Processes and structures for superjunction devices

Abstract

A superjunction device comprising: a drain contact, a substrate layer above the drain contact, an epitaxial layer above the substrate layer, a P+ layer above the epitaxial layer formed by a P-type implant into a bottom of the superjunction device, and a trench with a slope angle formed by use of a hard mask layer. The trench is filled with an insulating material. A first vertical column is formed proximate to the trench. A second vertical column is formed proximate to the first vertical column. A source contact is coupled to the first vertical column and the second vertical column. A P-type body region is coupled to the source contact. A gate oxide is formed above the source contact and the epitaxial layer, and a gate is formed above the gate oxide.

Description

[Technical field]

[0001] The present invention relates generally to semiconductor devices, device structures and processes for manufacturing high voltage integrated circuits or power transistor devices. [Background technology]

[0002] High voltage applications such as motor drives, uninterruptible power supplies, and solar inverters may use power semiconductor devices. Depending on the specific requirements of the application, a variety of power semiconductor devices are available, such as power diodes, power metal-oxide-semiconductor field-effect transistors (MOSFETs), bipolar-junction transistors (BJTs), insulated gate bipolar transistors (IGBTs), thyristors, and the like.

[0003] Performance measures of power semiconductor devices may include operating currents and voltages, input and output impedances, switching speeds, reverse bias breakdown voltages, etc. The type of power semiconductor device used may be based in part on these performance measures. Additional factors such as cost and device area may also contribute to identifying the type of power semiconductor device used.

[0004] To increase the breakdown voltage of the vertical device, the epitaxial layer thickness of the vertical device is also increased and the doping concentration in the epitaxial layer is decreased. However, this increases the drain-source resistance (R DSON ), which results in higher conduction losses when the vertical device is in the on-state. Another type of device, known as a superjunction device, uses charge compensation to reduce R for devices with high breakdown voltages. DSON It can improve the conduction loss (R DSON), superjunction devices require less area, which results in less output capacitance and less energy being stored and lost during switching transitions. Summary of the Invention

[0005] Non-limiting and non-exhaustive embodiments of the present invention are described with reference to the following figures, in which like reference symbols in different figures refer to like parts unless otherwise specified: [Brief description of the drawings]

[0006] [Figure 1] FIG. 1 illustrates an example process for forming a superjunction device using a mask for implantation according to an embodiment of the present disclosure. [Diagram 2] FIG. 2 illustrates an example of a superjunction device including a V-trench according to an embodiment of the present disclosure. [Figure 3A] FIG. 3A illustrates another example of a superjunction device including a trench and a DMOS gate according to an embodiment of the present disclosure. [Figure 3B] FIG. 3B illustrates a top view of the superjunction device of FIG. 3A according to an embodiment of the present disclosure. [Figure 4A] FIG. 4A illustrates another example of a superjunction device including a trench and a UMOS gate according to an embodiment of the present disclosure. [Figure 4B] FIG. 4B shows a top view of the superjunction device in FIG. 4A according to an embodiment of the present disclosure. [Figure 4C] FIG. 4C shows a cross section through a channel of the superjunction device in FIG. 4A according to an embodiment of the present disclosure. [Figure 5A] FIG. 5A illustrates a superjunction device including a trench and a DMOS gate according to an embodiment of the present disclosure. [Figure 5B]FIG. 5B shows a top view of the superjunction device in FIG. 5A according to an embodiment of the present disclosure. [Figure 6A] FIG. 6A illustrates another example of a superjunction device including a UMOS gate according to an embodiment of the present disclosure. [Figure 6B] FIG. 6B shows a top view of the superjunction device in FIG. 6A according to an embodiment of the present disclosure. [Figure 7A] FIG. 7A illustrates another example of a superjunction device including an isolated resistor according to an embodiment of the present disclosure. [Figure 7B] FIG. 7B shows a top view of the superjunction device in FIG. 7A according to an embodiment of the present disclosure. [Figure 8A] FIG. 8A illustrates another example of a superjunction device including a trench and a semi-insulating material according to an embodiment of the present disclosure. [Figure 8B] FIG. 8B shows a top view of the superjunction device in FIG. 8A according to an embodiment of the present disclosure. [Figure 9A] FIG. 9A illustrates another example of a superjunction device including a trench and a semi-insulating material according to an embodiment of the present disclosure. [Figure 9B] FIG. 9B shows a top view of the superjunction device in FIG. 9A according to an embodiment of the present disclosure. [Figure 10A] FIG. 10A illustrates another example of a superjunction device including a UMOS gate and a semi-insulating material according to an embodiment of the present disclosure. [Figure 10B] FIG. 10B shows a top view of the superjunction device in FIG. 10A according to an embodiment of the present disclosure. [Figure 11A] FIG. 11A illustrates a superjunction device including a trench, a DMOS gate, and a semi-insulating material according to an embodiment of the present disclosure. [Figure 11B] FIG. 11B shows a top view of the superjunction device in FIG. 11A according to an embodiment of the present disclosure. [Figure 12A] FIG. 12A illustrates another example of a superjunction device including a UMOS gate and a semi-insulating material according to an embodiment of the present disclosure. [Figure 12B] FIG. 12B shows a top view of the superjunction device in FIG. 12A according to an embodiment of the present disclosure. DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS

[0007] Corresponding reference characters indicate corresponding components throughout the several views of the drawings. Those skilled in the art will appreciate that the elements in the figures are drawn for simplicity and clarity, and have not necessarily been drawn to scale. For example, the dimensions of some of the elements in the figures may be exaggerated relative to other elements in order to facilitate a better understanding of the various embodiments of the present invention. Moreover, common but well-understood elements that are useful or necessary in commercially available embodiments are often not drawn in order to avoid cluttering the figures of these various embodiments of the present invention.

[0008] Examples of superjunction devices including trenches are described herein. In the following description, many specific details are set forth in order to provide a thorough understanding of the present invention. However, it will be apparent to those skilled in the art that the specific details may not necessarily be used to practice the present invention. In other instances, well-known materials or methods have not been described in detail to avoid obscuring the understanding of the present invention.

[0009] Reference herein to "one embodiment," "an embodiment," "an example," or "an example" means that a particular feature, structure, or characteristic described in connection with the embodiment or example is included in at least one embodiment of the invention. Thus, the use of the phrases "in one embodiment," "in an embodiment," "an example," or "an example" in various places throughout this specification does not necessarily all refer to the same embodiment or example. Furthermore, particular features, structures, or characteristics may be combined in any suitable combination and / or subcombination in one or more embodiments or examples. Particular features, structures, or characteristics may be included in an integrated circuit, electronic circuit, combinational logic circuit, or other suitable components that provide the described functionality. In addition, it is understood that the figures provided herewith are for illustrative purposes to persons skilled in the art, and that the drawings are not necessarily drawn to scale.

[0010] Superjunction devices have a lower on-resistance (R DSON ) and smaller output capacitance (C OSS ) performance. In one example, the vertical device can be a metal-oxide-semiconductor field effect transistor (MOSFET). The on-resistance is derived from the drain-source on-resistance of the product and the area of ​​the device. In one example for a vertical device with a breakdown voltage of 400 volts, it has an output capacitance of 360 picofarads (pf), an area of ​​13.8 mm 2 and a resistance of 0.2 ohms. The on-resistance is 2.76 ohms / mm 2 It is calculated as follows.

[0011] The use of superjunction devices instead of vertical devices can offer many advantages. For a superjunction device with the same breakdown voltage as the vertical MOSFETs described above, the superjunction device can be constructed using a smaller area, which reduces the overall on-resistance and reduces switching losses during each turn-off event. In one example, the superjunction device is 8.0 mm 2 and a resistance of 0.2 ohms. The on-resistance is 1.6 ohms / mm 2 which is a 42 percent reduction in on-resistance compared to the planar vertical device.

[0012] The superjunction devices of the present disclosure may be formed in vertical columns of trenches etched into a silicon surface. The formation of the vertical columns involves closely spaced P and N columns of substantially equal doping concentration to achieve charge balance. The positive charge from the P columns and the negative charge from the N columns provide a net charge of zero in the drift region. The charge balance provided by the P and N columns is important to generate a constant electric field to maximize the breakdown voltage of the superjunction device. The high doping concentration in the N columns allows for a reduction in resistivity Ron for a targeted breakdown voltage.

[0013] Additionally, the trenches may be filled with a semi-insulating material, such as semi-insulating polycrystalline silicon (SIPOS) or another equivalent insulating material, to provide high voltage resistance between the source and drain to further aid in charge balance. Since the vertical electric field in a semi-insulating resistor is assumed to be approximately constant, the isolated resistor may help provide a constant electric field across the superjunction device.

[0014] The superjunction device includes a trench filled with oxide. In one example, a superjunction device may be constructed with a U-shaped trench. However, if voids form in the trench due to non-uniform filling of the trench with oxide, the performance and reliability of the superjunction device may be degraded. The voids may adversely affect the reliability of the device due to the presence of mobile charges that may move in high electric fields during the off-state. As described below, if the trench is V-shaped instead of U-shaped, a superjunction vertical transistor device may be formed that reduces the formation of voids when filling the trench with oxide.

[0015] 1 illustrates an example of a process for forming a superjunction device using an implantation hardmask according to an embodiment of the present disclosure. The superjunction device 100 includes a substrate 102, an N-type epitaxial layer 108, a first type of vertical column 110, a second type of vertical column 111, an implantation hardmask layer 120, and an optional screen oxide layer 123.

[0016] To form the superjunction device structure 100, an N-type substrate 102 may be used, and an N-type epitaxial layer 108 may be formed on the N-type substrate 102. A hard mask layer 120 may then be formed over the epitaxial layer N-type layer. A trench is etched in the N-type epitaxial layer 108 with a slope angle. In one example, the trench angle may be between 85 degrees and 95 degrees. A trench angle of less than 90 degrees may be formed for a V-trench. Using implantation 122 and diffusion, a first type of vertical column 110 is formed adjacent to the trench. Similarly, using implantation 122 and diffusion, a second type of vertical column 111 is formed adjacent to the first vertical column 110. The first vertical column 110 may be a P-type semiconductor, and the second vertical column 111 may be an N-type semiconductor. It is understood that in other examples, the first vertical columns 110 can be an N-type semiconductor and the second vertical columns 111 can be a P-type semiconductor. The implant doses of the first and second vertical columns are approximately equal to provide charge compensation. The implantation and diffusion may include boron and Zn as part of the formation of the first type vertical columns or the second type vertical columns. Phosphate may include.

[0017] FIG. 2 illustrates an example of a superjunction device including a V-trench according to an embodiment of the present disclosure. It is understood that the elements referred to in FIG. 2 may be examples of elements in FIG. 1, and that similarly named and numbered elements referenced below are coupled and function similarly as described above. The superjunction device 200 includes a substrate layer 202, a P+ layer 204, an epitaxial layer 208, a first vertical column 210, a second vertical column 211, a source contact 214, a p-type body region 212, a gate oxide 216, a gate contact 218, and a source electrode 219. The substrate layer 202 may include a silicon material and is above the drain contact 203. The epitaxial layer is formed above the substrate layer 202. The P+ layer 204 is formed by P-type implantation at the bottom of the superjunction device 200 and is above the epitaxial layer 208. As described above, the first vertical column 210 and the second vertical column 211 are formed by implantation and diffusion. A trench is formed and filled with an insulating material 206. The insulating material 206 may be an oxide such as tetrathoxysilane (TEOS), thermal oxide, borophosphosilicate glass (BPSG), or nondoped silica glass (NSG). The angle of the trench may be between 85 degrees and 95 degrees. In FIG. 2, a V-shaped trench is preferred, which allows the insulating material to be filled without voids and allows the first vertical column 210 and the second vertical column 211 regions to be formed by vertical (zero degree) implantation. A P-type body region 212 is coupled to a source contact 214. A gate oxide 216 is deposited above the epitaxial layer 208. A gate 218 is formed above the gate oxide. In another example, a gate 218 may be formed in the trench. A source electrode 219 may be formed above the source contact 214. In addition, an insulating layer (not shown) may be formed above the gate 218.

[0018] FIG. 3A shows another example of a superjunction device including a trench and a DMOS gate according to an embodiment of the present disclosure. It is understood that the elements referred to in FIG. 3A may be an example of elements of the previous figures, and that similarly named and numbered elements referenced below are coupled and function similarly to those described above. FIGS. 3A-6B show several embodiments of a superjunction device using a vertical trench that allows for filling of insulating material without voids. The superjunction 300 includes similar elements to the previous figures. The difference is that a channel under the gate 318 couples the source contact 314 to the first vertical column 310.

[0019] Figure 3B shows a plan view of the superjunction device of Figures 2 and 3A. The plan view of the superjunction device shows insulating material 306, epitaxial layer 308, second vertical column 311, P body 312, N+ source 314, and gate 318. The channel below gate 318 couples to N- epitaxial layer 308 (as shown in Figure 2) and to the N-type column (as shown in Figure 3A).

[0020] FIG. 4A shows another example of a superjunction device including a trench and a UMOS gate according to an embodiment of the present disclosure. It is understood that the elements referred to in FIG. 4A may be an example of elements of the previous figures, and that similarly named and numbered elements referenced below are similarly coupled and function as described above. The superjunction device 400 includes similar elements to the previous figures. The difference is that the gate 418 is a UMOS gate.

[0021] Figure 4B shows a plan view of the superjunction device of Figure 4A. The plan view of the superjunction device shows the insulating material 406, the epitaxial layer 408, the P body 412, the N+ source 414, and the gate 418. The dotted areas indicate channels that couple the source contact 414 to the first vertical column 410.

[0022] Figure 4C shows a cross section through the channel of the superjunction device in Figure 4A, illustrating how electrons traverse the superjunction device from the source 419 to the N+ source 414, and further (when a voltage is applied to the gate 418) to the first vertical column 410, and further to the substrate 402 and the drain.

[0023] FIG. 5A illustrates a superjunction device including a trench and a DMOS gate according to an embodiment of the present disclosure. It is understood that the elements illustrated in FIG. 5A may be an example of elements of the previous figures, and that similarly named and numbered elements referenced below are coupled and function similarly to those described above. FIG. 5B illustrates a top view of the superjunction device in FIG. 5A according to an embodiment of the present disclosure. The figure shows that a channel below the gate 518 couples a source contact 514 to a first vertical column 510.

[0024] FIG 6A shows another example of a superjunction device including a UMOS gate according to an embodiment of the present disclosure. It is understood that the elements shown in FIG 6A may be an example of elements of the previous figures, and that similarly named and numbered elements referenced below are similarly coupled and function similarly to those described above. FIG 6B shows a top view of the superjunction device in FIG 6A according to an embodiment of the present disclosure.

[0025] FIG. 7A illustrates another example of a superjunction device including an isolated resistor according to an embodiment of the present disclosure. It is understood that the elements illustrated in FIG. 7A may be an example of elements of the previous figures, and that similarly named and numbered elements referenced below are coupled and function similarly as described above. As described above, the vertical trench may be filled with a semi-insulating material 734, such as semi-insulating polycrystalline silicon (SIPOS) or another equivalent insulating material, to provide a high voltage tolerant path between the source and drain to further aid in charge balance. The superjunction device 700 includes a substrate layer 702, an epitaxial layer 708, a first vertical column 710, a second vertical column 711, a source contact 714, a P-type body region 712, a gate oxide 716, a gate contact 718, a source electrode 719, and a semi-insulating material 734. The substrate layer 702 may include a silicon material and is above the drain contact 703. A semi-insulating material 734 may be deposited in the trench and bonded to the bottom of the epitaxial layer 708 or the bottom of the substrate layer 702 to provide a nearly constant electric field. The semi-insulating material 734 acting as an isolated resistor may help provide a nearly constant electric field across the superjunction device since the electric field is assumed to be nearly constant in an isolated resistor. A further advantage is that it provides a higher tolerance to charge imbalance. The epitaxial layer 708 is formed above the substrate layer 702. As described above, the first vertical column 710 and the second vertical column 711 are formed by implantation and diffusion. The trench is filled with an insulating material 706. The insulating material 706 may be an oxide such as tetraoxysilane (TEOS), thermal oxide, borophosphosilicate glass (BPSG), or non-doped silica glass (NSG). The angle of the trench may be between 85 degrees and 95 degrees. 7A, the trench is substantially V-shaped, which allows the insulating material to be filled without voids and allows the regions of first vertical column 710 and second vertical column 711 to be formed by vertical (zero degree) implantation. A source contact 714 is coupled to the first vertical column 710 and the second vertical column 711.P-type body region 712 is coupled to a source contact 714. A gate oxide 716 is formed above the source contact 714 and the epitaxial layer 708. A gate 718 is formed above the gate oxide. In another example, the gate 718 may be formed in a trench. A source electrode 719 is formed above the source contact 714. Additionally, a passivation layer (not shown) may be formed above the gate 718.

[0026] Figure 7B shows a top view of the superjunction device of Figure 7A. The top view of the superjunction device shows insulating material 706, epitaxial layer 708, second vertical column 711, P-type body region 712, N+ source 714, gate 718, and semi-insulating layer 734.

[0027] FIG. 8A shows another example of a superjunction device including a trench and semi-insulating material according to an embodiment of the present disclosure. It is understood that the elements referred to in FIG. 8A may be an example of elements of the previous figures, and that similarly named and numbered elements referenced below are connected and function similarly to those described above. FIGS. 7A-12B show some embodiments of a superjunction device that uses a vertical trench to allow filling of insulating material without voids, and further includes semi-insulating material. The superjunction device 800 includes similar elements to the previous figures. The difference is that the semi-insulating material is V-shaped.

[0028] Figure 8B shows a top view of the superjunction device of Figure 8A. The top view of the superjunction device shows insulating material 806, epitaxial layer 808, second vertical column 811, P-type body region 812, N+ source 814, gate 818, and semi-insulating layer 834.

[0029] 9A shows another example of a superjunction device including a trench and a semi-insulating material according to an embodiment of the present disclosure. It is understood that the elements referred to in FIG. 9A may be an example of elements of the previous figures, and that similarly named and numbered elements referenced below are coupled and function similarly to those described above. The superjunction device 900 includes similar elements to the previous figures. The difference is that a semi-insulating material 934 is coupled to the epitaxial layer 908.

[0030] Figure 9B shows a top view of the superjunction device of Figure 9A. The top view of the superjunction device shows insulating material 906, epitaxial layer 908, second vertical column 911, P-type body region 912, N+ source 914, gate 918, and semi-insulating layer 934.

[0031] 10A illustrates another example of a superjunction device including a UMOS gate and semi-insulating material according to an embodiment of the present disclosure. It is understood that the elements illustrated in FIG. 10A may be an example of elements of the previous figures, and that similarly named and numbered elements referenced below are coupled and function similarly to those described above. The superjunction device 1000 includes similar elements to the previous figures. The difference is that the semi-insulating material 1034 is coupled to the P+ layer 1004.

[0032] Figure 10B shows a top view of the superjunction device of Figure 10A. The top view of the superjunction device shows insulating material 1006, epitaxial layer 1008, second vertical column 1011, P-type body region 1012, N+ source 1014, gate 1018, and semi-insulating layer 1034.

[0033] 11A illustrates a superjunction device including a trench, a DMOS gate, and a semi-insulating material according to an embodiment of the present disclosure, it being understood that the elements illustrated in FIG 11A may be an example of elements of previous figures, and that similarly named and numbered elements referenced below are similarly coupled and function similarly to those described above.

[0034] 12A illustrates another example of a superjunction device including a UMOS gate and semi-insulating material according to an embodiment of the present disclosure. It is understood that the elements illustrated in FIG. 12A may be an example of elements of the previous figures, and that similarly named and numbered elements referenced below are similarly coupled and function similarly to those described above.

[0035] FIG. 12B shows a top view of the superjunction device in FIG. 12A according to an embodiment of the present disclosure.

[0036] The above description of examples shown for the present invention, including those matters described in the Abstract, is not intended to be exhaustive or to be limited to the precise forms disclosed. While specific embodiments and examples of the present invention are described herein for illustrative purposes, various equivalent modifications are possible without departing from the broader spirit and scope of the present invention. Indeed, it will be understood that specific and exemplary voltages, currents, frequencies, power range values, times, and the like are presented for purposes of illustration, and that other values ​​may be used in other embodiments and examples in accordance with the teachings of the present invention.

[0037] While the present invention is defined in the claims, it should be understood that the invention can alternatively be defined by the following examples.

[0038] Example 1: depositing an epitaxial N-type layer over an N-type substrate; depositing a hard mask layer over the epitaxial N-type layer; etching a trench in the epitaxial N-type layer with a sloped angle; forming a first vertical column proximate the trench by implantation and diffusion; forming a second vertical column proximate the first vertical column by implantation and diffusion; filling the trench with an insulating material to avoid the formation of a keyhole; and performing chemical-mechanical planarization (CMP) to remove the insulating material over the first vertical column, the second vertical column, and the epitaxial N-type layer. 1. A method of forming a superjunction device structure comprising: performing a gate mask (gate mask) over a semiconductor substrate (substrate) to form a gate oxide and a polysilicon layer; depositing a gate oxide and a polysilicon layer; etching the gate oxide and the polysilicon layer using a gate mask over the polysilicon layer to form a gate; implanting a source contact under the gate oxide; implanting a P-type body region under the source contact; forming a source electrode and a gate contact; and forming a drain contact under an N-type substrate.

[0039] Example 2: The method of example 1, further comprising depositing a semi-insulating material in the trench to provide a substantially constant electric field.

[0040] Example 3: The method of any one of the previous examples, further comprising etching the trench at an angle between 85 degrees and 95 degrees.

[0041] Example 4: The method of any one of the previous examples, wherein the first vertical column is a P-type semiconductor and the second vertical column is an N-type semiconductor.

[0042] Example 5: The method of any one of the preceding examples, wherein the injection volume of the first vertical column and the injection volume of the second vertical column are approximately equal.

[0043] Example 6: The method of any one of the preceding examples, wherein the injection volume of the first vertical column and the injection volume of the second vertical column are approximately equal.

[0044] Example 7: As part of the first vertical column or the second vertical column Phosphate The method of any one of the preceding examples, further comprising injecting and diffusing.

[0045] Example 8: The method of any one of the previous examples, further comprising depositing a channel mask and implanting a top of the p-type body region to adjust the threshold voltage.

[0046] Example 9: A superjunction device comprising: a drain contact, a substrate layer above the drain contact, an epitaxial layer above the substrate layer, a P+ layer above the epitaxial layer formed by a P-type implant to a bottom of the superjunction device, and a trench with a slope angle formed by use of a hard mask layer, the trench being filled with an insulating material, a first vertical column formed proximate to the trench, a second vertical column formed proximate to the first vertical column, a source contact coupled to the first vertical column and the second vertical column, a P-type body region coupled to the source contact, a gate oxide formed above the source contact and the epitaxial layer, and a gate formed above the gate oxide.

[0047] Example 10: The superjunction device of example 9, wherein the trench extends to the substrate layer.

[0048] Example 11: A superjunction device as described in any one of the preceding examples, further comprising a semi-insulating material deposited in the trench, the semi-insulating material bonded to a source contact on top of the epitaxial layer or bonded to the substrate layer.

[0049] Example 12: A superjunction device as described in any one of the previous examples, wherein the semi-insulating material forms a u-shape within the trench, the semi-insulating material is bonded to a source contact on top of the epitaxial layer or is bonded to a substrate layer.

[0050] Example 13: The superjunction device of any one of the preceding examples, further comprising an epitaxial buffer layer formed between the substrate layer and the bottom of the trench.

[0051] Example 14: The superjunction device of any one of the preceding examples, wherein the first vertical column is a P-type semiconductor and the second vertical column is an N-type semiconductor.

[0052] Example 15: The superjunction device of any one of the preceding examples, wherein the first vertical column is an N-type semiconductor and the second vertical column is a P-type semiconductor.

[0053] Example 16: The superjunction device of any one of the previous examples, wherein the gate is a DMOS gate.

[0054] Example 17: The superjunction device of any one of the previous examples, wherein the gate is a UMOS gate.

[0055] Example 18: The superjunction device of any one of the preceding examples, wherein the slope angle of the trench is between 85 degrees and 95 degrees.

[0056] Example 19: The superjunction device of any one of the preceding examples, further comprising a passivation layer formed over the gate.

[0057] Example 20: The superjunction device of any one of the preceding examples, wherein the gate is formed in a trench.

[0058] Example 21: The superjunction device of any one of the preceding examples, wherein the trench is V-shaped to allow the trench to be filled with oxide without voids and to allow the two column regions to be formed by vertical substantially zero degree implantation. (Additional note 1) depositing an epitaxial N-type layer over an N-type substrate; depositing a hard mask layer over the epitaxial N-type layer; Etching a trench in the epitaxial N-type layer with a slope angle; forming a first vertical column adjacent to the trench by implantation and diffusion; forming a second vertical column adjacent to the first vertical column by implantation and diffusion; filling the trench with an insulating material such that formation of a keyhole is avoided; performing a chemical mechanical planarization (CMP) to remove the insulating material above the first vertical columns, the second vertical columns, and the epitaxial N-type layer; depositing a gate oxide and a polysilicon layer; Etching the gate oxide and the polysilicon layer using a gate mask over the polysilicon layer to form a gate; recessing a source contact below said gate oxide; recessing a P-type body region beneath the source contact; forming a source electrode and a gate contact; forming a drain contact below the N-type substrate; 16. A method for forming a superjunction device structure comprising: (Additional note 2) and depositing a semi-insulating material in the trench to provide a substantially constant electric field. The method according to claim 1. (Additional note 3) further comprising etching the trench at an angle between 85 degrees and 95 degrees. The method according to claim 1. (Additional note 4) the first vertical column is a P-type semiconductor; the second vertical column is an N-type semiconductor; The method according to claim 1. (Additional note 5) the injection amount of the first vertical column is approximately equal to the injection amount of the second vertical column; The method according to claim 4. (Additional note 6) further comprising implanting and diffusing boron as part of the first vertical column or the second vertical column. The method according to claim 1. (Additional note 7) further comprising injecting and diffusing phosphoric acid as part of the first vertical column or the second vertical column. The method according to claim 1. (Additional note 8) and depositing a channel mask and implanting an upper portion of the P-type body region to adjust a threshold voltage. The method according to claim 1. (Additional note 9) A superjunction device, comprising: A drain contact; a substrate layer overlying the drain contact; an epitaxial layer above the substrate layer; a P+ layer above the epitaxial layer formed by a P-type implant into the bottom of the superjunction device; a trench having a slope angle formed by use of a hard mask layer, the trench being filled with an insulating material; a first vertical column formed adjacent to the trench; a second vertical column formed adjacent to the first vertical column; a source contact coupled to the first vertical column and to the second vertical column; a P-type body region coupled to the source contact; a gate oxide formed over said source contact and said epitaxial layer; a gate formed above the gate oxide; A superjunction device comprising: (Additional note 10) The trench extends to the base layer. 10. The superjunction device according to claim 9. (Additional note 11) a semi-insulating material deposited in the trench; the semi-insulating material is bonded to the source contact on top of the epitaxial layer or to the substrate layer; 11. The superjunction device according to claim 10. (Additional note 12) the semi-insulating material forms a u-shape within the trench; the semi-insulating material is bonded to the source contact on the top of the epitaxial layer or to the substrate layer; 12. The superjunction device according to claim 11. (Additional note 13) further comprising an epitaxial buffer layer formed between the substrate layer and a bottom of the trench. 12. The superjunction device according to claim 11. (Additional note 14) the first vertical column is a P-type semiconductor; the second vertical column is an N-type semiconductor; 10. The superjunction device according to claim 9. (Additional note 15) the first vertical column is an N-type semiconductor; the second vertical column is a P-type semiconductor; 10. The superjunction device according to claim 9. (Additional note 16) The gate is a DMOS gate. 10. The superjunction device according to claim 9. (Additional note 17) The gate is a UMOS gate. 10. The superjunction device according to claim 9. (Additional note 18) the inclination angle of the trench is between 85 degrees and 95 degrees; 10. The superjunction device according to claim 9. (Additional note 19) a passivation layer formed over the gate. 10. The superjunction device according to claim 9. (Additional note 20) the gate is formed in the trench; Item 18. The superjunction device according to item 17. (Additional note 21) the trench is V-shaped to allow the trench to be filled with oxide without voids and to allow two columnar regions to be formed by vertical substantially zero degree implantation; 10. The superjunction device according to claim 9.

Claims

1. A method for forming a superjunction device structure, the method comprising: depositing an epitaxial N-type layer over an N-type substrate; depositing a hard mask layer over the epitaxial N-type layer; Etching a trench in the epitaxial N-type layer with a slope angle; forming an implanted and diffused layer of a first conductivity type by vertical implantation into a column adjacent the trench by implantation and diffusion through the hard mask layer; forming an implanted and diffused layer of a second conductivity type by vertical implantation into the column adjacent the implanted and diffused layer of the first conductivity type by implantation through the hard mask layer, wherein dopants in the layer of the first conductivity type and the layer of the second conductivity type are charge balanced; filling the trench with an insulating material; performing a chemical mechanical planarization (CMP) to remove insulating material above the layer of first conductivity type, the layer of second conductivity type, and the epitaxial N-type layer; depositing a gate oxide and a polysilicon layer; Etching the gate oxide and the polysilicon layer using a gate mask over the polysilicon layer to form a gate; recessing a source below said gate oxide; embedding a P-type body region below the source; forming a source electrode and a gate contact; forming a drain contact below the N-type substrate; 16. A method for forming a superjunction device structure comprising:

2. The method of claim 1, further comprising depositing a semi-insulating material in the trench. The method of claim 1.

3. The layer of the first conductivity type is a P-type semiconductor; the layer of the second conductivity type is an N-type semiconductor; The method of claim 1.

4. The amount of implantation of the first conductivity type layer is equal to the amount of implantation of the second conductivity type layer. The method according to claim 3.

5. The method of claim 1, further comprising injecting and diffusing boron as part of the layer of the first conductivity type or the layer of the second conductivity type. The method of claim 1.

6. The method of claim 1, further comprising injecting and diffusing phosphorus as part of the layer of the first conductivity type or the layer of the second conductivity type. The method of claim 1.

7. depositing a channel mask and implanting an upper portion of the P-type body region to adjust a threshold voltage. The method of claim 1.

8. A superjunction device, comprising: A drain contact; a substrate layer overlying the drain contact; an epitaxial layer above the substrate layer; a P+ layer above the substrate layer formed by a P-type implant into the bottom of the superjunction device trench; a trench having an inclined angle, the trench being filled with an insulating material, the trench extending to the substrate layer; an implanted and diffused layer of a first conductivity type formed in a column adjacent to the trench; an implanted and diffused layer of a second conductivity type formed in the column adjacent to the layer of the first conductivity type, the dopants in the layer of the first conductivity type and the layer of the second conductivity type being charge balanced; and a source coupled to the layer of the first conductivity type and to the layer of the second conductivity type; a P-type body region coupled to the source; a gate oxide formed over the source and the epitaxial layer; a gate formed above the gate oxide; A superjunction device comprising:

9. a semi-insulating material deposited in the trench; the semi-insulating material is bonded to a source contact on top of the epitaxial layer or to the substrate layer; The superjunction device of claim 8.

10. the semi-insulating material forms a u-shape within the trench; the semi-insulating material is bonded to the source at the top of the epitaxial layer or to the substrate layer; The superjunction device of claim 9.

11. further comprising an epitaxial buffer layer formed between the substrate layer and a bottom of the trench. The superjunction device of claim 9.

12. The method of claim 11, wherein the layer of the first conductivity type is a P-type semiconductor; the layer of the second conductivity type is an N-type semiconductor; The superjunction device of claim 8.

13. The method of claim 12, wherein the layer of the first conductivity type is an N-type semiconductor; the layer of the second conductivity type is a P-type semiconductor; The superjunction device of claim 8.

14. the gate is a DMOS gate; The superjunction device of claim 8.

15. The gate is a UMOS gate. The superjunction device of claim 8.

16. a passivation layer formed over the gate. The superjunction device of claim 8.

17. the gate is formed in the trench; 16. The superjunction device of claim 15.

18. The method of claim 17, wherein the trench is V-shaped. The superjunction device of claim 8.

Images