Support for continuous strips produced during heated chamfering of a glass substrate, related method, and glass substrate produced therefrom.

Abstract

A support for a continuous strip formed during chamfering of a glass substrate located on a jig includes one or more platform structures positioned adjacent to the jig and configured to reduce vibrations of the continuous strip as it grows during chamfering of the glass substrate. The one or more platform structures are further configured to maintain the angle that the continuous strip forms with the glass substrate during chamfering.

Description

[Technical Field]

[0001] Cross-reference of related applications This application claims the benefit of priority under Section 119 of U.S. Patent Act, of U.S. Provisional Application No. 63 / 458,982, filed on 13 April 2023, the contents of which are incorporated herein by reference in their entirety.

[0002] This disclosure relates, in general, to an apparatus for heating and chamfering glass substrates, and more specifically, to a support for a continuous strip produced during heating and chamfering, which reduces defects in the chamfered edge. [Background technology]

[0003] Edge defects in glass substrates are a common cause of damage to the glass substrate and therefore reduce its reliability. Specifically, flexible devices containing thin glass substrates benefit from good edge quality for reliable bending performance. In such flexible devices, the elimination of edge defects is desirable. Edge finishing can be performed to improve the edge strength of the glass substrate. Among such edge finishing techniques, heated chamfering is a relatively new technique that is advantageous because it does not create particles and is suitable for use with thin glass substrates. Nevertheless, heated chamfering creates a continuous strip of glass that peels off from the glass substrate, and this continuous strip is subject to vibration, which can lead to a decrease in edge quality. [Overview of the Initiative]

[0004] In one embodiment, an embodiment of the present disclosure relates to a support for a continuous strip formed during chamfering of a glass substrate located on a jig. The support includes one or more platform structures positioned adjacent to the jig and configured to reduce vibration of the continuous strip as the continuous strip grows during chamfering of the glass substrate.

[0005] In another embodiment, embodiments of the present disclosure relate to a method for chamfering the edges of a glass substrate. In this method, a tool is moved around the edges of the glass substrate to remove the glass material in a continuous strip. Furthermore, the continuous strip is supported on a platform structure to reduce vibration of the continuous strip during the removal of the glass material from the glass substrate.

[0006] In yet another embodiment, embodiments of the present disclosure relate to a glass substrate. The glass substrate includes a glass body having a first main surface, a second main surface opposite the first main surface, and a heated chamfered edge extending at least partially around the glass body between the first main surface and the second main surface. On the glass substrate, the maximum peak versus trough surface roughness R of the heated chamfered edge z It is 10.0 μm or less.

[0007] Additional features and advantages are described in the following detailed description, some of which will be readily apparent to those skilled in the art from that description, or will be recognized by practicing the embodiments described herein, including the following detailed description, claims, and accompanying drawings.

[0008] It should be understood that both the general description above and the following embodiments for carrying out the invention are illustrative only and are intended to provide an overview or framework for understanding the nature and features of the claims.

[0009] The attached drawings are included to provide further understanding and are incorporated herein, forming part thereof. The drawings illustrate one or more embodiments and, together with the description, help to illustrate the principles and operation of various embodiments. [Brief explanation of the drawing]

[0010] [Figure 1] A top view of a glass substrate equipped with a heated chamfering tool moving around the periphery of the glass substrate is depicted according to an exemplary embodiment. [Figure 2]Depict a side view of a glass substrate and a heat chamfering tool shown in FIG. 1 according to an exemplary embodiment. [Figure 3] Depict an exploded side view of an apparatus for supporting a glass substrate during heat chamfering according to an exemplary embodiment. [Figure 4] Depict a top view of the apparatus shown in FIG. 3 according to an exemplary embodiment. [Figure 5] Depict the stages of progression of a continuous strip during heat chamfering according to an exemplary embodiment. [Figure 6] Depict a top view of a support for a continuous strip advanced during heat chamfering according to a first exemplary embodiment. [Figure 7] Depict a side view of the support shown in FIG. 6 according to an exemplary embodiment. [Figure 8] Depict a top view of another support for a continuous strip advanced during heat chamfering according to a second exemplary embodiment. [Figure 9] Depict a side view of the support shown in FIG. 8 according to an exemplary embodiment. [Figure 10] Depict the arches of the support shown in FIGS. 8 and 9 according to an exemplary embodiment. [Figure 11] Depict a top view of yet another support for a continuous strip advanced during heat chamfering according to a third exemplary embodiment. [Figure 12] Depict the arch of the support shown in FIG. 11 that moves independently according to an exemplary embodiment. [Figure 13] Depict an arch having proximity or distance sensors according to an exemplary embodiment. <00_{}00093>Depict a micrograph of a chamfered edge of a glass substrate produced using a support for a continuous strip according to the present disclosure. [Figure 15] A micrograph of hackle marks on a chamfered edge of a glass substrate, which can be produced when the glass strip is not supported during chamfering. [Figure 16]This is a micrograph of the unevenness on the beveled edge of a glass substrate, which can occur when the glass strip is not supported during beveling. [Modes for carrying out the invention]

[0011] Embodiments of the present disclosure relate to supports for continuous glass strips produced during a heated chamfering process of a glass substrate, and glass substrates produced using the same. As will be described in more detail below, the supports improve quality and reduce defects in the chamfered edges by reducing vibration and providing stable tension between the continuous strip and the glass substrate. In embodiments, the supports include one or more rails that spiral around a jig, configured to hold the glass substrate during heated chamfering. The height of the rails decreases as they spiral around the jig to maintain the angle and tension of the continuous strip with respect to the glass substrate. In other embodiments, the supports include one or more arches on a movable base that moves around the jig during heated chamfering. In yet another embodiment, each arch is provided on its own movable base, moving independently of the other movable bases. In this way, the continuous strip is supported as it grows substantially during heated chamfering, regardless of how the continuous strip progresses. These and other embodiments of supports for continuous glass strips, as well as their advantages, a method of heated chamfering glass using the same, and glass substrates produced thereon will be described in more detail below, in reference to the accompanying drawings. These exemplary embodiments are provided as examples only and not as limitations.

[0012] Figure 1 schematically depicts a glass substrate 100 undergoing a heated chamfering process according to one embodiment of the present disclosure. Heated chamfering involves applying thermal shock to the edge 102 of the glass substrate 100. In one or more embodiments, thermal shock is induced by bringing the edge 102 of the glass substrate 100 at room temperature into contact with a chamfering tool 104. The temperature difference between the glass substrate 100 and the chamfering tool 104 causes the edge 102 of the glass substrate 100 to heat rapidly compared to the interior of the glass substrate 100, causing a strip of glass 106 to break and separate from the glass substrate 100. As the chamfering tool 104 moves around the edge 102 of the glass substrate 100 and applies substantially constant pressure in contact with the edge 102 of the glass substrate 100, the strip 106 continues to separate from the glass substrate 100 and expands to form a continuous strip 106. In one or more embodiments, the glass substrate 100 is moved relative to a stationary chamfering tool 104, and in one or more other embodiments, the chamfering tool 104 is moved relative to a stationary glass substrate 100.

[0013] In one or more embodiments, heated chamfering can be applied to any of the various glass materials of the glass substrate 100. In one or more embodiments, the glass substrate 100 is a glass body formed from, among many, borosilicate glass, aluminosilicate glass, or boroaluminosilicate glass. Commercially available glass suitable for use in embodiments of this disclosure is sold under the names Eagle XG®, LOTUS®, Gorilla®, Iris®, Astra®, and Victus®, and is available from Corning Incorporated, Corning, NY, respectively.

[0014] In one or more embodiments, the edges 102 of the substrate 100 define the shape of the glass substrate 100. In one or more embodiments, the glass substrate 100 has a shape such as a rectangle, polygon, circle, or ellipse, among many others. In one or more embodiments, the glass substrate 100 has a thickness that is thinner than either its short length or its long length. In one or more other embodiments, the glass substrate 100 has a thickness that is greater than either or both of its short length or its long length.

[0015] In the embodiment shown in Figure 1, the glass substrate 100 has a rounded rectangular shape defined by a first main surface 108. The first main surface 108 has a first length L1 and a second length L2. The first length L1 is the longest length across the glass substrate 102, and the second length L2 is perpendicular to the first length L1. In one or more embodiments, the glass substrate 100 has a first length L1 of 30 mm to 500 mm. In one or more embodiments, the glass substrate 100 has a second length L2 of 30 mm to 200 mm.

[0016] During chamfering, the strip 106 is peeled off from the glass substrate 100 without creating any particles. By removing the thin strip 106 from the glass substrate 100, a chamfered edge 110 is created that is substantially defect-free and strengthened compared to the edge 102 before chamfering. In one or more embodiments, the strip 106 has a thickness in the range of 100 μm to 300 μm. The thickness of the strip 106 can be controlled based on the temperature of the chamfering tool 104 and the speed at which the chamfering tool 104 moves along the edge 102. Higher temperatures and / or slower speeds produce a greater thickness of the strip 106.

[0017] Further details regarding the heated chamfering process can be found in PCT applications PCT / US2022 / 022792 (filed March 31, 2022), PCT / US2021 / 063942 (filed December 17, 2021), and PCT / US2022 / 023978 (filed April 8, 2022), the whole of which is incorporated herein by reference.

[0018] In one or more embodiments, the chamfered edge 110 of the glass substrate 100 has an edge strength of 600 MPa or more. In one or more embodiments, the edge strength of the heated chamfered edge is approximately 600 MPa to approximately 1400 MPa, approximately 650 MPa to approximately 1400 MPa, approximately 700 MPa to approximately 1400 MPa, approximately 750 MPa to approximately 1400 MPa, approximately 800 MPa to approximately 1400 MPa, approximately 850 MPa to approximately 1400 MPa, approximately 900 MPa to approximately 1400 MPa, approximately 1000 MPa to approximately 1400 MPa, approximately 600 MPa to approximately 1350 MPa, and approximately 600 The ranges are approximately 600 MPa to 1300 MPa, 600 MPa to 1250 MPa, 600 MPa to 1200 MPa, 600 MPa to 1150 MPa, 600 MPa to 1100 MPa, 600 MPa to 1050 MPa, 600 MPa to 1000 MPa, 600 MPa to 950 MPa, 600 MPa to 900 MPa, 600 MPa to 850 MPa, or 600 MPa to 700 MPa. In one or more embodiments, the edge strength is measured by a two-point bending test.

[0019] In one or more embodiments, any defects found on the chamfered edge 110 are 11 μm or less (e.g., approximately 0.1 μm to approximately 11 μm, approximately 0.1 μm to approximately 10 μm, approximately 0.1 μm to approximately 9 μm, approximately 0.1 μm to approximately 8 μm, approximately 0.1 μm to approximately 7 μm, approximately 0.1 μm to approximately 6 μm, approximately 0.1 μm to approximately 5 μm, approximately 0.1 μm to approximately 4 It has a maximum length of approximately 3 μm, approximately 0.1 μm to approximately 2 μm, approximately 0.1 μm to approximately 1 μm, approximately 0.5 μm to approximately 11 μm, approximately 1 μm to approximately 11 μm, approximately 2 μm to approximately 11 μm, approximately 3 μm to approximately 11 μm, approximately 4 μm to approximately 11 μm, approximately 5 μm to approximately 11 μm, approximately 6 μm to approximately 11 μm, approximately 7 μm to approximately 11 μm, approximately 8 μm to approximately 11 μm, or approximately 9 μm to approximately 11 μm.

[0020] Figure 2 depicts a side view of the glass substrate 100 to be chamfered. As seen in Figure 2, the chamfering tool 104 is a metal rod, such as a metal rod made of MoSi2. In one or more embodiments, the chamfering tool 104 is heated by a heating element 112, for example, by induction heating, but in one or more other embodiments, another heating element 112, such as a resistance heating element, is used. Furthermore, in one or more embodiments, the heating element 112 is incorporated into the structure of the chamfering tool 104.

[0021] In the embodiments described, the heating element 112 is one or more induction coils 114 that heat the chamfering tool 104 using high-frequency induction heating. The chamfering tool 104 extends through the center of the induction coil 114. Specifically, in one or more embodiments, the chamfering tool 104 includes a heated portion 116 and a contact portion 118. As shown in Figure 2, the heated portion 116 is positioned within the induction coil 114 such that the heated portion 116 is heated by the induction coil 114 and heat is transferred to the contact portion 118 that contacts the glass substrate 100. In one or more embodiments, the cross-sectional area of ​​the contact portion 118 is smaller than the cross-sectional area of ​​the heated portion 116.

[0022] In one or more embodiments, the induction coil 114 of the heating element 112 is implemented using a copper (Cu) coil. In one or more embodiments, the outer surface of the induction coil 114 is coated with a ceramic material for electrical safety. In one or more embodiments, cooling water flows through the induction coil 114. In one or more embodiments, the heating element 112 of the induction coil heats the chamfering tool 104 to a temperature in the range of about 1200°C to about 1300°C by transmitting power to the chamfering tool 104.

[0023] Figure 2 also depicts a first main surface 108 of the glass substrate 100, and the glass substrate 100 further includes a second main surface 120 opposite the first main surface 108. The first main surface 108 and the second main surface 120 define the thickness T between them. In one or more embodiments, the thickness is 10 μm to 1 mm, particularly 50 μm to 250 μm. The first main surface 108, the second main surface 120, and the edges 102 and / or heated chamfered edges 110 form the boundary of the glass body defining the glass substrate 100.

[0024] Figure 3 is a schematic diagram of a jig 122 for holding a glass substrate 100 during heating chamfering, according to one or more embodiments of the present disclosure. In one or more embodiments, the jig 122 includes a contact support portion 124 that supports the glass substrate 100 while in contact with it, and a base portion 126 that supports the contact support portion 124 while separated from the glass substrate 100 without contact. In one or more embodiments, the contact support portion 124 is located closer to the heating element 112 than the base portion 126.

[0025] Figure 4 is a schematic plan view of the jig 122 of Figure 3. The contact support portion 124 (shown as a dashed line) supports the glass substrate 100 by direct contact with the glass substrate 100 during the heated chamfering process. For this reason, in one or more embodiments, the contact support portion 124 is formed from a first material having low thermal conductivity, a low coefficient of thermal expansion, and a low coefficient of friction with the glass substrate 100. In one or more embodiments, the first material is a carbon material such as isotropic graphite (e.g., available from Ibiden Co., Ltd.). Advantageously, such a material has low thermal conductivity to prevent the temperature of the glass substrate 100 from rising, thereby protecting the glass substrate 100 from thermal damage. Such a material also has a low coefficient of thermal expansion to prevent size changes during heated chamfering. In addition, the carbon material is relatively soft to prevent scratches on the surface of the glass substrate 100.

[0026] The base portion 126 supports the contact support portion 124. In one or more embodiments, the base portion 126 is configured to adequately support the contact support portion 124 so that no gap is formed between it and the contact support portion 124. In one or more embodiments, the base portion 126 is formed from a second material, such as aluminum (Al) or an aluminum alloy (e.g., an aluminum-magnesium-silicon (AlMgSi) alloy such as AA6061). Advantageously, aluminum and its alloys can be selected to be lightweight while having good machinability and high strength. In addition, aluminum and its alloys have high thermal conductivity, which allows for rapid cooling even when the chamfering tool 104 is at a high temperature.

[0027] While the general configuration and process of heated chamfering have been described, the following description and Figures 5-14 relate to a support for a continuous strip of glass formed during heated chamfering, and the glass substrate formed thereby. Figure 5 depicts the progression stages of the continuous strip 106. In the first stage 201 of the embodiment described, the heated chamfering process begins along a straight side, as opposed to a curved side or corner of the edge 102 of the glass substrate, and the glass strip 106 begins to peel away from the glass substrate 100. The straight side of the edge 102 provides a stable starting and stopping point for the heated chamfering process. In the second stage 202, the glass strip 106 continues to grow as the heated chamfering process moves toward a first corner of the glass substrate 100, and in the third stage 203, the heated chamfering process reaches the first corner of the glass substrate 100. In the fourth stage 204, the heated chamfering process proceeds around the first corner of the glass substrate 100, generating a curved portion of the glass strip 106. In the fifth stage 205, the heated chamfering process reaches the next corner, and the glass strip 106 remains continuous. In one or more embodiments, the heated chamfering process continues until the entire edge 102 of the glass substrate 100 is removed, leaving a chamfered edge 110.

[0028] The strip 106 is continuous and grows throughout the heated chamfering process, and vibrations of the continuous strip 106 during heated chamfering can affect the extreme properties of the chamfered edge 110. Specifically, although we do not wish to be bound by theory, it is conceivable that vibrations or excessive vibrations of the strip 106 could create hackle marks on the chamfered edge 110. In addition to this, as the strip 106 grows, its mass increases, changing the tension between the strip 106 and the glass substrate 100. Furthermore, the angle at which the strip 106 separates from the glass substrate 100 can change if the strip 106 is not properly supported, which can affect the uniformity of the strip thickness and therefore the edge quality. In one or more embodiments, the angle between the strip 106 and the chamfered edge 110, when viewed from the first main surface 108 or the second main surface 120 (i.e., the top view in Figure 5), is maintained in the range of about 5° to about 60°. In one or more embodiments, when viewed from a perpendicular to the first main surface 108 or the second main surface 120 (i.e., the side view in Figure 5), the angle between the strip 106 and the chamfered edge 110 is maintained in the range of approximately 100° to approximately 180° when measured at a maximum distance of 10 mm from the chamfered edge 100.

[0029] Therefore, embodiments of a support for a continuous strip are provided in accordance with this disclosure. Figures 6 and 7 depict a first embodiment of the support 210. As seen in the figures, the support 210 is positioned adjacent to the jig 122. In one or more embodiments, the support 210 includes one or more platform structures 212 configured to reduce vibration of the continuous strip 106 as the continuous strip 106 grows during heated chamfering of the glass substrate 100. Furthermore, in one or more embodiments, one or more platform structures 212 are further configured to maintain the angle that the continuous strip forms with the glass substrate 100 during heated chamfering.

[0030] In one or more embodiments, including those shown in Figures 6 and 7, one or more platform structures 212 define at least one rail 214 that spirals around the jig 122. In the embodiments shown in Figures 6 and 7, the at least one rail 214 is three rails, indicated as a first rail 214a, a second rail 214b, and a third rail 214c.

[0031] Referring to the first rail 214a, the first rail 214a spirals from a first height H1 at a first radial position θ1 to a second height H2 at a second radial position θ2. The second height H2 is lower than the first height H1. In one or more embodiments, the second radial position θ2 is at least three-quarters of a turn around the jig 122 from the first radial position θ1. In one or more preferred embodiments, the second radial position θ2 is at a complete turn around the jig 122 from the first radial position θ1 (i.e., the second radial position θ2 is the same as the first radial position θ1, but at a different height).

[0032] Similarly, the second rail 214b spirals from a first height H1 at a first radial position θ1 to a third height H3 at a second radial position θ2. In one or more embodiments, the third height H3 is lower than both the first height H1 and the second height H2.

[0033] In embodiments including a third rail 214c, the third rail 214c spirals from a first height H1 at a first radial position θ1 to a fourth height H4 at a second radial position θ2. In one or more embodiments, the fourth height H4 is lower than each of the first height H1, the second height H2, and the third height H3.

[0034] In this way, the rails 214 gradually decrease in height as the continuous strip 106 grows during the heated chamfering process, supporting the strip 106 at an angle corresponding to the angle at which it separates from the glass substrate 100 (for example, stages 201-205 as shown in Figure 5). Furthermore, in one or more embodiments, the spacing S between the rails 214 increases as the rails 214 spiral around the jig 122, which also helps to support the continuous strip 106 as it grows during heated chamfering.

[0035] In one or more embodiments, the rail heights H2, H3, H4 and spacing S are selected to maintain a desired angle of the strip 106 (e.g., about 100° to about 180°) as the strip 106 hangs longer from the glass substrate 100 as the chamfering process progresses. In one or more embodiments, the rail heights and spacing between rails are 0.01 ≤ (H n - - H n+1 The relationship ) / S ≤ 5.67 is satisfied, and in the above equation, H n This is the height of the first rail, H n+1 is the height of the adjacent rail, and S is the distance between the two rails. In one or more embodiments, this relationship is maintained over the entire helix of the rail 214, taking into account the length of the strip 106 generated based on the length of the edge 102 (i.e., perimeter) of the glass substrate 100.

[0036] In one or more embodiments, each rail 214 has a length. In one or more embodiments, a plurality of ports 216 are formed within each of the rails 214 along their respective lengths. Air or another fluid is configured to be forced through the plurality of ports 216 of each rail 214 to reduce friction between the continuous strip 106 and each rail 214. In one or more embodiments, each port 216 has a diameter ranging from 0.1 mm to 1 mm, and in one or more embodiments, each rail 214 contains 1 port per inch to 150 ports per inch.

[0037] Figures 8 and 9 depict another embodiment of the support 210. In one or more such embodiments, one or more platform structures 212 are configured to move radially around the jig 122. In one or more embodiments, one or more platform structures 212 include at least one arch 218 positioned on the first movable base 220. In the embodiments depicted, the at least one arch 218 includes a first arch 218a, a second arch 218b, and a third arch 218c.

[0038] First, referring to the first arch 218a, the first arch 218a includes a first leg 222a extending from the first movable base 220, a second leg 224a extending from the first movable base 220, and a crossbar 226a positioned between the first leg 222a and the second leg 224a. The crossbar 226a of the first arch 218a is at a first height H1 from the first movable base 220. The second arch 218b includes a first leg 222b extending from the movable base 220, a second leg 224b extending from the first movable base 220, and a crossbar 226b positioned between the first leg 222b and the second leg 224b. The crossbar 226b of the second arch 218b is at a second height H2 from the first movable base 220. In one or more embodiments, the second height H2 is lower than the first height H1. In embodiments that include a third arch 218c, the third arch 218c includes a first leg 222c extending from the first movable base 220, a second leg 224c extending from the first movable base 220, and a crossbar 226c positioned between the first leg 222c and the second leg 224c. The crossbar 226c of the third arch 218c is the third height H3 from the first movable base 220. In one or more embodiments, the third height H3 is lower than both the first height H1 and the second height H2. In this way, the height of the arch 218 gradually decreases to mimic the folds of the continuous strip 106 when separated from the glass substrate 100.

[0039] Furthermore, in one or more embodiments, each crossbar 226a, 226b, 226c has respective widths W1, W2, W3. In one or more embodiments, the width of each crossbar increases as the distance from the jig 122 increases. Thus, for example, the first width W1 of the crossbar 226a is less than the second width W2 of the crossbar 226b, and the second width W2 of the crossbar 226b is less than the third width W3 of the crossbar 226c.

[0040] In one or more embodiments, the first arch 218a is spaced from the second arch 218b by a first interval S1, and the second arch 218b is spaced from the third arch 218c by a second interval S2. In one or more embodiments, the first interval S1 is smaller than the second interval S2.

[0041] In one or more embodiments, the height of the arch 218 and the interval between the arches 218 satisfy the relationship 0.01 ≦ (H n - - H n+1 ) / S ≦ 5.67, where in the above formula, H n is the height of the first arch, H n+1 is the height of the next adjacent arch, and S is the interval between two arches. Further, in one or more embodiments, the width of the arch 218 is selected to satisfy the relationship W ≧ 2 * D * tan(θ), where in the above formula, W is the width of the arch 218, D is the distance from the glass substrate 100 of the arch 218, and θ is the angle between the glass strips 106 of the glass substrate 100 when viewed from above.

[0042] In one or more embodiments, the plurality of ports 216 are formed across the widths W1, W2, W3 of the respective crossbars 226a, 226b, 226c. Air or another fluid is configured to be forced through the plurality of ports 216 of the crossbars 226a, 226b, 226c to reduce the friction between the continuous strip 106 and the crossbars 226a, 226b, 226c.

[0043] Figure 10 depicts an embodiment of a single arch 218, which may represent a first arch 218a, a second arch 218b, or a third arch 218c. In one or more embodiments, the arch 218 includes a first end block 228 extending from a first end 230 of a crossbar 226 and a second end block 232 extending from a second end 234 of the crossbar 226. The first end block 228 and the second end block 232 provide a boundary for containing the continuous strip 106 during heated chamfering.

[0044] Specifically, the first movable base 220 moves around the jig 122 during the heated chamfering process in such a manner that one or more arches 218 support the continuous strip 106 as it grows. In one or more embodiments, the jig 122 is stationary and the chamfering tool 104 moves around the glass substrate 100. In such embodiments, the first movable base 220 moves together with the chamfering tool 104 at the same speed as the chamfering tool 104. In this way, the arches 218 support the continuous strip as it grows, and end blocks 228, 232, if included, ensure that the continuous glass strip 106 remains on the arches 218 during heated chamfering.

[0045] Figures 11 and 12 show another embodiment of the support 210 in which a plurality of arches 218 are provided on a plurality of movable bases 220. In one or more embodiments, the bases 220 move autonomously using navigation sensors and / or a track system. In one or more embodiments, a first arch 218a is provided on a first movable base 220a, a second arch 218b is provided on a second movable base 220b, and a third arch 218c is provided on a third movable base 220c. By providing the arches 218a, 218b, and 218c on separate movable bases 220a, 220b, and 220c, the bases 220a, 220b, and 220c can move independently of each other. Therefore, as shown, for example in Figure 12, the movable bases 220a, 220b, and 220c do not always have to be aligned during the heating chamfering process. Specifically, the movable bases 220a, 220b, and 220b can move at different speeds to provide appropriate support to the continuous strip 106.

[0046] Figure 13 depicts an embodiment of the arch 218 for use with one of the independent movable bases 220. In one or more embodiments, the arch 218 includes a first end block 228 and a second end block 232, as previously described. In one or more embodiments, the end blocks 228, 232 each include a sensor 236 configured to detect contact with or proximity to the continuous strip 106 (e.g., a distance monitoring sensor unit or a collision avoidance sensor unit). In such embodiments, the sensor 236 on the front end block 232 may increase the speed of its movement to the movable base 220 when the continuous strip 106 is close to the front end block 232. In contrast, the sensor 236 on the rear end block 228 may decrease the speed of its movement to the movable base 220 when the continuous strip 106 is close to the rear end block 228. In this way, the shape of the continuous strip 106, which changes as it grows during heated chamfering, may be taken into consideration and supported by the arch 218.

[0047] According to this disclosure, the support for continuous strips enhances the quality of the beveled edges of the glass substrate. Specifically, the glass substrate exhibits lower wave unevenness at the beveled edges. To determine the characteristics of the beveled edges, two glass samples were heat-beveled. One glass sample was prepared without using the support 210 according to this disclosure to stabilize the strip 106, and the other glass sample was prepared using the support 210 according to this disclosure to stabilize the strip 106 during beveling. Each glass sample was a rectangular glass sample, and eight positions around each beveled edge were sampled, including one sample at the midpoint of each short side and three equally spaced samples on each of the long sides.

[0048] At each of the eight positions of each sample, the average roughness (R a ) and maximum peak vs. trough roughness (R z The roughness was measured along a sampling length of 3000 μm. The measured values ​​for roughness are provided in Table 1 below. [Table 1]

[0049] As can be seen from Table 1, the glass samples beveled using support 210 had lower overall roughness. Specifically, the maximum average roughness (R) measured around the unsupported sample was lower. a ) is 2.5 μm, while the maximum average roughness (R) measured around the supported sample is 2.5 μm. a The ) was 1.5 μm. Furthermore, the maximum peak vs. trough roughness (R) measured around the unsupported sample was also measured. z ) is 16 μm, while the maximum peak vs. trough roughness (R) measured around the supported sample is 16 μm. z The roughness of the unsupported samples was 6 μm. The average roughness value of the unsupported samples was 0.5 μm (R a ) and 3.3 μm (R z The standard deviations were 0.8 μm and 5.2 μm, respectively. The mean of the roughness values ​​of the supported samples was 0.4 μm (R a ) and 1.8 μm (Rz The standard deviations were 0.5 μm and 1.9 μm, respectively. Therefore, the average roughness around the chamfered edges was lower for supported samples with lower levels of variance.

[0050] In one or more embodiments, the average surface roughness (R) of the chamfered edge 110 around the glass substrate 100. a ) is less than 0.5 μm, and the maximum surface roughness (R) of the chamfered edge 110 around the glass substrate 100 is less than 0.5 μm. a The mean surface roughness (R) of the chamfered edge 110 around the glass substrate 100 is 2.0 μm or less. In one or more embodiments, the mean surface roughness (R) of the chamfered edge 110 around the glass substrate 100 is 2.0 μm or less. z The thickness is less than 2.0 μm, and the maximum surface roughness (R) of the chamfered edge 110 around the glass substrate 100 is less than 2.0 μm. z The size is 10.0 μm or less.

[0051] Figure 14 depicts a chamfered edge 110 of the glass substrate 100. As shown in Figure 14, the chamfered edge 110 forms a first angle α with the first main surface 108 and a second angle β with respect to the second main surface 120. In one or more embodiments, both the first angle α and the second angle β of the chamfered edge 110 around the glass substrate 100 are within 15°, specifically within 10° and most particularly within 5°, of the perpendiculars to the first main surface 108 and the second main surface 120, respectively.

[0052] At each of the eight locations where roughness was measured, the perpendicularity of the chamfered edge was also measured for both samples chamfered using a support for the glass strip and samples chamfered without a support for the glass strip. The measured first angle α and measured second angle β for each of the eight locations around each sample are provided in Table 2 below. [Table 2]

[0053] Table 2 shows that the average first angle α for unsupported glass samples was 94.1°, and the average second angle β for unsupported glass samples was 86.0°. The average first angle α for supported glass samples was 85.9°, and the average second angle β for supported glass samples was 93.9°. The average first and second angles α and β for unsupported and supported glass samples were relatively close, but the difference between the minimum and maximum values ​​of the first and second angles α and β was larger for unsupported glass samples than for supported glass samples. For unsupported samples, the difference between the minimum and maximum values ​​of the first angle α was 21.78°, and the difference between the minimum and maximum values ​​of the second angle β was 21.84°. For supported samples, the difference between the minimum and maximum values ​​of the first angle α was 14.56°, and the difference between the minimum and maximum values ​​of the second angle β was 15.68°. Furthermore, for unsupported glass samples, the standard deviations of the measured first angle α and second angle β were 7.373° and 7.316°, respectively, while for supported glass samples, the standard deviations of the measured first angle α and second angle β were 5.682° and 6.144°, respectively. In this way, the support for the glass strip 106 reduces the dispersion of the first angle α and second angle β of the chamfered edge 110.

[0054] In one or more embodiments, the difference between the measured minimum and maximum first angle α and second angle β around the chamfered edge 110 is 20.0° or less, specifically 17.0° or less. Furthermore, in one or more embodiments, the standard deviation of the first angle α and the second angle β when measured around the chamfered edge 110 of the glass substrate 100 is 7.0° or less.

[0055] Advantageously, embodiments of the support 210 described herein reduce the formation of various defects and irregularities on the chamfered edge 110. Figure 15 illustrates an example of hackle marks that may form on the chamfered edge of a glass substrate without using the support 210 of the glass strip 106. Figure 16 provides a side view of the chamfered edge illustrating the irregularities on the edge resulting from the lack of support for the glass strip generated during chamfering. By using the support 210, the formation of hackle marks and irregularities is substantially reduced or eliminated, as shown in Figures 15 and 16. Advantageously, the reduction of such defects not only enhances the surface appearance of the chamfered edge but can also improve edge strength, and therefore can improve the reliability and lifespan of the glass substrate.

[0056] One aspect of the present disclosure relates to a support for a continuous strip formed during chamfering of a glass substrate located on a jig, the support comprising one or more platform structures positioned adjacent to the jig and configured to reduce vibration of the continuous strip as the continuous strip grows during chamfering of the glass substrate.

[0057] Aspect (2) of the present disclosure relates to the support of aspect (1), wherein one or more platform structures include a first rail that spirals around a jig from a first height at a first radial position to a second height at a second radial position, the second height being lower than the first height.

[0058] Aspect (3) of the present disclosure relates to the support of aspect (2), wherein the second radial position is three-quarters of a turn around the jig from the first radial position.

[0059] Aspect (4) of the present disclosure relates to a support of aspect (2) or aspect (3), wherein one or more platform structures further comprises a second rail that spirals around a jig from a first height at a first radial position to a third height at a third radial position, the third height being lower than the second height.

[0060] Aspect (5) of the present disclosure relates to any one of the supports of aspects (2) to (4), wherein the first rail includes a length, and a plurality of ports are formed within the first rail over the length, and air is configured to be forced through the plurality of ports of the first rail to reduce friction between the continuous strip and the first rail.

[0061] Aspect (6) of the present disclosure relates to the support of aspect (1), wherein one or more platform structures are configured to move around a jig.

[0062] Aspect (7) of the present disclosure relates to the support of aspect (6), wherein one or more platform structures comprises a first arch positioned on a first movable base, the first arch having a first leg extending from the first movable base, a second leg extending from the first movable base, and a first crossbar positioned between the first leg and the second leg.

[0063] Aspect (8) of the present disclosure relates to the support of aspect (7), wherein a plurality of ports are formed within a first crossbar, and air is configured to be forced through the plurality of ports in the first crossbar to reduce friction between the continuous strip and the first crossbar.

[0064] Aspect (9) of the present disclosure relates to a support of aspect (7) or aspect (8), wherein the first arch further comprises a first end block extending from a first end of a first crossbar and a second end block extending from a second end of the first crossbar, the first and second end blocks guiding a continuous strip as the first movable base moves radially around a jig.

[0065] Aspect (10) of the present disclosure relates to the support of aspect (9), wherein the first end block and the second end block include sensors configured to detect contact or proximity of a continuous strip to the first end block or the second end block.

[0066] Aspect (11) of the present disclosure relates to any one of the supports of aspects (7) to (10), wherein one or more platform structures further comprises a second arch positioned on a first movable base, the second arch comprising a third leg extending from the first movable base, a fourth leg extending from the first movable base, and a second crossbar positioned between the third and fourth legs.

[0067] Aspect (12) of the present disclosure relates to any one of the supports of aspects (7) to (10), wherein one or more platform structures further comprises a second arch positioned on a second movable base, the second arch comprising a third leg extending from the first movable base, a fourth leg extending from the first movable base, and a second crossbar positioned between the third and fourth legs, wherein the second movable base is configured to move independently of the first movable base.

[0068] Aspect (13) of the present disclosure relates to a support of aspect (11) or aspect (12), wherein a first crossbar is positioned between a first leg and a second leg at a first height, and a second crossbar is positioned between a third leg and a fourth leg at a second height, the second height being lower than the first height.

[0069] Aspect (14) of the present disclosure relates to a heated chamfering system and comprises a jig configured to hold a glass substrate, a tool configured to move relative to the jig to remove a continuous strip from the glass substrate, and a support positioned adjacent to the jig according to any one of aspects (1) to (13).

[0070] Aspect (15) of the present disclosure relates to the heated chamfering system of aspect (14), wherein the tool comprises an induction-heated tip.

[0071] Aspect (16) of the present disclosure relates to a heated chamfering system of aspect (14) or aspect (15), wherein the support is stationary relative to the jig.

[0072] Aspect (17) of the present disclosure relates to a heated chamfering system of aspect (14) or aspect (15), wherein the support is configured to move at least partially around a jig.

[0073] Aspect (18) of the present disclosure relates to a method for chamfering the edge of a glass substrate, which includes moving a tool around the edge of the glass substrate to remove glass material in a continuous strip, and supporting the continuous strip on a platform structure to reduce vibration of the continuous strip during the removal of glass material from the glass substrate.

[0074] Aspect (19) of the present disclosure relates to the method of aspect (18), wherein the platform structure comprises a first rail that spirals around a jig from a first height at a first radial position to a second height at a second radial position, the second height being lower than the first height.

[0075] Aspect (20) of the present disclosure relates to the method of aspect (19), wherein the second radial position is at least three-quarters of a turn around the jig from the first radial position.

[0076] Aspect (21) of the present disclosure relates to the method of aspect (18) or aspect (19), wherein the platform structure further comprises a second rail that spirals around the jig from a first height at a first radial position to a third height at a third radial position, the third height being lower than the second height.

[0077] Aspect (22) of the present disclosure relates to any one of aspects (19) to (21), wherein the first rail includes a length and a plurality of ports are formed within the first rail over the length, and the method further includes forcing air through the plurality of ports of the first rail to reduce friction between a continuous strip and the first rail.

[0078] Aspect (23) of this disclosure relates to the method of aspect (19), and supporting further includes moving the platform around the jig.

[0079] Aspect (24) of the present disclosure relates to the method of aspect (23), wherein the platform structure includes a first arch positioned on a first movable base, the first arch having a first leg extending from the base, a second leg extending from the first movable base, and a first crossbar positioned between the first leg and the second leg.

[0080] Aspect (25) of the present disclosure relates to the method of aspect (24), wherein the plurality of ports are formed within a first crossbar, and the method further includes forcing air through the plurality of ports in the first crossbar to reduce friction between the continuous strip and the first crossbar.

[0081] Aspects (26) of the present disclosure relate to the method of aspect (24) or aspect (25), wherein the first arch further comprises a first end block extending from a first end of a first crossbar and a second end block extending from a second end of the first crossbar, and the method further includes using the first end block and the second end block to guide a continuous strip as a first movable base moves radially around a jig.

[0082] Aspects (27) of the present disclosure relate to the method of aspect (26), wherein the first end block and the second end block include sensors configured to detect contact or proximity of a continuous strip to the first end block or the second end block, and the method further includes adjusting the speed at which the platform structure moves around the jig based on feedback from the sensors.

[0083] Aspect (28) of the present disclosure relates to any one of aspects (24) to (27), wherein one or more platform structures further comprises a second arch positioned on a first movable base, the second arch comprising a third leg extending from the first movable base, a fourth leg extending from the first movable base, and a second crossbar positioned between the third and fourth legs.

[0084] Aspect (29) of the present disclosure relates to any one of the methods of aspects (24) to (27), wherein one or more platform structures further comprises a second arch positioned on a second movable base, the second arch comprising a third leg extending from the first movable base, a fourth leg extending from the first movable base, and a second crossbar positioned between the third leg and the fourth leg, and the method further comprises moving the second movable base independently of the first movable base.

[0085] Aspect (30) of the present disclosure relates to the method of aspect (28) or (29), wherein a first crossbar is positioned between a first leg and a second leg at a first height, and a second crossbar is positioned between a third leg and a fourth leg at a second height, the second height being lower than the first height.

[0086] Aspect (31) of the present disclosure is a glass substrate comprising a glass body, the glass body comprising a first main surface, a second main surface opposite to the first main surface, and a heated chamfered edge extending at least partially around the glass body between the first main surface and the second main surface, wherein the heated chamfered edge has a maximum peak-to-trough surface roughness R zHowever, this relates to glass substrates with a thickness of 10.0 μm or less.

[0087] Aspect (32) of the present disclosure relates to the glass substrate of aspect (31), wherein the heated chamfered edge does not contain hackle marks.

[0088] Aspect (33) of the present disclosure relates to a glass substrate of aspect (31) or aspect (32), wherein the glass body includes a glass material selected from the group consisting of borosilicate glass, aluminosilicate glass, boroaluminosilicate glass, and combinations thereof.

[0089] Aspect (34) of the present disclosure relates to any one of the glass substrates of aspects (31) to (33), wherein a plurality of average surface roughness R around a heated chamfered edge a The average measurement is less than 0.5 μm.

[0090] Aspect (35) of the present disclosure relates to the glass substrate of aspect (34), and comprises a plurality of average surface roughness R a Each average surface roughness R of the measured values a The measured value is 2.0 μm or less.

[0091] Aspect (36) of the present disclosure relates to any one of the glass substrates of aspects (31) to (35), and comprises multiple peak-to-trough surface roughness R around a heated chamfered edge. z The average measurement is 2.0 μm or less.

[0092] Aspect (37) of the present disclosure relates to any one of the glass substrates of aspects (31) to (36), wherein the heated chamfered edge forms a first angle with a first main surface and a second angle with a second main surface, and each of the first and second angles is within 15° of a perpendicular.

[0093] Aspect (38) of the present disclosure relates to the glass substrate of aspect (37), wherein, for a plurality of first angles measured around a heated chamfered edge, the difference between the largest measured first angle and the smallest measured first angle is 20.0° or less.

[0094] Aspect (39) of the present disclosure relates to the glass substrate of aspect (38), wherein the standard deviation of a plurality of first angles measured around a heated chamfered edge is 7.0° or less.

[0095] Aspect (40) of the present disclosure relates to any one of the glass substrates of aspects (37) to (39), wherein, for a plurality of second angles measured around a heated chamfered edge, the difference between the largest measured second angle and the smallest measured second angle is 20.0° or less.

[0096] Aspect (40) of the present disclosure relates to a glass substrate of aspect (40), wherein the standard deviation of a plurality of second angles measured around a heated chamfered edge is 7.0° or less.

[0097] Unless otherwise expressly stated, no method described herein is intended to be construed as requiring its steps to be carried out in a particular order. Therefore, if a claim for a method does not actually list the order in which its steps are followed, or if the claims or description does not specifically state that the steps should be limited to a particular order, no particular order is ever intended to be inferred. Furthermore, as used herein, the article "a" is intended to include one or more components or elements, and is not intended to be construed as meaning only one.

[0098] It will be apparent to those skilled in the art that various modifications and variations can be made without departing from the scope or spirit of the embodiments of this disclosure. Since modifications, combinations, partial combinations, and variations of the disclosed embodiments incorporating the spirit and content of the embodiments may occur to those skilled in the art, the disclosed embodiments should be construed as encompassing all of the scope of the appended claims and their equivalents.

Claims

1. A method for chamfering the edges of a glass substrate, The tool is moved around the edge of the glass substrate to remove the glass material in a continuous strip. A method comprising supporting the continuous strip on a platform structure to reduce vibration of the continuous strip during the removal of the glass material from the glass substrate.

2. The method according to claim 1, wherein the platform structure comprises a first rail that spirals around a jig from a first height at a first radial position to a second height at a second radial position, and the second height is lower than the first height.

3. The method according to claim 2, wherein the second radial position is located at least three-quarters of a turn around the jig from the first radial position.

4. The method according to claim 1 or 2, wherein the platform structure further comprises a second rail that spirals around the jig from a first height at the first radial position to a third height at the third radial position, the third height being lower than the second height.

5. The method according to any one of claims 2 to 4, wherein the first rail includes a length and a plurality of ports are formed in the first rail over the length, and the method further comprises forcing air to pass through the plurality of ports of the first rail in order to reduce friction between the continuous strip and the first rail.

6. The method according to claim 2, further comprising supporting the platform by moving it around the jig.

7. The method according to claim 3, wherein the platform structure includes a first arch positioned on a first movable base, the first arch having a first leg extending from the base, a second leg extending from the first movable base, and a first crossbar positioned between the first leg and the second leg.

8. The method according to any one of claims 7, wherein the one or more platform structures further comprises a second arch positioned on the first movable base, the second arch comprising a third leg extending from the first movable base, a fourth leg extending from the first movable base, and a second crossbar positioned between the third leg and the fourth leg.

9. The method according to claim 7 or 8, wherein the one or more platform structures further comprises a second arch positioned on a second movable base, the second arch comprising a third leg extending from the first movable base, a fourth leg extending from the first movable base, and a second crossbar positioned between the third leg and the fourth leg, and the method further comprises moving the second movable base independently of the first movable base.

10. The method according to claim 8 or 9, wherein the first crossbar is positioned between the first leg and the second leg at a first height, and the second crossbar is positioned between the third leg and the fourth leg at a second height, and the second height is lower than the first height.

11. A glass substrate, A glass body comprising a first main surface, a second main surface facing the first main surface, and a heated chamfered edge extending at least partially around the glass body between the first main surface and the second main surface, The maximum peak versus trough surface roughness R of the heated chamfered edge ｚ However, the glass substrate is 10.0 μm or less.

12. The glass substrate according to claim 11, wherein the heated chamfered edge does not contain hackle marks.

13. The glass substrate according to claim 11 or 12, wherein the glass body comprises a glass material selected from the group consisting of borosilicate glass, aluminosilicate glass, boroaluminosilicate glass, and combinations thereof.

14. Multiple average surface roughness R around the heated chamfered edge ａ A glass substrate according to any one of claims 11 to 13, wherein the average of the measured values ​​is less than 0.5 μm.

15. The aforementioned plurality of average surface roughness R ａ Each measured average surface roughness R ａ The glass substrate according to claim 14, wherein the measured value is 2.0 μm or less.

16. Multiple peak-to-trough surface roughness R around the aforementioned heated chamfered edge ｚ A glass substrate according to any one of claims 11 to 15, wherein the average of the measured values ​​is 2.0 μm or less.

17. The glass substrate according to any one of claims 11 to 16, wherein the heated chamfered edge forms a first angle with the first main surface and a second angle with the second main surface, and each of the first angle and the second angle is within 15° of a perpendicular.

18. The glass substrate according to claim 17, wherein, with respect to a plurality of first angles measured around the heated chamfered edge, the difference between the largest measured first angle and the smallest measured first angle is 20.0° or less.

19. The glass substrate according to claim 18, wherein the standard deviation of the plurality of first angles measured around the heated chamfered edge is 7.0° or less.

20. The glass substrate according to any one of claims 17 to 19, wherein, with respect to a plurality of second angles measured around the heated chamfered edge, the difference between the largest measured second angle and the smallest measured second angle is 20.0° or less.

Images