Liquid supply device, liquid supply method and memory medium

Abstract

To provide technology that can reduce contamination of the process liquid in the circulation line.SOLUTION: A liquid supply device according to the present disclosure comprises a process liquid line, a heating mechanism, a filter, a drain line, a first temperature sensor, and a control unit. The process liquid line supplies the process liquid to the liquid processing section that performs liquid processing on the substrate. The heating mechanism is installed in the process liquid line and heats the process liquid flowing in the process liquid line. The filter is installed downstream of the heating mechanism in the process liquid line. The drain line is located downstream of the filter in the process liquid line and drains the process liquid flowing in the process liquid line. The first temperature sensor is installed in the filter, the process liquid line or the drain line located between the filter and the drain line to detect the temperature of the filter, the process liquid line, the drain line or the process liquid. The control section decides whether to drain the process liquid from the drain line on the basis of the detection result of the first temperature sensor.SELECTED DRAWING: Figure 4

Description

[Technical field]

[0001] The present disclosure relates to a liquid supplying device, a liquid supplying method, and a storage medium. [Background technology]

[0002] Conventionally, a processing solution for a substrate such as a semiconductor wafer (hereinafter also referred to as a wafer) has been circulated in a line. The wastewater is circulated through a circulation line and is then fed to a processing unit through a branch line branching off from the circulation line. A liquid treatment apparatus that supplies a chemical liquid is known. A filter is provided to remove foreign matter from the nozzle (see Patent Document 1). [Prior art documents] [Patent documents]

[0003] [Patent Document 1] JP 2019-41039 A Summary of the Invention [Problem to be solved by the invention]

[0004] The present disclosure provides a technique capable of reducing contamination of a treatment liquid in a circulation line. [Means for solving the problem]

[0005] A liquid supplying device according to an embodiment of the present disclosure includes a processing liquid line, a heating mechanism, a filter, a drain line, a first temperature sensor, and a control unit. The processing liquid line supplies a processing liquid to a liquid processing unit that performs liquid processing on a substrate. The heating mechanism is provided in the processing liquid line and heats the processing liquid flowing through the processing liquid line. The filter is provided downstream of the heating mechanism in the processing liquid line. The drain line is provided downstream of the filter in the processing liquid line and drains the processing liquid flowing through the processing liquid line. The first temperature sensor is provided in the filter, the processing liquid line located between the filter and the drain line, or the drain line, and detects the temperature of the filter, the processing liquid line, the drain line, or the processing liquid. The control unit determines whether or not to drain the processing liquid from the drain line based on a detection result of the first temperature sensor. Effect of the Invention

[0006] According to the present disclosure, contamination of the treatment liquid in the circulation line can be reduced. [Brief description of the drawings]

[0007] [Figure 1] FIG. 1 is a diagram showing a schematic configuration of a substrate processing system according to a first embodiment. [Diagram 2] FIG. 2 is a schematic diagram showing the configuration of the processing unit according to the first embodiment. [Diagram 3] FIG. 3 is a diagram showing a schematic configuration of a processing liquid supply source according to the embodiment. [Figure 4] FIG. 4 is a diagram showing an example of transition of the states of the pump, the first to fourth valves, the first heating mechanism, and the second heating mechanism. [Diagram 5] FIG. 5 is a schematic view showing an example of the operation of the treatment liquid supply source according to the first embodiment. [Figure 6] FIG. 6 is a schematic view showing an example of the operation of the treatment liquid supply source according to the first embodiment. [Figure 7] FIG. 7 is a schematic view showing an example of the operation of the treatment liquid supply source according to the first embodiment. [Figure 8]FIG. 8 is a diagram showing a schematic configuration of a processing liquid supply source according to the second embodiment. [Figure 9] FIG. 9 is a diagram showing a schematic configuration of a processing liquid supply source according to the third embodiment. [Figure 10] FIG. 10 is a diagram showing an example of transition of the states of the pump, the first to fourth valves, the seventh valve, the eighth valve, the first heating mechanism, and the second heating mechanism. [Figure 11] FIG. 11 is a schematic view showing an example of the operation of the treatment liquid supply source according to the third embodiment. [Figure 12] FIG. 12 is a schematic view showing an example of the operation of the treatment liquid supply source according to the third embodiment. [Figure 13] FIG. 13 is a schematic view showing an example of the operation of the treatment liquid supply source according to the third embodiment. [Figure 14] FIG. 14 is a schematic view showing an example of the operation of the treatment liquid supply source according to the third embodiment. [Figure 15] FIG. 15 is a diagram showing a schematic configuration of a processing liquid supply source according to the fifth embodiment. [Figure 16] FIG. 16 is a diagram showing a schematic configuration of a processing liquid supply source according to the sixth embodiment. DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS

[0008] Hereinafter, a detailed description will be given of a liquid supplying device, a liquid supplying method, and a storage medium according to the present disclosure (hereinafter, referred to as "embodiments") with reference to the drawings. Note that the present disclosure is not limited to these embodiments. In addition, the embodiments can be appropriately combined as long as the processing contents are not contradictory. In addition, the same parts in the following embodiments are given the same reference numerals, and duplicated descriptions are omitted.

[0009] In addition, in the embodiments described below, expressions such as "constant", "orthogonal", "vertical" and "parallel" may be used, but these expressions do not necessarily mean "constant", "orthogonal", "vertical" and "parallel" strictly. In other words, each of the above expressions allows for deviations due to, for example, manufacturing accuracy and installation accuracy.

[0010] In addition, in the drawings referred to below, for ease of understanding, an orthogonal coordinate system may be shown in which the X-axis, Y-axis, and Z-axis directions are defined as being orthogonal to each other, and the Z-axis positive direction is the vertically upward direction. Also, the direction of rotation about the vertical axis may be referred to as the θ direction.

[0011] Conventionally, there is known a liquid processing apparatus that circulates a processing liquid for substrates such as semiconductor wafers (hereinafter also referred to as wafers) through a circulation line and supplies the processing liquid to a processing section through a branch line branching off from the circulation line. The circulation line of such a liquid processing apparatus is provided with a filter that removes foreign matter from the processing liquid. In addition, there is known a technique for heating the processing liquid flowing through the circulation line to a desired temperature by a heating mechanism.

[0012] In the circulation line, the circulation of the processing liquid may be stopped for maintenance or the like. When the circulation of the processing liquid is restarted after the circulation has been stopped, the processing liquid is heated by the heating mechanism, and the filter thermally expands due to the effect of the temperature change of the processing liquid. This may cause particles captured in the filter to pass through the filter, thereby contaminating the processing liquid in the circulation line.

[0013] Therefore, there is a need for a technology that can overcome the above-mentioned problems and reduce contamination of the treatment liquid in the circulation line.

[0014] (First embodiment) <Outline of the substrate processing system> First, a schematic configuration of a substrate processing system 1 according to a first embodiment will be described with reference to Fig. 1. Fig. 1 is a diagram showing a schematic configuration of the substrate processing system 1 according to the first embodiment.

[0015] 1, the substrate processing system 1 includes a loading / unloading station 2 and a processing station 3. The loading / unloading station 2 and the processing station 3 are provided adjacent to each other.

[0016] The carry-in / out station 2 includes a FOUP placement section 11 and a transport section 12. On the FOUP placement section 11, a plurality of FOUPs F are placed, each of which accommodates a plurality of substrates, in this embodiment, semiconductor wafers W (hereinafter referred to as wafers W), in a horizontal state.

[0017] The transfer section 12 is provided adjacent to the FOUP placement section 11, and includes therein a substrate transfer device 13 and a transfer section 14. The substrate transfer device 13 includes a wafer holding mechanism that holds the wafer W. The substrate transfer device 13 is capable of moving in the horizontal and vertical directions and rotating about a vertical axis, and transfers the wafer W between the FOUP F and the transfer section 14 using the wafer holding mechanism.

[0018] The processing station 3 is provided adjacent to the transport section 12. The processing station 3 includes a transport section 15 and a plurality of processing units 16. The plurality of processing units 16 are provided side by side on both sides of the transport section 15.

[0019] The transfer section 15 includes a substrate transfer device 17 therein. The substrate transfer device 17 includes a wafer holding mechanism that holds the wafer W. The substrate transfer device 17 is capable of moving in the horizontal and vertical directions and rotating about a vertical axis, and transfers the wafer W between the delivery section 14 and the processing unit 16 using the wafer holding mechanism.

[0020] The processing unit 16 is an example of a liquid processing section, and performs a predetermined liquid processing on the wafer W transferred by the substrate transfer device 17.

[0021] The substrate processing system 1 also includes a control device 4. The control device 4 is, for example, a computer, and includes a control unit 18 and a storage unit 19. The storage unit 19 stores programs for controlling various processes executed in the substrate processing system 1. The control unit 18 controls the operation of the substrate processing system 1 by reading out and executing the programs stored in the storage unit 19.

[0022] Such a program may be recorded in a computer-readable storage medium and installed from that storage medium into the storage unit 19 of the control device 4. Examples of computer-readable storage media include a hard disk (HD), a flexible disk (FD), a compact disk (CD), a magnet optical disk (MO), and a memory card.

[0023] In the substrate processing system 1 configured as described above, first, the substrate transfer device 13 in the load / unload station 2 removes the wafer W from the FOUP F placed on the FOUP placement section 11, and places the removed wafer W on the delivery section 14. The wafer W placed on the delivery section 14 is then removed from the delivery section 14 by the substrate transfer device 17 in the processing station 3, and carried into the processing unit 16.

[0024] The wafer W carried into the processing unit 16 is processed by the processing unit 16, and then carried out of the processing unit 16 by the substrate transfer device 17 and placed on the delivery section 14. Then, the processed wafer W placed on the delivery section 14 is returned to the FOUP F of the FOUP mounting section 11 by the substrate transfer device 13.

[0025] <Processing unit overview> Next, an overview of the processing unit 16 will be described with reference to Fig. 2. Fig. 2 is a schematic diagram showing the configuration of the processing unit 16 according to the first embodiment. The processing unit 16 includes a chamber 20, a substrate processing section 30, a liquid supply section 40, and a collection cup 50.

[0026] The chamber 20 accommodates a substrate processing unit 30, a liquid supply unit 40, and a collection cup 50. An FFU (Fan Filter Unit) 21 is provided on the ceiling of the chamber 20. The FFU 21 forms a downflow within the chamber 20.

[0027] Substrate processing unit 30 includes a holder 31, a support 32, and a drive unit 33, and performs liquid processing on a placed wafer W. Holder 31 holds wafer W (see FIG. 1) horizontally. Support 32 is a member extending in the vertical direction, with a base end rotatably supported by drive unit 33 and a tip end supporting holder 31 horizontally. Drive unit 33 rotates support 32 about a vertical axis.

[0028] The substrate processing unit 30 rotates the support column 32 using the drive unit 33, thereby rotating the holder 31 supported by the support column 32. This causes the wafer W held by the holder 31 to rotate.

[0029] The liquid supply unit 40 supplies a processing liquid to the wafer W. The liquid supply unit 40 is connected to a processing liquid supply source 70. The liquid supply unit 40 includes a plurality of nozzles. The plurality of nozzles are provided corresponding to, for example, a plurality of types of processing liquid. The plurality of nozzles eject, onto the wafer W, the plurality of types of processing liquid respectively supplied from the plurality of processing liquid supply sources 70.

[0030] Collection cup 50 is disposed to surround holder 31, and collects the processing liquid scattered from wafer W due to the rotation of holder 31. A drainage outlet 51 is formed at the bottom of collection cup 50, and the processing liquid collected by collection cup 50 is discharged from drainage outlet 51 to the outside of processing unit 16.

[0031] Further, an exhaust port 52 for discharging the gas supplied from the FFU 21 to the outside of the processing unit 16 is formed at the bottom of the collection cup 50.

[0032] <Outline of processing solution supply sources> Next, a schematic configuration of the processing liquid supply source 70 included in the substrate processing system 1 will be described with reference to Fig. 3. Fig. 3 is a diagram showing a schematic configuration of the processing liquid supply source 70 according to an embodiment. The processing liquid supply source 70 is an example of a liquid supply device.

[0033] 3, a processing liquid supply source 70 included in the substrate processing system 1 supplies processing liquid to the multiple processing units 16. In the first embodiment, for example, a processing liquid supply source 70 shown in FIG. 3 is provided for each of the multiple types of processing liquid.

[0034] 3, the processing liquid supply source 70 includes a tank 80, a circulation line 90 (an example of a processing liquid line), and a pump 100. The tank 80 stores the processing liquid. The processing liquid is, for example, IPA (isopropyl alcohol). Note that the processing liquid of the present disclosure is not limited to IPA, and various types of chemical liquids are applicable.

[0035] The circulation line 90 returns the treatment liquid sent from the tank 80 to the tank 80. The circulation line 90 includes a main line 91 on the upstream side and multiple (here, two) branch lines 92a, 92b on the downstream side (hereinafter also referred to as a "first branch line 92a" and a "second branch line 92b").

[0036] In the following description, the final letter of the reference numeral given to the components belonging to the first branch line 92a is "a," and the final letter of the reference numeral given to the components belonging to the second branch line 92b is "b." The components belonging to the first branch line 92a and the components belonging to the second branch line 92b are the same or substantially the same. When it is not necessary to distinguish between the components belonging to the first branch line 92a and the components belonging to the second branch line 92b, the final letters "a" and "b" may be deleted (for example, 93a and 93b are written as 93).

[0037] A pump 100 is provided in the main line 91. The pump 100 forms a circulating flow of the treatment liquid in the circulation line 90.

[0038] The main line 91 branches into a first branch line 92a and a second branch line 92b at a branch (branch point) set at its downstream end, i.e., downstream of the pump 100. The treatment liquid flowing out of the tank 80 passes through the main line 91, then flows into the first branch line 92a and the second branch line 92b, and returns to the tank 80 through the first branch line 92a and the second branch line 92b.

[0039] That is, in the processing liquid supply source 70 according to the first embodiment, the driving force generated by the pump 100 causes the processing liquid to circulate in both the first branch line 92a and the second branch line 92b of the circulation line 90. This makes it possible to reduce the number of pumps and the cost of the processing liquid supply source, compared to the case where a pump is provided in each of the first branch line 92a and the second branch line 92b.

[0040] The first branch line 92a includes, in order from the upstream side, a first heating mechanism 93a, a first flowmeter 94a, a third valve 95a, a first filter 96a, a first circulation temperature sensor 97a (an example of a first temperature sensor), and a first valve 98a. The second branch line 92b includes, in order from the upstream side, a second heating mechanism 93b, a second flowmeter 94b, a fourth valve 95b, a second filter 96b, a second circulation temperature sensor 97b (an example of a first temperature sensor), and a second valve 98b.

[0041] The heating mechanism 93 (first heating mechanism 93a, second heating mechanism 93b) heats the temperature of the processing liquid passing through the heating mechanism 93. The control unit 18 can adjust the temperature of the processing liquid by controlling the amount of heat applied to the processing liquid by the heating mechanism 93. The first heating mechanism 93a and the second heating mechanism 93b each include a plurality of heating modules arranged in parallel. The heating mechanism 93 is controlled by the control unit 18.

[0042] The number of heating modules belonging to one heating mechanism 93 can be determined taking into consideration the temperature control capacity required of the heating mechanism 93 and the allowable pressure drop in the heating mechanism 93. In the first embodiment, as shown in Fig. 3, the first heating mechanism 93a and the second heating mechanism 93b are each composed of four heating modules arranged in parallel.

[0043] The flowmeter 94 (first flowmeter 94a, second flowmeter 94b) measures the flow rate of the circulating flow of the processing liquid formed in the circulation line 90. The measurement result by the flowmeter 94 is output to the control unit .

[0044] The valves 95 (third valve 95a, fourth valve 95b) switch the destination of the processing liquid. Specifically, a first branch circulation line 105a connected to the tank 80 branches from the third valve 95a. The first branch circulation line 105a returns the processing liquid sent from the tank 80 to the first branch circulation line 92a to the tank 80. The third valve 95a switches the destination of the processing liquid in the first branch line 92a between the first branch circulation line 105a and the first filter 96a. For example, when the control unit 18 controls the third valve 95a to set the destination of the processing liquid to the first branch circulation line 105a, the processing liquid sent from the tank 80 returns to the tank 80 via the third valve 95a. Furthermore, for example, when the control unit 18 controls the third valve 95a to direct the treatment liquid to the first filter 96a, the treatment liquid delivered from the tank 80 flows into the first filter 96a via the third valve 95a. The control unit 18 can also control the third valve 95a to direct the treatment liquid to both the first branch circulation line 105a and the first filter 96a.

[0045] The first branch circulation line 105a is provided with a first branch temperature sensor 102a (an example of a second temperature sensor) for detecting the temperature of the treatment liquid flowing through the first branch circulation line 105a. The detection result of the first branch temperature sensor 102a is output to the control unit 18.

[0046] Similarly, a second branch circulation line 105b connected to the tank 80 branches from the fourth valve 95b. The second branch circulation line 105b returns the processing liquid sent from the tank 80 to the second branch circulation line 92b to the tank 80. The fourth valve 95b switches the destination of the processing liquid in the second branch line 92b between the second branch circulation line 105b and the second filter 96b. For example, when the control unit 18 controls the fourth valve 95b to set the destination of the processing liquid to the second branch circulation line 105b, the processing liquid sent from the tank 80 returns to the tank 80 via the fourth valve 95b. Also, for example, when the control unit 18 controls the fourth valve 95b to set the destination of the processing liquid to the second filter 96b, the processing liquid sent from the tank 80 flows to the second filter 96b via the fourth valve 95b. The control unit 18 can also control the fourth valve 95b to allow the treatment liquid to flow to both the second branch circulation line 105b and the second filter 96b.

[0047] The second branch circulation line 105b is provided with a second branch temperature sensor 102b (an example of a second temperature sensor) that detects the temperature of the treatment liquid flowing through the second branch circulation line 105b. The detection result of the second branch temperature sensor 102b is output to the control unit 18.

[0048] In this manner, the processing liquid supply source 70 according to the first embodiment includes the first branch circulation line 105a and the second branch circulation line 105b. In a step of restarting a circulating flow of the processing liquid in the circulation line 90 after the circulation of the processing liquid has been stopped for maintenance or the like, the processing liquid can be heated while forming a circulating flow of the processing liquid flowing through the first branch circulation line 105a or the second branch circulation line 105b, thereby enabling a temperature raising process of the processing liquid to be performed without passing through the filter 96.

[0049] Therefore, according to the first embodiment, it is possible to reduce contamination of the processing liquid caused by particles passing through the filter 96 as the temperature of the processing liquid increases. Also, in the first embodiment, since the processing liquid does not flow through the filter 96 in which the particles are captured, it is possible to reduce contamination of the processing liquid during the temperature increase process.

[0050] The filters 96 (first filter 96a, second filter 96b) remove contaminants such as particles contained in the processing liquid passing through the filters 96. The first filter 96a and the second filter 96b may include a plurality of filter modules arranged in parallel. The number of filter modules belonging to one filter 96 can be determined in consideration of the filtering capacity required of the filter 96, the pressure drop allowed in the filter 96, and the like. In the first embodiment, as shown in FIG. 3, the first filter 96a and the second filter 96b are each composed of two filter modules arranged in parallel.

[0051] The circulation temperature sensor 97 (first circulation temperature sensor 97a, second circulation temperature sensor 97b) detects the temperature of the processing liquid flowing through the circulation line 90. The detection result by the circulation temperature sensor 97 is output to the control unit .

[0052] It is not necessary for the circulation temperature sensor 97 to detect the temperature of the treatment liquid flowing through the circulation line 90. For example, the circulation temperature sensor 97 may be provided on the filter 96, the circulation line 90 (the first branch line 92a, the second branch line 92b), or the drain line 99, and detect the temperature of the filter 96, the circulation line 90, or the drain line 99.

[0053] Further, although an example in which two temperature sensors, the first circulation temperature sensor 97a and the second circulation temperature sensor 97b, are provided, this is not limiting, and only one of the two temperature sensors may be provided.

[0054] The valve 98 (first valve 98a, second valve 98b) switches the destination of the treatment liquid. Specifically, a first drainage line 99a connected to the drain unit DR branches from the first valve 98a. The first drainage line 99a drains the treatment liquid flowing into the first branch line 92a. The first valve 98a switches the destination of the treatment liquid in the first branch line 92a between the first drainage line 99a and the first branch line 92a. For example, when the control unit 18 controls the first valve 98a to set the destination of the treatment liquid to the first drainage line 99a, the treatment liquid sent from the tank 80 is drained via the first valve 98a. Also, for example, when the control unit 18 controls the first valve 98a to set the destination of the treatment liquid to the first branch line 92a, the treatment liquid sent from the tank 80 flows into the first branch line 92a via the first valve 98a. The control unit 18 can also control the first valve 98a to allow the treatment liquid to flow into both the first branch line 92a and the first drain line 99a.

[0055] Similarly, a second drainage line 99b connected to the drain unit DR branches from the second valve 98b. The second drainage line 99b drains the processing liquid flowing into the second branch line 92b. The second valve 98b switches the destination of the processing liquid in the second branch line 92b between the second drainage line 99b and the second branch line 92b. For example, when the control unit 18 controls the second valve 98b to set the destination of the processing liquid to the second drainage line 99b, the processing liquid sent from the tank 80 is drained through the second valve 98b. Also, for example, when the control unit 18 controls the second valve 98b to set the destination of the processing liquid to the second branch line 92b, the processing liquid sent from the tank 80 flows into the second branch line 92b through the second valve 98b. The control unit 18 can also control the second valve 98b to allow the treatment liquid to flow into both the second branch line 92b and the second drain line 99b.

[0056] A plurality of first supply lines 110a are connected to the first branch line 92a located downstream of the first valve 98a. One end of the first supply line 110a is connected to the first branch line 92a, and the other end is connected to the processing unit 16. The first supply line 110a supplies the processing liquid flowing through the first branch line 92a to the processing unit 16. A fifth valve 107a for opening and closing the first supply line 110a is provided in the middle of the first supply line 110a.

[0057] A plurality of second supply lines 110b are connected to the second branch line 92b located downstream of the second valve 98b. One end of the second supply line 110b is connected to the second branch line 92b, and the other end is connected to the processing unit 16. The second supply line 110b supplies the processing liquid flowing through the second branch line 92b to the processing unit 16. A sixth valve 107b for opening and closing the second supply line 110b is provided in the middle of the second supply line 110b.

[0058] 3 shows an example in which three first supply lines 110a are connected to the first branch line 92a, but the number of first supply lines 110a connected to the first branch line 92a is not limited to three. Similarly, the number of second supply lines 110b connected to the second branch line 92b is not limited to three.

[0059] In addition, here, the first valve 98a, the second valve 98b, the third valve 95a, and the fourth valve 95b are switching valves that switch the destination of the processing liquid, but the first valve 98a, the second valve 98b, the third valve 95a, and the fourth valve 95b do not necessarily need to be switching valves. For example, the first valve 98a may be composed of two opening and closing valves, an opening and closing valve provided in the first drainage line 99a and an opening and closing valve provided in the first branch line 92a downstream of the first drainage line 99a. The same applies to the second valve 98b, the third valve 95a, and the fourth valve 95b.

[0060] In the substrate processing system 1 configured as described above, in the process of circulating the processing liquid through the circulation line 90 again after the flow of the processing liquid has been stopped for maintenance or the like, a process of draining a certain amount of the processing liquid from the drain line 99 (hereinafter referred to as "initial drain") is first performed, so that contaminants such as particles captured in the filter 96 can be discharged together with the processing liquid.

[0061] Here, if the amount of processing liquid discharged in the initial dump (hereinafter referred to as the "initial dump amount") is not clear, there is a risk that more processing liquid than necessary will be discharged from the drain line 99.

[0062] In response to this, the inventors of the present application have discovered a relationship between the temperature of the processing liquid flowing through the drain line 99 and the amount of contaminants such as particles contained in the processing liquid (hereinafter referred to as the "particle amount").

[0063] Specifically, the inventors found that the temperature of the processing liquid flowing through the drain line 99 increases as the initial waste amount increases, and that the temperature stabilizes when the initial waste amount reaches a certain amount. In more detail, the inventors measured the temperature of the processing liquid when the initial waste amount reached 2 L, 4 L, 8 L, 12 L, and 24 L. As a result, the temperature of the processing liquid was about 45° C. when the initial waste amount reached 2 L, and about 54° C. when the initial waste amount reached 4 L, whereas the temperature of the processing liquid hardly changed after the initial waste amount exceeded 4 L.

[0064] The inventors of the present application also measured the particle amounts when the initial disposal amounts reached 2 L, 4 L, 8 L, 12 L, and 24 L. As a result, the particle amount at an initial disposal amount of 2 L was greater than the particle amount at initial disposal amounts of 4 L, 8 L, 12 L, and 24 L, while the particle amounts at initial disposal amounts of 4 L, 8 L, 12 L, and 24 L were all approximately the same.

[0065] From these results, in the substrate processing system 1 according to the first embodiment, it is determined whether or not to drain the processing liquid flowing through the circulation line 90 from the drain line 99 based on the temperature of the processing liquid flowing through the circulation line 90. By performing such a determination, it is possible to optimize the initial discharge amount. That is, since the initial discharge can be ended at a stage where the amount of particles has sufficiently decreased, it is possible to appropriately suppress contamination of the processing liquid in the circulation line 90. Moreover, by ending the initial discharge at a timing when no change in the amount of particles is observed, it is possible to suppress unnecessary discharge of the processing liquid. Details of the determination process will be described later.

[0066] Next, an example of the operation of the substrate processing system 1 according to the first embodiment will be described with reference to Fig. 4. Fig. 4 is a diagram showing an example of the transition of states of the pump 100, the first valve 98a to the fourth valve 95b, the first heating mechanism 93a, and the second heating mechanism 93b. Figs. 5 to 7 are schematic diagrams showing an example of the operation of the processing liquid supply source 70 according to the first embodiment. The process shown in Fig. 4 is an example of the operation when the circulation of the processing liquid in the circulation line 90 is stopped due to maintenance or the like, and then the circulation of the processing liquid is started again.

[0067] First, the control unit 18 operates the pump 100, which had been stopped, to pump the treatment liquid from the tank 80 to the circulation line 90 (time T1). At the same time, the control unit 18 controls the third valve 95a to cause the treatment liquid to flow into the first branch circulation line 105a. As a result, the treatment liquid sent from the tank 80 flows into the first branch circulation line 105a via the third valve 95a, and is circulated back to the tank 80.

[0068] Next, the control unit 18 closes the third valve 95a to stop the outflow of the processing liquid to the first branch circulation line 105a (time T2). At the same time, the control unit 18 controls the fourth valve 95b to cause the processing liquid to flow into the second branch circulation line 105b. As a result, the processing liquid sent from the tank 80 flows into the second branch circulation line 105b via the fourth valve 95b, and is circulated so as to return to the tank 80.

[0069] Next, the control unit 18 controls the third valve 95a to cause the processing liquid to flow into the first branch circulation line 105a (time T3). As a result, the processing liquid sent from the tank 80 flows into the first branch circulation line 105a and the second branch circulation line 105b, and circulates back to the tank 80 (see FIG. 5).

[0070] Next, the control unit 18 judges whether the circulation flow rate of the treatment liquid flowing through the first branch circulation line 105a and the second branch circulation line 105b is stable or not based on the measured values ​​of the first flow meter 94a and the second flow meter 94b. Specifically, when the measured value of the first flow meter 94a falls within a preset threshold range, the control unit 18 judges that the circulation flow rate of the treatment liquid is stable, and starts heating by the first heating mechanism 93a. Similarly, when the measured value of the second flow meter 94b falls within a preset threshold range, the control unit 18 judges that the circulation flow rate of the treatment liquid in the second branch line 92b is stable, and starts heating by the second heating mechanism 93b. For example, as shown in FIG. 4, the control unit 18 operates the second heating mechanism 93b after the measured value of the second flow meter 94b falls within the threshold range (time T4). Thereafter, after the measurement value of the first flow meter 94a falls within the threshold range, the control unit 18 operates the first heating mechanism 93a (time T5).

[0071] Next, the control unit 18 judges whether the temperature of the treatment liquid flowing through the first branch circulation line 105a and the second branch circulation line 105b has stabilized based on the detection results of the first branch temperature sensor 102a and the second branch temperature sensor 102b. Specifically, the control unit 18 judges that the temperature of the treatment liquid in the first branch circulation line 105a has stabilized when the measurement value of the first branch temperature sensor 102a falls within a preset threshold range in a preset monitoring time width. Similarly, the control unit 18 judges that the temperature of the treatment liquid in the second branch circulation line 105b has stabilized when the measurement value of the second branch temperature sensor 102b falls within a preset threshold range in a preset monitoring time width.

[0072] When the temperatures of the treatment liquid in the first branch line 92a and the second branch line 92b are stabilized, the control unit 18 controls the first valve 98a to the fourth valve 95b to circulate the treatment liquid through the first branch circulation line 105a and the second branch circulation line 105b while causing the treatment liquid to flow into the drain line 99. For example, as shown in Fig. 4, after the measured values ​​of the first branch temperature sensor 102a and the second branch temperature sensor 102b fall within a preset threshold range in a preset monitoring time width, the control unit 18 controls the third valve 95a and the fourth valve 95b to cause the treatment liquid to flow into both the filter 96 and the branch circulation line 105 (time T6).

[0073] At the same time, the control unit 18 controls the first valve 98a and the second valve 98b to cause the processing liquid to flow into the first drainage line 99a and the second drainage line 99b. As a result, the processing liquid sent from the tank 80 flows into the first branch circulation line 105a or the second branch circulation line 105b and circulates back to the tank 80, while flowing into the first filter 96a and the second filter 96b and being drained from the drainage line 99 (see FIG. 6).

[0074] Next, the control unit 18 determines whether or not to drain the processing liquid from the drain line 99 based on the detection results of the first circulation temperature sensor 97a and the second circulation temperature sensor 97b. Specifically, when the measurement values ​​of the first circulation temperature sensor 97a and the second circulation temperature sensor 97b are equal to or higher than a threshold value, the control unit 18 controls the first valve 98a to the fourth valve 95b to switch the outflow destination of the processing liquid from the drain line 99 to the supply line 110.

[0075] For example, as shown in FIG. 4, when the measured values ​​of both the first circulation temperature sensor 97a and the second circulation temperature sensor 97b are equal to or greater than the threshold value, the control unit 18 controls the third valve 95a and the fourth valve 95b to switch the outflow destination of the processing liquid to the filter 96 (time T7). At the same time, the control unit 18 controls the first valve 98a and the second valve 98b to switch the outflow destination of the processing liquid to the supply line 110. As a result, the processing liquid sent from the tank 80 flows into the first branch line 92a and the second branch line 92b and returns to the tank 80 (see FIG. 7). Also, when the fifth valve 107a or the sixth valve 107b is open, the processing liquid is supplied from the supply line 110 to the processing unit 16.

[0076] In this way, the control unit 18 determines whether or not to drain the processing liquid from the drain line 99 based on the detection results of the first circulation temperature sensor 97a and the second circulation temperature sensor 97b. Specifically, when the temperature of the processing liquid flowing through the circulation line 90 is equal to or higher than a threshold based on the detection results of the first circulation temperature sensor 97a and the second circulation temperature sensor 97b, the control unit 18 controls the first valve 98a and the second valve 98b to switch the outflow destination of the processing liquid from the drain line 99 to the supply line 110.

[0077] Here, an example is shown in which the destination of the processing liquid is switched from the drain line 99 to the supply line 110 when the temperature of the processing liquid flowing through the circulation line 90 is equal to or higher than a threshold value, but the present invention is not limited to this. For example, when the temperature of the processing liquid flowing through the circulation line 90 becomes equal to or higher than a threshold value, the processing liquid may be continuously discharged until a predetermined time has elapsed. Specifically, when the temperature of the processing liquid flowing through the circulation line 90 becomes equal to or higher than a threshold value, the control unit 18 controls the first valve 98a and the second valve 98b to switch the destination of the processing liquid to the drain line 99 and the supply line 110. As a result, a certain amount of the processing liquid sent from the tank 80 is discharged from the drain line 99 while flowing through the branch line 92. After that, the control unit 18 switches the destination of the processing liquid to the supply line 110 when a predetermined time has elapsed.

[0078] After the processing liquid heated by the heating mechanism 93 starts to be discharged (time T6), the temperature of the processing liquid flowing through the circulation line 90 gradually increases. Thereafter, when the temperature of the processing liquid reaches or exceeds a threshold value, most of the particles captured in the filter 96 flow out. This reduces the possibility of contaminating the inside of the circulation line 90. By stopping the discharge at that point (time T7) and starting the circulation of the processing liquid into the circulation line 90, the amount of processing liquid to be discharged can be minimized. In other words, the control unit 18 controls whether or not to discharge the processing liquid based on the temperature of the processing liquid flowing through the circulation line 90, so that the amount of processing liquid to be discharged can be made appropriate.

[0079] Furthermore, the control unit 18 controls the pump 100, the first heating mechanism 93a, and the second heating mechanism 93b to heat the treatment liquid while circulating it through the first branch circulation line 105a and the second branch circulation line 105b (time T5 to time T7).

[0080] In this way, the control unit 18 heats the treatment liquid while circulating it through the first branch circulation line 105a and the second branch circulation line 105b, so that the treatment liquid can be heated efficiently in a short time compared to when the treatment liquid is heated while circulating it throughout the entire circulation line 90.

[0081] Furthermore, when the control unit 18 determines that the temperatures of the treatment liquid flowing through the first branch circulation line 105a and the second branch circulation line 105b have stabilized based on the detection results of the first branch temperature sensor 102a and the second branch temperature sensor 102b, it controls the pump 100 to send the treatment liquid to the filter 96 (time T6). This allows the treatment liquid to be sent to the circulation line 90 after the temperature of the treatment liquid has stabilized.

[0082] In addition, the control unit 18 controls the pump 100, the first valve 98a, and the second valve 98b to send the treatment liquid circulating through the first branch circulation line 105a and the second branch circulation line 105b to the first filter 96a and the second filter 96b, and to drain the treatment liquid that has passed through the first filter 96a and the second filter 96b into the first drainage line 99a and the second drainage line 99b (time T6 to time T7).

[0083] This allows the processing liquid to be drained when particles captured by the first filter 96a and the second filter 96b pass through due to a temperature change in the processing liquid, thereby reducing contamination of the processing liquid in the circulation line 90 by particles.

[0084] After the measured values ​​measured by the first flowmeter 94a and the second flowmeter 94b fall within their respective threshold ranges, the control unit 18 controls the third valve 95a to switch the outflow destination of the treatment liquid in the first branch circulation line 105a from the first branch circulation line 105a to the first filter 96a, and controls the fourth valve 95b to switch the outflow destination of the treatment liquid in the second branch circulation line 105b from the second branch circulation line 105b to the second filter 96b. This allows the treatment liquid to be sent to the first filter 96a and the second filter 96b after the flow rate of the treatment liquid has stabilized (time T4, time T5).

[0085] Moreover, after starting to feed the treatment liquid to the first branch circulation line 105a (time T1), the control unit 18 starts to feed the treatment liquid to the second branch circulation line 105b (time T2). By feeding the treatment liquid one by one in this way, the treatment liquid is more likely to become full of liquid than when feeding the treatment liquid to both lines simultaneously.

[0086] Furthermore, after the control unit 18 has drained the treatment liquid from the first drain line 99a and the second drain line 99b, it controls the first valve 98a and the second valve 98b to send the treatment liquid to the first branch line 92a and the second branch line 92b and return it to the tank 80 (time T7). This makes it possible to reduce the contamination of the inside of the tank 80 caused by particles captured by the filter 96 in the tank 80 flowing into the tank 80.

[0087] Furthermore, the control unit 18 circulates the treatment liquid in the first branch circulation line 105a and the second branch circulation line 105b (time T6 to time T7) while circulating the treatment liquid in the circulation line 90. This makes it possible to prevent the treatment liquid from stagnation in the first branch circulation line 105a and the second branch circulation line 105b while the treatment liquid is circulating in the circulation line 90.

[0088] As described above, the control unit 18 determines whether or not to drain the processing liquid from the drain line 99 based on the detection results of the first circulation temperature sensor 97a and the second circulation temperature sensor 97b. This makes it possible to optimize the amount of processing liquid to be drained while reducing contamination of the processing liquid flowing through the circulation line 90.

[0089] Here, an example has been shown in which the processing liquid being heated is discharged into the drain section DR via the drain line 99, and then a circulating flow of the processing liquid is formed through the circulation line 90, but the present disclosure is not limited to such an example.

[0090] For example, before starting circulation of the treatment liquid in the circulation line 90, the control unit 18 may heat the treatment liquid while circulating it in the first branch circulation line 105a and the second branch circulation line 105b (time T4, time T5), and then repeatedly perform a process (time T6 to time T7) of sending the treatment liquid circulating in the first branch circulation line 105a and the second branch circulation line 105b to the filter 96 and draining the treatment liquid by flowing it into the drainage line 99.

[0091] This allows a larger number of particles trapped in the filter 96 to flow downstream, further reducing contamination of the processing liquid in the circulation line 90.

[0092] Second embodiment 8 is a diagram showing a schematic configuration of a processing liquid supply source 70 according to the second embodiment. In the above-described first embodiment, the circulation line 90 is branched into the first branch line 92a and the second branch line 92b, but the present invention is not limited to this. The circulation line 90 does not necessarily have to include a branch line.

[0093] 8, the processing liquid supply source 70 includes a circulation line 90 that returns the processing liquid delivered from the tank 80 to the tank 80. The circulation line 90 includes, in this order from upstream, a pump 100, a heating mechanism 93c, a flow meter 94c, a valve 95c, a filter 96c, a circulation temperature sensor 97c, and a valve 98c.

[0094] A branch circulation line 105c connected to the tank 80 branches off from the valve 95c. A branch temperature sensor 102c for detecting the temperature of the treatment liquid flowing through the branch circulation line 105c is provided in the branch circulation line 105c. A drain line 99c connected to a drain unit DR branches off from the valve 98c.

[0095] In this case as well, at time T7 in Fig. 4, it is determined whether or not to drain the processing liquid from the drain line 99c based on the detection result of the circulation temperature sensor 97c. Specifically, when the measurement value of the circulation temperature sensor 97c is equal to or higher than the threshold value, the control unit 18 controls the valves 98c and 95c to switch the destination of the processing liquid from the drain line 99c to the supply line 110c. This makes it possible to optimize the amount of processing liquid to be drained while reducing contamination of the processing liquid flowing through the circulation line 90.

[0096] Third embodiment 9 is a diagram showing a schematic configuration of a processing liquid supply source 70 according to the third embodiment. The processing liquid supply source 70 according to the third embodiment differs from the processing liquid supply source 70 according to the first embodiment in that it has a cleaning liquid supply unit 120 and a new liquid supply unit 130. Therefore, in the following examples, the same reference numerals are used for the same parts as those in the already described embodiments, and detailed descriptions thereof will be omitted.

[0097] The cleaning liquid supply unit 120 supplies the cleaning liquid for the filter 96 to the tank 80. The cleaning liquid supply unit 120 includes a cleaning liquid source 121 and a seventh valve 122. The cleaning liquid for the filter 96 is supplied from the cleaning liquid source 121 to the tank 80. The cleaning liquid is, for example, DIW (Deionized Water). The seventh valve 122 is an opening / closing valve provided in a flow path of the cleaning liquid supplied from the cleaning liquid source 121. For example, when the control unit 18 controls the cleaning liquid supply unit 120 to open the seventh valve 122, the cleaning liquid supplied from the cleaning liquid source 121 is sent to the tank 80 via the seventh valve 122. Also, when the control unit 18 controls the cleaning liquid supply unit 120 to close the seventh valve 122, the cleaning liquid is not sent from the cleaning liquid source 121 to the tank 80.

[0098] The new liquid supply unit 130 supplies new processing liquid to the tank 80. The new liquid supply unit 130 includes a new liquid supply source 131 and an eighth valve 132. New processing liquid is supplied from the new liquid supply source 131 to the tank 80. The eighth valve 132 is an open / close valve provided in a flow path of new processing liquid supplied from the new liquid supply source 131. For example, when the control unit 18 controls the new liquid supply unit 130 to open the eighth valve 132, the new processing liquid supplied from the new liquid supply source 131 is sent to the tank 80 via the eighth valve 132. Also, when the control unit 18 controls the new liquid supply unit 130 to close the eighth valve 132, new processing liquid is not sent from the new liquid supply source 131 to the tank 80.

[0099] Next, an example of the operation of the substrate processing system 1 according to the third embodiment will be described with reference to Fig. 10. Fig. 10 is a diagram showing an example of the transition of states of the pump 100, the first valve 98a to the fourth valve 95b, the seventh valve 122, the eighth valve 132, the first heating mechanism 93a, and the second heating mechanism 93b. For example, Fig. 10 shows an example of the transition of states of each component when the filter 96 is replaced with a new one and the replaced filter 96 is cleaned after the circulation of the processing liquid in the circulation line 90 has stopped. Figs. 11 to 14 are schematic diagrams showing an example of the operation of the processing liquid supply source 70 according to the third embodiment.

[0100] First, the control unit 18 controls the seventh valve 122 to start supplying the cleaning liquid to the tank 80 (time T8).

[0101] Next, the control unit 18 operates the pump 100, which had been stopped, to pump the cleaning liquid from the tank 80 to the circulation line 90 (time T9). The control unit 18 also controls the third valve 95a and the fourth valve 95b to cause the cleaning liquid to flow into the first branch circulation line 105a and the second branch circulation line 105b. The control unit 18 also operates the first heating mechanism 93a and the second heating mechanism 93b. As a result, the cleaning liquid supplied from the cleaning liquid supply source 121 to the tank 80 flows through the third valve 95a and the fourth valve 95b into the first branch circulation line 105a and the second branch circulation line 105b, and is heated while circulating back to the tank 80 (see FIG. 11).

[0102] Next, the control unit 18 judges whether the temperature of the cleaning liquid flowing through the first branch circulation line 105a and the second branch circulation line 105b has stabilized based on the detection results of the first branch temperature sensor 102a and the second branch temperature sensor 102b. Specifically, the control unit 18 judges that the temperature of the cleaning liquid in the first branch circulation line 105a has stabilized when the measurement value of the first branch temperature sensor 102a falls within a preset threshold range in a preset monitoring time span. Similarly, the control unit 18 judges that the temperature of the cleaning liquid in the second branch circulation line 105b has stabilized when the measurement value of the second branch temperature sensor 102b falls within a preset threshold range in a preset monitoring time span.

[0103] When the temperatures of the cleaning liquid in the first branch line 92a and the second branch line 92b are stabilized, the control unit 18 controls the first valve 98a to the fourth valve 95b to circulate the processing liquid through the first branch circulation line 105a and the second branch circulation line 105b while causing the processing liquid to flow into the drain line 99. For example, as shown in Fig. 10, after the measured values ​​of the first branch temperature sensor 102a and the second branch temperature sensor 102b fall within a preset threshold range in a preset monitoring time width, the control unit 18 controls the third valve 95a and the fourth valve 95b to cause the cleaning liquid to flow into both the filter 96 and the branch circulation line 105 (time T10).

[0104] At the same time, the control unit 18 controls the first valve 98a and the second valve 98b to allow the cleaning liquid to flow into the first drainage line 99a and the second drainage line 99b. As a result, the cleaning liquid sent from the tank 80 flows into the first branch circulation line 105a or the second branch circulation line 105b and circulates back to the tank 80, while flowing into the first filter 96a and the second filter 96b and being drained from the drainage line 99 (see FIG. 12). Thereafter, the control unit 18 controls the seventh valve 122 to stop the supply of the cleaning liquid to the tank 80 (time T11). In addition, the control unit 18 stops the operation of the first heating mechanism 93a and the second heating mechanism 93b. As a result, the cleaning liquid in the tank 80 flows into the first filter 96a and the second filter 96b and is drained from the drainage line 99, so that it gradually decreases, and finally, all the cleaning liquid in the tank 80 is drained.

[0105] Next, the control unit 18 controls the eighth valve 132 to supply new processing liquid to the tank 80 (time T12). The control unit 18 also controls the third valve 95a and the fourth valve 95b to cause the processing liquid to flow into the first branch circulation line 105a and the second branch circulation line 105b. The control unit 18 also operates the first heating mechanism 93a and the second heating mechanism 93b. As a result, the processing liquid supplied from the new liquid supply source 131 to the tank 80 flows through the third valve 95a and the fourth valve 95b into the first branch circulation line 105a and the second branch circulation line 105b, and is heated while circulating back to the tank 80 (see FIG. 13).

[0106] Next, the control unit 18 determines whether or not the temperatures of the treatment liquid flowing through the first branch circulation line 105a and the second branch circulation line 105b have stabilized based on the detection results of the first branch temperature sensor 102a and the second branch temperature sensor 102b.

[0107] When the temperatures of the treatment liquid in the first branch line 92a and the second branch line 92b are stabilized, the control unit 18 controls the first valve 98a to the fourth valve 95b to circulate the treatment liquid through the first branch circulation line 105a and the second branch circulation line 105b while causing the treatment liquid to flow into the drain line 99. For example, as shown in Fig. 10, after the measured values ​​of the first branch temperature sensor 102a and the second branch temperature sensor 102b fall within a preset threshold range in a preset monitoring time width, the control unit 18 controls the third valve 95a and the fourth valve 95b to cause the treatment liquid to flow into both the filter 96 and the branch circulation line 105 (time T13).

[0108] At the same time, the control unit 18 controls the first valve 98a and the second valve 98b to cause the processing liquid to flow into the first drainage line 99a and the second drainage line 99b. As a result, the processing liquid sent from the tank 80 flows into the first branch circulation line 105a or the second branch circulation line 105b and circulates back to the tank 80, while flowing into the first filter 96a and the second filter 96b and being drained from the drainage line 99 (see FIG. 14).

[0109] Next, the control unit 18 determines whether or not to drain the processing liquid from the drain line 99 based on the detection results of the first circulation temperature sensor 97a and the second circulation temperature sensor 97b. Specifically, when the measurement values ​​of the first circulation temperature sensor 97a and the second circulation temperature sensor 97b are equal to or higher than a threshold value, the control unit 18 controls the first valve 98a to the fourth valve 95b to switch the outflow destination of the processing liquid from the drain line 99 to the supply line 110.

[0110] For example, as shown in FIG. 10, when the measured values ​​of both the first circulation temperature sensor 97a and the second circulation temperature sensor 97b are equal to or greater than the threshold value, the control unit 18 controls the third valve 95a and the fourth valve 95b to switch the outflow destination of the processing liquid to the filter 96 (time T14). At the same time, the control unit 18 controls the first valve 98a and the second valve 98b to switch the outflow destination of the processing liquid to the supply line 110. In addition, the control unit 18 controls the eighth valve 132 to stop the supply of the processing liquid to the tank 80. As a result, the processing liquid sent from the tank 80 flows into the first branch line 92a and the second branch line 92b and returns to the tank 80. In addition, when the fifth valve 107a or the sixth valve 107b is open, the processing liquid is supplied from the supply line 110 to the processing unit 16.

[0111] In this manner, the control unit 18 sends the cleaning liquid at a predetermined temperature or higher to the filter 96. Specifically, when the control unit 18 determines that the temperature of the cleaning liquid circulating through the branch circulation line 105 has stabilized based on the detection results of the first circulation temperature sensor 97a and the second circulation temperature sensor 97b, the control unit 18 controls the pump 100 to send the cleaning liquid to the filter 96 (time T10).

[0112] By supplying a cleaning liquid having a predetermined temperature or higher to the filter 96, particles adhering to the replaced filter 96, for example particles adhering during the replacement process, can be removed.

[0113] In addition, the control unit 18 controls the first valve 98a and the second valve 98b to drain the cleaning liquid that is at a predetermined temperature or higher and has been sent to the filter 96 for a predetermined time into the drain line 99 (time T10).

[0114] This allows the cleaning liquid to be drained when particles adhering to the first filter 96a and the second filter 96b pass through, thereby reducing contamination of the inside of the circulation line 90 by particles.

[0115] In addition, after the control unit 18 drains the cleaning liquid sent to the filter 96 by flowing it into the drain line 99, it controls the cleaning liquid supply unit 120 to stop the supply of cleaning liquid to the tank 80, and controls the new liquid supply unit 130 to start the supply of new processing liquid to the tank 80 (time T10 to time T12).

[0116] By supplying new processing liquid and flowing it through the circulation line 90 in this manner, new particles are less likely to adhere to the filter 96 that has been cleaned with the cleaning liquid.

[0117] In addition, the control unit 18 controls the seventh valve 122 to start supplying the cleaning liquid to the tank 80, and then controls the pump 100, the first heating mechanism 93a, and the second heating mechanism 93b to heat the cleaning liquid while circulating it through the first branch circulation line 105a and the second branch circulation line 105b (time T8 to time T10).

[0118] In this way, the control unit 18 heats the cleaning liquid while circulating it through the first branch circulation line 105a and the second branch circulation line 105b, so that the cleaning liquid can be heated efficiently in a short time compared to when the cleaning liquid is heated while circulating it throughout the entire circulation line 90.

[0119] Furthermore, the temperature of the cleaning liquid sent to the filter 96 may be higher than the temperature of the processing liquid sent to the filter 96. Specifically, the lower limit of the threshold range used to determine whether the temperature of the cleaning liquid has stabilized may be higher than the lower limit of the threshold range used to determine whether the temperature of the processing liquid has stabilized. By setting the threshold range in this manner, the temperature of the cleaning liquid sent to the filter 96 becomes higher than the temperature of the processing liquid sent to the filter 96.

[0120] 9, the treatment liquid supply source 70 according to the third embodiment may further include a moisture concentration meter 150 (a first moisture concentration meter 150a and a second moisture concentration meter 150b). The moisture concentration meter 150 is provided in the circulation line 90 and measures the moisture concentration of the liquid flowing through the circulation line 90.

[0121] Based on the measurement result of the moisture concentration meter 150, the control unit 18 can confirm the ratio of the cleaning liquid in the liquid flowing through the circulation line 90. This makes it possible to confirm the degree of replacement of the cleaning liquid in the liquid flowing through the circulation line 90 with the treatment liquid.

[0122] Note that, although an example in which two moisture concentration meters, the first moisture concentration meter 150a and the second moisture concentration meter 150b, are provided, this is not limiting, and it is also possible to provide only one of the two moisture concentration meters.

[0123] By sending high-temperature cleaning liquid to the filter 96 in this manner, the filter 96 thermally expands, and therefore particles captured by the filter 96 can easily pass through the filter 96. Since the particles that have passed through the filter 96 can be discharged together with the cleaning liquid into the drain line 99, contamination of the inside of the circulation line 90 by particles can be reduced.

[0124] As described above, the control unit 18 sends a cleaning liquid having a predetermined temperature or higher to the filter 96. This makes it possible to remove particles adhering to the replaced filter 96, for example, particles adhering during the replacement work.

[0125] Although an example has been described in which the filter 96 to be washed with the cleaning liquid is a new, replaced filter, the filter 96 to be washed is not limited to this. For example, the filter 96 may be a filter that has become contaminated through use. By washing a filter that has become contaminated through use with a cleaning liquid at a predetermined temperature or higher, particles that have adhered through use can be removed. Furthermore, compared to the case where an external device is used to wash the filter, the filter can be washed cheaply and easily.

[0126] Furthermore, by cleaning the filter using the branch circulation line 105, the filter can be cleaned in a shorter time than when the entire circulation line 90 is used to clean the filter, and the amount of cleaning liquid used can also be reduced.

[0127] (Fourth embodiment) In the above-described first embodiment, an example has been shown in which the destination of the treatment liquid is switched from the drain line 99 to the supply line 110 when the temperature of the treatment liquid flowing through the circulation line 90 is equal to or higher than a threshold value at time T7 in Fig. 4, but the present invention is not limited to this. For example, when the temperature of the treatment liquid flowing through the circulation line 90 is equal to or higher than a threshold value, the treatment liquid may be continuously drained until a predetermined time has elapsed.

[0128] By switching the outflow destination of the processing liquid from the drain line 99 to the supply line 110, the circulation flow rate of the processing liquid flowing through the circulation line 90 may increase. Specifically, when the processing liquid is circulated only through the branch circulation line 105 while being heated, the circulation flow rate is adjusted to be less than a predetermined circulation flow rate in order to stabilize the temperature of the processing liquid. When the outflow destination of the processing liquid is then switched from the drain line 99 to the supply line 110, the circulation flow rate of the processing liquid is adjusted to be greater than or equal to the predetermined circulation flow rate. In such a case, the circulation flow rate of the processing liquid flowing through the circulation line 90 increases. When the circulation flow rate of the processing liquid flowing through the circulation line 90 increases, particles captured in the filter 96 may pass through the filter 96, thereby causing contamination of the processing liquid in the circulation line 90.

[0129] Therefore, as described above, when the temperature of the processing liquid flowing through the circulation line 90 becomes equal to or higher than the threshold, the processing liquid continues to be discharged until a predetermined time has elapsed. Specifically, when the temperature of the processing liquid flowing through the circulation line 90 becomes equal to or higher than the threshold, the control unit 18 controls the first valve 98a and the second valve 98b to switch the outflow destination of the processing liquid to the drain line 99 and the supply line 110. As a result, the processing liquid sent from the tank 80 flows into the branch line 92 and is discharged at a constant rate from the drain line 99. Thereafter, the control unit 18 switches the outflow destination of the processing liquid from the drain line 99 and the supply line 110 to the supply line 110, for example, when a predetermined time has elapsed.

[0130] This allows the processing liquid to be drained when particles captured by the first filter 96a and the second filter 96b pass through due to a change in the circulation flow rate of the processing liquid, thereby reducing contamination of the processing liquid in the circulation line 90 by particles.

[0131] Fifth embodiment 15 is a diagram showing a schematic configuration of a processing liquid supply source 70 according to the fifth embodiment. The processing liquid supply source 70 according to the fifth embodiment differs from the processing liquid supply source 70 according to the first embodiment in that the processing liquid supply source 70 according to the fifth embodiment has a valve 160, a liquid delivery line 170, and a valve 171.

[0132] The valves 160 (the ninth valve 160a and the tenth valve 160b) are located downstream of the connection point of the branch line 92 with the supply line 110. The valves 160 switch the destination of the treatment liquid. Specifically, a third drainage line 161a connected to the drain section DR branches off from the ninth valve 160a. The third drainage line 161a drains the treatment liquid flowing to the first branch line 92a. The ninth valve 160a switches the destination of the treatment liquid in the first branch line 92a between the third drainage line 161a and the first branch line 92a. Similarly, a fourth drainage line 161b connected to the drain section DR branches off from the tenth valve 160b. The fourth drainage line 161b drains the treatment liquid flowing to the second branch line 92b. The tenth valve 160b switches the destination of the treatment liquid in the second branch line 92b between the fourth drainage line 161b and the second branch line 92b.

[0133] The liquid supply line 170 (first liquid supply line 170a, second liquid supply line 170b) returns the processing liquid supplied to the processing unit 16 to the tank 80. The liquid supply line 170 is provided with a valve 171 (eleventh valve 171a, twelfth valve 171b). The valve 171 switches the destination of the processing liquid. Specifically, a fifth drainage line 172a connected to the drain section DR branches off from the eleventh valve 171a. The fifth drainage line 172a drains the processing liquid flowing in the first liquid supply line 170a. The eleventh valve 171a switches the destination of the processing liquid in the first liquid supply line 170a between the fifth drainage line 172a and the first liquid supply line 170a. Similarly, a sixth drainage line 172b connected to the drain section DR branches off from the twelfth valve 171b. The sixth drainage line 172b drains the treatment liquid flowing into the second liquid supply line 170b. The twelfth valve 171b switches the destination of the treatment liquid in the second liquid supply line 170b between the sixth drainage line 172b and the second liquid supply line 170b.

[0134] In this way, the processing liquid supply source 70 according to the fifth embodiment has the valve 160 or the valve 171, and thus can drain the processing liquid that has been retained for a long time in the branch line 92 or the liquid feed line 170. Specifically, in a step of circulating the processing liquid again in the circulation line 90 after the circulation of the processing liquid has been stopped for maintenance or the like, the control unit 18 controls the valve 160 or the valve 171 to switch the outflow destination of the processing liquid for a certain period of time to the third drain line 161a to the sixth drain line 172b. This allows the processing liquid that has been retained for a long time to be drained without being returned to the tank 80, so that the tank 80 or the circulation line 90 is less likely to be contaminated by the retained processing liquid.

[0135] Sixth embodiment 16 is a diagram showing a schematic configuration of a processing liquid supply source 70 according to a sixth embodiment. The processing liquid supply source 70 according to the sixth embodiment differs from the processing liquid supply source 70 according to the first embodiment in that the processing liquid supply source 70 according to the sixth embodiment has a valve 180 and a filtration tank 182, and that the processing liquid is sent to the filtration tank 182 by a valve 98.

[0136] The valve 180 is located downstream of the pump 100 in the main line 91. The valve 180 switches the outflow destination of the treatment liquid. Specifically, a filtration line 181 connected to a filtration tank 182 branches off from the valve 180a. The filtration line 181 sends the treatment liquid flowing in the main line 91 to the filtration tank 182. The valve 180a switches the outflow destination of the treatment liquid in the main line 91 between the filtration line 181 and the main line 91.

[0137] The valves 98 (first valve 98a, second valve 98b) switch the destination of the treatment liquid. Specifically, a first drainage line 99a connected to a filtration tank 182 branches off from the first valve 98a. The first drainage line 99a sends the treatment liquid flowing in the first branch line 92a to the filtration tank 182. Similarly, a second drainage line 99b connected to the filtration tank 182 branches off from the second valve 98b. The second drainage line 99b sends the treatment liquid flowing in the first branch line 92a to the filtration tank 182.

[0138] The filtration tank 182 removes contaminants and the like contained in the delivered treatment liquid using a filter material, etc. The treatment liquid from which the contaminants and the like have been removed by the filtration tank 182 flows into a supply line 183 and is delivered to the tank 80.

[0139] In this way, the processing liquid supply source 70 according to the sixth embodiment has the filtration tank 182, and thus can filter the processing liquid flowing through the drainage line 99 or the circulation line 90 and return it to the tank 80 and the circulation line 90 for reuse. This makes it possible to reduce the amount of processing liquid drained.

[0140] The present disclosure can have the following configurations. (1) a processing liquid line for supplying a processing liquid to a liquid processing section that performs liquid processing on a substrate; a heating mechanism provided in the treatment liquid line and configured to heat the treatment liquid flowing through the treatment liquid line; a filter provided on the processing liquid line downstream of the heating mechanism; a drainage line provided on the treatment liquid line downstream of the filter, for draining the treatment liquid flowing through the treatment liquid line; a first temperature sensor provided in the filter, the treatment liquid line located between the filter and the drain line, or the drain line, for detecting a temperature of the filter, the treatment liquid line, the drain line, or the treatment liquid; Control unit and Equipped with The control unit determines whether or not to drain the treatment liquid from the drain line based on a detection result of the first temperature sensor. (2) a tank for storing the treatment liquid, The processing liquid line includes: a circulation line that returns the treatment liquid sent from the tank to the tank; a pump for forming a circulating flow of the treatment liquid in the circulation line; a branch circulation line that branches off between the heating mechanism and the filter and returns the treatment liquid sent from the tank to the tank; Equipped with The liquid supplying device described in (1), wherein the control unit controls the pump and the heating mechanism before starting circulation of the treatment liquid in the circulation line to heat the treatment liquid while circulating it in the branch circulation line. (3) a second temperature sensor provided in the branch circulation line to detect a temperature of the treatment liquid flowing through the branch circulation line; The liquid supplying device described in (2), wherein the control unit controls the pump to send the treatment liquid to the filter when it determines, based on the detection result of the second temperature sensor, that the temperature of the treatment liquid circulating through the branch circulation line has stabilized. (4) a supply line branching from the circulation line on a downstream side of the drainage line to supply the treatment liquid to the liquid treatment section; a valve for switching a destination of the treatment liquid between the drain line and the supply line in the circulation line; Equipped with The liquid supplying device according to (3), wherein the control unit controls the valve to cause the treatment liquid sent to the filter to flow into the drain line and be discharged. (5) The liquid supplying device according to any one of (2) to (4), wherein the control unit, before starting circulation of the treatment liquid in the circulation line, heats the treatment liquid while circulating it in the branch circulation line, then sends the treatment liquid circulating in the branch circulation line to the filter, and repeatedly performs a process of draining the treatment liquid sent to the filter by flowing it into the drainage line. (6) The liquid supplying device described in (4), wherein the control unit controls the valve to switch the destination of the processing liquid from the drain line to the supply line when the temperature of the filter, the processing liquid line, the drain line or the processing liquid is equal to or higher than a threshold value based on the detection result of the first temperature sensor. (7) The liquid supplying device described in (4), wherein the control unit controls the valve to switch the destination of the processing liquid from the drain line to the supply line and the drain line when the temperature of the filter, the processing liquid line, the drain line or the processing liquid is equal to or higher than a threshold value based on the detection result of the first temperature sensor. (8) The control unit switches the outflow destination of the treatment liquid from the drain line to the supply line and the drain line, and then switches the outflow destination of the treatment liquid from the supply line and the drain line to the supply line. (9) The liquid supplying device according to (2), wherein the control unit circulates the treatment liquid in the branch circulation line while circulating the treatment liquid in the circulation line. (10) a processing liquid line for supplying a processing liquid to a liquid processing section that performs liquid processing on a substrate; a heating mechanism provided in the treatment liquid line and configured to heat the treatment liquid flowing through the treatment liquid line; a filter provided on the processing liquid line downstream of the heating mechanism; a drainage line provided on the treatment liquid line downstream of the filter, for draining the treatment liquid flowing through the treatment liquid line; A tank for storing the treatment liquid; a cleaning liquid supply unit for supplying a cleaning liquid for the filter to the tank; Control unit and Equipped with The processing liquid line includes: a circulation line that returns the treatment liquid sent from the tank to the tank; a pump for forming a circulating flow of the treatment liquid in the circulation line; a branch circulation line that branches off between the heating mechanism and the filter and returns the treatment liquid sent from the tank to the tank; Equipped with The control unit controls the cleaning liquid supply unit to start supplying the cleaning liquid to the tank, and then controls the pump and the heating mechanism to heat the cleaning liquid while circulating it through the branch circulation line. (11) a second temperature sensor provided in the branch circulation line to detect a temperature of the cleaning liquid flowing through the branch circulation line; The liquid supplying device described in (10), wherein the control unit controls the pump to send the cleaning liquid to the filter when it determines, based on the detection result of the second temperature sensor, that the temperature of the cleaning liquid circulating through the branch circulation line has stabilized. (12) a supply line branching from the circulation line on a downstream side of the drainage line to supply the treatment liquid to the liquid treatment section; a valve for switching a destination of the treatment liquid between the drain line and the supply line in the circulation line; Equipped with The control unit controls the valve to drain the cleaning liquid that has been delivered to the filter and is at or above a predetermined temperature for a predetermined period of time into the drain line. (13) a new liquid supply unit for supplying new processing liquid to the tank; Equipped with The control unit, after draining the cleaning liquid sent to the filter into the drain line, controls the cleaning liquid supply unit to stop the supply of the cleaning liquid to the tank, and controls the new liquid supply unit to start supplying new processing liquid to the tank. (14) The liquid supplying device according to (11), wherein a temperature of the cleaning liquid sent to the filter is higher than a temperature of the treatment liquid sent to the filter. (15) In the liquid supplying device according to (1), detecting a temperature of the filter, the processing liquid line, the drain line, or the processing liquid using the first temperature sensor; determining whether or not to drain the treatment liquid from the drain line based on a detection result of the first temperature sensor; A liquid supply method comprising: (16) In the liquid supplying device according to (1), detecting a temperature of the filter, the processing liquid line, the drain line, or the processing liquid using the first temperature sensor; supplying the processing liquid flowing through the processing liquid line to the liquid processing unit when the temperature of the filter, the processing liquid line, the drain line, or the processing liquid is equal to or higher than a threshold value based on a detection result of the first temperature sensor; A liquid supply method comprising: (17) A computer-readable storage medium storing a program that operates on a computer and controls a liquid supplying device, The program, when executed, causes a computer to control the liquid supplying device so as to perform the liquid supplying method according to (15) or (16).

[0141] The embodiments disclosed herein should be considered to be illustrative and not restrictive in all respects. Indeed, the above-described embodiments may be embodied in various forms. In addition, the above-described embodiments may be omitted, substituted, or modified in various forms without departing from the scope and spirit of the appended claims. [Explanation of symbols]

[0142] W wafer 1. Substrate Processing System 16 Processing unit (an example of a liquid processing unit) 18 Control Unit 30 Substrate processing section 70 Processing liquid supply source (an example of a liquid supply device) 80 Tank 90 Circulation Line 100 Pump 92a First Branch Line 92b 2nd branch line 93 Heating mechanism 96 Filters 97a 1st circulation temperature sensor 97b Second circulation temperature sensor 99 Drainage Line 110 Supply Line 120 Cleaning liquid supply unit 130 New liquid supply section

Claims

1. a processing liquid line for supplying a processing liquid to a liquid processing section that performs liquid processing on a substrate; a heating mechanism provided in the treatment liquid line and configured to heat the treatment liquid flowing through the treatment liquid line; a filter provided on the processing liquid line downstream of the heating mechanism; a drainage line provided on the treatment liquid line downstream of the filter, for draining the treatment liquid flowing through the treatment liquid line; a first temperature sensor provided in the filter, the treatment liquid line located between the filter and the drain line, or the drain line, for detecting a temperature of the filter, the treatment liquid line, the drain line, or the treatment liquid; Control unit and Equipped with The control unit determines whether or not to drain the treatment liquid from the drain line based on a detection result of the first temperature sensor.

2. a tank for storing the treatment liquid, The processing liquid line includes: a circulation line that returns the treatment liquid sent from the tank to the tank; a pump for forming a circulating flow of the treatment liquid in the circulation line; a branch circulation line that branches off between the heating mechanism and the filter and returns the treatment liquid sent from the tank to the tank; Equipped with The liquid supplying apparatus according to claim 1 , wherein the control unit controls the pump and the heating mechanism to heat the treatment liquid while circulating it in the branch circulation line before starting circulation of the treatment liquid in the circulation line.

3. a second temperature sensor provided in the branch circulation line to detect a temperature of the treatment liquid flowing through the branch circulation line; The liquid supplying device according to claim 2, wherein the control unit controls the pump to send the treatment liquid to the filter when the control unit determines, based on the detection result of the second temperature sensor, that the temperature of the treatment liquid circulating through the branch circulation line has stabilized.

4. a supply line branching from the circulation line on a downstream side of the drainage line to supply the treatment liquid to the liquid treatment section; a valve for switching a destination of the treatment liquid between the drain line and the supply line in the circulation line; Equipped with The liquid supplying device according to claim 3 , wherein the control unit controls the valve to cause the treatment liquid sent to the filter to flow into the drain line and be drained.

5. 5. The liquid supplying device according to claim 4, wherein the control unit, before starting circulation of the treatment liquid in the circulation line, heats the treatment liquid while circulating it in the branch circulation line, then sends the treatment liquid circulating in the branch circulation line to the filter, and repeatedly performs a process of draining the treatment liquid sent to the filter by flowing it into the drainage line.

6. The liquid supplying device of claim 4, wherein the control unit controls the valve to switch the destination of the processing liquid from the drain line to the supply line when the temperature of the filter, the processing liquid line, the drain line or the processing liquid is above a threshold value based on the detection result of the first temperature sensor.

7. The liquid supply device of claim 4, wherein the control unit controls the valve to switch the destination of the processing liquid from the drain line to the supply line and the drain line when the temperature of the filter, the processing liquid line, the drain line or the processing liquid is above a threshold value based on the detection result of the first temperature sensor.

8. The liquid supplying device according to claim 7 , wherein the control unit switches the outflow destination of the treatment liquid from the drain line to the supply line and the drain line, and then switches the outflow destination of the treatment liquid from the supply line and the drain line to the supply line.

9. The liquid supplying device according to claim 2 , wherein the control unit circulates the treatment liquid in the branch circulation line while circulating the treatment liquid in the circulation line.

10. a processing liquid line for supplying a processing liquid to a liquid processing section that performs liquid processing on a substrate; a heating mechanism provided in the treatment liquid line and configured to heat the treatment liquid flowing through the treatment liquid line; a filter provided on the processing liquid line downstream of the heating mechanism; a drainage line provided on the treatment liquid line downstream of the filter, for draining the treatment liquid flowing through the treatment liquid line; A tank for storing the treatment liquid; a cleaning liquid supply unit for supplying a cleaning liquid for the filter to the tank; Control unit and Equipped with The processing liquid line includes: a circulation line that returns the treatment liquid sent from the tank to the tank; a pump for forming a circulating flow of the treatment liquid in the circulation line; a branch circulation line that branches off between the heating mechanism and the filter and returns the treatment liquid sent from the tank to the tank; Equipped with The control unit controls the cleaning liquid supply unit to start supplying the cleaning liquid to the tank, and then controls the pump and the heating mechanism to heat the cleaning liquid while circulating it through the branch circulation line.

11. a second temperature sensor provided in the branch circulation line to detect a temperature of the cleaning liquid flowing through the branch circulation line; The liquid supplying device according to claim 10, wherein the control unit, when determining based on a detection result of the second temperature sensor that a temperature of the cleaning liquid circulating through the branch circulation line has stabilized, controls the pump to send the cleaning liquid to the filter.

12. a supply line branching from the circulation line on a downstream side of the drainage line to supply the treatment liquid to the liquid treatment section; a valve for switching a destination of the treatment liquid between the drain line and the supply line in the circulation line; Equipped with 12. The liquid supplying device according to claim 11, wherein the control unit controls the valve to cause the cleaning liquid, which is at a predetermined temperature or higher and has been delivered to the filter for a predetermined time, to flow into the drain line and be drained.

13. a new liquid supply unit for supplying new processing liquid to the tank; Equipped with 13. The liquid supplying device according to claim 12, wherein the control unit, after draining the cleaning liquid sent to the filter into the drain line, controls the cleaning liquid supplying unit to stop the supply of the cleaning liquid to the tank and controls the new liquid supplying unit to start supplying new processing liquid to the tank.

14. The liquid supplying device according to claim 11 , wherein a temperature of the cleaning liquid sent to the filter is higher than a temperature of the treatment liquid sent to the filter.

15. 2. The liquid supply device according to claim 1, sensing a temperature of the filter, the treatment liquid line, the drain line, or the treatment liquid using the first temperature sensor; determining whether or not to drain the treatment liquid from the drain line based on a detection result of the first temperature sensor; A liquid supply method comprising:

16. 2. The liquid supply device according to claim 1, sensing a temperature of the filter, the treatment liquid line, the drain line, or the treatment liquid using the first temperature sensor; supplying the processing liquid flowing through the processing liquid line to the liquid processing unit when the temperature of the filter, the processing liquid line, the drain line, or the processing liquid is equal to or higher than a threshold value based on a detection result of the first temperature sensor; A liquid supply method comprising:

17. A computer-readable storage medium storing a program that operates on a computer and controls a liquid supplying device, A storage medium, the program being configured to cause a computer to control the liquid supplying device so as to perform the liquid supplying method according to claim 15 or 16, when the program is executed.

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