Lithography device and article producing method

Abstract

To provide a technology advantageous for using a lamp according to a rating in a lithography device.SOLUTION: A lithography device that uses light from a lamp to transfer a pattern from a master to a substrate includes a power supply unit that drives the lamp, a measuring instrument that measures the state of the lamp driven by the power supply unit, and a control unit that identifies the type of the lamp based on the output from the measuring instrument.SELECTED DRAWING: Figure 5

Description

[Technical field]

[0001] The present invention relates to a lithographic apparatus and a method for manufacturing an article. [Background technology]

[0002] Exposure apparatuses are used in the lithography process for manufacturing articles such as semiconductor devices or display devices. In the lithography process, a lithography apparatus may be used that transfers a pattern of an original onto a substrate using light from a lamp. Patent Document 1 discloses an apparatus that includes a one-dimensional and two-dimensional barcode or IC chip in the light source unit of an exposure light source, reads out information recorded in the barcode or IC chip, and performs control according to the specifications of the lamp installed. [Prior art documents] [Patent documents]

[0003] [Patent Document 1] JP 2010-160293 A Summary of the Invention [Problem to be solved by the invention]

[0004] In order to improve productivity, lithography equipment is designed to increase the operating time by extending the lamp replacement cycle through a longer lamp life. Also, by improving the lamp output, the illuminance is improved, and the number of substrates processed per unit time is increased. Thus, multiple types of lamps are provided to accommodate longer life and higher illuminance. Lamps have rated power and life time according to their type, and it is necessary to use the lamps at a power within the rated power and within the life time. If the lamp is lit at a power other than the rated power or beyond its life time, it may deteriorate or break.

[0005] The present invention aims to provide an advantageous technique for compliant lamp use in a lithography apparatus. [Means for solving the problem]

[0006] One aspect of the present invention relates to a lithography apparatus that uses light from a lamp to transfer a pattern of a master onto a substrate, the lithography apparatus comprising: a power supply unit that drives the lamp; a measuring instrument that measures a state of the lamp driven by the power supply unit; and a control unit that determines the type of the lamp based on an output of the measuring instrument. Effect of the Invention

[0007] SUMMARY OF THE PRESENTLY PREFERRED EMBODIMENTS The present invention provides an advantageous technique for compliantly using lamps in a lithography tool. [Brief description of the drawings]

[0008] [Figure 1] 1 is a diagram showing the configuration of an exposure apparatus as a lithography apparatus according to a first embodiment. [Diagram 2] FIG. 2 is a diagram showing a part of the configuration of the exposure apparatus in FIG. 1. [Diagram 3] FIG. 2 is a diagram illustrating examples of lamp types. [Figure 4] FIG. 4 is a diagram illustrating voltage and current characteristics of a lamp. [Diagram 5] FIG. 4 is a diagram showing the flow of an initial setting process accompanying a lamp replacement operation in the first embodiment. [Figure 6] 6 is a diagram illustrating an example of determination ranges for each lamp type stored in a storage unit. [Figure 7] FIG. 4 is a diagram illustrating the specifications for each lamp type. [Figure 8] FIG. 13 is a diagram showing the arrangement of an exposure apparatus as a lithography apparatus according to a second embodiment. [Figure 9] FIG. 11 is a diagram showing the flow of an initial setting process accompanying lamp replacement work in the second embodiment. [Figure 10] FIG. 4 is a diagram illustrating conditions for determining the type of lamp. DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS

[0009] Hereinafter, the embodiments will be described in detail with reference to the attached drawings. Note that the following embodiments do not limit the invention according to the claims. Although the embodiments describe a number of features, not all of these features are essential to the invention, and the features may be combined in any manner. Furthermore, in the attached drawings, the same reference numbers are used for the same or similar configurations, and duplicated descriptions are omitted.

[0010] 1 shows the configuration of an exposure apparatus 1 as a lithography apparatus of the first embodiment. Here, the exposure apparatus 1 will be described as an example of a lithography apparatus, but the lithography apparatus may be an imprint apparatus configured to transfer a pattern of an original onto a substrate using light from a lamp. The imprint apparatus brings a mold as an original into contact with an imprint material on a substrate, and then irradiates the imprint material with light from a lamp to harden the imprint material. As a result, a hardened product of the imprint material onto which the pattern of the mold has been transferred is formed on the substrate.

[0011] The exposure apparatus 1 may be, for example, of a step-and-repeat type or a step-and-scan type. The exposure apparatus 1 exposes the substrate 5 by projecting the pattern of a reticle 3 serving as an original onto the substrate 5 using a projection optical system 4, thereby forming a latent image of the pattern of the reticle 3 on the substrate 5. Here, directions will be described according to an XYZ coordinate system in which the axis parallel to the optical axis of the projection optical system 4 is the Z axis.

[0012] The exposure apparatus 1 may include a light source 21, an illumination optical system 2, a reticle stage mechanism (not shown) that drives a reticle 3, a projection optical system 4, a substrate stage mechanism (not shown) that drives a substrate 5, a masking blade 6, and a control unit CNT.

[0013] The light source 21 may include a lamp 8, a condensing mirror 9, a lamp house 10, a power supply unit 11, an exhaust mechanism 12, and a cooling mechanism 15. The lamp 8 is, for example, an ultra-high pressure mercury lamp. Light from the lamp 8 may be introduced into the illumination optical system 2 using the condensing mirror 9. The power supply unit 11 supplies power to the lamp 8 according to the driving power set by the control unit CNT (main control unit 7). The lamp 8 is stored in the lamp house 10, and the air inside the lamp house 10 is exhausted by the exhaust mechanism 12, whereby heat generated by the lamp 8 is also exhausted from the lamp house 10. The lamp house 10 may be provided with a cooling mechanism 15. The cooling mechanism 15 may cool the anode and cathode of the lamp 8 by blowing clean air onto the lamp 8.

[0014] The illumination optical system 2 adjusts the light emitted from the light source 21 (lamp 8) and illuminates the reticle 3. A masking blade 6 may be installed on a conjugate plane (a plane optically conjugate with the substrate 5) inside the illumination optical system 2. The masking blade 6 may have a light-shielding plate that defines an opening, and a driving mechanism that changes the size and shape of the opening by driving the light-shielding plate. By adjusting the opening of the masking blade 6, the exposure area (irradiation range) can be adjusted so that light does not enter an area outside the shot area of ​​the substrate 5 to be exposed. Here, when the above-mentioned conjugate plane is used as a reference, the illumination optical system 2 is divided into a first illumination optical system 2a from the lamp 8 side to the conjugate plane, and a second illumination optical system 2b from the conjugate plane to the reticle stage mechanism (reticle 3) side.

[0015] The first illumination optical system 2a may include, for example, a shutter for adjusting the exposure amount of the substrate 5, a fly-eye lens for creating uniform illuminance, and a filter for extracting a specific wavelength from the light from the lamp 8. The second illumination optical system 2b may include an imaging lens for irradiating the reticle 3 with light in an irradiation range defined by the masking blade 6. The second illumination optical system 2b includes a detection unit 13 for branching a part of the exposure light using a half mirror or the like and detecting the illuminance. The detection unit 13 may be a line or spot-shaped light amount detector. The reticle 3 has a pattern (for example, a circuit pattern) to be transferred to the substrate 5 formed thereon. Although not shown, the reticle stage mechanism holds the reticle 3 and is movable at least in directions parallel to the X-axis and Y-axis. The reticle 3 is placed at a position (object plane of the projection optical system 4) conjugate to the above-mentioned conjugate plane. The projection optical system 4 projects the pattern of the reticle 3 illuminated by the light from the illumination optical system 2 onto the substrate 5 at a predetermined magnification (for example, 1 / 2 to 1 / 5).

[0016] The substrate 5 is an object having a plate-like member with a resist (photosensitive agent) applied on the surface thereof. The plate-like member may be, for example, a single crystal silicon substrate, a glass substrate, a sapphire substrate, or a compound substrate. The substrate stage mechanism may include, although not shown, a substrate stage having a chuck for holding the substrate 5, and a drive mechanism for driving the substrate stage in at least a direction parallel to the X-axis and Y-axis. The substrate 5 is disposed on the image plane of the projection optical system 4. The exposure apparatus 1 may include a detection unit 14. The detection unit 14 is mounted on the substrate stage, and may detect the amount of exposure light irradiated onto the placement surface (image plane) of the substrate 5. The detection unit 14 may be, for example, a line- or spot-shaped light amount detector.

[0017] The control unit CNT may include a main control unit 7, a discrimination unit 20, and a storage unit 30. The main control unit 7 and the discrimination unit 20 may be configured, for example, by a PLD (abbreviation of Programmable Logic Device) such as an FPGA (abbreviation of Field Programmable Gate Array), or an ASIC (abbreviation of Application Specific Integrated Circuit), or a general-purpose or dedicated computer with a program built in, or a combination of all or part of these. The main control unit 7 and the discrimination unit 20 may be configured by one processor, for example, a PLD such as an FPGA, or an ASIC, or a general-purpose or dedicated computer with a program built in. The control unit CNT or the main control unit 7 may calibrate the illuminance on the arrangement surface of the substrate 5 by calibrating the detection unit 13 using the detection unit 14. When the substrate 5 is exposed to light, the exposure amount of the substrate 5 can be adjusted by adjusting the exposure time using the above-mentioned shutter based on the amount of light measured using the detection unit 13.

[0018] The main control unit 7 can determine the drive power to be set in the power supply unit 11 that drives the lamp 8, based on the illuminance result obtained from the detection unit 14. The main control unit 7 has a function of monitoring the turning on and off of the lamp 8 via the power supply unit 11, and monitoring the elapsed time since the lamp 8 was turned off. The main control unit 7 also has a function of managing the elapsed time since the lamp 8 started to be used. The discrimination unit 20 can discriminate the type of the lamp 8 based on the starting voltage of the lamp 8 when the lamp 8 is turned on and the transient electrical characteristics of the lamp 8, which are provided by the power supply unit 11. Data for discriminating the type of the lamp 8 is stored in the memory unit 30, and can be provided to the discrimination unit 20 as necessary.

[0019] Fig. 2 shows an extracted portion of the configuration of exposure apparatus 1 from Fig. 1. Main control unit 7 sets the drive power of lamp 8 in power supply unit 11 according to a target value of the operational illuminance of exposure apparatus 1. Power supply unit 11 supplies power according to the set drive power to lamp 8. Power supply unit 11 monitors and controls the voltage and current supplied to lamp 8.

[0020] The lamp 8 has an anode and a cathode, and may be configured to emit light by discharge occurring between the anode and the cathode. The voltage between the anode and the cathode may depend on the distance between the anode and the cathode, the composition of the gas filled inside the lamp 8, and the like. Control of the power supplied to the lamp 8 may include control of adjusting the magnitude of the current so that the power supplied to the lamp 8 matches the set driving power under the voltage supplied to the lamp 8.

[0021] The power supply unit 11 includes a measuring instrument 111 that measures the state of the lamp (e.g., the voltage and current supplied to the lamp 8), and may provide the output of the measuring instrument 111 to a discrimination unit 20 that discriminates the type of the lamp 8. The discrimination unit 20 may acquire information necessary for discriminating the type of the lamp 8 from the memory unit 30. The discrimination unit 20 may discriminate the type of the lamp 8 based on the information acquired from the power supply unit 11 (the output of the measuring instrument 111). The discrimination unit 20 may provide the discrimination result of the type of the lamp 8 to the main control unit 7. The main control unit 7 sets the settable range of the driving power, the exhaust volume of the exhaust mechanism 12, and the cooling air volume of the cooling mechanism 15 based on the discrimination result of the type of the lamp 8. The main control unit 7 receives illuminance information notified from the detection units 13 and 14, and adjusts the driving power to the power supply unit 11 so that the illuminance becomes the target illuminance value.

[0022] FIG. 3 shows examples of specifications according to the type of lamp 8. The rated power and lamp life can differ depending on the type of lamp 8 (lamp type). Lamp A and Lamp C have a rated power of 4500 W, so if an exposure apparatus 1 equipped with Lamp A or Lamp C is operated with Lamp B's rated power set to 5000 W, there is a possibility that the lamp will deteriorate and break. On the other hand, the life of Lamp B is 2000 hours, so if an exposure apparatus 1 equipped with Lamp B is operated with Lamp C's life time set to 4000 hours, there is a possibility that the lamp will break.

[0023] FIG. 4 illustrates voltage and current characteristics during lighting of a mercury lamp as an example of lamp 8. A high voltage is applied to a mercury lamp at the beginning of lighting to start lighting. A voltage V1 at lighting start time t1 is set as a starting voltage. After lighting, a current I1 flows through the lamp 8 according to the driving power, and as the lamp 8 warms up, the voltage of the lamp 8 (the voltage supplied to the lamp 8) increases. After the current I1 flows until time t2 according to the increase in the voltage of the lamp 8 and the set value of the driving power, the current drops during the period from time t2 to time t3. The voltage of the lamp 8 becomes voltage V2 at time t3 and stabilizes. The current of the lamp 8 becomes current I2 at time t3 and stabilizes.

[0024] The voltage coefficient G1 of the lamp 8 can be defined as shown in equation (1).

[0025] G1 = (V2 - V1) ÷ (t3 - t1) Equation (1) Moreover, the current coefficient G2 of the lamp 8 can be defined as shown in equation (2).

[0026] G2=(I2-I1)÷(t3-t2)...Equation (2) The starting voltage V1, the voltage coefficient G1, and the current coefficient G2 depend on the structure of the lamp 8, such as the distance between the anode and cathode of the lamp 8 and the outer size of the lamp 8. The starting voltage, the voltage coefficient, and the current coefficient can be measured in advance for each type of lamp 8 and stored in the memory unit 30.

[0027] In the above example, the voltage coefficient and the current coefficient are determined based on the amount of change over a certain period of time after the lamp 8 is turned on, but the voltage coefficient and the current coefficient may also be determined based on approximation coefficients calculated using known approximation methods such as exponential approximation, power approximation, and polynomial approximation.

[0028] Fig. 6 illustrates an example of a determination range according to lamp type stored in memory unit 30. A starting voltage and its determination range, a voltage coefficient and its determination range, and a current coefficient and its determination range, according to lamp type, can be stored in memory unit 30. The example of the determination range for lamp type in Fig. 6 can be used in the determinations in step S5 (determination of starting voltage) and step S6 (voltage and current characteristics) in Fig. 5 described below.

[0029] The starting voltage, voltage coefficient, and current coefficient in Fig. 6 can be obtained in advance for each type of lamp. The starting voltage, voltage coefficient, and current coefficient may be commonly used in exposure apparatuses (lithography apparatuses) of the same configuration, or may be prepared in the exposure apparatus (lithography apparatus). The determination range in Fig. 6 can be determined based on the variations in the starting voltage, voltage coefficient, and current coefficient measured in advance. The determination range may be common information for apparatuses of the same configuration, or it can be obtained for each apparatus.

[0030] FIG. 7 illustrates values ​​of a plurality of parameters that can be set in the exposure apparatus 1 according to the lamp type. The parameter values ​​illustrated in FIG. 7 are stored in the storage unit 30, and the discrimination unit 20 can acquire these values ​​from the storage unit 30. When providing information indicating the lamp type to the main control unit 7, the discrimination unit 20 can also provide the main control unit 7 with the values ​​of each parameter illustrated in FIG. 7. The plurality of parameters can include a rated power that can be set for each lamp type, a lamp life indicating the time during which the lamp can be used, an exhaust flow rate to be set in the exhaust mechanism 12, and a cooling air volume to be set in the cooling mechanism 15. The plurality of parameters can also include a power correction coefficient. The power correction coefficient is a coefficient for calculating the driving power to be set in the power supply unit 11 to obtain the target illuminance, based on the target illuminance, the driving power set in the power supply unit 11, and the illuminance measured using the detection units 13 and 14.

[0031] The main control unit 7 can determine whether the provisionally determined driving power can be set in the power supply unit 11 based on the rated power of the lamp 8. If the driving power provisionally determined based on the target illuminance and the power correction coefficient exceeds the rated power of the lamp, the main control unit 7 notifies the abnormality and does not set the driving power. This makes it possible to light the lamp 8 with an appropriate driving power according to the lamp type, and prevents the lamp 8 from deteriorating or breaking.

[0032] 5 shows the flow of the initial setting process associated with the lamp replacement work. The initial setting process can be executed in response to the implementation of the lamp replacement work. When the lamp replacement work is implemented, information indicating this can be input to the main controller 7. The initial setting process can be executed every time the exposure apparatus 1 is started up.

[0033] In step S1, the main control unit 7 sets the conditions for discrimination. Specifically, the main control unit 7 may set the conditions for the lamp type to which the minimum rated power is assigned among the multiple lamp types (lamp candidates) included in the table shown in FIG. 7 as the conditions for discrimination. In other words, the main control unit 7 sets the minimum rated power among the rated powers of the lamp candidates registered in advance as available lamp candidates as the conditions for discrimination. FIG. 10 illustrates examples of the conditions for discrimination. The power correction coefficient is used in step S10, which switches the settings according to the lamp type. In this embodiment, the conditions for discrimination are set based on the table shown in FIG. 7, but other conditions may be set. In that case, information for discrimination as illustrated in FIG. 6 may be acquired in advance according to the other conditions.

[0034] In step S2, the main control unit 7 checks whether a specified time has passed since the lamp 8 was last turned off. Since the lamp startup characteristics are affected by the temperature state of the lamp 8 and the lamp house 10, by checking that the specified time has passed since the lamp 8 was last turned off, it is possible to guarantee that the lamp 8 and the lamp house 10 have cooled down. When replacing the lamp 8, a waiting time must be provided to ensure safety when touching the lamp 8. Therefore, the specified time is set to a time longer than the sum of the waiting time and the lamp replacement work time, and the lamp replacement work can be performed during the specified time. This makes it possible to reduce the downtime of the exposure apparatus 1.

[0035] In step S2, if a specified time has elapsed, the process proceeds to step S3, otherwise the process proceeds to step S10. In step S3, the main control unit 7 turns on the lamp 8 under the conditions set in step S1. In step S4, the main control unit 7 judges the start-up voltage of the lamp 8, and if the start-up voltage is within the judgment range, it is judged that there is a candidate lamp type and the process proceeds to step S5, otherwise the process proceeds to step S10.

[0036] In step S4, the judgment range in Fig. 6 is used. In the example of Fig. 6, the start-up voltage of Lamp A is 20V, and the judgment range is the start-up voltage ±1V, so the judgment range of the start-up voltage of Lamp A is 19 to 21V. Similarly, the start-up voltage of Lamp B is 16V, and the judgment range is the start-up voltage ±1V, so the judgment range of the start-up voltage of Lamp B is 15 to 17V. Similarly, the start-up voltage of Lamp C is 21V, and the judgment range is the start-up voltage ±1V, so the judgment range of the start-up voltage of Lamp A is 20 to 22V. Therefore, in step S4, for example, if the measurement result of the start-up voltage provided by the power supply unit 11 is 20V, the discrimination unit 20 determines the candidates for the type of lamp 8 attached to the exposure apparatus 1 as Lamp A and Lamp C.

[0037] In step S5, the discrimination unit 20 calculates a voltage coefficient and a current coefficient using equations (1) and (2) from the measurement results of the voltage and current provided by the power supply unit 11. In step S6, the discrimination unit 20 determines whether the voltage coefficient and the current coefficient calculated in step S5 are within at least one of the determination ranges in Fig. 6, and if the voltage coefficient and the current coefficient are within at least one of the determination ranges, it determines that there is a candidate lamp type and proceeds to step S7, otherwise it proceeds to step S10.

[0038] Specifically, in the example of FIG. 6, the voltage coefficient of Lamp A is 0.2 V / min and the judgment range is ±0.01 V / min, so the judgment range of the voltage coefficient of Lamp A is 0.199 V / min to 0.201 V / min. Similarly, the voltage coefficient of Lamp B is 0.5 V / min and the judgment range is ±0.01 V / min, so the judgment range of the voltage coefficient of Lamp A is 0.499 V / min to 0.501 V / min. Similarly, the voltage coefficient of Lamp C is 0.3 V / min and the judgment range is ±0.01 V / min, so the judgment range of the voltage coefficient of Lamp A is 0.299 V / min to 0.301 V / min. Therefore, in step S6, for example, if the voltage coefficient calculated in step S5 is 0.2 V / min, the discrimination unit 20 determines the candidate type of the lamp 8 attached to the exposure apparatus 1 to be Lamp A.

[0039] 6, the current coefficient of the lamp A is -2.0 A / min and the judgment range is ±0.01 A / min, so the judgment range of the current coefficient of the lamp A is -2.010 A / min to -1.990 A / min. Similarly, the current coefficient of the lamp B is -5.0 A / min and the judgment range is ±0.01 A / min, so the judgment range of the current coefficient of the lamp B is -5.010 A / min to -4.990 A / min. Similarly, the current coefficient of the lamp C is -3.0 A / min and the judgment range is ±0.01 A / min, so the judgment range of the current coefficient of the lamp C is -3.010 A / min to -2.990 A / min. Therefore, in step S6, for example, if the voltage coefficient calculated in step S5 is -2.0 A / min, the discrimination unit 20 determines the candidate type of the lamp 8 attached to the exposure apparatus 1 to be the lamp A.

[0040] In step S7, the discrimination unit 20 discriminates the type of lamp from the judgment results of steps S4 and S6, and provides the discriminated type to the main controller 7. For example, if the lamp 8 attached to the exposure apparatus 1 is discriminated to be lamp A, the discrimination unit 20 can provide the discriminated type to the main controller 7 together with the rated power, lamp life, exhaust flow rate, cooling air flow rate, and power correction coefficient of lamp A shown in FIG.

[0041] In step S8, the main control unit 7 starts measuring the usage time of the lamp 8. In step S9, the main control unit 7 performs settings according to the type of the lamp 8. For example, if it is determined that the lamp 8 is a lamp A, the main control unit 7 may set the rated power to 4500 W and the lamp life to 3000 hours. In addition, the main control unit 7 may set the exhaust flow rate of the exhaust mechanism 12 to 30 slm, the cooling air volume of the cooling mechanism 15 to 2.0 slm, and the power correction coefficient to 1.2 as cooling conditions. In this embodiment, the type of the lamp 8 is determined based on the start-up voltage, voltage characteristics, and current characteristics in steps S4 and S6, but the type of the lamp 8 may be determined based on at least one of these. For example, in the example of FIG. 6, there are three types of lamps, but if the lamp C is not a lamp that can be used in the exposure apparatus 1 and the start-up voltage of the attached lamp is 20 V, the lamp 8 may be determined to be a lamp A. In step S10, the main control unit 7 performs error processing according to the determination result. For example, if the start-up voltage is out of range, the main control unit 7 executes an error process to turn off the lamp 8. In step S11, the main control unit 7 notifies the operator of the occurrence of an error.

[0042] As described above, according to the first embodiment, it is possible to identify the type of lamp and perform appropriate control according to the lamp being used, thereby reducing the possibility of lamp degradation and damage.

[0043] The second embodiment will be described below. Matters not mentioned as the second embodiment may follow the first embodiment. FIG. 8 shows the configuration of the exposure apparatus 1 of the second embodiment. The exposure apparatus 1 of the second embodiment includes a thermometer 16 that measures the temperature of the lamp 8 or the temperature around the lamp 8. In one example, the thermometer 16 may be installed in the lamp house 10. The thermometer 16 may be, for example, a radiation thermometer, which can measure the temperature of the lamp 8 itself. Alternatively, the thermometer 16 may be a thermocouple, in which case the temperature of the lamp house 10 can be measured. The temperature measured by the thermometer 16 is provided to the discrimination unit 20 and can be used to discriminate the type of the lamp 8.

[0044] FIG. 9 shows the flow of the initial setting process in the second embodiment. The initial setting process shown in FIG. 9 is obtained by replacing step S2 in the initial setting process shown in FIG. 5 with step S2'. In the second embodiment, in step S2', the main control unit 7 checks whether the temperature of the lamp 8 or its surroundings is equal to or lower than a specified temperature based on the temperature provided by the thermometer 16. Since the start-up characteristics of the lamp 8 are affected by the temperature state of the lamp 8 and its surroundings, by checking that the temperature of the lamp 8 or its surroundings is equal to or lower than a specified temperature, the type of the lamp 8 can be reliably identified. In step S2', if the temperature of the lamp 8 or its surroundings is equal to or lower than the specified temperature, the process may proceed to step S4, and if not, the process may proceed to step S10.

[0045] Hereinafter, an article manufacturing method for manufacturing an article using a lithography apparatus will be described. The article may be, for example, a semiconductor IC element, a liquid crystal display element, or a MEMS. The article manufacturing method may include a transfer step of transferring a pattern of an original to a substrate using a lithography apparatus, and a processing step of obtaining an article by processing the substrate that has undergone the transfer step. When the lithography apparatus is an exposure apparatus, the transfer step may include an exposure step of exposing a substrate (wafer, glass substrate, etc.) coated with a photosensitive agent, and a step of developing the substrate (photosensitive agent) that has undergone the exposure step. When the lithography apparatus is an imprint apparatus, the transfer step may include a contact step of contacting an original with an imprint material on a substrate, a curing step of curing the imprint material, and a separation step of separating the original from the cured imprint material. The processing step may include, for example, etching, resist peeling, dicing, bonding, packaging, and the like.

[0046] The present specification and drawings include the following disclosure. (Item 1) A lithography apparatus that transfers a pattern of an original onto a substrate using light from a lamp, comprising: A power supply unit for driving the lamp; a measuring instrument for measuring a state of the lamp driven by the power supply unit; a control unit that determines the type of the lamp based on an output of the measuring instrument; 1. A lithography apparatus comprising: (Item 2) The control unit determines the type of the lamp based on electrical characteristics of the lamp identified based on the output of the measuring instrument. 2. The lithography apparatus according to item 1, (Item 3) the electrical characteristics of the lamp include a starting voltage of the lamp; 3. The lithography apparatus according to item 2, (Item 4) the electrical characteristics of the lamp include a transient electrical characteristic of the lamp; 3. The lithography apparatus according to item 2, (Item 5) the transient electrical characteristic includes a change in voltage supplied to the lamp over a period of time; 5. The lithography apparatus according to item 4, (Item 6) the transient electrical characteristic includes a change in current supplied to the lamp over a period of time; 5. The lithography apparatus according to item 4, (Item 7) the electrical characteristics of the lamp include a starting voltage of the lamp and a transient electrical characteristic of the lamp; 3. The lithography apparatus according to item 2, (Item 8) The meter measures the voltage and current supplied to the lamp. 2. The lithography apparatus according to item 1, (Item 9) the control unit determines the type of the lamp based on electrical characteristics of the lamp that are specified based on an output of the measuring instrument when the lamp is driven at a minimum rated power among rated powers of lamp candidates that are pre-registered as available lamp candidates; 9. A lithographic apparatus according to any one of items 1 to 8, characterized in that (Item 10) The control unit executes a process of determining a type of the lamp in response to replacement of the lamp. 10. A lithographic apparatus according to any one of items 1 to 9, characterized in that (Item 11) The control unit executes the process after a specified time has elapsed since the lamp was last turned off. Item 11. A lithographic apparatus according to item 10, characterized in that (Item 12) a thermometer for measuring the temperature of the lamp; The control unit executes the process when the temperature measured by the thermometer is equal to or lower than a specified temperature. Item 11. A lithographic apparatus according to item 10, characterized in that (Item 13) the control unit executes a process of determining the type of the lamp every time the lithography apparatus is started. 11. A lithographic apparatus according to any one of items 1 to 10, characterized in that (Item 14) The control unit determines the type of the lamp and then sets the rated power of the lamp. Item 14. A lithographic apparatus according to any one of items 1 to 13, characterized in that (Item 15) the control unit determines a cooling condition for the lamp after determining the type of the lamp. 15. A lithographic apparatus according to any one of items 1 to 14, characterized in that (Item 16) configured as an exposure apparatus, 16. A lithographic apparatus according to any one of items 1 to 15, characterized in that (Item 17) configured as an imprint apparatus, 16. A lithographic apparatus according to any one of items 1 to 15, characterized in that (Item 18) A transfer step of transferring a pattern of a master onto a substrate using the lithography apparatus according to any one of items 1 to 17; a processing step of obtaining an article by processing the substrate that has been subjected to the transfer step; A method for manufacturing an article, comprising:

[0047] The invention is not limited to the above-described embodiments, and various modifications and variations are possible without departing from the spirit and scope of the invention. Accordingly, the following claims are appended to apprise the public of the scope of the invention. [Explanation of symbols]

[0048] 1: exposure device, 7: main control unit, 8: lamp, 11: power supply unit, 20: discrimination unit, 111: measuring instrument, CNT: control unit

Claims

1. A lithography apparatus that transfers a pattern of an original onto a substrate using light from a lamp, comprising: A power supply unit for driving the lamp; a measuring instrument for measuring a state of the lamp driven by the power supply unit; a control unit that determines the type of the lamp based on an output of the measuring instrument; 1. A lithography apparatus comprising:

2. The control unit determines the type of the lamp based on electrical characteristics of the lamp identified based on the output of the measuring instrument. A lithographic apparatus according to claim 1 .

3. the electrical characteristics of the lamp include a starting voltage of the lamp; A lithographic apparatus according to claim 2 .

4. the electrical characteristics of the lamp include a transient electrical characteristic of the lamp; A lithographic apparatus according to claim 2 .

5. the transient electrical characteristic includes a change in voltage supplied to the lamp over a period of time; A lithographic apparatus according to claim 4 .

6. the transient electrical characteristic includes a change in current supplied to the lamp over a period of time; A lithographic apparatus according to claim 4 .

7. the electrical characteristics of the lamp include a starting voltage of the lamp and a transient electrical characteristic of the lamp; A lithographic apparatus according to claim 2 .

8. The meter measures the voltage and current supplied to the lamp. A lithographic apparatus according to claim 1 .

9. the control unit determines the type of the lamp based on electrical characteristics of the lamp that are specified based on an output of the measuring instrument when the lamp is driven at a minimum rated power among rated powers of lamp candidates that are pre-registered as available lamp candidates; A lithographic apparatus according to claim 1 .

10. The control unit executes a process of determining a type of the lamp in response to replacement of the lamp. A lithographic apparatus according to claim 1 .

11. The control unit executes the process after a specified time has elapsed since the lamp was last turned off. A lithographic apparatus according to claim 10.

12. a thermometer for measuring the temperature of the lamp; The control unit executes the process when the temperature measured by the thermometer is equal to or lower than a specified temperature. A lithographic apparatus according to claim 10.

13. the control unit executes a process of determining the type of the lamp every time the lithography apparatus is started. A lithographic apparatus according to claim 1 .

14. The control unit determines the type of the lamp and then sets the rated power of the lamp. A lithographic apparatus according to claim 1 .

15. the control unit determines a cooling condition for the lamp after determining the type of the lamp. A lithographic apparatus according to claim 1 .

16. configured as an exposure apparatus, A lithographic apparatus according to claim 1 .

17. configured as an imprint apparatus, A lithographic apparatus according to claim 1 .

18. A transfer step of transferring a pattern of a master onto a substrate using a lithography apparatus according to any one of claims 1 to 17; a processing step of obtaining an article by processing the substrate that has been subjected to the transfer step; A method for manufacturing an article, comprising:

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