Jig for polishing and polishing device

Abstract

To provide a jig for polishing which can stably prevent variations in polishing states of a workpiece, and a polishing device including the jig for polishing.SOLUTION: A jig 10 for polishing is used when an object M to be polished is polished by a polishing device 1 having a rotated surface plate 3, wherein the jig 10 for polishing includes a holding member 11 which is mounted with the object M to be polished is mounted and has a circular cross section, and a weight member 15 which is detachably mounted on the holding member 11 and has a circular cross section, the holding member 11 has a body part 12 having a holding surface 12a of the object to be polished, and a projection 13 provided on the upper surface 12b of the body part 12, the weight member 15 has a recess 15h storing the projection 13 of the holding member 11 formed on its lower surface, and the recess 15h of the weight member 15 is formed into such a size that the upper surface 12b of the body part 12 is not brought into contact with the weight member 15 in a state in which the recess 15h stores the projection 13 of the body 12.SELECTED DRAWING: Figure 1

Description

[Technical field]

[0001] The present invention relates to a polishing jig and a polishing apparatus. [Background technology]

[0002] For example, when manufacturing semiconductor products, a single crystal silicon ingot is thinly sliced ​​to produce silicon wafers, and then a polishing process is performed in which the surface of the silicon wafer is lapped and polished to a mirror finish.

[0003] For example, when a silicon wafer W is polished using a polishing apparatus S having a rotating platen T as shown in FIG. 8, a jig 100 is used to hold the silicon wafer W to be polished on its underside. When using this jig 100, the silicon wafer W is attached to the underside of the jig 100 so that the surface to be polished faces downward, and the jig 100 is placed on the platen T so that the surface to be polished comes into surface contact with a polishing pad (not shown) provided on the surface of the platen T. Then, a weight 101 is placed on the jig 100 to apply a load, and a movement prevention member ST is placed so that the jig 100 does not move when the platen T rotates. In this state, when the platen T is rotated while supplying a slurry-like abrasive containing abrasive grains, the polishing pad on the surface of the platen T slides in contact with the underside of the silicon wafer W, so that the silicon wafer W can be polished by the abrasive. At this time, the jig 100 also rotates around its central axis due to the rotation of the platen T, so that the contact position between the platen T and the silicon wafer W changes. Therefore, the surface of the silicon wafer W can be polished without unevenness.

[0004] Incidentally, if a load is applied uniformly to the entire lower surface of the jig 100, the entire surface of the silicon wafer W can be polished uniformly. However, if the load applied differs depending on the position of the lower surface of the jig 100, the polishing state will change depending on the position. For example, as shown in FIG. 8(B), when the weight 101 is provided so that the load is applied to the entire surface of the jig 100, a difference in load occurs between the center and the periphery of the jig 100, and a difference in the polishing state may occur between the part located at the center of the lower surface of the jig 100 and the part located at the periphery of the lower surface of the jig 100 on the surface of the silicon wafer W. In addition, as shown in FIG. 8(C), there is a case where a plurality of silicon wafers W are attached to the lower surface of the jig 100 and polished simultaneously. Even in this case, when the weight 101 is provided so that the load is applied to the entire surface of the jig 100, the load applied to each silicon wafer W may differ depending on the position attached to the lower surface of the jig 100, and even if polished for the same time, a difference in the polishing state may occur between the plurality of silicon wafers W.

[0005] Techniques disclosed in Patent Documents 1 to 3 are jigs for preventing uneven loads on such workpieces. These Patent Documents 1 to 3 disclose a configuration in which a weight for applying a load to the workpiece to be polished is disposed in the center of a processing member. This configuration may reduce the difference in polishing state between the center and periphery of the workpiece due to load variations, compared to a case in which weights are disposed both in the center and periphery of the workpiece. [Prior art documents] [Patent documents]

[0006] [Patent Document 1] Japanese Patent Application Publication No. 3-43151 [Patent Document 2] Japanese Patent Application Publication No. 60-28632 [Patent Document 3] Japanese Patent Application Publication No. 60-28633 Summary of the Invention [Problem to be solved by the invention]

[0007] However, the techniques of Patent Documents 1 to 3 all have a cylindrical structure for holding the weight that applies the load, and can only be used to polish workpieces that are small enough to fit inside this cylindrical structure.

[0008] In view of the above circumstances, an object of the present invention is to provide a polishing jig capable of stably preventing variation in the polished state of a workpiece, and a polishing apparatus equipped with such a polishing jig. [Means for solving the problem]

[0009] <Polishing jig> The polishing jig of the first invention is a polishing jig used when polishing an object to be polished by a polishing machine equipped with a rotating table, the polishing jig comprising: a holding member having a circular cross section to which the object to be polished is attached; and a weight member having a circular cross section which is detachably attached to the holding member, the holding member having a main body portion having an object to be polished holding surface on its underside to which the object to be polished is attached, and a convex portion having a circular cross section and coaxial with the central axis of the main body portion, the upper surface of which is formed on a flat surface perpendicular to the central axis of the main body portion, the weight member having a cylindrical recess formed on its underside which is recessed from the underside and has an inner bottom surface formed on a flat surface perpendicular to the central axis of the weight member, the recess of the weight member being formed to be coaxial with the central axis of the weight member and accommodating the convex portion of the holding member, the recess of the weight member being formed to be sized so that the upper surface of the main body portion does not come into contact with the weight member when the convex portion of the main body portion is accommodated. The polishing jig of the second invention is characterized in that, in the first invention, the weight member is provided with a protrusion member that can protrude from and retract into its underside, and the main body of the holding member has a protrusion member fitting hole formed on its upper surface that can accommodate the protrusion member protruding from the underside of the weight member, and the protrusion member fitting hole is formed so that the distance from the central axis of the protrusion member fitting hole to the central axis of the main body is the same as the distance from the central axis of the weight member to the central axis of the protrusion member. The polishing jig of the third invention is characterized in that, in the second invention, a plurality of protrusion member fitting holes are formed on the upper surface of the main body of the holding member on concentric circles having their centers on the central axis of the main body. The polishing jig of the fourth invention is characterized in that, in the first invention, the convex portion of the holding member has a circular cross-sectional constriction portion between its upper surface and the upper surface of the main body of the holding member, the convex portion being coaxial with the central axis of the main body of the holding member and having a diameter smaller than the diameter of the upper surface of the convex portion. The polishing jig of the fifth invention is characterized in that, in the fourth invention, the convex portion of the holding member is formed so that the diameter φ1 of the tapered portion and the diameter φ2 of the holding member satisfy the following formula (1). 0.25×φ2 ≦ φ1 ≦ 0.75×φ2 ··· Formula (1) The polishing jig of the sixth invention is characterized in that, in the first invention, it comprises a plurality of the weight members, each weight member having a weight member convex portion of a circular cross section coaxial with the central axis of the weight member, the upper surface of which is formed on a flat surface perpendicular to the central axis of the weight member, and the concave portion of each weight member is formed to be sized such that, when the weight member convex portion of another weight member is accommodated in the concave portion, the weight member accommodating the weight member convex portion of the other weight member does not come into contact with the upper surface of the other weight member. The polishing jig of the seventh invention is characterized in that, in the sixth invention, the weight member is provided with a protrusion member that can protrude from its underside, and a weight portion fitting hole is formed in its upper surface in order to accommodate the protrusion member protruding from the underside of another weight member, and the weight portion fitting hole is formed so that the distance from the weight portion fitting hole to the central axis of the weight member is the same as the distance from the central axis of the weight member to the central axis of the protrusion member. The polishing jig of the eighth invention is characterized in that, in the seventh invention, the weight member has a plurality of weight portion fitting holes formed on concentric circles having their centers on the central axis of the weight member. <Polishing equipment> The polishing apparatus of the 9th invention is characterized by having a rotating platen, an abrasive supplying means for supplying an abrasive onto the platen, a polishing jig described in any of the 1st to 8th inventions that is placed on the platen with an object to be polished attached, and a polishing jig holding means for rotatably holding the polishing jig with its central axis offset from the rotation axis of the platen and preventing the polishing jig from revolving due to the rotation of the platen. The polishing apparatus of the tenth aspect of the invention is the polishing apparatus of the ninth aspect of the invention, characterized in that it comprises a plurality of the polishing jigs and a plurality of the polishing jig holding means for holding the plurality of polishing jigs respectively. The polishing apparatus of an eleventh aspect of the present invention is the polishing jig of the ninth aspect, characterized in that the polishing jig holding means has a rotation mechanism for rotating the polishing jig about the central axis of the polishing jig. The polishing apparatus of a twelfth aspect of the present invention is the polishing apparatus of the ninth aspect of the present invention, further comprising a weight member transport mechanism that attaches and detaches the weight member of the polishing jig to and from the holding member and / or the weight member. Effect of the Invention

[0010] <Polishing jig> According to the first aspect of the present invention, since the load applied from the weight member can be applied only to the center of the holding member, the load can be applied uniformly to the object to be polished attached to the polishing jig. Therefore, it is possible to suppress the variation in the polished state of the object to be polished depending on the position of the object to be polished holding surface of the polishing jig. In addition, even if multiple objects to be polished are attached to the holding member, it is possible to prevent the polished state of the multiple objects to be polished from varying. According to the second and third aspects of the present invention, the weight member can be prevented from moving relative to the holding member, which prevents the generation of metal powder and the like due to friction between the two. In addition, since vibrations and the like caused by the relative movement between the two can be prevented, variations in the polishing state of the object to be polished due to vibrations and the like can be prevented. According to the fourth and fifth aspects of the invention, the weight member can be stably disposed on the convex portion of the holding member, so that the load applied from the weight member can be prevented from shifting from the center of the holding member. According to the sixth aspect of the present invention, even if a plurality of weight members are provided on the holding member, the load applied from the plurality of weight members can be applied only to the central portion of the holding member. According to the seventh and eighth aspects of the invention, the weight members can be prevented from moving relative to each other, which prevents the generation of metal powder and the like due to friction between the weight members. Also, since vibrations and the like caused by the relative movement between the weight members can be prevented, it is possible to prevent variations in the polishing state of the object to be polished caused by vibrations and the like. <Polishing equipment> According to the ninth aspect of the present invention, the object to be polished held by the polishing jig can be polished by supplying an abrasive from the abrasive supply means onto the platen while rotating the platen. Moreover, since the load applied from the weight member can be applied only to the center of the holding member, and the polishing jig is held rotatably by the polishing jig holding means, variation in the polishing state of the object to be polished can be suppressed. According to the tenth aspect of the present invention, since a larger number of objects can be polished simultaneously, the polishing efficiency of the objects can be increased. According to the eleventh aspect of the present invention, the polishing jig can be rotated at a desired rotation speed by the rotation mechanism of the polishing jig holding means, making it easier to adjust the polished state of the object to be polished. According to the twelfth aspect of the present invention, the burden on the worker when attaching and detaching the weight member can be reduced. [Brief description of the drawings]

[0011] [Figure 1] 1A and 1B are schematic explanatory views of a polishing apparatus 1 of the present embodiment, in which (A) is a schematic perspective view and (B) is a schematic plan view. [Diagram 2] 1A is a perspective view of the polishing jig 10 of the present embodiment, and FIG. 1B is a schematic perspective view of the polishing jig 10 of the present embodiment with the holding member 11 and the weight member 15 separated. [Diagram 3] 1A and 1B are views showing the polishing jig 10 of the present embodiment, in which (A) is a side view and (B) is a cross-sectional view. [Figure 4]1A is a cross-sectional view of the weight member 15 alone, and FIG. 1B is a cross-sectional view of the holding member 11 alone. [Diagram 5] 3A is a cross-sectional view taken along line VA-VA in FIG. 3A when multiple protrusion member fitting holes 12h are provided, and FIG. 3B is a cross-sectional view taken along line VB-VB in FIG. 3A when multiple protrusion member fitting holes 12h are provided. [Figure 6] 1A is an explanatory diagram of the positioning of a weight member 15 on a holding member 11, (B) is a schematic explanatory diagram of the state in which the weight member 15 is positioned on the holding member 11 with the protrusion member fitting hole 12h of the main body portion 12 of the holding member 11 and the protrusion member 16 of the weight member 15 misaligned, and (C) is a schematic explanatory diagram of the state in which the main body portion 12 of the holding member 11 rotates due to the rotation of the base plate 3, and the protrusion member 16 of the weight member 15 is accommodated in the protrusion member fitting hole 12h of the main body portion 12. [Figure 7] 1A is a view of a weight member 20 alone, and FIG. 1B is a schematic explanatory view of a state in which a plurality of weight members 20 are stacked on a holding member 11. FIG. [Figure 8] 1A is a schematic oblique view of a conventional polishing apparatus S, FIG. 1B is a side view of a conventional jig 100 with a weight 101 and a silicon wafer W attached, and FIG. 1C is a bottom view of the conventional jig 100 with multiple silicon wafers W attached. DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS

[0012] The polishing jig of this embodiment is used for polishing an object to be polished, such as a wafer used in semiconductor manufacturing, and is characterized by its ability to suppress variation in the polished state of the object to be polished.

[0013] The object to be polished using the polishing jig of this embodiment is not particularly limited as long as the surface to be polished has a relatively flat surface and needs to be formed into a smooth plane. For example, the object to be polished may be an electronic device such as a wafer used in the manufacture of semiconductors, a light-emitting element, an optical element, an energy conversion element, etc. In the following embodiment, the case where the object to be polished is a wafer will be described as a representative example.

[0014] <Polishing Apparatus 1 of the Present Embodiment> First, before describing the polishing jig 10 of this embodiment, a polishing apparatus 1 of this embodiment that polishes an object M to be polished using the polishing jig 10 of this embodiment will be described. The polishing apparatus 1 having the polishing jig 10 of this embodiment corresponds to the polishing apparatus referred to in the claims. Note that hereinafter, the polishing apparatus 1 having the polishing jig 10 of this embodiment may be simply referred to as the polishing apparatus 1 of this embodiment (or polishing apparatus 1).

[0015] In FIG. 1, the reference numeral 2 denotes the main body 2 of the polishing apparatus 1 of this embodiment. The main body 2 is provided with a surface plate 3 that can rotate around a rotation axis 3s relative to the main body 2. The surface plate 3 is provided on the main body 2 so that when the main body 2 is placed on a table having a horizontal surface, the upper surface of the surface plate 3 becomes horizontal and rotates while maintaining the horizontal state. In other words, the surface plate 3 is provided on the main body 2 so that when the main body 2 is placed on a table having a horizontal surface, the rotation axis 3s becomes vertical. When polishing the object M to be polished, a polishing pad or the like (not shown) may be used on the upper surface of the surface plate 3, and when this polishing pad is used, the surface of the polishing pad may be referred to as the surface plate 3. When polishing the object M to be polished, a polishing jig 10 to which the object M to be polished is attached is placed on the surface plate 3.

[0016] As shown in FIG. 1, the polishing apparatus 1 of this embodiment includes a polishing jig 10 of this embodiment arranged on a platen 3. The polishing jig 10 of this embodiment is a jig on whose underside the object M to be polished is attached, and is arranged on the platen 3 so that the object M to be polished contacts the surface of the platen 3 with the object M to be polished attached to its underside. Moreover, the polishing jig 10 of this embodiment can prevent the load applied to the object M to be polished from varying depending on the position of its underside. Furthermore, when multiple objects M to be polished are attached (see FIG. 8(C)), the polishing jig 10 of this embodiment can prevent not only the position of the underside but also the load applied to the object M to be polished from varying between the objects M to be polished. The details of the polishing jig 10 of this embodiment will be described later. In the following, the polishing jig 10 of this embodiment may be simply referred to as the polishing jig 10.

[0017] As shown in FIG. 1, the polishing apparatus 1 of this embodiment is provided with a polishing jig holding means 4 for holding the polishing jig 10 arranged on the platen 3. The polishing jig holding means 4 holds the polishing jig 10 at a predetermined position so that the polishing jig 10 does not move with the rotation of the platen 3. Specifically, when the polishing jig 10 is arranged on the platen 3 so that the central axis 10s is eccentric (displaced) from the rotation axis 3s of the platen 3, the polishing jig holding means 4 holds the polishing jig 10 at a predetermined position on the platen 3 so that the polishing jig 10 does not revolve around the rotation axis 3s of the platen 3 with the rotation of the platen 3. Moreover, the polishing jig holding means 4 has a function of preventing the polishing jig 10 from revolving but holding the polishing jig 10 so that the polishing jig 10 can rotate around the central axis 10s with the rotation of the platen 3.

[0018] For example, as shown in FIG. 1, a pair of cylindrical holders 4a, 4b and a fixing member (not shown) for fixing the pair of holders 4a, 4b with the axial distance shorter than the diameter of the polishing jig 10 are provided as the polishing jig holding means 4. The pair of holders 4a, 4b are attached to the fixing member so that they can rotate around their central axes with their central axes parallel to the rotation axis of the rotation axis 3s of the base plate 3. In this configuration, after the polishing jig 10 is placed on the base plate 3, the pair of holders 4a, 4b are placed so as to be located downstream of the polishing jig 10 in the rotation direction of the base plate 3. Specifically, the pair of holders 4a, 4b are placed so as to be located downstream of the polishing jig 10 in the rotation direction of the base plate 3, so that the side of the polishing jig 10 and the side of the pair of holders 4a, 4b are in contact with each other and the axial distance of the pair of holders 4a, 4b is shorter than the diameter of the polishing jig 10. Then, even if the base plate 3 rotates, the revolution of the polishing jig 10 is prevented by the pair of holding bodies 4a, 4b, and since the pair of holding bodies 4a, 4b can rotate, the polishing jig 10 can be rotated (spinned) around its central axis 10s.

[0019] Although not shown, the polishing apparatus 1 of this embodiment also includes an abrasive supplying means for supplying an abrasive onto the platen 3 when polishing the object to be polished M. The abrasive is a slurry containing only abrasive grains or abrasive grains (for example, a slurry in which abrasive grains are mixed with oil), and the abrasive supplying means has a function of supplying this abrasive onto the platen 3.

[0020] Since the polishing apparatus 1 of this embodiment has the configuration described above, it can polish the object M to be polished as follows. In the following, the upper surface of the platen 3 means the upper surface of the platen 3 with the polishing pad provided thereon, that is, the upper surface of the polishing pad. Furthermore, the term "on the platen 3" means the upper surface of the polishing pad provided on the upper surface of the platen 3.

[0021] First, the object M to be polished is attached to the lower surface of the polishing jig 10. For example, a workpiece holding material such as a backing material is used on the lower surface of the polishing jig 10, and the object M to be polished is attached by being attracted to the lower surface of the polishing jig 10. Once the object M to be polished is attached to the lower surface of the polishing jig 10, the polishing jig 10 is placed on the platen 3 so that the object M to be polished contacts the upper surface of the platen 3. At this time, the polishing jig 10 is placed on the platen 3 so that its central axis 10s is eccentric with respect to the rotation axis 3s of the platen 3 (see FIG. 1). When the polishing jig 10 is placed on the base plate 3, the polishing jig holding means 4 holds the polishing jig 10 in a predetermined position, i.e., the polishing jig 10 is held so that its central axis 10s is eccentric from the central axis 3s of the base plate 3 (see Figure 1). When the polishing jig 10 is held by the polishing jig holding means 4, the platen 3 is rotated while a polishing agent is supplied from the polishing agent supplying means onto the platen 3. Then, since the polishing jig 10 is prevented from revolving by the polishing jig holding means 4, the object M to be polished is polished by the rotation of the platen 3. At this time, the polishing jig 10 is prevented from revolving but can rotate on its axis, so the polishing jig 10 rotates on its axis while the revolution is prevented due to the rotation of the platen 3. Then, due to the effect of the rotation of the platen 3 and the rotation of the polishing jig 10, the object M to be polished is polished in a state where there is little difference in the polishing state depending on the contact position with the upper surface of the platen 3. Moreover, the polishing jig 10 of this embodiment can prevent the load applied to the object M to be polished from varying depending on the position of the lower surface of the polishing jig 10, so the polishing state of the object M to be polished can be made uniform with little variation depending on the position of the lower surface of the polishing jig 10.

[0022] <Regarding the polishing jig 10 and the polishing jig holding means 4> In the polishing apparatus 1 of this embodiment, it is also possible to polish the object M to be polished using a plurality of polishing jigs 10. This allows a large number of objects M to be polished at one time, thereby increasing the efficiency of polishing the objects M to be polished. In this case, the number of polishing jigs 10 provided in the polishing apparatus 1 is not particularly limited, and may be two, or may be three or more. Depending on the size of the surface plate 3 and the size of the polishing jigs 10, the polishing jigs 10 can be provided in the number that allows the objects M to be polished provided on each polishing jig 10 to be appropriately polished without decreasing the polishing efficiency.

[0023] In addition, when a plurality of polishing jigs 10 are provided in the polishing apparatus 1 of this embodiment, it is desirable to provide a plurality of polishing jig holding means 4 for holding each polishing jig 10. Then, each polishing jig 10 can be held in a stable state by the polishing jig holding means 4, and each polishing jig 10 can be held by the polishing jig holding means 4 in a state suitable for the attached object to be polished M. When a plurality of polishing jig holding means 4 are provided, each polishing jig holding means 4 may be configured to hold each polishing jig 10 in the above-mentioned state, and the configuration is not particularly limited. In other words, each polishing jig holding means 4 may have a configuration that allows the polishing jig 10 held by each polishing jig holding means 4 to be held in a state in which it can rotate on its own axis but cannot revolve. In this case, all the polishing jig holding means 4 may have the same configuration, or the configurations for holding the polishing jigs 10 by the polishing jig holding means 4 may be different.

[0024] In the above example, the polishing jig 10 is rotated by the rotation of the platen 3. That is, the polishing apparatus 1 of the present embodiment is not provided with a special mechanism for rotating the polishing jig 10, but the polishing apparatus 1 of the present embodiment may have a mechanism for rotating the polishing jig 10. That is, a rotation mechanism for directly applying a rotational force to the polishing jig 10 to rotate it may be provided. In this case, regardless of the rotation speed of the platen 3, the polishing jig 10 can be rotated at a desired rotation speed by the rotation mechanism, making it easier to adjust the polishing state of the object M to be polished. The configuration of the rotation mechanism is not particularly limited, but for example, in the case of providing a polishing jig holding means 4 having a pair of holders 4a and 4b as shown in FIG. 1, if a rotation mechanism for rotating the pair of holders 4a and 4b is provided, the polishing jig 10 can be rotated by the rotation of the pair of holders 4a and 4b.

[0025] <Polishing jig 10> Next, the polishing jig 10 of this embodiment will be described. As shown in FIGS. 2 to 4, the polishing jig 10 of this embodiment includes a holding member 11 to which an object to be polished M is attached, and a weight member 15 provided on the holding member 11 so as to be detachable. The holding member 11 and the weight member 15 can be made of metal such as stainless steel or aluminum alloy, but the material is not particularly limited. Various materials suitable for polishing the object M can be used.

[0026] <Retaining member 11> As shown in FIGS. 2(B), 3(B), and 4(B), the holding member 11 has a main body portion 12 and a protrusion 13 provided on the upper surface of the main body portion 12.

[0027] <Main body 12> 2, 3, and 4(B), the main body 12 is a generally cylindrical member with a circular cross section. The main body 12 is provided with a polishing object holding surface 12a on the lower surface of which the object M to be polished is attached. The object to be polished holding surface 12a is formed into a flat surface perpendicular to the central axis 12s of the main body 12. The object to be polished M is attached to the object to be polished holding surface 12a.

[0028] In addition, the polished object holding surface 12a does not have to be a flat surface perpendicular to the central axis 12s of the main body 12 in its entirety; it is sufficient that the entire or part of the part where the polished object M is attached is a flat surface perpendicular to the central axis 12s of the main body 12. Furthermore, the method of attaching the object to be polished M to the object to be polished holding surface 12a is not particularly limited. Any method may be used as long as it can attach the object to be polished M so that the object to be polished M does not come off the object to be polished holding surface 12a or move relative to the object to be polished holding surface 12a while the object to be polished M is being polished. For example, the object to be polished M can be attached to the object to be polished holding surface 12a by fixing a workpiece holding material such as a backing material to the object to be polished holding surface 12a and adsorbing the object to be polished M to the surface of the workpiece holding material.

[0029] <Protruding part 13> As shown in Figures 2(B), 3(B), and 4(B), a protruding portion 13 is provided on the upper surface 12b of the main body portion 12 so as to protrude from the upper surface. This protruding portion 13 is a portion formed in a substantially cylindrical shape with a circular cross section, similar to the main body portion 12, and is formed so that its central axis 13s is coaxial with the central axis 12s. The upper surface 13a of this protruding portion 13 is formed as a flat surface perpendicular to the central axis 13s (in other words, the central axis 12s).

[0030] <Protruding part fitting hole 12h> In addition, the upper surface 12b of the main body 12 is provided with a protruding member fitting hole 12h recessed from the upper surface 12b. The protruding member fitting hole 12h is provided to accommodate a protruding member 16 provided on a weight member 15 described later. The protruding member fitting hole 12h is provided at a position where a distance L1 from the central axis 12s of the main body 12 to the central axis of the protruding member fitting hole 12h is longer than the sum of the radius of the convex portion 13 and the radius of the protruding member fitting hole 12h. In other words, the protruding member fitting hole 12h is provided at a position where the protruding member fitting hole 12h does not overlap with the convex portion 13 when the main body 12 is viewed from above in the direction of its central axis 12s. In other words, the protruding member fitting hole 12h is provided so as to be located outward from the outer edge of the convex portion 13 when the main body 12 is viewed from above in the direction of its central axis 12s.

[0031] <Weight member 15> 2, 3, and 4(A), the weight member 15 is a substantially cylindrical member with a circular cross section. This weight member 15 is disposed on the holding member 11 and applies a load to the holding member 11. That is, as described above, when the holding member 11 to which the object to be polished M is attached is placed on the surface plate 3, the weight member 15 has the function of applying a load to increase the contact surface pressure between the object to be polished M and the surface plate 3.

[0032] 2, 3, and 4(A), the weight member 15 is a stepped cylinder with an upper portion having a smaller diameter than the lower portion, but the weight member 15 does not necessarily have to be a stepped cylinder. For example, the weight member 15 may be a cylinder with the same diameter as the whole.

[0033] As shown in FIG. 3(B) and FIG. 4(A), a recess 15h recessed from the lower surface 15a is formed on the lower surface 15a of the weight member 15. This recess 15h is a portion that accommodates the protrusion 13 of the main body portion 12 when the weight member 15 is placed on the holding member 11 (see FIG. 3(B)). This recess 15h is a cylindrical recess having a center on the central axis 15s of the weight member 15. In other words, the recess 15h is a recess with a circular cross section formed so that its central axis is coaxial with the central axis 15s of the weight member 15. The inner bottom surface 15f of this recess 15h is formed as a flat surface perpendicular to the central axis 15s of the weight member 15. Moreover, the recess 15h is formed so that its depth D is shorter than the height H of the protrusion 13 of the main body portion 12. In other words, The recess 15h is formed so that, when the protrusion 13 of the main body 12 is housed in the recess 15h, the upper surface 12b of the main body 12 does not come into contact with the lower surface 15a of the weight member 15. For example, the depth D of the recess 15h is formed to be shorter than the height H of the protrusion 13 of the main body 12 by about 0.1 to 1.0 mm.

[0034] As shown in FIG. 3(B) and FIG. 4(A), the weight member 15 has a protruding member 16 provided so as to be able to protrude and retract from the lower surface 15a of the weight member 15. The protruding member 16 is a shaft-shaped member, and is housed in a storage hole 16h recessed from the lower surface of the weight member 15 so that its axial direction (i.e., the protruding and retracting direction) is substantially parallel to the central axis 15s of the weight member 15. A spring 17 is provided in the storage hole 16h between the inner bottom surface 16f of the storage hole 16h and the upper end surface 16a of the protruding member 16. In other words, the protruding member 16 is provided so that its tip protrudes from the lower surface 15a of the weight member 15 when no force is applied, and can move toward the storage hole 16h when a force is applied upward from the axial direction. Moreover, the protruding member 16 is formed to a length such that almost the entire protruding member 16 is housed in the storage hole 16h when a force is applied upward from the axial direction. The protrusion member 16 is arranged so that the distance L2 (see Figure 4(A)) from its central axis to the central axis 15s of the weight member 15 is the same length as the distance L1 (see Figure 4(B)) from the central axis 12s of the main body portion 12 of the retaining member 11 to the central axis of the protrusion member fitting hole 12h.

[0035] Since the polishing jig 10 of this embodiment has the above-mentioned configuration, when the object to be polished M is polished by the polishing apparatus 1, variation in the load applied to the object to be polished M attached to the polishing jig 10 can be prevented, and variation in the polishing condition of the object to be polished M can also be prevented.

[0036] That is, the weight member 15 is placed on the holding member 11 so that the convex portion 13 of the holding member 11 is housed in the concave portion 15h when the holding member 11 is placed on the surface plate 3 (see Figs. 6(A) and (B)). At this time, the central axis 12s of the main body 12 (in other words, the central axis 13s of the convex portion 13) and the central axis 15s of the weight member 15 (in other words, the central axis of the concave portion 15h) are made to coincide with each other. Then, the weight member 15 can apply the load of the holding member 11 only to the convex portion 13, and the load can be prevented from being biased, so that the load applied to the object M to be polished can be prevented from being uneven. Then, when the object M to be polished is polished by rotating the surface plate 3, the polishing state of the object M to be polished can be prevented from being uneven.

[0037] Moreover, the distance L2 from the central axis of the protrusion member 16 to the central axis 15s of the weight member 15 and the distance L1 from the central axis 12s of the main body 12 to the central axis of the protrusion member fitting hole 12h are set to be the same length. Therefore, as described above, by placing the weight member 15 on the holding member 11 placed on the surface plate 3, the tip of the protrusion member 16 can be accommodated in the protrusion member fitting hole 12h of the main body 12 of the holding member 11 (see FIG. 3(B)). Then, the relative movement between the holding member 11 and the weight member 15, that is, the relative rotation between the holding member 11 and the weight member 15 around the central axis 12s of the main body 12 of the holding member 11, can be prevented. Therefore, since the relative movement between the holding member 11 and the weight member 15 can be prevented, the generation of metal powder due to friction between them can be prevented, and the deterioration of the polishing state of the object M to be polished due to the metal powder can be prevented. Furthermore, since vibrations caused by the relative movement between the two can be prevented, variations in the polished state of the object M to be polished caused by vibrations can be prevented.

[0038] Moreover, the protrusion member 16 is provided so as to be able to appear and disappear from the lower surface 15a of the weight member 15, and is in a state of being urged downward by the spring 17. Therefore, when placing the weight member 15 on the holding member 11 placed on the surface plate 3, the weight member 15 can be placed on the holding member 11 without aligning the positions of the protrusion member 16 and the protrusion member fitting hole 12 (see Figs. 6(A) and (B)). In other words, if the positions of the protrusion member 16 and the protrusion member fitting hole 12 are misaligned when the weight member 15 is placed on the holding member 11, the protrusion member 16 is pushed up to the upper surface 12b of the main body of the holding member 11, the spring 17 contracts, and the protrusion member 16 is accommodated in the accommodation hole 16h of the weight member 15. Therefore, even if the positions of the protrusion member 16 and the protrusion member fitting hole 12 are not aligned, the protrusion member 16 does not get in the way of placing the weight member 15 on the holding member 11. Moreover, when the surface plate 3 rotates, the tip of the protrusion member 16 can be accommodated in the protrusion member fitting hole 12h of the main body 12 of the holding member 11 (see FIG. 6(C)). In other words, the holding member 11 arranged on the surface plate 3 is held by the polishing jig holding means 4 so as to be rotatable about its central axis (in other words, about the central axis 12s of the main body 12). Therefore, when the surface plate 3 rotates and polishing of the object to be polished M begins, the holding member 11 rotates due to the influence of the rotation of the surface plate 3. At this time, if the tip of the protrusion member 16 is not inserted into the protrusion member fitting hole 12, the relative rotation between the holding member 11 and the weight member 15 is not fixed, and therefore, relative rotation occurs between the holding member 11 and the weight member 15. Then, even if the positions of the protrusion member 16 and the protrusion member fitting hole 12 are misaligned, if the holding member 11 and the weight member 15 rotate relatively, the positions of the protrusion member 16 and the protrusion member fitting hole 12 will eventually match. Since the protrusion member 16 is urged downward by the spring 17, the protrusion member 16 protrudes from the lower surface 15a of the weight member 15 and is accommodated in the protrusion member fitting hole 12 (see FIG. 6(C)). This makes it possible to prevent relative movement between the holding member 11 and the weight member 15, thereby preventing problems caused by the relative movement between them.

[0039] <Regarding the sliding between the upper surface 13a of the convex portion 13 of the holding member 11 and the inner bottom surface 15f of the concave portion 15h of the weight member 15> As described above, when the holding member 11 and the weight member 15 rotate relatively due to the rotation of the surface plate 3, the upper surface 13a of the convex portion 13 of the holding member 11 and the inner bottom surface 15f of the concave portion 15h of the weight member 15 slide against each other. At this time, if the sliding resistance between them is large, it takes a long time for the protruding member 16 of the weight member 15 to be accommodated in the protruding member fitting hole 12h of the main body portion 12 of the holding member 11, and if vibration or the like occurs during that time, it may have a negative effect on the polishing of the object M to be polished. Therefore, it is desirable that the sliding resistance between the upper surface 13a of the convex portion 13 of the holding member 11 and the inner bottom surface 15f of the concave portion 15h of the weight member 15 is as small as possible. For example, a treatment to reduce the sliding resistance (for example, a coating of a low-friction material) is applied to both or either one of the inner side surface of the concave portion 15h and the side surface of the convex portion 13. Then, the holding member 11 and the weight member 15 can be smoothly rotated relative to each other, and the protruding member 16 of the weight member 15 can be quickly housed in the protruding member fitting hole 12h.

[0040] <Difference between depth D of recess 15h of weight member 15 and height H of protrusion 13 of holding member 11> The difference between the depth D of the recess 15h of the weight member 15 and the height H of the protrusion 13 of the holding member 11 is not limited to the range described above. The smaller this difference is, the more stably the weight member 15 can be arranged on the holding member 11, and as described above, the occurrence of vibrations and the like when the holding member 11 and the weight member 15 rotate relatively can be prevented. Therefore, it is desirable to make the difference between the depth D of the recess 15h and the height H of the protrusion 13 of the holding member 11 as small as possible within a range in which the upper surface 12b of the holding member 11 and the lower surface of the weight member 15 do not come into contact with each other when the holding member 11 and the weight member 15 rotate relatively.

[0041] <Regarding the protruding portion 13 of the holding member 11> As described above, the size of the protrusion 13 of the holding member 11 is not particularly limited as long as it can be accommodated in the recess 15h of the weight member 15.

[0042] On the other hand, as shown in Figures 2(B), 3(B), and 4(B), it is desirable that the convex portion 13 has a shape having a constriction (throttled portion 13c) between its upper surface 13a and the upper surface 12b of the main body portion 12. For example, the throttle portion 13c is formed between the upper surface 13a of the convex portion 13 and the upper surface 12b of the main body portion 12 so as to have a substantially cylindrical shape with a circular cross section like the main body portion 12 and the convex portion 13 and its central axis is coaxial with the central axes 12s, 13s. Moreover, the throttle portion 13c is formed so that its diameter φ1 is shorter than the diameter φ3 of the upper surface 13a of the convex portion 13 (or the diameter of the side surface 13f). By providing such a drawn portion 13c, the load applied from the weight member 15 can be applied to a narrower area in the center of the holding member 11, and the weight member 15 can be stably disposed on the upper surface 13a of the protrusion 13, thereby preventing the load applied from the weight member 15 from shifting from the center of the holding member 11. To fulfill this function, it is desirable that the diameter φ1 of the drawn portion 13c and the diameter φ2 of the main body portion 12 are sized to satisfy the following formula (1). 0.25×φ2 ≦ φ1 ≦ 0.75×φ2 ··· Formula (1)

[0043] In addition, it is desirable that the difference between the diameter φ3 of the protruding portion 13 of the holding member 11, that is, the diameter φ3 of the cylindrical surface 13f forming the side surface of the protruding portion 13 and the inner diameter φ4 of the recessed portion 15h of the weight member 15 is as small as possible. The smaller this difference is, the more stably the weight member 15 can be placed in the main body portion 12. For example, the difference between the diameter φ3 of the protruding portion 13 of the holding member 11 and the inner diameter φ4 of the recessed portion 15h of the weight member 15 is desirably about 0.1 to 0.5 mm, but is not particularly limited thereto. If the difference between the two is small, it becomes difficult to insert the protruding portion 13 of the holding member 11 into the recessed portion 15h when the weight member 15 is placed in the main body portion 12. However, the difficulty of insertion can be improved by treating both or either one of the inner surface of the recessed portion 15h and the side surface 13f of the protruding portion 13 to reduce the sliding resistance (for example, coating with a low-friction material).

[0044] <Regarding the protruding member 16> The axial length of the protruding member 16, in other words, the length by which the protruding member 16 protrudes from the bottom surface of the weight member 15 when no axial force is applied to the protruding member 16, is not particularly limited. It may be any length that can appropriately prevent relative rotation between the holding member 11 and the weight member 15 when the tip of the protruding member 16 is housed in the protruding member fitting hole 12h of the main body 12. For example, when no axial force is applied to the protruding member 16, the length L3 by which the protruding member 16 protrudes from the bottom surface of the weight member 15 can be about 2 to 10 mm.

[0045] <When multiple protruding member fitting holes 12h are provided> The main body 12 of the holding member 11 may have one or more protrusion member fitting holes 12h formed therein in order to prevent relative movement between the holding member 11 and the weight member 15. In this case, as shown in Fig. 5(B), the multiple protrusion member fitting holes 12h are provided on a concentric circle C2 whose central axis coincides with the central axis 12s of the main body 12 of the holding member 11. By providing multiple protrusion member fitting holes 12h in this manner, the protrusion member 16 can be quickly accommodated in the protrusion member fitting hole 12h when the holding member 11 and the weight member 15 rotate relative to each other. Conversely, only one protrusion member fitting hole 12h may be provided in the main body 12 of the holding member 11, and multiple protrusion members 16 may be provided on the weight member 15. In this case, multiple protrusion members 16 are provided on a concentric circle C1 having a center on the central axis 15s of the weight member 15. Then, when the holding member 11 and the weight member 15 rotate relatively to each other, if any of the protrusion members 16 is received in the protrusion member fitting hole 12h, relative movement between the holding member 11 and the weight member 15 can be prevented. Of course, a plurality of protrusion member fitting holes 12h may be provided in the main body portion 12 of the holding member 11, and a plurality of protrusion members 16 may be provided in the weight member 15. In this case, the number of protrusion member fitting holes 12h and the number of protrusion members 16 may be the same or different.

[0046] <Regarding the protruding member 16 and the protruding member fitting hole 12h> In the above-mentioned example, a case has been described in which protrusion member 16 is provided on weight member 15 and protrusion member fitting hole 12h is provided on main body portion 12 of holding member 11 in order to prevent relative movement between holding member 11 and weight member 15. However, contrary to the above-mentioned example, a protrusion member fitting hole may be provided on lower surface 15a of weight member 15, and a protrusion member biased to protrude from upper surface 12b of main body portion 12 may be provided on main body portion 12 of holding member 11.

[0047] Furthermore, the mechanism for preventing the relative movement between the holding member 11 and the weight member 15 is not limited to the above-mentioned protrusion member 16 and protrusion member fitting hole 12h. Furthermore, if the weight member 15 is merely placed on the holding member 11 and no relative movement occurs between them, it is not necessary to provide a mechanism for preventing the relative movement between them (for example, the protrusion member 16 and the protrusion member fitting hole 12h, etc.).

[0048] <When placing multiple weight parts> In the above example, only one weight member 15 is placed on the main body portion 12 of the holding member 11. However, if a weight member 20 as shown below is used, multiple weight members 20 can be stacked and placed on the main body portion 12 of the holding member 11.

[0049] 7(A), weight member 20 has recess 20h and protrusion member 21 having substantially the same shape and structure as recess 15h and protrusion member 16 of weight member 15, and in addition, weight member protrusion 22 and weight portion fitting hole 22h are provided on the upper surface. Weight member protrusion 22 of weight member 20 has substantially the same shape and structure as protrusion 13 of holding member 11, and weight portion fitting hole 22h is also formed to have substantially the same shape and structure as protrusion member fitting hole 12h of holding member 11.

[0050] If the weight members 20 have the above-mentioned configuration, even if multiple weight members 20 are stacked and arranged on the main body 12 of the holding member 11, the multiple weight members 20 can be prevented from moving relative to each other (see FIG. 7(B)). In other words, since all weight members 20 can be rotated in the same manner as the holding member 11, it is possible to prevent variation in the polished state of the object M to be polished when the object M is polished by rotating the surface plate 3. Moreover, it is possible to prevent the generation of metal powder and the like due to friction between the weight members 20, and it is possible to prevent deterioration of the polished state of the object M to be polished due to metal powder. In addition, since it is possible to prevent vibrations and the like due to relative movements between the weight members 20, it is possible to prevent variation in the polished state of the object M to be polished due to vibrations and the like.

[0051] The weight member 20 may have one or more protrusion members 21 and weight portion fitting holes 22h, similar to the protrusion member fitting holes 12h of the holding member 11 and the protrusion members 16 of the weight member 15 described above.

[0052] In addition, the mechanism for preventing the weight members 20 from moving relative to each other is not limited to the protrusion member 21 and the weight portion fitting hole 22h, similar to the protrusion member fitting hole 12h of the holding member 11 and the weight member 15 described above. In addition, if the weight member 20 is simply placed on the lower weight member 20 and no relative movement occurs between them, it is not necessary to provide a mechanism for preventing the relative movement between them.

[0053] <Weight member transport mechanism of polishing device 1> The polishing apparatus 1 of this embodiment may be provided with a weight member transport mechanism such as a robot arm that automatically places the weight members 15 and 20 on the holding member 11 placed on the base 3. By providing such a weight member transport mechanism, the weight of the weight members 15 and the like that can be transported at one time can be increased, thereby shortening the operation time and reducing the burden on the worker.

[0054] Usually, when a worker manually transports the weight members 15 and the like, the weight members 15 and the weight members 20 that can be accurately positioned and placed on the holding member 11 is at most about 3 kg per piece. Therefore, if the load required for polishing becomes large, multiple weight members 15 and the like must be placed on the holding member 11, which takes time to place the weight members 15 and the like that generate the necessary load on the holding member 11 and also increases the burden on the worker.

[0055] On the other hand, if a weight member transport mechanism such as a robot arm is provided, the weight of the weight members 15, etc. that can be placed on the holding member 11 in one transport can be increased. This reduces the time required to place the weight members 15, etc. on the holding member 11, shortening the overall polishing work time, and also reduces the burden on the worker because there is no need to transport the weight members 15, etc., which are heavy objects.

[0056] When the weight member 15 or the weight member 20 is placed by the weight member transport mechanism, it is preferable to provide the weight member protrusion 22 of the weight member 20 with a portion similar to the drawn portion 13c of the protrusion 13 of the holding member 11. Providing such a drawn portion 13c makes it easier for the weight member transport mechanism to stably hold the weight member 20. Also, if the weight member 15 is provided with a portion similar to the protrusion 13 of the holding member 11 (preferably one having a portion similar to the drawn portion 13c), it makes it easier for the weight member transport mechanism to stably hold the weight member 15. [Industrial Applicability]

[0057] The polishing jig of the present invention is suitable as a jig for holding an object to be polished when polishing the object to be polished, such as a wafer, which is to have a smooth surface by polishing. [Explanation of symbols]

[0058] 1 Polishing equipment 3. Fixed Plate 4 Polishing jig holding means 10 Polishing jig 11 Retaining member 12 Main body 12a Holding surface to be polished 12b Top side 12s center axis 13 Convex 13s center axis 15 Weight material 15h recess 15s center axis 16 Protruding member 20 Weight material 20h recess 21 Protruding member 22 Weight member protrusion 22h Weight fitting hole M Object to be polished

Claims

1. A polishing jig used when polishing an object to be polished by a polishing machine having a rotating platen, The polishing jig is A holding member having a circular cross section to which the object to be polished is attached; a weight member having a circular cross section that is detachably attached to the holding member, The holding member is A main body having a polishing object holding surface on the underside of which the polishing object is attached; a convex portion having a circular cross section and coaxial with the central axis of the main body portion, the convex portion being provided on the upper surface of the main body portion and having an upper surface formed on a flat surface perpendicular to the central axis of the main body portion; The weight member includes: a cylindrical recess is formed on the lower surface of the weight member, the cylindrical recess being recessed from the lower surface and having an inner bottom surface formed on a flat surface perpendicular to the central axis of the weight member, the cylindrical recess being coaxial with the central axis of the weight member and accommodating the protrusion of the holding member; The recess of the weight member is The upper surface of the main body is formed to a size that does not contact the weight member when the protrusion of the main body is accommodated. A polishing jig characterized by the above.

2. The weight member includes: A protruding member that can protrude from and retract into the bottom surface of the The body portion of the holding member is A protrusion member fitting hole capable of receiving the protrusion member protruding from the lower surface of the weight member is formed on the upper surface of the weight member. The protruding member fitting hole is The distance from the central axis of the projection member fitting hole to the central axis of the main body is formed to be the same as the distance from the central axis of the weight member to the central axis of the projection member.

2. The polishing jig according to claim 1.

3. The upper surface of the main body of the holding member is A plurality of the projection member fitting holes are formed on concentric circles having their centers on the central axis of the main body.

3. The polishing jig according to claim 2.

4. The protrusion of the holding member is Between the upper surface of the protrusion and the upper surface of the main body of the holding member, there is a drawn portion having a circular cross section, which is coaxial with the central axis of the main body of the holding member and has a diameter smaller than the diameter of the upper surface of the protrusion.

2. The polishing jig according to claim 1.

5. The protrusion of the holding member is The diameter φ1 of the narrowed portion and the diameter φ2 of the main body of the holding member are formed to satisfy the following formula (1):

5. The polishing jig according to claim 4. 0.25×φ2 ≦ φ1 ≦ 0.75×φ2 ... Formula (1)

6. The weight member is provided in a plurality of parts, Each weight member is The weight member has a circular cross-sectional projection on its upper surface, the upper surface of which is formed on a flat surface perpendicular to the central axis of the weight member, and the weight member has a circular cross-sectional projection on its upper surface which is coaxial with the central axis of the weight member. The recesses of each weight member are The weight member is formed to a size such that, in a state in which the weight member protrusion of another weight member is accommodated, the weight member accommodating the weight member protrusion of the other weight member does not come into contact with the upper surface of the other weight member.

2. The polishing jig according to claim 1.

7. The weight member includes: A protruding member that can protrude from and retract into the bottom surface of the A weight portion fitting hole capable of accommodating the protruding member protruding from the lower surface of another weight member is formed on the upper surface of the weight portion; The weight portion fitting hole is The distance from the center axis of the weight portion fitting hole to the center axis of the weight member is formed to be the same as the distance from the center axis of the weight member to the center axis of the protruding member.

7. The polishing jig according to claim 6.

8. The weight member includes: A plurality of the weight portion fitting holes are formed on concentric circles having their centers on the central axis of the weight member.

8. The polishing jig according to claim 7.

9. A rotating base plate and an abrasive supplying means for supplying an abrasive onto the surface plate; The polishing jig according to any one of claims 1 to 8, which is placed on the platen with an object to be polished attached thereto; a polishing jig holding means for rotatably holding the polishing jig with its central axis offset from the rotation axis of the surface plate and preventing the polishing jig from revolving due to the rotation of the surface plate; A polishing apparatus comprising:

10. The polishing jig is provided in plurality, The polishing jig holding means includes a plurality of polishing jig holding means for holding the plurality of polishing jigs, respectively.

10. The polishing apparatus according to claim 9.

11. The polishing tool holding means is The polishing jig has a rotation mechanism for rotating the polishing jig around its central axis.

10. The polishing apparatus according to claim 9.

12. The polishing jig has a weight member transport mechanism for attaching and detaching the weight member to and from the holding member and / or the weight member.

10. The polishing apparatus according to claim 9.

Images