Reactor

Abstract

To provide a reactor that can efficiently produce a product.SOLUTION: A reactor 1,2 that allows raw material gas X1 to react in solution containing first solution S1 and second solution S2 to produce a product Y comprises: a reaction vessel 10 in which a first liquid phase constituted of the first solution S1 and a second liquid phase constituted of the second solution S2 are formed; a raw material feeding device 30,80 which supplies raw material gas X1 to the first liquid phase or the second liquid phase; an irradiation device 20 which irradiates the inside of the reaction vessel 10 with light to allow the raw material gas X1 to react with the light; a product recovery device 50 which recovers a product Y produced by reaction of the raw material gas X1 from the first liquid phase or the second liquid phase; and a discharging device (the first discharging device 40 and / or the second discharging device 60,90) which discharges the first solution S1 or the second solution S2 to either the first liquid phase or the second liquid phase to which the raw material gas X1 is supplied.SELECTED DRAWING: Figure 1

Description

[Technical Field]

[0001] The present invention relates to a technology for a reactor that causes a chemical reaction to occur on a reactant. [Background technology]

[0002] Conventionally, techniques for carrying out chemical reactions on reactants have been publicly known. For example, Patent Document 1 discloses a method for producing a product by a chemical reaction using two liquid phases.

[0003] In the invention described in Patent Document 1, an aqueous phase in which substances used in a chemical reaction are dissolved in water and an organic phase in which raw materials are dissolved in an organic solvent are placed in a reaction vessel, and light is irradiated onto each liquid phase to cause a chemical reaction and produce a product. In such a method for producing a product using two liquid phases (aqueous and organic), the aqueous and organic phases may be stirred using a stirring device equipped with a propeller or the like to promote the chemical reaction.

[0004] However, when a stirring device with a propeller is installed in a reaction vessel, the reaction vessel needs to be relatively large so that the rotating propeller does not come into contact with the inside of the reaction vessel, which makes it difficult for light to reach the inside of the reaction vessel, making it difficult to efficiently produce a product. [Prior art documents] [Patent documents]

[0005] [Patent Document 1] Patent No. 6080281 Summary of the Invention [Problem to be solved by the invention]

[0006] The present invention has been made in view of the above circumstances, and an object of the present invention is to provide a reaction apparatus capable of efficiently producing a product. [Means for solving the problem]

[0007] The problem to be solved by the present invention is as described above, and the means for solving this problem will now be described.

[0008] That is, claim 1 provides a reaction apparatus for producing a product by reacting a raw material gas in a solution containing a first solution and a second solution, the reaction apparatus comprising: a reaction vessel in which a first liquid phase constituted by the first solution and a second liquid phase constituted by the second solution are formed; a raw material supply device for supplying the raw material gas to the first liquid phase or the second liquid phase; an irradiation device for irradiating the inside of the reaction vessel with light to cause the raw material gas to react; a product recovery device for recovering the product produced by the reaction of the raw material gas from the first liquid phase or the second liquid phase; and a release device for releasing the first solution or the second solution into the side of the first liquid phase or the second liquid phase to which the raw material gas is supplied.

[0009] In claim 2, the discharge device is provided so as to discharge the first solution or the second solution in a horizontal direction near the interface between the first liquid phase and the second liquid phase.

[0010] In claim 3, the discharging device includes a first discharging device that discharges the second solution into the first liquid phase in the vicinity of the interface between the first liquid phase and the second liquid phase.

[0011] In claim 4, the raw material supply device is configured to dissolve the raw material gas in the second solution recovered from the reaction vessel and supply the second solution in which the raw material gas is dissolved to the release device.

[0012] In claim 5, the discharging device includes a second discharging device that discharges the first solution into the second liquid phase in the vicinity of the interface between the first liquid phase and the second liquid phase.

[0013] In claim 6, the system includes a control unit that controls the operation of the product recovery device, and a detection unit that detects the concentration of the product in the first solution or the second solution recovered from the reaction vessel, and the control unit supplies the first solution or the second solution recovered from the reaction vessel to the product recovery device when the concentration of the product exceeds a predetermined threshold, and returns the first solution or the second solution recovered from the reaction vessel to the reaction vessel without passing through the product recovery device when the concentration of the product is equal to or less than the predetermined threshold. [Effects of the Invention]

[0014] The present invention has the effect of enabling efficient production of a product. [Brief explanation of the drawings]

[0015] [Figure 1] 1 is a schematic diagram showing a reaction apparatus according to a first embodiment of the present invention. [Figure 2] FIG. 1 is a schematic diagram showing a product recovery device. [Figure 3] FIG. 1 is a block diagram showing a reactor. [Figure 4] FIG. 2 is a schematic diagram showing a reaction apparatus when reacting raw material gases. [Figure 5] 4 is a flowchart showing the control of the operation of the product recovery device. [Figure 6] FIG. 4 is a schematic diagram showing a reaction apparatus according to a second embodiment of the present invention. [Figure 7] FIG. 2 is a schematic diagram showing a reaction apparatus in a state where raw material gases are supplied to a reaction vessel. [Figure 8] FIG. 2 is a schematic diagram showing a reaction apparatus when reacting raw material gases. DETAILED DESCRIPTION OF THE INVENTION

[0016] The configuration of a reaction apparatus 1 according to a first embodiment of the present invention will be described below with reference to FIGS.

[0017] The reaction apparatus 1 generates a product Y by a chemical reaction of a raw material gas in a liquid contained in a reaction vessel 10. In this embodiment, an example in which methanol is generated as the product Y will be described. The raw material gases include a raw material gas X1 and a raw material gas X2. The raw material gas X2 is an oxidizing agent that oxidizes the raw material gas X1. In this embodiment, methane is used as the raw material gas X1, and chlorine dioxide is used as the raw material gas X2.

[0018] The liquids used in the reaction include a first solution S1 and a second solution S2, which are two types of liquids with different specific gravities. More specifically, the second solution S2 has a higher specific gravity than the first solution S1. Therefore, as shown in FIG. 1, the first solution S1 and the second solution S2 are separated in the reaction vessel 10 so that the second solution S2 is located below the first solution S1. As the first solution S1, a solution in which the solubility of the product Y is greater than that of the second solution S2 is used. As the second solution S2, a solution in which the solubility of the source gas X1 and the source gas X2 is greater than that of the first solution S1 is used. As the first solution S1, for example, water is used. As the second solution S2, for example, a fluorous solvent is used.

[0019] The reaction apparatus 1 according to this embodiment can obtain a product Y by a chemical reaction between a raw material gas X1 and a raw material gas X2 in a liquid contained in a reaction vessel 10. The chemical reaction in the reaction vessel 10 will be described in detail later. The reaction apparatus 1 includes a reaction vessel 10, an irradiation device 20, a raw material supply device 30, a first discharging device 40, a product recovery device 50, a second discharging device 60, and a control unit 70.

[0020] The reaction vessel 10 accommodates the source gas X1, the source gas X2, the first solution S1, and the second solution S2. The shape of the reaction vessel 10 is not limited, but in this embodiment, it is formed into a hollow rectangular parallelepiped shape capable of accommodating the source gas X1, the source gas X2, the first solution S1, and the second solution S2 therein. The reaction vessel 10 is formed of a material that is resistant to the source gas X1, the source gas X2, the first solution S1, and the second solution S2.

[0021] As shown in Fig. 1, a "first liquid phase" and a "second liquid phase" are formed in this order from top to bottom inside the reaction vessel 10. The "first liquid phase" is a phase (aqueous phase) composed of the first solution S1. The "second liquid phase" is a phase (solvent phase) composed of the second solution S2.

[0022] The irradiation device 20 irradiates the inside of the reaction vessel 10 with light. The irradiation device 20 is disposed to the side of the interface b between the first liquid phase and the second liquid phase, and is configured to irradiate light onto a region of the liquid contained inside the reaction vessel 10 that includes the interface b (interface b and the vicinity of interface b). The irradiation device 20 is equipped with a light source that emits light of a wavelength required for the reaction. As the light source, an LED, halogen, or the like can be used. As the light source, various light sources that can irradiate light of a wavelength required for the reaction can be used.

[0023] The raw material supply device 30 supplies the raw material gas X1 and the raw material gas X2 into the reaction vessel 10. The raw material supply device 30 includes a raw material dissolving section 31, a second solution recovery path 32, and a raw material supply path 33.

[0024] The raw material dissolver 31 is a section that dissolves the raw material gas X1 and the raw material gas X2 supplied from a supply source such as a raw material tank into the second solution S2 recovered from the reaction vessel 10. The raw material dissolver 31 is formed to be able to accommodate the second solution S2, the raw material gas X1, and the raw material gas X2. The raw material dissolver 31 is connected to the supply source so as to be able to receive the raw material gas X1 and the raw material gas X2. The raw material dissolver 31 is also connected to the reaction vessel 10 via a second solution recovery path 32, which will be described later.

[0025] The second solution recovery path 32 is a path for recovering the second solution S2 from inside the reaction vessel 10. One end of the second solution recovery path 32 is connected to a position in the reaction vessel 10 corresponding to the separated second liquid phase (a position lower than the interface b between the first and second liquid phases). More specifically, one end of the second solution recovery path 32 is connected to the vicinity of the bottom end of the reaction vessel 10 (a portion below the mixed phase shown in FIG. 4) in order to recover a second solution S2 with higher purity. The other end of the second solution recovery path 32 is connected to the raw material dissolver 31.

[0026] The raw material supply path 33 is a path for supplying the second solution S2 containing the raw material gas X1 and the raw material gas X2 into the reaction vessel 10. One end of the raw material supply path 33 is connected to the raw material dissolver 31. The other end of the raw material supply path 33 extends into the reaction vessel 10. More specifically, the other end of the raw material supply path 33 extends to the vicinity of the interface b between the first liquid phase and the second liquid phase (slightly above the interface b).

[0027] The raw material supply device 30 configured as described above is provided with an appropriate pump (not shown) for circulating the second solution S2. The raw material supply device 30 can supply the second solution S2 from the reaction vessel 10 to the raw material dissolver 31 via the second solution recovery path 32 by operating the pump, for example. The raw material supply device 30 then dissolves the raw material gas X1 and the raw material gas X2 supplied from the supply sources in the raw material dissolver 31, and supplies the second solution S2 in which the raw material gas X1 and the raw material gas X2 are dissolved to the reaction vessel 10 via the raw material supply path 33. The second solution S2 is supplied to the reaction vessel 10 in a state saturated with the raw material gas X1 and containing the raw material gas X2 in an amount corresponding to the content of the raw material gas X1. The raw material supply device 30 supplies the second solution S2 containing the raw material gas X1 and the raw material gas X2 into the reaction vessel 10 until the second solution S2 in the reaction vessel 10 reaches a saturated concentration.

[0028] The first discharge device 40 discharges the second solution S2 (the second solution S2 containing the source gas X1 and the source gas X2) sent from the source supply device 30 into the first liquid phase. In this embodiment, a multi-hole nozzle having a plurality of small-diameter holes that can discharge the second solution S2 linearly is used as the first discharge device 40. The first discharge device 40 is provided in the vicinity of the interface b between the first liquid phase and the second liquid phase (slightly above the interface b), and is provided so as to discharge the second solution S2 containing the source gas X1 and the source gas X2 in a horizontal direction.

[0029] The product recovery device 50 recovers the product Y produced in the reaction vessel 10. The product recovery device 50 includes a first solution recovery path 51, a first solution supply path 52, a recovery treatment device 53, a product storage tank 54, a detection device 55, and a first valve 56.

[0030] The first solution recovery path 51 is a path for recovering the first solution S1 from inside the reaction vessel 10. One end of the first solution recovery path 51 is connected to a position in the reaction vessel 10 corresponding to the separated first liquid phase (a position higher than the interface b between the first liquid phase and the second liquid phase). More specifically, one end of the first solution recovery path 51 is connected to the vicinity of the upper end of the reaction vessel 10 (a portion above the mixed phase shown in FIG. 4) in order to recover a first solution S1 with higher purity. The first solution recovery path 51 includes a first recovery path 51a and a second recovery path 51b.

[0031] 2 constitutes an upstream portion in the flow direction of the first solution S1 of the first solution recovery path 51. The first recovery path 51a is formed to extend from the reaction vessel 10 to a first valve 56, which will be described later.

[0032] 2 constitutes a downstream portion in the flow direction of the first solution S1 of the first solution recovery path 51. The second recovery path 51b is formed to extend from the first valve 56 to the recovery treatment device 53, which will be described later.

[0033] The first solution supply path 52 is a path for supplying (returning) the first solution S1 recovered by the product recovery device 50 into the reaction vessel 10. The first solution supply path 52 includes a first supply path 52a and a second supply path 52b.

[0034] 2 is a path for supplying (returning) the first solution S1 into the reaction vessel 10 after the product Y has been recovered in the recovery treatment device 53. The first supply path 52a is formed so as to extend from the recovery treatment device 53, which will be described later, into the reaction vessel 10. More specifically, one end of the first supply path 52a extends to the vicinity of the interface b between the second liquid phase and the first liquid phase (slightly below the interface b) (see FIG. 1).

[0035] 2 is a path for supplying (returning) the first solution S1 that has not been sent to the recovery treatment device 53 into the reaction vessel 10. One end of the second supply path 52b is connected to a first valve 56, which will be described later. Although not shown, the other end of the second supply path 52b is connected to a midpoint of the first supply path 52a.

[0036] 2 performs a process of recovering the product Y from the first solution S1 recovered from the reaction vessel 10. As a method of recovering the product Y, methods such as membrane separation, distillation, and coagulation can be adopted depending on the properties and application of the product Y.

[0037] 2 stores the product Y recovered by the recovery processing device 53. The product storage tank 54 is connected to the recovery processing device 53 so as to be able to receive the product Y from the recovery processing device 53.

[0038] 2 detects (measures) the concentration of the product Y in the first solution S1 recovered from the reaction vessel 10 via the first solution recovery path 51. The detection device 55 is provided in the middle of the first recovery path 51a (between the reaction vessel 10 and the first valve 56).

[0039] 2 switches the flow path of the first solution S1. The first valve 56 is provided in the middle of the first solution recovery path 51 (between the first recovery path 51a and the second recovery path 51b). The first valve 56 is provided so as to be switchable between a state in which the first recovery path 51a communicates with the second supply path 52b (route A) and a state in which the first recovery path 51a communicates with the second recovery path 51b (route B).

[0040] The product recovery device 50 configured in this manner is provided with an appropriate pump (not shown) for circulating the first solution S1. By operating the pump or the like, the product recovery device 50 can recover the first solution S1 from the reaction vessel 10 and recover the product Y contained in the recovered first solution S1.

[0041] The second discharge device 60 discharges the first solution S1 sent from the product recovery device 50 into the second liquid phase. In this embodiment, a multi-hole nozzle having a plurality of small-diameter holes that can discharge the first solution S1 in a line is used as the second discharge device 60. The second discharge device 60 is provided in the vicinity of the interface b with the first liquid phase (slightly below the interface b), and is provided so as to discharge the first solution S1 sent from the product recovery device 50 in a horizontal direction.

[0042] The control unit 70 shown in Fig. 3 is capable of processing various types of information. The control unit 70 includes a CPU, a memory, and the like. As shown in Fig. 3, the control unit 70 is electrically connected to the irradiation device 20, the raw material supply device 30, the first release device 40, the product recovery device 50, and the second release device 60 of the reaction apparatus 1. The control unit 70 can control the operation of the valves and pumps included in the raw material supply device 30 and the product recovery device 50. The control unit 70 can also acquire the measurement results of the detection device 55 included in the product recovery device 50.

[0043] The process of producing product Y in the reactor 1 will be described below with reference to FIG.

[0044] First, by operating the pump of the raw material supply device 30, the second solution S2 in the reaction vessel 10 is supplied to the raw material supply device 30 via the second solution recovery path 32, and the raw material gas X1 (methane) and the raw material gas X2 (chlorine dioxide) are supplied from the supply sources to the raw material supply device 30. In this way, in the raw material supply device 30, the second solution S2 in which the raw material gas X1 and the raw material gas X2 are dissolved is generated.

[0045] The second solution S2 in which the raw material gas X1 and the raw material gas X2 are dissolved is sent to the first discharge device 40 via the raw material supply path 33. The second solution S2 (the second solution S2 containing the raw material gas X1 and the raw material gas X2) sent to the first discharge device 40 is discharged horizontally from the first discharge device 40. In this way, the raw material gas X1 (methane) and the raw material gas X2 (chlorine dioxide) are supplied near the interface b between the first liquid phase and the second liquid phase. The raw material gas X1 and the raw material gas X2 move toward the second liquid phase due to the difference in solubility between the first solution S1 and the second solution S2.

[0046] Then, when raw material gas X2 (chlorine dioxide) is supplied near the interface b, light is irradiated by the irradiation device 20 near the interface b, and raw material gas X2 (chlorine dioxide) becomes radicals (chlorine radicals). The radicals (chlorine radicals) oxidize raw material gas X1 (methane), which is also supplied near the interface b. This produces product Y (methanol). Product Y (methanol) moves to the first liquid phase due to the difference in solubility between the first solution S1 and the second solution S2.

[0047] Then, by operating the pump of the product recovery device 50, the first solution S1 in the reaction vessel 10 is recovered into the recovery treatment device 53 via the first solution recovery path 51. In the recovery treatment device 53, the product Y is extracted from the first solution S1 by a method such as membrane separation, distillation, or coagulation. The product Y extracted by the recovery treatment device 53 is sent to the product storage tank 54 and stored in the product storage tank 54. In this way, the product Y produced in the reaction vessel 10 can be recovered by the product recovery device 50.

[0048] After the product Y (methanol) is recovered from the first solution S1 in the recovery treatment device 53, the first solution S1 is sent to the second discharge device 60 via the first solution supply path 52. The first solution S1 sent to the second discharge device 60 (the first solution S1 after the product Y has been recovered) is discharged from the second discharge device 60 in the horizontal direction.

[0049] Thus, in the reaction vessel 10, the second solution S2 is discharged horizontally from the first discharge device 40 near the interface b (slightly above the interface b) of the first liquid phase, and the first solution S1 is discharged horizontally from the second discharge device 60 near the interface b (slightly below the interface b) of the second liquid phase. By such discharge of the solutions from the first discharge device 40 and the second discharge device 60, the first solution S1 and the second solution S2 are mixed to form a mixed phase.

[0050] In this way, the first solution S1 and the second solution S2 are mixed by discharging the solutions from the first discharging device 40 and the second discharging device 60, thereby promoting the reaction between the source gas X1 (methane) and the radicals (chlorine radicals) generated from the source gas X2. Furthermore, the first solution S1 and the second solution S2 are mixed by discharging the solutions from the first discharging device 40 and the second discharging device 60, thereby increasing the contact area between the first solution S1 and the second solution S2 and promoting the rapid movement of substances (source gases X1, X2 and product Y) between the first liquid phase and the second liquid phase (movement of source gases X1, X2 to the second liquid phase, movement of product Y to the first liquid phase). The first solution S1 and the second solution S2 in the mixed phase separate again when a predetermined time has elapsed after the release from the first discharging device 40 and the second discharging device 60 has stopped.

[0051] As described above, in the reaction apparatus 1 according to this embodiment, the contact area between the first solution S1 and the second solution S2 is increased by discharging the second solution S2 from the first discharging device 40 and the first solution S1 from the second discharging device 60, rather than by stirring with a stirrer equipped with a propeller. This increases the contact area between the first solution S1 and the second solution S2, thereby enabling rapid transfer of substances between the first and second liquid phases. Because the first discharging device 40 does not require space for the rotation of the propeller, the width of the reaction vessel 10 in the direction of light irradiation by the irradiation device 20 can be made relatively thin. This prevents the light irradiated from the irradiation device 20 from being attenuated before it reaches the center of the reaction vessel 10. Therefore, chlorine radicals can be generated from the raw material gas X2 (chlorine dioxide) by irradiating it with light from the irradiation device 20, thereby facilitating the generation of the product Y (methanol).

[0052] The following mainly uses Fig. 5 to describe the control of the operation of the product recovery apparatus 50. The operation of the product recovery apparatus 50 is controlled by the control unit 70. The control unit 70 controls each process shown in the flowchart of Fig. 5, causing the product Y (methanol) to be recovered by the product recovery apparatus 50. The control shown in the flowchart of Fig. 5 is repeatedly executed.

[0053] In step S11, the control unit 70 acquires the concentration of the product Y in the first solution S1 recovered by the product recovery device 50. The concentration of the product Y in the first solution S1 is acquired based on the measurement result of the detection device 55. After performing the process of step S11, the control unit 70 proceeds to step S12.

[0054] In step S12, the control unit 70 determines whether the concentration of the product Y is equal to or lower than a predetermined threshold value. The threshold value can be set to any value taking into consideration the efficiency of recovery of the product Y and the like.

[0055] If the control unit 70 determines that the concentration of the product Y is equal to or less than the predetermined threshold value ("YES" in step S12), the control unit 70 proceeds to step S13. On the other hand, if the control unit 70 determines that the concentration of the product Y is not equal to or less than the predetermined threshold value ("NO" in step S12), the control unit 70 proceeds to step S15.

[0056] In step S13, the control unit 70 switches the flow path of the first solution S1 to route A (see FIG. 2). The control unit 70 switches the flow path of the first solution S1 by operating the first valve 56. By switching the flow path of the first solution S1 to route A, the first solution S1 that has passed through the detection device 55 can be supplied to the reaction vessel 10 side without being supplied to the recovery and treatment device 53 side. After performing the process of step S13, the control unit 70 proceeds to step S14.

[0057] In step S14, the control unit 70 stops the operation of the recovery and processing device 53. After performing the process of step S14, the control unit 70 ends the control shown in the flowchart of FIG.

[0058] On the other hand, in step S15, the control unit 70 switches the flow path of the first solution S1 to route B (see FIG. 2). The control unit 70 switches the flow path of the first solution S1 by operating the first valve 56. By switching the flow path of the first solution S1 to route B, the first solution S1 that has passed through the detection device 55 can be supplied to the recovery and processing device 53. After performing the process of step S15, the control unit 70 proceeds to step S16.

[0059] In step S16, the control unit 70 starts the operation of the recovery processing device 53. As a result, the recovery processing device 53 recovers the product Y from the first solution S1, and the product Y is stored in the product storage tank 54. After performing the process of step S16, the control unit 70 ends the control shown in the flowchart of FIG.

[0060] 5, the circulation of the first solution S1 is repeated until the amount of the product Y produced reaches a certain amount (route A), and once the amount of the product Y produced reaches the certain amount, the product Y is recovered by the recovery treatment device 53 (route B). This allows the recovery treatment device 53 to operate efficiently.

[0061] Next, the configuration of a reaction apparatus 2 according to a second embodiment of the present invention will be described with reference to Figures 6 to 8. Hereinafter, the same components as those in the first embodiment will be denoted by the same reference numerals, and description thereof will be omitted. Note that in the second embodiment, an aqueous solution containing a source (sodium chlorite) of a raw material gas X2 (chlorine dioxide) that is an oxidant is used as the first solution S1.

[0062] The reaction apparatus 2 according to the second embodiment includes a raw material supply device 80 instead of the raw material supply device 30, and a second discharge device 90 instead of the second discharge device 60. The raw material supply device 80 includes a raw material gas supply source 81, an air supply path 82, an exhaust path 83, a circulation path 84, a second valve 85, and a third valve 86.

[0063] The raw material gas supply source 81 is a supply source of the raw material gas X1. The raw material gas supply source 81 is filled with the raw material gas X1.

[0064] The gas supply path 82 is a path for supplying the raw material gas X1 into the reaction vessel 10. The gas supply path 82 is formed to extend from the raw material gas supply source 81 to the inside of the reaction vessel 10. A second valve 85, which will be described later, is provided in the middle of the gas supply path 82. The gas supply path 82 includes a first gas supply path 82a and a second gas supply path 82b.

[0065] The first gas supply path 82a constitutes the upstream portion in the gas supply direction of the gas supply path 82. The first gas supply path 82a is formed to extend from the raw material gas supply source 81 to the second valve 85.

[0066] The second gas supply path 82b constitutes a downstream portion in the gas supply direction of the gas supply path 82. The second gas supply path 82b extends from the second valve 85 to the bottom of the separated second liquid phase, and is then bent in the horizontal direction. A plurality of blow-out holes (not shown) that can blow out the source gas X1 are formed in the bottom (horizontally extending portion) of the second gas supply path 82b.

[0067] The exhaust path 83 is a path for exhausting the raw material gas X1 from the inside of the reaction vessel 10 to the outside (outside the system). One end of the exhaust path 83 is connected to the upper end of the reaction vessel 10, and the other end is open. A third valve 86, which will be described later, is provided in the middle of the exhaust path 83. The exhaust path 83 includes a first exhaust path 83a and a second exhaust path 83b.

[0068] The first exhaust path 83a constitutes the upstream portion in the exhaust direction of the exhaust path 83. The first exhaust path 83a is formed so as to extend from the upper end of the reaction vessel 10 to the third valve 86.

[0069] The second exhaust path 83b constitutes a downstream portion in the exhaust direction of the exhaust path 83. One end of the second exhaust path 83b is connected to a third valve 86.

[0070] The circulation path 84 is a path for circulating the exhausted raw material gas X1 so as to return it to the gas supply path 82. The circulation path 84 is formed so as to connect the third valve 86 and the second valve 85.

[0071] The second valve 85 switches the flow path of the source gas X1 in the gas supply path 82. The second valve 85 is provided in the middle of the gas supply path 82 (between the first gas supply path 82a and the second gas supply path 82b). The second valve 85 is provided so as to be switchable between a state in which the first gas supply path 82a communicates with the second gas supply path 82b and a state in which the circulation path 84 communicates with the second gas supply path 82b.

[0072] The third valve 86 switches the flow path of the source gas X1 in the exhaust path 83. The third valve 86 is provided in the middle of the exhaust path 83 (between the first exhaust path 83a and the second exhaust path 83b). The third valve 86 is provided so as to be switchable between a state in which the exhaust path 83 communicates with the first exhaust path 83a and the second exhaust path 83b and a state in which the first exhaust path 83a communicates with the circulation path 84.

[0073] The second discharge device 90 discharges the first solution S1 sent from the product recovery device 50 into the second liquid phase. In the second embodiment, a multi-hole nozzle having a plurality of small-diameter holes that can discharge the first solution S1 in a line is used as the second discharge device 90. The second discharge device 90 is provided in the second liquid phase and is configured to discharge the first solution S1 sent from the product recovery device 50 in a horizontal direction. Note that, since there is no need to recover the second solution from the lower part of the second liquid phase in the second embodiment, the second discharge device 90 can have a longer vertical length than the second discharge device 60 of the first embodiment.

[0074] The process of producing product Y in the reactor 2 will be described below with reference to FIGS.

[0075] First, as shown in FIG. 7 , the second valve 85 is set to a state in which the first gas supply path 82a and the second gas supply path 82b are in communication with each other, whereby the raw material gas X1 is supplied from the raw material gas supply source 81 into the reaction vessel 10 via the gas supply path 82. The raw material gas X1 supplied into the reaction vessel 10 is blown into the second solution S2 from an outlet (not shown) of the second gas supply path 82b. At this time, the third valve 86 is set to a state in which the first exhaust path 83a and the second exhaust path 83b are in communication with each other. By supplying the raw material gas X1 into the reaction vessel 10 in this state, the air in the space above the reaction vessel 10 (the space above the first liquid phase) is replaced with the raw material gas X1, and the replaced air is discharged to the outside of the system via the exhaust path 83. In this way, the reaction vessel 10 is filled with the raw material gas X1.

[0076] 8, the second valve 85 is set to a state in which the second gas supply path 82b communicates with the circulation path 84, and the third valve 86 is set to a state in which the first exhaust path 83a communicates with the circulation path 84. Then, by operating the pump of the product recovery device 50, the first solution S1 in the reaction vessel 10 is sent to the recovery treatment device 53 via the first solution recovery path 51. The recovery treatment device 53 recovers the product Y from the first solution S1.

[0077] The first solution S1 after the product Y has been collected is sent to the second discharge device 60 via the first solution supply path 52. The first solution S1 sent to the second discharge device 60 is discharged horizontally from the second discharge device 60. As a result, a mixed phase in which the first solution S1 and the second solution S2 are mixed is formed in the lower part of the reaction vessel 10.

[0078] Then, when the irradiation device 20 irradiates the mixed phase with light, the sodium chlorite contained in the first solution S1 becomes chlorine dioxide, and the chlorine dioxide becomes chlorine radicals. The chlorine radicals oxidize the raw material gas X1 (methane). This produces product Y (methanol). Product Y (methanol) moves to the first liquid phase due to the difference in solubility between the first solution S1 and the second solution S2.

[0079] The first solution S1 in the reaction vessel 10 is recovered in a recovery treatment device 53 (see FIG. 2) via a first solution recovery path 51. In the recovery treatment device 53, a product Y is extracted from the first solution S1 by a method such as membrane separation, distillation, or coagulation, and the product Y is stored in a product storage tank 54. In this way, the product recovery device 50 can recover the product Y produced in the reaction vessel 10.

[0080] As described above, the reaction apparatuses 1 and 2 according to this embodiment are Reaction devices 1 and 2 are provided in which a raw material gas X1 is reacted in a solution containing a first solution S1 and a second solution S2 to produce a product Y, a reaction vessel 10 in which a first liquid phase constituted by the first solution S1 and a second liquid phase constituted by the second solution S2 are formed; a raw material supply device 30, 80 for supplying the raw material gas X1 to the first liquid phase or the second liquid phase; an irradiation device 20 that irradiates the inside of the reaction vessel 10 with light to cause the raw material gas X1 to react; a product recovery device 50 that recovers the product Y generated by the reaction of the raw material gas X1 from the first liquid phase or the second liquid phase; a discharge device (first discharge device 40 and / or second discharge device 60, 90) that discharges the first solution S1 or the second solution S2 to the side of the first liquid phase or the second liquid phase to which the raw material gas X1 is supplied; It is equipped with the following.

[0081] By configuring in this way, it is possible to efficiently produce the product. Specifically, by discharging the first solution S1 or the second solution S2 from the discharging device (the first discharging device 40 and / or the second discharging device 60, 90), the contact area between the first solution S1 and the second solution S2 can be increased, thereby promoting the rapid transfer of substances (the raw material gas X1 and the product Y) between the first liquid phase and the second liquid phase. Furthermore, since the discharge devices (first discharge device 40 and / or second discharge devices 60, 90) can be made narrower than a stirring device equipped with a propeller, the reaction vessel 10 can be made relatively thin. This allows the light irradiated from the irradiation device 20 to easily reach the inside of the reaction vessel 10. This therefore facilitates the production of the product Y.

[0082] In addition, the discharge device (first discharge device 40 and / or second discharge device 60) The nozzle is provided so as to eject the first solution S1 or the second solution S2 in a horizontal direction in the vicinity of the interface b between the first liquid phase and the second liquid phase.

[0083] This configuration allows a large amount of the first solution S1 or the second solution S2 to be released near the interface b between the first and second liquid phases, thereby further promoting the rapid movement of substances (the source gas X1 and the product Y) between the first and second liquid phases.

[0084] Moreover, the reaction apparatus 1 according to this embodiment is The discharge device is The apparatus includes a first discharging device 40 that discharges the second solution S2 into the first liquid phase in the vicinity of the interface b between the first liquid phase and the second liquid phase.

[0085] By configuring in this manner, it is possible to facilitate mixing of the first liquid phase and the second liquid phase.

[0086] In addition, the raw material supply device 30 is The raw material gas X1 is dissolved in the second solution S2 recovered from the reaction vessel 10, and the second solution S2 in which the raw material gas X1 is dissolved is supplied to the discharge device (first discharge device 40).

[0087] With this configuration, the source gas X1 can be easily supplied into the reaction vessel 10.

[0088] Further, the discharge device The second discharging device 60 discharges the first solution S1 into the second liquid phase in the vicinity of the interface b between the first liquid phase and the second liquid phase.

[0089] By configuring in this manner, it is possible to facilitate mixing of the first liquid phase and the second liquid phase.

[0090] Also, a control unit 70 that controls the operation of the product recovery device 50; a detection device 55 (detection unit) that detects the concentration of the product Y in the first solution S1 or the second solution S2 recovered from the reaction vessel 10; Equipped with The control unit 70 If the concentration of the product Y exceeds a predetermined threshold value ("NO" in step S12), the first solution S1 or the second solution S2 recovered from the reaction vessel 10 is supplied to the product recovery device 50, If the concentration of the product Y is below the predetermined threshold value ("YES" in step S12), the first solution S1 or the second solution S2 recovered from the reaction vessel 10 is returned to the reaction vessel 10 without going through the product recovery device 50.

[0091] By configuring in this way, the recovery and processing device 53 can be operated efficiently.

[0092] Although the embodiments of the present invention have been described above, the present invention is not limited to the above-described embodiments. For example, the configurations of the components constituting the reaction devices 1 and 2 are not limited to those described above and can be modified as appropriate.

[0093] Furthermore, in the above embodiment, an example was shown in which a first liquid phase is formed on the upper side and a second liquid phase is formed on the lower side within the reaction vessel 10, but this is not limited to such an embodiment, and the first liquid phase may be formed on the lower side and the second liquid phase may be formed on the upper side.

[0094] Furthermore, in the above embodiment, an example in which methanol is produced as product Y has been described, but the present invention is not limited to this embodiment. For example, alcohol may be used as product Y. Furthermore, product Y is not limited to the above-described example, and various substances produced by a chemical reaction using two liquid phases (aqueous phase and solvent phase) can be used.

[0095] Furthermore, in this embodiment, an example has been shown in which methane is used as the raw material gas X1, but the present invention is not limited to this. Various gases can be used as the raw material gas X1 depending on the product Y. Furthermore, in this embodiment, the raw material gas X2 (chlorine dioxide) serving as the oxidant is supplied from the raw material supply device 30, but an aqueous solution containing a source (sodium chlorite) of the oxidant (chlorine dioxide) may also be used as the first solution S1.

[0096] In addition, in this embodiment, water is used as the first solution, but the present invention is not limited to this. Various aqueous solutions that form the aqueous phase can be used as the first solution. In addition, in this embodiment, a fluorous solvent is used as the second solution, but the present invention is not limited to this. Various solvents that form the solvent phase can be used as the second solution.

[0097] Furthermore, as a mechanism for discharging the first solution S1 and / or the second solution S2, the flow paths (raw material supply path 33, first solution supply path 52) for the first solution S1 and / or the second solution S2 may be branched, and a nozzle for discharging the first solution S1 and / or the second solution S2 may be provided in each branch path.

[0098] Furthermore, when there is a source gas other than the source gases X1 and X2, a feed path for the other source gas may be provided in the circulation path of the first solution S1 or the second solution S2. Furthermore, when it is necessary to add a chemical agent to adjust the composition of the liquid in the reaction vessel 10, a feed path for the chemical agent may be provided in the circulation path of the first solution S1 or the second solution S2.

[0099] Furthermore, there may be provided a plurality of irradiation devices 20. When a plurality of irradiation devices 20 are provided, the irradiation devices 20 may be provided so as to be aligned along the interface b between the first liquid phase and the second liquid phase, or may be provided so as to be dispersed near the interface b on the wall surface of the reaction vessel 10. [Explanation of symbols]

[0100] 1,2 Reactor 10 Reaction vessel 20 Irradiation device 30 Raw material supply device 40 First discharge device 50 Product recovery device 60,90 Second release device 70 Control Unit

Claims

1. A reactor for producing a product by reacting a raw material gas in a solution containing a first solution and a second solution, a reaction vessel in which a first liquid phase constituted by the first solution and a second liquid phase constituted by the second solution are formed; a raw material supply device that supplies the raw material gas to the first liquid phase or the second liquid phase; an irradiation device that irradiates the inside of the reaction vessel with light to cause the raw material gas to react; a product recovery device that recovers the product produced by the reaction of the raw material gas from the first liquid phase or the second liquid phase; a discharging device that discharges the first solution or the second solution into one of the first liquid phase or the second liquid phase to which the raw material gas is supplied; Equipped with Reactor.

2. The discharge device is The nozzle is provided to discharge the first solution or the second solution in a horizontal direction near an interface between the first liquid phase and the second liquid phase. The reactor of claim 1.

3. The discharge device is a first discharging device configured to discharge the second solution into the first liquid phase in the vicinity of an interface between the first liquid phase and the second liquid phase; The reactor of claim 1.

4. The raw material supply device is the source gas is dissolved in the second solution recovered from the reaction vessel, and the second solution having the source gas dissolved therein is supplied to the discharge device. The reactor of claim 3.

5. The discharge device is a second discharging device that discharges the first solution into the second liquid phase in the vicinity of the interface between the first liquid phase and the second liquid phase; The reactor of claim 1.

6. a control unit that controls the operation of the product recovery device; a detection unit that detects the concentration of the product in the first solution or the second solution recovered from the reaction vessel; Equipped with The control unit When the concentration of the product exceeds a predetermined threshold, the first solution or the second solution recovered from the reaction vessel is supplied to the product recovery device; When the concentration of the product is equal to or lower than the predetermined threshold value, the first solution or the second solution recovered from the reaction vessel is returned to the reaction vessel without passing through the product recovery device. The reactor of claim 1.

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