Substrate processing apparatus

Abstract

To provide a technology capable of suppressing sticking of a substrate to a boat.SOLUTION: A substrate processing device according to an embodiment of the present disclosure includes a first boat that holds a substrate in a shelf, a second boat that is provided coaxially with the first boat and holds the substrate in a shelf shape, and a driving mechanism for synchronously rotating the first boat and the second boat, and raising and lowering the second boat relative to the first boat.SELECTED DRAWING: Figure 1

Description

Technical Field

[0001] The present disclosure relates to a substrate processing apparatus.

Background Art

[0002] An apparatus is known that accommodates a boat on which a plurality of substrates are loaded inside a processing chamber and performs a film forming process on the plurality of substrates (see, for example, Patent Documents 1 and 2). Patent Document 1 describes a double-structured boat having an inner boat and an outer boat that can move independently in the vertical direction. Patent Document 2 describes a holding means having a first holding boat that holds a wafer and a second holding boat that holds an induction heating body.

Prior Art Documents

Patent Documents

[0003]

Patent Document 1

Patent Document 2

Summary of the Invention

Problems to be Solved by the Invention

[0004] The present disclosure provides a technique capable of suppressing the adhesion of substrates to a boat.

Means for Solving the Problems

[0005] A substrate processing apparatus according to an aspect of the present disclosure includes a first boat that holds substrates in a shelf shape, a second boat that is provided coaxially with the first boat and holds substrates in a shelf shape, and a drive mechanism that rotates the first boat and the second boat in synchronization and moves the second boat up and down relative to the first boat. , the drive mechanism includes a substantially cylindrical rotating shaft, a substantially cylindrical outer support that supports the first boat, and an outer connection mechanism that connects the rotating shaft and the outer support. The rotating shaft and the outer support are formed of materials having different coefficients of thermal expansion. The outer connection mechanism includes a hub formed of a material having a coefficient of thermal expansion between the coefficient of thermal expansion of the material forming the rotating shaft and the coefficient of thermal expansion of the material forming the outer support. 。

Effects of the Invention

[0006] According to the present disclosure, sticking of the substrate to the boat can be suppressed.

Brief Description of the Drawings

[0007]

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Embodiments for Carrying Out the Invention

[0008] Hereinafter, non-limiting exemplary embodiments of the present disclosure will be described with reference to the accompanying drawings. In all the accompanying drawings, the same or corresponding members or components are denoted by the same or corresponding reference numerals, and redundant descriptions are omitted.

[0009] 〔Attachment of Substrate〕 When the substrate is placed on the claws provided on the boat and the boat with the substrate placed thereon is accommodated in the processing container and the substrate is subjected to film formation processing, the substrate may stick to the claws. In particular, when a thick polysilicon film is formed on the substrate, the substrate is likely to stick to the claws.

[0010] As an example of a measure to prevent the substrate from sticking to the claws, there is a technique of forming fine irregularities on the surface of the claws to reduce the contact area between the claws and the substrate. However, when the thickness of the film formed on the substrate becomes thick, the substrate may stick to the claws even if the above technique is applied.

[0011] The present disclosure provides a technique capable of suppressing the adhesion of the substrate to the boat by using a substrate holder including a first boat and a second boat that move up and down relative to each other and capable of transferring the substrate between the first boat and the second boat. Details will be described below.

[0012] 〔Substrate Processing Apparatus〕 Referring to FIG. 1, an example of the substrate processing apparatus according to the embodiment will be described. The substrate processing apparatus according to the embodiment is a batch-type apparatus that processes a plurality of substrates at a time.

[0013] The substrate processing apparatus 1 includes a processing container 10, a gas supply unit 30, an exhaust unit 40, a heating unit 50, and a control unit 80.

[0014] The processing container 10 can be depressurized inside. The processing container 10 accommodates the substrate W. The substrate W is, for example, a semiconductor wafer. The processing container 10 includes an inner tube 11 and an outer tube 12. The inner tube 11 has a substantially cylindrical shape with a ceiling and an open lower end. The outer tube 12 has a substantially cylindrical shape with a ceiling and an open lower end that covers the outside of the inner tube 11. The inner tube 11 and the outer tube 12 are formed of a heat-resistant material such as quartz and are arranged coaxially to form a double-tube structure.

[0015] The ceiling of the inner tube 11 is, for example, flat. On one side of the inner tube 11, a housing portion 13 for accommodating a gas nozzle is formed along its longitudinal direction (vertical direction). The housing portion 13 is a region within a convex portion 14 formed by protruding a part of the side wall of the inner tube 11 outward.

[0016] On the side wall of the inner tube 11 opposite to the housing portion 13, a rectangular opening 15 is formed along its longitudinal direction (vertical direction).

[0017] The opening 15 is a gas exhaust port formed so as to exhaust the gas inside the inner tube 11. The length of the opening 15 is the same as the length of the substrate holder 100 or a length extending vertically longer than the length of the substrate holder 100.

[0018] The lower end of the processing container 10 is supported by a substantially cylindrical manifold 17 formed of, for example, stainless steel. A flange 18 is formed at the upper end of the manifold 17, and the lower end of the outer tube 12 is installed and supported on the flange 18. A seal member 19 such as an O-ring is interposed between the flange 18 and the lower end of the outer tube 12 to make the inside of the outer tube 12 airtight.

[0019] On the inner wall of the upper part of the manifold 17, a substantially annular support portion 20 is provided. The support portion 20 installs and supports the lower end of the inner tube 11. A lid 21 is airtightly attached to the opening at the lower end of the manifold 17 via a seal member 22 such as an O-ring. The lid 21 has a substantially disc shape and airtightly closes the opening at the lower end of the processing container 10, that is, the opening of the manifold 17. The lid 21 is formed of, for example, stainless steel.

[0020] In the central part of the lid 21, a drive mechanism 200 is provided so as to penetrate therethrough. The lower part of the drive mechanism 200 is rotatably supported by an arm 25a of a lifting mechanism 25 composed of a boat elevator. The drive mechanism 200 rotates the first boat 110 and the second boat 120 in synchronization, and relatively raises and lowers the second boat 120 with respect to the first boat 110. Further, the lid 21, the drive mechanism 200, the first boat 110, and the second boat 120 move up and down integrally in response to the lifting of the lifting mechanism 25. As a result, the first boat 110 and the second boat 120 are inserted into and removed from the processing container 10. Details of the drive mechanism 200 will be described later.

[0021] The first boat 110 and the second boat 120 constitute a substrate holder 100 that holds a plurality (for example, 50 to 150) of substrates W in a shelf shape. Details of the substrate holder 100 will be described later.

[0022] A heat-insulating table 28 is provided on the lid 21. The heat-insulating table 28 keeps the substrate holder 100 warm by preventing the substrate holder 100 from being cooled by heat transfer with the lid 21 side. For example, the heat-insulating table 28 has a configuration in which a plurality of quartz plates arranged substantially horizontally at intervals in the vertical direction are attached to a plurality of columns provided on the lid 21.

[0023] The gas supply unit 30 includes a gas nozzle 31. The gas nozzle 31 is formed of, for example, quartz. The gas nozzle 31 is provided along its longitudinal direction inside the inner pipe 11, and its proximal end is bent in an L shape and supported so as to penetrate through the manifold 17. The gas nozzle 31 has a plurality of gas holes 31h along its longitudinal direction, and discharges the processing gas in the horizontal direction from the plurality of gas holes 31h. The plurality of gas holes 31h are arranged at the same interval as the interval between the substrates W supported by the substrate holder 100. The type of the processing gas is not limited, and examples include a film-forming gas, an etching gas, and a purge gas.

[0024] In the example of FIG. 1, the case where the gas supply unit 30 includes one gas nozzle 31 has been described, but the number of gas nozzles is not limited. For example, the gas supply unit 30 may include a plurality of gas nozzles. In this case, the plurality of gas nozzles may be configured to discharge the same processing gas, or may be configured to discharge different processing gases.

[0025] The exhaust unit 40 exhausts the gas that is discharged from the inside of the inner pipe 11 through the opening 15 and then discharged from the gas outlet 41 through the space P1 between the inner pipe 11 and the outer pipe 12. The gas outlet 41 is a side wall at the upper part of the manifold 17 and is formed above the support part 20. An exhaust passage 42 is connected to the gas outlet 41. A pressure regulating valve 43 and a vacuum pump 44 are sequentially interposed in the exhaust passage 42 so that the inside of the processing container 10 can be exhausted.

[0026] The heating unit 50 is provided around the outer pipe 12. The heating unit 50 is provided, for example, on the base plate 29. The heating unit 50 has a substantially cylindrical shape so as to cover the outer pipe 12. The heating unit 50 includes, for example, a heating element and heats the substrate W in the processing container 10.

[0027] The control unit 80 is configured to control the operations of each part of the substrate processing apparatus 1. The control unit 80 may be, for example, a computer. The program of the computer that performs the operations of each part of the substrate processing apparatus 1 is stored in the storage medium 90. The storage medium 90 may be, for example, a flexible disk, a compact disk, a hard disk, a flash memory, a DVD, or the like.

[0028] 〔Substrate Holder〕 With reference to FIGS. 2 to 5, an example of the substrate holder 100 included in the substrate processing apparatus 1 of the embodiment will be described. FIG. 2 is a perspective view showing the substrate holder in a state where the second boat is being attached to the first boat, and FIG. 3 is a perspective view showing the substrate holder in a state where the second boat is attached to the first boat.

[0029] The substrate holder 100 can be accommodated in the processing vessel 10 and holds a plurality of substrates substantially horizontally with a space therebetween in the vertical direction. The substrate holder 100 has a first boat 110 and a second boat 120.

[0030] The first boat 110 includes a bottom plate 111, a top plate 112, and support columns 113 (113a to 113c). The bottom plate 111, the top plate 112, and the support columns 113 are formed of a heat-resistant material such as quartz or silicon carbide, for example.

[0031] The bottom plate 111 is supported by an outer support 225 described later. The bottom plate 111 has a substantially annular plate shape with an outer diameter larger than the outer diameter of the substrate to be held. Note that the bottom plate 111 may have a substantially disc shape.

[0032] The top plate 112 is provided above the bottom plate 111 and opposite to the bottom plate 111. The top plate 112 has a substantially annular plate shape with an outer diameter larger than the outer diameter of the substrate to be held, similar to the bottom plate 111. Note that the top plate 112 may have a substantially disc shape.

[0033] The support columns 113 have a rod shape extending in the vertical direction and connect the bottom plate 111 and the top plate 112. The three support columns 113a to 113c have the same length. The center points of the respective support columns 113a to 113c are the same circumference provided so as to be located above. A plurality of grooves 114 are formed in the respective support columns 113a to 113c at intervals in the vertical direction. The grooves 114 form a placement surface 115 (FIGS. 4 and 5) on which the substrate is placed. When the substrate is placed on the placement surface 115, the substrate is held by the support columns 113.

[0034] The second boat 120 is configured to be detachable from the first boat 110 by horizontal movement. The second boat 120 is provided coaxially with the first boat 110 and is configured to be relatively movable up and down with respect to the first boat 110. The second boat 120 includes a bottom plate 121, a top plate 122, and support columns 123 (123a to 123c). The bottom plate 121, the top plate 122, and the support columns 123 are formed of a heat-resistant material such as quartz or silicon carbide, for example.

[0035] The bottom plate 121 is supported by an inner support body 235, which will be described later, and is disposed above the bottom plate 111. The bottom plate 121 has a substantially annular plate shape with an outer diameter larger than the outer diameter of the substrate to be held, and is disposed so as to overlap the bottom plate 111 in a plan view. Note that the bottom plate 121 may have a substantially disc shape. Notches 121a to 121c through which the support columns 113a to 113c are inserted are formed in the outer edge portion of the bottom plate 121. The notches 121a to 121c are formed so that the bottom plate 121 and the support columns 113a to 113c do not come into contact with each other when the second boat 120 is horizontally moved and attached to the first boat 110.

[0036] The top plate 122 is provided facing the bottom plate 121 above the bottom plate 121 and below the top plate 112. The top plate 122 has a substantially annular plate shape with an outer diameter larger than the outer diameter of the substrate to be held, similar to the bottom plate 121. Notches 122a to 122c through which the support columns 113a to 113c are inserted are formed in the outer edge portion of the top plate 122. The notches 122a to 122c are formed so that the top plate 122 and the support columns 113a to 113c do not come into contact with each other when the second boat 120 is horizontally moved and attached to the first boat 110. A concave surface 122s is formed in the inner edge portion of the top plate 122. The concave surface 122s has an upper surface lower than the upper surface of the top plate 122 and functions as a placement surface for placing a lid (not shown) that closes the opening 122h of the top plate 122. Note that the top plate 122 may have a substantially disc shape.

[0037] The support columns 123 have a rod shape extending in the vertical direction and connect the bottom plate 121 and the top plate 122. The three support columns 123a to 123c have the same length. The center points of the respective support columns 123a to 123c are located above and the same circumference the center points of the respective support columns 113a to 113c. Each of the support columns 123a to 123c is shorter than each of the support columns 113a to 113c. A plurality of groove portions 124 are formed in the respective support columns 123a to 123c at intervals in the vertical direction. The groove portions 124 form a placement surface 125 (FIGS. 4 and 5) on which the substrate is placed. When the substrate is placed on the placement surface 125, the substrate is held by the support columns 123.

[0038] [Delivery of the substrate] Referring to FIGS. 4 and 5, an example of the delivery of the substrate in the substrate holder 100 will be described. FIG. 4 is a side view showing the substrate holder holding the substrate in the first boat, and FIG. 5 is a side view showing the substrate holder holding the substrate in the second boat.

[0039] When holding the substrate W in the first boat 110, as shown in FIG. 4, lower the second boat 120 until the position of the mounting surface 125 moves below the position of the mounting surface 115. As a result, the substrate W is placed on the mounting surface 115 and is separated from the mounting surface 125.

[0040] When holding the substrate W in the second boat 120, as shown in FIG. 5, raise the second boat 120 until the position of the mounting surface 125 is above the position of the mounting surface 115. As a result, the substrate W is placed on the mounting surface 125 and is separated from the mounting surface 115.

[0041] For example, when the substrate holder 100 holding the substrate W in the first boat 110 is accommodated in the processing container 10 and a film forming process is performed on the substrate W in the processing container 10, the second boat 120 is raised with respect to the first boat 110 during the film forming process. As a result, the substrate W held by the first boat 110 is transferred to the second boat 120. Also, with the substrate W held by the second boat 120, the second boat 120 is lowered with respect to the first boat 110. As a result, the substrate W held by the second boat 120 is transferred to the first boat 110. In this way, by transferring the substrate W between the first boat 110 and the second boat 120 during the film forming process, the substrate W does not remain on the mounting surface 115 and the mounting surface 125. As a result, it is possible to suppress the substrate W from sticking to the mounting surface 115 and the mounting surface 125. Note that the transfer of the substrate W between the first boat 110 and the second boat 120 may be repeated a plurality of times during the film forming process.

[0042] [Drive mechanism] Referring to FIGS. 6 to 15, an example of a drive mechanism will be described. The drive mechanism 200 rotates the first port 110 and the second port 120 synchronously, and moves the second port 120 up and down relative to the first port 110. The drive mechanism 200 includes a fixed portion 210, a rotating portion 220, and a rotary linear motion portion 230.

[0043] The fixed portion 210 includes a bottom plate 211, a top plate 212, a connecting member 213, a fixed sleeve 214, and a purge gas inlet 215.

[0044] The bottom plate 211 is supported by an arm 25a (FIG. 1) of the elevating mechanism 25 and moves up and down relative to the processing container 10.

[0045] The top plate 212 is provided above the bottom plate 211 and faces the bottom plate 211. An opening is formed in the central portion of the top plate 212, and a rotating shaft 221 and a linear motion shaft 231 described later are inserted through the opening. The lower end of the lid 21 is connected to the top plate 212 via a sealing member 21s such as an O-ring.

[0046] The connecting member 213 is a columnar body extending in the vertical direction and connects the bottom plate 211 and the top plate 212.

[0047] The fixed sleeve 214 has a hollow substantially cylindrical shape extending downward from the central portion of the top plate 212. A rotating body 222 described later is rotatably provided on the outer periphery of the fixed sleeve 214 via a bearing 216. A magnetic fluid seal 217 is provided between the lower portion of the bearing 216 and the fixed sleeve 214 and the rotating body 222. The magnetic fluid seal 217 hermetically seals the gap between the fixed sleeve 214 and the rotating body 222.

[0048] The purge gas inlet 215 is provided through the side wall of the fixed sleeve 214 to introduce purge gas into the fixed sleeve 214. By introducing the purge gas from the purge gas inlet 215 into the fixed sleeve 214, it is possible to suppress the process gas discharged from the gas nozzle 31 from flowing into the gap between the fixed sleeve 214 and the rotating shaft 221. The purge gas is an inert gas such as, for example, Ar gas or N2 gas.

[0049] The rotating part 220 includes a rotating shaft 221, a rotating body 222, a rotation drive source 223, a connecting member 224, an outer support 225, and an outer connecting mechanism 226.

[0050] The rotating shaft 221 has a hollow substantially cylindrical shape. The rotating shaft 221 is inserted into the fixed sleeve 214 with a slight gap from the inner surface of the fixed sleeve 214. An outer support 225 is connected to the upper end of the rotating shaft 221 via an outer connecting mechanism 226. A connecting member 224 is connected to the lower end of the rotating shaft 221, and a rotating body 222 is connected to the connecting member 224. A through hole 221h is formed in the rotating shaft 221 to communicate the gap between the fixed sleeve 214 and the rotating shaft 221 with the gap between the rotating shaft 221 and the linear motion shaft 231.

[0051] The through hole 221h guides the purge gas introduced from the purge gas inlet 215 into the fixed sleeve 214 into the rotating shaft 221. Thereby, it is possible to suppress the process gas discharged from the gas nozzle 31 from flowing into the gap between the rotating shaft 221 and the linear motion shaft 231. Note that the through hole 221h may be formed so as to penetrate the connecting member 224 and may be configured to guide the purge gas to the gap between the rotating shaft 221 and the linear motion shaft 231. The rotating shaft 221 is formed of, for example, metal.

[0052] The rotating body 222 is rotatably provided on the outer periphery of the fixed sleeve 214 via a bearing 216. A connecting member 224 is connected to the lower end of the rotating body 222.

[0053] The rotation drive source 223 is, for example, a motor and rotates the rotating body 222.

[0054] The connecting member 224 connects the lower end of the rotating body 222 and the lower end of the rotating shaft 221. Thereby, the rotating shaft 221, the rotating body 222, and the connecting member 224 rotate integrally. The lifting drive plate 234 is connected to the lower surface of the connecting member 224 via the bellows 227 and the spline 228. Thereby, the region surrounded by the rotating shaft 221, the connecting member 224, the linear motion shaft 231, and the lifting drive plate 234 is hermetically sealed. Also, the rotating shaft 221, the connecting member 224, the linear motion shaft 231, and the lifting drive plate 234 rotate synchronously. Note that the rotating shaft 221, the rotating body 222, and the connecting member 224 may be integrally formed.

[0055] The outer support 225 is formed of, for example, quartz and includes a shaft portion 225a, a lower end portion 225b, a flange portion 225c, and support protrusions 225d.

[0056] The shaft portion 225a has a substantially hollow cylindrical shape. A through hole 225h penetrating the side wall of the shaft portion 225a is formed in the lower portion of the shaft portion 225a. The through hole 225h discharges the purge gas flowing upward through the gap between the shaft portion 225a and the shaft portion 235a to the outside of the shaft portion 225a. Thereby, in a state where the lid 21 hermetically closes the opening at the lower end of the processing container 10, it is suppressed that the purge gas introduced from the purge gas inlet 215 is blown out from the upper end of the shaft portion 225a toward the substrate holder 100. As a result, it is possible to suppress the flow of the processing gas discharged from the gas nozzle 31 toward the substrate holder 100 from being disturbed by the purge gas.

[0057] The lower end portion 225b is formed at the lower end of the outer support 225 and is connected to the rotating shaft 221 via the outer connection mechanism 226.

[0058] The flange portion 225c is formed at the upper end of the outer support 225. A plurality (for example, four) of support protrusions 225d are provided on the flange portion 225c at intervals along the circumferential direction of the flange portion 225c.

[0059] Each support projection 225d includes a placement surface 225d1 and a positioning portion 225d2 (FIG. 8). On each placement surface 225d1, a bottom plate 111 is placed on the first boat 110, and the inner peripheral surface of the bottom plate 111 engages with the positioning portion 225d2, so that the first boat 110 is supported in a positioned state on the support projection 225d.

[0060] The outer connection mechanism 226 connects the rotating shaft 221 and the outer support 225. The outer connection mechanism 226 includes a hub 226a and a hub 226b.

[0061] The hub 226a is formed of the same material as the material constituting the rotating shaft 221, for example, metal. The hub 226a has a substantially hollow cylindrical shape with a through hole 226a1 penetrating in the vertical direction. The inner diameter at the lower end of the through hole 226a1 is formed slightly larger than the outer diameter of the upper end of the rotating shaft 221. Thereby, the rotating shaft 221 can be inserted into the through hole 226a1, and the hub 226a can be fitted onto the rotating shaft 221. The hub 226a is fixed to the rotating shaft 221 by screws or the like. On the outer edge portion of the upper surface of the hub 226a, a substantially annular guide projection 226a2 protruding from the upper surface is formed. The inner diameter of the guide projection 226a2 is set slightly larger than the outer diameter of the lower end of the hub 226b. Thereby, the lower end of the hub 226b is fitted into the hub 226a.

[0062] The hub 226b is formed of a material having a lower coefficient of thermal expansion than the material constituting the hub 226a and a higher coefficient of thermal expansion than the material constituting the outer support 225, such as a ceramic material such as silicon nitride (Si3N4). The hub 226b has a hollow substantially cylindrical shape with a through-hole 226b1 penetrating in the vertical direction. An approximately annular guide projection 226b2 protruding from the upper surface is formed at the outer edge of the upper surface of the hub 226b. The guide projection 226b2 has three flat portions 226b3. The inner diameter of the guide projection 226b2 is set slightly larger than the outer diameter of the lower end of the lower end portion 225b. Thereby, the lower end of the lower end portion 225b is fitted into the hub 226b. Further, three flat portions 225b3 corresponding to the three flat portions 226b3 are formed at the lower end of the lower end portion 225b, and the outer support 225 is positioned with respect to the hub 226b by the three flat portions 225b3 engaging with the three flat portions 226b3, respectively.

[0063] The rotary linear motion unit 230 includes a linear motion shaft 231, a lifting stage 232, a lifting drive source 233, a lifting drive plate 234, an inner support 235, and an inner connection mechanism 236.

[0064] The linear motion shaft 231 has a solid substantially cylindrical shape. The linear motion shaft 231 is inserted into the rotary shaft 221 with a slight gap from the inner surface of the rotary shaft 221. An inner support 235 is connected to the upper end of the linear motion shaft 231 via an inner connection mechanism 236. A lifting drive plate 234 is connected to the lower end of the linear motion shaft 231. The linear motion shaft 231 is formed of, for example, metal.

[0065] The lifting stage 232 moves up and down by the power of the lifting drive source 233. A lifting drive plate 234 is installed on the lifting stage 232 via a bearing 232a.

[0066] The lifting drive source 233 is, for example, a ball screw, and raises and lowers the lifting stage 232.

[0067] The lifting drive plate 234 is connected to the lower end of the linear motion shaft 231. The lifting drive plate 234 receives the lifting of the lifting stage 232, moves up and down integrally with the lifting stage 232, and relatively raises and lowers the linear motion shaft 231 with respect to the rotary shaft 221. Note that the lifting drive plate 234 may be integrally formed with the linear motion shaft 231.

[0068] The inner support 235 is formed of, for example, quartz and includes a shaft portion 235a, a lower end portion 235b, a flange portion 235c, and support protrusions 235d.

[0069] The shaft portion 235a has a substantially solid cylindrical shape. The shaft portion 235a is inserted into the shaft portion 225a with a slight gap from the inner surface of the shaft portion 225a.

[0070] The lower end portion 235b is formed at the lower end of the inner support 235 and is connected to the linear motion shaft 231 via an inner connection mechanism 236.

[0071] The flange portion 235c is detachably attached to the upper end of the shaft portion 235a. A plurality (for example, four) of support protrusions 235d are provided on the flange portion 235c at intervals along the circumferential direction of the flange portion 235c.

[0072] Each support protrusion 235d includes a mounting surface 235d1 and a positioning portion 235d2 (FIG. 13). The second boat 120 is supported in a state of being positioned on the support protrusion 235d by placing the bottom plate 121 on each mounting surface 235d1 and engaging the inner peripheral surface of the bottom plate 121 with the positioning portion 235d2.

[0073] The inner connection mechanism 236 connects the linear motion shaft 231 and the inner support 235. The inner connection mechanism 236 includes a hub 236a and a hub 236b.

[0074] The hub 236a is formed of the same material as the material constituting the linear motion shaft 231, for example, metal. The hub 236a has a substantially hollow cylindrical shape with a through hole 236a1 penetrating in the vertical direction. The inner diameter at the lower end of the through hole 236a1 is formed slightly larger than the outer diameter at the upper end of the linear motion shaft 231. Thereby, the linear motion shaft 231 can be inserted into the through hole 236a1, and the hub 236a can be fitted onto the linear motion shaft 231. The hub 236a is fixed to the linear motion shaft 231 by a screw or the like. The inner diameter at the upper end of the through hole 236a1 is formed slightly larger than the outer diameter at the lower end of the hub 236b. Thereby, the lower end of the hub 236b can be inserted into the through hole 236a1, and the hub 236b can be fitted onto the hub 236a.

[0075] The hub 236b is formed of a material having a lower coefficient of thermal expansion than the material constituting the hub 236a and a higher coefficient of thermal expansion than the material constituting the outer support 225, for example, a ceramic material such as Si3N4. A substantially annular guide projection 236b2 protruding from the upper surface is formed at the outer edge of the upper surface of the hub 236b. The guide projection 236b2 has three flat portions 236b3. The inner diameter of the guide projection 236b2 is set slightly larger than the outer diameter at the lower end of the lower end portion 235b. Thereby, the lower end of the lower end portion 235b is fitted into the hub 236b. Further, three flat portions 235b3 corresponding to the three flat portions 236b3 are formed at the lower end of the lower end portion 235b, and the three flat portions 235b3 are engaged with the three flat portions 236b3, respectively, so that the inner support 235 is positioned with respect to the hub 236b.

[0076] It should be considered that all aspects of the embodiments disclosed this time are illustrative and not restrictive. The above embodiments may be omitted, replaced, or changed in various forms without departing from the scope and spirit of the appended claims.

Explanation of Reference Numerals

[0077] 10 Processing container 110 First boat 120 Second boat 200 Drive mechanism 210 Fixed part 220 Rotating part 230 Rotary linear motion part W substrate

Claims

1. a first boat for holding a substrate in a shelf shape; a second boat provided coaxially with the first boat for holding a substrate in a shelf shape; a drive mechanism for synchronously rotating the first boat and the second boat and relatively raising and lowering the second boat with respect to the first boat; comprising: the drive mechanism includes: a substantially cylindrical rotating shaft; a substantially cylindrical outer support for supporting the first boat; an outer connection mechanism for connecting the rotating shaft and the outer support; having: the rotating shaft and the outer support are formed of materials having different coefficients of thermal expansion; the outer connection mechanism includes a hub formed of a material having a coefficient of thermal expansion between the coefficient of thermal expansion of the material constituting the rotating shaft and the coefficient of thermal expansion of the material constituting the outer support; a substrate processing apparatus.

2. the drive mechanism has a substantially cylindrical fixed sleeve; the rotating shaft is inserted through the fixed sleeve with a gap therebetween and rotates relative to the fixed sleeve; the substrate processing apparatus according to Claim 1.

3. the fixed sleeve is provided with an inlet for introducing an inert gas into the gap between the fixed sleeve and the rotating shaft; the substrate processing apparatus according to Claim 2.

4. the drive mechanism has a linear motion shaft that is inserted through the rotating shaft with a gap therebetween and moves up and down relative to the rotating shaft; the substrate processing apparatus according to Claim 2 or 3.

5. the rotating shaft is formed with a through hole for communicating the gap between the fixed sleeve and the rotating shaft and the gap between the rotating shaft and the linear motion shaft; the substrate processing apparatus according to Claim 4.

6. the drive mechanism has a bellows for hermetically sealing the gap between the rotating shaft and the linear motion shaft; the substrate processing apparatus according to Claim 4 or 5.

7. the drive mechanism includes: a substantially columnar inner support that is inserted through the outer support with a gap therebetween and supports the second boat; an inner connection mechanism for connecting the linear motion shaft and the inner support; having: the substrate processing apparatus according to any one of Claims 4 to 6.

8. the outer support is formed with a through hole penetrating the side wall of the outer support; the substrate processing apparatus according to Claim 7.

9. the linear motion shaft and the inner support are formed of materials having different coefficients of thermal expansion; The inner connection mechanism includes a hub formed of a material having a coefficient of thermal expansion between the coefficient of thermal expansion of the material constituting the linear motion shaft and the coefficient of thermal expansion of the material constituting the inner support. The substrate processing apparatus according to claim 7 or 8.

10. A first boat for holding substrates in a shelf shape; A second boat provided coaxially with the first boat for holding substrates in a shelf shape; A drive mechanism for synchronously rotating the first boat and the second boat and relatively raising and lowering the second boat with respect to the first boat; Comprising: The drive mechanism includes: A linear motion shaft; A substantially cylindrical inner support for supporting the second boat; An inner connection mechanism for connecting the linear motion shaft and the inner support; Having: The linear motion shaft and the inner support are formed of materials having different coefficients of thermal expansion. The inner connection mechanism includes a hub formed of a material having a coefficient of thermal expansion between the coefficient of thermal expansion of the material constituting the linear motion shaft and the coefficient of thermal expansion of the material constituting the inner support. Substrate processing apparatus.

11. The drive mechanism includes: A substantially cylindrical fixed sleeve; A substantially cylindrical rotating shaft inserted through the fixed sleeve with a gap and rotating relative to the fixed sleeve; Having: The substrate processing apparatus according to claim 10.

12. The fixed sleeve is provided with an inlet for introducing an inert gas into the gap between the fixed sleeve and the rotating shaft. The substrate processing apparatus according to claim 11.

13. The linear motion shaft is inserted through the rotating shaft with a gap and moves up and down relative to the rotating shaft. The substrate processing apparatus according to claim 11 or 12.

14. The rotating shaft is formed with a through hole for communicating the gap between the fixed sleeve and the rotating shaft and the gap between the rotating shaft and the linear motion shaft. The substrate processing apparatus according to claim 13.

15. The drive mechanism has a bellows for airtightly sealing the gap between the rotating shaft and the linear motion shaft. The substrate processing apparatus according to claim 13 or 14.

16. The drive mechanism includes: A substantially cylindrical outer support for supporting the first boat; An outer connection mechanism for connecting the rotating shaft and the outer support; Having: The inner support is inserted through the outer support with a gap. The substrate processing apparatus according to any one of claims 13 to 15.

17. The outer support is formed with a through hole penetrating the side wall of the outer support. The substrate processing apparatus according to claim 16.

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