Desmear processing method and light processing device
JP2025027726APending Publication Date: 2025-02-28USHIO INC
Patent Information
- Application Number
- JP2023132790
- Authority / Receiving Office
- JP · JP
- Patent Type
- Applications
- Current Assignee / Owner
- Filing Date
- 2023-08-17
- Publication Date
- 2025-02-28
AI Technical Summary
Benefits of technology
【0019】 デスミア処理を効果的に行うことのできる方法と、当該方法に使用する光処理装置を提供できる。
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Figure 2025027726000001_ABST
Abstract
To provide a desmear method for effectively performing desmear processing and a light processing device used in the desmear processing method.SOLUTION: The desmear processing method includes irradiating a substrate 10 having a hole 5 and a smear 7 in the hole 5 with vacuum ultraviolet light L1 so that the water contact angle of the substrate 10 is 40 to 70 degrees, supplying a swelling liquid to the substrate 10 that has been irradiated with the vacuum ultraviolet light L1 to cause the smear 7 to swell, and supplying a removal liquid to the substrate 10 that has caused the smear 7 to swell to remove the smear 7 from the substrate 10.SELECTED DRAWING: Figure 3A
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Citation Information
Patent Citations
Method for forming via hole on multilayer printed board
JP2001015923A