Batch-type substrate processing apparatus

Abstract

The present invention relates to a batch-type substrate processing apparatus for preventing powder due to condensation of a process gas on the inner peripheral surface of a gas introduction port. The batch-type substrate processing apparatus may include a reaction tube that provides a processing space for accommodating a plurality of substrates, a ring-shaped flange portion in which a fluid passage is disposed and that supports the reaction tube, a first seal member disposed between the reaction tube and the flange portion, a refrigerant supply unit that supplies refrigerant to the fluid passage, a gas supply pipe that supplies a process gas to the processing space through the flange portion, a gas introduction port coupled to an outer end of the gas supply pipe, and a heater unit that heats the gas introduction port.

Description

Technical Field

[0001] The present invention relates to a batch-type substrate processing apparatus, and more particularly, to a batch-type substrate processing apparatus that prevents powder due to condensation of process gas on the inner peripheral surface of a gas introduction port.

Background Art

[0002] Generally, a substrate processing apparatus positions a substrate to be processed in a processing space, and then uses a method such as Chemical Vapor Deposition (CVD) or Atomic Layer Deposition (ALD) to deposit reaction particles contained in the process gas injected into the processing space onto the substrate. It can be roughly classified into a single wafer type substrate processing apparatus that can perform a processing step on one substrate and a batch type substrate processing apparatus that can perform a processing step on a plurality of substrates simultaneously.

[0003] The batch-type substrate processing apparatus may include a vertical reaction tube, a flange portion that supports the reaction tube, and a seal member that is interposed between the reaction tube and the flange portion and seals the space between the reaction tube and the flange portion.

[0004] Here, since the seal member may be distorted and / or damaged by a high-temperature process temperature, a fluid passage can be formed in the flange portion so that a refrigerant can flow through it to prevent distortion and / or damage due to high temperature.

[0005] At this time, a gas supply pipe that supplies process gas through the flange portion into the processing space of the reaction tube and / or a gas introduction port coupled to the outer end of the gas supply pipe may cause heat loss by being thermally connected (e.g., in contact) to the flange portion. In such a case, the process gas in the gas supply pipe and / or the gas introduction port may condense into powder, which accumulates on the inner peripheral surface of the gas supply pipe and / or the gas introduction port. In particular, at the connection (or connection) location between the gas supply pipe and the gas introduction port, the seal member cooled by the refrigerant flowing through the fluid passage of the flange portion comes into direct contact with the process gas, resulting in the possibility that powder accumulates intensively. The powder accumulated in this way becomes a main cause of particles and is supplied to the processing space together with the process gas, which may cause a serious problem of degrading the quality of the thin film.

[0006] Therefore, a configuration is required that can prevent and / or suppress the accumulation of powder on the inner peripheral surface of the gas supply pipe and the gas introduction port and at the connection location between the gas supply pipe and the gas introduction port.

Prior Art Documents

Patent Documents

[0007]

Patent Document 1

Summary of the Invention

Problems to be Solved by the Invention

[0008] The present invention provides a batch-type substrate processing apparatus having a heater unit that heats a gas introduction port coupled to the outer end of a gas supply pipe that supplies process gas through a flange portion in which a fluid passage of a refrigerant is formed.

Means for Solving the Problems

[0009] A batch-type substrate processing apparatus according to an embodiment of the present invention may include a reaction tube that provides a processing space for accommodating a plurality of substrates, a ring-shaped flange portion in which a fluid passage is disposed and that supports the reaction tube, a first seal member disposed between the reaction tube and the flange portion, a refrigerant supply unit that supplies refrigerant to the fluid passage, a gas supply pipe that supplies process gas to the processing space via the flange portion, a gas introduction port coupled to an outer end of the gas supply pipe, and a heater unit that heats the gas introduction port.

[0010] The heater unit may include a line heater that extends along a circumferential direction of the flange portion, and a metal block in which the line heater is incorporated and that is disposed so as to surround the gas introduction port.

[0011] The metal block may include an upper block that covers an upper portion of the gas introduction port, and a lower block that covers a lower portion of the gas introduction port.

[0012] The line heater may include an upper heater disposed in the upper block, and a lower heater disposed in the lower block. The upper block and the lower block may include heater insertion grooves into which the upper heater and the lower heater are respectively inserted. The metal block may further include an upper block cover and a lower block cover that respectively cover the heater insertion grooves of the upper block and the lower block.

[0013] The batch-type substrate processing apparatus may further include a temperature detection unit that detects a temperature of the heater unit, and a heating control unit that controls a heating temperature of the heater unit according to the temperature detected by the temperature detection unit.

[0014] The gas supply pipe may be composed of a plurality of pipes, penetrate the flange portion in a radial direction, the plurality of gas supply pipes may be arranged along a circumferential direction of the flange portion, and a length of the line heater may be proportional to a number of the gas supply pipes.

[0015] The temperature detection unit may include a first temperature measurement member disposed at the central portion in the extending direction of the line heater in the heater unit, and a second temperature measurement member disposed at the peripheral portion in the extending direction of the line heater in the heater unit, separated from the first temperature measurement member in the extending direction of the line heater.

[0016] The heating control unit may control the heating temperature of the heater unit based on the first temperature of the heater unit measured by the first temperature measurement member, and control the heating temperature of the heater unit by reflecting the second temperature of the heater unit according to the difference between the first temperature of the heater unit and the second temperature of the heater unit measured by the second temperature measurement member.

[0017] The heating control unit may reflect the second temperature of the heater unit when the difference value between the first temperature and the second temperature of the heater unit is greater than the allowable value.

[0018] The distance between the first temperature measurement member and the second temperature measurement member may be greater than the distance between the plurality of gas supply pipes.

[0019] The gas supply pipe may further include a second seal member disposed between the reaction tube and the gas supply pipe, which penetrates the reaction tube in the radial direction, and a third seal member disposed between the gas supply pipe and the gas introduction port.

[0020] The flange portion is disposed outside the lower end portion of the reaction tube. The gas supply pipe further penetrates the flange portion in the radial direction. The second seal member is located between the reaction tube and the flange portion. The third seal member is located between the gas supply pipe and the flange portion. The heater unit may be disposed outside the flange portion.

[0021] The inner diameter of the gas introduction port may be smaller than the inner diameter of the gas supply pipe.

Advantages of the Invention

[0022] In order to prevent thermal distortion and / or damage of the first seal member disposed between the reaction tube and the flange portion, while flowing refrigerant through the fluid passage formed in the flange portion, by heating the gas introduction port via the heater portion, it is possible to suppress and / or prevent powder from accumulating due to condensation of the process gas at the inner peripheral surface of the gas supply pipe and the gas introduction port and at the joint between the gas supply pipe and the gas introduction port.

[0023] Here, by configuring the heater portion from a line heater extending along the circumferential direction of the flange portion and a metal block incorporating the line heater and disposing it so as to surround the gas introduction port, the internal temperature of the gas introduction port and / or the gas supply pipe can be maintained at a temperature at which the process gas does not condense (for example, 150°C or higher). Further, even when a plurality of gas supply pipes are configured, the heater portion can be configured in proportion to the number of gas supply pipes, and the internal temperatures of each gas supply pipe and the gas introduction port can be uniformly maintained at a temperature at which the process gas does not condense via the heater portion (or the line heater) configured to extend along the circumferential direction of the flange portion.

[0024] At this time, by detecting the temperature of the heater portion via the temperature detection portion and controlling the heating temperature of the heater portion, the gas introduction port can be controlled to a desired temperature. And by configuring the temperature detection portion from a first temperature measurement member disposed at the central portion in the extending direction of the line heater in the heater portion and a second temperature measurement member disposed at the peripheral portion in the extending direction of the line heater, based on the first temperature of the heater portion measured by the first temperature measurement member, while controlling the heating temperature of the heater portion, according to the difference between the second temperature of the heater portion measured by the second temperature measurement member and the first temperature of the heater portion, it is possible to control the plurality of gas introduction ports to a uniform temperature reflecting the second temperature of the heater portion.

Brief Description of the Drawings

[0025]

Figure 1

Figure 2

Figure 3

Embodiments for Carrying Out the Invention

[0026] Hereinafter, embodiments of the present invention will be described in more detail based on the accompanying drawings. However, the present invention is not limited to the embodiments disclosed below and should be embodied in various different forms. These embodiments are merely provided to make the disclosure of the present invention complete and to fully inform those with ordinary knowledge of the scope of the invention. In describing the present invention, the same reference numerals are assigned to the same components, and the drawings may be partially exaggerated in size for the purpose of accurately explaining the embodiments of the present invention. In the drawings, the same reference numerals indicate the same components.

[0027] FIG. 1 is a schematic perspective view showing a batch type substrate processing apparatus according to an embodiment of the present invention.

[0028] Referring to FIG. 1, a batch type substrate processing apparatus 100 according to an embodiment of the present invention may include a reaction tube 110 that provides a processing space for accommodating a plurality of substrates, a ring-shaped flange portion 120 provided with fluid passages 121a and 121b for supporting the reaction tube 110, a first seal member 131 disposed between the reaction tube 110 and the flange portion 120, a refrigerant supply unit 140 for supplying refrigerant to the fluid passages 121a and 121b, a gas supply pipe 150 for supplying process gas to the processing space through the flange portion 120, a gas introduction port 160 coupled to an outer end of the gas supply pipe 150, and a heater unit 170 for heating the gas introduction port 160.

[0029] The reaction tube 110 can be formed of a heat-resistant material such as quartz or ceramic in a cylindrical shape with the upper part closed and the lower part open, and can provide a processing space in which a plurality of substrates are accommodated and processed inside. The processing space of the reaction tube 110 is a space in which a substrate boat on which a plurality of substrates are stacked in the longitudinal direction (i.e., the vertical direction) of the reaction tube 110 is accommodated, and an actual processing step (e.g., a vapor deposition step) is performed.

[0030] Here, the substrate boat is a component for supporting substrates, and may be formed such that a plurality of substrates are loaded in the longitudinal direction (i.e., the vertical direction) of the reaction tube 110, or a plurality of unit processing spaces in which a plurality of substrates are processed separately may be formed.

[0031] The flange portion 120 can be disposed along the circumference of the lower end portion of the reaction tube 110 in a ring shape to support the reaction tube 110, can be made of a metal such as stainless steel (SUS), and a first seal member 131 such as an O-ring is disposed at a portion where the flange portion 120 and the reaction tube 110 are in contact to prevent process gas from leaking between the reaction tube 110 and the flange portion 120. At this time, the flange portion 120 may be concentric with the reaction tube 110.

[0032] Here, fluid passages 121a and 121b may be disposed in the flange portion 120, and a refrigerant may be introduced into the fluid passages 121a and 121b to cool the first seal member 131 in contact with the flange portion 120, thereby preventing and / or suppressing thermal distortion and / or damage of the first seal member 131. For example, the fluid passages 121a and 121b may be formed inside the flange portion 120.

[0033] The first seal member 131 may be disposed between the reaction tube 110 and the flange portion 120, and can block the gap between the reaction tube 110 and the flange portion 120 to prevent process gas from leaking out of the processing space.

[0034] Here, the first seal member 131 may be an O-ring or the like, and may be disposed in a ring shape along the periphery of the reaction tube 110. When the substrate processing step is performed at a high temperature of 600° C. or higher and heat is transferred from the reaction tube 110 due to the high process temperature (or processing temperature), there is a risk of distortion and / or damage.

[0035] The refrigerant supply unit 140 can supply a refrigerant such as cooling water to the fluid passages 121a and 121b, and can cause the refrigerant to flow through the fluid passages 121a and 121b so that distortion and / or damage do not occur in the first seal member 131 due to the high temperature. The refrigerant can cool the first seal member 131 by heat exchange with the first seal member 131 via the flange portion 120. At this time, the flange portion 120 is made of a metal having excellent thermal conductivity, so that heat exchange between the refrigerant and the first seal member 131 can be effectively performed, and (rapid) heat exchange between the first seal member 131 and the flange portion 120 and (rapid) heat exchange between the flange portion 120 and the refrigerant due to excellent thermal conductivity are used to substantially perform (rapid) heat exchange between the refrigerant and the first seal member 131, and the first seal member 131 can be effectively cooled.

[0036] Here, the fluid passages 121a and 121b may extend along the circumferential direction of the flange portion 120, and may be formed following the shape of the first seal member 131, so that the first seal member 131 can be cooled uniformly and effectively as a whole. For example, when the first seal member 131 is ring-shaped, the fluid passages 121a and 121b may be formed so that the refrigerant circulates along the circumferential direction of the flange portion 120.

[0037] The gas supply pipe 150 can supply process gas to the processing space via the flange portion 120 and can penetrate at least partially through the flange portion 120. At this time, one end (or the outer end) of the gas supply pipe 150 may face the outside of the reaction tube 110 and may be disposed outside the reaction tube 110. The other end (or the outer end) of the gas supply pipe 150 may face the outside of the reaction tube 110 and may be disposed outside the reaction tube 110. Here, a nozzle (not shown) for injecting the process gas into the processing space may be disposed at the outer end (or one end) of the gas supply pipe 150, or a separate nozzle (not shown) may be connected (or joined) to the outer end of the gas supply pipe 150, or the outer end of the gas supply pipe 150 may be formed by a nozzle (not shown).

[0038] For example, when the flange portion 120 is disposed at the lower part of the reaction tube 110, the outer end of the gas supply pipe 150 penetrating the side wall of the flange portion 120 in the radial direction toward the center of the flange portion 120 may be bent and extend in the longitudinal direction (or the upper direction) of the reaction tube 110, so that it may be disposed outside the reaction tube 110. When the flange portion 120 is disposed outside the reaction tube 110, the outer end of the gas supply pipe 150 penetrating the side wall of the flange portion 120 in the radial direction may penetrate the side wall of the reaction tube 110 toward the center of the reaction tube 110 in the radial direction and may be disposed outside the reaction tube 110. At this time, the gas supply pipe 150 may be made of a metal such as stainless steel (SUS), but the material of the gas supply pipe 150 is not limited thereto at all, and various materials can be adopted.

[0039] The gas introduction port 160 may be coupled to the outer end (or the other end) of the gas supply pipe 150, and may be connected to a gas supply line (not shown) to introduce (inlet) the process gas supplied from a gas supply source (not shown) through the gas supply line (not shown) into the gas supply pipe 150. At this time, a heating means (not shown), such as a heating jacket, may be disposed in the gas supply line (not shown) to prevent condensation of the process gas, and the process gas may be supplied at a temperature at which the process gas is not condensed (for example, 150°C or higher). Here, the gas introduction port 160 may be made of a metal such as stainless steel (SUS), and there is a possibility that heat loss may occur due to the refrigerant for cooling the first seal member 131 under the thermal influence from the flange portion 120 due to excellent thermal conductivity.

[0040] For example, the gas introduction port 160 may be coupled to the outer end of the gas supply pipe 150 and project outward (in the radial direction) of the reaction tube 110 and / or the flange portion 120, and may be in contact with the flange portion 120. If the gas introduction port 160 is in contact with the flange portion 120, the gas introduction port 160 is thermally connected to the flange portion 120, and the heat of the gas introduction port 160 (that is, the heat of the process gas in the gas introduction port) is conducted (at high speed) to the refrigerant flowing through the fluid passages 121a and 121b of the flange portion 120, resulting in heat loss.

[0041] In such a case, there is a possibility that the process gas in the gas introduction port 160 is condensed into powder, which accumulates on the inner peripheral surface of the gas introduction port 160, and there is also a possibility that the process gas is condensed and the powder accumulates at the connection (or connection) portion between the gas introduction port 160 and the gas supply pipe 150. Thus, there is a concern that the powder accumulated on the inner peripheral surface of the gas introduction port 160 and / or the connection portion between the gas introduction port 160 and the gas supply pipe 150 may be supplied to the processing space together with the process gas as particles, causing a serious problem of deteriorating the quality of the thin film formed (or deposited) by the substrate processing step.

[0042] The heater unit 170 can heat the gas introduction port 160, prevent heat loss from occurring in the gas introduction port 160 due to the refrigerant flowing through the fluid passages 121a and 121b of the flange portion 120, and prevent the process gas in the gas introduction port 160 from being condensed into powder due to heat loss of the gas introduction port 160. Through this, it is possible to prevent the powder from accumulating on the inner peripheral surface of the gas introduction port 160 and / or the joint portion between the gas introduction port 160 and the gas supply pipe 150 and being supplied to the processing space together with the process gas, thereby solving the conventional problem that the powder acts as particles and degrades the quality of the thin film in the substrate processing step. For example, the heater unit 170 may be disposed so as to surround the gas introduction port 160 and can heat the gas introduction port 160 as a whole (uniformly).

[0043] Therefore, in the batch type substrate processing apparatus 100 according to the present invention, in order to prevent thermal distortion and / or damage of the first seal member 131 disposed between the reaction tube 110 and the flange portion 120 and sealing the space between the reaction tube 110 and the flange portion 120, while forming the fluid passages 121a and 121b in the flange portion 120 and flowing the refrigerant therethrough, the gas introduction port 160 is heated via the heater unit 170, thereby preventing the powder from accumulating on the inner peripheral surface of the gas introduction port 160 and the joint portion between the gas introduction port 160 and the gas supply pipe 150 due to condensation (or heat loss) of the process gas caused by heat loss of the gas introduction port 160. Thereby, it is possible to solve the serious problem that the quality of the thin film is degraded because the powder is supplied to the processing space together with the process gas and acts as particles in the substrate processing step.

[0044] FIG. 2 is an exploded perspective view of a heater unit according to an embodiment of the present invention.

[0045] Referring to FIG. 2, the heater unit 170 may include a line heater 171 extending along the circumferential direction of the flange portion 120, and a metal block 172 in which the line heater 171 is incorporated and which is disposed so as to surround the gas introduction port 160. The line heater 171 may extend along the circumferential direction of the flange portion 120 and may be disposed so as to be aligned with (or parallel to) the fluid passages 121a and 121b. For example, the line heater 171 may be in a curved line shape along the circumferential direction of the ring-shaped flange portion 120. In such a case, the fluid passages 121a and 121b through which the refrigerant flows and the line heater 171 can face each other, whereby the gas introduction port 160 affected by the refrigerant flowing through the fluid passages 121a and 121b can be uniformly heated in the circumferential direction of the flange portion 120, and the linear cooling (or line cooling) of the refrigerant flowing along the fluid passages 121a and 121b by the linear heating (or line heating) of the line heater 171 at the gas introduction port 160 can be (thermally) canceled out.

[0046] Also, the line heater 171 can be arranged so as to be aligned with the first seal member 131, and the heat from the line heater 171 can be uniformly dispersed without being concentrated on a part of the first seal member 131. The line heater 171 can be disposed farther from the first seal member 131 than the fluid passages 121a and 121b to minimize (or prevent) the thermal influence of the line heater 171 on the first seal member 131.

[0047] The metal block 172 may be arranged to surround the gas introduction port 160, may incorporate a line heater 171, may extend along the extending direction of the line heater 171, and can conduct (transfer) the heat of the line heater 171. That is, the metal block 172 can effectively and uniformly heat the gas introduction port 160 through heat conduction, and can surround the gas introduction port 160 to heat it uniformly as a whole. For example, the metal block 172 may be at least partially made of aluminum (Al), and using the high thermal conductivity of aluminum (Al), the heat of the line heater 171 can be quickly transferred (or conducted) to effectively heat the gas introduction port 160.

[0048] Here, the metal block 172 may include an upper block 172a that covers the upper part of the gas introduction port 160 and a lower block 172b that covers the lower part of the gas introduction port 160. The upper block 172a can cover the upper part of the gas introduction port 160, the lower block 172b can cover the lower part of the gas introduction port 160, and the upper block 172a and the lower block 172b can surround the gas introduction port 160 vertically.

[0049] For example, the upper block 172a and the lower block 172b may be formed symmetrically (vertically) and can be coupled and separated from each other. When the upper block 172a and the lower block 172b sandwich the gas introduction port 160 and meet and are coupled to each other vertically with the gas introduction port 160 as the center, they can surround the gas introduction port 160 and can also be separated from each other (pulled apart from each other) for maintenance and the like. At this time, fastening grooves may be formed along the periphery of the gas introduction port 160 so that the gas introduction port 160 can be at least partially inserted and fastened into the upper block 172a and the lower block 172b. The upper half of the periphery of the gas introduction port 160 may be inserted into the fastening groove of the upper block 172a, and the lower half of the periphery of the gas introduction port 160 may be inserted into the fastening groove of the lower block 172b.

[0050] When the metal block 172 is composed of an upper block 172a and a lower block 172b, it is easy to mount the heater part 170 to the gas introduction port 160 (that is, mount the metal block). Even when a plurality of gas supply pipes 150 penetrate the flange part 120 in the radial direction and are arranged along the circumferential direction of the flange part 120 so as to be arranged in the radial direction, correspondingly, a plurality of gas introduction ports 160 respectively connected to the plurality of gas supply pipes 150 can be collectively wrapped (or covered) respectively, and the plurality of gas introduction ports 160 can be heated simultaneously together (integrally). Through this, the plurality of gas introduction ports 160 can be heated uniformly, and the plurality of gas introduction ports 160 can be effectively heated even by a minimum (for example, one or two) line heaters 171.

[0051] When the metal block 172 is composed of a left block and a right block and wraps the gas introduction port 160 from both sides, not only is it difficult to incorporate the line heater 171 extending along the circumferential direction of the flange part 120, but also if the plurality of gas introduction ports 160 respectively connected to the plurality of gas supply pipes 150 that penetrate the flange part 120 in the radial direction and are arranged along the circumferential direction of the flange part 120 are each wrapped, they cannot be collectively wrapped. If an attempt is made to collectively wrap the plurality of gas introduction ports 160, they cannot be wrapped so as to be each wrapped. However, the upper block 172a and the lower block 172b can collectively wrap the plurality of gas introduction ports 160 while each wrapping the plurality of gas introduction ports 160.

[0052] In addition, when the metal block 172 is composed of a front-end block and a rear-end block and wraps the gas introduction port 160 from the front and the rear, the gas introduction port 160 must penetrate both the front-end block and the rear-end block. Therefore, it is difficult for the front-end block and the rear-end block to be in contact (or close contact) with the gas introduction port 160, and the front-end block and the rear-end block cannot be symmetrically formed because the distances from the flange portion 120 are different. However, the upper block 172a and the lower block 172b can be in close contact (or contact) with the gas introduction port 160 while wrapping the gas introduction port 160 from above and below, and can be symmetrically formed (vertically).

[0053] At this time, the line heater 171 may include an upper heater 171a disposed in the upper block 172a and a lower heater 171b disposed in the lower block 172b. The upper block 172a and the lower block 172b may be symmetrically formed (vertically), the upper heater 171a may be disposed in the upper block 172a symmetrically, and the lower heater 171b may be disposed in the lower block 172b symmetrically. The upper heater 171a and the lower heater 171b may be arranged at the same distance from the gas introduction port 160 symmetrically with each other, and may be configured in the same number.

[0054] For example, one upper heater 171a may be arranged in a curved shape on the upper block 172a, and one lower heater 171b may also be arranged in a curved shape on the lower block 172b. The upper heater 171a and the lower heater 171b may be parallel to each other, and may be symmetric with the gas introduction port 160 as the center. The gas introduction port 160 can be uniformly and effectively heated via the upper heater 171a and the lower heater 171b. Even when a plurality of gas introduction ports 160 are heated collectively, the plurality of gas introduction ports 160 can be effectively and uniformly heated.

[0055] Moreover, the upper block 172a and the lower block 172b may be provided with heater insertion grooves 172c into which the upper heater 171a and the lower heater 171b are respectively inserted, and the metal block 172 may further include an upper block cover 173a and a lower block cover 173b that respectively cover the heater insertion grooves 172c of the upper block 172a and the lower block 172b. Heater insertion grooves 172c may be formed in the upper block 172a and the lower block 172b. The upper heater 171a may be inserted into the heater insertion groove 172c of the upper block 172a, and the lower heater 171b may be inserted into the heater insertion groove 172c of the lower block 172b. Through this, even when the upper heater 171a and the lower heater 171b are curved, the upper heater 171a can be easily built into the upper block 172a and the lower heater 171b can be built into the lower block 172b. On the other hand, since the upper block 172a and the lower block 172b not only come into contact with the upper heater 171a and the lower heater 171b respectively, but also come into contact with the gas introduction port 160, they may be made of aluminum (Al) and use high thermal conductivity to effectively transfer (or conduct) the heat of the upper heater 171a and the lower heater 171b to the gas introduction port 160.

[0056] At this time, since the metal block 172 further includes an upper block cover 173a and a lower block cover 173b, the upper block cover 173a can cover the heater insertion groove 172c of the upper block 172a to incorporate the upper heater 171a into the metal block 172 (i.e., into the upper block), and the lower block cover 173b can cover the heater insertion groove 172c to incorporate the lower heater 171b into the metal block 172 (i.e., into the lower block). After the upper heater 171a and the lower heater 171b are respectively inserted into the heater insertion grooves 172c of the upper block 172a and the lower block 172b, the upper block cover 173a and the lower block cover 173b can cover the heater insertion grooves 172c of the upper block 172a and the lower block 172b respectively to prevent the upper heater 171a and the lower heater 171b from detaching, and can play a role in protecting the upper heater 171a and the lower heater 171b.

[0057] For example, the upper block cover 173a and the lower block cover 173b may be made of aluminum (Al) for a tight bond (or contact) with the upper block 172a and the lower block 172b, but are not limited thereto, and may be made of a heat insulating material to prevent the heat of the upper heater 171a and the lower heater 171b from dissipating to the outside (or to the side opposite to the gas introduction port).

[0058] Therefore, the batch type substrate processing apparatus 100 according to the present invention is configured by a line heater 171 in which the heater unit 170 extends along the circumferential direction of the flange unit 120 and a metal block 172 in which the line heater 171 is incorporated, and is disposed so as to surround the gas introduction port 160, thereby preventing heat loss of the gas introduction port 160 and maintaining the internal temperature of the gas introduction port 160 at a temperature at which the process gas does not condense.

[0059] The batch-type substrate processing apparatus 100 according to the present invention may further include a temperature detection unit 180 that detects the temperature of the heater unit 170 and a heating control unit 175 that controls the heating temperature of the heater unit 170 according to the temperature detected by the temperature detection unit 180.

[0060] The temperature detection unit 180 can detect the temperature of the heater unit 170 (for example, the temperature of the line heater), and can infer the (internal) temperature of the gas introduction port 160 using the detected temperature of the heater unit 170. Here, the heating temperature of the heater unit 170 may be the (heating) temperature set in the heating control unit 175.

[0061] The heating control unit 175 can control the heating temperature of the heater unit 170 according to the temperature detected by the temperature detection unit 180, and adjust the heating temperature of the heater unit 170 so as to match the detected temperature of the heater unit 170 (that is, the grasped (internal) temperature of the gas introduction port 160), and keep the internal temperature of the gas introduction port 160 at a temperature at which the process gas does not condense (for example, 150 to 170°C).

[0062] Therefore, while the heating of the heater unit 170 does not affect the cooling of the first seal member 131 using the flange portion 120, it is also possible to reduce (or minimize) the consumption of electric power (or fuel) for the heat generation (or heating) of the heater unit 170.

[0063] The gas supply pipes 150 are composed of a plurality of pipes and may penetrate the flange portion 120 in the radial direction (or the thickness direction). The plurality of gas supply pipes 150 may be arranged along the circumferential direction of the flange portion 120. The gas supply pipes 150 may be composed of a plurality of pipes. Each of the plurality of gas supply pipes 150 may penetrate the flange portion 120 in the radial direction, and the plurality of gas supply pipes 150 may be arranged along the circumferential direction of the flange portion 120 so as to be arranged side by side in the radial direction. Gas introduction ports 160 may be respectively connected to the outer ends of the plurality of gas supply pipes 150, and different gases may be supplied to each gas supply pipe 150, or the same gas may be supplied. Here, the plurality of gas introduction ports 160 respectively connected to the plurality of gas supply pipes 150 may be heated by a heater unit 170 in order to prevent condensation of the (process) gas.

[0064] At this time, the length of the line heater 171 may be proportional to the number of the gas supply pipes 150, and the more the number of the gas supply pipes 150, the longer it becomes. That is, the length of the line heater 171 may be proportional to the number of the gas introduction ports 160 that increases as the number of the gas supply pipes 150, and the line heater 171 can heat a plurality of gas introduction ports 160 simultaneously together. Thereby, the internal temperatures of the plurality of gas introduction ports 160 can be uniformly heated regardless of the number of the gas supply pipes 150 (that is, the number of the gas introduction ports).

[0065] Therefore, even when the batch type substrate processing apparatus 100 according to the present invention has a plurality of gas supply pipes 150, the heater unit 170 can be configured in proportion to the number of the gas supply pipes 150, and the internal temperatures of the plurality of gas introduction ports 160 can be made uniform through the line heater 171 extending along the circumferential direction of the flange portion 120, and the internal temperature of each of the gas introduction ports 160 can be maintained at a temperature at which the process gas is not condensed.

[0066] Here, the temperature detection unit 180 may include a first temperature measurement member 181 disposed at the central portion in the extending direction of the line heater 171 in the heater unit 170, and a second temperature measurement member 182 disposed at the peripheral portion in the extending direction of the line heater 171 in the heater unit 170 and separated from the first temperature measurement member 181 in the extending direction of the line heater 171. The first temperature measurement member 181 may be disposed at the central portion in the extending direction of the line heater 171 in the heater unit 170, and can measure the first temperature of the heater unit 170. The first temperature of the heater unit 170 may be a representative temperature of the heater unit 170 (or a representative temperature measured similarly in various portions).

[0067] The second temperature measurement member 182 may be separated from the first temperature measurement member 181 in the extending direction of the line heater 171, and may be disposed at the peripheral portion in the extending direction of the line heater 171 in the heater unit 170, and can measure the second temperature of the heater unit 170. The second temperature of the heater unit 170 may be a specific temperature of the heater unit 170 (or a special temperature that appears only in a specific portion). At this time, the second temperature measurement member 182 may be composed of a plurality and arranged symmetrically on both sides of the first temperature measurement member 181. However, since the temperature characteristics according to the position in the extending direction of the line heater 171 appear symmetrically, one second temperature measurement member 182 (only) may be arranged on either one of the two sides of the first temperature measurement member 181.

[0068] For example, the first temperature measurement member 181 and the second temperature measurement member 182 may be thermocouples (T / C), but are not limited thereto, and the temperature of the heater unit 170 (that is, the first temperature and the second temperature) can be measured by various methods.

[0069] The heating control unit 175 can control the heating temperature of the heater unit 170 based on the first temperature of the heater unit 170 measured by the first temperature measuring member 181, and can control the heating temperature of the heater unit 170 by reflecting the second temperature of the heater unit 170 according to the difference between the first temperature of the heater unit 170 and the second temperature of the heater unit 170 measured by the second temperature measuring member 182. The heating control unit 175 can control the heating temperature of the heater unit 170 based on the first temperature of the heater unit 170 measured by the first temperature measuring member 181, and can control the heating temperature of the heater unit 170 based on the first temperature of the heater unit 170 which is the representative temperature of the heater unit 170. Since the representative temperature of the heater unit 170 is measured at most positions (or parts), it can be regarded as the substantial temperature of the heater unit 170, and the heating temperature of the heater unit 170 can be controlled based on the first temperature of the heater unit 170.

[0070] Then, the heating control unit 175 can reflect the second temperature of the heater unit 170 in the control of the heating temperature of the heater unit 170 according to the difference between the second temperature of the heater unit 170 measured by the second temperature measuring member 182 and the first temperature of the heater unit 170. If the difference between the first temperature of the heater unit 170 and the second temperature of the heater unit 170 is at a negligible level, it may not be necessary to reflect the second temperature of the heater unit 170. If the difference between the first temperature of the heater unit 170 and the second temperature of the heater unit 170 is large and the specific temperature of the heater unit 170 has an impact, the heating temperature of the heater unit 170 can be controlled by reflecting the second temperature of the heater unit 170. Since the specific temperature of the heater unit 170 is only measured at a few specific positions (or parts), the heating temperature of the heater unit 170 can be controlled by reflecting the second temperature of the heater unit 170 in the first temperature of the heater unit 170 according to the magnitude of the difference between the first temperature of the heater unit 170 and the second temperature of the heater unit 170.

[0071] For example, based on the first temperature of the heater unit 170, the heating temperature of the heater unit 170 to be changed can be primarily determined, and according to the magnitude of the difference between the first temperature of the heater unit 170 and the second temperature of the heater unit 170, the heating temperature of the heater unit 170 to be changed can be supplementarily corrected by reflecting the second temperature of the heater unit 170.

[0072] Here, when the difference value between the first temperature of the heater unit 170 and the second temperature of the heater unit 170 is greater than the allowable value, the heating control unit 175 can reflect the second temperature of the heater unit 170. When it is equal to or less than the difference value between the first temperature of the heater unit 170 and the second temperature of the heater unit 170, since the second temperature (or the specific temperature) of the heater unit 170 is at a negligible level, the heating control unit 175 does not reflect the second temperature of the heater unit 170 and can control the heating temperature of the heater unit 170 based on (only) the first temperature of the heater unit 170. And when the difference value between the first temperature of the heater unit 170 and the second temperature of the heater unit 170 is greater than the allowable value, since the second temperature (or the specific temperature) of the heater unit 170 may affect and cause a temperature (or part) lower than the temperature at which the process gas is not partially condensed, the heating control unit 175 can control the heating temperature of the heater unit 170 by reflecting the second temperature of the heater unit 170 (to the first temperature of the heater unit). That is, only when the difference between the first temperature of the heater unit 170 and the second temperature of the heater unit 170 is large, the second temperature of the heater unit 170 can be reflected in the control of the heating temperature of the heater unit 170, and based on the first temperature of the heater unit 170, the heating temperature of the heater unit 170 determined primarily can be supplementarily corrected by reflecting the second temperature of the heater unit 170 to the heating temperature of the heater unit 170.

[0073] The interval between the first temperature measurement member 181 and the second temperature measurement member 182 (in the circumferential direction of the flange portion) may be larger than the interval between the plurality of gas supply pipes 150 (in the circumferential direction of the flange portion). At this time, the plurality of gas supply pipes 150 may be arranged at equal intervals in the circumferential direction of the flange portion 120. Since the specific temperature of the heater unit 170 mainly occurs at both ends in the extending direction of the line heater 171, if the interval between the first temperature measurement member 181 and the second temperature measurement member 182 is made equal to or less than the interval between the plurality of gas supply pipes 150, the second temperature measurement member 182 cannot measure the specific temperature of the heater unit 170, and the specific temperature of the heater unit 170 cannot be reflected in the control of the heating temperature of the heater unit 170. Also, since the difference between the second temperature of the heater unit 170 measured by the second temperature measurement member 182 that measures the representative temperature of the heater unit 170 instead of the specific temperature of the heater unit 170 and the first temperature of the heater unit 170 is not large, even the second temperature of the heater unit 170 cannot be reflected in the control of the heating temperature of the heater unit 170.

[0074] However, by making the interval between the first temperature measurement member 181 and the second temperature measurement member 182 larger than the interval between the plurality of gas supply pipes 150, the second temperature measurement member 182 can measure the temperature at either one of the two ends in the extending direction of the line heater 171, and can measure the specific temperature of the heater unit 170. Thereby, the specific temperature of the heater unit 170 can be reflected in the heating temperature control of the heater unit 170.

[0075] Therefore, the batch-type substrate processing apparatus 100 according to the present invention can control the temperature of the gas introduction port 160 to a desired temperature by detecting the temperature of the heater unit 170 via the temperature detection unit 180 and controlling the heating temperature of the heater unit 170. And, by configuring the temperature detection unit 180 with a first temperature measurement member 181 disposed at the central portion in the extending direction of the line heater 171 in the heater unit 170 and a second temperature measurement member 182 disposed at the peripheral portion in the extending direction of the line heater 171, while controlling the heating temperature of the heater unit 170 based on the first temperature of the heater unit 170 measured by the first temperature measurement member 181, the second temperature of the heater unit 170 measured by the second temperature measurement member 182 is reflected according to the difference between the second temperature of the heater unit 170 and the first temperature of the heater unit 170, and a plurality of gas introduction ports 160 can be controlled to a uniform temperature.

[0076] FIG. 3 is a conceptual diagram for explaining the coupling structure between the gas introduction port and the heater unit according to an embodiment of the present invention.

[0077] Referring to FIG. 3, the gas supply pipe 150 can penetrate the reaction tube 110 in the radial direction and supply the process gas to the processing space in the reaction tube 110. At this time, the flange portion 120 is disposed outside the reaction tube 110, and the outer end of the gas supply pipe 150 may penetrate both the side wall of the flange portion 120 and the side wall of the reaction tube 110 toward the center of the reaction tube 110 in the radial direction.

[0078] The batch-type substrate processing apparatus 100 according to the present invention may further include a second seal member 132 disposed between the reaction tube 110 and the gas supply pipe 150, and a third seal member 133 disposed between the gas supply pipe 150 and the gas introduction port 160.

[0079] The second seal member 132 may be disposed between the reaction tube 110 and the gas supply pipe 150, can seal between the reaction tube 110 and the gas supply pipe 150, block the gap between the reaction tube 110 and the gas supply pipe 150, and prevent the process gas from leaking between the reaction tube 110 and the gas supply pipe 150.

[0080] For example, the second seal member 132 may be an O-ring or the like, may be disposed in a ring shape around the gas supply pipe 150, and the second seal member 132 may also be distorted and / or damaged by the high-temperature process temperature.

[0081] The third seal member 133 may be disposed between the gas supply pipe 150 and the gas introduction port 160, can seal between the gas supply pipe 150 and the gas introduction port 160, block the gap between the gas supply pipe 150 and the gas introduction port 160, and prevent the process gas from leaking between the gas supply pipe 150 and the gas introduction port 160.

[0082] For example, the third seal member 133 may also be an O-ring or the like, may be disposed in a ring shape around the gas supply pipe 150, and there is a possibility of distortion and / or damage due to the high-temperature process temperature.

[0083] The flange portion 120 may be disposed outside the lower end portion of the reaction tube 110, and the gas supply pipe 150 may further penetrate the flange portion 120 in the radial direction and extend to the reaction tube 110, so as to penetrate both the flange portion 120 and the reaction tube 110. That is, the flange portion 120 may be disposed outside the lower end portion of the reaction tube 110, the gas supply pipe 150 may penetrate both the side wall of the flange portion 120 and the side wall of the reaction tube 110 toward the center of the reaction tube 110 in the radial direction, and the outer end of the gas supply pipe 150 may be disposed outside the reaction tube 110.

[0084] For example, the reaction tube 110 may have a protruding portion that protrudes outward (or in the radial direction) along the circumferential direction of the reaction tube 110 at the lower end. The flange portion 120 may be disposed so as to enclose the protruding portion outside the protruding portion of the reaction tube 110. The gas supply pipe 150 may penetrate the side wall of the flange portion 120 in the radial direction and reach the protruding portion, so that the outer end is disposed outside the reaction tube 110 through the protruding portion. Here, the flange portion 120 may be composed of a lower flange and an upper fixing ring. The lower flange can receive and support the reaction tube 110 from the lower part of the reaction tube 110 (that is, the lower part of the protruding portion). The upper fixing ring can press the protruding portion from above to bring the reaction tube 110 and the lower flange (that is, the protruding portion and the lower flange) into close contact (or adhesion) with the first sealing member 131. Through this, the space between the reaction tube 110 and the lower flange can be sealed (or hermetically sealed).

[0085] At this time, a plurality of fluid passages 121a and 121b may be formed in the flange portion 120. One of the fluid passages 121b may be formed for cooling the first sealing member 131, and the remaining other fluid passage 121a may be formed for cooling the second sealing member 132 and the third sealing member 133. Here, one of the fluid passages 121b can also cool the second sealing member 132 and the third sealing member 133, and the remaining other fluid passage 121a can also cool the first sealing member 131. Also, one fluid passage 121a may be formed in the upper fixing ring, and another fluid passage 121b may be formed in the lower flange. On the other hand, the refrigerant may flow in through one of the fluid passages 121a and be discharged through the remaining other fluid passage 121b.

[0086] Here, the second seal member 132 may be located between the reaction tube 110 and the flange portion 120 and interposed between the gas supply pipe 150 and the reaction tube 110 and the flange portion 120. The third seal member 133 may be located between the gas supply pipe 150 and the flange portion 120 and interposed between the gas introduction port 160 and the gas supply pipe 150 and the flange portion 120. The second seal member 132 can be interposed between the gas supply pipe 150 and the reaction tube 110 to prevent the process gas from leaking between the reaction tube 110 and the gas supply pipe 150. By also being interposed between the gas supply pipe 150 and the flange portion 120 to prevent direct contact between the gas supply pipe 150 and the flange portion 120, heat loss of the gas supply pipe 150 due to the refrigerant flowing through the fluid passages 121a, 121b of the flange portion 120 can be suppressed or prevented.

[0087] The third seal member 133 can be interposed between the gas introduction port 160 and the gas supply pipe 150 to prevent gas from leaking between the gas supply pipe 150 and the gas introduction port 160. By also being interposed between the gas supply pipe 150 and the flange portion 120 to effectively prevent direct contact between the gas supply pipe 150 and the flange portion 120, heat loss of the gas supply pipe 150 due to the refrigerant flowing through the fluid passages 121a, 121b of the flange portion 120 can be effectively suppressed or prevented.

[0088] Also, the second seal member 132 and the third seal member 133 can effectively prevent the process gas from leaking out to the outside (or leaking) between the reaction tube 110 and the gas supply pipe 150 and / or between the flange portion 120 and the gas supply pipe 150 from the processing space by doubly sealing (or sealing) not only between the reaction tube 110 and the gas supply pipe 150 but also between the flange portion 120 and the gas supply pipe 150.

[0089] At this time, the heater unit 170 may be disposed outside the flange portion 120. Since the first seal member 131, the second seal member 132, and the third seal member 133 are disposed (or arranged) inside (and / or outside) the flange portion 120, the heater unit 170 may be disposed outside the flange portion 120 so as not to thermally affect the first seal member 131, the second seal member 132, and the third seal member 133, and may be disposed farther from the first seal member 131, the second seal member 132, and the third seal member 133 than the fluid passages 121a and 121b. Then, the heater unit 170 can effectively heat the gas introduction port 160 by surrounding and closely contacting (or adhering to) the gas introduction port 160 from the outside of the flange portion 120. Here, the heater unit 170 may be in contact with the outside of the flange portion 120 or may be separated from the flange portion 120, but it is preferably separated from the flange portion 120 while being in contact with the gas introduction port 160 so that the gas introduction port 160 can be effectively heated without being thermally affected by or affecting the flange portion 120. On the other hand, by interposing the third seal member 133 between the gas introduction port 160 and the flange portion 120 to separate the gas introduction port 160 from the flange portion 120, it is also possible to suppress (or minimize) the heat loss of the gas supply pipe 150 due to the refrigerant flowing through the fluid passages 121a and 121b of the flange portion 120.

[0090] The inner diameter of the gas introduction port 160 may be smaller than the inner diameter of the gas supply pipe 150. When the inner diameter of the gas introduction port 160 is small, the process gas inside the gas introduction port 160 can be effectively heated by heating the gas introduction port 160. The process gas spreads into the gas supply pipe 150 with a relatively high internal pressure and a larger inner diameter and relatively low pressure while quickly passing through the portion (or section) corresponding to the flange portion 120 in the gas supply pipe 150, thereby preventing the condensation of the process gas inside the gas supply pipe 150 and preventing the powder from accumulating on the inner peripheral surface of the gas supply pipe 150 due to the condensation of the process gas. Here, the portion of the gas supply pipe 150 corresponding to the flange portion 120 may be a part (section) of the outer end of the gas supply pipe 150. On the other hand, when the inner diameter of the gas supply pipe 150 is large, the process gas that quickly passes through is prevented from contacting the inner peripheral surface of the gas supply pipe 150, and the condensation of the process gas and / or the accumulation of the powder on the inner peripheral surface of the gas supply pipe 150 can be prevented and / or suppressed.

[0091] The batch type substrate processing apparatus 100 of the present invention may further include an exhaust unit 190 for exhausting the inside of the reaction tube 110.

[0092] The exhaust unit 190 can exhaust the inside of the reaction tube 110 and can play a role in exhausting the process residues in the processing space to the outside. The exhaust unit 190 may be composed of an exhaust nozzle extending in the longitudinal direction of the reaction tube 110, an exhaust line connected to the exhaust nozzle, an exhaust port, and an exhaust pump. The exhaust nozzle may be provided with a plurality of exhaust holes arranged in the vertical direction corresponding to the unit processing spaces of the substrate boats respectively.

[0093] Here, the process gas may contain one or more gases, and may contain a source gas and a reaction gas that reacts with the source gas to form a thin film material. For example, when the thin film material deposited on the substrate is silicon nitride, the source gas may contain a gas containing silicon such as dichlorosilane (SiH2Cl2, abbreviation: DCS), and the reaction gas may contain a gas containing nitrogen such as NH3, N2O, or NO.

[0094] On the other hand, the batch type substrate processing apparatus 100 of the present invention may further include a heating cover (not shown) surrounding the reaction tube 110 for heating a plurality of the substrates. Further, the substrate boat may be rotated by a rotating means connected to the lower part of the substrate boat for the uniformity of the processing step.

[0095] Thus, in the present invention, in order to prevent thermal distortion and / or damage of the first seal member disposed between the reaction tube and the flange portion, while flowing a refrigerant by forming a fluid passage in the flange portion, the gas introduction port is heated through the heater portion, thereby suppressing and / or preventing powder from accumulating due to condensation of the process gas at the inner peripheral surface of the gas supply pipe and the gas introduction port and at the joint between the gas supply pipe and the gas introduction port. Here, the heater portion is composed of a line heater extending along the circumferential direction of the flange portion and a metal block incorporating the line heater, and is disposed so as to surround the gas introduction port, whereby the internal temperature of the gas introduction port and / or the gas supply pipe can be maintained at a temperature at which the process gas does not condense. Further, even when the gas supply pipe is composed of a plurality of pipes, the heater portion can be configured in proportion to the number of the gas supply pipes, and the internal temperatures of the respective gas supply pipes and the gas introduction port can be uniformly maintained at a temperature at which the process gas does not condense through the heater portion configured to extend along the circumferential direction of the flange portion. At this time, the temperature of the heater portion is detected through the temperature detection portion and the heating temperature of the heater portion is controlled, whereby the gas introduction port can be controlled to a desired temperature. Then, the temperature detection portion is composed of a first temperature measurement member disposed at the central portion in the extending direction of the line heater in the heater portion and a second temperature measurement member disposed at the peripheral portion in the extending direction of the line heater, whereby, based on the first temperature of the heater portion measured by the first temperature measurement member, while controlling the heating temperature of the heater portion, according to the difference between the second temperature of the heater portion measured by the second temperature measurement member and the first temperature of the heater portion, the second temperature of the heater portion is reflected to control the plurality of gas introduction ports to a uniform temperature.

[0096] The preferred embodiments of the present invention have been illustrated and described above. However, the present invention is not limited to the above-described embodiments at all, and those having ordinary knowledge in the field to which the present invention pertains can make various modifications and adopt other equivalent embodiments without departing from the gist of the present invention claimed in the claims. Therefore, the technical protection scope of the present invention should be determined by the following claims.

Claims

1. A reaction tube that provides a processing space for accommodating a plurality of substrates, A ring-shaped flange portion in which a fluid passage is disposed and that supports the reaction tube, A first seal member disposed between the reaction tube and the flange portion, A refrigerant supply unit that supplies refrigerant to the fluid passage, A gas supply pipe that supplies process gas to the processing space through the flange portion, A gas introduction port coupled to an outer end of the gas supply pipe, A heater unit that heats the gas introduction port, A batch-type substrate processing apparatus comprising the above.

2. The heater unit includes: A line heater extending along the circumferential direction of the flange portion, A metal block in which the line heater is incorporated and that is disposed so as to surround the gas introduction port, The batch-type substrate processing apparatus according to Claim 1, comprising the above.

3. The metal block includes: An upper block that covers an upper portion of the gas introduction port, A lower block that covers a lower portion of the gas introduction port, The batch-type substrate processing apparatus according to Claim 2, comprising the above.

4. The line heater includes: An upper heater disposed in the upper block, A lower heater disposed in the lower block, The upper block and the lower block include heater insertion grooves into which the upper heater and the lower heater are respectively inserted, The metal block further includes an upper block cover and a lower block cover that respectively cover the heater insertion grooves of the upper block and the lower block. The batch-type substrate processing apparatus according to Claim 3, comprising the above.

5. A temperature detection unit that detects the temperature of the heater unit, A heating control unit that controls the heating temperature of the heater unit according to the temperature detected by the temperature detection unit, The batch-type substrate processing apparatus according to Claim 2, further comprising the above.

6. The gas supply pipe is composed of a plurality of pipes that penetrate the flange portion in the radial direction, The plurality of gas supply pipes are arranged along the circumferential direction of the flange portion, The length of the line heater is proportional to the number of the gas supply pipes. The batch-type substrate processing apparatus according to Claim 4, comprising the above.

7. The temperature detection unit includes: A first temperature measurement member disposed at a central portion in the extending direction of the line heater in the heater unit, A second temperature measurement member disposed at a peripheral portion in the extending direction of the line heater in the heater unit, away from the first temperature measurement member in the extending direction of the line heater. ​ The batch-type substrate processing apparatus according to claim 6, comprising

8. The heating control unit controls the heating temperature of the heater unit based on the first temperature of the heater unit measured by the first temperature measuring member, and controls the heating temperature of the heater unit by reflecting the second temperature of the heater unit according to the difference between the first temperature of the heater unit and the second temperature of the heater unit measured by the second temperature measuring member. The batch-type substrate processing apparatus according to claim 7.

9. The heating control unit reflects the second temperature of the heater unit when the difference value between the first temperature and the second temperature of the heater unit is greater than an allowable value. The batch-type substrate processing apparatus according to claim 8.

10. The distance between the first temperature measuring member and the second temperature measuring member is greater than the distance between the plurality of gas supply pipes. The batch-type substrate processing apparatus according to claim 7.

11. The gas supply pipe penetrates the reaction tube in the radial direction, a second seal member disposed between the reaction tube and the gas supply pipe, and a third seal member disposed between the gas supply pipe and the gas introduction port. The batch-type substrate processing apparatus according to claim 1, further comprising

12. The flange portion is disposed outside the lower end portion of the reaction tube, the gas supply pipe further penetrates the flange portion in the radial direction, the second seal member is located between the reaction tube and the flange portion, the third seal member is located between the gas supply pipe and the flange portion, and the heater unit is disposed outside the flange portion. The batch-type substrate processing apparatus according to claim 11.

13. The inner diameter of the gas introduction port is smaller than the inner diameter of the gas supply pipe. The batch-type substrate processing apparatus according to claim 12.

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