Injector configured to be disposed in a reaction chamber of a substrate processing apparatus

The injector's design with varying thickness, elliptical cross-section, and matching thermal expansion materials addresses deposition and stress issues, improving efficiency and longevity in substrate processing.

JP2026015346APending Publication Date: 2026-01-29ASM IP HLDG BV
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Patent Information

Application Number
JP2025183810
Authority / Receiving Office
JP · JP
Patent Type
Applications
Current Assignee / Owner
Priority Date
2020-11-30
Filing Date
2025-10-30
Publication Date
2026-01-29

AI Technical Summary

Technical Problem

Existing injectors in substrate processing apparatuses experience clogging and damage due to reactive gas deposition, leading to inefficiencies and potential substrate damage.

Method used

The injector is designed with a varying thickness along its axis, an elliptical cross-section, and a tapered shape to minimize deposition and stress, using materials with matching thermal expansion coefficients to the deposited film, and incorporating a gas exhaust system to manage pressure and flow.

Benefits of technology

Reduces deposition-related clogging and stress, extending injector life and ensuring uniform gas distribution, thereby enhancing processing efficiency and reducing downtime.

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Abstract

The present invention provides an injector configured for placement in a reaction chamber of a substrate processing apparatus for injecting gas into the reaction chamber.SOLUTION: The injector may be elongated along a first axis and may be configured with an internal gas-conducting channel extending along the first axis and provided with at least one gas inlet opening and at least one gas outlet opening. The injector may have a width extending along a second axis perpendicular to the first axis that is substantially greater than a depth of the injector extending along a third axis perpendicular to the first axis and the second axis. The wall of the injector may have a varying thickness.SELECTED DRAWING: Figure 3
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