Cable slab, positioning module, and lithography apparatus
The flexible supply structure in lithography apparatuses addresses wear and particle issues by using magnetic repulsion to reduce mechanical contact, enhancing the lifespan of supply components and improving process reliability.
Patent Information
- Application Number
- JP2024564872
- Authority / Receiving Office
- JP · JP
- Patent Type
- Applications
- Current Assignee / Owner
- Priority Date
- 2022-05-30
- Filing Date
- 2023-05-04
- Publication Date
- 2025-06-17
AI Technical Summary
The existing flexible supply structures in lithography apparatuses suffer from wear and particle generation due to inertial forces during the movement of movable objects, which can lead to substrate defects and reduced lifespan of the supply hoses and cables.
A flexible supply structure is designed with a first permanent magnet and a support with a second magnet, allowing them to repel each other and exert a lifting force, thereby reducing direct mechanical contact and wear between the supply structure and its support.
This solution significantly reduces wear and particle generation, extending the lifespan of the supply hoses and cables and minimizing substrate defects in the lithography process.
Smart Images
Figure 2025518467000001_ABST
Abstract
Description
Technical Field
[0001] Cross - reference to related applications
[0001] This application claims the priority of European Application No. 22176118.2 filed on May 30, 2022, the entire content of which is incorporated herein by reference.
Background Art
[0002]
[0002] The present invention relates to a flexible supply structure and a positioning module including the flexible supply structure. The present invention further relates to a lithography apparatus including the positioning module.
[0003]
[0003] A lithography apparatus is a machine constructed to apply a desired pattern onto a substrate. A lithography apparatus can be used, for example, in the manufacture of integrated circuits (ICs). A lithography apparatus can project the pattern of a patterning device (e.g., a mask) onto a layer of radiation - sensitive material (resist) provided on a substrate.
[0004]
[0004] To project a pattern onto a substrate, a lithography apparatus may use electromagnetic radiation. The minimum size of the features that can be formed on the substrate is determined by the wavelength of this radiation. A lithography apparatus using extreme ultraviolet (EUV) radiation having a wavelength in the range of 4 - 20 nm, for example a wavelength of 6.7 nm or 13.5 nm, can be used to form smaller features on the substrate than, for example, a lithography apparatus using radiation with a wavelength of 193 nm.
[0005]
[0005] A lithographic apparatus includes a movable object that requires a supply. Such supplies include fluids, such as cooling liquids or vacuum, electricity such as supply power, or control and measurement signals and / or optical signals. To supply these supplies to the movable object, a flexible supply structure including supply hoses and / or supply cables is provided to enable a flexible connection of the supply hoses and / or supply cables between the movable object and another object.
[0006]
[0006] In one embodiment, the flexible supply structure can be, for example, a C-shaped cable slab including supply hoses and / or supply cables, and this cable slab is at least partially supported on a support. The support may be a slide plate on which the supply hoses and / or supply cables are mechanically supported. Usually, the C-shaped cable slab is oriented in the moving direction of the movable object, that is, each of the supply hoses and / or supply cables extends in a plane extending in the main moving direction and the vertical direction of the movable object. When the movable object moves in the main moving direction, the C-shaped cable slab can move back and forth, and a smaller or larger part of the cable slab is supported by the support.
[0007]
[0007] In one embodiment, the movable object is arranged to be movable at least in a first horizontal direction, and the movable object is supported on a second movable object that is movable in a second horizontal direction. When the second movable object is accelerated in the second horizontal direction, an inertial force in the second horizontal direction on the cable slab can occur. Due to such an inertial force, the cable slab can slide on the support surface of the support, which may lead to wear of the support surface and the supply hoses and / or supply cables. This wear may substantially affect the maximum lifespan of the supply hoses and / or supply cables. Furthermore, particles released from the support surface and the supply hoses and / or supply cables due to wear may cause defects on the substrate in the lithography process.
Summary of the Invention
[0008]
[0008] The object of the present invention is to provide an improved flexible supply structure. In particular, the object of the present invention is to provide a flexible supply structure that is less affected by wear and / or in which the generation of particles due to wear of the flexible supply structure and / or its support is substantially reduced.
[0009]
[0009] According to one aspect of the present invention, there is provided a flexible supply structure, such as a cable slab, for connecting a first movable object to a second object, the flexible supply structure includes a first permanent magnet having a first magnetic field orientation, the flexible supply structure is arranged to be at least partially supported by a support including a second magnet having a second magnetic field orientation, such that when the first permanent magnet and the second magnet face each other, the first permanent magnet and the second magnet repel each other and exert a force, such as a lifting force, on the flexible supply structure, and a flexible supply structure is provided.
[0010]
[0010] According to one aspect of the present invention, there is provided a positioning module, a first movable object, a second object, a flexible supply structure according to any one of claims 1 to 7, wherein a first end of the flexible supply structure is connected to the first object and a second end of the flexible supply structure is connected to the second object, the flexible supply structure, a support including a second magnet having a second magnetic field orientation, such that when the first permanent magnet and the second magnet face each other, the first permanent magnet and the second magnet repel each other and exert a force, such as a lifting force, on the flexible supply structure, the support, and a positioning module including the above is provided.
[0011]
[0011] According to one aspect of the present invention, there is provided a lithographic apparatus including the positioning module according to any one of claims 8 to 17.
Brief Description of the Drawings
[0012]
[0012] Some embodiments of the present invention will be described below by way of example only with reference to the accompanying schematic drawings.
[0013]
Figure 1
Figure 2
Figure 3
Figure 4
Figure 5A
Figure 5B
Figure 5C
Figure 6
DETAILED DESCRIPTION OF THE INVENTION
[0014]
[0013] A lithography system including a radiation source SO and a lithography apparatus LA is shown in FIG. 1. The radiation source SO is configured to generate an EUV radiation beam B and supply this EUV radiation beam B to the lithography apparatus LA. The lithography apparatus LA includes an illumination system IL, a support structure MT configured to support a patterning device MA (for example, a mask), a projection system PS, and a substrate table WT configured to support a substrate W.
[0015]
[0014] A substrate table positioning system WTP is provided to position the substrate table WT at a desired position. The substrate positioning system WTP includes a position measurement system for measuring the position of the substrate table WT and an actuation system for moving the substrate table WT to the desired position. A patterning device support positioning system MTP is provided to position the support structure MT at a desired position. The patterning device support positioning system MTP also includes a position measurement system for measuring the position of the support structure MT and an actuation system for moving the support structure MT to the desired position.
[0016]
[0015] The illumination system IL is configured to condition the EUV radiation beam B before the EUV radiation beam B is incident on the patterning device MA. Additionally, the illumination system IL may include a facet field mirror device 10 and a facet pupil mirror device 11. Both the facet field mirror device 10 and the facet pupil mirror device 11 together provide a desired cross-sectional shape and a desired intensity distribution to the EUV radiation beam B. The illumination system IL may include other mirrors or devices in addition to, or instead of, the facet field mirror device 10 and the facet pupil mirror device 11.
[0017]
[0016] After being adjusted as described above, the EUV radiation beam B interacts with the patterning device MA. As a result of this interaction, a patterned EUV radiation beam B’ is generated. The projection system PS is configured to project the patterned EUV radiation beam B’ onto the substrate W. Therefore, the projection system PS may include a plurality of mirrors 13, 14 configured to project the patterned EUV radiation beam B’ onto the substrate W held by the substrate table WT. The projection system PS can apply a reduction factor to the patterned EUV radiation beam B’, thereby forming an image having features smaller than the corresponding features on the patterning device MA. For example, a reduction factor of 4 or 8 can be applied. In FIG. 1, the projection system PS is depicted as having only two mirrors 13, 14, but the projection system PS may include a different number of mirrors (e.g., 6 or 8 mirrors).
[0018]
[0017] The substrate W may contain a previously formed pattern. In this case, the lithographic apparatus LA aligns the image formed by the patterned EUV radiation beam B’ with the previously formed pattern on the substrate W.
[0019]
[0018] A relatively low vacuum, i.e., a small amount of gas (e.g., hydrogen) at a pressure much lower than atmospheric pressure, may be provided in the radiation source SO, the illumination system IL, and / or the projection system PS.
[0020]
[0019] The radiation source SO can be a laser-produced plasma (LPP) source, a discharge-produced plasma (DPP) source, a free electron laser (FEL), or other radiation source capable of generating EUV radiation.
[0021]
[0020] The lithography process includes a series of projection steps (where the patterned EUV radiation beam B’ is projected onto the substrate W (exposure step) and / or the substrate W is aligned with the patterned EUV radiation beam B’ (alignment step)), and an idling step (where the patterned EUV radiation beam B’ is not projected onto the substrate W or an irrelevant part of the substrate W, and the positioning accuracy of the substrate W with respect to the patterned EUV radiation beam B’ is not very important). During the projection step, the patterning device and the substrate can be moved in a scanning movement at a constant scanning speed. The idling step can be used to decelerate and (re)accelerate the patterning device MT and the substrate W to the desired scanning speed and to the desired alignment with respect to each of the EUV radiation beam B and the patterned EUV radiation beam B’. The constant scanning speed of the patterning device MT is usually different from the constant scanning speed of the substrate W.
[0022]
[0021] FIG. 2 shows a positioning module including a first movable object 20, a second movable object 21, and a base frame 22. The first movable object 20 is supported on the second movable object 21 and is movable in a first horizontal direction, for example, the x direction, with respect to the second movable object 21. The second movable object 21 is supported on the base frame 22 and is movable in a second horizontal direction, for example, the y direction, with respect to the base frame 22. An actuator can be provided to apply an actuating force to the first movable object 20 and the second movable object 21 to move the first movable object 20 and the second movable object 21 towards the desired positions.
[0023]
[0022] The positioning module can be, for example, part of a substrate positioning system WTP arranged to position the substrate at a desired position.
[0024]
[0023] There may be cases where it is desirable for supplies, such as fluids like coolant or vacuum, electricity such as power or electrical measurements, or light such as optical signals, to be exchanged between the first movable object 20 and the second movable object 21. Accordingly, the positioning module includes a flexible supply structure 23 that extends between the first movable object 20 and the second movable object 21 and exchanges these supplies between the first movable object 20 and the second movable object 21. The flexible supply structure 23 is at least partially supported by a support 24.
[0025]
[0024] FIG. 3 shows a side view of the flexible supply structure 23 and the support 24. The flexible supply structure 23 includes a plurality of supply hoses and supply cables 25 between the first movable object 20 and the second movable object 21. The flexible supply structure 23 further includes a first clamp bracket 26, a second clamp bracket 27, and a third clamp bracket 28 for clamping the supply hoses and / or supply cables 25 to form a cable slab. One end of the cable slab is connected to a first manifold 29 attached to the first movable object 20, and the opposite second end of the cable slab is connected to a second manifold 30 attached to the second movable object 21. The first manifold 29 and the second manifold 30 may be any structure or device arranged to connect the supply hoses and / or supply cables 25 to the first movable object 20 and the second movable object 21, respectively. Each of the clamp brackets 26, 27, 28 is composed of a pair of clamp strips, and a plurality of supply hoses and supply cables 25 are clamped adjacent to each other between these clamp strips.
[0026]
[0025] The cable slab has a C-shape with a lower part, a middle part, and an upper part. The C-shaped cable slab is oriented in the moving direction of the first movable object 20, that is, each of the supply hose and / or supply cable 25 extends in a plane extending in the x-direction and the z-direction. When the first movable object 20 moves in the main moving direction, the C-shaped cable slab can move back and forth, and the smaller or larger part of the cable slab is supported by the support.
[0027]
[0026] A further flexible supply structure (not shown) similar to the flexible supply structure 23 between the first movable object 20 and the second movable object 21 is provided between the second movable object 21 and the base frame 22 to exchange supplies between the second movable object 21 and the base frame 22. This further flexible supply structure will usually be oriented in the y-direction, that is, the supply hose and / or supply cable will extend in a plane extending in the y-direction and the z-direction.
[0028]
[0027] In a conventional embodiment of the cable slab, the support may be formed as a slide plate on which the supply hose and / or supply cable is mechanically supported. Due to the inertial force applied to the cable slab caused by accelerating the second movable object in the y-direction, the cable slab may slide on the support surface of the slide plate. This sliding may cause wear of the support surface, the supply hose and / or the supply cable. The wear may substantially affect the maximum life of the supply hose and / or the supply cable. Further, particles released due to wear of the support surface, the supply hose and / or the supply cable may lead to defects on the substrate in the lithography process. Wear may also occur in a cable slab where there is no lateral movement, for example, a cable slab disposed between a stationary support object and a movable object that moves linearly in one direction. This wear may occur, for example, due to imperfect alignment of the supply hose and / or the supply cable.
[0029]
[0028] To prevent or reduce wear caused by mechanical contact between the support 24 and the flexible supply structure 23, the flexible supply structure 23 includes a plurality of first permanent magnets having a first magnetic field orientation, and the support 24 includes a plurality of second magnets having a second magnetic field orientation. By associating each first permanent magnet with a second magnet, when the first permanent magnet and the associated second magnet face each other, the first permanent magnet and the second magnet repel each other and exert a lifting force on the flexible supply structure 23.
[0030]
[0029] In the embodiment shown in FIG. 2, the first permanent magnet and the second magnet are designed to support the flexible supply structure 23 in a floating state, that is, without direct mechanical contact between the flexible supply structure 23 and the support 24. In an alternative embodiment, there may still be direct mechanical contact between the flexible supply structure 23 and the support 24, but the lifting force acting on the flexible supply structure 23 through the first permanent magnet and the second magnet can significantly reduce the pressure with which the flexible supply structure 23 is pressed against the support 24. As a result of such a pressure reduction, the frictional force between the flexible supply structure 23 and the support 24 also decreases, and as a result, the wear of the contact surface between the flexible supply structure 23 and the support 24, for example, the contact surface of the support surface, and the supply hose and / or the supply cable 25 is reduced.
[0031]
[0030] FIG. 4 shows a cross-section of the C-shaped lower part of the flexible supply structure 23 including a first clamp bracket 26 and a second clamp bracket 27. In each of the first clamp bracket 26 and the second clamp bracket 27, a first permanent magnet 31 is arranged. Each first permanent magnet 31 is associated with a second permanent magnet 32 arranged in the support 24.
[0032]
[0031] Each first permanent magnet 31 has a first magnetic field orientation, and each associated second permanent magnet 32 has a second magnetic field orientation, so that when the first permanent magnet 31 and the second magnet 32 face each other, the first permanent magnet 31 and the second permanent magnet 32 repel each other and exert a lifting force on the flexible supply structure.
[0033]
[0032] In the cross-sectional view shown in FIG. 4, two first permanent magnets 31 within the clamp brackets 26 and 27 and two second permanent magnets 32 within the support 24 are shown. The plurality of first permanent magnets 31 and the plurality of second permanent magnets 32 are provided while being dispersed along the length direction (y direction) of the clamp brackets 26 and 27 and the support 24, so that suitable support can be realized over the entire y-direction width of the flexible supply structure 23.
[0034]
[0033] As described above, the magnetic fields of the first permanent magnet 31 and the second permanent magnet 32 are selected such that the support 24 supports the flexible supply structure 23 in a floating state, that is, without direct mechanical contact between the flexible supply structure 23 and the support 24. As a safety measure, a collision element 33 that provides a safe surface is disposed within the support 24 in case one or both of the clamp brackets 26 and 27 accidentally bite into the support 24. The collision element 33 can be formed of, for example, an elastic material capable of supporting the flexible support structure 23.
[0035]
[0034] In the illustrated embodiment, the main axis of the first magnetic field orientation of the first permanent magnet 31 is arranged perpendicular to the tangent of the flexible supply structure at the position of the first permanent magnet 31, and the main axis of the second magnetic field orientation of the second permanent magnet 32 is arranged vertically. Other suitable magnetic field orientations of the first magnetic field and the second magnetic field may also be used.
[0036]
[0035] FIGS. 5A to 5C show the positioning module of FIG. 2 having a first movable object 20 at different positions in the x direction.
[0037]
[0036] Figure 5A shows the position of the first movable object 20 that substantially corresponds to the position in Figure 2. It can be seen that the flexible supply structure 23 is supported in a floating state by the support 24 due to the upward magnetic force between the first permanent magnet 31 and the second permanent magnet 32. At this position of the first movable object 20, the first clamp bracket 26 is closer to the support 24 than the second clamp bracket 27. As a result, a larger upward magnetic force acts on the first clamp bracket 26 than on the second clamp bracket 27. Due to the rigidity of the plurality of supply hoses and supply cables 25, the flexible supply structure is maintained in a C shape.
[0038]
[0037] In Figure 5B, the first movable object 20 is moving to the left. The C shape advances to the left so that the first clamp bracket 26 and the second clamp bracket 27 are at approximately the same distance from the support 24, and the lower part of the C shape moves to a position closer to the support 24. Due to the magnetic force between the first permanent magnet 31 and the second permanent magnet 32, the flexible supply structure 23 is still supported in a floating state.
[0039]
[0038] In Figure 5C, the first movable object 20 has moved to the right compared to the position in Figure 5A. At this position of the first movable object 20, the second clamp bracket 27 moves further away from the support 23. As a result, the upward magnetic force acting on the second clamp bracket 27 becomes smaller. The first clamp bracket 26 still remains away from the support 24, whereby the flexible support structure 23 is supported in a floating state.
[0040]
[0039] At all positions of the first movable object 20 in the x - direction, since the flexible support structure 23 does not mechanically contact the support 24 directly, wear of the flexible support structure 23 caused by friction between the flexible support structure 23 and the support 24, for example, wear of the supply hoses and supply cables 25, is prevented. This has a beneficial effect on the lifespan of the flexible support structure 23 and reduces the amount of particles released due to wear.
[0041]
[0040] FIG. 6 shows an alternative embodiment of the lower part of the flexible supply structure 23. Corresponding to the embodiment of FIG. 2, the flexible supply structure 23 includes a first clamp bracket 26 and a second clamp bracket 27, each clamp bracket including a pair of clamp strips between which a plurality of supply hoses and supply cables 25 are clamped in a row. Also, each of the clamp brackets 26, 27 includes at least one permanent magnet 31.
[0042]
[0041] The support 24 includes a plurality of second magnets 34, each second magnet 34 being associated with one of the plurality of first permanent magnets 31. The second magnet 34 is an electromagnet having a second magnetic field controllable by the magnetic field control unit 35. The second magnetic field of the second magnet 34 associated with the first permanent magnet 31 in the first clamp bracket 26 may be controlled independently of the second magnetic field of the second magnet 34 associated with the first permanent magnet 31 in the second clamp bracket 27.
[0043]
[0042] Each first permanent magnet 31 has a first magnetic field orientation, and each associated second magnet 34 has a second magnetic field orientation such that when the first permanent magnet 31 and the second magnet 34 face each other, the first permanent magnet 31 and the second magnet 34 repel each other when magnetically actuated by the magnetic field control unit 35, applying a lifting force to the flexible supply structure 23.
[0044]
[0043] The support 24 is provided with a support element 36 to provide a suitable support surface for receiving the first clamp bracket 26 and the second clamp bracket 27. The support element 36 can be formed of an elastic material, similar to the collision element 33 of the embodiment of FIG. 4. Alternatively, the support element 36 may be formed of another material suitable for supporting the first clamp bracket 26 and the second clamp bracket 27, such as polyethylene or other relatively rigid plastic material.
[0045]
[0044] In the state shown in FIG. 6, there is direct mechanical contact between the first clamp bracket 26 and the support element 36 of the support 24 associated therewith. This position can be a rest position, in which the second magnet 34 is not magnetically actuated by the magnetic field control unit 35. This rest position can be used, for example, when the positioning module is not actually in use.
[0046]
[0045] The illustrated position can also be the position during the movement of the first movable object 20 of the positioning module. The second magnet 34 can be actuated to act on the first permanent magnet 31 to generate a lifting force on the flexible supply structure 23 that reduces the pressure with which the first clamp bracket 26 presses against the support element 36.
[0047]
[0046] It should be noted that in this embodiment, the flexible supply structure 23 is not supported on the supply hose and the supply cable 25 as usual in the prior art embodiments, but is supported on the first clamp bracket 26 and / or the second clamp bracket 27.
[0048]
[0047] Since the magnetic fields of the two second magnets 34 can be controlled separately, the magnetic force acting on the flexible supply structure 23 can be made to depend on the position of the flexible supply structure 23 and / or the first movable object 20 relative to the associated support element 36. For example, when the first movable object 20 moves to the left and the permanent magnet 31 moves towards the second magnet 34 as a result, the magnetic field of the second magnet 34 can be temporarily increased to decelerate the movement of the respective clamp brackets 26, 27 towards the support 24. This deceleration can be advantageous, for example, to prevent the respective clamp brackets 26, 27 from accidentally colliding with the support element 36 when supporting the supply structure 23 in a floating state, or to ensure a smooth landing on the support element 36 when mechanical contact between the support element 36 and the respective clamp brackets 26, 27 is possible.
[0049]
[0048] In the above, a flexible supply structure 23 having a C-shaped configuration has been shown and described. The lower part of the C-shaped configuration is supported by a support, and by using magnetic force, a lifting force is applied to the flexible supply structure 23, particularly to its lower part. In other embodiments, instead of or in addition to the support by magnetic force at the lower part of the flexible supply structure 23, a support by magnetic force may be provided for the middle part of the upper part of the C-shaped configuration. For example, the third clamp bracket 28 in FIG. 2 may include one or more additional permanent magnets that cooperate with one or more additional magnets (not shown) within a support element, such that when the one or more additional permanent magnets and the one or more additional magnets face each other, the one or more additional permanent magnets and the one or more additional magnets repel each other to apply a force, such as a lifting force, to the flexible supply structure.
[0050]
[0049] The flexible supply structure 23 may have other shapes or configurations and it may also be possible to use mutually repulsive magnetic forces to apply a force to the flexible supply structure. The force acting on the flexible supply structure 23 may be a lifting force to reduce or remove the pressure by which the flexible supply structure 23 is pressed against the support 24, or alternatively, another advantageous force, such as a force that affects the shape of the flexible supply structure 23. The force may act at any suitable position on the flexible supply structure 23.
[0051]
[0050] In the above, the flexible supply structure 23 has been shown and described with respect to the first movable object 20 movably supported on the second movable object 21, particularly in the positioning module of a lithographic apparatus. In order to improve the support of the flexible supply structure by applying a force, such as a lifting force, to the flexible supply structure by using mutually repulsive magnets, this flexible supply structure can also be used in combination with other movable objects to exchange supplies between the movable object and other objects. The other objects may be movable objects or stationary objects.
[0052]
[0051] Although specific reference is made in this specification to the use of a lithographic apparatus in the manufacture of integrated circuits, it should be understood that the lithographic apparatus described in this specification may have other applications. Other possible applications include the manufacture of integrated optical systems, guidance and detection patterns for magnetic domain memories, flat panel displays, liquid crystal displays (LCDs), thin film magnetic heads, and the like.
[0053]
[0052] Although specific reference is made in this specification to embodiments of the invention in the context of a lithographic apparatus, embodiments of the invention may be used in other apparatus. Embodiments of the invention may form part of an apparatus for measuring or processing an object such as a wafer (or other substrate) or a mask (or other patterning device), a mask inspection apparatus, a metrology apparatus, or the like. These apparatus may sometimes be referred to as lithographic tools. Such lithographic tools may use vacuum conditions or environmental (non-vacuum) conditions.
[0054]
[0053] Although specific reference has been made above to the use of embodiments of the invention in the context of optical lithography, it is clear that the invention is not limited to optical lithography, if circumstances allow, and may also be used in other applications, for example imprint lithography.
[0055]
[0054] Having described specific embodiments of the invention above, it will be apparent that the invention may be practiced in other than the described embodiments. The foregoing description is intended to be illustrative, not limiting. Thus, it will be apparent to those skilled in the art that modifications may be made to the invention as described above without departing from the scope of the claims set forth below.
Claims
1. A flexible supply structure for connecting a first movable object to a second object, The flexible supply structure includes a first permanent magnet having a first magnetic field orientation, The flexible supply structure is arranged to be at least partially supported by a support including a second magnet having a second magnetic field orientation, so that when the first permanent magnet and the second magnet face each other, the first permanent magnet and the second magnet repel each other and exert a force on the flexible supply structure. A flexible supply structure.
2. The flexible supply structure according to claim 1, wherein the force is a lift force.
3. The flexible supply structure includes one or more clamp brackets, each clamp bracket clamps one or more supply hoses and / or supply cables, and the first permanent magnet is disposed within or on one of the one or more clamp brackets. The flexible supply structure according to claim 1 or 2.
4. The flexible supply structure is designed to be arranged in a C-shape having a lower part, a middle part, and an upper part, and at least the lower part includes the first permanent magnet. The flexible supply structure according to any one of claims 1 to 3.
5. The flexible supply structure according to any one of claims 1 to 4, wherein the first permanent magnet and the second magnet are designed to support the flexible supply structure in a floating state.
6. The flexible supply structure includes a plurality of first permanent magnets having a first magnetic field orientation, each first permanent magnet is disposed within or on the support, and is associated with one of a plurality of second magnets having a second magnetic field orientation. Thus, when each first permanent magnet and the associated second magnet face each other, the first permanent magnet and the second magnet repel each other and exert a lift force on the flexible supply structure. The flexible supply structure according to any one of claims 1 to 5.
7. The flexible supply structure includes a plurality of clamp brackets, each clamp bracket clamps one or more supply hoses and / or supply cables, and two or more clamp elements are provided with one or more first permanent magnets. The flexible supply structure according to claim 6.
8. A positioning module, A first movable object, A second object, A flexible supply structure according to any one of claims 1 to 7, wherein a first end of the flexible supply structure is connected to the first object, and a second end of the flexible supply structure is connected to the second object. A flexible supply structure, A support, including a second magnet having a second magnetic field orientation, so that when the first permanent magnet and the second magnet face each other, the first permanent magnet and the second magnet repel each other and act on the flexible supply structure. A support, A positioning module including.
9. The positioning module according to claim 8, wherein the force is a lifting force.
10. The flexible supply structure includes one or more supply hoses and / or supply cables, and the support is arranged to support the flexible supply structure without mechanical contact between the support and the one or more supply hoses and / or supply cables. The positioning module according to claim 8 or 9.
11. The first permanent magnet and the second magnet are designed to support the flexible supply structure in a floating state. The positioning module according to any one of claims 8 to 10.
12. The positioning module according to any one of claims 8 to 11, wherein the second magnet is a permanent magnet.
13. The positioning module according to any one of claims 8 to 12, wherein the second magnet is an electromagnet.
14. The positioning module according to any one of claims 8 to 13, wherein the main axis of the second magnetic field orientation is arranged vertically.
15. The positioning module according to any one of claims 8 to 14, wherein the flexible supply structure is arranged in a C shape having a lower part, an intermediate part, and an upper part, and at least the lower part is supported by the support.
16. The flexible supply structure includes a plurality of first permanent magnets having a first magnetic field orientation, the support includes a plurality of second magnets having a second magnetic field orientation, and each first permanent magnet is associated with one of the plurality of second magnets such that when each first permanent magnet and the associated second magnet face each other, the first permanent magnet and the second magnet repel each other to apply a lifting force to the flexible supply structure. The positioning module according to any one of claims 8 to 15.
17. The first movable object is supported by the second object, the first movable object is movable in a first horizontal direction, the second object is movable in a second horizontal direction, and the first horizontal direction and the second horizontal direction are not parallel. The positioning module according to any one of claims 8 to 16.
18. A lithography apparatus including the positioning module according to any one of claims 8 to 17.