Monitoring method of colloid in development liquid, lithography device, and, Anti-fouling composition

Abstract

SOLUTION: An embodiment of the present invention provides a monitoring method of colloid in a developer that sends a warning message to change a developer based on a change in the zeta potential distribution and a change in the particle size distribution of the colloid in the developer, and the warning message stops the development process and provides a method for monitoring colloids in the developer that can be used as a reference index to determine whether or not to perform cleaning and changing the developer. Embodiments of the present invention provide an antifouling composition that can extend the working time of the developer by suppressing colloidal aggregation and increasing size in the developer.EFFECT: By using a monitoring method of colloids in the developing solution of the present invention and the anti-fouling composition in the developing process, not only can the effective use of the developing solution be achieved, but also the minimization of stoppage frequency, reduction of cleaning frequency, decrease in the use of chemicals, and most importantly, the conservation of water for the developing process and reduction of carbon emissions can be realized.SELECTED DRAWING: None

Description

[Technical field]

[0001] The present invention relates to a method for monitoring a development process, in particular to a method for monitoring colloids in a developer solution, and to an anti-soiling composition for the development process. [Background technology]

[0002] Resist materials are commonly used as masks in lithography processes and find application in the manufacture of printed wiring boards, display panels and integrated circuit substrates. Resist materials are generally composed of photosensitive resin compositions and are classified into negative resists, in which the unexposed portions are dissolved and removed, and positive resists, in which the exposed portions are dissolved and removed.

[0003] During the production of products using resist materials, in order to meet the spirit of sustainability while maintaining excellent product quality and high yield, it is necessary to strictly control the operation accuracy of the units in the development process, and reduce the amount of chemicals used, the amount of chemical wastewater treated, and most importantly, the amount of water used for treatment when the units produce a number of substrates. One ideal method would be to optimize or maximize the recovery of used developer so that it can be reclaimed and reused in the next development process, thus extending the working time of the developer tank. It is hoped that through such planned adjustments, carbon emissions will be significantly reduced. However, implementing this idea is extremely challenging.

[0004] Taking the production of printed wiring boards as an example, U.S. Pat. No. 5,853,963 proposes that the development activity of the carbonate group can be maintained and the working time of the developer can be extended by adding additional hydroxide to the developer tank to control the hydrogen index (pH value). However, the more precise the circuit design, the more difficult it is to maintain the development activity by controlling the pH value in the development process. Therefore, development activity must be maintained by nonionic or ionic surfactants to enhance development efficiency in the process. The surfactant generates a protective space in the developer solution to enclose the resist composition dissolved in the basic carbonate group. Ideally, the addition of surfactants contributes to the expression of development efficiency and can further improve the development efficiency, but the used developer needs to be recovered and reused, and the production line will encounter the following operational problems:

[0005] I. In the development process unit, the surfactant generates bubbles at the gas-liquid interface, and in severe cases, the continuously generated bubbles overflow from the development tank, causing the development process to stop. II. Fresh developer is added to the developing tank, and after the first action dissolves the resist composition, it is recovered and reused. In this process, resist components accumulate in the developer over time and aggregate to form a colloidal suspension, which begins to produce stains. The resulting stains adhere and stick to the solid surfaces of the development system when the developer is reused, and furthermore, re-adhere and re-stick to the substrate, causing damage to the substrate and reducing the product yield. [Prior art documents] [Patent documents]

[0006] [Patent Document 1] U.S. Patent No. 5,853,963 Summary of the Invention [Problem to be solved by the invention]

[0007] The above movement disorders often occur together. Typically, control measures involve adding an antifoaming agent or adjusting the pH value, but adding an inappropriate antifoaming agent can have the opposite effect, causing the resist composition to aggregate into stains and accelerate adhesion and sticking to the substrate, reducing product yields and causing production line stoppages. This requires the use of more chemicals and water to clean the lithographic apparatus. In order to avoid the above-mentioned problems in terms of the desired product yield, the developer working time and stop / cleaning time in the production line must be determined based on operational experience, and usually, the production line must be stopped for cleaning every 8 or 16 hours. This would result in more chemical and water use, which goes against the spirit of sustainability.

[0008] In view of the above, the present invention aims to provide a method for optimizing the working time of a developer, which is a reason for stopping a production line, and to provide an anti-soiling composition that can be added to a developer or resist so as to suppress the aggregation of colloids and reduce the occurrence of stains. [Means for solving the problem]

[0009] One embodiment of the present invention is a method for monitoring colloids in a developer solution, comprising the steps of: To determine the change in zeta potential distribution of colloids in the developer; To determine the change in particle size distribution of colloids in the developer, and sending a warning message to change the developer based on the zeta potential distribution change and the particle size distribution change; The developer is used to develop the exposed substrate and remove a portion of the resist. A method for monitoring colloids in a developer solution is provided.

[0010] Another embodiment of the present invention comprises: a development tank in which the substrate undergoes a development reaction; a nozzle disposed in the developing tank for dispersing the developing solution onto the substrate; a developer tank for connecting to the nozzle and for holding the developer; a transport unit disposed within the developing tank for transporting the substrate to or from the developing tank; a control unit connected to the developer tank, the nozzle and the developer tank for controlling the injection, release or recovery of developer; a detection unit connected to the developer tank for detecting the zeta potential or particle size of colloids in the developer solution and generating a corresponding signal; and a computing unit connected to the detection unit and configured to perform a computation based on the signal; wherein said method for monitoring colloids in a developer is capable of being carried out.

[0011] Yet another embodiment of the present invention comprises: 0 to 99.5% by weight of water, a basic substance or mixture containing 0.5 to 1.5% by weight of tetramethylammonium hydroxide, tetra-n-butylammonium hydroxide, potassium carbonate, sodium carbonate or ammonium carbonate; 0.001 to 0.5% by weight of a dispersant, 0.001 to 0.5% by weight of a wetting agent, 0.001 to 0.5% by weight of a foam suppressor, and 0.001 to 0.5% by weight of a defoamer, The present invention provides an antifouling composition comprising:

[0012] Yet another embodiment of the present invention provides a developer composition comprising a developer and the antifouling composition described above.

[0013] Yet another embodiment of the present invention provides a resist composition comprising a resist and the antifouling composition.

[0014] A method for monitoring colloids in a developer according to an embodiment of the present invention sends a warning message to change the developer based on changes in the zeta potential distribution and particle size distribution of colloids in the developer, and the warning message can be used as a reference indicator for determining whether to stop the development process and perform cleaning or change the developer. Compared with the known technology of monitoring the hydrogen index as the basis for stopping the development process, the present invention uses the change in the physicochemical properties of the colloid in the developer as a reference index, which can better reflect the changes in the properties and content of the colloid that cause stains in the developer, and ensures that the developer can be used most effectively before modification and cleaning of the developer tank. The antifouling composition according to the embodiment of the present invention can inhibit the aggregation and size increase of colloids in the developer, inhibiting the generation of stains, thereby extending the working time of the developer. The use of the embodiment of the method of monitoring colloids in developer solutions and the embodiment of the antifouling composition in the development process not only allows for efficient use of developer solutions, but also minimizes stoppages, reduces cleaning frequency, reduces chemical usage, and most importantly, conserves water and reduces carbon emissions in the development process. The method for monitoring colloids in a developer according to an embodiment of the present invention and the antifouling composition according to an embodiment of the present invention can be applied to various resist development processes, and can also be applied to lithography processes such as printing of printed wiring boards, solder resist, panels, and integrated circuit surfaces. [Brief description of the drawings]

[0015] [Figure 1] FIG. 1 depicts a schematic diagram of a lithographic apparatus;

[0016] [Diagram 2] 2 is a flow chart of a method for monitoring colloids in a developer according to an embodiment of the present invention.

[0017] [Diagram 3] 1 is a flowchart for determining a change in zeta potential distribution according to an embodiment of the present invention.

[0018] [Figure 4] 1 is a flowchart for determining a change in particle size distribution according to an embodiment of the present invention.

[0019] [Diagram 5] 4 is a flowchart for determining a change in particle size distribution according to another embodiment of the present invention.

[0020] [Figure 6]1 is a flow chart for sending a warning message based on a change in zeta potential distribution and a change in particle size distribution according to one embodiment of the present invention.

[0021] [Figure 7A] This is the detection result of the zeta potential distribution. [Figure 7B] This is the detection result of the zeta potential distribution. [Figure 7C] This is the detection result of the zeta potential distribution.

[0022] [Figure 8A] This is the detection result of the particle size distribution of the control. [Figure 8B] This is the detection result of the particle size distribution of the control. [Figure 8C] This is the detection result of the particle size distribution of the control.

[0023] [Figure 9A] 4 shows the results of particle size distribution detection in the examples. [Figure 9B] 4 shows the results of particle size distribution detection in the examples. [Figure 9C] 4 shows the results of particle size distribution detection in the examples. DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS

[0024] Detailed features and advantages are described in detail in the following implementation scheme. The contents are sufficient for any person skilled in the art to understand the technical contents of the present invention and to implement the present invention based on the contents, claims, and drawings disclosed in this specification, and any person skilled in the art can easily understand the objects and advantages of the present invention. The following examples further illustrate aspects of the present invention, but are not intended to limit the scope of the invention in any respect.

[0025] FIG. 1 depicts a schematic diagram of a lithographic apparatus. The lithographic apparatus 100 may include a developer tank 101 , a nozzle 102 , a developer tank 103 , a transport unit 104 , a control unit 105 , a detection unit 106 , and a computing unit 107 . The developing tank 101 is where the substrate S undergoes a developing reaction. A nozzle 102 may be disposed within the developer tank 101 and used to dispense developer solution D onto a substrate S. The transport unit 104 is disposed within the developing tank 101 and is used to transport the substrate S to or from the developing tank 101, and the transport unit 104 may be, for example, a conveyor belt or rollers. A control unit 105 may be connected to the developer tank 101, the nozzle 102 and the developer tank 103 and used to control the injection, release or withdrawal of developer D, for example injecting fresh developer D or withdrawing used developer D. The detection unit 106 may be connected to the developing tank 101 and used to detect the state of the developer D, generate a corresponding signal, and transmit the signal to the calculation unit 107; for example, the detection unit 106 can detect the pH value, basic content, colloid particle size, or colloid zeta potential of the developer D. The sampling point of the detection unit 106 may be a location where the used developer D accumulates, for example, the lower part of the developing tank 101, or may be a circulation pump or a filter element for recovering the developer D. The calculation unit 107 is connected to the detection unit 106 and is used to perform calculations based on the signal detected from the detection unit 106, and send a warning message recommending stopping, cleaning, and changing to a new developer D based on the calculation result.

[0026] For example, the development process can be carried out as described below. The substrate S to be developed is placed in the developing tank 101 from the substrate feeder by the transport unit 104, and is unloaded from the developing tank 101 after undergoing a developing process in the developing tank 101. In the developing tank 101, fresh or used developing solution D is dispersed onto the substrate S by a nozzle 102, so that the resist on the substrate S can be dissolved and removed. The type of resist is not limited. If the resist is a positive resist, the exposed portions of the resist are dissolved and removed. If the resist is a negative resist, the portions of the resist that are not exposed to light are dissolved and removed. After the resist is dissolved, the used developer D flows by gravity to the bottom of the developing tank 101 and accumulates there, and is then collected by a circulation bump for reuse. During the reuse process, the dissolved resist gradually accumulates in the used developer D and aggregates to form colloids C. The calculation unit 107 performs calculations based on the signal detected by the detection unit 106, and sends a warning message recommending stopping, cleaning, and changing to a new developer D based on the calculation results.

[0027] The development process can be tailored according to the needs of the lithography process. In practice, a standard development process may use only one or two or more developer tanks connected in series, which may be connected to a residual resist washing tank. The development transport line may be designed to transport two or more substrates in parallel through the development tank. The development process can be batch, semi-batch or continuous, with the substrate being transported from the start of the development tank to the end of the development tank by a conveyor belt. The conveyor belt may be a horizontal mechanical type or a vertical mechanical type. The development residence time of the substrate can be roughly calculated by dividing the length of the transport path in the developing tank by the transport speed. In a manufacturing line, the throughput of substrates is typically the load time that can be operated in the development process, e.g., 500, 1000, 2000, 3000 or 5000 sheets, or the length of a work shift is typically the load time that can be operated in the development process, e.g., 8 hours, 16 hours or 24 hours.

[0028] A method for monitoring colloids in a developer according to an embodiment of the present invention will now be described with reference to FIG. FIG. 2 is a flow chart of a method for monitoring colloids in a developer according to one embodiment of the present invention. A method for monitoring colloids in a developer that is one embodiment of the present invention includes determining a change in the zeta potential distribution of colloids in the developer (step S210), determining a change in particle size distribution of colloids in the developer (step S220), and sending a warning message to change the developer based on the change in the zeta potential distribution and the change in particle size distribution (step S230).

[0029] The developer described above is used to develop the exposed substrate and remove a portion of the resist. For example, the exposed substrate S is developed using a developer D to remove a portion of the resist. As described above, in the developing tank 101, fresh or used developer D is dispersed onto the substrate S by the nozzle 102, so that the resist on the substrate S can be dissolved and removed. After the resist is dissolved, the used developer D flows by gravity to the bottom of the developing tank 101 and accumulates there, and the dissolved resist gradually accumulates in the used developer D and aggregates to form colloids C.

[0030] In step S210, a change in the zeta potential distribution of colloid C in developer D is obtained. As described above, the detection unit 106 samples and detects the zeta potential of colloid C in developer D, and the calculation unit 107 can calculate it. The method for detecting the zeta potential is not limited, and the potential can be detected by a DC electric field, an AC electric field, a pressure difference, electro-osmosis, electrical conductivity, or the like. In the examples described below, the zeta potential is determined by detection using a DC electric field.

[0031] Please refer to FIG. 3, which is a flow chart for determining the zeta potential distribution change according to one embodiment of the present invention. Step S210 further includes detecting a first zeta potential distribution of colloids in the developer at a first time point and calculating an integral of the first zeta potential distribution (step S211), detecting a second zeta potential distribution of colloids in the developer at a second time point after the first time point and calculating an integral of the second zeta potential distribution (step S212), and determining a zeta potential distribution change based on the integral of the first zeta potential distribution and the integral of the second zeta potential distribution (step S213).

[0032] The first point in time may be a point in time when the development process has not yet taken place, or may be any point in time during the development process. The second time point is a time point after the first time point. The interval between the first point in time and the second point in time may be set arbitrarily according to the needs of the production line. The interval between the first time point and the second time point may be set to a fixed time interval. For example, sampling and detection are preferably performed at intervals of 1 minute to 24 hours, more preferably at intervals of 15 minutes to 8 hours, and even more preferably at intervals of 30 minutes to 2 hours. Alternatively, the interval between the first time point and the second time point may be set with the number of developed substrates as a unit interval. For example, it is preferable to sample and detect 100 sheets / tank to 10,000 sheets / tank at each unit interval, more preferably to sample and detect 200 sheets / tank to 3,000 sheets / tank at each unit interval, and even more preferably to sample and detect 500 sheets / tank to 2,500 sheets / tank at each unit interval. Alternatively, the interval between the first and second time points may be set as the area of ​​the substrate divided by the volume of developer, for example, in square feet per gallon.

[0033] The zeta potential distribution of colloids in the developer is detected at a first time point and the integral of the first zeta potential distribution is calculated, and the zeta potential distribution of colloids in the developer is detected at a second time point and the integral of the second zeta potential distribution is calculated. When the first point in time is a point in time when the development process has not yet been performed, the integral of the first zeta potential distribution obtained at this time is, but is not limited to, the integral of the zeta potential distribution of colloids in the developer solution when the development process has not yet been performed. When the first time point is any time point during the development process, the integral of the first zeta potential distribution obtained at this time is the integral of the zeta potential distribution of the colloids in the developer used.

[0034] The integral of the first zeta potential distribution and the integral of the second zeta potential distribution are calculated by the following formula. Integral of zeta potential distribution = absolute value of integrating zeta potential signal intensity over zeta potential

[0035] The integral interval may be a zeta potential of 0 to +50 mV or 0 to -150 mV, and more preferably a zeta potential of 0 to +30 mV or 0 to -130 mV, but is not limited thereto. The integral interval of the zeta potential distribution can be determined by the components of the resist dissolved in the developer, and can be adjusted according to the characteristics of the colloid formed by dissolving the resist in the developer, and can also be adjusted according to the needs of the product, production line, equipment, and environment. The integration method is not limited, and may be performed by Riemann sum, trapezoidal rule, rectangular rule, or any other mathematical integration calculation method.

[0036] The change in zeta potential distribution is calculated by the following formula. Zeta potential distribution change = (absolute value of the difference between the integral of the second zeta potential distribution and the integral of the first zeta potential distribution / integral of the first zeta potential distribution) x 100%

[0037] In step S220, the change in particle size distribution of colloid C in developer D is obtained. As described above, the detection unit 106 samples and detects the particle size of the colloid C in the developer D, and the calculation unit 107 can calculate the particle size. The method for detecting the particle size is not limited, and the particle size can be detected by an optical method.

[0038] Please refer to FIG. 4, which is a flow chart of determining the change in particle size distribution according to one embodiment of the present invention. Step S220 further includes detecting a first particle size distribution of colloids in the developer at a first time point and calculating an integral of the first particle size distribution (step S221), detecting a second particle size distribution of colloids in the developer at a second time point after the first time point and calculating an integral of the second particle size distribution (step S222), and determining a change in particle size distribution based on the integral of the first particle size distribution and the integral of the second particle size distribution (step S223).

[0039] As mentioned above, the first and second points in time are omitted here. A particle size distribution of colloids in the developer at a first time point is detected and an integral of the first particle size distribution is calculated, and a particle size distribution of colloids in the developer at a second time point is detected and an integral of the second particle size distribution is calculated. When the first time point is a time point before the development process has been performed, the integral of the first particle size distribution obtained at this time is, but is not limited to, the integral of the particle size distribution of colloids in a developer before the development process has been performed. If the first time point is any time point during the development process, the integral of the first particle size distribution obtained at this time is the integral of the particle size distribution of the colloids in the developer used.

[0040] The first and second time points for detecting the zeta potential distribution may be the same as or different from the first and second time points for detecting the particle size distribution, and the order thereof is not limited. For convenience of sampling, the first and second time points for detecting the zeta potential distribution are preferably the same as the first and second time points for detecting the particle size distribution.

[0041] The integral of the first particle size distribution and the integral of the second particle size distribution are calculated by the following formula. Integral of particle size distribution = absolute value of integrating particle size signal intensity over particle size

[0042] The integral intervals are particle size 0 to 5000 nm and 5000 to 1×10 6 nm or 0 to 1×10 6 The thickness may be, but is not limited to, nm. The integral interval of the particle size distribution can be determined by the components of the resist dissolved in the developer, and can be adjusted according to the characteristics of the colloid formed by dissolving the resist in the developer, and can also be adjusted according to the needs of the product, production line, equipment, and environment. The integration method is not limited, and may be performed by Riemann sum, trapezoidal rule, rectangular rule, or any other mathematical integration calculation method.

[0043] The change in particle size distribution is calculated according to the following formula. Change in particle size distribution = (absolute value of the difference between the integral of the second particle size distribution and the integral of the first particle size distribution / integral of the first particle size distribution) x 100%

[0044] Please refer to FIG. 5, which is a flow chart for determining the change in particle size distribution according to another embodiment of the present invention. In another embodiment, step S220 further includes detecting a first particle size distribution of colloids in the developer at a first time point and obtaining a first particle size distribution signal peak (step S221′), detecting a second particle size distribution of colloids in the developer at a second time point after the first time point and obtaining a second particle size distribution signal peak (step S222′), and determining a particle size distribution change based on the first particle size distribution signal peak and the second particle size distribution signal peak (step S223′).

[0045] As mentioned above, the first and second points in time are omitted here. A particle size distribution of colloids in the developer is detected at a first time point and a first particle size distribution signal peak is obtained, and a particle size distribution of colloids in the developer is detected at a second time point and a second particle size distribution signal peak is obtained. When the first time point is a time point before the development process has been performed, the first particle size distribution signal peak obtained at this time is, but is not limited to, a particle size distribution signal peak of colloids in a developer before the development process has been performed. If the first time point is any time point during the development process, the first particle size distribution signal peak obtained at this time is the particle size distribution signal peak of the colloid in the developer used.

[0046] The change in particle size distribution is calculated according to the following formula. Particle size distribution change = absolute value of the difference between the position or number of the second particle size distribution signal peak and the position or number of the first particle size distribution signal peak

[0047] If the number of first particle size distribution signal peaks is not equal to the number of second particle size distribution signal peaks, i.e., if the particle size distribution change is greater than 0, this indicates that a change occurs in the particle size distribution of the colloid, e.g., from a single distribution to a multi-layer distribution. Alternatively, if the position of the first particle size distribution signal peak and the position of the second particle size distribution signal peak are not equal, i.e., the particle size distribution change is greater than 0, this indicates that the particle size distribution of the colloid has undergone a change, e.g., such that a shift occurs in the particle size distribution signal peak.

[0048] In step S230, a warning message is sent to change the developer D based on the change in zeta potential distribution and the change in particle size distribution. As mentioned above, based on the zeta potential distribution change and the particle size distribution change determined by the computing unit 107, a warning message can be sent recommending stopping, cleaning and changing to a new developer D.

[0049] Please refer to FIG. 6, which is a flow chart of sending a warning message based on the zeta potential distribution change and the particle size distribution change according to one embodiment of the present invention. Step S230 further includes sending a warning message recommending stopping the development process and changing the developer if the zeta potential distribution change exceeds a first warning value or the particle size distribution change exceeds a second warning value, and not sending a warning message recommending stopping the development process and changing the developer if the zeta potential distribution change does not exceed the first warning value and the particle size distribution change does not exceed the second warning value. That is, step S230 further includes determining whether the zeta potential distribution change exceeds a first warning value or whether the particle size distribution change exceeds a second warning value (S2301), and if at least one of them is YES, sending a warning message recommending stopping the development process and changing the developer (S2302), and if both are NO, not sending a warning message recommending stopping the development process and changing the developer (S2303).

[0050] When the zeta potential distribution change is obtained from the integral of the first zeta potential distribution and the integral of the second zeta potential distribution, the first warning value is preferably 9%, more preferably 9% to 100%, and even more preferably 9% to 50%. When the change in zeta potential distribution exceeds a first warning value, it is inferred that colloids in the developer may cause contamination, and a warning message is sent out at this point, recommending stopping the development process and changing the developer, so that the operator can consider the need to stop, clean, and change to a new developer based on the warning message.

[0051] When the change in particle size distribution is obtained from the integral of the first particle size distribution and the integral of the second particle size distribution, the second warning value is preferably 20%, more preferably 20% to 300%, and even more preferably 20% to 100%. The second warning value may be 0% when a particle size distribution change is obtained from the first particle size distribution signal peak and the second particle size distribution signal peak, i.e., there is a change in the position or number of the particle size distribution signal peaks, indicating that the colloid in the developer is unstable. If the change in particle size distribution exceeds a second warning value, it is inferred that colloids in the developer may cause contamination, and a warning message is sent at this point, recommending stopping the development process and changing the developer, so that the operator can consider the need to stop, clean, and change to a new developer based on the warning message.

[0052] The first warning value and the second warning value are not limited to the above numerical values. For example, a calibration curve of the change in colloid particle size and zeta potential in the developer over time can be created, and a first warning value and a second warning value can be set corresponding to a first time point and a second time point to be detected. Alternatively, the first warning value and the second warning value can be determined by the components of the resist dissolved in the developer, and can be adjusted according to the characteristics of the colloid formed by dissolving the resist in the developer, and can also be adjusted according to the needs of the product, production line, equipment, and environment.

[0053] If the change in zeta potential distribution does not exceed the first warning value and the change in particle size distribution does not exceed the second warning value, it is inferred that the colloids in the developer are stable and have not accumulated to the extent that staining occurs, and at this point, no warning message is sent to recommend stopping the development process and changing the developer, and the operator can recover the developer and use it for the next development process.

[0054] A method for monitoring colloids in a developer according to an embodiment of the present invention sends a warning message for changing the developer based on changes in the zeta potential distribution and particle size distribution of colloids in the developer, and the warning message can be used as a reference indicator for determining whether to stop the development process and perform cleaning and change the developer. Compared with the known technology of monitoring the hydrogen index as the basis for stopping the development process, the present invention uses the change in the physicochemical properties of the colloid in the developer as a reference index, which can better reflect the changes in the properties and content of the colloid that cause stains in the developer, and ensures that the developer can be used most effectively before modification and cleaning of the developer tank. This not only maximizes the efficient utilisation of developer but also minimises the number of stoppages, reduces the frequency of cleaning, reduces chemical usage and most importantly saves water and reduces carbon emissions during the development process.

[0055] In addition, in the method for monitoring colloids in a developer which is an embodiment of the present invention, determining the change in the zeta potential distribution of colloids in the developer (step S210) and determining the change in particle size distribution of colloids in the developer (step S220) may be considered as steps for quantifying the change in colloids in the developer. The change in zeta potential distribution and particle size distribution of colloids in the developer may be the basis for a decision to send a warning message to change the developer, as well as the result of quantifying the colloid change. Quantification of colloidal changes can be applied not only to monitoring of the development process, but also to developer design, resist design, process design, cost evaluation, and other aspects.

[0056] In another embodiment, in the method for monitoring colloids in a developer of the present invention, in addition to sending a warning message to change the developer based on changes in the zeta potential distribution and changes in the particle size distribution (step S230), it is also possible to send a warning message to change the developer based on changes in the zeta potential distribution and changes in the particle size distribution. For example, as described above, the zeta potential distribution and particle size distribution of a colloid are detected at a first time point and a second time point, and the change in zeta potential distribution and the change in particle size distribution are calculated, which are designated as a first zeta potential distribution change and a first particle size distribution change, respectively. Next, referring to the above, the zeta potential distribution and particle size distribution of the colloid are detected at a third time point and a fourth time point, and the zeta potential distribution change and the particle size distribution change are calculated, which are referred to as a second zeta potential distribution change and a second particle size distribution change, respectively. The change in zeta potential distribution change is the difference between the first zeta potential distribution change and the second zeta potential distribution change, and the change in particle size distribution change is the difference between the first particle size distribution change and the second particle size distribution change. A warning value can be set for each of the changes in the zeta potential distribution and the changes in the particle size distribution. The warning value can be determined based on the components of the resist dissolved in the developer, and can be adjusted according to the characteristics of the colloid formed when the resist is dissolved in the developer. The warning value can also be adjusted according to the needs of the product, production line, equipment, and environment.

[0057] An antifouling composition according to one embodiment of the present invention will be described below. The antifouling composition contains 0 to 99.5% by weight of water, 0.5 to 1.5% by weight of a basic substance or mixture including tetramethylammonium hydroxide, tetra-n-butylammonium hydroxide, potassium carbonate, sodium carbonate or ammonium carbonate, 0.001 to 0.5% by weight of a dispersant, 0.001 to 0.5% by weight of a wetting agent, 0.001 to 0.5% by weight of a foam suppressor, and 0.001 to 0.5% by weight of a defoamer. In another embodiment, the antifouling composition can include 98.45-98.65 wt. % water, 1 wt. % basic material or mixture including tetramethylammonium hydroxide, tetra-n-butylammonium hydroxide, potassium carbonate, sodium carbonate, or ammonium carbonate, 0.1-0.2 wt. % dispersant; 0.015-0.03 wt. % wetting agent, 0.1-0.25 wt. % foam suppressor, and 0.03-0.2 wt. % defoamer.

[0058] More preferably, the water is deionized water. Water serves as a vehicle to disperse the other ingredients in water to form a solution for ease of addition.

[0059] A basic substance or mixture is capable of maintaining the pH value of the solution and has the basic hydroxyl group OH - or carbonate group CO3 2- supplies. Basic hydroxyl group OH - or carbonate group CO3 2- is used to promote the aggregation of resist components and residual materials into aggregates to form electric double layer colloids and to stably suspend them in the developer. The basic substance or mixture can include tetramethylammonium hydroxide, tetra-n-butylammonium hydroxide, potassium carbonate, sodium carbonate, or ammonium carbonate.

[0060] The dispersant is used to control the interface stability of the developer, resist components and residual material ions. The dispersant preferably contains an organic active substance having a carbon-carbon triple bond with a Griffin hydrophilic-lipophilic balance (HLB) of 4 to 18, an organic active substance having a carbon-carbon double bond with an HLB of 3 to 18 and an aromatic ring structure, or a polycarboxylate polymer having a quaternary ammonium salt functional group, and more preferably contains an organic active substance having a carbon-carbon triple bond with an HLB of 4 to 18. Specifically, the dispersant is 2,4,7,9-tetramethyl-5-decene-4,7-diol polyoxyethylene ether (HLB of 4 to 18, more preferably HLB of 8 to 15), 2-butyne-1,4-diol polyoxyethylene ether (HLB of 4 to 18, more preferably HLB of 8 to 15), 2,4,7,9-tetramethyl-5-decene-4,7-diol polyoxyethylene / polyoxypropylene polyether polyol (HLB of 4 to 18, more preferably HLB of 8 to 15), 2-butyne-1,4 ... The polyoxyethylene ether comprises at least one selected from the group consisting of xypropylene polyether polyol (HLB of 4 to 18, more preferably HLB of 8 to 15), bioderived cardanol polyoxyethylene ether (HLB of 3 to 18, more preferably HLB of 8 to 15), nonylphenol polyoxyethylene ether (HLB of 3 to 18, more preferably HLB of 8 to 15), alkylphenol polyoxyethylene ether (HLB of 3 to 18, more preferably HLB of 8 to 15), and polycarboxylate polymers having a quaternary ammonium salt functional group.

[0061] Wetting agents are used to improve the presentation of dispersants. The wetting agent includes at least one selected from the group consisting of monoethylene glycol, diethylene glycol, triethylene glycol, polyethylene glycol (number average molecular weight of 100 to 600), monoethylene glycol butyl ether, diethylene glycol butyl ether, triethylene glycol butyl ether, polyethylene glycol butyl ether, ethylene carbonate, propylene carbonate, an ethylene oxide adduct of 2 to 3 molecules of a C8 to 10 aliphatic alcohol, a copolymer adduct of ethylene oxide and propylene oxide (having less than 11 carbon atoms and an HLB of 4 to 10), an ethylene oxide adduct of a linear secondary alcohol (HLB of 4 to 10), and an ethylene oxide adduct of a branched secondary alcohol (HLB of 4 to 10).

[0062] Since the dispersant and wetting agent in the antifouling composition are distributed at the gas-liquid interface between air and water, it is difficult to avoid the generation of bubbles. Excessive foam can overflow the developer tank, risking stopping the development process. Therefore, the occurrence of the above problems can be controlled by adding a foam inhibitor or defoamer to the soil repellent composition. Foam suppressors include 2-3 molecules of ethylene oxide adducts of natural C12-14 fatty alcohols, 2-3 molecules of ethylene oxide adducts of isotridecanol, 2-3 molecules of ethylene oxide adducts of isodecanol, 2-3 molecules of ethylene oxide adducts of oleyl alcohol, 2-3 molecules of ethylene oxide adducts of C16-18 fatty alcohols, triblock copolymers of ethylene oxide / propylene oxide, random copolymers of C8-14 fatty alcohols and ethylene oxide / propylene oxide, block copolymers of C8-14 fatty alcohols and ethylene oxide / propylene oxide, random copolymers of natural C12-14 fatty alcohols and ethylene oxide / propylene oxide, natural C12-14 fatty alcohols and ethylene oxide / propylene oxide, triblock copolymers of C8-14 fatty alcohols and ethylene oxide / propylene oxide, block copolymers of C8-14 fatty alcohols and ethylene oxide / propylene oxide, random copolymers of natural C12-14 fatty alcohols and ethylene oxide / propylene oxide, triblock copolymers of C8-14 fatty alcohols and ethylene oxide / propylene oxide, block copolymers of C8-14 fatty alcohols and ethylene oxide / propylene oxide, triblock ... The copolymer contains at least one selected from the group consisting of a block copolymer of an aliphatic alcohol and ethylene oxide / propylene oxide, a random copolymer of isotridecanol and ethylene oxide / propylene oxide, a block copolymer of isotridecanol and ethylene oxide / propylene oxide, a random copolymer of oleyl alcohol and ethylene oxide / propylene oxide, a block copolymer of oleyl alcohol and ethylene oxide / propylene oxide, a random copolymer of C16-18 aliphatic alcohol and ethylene oxide / propylene oxide, a block copolymer of C16-C18 aliphatic alcohol and ethylene oxide / propylene oxide, and a polypropylene glycol having a number average molecular weight of less than 2000.

[0063] The defoaming agent includes at least one selected from the group consisting of white mineral oil, palm kernel oil, palm stearin oil, horse oil, shea butter, and wax.

[0064] The antifouling composition according to the embodiment of the present invention may be used by being injected alone into a unit of a development process, or may be used by being added to a developer or resist, but is not limited thereto. For example, the antifouling composition may be added to a chemical agent that contacts with a resist or a developer during the development process.

[0065] Another embodiment of the present invention provides a developer composition comprising a developer and the antifouling composition described above.

[0066] Yet another embodiment of the present invention provides a resist composition comprising a resist and the antifouling composition.

[0067] In the following experiment, the antifouling composition according to the embodiment of the present invention is added to a developer, and a developing process is carried out on a substrate having a dry film resist as described above with reference to FIG. 1, and the zeta potential distribution and particle size distribution of the colloids in the developer are detected using the method for monitoring colloids in the developer. The substrate used in this experiment is copper foil, with a dry film resist (model number 115T, Evergreen Materials, Taiwan) on the copper foil. The components of the control, comparative example and example antifouling compositions are shown in Table 1. The zeta potential and particle size are detected using a zeta potential particle size analyzer (model number ELSZ-2000, Otsuka Electronics).

[0068] [Table 1]

[0069] A specific area of ​​resist is dissolved using a developer containing the antifouling composition of the above control, comparative example, or example, and a sample is taken using the method for monitoring colloids in a developer of the present invention, and changes in the zeta potential distribution and particle size distribution of the colloids in the developer are detected. The experimental results are shown in Tables 2 and 3, where Unit 1 represents dissolving 1 square foot of dry film resist, Unit 2 represents dissolving 2 square feet of dry film resist, and Unit 3 represents dissolving 3 square feet of dry film resist. The experimental results show that the antifouling compositions of Examples 1 and 2 can suppress changes in zeta potential distribution and particle size distribution, indicating that the antifouling compositions of Examples 1 and 2 can suppress the aggregation and size increase of colloids in the developer.

[0070] [Table 2]

[0071] [Table 3]

[0072] In addition, the zeta potential distributions obtained from different integral intervals are compared. As can be seen from Table 4, when the zeta potential integral interval is 0 to +500 mV or 0 to -950 mV, the obtained change in zeta potential distribution is not significant, whereas when the zeta potential integral interval specified by the embodiment of the present invention is 0 to +50 mV or 0 to -150 mV, the change in zeta potential distribution is significant, which indicates that the method for monitoring colloids in a developer according to the embodiment of the present invention has higher sensitivity when the zeta potential integral interval specified by the method is 0 to +50 mV or 0 to -150 mV.

[0073] [Table 4]

[0074] A development process is carried out using a developer containing the antifouling composition of the control, comparative example, or example. In this experiment, the first zeta potential distribution and the first particle size distribution are detected at time 0, which is the first time point, and the integral of the first zeta potential distribution and the integral of the first particle size distribution are calculated. The second zeta potential distribution and the second particle size distribution are detected at time points 8, 24, 36, and 48 hours, and the integral of the second zeta potential distribution and the integral of the second particle size distribution are calculated. The zeta potential distribution change and the particle size distribution change were calculated from the above parameters. The detection results of the zeta potential distribution are shown in FIGS. 7A to 7C and Table 5, and the detection results of the particle size distribution are shown in FIGS. 8A to 9C and Table 6.

[0075] 7A to 7C show the detection results of the zeta potential distribution, and the quantitative values ​​are shown in Table 5. As can be seen from Figures 7A to 7C and Table 5, the change in zeta potential distribution in the group using a developer containing a control had a difference of 15% from that at 0 hours at 8 hours, and a difference of 17% at 24 hours. With a first warning value of 9% as standard, the control sends a warning message at the 8th hour, allowing the operator to consider the need to stop, clean and change to fresh developer. On the other hand, the change in zeta potential distribution in the group using the developer containing the Example was less than 9% at 36 hours, at which point no warning message was sent and the operator was able to continue the development process; at 48 hours, only Example 2 reached 9%, at which point a warning message was sent and the operator was able to consider whether to continue the development process or to stop it, wash, and change to a new developer.

[0076] 8A to 8C show the results of detection of particle size distribution for the control, and FIGS. 9A to 9C show the results of detection of particle size distribution for the example. The quantitative values ​​are shown in Table 6. As can be seen from Figures 8A to 9C and Table 6, the change in particle size distribution in the group using the developer containing the control has a difference of 14% from 0 hours at 8 hours, and a difference of 1798% at 24 hours. With a second warning value of 20% as standard, the control would send a warning message at 24 hours, allowing the operator to consider the need to stop, clean and change to fresh developer. On the other hand, the particle size distribution change in the group using the developer containing the embodiment was less than 20% at 24 hours, so no warning message was sent and the operator could continue the development process. As can be seen from the above experiments, the antifouling compositions of Examples 1 and 2 can inhibit the aggregation and size increase of colloids in the developer. Incidentally, at the 36th hour, the change in particle size distribution in Example 2 increases rapidly, and this can be used as a reference index for considering whether or not to stop the process, wash the process, and change the developer.

[0077] [Table 5]

[0078] [Table 6]

[0079] The changes in the particle size distribution signal peaks are shown in FIGS. As can be seen from Figures 8A to 8C and Table 7, at 8 hours and 48 hours, the control experienced changes in the particle size distribution signal peak. At 0 hours, there are concentrated signal peaks, and at 8 hours and 48 hours, the number of signal peaks increases, there is a shift in their position, and there is also a change in intensity. At 8 hours, a 1.2% signal peak appeared at 2500 nm, and at 24 hours, a 1.1% signal peak appeared at 5 × 10 5 nm, at the 8th hour a warning message is sent, indicating that the operator may consider the need to stop, clean and change to a fresh developer. On the other hand, as can be seen from Figures 9A to 9C and Table 7, at 48 hours, neither the position nor the number of signal peaks of Example 1 changes, at this time no warning message is sent and the operator can continue the development process; at 48 hours, Example 2 has a 0.7% signal peak at 2500 nm, at this time a warning message is sent and the operator can consider the need to stop, clean and change to a new developer.

[0080] [Table 7]

[0081] The gas-liquid interface in the developing tank and the solid surfaces in the developing tank were visually observed to see whether or not any stains were generated. The results are shown in Table 8. As can be seen from Table 8, at 8 hours the control started to stain, and at 24 hours stain aggregation occurred, at which point it is recommended to stop, wash and change to fresh developer. On the other hand, in Example 1, no stains appeared even after 48 hours, and in Example 2, stains appeared after 48 hours.

[0082] [Table 8]

[0083] As can be seen from the above experimental results, the antifouling composition according to the embodiment of the present invention can suppress the aggregation and size increase of colloids in the developer, thereby extending the working time of the developer, reducing the number of stoppages, reducing the frequency of cleaning, reducing the use of chemicals, and most importantly, saving water for the development process and reducing carbon emissions.

[0084] In the following experiment, the antifouling composition according to the embodiment of the present invention is added to a developer, and a developing process is carried out on a substrate having a resist ink as described above with reference to FIG. 1, and the zeta potential distribution and particle size distribution of the colloids in the developer are detected using the method for monitoring colloids in the developer. The substrate used in this experiment is copper foil having a resist ink on the copper foil. The components of the control, comparative and example antifouling compositions are shown in Table 9. The zeta potential and particle size are detected using a zeta potential particle size analyzer (model number ELSZ-2000, Otsuka Electronics).

[0085] [Table 9]

[0086] A specific mass of resist is dissolved using a developer containing the antifouling composition of the above control, comparative example, or example, and sampling is performed using the method for monitoring colloids in a developer of the present invention to detect changes in the zeta potential distribution and particle size distribution of the colloids in the developer. The experimental results are shown in Tables 10 and 11, where 1g represents dissolving 1 gram of resist ink, 2g represents dissolving 2 grams of resist ink, and 4g represents dissolving 4 grams of resist ink. The experimental results show that the antifouling compositions of Examples 3 and 4 can inhibit the change in zeta potential distribution and particle size distribution, indicating that the antifouling compositions of Examples 3 and 4 can inhibit the aggregation and size increase of colloids in the developer.

[0087] [Table 10]

[0088] [Table 11]

[0089] As can be seen from the above experimental results, even in resist ink systems with more complex components, the antifouling composition according to the embodiment of the present invention can suppress the aggregation and size increase of colloids in the inhibiting developer, thereby extending the working time of the developer, reducing the number of stops, reducing the frequency of cleaning, reducing the use of chemicals, and most importantly, saving water for the development process and reducing carbon emissions.

[0090] A method for monitoring colloids in a developer according to an embodiment of the present invention sends a warning message to change the developer based on changes in the zeta potential distribution and particle size distribution of colloids in the developer, and the warning message can be used as a reference indicator for determining whether to stop the development process and perform cleaning or change the developer. Compared with the known technology of monitoring the hydrogen index as the basis for stopping the development process, the present invention uses the change in the physicochemical properties of the colloid in the developer as a reference index, which can better reflect the changes in the properties and content of the colloid that cause stains in the developer, and ensures that the developer can be used most effectively before modification and cleaning of the developer tank. The antifouling composition of the embodiment of the present invention can suppress the aggregation and size increase of colloids in the developer, thereby suppressing the generation of stains, and thereby extending the working time of the developer. The use of the embodiment of the method of monitoring colloids in developer solutions and the embodiment of the antifouling composition in the development process not only allows for efficient use of developer solutions, but also minimizes stoppages, reduces cleaning frequency, reduces chemical usage, and most importantly, conserves water and reduces carbon emissions in the development process.

Claims

1. 1. A method for monitoring colloids in a developer solution, comprising the steps of: determining a change in zeta potential distribution of colloids in the developer; determining a change in particle size distribution of colloids in said developer; and sending a warning message to change the developer based on the change in zeta potential distribution and the change in particle size distribution; The developer is used to develop the exposed substrate and remove a portion of the resist. Methods for monitoring colloids in developers.

2. Obtaining a change in the zeta potential distribution of colloids in the developer includes: detecting a first zeta potential distribution of colloids in the developer solution at a first time and calculating an integral of the first zeta potential distribution; detecting a second zeta potential distribution of colloids in the developer at a second time point after the first time point and calculating an integral of the second zeta potential distribution; and determining the change in zeta potential distribution based on an integral of the first zeta potential distribution and an integral of the second zeta potential distribution; The integral of the first zeta potential distribution and the integral of the second zeta potential distribution are expressed by the following formula, i.e. Integral of zeta potential distribution = absolute value of integrating zeta potential signal intensity with respect to zeta potential (integral interval is zeta potential 0 to +50 mV or 0 to -150 mV). Calculate by The change in zeta potential distribution is expressed by the following formula: Zeta potential distribution change=(absolute value of difference between integral of second zeta potential distribution and integral of first zeta potential distribution / integral of first zeta potential distribution)×100% By 2. A method for monitoring colloids in a developer solution according to claim 1.

3. Determining the change in particle size distribution of colloids in the developer includes: detecting a first particle size distribution of colloids in the developer at a first time and calculating an integral of the first particle size distribution; detecting a second particle size distribution of colloids in the developer at a second time point after the first time point and calculating an integral of the second particle size distribution; and determining the change in particle size distribution based on an integral of the first particle size distribution and an integral of the second particle size distribution; The integral of the first particle size distribution and the integral of the second particle size distribution are expressed by the following formula, i.e. Calculate by Integral of particle size distribution = absolute value obtained by integrating the particle size signal intensity with respect to the particle size (integral intervals are 0 to 5000 nm, 5000 to 1 x 10 ６ nm or 0 to 1×10 ６ nm.) The particle size distribution change is calculated according to the following formula: Change in particle size distribution=(absolute value of difference between integral of second particle size distribution and integral of first particle size distribution / integral of first particle size distribution)×100% By 2. A method for monitoring colloids in a developer solution according to claim 1.

4. Determining the change in particle size distribution of colloids in the developer includes: detecting a first particle size distribution of colloids in said developer at a first time and obtaining a first particle size distribution signal peak; detecting a second particle size distribution of colloids in the developer at a second time point after the first time point and obtaining a second particle size distribution signal peak; and determining the particle size distribution change based on the first particle size distribution signal peak and the second particle size distribution signal peak; The particle size distribution change is calculated according to the following formula: Particle size distribution change=absolute value of difference between the position or number of peaks of the second particle size distribution signal and the position or number of peaks of the first particle size distribution signal By 2. A method for monitoring colloids in a developer solution according to claim 1.

5. sending the warning message to change the developer if the change in zeta potential distribution exceeds a first warning value or if the change in particle size distribution exceeds a second warning value; not sending the warning message to change the developer if the zeta potential distribution change does not exceed a first warning value and the particle size distribution change does not exceed a second warning value. A method for monitoring colloids in a developer according to any one of claims 2 to 4.

6. 6. The method of monitoring colloids in developer solutions according to claim 5, wherein said first warning value is 9% and said second warning value is 20%.

7. 6. A method for monitoring colloids in developer solutions according to claim 5, wherein said first warning value is 9% and said second warning value is 0%.

8. The developer comprises an antifouling composition, The antifouling composition comprises 0 to 99.5% by weight of water, a basic substance or mixture containing 0.5 to 1.5% by weight of tetramethylammonium hydroxide, tetra-n-butylammonium hydroxide, potassium carbonate, sodium carbonate or ammonium carbonate; 0.001 to 0.5 wt. % of a dispersant, 0.001 to 0.5 wt. % of a wetting agent, 0.001 to 0.5 wt. % of a foam suppressor, and 0.001 to 0.5 wt. % of an antifoaming agent, 2. A method for monitoring colloids in a developer solution according to claim 1, comprising:

9. a development tank in which the substrate undergoes a development reaction; a nozzle disposed within the developer tank for dispersing developer onto the substrate; a developer tank connected to the nozzle and configured to hold the developer; a transport unit disposed within the developing tank for transporting the substrate to or from the developing tank; a control unit connected to said developer tank, said nozzle and said developer tank for controlling the injection, release or withdrawal of said developer; a detection unit connected to the developer tank for detecting the zeta potential or particle size of colloids in the developer and generating a corresponding signal; and a computing unit connected to the detection unit and configured to perform a computation based on the signal; A lithographic apparatus capable of carrying out the method for monitoring colloids in a developer solution according to claim 1.

10. 0 to 99.5% by weight of water, a basic substance or mixture containing 0.5 to 1.5% by weight of tetramethylammonium hydroxide, tetra-n-butylammonium hydroxide, potassium carbonate, sodium carbonate or ammonium carbonate; 0.001 to 0.5 wt. % of a dispersant, 0.001 to 0.5 wt. % of a wetting agent, 0.001 to 0.5 wt. % of a foam suppressor, and 0.001 to 0.5 wt. % of an antifoaming agent, 1. An antifouling composition comprising:

11. The antifouling composition according to claim 10, wherein the dispersant comprises an organic active material having a carbon-carbon triple bond with a Griffin hydrophilic-lipophilic balance (HLB) of 4 to 18, an organic active material having a carbon-carbon double bond and an aromatic ring structure with an HLB of 3 to 18, or a polycarboxylate polymer having a quaternary ammonium salt functional group.

12. The antifouling composition according to claim 10, wherein the wetting agent comprises at least one selected from the group consisting of monoethylene glycol, diethylene glycol, triethylene glycol, polyethylene glycol (number average molecular weight of 100 to 600), monoethylene glycol butyl ether, diethylene glycol butyl ether, triethylene glycol butyl ether, polyethylene glycol butyl ether, ethylene carbonate, propylene carbonate, an ethylene oxide adduct of 2 to 3 molecules of a C8-10 aliphatic alcohol, a copolymer adduct of ethylene oxide and propylene oxide (having less than 11 carbon atoms and an HLB of 4 to 10), an ethylene oxide adduct of a linear secondary alcohol (HLB of 4 to 10), and an ethylene oxide adduct of a branched secondary alcohol (HLB of 4 to 10).

13. The foam suppressor may be an ethylene oxide adduct of 2-3 molecules of natural C12-14 fatty alcohol, an ethylene oxide adduct of 2-3 molecules of isotridecanol, an ethylene oxide adduct of 2-3 molecules of isodecanol, an ethylene oxide adduct of 2-3 molecules of oleyl alcohol, an ethylene oxide adduct of 2-3 molecules of C16-18 fatty alcohol, a triblock copolymer of ethylene oxide / propylene oxide, a random copolymer of C8-14 fatty alcohol and ethylene oxide / propylene oxide, a block copolymer of C8-14 fatty alcohol and ethylene oxide / propylene oxide, a random copolymer of natural C12-14 fatty alcohol and ethylene oxide / propylene oxide, a natural C12-14 fatty alcohol 11. The antifouling composition according to claim 10, comprising at least one selected from the group consisting of a block copolymer of ethylene oxide and propylene oxide, a random copolymer of isotridecanol and ethylene oxide / propylene oxide, a block copolymer of isotridecanol and ethylene oxide / propylene oxide, a random copolymer of oleyl alcohol and ethylene oxide / propylene oxide, a block copolymer of oleyl alcohol and ethylene oxide / propylene oxide, a random copolymer of C16-18 aliphatic alcohol and ethylene oxide / propylene oxide, a block copolymer of C16-18 aliphatic alcohol and ethylene oxide / propylene oxide, and a polypropylene glycol having a number average molecular weight of less than 2000.

14. 11. The antifouling composition of claim 10, wherein the antifoaming agent comprises at least one selected from the group consisting of white mineral oil, palm kernel oil, palm stearin oil, horse oil, shea butter, and wax.

15. The antifouling composition according to claim 10, wherein the dispersant comprises at least one selected from the group consisting of 2,4,7,9-tetramethyl-5-decene-4,7-diol polyoxyethylene ether (HLB is 4 to 18), 2-butyne-1,4-diol polyoxyethylene ether (HLB is 4 to 18), 2,4,7,9-tetramethyl-5-decene-4,7-diol polyoxyethylene / polyoxypropylene polyether polyol (HLB is 4 to 18), 2-butyne-1,4-diol polyoxyethylene / polyoxypropylene polyether polyol (HLB is 4 to 18), bioderived cardanol polyoxyethylene ether (HLB is 3 to 18), nonylphenol polyoxyethylene ether (HLB is 3 to 18), alkylphenol polyoxyethylene ether (HLB is 3 to 18), and polycarboxylate polymers having quaternary ammonium salt functional groups.

16. A developer composition comprising a developer and the antifouling composition according to any one of claims 10 to 15.

17. A resist composition comprising a resist and the antifouling composition according to any one of claims 10 to 15.

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