Wall-cooled gas introduction member for CVD reactor

Abstract

The present invention relates to a gas introduction member (1) for a CVD reactor having a cylindrical substrate (8), the cylindrical substrate having an outer wall (10) surrounding at least one gas distribution medium (13) and forming a gas outlet surface (11) into which a plurality of gas outlet holes (12) originating from the gas distribution medium (13, 14, 15) open. A cooling device is provided within the outer wall (10) having a plurality of adjacent but separated cooling ducts (7) extending therethrough, the gas outlet holes (12) extending between the cooling ducts (7).

Description

Technical Field

[0001] The present invention relates to a gas introduction member for a CVD reactor, comprising a cylindrical substrate having an outer wall surrounding at least one gas distribution chamber and forming a gas outlet surface through which a plurality of gas outlet holes starting from the gas distribution chamber open, at least one gas supply line capable of supplying gas to the gas distribution chamber, and a cooling device that is flow-connected to a coolant supply line and a coolant discharge line assigned to the outer wall to allow the coolant to pass through.

[0002] The present invention further relates to a gas introduction device having a holder to which the gas introduction member is fixed. The present invention further relates to a CVD reactor provided with such a gas introduction member.

Background Art

[0003] Gas introduction members equipped with a cooling device and capable of cooling the outer wall of a cylindrical substrate are described in Patent Document 1 and Patent Document 2. According to that, the gas introduction member has a central pipe into which a process gas is supplied. The central pipe is connected to the outer wall of the substrate via small pipes extending in the radial direction. Those small pipes cross a cooling space formed between two pipes through which a cooling fluid can pass and flow.

[0004] Patent Document 3 describes a gas introduction member having a cylindrical substrate made of quartz. Three gas distribution chambers are located axially overlapping each other, and a process gas is supplied through a central supply pipe. The innermost supply pipe can allow a coolant to flow into a coolant chamber arranged in the substrate of the gas introduction member.

[0005] Patent Document 4 describes a method for manufacturing linear and non-linear ducts in a gas introduction member made of quartz.

[0006] Patent Document 5 describes a CVD reactor having a flat cylindrical gas introduction member. The gas introduction member has the function of a shower head. At the end of the gas introduction member, coolant chambers facing each other in the diametrical direction are arranged, and by opening coolant lines into each of them, coolant can be supplied to the coolant chambers. Both coolant chambers are connected to each other by a plurality of cooling ducts arranged separately and adjacent to each other, so that the coolant can flow into the other coolant chamber and flow out from there into the other coolant line.

Prior Art Documents

Patent Documents

[0007]

Patent Document 1

Patent Document 2

Patent Document 3

Patent Document 4

Patent Document 5

Patent Document 6

Patent Document 7

Summary of the Invention

Problems to be Solved by the Invention

[0008] The present invention is based on the problem of further constructing a general gas introduction member in an advantageous way of use, and in particular, providing means capable of cooling a gas outlet surface in a more advantageous way from the viewpoint of process technology.

Means for Solving the Problems

[0009] This problem is solved by the invention defined in the claims, and the dependent claims not only show further advantageous developments of the inventions described in the subclaims, but also show independent solution means.

[0010] First and essentially, it is proposed that the cooling device is formed by a plurality of cooling ducts extending adjacent to each other. These cooling ducts preferably extend inside the outer wall of the base of the gas introduction member, especially a metal, ceramic, or quartz, especially stainless steel. Through holes passing through the outer wall extend between the cooling ducts, and they form gas outlet holes. Thus, the cooling ducts extend in the same base where the gas outlet holes also extend. The cooling ducts through which the coolant of the fluid flows during the use of the device are preferably not connected to each other. These cooling ducts extend from the coolant distribution chamber to the coolant recovery chamber without branching, or extend while forming a branch by a non-disconnected wall. In that case, the coolant distribution chamber distributes the coolant to preferably at least 10 cooling ducts, and the coolant recovery chamber recovers the coolant flowing through the cooling ducts. Preferably over its entire length, at least partially, the cooling ducts having the same cross-section can branch such that one or more gas outlet holes are located between two branches. In that case, the branched cooling ducts can be provided to extend around one or more gas outlet holes. Preferably, the base has a cylindrical shape and forms an outer wall extending along the outer peripheral surface of the cylinder. The cooling ducts extend substantially in the axial direction of this cylinder, and the cooling ducts can run parallel to the axis. However, the cooling ducts can also run in a line inclined or bent with respect to the axis, especially a meandering line. The two oppositely directed openings of the cooling ducts are preferably located at the end faces of the cylinder. The openings of the cooling ducts communicate with two mutually separated coolant chambers. Coolant is supplied to one of the coolant chambers and is preferably distributed to a plurality of cooling ducts having the same shape as each other. That coolant chamber forms the coolant distribution chamber. The other coolant chamber forms the coolant recovery chamber, which communicates with the coolant discharge line. The outer wall of the gas introduction member with a thickness of about 2 mm to 10 mm is preferably made of stainless steel, ceramic, or quartz. Inside this outer wall, a cooling duct extends in the form of tunnels that run linearly, curvilinearly, and especially in a meandering shape. In particular, inside the solid outer wall, gas outlet holes that preferably run linearly extend perpendicular to the extending direction of the cooling duct. The cooling duct preferably has a non-discontinuous wall. The cooling duct can have a constant cross-section over its entire length. A plurality of cooling ducts can have the same cross-section. The cross-section can be circular or elliptical, but can also be polygonal. The cooling duct preferably has no or almost no branches, or is branched such that a tunnel-shaped duct runs around each gas outlet hole. The substrate has end faces that run at least partially flat at each of its two ends. Those end faces facing each other extend parallel to each other. The openings of the cooling ducts can be arranged on those end faces. However, those end faces can also be part of the inner wall of each coolant chamber. In this regard, it is preferable that each of the coolant chambers is assigned to one end face. The first coolant chamber can form an annular space. Through the annular opening of that annular space, a supply line for the coolant or the gas introduced into the process chamber of the CVD reactor by the gas introduction member extends. The coolant chamber arranged on the bottom surface of the gas introduction member can extend over the entire bottom surface. The first coolant chamber is separated from at least one gas distribution chamber by an annular plate. The second coolant chamber is separated from at least one gas distribution chamber by a separation plate. A coolant line, such as a supply line or a discharge line, can be a pipe that extends coaxially with the axis of the cylindrical substrate. Through this pipe, a coolant, preferably a cooling fluid, can be supplied to the coolant chamber. This coolant chamber is a coolant distribution chamber that distributes the coolant to a plurality of cooling ducts extending inside the outer wall to cool the outer wall. The annular coolant chamber can be a coolant recovery chamber connected to a coolant discharge line. However, the flow of the coolant can also be made to flow in the opposite direction through the coolant chamber and the cooling duct. The coolant chamber arranged on the free end of the gas introduction member has a cup shape and can be closed by a closing element made of a metal, ceramic, or quartz, in particular stainless steel. The closing element forms a central portion running parallel to the separating plate that separates the coolant chamber from the adjacent gas distribution chamber. In a preferred embodiment, the gas introduction member has two or more, in particular three, gas distribution chambers, which are arranged one behind the other in the axial direction of the substrate, as is basically known from Patent Document 3. The different gas distribution chambers are separated from each other by separating plates. A gas supply line can open into each gas distribution chamber. The gas supply line extends through a holder made of stainless steel in particular and is formed by a space extending in particular between the inner surface of the outer pipe and the outer surface of the inner pipe. The innermost pipe can form a coolant supply line or a discharge line. The gas supply line thus has an annular cross-sectional space. The separating plates each have a central hole through which the pipe can pass. In a further embodiment of the present invention, the gas introduction member has a plurality of combined parts, one of the parts being a base body which forms an outer wall having a cooling duct and a gas outlet hole. Further, the base body forms one or more annular bridges projecting radially inward from the inner surface of the wall of the substantially pipe-shaped base body. These annular bridges are used to fix the separation plate. The annular bridges are provided with annular holes, and the holes of different annular bridges have different diameters. On one free end of the base body, there is a first annular bridge provided with the largest hole. The annular bridges located away from it are respectively provided with holes whose diameters gradually become smaller. Therefore, the separation plates can be sequentially connected to the annular bridges. In that case, first, the separation plate having the smallest diameter is carried through the hole having the largest diameter and connected to the innermost annular bridge. In the case of a metal separation plate or a metal base body, it can be carried out by welding. However, an appropriate adhesive can also be used. However, it is also possible to provide shape-conforming connecting means. Further, the edges of the separation plate and the annular bridge can be fused to each other. The separation plates with gradually increasing diameters are successively carried through the holes with the largest diameter until the last separation plate is connected to the annular bridge having the hole with the largest diameter, and are respectively connected to one of the annular bridges. Here too, the edge of the separation plate can be connected to the edge of the annular bridge in the manner described above. In particular, the annular bridge forms a step on which the opposing step of the edge of the separation plate is arranged. The separation plate and the annular bridge can be connected to each other via these two surfaces extending in one plane. It is advantageous for the separation plate to have a central hole. In that case, in particular, the separation plate having the smallest outer diameter has a hole having the largest inner diameter, and the separation plate having the largest outer diameter has a central hole having the smallest diameter. In a further development of the present invention, it is provided that a pressure barrier is arranged in each of at least one gas distribution chamber. The pressure barrier can be a metal body, in particular a stainless steel body, a ceramic body, or a quartz body. The pressure barrier particularly has a circular contour and a cylindrical shape. Thus, the pressure barrier forms a part of a pipe having two edges facing each other. A plurality of passage holes extend through the wall of the pressure barrier extending on the outer peripheral surface of the cylindrical body, and the gas introduced into the central part of the gas distribution chamber can flow through them to the radially outer part of the gas distribution chamber. The gas can then flow into the process chamber of the CVD reactor through the gas outlet holes. The pressure barrier can be mounted during the mounting of the separation plate. For this purpose, the separation plate and the pressure barrier are alternately inserted into the holes of the substrate. The separation plate can form an arc-shaped recess extending on its main surface. This recess forms a positioning hole, and by inserting the protrusion of the edge of the pressure barrier into it, the pressure barrier can be mounted in the central position. Thus, the edges of the pressure barrier facing each other preferably form protrusions, and those protrusions engage with the corresponding recesses of the adjacent separation plates respectively. In one of the further embodiments of the present invention, the cooling ducts extend linearly between two end faces of the substrate facing each other. They can run parallel to the axis of the cylindrical substrate in the drawing. However, the coolant can also run inclined with respect to the axis. In that case, the coolant can also run in a spiral path, and in that case, those spiral paths run parallel to each other. However, the cooling ducts can also run in a meandering shape around the gas outlet holes, whereby one or more gas outlet holes are arranged in one bend of the cooling duct. Such a meandering path of the cooling duct can be manufactured by a preferred method of laser etching. That method is described in Patent Document 4. The disclosure of this document is fully incorporated into the present application. The present invention further relates to a gas introduction device. In that case, the above-described gas introduction member is attached to a steel holder. The base body can be welded to the holder. Inside the holder, a supply line extends in the form of a nested pipe. In that case, one supply line, in particular a coolant supply line or a discharge line, can also extend into the wall of the main body of the holder. In particular, it is a coolant discharge line connected to an annular coolant chamber. The pipe can be welded to the separation plate. The components forming the gas introduction member, in particular metal components such as the base body, the separation plate, and the pressure barrier, can be manufactured using a 3D printing process. The 3D printing process is particularly used in the manufacture of the base body, whereby cooling ducts that do not run linearly can also be produced in the stainless steel body. The present invention further relates to a CVD reactor described in Patent Document 3 or Patent Document 6. Such a CVD reactor has an airtight stainless steel housing, and a holder is attached to the top thereof. The holder further holds a process chamber ceiling located on the upper surface of the process chamber. On the lower surface of the process chamber, there is a susceptor made of graphite or the like, and the susceptor can have a central recess into which the lowermost part of the gas introduction member enters. Thereby, the gas outlet holes of the lowermost gas distribution chamber can open directly above the upper surface of the susceptor. The susceptor surrounding the gas introduction member is provided with a plurality of locations for accommodating substrates. The substrate can be arranged on a substrate holder that is supported on a gas cushion and rotationally driven by the gas cushion. A heating device for heating the susceptor can be provided below the susceptor. A gas mixing system connected to a gas source can be provided to supply a process gas, which is, for example, an organometallic compound of Group III and a hydride of Group V, together with hydrogen as a carrier gas to the gas introduction member. To deposit a layer on a substrate by means of a CVD reactor according to the present invention, the process chamber is heated to the process temperature and the process gas is supplied into the process chamber through a gas introduction member. In that case, different process gases are supplied into the process chamber through gas distribution chambers separated from each other. For example, hydrides are supplied through the two outermost gas distribution chambers in the axial direction, and organometallic compounds are supplied through the intermediate gas distribution chamber.

[0011] Hereinafter, an example of an embodiment of the present invention will be described with reference to the accompanying drawings.

Brief Description of the Drawings

[0012]

Figure 1

Figure 2

Figure 3

Figure 4

Figure 5

Figure 6

Figure 7

Figure 8

Figure 9

Embodiments for Carrying Out the Invention

[0013] Hereinafter, the present invention will be described in more detail with reference to embodiments. The present invention relates to a CVD reactor shown in FIG. 7 or described, for example, in Patent Document 7. The present invention relates to a further development of the gas introduction member shown therein, which particularly has three gas introduction regions arranged one above the other.

[0014] FIG. 1 shows a lower portion of a holder 2 attached to a cover of a housing of a CVD reactor schematically shown in FIG. 7. Inside the stainless-steel holder 2, there are four nested pipes. The innermost pipe 30 forms a coolant line, for example, a coolant supply line 3, whereby coolant can be supplied to a coolant chamber 6 of a gas introduction member 1 fixed in the lower region of the holder 2. Around the central pipe 30, further pipes 29 extending at equal intervals surround the pipe 30, so that an intervening space between the outer surface of the pipe 30 and the inner surface of the pipe 29 forms a gas supply line 33. Around the pipe 29, pipes 28 extending at equal intervals form a further gas supply line 32 between the inner surface of the pipe 28 and the outer surface of the pipe 29. Around the pipe 28, further pipes 27 extending form a further gas supply line 31 between the inner surface of the pipe 27 and the outer surface of the pipe 28. Inside the holder 2, a further coolant line, for example, a coolant discharge line 4, extends, which is connected to a coolant chamber 5 surrounding the pipe 27 in a ring shape.

[0015] FIG. 2 shows the gas introduction member 1, and the above-described gas supply lines 31 to 33 are shown together with the coolant line 3.

[0016] The gas introduction member 1 is made of stainless steel and is at least a multi-component part in the assembled state. A part of the gas introduction member 1 is formed by a base body 8, which is a substantially cylindrical hollow body. The base body 8 has an outer wall 10 with a material thickness of 2 mm to 10 mm. Gas outlet holes 12 uniformly distributed over the entire circumferential surface of the base body 8 extend on the outer wall 10, which forms a gas outlet surface 11. The gas outlet holes 12 are through holes between the gas outlet surface 11 and the inner surface 11' of the outer wall 10 forming the gas distribution wall.

[0017] Reference numeral 7 indicates a cooling duct 7 extending perpendicular to the extending direction of the gas outlet holes 12, and the cooling duct 7 extends axially on the outer wall 10.

[0018] The cooling duct 7 according to the present invention, in particular, has the same shape, that is, a constant cross-section, over its entire extending length. The equivalent circular diameter of the cooling duct 7 can be 0.5 mm to 7 mm. The cross-section of the cooling duct 7 can be circular, elliptical, but may also be polygonal. The present invention preferably has such a gas introduction member, in which case at least 10, preferably at least 15, or at least 20 cooling ducts 7 are arranged at equal angular intervals within the outer wall 10. A plurality of gas outlet holes 12 are arranged between two adjacent cooling ducts 7, and these gas outlet holes also preferably have a constant cross-section over their entire extending length.

[0019] Annular bridges 16, 19 are provided on two opposite end faces of the base body 8. The opposite ends of the base body 8 form end faces 8', 8" extending in a plane. Openings 7', 7" of the cooling duct 7 extend on the end faces 8', 8". The cooling duct 7 connects the lower coolant chamber 6 to the upper coolant chamber 5. In that case, the upper coolant chamber 5 extends annularly around the pipe 27. A part of the wall of the upper coolant chamber 5 is formed by a holder 2, and a further part of the cooling wall of the coolant chamber 5 is formed by a connecting portion 9 of the base body 8. Furthermore, a part of the coolant chamber 5 is formed by an annular plate 16 and a part of the pipe 27.

[0020] Further annular bridges 17, 18, 19 project from the inner surface 11' into the hollow interior of the base body 8. In that case, the annular bridges 17, 18, 19 have different radial lengths and in particular have holes of different diameters. The innermost annular bridge 17 surrounds a hole with the smallest diameter, and the outermost annular bridge 19 surrounds a hole with the largest diameter. The intermediate annular bridge 18 surrounds a hole having a diameter that is larger than the hole surrounded by the annular bridge 17 and smaller than the hole surrounded by the annular bridge 19.

[0021] The holes of the annular bridges 17, 18, 19 are each closed by separating plates 20, 21, 22 connected to the annular bridges 17, 18, 19. For this purpose, the annular bridges 17, 18, 19 form steps 34, and the separating plates 20, 21, 22 form corresponding opposing steps.

[0022] In each of the three vertically arranged gas distribution chambers 13, 14, 15, a pipe-shaped pressure barrier 24 having a passage hole 35 is provided. The edge 24' of the pressure barrier 24 is inserted into the recesses 25, 26 of the annular plate 16 and the separating plates 20, 21, 22. The recesses 25, 26 extend on an arc line around the axis of the gas introduction member 1 in the drawing.

[0023] The separating plates 20, 21, 22 have central holes through which pipes 28, 29, 30 pass. The holes of the separating plates 20, 21, 22 have different diameters from each other.

[0024] On the lower surface of the base body 8, a closing element 23 partitioning the coolant chamber 6 is fixed. The closing element 23, the separating plates 20, 21, 22, and the pressure barrier 24 can be made of stainless steel. The pressure barrier 24 has an axially extending annular projection at its edge, and the annular projection engages with an annular recess of the base body 8. The stainless steel parts can be welded to each other.

[0025] Figures 4 and 5 show that a plurality of cooling ducts 7 are arranged at equal intervals across the circumferential direction of the base body 8. The cooling ducts 7 extend as linear through-holes that communicate with the outer wall 10 of the base body 8. A plurality of gas outlet holes 12 extend between two directly adjacent cooling ducts 7, and they are also formed as through-holes. The diameter of the cooling ducts 7 can also be in the range of 1 mm to 8 mm. In an exemplary embodiment, 20 cooling ducts 7 extending parallel to each other are provided.

[0026] A 3D metal printing process can be used for the manufacture of the base body 2.

[0027] As a method for manufacturing a quartz base body, selective laser-induced etching (SLE) can be used. In this method, in the first process step, local material modification of a homogeneous quartz starting body that can be made into a cylindrical annular body is performed. For this purpose, an ultra-short pulse laser beam is focused on a focal point in the micrometer region. In that case, by three-dimensional movement of the laser beam with respect to the quartz base body, the focal point is induced to pass through the internal region of the quartz body in a writing manner. The focused laser beam is used to expose an internal region away from the surface. Through a multi-photon process, material modification of the quartz material occurs at the focal point of the laser beam. The material modified in this way can be removed by an etching solution in the second process step. This can be KOH.

[0028] This method can be used to fabricate both the cooling ducts 7 and the gas outlet holes 12. The gas introduction member manufactured by this method can have cooling ducts 7 or gas outlet holes smaller than 2 mm, smaller than 1 mm, smaller than 0.5 mm, and smaller than 0.2 mm. Preferably, the diameter of the cooling ducts 7 is in the range between 0.1 mm and 2 mm or 3 mm.

[0029] By this method, it is possible to fabricate the cooling duct 7 that extends not only linearly but also in a curved shape, particularly in a spiral shape, as can be achieved by the gas introduction member 1 according to the present invention.

[0030] FIG. 6 shows an example of a cooling duct 7 that extends in a meandering shape. The cooling duct 7 meanders within the outer wall 10, and in that case, one or more gas outlet holes 12 can be arranged within one turn of the cooling duct 7.

[0031] FIG. 7 schematically shows a CVD reactor including a housing made of, for example, stainless steel and having a holder 2 protruding therefrom by the gas introduction member 1. The holder 2 holds the process chamber ceiling 36, and the process chamber ceiling is the upper boundary of the process chamber 37. On the lower side, the process chamber 37 is bounded by a susceptor 38 that extends parallel to the process chamber ceiling 36. The susceptor 38 has a plurality of pockets arranged circularly around a rotation axis, and a substrate holder 42 for holding at least one substrate 40 is inserted into each of them. The substrate holder 42 is placed on a gas cushion that rotates the substrate holder 42. The susceptor 38 can be rotationally driven around its axis in the drawing by a shaft 41. Therefore, the substrate holder 42 rotates around the stationary gas introduction member 1. The susceptor 38 is heated by a heating device 39.

[0032] The holder 2 and the base 8 or the gas introduction member 1 can be connected to each other by a welded joint.

[0033] FIG. 8 shows a further modification of the present invention, in which the cooling duct 7 branches into two cooling ducts that extend parallel to each other, and the two cooling ducts that extend parallel to each other recombine at another position. One or more gas outlet holes can be arranged within the region surrounded by the branched cooling ducts.

[0034] In the exemplary embodiment shown in FIG. 9, the cooling duct 7 is also branched in order to recombine later. The branched cooling ducts 7 annularly surround the gas outlet holes 12. In the embodiments shown in FIGS. 8 and 9, the cooling ducts 7 have a substantially constant cross-section over their entire length.

[0035] The above description is for explaining the invention targeted by the present application as a whole, and is also for further developing the prior art by at least the combination of the following features. However, it is also possible to combine two, several, or all of these combinations of features.

[0036] A gas introduction member, wherein the cooling device has a plurality of cooling ducts 7 extending between two coolant chambers 5 and 6 separated from each other within the outer wall 10.

[0037] The outer wall 10 is made of a metal, ceramic, or quartz, particularly stainless steel. The coolant chambers 5 and 6 are assigned to opposite ends of the base 8 to form a coolant distribution chamber and a coolant recovery chamber, and they are fluidly connected to each other by at least 10 parallel-connected cooling ducts 7, and / or the cooling ducts 7 have walls without branches and breaks and are not connected to each other, and / or the cooling ducts 7 are guided around one or more gas outlet holes 12 while forming branches, and / or each has a constant cross-section over its entire length, and / or the cooling ducts 7 are circular, elliptical, or polygonal, in any case having a cross-section over the entire surface, characterized gas introduction member.

[0038] A gas introduction member, wherein the cooling duct 7 is formed linearly, curvilinearly, or meanderingly between the gas outlet holes 12 formed by radial holes within the outer wall 10, and the openings 7', 7" of the cooling duct 7 extend into the parallel end faces 8', 8" of the base 8.

[0039] The first coolant chamber 5 is assigned to the first end face 8' and forms an annular space, and the second coolant chamber 6 is assigned to the second end face 8", and / or the first coolant chamber 5 is separated from at least one gas distribution chamber 13 by an annular plate 16, and the first coolant chamber 6 is separated from at least one gas distribution chamber 15 by a separation plate 22, and / or the coolant supply line 3 opens into the first coolant chamber 5, and / or the coolant supply line 3 is formed by a pipe 30 extending concentrically with the axis of the cylindrical base body 8, and / or the second coolant chamber 6 is closed by a closing element 23 forming a wall extending parallel to the separation plate 22. A gas introduction member characterized by the above.

[0040] Two or more gas distribution chambers 13, 14, 15 are arranged one behind the other in the axial direction of the base body 8 and separated from each other by separation plates 20, 21, and gas supply lines 31, 32, 33 open into each of the plurality of gas distribution chambers 13, 14, 15, and / or the gas supply lines 31, 32, 33 opening into the gas distribution chambers 13, 14, 15 are formed by an annular cross-sectional space, and they extend between the opposing surfaces of the concentric pipes 27, 28, 29, 30, and / or the innermost of the concentrically arranged pipes 27, 28, 29, 30 forms the coolant supply line 3, and / or the separation plates 20, 21, 22 have central holes, and the pipes 28, 29, 30 pass through them. A gas introduction member characterized by the above.

[0041] Separation plates 20, 21, 22 that separate different gas distribution chambers 13, 14, 15 from each other and / or separate the coolant chamber 6 from the gas distribution chamber 15 are connected to annular bridges 17, 18, 19 formed of the same material as the base body 8, and / or the base body 8 has annular bridges 17, 18, 19 for attaching to separation plates 20, 21, 22 surrounding holes with different diameters from each other, the hole of the annular bridge 19 directly adjacent to the end face 8” of the base body has the largest diameter and the diameters of the holes of the annular bridges 18, 17 located axially away from it decrease step by step, and / or the radially inner edges of the annular bridges 17, 18, 19 form steps 34, against which the stepped edges of the separation plates 20, 21, 22 are attached, and / or the separation plates 20, 21, 22 are made of quartz, and / or the separation plates 20, 21, 22 have central holes, the separation plate 22 with the largest outer diameter forms a central hole with the smallest diameter, and the separation plate 20 with the smallest outer diameter forms a central hole with the largest diameter, and / or the three gas distribution chambers 13, 14, 15 are arranged axially one behind the other, and / or the separation plates 20, 21, 22 are made of a metal, especially stainless steel, and are welded to the annular bridges 17, 18, 19. A gas introduction member is characterized by the above.

[0042] An annular pressure barrier 24 is arranged in one or more gas distribution chambers 13, 14, 15. The pressure barrier 24 is arranged around the central gas supply lines 31, 32, 33 and has passage holes 35 for the gas supplied to the gas distribution chambers 13, 14, 15 to pass through to an annular chamber surrounding the pressure barrier 24 and adjacent to the inner surface 11’ of the outer wall 10, and / or the pressure barrier 24 is formed by a pipe element having opposite edges 24’ that at least partially engage with the recesses 25, 26 of the boundary walls that axially separate the gas distribution chambers 13, 14, 15, and / or the pressure barrier 24 is made of quartz, and / or the pressure barrier 24 is made of a metal, especially stainless steel, and is welded to the separation plates 20, 21, 22 or the annular plate 16. A gas introduction member is characterized by the above.

[0043] A gas introduction member, characterized in that at least cooling ducts (7) extending linearly, non-linearly, curvilinearly or meanderingly and uniformly distributed circumferentially within an outer wall (10) are manufactured by selective laser etching.

[0044] A gas introduction device, characterized in that a holder (2) holds the gas introduction member (1) according to one of the preceding claims and / or the holder (2) is welded to the gas introduction member (1).

[0045] All features disclosed are essential to the invention, either for themselves or in combination with each other. The disclosure of the application herein includes the entire content of the disclosure of the relevant / added priority documents (copies of the previous applications), which is also for the purpose of incorporating the features of these documents into the claims of the present application. Dependent claims, especially for the purpose of filing divisional applications based on these claims, characterize further developments of the prior art that are independently inventive even without the features of the claims being cited. The invention specified in each claim can additionally have one or more functions specified in the foregoing description, especially those provided with reference signs and / or specified in the description of the signs. The invention also relates, in particular, to design forms in which the individual features described in the foregoing description are not implemented, provided that they are clearly unnecessary for their respective intended uses or can be replaced by other means having the same technical effect.

Explanation of reference signs

[0046] 1 Gas introduction member 2 Holder 3 Coolant supply line 4 Coolant discharge line 5 Coolant chamber 6 Coolant chamber 7 Cooling duct 7’ Opening 7” Opening 8 Substrate 8’ (Cylindrical) end face 8” End face 9 Connection part 10 Outer wall, gas distribution wall 11 Gas outlet surface 11’ Inner surface 12 Gas outlet hole 13 Gas distribution chamber 14 Gas distribution chamber 15 Gas distribution chamber 16 Annular plate 17 Annular bridge 18 Annular bridge 19 Annular bridge 20 Separation plate 21 Separation plate 22 Separation plate 23 Closing element 24 Pressure barrier 24’ Edge 25 Recess 26 Recess 27 Pipe 28 Pipe 29 Pipe 30 Pipe 31 Gas supply line 32 Gas supply line 33 Gas supply line 34 Step 35 Through hole 36 Process chamber 37 Process chamber ceiling 38 Susceptor 39 Heating device 40 Substrate 41 Shaft 42 Substrate holder

Claims

Claim 1 A cylindrical substrate (8) having an outer wall (10) that surrounds at least one gas distribution chamber (13, 14, 15) and forms a gas outlet surface (11) through which a plurality of gas outlet holes (12) starting from the gas distribution chamber (13, 14, 15) open; at least one gas supply line (31, 32, 33) capable of supplying gas to the gas distribution chamber (13, 14, 15); and a cooling device that allows a coolant to pass through by being fluidly connected to two coolant lines (3, 4) and a coolant chamber (6) disposed on the bottom surface of the substrate (8). A gas introduction member for a CVD reactor, The gas introduction member, wherein the cooling device has a plurality of cooling ducts (7) that are separated from each other and extend adjacent to each other within the outer wall (10) between a coolant chamber (6) disposed on the bottom surface of the substrate (8) and an annular coolant chamber (5) spaced apart from the coolant chamber (6) in the axial direction of the cylindrical substrate (8). Claim 2 The gas introduction member according to claim 1, wherein the outer wall (10) is made of a metal, ceramic, or quartz, particularly stainless steel, and forms a coolant distribution chamber and a coolant recovery chamber that are fluidly connected to each other by at least ten parallel-connected cooling ducts (7). Claim 3 The gas introduction member according to claim 1 or 2, wherein the cooling duct (7) has no branches, has a wall that is not interrupted, and is not connected to each other; or the cooling duct (7) is guided while forming branches around one or more gas outlet holes (12); or each of the cooling ducts (7) has a constant cross-section over its entire length, and the entire cross-section is circular, elliptical, or polygonal. Claim 4 The gas introduction member according to any one of claims 1 to 3, wherein the coolant chambers (5, 6) are assigned to opposite end faces of the substrate (8). Claim 5 The gas introduction member according to any one of claims 1 to 4, wherein the cooling duct (7) extends linearly, curvilinearly, or serpentinely between the gas outlet holes (12) formed by the radially directed holes of the outer wall (10), and the openings (7', 7") of the cooling duct (7) extend within parallel end faces of the substrate (8). Claim 6 The first coolant chamber (5) is assigned to the first end face (8') and forms an annular space, and the second coolant chamber (6) is assigned to the second end face (8"), and the second coolant chamber (6) is separated from at least one gas distribution chamber (15) by a separation plate (22). The gas introduction member according to claim 5, characterized in that.

7. The first coolant line (3) opens into the first coolant chamber (5), and the first coolant line (3) is formed by a pipe (30) extending concentrically with the axis of the cylindrical base body (8), and the second coolant chamber (6) is closed by a closing element (23) forming a wall extending parallel to the separation plate (22). The gas introduction member according to claim 6, characterized in that.

8. The gas introduction member according to claim 6 or 7, characterized in that the first coolant chamber (5) is separated from at least one gas distribution chamber (13) by an annular plate (16).

9. Two or more gas distribution chambers (13, 14, 15) are arranged one behind the other in the axial direction of the base body (8) and separated from each other by separation plates (20, 21, 22), and gas supply lines (31, 32, 33) open into each of the plurality of gas distribution chambers (13, 14, 15). The gas introduction member according to any one of claims 1 to 8, characterized in that.

10. The gas supply lines (31, 32, 33) opening into the gas distribution chambers (13, 14, 15) are formed by a space having an annular cross section extending between opposite surfaces of coaxial pipes (27, 28, 29, 30), and the innermost pipe of the plurality of pipes (27, 28, 29, 30) arranged coaxially with each other forms the coolant supply line (3), and the separation plates (20, 21, 22) have a central hole through which the pipes (28, 29, 30) pass. The gas introduction member according to claim 9, characterized in that.

11. The separation plates (20, 21, 22) separating different gas distribution chambers (13, 14, 15) from each other and / or separating the coolant chamber (6) from the gas distribution chamber (15) are connected to annular bridges (17, 18, 19) formed of the same material as the base body (8), and / or The annular bridges (17, 18, 19) formed of the same material as the base body (8) surround holes having different diameters for fixing to the separation plates (20, 21, 22), and the hole of the annular bridge (19) directly adjacent to the end face (8”) of the base body has the largest diameter, and the diameters of the holes of the annular bridges (18, 17) spaced axially therefrom decrease stepwise, and / or the radially inner edges of the annular bridges (17, 18, 19) form steps to which the stepped edges of the separation plates (20, 21, 22) are attached, and / or the separation plates (20, 21, 22) are made of quartz, and / or the separation plates (20, 21, 22) have central holes, the separation plate (22) having the largest outer diameter forms a central hole having the smallest diameter, and the separation plate (20) having the smallest outer diameter forms a central hole having the largest diameter, and / or the three gas distribution chambers (13, 14, 15) are arranged axially one behind the other, and / or The gas introduction member according to any one of claims 1 to 10, characterized in that the separation plates (20, 21, 22) are made of a metal, particularly stainless steel, and are welded to the annular bridges (17, 18, 19).

12. An annular pressure barrier (24) is arranged in one or more gas distribution chambers (13, 14, 15), the pressure barrier (24) is arranged around the central gas supply lines (31, 32, 33), and has passage holes (35) for passing the gas supplied to the gas distribution chambers (13, 14, 15) to an annular chamber surrounding the pressure barrier (24) and adjacent to the inner surface (11’) of the outer wall (10), and / or the pressure barrier (24) is formed of a pipe element having opposite edges (24’) that at least partially engage recesses (25, 26) of the boundary walls axially delimiting the gas distribution chambers (13, 14, 15), and / or the pressure barrier (24) is made of quartz, and / or The gas introduction member according to claim 11, characterized in that the pressure barrier (24) is made of a metal, particularly stainless steel, and is welded to the separation plates (20, 21, 22).

13. At least a cooling duct (7) extending linearly, non-linearly, curvilinearly, or meanderingly and uniformly distributed circumferentially within the outer wall (10) is manufactured by selective laser etching, the gas introduction member according to any one of claims 1 to 12.

14. A gas introduction device for supplying one or more process gases to a process chamber of a CVD reactor, comprising a holder (2) fixed on the housing of the CVD reactor, through which a gas supply line (31, 32, 33), a coolant supply line (3), and a coolant discharge line (4) extend. The gas introduction device, wherein the holder (2) holds the gas introduction member (1) according to any one of claims 1 to 13.

15. A CVD reactor comprising the gas introduction device according to claim 14, wherein the susceptor surrounding the gas introduction member (1) extending between the ceiling plate of the process chamber and the susceptor forming the floor of the process chamber, and the susceptor carrying a substrate.

16. A gas introduction device for supplying one or more process gases to a process chamber of a CVD reactor, comprising a holder (2) fixed on the housing of the CVD reactor, through which a gas supply line (31, 32, 33), a coolant supply line (3), and a coolant discharge line (4) extend. The gas introduction device, wherein the holder (2) is welded to the gas introduction member (1) according to any one of claims 1 to 13.

17. A CVD reactor comprising the gas introduction device according to claim 16, wherein the susceptor surrounding the gas introduction member (1) extending between the ceiling plate of the process chamber and the susceptor forming the floor of the process chamber, and the susceptor carrying a substrate.

Images