Substrate processing equipment
The substrate processing apparatus addresses the challenge of maintaining the charged state of substrates by using a charging unit outside the processing chamber and insulating transfers, ensuring efficient and uniform charging for improved processing outcomes.
JP2026048265APending Publication Date: 2026-03-17SCREEN HOLDINGS CO LTD
Patent Information
- Authority / Receiving Office
- JP · JP
- Patent Type
- Applications
- Current Assignee / Owner
- Filing Date
- 2024-09-05
- Publication Date
- 2026-03-17
Smart Images
Figure 2026048265000001_ABST
Abstract
This technology provides a method for properly processing a substrate while simultaneously charging it. [Solution] The substrate processing apparatus comprises a processing unit 30, a charging unit 20, and a transport unit 40. The processing unit 30 includes a processing chamber 31 and performs processing on the first main surface Wa of the substrate W within the processing chamber 31. The charging unit 20 is provided outside the processing chamber 31 and includes a substrate placement section 22 that supports or holds the substrate W, and a charger that charges the first main surface Wa of the substrate W placed on the substrate placement section 22. The transport unit 40 has an insulating contact section that contacts the substrate W, and transports the substrate W between the charging unit 20 and the processing unit 30 while the contact section supports or holds the substrate W.
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Citation Information
Patent Citations
Substrate processing apparatus
JP2018029130A