Exposure method and exposure apparatus

Abstract

To cause an exposure head to emit light to an appropriate position on a substrate mounted on a stage by ensuring straightness in driving the stage in a main scanning direction with a drive mechanism.SOLUTION: A stage 2 is driven in a Y direction by a stage driving mechanism 3, so that the stage 2 moves in an exposure movement range Ye in the Y direction, and a substrate We passes an irradiation range Re in the Y direction. In parallel with a first main scanning driving, an exposure head 41 is caused to emit light to the irradiation range Re, so that a stripe region Rs extending in the Y direction in the substrate We is exposed. On the basis of a straight correction table Ts indicating an X-direction correction amount for correcting the position of the stage 2 in an X direction according to the position of the stage 2 in the Y direction in the exposure movement range Ye, the position of the stage 2 in the X direction during the execution of the first main scanning driving is corrected by the stage driving mechanism 3.SELECTED DRAWING: Figure 5A

Description

[Technical field]

[0001] The present invention relates to a technique for exposing a substrate, such as a semiconductor wafer or a glass substrate, to light in order to form a pattern on the substrate. [Background technology]

[0002] Patent documents 1 and 2 describe an exposure device that draws a pattern extending in the main scanning direction on a substrate (photosensitive material, substrate to be exposed) by irradiating light from an exposure head onto the photosensitive material while moving a stage on which the substrate is placed in the main scanning direction. In such an exposure device, there are cases where misalignment occurs between the stage and the exposure head, making it impossible to irradiate light onto the appropriate position on the photosensitive material. Therefore, Patent documents 1 and 2 address this issue by adjusting the pattern of light irradiated from the exposure head.

[0003] Furthermore, Patent Document 2 focuses on stage yawing. In particular, it has been pointed out that a method of eliminating the effects of yawing by controlling the stage position based on the results of measuring the stage yawing with a laser displacement meter has a problem in that it is necessary to equip the device with an expensive laser displacement meter. Therefore, Patent Document 2 adopts a software method of correcting the data given to the exposure head to adjust the light pattern, rather than a hardware method of controlling the stage position. [Prior art documents] [Patent documents]

[0004] [Patent Document 1] JP 2007-114468 A [Patent Document 2] JP 2010-113001 A Summary of the Invention [Problem to be solved by the invention]

[0005] However, in order to reliably eliminate the influence of the misalignment between the stage and the exposure head on the exposure position, the above-mentioned software method has limitations, and it is necessary to suppress the misalignment between the stage and the exposure head itself by hardware. In particular, according to research and development by the inventor of the present application, it is important to ensure the straightness of the stage in the main scanning direction. This situation is also the same in an apparatus that exposes a substrate on a fixed stage while driving an exposure head in the main scanning direction. In contrast, in Patent Documents 1 and 2, no consideration is given to straightness.

[0006] This invention has been made in consideration of the above-mentioned problems, and aims to provide technology that ensures straightness when a driven object such as a stage or exposure head is driven in the main scanning direction by a driving mechanism, and enables light to be irradiated from the exposure head to an appropriate position on a substrate placed on the stage. [Means for solving the problem]

[0007] The exposure method of the present invention includes the steps of: performing a first main scanning drive in which one of the driven objects, either the stage on which the substrate is placed or the exposure head that irradiates light onto the irradiation range, is driven in the main scanning direction by a driving mechanism, so that the driven object moves through a first moving range in the main scanning direction and the substrate passes through the irradiation range relatively in the main scanning direction; performing a first straightness correction operation in which the position of the driven object in the sub-scanning direction is corrected by the driving mechanism while the first main scanning drive is being performed, based on first straightness correction information indicating a first correction amount for correcting the position of the driven object in the sub-scanning direction according to the position of the driven object in the main scanning direction in the first moving range; and performing an exposure operation in which an area extending in the main scanning direction on the substrate is exposed by irradiating light from the exposure head onto the irradiation range while the first main scanning drive is being performed.

[0008] The exposure apparatus of the present invention includes a stage on which a substrate is placed, an exposure head which irradiates light onto an irradiation range, a drive mechanism which drives one of the stage and the exposure head as a drive object in the main scanning direction, a memory unit which stores first straightness correction information indicating a first correction amount for correcting the position of the drive object in the sub-scanning direction depending on the position of the drive object in the main scanning direction in a first movement range in the main scanning direction, and a control unit which performs an exposure operation to expose an area extending in the main scanning direction on the substrate by irradiating light onto the irradiation range from the exposure head while performing a first main scanning drive in which the drive object moves through the first movement range by driving the drive object in the main scanning direction using the drive mechanism and the substrate passes through the irradiation range relatively in the main scanning direction, and the control unit performs a first straightness correction operation in which the position of the drive object in the sub-scanning direction is corrected by the drive mechanism during the execution of the first main scanning drive based on the first straightness correction information.

[0009] In the present invention (exposure method and exposure apparatus) configured as described above, one of the driving targets, the stage and the exposure head, is driven in the main scanning direction by the driving mechanism, so that the driving target moves in a first movement range in the main scanning direction, and the substrate passes through the irradiation range relatively in the main scanning direction (first main scanning drive). Then, in parallel with the first main scanning drive, the exposure head irradiates the irradiation range with light, thereby exposing an area extending in the main scanning direction on the substrate (exposure operation). In particular, based on first straightness correction information indicating a first correction amount for correcting the position of the driving target in the sub-scanning direction according to the position of the driving target in the main scanning direction in the first movement range, the position of the driving target in the sub-scanning direction during the execution of the first main scanning drive is corrected by the driving mechanism (first straightness correction operation). As a result, it is possible to irradiate light from the exposure head to an appropriate position on the substrate placed on the stage, while ensuring straightness when the driving mechanism drives the driving target, such as the stage or the exposure head, in the main scanning direction.

[0010] The exposure method may further include a step of performing a correction information creating operation to create first straightness correction information based on a result of determining a position in the sub-scanning direction of the driven object that moves in the main scanning direction in the first movement range by the drive mechanism, and the first straightness correction operation may correct the position in the sub-scanning direction of the driven object based on the first straightness correction information created in the correction information creating operation. In this configuration, the first straightness correction information is created based on the result of determining the position in the sub-scanning direction of the driven object that moves in the main scanning direction in the first movement range by the drive mechanism, i.e., the result of determining the straightness in advance (correction information creating operation). Then, when performing an exposure operation while performing the first main scanning drive, the straightness of the driven object can be guaranteed based on the first straightness correction information thus created.

[0011] In addition, the exposure method may be configured such that in the correction information creation operation, the first straightness correction information is created based on the result of measuring the position in the sub-scanning direction of the driven object moving in the main scanning direction in the first movement range by a laser interferometer. With this configuration, the straightness of the driven object can be easily obtained by measurement with the laser interferometer.

[0012] The present invention also includes a step of performing a second main scanning drive in which a stage on which a test substrate having a reference mark is placed is driven in the main scanning direction by a drive mechanism, so that the stage moves in a second movement range in the main scanning direction and the test substrate passes through an imaging range of a camera in the main scanning direction; a step of capturing an image of the reference mark passing through the imaging range during the second main scanning drive by the camera to obtain a reference mark image; and a step of acquiring second straightness correction information indicating a second correction amount for correcting the position of the stage in the sub-scanning direction in accordance with the position of the stage in the main scanning direction in the second movement range, based on the position in the sub-scanning direction of the reference mark indicated by the reference mark image. The exposure method may be configured so that the correction information creating operation performs the following steps: creating the first straightness correction information based on the first straightness correction information, drawing an exposure mark on the test substrate by irradiating light from the exposure head onto the test substrate passing through the irradiation range while performing the first main scanning drive, capturing an image of the exposure mark passing through the imaging range with a camera while correcting the position of the stage in the sub-scanning direction based on the second main scanning drive, and acquiring an exposure mark image, and creating the first straightness correction information based on the result of determining the position of the stage in the sub-scanning direction moving through the first movement range based on the position of the exposure mark in the sub-scanning direction indicated by the exposure mark image. With this configuration, the straightness of the driven object can be obtained without using an expensive laser interferometer.

[0013] The exposure method may also include a step of detecting the position of the driven object in the main scanning direction by a position detection unit and transmitting the detected position to an imaging timing control unit that controls the timing of imaging by the camera, and a step of imaging the alignment mark of the substrate by the imaging timing control unit causing the camera to perform imaging at a timing according to the position of the driven object in the main scanning direction received from the position detection unit, the position detection unit and the imaging timing control unit being provided in the same integrated circuit. In this configuration, since the position detection unit and the imaging timing control unit are provided in the same integrated circuit, the position of the driven object in the main scanning direction can be transmitted to the imaging timing control unit while suppressing communication delay from the position detection unit to the imaging timing control unit. Therefore, imaging by the camera can be performed at an appropriate timing according to the position of the driven object.

[0014] The exposure method may further include a step of detecting the position of the driven object in the main scanning direction by a position detection unit and transmitting the detected position to a correction timing control unit that controls the execution timing of the first straightening operation by the driving mechanism, and the correction timing control unit causes the driving mechanism to execute the first straightening operation at a timing according to the position of the driven object in the main scanning direction received from the position detection unit, and the position detection unit and the correction timing control unit are provided in the same integrated circuit. In this configuration, since the position detection unit and the correction timing control unit are provided in the same integrated circuit, the position of the driven object in the main scanning direction can be transmitted to the correction timing control unit while suppressing communication delays from the position detection unit to the correction timing control unit. Therefore, the position of the driven object in the sub-scanning direction can be corrected at an appropriate timing according to the position of the driven object.

[0015] Meanwhile, a plurality of different exposure positions in the sub-scanning direction are set for the substrate, and a wide range can be exposed by repeating the first main scanning drive, the first straightness correction operation, and the exposure operation while changing the position of the driven object by the drive mechanism between the plurality of different sub-scanning positions in the sub-scanning direction that correspond to the plurality of exposure positions. However, when the position of the driven object (sub-scanning position) changes in the sub-scanning direction, the balance of the weight applied from the stage to the drive mechanism changes. Therefore, it may be difficult to guarantee the straightness of the driven object at each of the plurality of sub-scanning positions by a single first straightness correction information.

[0016] Therefore, the exposure method may be configured such that the first straightness correction information is provided for each of the multiple sub-scanning positions, and in the first straightness correction operation, the position of the driven object in the sub-scanning direction is corrected based on the first straightness correction information provided for the sub-scanning position where the driven object is located. With this configuration, it is possible to ensure the straightness of the driven object at each of the multiple sub-scanning positions.

[0017] Alternatively, the exposure method may be configured such that the first straightness correction information is provided for each of a plurality of different set positions in the sub-scanning direction, the plurality of set positions is less than the plurality of sub-scanning positions, and in the first straightness correction operation, the position of the driven object in the sub-scanning direction is corrected based on the first straightness correction information provided for the set position closest to the sub-scanning position where the driven object is located among the plurality of set positions, or by linear interpolation using the first straightness correction information provided for the set position closest to the sub-scanning position where the driven object is located and the first straightness correction information provided for the set position second closest to the sub-scanning position where the driven object is located. With such a configuration, it is possible to ensure the straightness of the driven object at each of the plurality of sub-scanning positions while suppressing memory resources required for storing the first straightness correction information. Effect of the Invention

[0018] As described above, according to the present invention, it is possible to ensure straightness when driving a driven object such as a stage or an exposure head in the main scanning direction by a driving mechanism, and to irradiate light from the exposure head to an appropriate position on a substrate placed on the stage. [Brief description of the drawings]

[0019] [Figure 1] FIG. 1 is a front view showing a schematic configuration of an exposure apparatus according to the present invention. [Diagram 2] FIG. 2 is a block diagram showing an example of the electrical configuration of the exposure apparatus in FIG. [Diagram 3] FIG. 2 is a perspective view illustrating an example of a position measuring device that measures the position of a stage by a laser interferometer. [Figure 4] FIG. 4 is a block diagram showing an example of a detailed configuration of a control unit that executes an alignment mark obtaining operation and an exposure operation. [Figure 5A] FIG. 4 is a diagram showing an example of a straightness correction table. [Figure 5B] FIG. 4 is a diagram showing an example of a yawing correction table. [Figure 6] 11 is a flowchart showing an example of an alignment mark obtaining operation and an exposure operation. [Figure 7] 7 is a side view showing typically the operation of the exposure apparatus which is executed according to the flowchart in FIG. 6. [Figure 8] FIG. 7 is a diagram showing an example of a substrate on which the flowchart of FIG. 6 is executed; [Figure 9] 6 is a flowchart showing an example of a method for creating a yawing correction table. [Figure 10] 11 is a flowchart showing an example of a method for creating a straightness correction table. [Figure 11A] 11A to 11C are diagrams illustrating operations executed in creating the straightness correction table in FIG. 10 . [Figure 11B] 11A to 11C are diagrams illustrating operations executed in creating the straightness correction table in FIG. 10 . [Figure 12] 11A to 11C are diagrams illustrating operations executed in creating the straightness correction table in FIG. 10 . [Figure 13] FIG. 11 is a block diagram showing a configuration for executing another example of a method for creating a straightness correction table. [Figure 14] FIG. 13 is a perspective view showing a configuration for executing another example of a method for creating a straightness correction table. DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS

[0020] Fig. 1 is a front view showing a schematic configuration of an exposure apparatus according to the present invention, and Fig. 2 is a block diagram showing an example of an electrical configuration of the exposure apparatus of Fig. 1. In Fig. 1 and the following figures, the X direction which is the horizontal direction, the Y direction which is the horizontal direction perpendicular to the X direction, the Z direction which is the vertical direction, and the rotation direction θ (yaw direction) around a rotation axis parallel to the Z direction are shown as appropriate.

[0021] The exposure device 1 draws a pattern on a substrate We (substrate to be exposed) on which a layer of a photosensitive material such as resist is formed, by irradiating the substrate We with a laser beam of a predetermined pattern. As the substrate We, various substrates such as a semiconductor substrate, a printed circuit board, a substrate for a color filter, a glass substrate for a flat panel display provided in a liquid crystal display device or a plasma display device, and a substrate for an optical disk can be used.

[0022] The exposure apparatus 1 includes a main body 11, which is composed of a main body frame 111 and a cover panel (not shown) attached to the main body frame 111. Various components of the exposure apparatus 1 are disposed both inside and outside the main body 11.

[0023] The inside of the main body 11 of the exposure apparatus 1 is divided into a processing region 112 and a transfer region 113. In the processing region 112, mainly, a stage 2, a stage driving mechanism 3, an exposure unit 4, and an alignment unit 5 are arranged. In addition, an illumination unit 6 that supplies illumination light to the alignment unit 5 is arranged outside the main body 11. In the transfer region 113, a transport device 7 such as a transport robot that transports the substrate We into and out of the processing region 112 is arranged. Furthermore, a control unit 8 is arranged inside the main body 11, and the control unit 8 is electrically connected to each part of the exposure apparatus 1 and controls the operation of each of these parts.

[0024] Outside the main body 11 of the exposure apparatus 1, a cassette placement part 114 for placing a cassette C is disposed at a position adjacent to the transfer area 113. The transport device 7 disposed in the transfer area 113 inside the main body 11 corresponding to this cassette placement part 114 takes out the unprocessed substrate We contained in the cassette C placed on the cassette placement part 114 and carries it (loads it) into the processing area 112, and also carries out (unloads) the processed substrate We from the processing area 112 and stores it in the cassette C. The transfer of the cassette C to and from the cassette placement part 114 is performed by an external transport device (not shown). The loading of the unprocessed substrate We and the unloading of the processed substrate We are performed by the transport device 7 in response to instructions from the control unit 8.

[0025] The stage 2 has a flat plate-like outer shape and horizontally holds the substrate We placed on its upper surface. A plurality of suction holes (not shown) are formed in the upper surface of the stage 2, and the substrate We placed on the stage 2 is fixed to the upper surface of the stage 2 by applying a negative pressure (suction pressure) to the suction holes. The stage 2 is driven by a stage driving mechanism 3.

[0026] The stage driving mechanism 3 is an XYZ-θ driving mechanism that moves the stage 2 in the Y direction (main scanning direction), X direction (sub-scanning direction), Z direction, and rotational direction θ (yaw direction). The stage driving mechanism 3 has a Y-axis robot 31 which is a single-axis robot extending in the Y direction, a table 32 which is driven in the Y direction by the Y-axis robot 31, an X-axis robot 33 which is a single-axis robot extending in the X direction on the upper surface of the table 32, a table 34 which is driven in the X direction by the X-axis robot 33, and a θ-axis robot 35 which drives the stage 2 supported on the upper surface of the table 34 in the rotational direction θ relative to the table 34.

[0027] Therefore, the stage driving mechanism 3 can drive the stage 2 in the Y direction by the Y-axis servo motor 311 of the Y-axis robot 31, drive the stage 2 in the X direction by the X-axis servo motor 331 of the X-axis robot 33, and drive the stage 2 in the rotation direction θ by the θ-axis servo motor 351 of the θ-axis robot 35. The stage driving mechanism 3 can also drive the stage 2 in the Z direction by the Z-axis robot, which is omitted in Fig. 1. The stage driving mechanism 3 moves the substrate We placed on the stage 2 by operating the Y-axis robot 31, the X-axis robot 33, the θ-axis robot 35, and the Z-axis robot in response to a command from the control unit 8.

[0028] The exposure unit 4 has an exposure head 41 arranged above the substrate We on the stage 2, and a light irradiation section 43 that irradiates the exposure head 41 with laser light. The light irradiation section 43 has a laser driving section 431, a laser oscillator 432, and an illumination optical system 433. The laser driving section 431 is operated to emit laser light from the laser oscillator 432, which is then irradiated onto the exposure head 41 via the illumination optical system 433. The exposure head 41 modulates the laser light irradiated from the light irradiation section 43 by a spatial light modulator, and illuminates the modulated laser light onto the substrate We moving directly below it. By exposing the substrate We to the laser light in this manner, a pattern is drawn on the substrate We (exposure operation).

[0029] The alignment unit 5 has an alignment camera 51 disposed above the substrate We on the stage 2. This alignment camera 51 has a lens barrel, an objective lens, and a CCD image sensor, and captures an image of an alignment mark provided on the top surface of the substrate We moving directly below it. The CCD image sensor provided in the alignment camera 51 is composed of, for example, an area image sensor (two-dimensional image sensor).

[0030] The illumination unit 6 is connected to the lens barrel of the alignment camera 51 via a fiber 61, and supplies illumination light to the alignment camera 51. The illumination light guided by the fiber 61 extending from the illumination unit 6 is guided to the upper surface of the substrate We via the lens barrel of the alignment camera 51, and the reflected light from the substrate We is incident on the CCD image sensor via the objective lens. In this way, the upper surface of the substrate We is imaged, and a captured image is obtained. The alignment camera 51 is electrically connected to the control unit 8, and obtains a captured image in response to an instruction from the control unit 8, and transmits the captured image to the control unit 8.

[0031] The control unit 8 acquires the position of the alignment mark indicated by the captured image captured by the alignment camera 51 (alignment mark acquisition operation). The control unit 8 also controls the exposure unit 4 based on the position of the alignment mark to adjust the pattern of the laser light irradiated from the exposure head 41 to the substrate We in the exposure operation. The control unit 8 then draws the pattern on the substrate We by irradiating the substrate We with the laser light modulated according to the pattern to be drawn from the exposure head 41.

[0032] Further, the exposure apparatus 1 is provided with a main PC (Personal Computer) 91, and image processing of the alignment marks is executed by the main PC 91. That is, the control unit 8 acquires the positions of the alignment marks calculated by the main PC 91 from the captured images of the alignment marks from the main PC 91. Furthermore, a position measuring device 92 that measures the position of the stage 2 by a laser interferometer can be detachably attached to the main body 11 of the exposure apparatus 1.

[0033] 3 is a perspective view showing a schematic example of a position measuring device that measures the position of a stage by a laser interferometer. The stage 2 moves in a movable range Yt in the Y direction, and the movable range Yt includes an alignment movement range Ya and an exposure movement range Ye. Here, the alignment movement range Ya is a range in which the stage 2 moves in the Y direction for an alignment mark acquisition operation, and the exposure movement range Ye is a range in which the stage 2 moves in the Y direction for an exposure operation. In this example, the alignment movement range Ya and the exposure movement range Ye partially overlap. However, they do not necessarily need to overlap.

[0034] The position measuring device 92 can measure the position of the stage 2 moving in the Y direction within the movable range Yt. The position measuring device 92 has two laser interferometers 921, 922 and two mirrors 923, 924 attached to the side surface of the stage 2 in the Y direction. The laser interferometers 921, 922 emit laser light parallel to the Y direction, and the mirrors 923, 924 are mirror surfaces perpendicular to the Y direction, and the two laser interferometers 921, 922 and the two mirrors 923, 924 face each other in the Y direction. The laser interferometer 921 emits laser light toward the mirror 923 and measures the position of the stage 2 in the Y direction based on the result of detecting the laser light reflected by the mirror 923, and the laser interferometer 922 emits laser light toward the mirror 924 and measures the position of the stage 2 in the Y direction based on the result of detecting the laser light reflected by the mirror 924.

[0035] In the position measuring instrument 92, the Y-axis laser length measuring instrument 92y is composed of a laser interferometer 921, and the Y-axis laser length measuring instrument 92y outputs the measurement result of the laser interferometer 921 to the control unit 8 as the position of the stage 2 in the Y direction. Also, the ΔY-axis laser length measuring instrument 92d is composed of a laser interferometer 921 and a laser interferometer 922, and the ΔY-axis laser length measuring instrument 92d outputs the tilt (in other words, the difference) between the position of the stage 2 in the Y direction measured by the laser interferometer 921 and the position of the stage 2 in the Y direction measured by the laser interferometer 922 to the control unit 8 as the amount of rotation in the rotation direction θ of the stage 2. Then, as will be described later in detail, the control unit 8 creates a yawing correction table Ty based on the result of measuring the position of the stage 2 by the position measuring instrument 92 (table creation operation).

[0036] 4 is a block diagram showing an example of a detailed configuration of a control unit that executes an alignment mark acquisition operation and an exposure operation. The control unit 8 has an integrated circuit 81, for example an FPGA (Field Programmable Gate Array), and a control board 85, for example, configured with a CPU (Central Processing Unit) and a memory.

[0037] The integrated circuit 81 has a Y-axis counter 811 that counts the output of the Y-axis encoder 312 provided on the Y-axis servo motor 311. Furthermore, the integrated circuit 81 has an imaging timing output unit 812, an exposure timing output unit 813, and an interrupt generation unit 814. The imaging timing output unit 812 provides the alignment camera 51 with imaging timing generated according to the Y-direction position of the stage 2 received from the Y-axis counter 811, and the alignment camera 51 captures an image at this imaging timing. The exposure timing output unit 813 provides the exposure head 41 with exposure timing generated according to the Y-direction position of the stage 2 indicated by the Y-axis counter 811, and the exposure head 41 performs exposure at this exposure timing. The interrupt generation unit 814 provides correction timing based on the straightness correction table Ts and the yawing correction table Ty, and the position correction of the stage 2 described later is performed at this correction timing.

[0038] Furthermore, the integrated circuit 81 has a Y-axis position information output unit 817. The Y-direction position of the stage 2 measured by the Y-axis laser length measuring device 92y, the amount of rotation in the rotation direction θ of the stage 2 measured by the ΔY-axis laser length measuring device 92d, and the count value of the Y-axis counter 811 are input to this Y-axis position information output unit 817. Then, the Y-axis position information output unit 817 outputs these inputs to the control board 85.

[0039] The control board 85 has an imaging timing control unit 851. This imaging timing control unit 851 stores the correspondence between the count value of a Y-axis counter 811 indicating the position of the stage 2 in the Y direction and the imaging timing, and the imaging timing output unit 812 of the integrated circuit 81 causes the alignment camera 51 to capture an image at the imaging timing based on this correspondence acquired from the imaging timing control unit 851.

[0040] The control board 85 also has a Y-axis scale correction table section 852 that corrects an error in the Y-direction position of the stage 2 output by the Y-axis encoder 312. Specifically, a calibration operation for correcting the position of the stage 2 is executed in advance. In this calibration operation, while the stage 2 is moved in the Y direction by the Y-axis servo motor 311, the Y-direction position of the stage 2 measured by the Y-axis laser length measuring device 92y and the count value of the Y-axis counter 811 output of the Y-axis encoder 312 are transmitted to the Y-axis scale correction table section 852 via the Y-axis position information output section 817, and the Y-axis scale correction table section 852 stores the error in the count value of the Y-axis encoder 312 relative to the measurement position of the Y-axis laser length measuring device 92y as a table (Y-axis scale correction table). Then, during the exposure operation, the exposure timing output section 813 of the integrated circuit 81 corrects the count value of the output of the Y-axis encoder 312 received from the Y-axis counter 811 based on the table, and generates the exposure timing by the exposure head 41.

[0041] The control board 85 also has an X-axis scale correction table section 853 and a θ-axis scale correction table section 854 similarly provided for the X direction and the rotation direction θ. That is, the X-axis scale correction table section 853 stores a table (X-axis scale correction table) for correcting an error between the output value of the X-axis encoder provided in the X-axis servo motor 331 and the position of the stage 2 in the X direction, and outputs a correction value for correcting this error. The θ-axis scale correction table section 854 stores a table (θ-axis scale correction table) for correcting an error between the output value of the θ-axis encoder provided in the θ-axis servo motor 351 and the amount of rotation in the rotation direction θ of the stage 2, and outputs a correction value for correcting this error.

[0042] Furthermore, the control board 85 has a Y-axis straightness correction table section 855 that stores a straightness correction table Ts (FIG. 5A). FIG. 5A is a diagram showing an example of the straightness correction table. In the example of FIG. 5A, the left column of the straightness correction table Ts indicates the Y-direction position of the stage 2 indicated by the Y-axis counter 811 (in other words, the count value of the Y-axis encoder 312 by the Y-axis counter 811) by one count across the movable range Yt, and the right column of the straightness correction table Ts indicates the correction amount (X-direction correction amount) for correcting the position of the stage 2 in the X direction. In other words, the straightness correction table Ts indicates the correspondence relationship between the Y-direction position of the stage 2 indicated by the Y-axis counter 811 and the correction amount of the position of the stage 2 in the X direction. Therefore, the Y-axis straightness correction table section 855 drives the stage 2 in the X direction by the stage driving mechanism 3 by the correction amount indicated by the straightness correction table Ts in correspondence with the Y-direction position of the stage 2. This ensures the straightness of the stage 2 moving in the Y direction. As will be described later, the straightness correction table Ts is created by cooperation between a straightness correction table creating unit 856 provided in the control board 85 and a CPU 911 provided in the main PC 91.

[0043] In this way, the control board 85 is provided with an X-axis scale correction table unit 853 and a Y-axis straightness correction table unit 855 as a function of correcting the position of the stage 2 in the X direction. Therefore, the control board 85 is provided with an X-axis movement amount calculation unit 857 that combines the correction amounts of both the correction tables 853, 855. In other words, the X-axis movement amount calculation unit 857 outputs a total correction amount obtained by adding together the correction amount output by the X-axis scale correction table unit 853 and the correction amount output by the Y-axis straightness correction table unit 855 to the X-axis servo motor 331, and the X-axis servo motor 331 drives the stage 2 in the X direction by the total correction amount.

[0044] The control board 85 also has an XY yaw correction table section 858 that stores a yaw correction table Ty (FIG. 5B). FIG. 5B is a diagram showing an example of the yaw correction table. In the example of FIG. 5B, the left column of the yaw correction table Ty indicates the Y-direction position of the stage 2 indicated by the Y-axis counter 811 (in other words, the count value of the Y-axis encoder 312 by the Y-axis counter 811) by one count across the movable range Yt, and the right column of the yaw correction table Ty indicates the correction amount (θ-direction correction amount) for correcting the position of the stage 2 in the rotation direction θ. In other words, the yaw correction table Ty indicates the correspondence between the Y-direction position of the stage 2 indicated by the Y-axis counter 811 and the correction amount of the position of the stage 2 in the rotation direction θ. Therefore, the XY yaw correction table section 858 drives the stage 2 in the rotation direction θ by the stage driving mechanism 3 by the correction amount indicated by the yaw correction table Ty in association with the Y-direction position of the stage 2. This makes it possible to suppress yawing of the stage 2 moving in the Y direction. Note that, as will be described later, the yawing correction table Ty is created by the XY yawing correction table unit 858.

[0045] In this way, the control board 85 is provided with a θ-axis scale correction table unit 854 and an XY yawing correction table unit 858 as a function of correcting the position of the stage 2 in the rotation direction θ. Therefore, the control board 85 is provided with a θ-axis movement amount calculation unit 859 that combines the respective correction amounts of both the correction tables 854, 858. In other words, the θ-axis movement amount calculation unit 859 outputs a total correction amount obtained by adding together the correction amount output by the θ-axis scale correction table unit 854 and the correction amount output by the XY yawing correction table unit 858 to the θ-axis servo motor 351, and the θ-axis servo motor 351 drives the stage 2 in the rotation direction θ by the total correction amount.

[0046] FIG. 6 is a flowchart showing an example of an alignment mark acquisition operation and an exposure operation, FIG. 7 is a side view showing typically the operation of an exposure apparatus executed according to the flowchart of FIG. 6, and FIG. 8 is a diagram showing typically an example of a substrate on which the flowchart of FIG. 6 is executed.

[0047] During execution of the flowchart shown in FIG. 6, the Y-axis straightness correction table unit 855 performs position correction (straightness correction) of the stage 2, and the XY yawing correction table unit 858 performs position correction (yawing correction) of the stage 2. As described above, the execution timing of these position corrections is controlled by the interrupt generation unit 814. Specifically, every time the Y-axis counter 811 counts a predetermined number of counts (for example, 10), the interrupt generation unit 814 transmits an execution command to the X-axis movement amount calculation unit 857 and the θ-axis movement amount calculation unit 859, and the X-axis movement amount calculation unit 857 and the θ-axis movement amount calculation unit 859 perform the position corrections in charge every time they receive an execution command. In this way, the position correction of the stage 2 is not performed for each count. However, the position correction of the stage 2 may be performed for each count.

[0048] In step S101, the stage driving mechanism 3 starts driving the stage 2 in the Y direction. This causes the stage 2 to move in the alignment movement range Ya, and the substrate We placed on the stage 2 passes through the imaging range Rc (FIG. 7) of the alignment camera 51 (step S102). Meanwhile, as shown in FIG. 8, the substrate We is provided with an alignment mark Ma. Therefore, the alignment camera 51 captures an image of the alignment mark Ma moving in the imaging range Rc to obtain an alignment mark image Ia (step S103, alignment mark acquisition operation). In this way, the alignment mark image Ia is captured between the time when the leading edge of the stage 2 reaches one end of the alignment movement range Ya ("at the start of alignment mark acquisition" in FIG. 7) and the time when the leading edge of the stage 2 reaches the other end of the alignment movement range Ya ("at the end of alignment mark acquisition" in FIG. 7).

[0049] Furthermore, in the alignment mark acquisition operation (step S103), the alignment mark image Ia is transmitted from the alignment camera 51 to the main PC 91 (FIG. 4). The CPU 911 of the main PC 91 extracts the position of the alignment mark Ma by performing image processing on the alignment mark image Ia, and transmits it to the control unit 8. In this way, the control unit 8 acquires the position of the alignment mark Ma from the CPU 911 (alignment mark acquisition operation). Then, the control unit 8 adjusts the pattern of light to be irradiated to the substrate We based on the position of the alignment mark Ma acquired by the alignment mark acquisition operation.

[0050] Also, the stage 2 reaches one end of the exposure movement range Ye shortly before the stage 2 reaches the other end of the alignment movement range Ya. As a result, the stage 2 moves through the exposure movement range Ye, and the substrate We placed on the stage 2 passes through the irradiation range Re (FIG. 7) of the exposure head 41 (step S104). Also, in parallel with the passage of the substrate We through the irradiation range Re, the exposure head 41 irradiates the irradiation range Re with laser light to expose the stripe region Rs extending in the Y direction on the substrate We (exposure operation). At this time, the laser light irradiated to the irradiation range Re is adjusted based on the position of the alignment mark Ma as described above. Thus, the exposure operation is performed from when the tip of the stage 2 reaches one end of the exposure movement range Ye ("at the start of the exposure operation" in FIG. 7) until the tip of the stage 2 reaches the other end of the exposure movement range Ye ("at the end of the exposure operation" in FIG. 7).

[0051] When the exposure operation is completed, the stage driving mechanism 3 stops the movement of the stage 2 in the Y direction (step S106). As shown in FIG. 8, a plurality of stripe regions Rs arranged in the Y direction are set on the substrate We, and laser light is irradiated on one stripe region Rs in one exposure operation. Therefore, in step S107, it is confirmed whether the exposure operation has been performed on all stripe regions Rs. If there is a stripe region Rs for which the exposure operation has not been performed (i.e., unexposed), the stage driving mechanism 3 drives the stage 2 in the X direction to position the irradiation range Re of the exposure head 41 on the unexposed stripe region Rs (step S108), and repeats steps S104 to S106. However, the direction in which the stage 2 passes through the exposure movement range Ye in this exposure operation is opposite to that of the previous exposure operation. In this way, by performing a plurality of exposure operations while reciprocating the stage 2 in the Y direction, all stripe regions Rs can be exposed.

[0052] FIG. 9 is a flow chart showing an example of a method for creating a yawing correction table. In step S201, an operator or a working robot attaches the position measuring device 92 to the main body 11 of the exposure apparatus 1. In step S202, the stage driving mechanism 3 starts driving the stage 2 in the Y direction. This causes the stage 2 to move through a movable range Yt including the alignment movement range Ya and the exposure movement range Ye. At this stage, the straightness correction table Ts and the yawing correction table Ty have not been created, so straightness correction and yawing correction cannot be performed. Therefore, while the Y-axis servo motor 311 of the stage driving mechanism 3 is operating, the X-axis servo motor 331 and the θ-axis servo motor 351 are stopped, and straightness correction and yawing correction are not functioning.

[0053] In this manner, while the Y-axis servo motor 311 is driving the stage 2 in the Y direction, the XY yawing correction table unit 858 associates the output value (amount of rotation in the rotation direction θ) from the ΔY-axis laser length measurement device 92d with the output value (position in the Y direction) from the Y-axis counter 811, and acquires them for each count of the Y-axis counter 811 (step S204). These are acquired via the Y-axis position information output unit 817. This provides a yawing measurement result indicating the correspondence between the count value of the Y-axis counter 811 and the amount of rotation in the rotation direction θ of the stage 2 located at the position indicated by the count value.

[0054] When the yawing measurement results are acquired for the entire movable range Yt, the movement of the stage 2 in the Y direction stops (step S205). Then, the XY yawing correction table unit 858 obtains an error between a reference rotation amount θ0 in the rotation direction θ and the measured rotation amount of the stage 2 in the rotation direction θ, and obtains a correction amount for the rotation direction θ required to eliminate the error, thereby creating and storing a yawing correction table Ty (step S206).

[0055] Incidentally, a step may be provided in which, after the movement of the stage 2 in the Y direction has stopped, an operator or a working robot removes the position measuring device 92 from the main body 11 of the exposure apparatus 1. On the other hand, when the straightness correction table creating operation, which will be described using FIG. 10 etc., is performed subsequently, this step does not need to be executed.

[0056] Figure 10 is a flowchart showing an example of a method for creating a straightness correction table, and Figures 11A, 11B and 12 are diagrams showing typically the operations executed in creating the straightness correction table of Figure 10. If the position measuring device 92 has not been attached to the main body 11 of the exposure apparatus 1 before the start of the flowchart of Figure 10, the position measuring device 92 is attached to the main body 11 by an operator or a working robot.

[0057] In step S301, the test substrate Wt is placed on the stage 2. The test substrate Wt is, for example, a glass substrate, and on the upper surface of the test substrate Wt, as shown in FIG. 12, a plurality of test marks Mt are arranged in the Y direction. The positional relationship of each test mark Mt in the X direction is measured in advance and stored in the straightness correction table creation unit 856. Here, each test mark Mt is provided at the same position in the X direction, and the plurality of test marks Mt are arranged in parallel in the Y direction. Furthermore, a photosensitive material such as a resist is applied to the upper surface of the glass substrate of the test substrate Wt, and the alignment camera 51 can capture an image of the test marks Mt through this photosensitive material.

[0058] In step S302, the stage driving mechanism 3 starts driving the stage 2 in the Y direction. This causes the stage 2 to move through the alignment movement range Ya, and the test substrate Wt passes through the imaging range Rc of the alignment camera 51. At this stage, the straightness correction table Ts has not been created, so straightness correction cannot be performed. On the other hand, the yawing correction table Ty has been created, so yawing correction can be performed. Therefore, while the Y-axis servo motor 311 of the stage driving mechanism 3 drives the stage 2 in the Y direction, the θ-axis servo motor 351 drives the stage 2 in the rotation direction θ based on the yawing correction table Ty to perform yawing correction. On the other hand, the X-axis servo motor 331 is stopped, so straightness correction is not performed.

[0059] In step S304, the alignment camera 51 captures the test mark Mt moving in the imaging range Rc to obtain a test mark image It (FIG. 12). In this manner, the test mark image It is captured during the period from when the leading edge of the stage 2 reaches one end of the alignment movement range Ya ("test mark acquisition start time" in FIG. 11A) until the leading edge of the stage 2 reaches the other end of the alignment movement range Ya ("test mark acquisition end time" in FIG. 11A).

[0060] Furthermore, the test mark image It is transmitted from the alignment camera 51 to the main PC 91 in association with the count value of the Y-axis counter 811 when the test mark image It was captured (FIG. 4). The CPU 911 of the main PC 91 extracts the X-direction position of the test mark Mt by executing image processing on the test mark image It. Then, the X-direction position of the test mark Mt is transmitted from the main PC 91 to the straightness correction table creation unit 856 of the control board 85 in association with the count value of the Y-axis counter 811 when the test mark Mt was captured.

[0061] This makes it possible to measure the position of the test mark Mt in the X direction, i.e., the position of the stage 2 in the X direction, for the count values ​​over the entire alignment movement range Ya (step S305).The straightness correction table creation unit 856 then obtains the error between the reference position X0 in the X direction and the measured position of the stage 2 in the X direction for each count value, and obtains the amount of correction in the X direction required to eliminate such error, thereby creating a straightness correction table Ts for the alignment movement range Ya and storing it in the Y-axis straightness correction table unit 855 (step S306).

[0062] Furthermore, as the stage 2 is driven in the Y direction, the stage 2 moves through the exposure movement range Ye, and the test substrate Wt passes through the irradiation range Re of the exposure head 41 (step S307). In step S308, the exposure head 41 irradiates the test substrate Wt moving through the irradiation range Re with a light beam, thereby drawing an exposure mark Me on each test mark Mt on the test substrate Wt (FIG. 12). In this way, the exposure operation is performed between when the leading edge of the stage 2 reaches one end of the exposure movement range Ye ("exposure operation start time" in FIG. 11A) and when the leading edge of the stage 2 reaches the other end of the exposure movement range Ye ("exposure operation end time" in FIG. 11A).

[0063] The stage driving mechanism 3 stops the movement of the stage 2 in the Y direction in step S309 (step S309), and moves the stage 2 to the start point (one end) of the alignment movement range Ya in step S310 ("exposure mark acquisition start time" in FIG. 11B). Next, the Y-axis straightness correction table unit 855 turns on straightness correction using the straightness correction table Ts for the alignment movement range Ya created in step S306 (step S311).

[0064] In step S312, the stage driving mechanism 3 starts driving the stage 2 in the Y direction. As a result, the stage 2 moves through the alignment movement range Ya, and the test substrate Wt passes through the imaging range Rc of the alignment camera 51. At this time, the stage 2 has been subjected to straightness correction based on the straightness correction table Ts created in step S306.

[0065] In step S314, the alignment camera 51 captures an image of the exposure mark Me moving in the imaging range Rc to obtain an exposure mark image Ie (FIG. 12). In this manner, the exposure mark image Ie is captured during the period from when the leading edge of the stage 2 reaches one end of the alignment movement range Ya ("exposure mark acquisition start time" in FIG. 11B) until the leading edge of the stage 2 reaches the other end of the alignment movement range Ya ("exposure mark acquisition end time" in FIG. 11B).

[0066] Furthermore, the exposure mark image Ie is associated with the count value of the Y-axis counter 811 when the exposure mark image Ie was captured, and transmitted from the alignment camera 51 to the main PC 91 (FIG. 4). The CPU 911 of the main PC 91 extracts the X-direction position of the exposure mark Me by executing image processing on the exposure mark image Ie. Then, the X-direction position of the exposure mark Me is associated with the count value of the Y-axis counter 811 when the exposure mark Me was captured, and transmitted from the main PC 91 to the straightness correction table creation unit 856 of the control board 85.

[0067] As described above, the exposure head 41 irradiates a light beam onto the test substrate Wt placed on the stage 2 passing through the exposure movement range Ye, thereby drawing the exposure mark Me. In addition, while the stage 2 passes through the alignment movement range Ya while performing straightness correction on the stage 2, the position of the exposure mark Me in the X direction is acquired based on the image of the exposure mark Me captured by the alignment camera 51. The position of each exposure mark Me in the X direction thus acquired represents the straightness of the stage 2 in the exposure movement range Ye.

[0068] This allows the X-direction position of the exposure mark Me to be measured for the count values ​​over the entire exposure movement range Ye (step S315). The straightness correction table creation unit 856 then calculates the error between the reference position X0 in the X direction and the measured X-direction position of the stage 2 for each count value, and calculates the amount of correction in the X direction required to eliminate the error, thereby creating a straightness correction table Ts for the exposure movement range Ye and storing it in the Y-axis straightness correction table unit 855 (step S316). As described above, the alignment movement range Ya and the exposure movement range Ye partially overlap. For this overlapping portion, it is sufficient to select and use either the data calculated in step S306 or the data calculated in step S316.

[0069] As described above, the stage 2 (drive target) is driven in the Y direction (main scanning direction) by the stage drive mechanism 3 (drive mechanism), whereby the stage 2 moves in the exposure movement range Ye (first movement range) in the Y direction, and the substrate We passes through the irradiation range Re in the Y direction (first main scanning drive (step S104)). Then, in parallel with the first main scanning drive (step S104), the exposure head 41 irradiates the irradiation range Re with light, thereby exposing the stripe region Rs (region) extending in the Y direction on the substrate We (exposure operation (step S105)). In particular, based on the straightness correction table Ts (first straightness correction information) indicating the X direction correction amount (first correction amount) for correcting the position of the stage 2 in the X direction (sub-scanning direction) according to the position of the stage 2 in the Y direction in the exposure movement range Ye, the position of the stage 2 in the X direction during the first main scanning drive (step S104) is corrected by the stage drive mechanism 3 (first straightness correction operation). As a result, it is possible to ensure straightness when driving the stage 2 in the Y direction by the stage driving mechanism 3, and to irradiate light from the exposure head 41 to an appropriate position on the substrate We placed on the stage 2.

[0070] Also included is a step of executing a correction information creating operation (steps S307 to S316) for creating a straightness correction table Ts based on the result of determining the position in the X direction of the stage 2 moving in the Y direction in the exposure movement range Ye by the stage driving mechanism 3. Then, in the first straightness correction operation, the position in the X direction of the stage 2 is corrected based on the straightness correction table Ts created in the correction information creating operation. In this configuration, the straightness correction table Ts is created based on the result of determining the position in the X direction of the stage 2 moving in the Y direction in the exposure movement range Ye by the stage driving mechanism 3, that is, the result of determining the straightness in advance (correction information creating operation). Then, when performing an exposure operation (step S105) while performing the first main scanning drive (step S104), the straightness of the stage 2 can be guaranteed based on the straightness correction table Ts created in this way.

[0071] In particular, in step S303, the stage 2 on which the test substrate Wt having the test marks Mt (reference marks) attached thereto is driven in the Y direction by the stage driving mechanism 3, so that the stage 2 moves in the alignment movement range Ya (second movement range) in the Y direction, and a second main scanning drive is executed in which the test substrate Wt passes through the imaging range Rc of the alignment camera 51 in the Y direction. In addition, in step S304, the alignment camera 51 captures an image of the test mark Mt passing through the imaging range Rc during the execution of this second main scanning drive, and a test mark image It is acquired. Then, in steps S305 and S306, a straightness correction table Ts (second straightness correction information) indicating an X-direction correction amount (second correction amount) for correcting the position of the stage 2 in the X direction according to the position of the stage 2 in the Y direction in the alignment movement range Ya is created based on the position of the test mark Mt in the X direction indicated by the test mark image It. Furthermore, in a state where the stage 2 moves in the exposure movement range Ye and the substrate We passes through the irradiation range Re in the Y direction (first main scanning drive), the exposure head 41 irradiates the test substrate Wt passing through the irradiation range Re with a light beam, thereby drawing the exposure mark Me on the test substrate Wt. Then, while correcting the position of the stage 2 in the X direction based on the straightness correction table Ts, the stage 2 moves in the alignment movement range Ya, and in a state where the test substrate Wt passes through the imaging range Rc of the alignment camera 51 in the Y direction (second main scanning drive), the exposure mark Me passing through the imaging range Rc is imaged by the alignment camera 51 to obtain an exposure mark image Ie (steps S310 to S314). Then, based on the position of the exposure mark Me in the X direction indicated by the exposure mark image Ie, the straightness correction table Ts is created based on the result of determining the position of the stage 2 in the X direction moving through the exposure movement range Ye (steps S315 and S316). In this configuration, the straightness of the stage 2 can be obtained without using an expensive laser interferometer.

[0072] Furthermore, the position of the stage 2 in the Y direction is detected by a Y-axis counter 811 (position detection unit) and transmitted to an imaging timing output unit 812 (imaging timing control unit). Then, the imaging timing output unit 812 causes the alignment camera 51 to capture an image at a timing according to the position of the stage 2 in the Y direction received from the Y-axis counter 811, thereby capturing an image of the alignment mark Ma of the substrate We. Here, the Y-axis counter 811 and the imaging timing output unit 812 are provided in the same integrated circuit 81 (FPGA). Therefore, the position of the stage 2 in the Y direction can be transmitted to the imaging timing output unit 812 while suppressing a communication delay from the Y-axis counter 811 to the imaging timing output unit 812. Therefore, imaging can be performed by the alignment camera 51 at an appropriate timing according to the position of the stage 2.

[0073] Furthermore, the position of the stage 2 in the Y direction is detected by a Y-axis counter 811 (position detection unit) and transmitted to an interrupt generation unit 814 (correction timing control unit). Then, the interrupt generation unit 814 causes the stage driving mechanism 3 to execute straightness correction (first straightness correction operation) based on the straightness correction table Ts at a timing according to the position of the stage 2 in the Y direction received from the Y-axis counter 811. Here, the Y-axis counter 811 and the interrupt generation unit 814 are provided in the same integrated circuit 81 (FPGA). Therefore, the position of the stage 2 in the Y direction can be transmitted to the interrupt generation unit 814 while suppressing communication delay from the Y-axis counter 811 to the interrupt generation unit 814. Therefore, the position of the stage 2 in the X direction can be corrected at an appropriate timing according to the position of the stage 2.

[0074] In the embodiment described above, the exposure apparatus 1 corresponds to an example of the "exposure apparatus" of the present invention, the stage 2 corresponds to an example of the "stage" and "driven object" of the present invention, the stage driving mechanism 3 corresponds to an example of the "driving mechanism" of the present invention, the exposure head 41 corresponds to an example of the "exposure head" of the present invention, the alignment camera 51 corresponds to an example of the "camera" of the present invention, the control unit 8 corresponds to an example of the "control unit" and "storage unit" of the present invention, the integrated circuit 81 corresponds to an example of the "integrated circuit" of the present invention, the Y-axis counter 811 corresponds to an example of the "position detection unit" of the present invention, the imaging timing output unit 812 corresponds to an example of the "imaging timing control unit" of the present invention, the interrupt generation unit 814 corresponds to an example of the "correction timing control unit" of the present invention, the alignment mark Ma corresponds to an example of the "alignment mark" of the present invention, the exposure mark Me corresponds to an example of the "exposure mark" of the present invention, the test mark Mt corresponds to an example of the "reference mark" of the present invention, and the straightness correction table Ts for the alignment movement range Ya corresponds to the "second straightness correction information" of the present invention. the straightness correction table Ts for the exposure movement range Ye corresponds to an example of the "first straightness correction information" of the present invention, the imaging range Rc corresponds to an example of the "imaging range" of the present invention, the irradiation range Re corresponds to an example of the "irradiation range" of the present invention, the substrate We corresponds to an example of the "substrate" of the present invention, the test substrate Wt corresponds to an example of the "test substrate" of the present invention, the X direction corresponds to an example of the "sub-scanning direction" of the present invention, the Y direction corresponds to an example of the "main scanning direction" of the present invention, and the alignment movement range Ya corresponds to a "second movement range" of the present invention. ", the exposure movement range Ye corresponds to an example of the "first movement range" of the present invention, step S104 or step S307 corresponds to an example of the "first main scanning drive" of the present invention, step S105 corresponds to an example of the "exposure operation" of the present invention, step S303 corresponds to an example of the "second main scanning drive" of the present invention, steps S307 to S316 correspond to an example of the "correction information creation operation" of the present invention, and the straightness correction for stage 2 moving in the exposure movement range Ye corresponds to an example of the "first straightness correction operation" of the present invention.

[0075] The present invention is not limited to the above-mentioned embodiment, and various modifications can be made without departing from the spirit of the present invention. For example, the method of creating the straightness correction table Ts is not limited to the above-mentioned example. Fig. 13 is a block diagram showing a configuration for executing another example of the method for creating the straightness correction table, and Fig. 14 is a perspective view showing a configuration for executing another example of the method for creating the straightness correction table.

[0076] In this other example, the position of the stage 2 in the X direction is measured by a laser interferometer. That is, in addition to the configuration shown in Fig. 3, the position measuring device 92 has a laser interferometer 925 attached to the side surface of the stage 2 in the X direction and a mirror 926 extending across the moving range of the stage 2 in the Y direction. The laser interferometer 925 emits laser light parallel to the X direction, and the mirror 926 has a mirror surface perpendicular to the X direction, and the laser interferometer 925 and the mirror 926 face each other in the X direction. The laser interferometer 925 emits laser light toward the mirror 926 and measures the position of the stage 2 in the X direction based on the result of detecting the laser light reflected by the mirror 926.

[0077] The X-axis laser length measuring device 92x is configured with a laser interferometer 925, and outputs the X-direction position of the stage 2 measured by the laser interferometer 925 to the control unit 8. The control unit 8 creates a straightness correction table Ts based on the result of measuring the position of the stage 2 by the position measuring device 92.

[0078] That is, while the stage 2 moves in the Y direction, the straightness correction table creation unit 856 of the control unit 8 associates the count value output by the Y-axis counter 811 with the X-direction position of the stage 2 output by the X-axis laser length measurement device 92x, and acquires it for each count of the Y-axis counter 811. This provides a straightness measurement result indicating the correspondence between the count value of the Y-axis counter 811 and the X-direction position of the stage 2 located at the position indicated by the count value.

[0079] When the straightness measurement results are acquired for the entire movable range Yt, the movement of the stage 2 in the Y direction stops. Then, the straightness correction table creation unit 856 obtains an error between the reference position X0 in the X direction and the measured position of the stage 2 in the X direction, and obtains an amount of correction in the X direction required to eliminate the error, thereby creating a straightness correction table Ts and storing it in the Y-axis straightness correction table unit 855.

[0080] That is, in this other example, in the correction information creation operation, the straightness correction table Ts is created based on the result of measuring the position in the X direction of the stage 2 that moves in the Y direction within the exposure movement range Ye by a laser interferometer. In this configuration, the straightness of the stage 2 can be easily obtained by measurement by the laser interferometer.

[0081] Meanwhile, as shown in Fig. 8, a plurality of different stripe regions Rs (exposure positions) are set in the X direction (sub-scanning direction) on the substrate We. The entire substrate We is exposed by repeating the first main scanning drive, the first straightness correction operation, and the exposure operation while changing the position of the stage 2 by the stage driving mechanism 3 between a plurality of different sub-scanning positions in the X direction corresponding to the plurality of stripe regions Rs. However, when the position (sub-scanning position) of the stage 2 changes in the X direction, the balance of the weight applied from the stage 2 to the stage driving mechanism 3 changes. Therefore, it may be difficult to ensure the straightness of the stage 2 at each of the plurality of sub-scanning positions by a single straightness correction table Ts.

[0082] Therefore, a straightness correction table Ts may be provided for each of the multiple sub-scanning positions (in other words, multiple stripe regions Rs). Specifically, the operation of creating the above-mentioned straightness correction table Ts may be performed for each sub-scanning position while changing the position of the stage 2 at the multiple sub-scanning positions. In this configuration, when the stage 2 is located at a sub-scanning position corresponding to one of the multiple stripe regions Rs, the X-direction position of the stage 2 driven in the Y direction is corrected based on the straightness correction table Ts provided for the one sub-scanning position (in other words, one stripe region Rs). This makes it possible to ensure the straightness of the stage 2 in the Y direction at each of the multiple sub-scanning positions.

[0083] Alternatively, instead of providing a straightness correction table Ts for each of the plurality of stripe regions Rs, the number of straightness correction tables Ts may be suppressed to be less than the number of stripe regions Rs. Specifically, the straightness correction table Ts is provided for each of a plurality of different set positions in the X direction, and the number of set positions is less than the number of sub-scanning positions (in other words, the number of stripe regions Rs). In this configuration, when the stage 2 is located at one sub-scanning position corresponding to one of the plurality of stripe regions Rs, the position of the stage 2 in the X direction driven in the Y direction is corrected based on the straightness correction table Ts provided for the set position closest to the one sub-scanning position among the plurality of set positions. This makes it possible to ensure the straightness of the stage 2 in the Y direction at each of the plurality of sub-scanning positions while suppressing memory resources required for storing the straightness correction table Ts. Alternatively, instead of the above, the correction amount for the X-direction position of the stage 2 driven in the Y-direction may be calculated by linear interpolation using the correction amounts obtained from the straightness correction table Ts provided for the setting position closest to the one sub-scanning position among the multiple setting positions, and the straightness correction table Ts provided for the setting position second closest to the one sub-scanning position.

[0084] The yawing correction table Ty can also be configured to be provided for each of a plurality of sub-scanning positions or set positions.

[0085] Furthermore, modifications other than those described above may be made. For example, when creating the straightness correction table Ts in the example of Fig. 10, yawing correction of the stage 2 may not be performed.

[0086] In addition, it is assumed that the straightness of the stage 2 by the X-axis robot 33 of the stage driving mechanism 3, i.e., the straightness of the stage 2 in the X direction, is not sufficiently ensured. In such a case, in a configuration in which the exposure operation is performed while changing the position of the stage 2 at multiple sub-scanning positions as described above to expose each of the multiple stripe regions Rs, the position of the stage 2 in the Y direction when the exposure operation starts (exposure start position) may vary among the multiple sub-scanning positions (in other words, the multiple stripe regions Rs). Therefore, based on a result of measuring in advance the variation in the exposure start position of the stage 2 among the multiple sub-scanning positions, a correction table indicating the amount of correction for eliminating the variation may be created. In such a configuration, the position of the stage 2 in the Y direction is corrected based on this correction table, so that the exposure operation can be performed on the substrate We while suppressing the variation in the exposure start position.

[0087] Also, information for performing straightness correction may be held by a formula, not in a table format such as the straightness correction table Ts. Similarly, information for performing yawing correction may be held by a formula, not in a table format such as the yawing correction table Ty. The same applies to various information represented by other tables.

[0088] Furthermore, the alignment camera 51 or the exposure head 41 may be driven instead of the stage 2 to move the stage 2 relative to the alignment camera 51 and the exposure head 41 .

[0089] In addition, the positions of the functional units 811-817 and 851-859 may be interchanged between the integrated circuit 81 and the control board 85. Furthermore, the control unit 8 does not need to be configured as separate units, the integrated circuit 81 and the control board 85, but may be configured as an integrated unit. In addition, the main PC 91 may be attached to the exposure apparatus 1 as an integral unit.

[0090] Furthermore, the form of the test marks Mt provided on the test substrate Wt is not limited to the example in Fig. 12. For example, a single straight line extending parallel to the Y direction may be provided on the test substrate Wt as the test marks Mt. [Industrial Applicability]

[0091] The present invention is suitable for use in the technical field of exposing a substrate, such as a semiconductor wafer or a glass substrate, to light in order to form a pattern on the substrate. [Explanation of symbols]

[0092] 1...Exposure equipment 2...Stage (drive object) 3...Stage drive mechanism (drive mechanism) 41...Exposure head 51...Alignment camera (camera) 8...Control unit (control unit, memory unit) 81...Integrated circuits 811...Y-axis counter (position detector) 812...imaging timing output unit (imaging timing control unit) 814...Interrupt generation unit (correction timing control unit) Ma...Alignment mark Me…Exposure mark Mt...Test mark (reference mark) Ts...Straightness correction table (first and second straightness correction information) Rc…Image range Re…Irradiation range We…Substrate Wt…Test board X...X direction (sub-scanning direction) Y...Y direction (main scanning direction) Ya…Alignment movement range (second movement range) Ye…Exposure movement range (first movement range) S104, S307...Step (first main scanning drive) S105...Step (exposure operation) S303...Step (second main scanning drive) S307 to S316... Steps (Correction information creation operation)

Claims

1. a step of performing a first main scanning drive in which one of the driving objects, that is, a stage on which a substrate is placed and an exposure head which irradiates an irradiation area with light, is driven in a main scanning direction by a driving mechanism, so that the driving object moves through a first movement range in the main scanning direction and the substrate passes through the irradiation range relatively in the main scanning direction; a step of executing a first straightness correction operation for correcting a position of the driven object in the sub-scanning direction by the drive mechanism during execution of the first main scanning drive, based on first straightness correction information stored in a storage unit that stores first straightness correction information indicating a first correction amount for correcting a position of the driven object in the sub-scanning direction according to a position of the driven object in the first movement range in the main scanning direction; performing an exposure operation of exposing an area extending in the main scanning direction on the substrate by irradiating light from the exposure head onto the irradiation range during execution of the first main scanning drive; Equipped with an output of an encoder provided in a servo motor of the driving mechanism that drives the driven object in the main scanning direction is counted by a counter; An exposure method in which the first straightness correction information indicates a correspondence relationship between a position of the object to be driven in the main scanning direction indicated by the counter and a correction amount of the position of the object to be driven in the sub-scanning direction.

2. a step of executing a correction information creating operation for creating the first straightness correction information based on a result of determining a position in the sub-scanning direction of the driven object that is moved in the first movement range in the main scanning direction by the driving mechanism, 2 . The exposure method according to claim 1 , wherein in the first straightness correction operation, a position of the object to be driven in the sub-scanning direction is corrected based on the first straightness correction information created in the correction information creation operation.

3. The exposure method according to claim 2, wherein in the correction information creation operation, the first straightness correction information is created based on the results of measuring the position in the sub-scanning direction of the driven object moving in the main scanning direction within the first movement range by a laser interferometer.

4. a step of performing a second main scanning drive in which the stage, on which a test substrate having a reference mark is placed, is driven in the main scanning direction by the driving mechanism as the driving target, so that the stage moves through a second movement range in the main scanning direction and the test substrate passes through an imaging range of a camera in the main scanning direction; capturing an image of the reference mark by the camera while the second main scanning drive is being performed, the reference mark passing through the imaging range, and acquiring a reference mark image; creating second straightness correction information indicating a second correction amount for correcting a position of the stage in the sub-scanning direction in accordance with a position of the stage in the second movement range in the main scanning direction, based on a position of the reference mark indicated by the reference mark image in the sub-scanning direction; a step of drawing an exposure mark on the test substrate by irradiating the test substrate passing through the irradiation range with light from the exposure head while performing the first main scanning drive; performing the second main scanning drive while correcting a position of the stage in the sub-scanning direction based on the second straightness correction information, and capturing an image of the exposure mark passing through the imaging range with the camera to obtain an exposure mark image; creating the first straightness correction information based on a result of determining a position in the sub-scanning direction of the stage moving within the first movement range based on a position in the sub-scanning direction of the exposure mark indicated by the exposure mark image; 3. The exposure method according to claim 2, wherein the correction information generating operation includes:

5. a step of detecting a position of the driven object in the main scanning direction by a position detection unit and transmitting the position to an imaging timing control unit that controls an imaging timing by a camera; the imaging timing control unit causes the camera to capture an image at a timing according to the position of the driven object in the main scanning direction received from the position detection unit, thereby capturing an image of an alignment mark of the substrate; Equipped with 5. The exposure method according to claim 1, wherein the position detection section and the imaging timing control section are provided in a single integrated circuit.

6. a step of detecting a position of the driven object in the main scanning direction by a position detection unit, and transmitting the position to a correction timing control unit that controls a timing of execution of the first straightness correction operation by the driving mechanism, the correction timing control unit causes the drive mechanism to execute the first straightness correction operation at a timing according to the position of the driven object in the main scanning direction received from the position detection unit; 6. The exposure method according to claim 1, wherein the position detection section and the correction timing control section are provided in a single integrated circuit.

7. 7. The exposure method according to claim 1, wherein a plurality of different exposure positions in the sub-scanning direction are set for the substrate, and the first main scanning drive, the first straightness correction operation, and the exposure operation are repeated while changing a position of the driven object by the drive mechanism between a plurality of different sub-scanning positions in the sub-scanning direction that respectively correspond to the plurality of exposure positions, the first straightness correction information is provided for each of the plurality of sub-scanning positions, In the first straightness correction operation, a position of the object to be driven in the sub-scanning direction is corrected based on the first straightness correction information provided for the sub-scanning position where the object to be driven is located.

8. 7. The exposure method according to claim 1, wherein a plurality of different exposure positions in the sub-scanning direction are set for the substrate, and the first main scanning drive, the first straightness correction operation, and the exposure operation are repeated while changing a position of the driven object by the drive mechanism between a plurality of different sub-scanning positions in the sub-scanning direction that respectively correspond to the plurality of exposure positions, the first straightness correction information is provided for each of a plurality of different setting positions in the sub-scanning direction, the plurality of set positions is less than the plurality of sub-scanning positions, In the first straightness correction operation, an exposure method is provided in which the position of the driven object in the sub-scanning direction is corrected based on the first straightness correction information provided for the setting position among the multiple setting positions that is closest to the sub-scanning position where the driven object is located, or by linear interpolation using the first straightness correction information provided for the setting position that is closest to the sub-scanning position where the driven object is located and the first straightness correction information provided for the setting position that is second closest to the sub-scanning position where the driven object is located.

9. a stage on which a substrate is placed; an exposure head that irradiates light onto an irradiation area; a driving mechanism that drives one of the stage and the exposure head in a main scanning direction; a storage unit configured to store first straightness correction information indicating a first correction amount for correcting a position of the driven object in a sub-scanning direction in accordance with a position of the driven object in the main scanning direction within a first movement range in the main scanning direction; a control unit that performs an exposure operation to expose an area of ​​the substrate extending in the main scanning direction by irradiating light from the exposure head onto the irradiation range while performing a first main scanning drive in which the drive mechanism drives the drive target in the main scanning direction, causing the drive target to move through the first movement range and the substrate to relatively pass through the irradiation range in the main scanning direction; and a counter that counts the output of an encoder provided in a servo motor of the driving mechanism that drives the driven object in the main scanning direction; Equipped with the first straightness correction information indicates a correspondence relationship between a position of the object to be driven indicated by the counter in a main scanning direction and a correction amount of the position of the object to be driven in the sub-scanning direction, The control unit executes a first straightness correction operation to correct the position of the driven object in the sub-scanning direction by the driving mechanism while the first main scanning drive is being performed, based on the first straightness correction information.

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