Additive-containing silicon-containing resist underlayer film forming composition

Abstract

To provide a silicon-containing resist underlayer film forming composition which can be peeled off by a wet etching method using a chemical solution such as dilute hydrofluoric acid, buffered hydrofluoric acid, or an alkaline chemical solution in a processing process of a semiconductor substrate or the like, and particularly exhibits excellent solubility in an alkaline chemical solution.SOLUTION: A silicon-containing resist underlayer film forming composition comprises a hydrolysis condensate of a mixture containing a hydrolyzable silane having a succinic anhydride skeleton or a hydrolyzable silane having a monovalent group represented by Formula (2-1), the composition being soluble in an alkaline chemical solution.SELECTED DRAWING: None

Description

[Technical Field]

[0001] The present invention relates to a composition for forming a resist underlayer film, and provides a composition for forming a silicon-containing resist underlayer film that can form a pattern with low roughness in fine patterning, can be easily stripped with a stripping solution that does not damage semiconductor substrates or coated organic underlayer films or carbon-based CVD films required in patterning processes, is soluble in particular in alkaline chemical solutions (basic chemical solutions), and can form a silicon-containing film that maintains its strippability even after dry etching. [Background technology]

[0002] Conventionally, microfabrication by lithography using photoresist has been performed in the manufacture of semiconductor devices. This microfabrication is a processing method in which a thin film of photoresist is formed on a semiconductor substrate such as a silicon wafer, and the thin film is irradiated with active light such as ultraviolet light through a mask pattern on which a semiconductor device pattern is drawn, developed, and the substrate is then etched using the resulting photoresist pattern as a protective film, thereby forming fine irregularities corresponding to the pattern on the substrate surface. In recent years, as semiconductor devices have become more highly integrated, the wavelength of the actinic rays used has tended to become shorter, from KrF excimer lasers (248 nm) to ArF excimer lasers (193 nm). As the wavelength of actinic rays has become shorter, the impact of their reflection from semiconductor substrates has become a major problem. As a result, a method of providing a resist underlayer film called a Bottom Anti-Reflective Coating (BARC) between the photoresist and the substrate to be processed has become widely used.

[0003] A film known as a hard mask containing a metal element such as silicon or titanium is used as an underlayer film between the semiconductor substrate and the photoresist. In this case, since the resist and the hard mask have significant differences in their constituent components, the rate at which they are removed by dry etching depends greatly on the gas species used in the dry etching. By appropriately selecting the gas species, the hard mask can be removed by dry etching without significantly reducing the thickness of the photoresist. Thus, in recent semiconductor device manufacturing, a resist underlayer film has been placed between the semiconductor substrate and the photoresist to achieve various effects, including anti-reflection. Although compositions for resist underlayer films have been studied to date, the development of new materials for resist underlayer films is desired due to the diversity of required properties, etc. For example, a coating-type BPSG (boron phosphate glass) film-forming composition containing a specific silicic acid skeleton structure, which aims to form a film that can be wet-etched, has been disclosed (Patent Document 1), and a silicon-containing resist underlayer film-forming composition containing a carbonyl structure, which aims to remove mask residues with a chemical solution after lithography, has been disclosed (Patent Document 2). [Prior art documents] [Patent documents]

[0004] [Patent Document 1] Japanese Patent Application Laid-Open No. 2016-74774 [Patent Document 2] International Publication No. 2018 / 181989 Summary of the Invention [Problem to be solved by the invention]

[0005] In cutting-edge semiconductor devices, multilayer processes are widely used due to the miniaturization of implant layers. In multilayer processes, transfer to the lower layer is usually performed by the above-mentioned dry etching, and the final processing of the substrate and removal of mask residues after substrate processing, such as underlayer films including resist films and resist underlayer films, are sometimes also performed by dry etching or ashing. However, dry etching and ashing processes can cause considerable damage to the substrate, and improvements in these processes are needed.

[0006] The present invention has been made in view of the above circumstances, and has an object to provide a silicon-containing composition for forming a resist underlayer film that can be stripped not only by conventional dry etching methods but also by wet etching methods using chemical solutions such as dilute hydrofluoric acid, buffered hydrofluoric acid, and alkaline chemical solutions (basic chemical solutions) in processing steps for semiconductor substrates and the like, and that exhibits particularly excellent solubility in alkaline chemical solutions (basic chemical solutions); and to provide a silicon-containing composition for forming a resist underlayer film that has excellent storage stability and leaves little residue in a dry etching step. [Means for solving the problem]

[0007] As a result of intensive research conducted by the present inventors to solve the above problems, it has been found that a film obtained from a composition containing a specific hydrolysis condensate (polysiloxane) obtained from a hydrolyzable silane having a succinic anhydride skeleton or a hydrolyzable silane having a group derived from phosphonic acid exhibits excellent solubility in an alkaline solution (basic chemical solution), and that a cationic AX + and anion AZ - The present inventors have found that a film obtained from a composition containing a hydrolysis condensate (polysiloxane) obtained from a hydrolyzable silane, which contains a specific additive (compound A) having a chemical structure comprising the following, exhibits excellent solubility in an alkaline solution (basic chemical solution), and have completed the present invention.

[0008] That is, the present invention includes the following aspects. [1] A composition for forming a silicon-containing resist underlayer film, comprising a hydrolysis condensate of a hydrolyzable silane mixture containing at least one of a hydrolyzable silane represented by the following formula (1) and a hydrolyzable silane represented by the following formula (2), the composition being for forming a silicon-containing resist underlayer film that is soluble in a basic chemical solution: [ka] (In formula (1), R 1 represents an organic group that is bonded to a silicon atom and contains a succinic anhydride skeleton, R 2 are groups bonded to silicon atoms, and each independently represent an optionally substituted alkyl group, an optionally substituted halogenated alkyl group, or an optionally substituted alkoxyalkyl group, or an organic group containing an epoxy group, an acryloyl group, a methacryloyl group, a mercapto group, an amino group, an amido group, an alkoxy group, a sulfonyl group, or a cyano group, or a combination thereof; R 3 are groups or atoms bonded to a silicon atom, and each independently represent an alkoxy group, an aralkyloxy group, an acyloxy group, or a halogen atom; a represents 1, b represents an integer of 0 to 2, and 4-(a+b) represents an integer of 1 to 3. [ka] (In formula (2), R 4 represents a monovalent group bonded to a silicon atom and represented by the following formula (2-1): [ka] (In formula (2-1), R 201 ~R 202 each independently represents an organic group containing a hydrogen atom or an optionally substituted alkyl group, and R 203 represents an alkylene group which may be substituted, and * represents a bond bonded to the silicon atom. R 5 are groups bonded to silicon atoms, and each independently represent an optionally substituted alkyl group, an optionally substituted halogenated alkyl group, or an optionally substituted alkoxyalkyl group, or an organic group containing an epoxy group, an acryloyl group, a methacryloyl group, a mercapto group, an amino group, an amido group, an alkoxy group, a sulfonyl group, or a cyano group, or a combination thereof; R 6 are groups or atoms bonded to a silicon atom, and each independently represent an alkoxy group, an aralkyloxy group, an acyloxy group, or a halogen atom; a represents 1, b represents an integer of 0 to 2, and 4-(a+b) represents an integer of 1 to 3. [2] The composition for forming a silicon-containing resist underlayer film is a cation AX + and anion AZ - The composition for forming a silicon-containing resist underlayer film according to [1], further comprising a compound A having a chemical structure comprising the following anion, wherein the molecular weight of the anion is 65 or more. [3] The anion AZ - is at least one anion selected from the group consisting of anions represented by the following (A) to (E): [ka] [ka] [ka] [ka] [ka] [ka] (In formulas (A) to (E), R 301represents an optionally substituted alkyl group, an optionally substituted aryl group, an optionally substituted halogenated alkyl group, an optionally substituted aralkyl group, or an organic group containing an ester bond (—C(═O)—O— or —O—C(═O)—), or a combination thereof; Z represents an aromatic ring, a cyclic alkane, or a non-aromatic ring cyclic alkene; R 501 represents an alkyl group which may be partially or completely substituted with fluorine atoms, R 302 and R 303 are each independently an alkyl group, R 304 and R 305 are each independently an alkyl group. [4] The composition for forming a silicon-containing resist underlayer film according to any one of [1] to [3], wherein the hydrolyzable silane mixture further contains a hydrolyzable silane represented by the following formula (3): [ka] (In formula (3), R 7 represents an organic group that is bonded to a silicon atom and contains an alkenyl group; R 8 are groups bonded to silicon atoms, and each independently represent an optionally substituted alkyl group, an optionally substituted halogenated alkyl group, or an optionally substituted alkoxyalkyl group, or an organic group containing an epoxy group, an acryloyl group, a methacryloyl group, a mercapto group, an amino group, an amido group, an alkoxy group, a sulfonyl group, or a cyano group, or a combination thereof; R 9 are groups or atoms bonded to a silicon atom, and each independently represent an alkoxy group, an aralkyloxy group, an acyloxy group, or a halogen atom; a represents 1, b represents an integer of 0 to 2, and 4-(a+b) represents an integer of 1 to 3. [5] The composition for forming a silicon-containing resist underlayer film according to [4], wherein the hydrolyzable silane mixture further contains a hydrolyzable silane represented by the following formula (4): [ka] (In formula (4), R 10 are groups or atoms bonded to a silicon atom, and each independently represent an alkoxy group, an aralkyloxy group, an acyloxy group, or a halogen atom. [6] A composition for forming a silicon-containing resist underlayer film, which is soluble in a basic chemical solution and is used to form a silicon-containing resist underlayer film, The composition for forming a silicon-containing resist underlayer film contains cation AX + and anion AZ - and a compound A having a chemical structure comprising the anion having a molecular weight of 65 or more. [7] The anion AZ - is at least one anion selected from the group consisting of anions represented by the following (A) to (E): [ka] [ka] [ka] [ka] [ka] [ka] (In formulas (A) to (E), R 301represents an optionally substituted alkyl group, an optionally substituted aryl group, an optionally substituted halogenated alkyl group, an optionally substituted aralkyl group, or an organic group containing an ester bond (—C(═O)—O— or —O—C(═O)—), or a combination thereof; Z represents an aromatic ring, a cyclic alkane, or a non-aromatic ring cyclic alkene; R 501 represents an alkyl group which may be partially or completely substituted with fluorine atoms, R 302 and R 303 are each independently an alkyl group, R 304 and R 305 are each independently an alkyl group. [8] A silicon-containing resist underlayer film formed using the composition for forming a resist underlayer film according to any one of [1] to [7]. [9] forming an organic underlayer film on a semiconductor substrate; a step of applying the composition for forming a resist underlayer film according to any one of [1] to [7] onto the organic underlayer film, and baking the composition to form a silicon-containing resist underlayer film; applying a resist film-forming composition onto the silicon-containing resist underlayer film to form a resist film; a step of exposing and developing the resist film to obtain a resist pattern; a step of etching the silicon-containing resist underlayer film using the resist pattern as a mask; etching the organic underlayer film using the patterned silicon-containing resist underlayer film as a mask; Pattern formation method.

[10] The method further comprises, after the step of etching the organic underlayer film, a step of removing the silicon-containing resist underlayer film by a wet method using a chemical solution. The pattern forming method according to [9].

[11] The pattern forming method according to

[10] , wherein the chemical solution is a basic chemical solution. [Effects of the Invention]

[0009] In the present invention, by using a hydrolysis condensate obtained by using a silane compound of a specific structure containing a succinic anhydride skeleton or a group derived from phosphonic acid as a hydrolyzable silane as one component of a composition for forming a resist underlayer film, even if the film formed from the composition is a silicon-based film, it exhibits excellent solubility in a basic chemical solution and can improve removability by a wet method. In addition, in the present invention, the cation AX + and anion AZ - By using a specific additive (compound A) having a chemical structure comprising the following as one component of a composition for forming a resist underlayer film, which contains a hydrolysis condensate obtained using a silane compound, a film formed from the composition, even if it is a silicon-based film, exhibits excellent solubility in a basic chemical solution, and can improve removability by a wet method. Therefore, when the composition for forming a resist underlayer film of the present invention is used to form a pattern using a photoresist film or the like or to process a semiconductor substrate or the like, mask residues after processing can be easily removed with a chemical solution when removing an underlayer film including a resist film or a resist underlayer film, making it possible to manufacture a semiconductor device with less damage to the substrate. Furthermore, according to the present invention, when a film formed from a composition containing the hydrolysis-condensation product is dry-etched, the removability of residues by etching can be improved. DETAILED DESCRIPTION OF THE INVENTION

[0010] The present invention will be described in detail below. Note that the following explanation of the constituent elements is an example for explaining the present invention, and the present invention is not limited to these contents.

[0011] [Silicon-containing composition for forming resist underlayer film] The present invention is directed to a composition for forming a silicon-containing resist underlayer film that is strippable by a wet process and that exhibits excellent solubility, particularly in basic chemical solutions. The composition for forming a resist underlayer film of the present invention contains a hydrolysis condensate of a hydrolyzable silane mixture. The composition for forming a resist underlayer film of the present invention is characterized in that it contains a product (hydrolysis condensate) obtained by hydrolysis condensation of a hydrolyzable silane mixture containing a hydrolyzable silane of a specific structure. This will be described in detail below in the section entitled "First embodiment of composition for forming a silicon-containing resist underlayer film." The composition for forming a resist underlayer film of the present invention is a mixture of a hydrolysis condensate of a hydrolyzable silane mixture and a cation AX + and anion AZ - One of the features of the composition is that it contains a specific additive (compound A) having a chemical structure containing the following: This will be described in detail below in the section entitled "Second embodiment of composition for forming silicon-containing resist underlayer film." The composition for forming a resist underlayer film of the present invention may contain a solvent and other components described below in addition to the hydrolysis condensate of the hydrolyzable silane mixture and the specific additive (compound A).

[0012] In the present invention, the hydrolysis condensate includes not only polyorganosiloxane polymers that are condensates in which condensation has been completely completed, but also polyorganosiloxane polymers that are partial hydrolysis condensates in which condensation has not been completely completed.Similar to the condensates in which condensation has been completely completed, such partial hydrolysis condensates are polymers obtained by hydrolysis and condensation of hydrolyzable silane compounds, but the hydrolysis has only partially stopped and the condensation has not been completed, and therefore Si-OH groups remain.Furthermore, in addition to the hydrolysis condensates, the composition for forming a resist underlayer film of the present invention may also contain uncondensed hydrolyzates (complete hydrolyzates, partial hydrolyzates) and monomers (hydrolyzable silane compounds) remaining. In this specification, the "hydrolyzable silane" may also be simply referred to as the "silane compound."

[0013] (First embodiment of composition for forming silicon-containing resist underlayer film) The composition for forming a resist underlayer film of the present invention contains a hydrolysis condensate of a hydrolyzable silane mixture containing a hydrolyzable silane of a specific structure.

[0014] <Hydrolyzed condensation product of hydrolyzable silane mixture> The hydrolyzable silane mixture contains a hydrolyzable silane represented by the following formula (1) or a hydrolyzable silane represented by the following formula (2), and may optionally contain a hydrolyzable silane represented by the following formula (3), a tetraalkoxysilane hydrolyzable silane represented by the following formula (4), a hydrolyzable silane represented by the following formula (5), or other hydrolyzable silanes.

[0015] <<Silane compound (hydrolyzable silane) represented by formula (1)>> The hydrolysis condensate used in the composition for forming a resist underlayer film of the present invention can be a product of hydrolysis condensation of a hydrolyzable silane mixture containing a silane compound represented by the following formula (1).

[0016] [ka]

[0017] R 1 represents an organic group that is bonded to a silicon atom and contains a succinic anhydride skeleton.

[0018] Above R 1 The organic group is not particularly limited as long as it is an organic group containing the above skeleton.

[0019] For example, organic groups containing a succinic anhydride skeleton include not only the skeleton itself but also organic groups in which one or more hydrogen atoms in an alkyl group are substituted with a succinic anhydride skeleton.

[0020] The alkyl group whose hydrogen atom is substituted by the succinic anhydride skeleton or the like is not particularly limited and may be linear, branched, or cyclic, and the number of carbon atoms therein is usually 40 or less, for example, 30 or less, more preferably 20 or less, or 10 or less. Specific examples of the linear or branched alkyl group include a methyl group, an ethyl group, an n-propyl group, an i-propyl group, an n-butyl group, an i-butyl group, an s-butyl group, a t-butyl group, an n-pentyl group, a 1-methyl-n-butyl group, a 2-methyl-n-butyl group, a 3-methyl-n-butyl group, a 1,1-dimethyl-n-propyl group, a 1,2-dimethyl-n-propyl group, a 2,2-dimethyl-n-propyl group, a 1-ethyl-n-propyl group, an n-hexyl group, a 1-methyl-n-pentyl group, a 2-methyl-n-pentyl group, a 3-methyl-n-pentyl group, an 1-ethyl-n-propyl group, an n-hexyl group, a 1-methyl-n-pentyl group, a 2-methyl-n-pentyl group, a 3-methyl-n-pentyl group, an 1-methyl-n-pentyl group, a 2-methyl-n-pentyl group, a 3-methyl-n-pentyl group, a ... Examples of alkyl groups include, but are not limited to, methyl, 4-methyl-n-pentyl, 1,1-dimethyl-n-butyl, 1,2-dimethyl-n-butyl, 1,3-dimethyl-n-butyl, 2,2-dimethyl-n-butyl, 2,3-dimethyl-n-butyl, 3,3-dimethyl-n-butyl, 1-ethyl-n-butyl, 2-ethyl-n-butyl, 1,1,2-trimethyl-n-propyl, 1,2,2-trimethyl-n-propyl, 1-ethyl-1-methyl-n-propyl, and 1-ethyl-2-methyl-n-propyl groups. Specific examples of the cyclic alkyl group include a cyclopropyl group, a cyclobutyl group, a 1-methylcyclopropyl group, a 2-methylcyclopropyl group, a cyclopentyl group, a 1-methylcyclobutyl group, a 2-methylcyclobutyl group, a 3-methylcyclobutyl group, a 1,2-dimethylcyclopropyl group, a 2,3-dimethylcyclopropyl group, a 1-ethylcyclopropyl group, a 2-ethylcyclopropyl group, a cyclohexyl group, a 1-methylcyclopentyl group, a 2-methylcyclopentyl group, a 3-methylcyclopentyl group, a 1-ethylcyclobutyl group, a 2-ethylcyclobutyl group, a 3-ethylcyclobutyl group, a 1,2-dimethylcyclobutyl group, a 1,3-dimethylcyclobutyl group, a 2,2-dimethylcyclobutyl group, a 2,3-dimethylcyclobutyl group, a 2,4-dimethylcyclobutyl group, a 2,5-dimethylcyclobutyl group, a 2,6-dimethylcyclobutyl group, a 2,7-dimethylcyclobutyl group, a 2,8-dimethylcyclobutyl group, a 2,9-dimethylcyclobutyl group, a 2,10-dimethylcyclobutyl group, a 2,11-dimethylcyclobutyl group, a 2,12-dimethylcyclobutyl group, a 2,13-dimethylcyclobutyl group, a 2,14-dimethylcyclobutyl group, a 2,15-dimethylcyclobutyl group, a 2,16-dimethylcyclobutyl group, a 2,17-dimethylcyclobutyl group, a 2,18-dimethylcyclobutyl group, a 2,19-dimethylcyclobutyl group, a 2,20-dimethylcyclobutyl group, a 2,21-dimethylcyclobutyl group, a 2,222-dimethylcyclobutyl group, a 2,23-dimethylcyclobutyl group, a 2,41-dimethylcyclobutyl group, a 2,23-dimethylcyclobutyl group, a 2,24-dimethylcyclobutyl group, a 2,25-dimethylcyclobutyl group, a 2,31 Examples of cycloalkyl groups include methylcyclobutyl, 3,3-dimethylcyclobutyl, 1-n-propylcyclopropyl, 2-n-propylcyclopropyl, 1-i-propylcyclopropyl, 2-i-propylcyclopropyl, 1,2,2-trimethylcyclopropyl, 1,2,3-trimethylcyclopropyl, 2,2,3-trimethylcyclopropyl, 1-ethyl-2-methylcyclopropyl, 2-ethyl-1-methylcyclopropyl, 2-ethyl-2-methylcyclopropyl, and 2-ethyl-3-methylcyclopropyl groups; and bicycloalkyl groups such as bicyclobutyl, bicyclopentyl, bicyclohexyl, bicycloheptyl, bicyclooctyl, bicyclononyl, and bicyclodecyl groups, but are not limited to these.

[0021] Above R 1 Examples of the organic group include monovalent groups represented by the following formula (1-1).

[0022] [ka]

[0023] R 401represents, for example, an alkylene group, which is a divalent group derived by removing one hydrogen atom from the above-mentioned linear, branched, or cyclic alkyl group. * represents a bond bonded to a silicon atom.

[0024] In formula (1), R 2 are groups bonded to silicon atoms, and independently represent an optionally substituted alkyl group, an optionally substituted halogenated alkyl group, or an optionally substituted alkoxyalkyl group, or an organic group containing an epoxy group, an acryloyl group, a methacryloyl group, a mercapto group, an amino group, an amido group, an alkoxy group, a sulfonyl group, or a cyano group, or a combination thereof.

[0025] R in Equation (1) 2 Examples of the alkyl group in the formula (I) include linear or branched alkyl groups having 1 to 10 carbon atoms, such as a methyl group, an ethyl group, an n-propyl group, an i-propyl group, an n-butyl group, an i-butyl group, an s-butyl group, a t-butyl group, an n-pentyl group, a 1-methyl-n-butyl group, a 2-methyl-n-butyl group, a 3-methyl-n-butyl group, a 1,1-dimethyl-n-propyl group, a 1,2-dimethyl-n-propyl group, a 2,2-dimethyl-n-propyl group, a 1-ethyl-n-propyl group, an n-hexyl group, a 1-methyl-n-pentyl group, a 2-methyl- Examples include an n-pentyl group, a 3-methyl-n-pentyl group, a 4-methyl-n-pentyl group, a 1,1-dimethyl-n-butyl group, a 1,2-dimethyl-n-butyl group, a 1,3-dimethyl-n-butyl group, a 2,2-dimethyl-n-butyl group, a 2,3-dimethyl-n-butyl group, a 3,3-dimethyl-n-butyl group, a 1-ethyl-n-butyl group, a 2-ethyl-n-butyl group, a 1,1,2-trimethyl-n-propyl group, a 1,2,2-trimethyl-n-propyl group, a 1-ethyl-1-methyl-n-propyl group, and a 1-ethyl-2-methyl-n-propyl group. Cyclic alkyl groups can also be used. Examples of cyclic alkyl groups having 3 to 10 carbon atoms include cyclopropyl, cyclobutyl, 1-methylcyclopropyl, 2-methylcyclopropyl, cyclopentyl, 1-methylcyclobutyl, 2-methylcyclobutyl, 3-methylcyclobutyl, 1,2-dimethylcyclopropyl, 2,3-dimethylcyclopropyl, 1-ethylcyclopropyl, 2-ethylcyclopropyl, cyclohexyl, 1-methylcyclopentyl, 2-methylcyclopentyl, 3-methylcyclopentyl, 1-ethylcyclobutyl, 2-ethylcyclobutyl, 3-ethylcyclobutyl, 1,2-dimethylcyclobutyl Examples of such cyclopropyl groups include methyl, 1,3-dimethyl-cyclobutyl, 2,2-dimethyl-cyclobutyl, 2,3-dimethyl-cyclobutyl, 2,4-dimethyl-cyclobutyl, 3,3-dimethyl-cyclobutyl, 1-n-propyl-cyclopropyl, 2-n-propyl-cyclopropyl, 1-i-propyl-cyclopropyl, 2-i-propyl-cyclopropyl, 1,2,2-trimethyl-cyclopropyl, 1,2,3-trimethyl-cyclopropyl, 2,2,3-trimethyl-cyclopropyl, 1-ethyl-2-methyl-cyclopropyl, 2-ethyl-1-methyl-cyclopropyl, 2-ethyl-2-methyl-cyclopropyl, and 2-ethyl-3-methyl-cyclopropyl groups.

[0026] R in Equation (1) 2 The halogenated alkyl group in the formula (I) refers to an alkyl group substituted with a halogen atom. Examples of the halogen atom include a fluorine atom, a chlorine atom, a bromine atom, and an iodine atom. Specific examples of the alkyl group include the same as those mentioned above. The number of carbon atoms in the halogenated alkyl group is not particularly limited, but is preferably 40 or less, more preferably 30 or less, even more preferably 20 or less, and still more preferably 10 or less. Specific examples of halogenated alkyl groups include, but are not limited to, a monofluoromethyl group, a difluoromethyl group, a trifluoromethyl group, a bromodifluoromethyl group, a 2-chloroethyl group, a 2-bromoethyl group, a 1,1-difluoroethyl group, a 2,2,2-trifluoroethyl group, a 1,1,2,2-tetrafluoroethyl group, a 2-chloro-1,1,2-trifluoroethyl group, a pentafluoroethyl group, a 3-bromopropyl group, a 2,2,3,3-tetrafluoropropyl group, a 1,1,2,3,3,3-hexafluoropropyl group, a 1,1,1,3,3,3-hexafluoropropan-2-yl group, a 3-bromo-2-methylpropyl group, a 4-bromobutyl group, and a perfluoropentyl group.

[0027] R in Equation (1) 2 The alkoxyalkyl group in the formula (I) refers to an alkyl group substituted with an alkoxy group. Specific examples of the alkyl group include the same as those mentioned above. Specific examples of the alkoxy group include alkoxy groups having a straight-chain, branched, or cyclic alkyl moiety having 1 to 20 carbon atoms. Examples of the straight-chain or branched alkoxy group include a methoxy group, an ethoxy group, an n-propoxy group, an i-propoxy group, an n-butoxy group, an i-butoxy group, an s-butoxy group, a t-butoxy group, an n-pentyloxy group, a 1-methyl-n-butoxy group, a 2-methyl-n-butoxy group, a 3-methyl-n-butoxy group, a 1,1-dimethyl-n-propoxy group, a 1,2-dimethyl-n-propoxy group, a 2,2-dimethyl-n-propoxy group, a 1-ethyl-n-propoxy group, an n-hexyloxy group, a 1-methyl-n-pentyloxy group, a 2-methyl-n-pentyloxy group, a 3- Examples include a methyl-n-pentyloxy group, a 4-methyl-n-pentyloxy group, a 1,1-dimethyl-n-butoxy group, a 1,2-dimethyl-n-butoxy group, a 1,3-dimethyl-n-butoxy group, a 2,2-dimethyl-n-butoxy group, a 2,3-dimethyl-n-butoxy group, a 3,3-dimethyl-n-butoxy group, a 1-ethyl-n-butoxy group, a 2-ethyl-n-butoxy group, a 1,1,2-trimethyl-n-propoxy group, a 1,2,2-trimethyl-n-propoxy group, a 1-ethyl-1-methyl-n-propoxy group, and a 1-ethyl-2-methyl-n-propoxy group. Examples of cyclic alkoxy groups include cyclopropoxy, cyclobutoxy, 1-methylcyclopropoxy, 2-methylcyclopropoxy, cyclopentyloxy, 1-methylcyclobutoxy, 2-methylcyclobutoxy, 3-methylcyclobutoxy, 1,2-dimethylcyclopropoxy, 2,3-dimethylcyclopropoxy, 1-ethylcyclopropoxy, 2-ethylcyclopropoxy, cyclohexyloxy, 1-methylcyclopentyloxy, 2-methylcyclopentyloxy, 3-methylcyclopentyloxy, 1-ethylcyclobutoxy, 2-ethylcyclobutoxy, 3-ethylcyclobutoxy, 1,2-dimethylcyclobutoxy, 1,3-dimethylcyclo butoxy group, 2,2-dimethyl-cyclobutoxy group, 2,3-dimethyl-cyclobutoxy group, 2,4-dimethyl-cyclobutoxy group, 3,3-dimethyl-cyclobutoxy group, 1-n-propyl-cyclopropoxy group, 2-n-propyl-cyclopropoxy group, 1-i-propyl-cyclopropoxy group, 2-i-propyl-cyclopropoxy group, 1,2,2-trimethyl-cyclopropoxy group, 1,2,3-trimethyl-cyclopropoxy group, 2,2,3-trimethyl-cyclopropoxy group, 1-ethyl-2-methyl-cyclopropoxy group, 2-ethyl-1-methyl-cyclopropoxy group, 2-ethyl-2-methyl-cyclopropoxy group, and 2-ethyl-3-methyl-cyclopropoxy group. The number of carbon atoms in the alkoxyalkyl group is not particularly limited, but is preferably 40 or less, more preferably 30 or less, even more preferably 20 or less, and still more preferably 10 or less. Specific examples of the alkoxyalkyl group include lower alkyloxy-lower alkyl groups such as a methoxymethyl group, an ethoxymethyl group, a 1-ethoxyethyl group, a 2-ethoxyethyl group, and an ethoxymethyl group, but are not limited to these.

[0028] Examples of the substituent in the alkyl group, halogenated alkyl group, or alkoxyalkyl group include alkyl group, aryl group, aralkyl group, halogenated alkyl group, halogenated aryl group, halogenated aralkyl group, alkoxyalkyl group, aryloxy group, alkoxyaryl group, alkoxyaralkyl group, alkenyl group, alkoxy group, aralkyloxy group, etc. Among these, specific examples of the alkyl group, halogenated alkyl group, alkoxyalkyl group, and alkoxy group and their suitable numbers of carbon atoms are the same as those described above.

[0029] Examples of the aryl group exemplified as the substituent include, but are not limited to, a phenyl group, an o-methylphenyl group, a m-methylphenyl group, a p-methylphenyl group, an o-chlorophenyl group, a m-chlorophenyl group, a p-chlorophenyl group, an o-fluorophenyl group, a p-mercaptophenyl group, an o-methoxyphenyl group, a p-methoxyphenyl group, a p-aminophenyl group, a p-cyanophenyl group, an α-naphthyl group, a β-naphthyl group, an o-biphenylyl group, an m-biphenylyl group, a p-biphenylyl group, a 1-anthryl group, a 2-anthryl group, a 9-anthryl group, a 1-phenanthryl group, a 2-phenanthryl group, a 3-phenanthryl group, a 4-phenanthryl group, and a 9-phenanthryl group.

[0030] Examples of the aralkyl group exemplified as the above substituent include, but are not limited to, a phenylmethyl group (benzyl group), a 2-phenylethylene group, a 3-phenyl-n-propyl group, a 4-phenyl-n-butyl group, a 5-phenyl-n-pentyl group, a 6-phenyl-n-hexyl group, a 7-phenyl-n-heptyl group, an 8-phenyl-n-octyl group, a 9-phenyl-n-nonyl group, and a 10-phenyl-n-decyl group.

[0031] The halogenated aryl group mentioned as the substituent is an aryl group substituted with a halogen atom, and specific examples of such an aryl group include those mentioned above. Examples of the halogen atom include a fluorine atom, a chlorine atom, a bromine atom, and an iodine atom. The number of carbon atoms in the halogenated aryl group is not particularly limited, but is preferably 40 or less, more preferably 30 or less, and even more preferably 20 or less. Specific examples of the halogenated aryl group include a 2-fluorophenyl group, a 3-fluorophenyl group, a 4-fluorophenyl group, a 2,3-difluorophenyl group, a 2,4-difluorophenyl group, a 2,5-difluorophenyl group, a 2,6-difluorophenyl group, a 3,4-difluorophenyl group, a 3,5-difluorophenyl group, a 2,3,4-trifluorophenyl group, a 2,3,5-trifluorophenyl group, a 2,3,6-trifluorophenyl group, a 2,4,5-trifluorophenyl group, a 2,4,6-trifluorophenyl group, a 3,4,5-trifluorophenyl group, a 2,3,4,5-tetrafluorophenyl group, a 2,3,4,6-tetrafluorophenyl group, and a 2,3,5,6-tetrafluorophenyl group. Examples of fluorophenyl groups include, but are not limited to, a pentafluorophenyl group, a 2-fluoro-1-naphthyl group, a 3-fluoro-1-naphthyl group, a 4-fluoro-1-naphthyl group, a 6-fluoro-1-naphthyl group, a 7-fluoro-1-naphthyl group, an 8-fluoro-1-naphthyl group, a 4,5-difluoro-1-naphthyl group, a 5,7-difluoro-1-naphthyl group, a 5,8-difluoro-1-naphthyl group, a 5,6,7,8-tetrafluoro-1-naphthyl group, a heptafluoro-1-naphthyl group, a 1-fluoro-2-naphthyl group, a 5-fluoro-2-naphthyl group, a 6-fluoro-2-naphthyl group, a 7-fluoro-2-naphthyl group, a 5,7-difluoro-2-naphthyl group, and a heptafluoro-2-naphthyl group.

[0032] The halogenated aralkyl groups mentioned as the substituents are aralkyl groups substituted with a halogen atom, and specific examples of such aralkyl groups and halogen atoms are the same as those mentioned above. The number of carbon atoms in the halogenated aralkyl group is not particularly limited, but is preferably 40 or less, more preferably 30 or less, and even more preferably 20 or less. Specific examples of halogenated aralkyl groups include, but are not limited to, 2-fluorobenzyl group, 3-fluorobenzyl group, 4-fluorobenzyl group, 2,3-difluorobenzyl group, 2,4-difluorobenzyl group, 2,5-difluorobenzyl group, 2,6-difluorobenzyl group, 3,4-difluorobenzyl group, 3,5-difluorobenzyl group, 2,3,4-trifluorobenzyl group, 2,3,5-trifluorobenzyl group, 2,3,6-trifluorobenzyl group, 2,4,5-trifluorobenzyl group, 2,4,6-trifluorobenzyl group, 2,3,4,5-tetrafluorobenzyl group, 2,3,4,6-tetrafluorobenzyl group, 2,3,5,6-tetrafluorobenzyl group, and 2,3,4,5,6-pentafluorobenzyl group.

[0033] The aryloxy group mentioned as the substituent is a group in which an aryl group is bonded via an oxygen atom (-O-), and specific examples of such aryl groups include the same as those mentioned above. The number of carbon atoms in the aryloxy group is not particularly limited, but is preferably 40 or less, more preferably 30 or less, and even more preferably 20 or less, and specific examples thereof include, but are not limited to, a phenoxy group, a naphthalene-2-yloxy group, etc. When two or more substituents are present, the substituents may be bonded to each other to form a ring.

[0034] The alkoxyaryl group exemplified as the substituent is an aryl group substituted with an alkoxy group, and specific examples of such alkoxy groups and aryl groups include the same as those mentioned above. The number of carbon atoms in the alkoxyaryl group is not particularly limited, but is preferably 40 or less, more preferably 30 or less, and even more preferably 20 or less. Specific examples of alkoxyaryl groups include, but are not limited to, a 2-methoxyphenyl group, a 3-methoxyphenyl group, a 4-methoxyphenyl group, a 2-(1-ethoxy)phenyl group, a 3-(1-ethoxy)phenyl group, a 4-(1-ethoxy)phenyl group, a 2-(2-ethoxy)phenyl group, a 3-(2-ethoxy)phenyl group, a 4-(2-ethoxy)phenyl group, a 2-methoxynaphthalen-1-yl group, a 3-methoxynaphthalen-1-yl group, a 4-methoxynaphthalen-1-yl group, a 5-methoxynaphthalen-1-yl group, a 6-methoxynaphthalen-1-yl group, and a 7-methoxynaphthalen-1-yl group.

[0035] The alkoxyaralkyl group exemplified as the substituent is an aralkyl group substituted with an alkoxy group, and specific examples of such alkoxy groups and aralkyl groups include the same as those mentioned above. The number of carbon atoms in the alkoxyaralkyl group is not particularly limited, but is preferably 40 or less, more preferably 30 or less, and even more preferably 20 or less. Specific examples of the alkoxyaralkyl group include, but are not limited to, a 3-(methoxyphenyl)benzyl group, a 4-(methoxyphenyl)benzyl group, and the like.

[0036] The alkenyl group mentioned in the above substituents can be an alkenyl group which may be substituted, for example, an alkenyl group having 2 to 10 carbon atoms. More specifically, an ethenyl group (vinyl group), a 1-propenyl group, a 2-propenyl group, a 1-methyl-1-ethenyl group, a 1-butenyl group, a 2-butenyl group, a 3-butenyl group, a 2-methyl-1-propenyl group, a 2-methyl-2-propenyl group, a 1-ethylethenyl group, a 1-methyl-1-propenyl group, a 1-methyl-2-propenyl group, a 1-pentenyl group, a 2-pentenyl group, a 3-pentenyl group, a 4-pentenyl group, a 1-n-propylethenyl group, a 1-methyl-1-butenyl group, a 1-methyl-2-butenyl group, a 1- Methyl-3-butenyl group, 2-ethyl-2-propenyl group, 2-methyl-1-butenyl group, 2-methyl-2-butenyl group, 2-methyl-3-butenyl group, 3-methyl-1-butenyl group, 3-methyl-2-butenyl group, 3-methyl-3-butenyl group, 1,1-dimethyl-2-propenyl group, 1-i-propylethenyl group, 1,2-dimethyl-1-propenyl group, 1,2-dimethyl-2-propenyl group, 1-cyclopentenyl group, 2-cyclopentenyl group, 3-cyclopentenyl group, 1-hexenyl group, 2-hexenyl group Ethenyl, 3-hexenyl, 4-hexenyl, 5-hexenyl, 1-methyl-1-pentenyl, 1-methyl-2-pentenyl, 1-methyl-3-pentenyl, 1-methyl-4-pentenyl, 1-n-butylethenyl, 2-methyl-1-pentenyl, 2-methyl-2-pentenyl, 2-methyl-3-pentenyl, 2-methyl-4-pentenyl, 2-n-propyl-2-propenyl, 3-methyl-1-pentenyl, 3-methyl-2-pentenyl, 3-methyl-3-pentenyl , 3-methyl-4-pentenyl group, 3-ethyl-3-butenyl group, 4-methyl-1-pentenyl group, 4-methyl-2-pentenyl group, 4-methyl-3-pentenyl group, 4-methyl-4-pentenyl group, 1,1-dimethyl-2-butenyl group, 1,1-dimethyl-3-butenyl group, 1,2-dimethyl-1-butenyl group, 1,2-dimethyl-2-butenyl group, 1,2-dimethyl-3-butenyl group, 1-methyl-2-ethyl-2-propenyl group, 1-s-butylethenyl group, 1,3-dimethyl-1-butenyl group, 1,3-dimethyl-2-butenyl group, 1,3-dimethyl-3-butenyl group, 1-i-butylethenyl group, 2,2-dimethyl-3-butenyl group, 2,3-dimethyl-1-butenyl group, 2,3-dimethyl-2-butenyl group, 2,3-dimethyl-3-butenyl group, 2-i-propyl-2-propenyl group, 3,3-dimethyl-1-butenyl group, 1-ethyl-1-butenyl group, 1-ethyl-2-butenyl group, 1-ethyl-3- Butenyl group, 1-n-propyl-1-propenyl group, 1-n-propyl-2-propenyl group, 2-ethyl-1-butenyl group, 2-ethyl-2-butenyl group, 2-ethyl-3-butenyl group, 1,1,2-trimethyl-2-propenyl group, 1-t-butylethenyl group, 1-methyl-1-ethyl-2-propenyl group, 1-ethyl-2-methyl-1-propenyl group, 1-ethyl-2-methyl-2-propenyl group, 1-i 1-propyl-1-propenyl group, 1-i-propyl-2-propenyl group, 1-methyl-2-cyclopentenyl group, 1-methyl-3-cyclopentenyl group, 2-methyl-1-cyclopentenyl group, 2-methyl-2-cyclopentenyl group, 2-methyl-3-cyclopentenyl group, 2-methyl-4-cyclopentenyl group, 2-methyl-5-cyclopentenyl group, 2-methylene-cyclopentyl group, 3-methyl-1-cyclopentenyl group, 3-methyl-2-cyclopentenyl group, 3-methyl-3-cyclopentenyl group, 3-methyl-4-cyclopentenyl group, 3-methyl-5-cyclopentenyl group, 3-methylene-cyclopentyl group, 1-cyclohexenyl group, 2-cyclohexenyl group, and 3-cyclohexenyl group, and also include bridged ring alkenyl groups such as a bicycloheptenyl group (norbornyl group). ,

[0037] The aralkyloxy group mentioned as the above substituent is a group derived by removing a hydrogen atom from the hydroxy group of an aralkyl alcohol, and specific examples of such an aralkyl group include the same as those mentioned above. The number of carbon atoms in the aralkyloxy group is not particularly limited, but is preferably 40 or less, more preferably 30 or less, and even more preferably 20 or less. Specific examples of aralkyloxy groups include, but are not limited to, a phenylmethyloxy group (benzyloxy group), a 2-phenylethyleneoxy group, a 3-phenyl-n-propyloxy group, a 4-phenyl-n-butyloxy group, a 5-phenyl-n-pentyloxy group, a 6-phenyl-n-hexyloxy group, a 7-phenyl-n-heptyloxy group, an 8-phenyl-n-octyloxy group, a 9-phenyl-n-nonyloxy group, and a 10-phenyl-n-decyloxy group.

[0038] R in the above formula (1) 2 Examples of the organic group containing an epoxy group in the formula (I) include, but are not limited to, a glycidoxymethyl group, a glycidoxyethyl group, a glycidoxypropyl group, a glycidoxybutyl group, and an epoxycyclohexyl group. R in the above formula (1) 2 Examples of the organic group containing an acryloyl group in the formula (I) include, but are not limited to, an acryloylmethyl group, an acryloylethyl group, and an acryloylpropyl group. R in the above formula (1) 2 Examples of the organic group containing a methacryloyl group in the formula (I) include, but are not limited to, a methacryloylmethyl group, a methacryloylethyl group, and a methacryloylpropyl group. R in the above formula (1) 2 Examples of the organic group containing a mercapto group in the formula (I) include, but are not limited to, an ethyl mercapto group, a butyl mercapto group, a hexyl mercapto group, and an octyl mercapto group. R in the above formula (1) 2 Examples of the organic group containing an amino group in the formula (I) include, but are not limited to, an amino group, an aminomethyl group, an aminoethyl group, a dimethylaminoethyl group, and a dimethylaminopropyl group. R in the above formula (1) 2 Examples of the organic group containing an alkoxy group in the formula (I) include, but are not limited to, a methoxymethyl group and a methoxyethyl group, provided that groups in which the alkoxy group is directly bonded to a silicon atom are excluded. R in the above formula (1) 2Examples of the organic group containing a sulfonyl group in the formula (I) include, but are not limited to, a sulfonylalkyl group and a sulfonylaryl group. R in the above formula (1) 2 Examples of the organic group containing a cyano group in the formula (I) include, but are not limited to, a cyanoethyl group and a cyanopropyl group.

[0039] In formula (1), R 3 are groups or atoms bonded to a silicon atom, and each independently represents an alkoxy group, an aralkyloxy group, an acyloxy group, or a halogen atom. Examples of the alkoxy group and halogen atom are the same as those mentioned above.

[0040] An aralkyloxy group is a group derived by removing a hydrogen atom from the hydroxy group of an aralkyl alcohol, and specific examples of such aralkyl groups include those mentioned above. The number of carbon atoms in the aralkyloxy group is not particularly limited, but is preferably 40 or less, more preferably 30 or less, and even more preferably 20 or less. Specific examples of aralkyloxy groups include, but are not limited to, a phenylmethyloxy group (benzyloxy group), a 2-phenylethyleneoxy group, a 3-phenyl-n-propyloxy group, a 4-phenyl-n-butyloxy group, a 5-phenyl-n-pentyloxy group, a 6-phenyl-n-hexyloxy group, a 7-phenyl-n-heptyloxy group, an 8-phenyl-n-octyloxy group, a 9-phenyl-n-nonyloxy group, and a 10-phenyl-n-decyloxy group.

[0041] The acyloxy group is a group derived by removing a hydrogen atom from the carboxylic acid group of a carboxylic acid compound, and typically includes, but is not limited to, an alkylcarbonyloxy group, an arylcarbonyloxy group, or an aralkylcarbonyloxy group derived by removing a hydrogen atom from the carboxylic acid group of an alkylcarboxylic acid, an arylcarboxylic acid, or an aralkylcarboxylic acid. Specific examples of the alkyl group, aryl group, and aralkyl group in such alkylcarboxylic acid, arylcarboxylic acid, and aralkylcarboxylic acid are the same as those mentioned above. Specific examples of the acyloxy group include acyloxy groups having 2 to 20 carbon atoms. For example, a methylcarbonyloxy group, an ethylcarbonyloxy group, an n-propylcarbonyloxy group, an i-propylcarbonyloxy group, an n-butylcarbonyloxy group, an i-butylcarbonyloxy group, an s-butylcarbonyloxy group, a t-butylcarbonyloxy group, an n-pentylcarbonyloxy group, a 1-methyl-n-butylcarbonyloxy group, a 2-methyl-n-butylcarbonyloxy group, a 3-methyl-n-butylcarbonyloxy group, a 1,1-dimethyl-n-propylcarbonyloxy group, a 1,2-dimethyl-n-propylcarbonyloxy group, a 2,2-dimethyl-n-propylcarbonyloxy group, a 1-ethyl-n-propylcarbonyloxy group, an n-hexylcarbonyloxy group, a 1-methyl-n-pentylcarbonyloxy group, a 2-methyl-n-pentylcarbonyloxy group, a 3-methyl-n-pentylcarbonyloxy group, Examples of the alkyl group include, but are not limited to, a 4-methyl-n-pentylcarbonyloxy group, a 1,1-dimethyl-n-butylcarbonyloxy group, a 1,2-dimethyl-n-butylcarbonyloxy group, a 1,3-dimethyl-n-butylcarbonyloxy group, a 2,2-dimethyl-n-butylcarbonyloxy group, a 2,3-dimethyl-n-butylcarbonyloxy group, a 3,3-dimethyl-n-butylcarbonyloxy group, a 1-ethyl-n-butylcarbonyloxy group, a 2-ethyl-n-butylcarbonyloxy group, a 1,1,2-trimethyl-n-propylcarbonyloxy group, a 1,2,2-trimethyl-n-propylcarbonyloxy group, a 1-ethyl-1-methyl-n-propylcarbonyloxy group, a 1-ethyl-2-methyl-n-propylcarbonyloxy group, a phenylcarbonyloxy group, and a tosylcarbonyloxy group.

[0042] In the above formula (1), a represents 1, b represents an integer of 0 to 2, and 4-(a+b) represents an integer of 1 to 3. b preferably represents 0 or 1, and more preferably 0.

[0043] Specific examples of the compound represented by the above formula (1) include silane compounds containing a succinic anhydride skeleton, such as [(3-trimethoxysilyl)propyl]succinic anhydride, [(3-triethoxysilyl)propyl]succinic anhydride, [(3-trimethoxysilyl)ethyl]succinic anhydride, and [(3-trimethoxysilyl)butyl]succinic anhydride.

[0044] <<Silane compound (hydrolyzable silane) represented by formula (2)>> The hydrolysis condensate used in the composition for forming a resist underlayer film of the present invention can be a product of hydrolysis condensation of a hydrolyzable silane mixture containing a silane compound represented by the following formula (2).

[0045] [ka]

[0046] R 4 represents a monovalent group bonded to a silicon atom and represented by the following formula (2-1).

[0047] [ka]

[0048] In formula (2-1), R 201 ~R 202 each independently represents an organic group containing a hydrogen atom or an optionally substituted alkyl group, and R 203 represents an alkylene group which may be substituted, and * represents a bond bonded to the silicon atom.

[0049] In formula (2), R 4 In the monovalent group represented by formula (2-1), the alkyl group which may be substituted includes R 2 The same applies to the optionally substituted alkyl group described above. Examples of the organic group containing an optionally substituted alkyl group include an optionally substituted alkyl group.

[0050] In formula (2), R 4 In the monovalent group represented by formula (2-1), the optionally substituted alkylene group refers to a divalent group derived by removing one more hydrogen atom from the above optionally substituted alkyl group. The alkylene group may be linear, branched, or cyclic. Specific examples of the alkylene group include linear alkylene groups such as methylene, ethylene, trimethylene, methylethylene, tetramethylene, pentamethylene, hexamethylene, heptamethylene, octamethylene, nonamethylene, and decamethylene; branched alkylene groups such as 1-methyltrimethylene, 2-methyltrimethylene, 1,1-dimethylethylene, 1-methyltetramethylene, 2-methyltetramethylene, 1,1-dimethyltrimethylene, 1,2-dimethyltrimethylene, 2,2-dimethyltrimethylene, and 1-ethyltrimethylene; 1,2-cyclopropanediyl, 1,2-cyclobutanediyl, and 1,3-cyclopentyl; Examples of alkylene groups include, but are not limited to, cyclic alkylene groups such as butanediyl group, 1,2-cyclohexanediyl, and 1,3-cyclohexanediyl, and ether groups such as -CH2OCH2-, -CH2CH2OCH2-, -CH2CH2OCH2CH2-, -CH2CH2CH2OCH2CH2-, -CH2CH2CH2OCH2CH2CH2-, -CH2CH2CH2OCH2CH2CH2-, -CH2SCH2-, -CH2CH2SCH2-, -CH2CH2SCH2CH2-, -CH2CH2CH2SCH2CH2-, -CH2CH2CH2SCH2CH2-, -CH2CH2CH2SCH2CH2-, and -CH2OCH2CH2SCH2-.

[0051] In formula (2), R 5 is R in the above formula (1). 2 is the same as:

[0052] In formula (2), R 6 is R in the above formula (1). 3 is the same as:

[0053] In the above formula (2), a represents 1, b represents an integer of 0 to 2, and 4-(a+b) represents an integer of 1 to 3. b preferably represents 0 or 1, and more preferably 0.

[0054] Specific examples of the compound represented by the above formula (2) include silane compounds containing alkylphosphonic acid, such as diethyl [(3-triethoxysilyl)ethyl]phosphonate.

[0055] <<Silane compound (hydrolyzable silane) represented by formula (3)>> The hydrolysis condensate used in the composition for forming a resist underlayer film of the present invention can further contain a hydrolyzable silane represented by the following formula (3).

[0056] [ka]

[0057] R 7 represents an organic group that is bonded to a silicon atom and contains an alkenyl group.

[0058] Above R 7 The organic group is not particularly limited as long as it is an organic group containing the above group.

[0059] For example, organic groups containing an alkenyl group include not only the alkenyl group itself but also organic groups in which one or more hydrogen atoms in an alkyl group have been substituted with an alkenyl group.

[0060] Also, the above R 7 The alkenyl group in the formula (1) is 2As explained above, examples of the alkenyl group include alkenyl groups which may be substituted, for example, alkenyl groups having 2 to 10 carbon atoms. More specifically, examples include ethenyl group (vinyl group), 1-propenyl group, 2-propenyl group, 1-methyl-1-ethenyl group, 1-butenyl group, 2-butenyl group, 3-butenyl group, 2-methyl-1-propenyl group, 2-methyl-2-propenyl group, 1-ethylethenyl group, 1-methyl-1-propenyl group, 1-methyl-2-propenyl group, 1-pentenyl group, 2-pentenyl group, 3-pentenyl group, 4-pentenyl group, 1-n-propylethenyl group, 1-methyl-1-butenyl group, 1-methyl-2-butenyl group, 1-methyl- 3-butenyl group, 2-ethyl-2-propenyl group, 2-methyl-1-butenyl group, 2-methyl-2-butenyl group, 2-methyl-3-butenyl group, 3-methyl-1-butenyl group, 3-methyl-2-butenyl group, 3-methyl-3-butenyl group, 1,1-dimethyl-2-propenyl group, 1-i-propylethenyl group, 1,2-dimethyl-1-propenyl group, 1,2-dimethyl-2-propenyl group, 1-cyclopentenyl group, 2-cyclopentenyl group, 3-cyclopentenyl group, 1-hexenyl group, 2-hexenyl group, 3-hexenyl group xenyl group, 4-hexenyl group, 5-hexenyl group, 1-methyl-1-pentenyl group, 1-methyl-2-pentenyl group, 1-methyl-3-pentenyl group, 1-methyl-4-pentenyl group, 1-n-butylethenyl group, 2-methyl-1-pentenyl group, 2-methyl-2-pentenyl group, 2-methyl-3-pentenyl group, 2-methyl-4-pentenyl group, 2-n-propyl-2-propenyl group, 3-methyl-1-pentenyl group, 3-methyl-2-pentenyl group, 3-methyl-3-pentenyl group, 3-methyl-4-pentenyl group 3-ethyl-3-butenyl group, 4-methyl-1-pentenyl group, 4-methyl-2-pentenyl group, 4-methyl-3-pentenyl group, 4-methyl-4-pentenyl group, 1,1-dimethyl-2-butenyl group, 1,1-dimethyl-3-butenyl group, 1,2-dimethyl-1-butenyl group, 1,2-dimethyl-2-butenyl group, 1,2-dimethyl-3-butenyl group, 1-methyl-2-ethyl-2-propenyl group, 1-s-butylethenyl group, 1,3-dimethyl-1-butenyl group, 1,3-dimethyl-2-butenyl group, 1,3-dimethyl-3-butenyl group, 1-i-butylethenyl group, 2,2-dimethyl-3-butenyl group, 2,3-dimethyl-1-butenyl group, 2,3-dimethyl-2-butenyl group, 2,3-dimethyl-3-butenyl group, 2-i-propyl-2-propenyl group, 3,3-dimethyl-1-butenyl group, 1-ethyl-1-butenyl group, 1-ethyl-2-butenyl group, 1-ethyl-3-butenyl group, 1-n-propyl 1-propyl-1-propenyl group, 1-n-propyl-2-propenyl group, 2-ethyl-1-butenyl group, 2-ethyl-2-butenyl group, 2-ethyl-3-butenyl group, 1,1,2-trimethyl-2-propenyl group, 1-t-butylethenyl group, 1-methyl-1-ethyl-2-propenyl group, 1-ethyl-2-methyl-1-propenyl group, 1-ethyl-2-methyl-2-propenyl group, 1-i-propyl-1-propenyl group Examples of alkenyl groups include 1-propyl-2-propenyl, 1-methyl-2-cyclopentenyl, 1-methyl-3-cyclopentenyl, 2-methyl-1-cyclopentenyl, 2-methyl-2-cyclopentenyl, 2-methyl-3-cyclopentenyl, 2-methyl-4-cyclopentenyl, 2-methyl-5-cyclopentenyl, 2-methylene-cyclopentyl, 3-methyl-1-cyclopentenyl, 3-methyl-2-cyclopentenyl, 3-methyl-3-cyclopentenyl, 3-methyl-4-cyclopentenyl, 3-methyl-5-cyclopentenyl, 3-methylene-cyclopentyl, 1-cyclohexenyl, 2-cyclohexenyl, and 3-cyclohexenyl groups, and also include bridged ring alkenyl groups such as bicycloheptenyl (norbornyl) groups. Among the above, R 7 is preferably a group containing a vinyl group.

[0061] In formula (3), R 8 is R in the above formula (1). 2 is the same as:

[0062] In formula (3), R 9 is R in the above formula (1). 3 is the same as:

[0063] In the above formula (3), a represents 1, b represents an integer of 0 to 2, and 4-(a+b) represents an integer of 1 to 3. b preferably represents 0 or 1, and more preferably 0.

[0064] Specific examples of the compound represented by the above formula (3) include vinyltrimethoxysilane, vinyltriethoxysilane, vinyltrichlorosilane, vinyltriacetoxysilane, methylvinyldimethoxysilane, methylvinyldiethoxysilane, methylvinyldichlorosilane, methylvinyldiacetoxysilane, dimethylvinylmethoxysilane, dimethylvinylethoxysilane, dimethylvinylchlorosilane, dimethylvinylacetoxysilane, divinyldimethoxysilane, divinyldiethoxysilane, divinyldichlorosilane, divinyldiacetoxysilane, γ-glycidoxypropylvinyldimethoxysilane, γ-glycidoxypropylvinyldiethoxysilane, allyltrimethoxysilane, Examples of silane compounds containing an alkenyl group (vinyl group) include silane, allyltriethoxysilane, allyltrichlorosilane, allyltriacetoxysilane, allylmethyldimethoxysilane, allylmethyldiethoxysilane, allylmethyldichlorosilane, allylmethyldiacetoxysilane, allyldimethylmethoxysilane, allyldimethylethoxysilane, allyldimethylchlorosilane, allyldimethylacetoxysilane, diallyldimethoxysilane, diallyldiethoxysilane, diallyldichlorosilane, diallyldiacetoxysilane, 3-allylaminopropyltrimethoxysilane, 3-allylaminopropyltriethoxysilane, and p-styryltrimethoxysilane.

[0065] <<Silane compound represented by formula (4) (hydrolyzable silane)>> The hydrolysis condensate used in the composition for forming a resist underlayer film of the present invention can further contain a hydrolyzable silane represented by the following formula (4).

[0066] [ka]

[0067] R 10 are groups or atoms bonded to a silicon atom, and each independently represents an alkoxy group, an aralkyloxy group, an acyloxy group, or a halogen atom. Specific examples of the alkoxy group, aralkyloxy group, and acyloxy group include the same as those mentioned above.

[0068] Specific examples of the hydrolyzable silane represented by formula (4) include tetramethoxysilane, tetrachlorosilane, tetraacetoxysilane, tetraethoxysilane, tetra-n-propoxysilane, tetra-i-propoxysilane, and tetra-n-butoxysilane.

[0069] From the viewpoints of improving the crosslink density of the film obtained from the composition of the present invention, suppressing the diffusion of components of the resist film into the obtained film, and maintaining or improving the resist properties of the resist film, it is preferable to use a tetrafunctional silane such as tetramethoxysilane or tetraethoxysilane represented by formula (4).

[0070] <<Silane compound represented by formula (5) (hydrolyzable silane)>> The hydrolysis condensate used in the composition for forming a resist underlayer film of the present invention can further contain a hydrolyzable silane represented by the following formula (5).

[0071] [ka]

[0072] R 11 represents an organic group that is bonded to a silicon atom and contains at least one group selected from the group consisting of an aryl group, an optionally substituted amino group, and a group represented by formula (5-2) described below.

[0073] Above R 11 The organic group is not particularly limited as long as it is an organic group containing the above group.

[0074] For example, the organic group containing an aryl group and a group represented by formula (5-2) described later includes not only the group itself, but also an organic group in which one or more hydrogen atoms in an alkyl group are substituted with at least one selected from the group consisting of an aryl group and a group represented by formula (5-2) described later. Also, R 11 The substituent in the optionally substituted amino group defined above is preferably an alkyl group, and it is particularly preferred that the group be substituted with an alkyl group having 1 to 4 carbon atoms.

[0075] Above R 11 The aryl group in the formula (1) may be an optionally substituted aryl group, for example, an aryl group having 6 to 20 carbon atoms. More specifically, the aryl group is an aryl group such as R 2 As explained above, examples of the alkyl group include a phenyl group, an o-methylphenyl group, a m-methylphenyl group, a p-methylphenyl group, an o-chlorophenyl group, a m-chlorophenyl group, a p-chlorophenyl group, an o-fluorophenyl group, a p-mercaptophenyl group, an o-methoxyphenyl group, a p-methoxyphenyl group, a p-aminophenyl group, a p-cyanophenyl group, an α-naphthyl group, a β-naphthyl group, an o-biphenylyl group, an m-biphenylyl group, a p-biphenylyl group, a 1-anthryl group, a 2-anthryl group, a 9-anthryl group, a 1-phenanthryl group, a 2-phenanthryl group, a 3-phenanthryl group, a 4-phenanthryl group, and a 9-phenanthryl group.

[0076] Furthermore, examples of the group containing the aryl group include an optionally substituted aralkyl group, an optionally substituted halogenated aryl group, an optionally substituted halogenated aralkyl group, an optionally substituted alkoxyaryl group, and an optionally substituted alkoxyaralkyl group.

[0077] The aralkyl group is an alkyl group substituted with an aryl group, and specific examples of such aryl groups and alkyl groups are the same as those mentioned above. The number of carbon atoms in the aralkyl group is not particularly limited, but is preferably 40 or less, more preferably 30 or less, and even more preferably 20 or less. Specific examples of the aralkyl group include R 2 As explained above, examples of the phenylmethyl group include a phenylmethyl group (benzyl group), a 2-phenylethylene group, a 3-phenyl-n-propyl group, a 4-phenyl-n-butyl group, a 5-phenyl-n-pentyl group, a 6-phenyl-n-hexyl group, a 7-phenyl-n-heptyl group, an 8-phenyl-n-octyl group, a 9-phenyl-n-nonyl group, and a 10-phenyl-n-decyl group, but are not limited to these.

[0078] The halogenated aryl group is an aryl group substituted with a halogen atom, and specific examples of such aryl groups include the same as those mentioned above. Examples of the halogen atom include a fluorine atom, a chlorine atom, a bromine atom, and an iodine atom. The number of carbon atoms in the halogenated aryl group is not particularly limited, but is preferably 40 or less, more preferably 30 or less, and even more preferably 20 or less. Specific examples of the halogenated aryl group include R 2As described above, a 2-fluorophenyl group, a 3-fluorophenyl group, a 4-fluorophenyl group, a 2,3-difluorophenyl group, a 2,4-difluorophenyl group, a 2,5-difluorophenyl group, a 2,6-difluorophenyl group, a 3,4-difluorophenyl group, a 3,5-difluorophenyl group, a 2,3,4-trifluorophenyl group, a 2,3,5-trifluorophenyl group, a 2,3,6-trifluorophenyl group, a 2,4,5-trifluorophenyl group, a 2,4,6-trifluorophenyl group, a 3,4,5-trifluorophenyl group, a 2,3,4,5-tetrafluorophenyl group, a 2,3,4,6-tetrafluorophenyl group, a 2,3,5,6-tetrafluorophenyl group, Examples of fluorophenyl include pentafluorophenyl, 2-fluoro-1-naphthyl, 3-fluoro-1-naphthyl, 4-fluoro-1-naphthyl, 6-fluoro-1-naphthyl, 7-fluoro-1-naphthyl, 8-fluoro-1-naphthyl, 4,5-difluoro-1-naphthyl, 5,7-difluoro-1-naphthyl, 5,8-difluoro-1-naphthyl, 5,6,7,8-tetrafluoro-1-naphthyl, heptafluoro-1-naphthyl, 1-fluoro-2-naphthyl, 5-fluoro-2-naphthyl, 6-fluoro-2-naphthyl, 7-fluoro-2-naphthyl, 5,7-difluoro-2-naphthyl, and heptafluoro-2-naphthyl groups.

[0079] The halogenated aralkyl group is an aralkyl group substituted with a halogen atom, and specific examples of such aralkyl groups and halogen atoms are the same as those mentioned above. The number of carbon atoms in the halogenated aralkyl group is not particularly limited, but is preferably 40 or less, more preferably 30 or less, and even more preferably 20 or less. Specific examples of the halogenated aralkyl group include R 2As explained above, examples of the fluorobenzyl group include a 2-fluorobenzyl group, a 3-fluorobenzyl group, a 4-fluorobenzyl group, a 2,3-difluorobenzyl group, a 2,4-difluorobenzyl group, a 2,5-difluorobenzyl group, a 2,6-difluorobenzyl group, a 3,4-difluorobenzyl group, a 3,5-difluorobenzyl group, a 2,3,4-trifluorobenzyl group, a 2,3,5-trifluorobenzyl group, a 2,3,6-trifluorobenzyl group, a 2,4,5-trifluorobenzyl group, a 2,4,6-trifluorobenzyl group, a 2,3,4,5-tetrafluorobenzyl group, a 2,3,4,6-tetrafluorobenzyl group, a 2,3,5,6-tetrafluorobenzyl group, and a 2,3,4,5,6-pentafluorobenzyl group.

[0080] The alkoxyaryl group is an aryl group substituted with an alkoxy group, and specific examples of such aryl groups and alkoxy groups include the same as those mentioned above.

[0081] The number of carbon atoms in the alkoxyaryl group is not particularly limited, but is preferably 40 or less, more preferably 30 or less, and even more preferably 20 or less. Specific examples of the alkoxyaryl group include R 2 As explained above, examples of methoxyphenyl include a 2-methoxyphenyl group, a 3-methoxyphenyl group, a 4-methoxyphenyl group, a 2-(1-ethoxy)phenyl group, a 3-(1-ethoxy)phenyl group, a 4-(1-ethoxy)phenyl group, a 2-(2-ethoxy)phenyl group, a 3-(2-ethoxy)phenyl group, a 4-(2-ethoxy)phenyl group, a 2-methoxynaphthalen-1-yl group, a 3-methoxynaphthalen-1-yl group, a 4-methoxynaphthalen-1-yl group, a 5-methoxynaphthalen-1-yl group, a 6-methoxynaphthalen-1-yl group, and a 7-methoxynaphthalen-1-yl group, but are not limited to these.

[0082] The alkoxyaralkyl group is an aralkyl group substituted with an alkoxy group, and specific examples of such alkoxy groups and aralkyl groups include the same as those mentioned above. The number of carbon atoms in the alkoxyaralkyl group is not particularly limited, but is preferably 40 or less, more preferably 30 or less, and even more preferably 20 or less. Specific examples of the alkoxyaralkyl group include, but are not limited to, a 3-(methoxyphenyl)benzyl group, a 4-(methoxyphenyl)benzyl group, and the like.

[0083] Also, the above R 11 Examples of the optionally substituted amino group include an amino group and an alkylamino group substituted with an alkyl group having 1 to 4 carbon atoms. More specific examples include an amino group, an aminomethyl group, an aminoethyl group, a dimethylaminoethyl group, and a dimethylaminopropyl group.

[0084] Also, the above R 11 In the formula (5-2), the group represented by the following formula (5-2) is

[0085] [ka] In X 101 each independently represents any one of the following formulas (5-3) to (5-5), and the carbon atom of the ketone group in the following formulas (5-4) and (5-5) is R 102 It bonds to the nitrogen atom to which it is bonded.

[0086] [ka] In formulas (5-3) to (5-5), R 103 ~R 107are each independently a hydrogen atom, an optionally substituted alkyl group, an optionally substituted alkenyl group, or an organic group containing an epoxy group or a sulfonyl group, and specific examples of the optionally substituted alkyl group and the optionally substituted alkenyl group, as well as the preferred number of carbon atoms, are given in R 1 With regard to the alkyl group, examples thereof include the alkyl groups exemplified as alkyl groups in which a hydrogen atom is substituted with a succinic anhydride skeleton or the like, and the same as those exemplified above as alkenyl groups. Furthermore, examples of organic groups containing an epoxy group include, but are not limited to, a glycidoxymethyl group, a glycidoxyethyl group, a glycidoxypropyl group, a glycidoxybutyl group, and an epoxycyclohexyl group. Examples of the organic group containing a sulfonyl group include, but are not limited to, a sulfonylalkyl group and a sulfonylaryl group.

[0087] In the above formula (5-2), R 101 each independently represents a hydrogen atom, an optionally substituted alkyl group, an optionally substituted alkenyl group, or an organic group containing an epoxy group or a sulfonyl group; R 102 represent, independently of one another, an alkylene group, a hydroxyalkylene group, a sulfide bond (-S-), an ether bond (-O-), or an ester bond (-C(=O)-O- or -OC(=O)-). Here, specific examples of the optionally substituted alkyl group, the optionally substituted alkenyl group, the epoxy group, or the organic group containing an epoxy group, and the preferred number of carbon atoms, etc. are given in R 103 ~R 107 In addition to these, examples of the optionally substituted alkyl group include an alkyl group in which a terminal hydrogen atom is substituted with a vinyl group, and specific examples thereof include an allyl group, a 2-vinylethyl group, a 3-vinylpropyl group, and a 4-vinylbutyl group.

[0088] The alkylene group is a divalent group derived by removing one more hydrogen atom from the alkyl group, and may be linear, branched, or cyclic. The number of carbon atoms in the alkylene group is not particularly limited, but is preferably 40 or less, more preferably 30 or less, even more preferably 20 or less, and even more preferably 10 or less. Also, R 102 The alkylene group may have one or more bonds selected from a sulfide bond, an ether bond and an ester bond at its terminal or in the middle, preferably in the middle. Specific examples of the alkylene group include linear alkylene groups such as methylene, ethylene, trimethylene, methylethylene, tetramethylene, pentamethylene, hexamethylene, heptamethylene, octamethylene, nonamethylene, and decamethylene; branched alkylene groups such as 1-methyltrimethylene, 2-methyltrimethylene, 1,1-dimethylethylene, 1-methyltetramethylene, 2-methyltetramethylene, 1,1-dimethyltrimethylene, 1,2-dimethyltrimethylene, 2,2-dimethyltrimethylene, and 1-ethyltrimethylene; 1,2-cyclopropanediyl, 1,2-cyclobutanediyl, and 1,3-cyclobutanediyl; Examples of alkylene groups include, but are not limited to, cyclic alkylene groups such as hexanediyl group, 1,2-cyclohexanediyl, and 1,3-cyclohexanediyl, and ether groups such as -CH2OCH2-, -CH2CH2OCH2-, -CH2CH2OCH2CH2-, -CH2CH2CH2OCH2CH2-, -CH2CH2CH2OCH2CH2CH2-, -CH2CH2CH2OCH2CH2CH2-, -CH2SCH2-, -CH2CH2SCH2-, -CH2CH2SCH2CH2-, -CH2CH2CH2SCH2CH2-, -CH2CH2CH2SCH2CH2-, -CH2CH2CH2SCH2CH2-, and -CH2OCH2CH2SCH2-.

[0089] The hydroxyalkylene group is an alkylene group in which at least one hydrogen atom has been replaced with a hydroxy group. Specific examples include, but are not limited to, a hydroxymethylene group, a 1-hydroxyethylene group, a 2-hydroxyethylene group, a 1,2-dihydroxyethylene group, a 1-hydroxytrimethylene group, a 2-hydroxytrimethylene group, a 3-hydroxytrimethylene group, a 1-hydroxytetramethylene group, a 2-hydroxytetramethylene group, a 3-hydroxytetramethylene group, a 4-hydroxytetramethylene group, a 1,2-dihydroxytetramethylene group, a 1,3-dihydroxytetramethylene group, a 1,4-dihydroxytetramethylene group, a 2,3-dihydroxytetramethylene group, a 2,4-dihydroxytetramethylene group, and a 4,4-dihydroxytetramethylene group.

[0090] Among the above, R 11 Examples of the aryl group include a phenyl group, a diaminopropyl group, and an isocyanuric acid skeleton (in formula (5-2), X 101 represents a group represented by formula (5-5).

[0091] In formula (5), R 12 is R in the above formula (1). 2 is the same as:

[0092] In formula (5), R 13 is R in the above formula (1). 3 is the same as:

[0093] In the above formula (5), a represents 1, b represents an integer of 0 to 2, and 4-(a+b) represents an integer of 1 to 3. b preferably represents 0 or 1, and more preferably 0.

[0094] Specific examples of the compound represented by the above formula (5) include phenyltrimethoxysilane, phenyltriethoxysilane, phenyltrichlorosilane, phenyltriacetoxysilane, phenylmethyldimethoxysilane, phenylmethyldiethoxysilane, phenylmethyldichlorosilane, phenylmethyldiacetoxysilane, phenyldimethylmethoxysilane, phenyldimethylethoxysilane, phenyldimethylchlorosilane, phenyldimethylacetoxysilane, diphenylmethylmethoxysilane, diphenylmethylethoxysilane, diphenylmethylchlorosilane, diphenylmethylacetoxysilane, diphenyldimethoxysilane, diphenyldiethoxysilane, diphenyldichlorosilane, diphenyldiacetoxysilane, triphenylmethoxysilane, and triphenylethoxysilane. silane compounds containing a phenyl group, such as triphenylacetoxysilane, triphenylchlorosilane, 3-phenylaminopropyltrimethoxysilane, 3-phenylaminopropyltriethoxysilane, dimethoxymethyl-3-(3-phenoxypropylthiopropyl)silane, benzyltrimethoxysilane, benzyltriethoxysilane, benzylmethyldimethoxysilane, benzylmethyldiethoxysilane, benzyldimethylmethoxysilane, benzyldimethylethoxysilane, benzyldimethylchlorosilane, phenethyltrimethoxysilane, phenethyltriethoxysilane, phenethyltrichlorosilane, phenethyltriacetoxysilane, phenethylmethyldimethoxysilane, phenethylmethyldiethoxysilane, phenethylmethyldichlorosilane, and phenethylmethyldiacetoxysilane;Methoxyphenyltrimethoxysilane, methoxyphenyltriethoxysilane, methoxyphenyltriacetoxysilane, methoxyphenyltrichlorosilane, methoxybenzyltrimethoxysilane, methoxybenzyltriethoxysilane, methoxybenzyltriacetoxysilane, methoxybenzyltrichlorosilane, methoxyphenethyltrimethoxysilane, methoxyphenethyltriethoxysilane, methoxyphenethyltriacetoxysilane, methoxyphenethyltrichlorosilane, ethoxyphenyltrimethoxysilane, ethoxyphenyltriethoxysilane, ethoxyphenyltriacetoxysilane, ethoxyphenyltrichlorosilane, ethoxybenzyltrimethoxysilane, ethoxybenzyltriethoxysilane, ethoxybenzyltriacetoxysilane, ethoxybenzyltrichlorosilane, i-propoxyphenyltrimethoxysilane, i-propoxyphenyltriethoxysilane, i-propoxyphenyltriacetoxysilane, i-propoxyphenyltrichloro Silane, i-propoxybenzyltrimethoxysilane, i-propoxybenzyltriethoxysilane, i-propoxybenzyltriacetoxysilane, i-propoxybenzyltrichlorosilane, t-butoxyphenyltrimethoxysilane, t-butoxyphenyltriethoxysilane, t-butoxyphenyltriacetoxysilane, t-butoxyphenyltrichlorosilane, t-butoxybenzyltrimethoxysilane, t-butoxybenzyltriethoxysilane, t-butoxybenzyltriacetoxysilane Silane compounds containing substituted aryl groups such as methoxysilane, t-butoxybenzyltrichlorosilane, methoxynaphthyltrimethoxysilane, methoxynaphthyltriethoxysilane, methoxynaphthyltriacetoxysilane, methoxynaphthyltrichlorosilane, ethoxynaphthyltrimethoxysilane, ethoxynaphthyltriethoxysilane, ethoxynaphthyltriacetoxysilane, and ethoxynaphthyltrichlorosilane; dimethylaminopropyltrimethoxysilane; and the like.

[0095] Specific examples of the silane compound represented by the formula (5) include those represented by the formula R 11The silane compound in which R is an organic group containing a group represented by the above formula (5-2) may be a commercially available product, or may be synthesized by a known method described in, for example, WO 2011 / 102470. Specific examples of the silane compound containing an organic group containing a group represented by the above formula (5-2) include, but are not limited to, the compounds exemplified below.

[0096] [ka]

[0097] [ka]

[0098] [ka]

[0099] Furthermore, examples of the silane compound represented by the above formula (5) include aryl group-containing silane compounds represented by formulae (A-1) to (A-41).

[0100] [ka]

[0101] [ka]

[0102] [ka]

[0103] <<Other silane compounds (hydrolyzable silanes)>> In the present invention, in order to adjust the film properties such as the film density, other silane compounds (other hydrolyzable silanes) represented by the following formula (6) can be used in the hydrolyzable silane mixture together with the silane compounds represented by the above formula (1) or (2), or, if desired, (3), (4), or (5).

[0104] [ka] In formula (6), R 14 are groups bonded to a silicon atom, and independently represent an optionally substituted alkyl group, an optionally substituted halogenated alkyl group, or an optionally substituted alkoxyalkyl group, or an organic group containing an epoxy group, an acryloyl group, a methacryloyl group, a mercapto group, an amido group, an alkoxy group, a sulfonyl group, or a cyano group, or a combination thereof. Also R 15 are groups or atoms bonded to a silicon atom, and each independently represents an alkoxy group, an aralkyloxy group, an acyloxy group, or a halogen atom. and c represents an integer of 1 to 3.

[0105] Above R 14 Specific examples of each group in the above and their preferred numbers of carbon atoms include R 2 The groups and carbon atom numbers mentioned above can be mentioned. Above R 15 Specific examples of each group in the above and their preferred numbers of carbon atoms include R 3 The groups and atoms and number of carbon atoms mentioned above can be mentioned. Specific examples of the hydrolyzable silane represented by formula (6) include methyltrimethoxysilane, methyltrichlorosilane, methyltriacetoxysilane, methyltriethoxysilane, methyltripropoxysilane, methyltributoxysilane, methyltriamyloxysilane, methyltribenzyloxysilane, methyltriphenethyloxysilane, glycidoxymethyltrimethoxysilane, glycidoxymethyltriethoxysilane, α-glycidoxyethyltrimethoxysilane, and α-glycidoxyethyl Triethoxysilane, β-glycidoxyethyltrimethoxysilane, β-glycidoxyethyltriethoxysilane, α-glycidoxypropyltrimethoxysilane, α-glycidoxypropyltriethoxysilane, β-glycidoxypropyltrimethoxysilane, β-glycidoxypropyltriethoxysilane, γ-glycidoxypropyltrimethoxysilane, γ-glycidoxypropyltriethoxysilane, γ-glycidoxypropyltripropoxysilane, γ-glycidoxypropyltributoxysilane Glycidoxybutyltrimethoxysilane, α-glycidoxybutyltriethoxysilane, β-glycidoxybutyltriethoxysilane, γ-glycidoxybutyltrimethoxysilane, γ-glycidoxybutyltriethoxysilane, δ-glycidoxybutyltrimethoxysilane, δ-glycidoxybutyltriethoxysilane, (3,4-epoxycyclohexyl)methyltrimethoxysilane, (3,4-epoxycyclohexyl)methyltriethoxysilane, β-(3,4-epoxycyclohexyl)methyltriethoxysilane β-(3,4-epoxycyclohexyl)ethyltrimethoxysilane, β-(3,4-epoxycyclohexyl)ethyltriethoxysilane, β-(3,4-epoxycyclohexyl)ethyltripropoxysilane, β-(3,4-epoxycyclohexyl)ethyltributoxysilane, γ-(3,4-epoxycyclohexyl)propyltrimethoxysilane, γ-(3,4-epoxycyclohexyl)propyltriethoxysilane, δ-(3,4-epoxycyclohexyl)butyltrimethoxysilane, δ-(3,4-Epoxycyclohexyl)butyltriethoxysilane, Glycidoxymethylmethyldimethoxysilane, Glycidoxymethylmethyldiethoxysilane, α-Glycidoxyethylmethyldimethoxysilane, α-Glycidoxyethylmethyldiethoxysilane, β-Glycidoxyethylmethyldimethoxysilane, β-Glycidoxyethylethyldimethoxysilane, α-Glycidoxypropylmethyldimethoxysilane, α-Glycidoxypropylmethyldiethoxysilane, β-Glycidoxypropylmethyl Dimethoxysilane, β-glycidoxypropyl ethyl dimethoxysilane, γ-glycidoxypropyl methyl dimethoxysilane, γ-glycidoxypropyl methyl diethoxysilane, γ-glycidoxypropyl methyl dipropoxysilane, γ-glycidoxypropyl methyl dibutoxysilane, γ-glycidoxypropyl ethyl dimethoxysilane, γ-glycidoxypropyl ethyl diethoxysilane, ethyl trimethoxysilane, ethyl triethoxysilane, γ-chloropropyl trimethoxysilane, γ Examples of suitable silanes include, but are not limited to, chloropropyltriethoxysilane, γ-chloropropyltriacetoxysilane, 3,3,3-trifluoropropyltrimethoxysilane, γ-methacryloxypropyltrimethoxysilane, γ-mercaptopropyltrimethoxysilane, γ-mercaptopropyltriethoxysilane, β-cyanoethyltriethoxysilane, chloromethyltrimethoxysilane, chloromethyltriethoxysilane, bicyclo(2,2,1)heptenyltriethoxysilane, benzenesulfonylpropyltriethoxysilane, benzenesulfonamidopropyltriethoxysilane, dimethyldimethoxysilane, dimethyldiethoxysilane, γ-chloropropylmethyldimethoxysilane, γ-chloropropylmethyldiethoxysilane, dimethyldiacetoxysilane, γ-methacryloxypropylmethyldimethoxysilane, γ-methacryloxypropylmethyldiethoxysilane, γ-mercaptopropylmethyldimethoxysilane, γ-mercaptomethyldiethoxysilane, and the like.

[0106] In addition to the above examples, the hydrolyzable silane mixture may contain other silane compounds (hydrolyzable silanes) other than the above examples, as long as the effects of the present invention are not impaired.

[0107] As described above, the composition for forming a resist underlayer film of the present invention contains a hydrolysis condensate of the hydrolyzable silane mixture. In a preferred embodiment of the present invention, the composition for forming a resist underlayer film of the present invention contains at least a hydrolysis condensate of the above-mentioned hydrolyzable silane mixture. In a preferred embodiment of the present invention, the hydrolyzed condensate contained in the composition for forming a resist underlayer film of the present invention includes, in addition to the silane represented by formula (1) or formula (2), a hydrolyzed condensate obtained using, if desired, a hydrolyzable silane represented by formula (3), a hydrolyzable silane represented by formula (4), a hydrolyzable silane represented by formula (5), another hydrolyzable silane represented by formula (6), or another hydrolyzable silane other than those represented by these formulas.

[0108] When a silane compound represented by formula (1) is used in the hydrolyzable silane mixture, the amount of the silane compound represented by formula (1) added can be, for example, 0.1 to 30 mol % relative to 100 mol % of the total amount of all silane compounds (hydrolyzable silanes) contained in the hydrolyzable silane mixture. When a silane compound represented by formula (2) is used in the hydrolyzable silane mixture, the amount of the silane compound represented by formula (2) added can be, for example, 0.1 to 30 mol % relative to 100 mol % of the total amount of all silane compounds (hydrolyzable silanes) contained in the hydrolyzable silane mixture. When the silane compound represented by formula (3) is used in the hydrolyzable silane mixture, the amount of the silane compound represented by formula (3) added can be, for example, 15 to 50 mol % relative to 100 mol % of the total amount of all silane compounds (hydrolyzable silanes) contained in the hydrolyzable silane mixture. When a silane compound represented by formula (4) is used in the hydrolyzable silane mixture, the amount of the silane compound represented by formula (4) added can be, for example, 30 to 70 mol % or 25 to 45 mol % relative to 100 mol % of the total amount of all silane compounds (hydrolyzable silanes) contained in the hydrolyzable silane mixture. In the case where a silane compound represented by formula (5) is used in the hydrolyzable silane mixture (for example, R 11 is an aryl group), the amount of the silane compound represented by formula (5) added can be, for example, 0.01 to 5 mol % relative to 100 mol % of the total amount of all silane compounds (hydrolyzable silanes) contained in the hydrolyzable silane mixture.

[0109] The hydrolysis condensate of the hydrolyzable silane mixture may have a weight-average molecular weight of, for example, 500 to 1,000,000. From the viewpoint of suppressing precipitation of the hydrolysis condensate in the composition, the weight-average molecular weight is preferably 500,000 or less, more preferably 250,000 or less, and even more preferably 100,000 or less, and from the viewpoint of achieving both storage stability and coatability, the weight-average molecular weight is preferably 700 or more, more preferably 1,000 or more. The weight-average molecular weight is a molecular weight obtained by GPC analysis in terms of polystyrene. GPC analysis can be performed, for example, using a GPC apparatus (trade name HLC-8220GPC, manufactured by Tosoh Corporation) and a GPC column (trade names Shodex (registered trademark) KF803L, KF802, KF801, manufactured by Showa Denko K.K.), setting the column temperature to 40°C, using tetrahydrofuran as an eluent (elution solvent), setting the flow rate (flow rate) to 1.0 mL / min, and using polystyrene (manufactured by Showa Denko K.K.) as a standard sample.

[0110] The hydrolysis condensate of the hydrolyzable silane mixture can be obtained by hydrolyzing and condensing the above-mentioned silane compound (hydrolyzable silane). The silane compound (hydrolyzable silane) contains an alkoxy group, aralkyloxy group, acyloxy group, or halogen atom directly bonded to a silicon atom, that is, a hydrolyzable group such as an alkoxysilyl group, aralkyloxysilyl group, acyloxysilyl group, or halogenated silyl group. For the hydrolysis of these hydrolyzable groups, usually 0.5 to 100 mol, preferably 1 to 10 mol of water is used per 1 mol of the hydrolyzable group. During the hydrolysis and condensation, a hydrolysis catalyst may be used or may be performed without the use of a hydrolysis catalyst for the purpose of promoting the reaction, etc. When a hydrolysis catalyst is used, the amount of the hydrolysis catalyst that can be used is usually 0.0001 to 10 mol, preferably 0.001 to 1 mol, per 1 mol of the hydrolyzable group. The reaction temperature during hydrolysis and condensation is usually in the range of room temperature or higher and the reflux temperature of the organic solvent that can be used for hydrolysis at normal pressure or lower, for example, 20 to 110°C, or 20 to 80°C. The hydrolysis may be complete, i.e., all hydrolyzable groups are converted to silanol groups, or may be partial, i.e., some hydrolyzable groups remain unreacted. Examples of hydrolysis catalysts that can be used in the hydrolysis and condensation include metal chelate compounds, organic acids, inorganic acids, organic bases, and inorganic bases.

[0111] Examples of metal chelate compounds as hydrolysis catalysts include triethoxy mono(acetylacetonate)titanium, tri-n-propoxy mono(acetylacetonate)titanium, tri-i-propoxy mono(acetylacetonate)titanium, tri-n-butoxy mono(acetylacetonate)titanium, tri-sec-butoxy mono(acetylacetonate)titanium, tri-t-butoxy mono(acetylacetonate)titanium, diethoxy bis(acetylacetonate)titanium, di-n-propoxy bis(acetylacetonate)titanium, di -i-Propoxy bis(acetylacetonate) titanium, di-n-butoxy bis(acetylacetonate) titanium, di-sec-butoxy bis(acetylacetonate) titanium, di-t-butoxy bis(acetylacetonate) titanium, monoethoxy tris(acetylacetonate) titanium, mono-n-propoxy tris(acetylacetonate) titanium, mono-i-propoxy tris(acetylacetonate) titanium, mono-n-butoxy tris(acetylacetonate) titanium, mono-sec-butoxy tris(acetylacetonate) Titanium acetate, titanium mono-t-butoxy tris(acetylacetonate), titanium tetrakis(acetylacetonate), titanium triethoxy mono(ethylacetoacetate), titanium tri-n-propoxy mono(ethylacetoacetate), titanium tri-i-propoxy mono(ethylacetoacetate), titanium tri-n-butoxy mono(ethylacetoacetate), titanium tri-sec-butoxy mono(ethylacetoacetate), titanium tri-t-butoxy mono(ethylacetoacetate), titanium diethoxy bis(ethoxy) di-n-propoxy bis(ethylacetoacetate) titanium, di-i-propoxy bis(ethylacetoacetate) titanium, di-n-butoxy bis(ethylacetoacetate) titanium, di-sec-butoxy bis(ethylacetoacetate) titanium, di-t-butoxy bis(ethylacetoacetate) titanium, monoethoxy tris(ethylacetoacetate) titanium, mono-n-propoxy tris(ethylacetoacetate) titanium, mono-i-propoxy tris(ethylacetoacetate) titanium,Titanium chelate compounds such as mono-n-butoxy tris(ethylacetoacetate)titanium, mono-sec-butoxy tris(ethylacetoacetate)titanium, mono-t-butoxy tris(ethylacetoacetate)titanium, tetrakis(ethylacetoacetate)titanium, mono(acetylacetonato)tris(ethylacetoacetate)titanium, bis(acetylacetonato)bis(ethylacetoacetate)titanium, tris(acetylacetonato)mono(ethylacetoacetate)titanium; triethoxy mono(acetylacetonato) Tri-n-propoxy mono(acetylacetonate)zirconium, Tri-i-propoxy mono(acetylacetonate)zirconium, Tri-n-butoxy mono(acetylacetonate)zirconium, Tri-sec-butoxy mono(acetylacetonate)zirconium, Tri-t-butoxy mono(acetylacetonate)zirconium, Diethoxy bis(acetylacetonate)zirconium, Di-n-propoxy bis(acetylacetonate)zirconium, Di-i-propoxy bis(acetylacetonate)zirconium Cetylacetonate)zirconium, di-n-butoxy bis(acetylacetonate)zirconium, di-sec-butoxy bis(acetylacetonate)zirconium, di-t-butoxy bis(acetylacetonate)zirconium, monoethoxy tris(acetylacetonate)zirconium, mono-n-propoxy tris(acetylacetonate)zirconium, mono-i-propoxy tris(acetylacetonate)zirconium, mono-n-butoxy tris(acetylacetonate)zirconium, mono-sec- Butoxy tris(acetylacetonate)zirconium, mono-t-butoxy tris(acetylacetonate)zirconium, tetrakis(acetylacetonate)zirconium, triethoxy mono(ethylacetoacetate)zirconium, tri-n-propoxy mono(ethylacetoacetate)zirconium, tri-i-propoxy mono(ethylacetoacetate)zirconium, tri-n-butoxy mono(ethylacetoacetate)zirconium, tri-sec-butoxy mono(ethylacetoacetate)zirconium,Tri-t-butoxy mono(ethylacetoacetate)zirconium, diethoxy bis(ethylacetoacetate)zirconium, di-n-propoxy bis(ethylacetoacetate)zirconium, di-i-propoxy bis(ethylacetoacetate)zirconium, di-n-butoxy bis(ethylacetoacetate)zirconium, di-sec-butoxy bis(ethylacetoacetate)zirconium, di-t-butoxy bis(ethylacetoacetate)zirconium, monoethoxy tris(ethylacetoacetate)zirconium, mono-n-propoxy tris(ethylacetoacetate)zirconium, mono-i-propoxy tris(ethylacetoacetate)zirconium, mono-n-butoxy Examples of the chelate compounds include, but are not limited to, zirconium chelate compounds such as tris(ethylacetoacetate)zirconium, mono-sec-butoxytris(ethylacetoacetate)zirconium, mono-t-butoxytris(ethylacetoacetate)zirconium, tetrakis(ethylacetoacetate)zirconium, mono(acetylacetonato)tris(ethylacetoacetate)zirconium, bis(acetylacetonato)bis(ethylacetoacetate)zirconium, and tris(acetylacetonato)mono(ethylacetoacetate)zirconium; and aluminum chelate compounds such as tris(acetylacetonato)aluminum and tris(ethylacetoacetate)aluminum.

[0112] Examples of organic acids that can be used as hydrolysis catalysts include, but are not limited to, acetic acid, propionic acid, butanoic acid, pentanoic acid, hexanoic acid, heptanoic acid, octanoic acid, nonanoic acid, decanoic acid, oxalic acid, maleic acid, methylmalonic acid, adipic acid, sebacic acid, gallic acid, butyric acid, mellitic acid, arachidonic acid, 2-ethylhexanoic acid, oleic acid, stearic acid, linoleic acid, linolenic acid, salicylic acid, benzoic acid, p-aminobenzoic acid, p-toluenesulfonic acid, benzenesulfonic acid, monochloroacetic acid, dichloroacetic acid, trichloroacetic acid, trifluoroacetic acid, formic acid, malonic acid, sulfonic acid, phthalic acid, fumaric acid, citric acid, and tartaric acid.

[0113] Examples of inorganic acids that can be used as hydrolysis catalysts include, but are not limited to, hydrochloric acid, nitric acid, sulfuric acid, hydrofluoric acid, and phosphoric acid.

[0114] Examples of organic bases as hydrolysis catalysts include, but are not limited to, pyridine, pyrrole, piperazine, pyrrolidine, piperidine, picoline, trimethylamine, triethylamine, monoethanolamine, diethanolamine, dimethylmonoethanolamine, monomethyldiethanolamine, triethanolamine, diazabicyclooctane, diazabicyclononane, diazabicycloundecene, tetramethylammonium hydroxide, tetraethylammonium hydroxide, tetrapropylammonium hydroxide, tetrabutylammonium hydroxide, trimethylphenylammonium hydroxide, benzyltrimethylammonium hydroxide, and benzyltriethylammonium hydroxide. Examples of inorganic bases as hydrolysis catalysts include, but are not limited to, ammonia, sodium hydroxide, potassium hydroxide, barium hydroxide, calcium hydroxide, and the like.

[0115] Of these catalysts, metal chelate compounds, organic acids and inorganic acids are preferred, and these may be used alone or in combination of two or more.

[0116] Among these, nitric acid can be suitably used as a hydrolysis catalyst in the present invention. The use of nitric acid can improve the storage stability of the reaction solution after hydrolysis and condensation, and in particular, can suppress changes in the molecular weight of the hydrolysis condensate. It is known that the stability of the hydrolysis condensate in a solution depends on the pH of the solution. As a result of extensive investigation, it has been found that the pH of the solution can be kept within a stable range by using an appropriate amount of nitric acid.

[0117] When carrying out the hydrolysis and condensation, an organic solvent may be used as the solvent, and specific examples thereof include aliphatic hydrocarbon solvents such as n-pentane, i-pentane, n-hexane, i-hexane, n-heptane, i-heptane, 2,2,4-trimethylpentane, n-octane, i-octane, cyclohexane, and methylcyclohexane; benzene, toluene, xylene, ethylbenzene, trimethylbenzene, methylethylbenzene, n-propylbenzene, i-propylbenzene, diethylbenzene, Aromatic hydrocarbon solvents such as i-butylbenzene, triethylbenzene, di-i-propylbenzene, and n-amylnaphthalene; methanol, ethanol, n-propanol, i-propanol, n-butanol, i-butanol, sec-butanol, t-butanol, n-pentanol, i-pentanol, 2-methylbutanol, sec-pentanol, t-pentanol, 3-methoxybutanol, n-hexanol, 2-methylpentanol, sec-hexanol, and 2-ethylbutanol. alcohol, n-heptanol, sec-heptanol, 3-heptanol, n-octanol, 2-ethylhexanol, sec-octanol, n-nonyl alcohol, 2,6-dimethyl-4-heptanol, n-decanol, sec-undecyl alcohol, trimethylnonyl alcohol, sec-tetradecyl alcohol, sec-heptadecyl alcohol, phenol, cyclohexanol, methylcyclohexanol, 3,3,5-trimethylcyclohexanol, benzyl alcohol Monoalcohol solvents such as phenylmethylcarbinol, diacetone alcohol, and cresol; polyhydric alcohol solvents such as ethylene glycol, propylene glycol, 1,3-butylene glycol, 2,4-pentanediol, 2-methyl-2,4-pentanediol, 2,5-hexanediol, 2,4-heptanediol, 2-ethyl-1,3-hexanediol, diethylene glycol, dipropylene glycol, triethylene glycol, tripropylene glycol, and glycerin;Ketone solvents such as acetone, methyl ethyl ketone, methyl n-propyl ketone, methyl n-butyl ketone, diethyl ketone, methyl i-butyl ketone, methyl n-pentyl ketone, ethyl n-butyl ketone, methyl n-hexyl ketone, di-i-butyl ketone, trimethylnonanone, cyclohexanone, methylcyclohexanone, 2,4-pentanedione, acetonylacetone, diacetone alcohol, acetophenone, and fenchone; ethyl ether, i-propyl ether, n-butyl ether, n-hexyl ether, 2-ethylhexyl ether, ethylene oxide, 1,2-propylene oxide, dioxolane, 4-methyldioxolane, dioxane, dimethyldioxane, ethylene glycol monomethyl ether, ethylene glycol monoethyl ether, ethylene glycol diethyl ether, ethylene glycol mono-n-butyl ether, ethylene glycol mono-n-hexyl ether, ethylene glycol monophenyl ether, ethylene glycol mono-2-ethylbutyl ether, and ethylene glycol dibutyl ether-based solvents such as ether, diethylene glycol monomethyl ether, diethylene glycol monoethyl ether, diethylene glycol diethyl ether, diethylene glycol mono-n-butyl ether, diethylene glycol di-n-butyl ether, diethylene glycol mono-n-hexyl ether, ethoxytriglycol, tetraethylene glycol di-n-butyl ether, propylene glycol monomethyl ether (1-methoxy-2-propanol), propylene glycol monoethyl ether (1-ethoxy-2-propanol), propylene glycol monopropyl ether, propylene glycol monobutyl ether, propylene glycol monomethyl ether acetate (1-methoxy-2-propanol monoacetate), dipropylene glycol monomethyl ether, dipropylene glycol monoethyl ether, dipropylene glycol monopropyl ether, dipropylene glycol monobutyl ether, tripropylene glycol monomethyl ether, tetrahydrofuran, and 2-methyltetrahydrofuran;Diethyl carbonate, methyl acetate, ethyl acetate, γ-butyrolactone, γ-valerolactone, n-propyl acetate, i-propyl acetate, n-butyl acetate, i-butyl acetate, sec-butyl acetate, n-pentyl acetate, sec-pentyl acetate, 3-methoxybutyl acetate, methylpentyl acetate, 2-ethylbutyl acetate, 2-ethylhexyl acetate, benzyl acetate, cyclohexyl acetate, methylcyclohexyl acetate, n-nonyl acetate, methyl acetoacetate, ethyl acetoacetate, ethylene glycol monomethyl ether acetate, ethylene glycol monoethyl ether acetate, diethylene glycol monomethyl ether acetate, diethylene glycol monoethyl ether acetate, diethylene glycol mono-n-butyl ether acetate, propylene glycol monomethyl ether acetate, propylene glycol monoethyl ether acetate, propylene glycol monopropyl ether acetate, propylene glycol mono Examples of suitable solvents include ester-based solvents such as butyl ether, dipropylene glycol monomethyl ether acetate, dipropylene glycol monoethyl ether acetate, glycol diacetate, methoxytriglycol acetate, ethyl propionate, n-butyl propionate, i-amyl propionate, diethyl oxalate, di-n-butyl oxalate, methyl lactate, ethyl lactate, n-butyl lactate, n-amyl lactate, diethyl malonate, dimethyl phthalate, and diethyl phthalate; nitrogen-containing solvents such as N-methylformamide, N,N-dimethylformamide, N,N-diethylformamide, acetamide, N-methylacetamide, N,N-dimethylacetamide, N-methylpropionamide, and N-methyl-2-pyrrolidone; and sulfur-containing solvents such as dimethyl sulfide, diethyl sulfide, thiophene, tetrahydrothiophene, dimethyl sulfoxide, sulfolane, and 1,3-propane sultone. These solvents can be used alone or in combination.

[0118] After completion of the hydrolysis and condensation reactions, the reaction solution can be used as is or after dilution or concentration, neutralized, and treated with an ion exchange resin to remove the hydrolysis catalyst, such as an acid or a base, used in the hydrolysis and condensation. Before or after such treatment, by-product alcohol and water, the hydrolysis catalyst, etc., can be removed from the reaction solution by vacuum distillation or the like.

[0119] The hydrolysis condensate (hereinafter also referred to as polysiloxane) thus obtained is obtained in the form of a polysiloxane varnish dissolved in an organic solvent, and this can be used as is as a composition for forming a resist underlayer film, which will be described later. The obtained polysiloxane varnish may be subjected to solvent substitution or may be diluted with an appropriate solvent. If the storage stability of the obtained polysiloxane varnish is not poor, the organic solvent may be distilled off to a solids concentration of 100%. The organic solvent used for solvent substitution or dilution of the polysiloxane varnish may be the same as or different from the organic solvent used in the hydrolysis and condensation reaction of the hydrolyzable silane mixture. The dilution solvent is not particularly limited, and one or more solvents may be selected and used.

[0120] The composition for forming a resist underlayer film of the present invention contains, in addition to the hydrolysis condensate (polysiloxane) of the hydrolyzable silane mixture, a solvent and a cation AX + and anion AZ - It may contain a specific additive (compound A) having a chemical structure including the following, as well as other ingredients.

[0121] <Solvent> The solvent used in the composition for forming a resist underlayer film of the present invention is not particularly limited as long as it is a solvent that can dissolve the solid content in the composition for forming a resist underlayer film. Such a solvent is not limited as long as it dissolves the hydrolysis condensate of the hydrolyzable silane mixture, the specific additive (compound A), and other components.

[0122] Specific examples thereof include methyl cellosolve acetate, ethyl cellosolve acetate, propylene glycol, propylene glycol monomethyl ether (1-methoxy-2-propanol), propylene glycol monoethyl ether (1-ethoxy-2-propanol), methyl isobutyl carbinol, propylene glycol monobutyl ether, propylene glycol monomethyl ether acetate (1-methoxy-2-propanol monoacetate), propylene glycol monoethyl ether acetate, and propylene glycol monopropyl ether. butyl ether acetate, propylene glycol monobutyl ether acetate, toluene, xylene, methyl ethyl ketone, cyclopentanone, cyclohexanone, ethyl 2-hydroxypropionate, ethyl 2-hydroxy-2-methylpropionate, ethyl ethoxyacetate, ethyl hydroxyacetate, methyl 2-hydroxy-3-methylbutanoate, methyl 3-methoxypropionate, ethyl 3-methoxypropionate, ethyl 3-ethoxypropionate, methyl 3-ethoxypropionate, methyl pyruvate, ethyl pyruvate, ethylene glycol monomethyl ether ether, ethylene glycol monoethyl ether, ethylene glycol monopropyl ether, ethylene glycol monobutyl ether, ethylene glycol monomethyl ether acetate, ethylene glycol monoethyl ether acetate, ethylene glycol monopropyl ether acetate, ethylene glycol monobutyl ether acetate, diethylene glycol dimethyl ether, diethylene glycol diethyl ether, diethylene glycol dipropyl ether, diethylene glycol dibutyl ether, propylene glycol monomethyl ether, propylene glycol dimethyl ether, propylene glycol diethyl ether, propylene glycol dipropyl ether, propylene glycol dibutyl ether, ethyl lactate, propyl lactate, isopropyl lactate, butyl lactate, isobutyl lactate, methyl formate, ethyl formate, propyl formate, isopropyl formate, butyl formate, isobutyl formate, amyl formate, isoamyl formate, methyl acetate, ethyl acetate, amyl acetate, isoamyl acetate, hexyl acetate, methyl propionate, ethyl propionate, propyl propionate, isopropyl propionate,Butyl propionate, isobutyl propionate, methyl butyrate, ethyl butyrate, propyl butyrate, isopropyl butyrate, butyl butyrate, isobutyl butyrate, ethyl hydroxyacetate, ethyl 2-hydroxy-2-methylpropionate, methyl 3-methoxy-2-methylpropionate, methyl 2-hydroxy-3-methylbutyrate, ethyl methoxyacetate, ethyl ethoxyacetate, methyl 3-methoxypropionate, ethyl 3-ethoxypropionate, ethyl 3-methoxypropionate, 3-methoxybutyl acetate, 3-methoxypropyl acetate, 3-methyl-3-methoxybutyrate Examples of suitable solvents include methyl acetate, 3-methyl-3-methoxybutyl propionate, 3-methyl-3-methoxybutyl butyrate, methyl acetoacetate, toluene, xylene, methyl ethyl ketone, methyl propyl ketone, methyl butyl ketone, 2-heptanone, 3-heptanone, 4-heptanone, cyclohexanone, N,N-dimethylformamide, N-methylacetamide, N,N-dimethylacetamide, N-methyl-2-pyrrolidone, 4-methyl-2-pentanol, and γ-butyrolactone. These solvents can be used alone or in combination of two or more.

[0123] The composition for forming a resist underlayer film of the present invention may contain water as a solvent. When water is contained as a solvent, the content of water can be, for example, 30% by mass or less, preferably 20% by mass or less, and more preferably 15% by mass or less, based on the total mass of the solvents contained in the composition.

[0124] <Specific additive (compound A)> The composition for forming a resist underlayer film containing the hydrolysis condensate (polysiloxane) of the hydrolyzable silane mixture further contains a cation AX + and anion AZ - By incorporating a specific additive (compound A) having a chemical structure containing the following, it is possible to form a resist underlayer film that exhibits superior solubility in alkaline solutions (basic chemical solutions).

[0125] The specific additive (compound A) is cation AX + and anion AZ -and the molecular weight of the anion is 65 or more.

[0126] In a specific additive (compound A), "cation" means a positively charged atom or a group of atoms, and "anion" means a negatively charged atom or a group of atoms.

[0127] The inclusion of a specific additive (compound A) in a composition for forming a resist underlayer film increases the solubility of the resist underlayer film in alkaline solutions (basic chemical solutions). This is presumably because the presence of an anionic species in the specific additive (compound A) between the hydrolysis condensation product (polymer) inhibits the bonds that crosslink the hydrolysis condensation product, or the anionic species themselves bind and cap, preventing three-dimensional crosslinking from proceeding.

[0128] Anion AZ - From the viewpoint of suppressing condensation, the molecular weight is more preferably 65 or more, and from the viewpoint of maintaining dry etching resistance, the molecular weight is more preferably 500 or less.

[0129] << Anion AZ - >> In compound A, anion AZ - is the cation AX + It may be present either extramolecularly or intramolecularly. "Anion AZ - is cation AX + "Exists outside the molecule" refers to the anion AZ - But cation AX + is not covalently bonded to the cation AX + "An anion" refers to a state in which the anion exists as an independent structural unit. An example of the form of compound A described above is a salt. Hereinafter, an anion existing outside the molecule of a cation will also be referred to as a counter anion. In addition, in compound A, the anion AZ - is the cation AX +via a covalent bond. That is, compound A may be in the form of an inner salt (also called a zwitterion).

[0130] Anion AZ - The type of anion is not particularly limited as long as it satisfies the condition that the molecular weight of the anion is 65 or more, and examples thereof include anions having chemical structures represented by the following (A) to (E).

[0131] [ka]

[0132] [ka]

[0133] [ka]

[0134] [ka]

[0135] [ka]

[0136] [ka]

[0137] In formulas (A) to (E), R 301 represents an optionally substituted alkyl group, an optionally substituted aryl group, an optionally substituted halogenated alkyl group, an optionally substituted aralkyl group, or an organic group containing an ester bond (—C(═O)—O— or —O—C(═O)—), or a combination thereof; Z represents an aromatic ring, a cyclic alkane, or a non-aromatic ring cyclic alkene; R 501 represents an alkyl group which may be partially or completely substituted with fluorine atoms, R 302 and R 303 are each independently an alkyl group, R 304 and R 305 are each independently an alkyl group. Specific examples of the alkyl group, aryl group, halogenated alkyl group, and aralkyl group are the same as those described above. Specific examples of the substituent that may be substituted on the alkyl group and the like are the same as those described above.

[0138] The specific additive (compound A) may be, for example, a compound having a sulfonate anion represented by the above formula (A). The compound having the sulfonate anion represented by the above formula (A) may be not only a compound having the anion represented by formula (A) outside the molecule, but also a compound having the anion represented by formula (A) inside the molecule, such as sulfobetaines such as lauryl sulfobetaine and myristyl sulfobetaine (see compounds (Add-6) and (Add-7) below).

[0139] The specific additive (compound A) may be, for example, a compound having an anion containing a triazole skeleton represented by the above formula (B-1) or (B-2). In formula (B-2), Z represents an aromatic ring having 1 to 6 carbon atoms, a cyclic alkane, or a non-aromatic cyclic alkene. The specific additive (compound A) is preferably a compound having an anion represented by formula (B-2), and in particular, in formula (B-2), Z is preferably an aromatic ring. That is, a preferred embodiment of the specific additive (compound A) is, for example, a compound having an anion containing a benzotriazole skeleton represented by the following (b-1).

[0140] [ka]

[0141] An example of the specific additive (compound A) is a compound represented by the above formula (C). In formula (C), R 501 represents an alkyl group having 1 to 4 carbon atoms, a fluoroalkyl group in which the alkyl group is partially or entirely substituted with fluorine atoms, or a perfluoroalkyl group. Among them, R 501 is preferably a CF3 group or a C4F9 group. In particular, the specific additive (compound A) is more preferably a compound having a bis(trifluoromethanesulfonyl)imide anion represented by the following (c-1):

[0142] [ka]

[0143] The specific additive (compound A) may be, for example, a compound having a thiophosphate anion represented by the above formula (D).

[0144] The specific additive (compound A) may be, for example, a compound having a phosphate anion represented by the above formula (E).

[0145] Specific examples of the specific additive (compound A) include, but are not limited to, compounds represented by the following formulae (Add-1) to (Add-11).

[0146] [ka] ···(Add-1)

[0147] [ka] ···(Add-2)

[0148] [ka] (Add-3)

[0149] [ka] (Add-4)

[0150] [ka] ···(Add-5)

[0151] [ka] ···(Add-6)

[0152] [ka] ···(Add-7)

[0153] [ka] ···(Add-8)

[0154] [ka] ···(Add-9)

[0155] [ka] ···(Add-10)

[0156] [ka] ···(Add-11)

[0157] When the composition for forming a resist underlayer film of the present invention contains a specific additive, the content thereof can be 1 to 30 parts by mass relative to 100 parts by mass of the composition for forming a resist underlayer film.

[0158] <Other ingredients (other additives)> The composition for forming a resist underlayer film of the present invention can contain various additives (also referred to as other additives) other than the above-mentioned specific additives, depending on the intended use of the composition. Examples of other components (other additives) that can be blended into the composition for forming a resist underlayer film include curing catalysts (ammonium salts, phosphines, phosphonium salts, sulfonium salts, nitrogen-containing silane compounds, etc.), crosslinking agents, crosslinking catalysts, stabilizers (organic acids, water, alcohols, etc.), organic polymer compounds, acid generators, surfactants (nonionic surfactants, anionic surfactants, cationic surfactants, silicon-based surfactants, fluorine-based surfactants, UV-curable surfactants, etc.), pH adjusters, rheology adjusters, adhesion aids, and other known additives that are blended into materials (compositions) for forming various films that can be used in the production of semiconductor devices, such as resist underlayer films, antireflective films, and pattern reversal films. Various additives are exemplified below, but are not limited to these.

[0159] <<Curing catalyst>> The curing catalyst may be an ammonium salt, a phosphine, a phosphonium salt, a sulfonium salt, etc. The salts described below as curing catalysts may be added in the form of a salt, or may form a salt in the composition (a compound that is added as a separate compound and forms a salt in the system).

[0160] The ammonium salt may be selected from the group consisting of ammonium salts of the formula (D-1):

[0161] [ka] (In the formula, m is an integer of 2 to 11, n is an integer of 2 to 3, and R 21 represents an alkyl group or an aryl group, Y - represents an anion.) a quaternary ammonium salt having a structure represented by Formula (D-2):

[0162] [ka] (In the formula, R 22 , R 23 , R 24 and R 25 represents an alkyl or aryl group, N represents a nitrogen atom, Y - represents an anion, and R 22 , R 23 , R 24 , and R 25 are bonded to a nitrogen atom by a C-N bond), Formula (D-3):

[0163] [ka] (In the formula, R 26 and R 27 represents an alkyl or aryl group, N represents a nitrogen atom, Y - represents an anion), Formula (D-4):

[0164] [ka] (In the formula, R 28 represents an alkyl or aryl group, N represents a nitrogen atom, Y - represents an anion), Formula (D-5):

[0165] [ka] (In the formula, R 29 and R 30 represents an alkyl or aryl group, N represents a nitrogen atom, Y - represents an anion), Formula (D-6):

[0166] [ka] (In the formula, m is an integer of 2 to 11, n is an integer of 2 to 3, H is a hydrogen atom, N is a nitrogen atom, and Y - represents an anion).

[0167] The phosphonium salt may also be a compound represented by the formula (D-7):

[0168] [ka] (In the formula, R 31 , R 32 , R 33 , and R 34 represents an alkyl or aryl group, P represents a phosphorus atom, and Y - represents an anion, and R 31 , R 32 , R 33 , and R 34 are bonded to the phosphorus atom by a C—P bond).

[0169] The sulfonium salt may also be a compound represented by the formula (D-8):

[0170] [ka] (In the formula, R 35 , R 36 , and R 37 represents an alkyl or aryl group, S represents a sulfur atom, and Y - represents an anion, and R 35 , R 36 , and R 37 are bonded to the sulfur atom by a C—S bond).

[0171] The compound of the above formula (D-1) is a quaternary ammonium salt derived from an amine, where m is an integer of 2 to 11 and n is an integer of 2 to 3. R of this quaternary ammonium salt 21represents an alkyl group having 1 to 18 carbon atoms, preferably 2 to 10, or an aryl group having 6 to 18 carbon atoms, and examples thereof include linear alkyl groups such as ethyl, propyl, and butyl groups, as well as benzyl, cyclohexyl, cyclohexylmethyl, and dicyclopentadienyl groups. - ) is a chloride ion (Cl - ), bromide ion (Br - ), iodine ion (I - ) and carboxylate ions (-COO - ), sulfonate (-SO3 - ), alcoholate (-O - ) and other acid groups.

[0172] The compound of the above formula (D-2) is R 22 R 23 R 24 R 25 N + Y - The R of this quaternary ammonium salt is 22 , R 23 , R 24 and R 25 is an alkyl group having 1 to 18 carbon atoms or an aryl group having 6 to 18 carbon atoms. - ) is a chloride ion (Cl - ), bromide ion (Br - ), iodine ion (I - ) and carboxylate ions (-COO - ), sulfonate (-SO3 - ), alcoholate (-O - The quaternary ammonium salt is commercially available, and examples thereof include tetramethylammonium acetate, tetrabutylammonium acetate, triethylbenzylammonium chloride, triethylbenzylammonium bromide, trioctylmethylammonium chloride, tributylbenzylammonium chloride, and trimethylbenzylammonium chloride.

[0173] The compound of the above formula (D-3) is a quaternary ammonium salt derived from a 1-substituted imidazole, and R 26 and R 27 has 1 to 18 carbon atoms, and R 26 and R 27 The total number of carbon atoms in R is preferably 7 or more. 26 represents methyl, ethyl, propyl, phenyl, and benzyl groups, and R 27 Examples of the anion (Y - ) is a chloride ion (Cl - ), bromide ion (Br - ), iodine ion (I - ) and carboxylate ions (-COO - ), sulfonate (-SO3 - ), alcoholate (-O - Although this compound is commercially available, it can also be produced by reacting an imidazole compound such as 1-methylimidazole or 1-benzylimidazole with an alkyl halide or aryl halide such as benzyl bromide or methyl bromide.

[0174] The compound of the above formula (D-4) is a quaternary ammonium salt derived from pyridine, and R 28 is an alkyl group having 1 to 18 carbon atoms, preferably 4 to 18 carbon atoms, or an aryl group having 6 to 18 carbon atoms, and examples thereof include a butyl group, an octyl group, a benzyl group, and a lauryl group. - ) is a chloride ion (Cl - ), bromide ion (Br - ), iodine ion (I - ) and carboxylate ions (-COO - ), sulfonate (-SO3 - ), alcoholate (-O -) and other acid groups. This compound is commercially available, but can also be produced by reacting pyridine with an alkyl halide or aryl halide, such as lauryl chloride, benzyl chloride, benzyl bromide, methyl bromide, or octyl bromide. Examples of this compound include N-laurylpyridinium chloride and N-benzylpyridinium bromide.

[0175] The compound of the above formula (D-5) is a quaternary ammonium salt derived from a substituted pyridine, such as picoline, and R 29 R is an alkyl group having 1 to 18 carbon atoms, preferably 4 to 18 carbon atoms, or an aryl group having 6 to 18 carbon atoms, and examples thereof include a methyl group, an octyl group, a lauryl group, and a benzyl group. 30 is an alkyl group having 1 to 18 carbon atoms or an aryl group having 6 to 18 carbon atoms. For example, in the case of a quaternary ammonium derived from picoline, R 30 is a methyl group. - ) is a chloride ion (Cl - ), bromide ion (Br - ), iodine ion (I - ) and carboxylate ions (-COO - ), sulfonato (-SO3 - ), alcoholate (-O - ) and other acid groups. This compound is commercially available, but can also be produced by reacting a substituted pyridine such as picoline with an alkyl halide or aryl halide such as methyl bromide, octyl bromide, lauryl chloride, benzyl chloride, or benzyl bromide. Examples of this compound include N-benzylpicolinium chloride, N-benzylpicolinium bromide, and N-laurylpicolinium chloride.

[0176] The compound of the above formula (D-6) is a tertiary ammonium salt derived from an amine, where m is an integer of 2 to 11 and n is an integer of 2 to 3. - ) is a chloride ion (Cl -), bromide ion (Br - ), iodine ion (I - ) and carboxylate ions (-COO - ), sulfonate (-SO3 - ), alcoholate (-O - ) and other acid groups. This compound can be produced by reacting an amine with a weak acid such as a carboxylic acid or phenol. Examples of carboxylic acids include formic acid and acetic acid. When formic acid is used, an anion (Y - ) is (HCOO - ) and when acetic acid is used, the anion (Y - ) is (CH3COO - ) When phenol is used, the anion (Y - ) is (C6H5O - )

[0177] The compound of the above formula (D-7) is R 31 R 32 R 33 R 34 P + Y - It is a quaternary phosphonium salt having the structure: R 31 , R 32 , R 33 , and R 34 is an alkyl group having 1 to 18 carbon atoms or an aryl group having 6 to 18 carbon atoms, and preferably R 31 ~R 34 Of the four substituents, three are phenyl groups or substituted phenyl groups, such as phenyl groups and tolyl groups, and the remaining one is an alkyl group having 1 to 18 carbon atoms or an aryl group having 6 to 18 carbon atoms. - ) is a chloride ion (Cl - ), bromide ion (Br - ), iodine ion (I - ) and carboxylate ions (-COO - ), sulfonate (-SO3 - ), alcoholate (-O -Examples of such compounds include tetraalkylphosphonium halides such as tetra-n-butylphosphonium halide and tetra-n-propylphosphonium halide, trialkylbenzylphosphonium halides such as triethylbenzylphosphonium halide, triphenylmonoalkylphosphonium halides such as triphenylmethylphosphonium halide and triphenylethylphosphonium halide, triphenylbenzylphosphonium halides, tetraphenylphosphonium halides, tritolylmonoarylphosphonium halides, and tritolylmonoalkylphosphonium halides (all of which the halogen atom is a chlorine atom or a bromine atom). In particular, triphenylmonoalkylphosphonium halides such as triphenylmethylphosphonium halide and triphenylethylphosphonium halide, triphenylmonoarylphosphonium halides such as triphenylbenzylphosphonium halide, tritolylmonoarylphosphonium halides such as tritolylmonophenylphosphonium halide, and tritolylmonoalkylphosphonium halides (the halogen atom is a chlorine atom or a bromine atom) are preferred.

[0178] Examples of phosphines include primary phosphines such as methylphosphine, ethylphosphine, propylphosphine, isopropylphosphine, isobutylphosphine, and phenylphosphine; secondary phosphines such as dimethylphosphine, diethylphosphine, diisopropylphosphine, diisoamylphosphine, and diphenylphosphine; and tertiary phosphines such as trimethylphosphine, triethylphosphine, triphenylphosphine, methyldiphenylphosphine, and dimethylphenylphosphine.

[0179] The compound of the above formula (D-8) is R 35 R 36 R 37 S + Y - It is a tertiary sulfonium salt having the structure: R 35 , R36 , and R 37 is an alkyl group having 1 to 18 carbon atoms or an aryl group having 6 to 18 carbon atoms, and preferably R 35 ~R 37 Two of the three substituents are phenyl groups or substituted phenyl groups, such as phenyl groups and tolyl groups, and the remaining one is an alkyl group having 1 to 18 carbon atoms or an aryl group having 6 to 18 carbon atoms. - ) is a chloride ion (Cl - ), bromide ion (Br - ), iodine ion (I - ) and carboxylate ions (-COO - ), sulfonate (-SO3 - ), alcoholate (-O - Examples of suitable acid groups include trialkylsulfonium halides such as tri-n-butylsulfonium halides and tri-n-propylsulfonium halides, dialkylbenzylsulfonium halides such as diethylbenzylsulfonium halides, diphenylmonoalkylsulfonium halides such as diphenylmethylsulfonium halides and diphenylethylsulfonium halides, triphenylsulfonium halides (all of which the halogen atom is a chlorine atom or a bromine atom), trialkylsulfonium carboxylates such as tri-n-butylsulfonium carboxylate and tri-n-propylsulfonium carboxylate, dialkylbenzylsulfonium carboxylates such as diethylbenzylsulfonium carboxylate, diphenylmonoalkylsulfonium carboxylates such as diphenylmethylsulfonium carboxylate and diphenylethylsulfonium carboxylate, and triphenylsulfonium carboxylate. Furthermore, triphenylsulfonium halides and triphenylsulfonium carboxylates are preferably used.

[0180] In the present invention, a nitrogen-containing silane compound can be added as a curing catalyst, such as an imidazole ring-containing silane compound such as N-(3-triethoxysilylpropyl)-4,5-dihydroimidazole.

[0181] When a curing catalyst is used, the amount thereof is 0.01 to 10 parts by mass, or 0.01 to 5 parts by mass, or 0.01 to 3 parts by mass, relative to 100 parts by mass of the polysiloxane.

[0182] <<Stabilizers>> The stabilizer may be added for the purpose of stabilizing the hydrolysis condensate of the hydrolyzable silane mixture, and specific examples thereof include organic acids, water, alcohols, and combinations thereof. Examples of the organic acid include oxalic acid, malonic acid, methylmalonic acid, succinic acid, maleic acid, malic acid, tartaric acid, phthalic acid, citric acid, glutaric acid, lactic acid, and salicylic acid. Among these, oxalic acid and maleic acid are preferred. When an organic acid is added, the amount added is 0.1 to 5.0% by mass relative to the mass of the hydrolysis condensate of the hydrolyzable silane mixture. These organic acids can also function as pH adjusters. The water may be pure water, ultrapure water, ion-exchanged water, or the like. When used, the amount of water added may be 1 to 20 parts by mass per 100 parts by mass of the composition for forming a resist underlayer film. The alcohol is preferably one that easily evaporates (volatilizes) when heated after application, and examples include methanol, ethanol, propanol, i-propanol, butanol, etc. When an alcohol is added, the amount added can be 1 to 20 parts by mass per 100 parts by mass of the composition for forming a resist underlayer film.

[0183] <<Organic polymers>> The organic polymer compound can be added to the composition for forming a resist underlayer film to adjust the dry etching rate (amount of film thickness reduction per unit time) of the film (resist underlayer film) formed from the composition, as well as the attenuation coefficient, refractive index, etc. The organic polymer compound is not particularly limited and may be appropriately selected from various organic polymers (condensation polymerization polymers and addition polymerization polymers) depending on the purpose of addition. Specific examples thereof include addition polymerization polymers and condensation polymerization polymers such as polyester, polystyrene, polyimide, acrylic polymer, methacrylic polymer, polyvinyl ether, phenol novolak, naphthol novolak, polyether, polyamide, and polycarbonate. In the present invention, organic polymers containing aromatic rings or heteroaromatic rings such as benzene rings, naphthalene rings, anthracene rings, triazine rings, quinoline rings, and quinoxaline rings that function as light-absorbing moieties can also be used when such a function is required. Specific examples of such organic polymer compounds include, but are not limited to, addition polymerization polymers containing addition-polymerizable monomers such as benzyl acrylate, benzyl methacrylate, phenyl acrylate, naphthyl acrylate, anthryl methacrylate, anthrylmethyl methacrylate, styrene, hydroxystyrene, benzyl vinyl ether, and N-phenylmaleimide as structural units, and condensation polymerization polymers such as phenol novolac and naphthol novolac.

[0184] When an addition polymerization polymer is used as the organic polymer compound, the polymer compound may be either a homopolymer or a copolymer. An addition-polymerizable monomer is used to produce an addition-polymerized polymer. Specific examples of such addition-polymerizable monomers include, but are not limited to, acrylic acid, methacrylic acid, acrylic acid ester compounds, methacrylic acid ester compounds, acrylamide compounds, methacrylamide compounds, vinyl compounds, styrene compounds, maleimide compounds, maleic anhydride, and acrylonitrile.

[0185] Specific examples of acrylic acid ester compounds include, but are not limited to, methyl acrylate, ethyl acrylate, normal hexyl acrylate, i-propyl acrylate, cyclohexyl acrylate, benzyl acrylate, phenyl acrylate, anthrylmethyl acrylate, 2-hydroxyethyl acrylate, 3-chloro-2-hydroxypropyl acrylate, 2-hydroxypropyl acrylate, 2,2,2-trifluoroethyl acrylate, 2,2,2-trichloroethyl acrylate, 2-bromoethyl acrylate, 4-hydroxybutyl acrylate, 2-methoxyethyl acrylate, tetrahydrofurfuryl acrylate, 2-methyl-2-adamantyl acrylate, 5-acryloyloxy-6-hydroxynorbornene-2-carboxylic-6-lactone, 3-acryloxypropyltriethoxysilane, and glycidyl acrylate.

[0186] Specific examples of methacrylic acid ester compounds include, but are not limited to, methyl methacrylate, ethyl methacrylate, normal hexyl methacrylate, i-propyl methacrylate, cyclohexyl methacrylate, benzyl methacrylate, phenyl methacrylate, anthrylmethyl methacrylate, 2-hydroxyethyl methacrylate, 2-hydroxypropyl methacrylate, 2,2,2-trifluoroethyl methacrylate, 2,2,2-trichloroethyl methacrylate, 2-bromoethyl methacrylate, 4-hydroxybutyl methacrylate, 2-methoxyethyl methacrylate, tetrahydrofurfuryl methacrylate, 2-methyl-2-adamantyl methacrylate, 5-methacryloyloxy-6-hydroxynorbornene-2-carboxylic-6-lactone, 3-methacryloxypropyltriethoxysilane, glycidyl methacrylate, 2-phenylethyl methacrylate, hydroxyphenyl methacrylate, and bromophenyl methacrylate.

[0187] Specific examples of acrylamide compounds include, but are not limited to, acrylamide, N-methylacrylamide, N-ethylacrylamide, N-benzylacrylamide, N-phenylacrylamide, N,N-dimethylacrylamide, and N-anthrylacrylamide.

[0188] Specific examples of methacrylamide compounds include, but are not limited to, methacrylamide, N-methylmethacrylamide, N-ethylmethacrylamide, N-benzylmethacrylamide, N-phenylmethacrylamide, N,N-dimethylmethacrylamide, and N-anthrylmethacrylamide.

[0189] Specific examples of vinyl compounds include, but are not limited to, vinyl alcohol, 2-hydroxyethyl vinyl ether, methyl vinyl ether, ethyl vinyl ether, benzyl vinyl ether, vinyl acetate, vinyltrimethoxysilane, 2-chloroethyl vinyl ether, 2-methoxyethyl vinyl ether, vinylnaphthalene, and vinylanthracene.

[0190] Specific examples of styrene compounds include, but are not limited to, styrene, hydroxystyrene, chlorostyrene, bromostyrene, methoxystyrene, cyanostyrene, and acetylstyrene.

[0191] Examples of maleimide compounds include, but are not limited to, maleimide, N-methylmaleimide, N-phenylmaleimide, N-cyclohexylmaleimide, N-benzylmaleimide, and N-hydroxyethylmaleimide.

[0192] When a condensation polymerization polymer is used as the polymer, examples of such a polymer include condensation polymerization polymers of a glycol compound and a dicarboxylic acid compound. Examples of glycol compounds include diethylene glycol, hexamethylene glycol, butylene glycol, etc. Examples of dicarboxylic acid compounds include succinic acid, adipic acid, terephthalic acid, maleic anhydride, etc. Other examples include, but are not limited to, polyesters, polyamides, and polyimides such as polypyromellitimide, poly(p-phenylene terephthalamide), polybutylene terephthalate, and polyethylene terephthalate. When the organic polymer compound contains a hydroxy group, this hydroxy group can undergo a crosslinking reaction with a hydrolysis condensate or the like.

[0193] The weight-average molecular weight of the organic polymer compound can usually be 1,000 to 1,000,000. When an organic polymer compound is incorporated, the weight-average molecular weight can be, for example, 3,000 to 300,000, 5,000 to 300,000, or 10,000 to 200,000, from the viewpoint of suppressing precipitation in the composition while fully obtaining the functional effect of the polymer. Such organic polymer compounds may be used alone or in combination of two or more.

[0194] When the composition for forming a resist underlayer film of the present invention contains an organic polymer compound, its content cannot be generally specified because it is determined appropriately in consideration of the function and the like of the organic polymer compound. However, it can usually be in the range of 1 to 200 mass% relative to the mass of the hydrolysis condensate of the hydrolyzable silane mixture. From the viewpoint of suppressing precipitation in the composition, it can be, for example, 100 mass% or less, preferably 50 mass% or less, and more preferably 30 mass% or less. From the viewpoint of fully obtaining the effect, it can be, for example, 5 mass% or more, preferably 10 mass% or more, and more preferably 30 mass% or more.

[0195] <<Acid generator>> Examples of the acid generator include a thermal acid generator and a photoacid generator, and a photoacid generator is preferably used. Examples of the photoacid generator include, but are not limited to, onium salt compounds, sulfonimide compounds, and disulfonyldiazomethane compounds. Examples of the thermal acid generator include, but are not limited to, tetramethylammonium nitrate.

[0196] Specific examples of the onium salt compound include iodonium salt compounds such as diphenyliodonium hexafluorophosphate, diphenyliodonium trifluoromethanesulfonate, diphenyliodonium nonafluoro-normal butanesulfonate, diphenyliodonium perfluoro-normal octanesulfonate, diphenyliodonium camphorsulfonate, bis(4-t-butylphenyl)iodonium camphorsulfonate, and bis(4-t-butylphenyl)iodonium trifluoromethanesulfonate; and sulfonium salt compounds such as triphenylsulfonium hexafluoroantimonate, triphenylsulfonium nonafluoro-normal butanesulfonate, triphenylsulfonium camphorsulfonate, triphenylsulfonium trifluoromethanesulfonate, triphenylsulfonium nitrate, triphenylsulfonium trifluoroacetate, triphenylsulfonium maleate, and triphenylsulfonium chloride. However, the present invention is not limited to these compounds.

[0197] Specific examples of the sulfonimide compound include, but are not limited to, N-(trifluoromethanesulfonyloxy)succinimide, N-(nonafluoronormalbutanesulfonyloxy)succinimide, N-(camphorsulfonyloxy)succinimide, and N-(trifluoromethanesulfonyloxy)naphthalimide.

[0198] Specific examples of the disulfonyldiazomethane compound include, but are not limited to, bis(trifluoromethylsulfonyl)diazomethane, bis(cyclohexylsulfonyl)diazomethane, bis(phenylsulfonyl)diazomethane, bis(p-toluenesulfonyl)diazomethane, bis(2,4-dimethylbenzenesulfonyl)diazomethane, methylsulfonyl-p-toluenesulfonyldiazomethane, and the like.

[0199] When the composition for forming a resist underlayer film of the present invention contains an acid generator, its content cannot be generally specified because it is determined appropriately taking into consideration the type of acid generator and the like. However, it is usually in the range of 0.01 to 5 mass % relative to the mass of the hydrolysis condensate of the hydrolyzable silane mixture. From the viewpoint of inhibiting precipitation of the acid generator in the composition, the content is preferably 3 mass % or less, more preferably 1 mass % or less, and from the viewpoint of fully obtaining its effects, the content is preferably 0.1 mass % or more, more preferably 0.5 mass % or more. The acid generators may be used alone or in combination of two or more kinds, and a photoacid generator and a thermal acid generator may be used in combination.

[0200] <<Surfactants>> The surfactant is effective in suppressing the occurrence of pinholes, striations, etc. when the composition for forming a resist underlayer film is applied to a substrate. Examples of the surfactant include nonionic surfactants, anionic surfactants, cationic surfactants, silicone surfactants, fluorine-based surfactants, and UV-curable surfactants. More specifically, examples of the surfactant include polyoxyethylene alkyl ethers such as polyoxyethylene lauryl ether, polyoxyethylene stearyl ether, polyoxyethylene cetyl ether, and polyoxyethylene oleyl ether; polyoxyethylene alkylaryl ethers such as polyoxyethylene octylphenol ether and polyoxyethylene nonylphenol ether; polyoxyethylene-polyoxypropylene block copolymers; sorbitan fatty acid esters such as sorbitan monolaurate, sorbitan monopalmitate, sorbitan monostearate, sorbitan monooleate, sorbitan trioleate, and sorbitan tristearate; polyoxyethylene sorbitan monolaurate, polyoxyethylene sorbitan monopalmitate, polyoxyethylene sorbitan monostearate, and polyoxyethylene sorbitan tristearate; Nonionic surfactants such as polyoxyethylene sorbitan fatty acid esters such as oleate and polyoxyethylene sorbitan tristearate, trade names F-Top (registered trademark) EF301, EF303, EF352 (manufactured by Mitsubishi Materials Electronic Chemicals Co., Ltd. (formerly Tochem Products Co., Ltd.)), trade names Megafac (registered trademark) F171, F173, R-08, R-30, R-30N, R-40LM (manufactured by DIC Corporation), Fluorad F Examples of suitable surfactants include, but are not limited to, fluorine-based surfactants such as C430 and FC431 (manufactured by 3M Japan Limited), Asahi Guard (registered trademark) AG710 (manufactured by AGC Corporation), Surflon (registered trademark) S-382, SC101, SC102, SC103, SC104, SC105, and SC106 (manufactured by AGC Seimi Chemical Co., Ltd.), and organosiloxane polymer KP341 (manufactured by Shin-Etsu Chemical Co., Ltd.). The surfactants can be used alone or in combination of two or more.

[0201] When the composition for forming a resist underlayer film of the present invention contains a surfactant, the content thereof can be typically 0.0001 to 5 mass %, preferably 0.001 to 4 mass %, and more preferably 0.01 to 3 mass %, relative to the mass of the hydrolysis condensate of the hydrolyzable silane mixture.

[0202] <<Rheology modifier>> The rheology adjuster is added mainly to improve the fluidity of the composition for forming a resist underlayer film, and particularly in the baking process, to improve the film thickness uniformity of the formed film and the filling ability of the composition into holes. Specific examples include phthalic acid derivatives such as dimethyl phthalate, diethyl phthalate, di-i-butyl phthalate, dihexyl phthalate, and butyl i-decyl phthalate, adipic acid derivatives such as di-n-butyl adipate, di-i-butyl adipate, di-i-octyl adipate, and octyldecyl adipate, maleic acid derivatives such as di-n-butyl maleate, diethyl maleate, and dinonyl maleate, oleic acid derivatives such as methyl oleate, butyl oleate, and tetrahydrofurfuryl oleate, and stearic acid derivatives such as n-butyl stearate and glyceryl stearate. When these rheology adjusters are used, the amount added is usually less than 30 mass % based on the total solid content of the composition for forming a resist underlayer film.

[0203] <<Adhesion aid>> The above adhesion promoter is mainly added for the purpose of improving the adhesion between the substrate or resist and the film (resist underlayer film) formed from the composition for forming the resist underlayer film, and particularly suppressing and preventing the peeling of the resist during development. Specific examples include chlorosilanes such as trimethylchlorosilane, dimethylvinylchlorosilane, methyldiphenylchlorosilane, chloromethyldimethylchlorosilane, etc., alkoxysilanes such as trimethylmethoxysilane, dimethyldiethoxysilane, methyldimethoxysilane, dimethylvinylethoxysilane, etc., silazanes such as hexamethyldisilazane, N,N'-bis(trimethylsilyl)urea, dimethyltrimethylsilylamine, trimethylsilylimidazole, etc., other silanes such as γ-chloropropyltrimethoxysilane, γ-aminopropyltriethoxysilane, γ-glycidoxypropyltrimethoxysilane, etc., heterocyclic compounds such as benzotriazole, benzimidazole, indazole, imidazole, 2-mercaptobenzimidazole, 2-mercaptobenzothiazole, 2-mercaptobenzoxazole, urazole, thiouracil, mercaptoimidazole, mercaptopyrimidine, etc., ureas such as 1,1-dimethylurea, 1,3-dimethylurea, or thiourea compounds. When these adhesion promoters are used, the addition amount is usually less than 5% by mass, preferably less than 2% by mass, based on the total solid content of the composition for forming the resist underlayer film.

[0204] <<pH Adjusting Agent>> In addition, as the pH adjusting agent, in addition to acids having one or more carboxyl groups such as the organic acids mentioned as the above <stabilizer>, bisphenol S or a bisphenol S derivative can be added. Bisphenol S or a bisphenol S derivative is 0.01 to 20 parts by mass, or 0.01 to 10 parts by mass, or 0.01 to 5 parts by mass, based on 100 parts by mass of the hydrolyzate of the above hydrolyzable silane mixture.

[0205] Hereinafter, specific examples of bisphenol S and bisphenol S derivatives are given, but are not limited thereto.

[0206] [ka]

[0207] The concentration of the solid content in the composition for forming a resist underlayer film can be, for example, 0.1 to 50 mass%, 0.1 to 30 mass%, 0.1 to 25 mass%, or 0.5 to 20.0 mass% relative to the total mass of the composition. The solid content refers to all components of the composition excluding the solvent component. The content of the hydrolysis condensate of the hydrolyzable silane mixture in the solid content is usually 20% by mass to 100% by mass. From the viewpoint of reproducibly obtaining the above-mentioned effects of the present invention, the lower limit is preferably 50% by mass, more preferably 60% by mass, even more preferably 70% by mass, and even more preferably 80% by mass, and the upper limit is preferably 99% by mass, with the remainder being made up of a specific additive (compound A) described below and other components. The content of the hydrolysis condensate of the hydrolyzable silane mixture in the composition can be, for example, 0.5 to 20.0% by mass. The composition for forming a resist underlayer film preferably has a pH of 2 to 5, and more preferably a pH of 3 to 4.

[0208] The composition for forming a resist underlayer film can be produced by mixing the hydrolysis condensate of the hydrolyzable silane mixture, a solvent, and, if desired, a specific additive (compound A) and other components, if any, with the specific additive (compound A) and other components. In this case, a solution containing the hydrolysis condensate and the like may be prepared in advance, and this solution may be mixed with the solvent, the specific additive (compound A), and other components. The order of mixing is not particularly limited. For example, a solvent may be added to a solution containing the hydrolyzed condensate or the like and mixed, and then the specific additive (compound A) and other components may be added to the mixture, or the solution containing the hydrolyzed condensate or the like, the solvent, the specific additive (compound A) and other components may be mixed simultaneously. If necessary, additional solvent may be added at the end, or some components that are relatively soluble in the solvent may be left out of the mixture and added at the end. However, from the viewpoint of suppressing aggregation or separation of the constituent components and reproducibly preparing a composition with excellent uniformity, it is preferable to prepare a solution in which the hydrolyzed condensate, etc. is well dissolved in advance and use this to prepare the composition. Note that the hydrolyzed condensate, etc. may aggregate or precipitate when mixed depending on the type and amount of the solvent to be mixed with it, the amount and properties of other components, etc. In addition, when preparing a composition using a solution in which the hydrolyzed condensate, etc. is dissolved, it is also important to note that the concentration and amount of the solution of the hydrolyzed condensate, etc. must be determined so that the desired amount of the hydrolyzed condensate, etc. is contained in the final composition. In preparing the composition, heating may be carried out as appropriate within a range that does not cause decomposition or deterioration of the components.

[0209] In the present invention, the composition for forming a resist underlayer film may be filtered using a submicrometer-order filter or the like during the production process or after all components have been mixed.

[0210] The composition for forming a resist underlayer film of the present invention can be suitably used as a composition for forming a resist underlayer film used in a lithography process.

[0211] (Silicon-containing resist underlayer film-forming composition of the second embodiment) The composition for forming a resist underlayer film of the present invention is a hydrolysis condensate of a hydrolyzable silane mixture and a cation AX + and anion AZ - and a specific additive (compound A) having a chemical structure comprising: A composition for forming a resist underlayer film containing a hydrolysis condensate (polysiloxane) of a hydrolyzable silane mixture, and a cationic AX + and anion AZ - By incorporating a specific additive (compound A) having a chemical structure containing the following, it is possible to form a resist underlayer film that exhibits excellent solubility in alkaline solutions (basic chemical solutions).

[0212] <Hydrolyzed condensation product of hydrolyzable silane mixture> The hydrolyzable silane that forms the hydrolyzed condensate of the hydrolyzable silane mixture contained in the composition for forming a silicon-containing resist underlayer film of the second embodiment is not particularly limited, and all of the silane compounds (hydrolyzable silanes) described in the section "Hydrolyzed condensate of hydrolyzable silane mixture" above (Composition for forming a silicon-containing resist underlayer film of the first embodiment) can be used. That is, the composition may contain any of the hydrolyzable silanes represented by formula (1), (2), (3), (4), and (5), or may contain hydrolyzed silanes other than those represented by these formulas. The difference between the hydrolyzed condensate of the second embodiment and the hydrolyzed condensate of the first embodiment is that the type of hydrolyzable silane contained in the hydrolyzable silane mixture is specified to contain a specific hydrolyzable silane in the first embodiment, whereas there is no particular limitation in the second embodiment. Since the inclusion of a specific additive (compound A) in the composition for forming a resist underlayer film can improve the solubility of the resist underlayer film in an alkaline solution (basic chemical solution), there is no particular limitation in the type of hydrolyzable silane contained in the hydrolyzable silane mixture in the second embodiment. Any hydrolyzable silane can be used in the second embodiment. As the "hydrolyzed condensate of hydrolyzable silane mixture" in the second embodiment, various hydrolyzable silanes described in the section <Hydrolyzed condensate of hydrolyzable silane mixture> above in the composition for forming a silicon-containing resist underlayer film of the first embodiment can be used.

[0213] <Specific additive (compound A)> The "specific additive (compound A)" ​​in the second embodiment is as described in the section <Specific additive (compound A)> above in the composition for forming a silicon-containing resist underlayer film of the first embodiment.

[0214] The composition for forming a resist underlayer film of the second embodiment can also contain a solvent and other components in addition to the hydrolysis condensate (polysiloxane) of the hydrolyzable silane mixture and the specific additive (compound A).

[0215] <Solvent> The "solvent" in the second embodiment is as described in the <Solvent> section above (composition for forming a silicon-containing resist underlayer film of the first embodiment).

[0216] <Other ingredients (other additives)> The "other components" in the second embodiment are as described in the <Other components (other additives)> section above in the (first embodiment of the composition for forming a silicon-containing resist underlayer film) above.

[0217] The solids concentration and preferred pH value of the composition for forming a resist underlayer film in the second embodiment, and the method for producing the composition for forming a resist underlayer film are as described above in the section (Composition for forming a silicon-containing resist underlayer film of the first embodiment).

[0218] [Pattern formation method and semiconductor device manufacturing method] Hereinafter, as one embodiment of the present invention, a pattern forming method using the composition for forming a resist underlayer film of the present invention and a method for manufacturing a semiconductor device will be described.

[0219] First, the resist underlayer film-forming composition of the present invention is applied onto a substrate used in the manufacture of precision integrated circuit devices (e.g., semiconductor substrates such as silicon wafers coated with silicon oxide films, silicon nitride films, or silicon oxynitride films, silicon nitride substrates, quartz substrates, glass substrates (including alkali-free glass, low-alkali glass, and crystallized glass), glass substrates with ITO (indium tin oxide) films or IZO (indium zinc oxide) films, plastic (polyimide, PET, etc.) substrates, low-dielectric constant material (low-k material)-coated substrates, flexible substrates, etc.) by a suitable application method such as a spinner or coater, and then the composition is cured by baking using a heating means such as a hot plate to form a resist underlayer film. In this specification, the resist underlayer film refers to a film formed from the resist underlayer film-forming composition of the present invention. The firing conditions are appropriately selected from a firing temperature of 40° C. to 400° C. or 80° C. to 250° C. and a firing time of 0.3 to 60 minutes. Preferably, the firing temperature is 150° C. to 250° C. and the firing time is 0.5 to 2 minutes. The thickness of the resist underlayer film formed here is, for example, 10 nm to 1,000 nm, or 20 nm to 500 nm, or 50 nm to 300 nm, or 100 nm to 200 nm, or 10 to 150 nm.

[0220] In the present invention, an organic underlayer film is formed on the substrate, and then the resist underlayer film is formed thereon. However, in some cases, an organic underlayer film may not be provided. The organic underlayer film used here is not particularly limited, and any film that has been conventionally used in the lithography process can be selected and used. By providing an organic underlayer film on a substrate, a resist underlayer film thereon, and a resist film (described later) thereon, the pattern width of the photoresist film is narrowed, and even when the photoresist film is thinly coated to prevent pattern collapse, the substrate can be processed by selecting an appropriate etching gas (described later). For example, the resist underlayer film of the present invention can be processed using a fluorine-based gas having a sufficiently high etching rate for the photoresist film as an etching gas, and the organic underlayer film can be processed using an oxygen-based gas having a sufficiently high etching rate for the resist underlayer film of the present invention as an etching gas, and the substrate can be processed using a fluorine-based gas having a sufficiently high etching rate for the organic underlayer film as an etching gas. The substrate and coating method that can be used in this case are the same as those described above.

[0221] Next, for example, a layer of a photoresist material (resist film) is formed on the resist underlayer film. The resist film can be formed by a well-known method, that is, by applying a coating-type resist material (for example, a photoresist film-forming composition) on the resist underlayer film and baking it. The thickness of the resist film is, for example, 10 nm to 10,000 nm, or 100 nm to 2,000 nm, or 200 nm to 1,000 nm, or 30 nm to 200 nm.

[0222] The photoresist material used in the resist film formed on the resist underlayer film is not particularly limited as long as it is sensitive to the light used for exposure (e.g., KrF excimer laser, ArF excimer laser, etc.), and both negative and positive photoresist materials can be used. Examples include a positive photoresist material composed of a novolak resin and a 1,2-naphthoquinone diazide sulfonic acid ester, a chemically amplified photoresist material composed of a binder having a group that decomposes in the presence of an acid to increase the alkaline dissolution rate and a photoacid generator, a chemically amplified photoresist material composed of a low-molecular-weight compound that decomposes in the presence of an acid to increase the alkaline dissolution rate of the photoresist material, an alkali-soluble binder, and a photoacid generator, and a chemically amplified photoresist material composed of a binder having a group that decomposes in the presence of an acid to increase the alkaline dissolution rate, a low-molecular-weight compound that decomposes in the presence of an acid to increase the alkaline dissolution rate of the photoresist material, and a photoacid generator. Specific examples of commercially available products include, but are not limited to, APEX-E (trade name) manufactured by Shipley, PAR710 (trade name) manufactured by Sumitomo Chemical Co., Ltd., AR2772JN (trade name) manufactured by JSR Corporation, and SEPR430 (trade name) manufactured by Shin-Etsu Chemical Co., Ltd. Other examples include fluorine-containing polymer photoresist materials such as those described in Proc. SPIE, Vol. 3999, 330-334 (2000), Proc. SPIE, Vol. 3999, 357-364 (2000), and Proc. SPIE, Vol. 3999, 365-374 (2000).

[0223] Furthermore, for the resist film formed on the resist underlayer film, a resist film for electron beam lithography (also referred to as an electron beam resist film) or a resist film for EUV lithography (also referred to as an EUV resist film) can be used instead of a photoresist film. That is, the composition for forming a silicon-containing resist underlayer film of the present invention can be used for forming a resist underlayer film for electron beam lithography or a resist underlayer film for EUV lithography. The composition is particularly suitable as a composition for forming a resist underlayer film for EUV lithography. The electron beam resist material can be either a negative-working material or a positive-working material. Specific examples include chemically amplified resist materials comprising an acid generator and a binder having a group that decomposes in the presence of an acid to change the alkaline dissolution rate; chemically amplified resist materials comprising an alkali-soluble binder, an acid generator, and a low-molecular-weight compound that decomposes in the presence of an acid to change the alkaline dissolution rate of the resist material; chemically amplified resist materials comprising an acid generator, a binder having a group that decomposes in the presence of an acid to change the alkaline dissolution rate, and a low-molecular-weight compound that decomposes in the presence of an acid to change the alkaline dissolution rate of the resist material; non-chemically amplified resist materials comprising a binder having a group that decomposes in the presence of an electron beam to change the alkaline dissolution rate; and non-chemically amplified resist materials comprising a binder having a moiety that is cleaved by an electron beam to change the alkaline dissolution rate. When using these electron beam resist materials, resist film patterns can be formed in the same way as when using a photoresist material with an electron beam as the irradiation source. Furthermore, as the EUV resist material, a methacrylate resin-based resist material can be used.

[0224] Next, the resist film formed on the upper layer of the resist underlayer film is exposed through a predetermined mask (reticle). For exposure, a KrF excimer laser (wavelength 248 nm), an ArF excimer laser (wavelength 193 nm), an F2 excimer laser (wavelength 157 nm), EUV (wavelength 13.5 nm), an electron beam, or the like can be used. After exposure, post-exposure baking may be carried out as needed, under conditions appropriately selected from a heating temperature of 70° C. to 150° C. and a heating time of 0.3 to 10 minutes.

[0225] Next, development is carried out using a developer (e.g., an alkaline developer). As a result, if a positive photoresist film is used, the exposed portions of the photoresist film are removed, and a pattern of the photoresist film is formed. Examples of the developer (alkaline developer) include aqueous solutions of alkali metal hydroxides such as potassium hydroxide and sodium hydroxide, aqueous solutions of quaternary ammonium hydroxides such as tetramethylammonium hydroxide, tetraethylammonium hydroxide, and choline, and aqueous solutions of amines such as ethanolamine, propylamine, and ethylenediamine. Furthermore, surfactants and the like can be added to these developers. The development conditions are appropriately selected from a temperature of 5 to 50°C and a development time of 10 to 600 seconds.

[0226] In the present invention, an organic solvent can be used as a developer, and development is carried out with the developer (solvent) after exposure. As a result, when a negative photoresist film is used, for example, the photoresist film in the unexposed areas is removed, and a photoresist film pattern is formed. Examples of the developer (organic solvent) include methyl acetate, butyl acetate, ethyl acetate, isopropyl acetate, amyl acetate, isoamyl acetate, ethyl methoxyacetate, ethyl ethoxyacetate, propylene glycol monomethyl ether acetate, ethylene glycol monoethyl ether acetate, ethylene glycol monopropyl ether acetate, ethylene glycol monobutyl ether acetate, ethylene glycol monophenyl ether acetate, diethylene glycol monomethyl ether acetate, diethylene glycol monopropyl ether acetate, diethylene glycol monoethyl ether acetate, diethylene glycol monophenyl ether acetate, diethylene glycol monobutyl ether acetate, diethylene glycol monoethyl ether acetate, 2-methoxybutyl acetate, 3-methoxybutyl acetate, 4-methoxybutyl acetate, 3-methyl-3-methoxybutyl acetate, 3-ethyl-3-methoxybutyl acetate, propylene glycol monomethyl ether acetate, propylene glycol monoethyl ether acetate, propylene glycol Monopropyl ether acetate, 2-ethoxybutyl acetate, 4-ethoxybutyl acetate, 4-propoxybutyl acetate, 2-methoxypentyl acetate, 3-methoxypentyl acetate, 4-methoxypentyl acetate, 2-methyl-3-methoxypentyl acetate, 3-methyl-3-methoxypentyl acetate, 3-methyl-4-methoxypentyl acetate, 4-methyl-4-methoxypentyl acetate, propylene glycol diacetate, methyl formate, ethyl formate, butyl formate, propyl formate, ethyl lactate, butyl lactate Examples of the alkyl esters include methyl acetoacetate, propyl lactate, ethyl carbonate, propyl carbonate, butyl carbonate, methyl pyruvate, ethyl pyruvate, propyl pyruvate, butyl pyruvate, methyl acetoacetate, ethyl acetoacetate, methyl propionate, ethyl propionate, propyl propionate, isopropyl propionate, methyl 2-hydroxypropionate, ethyl 2-hydroxypropionate, methyl-3-methoxypropionate, ethyl-3-methoxypropionate, ethyl-3-ethoxypropionate, and propyl-3-methoxypropionate.Furthermore, a surfactant may be added to these developers. The development conditions are appropriately selected from the temperature range of 5° C. to 50° C. and the development time range of 10 seconds to 600 seconds.

[0227] The resist underlayer film (middle layer) is removed using the pattern of the photoresist film (upper layer) thus formed as a protective film, then the organic underlayer film (lower layer) is removed using the film consisting of the patterned photoresist film and the patterned resist underlayer film (middle layer) as a protective film, and finally the substrate is processed using the patterned photoresist film (upper layer), the patterned resist underlayer film (middle layer), and the patterned organic underlayer film (lower layer) as protective films.

[0228] The removal of the resist underlayer film (middle layer), which is carried out using the pattern of the resist film (upper layer) as a protective film, is carried out by dry etching, and gases such as tetrafluoromethane (CF4), perfluorocyclobutane (C4F8), perfluoropropane (C3F8), trifluoromethane, carbon monoxide, argon, oxygen, nitrogen, sulfur hexafluoride, difluoromethane, nitrogen trifluoride, chlorine trifluoride, chlorine, trichloroborane, and dichloroborane can be used. It is preferable to use a halogen-based gas for dry etching of the resist underlayer film. Resist films (photoresist films) made of organic substances are generally difficult to remove with dry etching using a halogen-based gas. In contrast, silicon-containing resist underlayer films containing a large amount of silicon atoms are quickly removed with a halogen-based gas. Therefore, it is possible to suppress the reduction in the thickness of the photoresist film that accompanies dry etching of the resist underlayer film. As a result, it is possible to use a thin photoresist film. Therefore, it is preferable to use a fluorine-based gas for dry etching of the resist underlayer film. Examples of fluorine-based gases include, but are not limited to, tetrafluoromethane (CF), perfluorocyclobutane (C), perfluoropropane (C, F), trifluoromethane, and difluoromethane (CH, F).

[0229] When an organic underlayer film is present between the substrate and the resist underlayer film, the organic underlayer film (lower layer) is then preferably removed using the patterned resist underlayer film (middle layer) (and the patterned resist film (upper layer), if any) as a protective film by dry etching with an oxygen-based gas (oxygen gas, oxygen / carbonyl sulfide (COS) mixed gas, etc.) because the resist underlayer film of the present invention, which contains a large amount of silicon atoms, is difficult to remove by dry etching with an oxygen-based gas.

[0230] Finally, the processing of the (semiconductor) substrate using the patterned resist underlayer film (intermediate layer) and, if desired, the patterned organic underlayer film (underlayer) as protective films is preferably carried out by dry etching using a fluorine-based gas. Examples of fluorine-based gases include tetrafluoromethane (CF4), perfluorocyclobutane (C4F8), perfluoropropane (C3F8), trifluoromethane, and difluoromethane (CH2F2).

[0231] In the present invention, the resist underlayer film can be removed using a chemical solution after the step of etching (removing) the organic underlayer film. The removal of the resist underlayer film using a chemical solution can also be performed after processing the substrate with the patterned organic underlayer film. In the present invention, by using a composition for forming a resist underlayer film containing the above-mentioned hydrolysis condensation product (polysiloxane), the solubility of a film formed from the condensation product can be increased under alkaline conditions. For example, the film exhibits excellent solubility in alkaline solutions (basic chemical solutions) such as aqueous solutions containing ammonia and hydrogen peroxide. Therefore, the film exhibits good strippability when treated with an alkaline solution, and even silicon-based mask residues, such as silicon-containing resist underlayer films, can be easily removed using a chemical solution, allowing the production of semiconductor devices with minimal substrate damage. Examples of the chemical solution include alkaline solutions such as dilute hydrofluoric acid, buffered hydrofluoric acid, an aqueous solution containing hydrochloric acid and hydrogen peroxide (SC-2 chemical solution), an aqueous solution containing sulfuric acid and hydrogen peroxide (SPM chemical solution), an aqueous solution containing hydrofluoric acid and hydrogen peroxide (FPM chemical solution), and an aqueous solution containing ammonia and hydrogen peroxide (SC-1 chemical solution), and the use of alkaline chemical solutions (basic chemical solutions) is preferable from the viewpoint of minimizing the effect on the substrate. Examples of the alkaline solution include the aforementioned ammonia hydrogen peroxide solution (SC-1 chemical solution) obtained by mixing ammonia, hydrogen peroxide, and water, as well as aqueous solutions containing 1 to 99 mass% of ammonia, tetramethylammonium hydroxide, tetraethylammonium hydroxide, tetrapropylammonium hydroxide, tetrabutylammonium hydroxide, choline hydroxide, benzyltrimethylammonium hydroxide, benzyltriethylammonium hydroxide, DBU (diazabicycloundecene), DBN (diazabicyclononene), hydroxylamine, 1-butyl-1-methylpyrrolidinium hydroxide, 1-propyl-1-methylpyrrolidinium hydroxide, 1-butyl-1-methylpiperidinium hydroxide, 1-propyl-1-methylpiperidinium hydroxide, mepicato hydroxide, trimethylsulfonium hydroxide, hydrazines, ethylenediamines, or guanidine.

[0232] An organic antireflective coating can be formed on the resist underlayer before the formation of the resist film. The antireflective coating composition used therein is not particularly limited, and can be selected from those conventionally used in lithography processes. The antireflective coating can be formed by a conventional method, such as coating with a spinner or coater and baking.

[0233] Furthermore, the substrate onto which the resist underlayer film-forming composition of the present invention is applied may have an organic or inorganic antireflective film formed on its surface by a CVD method or the like, and the resist underlayer film may be formed thereon. Even when an organic underlayer film is formed on a substrate and then the resist underlayer film of the present invention is formed thereon, the substrate used may have an organic or inorganic antireflective film formed on its surface by a CVD method or the like.

[0234] The resist underlayer film formed from the composition for forming a resist underlayer film of the present invention may also absorb light, depending on the wavelength of light used in the lithography process, and in such cases, can function as an antireflection film that has the effect of preventing light from being reflected from the substrate. Furthermore, the resist underlayer film can also be used as a layer for preventing interaction between the substrate and the resist film (such as a photoresist film), a layer having a function of preventing adverse effects on the substrate of materials used in the resist film or substances generated during exposure of the resist film, a layer having a function of preventing diffusion of substances generated from the substrate during heating and baking into the upper resist film, and a barrier layer for reducing the poisoning effect of the resist film due to the dielectric layer of the semiconductor substrate.

[0235] The resist underlayer film can be applied to a substrate having via holes formed therein for use in a dual damascene process, and can be used as a hole filling material (embedding material) capable of filling the holes without gaps, and can also be used as a planarizing material for planarizing the surface of an uneven semiconductor substrate. Furthermore, the resist underlayer film can be used as an underlayer film of an EUV resist film, not only functioning as a hard mask, but also as an underlayer anti-reflection film of an EUV resist film, which can prevent reflection from the substrate or interface of undesirable exposure light, such as UV (ultraviolet) light or DUV (deep ultraviolet) light (ArF light, KrF light), during EUV exposure (wavelength 13.5 nm), without intermixing with the EUV resist film. That is, it can efficiently prevent reflection as an underlayer of an EUV resist film. When used as an EUV resist underlayer film, the process can be carried out in the same way as for an underlayer film for a photoresist.

[0236] The semiconductor processing substrate comprising the resist underlayer film of the present invention and a semiconductor substrate as described above can be used to suitably process the semiconductor substrate. Furthermore, as described above, according to the method for manufacturing a semiconductor device, which includes the steps of forming an organic underlayer film, forming a silicon-containing resist underlayer film on the organic underlayer film using the composition for forming a silicon-containing resist underlayer film of the present invention, and forming a resist film on the silicon-containing resist underlayer film, highly accurate processing of a semiconductor substrate can be realized with good reproducibility, and stable manufacturing of semiconductor devices can be expected. [Example]

[0237] The contents and effects of the present invention will be explained in more detail below with reference to examples, but the present invention is not limited to these examples. The hydrolysis condensation product (polyorganosiloxane) of the above hydrolyzable silane can have a weight-average molecular weight of 1,000 to 1,000,000 or 1,000 to 100,000. These molecular weights are determined by GPC analysis in terms of polystyrene. The GPC measurement conditions may be, for example, a GPC apparatus (trade name HLC-8220GPC, manufactured by Tosoh Corporation), a GPC column (trade names Shodex (registered trademark) KF803L, KF802, KF801, manufactured by Showa Denko K.K.), a column temperature of 40°C, an eluent (elution solvent) of tetrahydrofuran, a flow rate (flow velocity) of 1.0 mL / min, and a standard sample of polystyrene (manufactured by Showa Denko K.K.).

[0238] [1] Synthesis Examples 1 to 11 and Comparative Synthesis Examples 1 to 2: Synthesis of Hydrolysis Condensation Products (Polysiloxanes) Compounds 1 to 8 used in each synthesis are shown below.

[0239] [ka] In the above formula, Me represents a methyl group and Et represents an ethyl group.

[0240] <Synthesis Example 1> 20.8 g of compound 1, 21.9 g of compound 2, 8.8 g of compound 3, 0.1 g of compound 4, 0.9 g of compound 5, and 83 g of 1-ethoxy-2-propanol were placed in a 200 mL flask and stirred. The resulting solution was stirred with a magnetic stirrer, and 37 g of a 0.2 mol / L aqueous solution of nitric acid was added dropwise thereto. After the dropwise addition, the flask was transferred to an oil bath adjusted to 65°C and reacted for 20 hours. The reaction solution was then cooled to room temperature, and 56 g of 1-ethoxy-2-propanol was added to the reaction solution. Water, nitric acid, and the reaction by-products, methanol and ethanol, were distilled off under reduced pressure to obtain a concentrated solution of a hydrolysis condensate (polymer) with 1-ethoxy-2-propanol as the solvent. The solids concentration of the resulting concentrated solution exceeded 20% by mass, calculated as the solid residue when heated at 150°C. The resulting hydrolysis condensation product (polysiloxane) corresponded to the following formula, and the weight average molecular weight (Mw) measured by GPC was 2,000 in terms of polystyrene. In the chemical formulas described in the following synthesis examples and comparative synthesis examples, the numbers next to the siloxane units represent the molar ratio (total 100).

[0241] [ka]

[0242] Synthesis Example 2 to Synthesis Example 11 were carried out using the compounds (monomers) shown in Table 1 under the same conditions as in Synthesis Example 1, and the target hydrolysis condensation products (polysiloxane compounds) 2 to 11 were obtained, respectively.

[0243] [Table 1]

[0244] <Comparative Synthesis Example 1> 20.8 g (70 mol%) of compound 1, 7.6 g (30 mol%) of compound 7, and 42 g of 1-ethoxy-2-propanol were placed in a 100 mL flask and stirred. The resulting solution was stirred with a magnetic stirrer, and 19 g of a 0.2 mol / L aqueous nitric acid solution was added dropwise thereto. After the dropwise addition, the flask was transferred to an oil bath adjusted to 65°C and reacted for 16 hours. The reaction solution was then cooled to room temperature, and 100 g of 1-ethoxy-2-propanol was added to the reaction solution. Water, nitric acid, and the reaction by-product ethanol were distilled off under reduced pressure from the reaction solution, yielding a concentrated solution of a hydrolysis condensate (polymer) with 1-ethoxy-2-propanol as the solvent. The solids concentration of the resulting concentrated solution exceeded 20% by mass, calculated as the solid residue when heated at 150°C. The resulting hydrolysis condensation product (polysiloxane) corresponded to the following formula, and the weight average molecular weight (Mw) measured by GPC was 2,700 in terms of polystyrene.

[0245] [ka]

[0246] <Comparative Synthesis Example 2> 12.5 g (40 mol%) of compound 1, 12.0 g (45 mol%) of compound 7, 3.6 g (12 mol%) of compound 3, 1.9 g (3 mol%) of compound 8, and 45 g of 1-ethoxy-2-propanol were placed in a 100 mL flask and stirred, and the resulting solution was stirred with a magnetic stirrer, to which 18 g of a 0.2 mol / L aqueous nitric acid solution was added dropwise while stirring with a magnetic stirrer. After the dropwise addition, the flask was transferred to an oil bath adjusted to 65°C and reacted for 16 hours. The reaction solution was then cooled to room temperature, and 100 g of 1-ethoxy-2-propanol was added to the reaction solution. Water, nitric acid, and the reaction by-products, methanol and ethanol, were removed from the reaction solution by vacuum distillation under reduced pressure, yielding a concentrated solution of a hydrolysis condensate (polymer) with 1-ethoxy-2-propanol as the solvent. The solids concentration of the resulting concentrated solution exceeded 20% by mass, calculated as the solid residue when heated at 150°C. The resulting hydrolysis-condensation polysiloxane corresponded to the following formula, and its weight average molecular weight (Mw) measured by GPC was 1,900 in terms of polystyrene.

[0247] [ka]

[0248] [2] Preparation Examples 1 to 34 and Comparative Preparation Examples 1 to 2: Preparation of silicon-containing resist underlayer film-forming compositions (coating solutions) The hydrolyzed condensates (polymers) 1 to 11 obtained in the above Synthesis Examples and the hydrolyzed condensates (polymers) of Comparative Synthesis Examples 1 and 2 were mixed with additives and solvents in the proportions shown in Tables 2-1 and 2-2, and filtered through a 0.02 μm polyethylene filter to prepare polysiloxane underlayer film-forming composition solutions. The amounts of each additive in Table 2 are shown in parts by mass. In Table 2, the "2 parts by mass" in each synthesis example in the "Composition" column means that the amount of hydrolysis-condensation product is 2 parts by mass. Also, in Table 2, MA represents maleic acid, TPSNO3 represents triphenylsulfonium nitrate, PGEE represents propylene glycol monoethyl ether, and PGME represents propylene glycol monomethyl ether. In Table 2, Add-1 to Add-11 are additives represented by the following structural formulas, respectively.

[0249] [ka]

[0250] [ka]

[0251] [Table 2-1]

[0252] [Table 2-2]

[0253] [3] Preparation of composition for forming organic underlayer film Under nitrogen, carbazole (6.69 g, 0.040 mol, manufactured by Tokyo Chemical Industry Co., Ltd.), 9-fluorenone (7.28 g, 0.040 mol, manufactured by Tokyo Chemical Industry Co., Ltd.), and paratoluenesulfonic acid monohydrate (0.76 g, 0.0040 mol, manufactured by Tokyo Chemical Industry Co., Ltd.) were placed in a 100 mL four-neck flask, and 1,4-dioxane (6.69 g, manufactured by Kanto Chemical Co., Inc.) was added thereto and stirred, and then the mixture was heated to 100°C to dissolve the solid and initiate polymerization. After 24 hours, the reaction mixture was allowed to cool to 60°C and diluted with chloroform (34 g, manufactured by Kanto Chemical Co., Inc.), and the diluted reaction mixture was added dropwise to methanol (168 g, manufactured by Kanto Chemical Co., Inc.) to cause reprecipitation. The resulting precipitate was collected by filtration, and the collected solid was dried at 80°C for 24 hours to obtain 9.37 g of the target polymer represented by formula (X) (hereinafter abbreviated as PCzFL). In addition, PCzFL 1 The results of H-NMR measurement were as follows: 1 H-NMR(400MHz,DMSO-d6):δ7.03-7.55(br,12H),δ7.61-8.10(br,4H),δ11.18(br,1H) The weight average molecular weight (Mw) of PCzFL was 2,800 as calculated using polystyrene standards by GPC, and the polydispersity index (Mw / Mn) was 1.77.

[0254] [ka]

[0255] 20 g of PCzFL was mixed with 3.0 g of tetramethoxymethylglycoluril (trade name Powder Link 1174, manufactured by Nippon Cytec Industries Co., Ltd. (formerly Mitsui Cytec Co., Ltd.)) as a crosslinker, 0.30 g of pyridinium paratoluenesulfonate as a catalyst, and 0.06 g of Megafac R-30 (trade name DIC Corporation) as a surfactant. The mixture was then dissolved in 88 g of propylene glycol monomethyl ether acetate to form a solution. The solution was then filtered using a polyethylene microfilter with a pore size of 0.10 μm, and further filtered using a polyethylene microfilter with a pore size of 0.05 μm to prepare a composition for forming an organic underlayer film.

[0256] [4] Examples 1 to 34 and Comparative Examples 1 to 2: Resist pattern evaluation by ArF exposure (PTD) The organic underlayer film-forming composition was applied onto a silicon wafer using a spinner and heated on a hot plate at 240°C for 60 seconds to form an organic underlayer film (layer A) (film thickness 200 nm). The coating liquid obtained in Preparation Example 1 was spin-coated thereon, and heated on a hot plate at 215° C. for 1 minute to form a silicon-containing resist underlayer film (layer B) (20 nm). A commercially available ArF resist (manufactured by JSR Corporation, product name: AR2772JN) was then spin-coated on top of the resist and heated on a hot plate at 110°C for 90 seconds to form a resist film (C layer) (120 nm). Using a Nikon Corporation NSR-S307E scanner (wavelength: 193 nm, NA: 0.85, σ: 0.85 / 0.93), the resist was exposed through a mask set so that the photoresist line width and line spacing would be 0.065 μm after development described below, i.e., so that dense lines with a line and space (L / S) of 0.065 μm would be formed. After exposure, post-exposure baking (110° C. for 1 minute) was performed, followed by cooling to room temperature on a cooling plate, development using a 2.38% aqueous alkaline solution for 60 seconds, and rinsing treatment to form a resist pattern. Resist patterns were formed in the same manner using the coating liquids obtained in Preparation Examples 2 to 34 and Comparative Preparation Examples 1 and 2. The experimental results using Preparation Examples 1 to 34 are Examples 1 to 34, respectively, and the experimental results using Comparative Preparation Examples 1 and 2 are Comparative Examples 1 and 2, respectively. The obtained photoresist patterns were evaluated by observing the cross section of the pattern to confirm the pattern shape, and those that did not suffer from pattern collapse (significant pattern peeling, undercut, or thickening of the line bottom (footing)) were rated as "good," and those that suffered from pattern collapse were rated as "poor." The results are shown in Table 3. In the following description, the example numbers of the compositions for forming resist underlayer films that were used will also be treated as the example numbers of the various evaluations that were carried out using the compositions.

[0257] [5] Examples 1 to 34 and Comparative Examples 1 to 2: Evaluation of siloxane bond strength ratio by FT-IR The coating solution obtained in Preparation Example 1 was spin-coated onto a silicon wafer and heated on a hot plate at 215°C for 1 minute to form a silicon-containing resist underlayer film (layer B). Two more layers of layer B were laminated on the formed layer B using the same process, yielding a triple-laminated layer B (80 nm thick). Using the same procedure, silicon-containing resist underlayer films were formed using the coating solutions obtained in Preparation Examples 2 to 34 and Comparative Preparation Examples 1 and 2, respectively. Each of the obtained silicon-containing resist underlayer films was analyzed by Fourier transform infrared spectroscopy (FT / IR-6600 (manufactured by JASCO Corporation)) at a wave number of 1000 to 1250 cm -1 The peak intensities of siloxane bonds observed in Comparative Example 2 were compared. The peak intensities were normalized to the intensity of the silicon-containing resist underlayer film of Comparative Example 2, which was set at 100. When the bond intensity ratio relative to Comparative Example 2 was relatively high (e.g., 90 or higher), the solubility tended to decrease. The results are shown in Table 3.

[0258] [6] Examples 1 to 34 and Comparative Examples 1 to 2: Evaluation of removability using SC-1 chemical solution (ammonia / hydrogen peroxide aqueous solution) The coating liquid obtained in Preparation Example 1 was spin-coated onto a silicon wafer and heated on a hot plate at 215° C. for 1 minute to form a silicon-containing resist underlayer film (layer B) (20 nm). Using the same procedure, silicon-containing resist underlayer films were formed using the coating solutions obtained in Preparation Examples 2 to 34 and Comparative Preparation Examples 1 and 2, respectively. The silicon wafers with the silicon-containing resist underlayer films formed thereon were immersed in SC-1 solution (28% aqueous ammonia / 33% aqueous hydrogen peroxide / water = 1 / 1 / 10 (v / v / v)) adjusted to 60°C for 180 or 300 seconds, rinsed with water for 60 seconds, and then dried. The thickness of the silicon-containing resist underlayer film after 300 seconds of immersion in SC-1 solution was measured, and the percent change in film thickness (%) was calculated. A film with a film thickness change of 90% or more after immersion relative to the film thickness before immersion was evaluated as "good," and a film with a film thickness change of less than 90% was evaluated as "poor." Furthermore, among the films evaluated as "good" after 300 seconds of immersion, a film with a film thickness change of 90% or more after 180 seconds of immersion was evaluated as "very good." The results are shown in Table 3.

[0259] [7] Examples 1 to 34 and Comparative Examples 1 to 2: Evaluation of residues after dry etching The above composition for forming an organic underlayer film was applied to a silicon wafer using a spinner and heated on a hot plate at 240°C for 60 seconds to form an organic underlayer film (layer A) (film thickness 70 nm). The coating liquid obtained in Preparation Example 1 was spin-coated thereon, and heated on a hot plate at 215° C. for 1 minute to form a silicon-containing resist underlayer film (layer B) (20 nm). Using a Lam Research dry etcher (LAM-2300), dry etching was performed for 20 seconds under CF4-based gas conditions to remove the silicon-containing resist underlayer film (layer B) from the resulting silicon wafer with the film. Subsequently, dry etching was performed for 5 seconds under O2 / COS-based gas conditions to remove the organic underlayer film (layer A). Using the same procedure, a silicon-containing resist underlayer film was formed using each of the coating solutions obtained in Preparation Examples 2 to 34 and Comparative Preparation Examples 1 and 2, and the silicon-containing resist underlayer film (layer B) and the organic underlayer film (layer A) were then removed. The surface of the silicon wafer from which the organic underlayer film (Layer A) and silicon-containing resist underlayer film (Layer B) had been removed was observed using a scanning probe microscope (Hitachi High-Tech Corporation, AFM5000). If convex etching residues with a width of 0.05 μm or more and a height of 2 nm or more were observed, the wafer was rated as "poor," and if no such residues were observed, the wafer was rated as "good." The results are shown in Table 3.

[0260] [Table 3]

Claims

[Claim 1] A composition for forming a silicon-containing resist underlayer film, comprising a hydrolysis condensate of a hydrolyzable silane mixture containing at least one of a hydrolyzable silane represented by the following formula (1) and a hydrolyzable silane represented by the following formula (2), wherein the composition is for forming a silicon-containing resist underlayer film that is soluble in a basic chemical solution: 【Chemical 1】 (In formula (1), R １ represents an organic group that is bonded to a silicon atom and contains a succinic anhydride skeleton, R ２ are groups bonded to silicon atoms, and each independently represent an optionally substituted alkyl group, an optionally substituted halogenated alkyl group, or an optionally substituted alkoxyalkyl group, or an organic group containing an epoxy group, an acryloyl group, a methacryloyl group, a mercapto group, an amino group, an amido group, an alkoxy group, a sulfonyl group, or a cyano group, or a combination thereof; R ３ are groups or atoms bonded to a silicon atom, and each independently represent an alkoxy group, an aralkyloxy group, an acyloxy group, or a halogen atom; a represents 1, b represents an integer of 0 to 2, and 4-(a+b) represents an integer of 1 to 3. 【Chemistry 2】 (In formula (2), R ４ represents a monovalent group bonded to a silicon atom and represented by the following formula (2-1): 【Chemistry 3】 (In formula (2-1), R ２０１ ~R ２０2 each independently represents an organic group containing a hydrogen atom or an optionally substituted alkyl group, and R ２０３ represents an alkylene group which may be substituted, and * represents a bond bonded to the silicon atom. R ５ are groups bonded to silicon atoms, and each independently represent an optionally substituted alkyl group, an optionally substituted halogenated alkyl group, or an optionally substituted alkoxyalkyl group, or an organic group containing an epoxy group, an acryloyl group, a methacryloyl group, a mercapto group, an amino group, an amido group, an alkoxy group, a sulfonyl group, or a cyano group, or a combination thereof; R ６ are groups or atoms bonded to a silicon atom, and each independently represent an alkoxy group, an aralkyloxy group, an acyloxy group, or a halogen atom; a represents 1, b represents an integer of 0 to 2, and 4-(a+b) represents an integer of 1 to 3.

Images