Nitrogen-containing heterocyclic compound, material for metal patterning, thin film for metal patterning, organic electroluminescent element, electronic device, and method for forming metal pattern

Abstract

To provide a heterocyclic compound, a material for metal patterning that can highly suppress formation of a metal thin film on a film surface, a thin film for metal patterning using the material for metal patterning, an organic electroluminescent element, a method for forming a metal pattern, and an electronic device.SOLUTION: A nitrogen-containing heterocyclic compound, which is represented by a formula (G1) and the like, is used as a material for metal patterning.SELECTED DRAWING: None

Description

[Technical field]

[0001] The present disclosure relates to a nitrogen-containing heterocyclic compound, a material for metal patterning, a thin film for metal patterning, an organic electroluminescence element, an electronic device, and a method for forming a metal pattern. [Background technology]

[0002] In recent years, organic electronic devices such as organic electroluminescence (EL) elements, organic thin-film solar cells, organic transistors, and organic sensors have been widely developed. In organic electronic devices, metal thin films are used as electrodes, but it is necessary to pattern the metal thin films into desired shapes.

[0003] A known method for patterning a metal electrode is to form a patterned film of a metal patterning material with reduced metal adhesion as an underlayer, and then evaporate a metal from the underlayer. In this method, a metal film is selectively formed in the area where the metal patterning material is not formed, so that a metal electrode patterned in a desired shape can be formed.

[0004] Patent Document 1 discloses a technique for patterning magnesium metal using an anthracene derivative as a material for metal patterning. [Prior art documents] [Patent documents]

[0005] [Patent Document 1] International Publication No. 2020 / 225778 Summary of the Invention [Problem to be solved by the invention]

[0006] However, in the method of Patent Document 1, it is difficult to form a pattern while highly suppressing the deposition of the metal in places other than the desired places. Furthermore, it is difficult to pattern metals other than magnesium with the compound described in Patent Document 1.

[0007] Therefore, one aspect of the present disclosure is directed to providing metal patterning materials that can highly suppress the formation of various metal thin films on a film surface, thin films for metal patterning using these materials, organic electroluminescence elements, methods for forming metal patterns, and electronic devices. [Means for solving the problem]

[0008] Means for Solving the Problems The present inventors have conducted extensive research to solve the above problems, and as a result have found a specific compound, as described below, and a material for metal patterning containing the compound, thereby completing the present invention.

[0009] That is, the present disclosure includes the following embodiments. Effect of the Invention

[0010] According to one aspect of the present disclosure, there are provided a material for metal patterning that suppresses the formation of a metal thin film on a film surface, a novel nitrogen-containing heterocyclic compound, a thin film for metal patterning using the same, an organic electroluminescence element, a method for forming a metal pattern, and an electronic device. The nitrogen-containing heterocyclic compound of the present disclosure has excellent metal patterning properties and excellent adhesion to an underlayer and an adjacent thin film. DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS

[0011] Hereinafter, a material for metal patterning, a nitrogen-containing heterocyclic compound, a thin film for metal patterning, an organic electroluminescence element, an electronic device, and a method for forming a metal pattern according to one embodiment of the present disclosure will be described in detail.

[0012] [Metal patterning materials] A material for metal patterning according to one embodiment of the present disclosure comprises a nitrogen-containing heterocyclic compound having a fused ring skeleton represented by the following formula (G1) or (G2).

[0013] [ka]

[0014] In formula (G1), each A independently has a ring structure condensed with a nitrogen-containing heterocycle, and the ring structure is an aromatic hydrocarbon ring having 5 to 26 carbon atoms which may be substituted, or It represents an optionally substituted heteroaromatic ring having 3 to 26 carbon atoms.

[0015] B is bonded to a nitrogen-containing heterocycle or A, and O. S, NR 101 (R 101 represents a monocyclic, linked or fused aromatic hydrocarbon group having 6 to 26 carbon atoms, a monocyclic, linked or fused heteroaromatic group having 3 to 26 carbon atoms, a linear, branched or cyclic aliphatic hydrocarbon group having 1 to 18 carbon atoms, or formula (B1), a monocyclic, linked or condensed ring, optionally substituted, mono- to tetravalent aromatic hydrocarbon ring having 5 to 26 carbon atoms; a monocyclic, linked or fused ring, optionally substituted mono- to tetravalent heteroaromatic ring having 3 to 26 carbon atoms; a linear, branched or cyclic, optionally substituted, monovalent to tetravalent aliphatic hydrocarbon ring having 3 to 18 carbon atoms; or It represents a monocyclic, linked ring, or condensed ring which may be substituted, mono- to tetravalent, heteroaliphatic hydrocarbon ring having 3 to 20 carbon atoms.

[0016] R 1 are each independently N(R 101 )2(R 101 has the same definition as above.) Hydrogen atom, Halogen atoms, an optionally substituted monocyclic, linked or fused ring aromatic hydrocarbon group having 6 to 26 carbon atoms; an optionally substituted monocyclic, linked or fused ring heteroaromatic group having 3 to 26 carbon atoms; an optionally substituted linear, branched or cyclic aliphatic hydrocarbon group having 1 to 18 carbon atoms; an optionally substituted monocyclic, linked or fused heteroaliphatic hydrocarbon group having 3 to 26 carbon atoms; or It represents a group having a fluoroalkyl structure and is represented by the following formula (B1).

[0017] [ka]

[0018] In formula (B1), L 2 are each independently O. S, a linear, branched or cyclic divalent aliphatic hydrocarbon group having 1 to 18 carbon atoms which may be substituted with a fluorine atom; a vinylene group optionally substituted with fluorine, or It represents a vinylene group which may form a ring.

[0019] Each f independently represents an integer of 0 to 4.

[0020] Each g independently represents an integer of 1 to 4.

[0021] Each Rf independently represents a monovalent group having 1 to 18 carbon atoms and containing 3 or more fluorine atoms.

[0022] R 2 each independently represents a group having a fluoroalkyl structure and is represented by the above formula (B1).

[0023] x 101 each independently represents an integer of 0 to 5.

[0024] y 101each independently represents an integer of 1 to 6.

[0025] z 101 each independently represents an integer of 0 to 5.

[0026] v 101 each independently represents an integer of 0 to 5.

[0027] However, z 101 or v 101 One of the following represents an integer from 1 to 5.

[0028] [ka]

[0029] In formula (G2), two C's have a ring structure fused to the nitrogen-containing heterocycle shown in formula (G2), and the ring structure is each independently an aromatic hydrocarbon ring having 5 to 26 carbon atoms which may be substituted; an optionally substituted heteroaromatic ring having 3 to 26 carbon atoms; an optionally substituted aliphatic hydrocarbon ring having 5 to 18 carbon atoms, or It represents an optionally substituted heteroaliphatic hydrocarbon ring having 5 to 26 carbon atoms.

[0030] In addition, two C's may be condensed with each other.

[0031] R 3 represents a group having a fluoroalkyl structure and represented by the above formula (B1).

[0032] R 4 are each independently N(R 101 )2(R 101 has the same definition as above.) Hydrogen atom, Halogen atoms, an optionally substituted monocyclic, linked or fused ring aromatic hydrocarbon group having 6 to 26 carbon atoms; an optionally substituted monocyclic, linked or fused ring heteroaromatic group having 3 to 26 carbon atoms; an optionally substituted linear, branched or cyclic aliphatic hydrocarbon group having 1 to 18 carbon atoms; an optionally substituted monocyclic, linked or fused heteroaliphatic hydrocarbon group having 3 to 26 carbon atoms; or It represents a group having a fluoroalkyl structure and is represented by the above formula (B1).

[0033] X represents N or C.

[0034] r 101 each independently represents an integer of 1 to 6.

[0035] The compound represented by the above formula (G1) is a compound having a fused ring structure of a nitrogen-containing heterocycle and R 2 In addition, the compound represented by the formula (G2) has a fused ring structure of a nitrogen-containing heterocycle and a fluoroalkyl structure represented by the formula (G3). 3 By combining the fluoroalkyl structure represented by the following formula (1), the metal patterning material containing these compounds can highly inhibit the formation of a metal thin film on the film surface. Therefore, the compounds can be suitably used as metal patterning materials.

[0036] (R 2 , R 3 , Rf 001 About R in formula (G1) 2 , R in formula (G2) 3 represents a group having a fluoroalkyl structure and represented by the above formula (B1), which is preferably a group represented by the formula (001).

[0037] [ka]

[0038] In formula (001), Rf 001each independently represents a linear, branched or cyclic aliphatic hydrocarbon group having 1 to 18 carbon atoms and containing 3 or more fluorine atoms; L 001 are each independently O. S, a linear, branched or cyclic divalent aliphatic hydrocarbon group having 1 to 18 carbon atoms which may be substituted with a fluorine atom; a vinylene group optionally substituted with fluorine, or It represents a vinylene group which may form a ring.

[0039] Each a001 independently represents an integer of 0 to 4.

[0040] Each a002 independently represents an integer of 1 to 4.

[0041] The group represented by the formula (001) more preferably has a fluoroalkyl structure containing three or more fluorine atoms and having one or more carbon atoms.

[0042] In formula (001), Rf 001 can suppress the formation of a metal film on the film surface, and therefore, independently, the proportion of carbon atoms directly bonded to fluorine atoms among the carbon atoms forming the fluoroalkyl structure is preferably 30% or more, more preferably 50% or more, even more preferably 60% or more, even more preferably 70% or more, and particularly preferably 80% or more.

[0043] Rf 001 are each independently substituted with at least three fluorine atoms, since they can suppress the formation of a metal film on the film surface. More preferred are methyl, ethyl, n-propyl, n-butyl, n-pentyl, n-hexyl, n-heptyl, n-octyl, and alkyl groups that are structurally isomeric with these alkyl groups, as well as cyclopropyl, cyclobutyl, cyclopentyl, 1-methylcyclopentyl, cyclopentylmethyl, cyclohexyl, and adamantyl groups.

[0044] L 001 As the above, the formation of a metal film on the film surface can be suppressed, and therefore, each of the following can be independently selected: O. S, which may be substituted with a fluorine atom; More preferred are a methanediyl group, an ethanediyl group, an n-propanediyl group, an n-butanediyl group, an n-pentanediyl group, an n-hexanediyl group, an n-heptanediyl group, an n-octanediyl group, and alkanediyl groups which are structurally isomeric with these alkanediyl groups, as well as a cyclopropanediyl group, a cyclobutanediyl group, a cyclopentanediyl group, a 1-methylcyclopentanediyl group, a cyclopentanediyl group, a cyclohexanediyl group, an adamantanediyl group, or a vinylene group.

[0045] Each a001 independently represents preferably 0 to 3, and more preferably 0 to 2.

[0046] Each a002 independently is preferably 1 to 3, and more preferably 1 or 2.

[0047] The group represented by formula (001) preferably has 1 or more and 36 or less, more preferably 1 or more and 34 or less, and even more preferably 1 or more and 32 or less.

[0048] (Specific examples of fluoroalkyl structures) Examples of the group represented by formula (B1) include the structures shown in the following (AAA1) to (AAA126).

[0049] [ka]

[0050] [ka]

[0051] [ka]

[0052] [ka]

[0053] [ka]

[0054] [ka]

[0055] [ka]

[0056] (Regarding A) In formula (G1), each A independently represents an optionally substituted aromatic hydrocarbon ring having 5 to 26 carbon atoms, or an optionally substituted heteroaromatic ring having 3 to 26 carbon atoms.

[0057] The optionally substituted aromatic hydrocarbon ring having 5 to 26 carbon atoms is preferably, for example, a monocyclic, linked ring, or condensed ring, optionally substituted aromatic hydrocarbon ring having 5 to 26 carbon atoms.

[0058] The optionally substituted heteroaromatic ring having 3 to 26 carbon atoms is preferably, for example, a monocyclic, linked, or condensed heteroaromatic ring having 3 to 26 carbon atoms which is optionally substituted.

[0059] A is independently a monocyclic, linked or fused aromatic hydrocarbon ring having 5 to 26 carbon atoms and having at least one structure selected from the group consisting of a benzene ring, a biphenyl ring, a terphenyl ring, a naphthalene ring, a fluorene ring, a spirobifluorene ring, a 9,9-dimethylfluorene ring, a 9,9-diphenylfluorene ring, a benzofluorene ring, a phenanthrene ring, a fluoranthene ring, a triphenylene ring, an anthracene ring, a pyrene ring, a chrysene ring, a perylene ring, a benzochrysene ring, and a dibenzochrysene ring (these rings may be substituted); or It is more preferable that the heteroaromatic ring is a monocyclic, linked or condensed heteroaromatic ring having 3 to 26 carbon atoms (these rings may be substituted) having at least one structure selected from the group consisting of a pyridine ring, a pyrimidine ring, a pyrazine ring, a triazine ring, a carbazole ring, a quinoline ring, an isoquinoline ring, a quinazoline ring, a furan ring, a thiophene ring, a pyrrole ring, a benzofuran ring, a benzothiophene ring, an indole ring, a benzodioxin ring, a dibenzofuran ring, a dibenzothiophene ring, a thiazole ring, a dibenzodioxin ring, and a benzothiazole ring.

[0060] Each A is independently It is even more preferable that the ring is a benzene ring, a naphthalene ring, a fluorene ring, a spirobifluorene ring, a phenanthrene ring, a fluoranthene ring, a pyrene ring, an anthracene ring, a pyridine ring, a pyrazine ring, a pyrimidine ring, a triazine ring, a quinazoline ring, a thiophene ring, a benzothiophene ring, a furan ring, a benzofuran ring, a dibenzofuran ring, a pyrrole ring, or a carbazole ring (these rings may be substituted).

[0061] A is independently It is even more preferable that the ring is a benzene ring, a naphthalene ring, a fluorene ring, an anthracene ring, a pyridine ring, a pyrazine ring, a pyrimidine ring, a triazine ring, a quinazoline ring, a thiophene ring, a benzothiophene ring, a furan ring, a benzofuran ring, a pyrrole ring, or a carbazole ring (these rings may be substituted).

[0062] When A is a substituted aromatic hydrocarbon ring having 5 to 26 carbon atoms, or a substituted heteroaromatic ring having 3 to 26 carbon atoms, each of these substituents represented by "substituted" is independently A linear, branched, or cyclic aliphatic hydrocarbon group having 1 to 18 carbon atoms, A linear, branched, or cyclic alkoxy group having 1 to 18 carbon atoms, an aromatic hydrocarbon group having 6 to 20 carbon atoms; a heteroaromatic group having 3 to 20 carbon atoms; a cyclic heteroaliphatic hydrocarbon group having 6 to 20 carbon atoms, a cyano group, a fluorine atom, a deuterium atom, a group represented by formula (B1), or A combination of these groups is preferred.

[0063] When A is a substituted aromatic hydrocarbon ring having 5 to 26 carbon atoms or a substituted heteroaromatic ring having 3 to 26 carbon atoms, these substituents are each independently a methyl group, an ethyl group, a methoxy group, an ethoxy group, a trifluoromethyl group, a trifluoromethoxy group, a perfluoroalkyl group having 2 to 10 carbon atoms, a perfluoroalkoxy group having 2 to 10 carbon atoms, a cyano group, a deuterium atom, a fluorine atom, a phenyl group which may be substituted with a fluorine atom, a biphenylyl group which may be substituted with a fluorine atom, a naphthyl group which may be substituted with a fluorine atom, a phenanthryl group which may be substituted with a fluorine atom, a pyridyl group which may be substituted with a fluorine atom, a pyrimidyl group which may be substituted with a fluorine atom, a carbazolyl group which may be substituted with a fluorine atom, a quinazolyl group which may be substituted with a fluorine atom, a dibenzothienyl group which may be substituted with a fluorine atom, a dibenzofuranyl group which may be substituted with a fluorine atom, a group represented by formula (B1), or A combination of these groups is preferred.

[0064] (B bonding position) In formula (G1), when B is a heteroaromatic ring, the bond formed between B and the nitrogen-containing heterocycle fused with A is limited to a carbon atom of the heteroaromatic ring. However, two or more nitrogen-containing heterocycles fused with A cannot be bonded to the carbon atom at the same time.

[0065] (Regarding B) In formula (G1), each B is independently O. S, NR 101 , a monocyclic, linked or condensed ring, optionally substituted, mono- to tetravalent aromatic hydrocarbon ring having 5 to 26 carbon atoms; a monocyclic, linked or fused ring, optionally substituted mono- to tetravalent heteroaromatic ring having 3 to 26 carbon atoms; a linear, branched or cyclic, optionally substituted, monovalent to tetravalent aliphatic hydrocarbon ring having 3 to 18 carbon atoms; or It represents a monocyclic, linked ring, or condensed ring which may be substituted, mono- to tetravalent, heteroaliphatic hydrocarbon ring having 3 to 20 carbon atoms.

[0066] Examples of compounds that provide the monocyclic, linked, or fused, optionally substituted, mono- to tetravalent aromatic hydrocarbon ring having 5 to 26 carbon atoms include benzene, biphenyl, terphenyl, naphthalene, fluorene, spirobifluorene, 9,9-dimethylfluorene, 9,9-diphenylfluorene, benzofluorene, phenanthrene, fluoranthene, triphenyl, anthracene, pyrene, chrysene, perylene, benzochrysene, dibenzochrysene, triptycene, and corannulene.

[0067] Examples of compounds that provide the monocyclic, linked, or fused, optionally substituted, mono- to tetravalent heteroaromatic ring having 3 to 26 carbon atoms include pyridine, pyrimidine, pyrazine, triazine, carbazole, quinazoline, furan, thiophene, benzofuran, benzothiophene, dibenzofuran, dibenzothiophene, thiazoline, thiadiazoline, acridine, phenoxazine, phenothiazine, and benzothiazoline.

[0068] Examples of compounds that provide the linear, branched or cyclic, optionally substituted, mono- to tetravalent aliphatic hydrocarbon ring having 3 to 18 carbon atoms include adamantane, diamantane, norbornene, cyclohexane, methane, ethane, propane, isopropane, butane, isobutane, heptane, octane, nonane, decane, undecane, dodecane, tridecane, tetradecane, pentadecane, hexadecane, heptadecane, octadecane, nonadecane, and eicodecane.

[0069] Examples of compounds that provide the monocyclic, linked, or fused heteroaliphatic hydrocarbon ring having 3 to 20 carbon atoms which may be substituted include pyrrolidine, piperidine, piperazine, homopiperazine, dihydroacridine, 1,2,3,4-tetrahydroquinoxaline, 2,3,4,5-tetrahydro-1H-benzo[b][1,4]diazapine, and 2,3,4,5-tetrahydro-1H-1,4-benzodiazepine.

[0070] The compound providing the monocyclic, linked or fused, optionally substituted, monovalent to tetravalent aromatic hydrocarbon ring having 5 to 26 carbon atoms is preferably, independently, benzene, biphenyl, naphthalene, 9,9-dimethylfluorene, 9,9-diphenylfluorene, benzofluorene, phenanthrene, fluoranthene, triphenyl, anthracene, chrysene, perylene, benzochrysene, or corannulene.

[0071] The compound providing the monocyclic, linked or fused ring, optionally substituted, mono- to tetravalent heteroaromatic ring having 3 to 26 carbon atoms is preferably, independently, pyridine, pyrimidine, pyrazine, pyrimidine, triazine, carbazole, quinazoline, thiophene, benzothiophene, dibenzofuran, dibenzothiophene, thiazoline, thiadiazoline, phenoxazine, phenothiazine or benzothiazoline.

[0072] As the compound which gives the linear, branched or cyclic, optionally substituted, mono- to tetravalent aliphatic hydrocarbon group having 3 to 18 carbon atoms, each independently preferably is adamantane, norbornene, cyclohexane, methane, ethane, propane, isopropane, butane, isobutane, heptane, octane, nonane, decane, undecane, dodecane, tridecane, tetradecane, pentadecane, hexadecane or heptadecane.

[0073] As the compound which gives the monocyclic, linked or fused ring, optionally substituted mono- to tetravalent heteroaliphatic hydrocarbon ring having 3 to 20 carbon atoms, each independently is preferably pyrrolidine, piperidine, piperazine, homopiperazine, dihydroacridine, or 1,2,3,4-tetrahydroquinoxaline.

[0074] When B is a substituted mono- to tetravalent aromatic hydrocarbon ring having 5 to 26 carbon atoms, a substituted mono- to tetravalent heteroaromatic ring having 3 to 26 carbon atoms, a substituted mono- to tetravalent aliphatic hydrocarbon group having 3 to 18 carbon atoms, or a substituted mono- to tetravalent heteroaliphatic hydrocarbon ring having 3 to 20 carbon atoms, these substituents represented by "substituted" are each independently A linear, branched, or cyclic aliphatic hydrocarbon group having 1 to 18 carbon atoms, A linear, branched, or cyclic alkoxy group having 1 to 18 carbon atoms, an aromatic hydrocarbon group having 6 to 20 carbon atoms; a heteroaromatic group having 3 to 20 carbon atoms; a cyclic heteroaliphatic hydrocarbon group having 6 to 20 carbon atoms, a cyano group, a fluorine atom, a deuterium atom, a group represented by formula (B1), or A combination of these groups is preferred, each of which is independently a methyl group, an ethyl group, a methoxy group, an ethoxy group, a trifluoromethyl group, a trifluoromethoxy group, a perfluoroalkyl group having 2 to 10 carbon atoms, a perfluoroalkoxy group having 2 to 10 carbon atoms, a cyano group, a deuterium atom, a fluorine atom, a phenyl group which may be substituted with a fluorine atom, a biphenylyl group which may be substituted with a fluorine atom, a naphthyl group which may be substituted with a fluorine atom, a phenanthryl group which may be substituted with a fluorine atom, a pyridyl group which may be substituted with a fluorine atom, a pyrimidyl group which may be substituted with a fluorine atom, a carbazolyl group which may be substituted with a fluorine atom, a quinazolyl group which may be substituted with a fluorine atom, a dibenzothienyl group which may be substituted with a fluorine atom, a dibenzofuranyl group which may be substituted with a fluorine atom, a group represented by formula (B1), or A combination of these groups is more preferred.

[0075] When B is a substituted mono- to tetravalent aromatic ring having 5 to 26 carbon atoms or a substituted mono- to tetravalent heterocycle having 3 to 26 carbon atoms, each of these substituents represented by "substituted" is independently a methyl group, an ethyl group, a methoxy group, an ethoxy group, a trifluoromethyl group, a trifluoromethoxy group, a perfluoroalkyl group having 2 to 10 carbon atoms, a perfluoroalkoxy group having 2 to 10 carbon atoms, a cyano group, a deuterium atom, a fluorine atom, a phenyl group which may be substituted with a fluorine atom, a biphenylyl group which may be substituted with a fluorine atom, a naphthyl group which may be substituted with a fluorine atom, a phenanthryl group which may be substituted with a fluorine atom, a pyridyl group which may be substituted with a fluorine atom, a pyrimidyl group which may be substituted with a fluorine atom, a carbazolyl group which may be substituted with a fluorine atom, a quinazolyl group which may be substituted with a fluorine atom, a dibenzothienyl group which may be substituted with a fluorine atom, a dibenzofuranyl group which may be substituted with a fluorine atom, a structure represented by formula (B1), or A combination of these groups is more preferred.

[0076] (About C) In formula (G2), each C is independently at least one monocyclic, linked or fused aromatic hydrocarbon ring having 5 to 26 carbon atoms selected from the group consisting of a benzene ring, a biphenyl ring, a terphenyl ring, a naphthalene ring, a fluorene ring, a spirobifluorene ring, a 9,9-dimethylfluorene ring, a 9,9-diphenylfluorene ring, a benzofluorene ring, a phenanthrene ring, a fluoranthene ring, a triphenylyl ring, an anthracene ring, a pyrene ring, a chrysene ring, a perylene ring, a benzochrysene ring, a dibenzochrysene ring, a triptycene ring, and a corannulene ring (these rings may have a substituent); at least one monocyclic, linked or condensed heteroaromatic ring having 3 to 26 carbon atoms selected from the group consisting of a pyridine ring, a pyrimidine ring, a pyrazine ring, a pyrimidine ring, a triazine ring, a carbazole ring, a quinazoline ring, a furan ring, a thiophene ring, a benzofuran ring, a benzothiophene ring, a dibenzofuran ring, a dibenzothiophene ring, a thiazoline ring, a thiadiazoline ring, a thianthrine ring, an acridine ring, a phenoxazine ring, a phenothiazine ring, a benzothiazoline ring, and a carbasolyl ring (these rings may have a substituent); At least one monocyclic, linked or fused aliphatic hydrocarbon ring having 5 to 18 carbon atoms selected from the group consisting of an adamantane ring, a diamantane ring, a norbornene ring, and a cyclohexane ring (these rings may be substituted); or It is preferably at least one type of monocyclic, linked or fused heteroaliphatic hydrocarbon ring having 5 to 26 carbon atoms selected from the group consisting of a pyrrolidine ring, a piperidine ring, a piperazine ring, a homopiperazine ring, and a dihydroacridine ring (these rings may be substituted).

[0077] C is at least one monocyclic, linked or fused aromatic hydrocarbon ring having 5 to 26 carbon atoms selected from the group consisting of a benzene ring, a biphenyl ring, a terphenyl ring, a naphthalene ring, a fluorene ring, a spirobifluorene ring, a 9,9-dimethylfluorene ring, a 9,9-diphenylfluorene ring, a benzofluorene ring, a phenanthrene ring, a fluoranthene ring, a triphenylyl ring, an anthracene ring, a pyrene ring, a chrysene ring, a perylene ring, a benzochrysene ring, a dibenzochrysene ring, a triptycene ring, and a corannulene ring (these rings may have a substituent); at least one monocyclic, linked or fused heteroaromatic ring having 3 to 26 carbon atoms selected from the group consisting of a pyridine ring, a pyrimidine ring, a pyrazine ring, a pyrimidine ring, a triazine ring, a carbazole ring, a quinazoline ring, a furan ring, a thiophene ring, a benzofuran ring, a benzothiophene ring, a dibenzofuran ring, a dibenzothiophene ring, a thiazoline ring, a thiadiazoline ring, a thianthrine ring, an acridine ring, a phenoxazine ring, a phenothiazine ring, a benzothiazoline ring, and a carbasolyl ring (these rings may have a substituent); At least one aliphatic hydrocarbon ring having 5 to 18 carbon atoms selected from the group consisting of an adamantane ring, a diamantane ring, a norbornene ring, and a cyclohexane ring (these rings may have a substituent), or At least one type of monocyclic, linked or condensed heteroaliphatic hydrocarbon ring having 5 to 26 carbon atoms selected from the group consisting of a pyrrolidine ring, a piperidine ring, a piperazine ring, a homopiperazine ring, and a dihydroacridine ring (these rings may have a substituent).

[0078] C is at least one monocyclic, linked or condensed aromatic hydrocarbon ring having 5 to 26 carbon atoms selected from the group consisting of a benzene ring, a naphthalene ring, a phenanthrene ring, a fluoranthene ring, a pyrene ring, a chrysene ring, and a perylene ring (these rings may have a substituent); at least one monocyclic, linked or fused heteroaromatic ring having 3 to 26 carbon atoms selected from the group consisting of a pyridine ring, a pyrimidine ring, a pyrazine ring, a pyrimidine ring, a triazine ring, a furan ring, a thiophene ring, a benzothiazoline ring, and a carbazole ring (these rings may have a substituent); At least one cyclic aliphatic hydrocarbon group having 5 to 18 carbon atoms selected from the group consisting of an adamantane ring and a cyclohexane ring (these rings may have a substituent), or More preferred is at least one monocyclic, linked or condensed heteroaliphatic hydrocarbon ring having 5 to 26 carbon atoms selected from the group consisting of a piperidine ring, a pyrazine ring, and a homopiperazine ring (these rings may have a substituent).

[0079] It is even more preferable that C is a benzene ring, a naphthalene ring, a perylene ring, a pyridine ring, a pyrimidine ring, a pyrazine ring, a pyrimidine ring, a triazine ring, an adamantane ring, a cyclohexane ring, a piperidine ring, or a piperazine ring (these rings may have a substituent).

[0080] In formula (G1), when C is a ring having substituents, these substituents are each independently A linear, branched, or cyclic aliphatic hydrocarbon group having 1 to 18 carbon atoms, A linear, branched, or cyclic alkoxy group having 1 to 18 carbon atoms, an aromatic hydrocarbon group having 6 to 20 carbon atoms; a heteroaromatic group having 3 to 20 carbon atoms; a heteroaliphatic hydrocarbon group having 6 to 20 carbon atoms; a cyano group, a fluorine atom, a deuterium atom, a group represented by formula (B1), or A combination of these groups is preferred.

[0081] With respect to the above-mentioned substituents, a methyl group, an ethyl group, a methoxy group, an ethoxy group, a trifluoromethyl group, a trifluoromethoxy group, a perfluoroalkyl group having 2 to 10 carbon atoms, a perfluoroalkoxy group having 2 to 10 carbon atoms, a cyano group, a deuterium atom, a fluorine atom, a phenyl group which may be substituted with a fluorine atom, a biphenylyl group which may be substituted with a fluorine atom, a naphthyl group which may be substituted with a fluorine atom, a phenanthryl group which may be substituted with a fluorine atom, a pyridyl group which may be substituted with a fluorine atom, a pyrimidyl group which may be substituted with a fluorine atom, a carbazolyl group which may be substituted with a fluorine atom, a quinazolyl group which may be substituted with a fluorine atom, a dibenzothienyl group which may be substituted with a fluorine atom, a dibenzofuranyl group which may be substituted with a fluorine atom, a group represented by formula (B1), or A combination of these groups is more preferred.

[0082] With respect to the above-mentioned substituents, a methyl group, a methoxy group, a trifluoromethyl group, a trifluoromethoxy group, a perfluoroalkyl group having 2 to 10 carbon atoms, a perfluoroalkoxy group having 2 to 10 carbon atoms, a fluorine atom, a phenyl group which may be substituted with a fluorine atom, a naphthyl group which may be substituted with a fluorine atom, a pyridyl group which may be substituted with a fluorine atom, a pyrimidyl group which may be substituted with a fluorine atom, a quinazolyl group which may be substituted with a fluorine atom, a dibenzothienyl group which may be substituted with a fluorine atom, a dibenzofuranyl group which may be substituted with a fluorine atom, a group represented by formula (B1), or A combination of these groups is more preferred.

[0083] With respect to the above-mentioned substituents, a methyl group, a trifluoromethyl group, a trifluoromethoxy group, a perfluoroalkyl group having 2 to 10 carbon atoms, a perfluoroalkoxy group having 2 to 10 carbon atoms, a fluorine atom, a phenyl group which may be substituted with a fluorine atom, a pyridyl group which may be substituted with a fluorine atom, a pyrimidyl group which may be substituted with a fluorine atom, a group represented by formula (B1), or It is even more preferable that these groups are combined.

[0084] (R 2 and R 3 About R in formula (G1) 2 , R in formula (G2) 3 is a group represented by the above formula (B1), and as described above, a group represented by the above formula (001) is more preferable.

[0085] (R 1 , R 2 , R 4 Regarding the bonding position of In formula (G1), R 1 , R 2 does not bond to the nitrogen atom. That is, R 1 , R 2 R is bonded to a carbon atom that forms a heterocycle with the nitrogen atom. 2 The carbon atom to which is not bonded is R 1 can be bonded. Note that R 1 , R 2 There is no particular limitation on the position at which R is bonded, but 1 , R 2 , R 4 One of them will bind, and two or more will not.

[0086] R 1 , R 2 In formula (G1), is bonded to the heterocycle having a nitrogen atom and is not bonded to A.

[0087] R 4 In formula (G2), is bonded to C and is not bonded to the heterocycle having a nitrogen atom.

[0088] R 4 There is no particular limitation on the position at which R is bonded, but 4 One of them will bind, and two or more will not.

[0089] (R 3 Regarding the bonding position of R 3 is bonded to the heterocycle having a nitrogen atom in formula (G2).

[0090] (R 1 and R 4 About R in formula (G1) 1 , R in formula (G2) 4 teeth, at least one optionally substituted monocyclic, linked or fused aromatic hydrocarbon group having 6 to 26 carbon atoms selected from the group consisting of a phenyl group, a biphenyl group, a terphenyl group, a naphthyl group, a fluorenyl group, a spirobifluorenyl group, a 9,9-dimethylfluorenyl group, a 9,9-diphenylfluorenyl group, a benzofluorenyl group, a phenanthryl group, a fluoranthenyl group, a triphenylyl group, an anthryl group, a pyrenyl group, a chrysenyl group, a perylenyl group, a benzochrysenyl group, a dibenzochrysenyl group, a triptycenyl group, and a corannulenyl group; at least one optionally substituted monocyclic, linked or fused ring heteroaromatic group having 3 to 26 carbon atoms selected from the group consisting of a pyridyl group, a pyrimidyl group, a pyrazyl group, a pyrimidyl group, a triazyl group, a carbazolyl group, a quinazoline group, a furanyl group, a thienyl group, a benzofuranyl group, a benzothienyl group, a dibenzofuranyl group, a dibenzothienyl group, a thiazolyl group, a thiadiazolyl group, a thianthryl group, an acridyl group, a phenoxazyl group, a phenothiazyl group, a benzothiazolyl group, and a carbazolyl group; at least one optionally substituted linear, branched or cyclic aliphatic hydrocarbon group having 1 to 18 carbon atoms selected from the group consisting of an adamantyl group, a diamantyl group, a norbornyl group, a cyclohexyl group, a methyl group, an ethyl group, a propyl group, an isopropyl group, a butyl group, an isobutyl group, a heptyl group, an octyl group, a nonyl group, a decyl group, an undecyl group, a dodecyl group, a tridecyl group, a tetradecyl group, a pentadecyl group, a hexadecyl group, a heptadecyl group, an octadecyl group, a nonadecyl group, and an eicodecyl group; at least one optionally substituted monocyclic, linked or fused heteroaliphatic hydrocarbon group having 3 to 26 carbon atoms selected from the group consisting of a pyrrolidine group, a piperidyl group, a piperadyl group, a homopiperazyl group, and a dihydroacridyl group; N(R 101 )2, or A group represented by formula (B1) is preferred.

[0091] R 1 or R 4 teeth, at least one optionally substituted monocyclic, linked or fused ring aromatic hydrocarbon group having 6 to 26 carbon atoms selected from the group consisting of a phenyl group, a biphenyl group, a naphthyl group, a 9,9-dimethylfluorenyl group, a 9,9-diphenylfluorenyl group, a benzofluorenyl group, a phenanthryl group, a fluoranthenyl group, a triphenylyl group, an anthryl group, a pyrenyl group, a chrysenyl group, a perylenyl group, a benzochrysenyl group, and a corannulenyl group; at least one optionally substituted monocyclic, linked or fused heteroaromatic group having 3 to 26 carbon atoms selected from the group consisting of a pyridyl group, a pyrimidyl group, a pyrazyl group, a pyrimidyl group, a triazyl group, a carbazolyl group, a quinazoline group, a thienyl group, a benzothienyl group, a dibenzofuranyl group, a dibenzothienyl group, a thiadiazolyl group, a phenoxazyl group, a phenothiazyl group, a benzothiazolyl group, and a carbazolyl group; at least one optionally substituted linear, branched or cyclic aliphatic hydrocarbon group having 1 to 18 carbon atoms selected from the group consisting of an adamantyl group, a norbornyl group, a cyclohexyl group, a methyl group, an ethyl group, a propyl group, an isopropyl group, a butyl group, an isobutyl group, a heptyl group, an octyl group, a nonyl group, a decyl group, an undecyl group, a dodecyl group, a tridecyl group, a tetradecyl group, and a pentadecyl group, or It is more preferable that the alkyl group is at least one optionally substituted monocyclic, linked or fused heteroaliphatic hydrocarbon group having 3 to 26 carbon atoms selected from the group consisting of a pyrrolidine group, a piperidyl group, a piperadyl group, and a homopiperazyl group.

[0092] R 1 or R 4 teeth, at least one optionally substituted monocyclic, linked or fused aromatic hydrocarbon group having 6 to 26 carbon atoms selected from the group consisting of a phenyl group, a biphenyl group, a naphthyl group, a 9,9-dimethylfluorenyl group, a phenanthryl group, an anthryl group, a pyrenyl group, and a benzochrysenyl group; at least one optionally substituted monocyclic, linked or fused ring heteroaromatic group having 3 to 26 carbon atoms selected from the group consisting of a pyridyl group, a pyrimidyl group, a pyrazyl group, a pyrimidyl group, a triazyl group, a carbazolyl group, a quinazoline group, a thienyl group, a dibenzothienyl group, a thiadiazolyl group, and a carbazolyl group; at least one optionally substituted linear, branched or cyclic aliphatic hydrocarbon group having 1 to 18 carbon atoms selected from the group consisting of an adamantyl group, a norbornyl group, a cyclohexyl group, a methyl group, an ethyl group, a propyl group, an isopropyl group, a butyl group, an isobutyl group, a heptyl group, an octyl group, a nonyl group, a decyl group, an undecyl group, and a dodecyl group, or It is even more preferable that the alkyl group is at least one optionally substituted monocyclic, linked or fused heteroaliphatic hydrocarbon group having 3 to 26 carbon atoms selected from the group consisting of a pyrrolidine group, a piperidyl group, and a homopiperazyl group.

[0093] R 1 or R 4 When is a ring having substituents, the substituents are each independently A linear, branched, or cyclic aliphatic hydrocarbon group having 1 to 18 carbon atoms, a linear, branched, or cyclic alkoxy group having 1 to 18 carbon atoms; an aromatic hydrocarbon group having 6 to 20 carbon atoms; a heteroaromatic group having 3 to 20 carbon atoms; a fluorine atom, a deuterium atom, a group represented by formula (B1), or A combination of these groups is preferred.

[0094] R 1or R 4 When the group has a substituent, the substituents are each independently a methyl group, an ethyl group, a methoxy group, an ethoxy group, a trifluoromethyl group, a trifluoromethoxy group, a perfluoroalkyl group having 2 to 10 carbon atoms, a perfluoroalkoxy group having 2 to 10 carbon atoms, a cyano group, a deuterium atom, a fluorine atom, a phenyl group which may be substituted with a fluorine atom, a biphenylyl group which may be substituted with a fluorine atom, a naphthyl group which may be substituted with a fluorine atom, a phenanthryl group which may be substituted with a fluorine atom, a pyridyl group which may be substituted with a fluorine atom, a pyrimidyl group which may be substituted with a fluorine atom, a carbazolyl group which may be substituted with a fluorine atom, a quinazolyl group which may be substituted with a fluorine atom, a dibenzothienyl group which may be substituted with a fluorine atom, a dibenzofuranyl group which may be substituted with a fluorine atom, a group represented by formula (B1), or A combination of these groups is more preferred.

[0095] R 1 or R 4 When the group has a substituent, the substituents are each independently a methyl group, a methoxy group, a trifluoromethyl group, a trifluoromethoxy group, a perfluoroalkyl group having 2 to 10 carbon atoms, a perfluoroalkoxy group having 2 to 10 carbon atoms, a cyano group, a deuterium atom, a fluorine atom, a phenyl group which may be substituted with a fluorine atom, a naphthyl group which may be substituted with a fluorine atom, a pyridyl group which may be substituted with a fluorine atom, a pyrimidyl group which may be substituted with a fluorine atom, a carbazolyl group which may be substituted with a fluorine atom, a quinazolyl group which may be substituted with a fluorine atom, a group represented by formula (B1), or A combination of these groups is more preferred.

[0096] (R 2 , R 3 About R in formula (G1) 2 and R in formula (G2) 3represents a group having a fluoroalkyl structure and is represented by the formula (B1).

[0097] To highly suppress the formation of a thin metal film on the film surface, 2 or R 3 It is preferable that the nitrogen-containing heterocyclic compound contains one or more of the following.

[0098] (R 101 About R 101 teeth, Phenyl group, biphenyl group, terphenyl group, naphthyl group, fluorene group, spirobifluorene group, 9,9-dimethylfluorene group, 9,9-diphenylfluorene group, benzofluorene group, phenanthrene group, fluoranthene group, triphenylene group, anthracene group, pyrene group, chrysene group, perylene group, benzochrysene group, dibenzochrysene group, triptycene group, corannulene group, pyridine group, pyrimidine group, pyrazine group, triazine group, carbazole group, furan group, thiophene group, benzyl group, a benzofuran group, a benzothiophene group, a dibenzofuran group, a dibenzothiophene group, a thiazole group, a thiadiazole group, a thianthrene group, an acridine group, a dihydroacridine group, a phenoxazine group, a phenothiazine group, a benzothiazole group, a methyl group, an ethyl group, a propyl group, a pentyl group, a hexyl group, a heptyl group, an octyl group, a cyclopentyl group, a cyclohexyl group, a cycloheptyl group, a cyclooctyl group, an adamantane group, a diamantane group, a norbornene group, a group represented by formula (B1), or A combination of these groups is preferred.

[0099] R 101 teeth, a phenyl group, a biphenyl group, a naphthyl group, a fluorene group, a 9,9-dimethylfluorene group, a 9,9-diphenylfluorene group, a benzofluorene group, a phenanthrene group, an anthracene group, a pyrene group, a benzochrysene group, a dibenzochrysene group, a corannulene group, a pyridine group, a pyrimidine group, a pyrazine group, a triazine group, a carbazole group, a furan group, a thiophene group, a benzofuran group, a benzothiophene group, a dibenzofuran group, a dibenzothiophene group, a thiazole group, a thiadiazole group, a thianthrene group, a phenoxazine group, a phenothiazine group, a benzothiazole group, a methyl group, an ethyl group, a propyl group, a pentyl group, a hexyl group, a heptyl group, an octyl group, a cyclopentyl group, a cyclohexyl group, a cycloheptyl group, a cyclooctyl group, an adamantane group, a group represented by formula (B1), or A combination of these groups is more preferred.

[0100] R 101 When is a ring having substituents, the substituents are each independently A linear, branched, or cyclic aliphatic hydrocarbon group having 1 to 18 carbon atoms, a linear, branched, or cyclic alkoxy group having 1 to 18 carbon atoms; an aromatic hydrocarbon group having 6 to 20 carbon atoms; a heteroaromatic group having 3 to 20 carbon atoms; a fluorine atom, a deuterium atom, a group represented by formula (B1), or A combination of these groups is preferred.

[0101] R 101 When is a ring having substituents, the substituents are each independently a methyl group, an ethyl group, a methoxy group, an ethoxy group, a trifluoromethyl group, a trifluoromethoxy group, a perfluoroalkyl group having 2 to 10 carbon atoms, a perfluoroalkoxy group having 2 to 10 carbon atoms, a cyano group, a deuterium atom, a fluorine atom, a phenyl group which may be substituted with a fluorine atom, a biphenylyl group which may be substituted with a fluorine atom, a naphthyl group which may be substituted with a fluorine atom, a phenanthryl group which may be substituted with a fluorine atom, a pyridyl group which may be substituted with a fluorine atom, a carbazolyl group which may be substituted with a fluorine atom, a dibenzothienyl group which may be substituted with a fluorine atom, a dibenzofuranyl group which may be substituted with a fluorine atom, a group represented by the formula (001), or A combination of these groups is more preferred.

[0102] R 101 When is a ring having substituents, the substituents are each independently a phenyl group, a biphenyl group, a naphthyl group, a 9,9-dimethylfluorenyl group, a phenanthryl group, a pyridyl group, a pyrimidyl group, a pyrazyl group, a pyrimidyl group, a triazyl group, a carbazolyl group, a quinazoline group, a benzofuranyl group, a benzothiazolyl group, an adamantyl group, a diamantyl group, a norbornyl group, a cyclohexyl group, a methyl group, an ethyl group, a propyl group, an isopropyl group, a butyl group, an isobutyl group, a heptyl group, an octyl group, a nonyl group, a decyl group, an undecyl group, a dodecyl group, a trifluoromethyl group, a perfluoroalkyl group having 2 to 10 carbon atoms, a group represented by the formula (B1), or A combination of these groups is more preferred.

[0103] R 101 When is a ring having substituents, the substituents are each independently a phenyl group, a naphthyl group, a 9,9-dimethylfluorenyl group, a pyridyl group, a pyrimidyl group, a pyrazyl group, a pyrimidyl group, a triazyl group, a carbazolyl group, a quinazoline group, a benzofuranyl group, a benzothiazolyl group, an adamantyl group, a cyclohexyl group, a methyl group, an ethyl group, a propyl group, an isopropyl group, a butyl group, an isobutyl group, a heptyl group, an octyl group, a trifluoromethyl group, a perfluoroalkyl group having 2 to 10 carbon atoms, a group represented by the formula (B1), or It is even more preferable that these groups are combined. The molecular weight of the compound represented by formula (G1) or (G2) is preferably 600 or more and 8,000 or less, more preferably 600 or more and 5,000 or less, even more preferably 600 or more and 4,000 or less, and particularly preferably 600 or more and 3,500 or less.

[0104] The nitrogen-containing heterocyclic compound according to one embodiment of the present disclosure preferably has one or more substituents represented by the above formula (B1) in the molecule.

[0105] x 101 are each independently preferably 0 to 3, more preferably 0 to 2, and further preferably 0 or 1.

[0106] y 101 are each independently preferably 1 to 3, more preferably 1 or 2, and even more preferably 1.

[0107] z 101 are each independently preferably 0 to 3, more preferably 0 to 2, and further preferably 0 or 1.

[0108] v 101 are each independently preferably 0 to 4, more preferably 0 to 3, and further preferably 0 to 2.

[0109] r 101 are each independently preferably 1 to 4, more preferably 1 to 3, and further preferably 1 or 2.

[0110] Each f is preferably 0 to 3, and more preferably 0 to 2.

[0111] Each g is independently preferably 1 to 3, and more preferably 1 or 2.

[0112] As examples of the metal patterning material according to one embodiment of the present disclosure, compounds (Z1) to (Z194) are shown below, but the present disclosure is not limited to these compounds.

[0113] [ka]

[0114] [ka]

[0115] [ka]

[0116] [ka]

[0117] [ka]

[0118] [ka]

[0119] [ka]

[0120] [ka]

[0121] [ka]

[0122] [ka]

[0123] [ka]

[0124] [ka]

[0125] [ka]

[0126] The metal patterning material according to one embodiment of the present disclosure is a material that contains a nitrogen-containing heterocyclic compound having a fused ring skeleton represented by the above formula (G1) or (G2), can form a thin film, and has the effect of suppressing the formation of a metal thin film on the film surface. In addition, the metal patterning material may contain any other organic molecular material, polymer, etc., within a range that can suppress the formation of a metal film on the film surface.

[0127] The type of metal material to be patterned is not particularly limited, but is preferably an alkali metal, an alkaline earth metal, a transition metal, or a metal of Group 13 of the periodic table, and examples thereof include lithium, sodium, potassium, rubidium, cesium, beryllium, magnesium, calcium, strontium, barium, aluminum, scandium, vanadium, zinc, yttrium, indium, cerium, samarium, europium, terbium, ytterbium, gold, silver, platinum, copper, iron, palladium, molybdenum, manganese, titanium, cobalt, nickel, tungsten, tin, and chromium, as well as alloys and salts containing one or more of these metals. Examples of alloys include magnesium-silver alloys, magnesium-indium alloys, magnesium-aluminum alloys, indium-silver alloys, lithium-aluminum alloys, lithium-magnesium alloys, lithium-indium alloys, and calcium-aluminum alloys, and examples of salts include lithium fluoride.

[0128] [Nitrogen-containing heterocyclic compound] The nitrogen-containing heterocyclic compound according to one embodiment of the present disclosure is represented by the following formula (G1) or (G2).

[0129] [ka]

[0130] In formula (G1), each A independently has a ring structure condensed with a nitrogen-containing heterocycle, and the ring structure is an aromatic hydrocarbon ring having 5 to 26 carbon atoms which may be substituted, or It represents an optionally substituted heteroaromatic ring having 3 to 26 carbon atoms.

[0131] B is bonded to a nitrogen-containing heterocycle or A, and O. S, NR 101 (R 101represents a monocyclic, linked or fused aromatic hydrocarbon group having 6 to 26 carbon atoms, a monocyclic, linked or fused heteroaromatic group having 3 to 26 carbon atoms, a linear, branched or cyclic aliphatic hydrocarbon group having 1 to 18 carbon atoms, or formula (B1), a monocyclic, linked or condensed ring, optionally substituted, mono- to tetravalent aromatic hydrocarbon ring having 5 to 26 carbon atoms; a monocyclic, linked or fused ring, optionally substituted mono- to tetravalent heteroaromatic ring having 3 to 26 carbon atoms; a linear, branched or cyclic, optionally substituted, monovalent to tetravalent aliphatic hydrocarbon ring having 3 to 18 carbon atoms; or It represents a monocyclic, linked ring, or condensed ring which may be substituted, mono- to tetravalent, heteroaliphatic hydrocarbon ring having 3 to 20 carbon atoms.

[0132] R 1 are each independently N(R 101 )2(R 101 has the same definition as above.) Hydrogen atom, Halogen atoms, an optionally substituted monocyclic, linked or fused ring aromatic hydrocarbon group having 6 to 26 carbon atoms; an optionally substituted monocyclic, linked or fused ring heteroaromatic group having 3 to 26 carbon atoms; an optionally substituted linear, branched or cyclic aliphatic hydrocarbon group having 1 to 18 carbon atoms; an optionally substituted monocyclic, linked or fused heteroaliphatic hydrocarbon group having 3 to 26 carbon atoms; or It represents a group having a fluoroalkyl structure and is represented by the following formula (B1).

[0133] [ka]

[0134] In formula (B1), L 2 teeth, O. S, a linear, branched or cyclic divalent aliphatic hydrocarbon group having 1 to 18 carbon atoms which may be substituted with a fluorine atom; a vinylene group optionally substituted with fluorine, or It represents a vinylene group which may form a ring.

[0135] Each f independently represents an integer of 0 to 4.

[0136] Each g independently represents an integer of 1 to 4.

[0137] Each Rf independently represents a monovalent group having 1 to 18 carbon atoms and containing 3 or more fluorine atoms.

[0138] R 2 represents a group having a fluoroalkyl structure and represented by the above formula (B1).

[0139] x 101 each independently represents an integer of 0 to 5.

[0140] y 101 each independently represents an integer of 1 to 6.

[0141] z 101 each independently represents an integer of 1 to 5.

[0142] v 101 each independently represents an integer of 0 to 5.

[0143] However, z 101 or v 101 One of the following represents an integer from 1 to 5.

[0144] [ka]

[0145] In formula (G2), two C's have a ring structure fused to the nitrogen-containing heterocycle shown in formula (G2), and the ring structure is each independently an aromatic hydrocarbon ring having 5 to 26 carbon atoms which may be substituted; an optionally substituted heteroaromatic ring having 3 to 26 carbon atoms; an optionally substituted aliphatic hydrocarbon ring having 5 to 18 carbon atoms, or It represents an optionally substituted heteroaliphatic hydrocarbon ring having 5 to 26 carbon atoms.

[0146] In addition, two C's may be condensed with each other.

[0147] R 3 represents a group having a fluoroalkyl structure and represented by the above formula (B1).

[0148] R 4 are each independently N(R 101 )2(R 101 has the same definition as above.) Hydrogen atom, Halogen atoms, an optionally substituted monocyclic, linked or fused ring aromatic hydrocarbon group having 6 to 26 carbon atoms; an optionally substituted monocyclic, linked or fused ring heteroaromatic group having 3 to 26 carbon atoms; an optionally substituted linear, branched or cyclic aliphatic hydrocarbon group having 1 to 18 carbon atoms; an optionally substituted monocyclic, linked or fused heteroaliphatic hydrocarbon group having 3 to 26 carbon atoms; or It represents a group having a fluoroalkyl structure and is represented by the above formula (B1).

[0149] X represents N or C.

[0150] r 101 each independently represents an integer of 1 to 6.

[0151] In the nitrogen-containing heterocyclic compound according to one embodiment of the present disclosure, A, B, and R 101 , formula B1, R 1 , R 1 , f, g, Rf, R 2 , x 101 , y101 , z 101 , v 101 , C, R 3 , R 4 , X, and r 101 The definitions and preferred ranges of A, B, and R in the metal patterning material according to one embodiment of the present disclosure are as follows. 101 , formula B1, R 1 , R 1 , f, g, Rf, R 2 , x 101 , y 101 , z 101 , v 101 , C, R 3 , R 4 , X, and r 101 The definition and preferred range are the same as those of the above.

[0152] In the nitrogen-containing heterocyclic compound according to one embodiment of the present disclosure, z 101 Each independently represents an integer of 1 to 5, and z 101 This differs from the definition of

[0153] In the nitrogen-containing heterocyclic compound according to one embodiment of the present disclosure, z 101 Regarding each independently, 1 to 3 is preferable, 1 to 2 is more preferable, and 1 is even more preferable.

[0154] [Thin films for metal patterning] A thin film for metal patterning according to one embodiment of the present disclosure is a thin film for metal patterning that contains a material for metal patterning and is capable of patterning a metal film or a metal laminate film.

[0155] The metal patterning material is the above-mentioned metal patterning material, The metal film or metal laminated film contains at least one selected from the group consisting of ytterbium, magnesium, silver, aluminum, copper, titanium, chromium, and an alloy of magnesium and silver.

[0156] In one embodiment of the present disclosure, it is more preferable that the water contact angles of the thin film for metal patterning are, in order, 90° or more, 91° or more, 92° or more, 93° or more, 94° or more, 95° or more, 96° or more, 97° or more, 98° or more, 99° or more, and 100° or more.

[0157] [Organic electroluminescence element] An organic electroluminescence element according to one aspect of the present disclosure is an organic electroluminescence element including a cathode, The cathode contains at least one selected from the group consisting of ytterbium, magnesium, silver, aluminum, and an alloy of magnesium and silver, The patterning is performed using the above-mentioned metal patterning material.

[0158] [Metal pattern formation method] A method for forming a metal pattern according to one embodiment of the present disclosure includes forming an organic material pattern including the above-described metal patterning material; and applying a metal material to a region where the organic material pattern is formed and a region where the organic material pattern is not formed, thereby forming a metal pattern in the region where the organic material pattern is not formed.

[0159] The metal patterning material is used by forming a film in the area where it is desired to suppress adhesion of the metal material. The area where it is desired to suppress adhesion of the metal material corresponds to the area where the organic material pattern is formed. Areas other than the area where it is desired to suppress adhesion of the metal material correspond to the area where the organic material pattern is not formed. The area where the organic material pattern is not formed is the area where adhesion of the metal material is promoted and is the area where it is desired to form the metal pattern.

[0160] The method for forming the organic material pattern (film formation method) is not particularly limited, and known methods such as vacuum deposition, spin coating, casting, dip coating, die coating, bar code, offset, spray coating, inkjet, screen, offset, flexography, gravure, and microcontact can be applied. After film formation, the film may be annealed in a temperature environment higher than room temperature. There is also no particular limit to the film thickness of the organic material pattern.

[0161] Furthermore, other organic molecular materials, polymers, etc. may be added to the metal patterning material as long as the formation of a metal film on the film surface can be suppressed.

[0162] The base on which the organic material pattern is formed may be either metallic or non-metallic, and examples of the base include organic films, metallic films, oxide films, inorganic films, etc. There are no particular limitations on the material of the substrate, and glass, plastic, metal, ceramic, and any other material can be used.

[0163] When the base on which the organic material pattern is formed is an organic film, the organic film may be, for example, a tris(8-quinolinolato)aluminum derivative, an imidazole derivative, a benzimidazole derivative, a triazine derivative, a pyrimidine derivative, a pyridine derivative, a pyrazine derivative, a quinoline derivative, a quinoxaline derivative, an oxadiazole derivative, a phosphole derivative, a silole derivative, or a phosphine oxide derivative.

[0164] The type of metal material used to form a metal pattern using a metal patterning material is not particularly limited, but may be any of the following: Alkali metals, alkaline earth metals, transition metals, and metals of Group 13 of the Periodic Table are preferred; More preferred are lithium, sodium, potassium, rubidium, cesium, beryllium, magnesium, calcium, strontium, barium, aluminum, scandium, vanadium, zinc, yttrium, indium, cerium, samarium, europium, terbium, ytterbium, gold, silver, platinum, copper, iron, palladium, molybdenum, manganese, titanium, cobalt, nickel, tungsten, tin, chromium, and alloys containing one or more selected from the group consisting of these metals.

[0165] Examples of such alloys include magnesium-silver alloys, magnesium-indium alloys, magnesium-aluminum alloys, indium-silver alloys, lithium-aluminum alloys, lithium-magnesium alloys, lithium-indium alloys, and calcium-aluminum alloys.

[0166] The method for forming the metal pattern is not particularly limited, and examples thereof include dry processes such as vacuum deposition and sputtering, and inkjet methods using metal nanoink, etc. Furthermore, there is no particular limit to the film thickness of the metal pattern.

[0167] By applying a metal material to the region where the organic material pattern is formed and the region where the organic material pattern is not formed, a film containing the metal material is instantaneously formed in both regions. However, since the adhesion of metal is suppressed in the region where the organic material pattern is formed, the metal pattern is naturally formed only in the region where the organic material pattern is not formed.

[0168] More specific examples of the method for forming the metal pattern include the following methods 1) and 2). 1) The above-mentioned metal patterning material is evaporated into a desired pattern using a metal mask or the like. 2) Then, metal is evaporated to form electrodes only on the areas where the metal patterning material is not deposited, i.e., negative metal electrodes are formed with respect to the deposition pattern of the metal patterning material.

[0169] The area and line width of the patterned metal electrode can be adjusted as desired by changing the patterning shape of the metal patterning material.

[0170] A protective film may be provided on the patterned film obtained by patterning the metal. The protective film may be, for example, an organic film, an oxide film, an inorganic film, or the like, and is not particularly limited.

[0171] When the protective film is an organic film, examples of the organic film that can be used include triazole derivatives, oxadiazole derivatives, imidazole derivatives, polyarylalkane derivatives, pyrazoline derivatives, pyrazolone derivatives, phenylenediamine derivatives, arylamine derivatives, amino-substituted chalcone derivatives, oxazole derivatives, styrylanthracene derivatives, fluorenone derivatives, hydrazone derivatives, stilbene derivatives, silazane derivatives, aniline-based copolymers, conductive polymer oligomers (particularly thiophene oligomers), porphyrin compounds, aromatic tertiary amine compounds, carbazole compounds, styrylamine compounds, triazine derivatives, and pyrimidine derivatives.

[0172] When the protective film is an inorganic film, the inorganic film may be, for example, silicon nitride, silicon oxide, or the like.

[0173] According to the metal patterning material and the metal pattern forming method according to one embodiment of the present disclosure, it is possible to pattern metal electrodes of solar cells, optical sensors, image sensors, organic electroluminescence (EL) elements, organic solar cells, organic sensors, organic transistors, and the like, and to form metal wiring on a circuit board.

[0174] [Electronic equipment] An electronic device according to one aspect of the present disclosure includes the above-described material for metal patterning.

[0175] As described above, when the metal pattern is formed, the organic material pattern containing the metal patterning material is formed, and therefore the organic material pattern is formed together with the metal pattern. Therefore, the electronic device according to one aspect of the present disclosure includes the organic material pattern containing the metal patterning material together with the metal pattern.

[0176] Examples of electronic devices include solar cells, optical sensors, image sensors, organic EL elements, organic solar cells, organic sensors, and organic transistors. These electronic devices include patterned metal electrodes, metal wiring on a circuit board, and the like. In other words, if the electronic device includes patterned metal electrodes or metal wiring on a circuit board, the electronic device according to this embodiment can be obtained using the above-mentioned method for forming a metal pattern. Such electronic devices have a highly accurate metal pattern. EXAMPLES

[0177] The present invention will be described in more detail below based on examples, but the present invention should not be construed as being limited to these examples in any way.

[0178] NMR measurements were carried out using the following equipment. [NMR measurement] Measuring device: JEOL JNM-ECZ400S [Transmittance measurement] Metal adhesion can be evaluated by measuring the transmittance, and the transmittance decreases as metal adheres to the surface. Also, the transmittance decreases in correlation with the amount of metal adhered to the surface.

[0179] The transmittance measurements were carried out using the following equipment.

[0180] Measurement equipment: JASCO V-750 Measurement range: 550~800nm [Synthesis of compound (Z2) and evaluation of metal adhesion and adhesion to CVD film] Example 1-1 Synthesis of Z2

[0181] [ka]

[0182] Under a nitrogen atmosphere, 6,7-dimethoxy-2,4-dichloroquinazoline (3.0 mmol) was mixed with 1H,1H,7H-decafluoro-1-heptanol (9.0 mmol), THF (100 ml), and potassium hydroxide, and the mixture was stirred at 80°C for 4 hours. After cooling to room temperature, water (300 mL) was added, and the mixture was stirred at room temperature for 30 minutes. The precipitated solid was filtered and washed with methanol. After drying at 50°C, the target product Z2 was obtained (yield 80%).

[0183] The compound was identified by FDMS measurement (FDMS: 863.97).

[0184] Example 1-1' Evaluation of metal adhesion of compound (Z2) The glass substrate was washed by boiling with isopropyl alcohol, and then washed with ultraviolet light and ozone. After that, it was placed in a vacuum deposition apparatus and 1.0 × 10 -4 The vacuum pump was used to evacuate the chamber until the pressure in the chamber was reduced to 0.02 Pa or less. Compound (Z22) was deposited at a deposition rate of 0.2 nm / sec to a thickness of 100 nm on a glass substrate on which a metal mask with an opening of 20 mm x 10 mm was placed. The metal mask was then removed, and ytterbium was deposited at a deposition rate of 0.01 nm / sec to a thickness of 2 nm, followed by silver deposition at a deposition rate of 0.1 nm / sec to a thickness of 20 nm. No ytterbium or silver was deposited on the area on which compound (Z2) was deposited, and a transparent area of ​​20 mm x 10 mm was formed (transmittance: ≧80%).

[0185] Example 1-1 "Evaluation of adhesion of compound (Z2) to CVD film" The glass substrate was washed by boiling with isopropyl alcohol, and then washed with ultraviolet light and ozone. After that, it was placed in a vacuum deposition apparatus and 1.0 × 10 -4The chamber was evacuated with a vacuum pump until the pressure in the chamber was reduced to less than 1 Pa. Compound (Z22) was deposited at a deposition rate of 0.2 nm / sec to a thickness of 100 nm on a glass substrate with a metal mask having an opening of 20 mm x 10 mm. The metal mask was then removed, and ytterbium was deposited at a deposition rate of 0.01 nm / sec to a thickness of 2 nm, followed by deposition of silver at a deposition rate of 0.1 nm / sec to a thickness of 20 nm. Further, CVD deposition (SiN) was performed at 11 Ω / sec, and after one day, it was visually confirmed that there was no peeling in the area where compound (Z2) was deposited.

[0186] [Synthesis of compound (Z22) and evaluation of metal adhesion and adhesion to CVD film] Example 2-1 Synthesis of intermediate (AA-101)

[0187] [ka]

[0188] Under a nitrogen atmosphere, 7-bromo-2,4-dichloroquinazoline (3.0 mmol) was mixed with 1H,1H,7H-decafluoro-1-heptanol (9.0 mmol), THF (100 ml), and potassium hydroxide, and the mixture was stirred at 80°C for 4 hours. After cooling to room temperature, water (300 mL) was added, and the mixture was stirred at room temperature for 30 minutes. The precipitated solid was filtered and washed with methanol. After drying at 50°C, the desired intermediate (AA-101) was obtained (yield 92%).

[0189] The compound was identified by FDMS measurement (FDMS: 863.97).

[0190] Example 2-2 Synthesis of Z22

[0191] [ka]

[0192] Under a nitrogen atmosphere, the intermediate (AA-101) (3.0 mmol) was dissolved in THF (100 ml), and tripotassium phosphate (7.0 mmol), water (100 ml), tetrakis(triphenylphosphine)palladium(0) (0.03 mmol), and 3,5-bis(trifluoromethyl)phenylboronic acid (7.0 mmol) were added, and the mixture was stirred at 80°C for 3 hours. Ethyl acetate was added, and the organic layer was taken out and dehydrated with sodium sulfate. After filtering the sodium sulfate, the mixture was concentrated with an evaporator, and the residue was recrystallized from ethanol. The precipitated solid was filtered, and the target product Z22 was obtained (yield 70%).

[0193] The compound was identified by FDMS measurement (FDMS: 998.07).

[0194] Example 2-2' Evaluation of metal adhesion of compound (Z22) The glass substrate was washed by boiling with isopropyl alcohol, and then washed with ultraviolet light and ozone. After that, it was placed in a vacuum deposition apparatus and 1.0 × 10 -4 The vacuum pump was used to evacuate the chamber until the pressure in the chamber was reduced to less than 1 Pa. Compound (Z22) was deposited at a deposition rate of 0.2 nm / sec to form a 100 nm film on a glass substrate on which a metal mask with an opening of 20 mm x 10 mm was placed. The metal mask was then removed, and ytterbium was deposited at a deposition rate of 0.01 nm / sec to form a 2 nm film, followed by silver deposition at a deposition rate of 0.1 nm / sec to form a 20 nm film. No ytterbium or silver was deposited on the area on which compound (Z22) was deposited, and a 20 mm x 10 mm transparent area was formed (transmittance: ≧85%).

[0195] Example 2-2 "Evaluation of adhesion of compound (Z22) to CVD film" The glass substrate was washed by boiling with isopropyl alcohol, and then washed with ultraviolet light and ozone. After that, it was placed in a vacuum deposition apparatus and 1.0 × 10 -4The chamber was evacuated with a vacuum pump until the pressure in the chamber was reduced to less than 1 Pa. Compound (Z22) was deposited at a deposition rate of 0.2 nm / sec to a thickness of 100 nm on a glass substrate with a metal mask having an opening of 20 mm x 10 mm. The metal mask was then removed, and ytterbium was deposited at a deposition rate of 0.01 nm / sec to a thickness of 2 nm, followed by deposition of silver at a deposition rate of 0.1 nm / sec to a thickness of 20 nm. Further, CVD deposition (SiN) was performed at 11 Ω / sec, and after one day, it was visually confirmed that there was no peeling in the area where compound (Z22) was deposited.

[0196] [Synthesis of compound (Z25) and evaluation of metal adhesion and adhesion to CVD film] Example 3-1 Synthesis of Z25

[0197] [ka]

[0198] Under a nitrogen atmosphere, the intermediate (AA-101) (3.0 mmol) was dissolved in THF (100 ml), and tripotassium phosphate (7.0 mmol), water (100 ml), tetrakis (triphenylphosphine) palladium (0) (0.03 mmol), and 9-antraceneboronic acid (7.0 mmol) were added, followed by stirring at 80°C for 3 hours. Ethyl acetate was added, and the organic layer was taken out and dehydrated with sodium sulfate. After filtering off the sodium sulfate, the mixture was concentrated with an evaporator, and the residue was recrystallized from ethanol and ethyl acetate. The precipitated solid was filtered to obtain the target product Z25 (yield 40%).

[0199] The compound was identified by FDMS measurement (FDMS: 962.12).

[0200] Example 3-1' Evaluation of metal adhesion of compound (Z25) The glass substrate was washed by boiling with isopropyl alcohol, and then washed with ultraviolet light and ozone. After that, it was placed in a vacuum deposition apparatus and 1.0 × 10 -4The vacuum pump was used to evacuate the chamber until the pressure in the chamber was reduced to 0.02 Pa or less. A 100 nm film of compound (Z25) was formed at a deposition rate of 0.2 nm / sec on a glass substrate on which a metal mask with an opening of 20 mm x 10 mm was placed. The metal mask was then removed, and ytterbium was deposited at a deposition rate of 0.01 nm / sec to a thickness of 2 nm, followed by silver being deposited at a deposition rate of 0.1 nm / sec to a thickness of 20 nm. No ytterbium or silver was deposited on the area on which compound (Z25) was deposited, and a 20 mm x 10 mm transparent area was formed (transmittance: ≧80%).

[0201] Example 3-1 "Evaluation of adhesion of compound (Z25) to CVD film" The glass substrate was washed by boiling with isopropyl alcohol, and then washed with ultraviolet light and ozone. After that, it was placed in a vacuum deposition apparatus and 1.0 × 10 -4 The chamber was evacuated with a vacuum pump until the pressure in the chamber was reduced to less than 1 Pa. A 100 nm film of compound (Z25) was formed at a deposition rate of 0.2 nm / sec on a glass substrate with a metal mask having an opening of 20 mm x 10 mm. The metal mask was then removed, and ytterbium was deposited at a deposition rate of 0.01 nm / sec to a thickness of 2 nm, followed by deposition of silver at a deposition rate of 0.1 nm / sec to a thickness of 20 nm. Further, a CVD film (SiN) was formed at 11 Ω / sec, and after one day, it was visually confirmed that there was no peeling in the area where compound (Z25) was deposited.

[0202] [Synthesis of compound (Z39) and evaluation of metal adhesion and adhesion to CVD films] Example 4-1 Synthesis of intermediate (AA-201)

[0203] [ka]

[0204] Under a nitrogen atmosphere, 2,6-dichloro-7-deazapurine (3.0 mmol) was mixed with 1H,1H,7H-decafluoro-1-heptanol (9.0 mmol), THF (100 ml), and potassium hydroxide, and the mixture was stirred at 80°C for 4 hours. After cooling to room temperature, water (300 mL) was added, and the mixture was stirred at room temperature for 30 minutes. The precipitated solid was filtered and washed with methanol. After drying at 50°C, the desired intermediate (AA-201) was obtained (yield 96%).

[0205] The compound was identified by FDMS measurement (FDMS: 779.03).

[0206] Example 4-2 Synthesis of Z39

[0207] [ka]

[0208] Under a nitrogen atmosphere, the intermediate (AA-201) (3.0 mmol) was dissolved in DMSO (50 ml), perfluoropyridine (10 mmol) was added, and the mixture was stirred at 80°C for 12 hours. Water and ethyl acetate were added, and the organic layer was taken out and dehydrated with sodium sulfate. After filtering off the sodium sulfate, the mixture was concentrated with an evaporator, and the residue was recrystallized from ethyl acetate and ethanol. The precipitated solid was filtered to obtain the target product Z39 (yield 60%).

[0209] The compound was identified by FDMS measurement (FDMS: 928.02).

[0210] Example 4-2' Evaluation of metal adhesion of compound (Z39) The glass substrate was washed by boiling with isopropyl alcohol, and then washed with ultraviolet light and ozone. After that, it was placed in a vacuum deposition apparatus and 1.0 × 10 -4The vacuum pump was used to evacuate the chamber until the pressure in the chamber was reduced to 0.02 Pa or less. Compound (Z31) was deposited at a deposition rate of 0.2 nm / sec to a thickness of 100 nm on a glass substrate on which a metal mask with an opening of 20 mm x 10 mm was placed. The metal mask was then removed, and ytterbium was deposited at a deposition rate of 0.01 nm / sec to a thickness of 2 nm, followed by silver being deposited at a deposition rate of 0.1 nm / sec to a thickness of 20 nm. No ytterbium or silver was deposited on the area on which compound (Z39) was deposited, and a transparent area of ​​20 mm x 10 mm was formed (transmittance: ≧88%).

[0211] Example 4-2' Evaluation of adhesion of compound (Z39) to CVD film The glass substrate was washed by boiling with isopropyl alcohol, and then washed with ultraviolet light and ozone. After that, it was placed in a vacuum deposition apparatus and 1.0 × 10 -4 The chamber was evacuated with a vacuum pump until the pressure in the chamber was reduced to less than 1 Pa. A 100 nm film of compound (Z39) was formed at a deposition rate of 0.2 nm / sec on a glass substrate with a metal mask having an opening of 20 mm x 10 mm. The metal mask was then removed, and ytterbium was deposited at a deposition rate of 0.01 nm / sec to a thickness of 2 nm, followed by silver deposition at a deposition rate of 0.1 nm / sec to a thickness of 20 nm. Further, a CVD film (SiN) was deposited at 11 Ω / sec, and after one day, it was visually confirmed that there was no peeling in the area where compound (Z39) was deposited.

[0212] [Synthesis of compound (Z46) and evaluation of metal adhesion and adhesion to CVD films] Example 5-1 Synthesis of Z46

[0213] [ka]

[0214] Under a nitrogen atmosphere, 2,4-dichlorobenzofuro[3,2-g]quinazoline (3.0 mmol) was mixed with 1H,1H,7H-decafluoro-1-heptanol (9.0 mmol), THF (100 ml), and potassium hydroxide, and the mixture was stirred at 80°C for 4 hours. After cooling to room temperature, water (300 mL) was added, and the mixture was stirred at room temperature for 30 minutes. The precipitated solid was filtered and washed with methanol. After drying at 50°C, the target product Z46 was obtained (yield 62%).

[0215] The compounds were identified by FDMS measurement.

[0216] FDMS:794.07 Example 5-1' Evaluation of metal adhesion of compound (Z46) The glass substrate was boiled and cleaned with isopropyl alcohol, and then cleaned with ultraviolet ozone. It was then placed in a vacuum deposition apparatus and evacuated with a vacuum pump until the pressure was 1.0×10-4 Pa or less. Compound (Z46) was deposited at a deposition rate of 0.2 nm / sec to a thickness of 100 nm on the glass substrate with a metal mask having an opening of 20 mm×10 mm. The metal mask was then removed, and ytterbium was deposited at a deposition rate of 0.01 nm / sec to a thickness of 2 nm, followed by silver deposition at a deposition rate of 0.1 nm / sec to a thickness of 20 nm. No ytterbium or silver was deposited on the area where compound (Z46) was deposited, and a transparent area of ​​20 mm×10 mm was formed (transmittance: ≧91%).

[0217] Example 5-1' Evaluation of adhesion of compound (Z46) to CVD film The glass substrate was washed by boiling with isopropyl alcohol, and then washed with ultraviolet light and ozone. After that, it was placed in a vacuum deposition apparatus and 1.0 × 10 -4The chamber was evacuated with a vacuum pump until the pressure in the chamber was reduced to less than 1 Pa. Compound (Z46) was deposited at a deposition rate of 0.2 nm / sec to a thickness of 100 nm on a glass substrate with a metal mask having an opening of 20 mm x 10 mm. The metal mask was then removed, and ytterbium was deposited at a deposition rate of 0.01 nm / sec to a thickness of 2 nm, followed by deposition of silver at a deposition rate of 0.1 nm / sec to a thickness of 20 nm. Further, CVD deposition (SiN) was performed at 11 Ω / sec, and after one day, it was visually confirmed that there was no peeling in the area where compound (Z46) was deposited.

[0218] [Synthesis of compound (Z60) and evaluation of metal adhesion and adhesion to CVD films] Example 6-1 Synthesis of Z60

[0219] [ka]

[0220] Under a nitrogen atmosphere, 2,4,6,8-tetrachloropyrimido[5,4-d]pyrimidine was added with 1H,1H,9H-hexadecafluoro-1-nonanol (9.0 mmol), THF (100 ml), and potassium hydroxide, and the mixture was stirred at 80°C for 4 hours. After cooling to room temperature, water (300 mL) was added and the mixture was stirred at room temperature for 30 minutes. The precipitated solid was filtered and washed with methanol. After drying at 50°C, the target product Z60 was obtained (yield 82%).

[0221] The compounds were identified by FDMS measurement.

[0222] FDMS:1851.98 Example 6-1' Evaluation of metal adhesion of compound (Z60) The glass substrate was boiled and cleaned with isopropyl alcohol, then cleaned with ultraviolet ozone, and then placed in a vacuum deposition apparatus and evacuated with a vacuum pump until the pressure was 1.0×10-4 Pa or less. A 100 nm film of compound (Z60) was formed at a deposition rate of 0.2 nm / sec on the glass substrate on which a metal mask with an opening of 20 mm×10 mm was placed. The metal mask was then removed, and 2 nm of ytterbium was deposited at a deposition rate of 0.01 nm / sec, followed by 20 nm of silver at a deposition rate of 0.1 nm / sec. No ytterbium or silver was deposited on the part on which compound (Z60) was deposited, and a 20 mm×10 mm transparent region was formed (transmittance: ≧90%).

[0223] Example 6-1' Evaluation of adhesion of compound (Z60) to CVD film The glass substrate was washed by boiling with isopropyl alcohol, and then washed with ultraviolet light and ozone. After that, it was placed in a vacuum deposition apparatus and 1.0 × 10 -4 The chamber was evacuated with a vacuum pump until the pressure in the chamber was reduced to less than 1 Pa. A 100 nm film of compound (Z46) was formed at a deposition rate of 0.2 nm / sec on a glass substrate with a metal mask having an opening of 20 mm x 10 mm. The metal mask was then removed, and ytterbium was deposited at a deposition rate of 0.01 nm / sec to a thickness of 2 nm, followed by silver deposition at a deposition rate of 0.1 nm / sec to a thickness of 20 nm. Further, a CVD film (SiN) was deposited at 11 Ω / sec, and after one day, it was visually confirmed that there was no peeling in the area where compound (Z60) was deposited.

[0224] [Synthesis of compound (Z70) and evaluation of metal adhesion and adhesion to CVD films] Example 7-1 Synthesis of Z70

[0225] [ka]

[0226] Under a nitrogen atmosphere, the intermediate (AA-201) (3.0 mmol), perfluorobiphenyl (1.3 mmol), DMSO (200 ml), and tripotassium phosphate were added and stirred at 120°C for 19 hours. After cooling to room temperature, water (1000 mL) was added and stirred at room temperature for 30 minutes. The precipitated solid was filtered and washed with methanol. After drying at 50°C, the target product Z70 was obtained (yield 31%).

[0227] The compound was identified by FDMS measurement (FDMS: 1852.03).

[0228] Example 7-1' Evaluation of metal adhesion of compound (Z70) The glass substrate was washed by boiling with isopropyl alcohol, and then washed with ultraviolet light and ozone. After that, it was placed in a vacuum deposition apparatus and 1.0 × 10 -4 The vacuum pump was used to evacuate the chamber until the pressure in the chamber was reduced to 0.02 Pa or less. A 100 nm film of compound (Z70) was formed at a deposition rate of 0.2 nm / sec on a glass substrate on which a metal mask with an opening of 20 mm x 10 mm was placed. The metal mask was then removed, and ytterbium was deposited at a deposition rate of 0.01 nm / sec to a thickness of 2 nm, followed by silver deposition at a deposition rate of 0.1 nm / sec to a thickness of 20 nm. No ytterbium or silver was deposited on the area on which compound (Z70) was deposited, and a 20 mm x 10 mm transparent area was formed (transmittance: ≧90%).

[0229] Example 7-1 "Evaluation of adhesion of compound (Z70) to CVD film" The glass substrate was washed by boiling with isopropyl alcohol, and then washed with ultraviolet light and ozone. After that, it was placed in a vacuum deposition apparatus and 1.0 × 10 -4 The chamber was evacuated with a vacuum pump until the pressure in the chamber was below 1 Pa. A 100 nm film of compound (Z70) was formed at a deposition rate of 0.2 nm / sec on a glass substrate with a metal mask having an opening of 20 mm x 10 mm. The metal mask was then removed, and ytterbium was deposited at a deposition rate of 0.01 nm / sec to a thickness of 2 nm, followed by silver deposition at a deposition rate of 0.1 nm / sec to a thickness of 20 nm. Further, a CVD film (SiN) was deposited at 11 Ω / sec, and after one day, it was visually confirmed that there was no peeling in the area where compound (Z70) was deposited.

[0230] [Synthesis of compound (Z74) and evaluation of metal adhesion and adhesion to CVD films] Example 8-1 Synthesis of intermediate (AA-301)

[0231] [ka]

[0232] Under a nitrogen atmosphere, 2,6-dichloro-7-deazapurine (3.0 mmol) was mixed with 1H,1H,9H-hexadecafluoro-1-nonanol (9.0 mmol), THF (100 ml), and potassium hydroxide, and the mixture was stirred at 80°C for 4 hours. After cooling to room temperature, water (300 mL) was added, and the mixture was stirred at room temperature for 30 minutes. The precipitated solid was filtered and washed with methanol. After drying at 50°C, the desired intermediate (AA-301) was obtained (yield 76%).

[0233] The compound was identified by FDMS measurement (FDMS: 979.02).

[0234] Example 8-2 Synthesis of Z74

[0235] [ka]

[0236] Under a nitrogen atmosphere, the intermediate (AA-301) (3.0 mmol), dichlorotriazine (1.3 mmol), THF (200 ml), and tripotassium phosphate were added and stirred at 70°C for 12 hours. After cooling to room temperature, water (100 mL) was added and stirred at room temperature for 30 minutes. The precipitated solid was filtered and washed with methanol. After drying at 50°C, the target product Z74 was obtained (yield 11%).

[0237] The compound was identified by FDMS measurement (FDMS: 2035.04).

[0238] Example 8-2' Evaluation of metal adhesion of compound (Z74) The glass substrate was washed by boiling with isopropyl alcohol, and then washed with ultraviolet light and ozone. After that, it was placed in a vacuum deposition apparatus and 1.0 × 10 -4 The vacuum pump was used to evacuate the chamber until the pressure in the chamber was reduced to 0.02 Pa or less. A 100 nm film of compound (Z74) was formed at a deposition rate of 0.2 nm / sec on a glass substrate on which a metal mask with an opening of 20 mm x 10 mm was placed. The metal mask was then removed, and ytterbium was deposited at a deposition rate of 0.01 nm / sec to a thickness of 2 nm, followed by deposition of silver at a deposition rate of 0.1 nm / sec to a thickness of 20 nm. No ytterbium or silver was deposited on the area on which compound (Z74) was deposited, and a 20 mm x 10 mm transparent area was formed (transmittance: ≧90%).

[0239] Example 8-2: Evaluation of adhesion of compound (Z74) to CVD film The glass substrate was washed by boiling with isopropyl alcohol, and then washed with ultraviolet light and ozone. After that, it was placed in a vacuum deposition apparatus and 1.0 × 10 -4 The chamber was evacuated with a vacuum pump until the pressure in the chamber was reduced to less than 1 Pa. A 100 nm film of compound (Z74) was formed at a deposition rate of 0.2 nm / sec on a glass substrate with a metal mask having an opening of 20 mm x 10 mm. The metal mask was then removed, and ytterbium was deposited at a deposition rate of 0.01 nm / sec to a thickness of 2 nm, followed by deposition of silver at a deposition rate of 0.1 nm / sec to a thickness of 20 nm. Further, a CVD film (SiN) was formed at 11 Ω / sec, and after one day, it was visually confirmed that there was no peeling in the area where compound (Z74) was deposited.

[0240] [Synthesis of compound (Z76) and evaluation of metal adhesion and adhesion to CVD films] Example 9-1 Synthesis of intermediate (AA-401

[0241] [ka]

[0242] Under a nitrogen atmosphere, 6-bromo-2,4-dichloroquinazoline (3.0 mmol) was mixed with 1H,1H,1H,7H-decafluoro-1-heptanol (9.0 mmol), THF (100 ml), and potassium hydroxide, and the mixture was stirred at 80°C for 4 hours. After cooling to room temperature, water (300 mL) was added, and the mixture was stirred at room temperature for 30 minutes. The precipitated solid was filtered and washed with methanol. After drying at 50°C, the desired intermediate (AA-401) was obtained (yield 82%).

[0243] The compounds were identified by FDMS measurement.

[0244] FDM S: 867.95 Example 9-2 Synthesis of Z76

[0245] [ka]

[0246] Under a nitrogen atmosphere, the intermediate (AA-401) (2.0 mmol) and 2,8-Bis(4,4,5,5-tetramethyl-1,3,2-dioxaborolan-2-yl)dibenzothiophene (1.0 mmol) were dissolved in THF (50 ml), palladium acetate (0.01 mmol), triphenylphosphine (0.02 mmol), and 2N-sodium hydroxide aqueous solution (100 ml) were added, and the mixture was stirred at 70°C for 12 hours. Water and ethyl acetate were added, and the organic layer was taken out and dehydrated with sodium sulfate. After filtering the sodium sulfate, the mixture was concentrated with an evaporator, and the residue was recrystallized from ethyl acetate and ethanol. The precipitated solid was filtered, and the target product Z76 was obtained (yield 29%).

[0247] The compound was identified by FDMS measurement (FDMS: 1760.08).

[0248] Example 9-2' Evaluation of metal adhesion of compound (Z76) The glass substrate was boiled and cleaned with isopropyl alcohol, and then cleaned with ultraviolet ozone. It was then placed in a vacuum deposition apparatus and evacuated with a vacuum pump until the pressure was 1.0×10-4 Pa or less. Compound (Z76) was deposited at a deposition rate of 0.2 nm / sec to a thickness of 100 nm on the glass substrate with a metal mask having an opening of 20 mm×10 mm. The metal mask was then removed, and ytterbium was deposited at a deposition rate of 0.01 nm / sec to a thickness of 2 nm, followed by silver deposition at a deposition rate of 0.1 nm / sec to a thickness of 20 nm. No ytterbium or silver was deposited on the area where compound (Z76) was deposited, and a transparent area of ​​20 mm×10 mm was formed (transmittance: ≧90%).

[0249] Example 9-2: Evaluation of adhesion of compound (Z76) to CVD film The glass substrate was washed by boiling with isopropyl alcohol, and then washed with ultraviolet light and ozone. After that, it was placed in a vacuum deposition apparatus and 1.0 × 10 -4 The chamber was evacuated with a vacuum pump until the pressure in the chamber was reduced to less than 1 Pa. A 100 nm film of compound (Z76) was formed at a deposition rate of 0.2 nm / sec on a glass substrate with a metal mask having an opening of 20 mm x 10 mm. The metal mask was then removed, and ytterbium was deposited at a deposition rate of 0.01 nm / sec to a thickness of 2 nm, followed by silver deposition at a deposition rate of 0.1 nm / sec to a thickness of 20 nm. Further, a CVD film (SiN) was deposited at 11 Ω / sec, and after one day, it was visually confirmed that there was no peeling in the area where compound (Z76) was deposited.

[0250] [Synthesis of compound (Z78) and evaluation of metal adhesion and adhesion to CVD films] Example 10-1 Synthesis of Z78

[0251] [ka]

[0252] Under a nitrogen atmosphere, the intermediate (AA-401) (2.0 mmol) and 2,8-Bis(4,4,5,5-tetramethyl-1,3,2-dioxaborolan-2-yl)dibenzofuran (1.0 mmol) were dissolved in THF (50 ml), palladium acetate (0.01 mmol), triphenylphosphine (0.02 mmol), and 2N-sodium hydroxide aqueous solution (100 ml) were added, and the mixture was stirred at 70°C for 12 hours. Water and ethyl acetate were added, and the organic layer was taken out and dehydrated with sodium sulfate. After filtering the sodium sulfate, the mixture was concentrated with an evaporator, and the residue was recrystallized from ethyl acetate and ethanol. The precipitated solid was filtered, and the target product Z78 was obtained (yield 35%).

[0253] The compound was identified by FDMS measurement (FDMS: 1744.10).

[0254] Example 10-1' Evaluation of metal adhesion of compound (Z78) The glass substrate was boiled and cleaned with isopropyl alcohol, and then cleaned with ultraviolet ozone. It was then placed in a vacuum deposition apparatus and evacuated with a vacuum pump until the pressure was 1.0×10-4 Pa or less. Compound (Z78) was deposited at a deposition rate of 0.2 nm / sec to a thickness of 100 nm on the glass substrate with a metal mask having an opening of 20 mm×10 mm. The metal mask was then removed, and ytterbium was deposited at a deposition rate of 0.01 nm / sec to a thickness of 2 nm, followed by silver deposition at a deposition rate of 0.1 nm / sec to a thickness of 20 nm. No ytterbium or silver was deposited on the area where compound (Z78) was deposited, and a transparent area of ​​20 mm×10 mm was formed (transmittance: ≧90%).

[0255] Example 10-1 "Evaluation of adhesion of compound (Z78) to CVD film" The glass substrate was washed by boiling with isopropyl alcohol, and then washed with ultraviolet light and ozone. After that, it was placed in a vacuum deposition apparatus and 1.0 × 10 -4The chamber was evacuated with a vacuum pump until the pressure in the chamber was reduced to less than 1 Pa. A 100 nm film of compound (Z78) was formed at a deposition rate of 0.2 nm / sec on a glass substrate with a metal mask having an opening of 20 mm x 10 mm. The metal mask was then removed, and ytterbium was deposited at a deposition rate of 0.01 nm / sec to a thickness of 2 nm, followed by silver deposition at a deposition rate of 0.1 nm / sec to a thickness of 20 nm. Further, a CVD film (SiN) was deposited at 11 Ω / sec, and after one day, it was visually confirmed that there was no peeling in the area where compound (Z78) was deposited.

[0256] [Synthesis of compound (Z99) and evaluation of metal adhesion and adhesion to CVD films] Example 11-1 Synthesis of Z99

[0257] [ka]

[0258] Under a nitrogen atmosphere, the intermediate (AA-401) (2.0 mmol) and 3,5-bis(trifluoromethyl)aniline (1.0 mmol) were dissolved in xylene (50 ml), and palladium acetate (0.01 mmol), triphenylphosphine (0.02 mmol), and potassium tert-butoxide (4.0 mmol) were added, followed by stirring at 140°C for 50 hours. Water and ethyl acetate were added, and the organic layer was taken out and dehydrated with sodium sulfate. After filtering off the sodium sulfate, the mixture was concentrated with an evaporator, and the residue was recrystallized from ethyl acetate and ethanol. The precipitated solid was filtered, and the target product, Z99, was obtained (yield 15%).

[0259] The compound was identified by FDMS measurement (FDMS: 1805.07).

[0260] Example 11-1' Evaluation of metal adhesion of compound (Z99) The glass substrate was boiled and cleaned with isopropyl alcohol, and then cleaned with ultraviolet ozone. It was then placed in a vacuum deposition apparatus and evacuated with a vacuum pump until the pressure was 1.0×10-4 Pa or less. Compound (Z99) was deposited at a deposition rate of 0.2 nm / sec to a thickness of 100 nm on the glass substrate with a metal mask having an opening of 20 mm×10 mm. The metal mask was then removed, and ytterbium was deposited at a deposition rate of 0.01 nm / sec to a thickness of 2 nm, followed by silver deposition at a deposition rate of 0.1 nm / sec to a thickness of 20 nm. No ytterbium or silver was deposited on the area where compound (Z99) was deposited, and a transparent area of ​​20 mm×10 mm was formed (transmittance: ≧90%).

[0261] Example 11-1 "Evaluation of adhesion of compound (Z99) to CVD film" The glass substrate was washed by boiling with isopropyl alcohol, and then washed with ultraviolet light and ozone. After that, it was placed in a vacuum deposition apparatus and 1.0 × 10 -4 The chamber was evacuated with a vacuum pump until the pressure in the chamber was reduced to less than 1 Pa. A 100 nm film of compound (Z99) was formed at a deposition rate of 0.2 nm / sec on a glass substrate with a metal mask having an opening of 20 mm x 10 mm. The metal mask was then removed, and ytterbium was deposited at a deposition rate of 0.01 nm / sec to a thickness of 2 nm, followed by silver deposition at a deposition rate of 0.1 nm / sec to a thickness of 20 nm. Further, a CVD film (SiN) was deposited at 11 Ω / sec, and after one day, it was visually confirmed that there was no peeling in the area where compound (Z99) was deposited.

[0262] [Synthesis of compound (Z106) and evaluation of metal adhesion and adhesion to CVD films] Example 12-1 Synthesis of intermediate (AA-501)

[0263] [ka]

[0264] Under a nitrogen atmosphere, 7-bromo-2,4-dichloroquinazoline (3.0 mmol) was mixed with 1H,1H,9H-hexadecafluoro-1-nonanol (9.0 mmol), THF (100 ml), and potassium hydroxide, and the mixture was stirred at 70°C for 4 hours. After cooling to room temperature, water (300 mL) was added, and the mixture was stirred at room temperature for 30 minutes. The precipitated solid was filtered and washed with methanol. After drying at 50°C, the desired intermediate (AA-501) was obtained (yield 95%).

[0265] The compounds were identified by FDMS measurement.

[0266] FDMS: 1067.93 Example 12-2 Synthesis of Z106

[0267] [ka]

[0268] Under a nitrogen atmosphere, the intermediate (AA-501) (3.0 mmol) was dissolved in DMSO (50 ml), copper powder (50 mmol) was added, and the mixture was stirred at 150°C for 12 hours. Ammonium water and ethyl acetate were added, and the organic layer was taken out and dehydrated with sodium sulfate. After filtering the sodium sulfate, the mixture was concentrated with an evaporator, and the residue was recrystallized from ethyl acetate and ethanol. The precipitated solid was filtered to obtain the target product Z106 (yield 30%). The compounds were identified by FDMS measurement (FDMS: 1978.03).

[0269] Example 12-2' Evaluation of metal adhesion of compound (Z106) The glass substrate was washed by boiling with isopropyl alcohol, and then washed with ultraviolet light and ozone. After that, it was placed in a vacuum deposition apparatus and 1.0 × 10 -4The vacuum pump was used to evacuate the chamber until the pressure in the chamber was reduced to 0.02 Pa or less. A 100 nm film of compound (Z106) was formed at a deposition rate of 0.2 nm / sec on a glass substrate on which a metal mask with an opening of 20 mm x 10 mm was placed. The metal mask was then removed, and ytterbium was deposited at a deposition rate of 0.01 nm / sec to a thickness of 2 nm, followed by deposition of silver at a deposition rate of 0.1 nm / sec to a thickness of 20 nm. No ytterbium or silver was deposited on the area on which compound (Z106) was deposited, and a 20 mm x 10 mm transparent area was formed (transmittance: ≧90%).

[0270] Example 12-2 "Evaluation of adhesion of compound (Z106) to CVD film" The glass substrate was washed by boiling with isopropyl alcohol, and then washed with ultraviolet light and ozone. After that, it was placed in a vacuum deposition apparatus and 1.0 × 10 -4 The chamber was evacuated with a vacuum pump until the pressure in the chamber was below 1 Pa. A 100 nm film of compound (Z106) was formed at a deposition rate of 0.2 nm / sec on a glass substrate with a metal mask having an opening of 20 mm x 10 mm. The metal mask was then removed, and ytterbium was deposited at a deposition rate of 0.01 nm / sec to a thickness of 2 nm, followed by silver deposition at a deposition rate of 0.1 nm / sec to a thickness of 20 nm. Further, a CVD film (SiN) was deposited at 11 Ω / sec, and after one day, it was visually confirmed that there was no peeling in the area where compound (Z106) was deposited.

[0271] [Synthesis of compound (Z107) and evaluation of metal adhesion and adhesion to CVD films] Example 13-1 Synthesis of intermediate (AA-601)

[0272] [ka]

[0273] Under a nitrogen atmosphere, 6-bromo-2,4-dichloroquinazoline (3.0 mmol) was mixed with 1H,1H,9H-hexadecafluoro-1-nonanol (9.0 mmol), THF (100 ml), and potassium hydroxide, and the mixture was stirred at 70°C for 4 hours. After cooling to room temperature, water (300 mL) was added, and the mixture was stirred at room temperature for 30 minutes. The precipitated solid was filtered and washed with methanol. After drying at 50°C, the desired intermediate (AA-601) was obtained (yield 85%).

[0274] The compounds were identified by FDMS measurement.

[0275] FDMS: 1067.93 Example 13-2 Synthesis of Z107

[0276] [ka]

[0277] Under a nitrogen atmosphere, the intermediate (AA-601) (3.0 mmol) was dissolved in DMSO (50 ml), copper powder (50 mmol) was added, and the mixture was stirred at 150°C for 12 hours. Ammonium water and ethyl acetate were added, and the organic layer was taken out and dehydrated with sodium sulfate. After filtering the sodium sulfate, the mixture was concentrated with an evaporator, and the residue was recrystallized from ethyl acetate and ethanol. The precipitated solid was filtered to obtain the target product, Z107 (yield 26%). The compounds were identified by FDMS measurement (FDMS: 1978.03).

[0278] Example 13-2' Evaluation of metal adhesion of compound (Z107) The glass substrate was washed by boiling with isopropyl alcohol, and then washed with ultraviolet light and ozone. After that, it was placed in a vacuum deposition apparatus and 1.0 × 10 -4The vacuum pump was used to evacuate the chamber until the pressure in the chamber was reduced to 0.02 Pa or less. A 100 nm film of compound (Z107) was formed at a deposition rate of 0.2 nm / sec on a glass substrate on which a metal mask with an opening of 20 mm x 10 mm was placed. The metal mask was then removed, and ytterbium was deposited at a deposition rate of 0.01 nm / sec to a thickness of 2 nm, followed by deposition of silver at a deposition rate of 0.1 nm / sec to a thickness of 20 nm. No ytterbium or silver was deposited on the area on which compound (Z107) was deposited, and a 20 mm x 10 mm transparent area was formed (transmittance: ≧90%).

[0279] Example 13-2 "Evaluation of adhesion of compound (Z107) to CVD film" The glass substrate was washed by boiling with isopropyl alcohol, and then washed with ultraviolet light and ozone. After that, it was placed in a vacuum deposition apparatus and 1.0 × 10 -4 The chamber was evacuated with a vacuum pump until the pressure in the chamber was reduced to less than 1 Pa. A 100 nm film of compound (Z107) was formed at a deposition rate of 0.2 nm / sec on a glass substrate with a metal mask having an opening of 20 mm x 10 mm. The metal mask was then removed, and ytterbium was deposited at a deposition rate of 0.01 nm / sec to a thickness of 2 nm, followed by silver deposition at a deposition rate of 0.1 nm / sec to a thickness of 20 nm. Further, a CVD film (SiN) was deposited at 11 Ω / sec, and after one day, it was visually confirmed that there was no peeling in the area where compound (Z107) was deposited.

[0280] [Synthesis of compound (Z112) and evaluation of metal adhesion and adhesion to CVD films] Example 14-1 Synthesis of intermediate (AA-701)

[0281] [ka]

[0282] Under a nitrogen atmosphere, piperazine (1.2 mmol), THF (100 ml), and potassium hydroxide were added to 2,4-dichloroquinazoline (3.0 mmol), and the mixture was stirred at 70°C for 4 hours. After cooling to room temperature, water (300 mL) was added and the mixture was stirred at room temperature for 30 minutes. The precipitated solid was filtered and washed with methanol. After drying at 50°C, the desired intermediate (AA-701) was obtained (yield 90%).

[0283] The compounds were identified by FDMS measurement.

[0284] FDMS:411.08 Example 14-2 Synthesis of Z112

[0285] [ka]

[0286] Under a nitrogen atmosphere, the intermediate (AA-701) (3.0 mmol), 1H,1H,9H-hexadecafluoro-1-nonanol (9.0 mmol), THF (100 ml), and potassium hydroxide were mixed and stirred at 70°C for 6 hours. Water and ethyl acetate were added, and the organic layer was taken out and dehydrated with sodium sulfate. After filtering off the sodium sulfate, the mixture was concentrated with an evaporator, and the residue was recrystallized from ethyl acetate and ethanol. The precipitated solid was filtered to obtain the target product, Z112 (yield 70%). The compound was identified by FDMS measurement (FDMS: 1203.14).

[0287] Example 14-2' Evaluation of metal adhesion of compound (Z112) The glass substrate was washed by boiling with isopropyl alcohol, and then washed with ultraviolet light and ozone. After that, it was placed in a vacuum deposition apparatus and 1.0 × 10 -4The vacuum pump was used to evacuate the chamber until the pressure was below 1 Pa. A 100 nm film of compound (Z112) was formed at a deposition rate of 0.2 nm / sec on a glass substrate on which a metal mask with an opening of 20 mm x 10 mm was placed. The metal mask was then removed, and ytterbium was deposited at a deposition rate of 0.01 nm / sec to a thickness of 2 nm, followed by deposition of silver at a deposition rate of 0.1 nm / sec to a thickness of 20 nm. No ytterbium or silver was deposited on the area on which compound (Z112) was deposited, and a 20 mm x 10 mm transparent area was formed (transmittance: ≧90%).

[0288] Example 14-2' Evaluation of adhesion of compound (Z112) to CVD film The glass substrate was washed by boiling with isopropyl alcohol, and then washed with ultraviolet light and ozone. After that, it was placed in a vacuum deposition apparatus and 1.0 × 10 -4 The chamber was evacuated with a vacuum pump until the pressure in the chamber was below 1 Pa. A 100 nm film of compound (Z112) was formed at a deposition rate of 0.2 nm / sec on a glass substrate with a metal mask having an opening of 20 mm x 10 mm. The metal mask was then removed, and ytterbium was deposited at a deposition rate of 0.01 nm / sec to a thickness of 2 nm, followed by silver deposition at a deposition rate of 0.1 nm / sec to a thickness of 20 nm. Further, a CVD film (SiN) was deposited at 11 Ω / sec, and after one day, it was visually confirmed that there was no peeling in the area where compound (Z112) was deposited.

[0289] [Synthesis of compound (Z113) and evaluation of metal adhesion and adhesion to CVD films] Example 15-1 Synthesis of intermediate (AA-801)

[0290] [ka]

[0291] Under a nitrogen atmosphere, 2,4-dichloroquinazoline (3.0 mmol), homopiperazine (1.2 mmol), THF (100 ml), and potassium hydroxide were added and stirred at 70°C for 4 hours. After cooling to room temperature, water (300 mL) was added and stirred at room temperature for 30 minutes. The precipitated solid was filtered and washed with methanol. After drying at 50°C, the desired intermediate (AA-801) was obtained (yield 92%).

[0292] The compounds were identified by FDMS measurement.

[0293] FDMS:424.10 Example 15-2 Synthesis of Z113

[0294] [ka]

[0295] Under a nitrogen atmosphere, the intermediate (AA-801) (3.0 mmol), 1H,1H,9H-hexadecafluoro-1-nonanol (9.0 mmol), THF (100 ml), and potassium hydroxide were mixed and stirred at 70°C for 6 hours. Water and ethyl acetate were added, and the organic layer was taken out and dehydrated with sodium sulfate. After filtering off the sodium sulfate, the mixture was concentrated with an evaporator, and the residue was recrystallized from ethyl acetate and ethanol. The precipitated solid was filtered to obtain the target product, Z112 (yield 80%). The compound was identified by FDMS measurement (FDMS: 1217.15).

[0296] Example 15-2' Evaluation of metal adhesion of compound (Z113) The glass substrate was washed by boiling with isopropyl alcohol, and then washed with ultraviolet light and ozone. After that, it was placed in a vacuum deposition apparatus and 1.0 × 10 -4The vacuum pump was used to evacuate the chamber until the pressure in the chamber was reduced to 0.02 Pa or less. A 100 nm film of compound (Z113) was formed at a deposition rate of 0.2 nm / sec on a glass substrate on which a metal mask with an opening of 20 mm x 10 mm was placed. The metal mask was then removed, and ytterbium was deposited at a deposition rate of 0.01 nm / sec to a thickness of 2 nm, followed by deposition of silver at a deposition rate of 0.1 nm / sec to a thickness of 20 nm. No ytterbium or silver was deposited on the area on which compound (Z113) was deposited, and a 20 mm x 10 mm transparent area was formed (transmittance: ≧90%).

[0297] Example 15-2' Evaluation of adhesion of compound (Z113) to CVD film The glass substrate was washed by boiling with isopropyl alcohol, and then washed with ultraviolet light and ozone. After that, it was placed in a vacuum deposition apparatus and 1.0 × 10 -4 The chamber was evacuated with a vacuum pump until the pressure in the chamber was below 1 Pa. A 100 nm film of compound (Z113) was formed at a deposition rate of 0.2 nm / sec on a glass substrate with a metal mask having an opening of 20 mm x 10 mm. The metal mask was then removed, and ytterbium was deposited at a deposition rate of 0.01 nm / sec to a thickness of 2 nm, followed by silver deposition at a deposition rate of 0.1 nm / sec to a thickness of 20 nm. Further, a CVD film (SiN) was deposited at 11 Ω / sec, and after one day, it was visually confirmed that there was no peeling in the area where compound (Z113) was deposited.

[0298] [Synthesis of compound (Z120) and evaluation of metal adhesion and adhesion to CVD films] Example 16-1 Synthesis of intermediate (AA-901)

[0299] [ka]

[0300] Under a nitrogen atmosphere, 2,4-dichloroquinazoline (3.0 mmol) was mixed with 1H,1H,9H-hexadecafluoro-1-nonanol (3.0 mmol), THF (100 ml), and potassium hydroxide, and the mixture was stirred at 70°C for 4 hours. After cooling to room temperature, water (300 mL) was added, and the mixture was stirred at room temperature for 30 minutes. The precipitated solid was filtered and washed with methanol. After drying at 50°C, the mixture was purified by column chromatography to obtain the desired intermediate (AA-901) (yield 50%).

[0301] The compounds were identified by FDMS measurement.

[0302] FDMS: 594.00 Example 16-2 Synthesis of Z120

[0303] [ka]

[0304] Under a nitrogen atmosphere, the intermediate (AA-901) (3.0 mmol), 1,4-phenylenediboronic acid (1.4 mmol), THF (100 ml), palladium acetate (0.01 mmol), triphenylphosphine (0.02 mmol), and potassium hydroxide aqueous solution were mixed and stirred at 70°C for 20 hours. Water and ethyl acetate were added, and the organic layer was taken out and dehydrated with sodium sulfate. After filtering off the sodium sulfate, the mixture was concentrated with an evaporator, and the residue was recrystallized from ethyl acetate and ethanol. The precipitated solid was filtered to obtain the target product, Z120 (yield 45%). The compound was identified by FDMS measurement (FDMS: 1194.09).

[0305] Example 16-3' Evaluation of metal adhesion of compound (Z120) The glass substrate was washed by boiling with isopropyl alcohol, and then washed with ultraviolet light and ozone. After that, it was placed in a vacuum deposition apparatus and 1.0 × 10 -4The vacuum pump was used to evacuate the chamber until the pressure was below 1 Pa. A 100 nm film of compound (Z120) was formed at a deposition rate of 0.2 nm / sec on a glass substrate on which a metal mask with an opening of 20 mm x 10 mm was placed. The metal mask was then removed, and 2 nm of ytterbium was deposited at a deposition rate of 0.01 nm / sec, followed by deposition of 20 nm of silver at a deposition rate of 0.1 nm / sec. No ytterbium or silver was deposited on the area on which compound (Z120) was deposited, forming a 20 mm x 10 mm transparent area (transmittance: ≧90%).

[0306] Example 16-2' Evaluation of adhesion of compound (Z120) to CVD film The glass substrate was washed by boiling with isopropyl alcohol, and then washed with ultraviolet light and ozone. After that, it was placed in a vacuum deposition apparatus and 1.0 × 10 -4 The chamber was evacuated with a vacuum pump until the pressure in the chamber was reduced to less than 1 Pa. A 100 nm film of compound (Z120) was formed at a deposition rate of 0.2 nm / sec on a glass substrate with a metal mask having an opening of 20 mm x 10 mm. The metal mask was then removed, and ytterbium was deposited at a deposition rate of 0.01 nm / sec to a thickness of 2 nm, followed by silver deposition at a deposition rate of 0.1 nm / sec to a thickness of 20 nm. Further, a CVD film (SiN) was deposited at 11 Ω / sec, and after one day, it was visually confirmed that there was no peeling in the area where compound (Z120) was deposited.

[0307] [Synthesis of compound (Z127) and evaluation of metal adhesion and adhesion to CVD films] Example 17-1 Synthesis of Z127

[0308] [ka]

[0309] Under a nitrogen atmosphere, the intermediate (AA-601) (3.0 mmol), piperazine (1.4 mmol), xylene (100 ml), palladium acetate (0.01 mmol), tri-tert-butylphosphine (0.02 mmol), and potassium t-butoxide (4.0 mmol) were mixed and stirred at 140°C for 20 hours. Water and ethyl acetate were added, and the organic layer was taken out and dehydrated with sodium sulfate. After filtering the sodium sulfate, the mixture was concentrated with an evaporator, and the residue was recrystallized from ethyl acetate and ethanol. The precipitated solid was filtered, and further purified by column chromatography to obtain the target product Z127 (yield 20%). The compound was identified by FDMS measurement (FDMS: 2062.10).

[0310] Example 17-1' Evaluation of metal adhesion of compound (Z127) The glass substrate was washed by boiling with isopropyl alcohol, and then washed with ultraviolet light and ozone. After that, it was placed in a vacuum deposition apparatus and 1.0 × 10 -4 The vacuum pump was used to evacuate the chamber until the pressure in the chamber was reduced to 0.02 Pa or less. A 100 nm film of compound (Z127) was formed at a deposition rate of 0.2 nm / sec on a glass substrate on which a metal mask with an opening of 20 mm x 10 mm was placed. The metal mask was then removed, and ytterbium was deposited at a deposition rate of 0.01 nm / sec to a thickness of 2 nm, followed by silver deposition at a deposition rate of 0.1 nm / sec to a thickness of 20 nm. No ytterbium or silver was deposited on the area on which compound (Z127) was deposited, and a 20 mm x 10 mm transparent area was formed (transmittance: ≧90%).

[0311] Example 17-1 "Evaluation of adhesion of compound (Z127) to CVD film" The glass substrate was washed by boiling with isopropyl alcohol, and then washed with ultraviolet light and ozone. After that, it was placed in a vacuum deposition apparatus and 1.0 × 10 -4The chamber was evacuated with a vacuum pump until the pressure in the chamber was reduced to less than 1 Pa. A 100 nm film of compound (Z127) was formed at a deposition rate of 0.2 nm / sec on a glass substrate with a metal mask having an opening of 20 mm x 10 mm. The metal mask was then removed, and ytterbium was deposited at a deposition rate of 0.01 nm / sec to a thickness of 2 nm, followed by silver deposition at a deposition rate of 0.1 nm / sec to a thickness of 20 nm. Further, a CVD film (SiN) was deposited at 11 Ω / sec, and after one day, it was visually confirmed that there was no peeling in the area where compound (Z127) was deposited.

[0312] [Synthesis of compound (Z128) and evaluation of metal adhesion and adhesion to CVD films] Example 18-1 Synthesis of Z128

[0313] [ka]

[0314] Under a nitrogen atmosphere, the intermediate (AA-501) (3.0 mmol), piperazine (1.4 mmol), xylene (100 ml), palladium acetate (0.01 mmol), tri-tert-butylphosphine (0.02 mmol), and potassium t-butoxide (4.0 mmol) were mixed and stirred at 140°C for 20 hours. Water and ethyl acetate were added, and the organic layer was taken out and dehydrated with sodium sulfate. After filtering the sodium sulfate, the mixture was concentrated with an evaporator, and the residue was recrystallized from ethyl acetate and ethanol. The precipitated solid was filtered, and further purified by column chromatography to obtain the target product Z128 (yield 30%). The compound was identified by FDMS measurement (FDMS: 2062.10).

[0315] Example 18-1' Evaluation of metal adhesion of compound (Z128) The glass substrate was washed by boiling with isopropyl alcohol, and then washed with ultraviolet light and ozone. After that, it was placed in a vacuum deposition apparatus and 1.0 × 10 -4The vacuum pump was used to evacuate the chamber until the pressure was below 1 Pa. A 100 nm film of compound (Z128) was formed at a deposition rate of 0.2 nm / sec on a glass substrate on which a metal mask with an opening of 20 mm x 10 mm was placed. The metal mask was then removed, and ytterbium was deposited at a deposition rate of 0.01 nm / sec to a thickness of 2 nm, followed by silver deposition at a deposition rate of 0.1 nm / sec to a thickness of 20 nm. No ytterbium or silver was deposited on the area on which compound (Z128) was deposited, and a 20 mm x 10 mm transparent area was formed (transmittance: ≧90%).

[0316] Example 18-1 "Evaluation of adhesion of compound (Z128) to CVD film" The glass substrate was washed by boiling with isopropyl alcohol, and then washed with ultraviolet light and ozone. After that, it was placed in a vacuum deposition apparatus and 1.0 × 10 -4 The chamber was evacuated with a vacuum pump until the pressure in the chamber was below 1 Pa. A 100 nm film of compound (Z128) was formed at a deposition rate of 0.2 nm / sec on a glass substrate with a metal mask having an opening of 20 mm x 10 mm. The metal mask was then removed, and ytterbium was deposited at a deposition rate of 0.01 nm / sec to a thickness of 2 nm, followed by silver deposition at a deposition rate of 0.1 nm / sec to a thickness of 20 nm. Further, a CVD film (SiN) was deposited at 11 Ω / sec, and after one day, it was visually confirmed that there was no peeling in the area where compound (Z128) was deposited.

[0317] [Synthesis of compound (Z130) and evaluation of metal adhesion and adhesion to CVD films] Example 19-1 Synthesis of Z130

[0318] [ka]

[0319] Under a nitrogen atmosphere, the intermediate (AA-601) (3.0 mmol), homopiperazine (1.4 mmol), xylene (100 ml), palladium acetate (0.01 mmol), tri-tert-butylphosphine (0.02 mmol), and potassium t-butoxide (4.0 mmol) were mixed and stirred at 140°C for 20 hours. Water and ethyl acetate were added, and the organic layer was taken out and dehydrated with sodium sulfate. After filtering the sodium sulfate, the mixture was concentrated with an evaporator, and the residue was recrystallized from ethyl acetate and ethanol. The precipitated solid was filtered, and further purified by column chromatography to obtain the target product Z127 (yield 17%). The compound was identified by FDMS measurement (FDMS: 2076.12).

[0320] Example 19-1' Evaluation of metal adhesion of compound (Z130) The glass substrate was washed by boiling with isopropyl alcohol, and then washed with ultraviolet light and ozone. After that, it was placed in a vacuum deposition apparatus and 1.0 × 10 -4 The chamber was evacuated with a vacuum pump until the pressure in the chamber was reduced to 0.02 Pa or less. A 100 nm film of the compound (Z130) was formed at a deposition rate of 0.2 nm / sec on a glass substrate on which a metal mask with an opening of 20 mm x 10 mm was placed. The metal mask was then removed, and 2 nm of ytterbium was deposited at a deposition rate of 0.01 nm / sec, followed by deposition of 20 nm of silver at a deposition rate of 0.1 nm / sec. No films of ytterbium or silver were formed on the part on which the compound (Z130) was deposited, forming a 20 mm x 10 mm transparent region (transmittance: ≧90%).

[0321] Example 19-1 "Evaluation of adhesion of compound (Z130) to CVD film" The glass substrate was washed by boiling with isopropyl alcohol, and then washed with ultraviolet light and ozone. After that, it was placed in a vacuum deposition apparatus and 1.0 × 10 -4The chamber was evacuated with a vacuum pump until the pressure in the chamber was below 1 Pa. A 100 nm film of compound (Z130) was formed at a deposition rate of 0.2 nm / sec on a glass substrate with a metal mask having an opening of 20 mm x 10 mm. The metal mask was then removed, and ytterbium was deposited at a deposition rate of 0.01 nm / sec to a thickness of 2 nm, followed by silver deposition at a deposition rate of 0.1 nm / sec to a thickness of 20 nm. Further, a CVD film (SiN) was deposited at 11 Ω / sec, and after one day, it was visually confirmed that there was no peeling in the area where compound (Z130) was deposited.

[0322] [Synthesis of compound (Z136) and evaluation of metal adhesion and adhesion to CVD films] Example 20-1 Synthesis of Z136

[0323] [ka]

[0324] Under a nitrogen atmosphere, the intermediate (AA-401) (3.0 mmol) was dissolved in DMSO (50 ml), copper powder (50 mmol) was added, and the mixture was stirred at 150°C for 12 hours. Ammonium water and ethyl acetate were added, and the organic layer was taken out and dehydrated with sodium sulfate. After filtering the sodium sulfate, the mixture was concentrated with an evaporator, and the residue was recrystallized from ethyl acetate and ethanol. The precipitated solid was filtered to obtain the target product Z136 (yield 42%). The compound was identified by FDMS measurement (FDMS: 1578.06).

[0325] Example 20-1' Evaluation of metal adhesion of compound (Z136) The glass substrate was washed by boiling with isopropyl alcohol, and then washed with ultraviolet light and ozone. After that, it was placed in a vacuum deposition apparatus and 1.0 × 10 -4The vacuum pump was used to evacuate the chamber until the pressure was below 1 Pa. A 100 nm film of compound (Z136) was formed at a deposition rate of 0.2 nm / sec on a glass substrate on which a metal mask with an opening of 20 mm x 10 mm was placed. The metal mask was then removed, and ytterbium was deposited at a deposition rate of 0.01 nm / sec to a thickness of 2 nm, followed by silver deposition at a deposition rate of 0.1 nm / sec to a thickness of 20 nm. No ytterbium or silver was deposited on the area on which compound (Z136) was deposited, and a 20 mm x 10 mm transparent area was formed (transmittance: ≧90%).

[0326] Example 20-1 "Evaluation of adhesion of compound (Z136) to CVD film" The glass substrate was washed by boiling with isopropyl alcohol, and then washed with ultraviolet light and ozone. After that, it was placed in a vacuum deposition apparatus and 1.0 × 10 -4 The chamber was evacuated with a vacuum pump until the pressure in the chamber was below 1 Pa. A 100 nm film of compound (Z136) was formed at a deposition rate of 0.2 nm / sec on a glass substrate with a metal mask having an opening of 20 mm x 10 mm. The metal mask was then removed, and ytterbium was deposited at a deposition rate of 0.01 nm / sec to a thickness of 2 nm, followed by silver deposition at a deposition rate of 0.1 nm / sec to a thickness of 20 nm. Further, a CVD film (SiN) was deposited at 11 Ω / sec, and after one day, it was visually confirmed that there was no peeling in the area where compound (Z136) was deposited.

[0327] [Synthesis of compound (Z138) and evaluation of metal adhesion and adhesion to CVD films] Example 21-1 Synthesis of intermediate (AA-1001)

[0328] [ka]

[0329] Under a nitrogen atmosphere, 6-bromo-2,4-dichloroquinazoline (3.0 mmol) was mixed with trifluoroethanol (9.0 mmol), THF (100 ml), and potassium hydroxide, and the mixture was stirred at 70°C for 4 hours. After cooling to room temperature, water (300 mL) was added, and the mixture was stirred at room temperature for 30 minutes. The precipitated solid was filtered and washed with methanol. After drying at 50°C, the desired intermediate (AA-1001) was obtained (yield 72%).

[0330] The compounds were identified by FDMS measurement.

[0331] FDMS: 367.98 Example 21-2 Synthesis of Z138

[0332] [ka]

[0333] Under a nitrogen atmosphere, the intermediate (AA-1001) (3.0 mmol) was dissolved in DMSO (50 ml), copper powder (50 mmol) was added, and the mixture was stirred at 150°C for 12 hours. Ammonium water and ethyl acetate were added, and the organic layer was taken out and dehydrated with sodium sulfate. After filtering the sodium sulfate, the mixture was concentrated with an evaporator, and the residue was recrystallized from ethyl acetate and ethanol. The precipitated solid was filtered to obtain the target product Z138 (yield 42%). The compound was identified by FDMS measurement (FDMS: 578.12).

[0334] Example 21-2' Evaluation of metal adhesion of compound (Z138) The glass substrate was washed by boiling with isopropyl alcohol, and then washed with ultraviolet light and ozone. After that, it was placed in a vacuum deposition apparatus and 1.0 × 10 -4The vacuum pump was used to evacuate the chamber until the pressure was below 1 Pa. A 100 nm film of compound (Z138) was formed at a deposition rate of 0.2 nm / sec on a glass substrate on which a metal mask with an opening of 20 mm x 10 mm was placed. The metal mask was then removed, and ytterbium was deposited at a deposition rate of 0.01 nm / sec to a thickness of 2 nm, followed by silver deposition at a deposition rate of 0.1 nm / sec to a thickness of 20 nm. No ytterbium or silver was deposited on the area on which compound (Z138) was deposited, and a 20 mm x 10 mm transparent area was formed (transmittance: ≧90%).

[0335] Example 21-2 "Evaluation of adhesion of compound (Z138) to CVD film" The glass substrate was washed by boiling with isopropyl alcohol, and then washed with ultraviolet light and ozone. After that, it was placed in a vacuum deposition apparatus and 1.0 × 10 -4 The chamber was evacuated with a vacuum pump until the pressure in the chamber was below 1 Pa. A 100 nm film of compound (Z138) was formed at a deposition rate of 0.2 nm / sec on a glass substrate with a metal mask having an opening of 20 mm x 10 mm. The metal mask was then removed, and ytterbium was deposited at a deposition rate of 0.01 nm / sec to a thickness of 2 nm, followed by silver deposition at a deposition rate of 0.1 nm / sec to a thickness of 20 nm. Further, a CVD film (SiN) was deposited at 11 Ω / sec, and after one day, it was visually confirmed that there was no peeling in the area where compound (Z138) was deposited.

[0336] [Synthesis of compound (Z169) and evaluation of metal adhesion and adhesion to CVD films] Example 22-1 Synthesis of Z169

[0337] [ka]

[0338] Under a nitrogen atmosphere, 2,5,8-trichloro-1,3,4,6,7,9,9b-heptaazaphenalene (3.0 mmol) was mixed with 1H,1H,9H-hexadecafluoro-1-nonanol (10.0 mmol), THF (100 ml), and potassium hydroxide, and the mixture was stirred at 70°C for 5 hours. After cooling to room temperature, water (300 mL) was added and the mixture was stirred at room temperature for 30 minutes. The precipitated solid was filtered and washed with methanol. After drying at 50°C, the mixture was recrystallized with ethyl acetate and ethanol to obtain the desired intermediate (Z169) (yield 69%).

[0339] The compounds were identified by FDMS measurement.

[0340] FDMS:1463.00 Example 22-1' Evaluation of metal adhesion of compound (Z169) The glass substrate was washed by boiling with isopropyl alcohol, and then washed with ultraviolet light and ozone. After that, it was placed in a vacuum deposition apparatus and 1.0 × 10 -4 The chamber was evacuated with a vacuum pump until the pressure was below 1 Pa. A 100 nm film of compound (Z169) was formed at a deposition rate of 0.2 nm / sec on a glass substrate on which a metal mask with an opening of 20 mm x 10 mm was placed. The metal mask was then removed, and 2 nm of ytterbium was deposited at a deposition rate of 0.01 nm / sec, followed by 20 nm of silver at a deposition rate of 0.1 nm / sec. No ytterbium or silver was deposited on the area on which compound (Z169) was deposited, forming a 20 mm x 10 mm transparent area (transmittance: ≧90%).

[0341] Example 22-1 "Evaluation of adhesion of compound (Z169) to CVD film" The glass substrate was washed by boiling with isopropyl alcohol, and then washed with ultraviolet light and ozone. After that, it was placed in a vacuum deposition apparatus and 1.0 × 10 -4The chamber was evacuated with a vacuum pump until the pressure in the chamber was below 1 Pa. A 100 nm film of compound (Z169) was formed at a deposition rate of 0.2 nm / sec on a glass substrate with a metal mask having an opening of 20 mm x 10 mm. The metal mask was then removed, and ytterbium was deposited at a deposition rate of 0.01 nm / sec to a thickness of 2 nm, followed by silver deposition at a deposition rate of 0.1 nm / sec to a thickness of 20 nm. Further, a CVD film (SiN) was deposited at 11 Ω / sec, and after one day, it was visually confirmed that there was no peeling in the area where compound (Z169) was deposited.

[0342] [Synthesis of compound (Z170) and evaluation of metal adhesion and adhesion to CVD films] Example 23-1 Synthesis of Z170

[0343] [ka]

[0344] Under a nitrogen atmosphere, 2,5,8-trichloro-1,3,4,6,7,9,9b-heptaazaphenalene (3.0 mmol) was mixed with 1H,1H,7H-decafluoro-1-heptanol (10.0 mmol), THF (100 ml), and potassium hydroxide, and the mixture was stirred at 70°C for 5 hours. After cooling to room temperature, water (300 mL) was added and the mixture was stirred at room temperature for 30 minutes. The precipitated solid was filtered and washed with methanol. After drying at 50°C, the mixture was recrystallized from ethyl acetate and ethanol to obtain the desired intermediate (Z170) (yield 47%).

[0345] The compounds were identified by FDMS measurement.

[0346] FDMS:1163.02 Example 23-1' Evaluation of metal adhesion of compound (Z170) The glass substrate was washed by boiling with isopropyl alcohol, and then washed with ultraviolet light and ozone. After that, it was placed in a vacuum deposition apparatus and 1.0 × 10 -4The vacuum pump was used to evacuate the chamber until the pressure in the chamber was reduced to 0.1 Pa or less. A 100 nm film of compound (Z170) was formed at a deposition rate of 0.2 nm / sec on a glass substrate on which a metal mask with an opening of 20 mm x 10 mm was placed. The metal mask was then removed, and ytterbium was deposited at a deposition rate of 0.01 nm / sec to a thickness of 2 nm, followed by deposition of silver at a deposition rate of 0.1 nm / sec to a thickness of 20 nm. No ytterbium or silver was deposited on the area on which compound (Z170) was deposited, and a 20 mm x 10 mm transparent area was formed (transmittance: ≧90%).

[0347] Example 23-1 "Evaluation of adhesion of compound (Z170) to CVD film" The glass substrate was washed by boiling with isopropyl alcohol, and then washed with ultraviolet light and ozone. After that, it was placed in a vacuum deposition apparatus and 1.0 × 10 -4 The chamber was evacuated with a vacuum pump until the pressure in the chamber was below 1 Pa. A 100 nm film of compound (Z170) was formed at a deposition rate of 0.2 nm / sec on a glass substrate with a metal mask having an opening of 20 mm x 10 mm. The metal mask was then removed, and ytterbium was deposited at a deposition rate of 0.01 nm / sec to a thickness of 2 nm, followed by silver deposition at a deposition rate of 0.1 nm / sec to a thickness of 20 nm. Further, a CVD film (SiN) was deposited at 11 Ω / sec, and after one day, it was visually confirmed that there was no peeling in the area where compound (Z170) was deposited.

[0348] Comparative Example 24-1' Evaluation of metal adhesion of comparative compound (X0001)

[0349] [ka]

[0350] The adhesion of metal to the compound (X0001) was evaluated in the same manner as in Example 23-1'. Films of ytterbium and silver were also formed on the film of the compound (X0001), and no transparent region was formed.

[0351] Transmittance: ≧50% The adhesion of the compound (X0001) to the CVD film was evaluated in the same manner as in Example 23-1". Peeling off of the portion where the compound (X0001) was vapor-deposited was confirmed by visual inspection.

[0352] Comparative Example 25-1' Evaluation of metal adhesion of comparative compound (X0002)

[0353] [ka]

[0354] The adhesion of metal to the compound (X0002) was evaluated in the same manner as in Example 23-1'. Films of ytterbium and silver were formed on the film of the compound (X0002), and no transparent region was formed.

[0355] Transmittance: ≧60% The adhesion of the compound (X0002) to the CVD film was evaluated in the same manner as in Example 23-1". Peeling off of the portion where the compound (X0002) was vapor-deposited was confirmed by visual inspection.

[0356] Comparative Example 26-1' Evaluation of metal adhesion of comparative compound (X0003)

[0357] [ka]

[0358] The adhesion of metal to the compound (X0003) was evaluated in the same manner as in Example 23-1'. No ytterbium or silver was formed on the film of the compound (X0003), and a transparent region was formed. Transmittance: ≧40% The adhesion of the compound (X0003) to the CVD film was evaluated in the same manner as in Example 23-1". Peeling off of the portion where the compound (X0003) was vapor-deposited was confirmed by visual inspection.

[0359] Comparative Example 27-1' Evaluation of metal adhesion of comparative compound (X0004)

[0360] [ka]

[0361] The adhesion of metal to compound (X0003) was evaluated in the same manner as in Example 23-1'. No ytterbium or silver was formed on the film of compound (X0004), and a transparent region was formed. Transmittance: ≧40% The adhesion of the compound (X0003) to the CVD film was evaluated in the same manner as in Example 23-1". Peeling off of the portion where the compound (X0004) was vapor-deposited was confirmed by visual inspection.

[0362] The transmittance of each of the above compounds and the results of adhesion to the CVD film are summarized in Table 1 below.

[0363] [Table 1]

[0364] The present disclosure includes the following embodiments. [1] A metal patterning material comprising a nitrogen-containing heterocyclic compound having a fused ring skeleton represented by the following formula (G1) or (G2):

[0365] [ka]

[0366] In formula (G1), each A independently has a ring structure condensed with a nitrogen-containing heterocycle, and the ring structure is an aromatic hydrocarbon ring having 5 to 26 carbon atoms which may be substituted, or It represents an optionally substituted heteroaromatic ring having 3 to 26 carbon atoms.

[0367] B is bonded to a nitrogen-containing heterocycle or A, and O. S, NR 101 (R 101represents a monocyclic, linked or fused aromatic hydrocarbon group having 6 to 26 carbon atoms, a monocyclic, linked or fused heteroaromatic group having 3 to 26 carbon atoms, a linear, branched or cyclic aliphatic hydrocarbon group having 1 to 18 carbon atoms, or formula (B1), a monocyclic, linked or condensed ring, optionally substituted, mono- to tetravalent aromatic hydrocarbon ring having 5 to 26 carbon atoms; a monocyclic, linked or fused ring, optionally substituted mono- to tetravalent heteroaromatic ring having 3 to 26 carbon atoms; a linear, branched or cyclic, optionally substituted, monovalent to tetravalent aliphatic hydrocarbon ring having 3 to 18 carbon atoms; or It represents a monocyclic, linked ring, or condensed ring which may be substituted, mono- to tetravalent, heteroaliphatic hydrocarbon ring having 3 to 20 carbon atoms.

[0368] R 1 are each independently N(R 101 )2(R 101 has the same definition as above.) Hydrogen atoms, Halogen atoms, an optionally substituted monocyclic, linked or fused ring aromatic hydrocarbon group having 6 to 26 carbon atoms; an optionally substituted monocyclic, linked or fused ring heteroaromatic group having 3 to 26 carbon atoms; an optionally substituted linear, branched or cyclic aliphatic hydrocarbon group having 1 to 18 carbon atoms; an optionally substituted monocyclic, linked or fused heteroaliphatic hydrocarbon group having 3 to 26 carbon atoms; or It represents a group having a fluoroalkyl structure and is represented by the following formula (B1).

[0369] [ka]

[0370] In formula (B1), L 2 are each independently O. S, a linear, branched or cyclic divalent aliphatic hydrocarbon group having 1 to 18 carbon atoms which may be substituted with a fluorine atom; a vinylene group optionally substituted with fluorine, or It represents a vinylene group which may form a ring.

[0371] Each f independently represents an integer of 0 to 4.

[0372] Each g independently represents an integer of 1 to 4.

[0373] Each Rf independently represents a monovalent group having 1 to 18 carbon atoms and containing 3 or more fluorine atoms.

[0374] R 2 each independently represents a group having a fluoroalkyl structure and is represented by the above formula (B1).

[0375] x 101 each independently represents an integer of 0 to 5.

[0376] y 101 each independently represents an integer of 1 to 6.

[0377] z 101 each independently represents an integer of 0 to 5.

[0378] v 101 each independently represents an integer of 0 to 5.

[0379] However, z 101 or v 101 One of the following represents an integer from 1 to 5.

[0380] [ka]

[0381] In formula (G2), two C's have a ring structure fused to the nitrogen-containing heterocycle shown in formula (G2), and the ring structure is each independently an aromatic hydrocarbon ring having 5 to 26 carbon atoms which may be substituted; an optionally substituted heteroaromatic ring having 3 to 26 carbon atoms; an optionally substituted aliphatic hydrocarbon ring having 5 to 18 carbon atoms, or It represents an optionally substituted heteroaliphatic hydrocarbon ring having 5 to 26 carbon atoms.

[0382] In addition, two C's may be condensed with each other.

[0383] R 3 represents a group having a fluoroalkyl structure and represented by the above formula (B1).

[0384] R 4 are each independently N(R 101 )2(R 101 has the same definition as above.) Hydrogen atom, Halogen atoms, an optionally substituted monocyclic, linked or fused ring aromatic hydrocarbon group having 6 to 26 carbon atoms; an optionally substituted monocyclic, linked or fused ring heteroaromatic group having 3 to 26 carbon atoms; an optionally substituted linear, branched or cyclic aliphatic hydrocarbon group having 1 to 18 carbon atoms; an optionally substituted monocyclic, linked or fused heteroaliphatic hydrocarbon group having 3 to 26 carbon atoms; or It represents a group having a fluoroalkyl structure and is represented by the above formula (B1).

[0385] X represents N or C.

[0386] r 101 each independently represents an integer of 1 to 6. [2] R 2 , R 3 Each independently represents a group represented by the following formula (001):

[0387] [ka]

[0388] In formula (001), Rf 001 each independently represents a linear, branched or cyclic aliphatic hydrocarbon group having 1 to 18 carbon atoms and containing 3 or more fluorine atoms; L 001 are each independently O. S, a linear, branched or cyclic divalent aliphatic hydrocarbon group having 1 to 18 carbon atoms which may be substituted with a fluorine atom; a vinylene group optionally substituted with fluorine, or It represents a vinylene group which may form a ring.

[0389] Each a001 independently represents an integer of 0 to 4.

[0390] Each a002 independently represents an integer of 1 to 4. [3] In formula (G1), each A is independently an optionally substituted monocyclic, linked or fused aromatic hydrocarbon ring having 5 to 26 carbon atoms; or The metal patterning material according to [1], which is a monocyclic, linked, or fused heteroaromatic ring having 3 to 26 carbon atoms and which may be substituted. [4] In formula (G1), each A is independently a monocyclic, linked or fused aromatic hydrocarbon ring having 5 to 26 carbon atoms and having at least one structure selected from the group consisting of a benzene ring, a biphenyl ring, a terphenyl ring, a naphthalene ring, a fluorene ring, a spirobifluorene ring, a 9,9-dimethylfluorene ring, a 9,9-diphenylfluorene ring, a benzofluorene ring, a phenanthrene ring, a fluoranthene ring, a triphenylene ring, an anthracene ring, a pyrene ring, a chrysene ring, a perylene ring, a benzochrysene ring, and a dibenzochrysene ring (these rings may be substituted); or The metal patterning material according to [1], which is a monocyclic, linked or fused heteroaromatic ring having 5 to 26 carbon atoms (these rings may be substituted) having at least one structure selected from the group consisting of a pyridine ring, a pyrimidine ring, a pyrazine ring, a triazine ring, a carbazole ring, a quinoline ring, an isoquinoline ring, a quinazoline ring, a furan ring, a thiophene ring, a pyrrole ring, a benzofuran ring, a benzothiophene ring, an indole ring, a benzodioxin ring, a dibenzofuran ring, a dibenzothiophene ring, a thiazole ring, a dibenzodioxin ring, and a benzothiazole ring. [5] In formula (G1), when A is a substituted aromatic hydrocarbon ring having 5 to 26 carbon atoms or a substituted heteroaromatic ring having 3 to 26 carbon atoms, these substituents represented by "substituted" are each independently A linear, branched, or cyclic aliphatic hydrocarbon group having 1 to 18 carbon atoms, A linear, branched, or cyclic alkoxy group having 1 to 18 carbon atoms, an aromatic hydrocarbon ring having 6 to 20 carbon atoms; A heteroaromatic ring having 3 to 20 carbon atoms, a cyclic heteroaliphatic hydrocarbon ring having 6 to 20 carbon atoms; a cyano group, a fluorine atom, a deuterium atom, a group represented by formula (B1), or The metal patterning material according to [1], wherein these groups are combined. [6] In formula (G1), when A is a substituted aromatic ring having 5 to 26 carbon atoms or a substituted heterocycle having 3 to 26 carbon atoms, these substituents each independently represent a methyl group, an ethyl group, a methoxy group, an ethoxy group, a trifluoromethyl group, a trifluoromethoxy group, a perfluoroalkyl group having 2 to 10 carbon atoms, a perfluoroalkoxy group having 2 to 10 carbon atoms, a cyano group, a deuterium atom, a fluorine atom, a phenyl group which may be substituted with a fluorine atom, a biphenylyl group which may be substituted with a fluorine atom, a naphthyl group which may be substituted with a fluorine atom, a phenanthryl group which may be substituted with a fluorine atom, a pyridyl group which may be substituted with a fluorine atom, a pyrimidyl group which may be substituted with a fluorine atom, a carbazolyl group which may be substituted with a fluorine atom, a quinazolyl group which may be substituted with a fluorine atom, a dibenzothienyl group which may be substituted with a fluorine atom, a dibenzofuranyl group which may be substituted with a fluorine atom, a group represented by formula (B1), or The metal patterning material according to [1], wherein these groups are combined. [7] In formula (G1), each B is independently O, S, N(R 101 )2, a monovalent to tetravalent aromatic hydrocarbon ring having 5 to 26 carbon atoms and consisting of a ring structure selected from the group consisting of benzene, biphenyl, terphenyl, naphthalene, fluorene, spirobifluorene, 9,9-dimethylfluorene, 9,9-diphenylfluorene, benzofluorene, phenanthrene, fluoranthene, triphenyl, anthracene, pyrene, chrysene, perylene, benzochrysene, dibenzochrysene, triptycene, and corannulene (these rings may be substituted); a monovalent to tetravalent heteroaromatic ring having 3 to 26 carbon atoms and consisting of a ring structure selected from the group consisting of pyridine, pyrimidine, pyrazine, pyrimidine, triazine, carbazole, quinazoline, furan, thiophene, benzofuran, benzothiophene, dibenzofuran, dibenzothiophene, thiazoline, thiadiazoline, acridine, phenoxazine, phenothiazine, and benzothiazoline (these rings may be substituted); a monovalent to tetravalent aliphatic hydrocarbon ring having 3 to 18 carbon atoms and consisting of a ring structure selected from the group consisting of adamantane, diamantane, norbornene, cyclohexane, methane, ethane, propane, isopropane, butane, isobutane, heptane, octane, nonane, decane, undecane, dodecane, tridecane, tetradecane, pentadecane, hexadecane, heptadecane, octadecane, nonadecane, and eicodecane (these rings may be substituted); or The metal patterning material according to [1], which is a mono- to tetravalent heteroaliphatic hydrocarbon ring having 3 to 20 carbon atoms and consisting of a ring structure selected from the group consisting of pyrrolidine, piperidine, piperazine, homopiperazine, dihydroacridine, 1,2,3,4-tetrahydroquinoxaline, 2,3,4,5-tetrahydro-1H-benzo[b][1,4]diazapine, and 2,3,4,5-tetrahydro-1H-1,4-benzodiazepine (these rings may be substituted). [8] In formula (G1), when B is a substituted mono- to tetravalent aromatic hydrocarbon ring having 5 to 26 carbon atoms, a substituted mono- to tetravalent heteroaromatic ring having 3 to 26 carbon atoms, a substituted mono- to tetravalent aliphatic hydrocarbon group having 3 to 18 carbon atoms, or a substituted mono- to tetravalent heteroaliphatic hydrocarbon ring having 3 to 20 carbon atoms, these substituents represented by "substituted" are each independently A linear, branched, or cyclic aliphatic hydrocarbon group having 1 to 18 carbon atoms, A linear, branched, or cyclic alkoxy group having 1 to 18 carbon atoms, an aromatic hydrocarbon group having 6 to 20 carbon atoms; a heteroaromatic group having 3 to 20 carbon atoms; a cyclic heteroaliphatic hydrocarbon group having 6 to 20 carbon atoms; a cyano group, a fluorine atom, a deuterium atom, a group represented by formula (B1), or The metal patterning material according to [1], wherein these groups are combined. [9] In formula (G1), when B is a substituted mono- to tetravalent aromatic ring having 5 to 26 carbon atoms or a substituted mono- to tetravalent heterocycle having 3 to 26 carbon atoms, these substituents represented by "substituted" are each independently a methyl group, an ethyl group, a methoxy group, an ethoxy group, a trifluoromethyl group, a trifluoromethoxy group, a perfluoroalkyl group having 2 to 10 carbon atoms, a perfluoroalkoxy group having 2 to 10 carbon atoms, a cyano group, a deuterium atom, a fluorine atom, a phenyl group which may be substituted with a fluorine atom, a biphenylyl group which may be substituted with a fluorine atom, a naphthyl group which may be substituted with a fluorine atom, a phenanthryl group which may be substituted with a fluorine atom, a pyridyl group which may be substituted with a fluorine atom, a pyrimidyl group which may be substituted with a fluorine atom, a carbazolyl group which may be substituted with a fluorine atom, a quinazolyl group which may be substituted with a fluorine atom, a dibenzothienyl group which may be substituted with a fluorine atom, a dibenzofuranyl group which may be substituted with a fluorine atom, a structure represented by formula (B1), or The metal patterning material according to [1], wherein these groups are combined.

[10] In formula (G2), each C is independently at least one monocyclic, linked or fused aromatic hydrocarbon ring having 5 to 26 carbon atoms selected from the group consisting of a benzene ring, a biphenyl ring, a terphenyl ring, a naphthalene ring, a fluorene ring, a spirobifluorene ring, a 9,9-dimethylfluorene ring, a 9,9-diphenylfluorene ring, a benzofluorene ring, a phenanthrene ring, a fluoranthene ring, a triphenylyl ring, an anthracene ring, a pyrene ring, a chrysene ring, a perylene ring, a benzochrysene ring, a dibenzochrysene ring, a triptycene ring, and a corannulene ring (these rings may have a substituent); at least one monocyclic, linked or condensed heteroaromatic ring having 3 to 26 carbon atoms selected from the group consisting of a pyridine ring, a pyrimidine ring, a pyrazine ring, a pyrimidine ring, a triazine ring, a carbazole ring, a quinazoline ring, a furan ring, a thiophene ring, a benzofuran ring, a benzothiophene ring, a dibenzofuran ring, a dibenzothiophene ring, a thiazoline ring, a thiadiazoline ring, a thianthrine ring, an acridine ring, a phenoxazine ring, a phenothiazine ring, a benzothiazoline ring, and a carbazole ring (these rings may have a substituent); At least one aliphatic hydrocarbon ring having 5 to 18 carbon atoms selected from the group consisting of an adamantane ring, a diamantane ring, a norbornene ring, and a cyclohexane ring (these rings may have a substituent), or The metal patterning material according to [1], which is at least one type of monocyclic, linked or fused heteroaliphatic hydrocarbon ring having 5 to 26 carbon atoms selected from the group consisting of a pyrrolidine ring, a piperidine ring, a piperazine ring, a homopiperazine ring, and a dihydroacridine ring (these rings may have a substituent).

[11] In formula (G2), when C is a ring having substituents, these substituents are each independently A linear, branched, or cyclic aliphatic hydrocarbon group having 1 to 18 carbon atoms, A linear, branched, or cyclic alkoxy group having 1 to 18 carbon atoms, an aromatic hydrocarbon group having 6 to 20 carbon atoms; a heteroaromatic group having 3 to 20 carbon atoms; a heteroaliphatic hydrocarbon group having 6 to 20 carbon atoms; a cyano group, a fluorine atom, a deuterium atom, a group represented by formula (B1), or The metal patterning material according to [1], wherein these groups are combined.

[12] In formula (G2), when C is a ring having substituents, these substituents are each independently a methyl group, an ethyl group, a methoxy group, an ethoxy group, a trifluoromethyl group, a trifluoromethoxy group, a perfluoroalkyl group having 2 to 10 carbon atoms, a perfluoroalkoxy group having 2 to 10 carbon atoms, a cyano group, a deuterium atom, a fluorine atom, a phenyl group which may be substituted with a fluorine atom, a biphenylyl group which may be substituted with a fluorine atom, a naphthyl group which may be substituted with a fluorine atom, a phenanthryl group which may be substituted with a fluorine atom, a pyridyl group which may be substituted with a fluorine atom, a pyrimidyl group which may be substituted with a fluorine atom, a carbazolyl group which may be substituted with a fluorine atom, a quinazolyl group which may be substituted with a fluorine atom, a dibenzothienyl group which may be substituted with a fluorine atom, a dibenzofuranyl group which may be substituted with a fluorine atom, a group represented by formula (B1), or The metal patterning material according to [1], wherein these groups are combined.

[13] R 1 or R 4 but, at least one optionally substituted monocyclic, linked or fused aromatic hydrocarbon group having 6 to 26 carbon atoms selected from the group consisting of a phenyl group, a biphenyl group, a terphenyl group, a naphthyl group, a fluorenyl group, a spirobifluorenyl group, a 9,9-dimethylfluorenyl group, a 9,9-diphenylfluorenyl group, a benzofluorenyl group, a phenanthryl group, a fluoranthenyl group, a triphenylyl group, an anthryl group, a pyrenyl group, a chrysenyl group, a perylenyl group, a benzochrysenyl group, a dibenzochrysenyl group, a triptycenyl group, and a corannulenyl group; at least one optionally substituted monocyclic, linked or fused ring heteroaromatic group having 3 to 26 carbon atoms selected from the group consisting of a pyridyl group, a pyrimidyl group, a pyrazyl group, a pyrimidyl group, a triazyl group, a carbazolyl group, a quinazoline group, a furanyl group, a thienyl group, a benzofuranyl group, a benzothienyl group, a dibenzofuranyl group, a dibenzothienyl group, a thiazolyl group, a thiadiazolyl group, a thianthryl group, an acridyl group, a phenoxazyl group, a phenothiazyl group, a benzothiazolyl group, and a carbazolyl group; at least one optionally substituted monocyclic, linked or fused ring heteroaliphatic hydrocarbon group having 3 to 26 carbon atoms selected from the group consisting of an adamantyl group, a diamantyl group, a norbornyl group, a cyclohexyl group, a methyl group, an ethyl group, a propyl group, an isopropyl group, a butyl group, an isobutyl group, a heptyl group, an octyl group, a nonyl group, a decyl group, an undecyl group, a dodecyl group, a tridecyl group, a tetradecyl group, a pentadecyl group, a hexadecyl group, a heptadecyl group, an octadecyl group, a nonadecyl group, and an eicodecyl group; at least one optionally substituted monocyclic, linked or fused heteroaliphatic hydrocarbon group having 3 to 26 carbon atoms selected from the group consisting of a pyrrolidine group, a piperidyl group, a piperadyl group, a homopiperazyl group, and a dihydroacridyl group; N(R 101 )2, or The metal patterning material according to [1], which is a group represented by formula (B1).

[14] R 1 or R 4 When is a ring having substituents, the substituents are each independently A linear, branched, or cyclic aliphatic hydrocarbon group having 1 to 18 carbon atoms, a linear, branched, or cyclic alkoxy group having 1 to 18 carbon atoms; an aromatic hydrocarbon group having 6 to 20 carbon atoms; a heteroaromatic group having 3 to 20 carbon atoms; a fluorine atom, a deuterium atom, a group represented by formula (B1), or The metal patterning material according to [1], wherein these groups are combined.

[15] R 101 but, Phenyl group, biphenyl group, terphenyl group, naphthyl group, fluorene group, spirobifluorene group, 9,9-dimethylfluorene group, 9,9-diphenylfluorene group, benzofluorene group, phenanthrene group, fluoranthene group, triphenylene group, anthracene group, pyrene group, chrysene group, perylene group, benzochrysene group, dibenzochrysene group, triptycene group, corannulene group, pyridine group, pyrimidine group, pyrazine group, triazine group, carbazole group, furan group, thiophene group, benzyl group, a benzofuran group, a benzothiophene group, a dibenzofuran group, a dibenzothiophene group, a thiazole group, a thiadiazole group, a thianthrene group, an acridine group, a dihydroacridine group, a phenoxazine group, a phenothiazine group, a benzothiazole group, a methyl group, an ethyl group, a propyl group, a pentyl group, a hexyl group, a heptyl group, an octyl group, a cyclopentyl group, a cyclohexyl group, a cycloheptyl group, a cyclooctyl group, an adamantane group, a diamantane group, a norbornene group, a group represented by formula (B1), or The metal patterning material according to [1], wherein these groups are combined.

[16] R 101 When is a ring having substituents, the substituents are each independently A linear, branched, or cyclic aliphatic hydrocarbon group having 1 to 18 carbon atoms, a linear, branched, or cyclic alkoxy group having 1 to 18 carbon atoms; an aromatic hydrocarbon group having 6 to 20 carbon atoms; a heteroaromatic group having 3 to 20 carbon atoms; a fluorine atom, a deuterium atom, a group represented by formula (B1), or The metal patterning material according to [1], wherein these groups are combined.

[17] R 101 When is a ring having substituents, the substituents are each independently a methyl group, an ethyl group, a methoxy group, an ethoxy group, a trifluoromethyl group, a trifluoromethoxy group, a perfluoroalkyl group having 2 to 10 carbon atoms, a perfluoroalkoxy group having 2 to 10 carbon atoms, a cyano group, a deuterium atom, a fluorine atom, a phenyl group which may be substituted with a fluorine atom, a biphenylyl group which may be substituted with a fluorine atom, a naphthyl group which may be substituted with a fluorine atom, a phenanthryl group which may be substituted with a fluorine atom, a pyridyl group which may be substituted with a fluorine atom, a carbazolyl group which may be substituted with a fluorine atom, a dibenzothienyl group which may be substituted with a fluorine atom, a dibenzofuranyl group which may be substituted with a fluorine atom, a group represented by formula (B1), or The metal patterning material according to [1], wherein these groups are combined.

[18] A nitrogen-containing heterocyclic compound having a fused ring skeleton represented by the following formula (G1) or (G2).

[0391] [ka]

[0392] In formula (G1), each A independently has a ring structure condensed with a nitrogen-containing heterocycle, and the ring structure is an aromatic hydrocarbon ring having 5 to 26 carbon atoms which may be substituted, or It represents an optionally substituted heteroaromatic ring having 3 to 26 carbon atoms.

[0393] B is bonded to a nitrogen-containing heterocycle or A, and O. S, NR 101 (R 101 represents a monocyclic, linked or fused aromatic hydrocarbon group having 6 to 26 carbon atoms, a monocyclic, linked or fused heteroaromatic group having 3 to 26 carbon atoms, a linear, branched or cyclic aliphatic hydrocarbon group having 1 to 18 carbon atoms, or formula (B1), a monocyclic, linked or condensed ring, optionally substituted, mono- to tetravalent aromatic hydrocarbon ring having 5 to 26 carbon atoms; a monocyclic, linked or fused ring, optionally substituted mono- to tetravalent heteroaromatic ring having 3 to 26 carbon atoms; a linear, branched or cyclic, optionally substituted, monovalent to tetravalent aliphatic hydrocarbon ring having 3 to 18 carbon atoms; or It represents a monocyclic, linked ring, or condensed ring which may be substituted, mono- to tetravalent, heteroaliphatic hydrocarbon ring having 3 to 20 carbon atoms.

[0394] R 1 are each independently N(R 101 )2(R 101 has the same definition as above.) Hydrogen atoms, Halogen atoms, an optionally substituted monocyclic, linked or fused ring aromatic hydrocarbon group having 6 to 26 carbon atoms; an optionally substituted monocyclic, linked or fused ring heteroaromatic group having 3 to 26 carbon atoms; an optionally substituted linear, branched or cyclic aliphatic hydrocarbon group having 1 to 18 carbon atoms; an optionally substituted monocyclic, linked or fused heteroaliphatic hydrocarbon group having 3 to 26 carbon atoms; or It represents a group having a fluoroalkyl structure and is represented by the following formula (B1).

[0395] [ka]

[0396] In formula (B1), L 2 are each independently O. S, a linear, branched or cyclic divalent aliphatic hydrocarbon group having 1 to 18 carbon atoms which may be substituted with a fluorine atom; a vinylene group optionally substituted with fluorine, or It represents a vinylene group which may form a ring.

[0397] Each f independently represents an integer of 0 to 4.

[0398] Each g independently represents an integer of 1 to 4.

[0399] Each Rf independently represents a monovalent group having 1 to 18 carbon atoms and containing 3 or more fluorine atoms.

[0400] R 2 each independently represents a group having a fluoroalkyl structure and is represented by the above formula (B1).

[0401] x 101 each independently represents an integer of 0 to 5.

[0402] y 101 each independently represents an integer of 1 to 6.

[0403] z 101 each independently represents an integer of 1 to 5.

[0404] v 101 each independently represents an integer of 0 to 5.

[0405] However, z 101 or v 101 One of the following represents an integer from 1 to 5.

[0406] [ka]

[0407] In formula (G2), two C's have a ring structure fused to the nitrogen-containing heterocycle shown in formula (G2), and the ring structure is each independently an aromatic hydrocarbon ring having 5 to 26 carbon atoms which may be substituted; an optionally substituted heteroaromatic ring having 3 to 26 carbon atoms; an optionally substituted aliphatic hydrocarbon ring having 5 to 18 carbon atoms, or It represents an optionally substituted heteroaliphatic hydrocarbon ring having 5 to 26 carbon atoms.

[0408] In addition, two C's may be condensed with each other.

[0409] R 3 represents a group having a fluoroalkyl structure and represented by the above formula (B1).

[0410] R 4 are each independently N(R 101 )2(R 101 has the same definition as above.) Hydrogen atom, Halogen atoms, an optionally substituted monocyclic, linked or fused ring aromatic hydrocarbon group having 6 to 26 carbon atoms; an optionally substituted monocyclic, linked or fused ring heteroaromatic group having 3 to 26 carbon atoms; an optionally substituted linear, branched or cyclic aliphatic hydrocarbon group having 1 to 18 carbon atoms; an optionally substituted monocyclic, linked or fused heteroaliphatic hydrocarbon group having 3 to 26 carbon atoms; or It represents a group having a fluoroalkyl structure and is represented by the above formula (B1).

[0411] X represents N or C.

[0412] r 101 each independently represents an integer of 1 to 6.

[19] R 2 , R 3 each independently represents a group represented by the following formula (001):

[0413] [ka]

[0414] In formula (001), Rf 001 each independently represents a linear, branched or cyclic aliphatic hydrocarbon group having 1 to 18 carbon atoms and containing 3 or more fluorine atoms; L001 are each independently O. S, a linear, branched or cyclic divalent aliphatic hydrocarbon group having 1 to 18 carbon atoms which may be substituted with a fluorine atom; a vinylene group optionally substituted with fluorine, or It represents a vinylene group which may form a ring.

[0415] Each a001 independently represents an integer of 0 to 4.

[0416] Each a002 independently represents an integer of 1 to 4.

[20] In formula (G1), each A is independently an optionally substituted monocyclic, linked or fused aromatic hydrocarbon ring having 5 to 26 carbon atoms; or The nitrogen-containing heterocyclic compound according to

[18] , which is a monocyclic, linked or fused heteroaromatic ring having 3 to 26 carbon atoms and which may be substituted. [twenty one] In formula (G1), each A is independently a monocyclic, linked or fused aromatic hydrocarbon ring having 5 to 26 carbon atoms and having at least one structure selected from the group consisting of a benzene ring, a biphenyl ring, a terphenyl ring, a naphthalene ring, a fluorene ring, a spirobifluorene ring, a 9,9-dimethylfluorene ring, a 9,9-diphenylfluorene ring, a benzofluorene ring, a phenanthrene ring, a fluoranthene ring, a triphenylene ring, an anthracene ring, a pyrene ring, a chrysene ring, a perylene ring, a benzochrysene ring, and a dibenzochrysene ring (these rings may be substituted); or The nitrogen-containing heterocyclic compound according to

[18] , which is a monocyclic, linked or fused heteroaromatic ring having 5 to 26 carbon atoms (these rings may be substituted) having at least one structure selected from the group consisting of a pyridine ring, a pyrimidine ring, a pyrazine ring, a triazine ring, a carbazole ring, a quinoline ring, an isoquinoline ring, a quinazoline ring, a furan ring, a thiophene ring, a pyrrole ring, a benzofuran ring, a benzothiophene ring, an indole ring, a benzodioxin ring, a dibenzofuran ring, a dibenzothiophene ring, a thiazole ring, a dibenzodioxin ring, and a benzothiazole ring. [twenty two] In formula (G1), when A is a substituted aromatic hydrocarbon ring having 5 to 26 carbon atoms or a substituted heteroaromatic ring having 3 to 26 carbon atoms, these substituents represented by "substituted" are each independently A linear, branched, or cyclic aliphatic hydrocarbon group having 1 to 18 carbon atoms, A linear, branched, or cyclic alkoxy group having 1 to 18 carbon atoms, an aromatic hydrocarbon ring having 6 to 20 carbon atoms; A heteroaromatic ring having 3 to 20 carbon atoms, a cyclic heteroaliphatic hydrocarbon ring having 6 to 20 carbon atoms; a cyano group, a fluorine atom, a deuterium atom, a group represented by formula (B1), or The nitrogen-containing heterocyclic compound according to

[18] , wherein the nitrogen-containing heterocyclic compound is a group formed by combining these groups. [twenty three] In formula (G1), when A is a substituted aromatic ring having 5 to 26 carbon atoms or a substituted heterocycle having 3 to 26 carbon atoms, these substituents each independently represent a methyl group, an ethyl group, a methoxy group, an ethoxy group, a trifluoromethyl group, a trifluoromethoxy group, a perfluoroalkyl group having 2 to 10 carbon atoms, a perfluoroalkoxy group having 2 to 10 carbon atoms, a cyano group, a deuterium atom, a fluorine atom, a phenyl group which may be substituted with a fluorine atom, a biphenylyl group which may be substituted with a fluorine atom, a naphthyl group which may be substituted with a fluorine atom, a phenanthryl group which may be substituted with a fluorine atom, a pyridyl group which may be substituted with a fluorine atom, a pyrimidyl group which may be substituted with a fluorine atom, a carbazolyl group which may be substituted with a fluorine atom, a quinazolyl group which may be substituted with a fluorine atom, a dibenzothienyl group which may be substituted with a fluorine atom, a dibenzofuranyl group which may be substituted with a fluorine atom, a group represented by formula (B1), or The nitrogen-containing heterocyclic compound according to

[18] , wherein the nitrogen-containing heterocyclic compound is a group formed by combining these groups. [twenty four] In formula (G1), each B is independently O, S, N(R 101 )2, a monovalent to tetravalent aromatic hydrocarbon ring having 5 to 26 carbon atoms and consisting of a ring structure selected from the group consisting of benzene, biphenyl, terphenyl, naphthalene, fluorene, spirobifluorene, 9,9-dimethylfluorene, 9,9-diphenylfluorene, benzofluorene, phenanthrene, fluoranthene, triphenyl, anthracene, pyrene, chrysene, perylene, benzochrysene, dibenzochrysene, triptycene, and corannulene (these rings may be substituted); a monovalent to tetravalent heteroaromatic ring having 3 to 26 carbon atoms and consisting of a ring structure selected from the group consisting of pyridine, pyrimidine, pyrazine, pyrimidine, triazine, carbazole, quinazoline, furan, thiophene, benzofuran, benzothiophene, dibenzofuran, dibenzothiophene, thiazoline, thiadiazoline, acridine, phenoxazine, phenothiazine, and benzothiazoline (these rings may be substituted); a monovalent to tetravalent aliphatic hydrocarbon ring having 3 to 18 carbon atoms and consisting of a ring structure selected from the group consisting of adamantane, diamantane, norbornene, cyclohexane, methane, ethane, propane, isopropane, butane, isobutane, heptane, octane, nonane, decane, undecane, dodecane, tridecane, tetradecane, pentadecane, hexadecane, heptadecane, octadecane, nonadecane, and eicodecane (these rings may be substituted); or The nitrogen-containing heterocyclic compound according to

[18] , which is a mono- to tetravalent heteroaliphatic hydrocarbon ring having 3 to 20 carbon atoms and consisting of a ring structure selected from the group consisting of pyrrolidine, piperidine, piperazine, homopiperazine, dihydroacridine, 1,2,3,4-tetrahydroquinoxaline, 2,3,4,5-tetrahydro-1H-benzo[b][1,4]diazapine, and 2,3,4,5-tetrahydro-1H-1,4-benzodiazepine (these rings may be substituted). [twenty five] In formula (G1), when B is a substituted mono- to tetravalent aromatic hydrocarbon ring having 5 to 26 carbon atoms, a substituted mono- to tetravalent heteroaromatic ring having 3 to 26 carbon atoms, a substituted mono- to tetravalent aliphatic hydrocarbon group having 3 to 18 carbon atoms, or a substituted mono- to tetravalent heteroaliphatic hydrocarbon ring having 3 to 20 carbon atoms, these substituents represented by "substituted" are each independently A linear, branched, or cyclic aliphatic hydrocarbon group having 1 to 18 carbon atoms, A linear, branched, or cyclic alkoxy group having 1 to 18 carbon atoms, an aromatic hydrocarbon group having 6 to 20 carbon atoms; a heteroaromatic group having 3 to 20 carbon atoms; a cyclic heteroaliphatic hydrocarbon group having 6 to 20 carbon atoms; a cyano group, a fluorine atom, a deuterium atom, a group represented by formula (B1), or The nitrogen-containing heterocyclic compound according to

[18] , wherein the nitrogen-containing heterocyclic compound is a group formed by combining these groups.

[26] In formula (G1), when B is a substituted mono- to tetravalent aromatic ring having 5 to 26 carbon atoms or a substituted mono- to tetravalent heterocycle having 3 to 26 carbon atoms, these substituents represented by "substituted" are each independently a methyl group, an ethyl group, a methoxy group, an ethoxy group, a trifluoromethyl group, a trifluoromethoxy group, a perfluoroalkyl group having 2 to 10 carbon atoms, a perfluoroalkoxy group having 2 to 10 carbon atoms, a cyano group, a deuterium atom, a fluorine atom, a phenyl group which may be substituted with a fluorine atom, a biphenylyl group which may be substituted with a fluorine atom, a naphthyl group which may be substituted with a fluorine atom, a phenanthryl group which may be substituted with a fluorine atom, a pyridyl group which may be substituted with a fluorine atom, a pyrimidyl group which may be substituted with a fluorine atom, a carbazolyl group which may be substituted with a fluorine atom, a quinazolyl group which may be substituted with a fluorine atom, a dibenzothienyl group which may be substituted with a fluorine atom, a dibenzofuranyl group which may be substituted with a fluorine atom, a structure represented by formula (B1), or The nitrogen-containing heterocyclic compound according to

[18] , wherein the nitrogen-containing heterocyclic compound is a group formed by combining these groups.

[27] In formula (G2), each C is independently at least one monocyclic, linked or fused aromatic hydrocarbon ring having 5 to 26 carbon atoms selected from the group consisting of a benzene ring, a biphenyl ring, a terphenyl ring, a naphthalene ring, a fluorene ring, a spirobifluorene ring, a 9,9-dimethylfluorene ring, a 9,9-diphenylfluorene ring, a benzofluorene ring, a phenanthrene ring, a fluoranthene ring, a triphenylyl ring, an anthracene ring, a pyrene ring, a chrysene ring, a perylene ring, a benzochrysene ring, a dibenzochrysene ring, a triptycene ring, and a corannulene ring (these rings may have a substituent); at least one monocyclic, linked or condensed heteroaromatic ring having 3 to 26 carbon atoms selected from the group consisting of a pyridine ring, a pyrimidine ring, a pyrazine ring, a pyrimidine ring, a triazine ring, a carbazole ring, a quinazoline ring, a furan ring, a thiophene ring, a benzofuran ring, a benzothiophene ring, a dibenzofuran ring, a dibenzothiophene ring, a thiazoline ring, a thiadiazoline ring, a thianthrine ring, an acridine ring, a phenoxazine ring, a phenothiazine ring, a benzothiazoline ring, and a carbazole ring (these rings may have a substituent); At least one aliphatic hydrocarbon ring having 5 to 18 carbon atoms selected from the group consisting of an adamantane ring, a diamantane ring, a norbornene ring, and a cyclohexane ring (these rings may have a substituent), or The nitrogen-containing heterocyclic compound according to

[18] , which is at least one monocyclic, linked or fused heteroaliphatic hydrocarbon ring having 5 to 26 carbon atoms selected from the group consisting of a pyrrolidine ring, a piperidine ring, a piperazine ring, a homopiperazine ring, and a dihydroacridine ring (these rings may have a substituent).

[28] In formula (G2), when C is a ring having substituents, these substituents are each independently A linear, branched, or cyclic aliphatic hydrocarbon group having 1 to 18 carbon atoms, A linear, branched, or cyclic alkoxy group having 1 to 18 carbon atoms, an aromatic hydrocarbon group having 6 to 20 carbon atoms; a heteroaromatic group having 3 to 20 carbon atoms; a heteroaliphatic hydrocarbon group having 6 to 20 carbon atoms; a cyano group, a fluorine atom, a deuterium atom, a group represented by formula (B1), or The nitrogen-containing heterocyclic compound according to

[18] , wherein the nitrogen-containing heterocyclic compound is a group formed by combining these groups.

[29] In formula (G2), when C is a ring having substituents, these substituents are each independently a methyl group, an ethyl group, a methoxy group, an ethoxy group, a trifluoromethyl group, a trifluoromethoxy group, a perfluoroalkyl group having 2 to 10 carbon atoms, a perfluoroalkoxy group having 2 to 10 carbon atoms, a cyano group, a deuterium atom, a fluorine atom, a phenyl group which may be substituted with a fluorine atom, a biphenylyl group which may be substituted with a fluorine atom, a naphthyl group which may be substituted with a fluorine atom, a phenanthryl group which may be substituted with a fluorine atom, a pyridyl group which may be substituted with a fluorine atom, a pyrimidyl group which may be substituted with a fluorine atom, a carbazolyl group which may be substituted with a fluorine atom, a quinazolyl group which may be substituted with a fluorine atom, a dibenzothienyl group which may be substituted with a fluorine atom, a dibenzofuranyl group which may be substituted with a fluorine atom, a group represented by formula (B1), or The nitrogen-containing heterocyclic compound according to

[18] , wherein the nitrogen-containing heterocyclic compound is a group formed by combining these groups.

[30] R 1 or R 4 but, at least one optionally substituted monocyclic, linked or fused aromatic hydrocarbon group having 6 to 26 carbon atoms selected from the group consisting of a phenyl group, a biphenyl group, a terphenyl group, a naphthyl group, a fluorenyl group, a spirobifluorenyl group, a 9,9-dimethylfluorenyl group, a 9,9-diphenylfluorenyl group, a benzofluorenyl group, a phenanthryl group, a fluoranthenyl group, a triphenylyl group, an anthryl group, a pyrenyl group, a chrysenyl group, a perylenyl group, a benzochrysenyl group, a dibenzochrysenyl group, a triptycenyl group, and a corannulenyl group; at least one optionally substituted monocyclic, linked or fused ring heteroaromatic group having 3 to 26 carbon atoms selected from the group consisting of a pyridyl group, a pyrimidyl group, a pyrazyl group, a pyrimidyl group, a triazyl group, a carbazolyl group, a quinazoline group, a furanyl group, a thienyl group, a benzofuranyl group, a benzothienyl group, a dibenzofuranyl group, a dibenzothienyl group, a thiazolyl group, a thiadiazolyl group, a thianthryl group, an acridyl group, a phenoxazyl group, a phenothiazyl group, a benzothiazolyl group, and a carbazolyl group; at least one optionally substituted monocyclic, linked or fused ring heteroaliphatic hydrocarbon group having 3 to 26 carbon atoms selected from the group consisting of an adamantyl group, a diamantyl group, a norbornyl group, a cyclohexyl group, a methyl group, an ethyl group, a propyl group, an isopropyl group, a butyl group, an isobutyl group, a heptyl group, an octyl group, a nonyl group, a decyl group, an undecyl group, a dodecyl group, a tridecyl group, a tetradecyl group, a pentadecyl group, a hexadecyl group, a heptadecyl group, an octadecyl group, a nonadecyl group, and an eicodecyl group; at least one optionally substituted monocyclic, linked or fused heteroaliphatic hydrocarbon group having 3 to 26 carbon atoms selected from the group consisting of a pyrrolidine group, a piperidyl group, a piperadyl group, a homopiperazyl group, and a dihydroacridyl group; N(R 101 )2, or The nitrogen-containing heterocyclic compound according to

[18] , which is a group represented by formula (B1).

[31] R 1 or R 4 When is a ring having substituents, the substituents are each independently A linear, branched, or cyclic aliphatic hydrocarbon group having 1 to 18 carbon atoms, a linear, branched, or cyclic alkoxy group having 1 to 18 carbon atoms; an aromatic hydrocarbon group having 6 to 20 carbon atoms; a heteroaromatic group having 3 to 20 carbon atoms; a fluorine atom, a deuterium atom, a group represented by formula (B1), or The nitrogen-containing heterocyclic compound according to

[18] , wherein the nitrogen-containing heterocyclic compound is a group formed by combining these groups.

[32] R 101 but, Phenyl group, biphenyl group, terphenyl group, naphthyl group, fluorene group, spirobifluorene group, 9,9-dimethylfluorene group, 9,9-diphenylfluorene group, benzofluorene group, phenanthrene group, fluoranthene group, triphenylene group, anthracene group, pyrene group, chrysene group, perylene group, benzochrysene group, dibenzochrysene group, triptycene group, corannulene group, pyridine group, pyrimidine group, pyrazine group, triazine group, carbazole group, furan group, thiophene group, benzyl group, a benzofuran group, a benzothiophene group, a dibenzofuran group, a dibenzothiophene group, a thiazole group, a thiadiazole group, a thianthrene group, an acridine group, a dihydroacridine group, a phenoxazine group, a phenothiazine group, a benzothiazole group, a methyl group, an ethyl group, a propyl group, a pentyl group, a hexyl group, a heptyl group, an octyl group, a cyclopentyl group, a cyclohexyl group, a cycloheptyl group, a cyclooctyl group, an adamantane group, a diamantane group, a norbornene group, a group represented by formula (B1), or The nitrogen-containing heterocyclic compound according to

[18] , wherein the nitrogen-containing heterocyclic compound is a group formed by combining these groups.

[33] R 101 When is a ring having substituents, the substituents are each independently A linear, branched, or cyclic aliphatic hydrocarbon group having 1 to 18 carbon atoms, a linear, branched, or cyclic alkoxy group having 1 to 18 carbon atoms; an aromatic hydrocarbon group having 6 to 20 carbon atoms; a heteroaromatic group having 3 to 20 carbon atoms; a fluorine atom, a deuterium atom, a group represented by formula (B1), or The nitrogen-containing heterocyclic compound according to

[18] , wherein the nitrogen-containing heterocyclic compound is a group formed by combining these groups.

[34] R 101 When is a ring having substituents, the substituents are each independently a methyl group, an ethyl group, a methoxy group, an ethoxy group, a trifluoromethyl group, a trifluoromethoxy group, a perfluoroalkyl group having 2 to 10 carbon atoms, a perfluoroalkoxy group having 2 to 10 carbon atoms, a cyano group, a deuterium atom, a fluorine atom, a phenyl group which may be substituted with a fluorine atom, a biphenylyl group which may be substituted with a fluorine atom, a naphthyl group which may be substituted with a fluorine atom, a phenanthryl group which may be substituted with a fluorine atom, a pyridyl group which may be substituted with a fluorine atom, a carbazolyl group which may be substituted with a fluorine atom, a dibenzothienyl group which may be substituted with a fluorine atom, a dibenzofuranyl group which may be substituted with a fluorine atom, a group represented by formula (B1), or The nitrogen-containing heterocyclic compound according to

[18] , wherein the nitrogen-containing heterocyclic compound is a group formed by combining these groups.

[35] A thin film for metal patterning, which contains a material for metal patterning and can pattern a metal film or a metal laminate film, The material for metal patterning is the material for metal patterning according to any one of [1] to

[17] , The metal film or metal laminate film is a thin film for metal patterning, which contains at least one selected from the group consisting of ytterbium, magnesium, silver, aluminum, and an alloy of magnesium and silver.

[36] The thin film for metal patterning according to

[35] , having a water contact angle of 90° or more.

[37] An organic electroluminescence element comprising a cathode, The cathode is Contains at least one selected from the group consisting of ytterbium, magnesium, silver, aluminum, and an alloy of magnesium and silver, It is patterned with a metal patterning material, The metal patterning material is the metal patterning material according to any one of [1] to

[17] , for an organic electroluminescence device.

[38] forming an organic material pattern containing the metal patterning material according to any one of [1] to

[17] ; applying a metal material to a region where the organic material pattern is formed and a region where the organic material pattern is not formed, thereby forming a metal pattern in the region where the organic material pattern is not formed.

[39] An electronic device comprising the material for metal patterning according to any one of [1] to

[17] .

Claims

1. A metal patterning material comprising a nitrogen-containing heterocyclic compound having a fused ring skeleton represented by the following formula (G1) or (G2): 【Chemistry 1】 In formula (G1), each A independently has a ring structure fused to a nitrogen-containing heterocycle, and the ring structure is an aromatic hydrocarbon ring having 5 to 26 carbon atoms which may be substituted, or It represents an optionally substituted heteroaromatic ring having 3 to 26 carbon atoms. B is bonded to the nitrogen-containing heterocycle or A, and O. S. N.R. １０１ (R １０１ represents a monocyclic, linked or fused aromatic hydrocarbon group having 6 to 26 carbon atoms, a monocyclic, linked or fused heteroaromatic group having 3 to 26 carbon atoms, a linear, branched or cyclic aliphatic hydrocarbon group having 1 to 18 carbon atoms, or formula (B1), a monocyclic, linked or condensed aromatic hydrocarbon ring which may be substituted, has 1 to 4 valences and has 5 to 26 carbon atoms; a monocyclic, linked or condensed ring, optionally substituted, mono- to tetravalent heteroaromatic ring having 3 to 26 carbon atoms, a linear, branched or cyclic, optionally substituted mono- to tetravalent aliphatic hydrocarbon ring having 3 to 18 carbon atoms; or It represents a monocyclic, linked ring, or condensed ring which may be substituted, mono- to tetravalent, heteroaliphatic hydrocarbon ring having 3 to 20 carbon atoms. R １ are each independently N (R １０１ ) ２ (R １０１ has the same definition as above.) Hydrogen atom, Halogen atoms, an optionally substituted monocyclic, linked or condensed aromatic hydrocarbon group having 6 to 26 carbon atoms, an optionally substituted monocyclic, linked or condensed ring heteroaromatic group having 3 to 26 carbon atoms; an optionally substituted linear, branched or cyclic aliphatic hydrocarbon group having 1 to 18 carbon atoms; an optionally substituted monocyclic, linked, or condensed heteroaliphatic hydrocarbon group having 3 to 26 carbon atoms; or It represents a group having a fluoroalkyl structure and represented by the following formula (B1). 【Chemistry 2】 In formula (B1), L ２ are each independently O. S. a linear, branched or cyclic divalent aliphatic hydrocarbon group having 1 to 18 carbon atoms which may be substituted with a fluorine atom; a vinylene group optionally substituted with fluorine, or It represents a vinylene group which may form a ring. Each f independently represents an integer of 0 to 4. Each g independently represents an integer of 1 to 4. Each Rf independently represents a monovalent group having 1 to 18 carbon atoms and containing 3 or more fluorine atoms. R ２ each independently represents a group having a fluoroalkyl structure and is represented by the above formula (B1). x １０１ each independently represents an integer of 0 to 5. y １０１ each independently represents an integer of 1 to 6. Z １０１ each independently represents an integer of 0 to 5. v １０１ each independently represents an integer of 0 to 5. Here, z １０１ Or v １０１ Either one of them represents an integer of 1 to 5. 【Chemistry 3】 In formula (G2), two Cs have a ring structure fused to the nitrogen-containing heterocycle shown in formula (G2), and the ring structures are each independently an aromatic hydrocarbon ring having 5 to 26 carbon atoms which may be substituted; an optionally substituted heteroaromatic ring having 3 to 26 carbon atoms; an optionally substituted aliphatic hydrocarbon ring having 5 to 18 carbon atoms, or It represents an optionally substituted heteroaliphatic hydrocarbon ring having 5 to 26 carbon atoms. In addition, two C's may be condensed with each other. R ３ represents a group having a fluoroalkyl structure and represented by the above formula (B1). R ４ are each independently N (R １０１ ) ２ (R １０１ has the same definition as above.) Hydrogen atom, Halogen atoms, an optionally substituted monocyclic, linked or condensed aromatic hydrocarbon group having 6 to 26 carbon atoms, an optionally substituted monocyclic, linked or condensed ring heteroaromatic group having 3 to 26 carbon atoms; an optionally substituted linear, branched or cyclic aliphatic hydrocarbon group having 1 to 18 carbon atoms; an optionally substituted monocyclic, linked, or condensed heteroaliphatic hydrocarbon group having 3 to 26 carbon atoms; or It represents a group having a fluoroalkyl structure and is represented by the above formula (B1). X represents N or C. r １０１ each independently represents an integer of 1 to 6.

2. R ２ , R ３ The metal patterning material according to claim 1 , wherein each independently represents a group represented by the following formula (001): 【Chemistry 4】 In formula (001), Rf ００１ each independently represents a linear, branched or cyclic aliphatic hydrocarbon group having 1 to 18 carbon atoms and containing 3 or more fluorine atoms; L ００１ are each independently O. S. a linear, branched or cyclic divalent aliphatic hydrocarbon group having 1 to 18 carbon atoms which may be substituted with a fluorine atom; a vinylene group optionally substituted with fluorine, or It represents a vinylene group which may form a ring. Each a001 independently represents an integer of 0 to 4. Each a002 independently represents an integer of 1 to 4.

3. In formula (G1), each A is independently an aromatic hydrocarbon ring having 5 to 26 carbon atoms which may be substituted, which is a monocyclic, linked or condensed ring; or 2. The metal patterning material according to claim 1, which is a monocyclic, linked or condensed heteroaromatic ring having 3 to 26 carbon atoms which may be substituted.

4. In formula (G1), each A is independently a monocyclic, linked or fused aromatic hydrocarbon ring having 5 to 26 carbon atoms and having at least one structure selected from the group consisting of a benzene ring, a biphenyl ring, a terphenyl ring, a naphthalene ring, a fluorene ring, a spirobifluorene ring, a 9,9-dimethylfluorene ring, a 9,9-diphenylfluorene ring, a benzofluorene ring, a phenanthrene ring, a fluoranthene ring, a triphenylene ring, an anthracene ring, a pyrene ring, a chrysene ring, a perylene ring, a benzochrysene ring, and a dibenzochrysene ring (these rings may be substituted); or 2. The metal patterning material according to claim 1, which is a monocyclic, linked or fused heteroaromatic ring having 5 to 26 carbon atoms (these rings may be substituted) having at least one structure selected from the group consisting of a pyridine ring, a pyrimidine ring, a pyrazine ring, a triazine ring, a carbazole ring, a quinoline ring, an isoquinoline ring, a quinazoline ring, a furan ring, a thiophene ring, a pyrrole ring, a benzofuran ring, a benzothiophene ring, an indole ring, a benzodioxin ring, a dibenzofuran ring, a dibenzothiophene ring, a thiazole ring, a dibenzodioxin ring, and a benzothiazole ring.

5. In formula (G1), when A is a substituted aromatic hydrocarbon ring having 5 to 26 carbon atoms or a substituted heteroaromatic ring having 3 to 26 carbon atoms, these substituents represented by "substituted" are each independently a linear, branched, or cyclic aliphatic hydrocarbon group having 1 to 18 carbon atoms; a linear, branched, or cyclic alkoxy group having 1 to 18 carbon atoms; an aromatic hydrocarbon ring having 6 to 20 carbon atoms; a heteroaromatic ring having 3 to 20 carbon atoms, a cyclic heteroaliphatic hydrocarbon ring having 6 to 20 carbon atoms, a cyano group, a fluorine atom, a deuterium atom, a group represented by formula (B1), or The metal patterning material of claim 1 , wherein these groups are a combination of groups.

6. In formula (G1), when A is a substituted aromatic ring having 5 to 26 carbon atoms or a substituted heterocycle having 3 to 26 carbon atoms, these substituents each independently represent a methyl group, an ethyl group, a methoxy group, an ethoxy group, a trifluoromethyl group, a trifluoromethoxy group, a perfluoroalkyl group having 2 to 10 carbon atoms, a perfluoroalkoxy group having 2 to 10 carbon atoms, a cyano group, a deuterium atom, a fluorine atom, a phenyl group which may be substituted with a fluorine atom, a biphenylyl group which may be substituted with a fluorine atom, a naphthyl group which may be substituted with a fluorine atom, a phenanthryl group which may be substituted with a fluorine atom, a pyridyl group which may be substituted with a fluorine atom, a pyrimidyl group which may be substituted with a fluorine atom, a carbazolyl group which may be substituted with a fluorine atom, a quinazolyl group which may be substituted with a fluorine atom, a dibenzothienyl group which may be substituted with a fluorine atom, a dibenzofuranyl group which may be substituted with a fluorine atom, a group represented by formula (B1), or The metal patterning material of claim 1 , wherein these groups are a combination of groups.

7. In formula (G1), each B is independently O、S、N(R １０１ ) ２ 、 a monovalent to tetravalent aromatic hydrocarbon ring having 5 to 26 carbon atoms and consisting of a ring structure selected from the group consisting of benzene, biphenyl, terphenyl, naphthalene, fluorene, spirobifluorene, 9,9-dimethylfluorene, 9,9-diphenylfluorene, benzofluorene, phenanthrene, fluoranthene, triphenyl, anthracene, pyrene, chrysene, perylene, benzochrysene, dibenzochrysene, triptycene, and corannulene (these rings may be substituted); a mono- to tetravalent heteroaromatic ring having 3 to 26 carbon atoms and consisting of a ring structure selected from the group consisting of pyridine, pyrimidine, pyrazine, pyrimidine, triazine, carbazole, quinazoline, furan, thiophene, benzofuran, benzothiophene, dibenzofuran, dibenzothiophene, thiazoline, thiadiazoline, acridine, phenoxazine, phenothiazine, and benzothiazoline (these rings may be substituted); a monovalent to tetravalent aliphatic hydrocarbon ring having 3 to 18 carbon atoms and consisting of a ring structure selected from the group consisting of adamantane, diamantane, norbornene, cyclohexane, methane, ethane, propane, isopropane, butane, isobutane, heptane, octane, nonane, decane, undecane, dodecane, tridecane, tetradecane, pentadecane, hexadecane, heptadecane, octadecane, nonadecane, and eicodecane (these rings may be substituted); or 2. The metal patterning material according to claim 1, which is a mono- to tetravalent heteroaliphatic hydrocarbon ring having 3 to 20 carbon atoms and consisting of a ring structure selected from the group consisting of pyrrolidine, piperidine, piperazine, homopiperazine, dihydroacridine, 1,2,3,4-tetrahydroquinoxaline, 2,3,4,5-tetrahydro-1H-benzo[b][1,4]diazapine, and 2,3,4,5-tetrahydro-1H-1,4-benzodiazepine (these rings may be substituted).

8. In formula (G1), when B is a substituted mono- to tetravalent aromatic hydrocarbon ring having 5 to 26 carbon atoms, a substituted mono- to tetravalent heteroaromatic ring having 3 to 26 carbon atoms, a substituted mono- to tetravalent aliphatic hydrocarbon group having 3 to 18 carbon atoms, or a substituted mono- to tetravalent heteroaliphatic hydrocarbon ring having 3 to 20 carbon atoms, these substituents represented by "substituted" are each independently a linear, branched, or cyclic aliphatic hydrocarbon group having 1 to 18 carbon atoms; a linear, branched, or cyclic alkoxy group having 1 to 18 carbon atoms; an aromatic hydrocarbon group having 6 to 20 carbon atoms, a heteroaromatic group having 3 to 20 carbon atoms, a cyclic heteroaliphatic hydrocarbon group having 6 to 20 carbon atoms, a cyano group, a fluorine atom, a deuterium atom, a group represented by formula (B1), or The metal patterning material of claim 1 , wherein these groups are a combination of groups.

9. In formula (G1), when B is a substituted mono- to tetravalent aromatic ring having 5 to 26 carbon atoms or a substituted mono- to tetravalent heterocycle having 3 to 26 carbon atoms, these substituents represented by "substituted" are each independently a methyl group, an ethyl group, a methoxy group, an ethoxy group, a trifluoromethyl group, a trifluoromethoxy group, a perfluoroalkyl group having 2 to 10 carbon atoms, a perfluoroalkoxy group having 2 to 10 carbon atoms, a cyano group, a deuterium atom, a fluorine atom, a phenyl group which may be substituted with a fluorine atom, a biphenylyl group which may be substituted with a fluorine atom, a naphthyl group which may be substituted with a fluorine atom, a phenanthryl group which may be substituted with a fluorine atom, a pyridyl group which may be substituted with a fluorine atom, a pyrimidyl group which may be substituted with a fluorine atom, a carbazolyl group which may be substituted with a fluorine atom, a quinazolyl group which may be substituted with a fluorine atom, a dibenzothienyl group which may be substituted with a fluorine atom, a dibenzofuranyl group which may be substituted with a fluorine atom, a structure represented by formula (B1), or The metal patterning material of claim 1 , wherein these groups are a combination of groups.

10. In formula (G2), each C is independently at least one monocyclic, linked or fused aromatic hydrocarbon ring having 5 to 26 carbon atoms selected from the group consisting of a benzene ring, a biphenyl ring, a terphenyl ring, a naphthalene ring, a fluorene ring, a spirobifluorene ring, a 9,9-dimethylfluorene ring, a 9,9-diphenylfluorene ring, a benzofluorene ring, a phenanthrene ring, a fluoranthene ring, a triphenylyl ring, an anthracene ring, a pyrene ring, a chrysene ring, a perylene ring, a benzochrysene ring, a dibenzochrysene ring, a triptycene ring, and a corannulene ring (these rings may have a substituent); at least one monocyclic, linked or condensed heteroaromatic ring having 3 to 26 carbon atoms selected from the group consisting of a pyridine ring, a pyrimidine ring, a pyrazine ring, a pyrimidine ring, a triazine ring, a carbazole ring, a quinazoline ring, a furan ring, a thiophene ring, a benzofuran ring, a benzothiophene ring, a dibenzofuran ring, a dibenzothiophene ring, a thiazoline ring, a thiadiazoline ring, a thianthrine ring, an acridine ring, a phenoxazine ring, a phenothiazine ring, a benzothiazoline ring, and a carbazole ring (these rings may have a substituent); At least one aliphatic hydrocarbon ring having 5 to 18 carbon atoms selected from the group consisting of an adamantane ring, a diamantane ring, a norbornene ring, and a cyclohexane ring (these rings may have a substituent), or 2. The metal patterning material according to claim 1, which is at least one monocyclic, linked or fused heteroaliphatic hydrocarbon ring having 5 to 26 carbon atoms selected from the group consisting of a pyrrolidine ring, a piperidine ring, a piperazine ring, a homopiperazine ring, and a dihydroacridine ring (these rings may have a substituent).

11. In formula (G2), when C is a ring having substituents, these substituents are each independently a linear, branched, or cyclic aliphatic hydrocarbon group having 1 to 18 carbon atoms; a linear, branched, or cyclic alkoxy group having 1 to 18 carbon atoms; an aromatic hydrocarbon group having 6 to 20 carbon atoms, a heteroaromatic group having 3 to 20 carbon atoms, a heteroaliphatic hydrocarbon group having 6 to 20 carbon atoms, a cyano group, a fluorine atom, a deuterium atom, a group represented by formula (B1), or The metal patterning material of claim 1 , wherein these groups are a combination of groups.

12. In formula (G2), when C is a ring having substituents, these substituents are each independently a methyl group, an ethyl group, a methoxy group, an ethoxy group, a trifluoromethyl group, a trifluoromethoxy group, a perfluoroalkyl group having 2 to 10 carbon atoms, a perfluoroalkoxy group having 2 to 10 carbon atoms, a cyano group, a deuterium atom, a fluorine atom, a phenyl group which may be substituted with a fluorine atom, a biphenylyl group which may be substituted with a fluorine atom, a naphthyl group which may be substituted with a fluorine atom, a phenanthryl group which may be substituted with a fluorine atom, a pyridyl group which may be substituted with a fluorine atom, a pyrimidyl group which may be substituted with a fluorine atom, a carbazolyl group which may be substituted with a fluorine atom, a quinazolyl group which may be substituted with a fluorine atom, a dibenzothienyl group which may be substituted with a fluorine atom, a dibenzofuranyl group which may be substituted with a fluorine atom, a group represented by formula (B1), or The metal patterning material of claim 1 , wherein these groups are a combination of groups.

13. R １ Or R ４ but, at least one optionally substituted monocyclic, linked or fused aromatic hydrocarbon group having 6 to 26 carbon atoms selected from the group consisting of a phenyl group, a biphenyl group, a terphenyl group, a naphthyl group, a fluorenyl group, a spirobifluorenyl group, a 9,9-dimethylfluorenyl group, a 9,9-diphenylfluorenyl group, a benzofluorenyl group, a phenanthryl group, a fluoranthenyl group, a triphenylyl group, an anthryl group, a pyrenyl group, a chrysenyl group, a perylenyl group, a benzochrysenyl group, a dibenzochrysenyl group, a triptycenyl group, and a corannulenyl group; at least one optionally substituted monocyclic, linked or fused heteroaromatic group having 3 to 26 carbon atoms selected from the group consisting of a pyridyl group, a pyrimidyl group, a pyrazyl group, a pyrimidyl group, a triazyl group, a carbazolyl group, a quinazoline group, a furanyl group, a thienyl group, a benzofuranyl group, a benzothienyl group, a dibenzofuranyl group, a dibenzothienyl group, a thiazolyl group, a thiadiazolyl group, a thianthryl group, an acridyl group, a phenoxazyl group, a phenothiazyl group, a benzothiazolyl group, and a carbazolyl group; at least one optionally substituted monocyclic, linked or fused heteroaliphatic hydrocarbon group having 3 to 26 carbon atoms selected from the group consisting of an adamantyl group, a diamantyl group, a norbornyl group, a cyclohexyl group, a methyl group, an ethyl group, a propyl group, an isopropyl group, a butyl group, an isobutyl group, a heptyl group, an octyl group, a nonyl group, a decyl group, an undecyl group, a dodecyl group, a tridecyl group, a tetradecyl group, a pentadecyl group, a hexadecyl group, a heptadecyl group, an octadecyl group, a nonadecyl group, and an eicodecyl group; at least one optionally substituted monocyclic, linked or fused heteroaliphatic hydrocarbon group having 3 to 26 carbon atoms selected from the group consisting of a pyrrolidine group, a piperidyl group, a piperadyl group, a homopiperazyl group, and a dihydroacridyl group; N (R １０１ ) ２ or The metal patterning material according to claim 1 , which is a group represented by formula (B1):

14. R １ Or R ４ When is a ring having substituents, the substituents are each independently a linear, branched, or cyclic aliphatic hydrocarbon group having 1 to 18 carbon atoms; a linear, branched, or cyclic alkoxy group having 1 to 18 carbon atoms, an aromatic hydrocarbon group having 6 to 20 carbon atoms, a heteroaromatic group having 3 to 20 carbon atoms, a fluorine atom, a deuterium atom, a group represented by formula (B1), or The metal patterning material of claim 1 , wherein these groups are a combination of groups.

15. R １０１ but, Phenyl group, biphenyl group, terphenyl group, naphthyl group, fluorene group, spirobifluorene group, 9,9-dimethylfluorene group, 9,9-diphenylfluorene group, benzofluorene group, phenanthrene group, fluoranthene group, triphenylene group, anthracene group, pyrene group, chrysene group, perylene group, benzochrysene group, dibenzochrysene group, triptycene group, corannulene group, pyridine group, pyrimidine group, pyrazine group, triazine group, carbazole group, furan group, thiophene group, benzyl group, a benzofuran group, a benzothiophene group, a dibenzofuran group, a dibenzothiophene group, a thiazole group, a thiadiazole group, a thianthrene group, an acridine group, a dihydroacridine group, a phenoxazine group, a phenothiazine group, a benzothiazole group, a methyl group, an ethyl group, a propyl group, a pentyl group, a hexyl group, a heptyl group, an octyl group, a cyclopentyl group, a cyclohexyl group, a cycloheptyl group, a cyclooctyl group, an adamantane group, a diamantane group, a norbornene group, a group represented by formula (B1), or The metal patterning material of claim 1 , wherein these groups are a combination of groups.

16. R １０１ When is a ring having substituents, the substituents are each independently a linear, branched, or cyclic aliphatic hydrocarbon group having 1 to 18 carbon atoms; a linear, branched, or cyclic alkoxy group having 1 to 18 carbon atoms, an aromatic hydrocarbon group having 6 to 20 carbon atoms, a heteroaromatic group having 3 to 20 carbon atoms, a fluorine atom, a deuterium atom, a group represented by formula (B1), or The metal patterning material of claim 1 , wherein these groups are a combination of groups.

17. R １０１ When is a ring having substituents, the substituents are each independently a methyl group, an ethyl group, a methoxy group, an ethoxy group, a trifluoromethyl group, a trifluoromethoxy group, a perfluoroalkyl group having 2 to 10 carbon atoms, a perfluoroalkoxy group having 2 to 10 carbon atoms, a cyano group, a deuterium atom, a fluorine atom, a phenyl group which may be substituted with a fluorine atom, a biphenylyl group which may be substituted with a fluorine atom, a naphthyl group which may be substituted with a fluorine atom, a phenanthryl group which may be substituted with a fluorine atom, a pyridyl group which may be substituted with a fluorine atom, a carbazolyl group which may be substituted with a fluorine atom, a dibenzothienyl group which may be substituted with a fluorine atom, a dibenzofuranyl group which may be substituted with a fluorine atom, a group represented by formula (B1), or The metal patterning material of claim 1 , wherein these groups are a combination of groups.

18. A nitrogen-containing heterocyclic compound having a fused ring skeleton represented by the following formula (G1) or (G2): 【Chemistry 5】 In formula (G1), each A independently has a ring structure fused to a nitrogen-containing heterocycle, and the ring structure is an aromatic hydrocarbon ring having 5 to 26 carbon atoms which may be substituted, or It represents an optionally substituted heteroaromatic ring having 3 to 26 carbon atoms. B is bonded to the nitrogen-containing heterocycle or A, and O. S. N.R. １０１ (R １０１ represents a monocyclic, linked or fused aromatic hydrocarbon group having 6 to 26 carbon atoms, a monocyclic, linked or fused heteroaromatic group having 3 to 26 carbon atoms, a linear, branched or cyclic aliphatic hydrocarbon group having 1 to 18 carbon atoms, or formula (B1), a monocyclic, linked or condensed aromatic hydrocarbon ring which may be substituted, has 1 to 4 valences and has 5 to 26 carbon atoms; a monocyclic, linked or condensed ring, optionally substituted, mono- to tetravalent heteroaromatic ring having 3 to 26 carbon atoms, a linear, branched or cyclic, optionally substituted mono- to tetravalent aliphatic hydrocarbon ring having 3 to 18 carbon atoms; or It represents a monocyclic, linked ring, or condensed ring which may be substituted, mono- to tetravalent, heteroaliphatic hydrocarbon ring having 3 to 20 carbon atoms. R １ are each independently N (R １０１ ) ２ (R １０１ has the same definition as above.) Hydrogen atom, Halogen atoms, an optionally substituted monocyclic, linked or condensed aromatic hydrocarbon group having 6 to 26 carbon atoms, an optionally substituted monocyclic, linked or condensed ring heteroaromatic group having 3 to 26 carbon atoms; an optionally substituted linear, branched or cyclic aliphatic hydrocarbon group having 1 to 18 carbon atoms; an optionally substituted monocyclic, linked, or condensed heteroaliphatic hydrocarbon group having 3 to 26 carbon atoms; or It represents a group having a fluoroalkyl structure and represented by the following formula (B1). 【Chemistry 6】 In formula (B1), L ２ are each independently O. S. a linear, branched or cyclic divalent aliphatic hydrocarbon group having 1 to 18 carbon atoms which may be substituted with a fluorine atom; a vinylene group optionally substituted with fluorine, or It represents a vinylene group which may form a ring. Each f independently represents an integer of 0 to 4. Each g independently represents an integer of 1 to 4. Each Rf independently represents a monovalent group having 1 to 18 carbon atoms and containing 3 or more fluorine atoms. R ２ each independently represents a group having a fluoroalkyl structure and is represented by the above formula (B1). x １０１ each independently represents an integer of 0 to 5. y １０１ each independently represents an integer of 1 to 6. Z １０１ each independently represents an integer of 1 to 5. v １０１ each independently represents an integer of 0 to 5. Here, z １０１ Or v １０１ Either one of them represents an integer of 1 to 5. 【Chemistry 7】 In formula (G2), two Cs have a ring structure fused to the nitrogen-containing heterocycle shown in formula (G2), and the ring structures are each independently an aromatic hydrocarbon ring having 5 to 26 carbon atoms which may be substituted; an optionally substituted heteroaromatic ring having 3 to 26 carbon atoms; an optionally substituted aliphatic hydrocarbon ring having 5 to 18 carbon atoms, or It represents an optionally substituted heteroaliphatic hydrocarbon ring having 5 to 26 carbon atoms. In addition, two C's may be condensed with each other. R ３ represents a group having a fluoroalkyl structure and represented by the above formula (B1). R ４ are each independently N (R １０１ ) ２ (R １０１ has the same definition as above.) Hydrogen atom, Halogen atoms, an optionally substituted monocyclic, linked or condensed aromatic hydrocarbon group having 6 to 26 carbon atoms, an optionally substituted monocyclic, linked or condensed ring heteroaromatic group having 3 to 26 carbon atoms; an optionally substituted linear, branched or cyclic aliphatic hydrocarbon group having 1 to 18 carbon atoms; an optionally substituted monocyclic, linked, or condensed heteroaliphatic hydrocarbon group having 3 to 26 carbon atoms; or It represents a group having a fluoroalkyl structure and is represented by the above formula (B1). X represents N or C. r １０１ each independently represents an integer of 1 to 6.

19. R ２ , R ３ The nitrogen-containing heterocyclic compound according to claim 18, wherein each independently represents a group represented by the following formula (001): 【Chemistry 8】 In formula (001), Rf ００１ each independently represents a linear, branched or cyclic aliphatic hydrocarbon group having 1 to 18 carbon atoms and containing 3 or more fluorine atoms; L ００１ are each independently O. S. a linear, branched or cyclic divalent aliphatic hydrocarbon group having 1 to 18 carbon atoms which may be substituted with a fluorine atom; a vinylene group optionally substituted with fluorine, or It represents a vinylene group which may form a ring. Each a001 independently represents an integer of 0 to 4. Each a002 independently represents an integer of 1 to 4.

20. In formula (G1), each A is independently an aromatic hydrocarbon ring having 5 to 26 carbon atoms which may be substituted, which is a monocyclic, linked or condensed ring; or The nitrogen-containing heterocyclic compound according to claim 18, which is a monocyclic, linked, or condensed heteroaromatic ring having 3 to 26 carbon atoms and which may be substituted.

21. In formula (G1), each A is independently a monocyclic, linked or fused aromatic hydrocarbon ring having 5 to 26 carbon atoms and having at least one structure selected from the group consisting of a benzene ring, a biphenyl ring, a terphenyl ring, a naphthalene ring, a fluorene ring, a spirobifluorene ring, a 9,9-dimethylfluorene ring, a 9,9-diphenylfluorene ring, a benzofluorene ring, a phenanthrene ring, a fluoranthene ring, a triphenylene ring, an anthracene ring, a pyrene ring, a chrysene ring, a perylene ring, a benzochrysene ring, and a dibenzochrysene ring (these rings may be substituted); or The nitrogen-containing heterocyclic compound according to claim 18, which is a monocyclic, linked, or fused heteroaromatic ring having 5 to 26 carbon atoms (these rings may be substituted) having at least one structure selected from the group consisting of a pyridine ring, a pyrimidine ring, a pyrazine ring, a triazine ring, a carbazole ring, a quinoline ring, an isoquinoline ring, a quinazoline ring, a furan ring, a thiophene ring, a pyrrole ring, a benzofuran ring, a benzothiophene ring, an indole ring, a benzodioxin ring, a dibenzofuran ring, a dibenzothiophene ring, a thiazole ring, a dibenzodioxin ring, and a benzothiazole ring.

22. In formula (G1), when A is a substituted aromatic hydrocarbon ring having 5 to 26 carbon atoms or a substituted heteroaromatic ring having 3 to 26 carbon atoms, these substituents represented by "substituted" are each independently a linear, branched, or cyclic aliphatic hydrocarbon group having 1 to 18 carbon atoms; a linear, branched, or cyclic alkoxy group having 1 to 18 carbon atoms; an aromatic hydrocarbon ring having 6 to 20 carbon atoms; a heteroaromatic ring having 3 to 20 carbon atoms, a cyclic heteroaliphatic hydrocarbon ring having 6 to 20 carbon atoms, a cyano group, a fluorine atom, a deuterium atom, a group represented by formula (B1), or The nitrogen-containing heterocyclic compound according to claim 18 , which is a combination of these groups.

23. In formula (G1), when A is a substituted aromatic ring having 5 to 26 carbon atoms or a substituted heterocycle having 3 to 26 carbon atoms, these substituents each independently represent a methyl group, an ethyl group, a methoxy group, an ethoxy group, a trifluoromethyl group, a trifluoromethoxy group, a perfluoroalkyl group having 2 to 10 carbon atoms, a perfluoroalkoxy group having 2 to 10 carbon atoms, a cyano group, a deuterium atom, a fluorine atom, a phenyl group which may be substituted with a fluorine atom, a biphenylyl group which may be substituted with a fluorine atom, a naphthyl group which may be substituted with a fluorine atom, a phenanthryl group which may be substituted with a fluorine atom, a pyridyl group which may be substituted with a fluorine atom, a pyrimidyl group which may be substituted with a fluorine atom, a carbazolyl group which may be substituted with a fluorine atom, a quinazolyl group which may be substituted with a fluorine atom, a dibenzothienyl group which may be substituted with a fluorine atom, a dibenzofuranyl group which may be substituted with a fluorine atom, a group represented by formula (B1), or The nitrogen-containing heterocyclic compound according to claim 18 , which is a combination of these groups.

24. In formula (G1), each B is independently O、S、N(R １０１ ) ２ 、 a monovalent to tetravalent aromatic hydrocarbon ring having 5 to 26 carbon atoms and consisting of a ring structure selected from the group consisting of benzene, biphenyl, terphenyl, naphthalene, fluorene, spirobifluorene, 9,9-dimethylfluorene, 9,9-diphenylfluorene, benzofluorene, phenanthrene, fluoranthene, triphenyl, anthracene, pyrene, chrysene, perylene, benzochrysene, dibenzochrysene, triptycene, and corannulene (these rings may be substituted); a mono- to tetravalent heteroaromatic ring having 3 to 26 carbon atoms and consisting of a ring structure selected from the group consisting of pyridine, pyrimidine, pyrazine, pyrimidine, triazine, carbazole, quinazoline, furan, thiophene, benzofuran, benzothiophene, dibenzofuran, dibenzothiophene, thiazoline, thiadiazoline, acridine, phenoxazine, phenothiazine, and benzothiazoline (these rings may be substituted); a monovalent to tetravalent aliphatic hydrocarbon ring having 3 to 18 carbon atoms and consisting of a ring structure selected from the group consisting of adamantane, diamantane, norbornene, cyclohexane, methane, ethane, propane, isopropane, butane, isobutane, heptane, octane, nonane, decane, undecane, dodecane, tridecane, tetradecane, pentadecane, hexadecane, heptadecane, octadecane, nonadecane, and eicodecane (these rings may be substituted); or The nitrogen-containing heterocyclic compound according to claim 18, which is a mono- to tetravalent heteroaliphatic hydrocarbon ring having 3 to 20 carbon atoms and consisting of a ring structure selected from the group consisting of pyrrolidine, piperidine, piperazine, homopiperazine, dihydroacridine, 1,2,3,4-tetrahydroquinoxaline, 2,3,4,5-tetrahydro-1H-benzo[b][1,4]diazapine, and 2,3,4,5-tetrahydro-1H-1,4-benzodiazepine (these rings may be substituted).

25. In formula (G1), when B is a substituted mono- to tetravalent aromatic hydrocarbon ring having 5 to 26 carbon atoms, a substituted mono- to tetravalent heteroaromatic ring having 3 to 26 carbon atoms, a substituted mono- to tetravalent aliphatic hydrocarbon group having 3 to 18 carbon atoms, or a substituted mono- to tetravalent heteroaliphatic hydrocarbon ring having 3 to 20 carbon atoms, these substituents represented by "substituted" are each independently a linear, branched, or cyclic aliphatic hydrocarbon group having 1 to 18 carbon atoms; a linear, branched, or cyclic alkoxy group having 1 to 18 carbon atoms; an aromatic hydrocarbon group having 6 to 20 carbon atoms, a heteroaromatic group having 3 to 20 carbon atoms, a cyclic heteroaliphatic hydrocarbon group having 6 to 20 carbon atoms, a cyano group, a fluorine atom, a deuterium atom, a group represented by formula (B1), or The nitrogen-containing heterocyclic compound according to claim 18 , which is a combination of these groups.

26. In formula (G1), when B is a substituted mono- to tetravalent aromatic ring having 5 to 26 carbon atoms or a substituted mono- to tetravalent heterocycle having 3 to 26 carbon atoms, these substituents represented by "substituted" are each independently a methyl group, an ethyl group, a methoxy group, an ethoxy group, a trifluoromethyl group, a trifluoromethoxy group, a perfluoroalkyl group having 2 to 10 carbon atoms, a perfluoroalkoxy group having 2 to 10 carbon atoms, a cyano group, a deuterium atom, a fluorine atom, a phenyl group which may be substituted with a fluorine atom, a biphenylyl group which may be substituted with a fluorine atom, a naphthyl group which may be substituted with a fluorine atom, a phenanthryl group which may be substituted with a fluorine atom, a pyridyl group which may be substituted with a fluorine atom, a pyrimidyl group which may be substituted with a fluorine atom, a carbazolyl group which may be substituted with a fluorine atom, a quinazolyl group which may be substituted with a fluorine atom, a dibenzothienyl group which may be substituted with a fluorine atom, a dibenzofuranyl group which may be substituted with a fluorine atom, a structure represented by formula (B1), or The nitrogen-containing heterocyclic compound according to claim 18 , which is a combination of these groups.

27. In formula (G2), each C is independently at least one monocyclic, linked or fused aromatic hydrocarbon ring having 5 to 26 carbon atoms selected from the group consisting of a benzene ring, a biphenyl ring, a terphenyl ring, a naphthalene ring, a fluorene ring, a spirobifluorene ring, a 9,9-dimethylfluorene ring, a 9,9-diphenylfluorene ring, a benzofluorene ring, a phenanthrene ring, a fluoranthene ring, a triphenylyl ring, an anthracene ring, a pyrene ring, a chrysene ring, a perylene ring, a benzochrysene ring, a dibenzochrysene ring, a triptycene ring, and a corannulene ring (these rings may have a substituent); at least one monocyclic, linked or condensed heteroaromatic ring having 3 to 26 carbon atoms selected from the group consisting of a pyridine ring, a pyrimidine ring, a pyrazine ring, a pyrimidine ring, a triazine ring, a carbazole ring, a quinazoline ring, a furan ring, a thiophene ring, a benzofuran ring, a benzothiophene ring, a dibenzofuran ring, a dibenzothiophene ring, a thiazoline ring, a thiadiazoline ring, a thianthrine ring, an acridine ring, a phenoxazine ring, a phenothiazine ring, a benzothiazoline ring, and a carbazole ring (these rings may have a substituent); At least one aliphatic hydrocarbon ring having 5 to 18 carbon atoms selected from the group consisting of an adamantane ring, a diamantane ring, a norbornene ring, and a cyclohexane ring (these rings may have a substituent), or The nitrogen-containing heterocyclic compound according to claim 18, which is at least one monocyclic, linked or fused heteroaliphatic hydrocarbon ring having 5 to 26 carbon atoms selected from the group consisting of a pyrrolidine ring, a piperidine ring, a piperazine ring, a homopiperazine ring, and a dihydroacridine ring (these rings may have a substituent).

28. In formula (G2), when C is a ring having substituents, these substituents are each independently a linear, branched, or cyclic aliphatic hydrocarbon group having 1 to 18 carbon atoms; a linear, branched, or cyclic alkoxy group having 1 to 18 carbon atoms; an aromatic hydrocarbon group having 6 to 20 carbon atoms, a heteroaromatic group having 3 to 20 carbon atoms, a heteroaliphatic hydrocarbon group having 6 to 20 carbon atoms, a cyano group, a fluorine atom, a deuterium atom, a group represented by formula (B1), or The nitrogen-containing heterocyclic compound according to claim 18 , which is a combination of these groups.

29. In formula (G2), when C is a ring having substituents, these substituents are each independently a methyl group, an ethyl group, a methoxy group, an ethoxy group, a trifluoromethyl group, a trifluoromethoxy group, a perfluoroalkyl group having 2 to 10 carbon atoms, a perfluoroalkoxy group having 2 to 10 carbon atoms, a cyano group, a deuterium atom, a fluorine atom, a phenyl group which may be substituted with a fluorine atom, a biphenylyl group which may be substituted with a fluorine atom, a naphthyl group which may be substituted with a fluorine atom, a phenanthryl group which may be substituted with a fluorine atom, a pyridyl group which may be substituted with a fluorine atom, a pyrimidyl group which may be substituted with a fluorine atom, a carbazolyl group which may be substituted with a fluorine atom, a quinazolyl group which may be substituted with a fluorine atom, a dibenzothienyl group which may be substituted with a fluorine atom, a dibenzofuranyl group which may be substituted with a fluorine atom, a group represented by formula (B1), or The nitrogen-containing heterocyclic compound according to claim 18 , which is a combination of these groups.

30. R １ Or R ４ but, at least one optionally substituted monocyclic, linked or fused aromatic hydrocarbon group having 6 to 26 carbon atoms selected from the group consisting of a phenyl group, a biphenyl group, a terphenyl group, a naphthyl group, a fluorenyl group, a spirobifluorenyl group, a 9,9-dimethylfluorenyl group, a 9,9-diphenylfluorenyl group, a benzofluorenyl group, a phenanthryl group, a fluoranthenyl group, a triphenylyl group, an anthryl group, a pyrenyl group, a chrysenyl group, a perylenyl group, a benzochrysenyl group, a dibenzochrysenyl group, a triptycenyl group, and a corannulenyl group; at least one optionally substituted monocyclic, linked or fused heteroaromatic group having 3 to 26 carbon atoms selected from the group consisting of a pyridyl group, a pyrimidyl group, a pyrazyl group, a pyrimidyl group, a triazyl group, a carbazolyl group, a quinazoline group, a furanyl group, a thienyl group, a benzofuranyl group, a benzothienyl group, a dibenzofuranyl group, a dibenzothienyl group, a thiazolyl group, a thiadiazolyl group, a thianthryl group, an acridyl group, a phenoxazyl group, a phenothiazyl group, a benzothiazolyl group, and a carbazolyl group; at least one optionally substituted monocyclic, linked or fused heteroaliphatic hydrocarbon group having 3 to 26 carbon atoms selected from the group consisting of an adamantyl group, a diamantyl group, a norbornyl group, a cyclohexyl group, a methyl group, an ethyl group, a propyl group, an isopropyl group, a butyl group, an isobutyl group, a heptyl group, an octyl group, a nonyl group, a decyl group, an undecyl group, a dodecyl group, a tridecyl group, a tetradecyl group, a pentadecyl group, a hexadecyl group, a heptadecyl group, an octadecyl group, a nonadecyl group, and an eicodecyl group; at least one optionally substituted monocyclic, linked or fused heteroaliphatic hydrocarbon group having 3 to 26 carbon atoms selected from the group consisting of a pyrrolidine group, a piperidyl group, a piperadyl group, a homopiperazyl group, and a dihydroacridyl group; N (R １０１ ) ２ or The nitrogen-containing heterocyclic compound according to claim 18 , which is a group represented by formula (B1):

31. R １ Or R ４ When is a ring having substituents, the substituents are each independently a linear, branched, or cyclic aliphatic hydrocarbon group having 1 to 18 carbon atoms; a linear, branched, or cyclic alkoxy group having 1 to 18 carbon atoms, an aromatic hydrocarbon group having 6 to 20 carbon atoms, a heteroaromatic group having 3 to 20 carbon atoms, a fluorine atom, a deuterium atom, a group represented by formula (B1), or The nitrogen-containing heterocyclic compound according to claim 18 , which is a combination of these groups.

32. R １０１ but, Phenyl group, biphenyl group, terphenyl group, naphthyl group, fluorene group, spirobifluorene group, 9,9-dimethylfluorene group, 9,9-diphenylfluorene group, benzofluorene group, phenanthrene group, fluoranthene group, triphenylene group, anthracene group, pyrene group, chrysene group, perylene group, benzochrysene group, dibenzochrysene group, triptycene group, corannulene group, pyridine group, pyrimidine group, pyrazine group, triazine group, carbazole group, furan group, thiophene group, benzyl group, a benzofuran group, a benzothiophene group, a dibenzofuran group, a dibenzothiophene group, a thiazole group, a thiadiazole group, a thianthrene group, an acridine group, a dihydroacridine group, a phenoxazine group, a phenothiazine group, a benzothiazole group, a methyl group, an ethyl group, a propyl group, a pentyl group, a hexyl group, a heptyl group, an octyl group, a cyclopentyl group, a cyclohexyl group, a cycloheptyl group, a cyclooctyl group, an adamantane group, a diamantane group, a norbornene group, a group represented by formula (B1), or The nitrogen-containing heterocyclic compound according to claim 18 , which is a combination of these groups.

33. R １０１ When is a ring having substituents, the substituents are each independently a linear, branched, or cyclic aliphatic hydrocarbon group having 1 to 18 carbon atoms; a linear, branched, or cyclic alkoxy group having 1 to 18 carbon atoms, an aromatic hydrocarbon group having 6 to 20 carbon atoms, a heteroaromatic group having 3 to 20 carbon atoms, a fluorine atom, a deuterium atom, a group represented by formula (B1), or The nitrogen-containing heterocyclic compound according to claim 18 , which is a combination of these groups.

34. R １０１ When is a ring having substituents, the substituents are each independently a methyl group, an ethyl group, a methoxy group, an ethoxy group, a trifluoromethyl group, a trifluoromethoxy group, a perfluoroalkyl group having 2 to 10 carbon atoms, a perfluoroalkoxy group having 2 to 10 carbon atoms, a cyano group, a deuterium atom, a fluorine atom, a phenyl group which may be substituted with a fluorine atom, a biphenylyl group which may be substituted with a fluorine atom, a naphthyl group which may be substituted with a fluorine atom, a phenanthryl group which may be substituted with a fluorine atom, a pyridyl group which may be substituted with a fluorine atom, a carbazolyl group which may be substituted with a fluorine atom, a dibenzothienyl group which may be substituted with a fluorine atom, a dibenzofuranyl group which may be substituted with a fluorine atom, a group represented by formula (B1), or The nitrogen-containing heterocyclic compound according to claim 18 , which is a combination of these groups.

35. A thin film for metal patterning, which contains a material for metal patterning and can pattern a metal film or a metal laminate film, The metal patterning material is the metal patterning material according to any one of claims 1 to 17, The metal film or metal laminate film is a thin film for metal patterning, which contains at least one selected from the group consisting of ytterbium, magnesium, silver, aluminum, and an alloy of magnesium and silver.

36. The thin film for metal patterning according to claim 35, which has a water contact angle of 90° or more.

37. An organic electroluminescence element comprising a cathode, The cathode is Contains at least one selected from the group consisting of ytterbium, magnesium, silver, aluminum, and an alloy of magnesium and silver, It is patterned with a metal patterning material, An organic electroluminescence element, wherein the metal patterning material is the metal patterning material according to any one of claims 1 to 17.

38. Forming an organic material pattern comprising the metal patterning material according to any one of claims 1 to 17; applying a metal material to a region where the organic material pattern is formed and a region where the organic material pattern is not formed, thereby forming a metal pattern in the region where the organic material pattern is not formed.

39. An electronic device comprising the metal patterning material according to any one of claims 1 to 17.

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