Slit device and transmission type small-angle scattering device

Abstract

To provide a slit device capable of accurately irradiating a fine region set at an inspection point of a sample with X-rays.SOLUTION: A slit member 51 in which a slit is formed can be moved by a slit moving mechanism 60. By moving the slit member 51 by a slit moving mechanism 60, the slit is arranged at a position near the inspection area of the sample held by the sample holding part. When the sample is replaced, the slit member 51 is retracted from the position near the inspection area of the sample.SELECTED DRAWING: Figure 3

Description

[Technical Field]

[0001] This invention relates to a slit device used to limit the cross-sectional area of ​​X-rays irradiated onto a sample, and in particular to a slit device suitable for transmission small-angle X-ray scattering (T-SAXS). [Background technology]

[0002] In recent years, semiconductor devices have become increasingly dense, multi-layered, and have more complex circuit patterns in order to improve performance. In particular, in three-dimensional NAND flash memory (3D-NAND), the number of layers has increased in line with the increase in capacity density, resulting in structures with large aspect ratio pillars (diameter: tens to hundreds of nm, height: several μm) and trenches (deep grooves). In view of the circumstances in the semiconductor manufacturing field, the present applicant has previously proposed a transmission-type small-angle scattering instrument that can non-destructively and efficiently measure the minute shapes of semiconductor devices with complex structures at the manufacturing process site (see Patent Document 1).

[0003] The transmission small-angle scattering device disclosed in Patent Document 1 irradiates a sample (i.e., a semiconductor wafer with an integrated circuit pattern formed on its surface) placed in a sample holder with X-rays from an X-ray irradiation unit installed below the sample. The scattered X-rays generated around the X-rays that have passed through the sample are detected by a two-dimensional X-ray detector installed above the sample. The reference numerals in parentheses are the reference numerals assigned to the respective components in the drawings of Patent Document 1.

[0004] In order to use such a transmission small-angle scattering device to inspect with high precision the fine shapes of the integrated circuit patterns formed on the surfaces of semiconductor wafers that are manufactured one after another at the manufacturing process site, it is preferable to narrow the cross-sectional area of ​​the X-rays and accurately irradiate the X-rays onto the fine area (inspection area) set at the inspection point on the sample without straying beyond the inspection area. Therefore, there was a need to develop a slit device that could place a slit close to the inspection area of ​​the sample, limit the cross-sectional area of ​​the X-rays emitted from the X-ray irradiation unit through the slit, and accurately irradiate the inspection area. [Prior art documents] [Patent documents]

[0005] [Patent Document 1] International Publication No. 2020 / 194986 Summary of the Invention [Problem to be solved by the invention]

[0006] The present invention has been made in view of the above circumstances, and has as its object to provide a slit device that can accurately irradiate X-rays onto a minute area set as an inspection point on a sample. [Means for solving the problem]

[0007] In order to achieve the above object, the present invention relates to a transmission type small-angle scattering device comprising a sample holder for holding a sample, an X-ray irradiation unit for irradiating X-rays, and a two-dimensional X-ray detector, wherein a sample placed on the sample holder is irradiated from below with X-rays emitted from the X-ray irradiation unit, and the two-dimensional X-ray detector detects scattered X-rays generated around the X-rays that have transmitted through the sample at a position above the sample. The present invention is characterized by comprising: a slit device to be incorporated into the transmission type small-angle scattering device, the slit member including a slit piece formed with a slit that allows a portion of the X-rays to pass, and an X-ray guide cylinder that is open at both ends, with the slit piece attached to one opening and that allows X-rays to be incident on a hollow space from the other opening and guided to the slit; and a slit movement mechanism that supports the slit member and moves the slit member to position the slit at a position near an inspection region of the sample held in the sample holder, and that moves the slit member to retract it from the position near the inspection region.

[0008] Furthermore, the present invention can also be configured as follows, if necessary. The slit member has an intermediate slit piece provided in the hollow portion of the X-ray guide cylinder, and the intermediate slit piece has an intermediate slit formed therein that allows a portion of the X-rays to pass through.

[0009] The apparatus is configured to include a plurality of slit members having different slit dimensions and shapes, and the slit moving mechanism moves one of the plurality of slit members to position the slit attached to that slit member near the inspection area of ​​the sample held in the sample holding section.

[0010] The configuration includes an inclination correction unit that aligns the direction of the central axis of the slit member with the direction of the optical axis of the X-rays emitted from the X-ray irradiation unit.

[0011] The tilt correction unit is configured to include a tilt measuring instrument that irradiates a surface of the slit piece with laser light and calculates the tilt of the direction of the central axis of the slit member relative to the direction of the optical axis of the X-ray emitted from the X-ray irradiation unit based on the reflection angle of the laser light reflected from the surface of the slit piece.

[0012] The tilt correction unit is configured to measure the intensity of the X-rays that are emitted from the X-ray irradiation unit, pass through the hollow portion of the slit member, and enter the two-dimensional X-ray detector, and correct the tilt of the slit member so that the intensity of the X-rays is maximized.

[0013] Furthermore, a transmission small-angle scattering instrument according to the present invention comprises a sample holder for holding a sample, an X-ray irradiation unit for irradiating X-rays, a two-dimensional X-ray detector, and a slit device having the above-described configuration, wherein a sample placed on the sample holder is irradiated from below with X-rays that have been emitted from the X-ray irradiation unit and passed through the slit, and the two-dimensional X-ray detector detects scattered X-rays generated around the X-rays that have passed through the sample at a position above the sample. [Effects of the Invention]

[0014] According to the slit device of the present invention, the slit member can be moved and adjusted using a slit moving mechanism, and the slit can be accurately positioned in a close position opposite a microscopic area (inspection area) set at the inspection point of the sample, so that X-rays whose cross-sectional area has been narrowed by the slit can be accurately irradiated onto the inspection area of ​​the sample.

[0015] Furthermore, when replacing the sample, the slit movement mechanism can be used to move the slit placed close to the sample away from the sample and retract the slit member to a position where it does not interfere with the surrounding operating parts of the transmission type small-angle scattering device. [Brief explanation of the drawings]

[0016] [Figure 1] 1A is a side view of a transmission type small-angle scattering device according to an embodiment of the present invention, and FIG. 1B is a front view of the same device. [Figure 2] FIG. 2 is a diagram schematically showing an optical system configured between an X-ray irradiation unit and a two-dimensional X-ray detector. [Figure 3] 1(a) and 1(b) are perspective views of the external configuration of a slit device according to an embodiment of the present invention, viewed from different angles. [Figure 4] 1A is an exploded perspective view of a slit member, FIG. 1B is a perspective view of the slit member, and FIG. 1C is an enlarged perspective view of a slit piece. [Figure 5] FIG. 1A is a front view showing an example of the configuration of the tilt correction unit, and FIG. 1B is a diagram showing a schematic diagram of another example of the configuration of the tilt correction unit. [Figure 6] FIG. 10 is a front cross-sectional view showing another example of the configuration of the slit member. DETAILED DESCRIPTION OF THE INVENTION

[0017] Hereinafter, an embodiment of the present invention will be described in detail with reference to the drawings. [Outline of transmission type small angle scattering instrument] First, an overview of a transmission type small-angle scattering device according to an embodiment of the present invention will be described. When an X-ray beam is irradiated onto a sample, the X-rays scatter in a small angle region (small-angle region) near the direction of travel of the X-ray beam. This scattering is called small-angle scattering, and measuring it can reveal information about the particle size and periodic structure of a material. Furthermore, in recent years, analytical methods have been developed that use small-angle scattering measurements to obtain various information about the thin films that make up semiconductor devices. The device used to measure this small-angle scattering is called a small-angle scattering device.

[0018] There are two types of small-angle scattering instruments: reflection type, which irradiates the surface of a sample with X-rays and detects the scattered X-rays reflected from the surface, and transmission type, which irradiates the backside of a sample with X-rays and detects the scattered X-rays emitted from the surface.

[0019] The present invention is a transmission-type small-angle scattering instrument. This transmission-type small-angle scattering instrument has a basic structure in which an X-ray source and a two-dimensional X-ray detector are arranged opposite each other with a sample in between, X-rays from the X-ray source are irradiated onto the back surface of the sample, and scattered X-rays emitted at a specific angle from the front surface of the sample are detected by the two-dimensional X-ray detector.

[0020] Conventional small-angle scattering instruments have a horizontal structure in which the X-ray source and two-dimensional X-ray detector are arranged horizontally, requiring a large installation area. In contrast, the transmission small-angle scattering device according to this embodiment has a vertical structure in which the X-ray source and the two-dimensional X-ray detector are arranged vertically so that it can be installed on the limited floor area of ​​a clean room in which a semiconductor production line is constructed.

[0021] FIG. 1A is a side view showing a schematic diagram of the overall structure of a transmission type small-angle scattering device according to an embodiment of the present invention, and FIG. 1B is a front view of the same.

[0022] The transmission small-angle scattering instrument according to this embodiment is equipped with a goniometer 10. The goniometer 10 has the function of rotating a rotary arm 11 around a θ axis extending horizontally. An X-ray irradiation unit 20 and a two-dimensional X-ray detector 30 are mounted on both ends of the rotary arm 11. Here, the rotary arm 11 has its origin in a vertically arranged state. The X-ray irradiation unit 20 is mounted on the lower end, and the two-dimensional X-ray detector 30 is mounted on the upper end. Such a vertical arrangement structure allows the instrument to be installed on a relatively small floor area.

[0023] The X-ray irradiation unit 20 and the two-dimensional X-ray detector 30 are arranged opposite each other with a sample stage 40 in between, and the X-ray irradiation unit 20 irradiates X-rays from below onto the sample S supported by the sample holder 42 of the sample stage 40. The two-dimensional X-ray detector 30 is configured to detect scattered X-rays generated in a small angle region around the X-rays transmitted from the sample S.

[0024] As shown in Figures 1A and 1B, the sample stage 40 has a cavity 43 formed therein that allows the X-rays emitted from the X-ray irradiation unit 20 to pass through, and the X-rays are irradiated onto the back surface of the sample S through this cavity 43.

[0025] Furthermore, a slit device including a slit member 51 as a component is installed below the sample stage 40. The slit member 51 is provided below the sample placed in the sample holder and on the optical axis of the X-rays emitted from the X-ray irradiation unit 20. Details of the slit device will be described later.

[0026] A cylindrical vacuum path 32 is mounted on the rotary arm 11 of the goniometer 10. This vacuum path 32 has the function of eliminating air scattering that occurs when X-rays that have passed through the sample S collide with air, thereby improving the measurement accuracy of small-angle scattering.

[0027] The sample stage 40 is equipped with a sample positioning mechanism (not shown) that moves the sample holder 42 in the forward / backward direction (Y direction) and the lateral direction (X direction) parallel to the horizontal plane, and in the up / down direction (Z direction) perpendicular to the horizontal plane, thereby positioning the inspection point of the sample S at the measurement position P of the transmission small-angle scattering device.

[0028] The sample positioning mechanism (not shown) has the function of rotating the sample S supported by the sample holder 42 in-plane (φ rotation) and the function of swinging it around the χ axis (χ swing). The χ axis is an axis that intersects at a right angle with the θ axis of the goniometer 10 in the horizontal plane, and the intersection of the θ axis and the χ axis is positioned to coincide with the measurement position P of the transmission small-angle scattering device.

[0029] The sample stage 40 is supported by a frame 41. The relative positions of the frame 41 and the rotary arm 11 of the goniometer 10 are adjusted so that they do not interfere with each other.

[0030] The transmission small-angle scattering instrument according to this embodiment also includes an optical microscope 35 for observing the surface of the sample S. The optical microscope 35 is installed in a position where it does not interfere with the surrounding components, such as the components driven by the sample positioning mechanism, the X-ray irradiation unit 20 rotated by the goniometer 10, and the two-dimensional X-ray detector 30. The sample S can be moved to a position below the optical microscope 35 by a sample positioning mechanism (not shown).

[0031] [X-ray optical system] Next, with reference to FIG. 2, an outline of the X-ray optical system configured between the X-ray irradiation unit and the two-dimensional X-ray detector will be described. The X-ray irradiation unit 20 includes, as its components, an X-ray tube 21, a collecting mirror 22, and an aperture 23. As described above, a slit member 51 is provided below the sample S placed in the sample holder 42 and on the optical axis of the X-rays emitted from the X-ray irradiation unit 20.

[0032] An X-ray tube with an electron beam focal spot size on the target of 70 μm or less, preferably 40 μm or less, is used as the X-ray tube 21. Target materials can be selected from copper (Cu), molybdenum (Mo), silver (Ag), gold (Au), etc., but in the case of a transmission type, high-energy X-rays that can penetrate the Si wafer substrate are required, so it is desirable to use molybdenum (Mo) or silver (Ag) that make this possible.

[0033] A side-by-side type collector mirror 22, in which two multilayer mirrors with multilayer films formed on their surfaces are arranged in an L-shape and integrated, can be used as the collector mirror 22. Alternatively, a Kirkpatrick-Baez type collector mirror, in which two multilayer mirrors are arranged independently, may also be used. The focusing mirror 22 is adjusted to focus on the detection surface of the two-dimensional X-ray detector 30, and has the function of focusing the X-rays into a rectangular spot of 100 μm or less in length and width, preferably 50 μm or less, at the focus.

[0034] The aperture 23 has a function of blocking leakage light of X-rays emitted from the X-ray tube 21 that pass through the outside without entering the condenser mirror 22. The X-rays emitted from the X-ray tube 21 are blocked by the aperture 23 to be leaked, and then are monochromatized and focused by the condenser mirror 22.

[0035] The X-rays emitted from the X-ray tube 21 are blocked by the aperture 23 to prevent leakage light, and then enter the collecting mirror 22. The X-rays are monochromatized and converged by the collecting mirror 22, and pass through a slit formed in the slit member 51, thereby narrowing the cross-sectional area, and are then irradiated onto an inspection region of a very small area set on the surface of the sample S.

[0036] Next, the X-rays that have passed through the sample S and the scattered X-rays generated in the small-angle region around it pass through the vacuum path 32 shown in Figure 1(a) and travel towards the two-dimensional X-ray detector 30. Of these, the X-rays that have passed through the sample S from the X-ray irradiation unit 20 and travelled straight ahead are blocked by a direct beam stopper 31 provided in front of the two-dimensional X-ray detector 30. As a result, only the scattered X-rays generated in the small-angle region of the X-rays are incident on the two-dimensional X-ray detector 30.

[0037] Here, the distance L1 from the focal point of the X-ray tube 21 to the sample S affects the focusing area of ​​the X-rays irradiated onto the sample S. That is, the longer the distance L1, the smaller the focusing area of ​​the X-rays irradiated onto the sample S. Also, in a transmission small-angle scattering device, the distance L2 from the sample S to the two-dimensional X-ray detector 30 is called the camera length, and this camera length L2 affects the angular resolution of the two-dimensional X-ray detector 30. That is, the longer the camera length L2, the better the angular resolution.

[0038] However, in a transmission-type small-angle scattering instrument arranged vertically as in this embodiment, there is a limit to how long the distance L1 and camera length L2 can be secured, so it is preferable to determine these dimensions appropriately by comprehensively taking into consideration the environment of the site where the instrument is installed, the focused area of ​​X-rays on the sample S, and the angular resolution.

[0039] The rotating arm 11 is composed of multiple arm members, and the camera length L2 can be set arbitrarily by sliding these arm members in the lengthwise direction. Note that the rotating arm 11 may be provided with a position adjustment mechanism for moving the X-ray irradiation unit 20 in the X-ray optical axis direction to arbitrarily change the distance L1. Furthermore, the rotating arm 11 may be configured to be equipped with a position adjustment mechanism for moving the two-dimensional X-ray detector 30 in the X-ray optical axis direction to arbitrarily change the camera length L2.

[0040] [Slitting device] Next, the slitting device will be described in detail with reference to FIGS. The slit device 50 includes a plurality of slit members 51 (four in the figure), a slit moving mechanism 60, and an inclination correction unit 80.

[0041] As shown in FIGS. 3(a) and 3(b), the slit movement mechanism 60 is made up of an X movement mechanism, a Y movement mechanism, and a Z movement mechanism. The X movement mechanism and Y movement mechanism have the function of moving horizontal movement platform 62 in two orthogonal directions (X direction and Y direction) on a horizontal plane. Specifically, the X movement mechanism is mounted on base 61, and is configured so that X slider 67 moves on X guide rails 65 extending in the X direction by the driving force of X drive motor 66. The Y movement mechanism is mounted on the upper surface of X slider 67, and is configured so that Y slider 71 moves on Y guide rails 69 extending in the Y direction by the driving force of Y drive motor 70.

[0042] The Z movement mechanism is mounted on a Y slider 71, and is configured such that a Z slider 75 moves by the driving force of a Z drive motor 74 along a Z guide rail 73 extending in the vertical direction (Z direction). A support base 63 is fixed to the Z slider 75, and a plurality of slit members 51 are bundled and mounted on this support base 63. Each slit member 51 is arranged so that its central axis extends in the vertical direction (Z direction).

[0043] 4(a) and 4(b), the slit member 51 is composed of a rod-shaped X-ray guide cylinder 52 with both ends open, and a slit piece 53. The X-ray guide cylinder 52 is made of a highly rigid metal such as stainless steel, and as shown in FIG. 4(b), the slit piece 53 is fixed to the opening at one end of the X-ray guide cylinder 52.

[0044] As shown in FIG. 4(c), the slit piece 53 is made of a small plate-like piece, and a slit 53a is formed in the center thereof, penetrating from the rear surface to the front surface. The slit piece 53 is preferably made of a material (e.g., tantalum) that is difficult for X-rays to transmit through. The slit 53a is manufactured to match the area of ​​a minute region (inspection region) set at an inspection point of the sample S (e.g., a semiconductor wafer) and the surface shape of the minute region (e.g., the pattern shape of an integrated circuit). In other words, the opening shape and opening area of ​​the slit 53a are adjusted so that the X-rays, which have passed through the slit 53a and have a reduced cross-sectional area, are accurately irradiated onto the inspection region without escaping from the inspection region. This makes it possible to detect scattered X-rays generated from the inspection area with high accuracy, and to obtain a measured waveform of scattered X-rays with little noise.

[0045] 3(a) and 3(b), in this embodiment, a plurality of slit members 51 are mounted on a support base 63 of a slit moving mechanism 60. The slit pieces 53 attached to the plurality of slit members 51 each have a slit 53a formed therein to fit the inspection area of ​​each sample S in order to accommodate a plurality of samples S having different areas and surface shapes of the inspection area.

[0046] The above-mentioned slit device 50 is installed below the sample holder 42 shown in Figures 1(a) and (b), selects a slit member 51 having a slit 53a formed therein that fits the inspection area of ​​the sample S, and by driving it in the XY directions using the slit moving mechanism 60, positions the X-ray guide cylinder 52 that constitutes the selected slit member 51 so that its central axis coincides with the optical axis of the X-rays emitted from the X-ray irradiation unit 20.

[0047] Next, the slit moving mechanism 60 is driven in the XY directions to position the surface of the slit piece 53 attached to the slit member 51 at a position near the inspection area of ​​the sample S held in the sample holding section (specifically, a position close to the back surface of the inspection area of ​​the sample S).

[0048] The X-rays emitted from the X-ray irradiation unit 20 pass through the hollow part of the X-ray guide cylinder 52, have their cross-sectional area narrowed by the slit 53a, and are accurately irradiated onto an inspection area set on the sample S. This makes it possible to realize high-precision inspection of the sample S using a transmission-type small-angle scattering device.

[0049] As described above, the switching of the slit member 51 according to the inspection area of ​​the sample S can be automatically performed by driving the slit moving mechanism 60, so that the efficiency of the inspection work is improved significantly.

[0050] Furthermore, when replacing the sample S, the slit 53a disposed near the inspection area of ​​the sample S is retracted by the slit movement mechanism 60. During the sample S replacement operation, the sample stage 40 may be driven to move the sample holder 42. In this case, if the slit 53a remains disposed near the inspection area of ​​the sample S, there is a risk that it may interfere with the operating parts of the transmission small-angle scattering device (specifically, components such as the sample holder 42 and the sample stage 40 that moves it). Therefore, by retracting the slit 53a from the position near the inspection area of ​​the sample S, damage to the slit member 51, etc. can be avoided, and stable operation of the transmission small-angle scattering device can be ensured without stopping.

[0051] Next, the slit device 50 of this embodiment is equipped with an inclination correction unit 80 that aligns the direction of the central axis of the slit member 51 (specifically, the X-ray guide cylinder 52) with the direction of the optical axis of the X-rays emitted from the X-ray irradiation unit 20. FIG. 5(a) is a diagram showing an example of the configuration of the tilt correction unit 80 incorporated in the slit device 50 of this embodiment.

[0052] 5(a), a tilt correction unit 80 is provided with a two-dimensional X-ray detector 30 and a laser tilt measurement device 81 arranged side by side on the rotating arm 11 of a goniometer 10. The two-dimensional X-ray detector 30 and the laser tilt measurement device 81 are mounted on a moving table 82 that moves laterally. The movable table 82 can be moved laterally by the driving force of a drive motor (not shown), so that either the laser tilt measuring device 81 or the two-dimensional X-ray detector 30 can be positioned opposite the surface of the slit piece 53 of the slit member 51, which is positioned on the optical axis of the X-rays emitted from the X-ray irradiation unit 20.

[0053] The laser tilt measuring device 81 includes a laser light source 83 and a laser detector 84, and has the function of measuring the tilt of the central axis of the slit member 51 relative to the optical axis of the X-ray by irradiating the surface of the slit piece 53 of the slit member 51 arranged on the optical axis of the X-ray with laser light from the laser light source 83 and detecting the laser light reflected from the surface with the laser detector 84.

[0054] The correlation between the inclination of the surface of the slit piece 53 and the inclination of the central axis of the slit member 51 relative to the optical axis of the X-ray is measured in advance, and based on this correlation, the inclination of the central axis of the slit member 51 relative to the optical axis of the X-ray can be calculated from the measurement results by the laser inclination measuring device 81.

[0055] As shown in Figures 3(a) and (b), the slit device 50 has a built-in tilt correction mechanism 90, and based on the tilt of the central axis of the slit member 51 relative to the optical axis of the X-rays calculated from the measurement results by the laser tilt measurement device 81, the tilt correction mechanism 90 can be driven to align the direction of the central axis of the slit member 51 with the direction of the optical axis of the X-rays emitted from the X-ray irradiation unit 20.

[0056] The tilt correction mechanism 90 has a function of swinging the base 61 of the slit movement mechanism 60 to correct the tilt of the slit member 51 mounted on the support base 63. For example, the base 61 can be swung by independently raising and lowering the multiple support columns 91 that support the base 61. Other known swing mechanisms can also be applied to the tilt correction mechanism 90.

[0057] FIG. 5(b) is a diagram showing another example of the configuration of the tilt correction unit 80 incorporated in the slitting device 50 of this embodiment. The tilt correction unit 80 shown in the same figure is configured to allow the X-rays (direct beam) emitted from the X-ray irradiation unit 20 to enter the two-dimensional X-ray detector 30 through the hollow part of the slit member 51 arranged on the optical axis of the X-rays, and to correct the tilt of the slit member 51 so that the intensity of the X-rays detected by the two-dimensional X-ray detector 30 is maximized.

[0058] That is, when there is an inclination in the direction of the central axis of the slit member 51 with respect to the optical axis of the X-rays emitted from the X-ray irradiation unit 20, the X-rays that can pass through the slit 53a are narrower than in normal times when there is no inclination. As a result, the intensity of the X-rays detected by the two-dimensional X-ray detector 30 decreases. Therefore, by correcting the inclination of the slit member 51 so that the intensity of the X-rays (direct beam) incident on the two-dimensional X-ray detector 30 is maximized, the inclination in the direction of the central axis of the slit member 51 can be aligned with the direction of the optical axis of the X-rays emitted from the X-ray irradiation unit 20. The inclination of the slit member 51 can be corrected by an inclination correction mechanism 90 shown in FIGS. 3(a) and 3(b).

[0059] The tilt correction unit 80 shown in Figure 5(b) can be constructed using the X-ray irradiation unit 20 and two-dimensional X-ray detector 30 provided in the transmission small-angle scattering device, which has the economical advantage of eliminating the need to add new components.

[0060] The present invention is not limited to the above-described embodiment, and it goes without saying that various modifications and applications are possible as required. For example, the number of slit members 51 mounted on the slit moving mechanism 60 is not limited to four, and may be one, two, three, five or more.

[0061] Also, a slit member 51 can be configured as shown in Fig. 6. The slit member 51 shown in the figure has an intermediate slit piece 54 provided in the hollow part of an X-ray guide cylinder 52. The intermediate slit piece 54 has an intermediate slit 54a formed therein for gradually narrowing the cross-sectional area of ​​the X-rays passing through it.

[0062] The X-rays emitted from the X-ray irradiation unit 20 and passing through the hollow portion of the slit member 51 first have their cross-sectional area narrowed by the intermediate slit 54a of the intermediate slit piece 54, and then their cross-sectional area is further adjusted by the slit 53a of the slit piece 53 provided at the tip opening of the X-ray guide cylinder 52 before being irradiated onto the sample S. This reduces the background caused by scattered light generated around the X-rays, making it possible to improve measurement accuracy and throughput.

[0063] 5(a) 。 For example, the laser tilt measuring device 81 may be disposed so as to wait in the vicinity of the sample holder 42, and when measuring the tilt, the laser tilt measuring device 81 may be moved to a position directly above the slit member 51 and positioned opposite the surface of the slit piece 53 of the slit member 51. [Explanation of symbols]

[0064] S: sample, P: measurement position, 10: goniometer, 11: rotating arm, 20: X-ray irradiation unit, 21: X-ray tube, 22: focusing mirror, 23: aperture, 30: two-dimensional X-ray detector, 31: direct beam stopper, 32: vacuum path, 35: Optical microscope 40: sample stage, 41: frame, 42: sample holder, 43: cavity, 50: slit device, 51: slit member, 52: X-ray guide tube, 53: slit piece, 53a: slit, 54: intermediate slit piece, 54a: intermediate slit, 60: slit movement mechanism, 61: base, 62: horizontal movement table, 63: support table, 65: X guide rail, 66: X drive motor, 67: X slider, 69: Y guide rail, 70: Y drive motor, 71: Y slider, 73: Z guide rail, 74: Z drive motor, 75: Z slider, 80: tilt correction unit, 81: laser tilt measuring device, 82: moving table, 83: laser light source, 84: laser detector, 90: Tilt correction mechanism, 91: Support

Claims

1. A slit device incorporated into a transmission type small-angle scattering device, the transmission type small-angle scattering device comprising: a sample holder for holding a sample; an X-ray irradiation unit for irradiating X-rays; and a two-dimensional X-ray detector, wherein the sample placed on the sample holder is irradiated from below with X-rays emitted from the X-ray irradiation unit, and the two-dimensional X-ray detector detects scattered X-rays generated around the X-rays that have passed through the sample at a position above the sample, a slit member including a slit piece formed with a slit for passing a part of the X-rays, and an X-ray guide tube having openings at both ends, the slit piece being attached to the opening at one end, and allowing X-rays to be incident into a hollow portion from the opening at the other end and guided to the slit; a slit moving mechanism that supports the slit member, moves the slit member to position the slit at a position near an inspection area of ​​the sample held in the sample holding unit, and moves the slit member to retract it from the position near the inspection area; A slit device comprising:

2. The slit member has an intermediate slit piece provided in a hollow portion of the X-ray guide cylinder, 2. The slit device according to claim 1, wherein the intermediate slit piece is formed with an intermediate slit that allows a portion of the X-rays to pass therethrough.

3. A plurality of slit members having different slit sizes and shapes are provided, The slit device according to claim 1, characterized in that the slit moving mechanism moves one of the plurality of slit members to position the slit attached to that slit member at a position near the inspection area of ​​the sample held in the sample holding section.

4. 2. The slit device according to claim 1, further comprising an inclination correction unit that aligns the direction of the central axis of the slit member with the direction of the optical axis of the X-ray emitted from the X-ray irradiation unit.

5. The slit device according to claim 4, characterized in that the tilt correction unit includes a tilt measuring instrument that calculates the tilt of the direction of the central axis of the slit member relative to the direction of the optical axis of the X-ray emitted from the X-ray irradiation unit based on the reflection angle of the laser light reflected from the surface of the slit piece by irradiating the surface of the slit piece with laser light.

6. The slit device according to claim 4, characterized in that the tilt correction unit is configured to measure the intensity of X-rays emitted from the X-ray irradiation unit, pass through the hollow portion of the slit member, and enter the two-dimensional X-ray detector, and correct the tilt of the slit member so that the intensity of the X-rays is maximized.

7. A sample holder that holds a sample, an X-ray irradiation unit that irradiates X-rays, a two-dimensional X-ray detector, and the slit device according to any one of claims 1 to 6, a transmission type small-angle scattering device configured such that a sample placed on the sample holder is irradiated from below with X-rays that have been emitted from the X-ray irradiation unit and passed through the slit, and the two-dimensional X-ray detector detects scattered X-rays generated around the X-rays that have passed through the sample at a position above the sample.

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