical, the first chemical being different from the second chemical.
[0010] In one embodiment, the apparatus further comprises a second UV light source adjacent to the second connector.
[0011] In one embodiment of the above apparatus, the second UV light source is positioned to emit UV light into the third gas channel.
[0012] In one embodiment of the above apparatus, the first UV light source is positioned to emit UV light into the first gas channel.
[0013] In one embodiment of the above device, the transparent material is one of quartz or sapphire.
[0014] 16. An apparatus comprising: a main channel; a first subchannel having a first end and a second end connected to the main channel at a connection point; a second subchannel having a third end and a fourth end connected to the main channel and the first subchannel at the connection point; a shield formed from a transparent material and positioned adjacent the connection point; a light source adjacent the transparent shield and positioned to emit light into the connection point; a first connector connected to a valve manifold and having a first plurality of inlets connected to the first subchannel via a first gas channel; and a first secondary manifold connected to the primary valve manifold and having a second plurality of inlets connected to the second subchannel via a second gas channel.
[0015] In one embodiment, the apparatus further comprises a third gas channel connected to the main channel at a connection point and adjacent to the transparent shield.
[0016] In one embodiment of the above device, the transparent material is one of quartz or sapphire.
[0017] In one embodiment of the above apparatus, the light source includes an infrared light source.
[0018] In one embodiment of the above apparatus, the light source includes an ultraviolet light source.
[0019] 1. An apparatus comprising: a valve manifold comprising a first gas channel, the first gas channel comprising: a main channel, a first subchannel having a first end and a second end connected to the main channel at a connection point, and a second subchannel having a third end and a fourth end connected to the main channel and the first subchannel at a connection point; a first multiport valve coupled to the second end of the first subchannel; a first cell having an interior volume and a sidewall formed from a transparent material, the first cell comprising a first inlet and a first outlet coupled to the first multiport valve; and a first ultraviolet light source adjacent to the first cell.
[0020] In one embodiment of the above device, the transparent material is one of quartz or sapphire.
[0021] In one embodiment, the apparatus further comprises a second multiport valve coupled to a fourth end of the second subchannel, a second inlet formed from a transparent material, a second outlet coupled to the second multiport valve, and a second ultraviolet light source adjacent to the second cell.
[0022] In one embodiment of the above apparatus, one port from the first multiport valve is connected to an inert gas source and one port from the second multiport valve is connected to an inert gas source.
[0023] In one embodiment, the apparatus further comprises a first container coupled to the first cell, the first container configured to contain a first chemical, and a second container coupled to the second cell, the second container configured to contain a second chemical, different from the first chemical.
[0024] A more complete understanding of the present technology may be obtained by reference to the detailed description when considered in conjunction with the following illustrative drawings, in which like reference numbers refer to like elements and steps throughout. [Brief description of the drawings]
[0025] [Figure 1] FIG. 1 is a block diagram in accordance with various embodiments of the present technology. [Diagram 2] FIG. 2 representatively illustrates a cross-sectional view of a valve assembly in accordance with various embodiments of the present technology. [Diagram 3] FIG. 3 representatively illustrates a cross-sectional view of a valve assembly in accordance with an alternative embodiment of the present technology. [Figure 4] FIG. 4 representatively illustrates a cross-sectional view of a showerhead assembly in accordance with an embodiment of the present technique. DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS
[0026] The present technology may be described in terms of functional block components and various process steps. Such functional blocks may be realized by any number of components configured to perform the specified functions and achieve various results. For example, the present technology may employ various reaction chambers, susceptors, valves, vessels, precursors, showerhead plates, and delivery lines.
[0027] 1, an exemplary system 100 may include a reactor 105 and a valve assembly 115. The reactor 105 may be configured to process a substrate (e.g., a wafer 125). For example, the reactor 105 may be configured to deposit a film on the wafer, perform etching, etc. The reactor 105 may include a showerhead assembly 130 and a reaction chamber 110. The showerhead assembly 130 may be disposed above the reaction chamber 130 and above the wafer 125.
[0028] The system 100 may further include a first container 135 configured to contain or hold a first chemical (e.g., a precursor or a reactant) used in the semiconductor manufacturing process. The first chemical in the first container 135 may initially be in a solid, liquid, or gas phase. In the case of a solid or liquid chemical, the solid or liquid phase may be converted to a gas phase. For example, the first container 135 may include various devices and / or systems for converting the solid or liquid to a gas. The conversion to the gas phase may occur within the first container 135.
[0029] The system 100 may further include a second container 155 configured to contain or hold a second chemical (e.g., a precursor or a reactant) used in the semiconductor manufacturing process. The second chemical may be different from the first chemical. The second chemical in the second container 155 may initially be in a solid, liquid, or gas phase. In the case of a solid or liquid chemical, the solid or liquid phase may be converted to a gas phase. For example, the second container 155 may include various devices and / or systems for converting the solid or liquid to a gas. The conversion to the gas phase may occur within the second container 155.
[0030] The system 100 may further include a third vessel 140 configured to contain or hold an inert gas.
[0031] Additionally, the system 100 may further include a first gas line 145 for transporting gas from the first vessel 135 through the valve assembly 115 to the reactor 105. For example, the gas line 145 may be coupled at a first end to the first vessel 135 and at a second end to the valve assembly 115.
[0032] In addition, the system 100 may further include a second gas line 150 for transporting gas from a second vessel 155 through the valve assembly 115 to the reactor 105. For example, the gas line 150 may be coupled at a first end to the second vessel 155 and at a second end to the valve assembly 115.
[0033] In addition, system 100 may further include a third gas line 160 for transporting gas from third vessel 140 through valve assembly 115 to reactor 105. For example, third gas line 160 may be coupled at a first end to third vessel 140 and at a second end to valve assembly 115.
[0034] In various embodiments, the system 100 may further include a susceptor 120 disposed within the reaction chamber 110 and configured to support a wafer 125. In some embodiments, the susceptor 120 may be configured to move up and down within the reaction chamber 110. In other embodiments, the susceptor 120 may remain stationary.
[0035] In various embodiments, the valve assembly 115 may be configured to mix multiple gas sources prior to flowing into the reactor 105. For example, the valve assembly 115 may have multiple inlets. The valve assembly 115 may be directly coupled to the reactor 105 or may be coupled to first and second gas lines 145, 150 and may be configured to receive gases from first and second vessels 135, 140.
[0036] In various embodiments, referring to FIG. 2, the valve assembly 115 may include a primary valve manifold 280 that includes a plurality of gas channels. For example, the valve assembly 115 may include a main channel 245, a first subchannel 250, and a second subchannel 255. In various embodiments, the main channel 245 and the first subchannel 250 may be connected to each other at a connection point 285. In addition, the second subchannel 255 may be connected to the main channel 245 at the connection point 285. Thus, the main channel 245, the first subchannel 250, and the second subchannel may be fluidly connected to each other via the connection point 285. The main channel 245 may be fluidly connected to the showerhead assembly 130. The primary valve manifold 280 may be formed from a metallic material such as aluminum, stainless steel, nickel-based alloys such as Hastelloy C22, Inconel, and the like.
[0037] In an exemplary embodiment, the valve assembly 115 may further comprise a first connector 205 comprising a first gas channel 265 extending therethrough. The first connector 205 may be formed from a transparent material such as quartz, sapphire, or the like. Thus, the entire first connector 205 may be completely transparent, thus allowing visibility through an outer wall of the first connector 205 and into the third gas channel 270. The first connector 205 may be connected to a primary valve manifold 280, and the first gas channel 265 may be fluidly connected to the first sub-channel 250.
[0038] The valve assembly may further include a first secondary manifold 215 comprising a second gas channel 260 and a first plurality of inlets connected to the second gas channel 260. The first secondary manifold 215 may be formed from a metallic material such as aluminum, stainless steel, nickel-based alloys such as Hastelloy C22, Inconel, and the like. In various embodiments, a first inlet from the first plurality of inlets may be configured to receive a first chemical (Chemical 1) and a second inlet from the first plurality of inlets may be configured to receive an inert gas. The first secondary manifold 215 may be connected to the first connector 205 and the second gas channel 260 may be fluidly connected to the first gas channel 265.
[0039] The valve assembly 115 may further include a second connector 210 that includes a third gas channel 270 extending therethrough. The second connector 210 may be formed from a transparent material, such as quartz, sapphire, or the like. Thus, the entire second connector 210 may be completely transparent, thus allowing visibility into the outer wall of the second connector 210, and into the third gas channel 270. The second connector 210 may be connected to a primary valve manifold 280, and the third gas channel 270 may be fluidly connected to the second sub-channel 255.
[0040] The valve assembly 115 may further include a second secondary manifold 220 including a fourth gas channel 275 and a second plurality of inlets connected to the fourth gas channel 275. The second secondary manifold 220 may be formed from a metallic material such as aluminum, stainless steel, nickel-based alloys such as Hastelloy C22, Inconel, and the like. In various embodiments, a first inlet from the second plurality of inlets may be configured to receive a second chemical (chemical 2), the second chemical being different from the first chemical. A second inlet from the second plurality of inlets may be configured to receive an inert gas. The second secondary manifold 220 may be connected to the second connector 210, and the fourth gas channel 275 may be fluidly connected to the third gas channel 270.
[0041] In an exemplary embodiment, referring to FIG. 3, the valve assembly 115 may comprise a first cell 300 and a second cell 305, each having an interior volume defined by a sidewall of a respective vessel and configured to contain a gas. The first cell 300 may be connected to the primary valve manifold 280 via a first valve 310. For example, the first cell 300 may comprise an outlet connected to the first valve 310, which may be connected to the first subchannel 250. The first valve 310 may comprise a diaphragm valve or any other suitable valve. The first cell 300 may comprise multiple inlets, one inlet configured to receive the first chemical and another inlet configured to receive the inert gas. The first cell 300, particularly the sidewall, may be formed from a transparent material, such as quartz, sapphire, etc. Thus, the first cell 300 may be transparent, thus allowing visibility through the sidewall and into the interior volume.
[0042] Similarly, the second cell 305 may be connected to the primary valve manifold 280 via a second valve 315. For example, the second cell 305 may include an outlet connected to the second valve 315, which may be connected to the second sub-channel 255. The second valve 315 may include a diaphragm valve or any other suitable valve. The second cell 305 may include multiple inlets, one inlet configured to receive the second chemical and another inlet configured to receive the inert gas. The second cell 305, particularly the sidewall, may be formed from a transparent material, such as quartz, sapphire, etc. Thus, the second cell 305 may be transparent, thus allowing visibility through the sidewall and into the interior volume.
[0043] In various embodiments, the first and second valves 310, 315 may be responsive to and operated by a controller (not shown), processor, or other suitable control system. Thus, the controller may be configured to generate and send control signals to the valves 310, 315 to open and close the valves.
[0044] 2 and 3, primary valve manifold 280 may further include a shield 235 disposed immediately adjacent connection point 285. For example, shield 235 may form a boundary of connection point 285. In an exemplary embodiment, shield 235 may be disposed on or within a top surface of primary valve manifold 280. For example, shield 235 may be embedded within primary valve manifold 280. Shield 235 may be formed from a transparent material, such as quartz, sapphire, or the like.
[0045] In various embodiments, referring to FIG. 2 and FIG. 3, the primary valve manifold 280 may further comprise a fifth gas channel 200 and a sixth gas channel 202 configured to receive an inert gas, such as argon, nitrogen, or other inert noble gas, and flow the inert gas into the primary valve manifold 280. The fifth gas channel 200 and the sixth gas channel 202 may be fluidly connected to a connection point 285 and therefore to the main channel 245. The fifth gas channel 200 and the sixth gas channel 202 may be disposed directly adjacent to the shield 235 such that the inert gas flows across the bottom surface of the shield 235. The amount and pressure of gas flowing through the fifth channel 200 and the sixth channel 202 may be selected to create a gas curtain on the bottom surface of the shield 235 to prevent chemicals from depositing on the bottom surface of the shield 235. In an exemplary embodiment, at least one section of the fifth gas channel 200 is disposed horizontally and parallel to the bottom surface of the shield 235. For example, an inlet to the fifth gas channel 200 may be disposed on a top surface of the primary valve manifold 280 such that the fifth gas channel 200 is L-shaped, and an inlet to the sixth gas channel 202 may be disposed on a top surface of the primary valve manifold 280 such that the sixth gas channel is L-shaped. In another embodiment, the fifth gas channel and the sixth gas channel may extend radially outward from the connection point 285. Thus, an inlet to the fifth gas channel 200 may be disposed along a first sidewall of the primary valve manifold 280, and an inlet to the sixth gas channel 202 may be disposed along an opposing second sidewall of the primary valve manifold 280. It will be appreciated that the primary valve manifold 280 may include additional gas channels that are coplanar with the fifth and sixth gas channels and extend radially outward relative to the sidewall.
[0046] In various embodiments, the valve assembly 115 may further comprise a light source configured to emit ultraviolet (UV) light or infrared (IR) light. Thus, the light source may include a UV light source or an IR light source. For example, the valve assembly 115 may comprise a first light source 225 and a second light source 230. In one embodiment, referring to FIG. 2, the first light source 225 may be disposed adjacent to the first connector 205 and positioned to emit light into the first gas channel 265. Similarly, the second light source 230 may be disposed adjacent to the second connector 210 and positioned to emit light into the third gas channel 270.
[0047] In an alternative embodiment, and referring to FIG. 3, the first light source 225 may be disposed adjacent to the first cell 300 and positioned to emit light into the first cell 300 .
[0048] Similarly, the second light source 230 may be disposed adjacent to the second cell 305 and positioned to emit light into the second cell 305 .
[0049] In various embodiments, the valve assembly 115 may further include a third light source 240 disposed adjacent the shield 235 and positioned to emit light into the connection point 285 .
[0050] In various embodiments, each light source 225, 230, 240 may be coupled to and controlled accordingly by a controller (not shown), processor, or any other suitable control system. The controller may operate (e.g., turn on and off) the light sources. For example, in some operations, one light source may be on and the other off. In addition, the controller may be configured to pulse the light sources from off to on and back off according to a desired pulsing scheme.
[0051] 4, the showerhead assembly 130 may include a lid 400 and a showerhead plate 405. The showerhead assembly 130 may further include a plenum volume 410 defined by the lid 400 and the showerhead plate 405. The lid 400 may include a main inlet configured to allow gas from the valve assembly 115 to enter the plenum volume 410.
[0052] The showerhead plate 405 may be positioned directly above the susceptor 120 or wafer 125 (FIG. 1) and may be configured to allow gases to pass therethrough and into the reaction chamber 110. For example, the showerhead plate 405 may include a number of through-holes extending from a first surface (e.g., a top surface) of the showerhead plate 405 to an opposing second surface (e.g., a bottom surface) of the showerhead plate 405. Each through-hole may be configured to allow gases to flow through the showerhead plate 405, i.e., from the top surface to the bottom surface.
[0053] In an exemplary embodiment, the lid 400 may be configured to provide UV and / or IR light into the plenum volume 410. For example, the lid 400 may include a number of windows 420 embedded within the lid 400. The windows 420 may be formed from a transparent material, such as quartz, sapphire, or the like.
[0054] The showerhead assembly 130 may further include a number of light sources 415. The light sources 415 may be disposed along an exterior surface of the lid 400 opposite the plenum volume 410. In some embodiments, the light sources 415 may be bonded to the exterior surface of the lid 400. Alternatively, the light sources 415 may be near the exterior surface of the lid 400. In some embodiments, each light source 415 may be aligned with a respective window 420 such that light from the light sources 415 is emitted through the window 420 into the plenum volume 410.
[0055] In some embodiments, the lid 400 may further comprise a number of channels 425 extending through the lid 400 and in fluid communication with the plenum volume 410. The channels 425 may be connected to a gas source (such as the third vessel 140), which delivers an inert gas, such as argon, through the channels 425 and into the plenum volume 410. In an exemplary embodiment, the gas channels 425 may be disposed adjacent to each window 420.
[0056] In operation, referring to FIG. 1 and FIG. 2, a first chemical from the first container 135 may flow into the valve assembly 115 via the first secondary manifold 215 and the first connector 205. As the first chemical flows through the first gas channel 265 of the first connector 205, the first light source 225 may be turned on to emit light into the first gas channel 265 and thus the flowing first chemical. The light from the first light source 225 may activate the first chemical. In particular, the light may induce chemical reactions such as photodissociation, photolysis, photodecomposition, etc., where the molecules of the compound interact with photons to generate highly reactive radicals / molecules and / or simpler molecules / fragments that are highly reactive. Activating the molecules in the chemical prior to flowing the chemical into the reaction chamber 110 may enhance the reactivity of the chemical and / or enhance the active surface sites on the wafer 125, thus providing improved film properties on the wafer 125.
[0057] Similarly, at the same time as the first chemical flows, or at a different time, a second chemical from the second container 155 may flow into the valve assembly 115 via the second connector 210 and the second secondary manifold 220. As the second chemical flows through the third gas channel 270 of the second connector 210, the second light source 230 may be turned on to emit light into the third gas channel 270 and thus the flowing second chemical. The light from the second light source 230 may activate the second chemical in the same manner as described above. The activated chemical may then flow through the main channel 245 into the showerhead assembly 130. Activating the molecules in the chemical prior to flowing the chemical into the reaction chamber 110 may enhance the reactivity of the chemical and / or enhance the active surface sites on the wafer 125 and therefore provide improved film properties on the wafer 125.
[0058] Alternatively, the first and second chemicals may flow simultaneously, thus mixing at junction 285. Once both chemicals are flowing together, the third light source 240 may be turned on to emit light through the shield 235 into the gas channel and junction 285, thus illuminating the flowing chemicals. In this case, the first light 225 and the second light 230 may be off while the first and second chemicals are flowing. The activated chemical may then flow through the main channel 245 into the showerhead assembly 130.
[0059] Alternatively, the first and second chemicals may be activated by multiple light sources. For example, the first light 225 and the second light 230 may be on as the first and second chemicals flow, activating each chemical as they pass through the first connector 205 and the second connector 210, respectively. In addition, the third light 240 may also be on to activate the combination of chemicals. The activated chemicals may then flow through the main channel 245 into the showerhead assembly 130.
[0060] In yet another operation, referring to FIG. 3, a first chemical may be flowed into the first cell 300 and contained within the first cell 300. An inert gas may also flow into the first cell 300 at the same time as the first chemical or at a different time. Once the first cell 300 is filled with the first chemical (gas) to a desired pressure or volume, the first light source 225 may be turned on. Alternatively, the first light source 225 may be on while the first cell 300 is being filled with the chemical. The light from the first light source 225 may activate the first chemical. In particular, the light may induce chemical reactions such as photodissociation, photolysis, photodecomposition, etc., where the molecules of the compound interact with the photons to generate highly reactive radicals / molecules and / or highly reactive simpler molecules / fragments. Activating molecules in the chemical prior to flowing the chemical into the reaction chamber 110 may enhance the reactivity of the chemical and / or enhance the active surface sites on the wafer 125, and therefore provide improved film properties on the wafer 125. Once the chemical is activated, the first valve 310 may be opened to allow the chemical to flow through the first subchannel 250 into the primary valve manifold 280. For example, a controller (not shown) may send a signal or otherwise operate the first valve 310 to open it. Once the chemical reaches the connection point 285, it may be further activated and / or combined with a second chemical. For example, the third light source 240 may be turned on.
[0061] Similarly, a second chemical may be flowed into the second cell 305 and contained within the second cell 305. An inert gas may also flow into the second cell 305 at the same time or at a different time as the first chemical. Once the second cell 305 is filled with the second chemical (gas) to a desired pressure or volume, the second light source 230 may be turned on. Alternatively, the second light source 230 may be on while the second cell 305 is being filled with the chemical. The light from the second light source 230 may activate the second chemical. In particular, the light may induce chemical reactions such as photodissociation, photolysis, photodecomposition, etc., where the molecules of the compound interact with photons to generate highly reactive radicals / molecules and / or simpler molecules / fragments that are highly reactive. Activating the molecules in the chemical prior to flowing the chemical into the reaction chamber 110 may enhance the reactivity of the chemical and / or enhance the active surface sites on the wafer 125, thus providing improved film properties on the wafer 125. Once the chemical is activated, the second valve 315 may be opened to allow the chemical to flow through the first sub-channel 250 into the primary valve manifold 280. For example, a controller (not shown) may send a signal or otherwise operate the second valve 315 to open it. Once the chemical reaches the connection point 285, it may be further activated and / or combined with the first chemical. For example, the third light source 240 may be turned on.
[0062] In yet another operation, referring to FIG. 4, as chemicals flow from the valve assembly 115 into the plenum volume 410, the light source 415 may be turned on. The light from the light source 415 may pass through the respective windows 420 and into the plenum volume 410 to activate the chemicals in the plenum volume. Activating the molecules in the chemicals may enhance the reactivity of the chemicals and / or enhance the active surface sites on the wafer 125, thus providing improved film properties on the wafer 125. At the same time, gas may flow through the channel 425. The amount and pressure of the gas flowing through the channel 425 may be selected to create a gas curtain over the window 420 to prevent the chemicals from depositing on the window 420.
[0063] In the foregoing description, the technology has been described with reference to certain exemplary embodiments. The specific implementations shown and described are illustrative of the technology and its best modes, and are not intended to otherwise limit the scope of the technology in any manner. Indeed, for the sake of brevity, conventional manufacturing, connection, preparation, and other functional aspects of the methods and systems may not be described in detail. Furthermore, the connecting lines shown in the various figures are intended to represent exemplary functional relationships and / or steps between the various elements. Many alternative or additional functional relationships or physical connections may exist in an actual system.
[0064] The present technology has been described with reference to certain exemplary embodiments. However, various modifications and changes may be made without departing from the scope of the present technology. The description and drawings are to be regarded in an illustrative manner, not restrictive, and all such modifications are intended to be included within the scope of the present technology. Thus, the scope of the technology should be determined by the general embodiments described, and their legal equivalents, and not merely by the specific examples described above. For example, the steps recited in any method or process embodiment may be performed in any order, unless expressly specified otherwise, and are not limited to the explicit order presented in the specific examples. Furthermore, the components and / or elements recited in any apparatus embodiment may be assembled in various permutations or configured to operate in other ways to produce substantially the same results as the present technology, and therefore are not limited to the specific configurations recited in the specific examples.
[0065] Benefits, other advantages, and solutions to problems have been described above with regard to specific embodiments. Any element that may cause or make more pronounced any benefit, advantage, solution to a problem, or any element that may cause any particular benefit, advantage, or solution, is not, however, construed as a critical, required, or essential feature or component.
[0066] The terms "comprises," "comprising," or any other variation thereof, are intended to refer to an open-ended inclusion, such that a process, method, article, component, or apparatus comprising a list of elements may include not only those elements listed, but also other elements not expressly listed or inherent to such process, method, article, component, or apparatus. In addition to those not specifically listed, other combinations and / or modifications of the above-described structure, arrangement, application, proportions, elements, materials, or components used in the practice of the technology may be changed or otherwise specifically adapted to particular environments, manufacturing specifications, design parameters, or other operating requirements without departing from the general principles thereof.
[0067] The present technology has been described above with reference to exemplary embodiments. However, changes and modifications may be made to the exemplary embodiments without departing from the scope of the technology. These and other changes or modifications are intended to be included within the scope of the technology, as expressed in the following claims. [Explanation of symbols]
[0068] 100 Systems 105 Reactor 110 Reaction chamber 115 Valve Assembly 120 Susceptor 125 wafers 130 shower head assembly 135 First Container 140 Third Container 145 First Gas Line 150 Second Gas Line 155 Second Container 160 Third Gas Line 200 Fifth Gas Channel 202 Sixth Gas Channel 205 First Connector 210 Second Connector 215 First Secondary Manifold 220 Secondary Manifold 225 First Light Source 225 Light source 230 Second Light Source 235 Shield 240 The Third Light Source 245 Main Channel 250 First Subchannel 255 Second Subchannel 260 Second Gas Channel 265 First Gas Channel 270 Third Gas Channel 275 Fourth Gas Channel 280 Primary valve manifold 285 Connection Points 300 First Cell 305 Second Cell 310 First Valve 315 Second Valve 400 lids 405 shower head plate 410 Plenum Space 415 Light source 420 Window 425 Gas Channel
Claims
1. 1. A primary valve manifold comprising: The main channel; a first subchannel including a first end connected to the main channel at a connection point, and a second end; a second subchannel having a third end connected to the main channel and the first subchannel at the connection point, and a fourth end; a first connector connected to the valve manifold and including a first gas channel, the first connector being formed from a transparent material; a first ultraviolet (UV) light source adjacent to the first connector; a first secondary manifold connected to the first connector and comprising a first plurality of inlets connected to second gas channels.
2. The apparatus of claim 1 , wherein the first gas channel is connected to the second end of the first subchannel.
3. The apparatus of claim 2 , wherein the first gas channel is connected to the second gas channel.
4. 10. The apparatus of claim 1, further comprising a second connector connected to the primary valve manifold and comprising a third gas channel, the second connector being formed from a transparent material.
5. 5. The apparatus of claim 4, further comprising a second secondary manifold connected to and including a fourth gas channel connected to the second connector and a second plurality of inlets connected to the fourth gas channel.
6. 6. The apparatus of claim 5, wherein an inlet from the first plurality of inlets is configured to connect to a first source vessel containing a first chemical and an inlet from the second plurality of inlets is configured to connect to a second source vessel containing a second chemical, the first chemical being different from the second chemical.
7. The apparatus of claim 4 , further comprising a second UV light source adjacent to the second connector.
8. The apparatus of claim 7 , wherein the second UV light source is positioned to emit UV light into the third gas channel.
9. The apparatus of claim 1 , wherein the first UV light source is positioned to emit UV light into the first gas channel.
10. The apparatus of claim 1 , wherein the transparent material is one of quartz or sapphire.
11. 1. A primary valve manifold comprising: The main channel; a first subchannel including a first end connected to the main channel at a connection point, and a second end; a second subchannel having a third end connected to the main channel and the first subchannel at the connection point, and a fourth end; a shield formed from a transparent material and disposed adjacent the connection point; a light source positioned adjacent the transparent shield to emit light into the connection point; a first connector connected to the valve manifold and including a first plurality of inlets connected to the first subchannels via a first gas channel; a first secondary manifold connected to the primary valve manifold and comprising a second plurality of inlets connected to the second sub-channels via second gas channels.
12. 12. The apparatus of claim 11, further comprising a third gas channel connected to the main channel at the connection point and adjacent to the transparent shield.
13. The apparatus of claim 11 , wherein the transparent material is one of quartz or sapphire.
14. The apparatus of claim 11 , wherein the light source comprises an infrared light source.
15. The apparatus of claim 11 , wherein the light source comprises an ultraviolet light source.
16. 1. A valve manifold comprising a first gas channel, the first gas channel comprising: The main channel; a first subchannel including a first end connected to the main channel at a connection point, and a second end; a second sub-channel, a third end connected to the main channel and the first sub-channel at the connection point; a second subchannel having a fourth end; and a valve manifold comprising: a first multiport valve coupled to the second end of the first subchannel; and A first cell having an interior volume and a sidewall formed from a transparent material, The first entrance and a first cell having a first outlet coupled to the first multiport valve; a first ultraviolet light source adjacent to the first cell.
17. 17. The apparatus of claim 16, wherein the transparent material is one of quartz or sapphire.
18. a second multiport valve coupled to the fourth end of the second subchannel; and A second cell formed from the transparent material, The second entrance, a second cell comprising a second outlet coupled to the second multiport valve; and a second ultraviolet light source adjacent to the second cell.
19. 20. The apparatus of claim 18, wherein one port from the first multiport valve is connected to an inert gas source and one port from the second multiport valve is connected to the inert gas source.
20. a first container coupled to the first cell, the first container configured to contain a first chemical; 17. The apparatus of claim 16, comprising: a second container coupled to the second cell, the second cell configured to contain a second chemical different from the first chemical.