Showerhead for substrate processing system

Abstract

A dual plenum showerhead for a substrate processing system includes a base portion and a backplate. The base portion has a first side facing the substrate, a second side opposite the first side, and a sidewall extending between the first side and the second side. The first side and the second side are flat. The first side, the second side, and the sidewall define a first plenum. The backplate has a shaped surface extending from a central portion of the backplate to an outer periphery of the backplate. The shaped surface has a plurality of portions. At least one of the portions is parallel to the base portion. At least one of the portions is angled toward the base portion. The outer periphery of the backplate is attached to a second surface of the base portion defining a second plenum.

Description

[Technical field]

[0001] [CROSS REFERENCE TO RELATED APPLICATIONS] This application claims the benefit of U.S. Provisional Application No. 63 / 320,015, filed March 15, 2022. The entire disclosure of the above application is incorporated herein by reference.

[0002] The present disclosure relates generally to substrate processing systems, and more particularly to showerheads for substrate processing systems. [Background technology]

[0003] The background description provided herein is intended to provide a general overview of the contents of the present disclosure. Work by the currently named inventors within the scope of what is described in this Background section, as well as aspects of the description that may not otherwise be regarded as prior art at the time of filing, are not admitted, expressly or impliedly, as prior art against the present disclosure.

[0004] Substrate processing tools typically include multiple stations that perform deposition, etching, and other processing on substrates, such as semiconductor wafers. Examples of processes that may be performed on the substrate include chemical vapor deposition (CVD) processes, chemically enhanced plasma vapor deposition (CEPVD) processes, plasma enhanced chemical vapor deposition (PECVD) processes, sputtering physical vapor deposition (PVD) processes, atomic layer deposition (ALD), and plasma enhanced ALD (PEALD). Further examples of processes that may be performed on the substrate include etching (e.g., chemical etching, plasma etching, reactive ion etching, etc.) and cleaning processes.

[0005] During processing, a substrate is placed on a substrate support, such as a pedestal, in the station. During deposition, a gas mixture containing one or more precursors is introduced into the station and a plasma may optionally be ignited to promote a chemical reaction. During etching, a gas mixture containing an etching gas is introduced into the station and a plasma may optionally be ignited to promote a chemical reaction. A computer-controlled robot typically transfers the substrates from one station to another in the order in which they are processed.

[0006] ALD uses a gaseous chemical process to sequentially deposit thin films on the surface of a material (e.g., the surface of a substrate such as a semiconductor wafer). Most ALD reactions use at least two chemicals, called precursors (reactants), that react sequentially and self-limitingly with the surface of the material, one at a time. Through repeated exposure to the separate precursors, a thin film is gradually deposited on the surface of the material. Thermal ALD (T-ALD) is carried out in a heated station. The station is maintained at subatmospheric pressure using a vacuum pump and a controlled flow of an inert gas. The substrate to be coated with the ALD film is placed in the station and the substrate is equilibrated to the temperature of the station before the ALD process begins. Summary of the Invention

[0007] A dual plenum showerhead for a substrate processing system includes a base portion and a backplate. The base portion has a first side facing the substrate, a second side opposite the first side, and a sidewall extending between the first side and the second side. The first side and the second side are flat. The first side, the second side, and the sidewall define a first plenum. The backplate has a shaped surface extending from a central portion of the backplate to an outer periphery of the backplate. The shaped surface has a plurality of portions. At least one of the portions is parallel to the base portion. At least one of the portions is angled toward the base portion. The outer periphery of the backplate is attached to a second surface of the base portion defining a second plenum.

[0008] In a further feature, the base portion and the backplate are cylindrical. The dual plenum showerhead further includes a plate disposed between the shaped surface and the second surface of the base portion. The plate has a smaller diameter than the base portion and includes a plurality of through holes.

[0009] In a further feature, the through holes increase in size along a radius of the plate.

[0010] In a further feature, the through holes are arranged in concentric circles on the plate.

[0011] In a further feature, the diameter of the through hole increases with the radius of the circle.

[0012] In a further feature, the thickness of the plate is less than the distance between the second surface of the base portion and the central portion of the backplate.

[0013] In a further feature, a thickness of the plate is less than a distance between the second surface of the base portion and at least one of the portions of the molding surface that is parallel to the base portion and within a radius of the plate.

[0014] In a further feature, a thickness of the plate is less than a distance between the second surface of the base portion and at least one of the portions of the molding surface that slopes toward the base portion and within a radius of the plate.

[0015] In a further feature, the thickness of the plate is greater than the distance between the second surface of the base portion and at least one of the portions of the molding surface that is parallel to the base portion and outside a radius of the plate.

[0016] In a further feature, the thickness of the plate is greater than the distance between the second surface of the base portion and at least one of the portions of the molding surface that slopes toward the base portion and is outside the radius of the plate.

[0017] In a further feature, the plate is tapered near the outer diameter of the plate.

[0018] In a further feature, the plate is rounded near the outer diameter edge of the plate.

[0019] In a further feature, the base portion has a first set of through holes extending from the first surface to the first plenum and a second set of through holes extending from the first surface to the second surface, the first plenum and the first set of through holes are not in fluid communication with the second plenum and the second set of through holes, and the second plenum, the second set of through holes, and the through holes in the plate are in fluid communication with each other.

[0020] In a further feature, the dual plenum showerhead further comprises a stem portion attached to the backplate and an adapter attached to the stem portion, the adapter having cooling channels disposed in a portion of the adapter for circulating a coolant through the cooling channels.

[0021] In a further feature, the stem portion and the adapter have passages separately connected to the first plenum and the second plenum.

[0022] In a further feature, the dual plenum showerhead further includes a plate disposed between the shaped surface and the second surface of the base portion. The plate has a smaller diameter than the base portion and has a plurality of through holes. A first of the passages passes through a central portion of the backplate and connects to the second plenum. A second of the passages passes through the central portion of the backplate and a central region of the plate and connects to the first plenum.

[0023] A further feature is that the first and second passages are coaxial.

[0024] In a further feature, the dual plenum showerhead further comprises a heater disposed on the backplate.

[0025] In a further feature, the backplate has a flat surface opposite the molding surface, a second sidewall extending from an outer periphery of the backplate toward the flat surface, and a heater disposed in a groove in the second sidewall at a distal end of the second sidewall.

[0026] In a further feature, the base portion has cross-drilled bores extending laterally therethrough, a first set of through holes extending from the first face through a perforated region of the base portion to the first plenum, and a second set of through holes extending from the first face through a non-perforated region of the base portion and through the second face to the second plenum.

[0027] In a further feature, the dual plenum showerhead further comprises a ring attached to a sidewall of the base portion surrounding the bore.

[0028] In a further feature, the first set of through holes and the second set of through holes have conical ends at the first surface of the base portion.

[0029] In a further feature, the first set of through holes has a smaller length and diameter than the second set of through holes.

[0030] In a further feature, the first set of through holes and the second set of through holes have a cylindrical portion and a conical portion extending from the cylindrical portion. The cylindrical portions of the first set of through holes and the second set of through holes extend to the first plenum and the second plenum, respectively. The conical portions of the first set of through holes and the second set of through holes extend to the first surface of the base portion.

[0031] In a further feature, the cylindrical and conical portions of the first set of through holes have lengths and diameters, respectively, that are smaller than the cylindrical and conical portions of the second set of through holes.

[0032] In further features, the cylindrical portion of the first set of through holes has a smaller length and diameter than the cylindrical portion of the second set of through holes, and the conical portion of the first set of through holes has a smaller length and diameter than the conical portion of the second set of through holes.

[0033] In a further feature, the conical portions of the first set of through holes extend at a first angle relative to an axis parallel to the length of the cylindrical portions of the first set of through holes, and the conical portions of the second set of through holes extend at a second angle relative to an axis parallel to the length of the cylindrical portions of the second set of through holes.

[0034] In a further feature, the first angle and the second angle are equal.

[0035] In a further feature, a system includes a showerhead, a first gas source, a second gas source, and a controller. The first gas source is configured to supply a first gas to the first plenum. The second gas source is configured to supply a second gas to the second plenum. The controller is configured to control a flow rate of the first gas to a rate selected to reduce injection of the second gas through the second set of through-holes and reduce diffusion of the second gas through the first set of through-holes into the first plenum.

[0036] In a further feature, a system includes a showerhead, a first gas source, a second gas source, and a controller. The first gas source is configured to supply a first gas to the first plenum. The second gas source is configured to supply a second gas to the second plenum. The controller is configured to control a flow rate of the second gas to a rate selected to reduce injection of the first gas through the first set of through-holes and reduce diffusion of the first gas through the second set of through-holes into the second plenum.

[0037] In a further feature, the overall length of the first set of through holes is in the range of 0.15 to 0.35 inches. The overall length of the second set of through holes is in the range of 0.5 to 0.7 inches.

[0038] In a further feature, the cylindrical portion of the first set of through holes has a diameter in the range of 0.014 to 0.018 inches. The cylindrical portion of the second set of through holes has a diameter in the range of 0.029 to 0.039 inches.

[0039] In a further feature, the conical portions of the first set of through holes and the second set of through holes extend at an angle in the range of 30 to 60 degrees relative to an axis parallel to the length of the cylindrical portions of the first set of through holes and the second set of through holes.

[0040] Other areas of applicability of the present disclosure will become apparent from the detailed description, the claims, and the drawings. The detailed description and specific examples are for purposes of illustration only and are not intended to limit the scope of the present disclosure. [Brief description of the drawings]

[0041] The present disclosure will become more fully understood from the detailed description and the accompanying drawings, wherein:

[0042] [Figure 1] FIG. 1 illustrates a schematic of an example substrate processing tool with multiple stations for processing substrates.

[0043] [Diagram 2] FIG. 2 illustrates an example of a substrate processing system including stations configured to process substrates.

[0044] [Diagram 3] FIG. 3 is a cross-sectional view of a dual plenum showerhead in accordance with the present disclosure.

[0045] [Figure 4A] FIG. 4A illustrates in greater detail one example of the profile of an upper plenum formed in the backplate of the dual plenum showerhead of FIG. [Figure 4B] FIG. 4B illustrates in greater detail one example of the profile of the upper plenum formed in the backplate of the dual plenum showerhead of FIG.

[0046] [Diagram 5]FIG. 5 illustrates in greater detail one example of a baffle plate used in the upper plenum of the dual plenum showerhead of FIG.

[0047] [Figure 6A] FIG. 6A shows the heater of the dual plenum showerhead of FIG. 3 in further detail. [Figure 6B] FIG. 6B shows the heater of the dual plenum showerhead of FIG. 3 in further detail.

[0048] [Figure 7A] FIG. 7A illustrates in greater detail one example of an adapter attached to the stem portion of the dual plenum showerhead of FIG. [Figure 7B] FIG. 7B illustrates in further detail one example of an adapter attached to the stem portion of the dual plenum showerhead of FIG. [Figure 7C] FIG. 7C illustrates in further detail one example of an adapter attached to the stem portion of the dual plenum showerhead of FIG. [Figure 7D] FIG. 7D illustrates in further detail one example of an adapter attached to the stem portion of the dual plenum showerhead of FIG. [Figure 7E] FIG. 7E illustrates in further detail one example of an adapter attached to the stem portion of the dual plenum showerhead of FIG. [Figure 7F] FIG. 7F shows an example of an adapter attached to the stem portion of the dual plenum showerhead of FIG. 3 in further detail.

[0049] [Figure 8A] FIG. 8A illustrates in greater detail a first example of a lower plenum formed in the base portion of the dual plenum showerhead of FIG. [Figure 8B] FIG. 8B illustrates in greater detail a first example of a lower plenum formed in the base portion of the dual plenum showerhead of FIG. [Figure 8C]FIG. 8C illustrates in greater detail a first example of a lower plenum formed in the base portion of the dual plenum showerhead of FIG.

[0050] [Figure 9A] FIG. 9A illustrates in greater detail a second example of a lower plenum formed in the base portion of the dual plenum showerhead of FIG. [Figure 9B] FIG. 9B illustrates in greater detail a second example of a lower plenum formed in the base portion of the dual plenum showerhead of FIG. [Figure 9C] FIG. 9C illustrates in greater detail a second example of a lower plenum formed in the base portion of the dual plenum showerhead of FIG.

[0051] [Figure 10] FIG. 10 illustrates through-holes formed in the top surface of the base portion of the dual plenum showerhead of FIG.

[0052] [Figure 11] FIG. 11 shows an example of a pattern of through-holes formed in the lower, substrate-facing surface of the base portion of the dual plenum showerhead of FIG. [Figure 12] FIG. 12 shows an example of a pattern of through-holes formed in the lower, substrate-facing surface of the base portion of the dual plenum showerhead of FIG.

[0053] [Figure 13] FIG. 13 is a cross-sectional view of a second dual plenum showerhead in accordance with the present disclosure.

[0054] [Figure 14] FIG. 14 is a bottom view of the second dual plenum showerhead.

[0055] [Figure 15] FIG. 15 shows an example of a through hole in the upper plenum.

[0056] [Figure 16]FIG. 16 shows an example of a through hole in the lower plenum.

[0057] In the drawings, reference numbers may be reused to identify similar and / or identical elements. DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS

[0058] Before describing the problem solved by the present disclosure, a brief description of dual plenum showerheads will be provided. Some substrates are processed by supplying separate process gases using dual plenum showerheads. For example, a dual plenum showerhead (hereinafter, showerhead) includes a base portion attached to a backplate. A first plenum is defined in the base portion by a bore cross-drilled diametrically through the base portion. The cross-drilling forms vertical columns in the base portion. The columns extend between a lower surface and an upper surface of the base portion. The lower surface of the base portion faces the substrate. The upper surface of the base portion is attached to the bottom of the backplate. The space between the columns defines a first plenum of the base portion. A first plurality of through holes is drilled vertically from the lower surface of the base portion through the space between the columns, but not through the upper surface of the base portion. The first plurality of through holes is in fluid communication with the first plenum. A second plurality of through holes is drilled vertically from the lower surface of the base portion through the columns and the upper surface of the base portion.

[0059] A second plenum is defined in the backplate by removing material from a bottom of the backplate. When the base portion is attached to the backplate, an upper surface of the base portion and the bottom of the backplate define the second plenum. The second plurality of through holes is in fluid communication with the second plenum. The second plenum and the second plurality of through holes are not in fluid communication with the first plenum and the first plurality of through holes. For convenience, the first plenum of the base portion may be referred to as a lower plenum and the second plenum of the backplate may be referred to as an upper plenum.

[0060] The showerhead comprises a stem portion attached to the backplate. The stem portion comprises a first passage and a second passage drilled through the stem portion. The first passage is in fluid communication with the first plenum and the first plurality of through holes. The second passage is in fluid communication with the second plenum and the second plurality of through holes. The first gas passage and the second gas passage are decoupled (i.e., separate) and are not in fluid communication with each other. Thus, the process gas can be separately supplied to the first plenum and the second plenum through the first passage and the second passage, respectively. Specifically, the first process gas can be supplied to the first plenum through the first passage and supplied to the substrate through the first plurality of through holes. The second process gas can be supplied to the second plenum through the second passage and supplied to the substrate through the second plurality of through holes.

[0061] Typically, the upper plenum is cylindrical and extends diametrically across the bottom of the backplate. The volume of the upper plenum determines various aspects of the substrate processing. For example, the volume of the upper plenum determines the purge time, the process uniformity (e.g., film resistance non-uniformity), and the film quality (e.g., halogen content in the film). The present disclosure improves these aspects by reducing the volume of the upper plenum. Specifically, the present disclosure reduces the volume of the upper plenum by profiling the upper plenum, as described in more detail below.

[0062] Additionally, process gas supplied through the second plenum tends to flow more through a central region of the second plenum than through an outer periphery of the second plenum. The present disclosure provides a baffle plate disposed in the central region of the second plenum. The baffle plate is designed to divert the process gas and distribute the process gas evenly from the center to the edge of the baffle plate. The even distribution is achieved by drilling holes through the baffle plate that increase in diameter from the center to the edge of the baffle plate.

[0063] Additionally, the showerhead heats up during substrate processing. Also, the showerhead is in close proximity to a heated pedestal during substrate processing. As a result, the showerhead reaches high temperatures (e.g., several hundred degrees) during substrate processing. Heat from the showerhead is transferred through a stem to a manifold that is used to supply process gases to the showerhead. The present disclosure provides an adapter that is attached to the stem of the showerhead. The adapter is cooled as described in more detail below. The adapter reduces the amount of heat transferred from the showerhead to the manifold.

[0064] Also, the amount of process gas used to treat a substrate can be reduced by reducing the gap between the showerhead and the substrate. However, when reducing the gap between the showerhead and the substrate, it is desirable to optimize the shape of the through holes in the dual plenum and the flow rate of the inert gas supplied through the lower plenum to prevent jetting (significant or excessive localized deposition or etching) on ​​the substrate and to prevent the process gas supplied through the upper plenum from diffusing or backflowing into the showerhead. These and other features of the present disclosure are described in detail below.

[0065] The present disclosure is organized as follows: First, to provide context, an example of a substrate processing tool with multiple stations is shown and described with reference to FIG. 1. An example of a substrate processing system with stations configured to process substrates using a dual plenum showerhead of the present disclosure is shown and described with reference to FIG. 2. A cross-sectional view of a dual plenum showerhead according to the present disclosure is shown and described with reference to FIG. 3. An example of a profile of an upper plenum of a dual plenum showerhead according to the present disclosure is shown and described in further detail with reference to FIG. 4A and FIG. 4B. An example of a baffle plate used in the upper plenum of a dual plenum showerhead according to the present disclosure is shown and described in further detail with reference to FIG. 5.

[0066] A heater for use in an upper plenum of a dual plenum showerhead is shown and described in further detail with reference to Figures 6A and 6B. An example of an adapter for a dual plenum showerhead according to the present disclosure is shown and described in further detail with reference to Figures 7A-7C. An example of a lower plenum formed in a base portion of a dual plenum showerhead is shown and described in further detail with reference to Figures 8A and 9C. Through holes formed in an upper surface of a base portion of a dual plenum showerhead is shown and described in further detail with reference to Figure 10. Different patterns of through holes formed in a lower substrate-facing surface of the base portion are shown and described with reference to Figures 11 and 12.

[0067] 13-16 show a second example of a dual plenum showerhead with upper and lower plenum through-holes optimized to prevent jetting and back-diffusion. FIG. 13 shows the second showerhead.

[0068] Figure 14 is a bottom view of the second showerhead showing separate through-holes in the upper and lower plenums. Figures 15 and 16 show the geometry of the through-holes in the upper and lower plenums in more detail. Tools and Station Examples

[0069] 1 illustrates diagrammatically an example of a substrate processing tool 10. For example, the substrate processing tool 10 includes four (or any number) stations: a first station 12, a second station 14, a third station 16, and a fourth station 18. For example, each station 12, 14, 16, and 18 may be configured to perform one or more respective processes on a substrate. A transfer robot 20 transfers substrates between stations 12, 14, 16, and 18 depending on the process to be performed on the substrate at each station.

[0070] For example, in some processes, the transfer robot 20 transfers a substrate from the first station 12 to the second station 14, from the second station 14 to the third station 16, and from the third station 16 to the fourth station 18 for processing. After the substrate is processed in the fourth station 18, the transfer robot 20 transfers the substrate to the first station 12. The substrate is then removed from the first station 12 and a new substrate is loaded into the first station 12, and the above cycle is repeated.

[0071] 2 illustrates an example of a substrate processing system 100 that includes a station 102 configured to process a substrate using a process such as thermal atomic layer deposition (T-ALD), chemical vapor deposition (CVD), plasma-enhanced ALD (PEALD), or PECVD. For example, station 102 may comprise any of stations 12, 14, 16, and 18 of the substrate processing tool 10 illustrated in FIG.

[0072] The station 102 comprises a substrate support (e.g., pedestal) 104. The pedestal 104 has a base portion 106 and a stem portion 108. During processing, a substrate 110 and a ring assembly 111 are disposed on the base portion 106 of the pedestal 104. The substrate 110 is clamped to the base portion 106 of the pedestal 104 using a vacuum clamp (not shown). The ring assembly 111 is used to transport the substrate 110 using a transfer robot 20, as described above with reference to FIG. 1 . The stem portion 108 is generally Y-shaped. A heater 112 is disposed in the base portion 106 to heat the substrate 110 during processing. One or more temperature sensors 114 are disposed in the base portion 106 to sense the temperature of the pedestal 104.

[0073] The station 102 includes a gas distribution device 120, such as a dual plenum showerhead. The dual plenum showerhead (hereafter showerhead) 120 is shown with reference to FIGS. 3-12 and described in more detail below. Briefly, the showerhead 120 is used to introduce and distribute process gases within the station 102. The showerhead 120 is made of a metal, such as aluminum or an alloy. The showerhead 120 has a base portion 122, a backplate 124, and a stem portion 126. An adapter 127 (see FIGS. 7A-7D) having cooling channels is attached to the stem portion 126. The base portion 122, the backplate 124, the stem portion 126, and the adapter 127 are shown with reference to FIGS. 3-12 and described in more detail below.

[0074] Briefly, a base portion 122 is attached to a backplate 124. The base portion 122 and the backplate 124 are generally cylindrical. The base portion 122 has a first (lower) plenum (see FIG. 3 and FIGS. 8A-9C). The backplate 124 has a second (upper) plenum (see FIGS. 3-4B). The upper end of the backplate 124 has a flange 125 that extends radially outward and is attached to a sidewall of the station 102. One end of a stem portion 126 is attached to the center of the backplate 124. The distal end of the stem portion 126 is attached to an adapter 127. The stem portion 126 and the adapter 127 have bores (see FIG. 3) through which process gases are delivered to the upper and lower plenums of the showerhead 120.

[0075] The substrate-facing surface of base portion 122 has a number of outlets or features (e.g., slots or through-holes, see Figures 11 and 12) through which process gases enter station 102. Showerhead 120 includes a heater, which is shown with reference to Figures 3, 6A, and 6B and described in further detail below. Showerhead 120 includes one or more temperature sensors 128 for sensing the temperature of showerhead 120.

[0076] The gas delivery system 130 includes a plurality of gas sources 132-1, 132-2, ..., and 132-N (collectively, gas sources 132), where N is a positive integer. The gas sources 132 are connected to mass flow controllers 136-1, 136-2, ..., and 136-N (collectively, mass flow controllers 136) by valves 134-1, 134-2, ..., and 134-N (collectively, valves 134). The gas sources 132 may supply process gases, purge gases, inert gases, cleaning gases, etc. to the station 102. One or more of the gas sources 132 supply process gases to an upper plenum of the showerhead 120 via a manifold 140. One or more of the gas sources 132 supply process gases to a lower plenum of the showerhead 120. Additionally, although not shown, if a plasma is used, the substrate processing system 100 may also include an RF power supply that provides RF power to the showerhead 120 to ignite the plasma.

[0077] The cooling assembly 150 is mounted to the base of the stem portion 108 of the pedestal 104. A coolant supply 152 supplies coolant (e.g., water) to the cooling assembly 150 via a valve 154. The coolant flowing through the cooling assembly 150 removes heat from the stem portion 108 of the pedestal 104. A pedestal elevation assembly 155 is attached to the cooling assembly 150. The pedestal elevation assembly 155 raises and lowers the pedestal 104 vertically relative to the showerhead 120.

[0078] The coolant supplier 152 also supplies coolant to the cooling channels in the adapter 127 via valve 157. The coolant flowing through the cooling channels in the adapter 127 removes heat from the stem portion 126 of the showerhead 120. The adapter 127, cooled by the coolant, reduces the amount of heat transferred from the stem portion 126 of the showerhead 120 to the manifold 140. In addition, the coolant supplier 152 supplies coolant to a heater in the showerhead 120 (see FIGS. 3, 6A, and 6B) to control the temperature of the showerhead 120.

[0079] A controller 160 controls the components of the substrate processing system 100. The controller 160 is connected to the heater 112 in the pedestal 104, the heater in the showerhead 120, and the temperature sensors 114 and 128 in the pedestal 104 and the showerhead 120. The controller 160 controls the power supplied to the heater 112 to control the temperature of the pedestal 104. The controller 160 also controls the power supplied to the heater disposed in the showerhead 120 to control the temperature of the showerhead 120. The controller 160 controls the power supplied to the heaters in the pedestal 104 and the showerhead 120 based on feedback received from the temperature sensors 114 and 128 disposed in the pedestal 104 and the showerhead 120, respectively.

[0080] The controller 160 controls the supply of coolant to the adapter 127 by controlling the valve 157 based on the temperature of the showerhead 120 sensed by the temperature sensor 128. The controller 160 also controls the supply of coolant to the cooling assembly 150 by controlling the coolant supplier 152 and the valve 154 based on the temperature of the pedestal 104 sensed by the temperature sensor 114. The controller 160 controls the pedestal elevation assembly 155 to control the gap between the pedestal 104 (and substrate 110) and the showerhead 120.

[0081] A vacuum pump 158 maintains the interior of station 102 at subatmospheric pressure during substrate processing. A valve 156 is connected to an exhaust port of station 102. Valve 156 and vacuum pump 158 are used to control the pressure within station 102 and to evacuate reactants from station 102 through valve 156. A controller 160 controls vacuum pump 158 and valve 156. Dual plenum shower head

[0082] FIG. 3 shows a dual plenum showerhead (hereafter showerhead) 120 in more detail. All components of the showerhead 120 described below are made of a metallic material (e.g., aluminum or alloy). The showerhead 120 has a base portion 122, a backplate 124, and a stem portion 126. The base portion 122 is attached to the backplate 124. The base portion 122 and the backplate 124 are generally cylindrical. The base portion 122 has a first (lower) plenum 200, which is shown with reference to FIGS. 8A-9C and described in more detail below. The backplate 124 has a second (upper) plenum 202, which is shown with reference to FIGS. 4A and 4B and described in more detail below.

[0083] Briefly, the lower plenum 200 is formed by cross-drilling a bore (see FIGS. 8A-9C) diametrically through the base portion 122. The cross-drilling forms a vertical column (see FIGS. 8A-9C) between the lower substrate-facing surface 204 and the upper surface 206 of the base portion 122. A set of first through-holes 210-1, 210-2, ..., and 210-N (collectively, first through-holes 210), where N is a positive integer, are drilled from the lower surface 204 of the base portion 122 into the first plenum 200. The first through-holes 210 extend vertically from the lower surface 204 of the base portion 122 into the lower plenum 200, as shown with reference to FIGS. 8A-9C and described in more detail below. The first through-holes 210 have a first diameter. The first through hole 210 is in fluid communication with the lower plenum 200. A ring 212 is attached to the outer periphery (e.g., sidewall) of the base portion 122 and surrounds a bore cross-drilled in the base portion 122. Alternatively, a plug (not shown) may be inserted into the bore cross-drilled in the base portion 122. For example, the ring 212 may comprise a clamp. Thus, the lower and upper surfaces 204, 206 of the base portion 122 and the ring 212 define the lower plenum 200.

[0084] The upper plenum 202 is defined in the backplate 124 by removing material from a bottom region 214 of the backplate 124. The removal of material causes the bottom region 214 of the backplate 124 to have a predetermined profile, as shown with reference to Figures 4A and 4B and described in further detail below. Briefly, the bottom region 214 of the backplate 124 tapers at various angles from the center to the edge of the bottom region 214 of the backplate 124. When the base portion 122 is attached to the backplate 124, the top surface 206 of the base portion 122 and the bottom region 214 of the backplate 124 define the upper plenum 202.

[0085] A set of second through holes 220-1, 220-2, ..., and 210-M (collectively, second through holes 220), where M is a positive integer, are drilled into a post formed in the base portion 122. The second through holes 220 extend vertically from the lower surface 204 to the upper surface 206 of the base portion 122 into the upper plenum 202. The second through holes 220 have a second diameter. The second diameter may or may not be the same as the first diameter of the first through holes 210. The second through holes 220 are in fluid communication with the upper plenum 202. The second through holes 220 and the upper plenum 202 are decoupled (separate) from the first through holes 210 and the lower plenum 200. Thus, the second through-holes 220 and the upper plenum 202 are not in fluid communication with the first through-holes 210 and the lower plenum 200 .

[0086] A baffle plate 218 is disposed within the upper plenum 202. The baffle plate 218 is attached to the upper surface 206 of the base portion 122 using suitable fasteners shown at 217. The baffle plate 218 is shown with reference to FIG. 5 and described in further detail below. Briefly, the baffle plate 218 is flat and generally cylindrical, tapered at the edges to match the profile of the upper plenum 202. The baffle plate 218 has a smaller diameter than the backplate 124 and base portion 122 of the showerhead 120. The baffle plate 218 has a concentric array of through holes (see FIG. 5). The diameter of each through hole in the baffle plate 218 increases from the center to the edges of the baffle plate 218.

[0087] The through-holes in the baffle plate 218 may or may not be aligned with the second through-holes 220. However, the through-holes in the baffle plate 218 are in fluid communication with the second through-holes 220 and the upper plenum 202. The through-holes in the baffle plate 218 are not in fluid communication with the first through-holes 210 and the lower plenum 202. The baffle plate 218 uniformly distributes the process gas flowing through the upper plenum 202 through the second through-holes 220. Specifically, due to the varying diameters, the through-holes in the baffle plate 218 uniformly distribute the process gas through the second through-holes 220 from the center to the edge of the baffle plate 218.

[0088] The backplate 124 has a top surface 230 and a sidewall 232. The sidewall 232 extends vertically upward from an outer diameter (OD) of the bottom region 214 of the backplate 124. That is, the sidewall 232 extends vertically along the axis 240 of the showerhead 120, away from the base portion 122. The top surface 230 of the backplate 124 is perpendicular to the showerhead axis 240 and parallel to the base portion 122. The top surface 230 extends radially to an inner diameter (ID) of the sidewall 232.

[0089] A portion of the sidewall 232 extends vertically above the top surface 230 parallel to the axis 240 of the showerhead 120. The height of the sidewall 232 is the distance between the OD of the bottom region 214 of the backplate 124 and the distal end 233 of the sidewall 232. The distance from the OD of the bottom region 214 of the backplate 124 to the top surface 230 of the backplate 124 is less than the height of the sidewall 232.

[0090] The distal end 233 of the sidewall 232 has a flange 125 extending radially outward from the OD of the sidewall 232. The flange 125 is attached to the sidewall of the station 102 as shown and described above with reference to FIG. 2. The distal end 233 of the sidewall 232 has a groove 236 along the ID of the sidewall 232. The groove 236 is located opposite the flange 125. A heater 238 is disposed within the groove 236. The heater 238 heats the backplate 124. The heater 238 is shown with reference to FIGS. 6A and 6B and will be described in further detail below.

[0091] The stem portion 126 of the showerhead 120 is attached to the center of the top surface 230 of the backplate 124. The stem portion 126 is generally cylindrical. The stem portion 126 extends vertically from the center of the top surface 230 along the axis 240 of the showerhead 120. The stem portion 126 has a smaller diameter than the backplate 124 and the base portion 122. The height of the stem portion 126 is equal to or less than the distance between the top surface 230 of the backplate 124 and the distal end 233 of the sidewall 232. The adapter 127 is attached to the distal end 126-1 of the stem portion 126. The adapter 127, along with the cooling channels, is shown with reference to Figures 7A-7C and will be described in further detail below.

[0092] The stem portion 126 and adapter 127 have inlets, outlets, bores, and conduits (collectively referred to as passageways) through which process gases are delivered to the upper and lower plenums 202, 200 of the showerhead 120 as follows: In the example passageways described below, various example inlet, outlet, bore, and conduit arrangements are described. Alternately, other arrangements of inlets, outlets, bores, and conduits can be used.

[0093] For example, the adapter 127 has a first inlet 250-1, a second inlet 250-2, and a third inlet 250-3 (collectively, inlets 250). The adapter 127 has a first outlet 251-1 and a second outlet 251-2 (collectively, outlets 251). The first inlet 250-1 is located on a top surface 127-1 of the adapter 127. The second inlet 250-2 is located on a first side surface 127-2 of the adapter 127. The third inlet 250-3 is located on a second side surface 127-3 of the adapter 127. The outlet 251 is located on a bottom surface 127-4 of the adapter 127. For example, the first inlet 250-1 is connected to the manifold 140 (shown in FIG. 2). The second inlet 250-2 may be connected to another manifold (not shown), which may in turn receive one or more gases from gas source 130 (shown in FIG. 2). The third inlet 250-3 may be connected to yet another manifold (not shown), which may in turn receive one or more gases from gas source 132 (shown in FIG. 2).

[0094] A first bore 252-1 is drilled through the adapter 127 along the axis 240 of the showerhead 120. The first bore 252-1 extends from the first inlet 250-1 through the adapter 127 to a first outlet 251-1 of the adapter 127. The first inlet 250-1, the first bore 252-1, and the first outlet 251-1 of the adapter 127 are aligned with the axis 240 of the showerhead 120. A second bore 252-2 is drilled through the adapter 127 perpendicular to the axis 240 of the showerhead 120. The second bore 252-2 extends from the second inlet 250-2 through the adapter 127 and connects to the first bore 252-1. A third bore 252-3 is drilled through the adapter 127 perpendicular to the axis 240 of the showerhead 120. The third bore 252-3 extends from the third inlet 250-3 through the adapter 127, turns downward toward the bottom surface 127-4 of the adapter 127, and extends parallel to the axis 240 of the showerhead 120 to the second outlet 251-2.

[0095] The stem portion 126 has a first inlet 253-1 and a second inlet 253-2 (collectively inlets 253). The inlets 253 are located on the distal end 126-1 of the stem portion 126. When the adapter 127 is attached to the stem portion 126, the bottom surface 127-4 of the adapter is attached to the distal end 126-1 of the stem portion 126. The first outlet 251-1 and the second outlet 251-2 of the adapter 127 mate with the first inlet 253-1 and the second inlet 253-2 of the stem portion 126, respectively. The stem portion 126 has an outlet 255. The outlet 255 is located on the bottom surface 256 of the stem portion 126, which is attached to the top surface 230 of the backplate 124.

[0096] A fourth bore 252-4 is drilled through the stem portion 126 along the axis 240 of the showerhead 120. The fourth bore 252-4 extends from the first inlet 253-1 through the stem portion 126 to the outlet 255 of the stem portion 126. The first inlet 253-1, the fourth bore 252-4, and the outlet 255 of the stem portion 126 are aligned with the axis 240 of the showerhead 120. A first portion of the fourth bore 252-4 connected to the first inlet 253-1 of the stem portion 126, the first inlet 253-1, and the first outlet 251-1 of the adapter 127 have the same diameter (referred to as the first diameter). A second portion of the fourth bore 252-4, which extends from the first portion of the fourth bore 252-4 to the outlet 255 in the stem portion 126, and the outlet 255 have the same diameter (referred to as the second diameter). The second diameter is larger than the first diameter.

[0097] A fifth bore 252-5 is drilled through the stem portion 126 along the axis 240 of the showerhead 120. The fifth bore 252-5 is parallel to the fourth bore 252-4. A first conduit 258-1 is inserted from a side 126-2 of the stem portion 126 through a corresponding bore (not shown) drilled in the stem portion 126. The distal end of the conduit 258-1 and the corresponding bore extend perpendicular to the axis 240 of the showerhead 120 toward the center of the stem portion 126 and into the fourth bore 252-4. After inserting the first conduit 258-1, the corresponding bore is closed (e.g., with a plug) at the side 126-2 of the stem portion 126. A second conduit 258-2 is inserted from an outlet 255 of the stem portion 126. The distal end of the second conduit 258-2 is attached to the distal end of the first conduit 258-1 at the center of the stem portion 126.

[0098] The backplate 124 has an inlet 260 on the top surface 230 of the backplate 124. When the stem portion 126 is attached to the backplate 124, the outlet 255 of the stem portion 126 mates with the inlet 260 of the backplate 124. The outlet 255 of the stem portion 126 has the same diameter as the inlet 260 of the backplate 124. A bore 262 is drilled through the backplate 124 along the axis 240 of the showerhead 120. The bore 262 extends from the inlet 260 and enters the upper plenum 202. The bore 262 has the same diameter as the second portion of the fourth bore 252-4. A second conduit 258-2 extends through the bore 262, the upper plenum 202, and the center of the baffle plate 218. The second conduit 258-2 is connected to the lower plenum 200. The second conduit 258-2 is not in fluid communication with the bore 262.

[0099] The first inlet 250-1, the second inlet 250-2, the first bore 252-1, the second bore 252-2, the first outlet 251-1, the first inlet 253-1, the fourth bore 252-4, the outlet 255, the inlet 260, the bore 262, the upper plenum 202, the through holes in the baffle plate 218, and the second through holes 220 (referred to as a first set of elements) are in fluid communication with each other.

[0100] The third inlet 250-3, the third bore 252-3, the second outlet 251-2, the second inlet 253-2, the fifth bore 252-5, the first and second conduits 258-1, 258-2, the lower plenum 200, and the first through-hole 210 (referred to as the second set of elements) are in fluid communication with each other. The first and second sets of elements are not in fluid communication with each other. Thus, gases flowing through the first set of elements do not mix with gases flowing through the second set of elements in the showerhead 120.

[0101] Also, while one example of an arrangement of the various inlets, outlets, bores, and conduits (collectively, passages) is described above, the inlets, outlets, bores, and conduits can be arranged in other ways so that the upper and lower plenums 202, 202 remain separated and gases supplied through the upper and lower plenums 202, 202 do not mix within the showerhead 120. Dual Plenum Shower Head Elements

[0102] The profile of the upper plenum 202 is shown and described in further detail with reference to Figures 4A and 4B. The baffle plate 218 is shown and described in further detail with reference to Figure 5. The heater 238 is shown and described in further detail with reference to Figures 6A and 6B. The adapter 127 and stem portion 126 are shown and described in further detail with reference to Figures 7A-7F. A cross-sectional view of the lower plenum 200 taken along line AA shown in Figure 3 is shown and described in further detail with reference to Figures 8A-9C. A top view of the base portion 122 (i.e., a cross-sectional view of the showerhead 120 taken along line BB shown in Figure 3) is shown and described in further detail with reference to Figure 10. A bottom view of the showerhead 120 (i.e., a cross-sectional view of the showerhead 120 taken along line BB shown in Figure 3) is shown and described in further detail with reference to Figures 11 and 12. Upper Plenum

[0103] Figures 4A and 4B show in more detail the profile of the upper plenum 202 of the showerhead 120. Other details of the showerhead 120 shown in Figure 3 are omitted but are assumed to be present in Figures 4A and 4B. Figure 4A shows the profile of the upper plenum 202 with the baffle plate 218 present. Figure 4B shows the profile of the upper plenum 202 without the baffle plate 218 (i.e., the baffle plate 218 has been removed from the showerhead 120).

[0104] In FIG. 4A, the upper plenum 202 tapers radially at various angles from the center of the backplate 124 to the OD of the bottom region 214 of the backplate 124. The taper of the bottom region 214 of the backplate 124 is described only for the first half of the backplate 124. The taper of the bottom region 214 in the second half of the backplate 124 is a mirror image of the taper of the bottom region 214 on the first half of the backplate 124. The following description is only one example of the taper of the bottom region 214. The distance and angle can vary. The number of sections can also vary. In the following description, a direction perpendicular to the axis 240 of the showerhead 120 is the same as being parallel to the top surface 230 of the backplate 124 and parallel to the bottom and top surfaces 204, 206 of the base portion 122. The angle is with respect to a plane perpendicular to the axis 240 of the showerhead 120 .

[0105] For example, a first portion 270 of the bottom region 214 extends radially from the center of the backplate 124 toward the OD of the backplate 124 a first distance d1 perpendicular to the axis 240 of the showerhead 120. A second portion 272 of the bottom region 214 then extends from the first portion 270 toward the OD of the backplate 124 and slopes downward at a first angle a second distance d2 toward the base portion 122 (i.e., away from the top surface 230 of the backplate 124). A third portion 274 of the bottom region 214 then extends from the second portion 272 and extends radially toward the OD of the backplate 124 a third distance d3 perpendicular to the axis 240 of the showerhead 120.

[0106] Next, a fourth portion 276 of the bottom region 214 extends from the third portion 274 toward the OD of the backplate 124 and slopes downward by a fourth distance d4 at a second angle toward the base portion 122 (i.e., away from the upper surface 230 of the backplate 124). Next, a fifth portion 278 of the bottom region 214 extends from the fourth portion 276, radially extends by a fifth distance d5 toward the OD of the backplate 124 and perpendicular to the axis 240 of the showerhead 120. Next, a sixth portion 280 of the bottom region 214 extends from the fifth portion 278 toward the OD of the backplate 124 and slopes downward by a sixth distance d6 at a third angle toward the base portion 122 (i.e., away from the upper surface 230 of the backplate 124) to the OD of the backplate 124.

[0107] For example, d1 < d2, d1 < d3, d1 < d5, d1 < d6, d1 is approximately equal to d4, d2 > d3, d2 > d4, d2 < d5, d2 > d6, d3 > d1, d3 < d2, d3 > d4, d3 < d5, d3 < d6, d4 is approximately equal to d1, d4 is smaller than each of d2, d3, d5, and d6, d5 is larger than each of d1, d2, d3, d4, and d6, d6 is larger than each of d1 and d4, and d6 is smaller than each of d2, d3, and d5. For example, the sum of distance d1, d2, and d3 is approximately equal to the diameter of the baffle plate 218. The diameter of the baffle plate is approximately half of the OD of the sidewall 232 (i.e., the OD of the backplate 124). For example, the sum of distance d1, d2, and d3 is approximately equal to the sum of those distances. In other examples, any one of distances d1 - d6 can be changed in any other way. Further, the number of portions can be increased or decreased.

[0108] For example, the first angle is less than the second angle and greater than the third angle. The second angle is greater than the first angle and the third angle. The third angle is less than the first angle and the second angle. In other examples, any of these angles can be varied in any other manner. Additionally, the number of angles can be increased or decreased.

[0109] In general, the backplate 124 has a molding surface (bottom region 214) that extends from a central portion of the backplate 124 to an outer periphery (OD) of the backplate 124. The molding surface (bottom region 214) has a number of portions or segments (e.g., elements 270-280). At least a portion of the molding surface (bottom region 214) is parallel to the base portion 122 (e.g., elements 270, 274, 278). At least one of the portions of the molding surface (bottom region 214) is angled toward the base portion 122 (e.g., elements 272, 276, 280). The outer periphery of the backplate 124 is attached to the top surface 206 of the base portion 122. The molding surface (bottom region 214) of the backplate 124 and the top surface 206 of the base portion 122 define an upper plenum 202.

[0110] 4B shows the profile of the upper plenum 202 without the baffle plate 218. This profile reduces the volume of the upper plenum 202 compared to a typical cylindrical plenum 201. FIG. 4B also shows a side view of the baffle plate 218. The thickness t (i.e., height) of the baffle plate 218 is less than half the distance d7 between the top surface 206 of the base portion 122 and the center of the bottom region 214 of the backplate 124.

[0111] Additionally, the thickness t of the baffle plate 218 is less than the distance between the upper surface 206 of the base portion 122 and at least one of the portions of the molding surface (bottom region 214) (e.g., elements 270, 274) that are parallel to the base portion 122 and within a radius of the baffle plate 218. The thickness t of the baffle plate 218 is also less than the distance between the upper surface 206 of the base portion 122 and at least one of the portions of the molding surface (bottom region 214) (e.g., elements 272, 276) that slope toward the base portion 122 and within a radius of the baffle plate 218.

[0112] Additionally, the thickness t of the baffle plate 218 is greater than the distance between the top surface 206 of the base portion 122 and at least one of the portions of the molding surface (bottom region 214) that are parallel to the base portion 122 and outside the radius of the plate (e.g., element 278). The thickness t of the baffle plate 218 is less than the distance between the top surface 206 of the base portion 122 and at least one of the portions of the molding surface (bottom region 214) that are inclined toward the base portion 122 and outside the radius of the baffle plate 218 (e.g., element 280).

[0113] The baffle plate 218 has a central opening 219 through which a second conduit 258-2 (shown in FIG. 3) passes and connects to the lower plenum 200. The baffle plate 218 tapers near its outer periphery (i.e., edge or OD) 221. Although not shown, the edge 221 of the baffle plate may be rounded instead of tapering at an angle as shown. Baffle plate

[0114] Figure 5 is a plan view of the baffle plate 218. The baffle plate has a plurality of sets of through holes 290-1, 290-2, 290-3, etc. (collectively, through holes 290) arranged in concentric circles. For simplicity of illustration, only 4 through holes 290 are shown for each circle, but a large number of through holes 290 can be arranged on each circle. The circles and the through holes 290 can extend in all directions indicated by the arrows up to the OD of the baffle plate 218 at most.

[0115] The through hole 290-1 on the first circle with the first radius R1 has the first diameter D1. The through hole 290-2 on the second circle with the second radius R2 has the second diameter D2. The through hole 290-3 on the third circle with the third radius R3 has the third diameter D3, etc., where R1 > R2 > R3, etc., and D1 < D2 < D3, etc. That is, the diameter of the through hole 290 increases in proportion to the radial distance of the through hole 290 from the center of the baffle plate 218. On each circle, the through holes 290 are equally spaced from each other. The through holes 290 can be arranged on the circle in various ways.

[0116] In some examples, the through holes 290 may be arranged in different patterns. For example, on some circles, some of the through holes 290 may be omitted. For example, the spacing between the through holes 290 within each circle may be different for each circle. For example, the through holes 290 may be grouped differently in separate circles. For example, there may be an offset between the through holes 290 on alternate circles. In the arrangement of the through holes 290, a number of other variations are possible.

[0117] Additionally, the through-holes 290 may be arranged in shapes other than circles. For example, the through-holes 290 may be arranged in concentric polygonal shapes. For example, the through-holes 290 may be arranged in zones (e.g., in a pie shape). For example, the through-holes 290 may be arranged using a combination of shapes. Additionally, the shape of the through-holes 290 may vary. For example, the through-holes 290 may be polygonal. For example, the through-holes 290 may be hexagonal, triangular, etc. Any combination of these shapes may be used. Additionally, any of the above variations in layout, shape, and size of the through-holes 290 may be combined. Shower head heater

[0118] 6A and 6B show the heater 238 in more detail. The heater 238 includes conduits (see FIG. 6B) through which coolant circulates, supplied from the coolant supply 152 shown in FIG. 2. The arrows indicate the direction of coolant flow through the conduits. The heater 238 controls the temperature of the backplate 124. The controller 160 shown in FIG. 2 controls the temperature of the coolant through the heater 238 based on feedback from a temperature sensor 128 (see FIG. 2) disposed in the backplate 124. The controller 160 controls the flow rate of the coolant through the heater 238 by controlling the valve 157 shown in FIG. 2. The heater 238 is used to heat the backplate 124 to control the temperature of the gas flowing through the showerhead 120. The heater 238 also regulates the temperature of the showerhead 120, since the showerhead 120 receives heat from the pedestal 104 (see FIG. 2). Additionally, the adapter 127 prevents heat transfer from the showerhead 120 to the manifold 140 (see FIG. 2) as follows. shower head adapter

[0119] 7A-7F show the adapter 127 and stem portion 126 in further detail. FIGS. 7A-7D are various views of the adapter showing the cooling channels within the adapter 127. The arrows indicate the direction in which coolant flows through the cooling channels. FIGS. 7A-7D also show the inlets and outlets of the adapter 127, which were described in detail above with reference to FIG. 3. It should be noted that the adapter 127 and the cooling channels may have different shapes than shown. FIGS. 7E and 7F are views of the stem portion 126, showing the inlets mated to the outlets of the adapter 127 and the outlets mated to the backplate 124, which were described in detail above with reference to FIG. 3.

[0120] Figure 7A is a top view of the adapter 127 showing the first inlet 250-1 and the cooling channels. Figure 7B is a side view of the adapter 127 showing the cooling channels in further detail. Figure 7C is a front view of the adapter 127 showing the cooling channels in further detail. Figure 7D is a bottom view of the adapter 127 showing the first and second outlets 251-1, 251-2 and the cooling channels.

[0121] 7B and 7C, the adapter 127 has a groove 129 in which the conduit 131 is disposed. The groove 129 is disposed in the adapter 127 on a second side 127-3 of the adapter 127. The groove 129 extends from near a bottom surface 127-4 of the adapter 127 proximate the distal end 126-1 (i.e., the top end) of the stem portion 126 to near a top surface 127-1 of the adapter 127. The groove 129 begins on the second side 127-3 of the adapter 127 near the bottom surface 127-4 of the adapter 127. The groove 129 extends into the adapter 127 toward the center of the adapter 127 a distance that is less than half the width of the adapter 127 (or the radius if the adapter 127 is cylindrical). The width of the adapter 127 is the distance between the second side 127-3 and the first side 127-2 of the adapter 127. The groove 129 then extends upward through the adapter 127 toward the top surface 127-1 of the adapter 127. The groove 129 then extends outward toward the second side 127-3 near the top surface 127-1 of the adapter 127. The groove 129 terminates on the second side 127-3 of the adapter 127 near the top surface 127-1 of the adapter 127. Thus, the groove 129 is typically U-shaped. However, the groove 129 can be any other shape (e.g., V-shaped, S-shaped, Ω-shaped, etc.). A conduit 131 in the shape of the groove 129 is disposed within the groove 129. A coolant provided by a coolant supply 152 (shown in FIG. 2) circulates through the conduit 131 to cool the adapter 127.

[0122] 7E and 7F are top and bottom views, respectively, of stem portion 126. FIG. 7E shows the top surface of stem portion 126 at the distal end 126-1 of stem portion 126, along with first and second inlets 253-1, 253-2 of stem portion 126. The top surface of stem portion 126 is attached to bottom surface 127-4 of adapter 127. First and second inlets 253-1, 253-2 of stem portion 126 mate with first and second outlets 251-1, 251-2 of adapter 127, as described in detail above with reference to FIG. 3. FIG. 7F shows bottom surface 256 of stem portion 126, along with outlet 255 and second conduit 258-2, as described in detail above with reference to FIG. 3. Lower Plenum

[0123] Figures 8A-9C show the lower plenum 200 in further detail. Figures 8A-9C show two examples of the lower plenum 200. In the first example, Figures 8A-8C show a first configuration of the lower plenum 200. In the second example, Figures 9A-9C show a second alternative configuration of the lower plenum 200 having more through holes 210 than the first configuration, as will be described in more detail below.

[0124] Specifically, Figures 8A-9C show two example cross sections of the base portion 122 taken along line AA shown in Figure 3. Figures 8A-8C show a first pattern in which the posts 370 are arranged, formed by cross-drilled bores (described below) in the base portion 122 and through holes 210, 220 in the base portion 122. Figures 9A-9C show a second pattern in which the posts 370 and through holes 210, 220 are arranged. As will be described in more detail below, the second pattern differs from the first pattern in that the second pattern has additional through holes 210 than the first pattern. Some of the through holes 210 that are not visible in Figures 8A and 9A are shown in more detail in Figures 8B, 8C, 9B, and 9C.

[0125] 8A and 9A, the base portion 122 has a lower plenum 200 defined by a plurality of bores drilled horizontally through the base portion 122. The lower plenum 200 and bores are shown and will be described in detail below. Briefly, at least two sets of bores are cross-drilled through the base portion 122 to form vertical columns 370 at the intersections of the cross-drilled bores. Through holes 210 are drilled from the lower surface 204 of the base portion 122 around the columns 370. The through holes 210 extend from the lower surface 204 of the base portion 122 into the lower plenum 200 defined by the cross-drilled bores. Through holes 220 are drilled from the lower surface 204 of the base portion 122 through the columns 370. The through holes 220 extend through the base portion 122 via posts 370 and into the upper plenum 202 defined by the backplate 124 as described above. The lower plenum 200 and the through holes 210, 220 will now be described in further detail below.

[0126] 8A and 9A show a cross section of the showerhead 120 along line AA shown in FIG. 3. Cross section AA shows the cross-drilled bores and the lower plenum 200. Two sets of bores are orthogonally (i.e., perpendicular to each other) cross-drilled laterally through the sidewall of the base portion 122. Specifically, a first set of bores 380-1, 380-2, 380-3, ..., 380-N (collectively, the first set of bores 380), where N is a positive integer, are drilled horizontally (i.e., perpendicular to the axis 240 of the showerhead 120) through the base portion 122. The first set of bores 380 are drilled along a first axis 382 (i.e., along a chord of the base portion 122 that is parallel to the first axis 382). A second set of bores 390-1, 390-2, 390-3, ..., 390-N (collectively, second set of bores 390), where N is a positive integer, are drilled horizontally (i.e., perpendicular to the axis 240 of the showerhead 120) through the base portion 122. The second set of bores 390 are drilled along a second axis 392 (i.e., along a chord of the base portion 122 that is parallel to the second axis 392). The first axis 382 is perpendicular to the second axis 392. The first and second sets of bores 380, 390 and the sidewall of the base portion 122 to which the ring 212 is attached define a lower plenum 200 within the base portion 122.

[0127] The first and second sets of bores 380, 390 create posts 370-1, 370-2, 370-3, ..., and 370-M (collectively posts 370) (M is a positive integer greater than N) at the intersections of the first and second sets of bores 380, 390. Specifically, the first and second sets of bores 380, 390 are drilled perpendicular to one another, so that the post 370 is rectangular in shape. More specifically, in the illustrated example, the bores in the first and second sets of bores 380, 390 are equal in diameter and equidistant from one another. As a result, the post 370 is square in shape. The posts 370 extend vertically from the lower surface 204 to the upper surface 206 of the base portion 122. The posts 370 are distributed from the center of the base portion 122 toward the OD of the base portion 122, as shown and as will be described in more detail below.

[0128] The through holes 210 are drilled from the underside 204 of the base portion 122 into the lower plenum 200 (i.e., in the spaces between the posts 370) around the posts 370. The through holes 210 are distributed radially from the center of the base portion 122 to the OD of the base portion 122. Some of the through holes 210 are not visible in Figures 8A and 9A and are shown in detail in Figures 8B, 8C, 9B and 9C.

[0129] Furthermore, because the showerhead 120 has an upper plenum 202, the pillars 370 in the first and second patterns shown in Figures 8A to 9C have through-holes 220. The through-holes 220 are drilled through the pillars 370 from the lower surface 204 to the upper surface 206 of the base portion 122.

[0130] 8A-9C, the first and second sets of bores 380, 390 are drilled such that the center of the base portion 122 has a through hole 210 rather than a post 370. The bores in the first and second sets of bores 380, 390 intersect at the center of the base portion 122. However, although not shown, the first and second sets of bores 380, 390 can be drilled such that the center of the base portion 122 has a post 370 rather than a through hole 210.

[0131] Figures 8C and 9C show the arrangement of posts 370 and through-holes 210, 220 in the center of base portion 122. Figures 8B and 9B show the arrangement of posts 370 and through-holes 210, 220 in the remainder of base portion 122 (i.e., the region of base portion 122 radially outward from the center of base portion 122).

[0132] In FIG. 8A, following the pattern shown in FIG. 8C, in an area of ​​the base portion 122 radially outward from the center of the base portion 122, the pattern of posts 370, through holes 220, and through holes 210 shown in FIG. 8B extends (i.e., is replicated) along first and second axes 382, ​​392.

[0133] In FIG. 9A, following the pattern shown in FIG. 9C, in a region radially outward from the center of the base portion 122, the pattern of posts 370, through holes 220, and through holes 210 shown in FIG. 9B extends (i.e., is replicated) along first and second axes 382, ​​392.

[0134] 8B and 9B, when the bores in the first and second sets of bores 380, 390 have equal diameters and are equidistant from one another, four pillars 370 are at the vertices of a square 371. The four pillars 370 include two pillars 370 aligned along a first axis 382 and two pillars 370 aligned along a second axis 392. One pillar 370 is placed at the center of the square 371 (i.e., at the intersection of the diagonals of the square 371 aligned along the first and second axes 382, ​​392).

[0135] In FIG. 8B and FIG. 9B, at the center of each side of the square 371, there is one through hole 210 between each successive pillar 370. The center of the side of the square 371 is on the vertex of the square 396. Therefore, the four through holes 210 at the center of the sides of the square 371 are on the vertices of the square 396, and there is one pillar 370 at the center of the square 396. The center of the square 396 is the same as the center of the square 371. Therefore, each pillar 370 is surrounded by four through holes 210. Furthermore, four through holes 220 are on the vertices of the square 371, and one through hole 220 is at the center of the square 371.

[0136] FIG. 9B differs from FIG. 8B in that FIG. 9B shows additional through holes 210 than FIG. 8B. Specifically, in FIG. 9B, there is one additional through hole 210 between each of the consecutive columns 370 along the first and second axes 382, ​​392. These four additional through holes 210 are at the center of each side of the square 396. Thus, two through holes 210 are on each diagonal of the square 371. Thus, each column 370 is surrounded by eight through holes 210. Of the eight through holes 210, a first set of four through holes 210 are on the vertices of the square 396. A second set of four through holes 210 are at the center of each of the four sides of the square 396. The second set of four through holes 210 are also on the diagonal of the square 371.

[0137] As shown in Figures 8A, 8C, 9A, and 9C, in the first and second patterns, there is a through hole 210 in the center of the base portion 122. If the bores in the first and second sets of bores 380, 390 have equal diameters and are equidistant from each other, the centers of the posts 370 immediately adjacent to the through hole 210 in the center of the base portion 122 are on the vertices of a square 450. As a result, the through holes 220 in the posts 370, which are in the centers of the respective posts 370, are on the vertices of the square 450. The through hole 210 in the center of the base portion 122 is in the center of the square 450. That is, the through hole 210 in the center of the base portion 122 is at the intersection of the diagonals of the square 450. The sides of the squares 450 and 371 are equal.

[0138] In FIG. 9C, in a second pattern, the pattern of posts 370, through holes 220, and through holes 210 as shown in FIGS. 9A and 9C is identical to the pattern shown in FIG. 8C, except that there are four additional through holes 210, one at the center of each of the four sides of the square 450.

[0139] In some examples, the spacing between the bores in the first set of bores 380 may be different than the spacing in the second set of bores 390. For example, the bores in the first set of bores 380 may be separated from one another by a first distance. The bores in the second set of bores 390 may be separated from one another by a second distance. In other examples, the bores in the first set of bores 380 and / or the bores in the second set of bores 390 may be spaced apart (i.e., separated from one another) by a gradually varying distance. For example, the distance between the bores in the first set of bores 380 and / or the second set of bores 390 may increase from the center of the base portion 122 toward the circumference of the base portion 122. In some examples, the distance between the bores in the first set of bores 380 and / or the second set of bores 390 may decrease from the center of the base portion 122 toward the circumference of the base portion 122.

[0140] In still other examples, the number of bores in the first set of bores 380 and the second set of bores 390 may be equal. In further examples, some of the bores in the first set of bores 380 and / or the second set of bores 390 may be omitted. In some examples, the diameters of the bores in the first set of bores 380 and / or the second set of bores 390 may vary similar to the spacing variations discussed above. In still other examples, the bores in the first set of bores 380 and / or the second set of bores 390 may be arranged in groups. In these still other examples, the spacing (i.e., distance) between the bores in each group and / or the diameters of the bores may vary as discussed above.

[0141] Additionally, the two sets of bores 380, 390 are shown by way of example only. In some examples, additional sets of bores can be drilled to create posts of various shapes. Variations in quantity (i.e., number of bores in a set) and / or diameter, as well as variations in spacing and grouping of the bores described above, can be added to these additional sets of bores to create various patterns of posts. The placement of the bores may be determined by the pattern of through holes 210 dictated by the process performed on the substrate 110.

[0142] Figure 10 shows a cross section of showerhead 120 taken along line BB shown in Figure 3. Figure 10 is a top view of base portion 122 of showerhead 120 showing through-hole 220 disposed on top surface 206 of base portion 122. Post 370 is not visible but is shown with a dotted line to illustrate the positional relationship between through-hole 220 and the center of post 370.

[0143] For example, Figure 10 shows posts 370 and through-holes 220 disposed within base portion 122 as shown in Figures 8A and 9A. In some examples, the through-holes 220 can be disposed in zones (i.e., one or more regions of base portion 122) rather than disposed throughout base portion 122 as shown in Figures 8A and 9A. For example, the zones can be radial, azimuthal, or a combination thereof. Shower head through hole

[0144] Figures 11 and 12 are bottom views of the showerhead 120 taken along line CC shown in Figure 3. Figures 11 and 12 show example patterns of through-holes 210 and 220 on the underside 204 of the base portion 122. Figure 11 shows a first pattern of through-holes 210, 220 when the through-holes 210, 220 are arranged as described above with reference to Figures 8A-8C. Figure 12 shows a second pattern of through-holes 210, 220 when the through-holes 210, 220 are arranged as described above with reference to Figures 9A-9C. Showerhead with optimized through holes

[0145] 13-16 show an example of a showerhead 121 with upper and lower plenum through-holes that are optimized to prevent injection and back-diffusion of gases while also allowing for a small gap between the showerhead 121 and the substrate 110 (shown in FIG. 1). Specifically, the through-holes have a conical exit. Additionally, the length of the through-holes, the diameter of the through-holes, the length of the conical portion of the through-holes, and the cone angle of the through-holes are optimized as described in detail below. The process gas is supplied through the upper plenum and the inert gas is supplied through the lower plenum. As the process gas flows out of the showerhead, most of the molecules tend to move from the center to the edge or OD (radially outward) of the showerhead. Some of the process gas that exits the upper plenum through-holes may back-diffuse into the lower plenum through-holes. Alternatively, the process gas may be supplied through the lower plenum and the inert gas may be supplied through the upper plenum. In this alternative example, some of the process gas that exits the lower plenum through-holes may back-diffuse into the upper plenum through-holes. To prevent back-diffusion, the above-mentioned shapes of the upper and lower plenum through-holes and the flow rate of the inert gas through the lower plenum (or, alternatively, the upper plenum) through-holes are optimized so that when the gap between the showerhead and the substrate is reduced, the process gas does not back-flow into the lower plenum through-holes and cause jetting on the substrate.

[0146] Specifically, the showerhead design allows for reduced process gas volume by reducing the gap between the showerhead and the substrate while also preventing jetting on the substrate and back-diffusion of process gas into the showerhead. The showerhead design minimizes non-uniformity that may result from jetting due to reduced gap between the showerhead and the substrate. The showerhead design also minimizes particle escapes due to back-diffusion of process gas into the showerhead. As described in more detail below, the cone angle and cone height are optimized to minimize jetting effects. The diameter and length of the through-holes are optimized to minimize back-diffusion. The flow rate of the inert gas delivered through the lower plenum is optimized to minimize both jetting and back-diffusion.

[0147] FIG. 13 illustrates an example of a showerhead 121 having through-holes 223, 213 in upper and lower plenums 202, 200 with conical outlets. The through-holes 223 are designated 223-1, 223-2, ..., and 223-M (collectively, through-holes 223). The through-holes 213 are designated 213-1, 213-2, ..., 213-N (collectively, through-holes 213). The shapes of the through-holes 223, 213 are illustrated with reference to FIGS. 15 and 16 and described in further detail below. The showerhead 121 is similar to the showerhead 120 illustrated and described above with reference to FIGS. 3-10, except for the differences illustrated and described with reference to FIGS. 13-16. Thus, elements of the showerhead 121 illustrated using the same reference numbers as those illustrated and described with reference to FIG. 3 will not be described again for the sake of brevity. 2. Showerhead 121, rather than showerhead 120, can be used in the substrate processing system 100 shown in FIG.

[0148] In showerhead 121, unlike showerhead 120, through-holes 223, 213 in upper and lower plenums 202, 200 have conical outlets. Additionally, the length, diameter, and conical shape of through-holes 223, 213 in upper and lower plenums 202, 200 are different from the cylindrical through-holes 220, 210 of showerhead 120 shown in FIG. 3. Accordingly, the base portion of showerhead 121 is identified as 123 to distinguish it from base portion 122 of showerhead 120 shown in FIG. 3. Other elements of base portion 123, identified by the same reference numbers used to identify and describe elements of base portion 122 with reference to FIGS. 3-10, other than through-holes 223, 213 which are different from through-holes 220, 210, are not described again for brevity. Through-hole 213 in lower plenum 200 is cross-drilled, similar to through-hole 210 shown and described above with reference to FIGS. 3-10. The cross-drilling of the through-holes 213 in the lower plenum 200 will therefore not be described again for the sake of brevity. The through-holes 223 in the upper plenum 202 are longer and have a larger diameter than the through-holes 213 in the lower plenum 200.

[0149] 14 shows an example of a bottom view of the showerhead 121. The through-holes 223, 213 in the upper and lower plenums 202, 200 are visible in the depicted perspective. The through-hole 223 in the upper plenum 202 is a larger diameter than the through-hole 213 in the lower plenum 200.

[0150] 15 and 16 show examples of the shapes of the through-holes 223, 213 in the upper and lower plenums 202, 200. Fig. 15 shows an example of the through-hole 223 in the upper plenum 202. Fig. 16 shows an example of the through-hole 213 in the lower plenum 200.

[0151] 15, each through hole 223 in upper plenum 202 has a stem portion 300 and a cone portion 302. Stem portion 300 is cylindrical. Cone portion 302 extends from stem portion 300. Stem portion 300 and cone portion 302 are integral and are not separate elements attached to one another.

[0152] The stem portion 300 has a radius r11 and a length L1. The cone portion 302 has a cone length or height Lc1. The cone portion 302 has a cone angle φ with respect to a vertical axis parallel to the length L1 of the stem portion 300. The upper end of the cone portion 302 extends from the lower end of the stem portion 300 at the cone angle φ. Thus, the upper end of the cone portion 302 has the same diameter as the diameter of the stem portion 300. The lower end of the cone portion 302 has a cone radius r21. The cone radius r21 is greater than the radius r11 of the stem portion 300. The length L1 of the stem portion 300 is greater than the cone length Lc1. The total length or height of the through hole 223 is (L1+Lc1). Example dimensions of the stem portion 300 and the cone portion 302 are described below.

[0153] 16, each through hole 213 in lower plenum 200 has a stem portion 310 and a conical portion 312. Stem portion 310 is cylindrical. Conical portion 312 extends from stem portion 310. Stem portion 310 and conical portion 312 are integral and are not separate elements attached to one another. Through holes 213 are smaller than through holes 223.

[0154] The stem portion 310 has a radius r12 and a length L2, which are smaller than the radius r11 and the length L1, respectively, of the stem portion 300 of the through hole 223. The cone portion 312 has a cone length or cone height Lc2, which is smaller than the cone length Lc1 of the cone portion 302 of the through hole 223. The cone portion 312 has a cone angle φ with respect to a vertical axis parallel to the length L2 of the stem portion 310. The upper end of the cone portion 312 extends at a cone angle φ from the lower end of the stem portion 310. Thus, the upper end of the cone portion 302 is of the same diameter as the diameter of the stem portion 300. The cone angle of the cone portion 312 may be different from the cone angle of the cone portion 302. The lower end of the cone portion 312 has a cone radius r22, which is smaller than the cone radius r21 of the cone portion 302. Cone radius r22 is greater than radius r12 of stem portion 310. Stem portion 310 has length L2 greater than cone length Lc2. Through hole 213 has a total length or height (L2+Lc2), which is less than the total length (L1+Lc1) of through hole 223. Example dimensions of stem portion 310 and cone portion 312 are described below.

[0155] To minimize the average velocity of the process gas and the inert gas at the conical exits of the through-holes 223, 213 of the upper and lower plenums 202, 200 (i.e., the lower ends of the conical portions 302, 312), the dimensions of the through-holes 223, 213 can be selected as follows: For example, the total length (L1+Lc1) of the through-holes 223 of the upper plenum 202 can be 0.5-0.7 inches; the total length (L2+Lc2) of the through-holes 213 of the lower plenum 200 can be 0.15-0.35 inches; for example, the diameter (i.e., twice r11) of the through-holes 223 of the upper plenum 202 can be 0.029-0.039 inches; for example, the diameter (i.e., twice r12) of the through-holes 213 of the lower plenum 200 can be 0.014-0.018 inches. For example, the cone angle φ of the conical portions 302, 312 of the through-holes 223, 213 of the upper and lower plenums 202, 200 can be 30 degrees, 45 degrees, or 60 degrees. Similarly, the cone angle φ of the conical portions 302, 312 of the through-holes 223, 213 of the upper and lower plenums 202, 200 can be the same or different.

[0156] In order to prevent injection and back diffusion, in addition to selecting the dimensions of the through holes 223, 213 in the upper and lower plenums 202, 200 as described above, the flow rate of the inert gas supplied through the through holes 213 in the lower plenum 200 can be selected based on the dimensions of the through holes 223, 213. For example, if the dimensions of the through holes 223, 213 in the upper and lower plenums 202, 200 are selected according to the above example, the flow rate of the inert gas supplied through the through holes 213 in the lower plenum 200 can be 300-3200. Alternatively, the process gas can be supplied through the lower plenum 200 and the inert gas can be supplied through the upper plenum 202. In this alternative example, some of the process gas exiting the through holes 213 in the lower plenum 200 may back diffuse into the through holes 223 in the upper plenum 202. In this alternative example, in addition to optimizing and selecting the dimensions of the through-holes 223, 213 in the upper and lower plenums 202, 200 according to the above example to prevent back-diffusion of process gas into the upper plenum 202, the flow rate of the inert gas supplied through the through-holes 223 in the upper plenum 202 can be 300-3200. For example, the controller 160 (shown in FIG. 2) can control the flow rate of the inert gas. If not optimized, a flow rate of the inert gas higher than the optimized one can increase injection, while a flow rate lower than the optimized one can increase back-diffusion.

[0157] All the above optimizations are inferred through extensive experimentation and are not merely design choices. Furthermore, the above optimizations provide the following advantages. Specifically, the optimized shape of the through-holes 223, 213 in the upper and lower plenums 202, 200 in combination with the optimized flow rate of the inert gas through the through-holes 213 in the lower plenum 200 provides the following advantages: reduced chemical usage due to smaller gap between the showerhead 121 and the substrate 100, prevention of injection of process gases on the substrate 110, back-diffusion of process gases into the showerhead, and prevention of escape of contaminants into the upper and lower plenums of the showerhead.

[0158] The foregoing description is merely exemplary in nature and is not intended to limit the disclosure, its application, or uses. The broad teachings of the disclosure can be embodied in various forms. Thus, although the disclosure includes specific embodiments, the true scope of the disclosure should not be so limited, since other variations will become apparent upon review of the drawings, specification, and claims that follow.

[0159] It should be understood that one or more steps within a method may be performed in a different order (or simultaneously) without altering the principles of the present disclosure. Moreover, although each embodiment is described above as having certain features, any one or more of those features described with respect to any embodiment of the present disclosure can be implemented and / or combined with features of any other embodiment, even if that combination is not explicitly described. In other words, the described embodiments are not mutually exclusive, and substituting one or more embodiments for one another remains within the scope of the present disclosure.

[0160] Spatial and functional relationships between elements (e.g., between modules, circuit elements, semiconductor layers, etc.) are described using various terms such as "connected," "engaged," "coupled," "adjacent," "next to," "on top of," "above," "below," and "disposed." Unless expressly described as "direct," when a relationship between a first and second element is described in the above disclosure, the relationship may be a direct relationship where there are no other intervening elements between the first and second elements, but may also be an indirect relationship where there are one or more intervening elements (spatially or functionally) between the first and second elements. As used herein, the phrase at least one of A, B, and C should be interpreted as meaning the logic (A OR B OR C) with a non-exclusive logical OR, and not as meaning "at least one of A, at least one of B, and at least one of C."

[0161] In some embodiments, the controller is part of a system that may be part of the examples described above. Such systems may include semiconductor processing equipment, such as one or more processing tools, one or more chambers, one or more processing platforms, and / or specific processing components (wafer pedestals, gas flow systems, etc.). These systems may be integrated with electronics for controlling the operation of the systems before, during, and after processing of a semiconductor wafer or substrate.

[0162] This electronics may be referred to as a "controller" that may control various components or subcomponents of one or more systems. Depending on the processing requirements and / or type of system, the controller may be programmed to control any of the processes disclosed herein, such as delivery of process gases, temperature settings (e.g., heating and / or cooling), pressure settings, vacuum settings, power settings, radio frequency (RF) generator settings, RF matching circuit settings, frequency settings, flow settings, fluid delivery settings, position and motion settings, loading and unloading of wafers into and out of the tool, and loading and unloading of wafers into and out of other transport tools and / or load locks connected or interlocked with the particular system.

[0163] Broadly speaking, a controller may be defined as electronic equipment having various integrated circuits, logic, memory, and / or software that, for example, receives instructions, issues instructions, controls operations, enables cleaning operations, enables end point measurement, etc. Integrated circuits may include chips in the form of firmware that store program instructions, digital signal processors (DSPs), chips defined as application specific integrated circuits (ASICs), and / or one or more microprocessors or microcontrollers that execute program instructions (e.g., software).

[0164] Program instructions may be instructions in the form of various individual settings (or program files) communicated to the controller that define operational parameters for performing a particular process on or for a semiconductor wafer or for the system. The operational parameters, in some examples, may be part of a recipe defined by a process engineer to accomplish one or more processing processes in the manufacture of one or more layers, materials, metals, oxides, silicon, silicon dioxide, surfaces, circuits, and / or dies of the wafer.

[0165] The controller, in some embodiments, may be part of or coupled to a computer that is integrated with, coupled to, or otherwise networked to the system, or a combination thereof. For example, the controller may be all or part of a host computer system in the "cloud" or at a fab that allows remote access of wafer processing. This computer may provide remote access to the system to monitor the current progress of a manufacturing operation, review the history of past manufacturing operations, review trends or performance criteria from multiple manufacturing operations, modify parameters of a current process, set up processing steps following a current process, or initiate a new process.

[0166] In some embodiments, a remote computer (e.g., a server) can provide the process recipe to the system over a network, which may include a local network or the Internet. The remote computer may include a user interface that allows for entry or programming of parameters and / or settings, which are then communicated from the remote computer to the system. In some embodiments, the controller receives instructions in the form of data that defines parameters for each processing step that is performed during one or more operations. It should be understood that the parameters may be specific to the type of process that is being performed or the type of tool that the controller is configured to interface with or control.

[0167] Thus, as discussed above, the controller may be distributed, such as by including one or more separate controllers networked together and working toward a common purpose, such as the process and control described herein. An example of a controller distributed for such purposes includes one or more integrated circuits on the chamber that are combined to control a process on the chamber and communicate with one or more integrated circuits located remotely (e.g., at the platform level or as part of a remote computer).

[0168] Without being limited thereto, exemplary systems may include a plasma etch chamber or module, a deposition chamber or module, a spin rinse chamber or module, a metal plating chamber or module, a clean chamber or module, a bevel edge etch chamber or module, a physical vapor deposition (PVD) chamber or module, a chemical vapor deposition (CVD) chamber or module, an atomic layer deposition (ALD) chamber or module, an atomic layer etch (ALE) chamber or module, an ion implantation chamber or module, a track chamber or module, and any other semiconductor processing system that may be associated with or used in the manufacturing and / or production of semiconductor wafers.

[0169] As described above, depending on the process step or steps being performed by the tool, the controller may communicate with one or more of other tool circuits or modules, other tool components, cluster tools, other tool interfaces, adjacent tools, nearby tools, tools located throughout the factory, a main computer, other controllers, or tools used in material transport to and from containers of wafers to and from tool locations and / or load ports within a semiconductor production factory.

Claims

1. 1. A dual plenum showerhead for a substrate processing system, comprising: A base portion, a first surface facing the substrate; a second surface opposite the first surface; and a sidewall extending between the first surface and the second surface; the first surface and the second surface are flat; a base portion, the first surface, the second surface, and the sidewall defining a first plenum; A backplate, a molding surface extending from a central portion of the backplate to an outer periphery of the backplate; The molding surface has a plurality of portions; At least one of the portions is parallel to the base portion; At least one of the portions is angled toward the base portion; a backplate, the periphery of the backplate being attached to a second surface of the base portion defining a second plenum; Equipped with a dual plenum shower head.

2. 10. The dual plenum showerhead of claim 1, the base portion and the backplate are cylindrical; a plate disposed between the molding surface and the second surface of the base portion; The plate has a smaller diameter than the base and has a plurality of through holes.

3. 3. The dual plenum showerhead of claim 2, A dual plenum showerhead, wherein the through-holes increase in size along a radius of the plate.

4. 3. The dual plenum showerhead of claim 2, A dual plenum showerhead, wherein the through-holes are arranged in concentric circles on the plate.

5. 5. The dual plenum showerhead of claim 4, A dual plenum showerhead, wherein a diameter of the through-hole increases with a radius of the circle.

6. 3. The dual plenum showerhead of claim 2, The dual plenum showerhead, wherein a thickness of the plate is less than a distance between the second surface of the base portion and a central portion of the backplate.

7. 3. The dual plenum showerhead of claim 2, a thickness of the plate is less than a distance between a second surface of the base portion and at least one of the portions of the shaped surface that is parallel to the base portion and within a radius of the plate.

8. 3. The dual plenum showerhead of claim 2, a thickness of the plate is less than a distance between the second surface of the base portion and at least one of the portions of the shaped surface that slopes toward the base portion and is within a radius of the plate.

9. 3. The dual plenum showerhead of claim 2, a thickness of the plate is greater than a distance between a second side of the base portion and at least one of the portions of the shaped surface that is parallel to the base portion and outside a radius of the plate.

10. 3. The dual plenum showerhead of claim 2, a thickness of the plate is greater than a distance between the second surface of the base portion and at least one of the portions of the shaped surface that slopes toward the base portion and is outside a radius of the plate.

11. 3. The dual plenum showerhead of claim 2, A dual plenum showerhead, wherein the plate is tapered near an outer diameter of the plate.

12. 3. The dual plenum showerhead of claim 2, The plate is rounded near an outer diameter edge of the plate.

13. 3. The dual plenum showerhead of claim 2, The base portion is a first set of through holes extending from the first surface to the first plenum; a second set of through holes extending from the first surface to the second surface; the first plenum and the first set of through holes are not in fluid communication with the second plenum and the second set of through holes; the second plenum, the second set of through holes, and the through holes in the plate are in fluid communication with one another.

14. 10. The dual plenum showerhead of claim 1, a stem portion attached to the backplate; an adapter attached to the stem portion, the adapter having cooling channels disposed in a portion of the adapter for circulating a coolant through the cooling channels.

15. 15. The dual plenum showerhead of claim 14, The dual plenum showerhead, wherein the stem portion and the adapter have passages separately connected to the first plenum and the second plenum.

16. 16. The dual plenum showerhead of claim 15, a plate disposed between the molding surface and the second surface of the base portion; The plate has a smaller diameter than the base portion and has a plurality of through holes; one of the passages is connected to the second plenum through a central portion of the backplate; A dual plenum showerhead, wherein a second of the passages passes through a central portion of the backplate and a central region of the plate and is connected to the first plenum.

17. 17. The dual plenum showerhead of claim 16, A dual plenum showerhead, wherein the first and second of the passages are coaxial.

18. 10. The dual plenum showerhead of claim 1, The dual plenum showerhead further comprising a heater disposed within the backplate.

19. 10. The dual plenum showerhead of claim 1, The back plate is a flat surface opposite the molding surface; a second side wall extending from an outer periphery of the back plate toward the flat surface; a heater disposed within a groove in the second sidewall at a distal end of the second sidewall; Dual plenum shower head.

20. 10. The dual plenum showerhead of claim 1, The base portion is a bore extending laterally through said base portion; a first set of through holes extending from the first surface through a perforated area of ​​the base portion to the first plenum; a second set of through holes extending from the first surface, through a non-perforated area of ​​the base portion, through the second surface, and to the second plenum; Dual plenum shower head.

21. 21. The dual plenum showerhead of claim 20, The dual plenum showerhead further comprising a ring attached to a sidewall of the base portion surrounding the bore.

22. 14. The dual plenum showerhead of claim 13, the first set of through holes and the second set of through holes have conical ends at a first surface of the base portion.

23. 14. The dual plenum showerhead of claim 13, The first set of through holes has a smaller length and diameter than the second set of through holes.

24. 14. The dual plenum showerhead of claim 13, the first set of through holes and the second set of through holes have a cylindrical portion and a conical portion extending from the cylindrical portion; the cylindrical portions of the first set of through holes and the second set of through holes extend to the first plenum and the second plenum, respectively; the conical portions of the first set of through holes and the second set of through holes extend to the first surface of the base portion.

25. 25. The dual plenum showerhead of claim 24, a length and a diameter of the cylindrical and conical portions of the first set of through-holes, respectively, that are smaller than the cylindrical and conical portions of the second set of through-holes.

26. 25. The dual plenum showerhead of claim 24, a length and a diameter of the cylindrical portion of the first set of through holes are smaller than a length and a diameter of the cylindrical portion of the second set of through holes; a length and a diameter of the conical portion of the first set of through holes are smaller than a length and a diameter of the conical portion of the second set of through holes.

27. 25. The dual plenum showerhead of claim 24, the conical portions of the first set of through holes extend at a first angle relative to an axis parallel to a length of the cylindrical portions of the first set of through holes; the conical portion of the second set of through holes extends at a second angle relative to an axis parallel to a length of the cylindrical portion of the second set of through holes.

28. 28. The dual plenum showerhead of claim 27, The dual plenum showerhead, wherein the first angle and the second angle are equal.

29. 23. A system comprising the showerhead of claim 22, a first gas source configured to supply a first gas to the first plenum; a second gas source configured to supply a second gas to the second plenum; a controller configured to control a flow rate of the first gas at a rate selected to reduce injection of the second gas through the second set of through-holes and reduce diffusion of the second gas through the first set of through-holes and into the first plenum; The system further comprises:

30. 27. A system comprising the showerhead of claim 26, a first gas source configured to supply a first gas to the first plenum; a second gas source configured to supply a second gas to the second plenum; a controller configured to control a flow rate of the first gas at a rate selected to reduce injection of the second gas through the second set of through-holes and reduce diffusion of the second gas through the first set of through-holes and into the first plenum; The system further comprises:

31. 23. A system comprising the showerhead of claim 22, a first gas source configured to supply a first gas to the first plenum; a second gas source configured to supply a second gas to the second plenum; a controller configured to control a flow rate of the second gas at a rate selected to reduce injection of the first gas through the first set of through-holes and reduce diffusion of the first gas through the second set of through-holes and into the second plenum; The system further comprises:

32. 27. A system comprising the showerhead of claim 26, a first gas source configured to supply a first gas to the first plenum; a second gas source configured to supply a second gas to the second plenum; a controller configured to control a flow rate of the second gas at a rate selected to reduce injection of the first gas through the first set of through-holes and reduce diffusion of the first gas through the second set of through-holes and into the second plenum; The system further comprises:

33. 25. The showerhead of claim 24, the overall length of the first set of through holes is in the range of 0.15 to 0.35 inches; the overall length of the second set of through holes is in the range of 0.5 to 0.7 inches.

34. 25. The showerhead of claim 24, a diameter of the cylindrical portion of the first set of through holes is in the range of 0.014 to 0.018 inches; the diameter of the cylindrical portion of the second set of through-holes is in the range of 0.029 to 0.039 inches.

35. 25. The showerhead of claim 24, the conical portions of the first and second sets of through holes extend at an angle in the range of 30 to 60 degrees relative to an axis parallel to a length of the cylindrical portions of the first and second sets of through holes.

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