Cleaning Brush for Semiconductor Fabrication Process

Abstract

A cleaning brush for a semiconductor manufacturing process is provided. The cleaning brush includes a core and a brush member. The core includes a peripheral portion and a closed-end portion. The peripheral portion surrounds the rotation axis of the cleaning brush and defines an inlet opening for receiving fluid. The closed-end portion is connected to an end of the peripheral portion on the opposite side of the inlet opening along the rotation axis. At least one elongated conduit is defined within the core and is in fluid communication with the inlet opening, and the peripheral portion includes a plurality of outlet channels for passing therethrough and being in fluid communication with the elongated conduit, and the outlet channels are inclined outwardly toward the closed-end portion. The brush member is connected to the outer surface of the peripheral portion and covers all of the plurality of outlet channels.

Description

Technical Field

[0001] The present disclosure generally relates to a cleaning brush for removing residues from a semiconductor substrate in a semiconductor manufacturing process. In particular, the present disclosure relates to a cleaning brush in a post-CMP cleaning process.

Background Art

[0002] Integrated circuits can be formed on a semiconductor substrate, particularly a silicon wafer, by successive deposition of conductive, semiconductive, and insulating layers on the wafer. After each layer is deposited, circuit features can be etched. After a series of layers have been deposited and etched, the uppermost surface of the substrate may become increasingly non-planar. A non-planar surface may cause problems in the photolithography steps of the integrated circuit manufacturing process.

[0003] To remove and / or polish some surfaces of a very small electronic device wafer, a chemical mechanical polishing (CMP) process, also called chemical mechanical planarization, is performed on the semiconductor substrate. The CMP process refers to a method of removing a solid layer by chemical mechanical polishing performed for the purpose of surface planarization and definition of metal interconnect patterns. In a typical CMP operation, a rotating polishing pad that receives a chemically reactive slurry is used to polish the outermost surface of the substrate. The substrate is positioned on the polishing pad and held in place by a retaining ring. Generally, the substrate and the retaining ring are mounted on a carrier head or a polishing head. A controlled force is applied to the substrate by the carrier head to press the substrate against the polishing pad. Movement of the polishing pad across the surface of the substrate causes material to be removed chemically and mechanically from the surface of the substrate.

[0004] After polishing, contaminants, including slurry particles, organic residues, and / or metallic impurities, may be present on the wafer surface and must be removed. If the contaminants are not removed, such contaminants can lead to various defects, such as scratches and corrosion spots, in subsequent processing steps, thereby causing a reduction in the product yield of the integrated circuit. Accordingly, what is needed is a system and method for effectively removing contaminants from a semiconductor substrate after a CMP process that addresses the above problems. SUMMARY OF THE INVENTION

[0005] Briefly stated, the present disclosure provides a cleaning brush that includes a core and a brush member. The core includes a circumferential portion that surrounds the axis of rotation of the present cleaning brush and defines an inlet opening for receiving fluid, and a closed end portion connected to an end of the circumferential portion opposite the inlet opening along the axis of rotation. At least one elongated conduit is defined within the core and is in fluid communication with the inlet opening, and the circumferential portion includes a plurality of outlet channels for passing therethrough and being in fluid communication with the elongated conduit, and the outlet channels are inclined outwardly toward the closed end portion. The brush member is connected to the outer surface of the circumferential portion and covers all of the plurality of outlet channels.

[0006] In another aspect, the present disclosure provides a cleaning brush that includes a core and a brush member. The core includes a circumferential portion that surrounds the axis of rotation of the present cleaning brush and defines an inlet opening for receiving fluid, and a closed end portion connected to an end of the circumferential portion opposite the inlet opening along the axis of rotation. At least one elongated conduit is defined within the core and is in fluid communication with the inlet opening, and the circumferential portion includes a plurality of outlet channels for passing therethrough and being in fluid communication with the elongated conduit. Further, a first zone, a second zone, and a third zone of the core are defined in order along the direction from the inlet opening to the closed end portion, and the total volume per unit length of the core of the elongated conduit and the outlet channels within each of the respective first zone, second zone, and third zone decreases gradually. The brush member is connected to the outer surface of the circumferential portion and covers all of the plurality of outlet channels.

[0007] In yet another aspect, the present disclosure provides a CMP (chemical mechanical planarization) apparatus including a CMP module and a post-CMP cleaning module. The CMP module is configured to perform a CMP process on a semiconductor wafer. The post-CMP cleaning module is positioned downstream of the CMP module and includes a core and a brush material surrounding the core, and is configured to perform a cleaning process on the semiconductor wafer. An inlet opening, an elongated conduit, and a plurality of outlet channels are disposed in the core to guide liquid flowing in the core to the brush material through the inlet opening, through the elongated conduit, and through the outlet channels. At least the following three parameters of a first outlet channel and a second outlet channel among the outlet channels spaced apart from the inlet opening by different distances, namely, (a) the width of the outlet channel, (b) the cross-sectional shape of the outlet channel, and (c) the inclination angle of the outlet channel with respect to the longitudinal direction of the core, are different such that a preferential flow distribution or a target flow distribution of the liquid in the core is presented.

[0008] Since various changes and modifications will become apparent to those skilled in the art from the following embodiments for carrying out the invention, in the following embodiments for carrying out the invention, the embodiments are described by way of example only. The use of the same reference numerals in different figures indicates similar or equivalent items.

Brief Description of the Drawings

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Best Mode for Carrying Out the Invention

[0010] In the following embodiments for carrying out the invention, reference is made to the accompanying drawings, which form part of the description thereof. In the drawings, like reference numerals generally identify like components unless the context dictates otherwise. Further, unless otherwise stated, the description of each successive drawing may refer to features from one or more of the previous drawings to provide a clearer context and more substantial description of the current exemplary embodiment. Also, the exemplary embodiments described in the embodiments for carrying out the invention, the drawings, and the claims are not limiting. Other embodiments may be utilized and other changes may be made without departing from the spirit or scope of the subject matter presented herein. Aspects of the present disclosure can be configured, arranged, substituted, combined, separated, and designed in a variety of different configurations as generally described herein and shown in the drawings, and all of these are readily understood to be explicitly contemplated herein.

[0011] Spatially relative terms such as "beneath," "below," "lower," "above," "over," "upper," "on," etc. may be used herein for ease of description to describe the relationship of one or more elements or features of a certain element or feature shown in the figure to another element or feature. Spatially relative terms include different orientations of the device during use or operation in addition to the orientation shown in the figure. The device may be otherwise oriented (rotated 90 degrees or in another orientation), and the spatially relative descriptors used herein may be interpreted accordingly.

[0012] As used herein, terms such as "first", "second", and "third" represent various elements, components, regions, layers, and / or sections, and these elements, components, regions, layers, and / or sections should not be limited by these terms. These terms can only be used to distinguish one element, component, region, layer, or section from another. Terms such as "first", "second", and "third" do not imply an order or sequence when used herein, unless clearly indicated by the context.

[0013] As used herein, terms such as "substantially", "essentially", "substantial", and "about" are used to describe and account for small variations. When used with an event or situation, these terms may refer to instances where the event or situation occurs exactly, as well as instances where the event or situation occurs substantially.

[0014] Embodiments of the present disclosure provide a brush design with improved performance, including a consistent and uniform fluid distribution across the entire length of the brush. Such a uniform fluid distribution results in a consistent and reduced cleaning time, as well as improved and uniform cleaning performance, for the brush itself or for the substrate to be cleaned by the brush, compared to a brush with uniformly spaced discharge outlets extending perpendicular to the axis of rotation.

[0015] In an exemplary embodiment, the brush of the present invention is used in a CMP (chemical mechanical planarization) system to remove contaminants such as slurry particles, organic residues, and / or metal impurities adhering to a substrate in a CMP process. However, it should be understood that the present disclosure is not limited to CMP systems, and the brushes of the various embodiments disclosed herein are applicable to other substrate processing tools in the semiconductor manufacturing field. For example, the brush can be used to clean a semiconductor wafer after a chemical etching process, an epitaxial growth process, etc.

[0016] FIG. 1 is a front perspective view of the post-CMP cleaning module 1, and FIG. 2 is a right perspective view of the post-CMP cleaning module 1 according to at least one exemplary embodiment. According to some embodiments of the present disclosure, the post-CMP cleaning module 1 includes a pair of cleaning brushes 10 and several rollers 3. The two cleaning brushes 10 are configured to clean the upper and lower surfaces of the semiconductor wafer 5. The rollers 3 are configured to abut against the edge of the semiconductor wafer 5 and rotate the semiconductor wafer 5 in a perpendicular direction. During the cleaning process, the two cleaning brushes 10 are driven to rotate about the rotation axes R1 and R2, and a predetermined external force is applied to the cleaning brushes 10 such that the surface of the cleaning brush 10 presses against the surface of the semiconductor wafer 5. On the other hand, the roller 3 can be rotated about the rotation axis R3 to drive the semiconductor wafer 5 to rotate.

[0017] In some embodiments, as shown in FIG. 1, the cleaning brush 10 includes a core 20 and a brush member 40. As shown in FIG. 2, the brush member 40 surrounds the core 20 and includes several nodules 41 arranged along the entire length of the brush member 40. The length L0 of the brush member 40 can be greater than the diameter W0 of the semiconductor wafer 5, and the brush member 40 can be positioned across the semiconductor wafer 5 during the cleaning process such that both the central portion and the peripheral portion of the semiconductor wafer 5 are cleaned by the nodules 41 of the brush member 40. However, it will be understood that many variations and modifications can be made to the embodiments of the present disclosure. In some other embodiments, the length of the brush member 40 is less than the diameter W0 of the semiconductor wafer 5, and a plurality of brush members 40 are used to clean the upper and lower surfaces of the semiconductor wafer 5.

[0018] In some embodiments, as shown in FIG. 2, the CMP post - cleaning module 1 further includes a liquid tank 2 and a liquid line 4. A cleaning liquid 6, such as a surfactant and / or deionized water, is supplied from the liquid source 2 through the liquid line 4 to the inlet port 29 of the cleaning brush 10. The cleaning liquid 2 flows along the core 20 and is uniformly distributed over the entire surface of the semiconductor wafer 5 through a plurality of holes (described in detail with reference to FIGS. 3 and 4) formed on the core 20 as indicated by the arrow 6 shown in FIG. 1.

[0019] The detailed structure of the core 20 of the cleaning brush 1 according to an exemplary embodiment is described below.

[0020] FIG. 3 is a longitudinal perspective cross - sectional view of the cleaning brush 1 according to a first exemplary embodiment. For the purpose of illustration, the brush member 40 of the cleaning brush 1 is not shown in FIG. 3. In an exemplary embodiment, the core 20 has a first end 21 and a second end 22 opposite the first end 21 in the longitudinal direction L of the core 20. The core 20 includes a peripheral portion 23 centered about the rotation axis R1 of the core 20 to form a hollow cylindrical shape. An elongated conduit 26 is defined by the inner surface 231 of the peripheral portion 23. The elongated conduit 26 allows the flow of the cleaning liquid along the longitudinal direction L of the core 20. The elongated conduit 26 may have a circular cross - section whose center is aligned with the rotation axis R1 of the core 20. Alternatively, the elongated conduit 26 may have a polygonal cross - section with edges arranged mirror - symmetrically with respect to the rotation axis R1 of the core 20.

[0021] The inlet opening 25 is formed at the first end 21 to allow the cleaning liquid to enter into the elongated conduit 26. A separate inlet port, such as the inlet port 29 shown in FIG. 2, is connected to the inlet opening 25 to facilitate the engagement of the fluid line 4 to the inlet opening 25. The inlet port 29 can be joined to the core 20 by thermal energy, fusion, adhesive, or a snap fit to the inlet opening 25. In such an arrangement, the core 20 can be used in various process tools having different drive ends and / or fluid inlets while using a single mold to make the core 20 without modification to the end fitting.

[0022] The core 20 further includes a closed end portion 24 that connects to the surrounding portion 23 at the second end 22 of the core 20. The second end 22 of the core 20 is sealed or closed by the closed end portion 24, and thus the cleaning liquid is not allowed to pass through the second end 22 of the core 20. However, it will be understood that many variations and modifications can be made to the embodiments of the present disclosure. In some other embodiments, both the first end 21 and the second end 22 of the core 20 are open, and the cleaning liquid is supplied into the core 20 through both ends of the core. Alternatively, the cleaning liquid enters the core 20 through an opening formed at the first end of the core 20 and exits the core 20 through another opening formed at the second end of the core 20.

[0023] A plurality of outlet channels 30 are formed in the peripheral portion 23 of the core 20 and are configured to discharge the cleaning liquid from the elongated conduit 26 to the brush member 40 (FIGS. 1 and 2) surrounding the core 20. Each of the outlet channels 30 passes through the peripheral portion 23 of the core 20 and extends from the inner surface 231 to the outer surface 232 of the peripheral portion 23. Some groups of the outlet channels 30 are arranged in sequence along the longitudinal direction L of the core 20 at a constant pitch or at a varying pitch. The outlet channels 30 of each group are arranged around the rotation axis R1 of the core 20. According to an exemplary embodiment of the present disclosure, there are 144 outlet channels 30 formed in the peripheral portion 23 of the core 20, and every six outlet channels 30 are grouped together. For example, as shown in FIG. 3, the groups G0, G1, G2, and GN each consist of six outlet channels 30 arranged around the rotation axis R1 of the core 20.

[0024] FIG. 4 is an enlarged view of the region M1 of the core 20 shown in FIG. 3, where the brush member 40 covers the outer surface 232 of the core 20. In some embodiments, each of the outlet channels 30 has an upstream section 31 and two or more downstream sections, such as a first downstream section 32 and a second downstream section 33. The upstream section 31 extends from the inner surface 231 of the core 20 and terminates at a distal end 313. The end of the upstream section 31 formed on the inner surface 231 of the core 20 defines the inlet hole 311 of the outlet channel 30. The distal end 313 is far from the outer surface 232 of the core 20 and is not connected to the outer surface 232.

[0025] In some embodiments, the upstream section 31 of the outlet channel 30 is inclined outwardly towards the closed end portion 24 (FIG. 3). Specifically, as shown in FIG. 4, the inner wall 315 of the upstream section 31 is inclined at an inclination angle A1 with respect to the inner surface 231 of the surrounding portion 23. The inclination angle A1 can be in the range of about 20 degrees to about 80 degrees, preferably in the range of about 30 degrees to about 60 degrees. In an exemplary embodiment, the inclination angle A1 is about 45 degrees. As shown in FIG. 4, due to the inclined arrangement, the inlet hole 311 of the outlet channel 30 has an oval shape. The purpose of inclining the outlet channel 30 towards the closed end portion (i.e., aligning with the flow direction) is to reduce the resistance to the fluid flow in the core 20 so that a greater flow volume exits from the outlet channel 30 compared to an outlet channel that is perpendicular to the flow direction.

[0026] In some embodiments, the inclination angle A1 of the outlet channel 30 near the closed end portion 24 is steeper than the inclination angle of the outlet channel 30 near the inlet opening 25. For example, the outlet channels 30 in the group G0 closest to the inlet opening 25 are inclined at a first angle with respect to the inner surface 231 of the surrounding portion 23, and the outlet channels 30 in the group GN closest to the closed end portion 24 are inclined at a second angle with respect to the inner surface 231 of the surrounding portion 23. The second angle is greater than the first angle. In an exemplary embodiment, although not shown in FIG. 3, the first angle is about 20 degrees and the second angle is about 80 degrees. In such an arrangement, the uniformity of the fluid distribution in the core 20 can be further improved.

[0027] The first downstream section 32 and the second downstream section 33 of the outlet channel 30 are connected to the upstream section 31 at their inner ends 321 and 331. The first downstream section 32 and the second downstream section 33 extend respectively from the inner ends 321 and 331 along a direction perpendicular to the outer surface 232 of the core 20, and terminate at the outlet holes 322 and 332 formed in the outer surface 232 of the core 20. In some embodiments, the inner end 321 of the first downstream section 32 intersects the midpoint of the upstream section 31, and the inner end 331 of the second downstream section 33 intersects the distal end 313 of the upstream section 31.

[0028] In some embodiments, the outlet channels 30 have a cross-section that varies along their length. For example, the width of the upstream section 31 of the outlet channel 30 is tapered along the direction in which the upstream section 31 extends. Specifically, as shown in FIG. 4, the upstream section 31 has a first width W11 at the inlet hole 311 and a second width W12 at the distal end 313, and the first width W11 and the second width W12 are perpendicular to the extension axis E1 of the upstream section 31. The second width W12 is smaller than the first width W11. In another exemplary embodiment, the width W13 of the downstream section 32 and the width W14 of the second downstream section 33 are smaller than the width W11 or W12 of the upstream section 31. The width W13 of the downstream section 32 and the width W14 of the second downstream section 33 may be different. For example, the width W13 of the downstream section 32 may be narrower than the width W14 of the second downstream section 33.

[0029] It should be appreciated that the width of the outlet channel 30 and the number of outlet channels 30 may be varied and should not be limited to the above embodiments. In some embodiments, for better uniformity of fluid distribution, Murray's law is applied to design the width D (FIG. 3) of the elongated conduit 26, the first width W11 of the upstream section 31, and the width W13 or width W14 of the downstream sections 32 and 33. For example, the widths D, W11, W13, and W14 are layered according to the following equations (1) and (2): TIFF0007714819000001.tif19170Here, k is the total number of upstream sections 31, i is the total number of downstream sections 32, and j is the total number of downstream sections 33.

[0030] In some embodiments, the cross-sectional shape of the upstream section of an outlet channel differs from the cross-sectional shape of the downstream section. For example, as shown in FIGS. 4A and 4B, the upstream section 31 of an outlet channel 30 in group G1 (FIG. 3) may have a circular shape, and the downstream section 32 of the corresponding outlet channel may have a rectangular shape. In some embodiments, the outlet channels 30 in different groups may have different cross-sectional shapes. For example, as shown in FIGS. 4C and 4D, the upstream section 31 of an outlet channel 30 in group GN (FIG. 3) may have a rectangular shape, and the downstream section 32 of the corresponding outlet channel 30 may have an elliptical shape. That is, the outlet channels 30 in group GN have a different shape from the outlet channels 30 in group G1.

[0031] In some embodiments, the geometry, shape, and size of the outlet channel 30 can be selectively varied along the length of the core 20 as long as uniform pressurization can be obtained. The cross-sectional shape of the outlet channel 30 can be selected from regular shapes, irregular shapes, and / or non-columnar shapes such as those shown in FIGS. 4A-4D, for example, an S-shaped, U-shaped, droplet-shaped, or any other suitable shape as shown in FIG. 4E. Further, when the outlet channel has a rectangular shape, the ratio of the width to the length of the rectangular channel that satisfies the flow requirements and the pressurization target for the post-CMP cleaning process can be derived.

[0032] In some embodiments, the outlet channels 30 in two adjacent groups are arranged in a staggered pattern. For example, as shown in FIG. 3, a first group G1 of outlet channels 30 is located directly adjacent to a second group G2 of outlet channels 30. The outlet channels 30 in the first group G1 are offset from the outlet channels 30 in the second group G2. However, the present disclosure should not be limited to the above embodiments. The outlet channels 30 in two adjacent groups can be aligned with each other in the longitudinal direction L of the core 20.

[0033] The core 20 can be made of any chemically inert polymeric material such as a polymer, copolymer, or other material useful in the CMP cleaning process. In some embodiments, the core 20 is manufactured by a three-dimensional printing technique, and the material used for the core 20 can be, for example, acrylonitrile butadiene styrene (ABS) or polycarbonate. In some embodiments, a high ratio of open surface area is provided in the core 20, but the core 20 still has sufficient rigidity, and one skilled in the art of CMP can select the rigidity such that the desired cleaning results are achieved depending on the composition of the semiconductor substrate, contaminants, or a combination thereof.

[0034] The brush member (40) is formed on the outer surface (232) of the core (20) and covers all of the outlet holes (322, 332) of the outlet channels (30). In an exemplary embodiment, the brush member (40) is made of or includes polyvinyl alcohol (PVA) or other suitable material that is applied in liquid form on the outer surface (232) of the core (20) and then cured. During the formation of the brush member (40), a portion (43) of the material of the brush member (40) may flow into and seal the first downstream section (32) and the second downstream section (33) of the outlet channels (30), as shown in FIG. 4. Due to the small width of the first downstream section (32) and the second downstream section (33) of the outlet channels (30), the first downstream section (32) and the second downstream section (33) are partially filled with the material of the brush member (40), and the upstream section (31) is free of the material of the brush member (40). However, it will be understood that many variations and modifications can be made to the embodiments of the present disclosure. In some other embodiments, the first downstream section (32) and the second downstream section (33) are completely filled with the material of the brush member (40), and the upstream section (31) is partially filled with the material of the brush member (40).

[0035] FIG. 5 shows the simulation results of the liquid pressure distribution in the core 20 of FIG. 3. The simulation was carried out to obtain the pressure distribution over the entire length of the core 20 when the flow of the cleaning liquid is supplied into the core 20 through the inlet opening 25 formed at the first end 21 of the core 20. By following Mariotte's law, the bio-mimicked design of the core 20 ensures a minimum pressure drop of the fluid along the length of the core 20 and exhibits a remarkable uniformity in the pressure distribution of the fluid within the elongated conduit 26 of the core 20. As a result, the pressure of the fluid exiting the outlet channel 30 is substantially uniform, and the large area of the brush member 40 covering the outlet channel is sufficiently rinsed by the cleaning liquid, thereby increasing the cleaning efficiency of the brush member 40 or the semiconductor wafer to be cleaned by the cleaning brush 1. Over the entire length of the core, compared to a conventional core including an outlet channel extending perpendicular to the axis of rotation, the embodiment of the present disclosure presents a larger outlet volume at the proximal end of the core and a smaller outlet volume at the distal end of the core.

[0036] The configuration of the core of the cleaning brush 1 surrounded by the brush member 40 should not be limited to the above-described embodiments. Some exemplary embodiments of the core will be described below.

[0037] FIG. 6 is a longitudinal perspective cross-sectional view of a core 20a according to a second exemplary embodiment. In an exemplary embodiment, the core 20a has a first end 21a and a second end 22a opposite the first end 21a in the longitudinal direction L of the core 20a. Several inlet openings, such as a first inlet opening 251a, a second inlet opening 252a, and a third inlet opening 253a, are defined at the first end 21a of the core to allow the cleaning liquid to enter different conduits in the core 20a. The first inlet opening 251a, the second inlet opening 252a, and the third inlet opening 253a are arranged adjacent to each other and concentrically with respect to the axis of rotation R1 of the core 20a. The first inlet opening 251a, the second inlet opening 252a, and the third inlet opening 253a may have the same width in the radial direction of the core 20a.

[0038] In some embodiments, the core 20a includes a plurality of distinct structures that are telescoped with respect to each other. In an exemplary embodiment, the core 20a includes a first member 201a, a second member 202a, and a third member 203a. The first member 201a, the second member 202a, and the third member 203a each include a first sub-segment wall 234a, a second sub-segment wall 235a, and a third sub-segment wall 236a, respectively. The first sub-segment wall 234a, the second sub-segment wall 235a, and the third sub-segment wall 236a each have a ring shape and are continuously arranged along the longitudinal direction L from the first end 21a to the second end 22a of the core 20a so as to cooperatively construct the peripheral portion 23 of the core 20 on which the brush member 40 (FIG. 1) is formed.

[0039] Furthermore, the first member 201a, the second member 202a, and the third member 203a each include a first fluid guiding portion 237a, a second fluid guiding portion 238a, and a third fluid guiding portion 239a, respectively, for defining a plurality of elongated conduits in the core 20a. Specifically, the first fluid guiding portion 237a is connected to the inner surface of the first sub-segment wall 234a and extends from the distal end of the first sub-segment wall 234a that is directly adjacent to the second sub-segment wall 235a to the first inlet opening 251a. A first elongated conduit 261a is defined between the first sub-segment wall 234a and the first fluid guiding portion 237a and is in fluid communication with the first inlet opening 251a.

[0040] The second fluid guiding portion 238a is connected to the inner surface of the second sub-segment wall 235a and extends from the distal end of the second sub-segment wall 235a that is directly adjacent to the third sub-segment wall 236a to the second inlet opening 252a. The upstream of the second elongated conduit 262a is defined between the first fluid guiding portion 237a and the second fluid guiding portion 238a, and the downstream of the second elongated conduit 262a is defined between the second fluid guiding portion 238a and the second sub-segment wall 235a. The second elongated conduit 262a is in fluid communication with the second inlet opening 252a.

[0041] The third fluid guiding portion 239a is connected to the inner surface of the third sub-segment wall 236a and extends from the distal end of the third sub-segment wall 236a adjacent to the second end 22a of the core 20a to the third inlet opening 253a. The upstream of the third elongated conduit 263a is defined between the second fluid guiding portion 238a and the third fluid guiding portion 239a, and the downstream of the third elongated conduit 263a is defined between the third fluid guiding portion 239a and the third sub-segment wall 236a. The third fluid guiding portion 239a is in fluid communication with the third inlet opening 253a. The closed end portion 24a of the core 20a is defined by a portion of the third fluid guiding portion 239a connected to the third sub-segment wall 236a. The first fluid guiding portion 237a, the second fluid guiding portion 238a, and the third fluid guiding portion 239a can be formed in a streamline shape so as to reduce the impedance of the fluid in the core 20a as shown in FIG. 6.

[0042] A plurality of outlet channels 30a are formed in the first sub-segment wall 234a, the second sub-segment wall 235a, and the third sub-segment wall 236a, and are configured to discharge the cleaning liquid from the first elongated conduit 261a, the second elongated conduit 262a, and the third elongated conduit 263a to the brush member surrounding the core 20a. Each of the outlet channels 30a passes through the peripheral portion 23a of the core 20a and extends from the inner surface 231a to the outer surface 232a of the peripheral portion 23a.

[0043] Some groups of outlet channels 30a are arranged along the longitudinal direction L of the core 20a at a fixed or variable pitch, and the outlet channels 30a in each group are arranged about the rotation axis R1 of the core 20a. The arrangements of the outlet channels 30a in each of the first member 201a, the second member 202a, and the third member 203a are shown in FIGS. 7, 8, and 9, which are cross-sectional perspective views of the core 20a taken along lines A-A, B-B, and C-C, respectively, of FIG. 6. In an exemplary embodiment, as shown in FIGS. 7, 8, and 9, each of the groups of outlet channels arranged about the rotation axis R1 consists of four outlet channels 30a formed in the first sub-segment wall 234a, the second sub-segment wall 235a, and the third sub-segment wall 236a. As shown in FIG. 7, two ends of the outlet channel 30a form an inlet hole 31a and an outlet hole 32a on the inner surface 231a and the outlet surface 232a of the core 23a. In some embodiments, a flange 39a is formed at the outlet hole 32a and surrounds the outlet hole 32a.

[0044] Referring to FIG. 6, in some embodiments, the exit channels 30a are inclined outwardly towards the closed end portion 24a. Specifically, the exit channels 30a formed in the first sub-segment wall 234a each extend along the extension axis E2 and are inclined at an inclination angle A2 with respect to the inner surface 231a of the peripheral portion 23a. The exit channels 30a formed in the second sub-segment wall 235a each extend along the extension axis E3 and are inclined at an inclination angle A3 with respect to the inner surface 231a of the peripheral portion 23a. The exit channels 30a formed in the third sub-segment wall 236a each extend along the extension axis E3 and are inclined at an inclination angle A3 with respect to the inner surface 231a of the peripheral portion 23a. The inclination angles A2, A3, and A4 can be in the range of about 20 degrees to about 90 degrees, preferably in the range of about 30 degrees to about 60 degrees. In an exemplary embodiment, the inclination angles A2, A3, and A4 are about 45 degrees. The purpose of inclining the exit channels 30a towards the closed end portion (i.e., aligning with the flow direction) is to reduce the resistance to the flow of the fluid in the core 20a so that more flow rate exits from the exit channels 30a compared to an exit channel that is perpendicular to the flow direction.

[0045] In some embodiments, the inclination angle of the exit channels 30a near the closed end portion 24a is steeper than the inclination angle of the exit channels 30a near the inlet openings 251a, 252a, and 253a. For example, the inclination angle A4 of the exit channels 30a formed in the third sub-segment wall 236a is greater than the inclination angle A3 of the exit channels 30a formed in the second sub-segment wall 235a, and the inclination angle A3 of the exit channels 30a is greater than the inclination angle A2 of the exit channels 30a formed in the first sub-segment wall 234a. In an exemplary embodiment, although not shown in FIG. 6, the inclination angle A2 is about 20 degrees, the inclination angle A3 is about 45 degrees, and the inclination angle A4 is about 90 degrees. In such an arrangement, the uniformity of the fluid distribution in the core 20a can be further improved.

[0046] In some embodiments, the outlet channels 30a have a cross-section that varies along their length. In an exemplary embodiment, as shown in FIG. 7, the outlet channel 30a has a spindle-shaped cross-section where the width of the middle section of the outlet channel 30 is greater than the width of the inlet hole 31a or the width of the outlet hole 32a. It should be understood that the width of the outlet channel 30a and the number of outlet channels 30a can be varied and should not be limited to the above embodiments. The geometry, shape, and size of the outlet channel 30a can be selectively varied along the length of the core 20a as long as uniform pressurization can be obtained. When the outlet channel has a rectangular shape, the ratio of the spread to the length of the rectangular channel that satisfies the flow requirements and the pressurization target for the post-CMP cleaning process can be derived.

[0047] In some embodiments, a first zone Z1, a second zone Z2, and a third zone Z3 of the core 20a are defined in order along the direction from the inlet openings 251a, 252a, and 253a to the closed end portion 24a. The first zone Z1 corresponds to the segment of the core 20a where the outlet channel 30a of the first sub-segment wall 234a is located. The second zone Z2 corresponds to the segment of the core 20a where the outlet channel 30a of the second sub-segment wall 235a is located. The third zone Z3 corresponds to the segment of the core 20a where the outlet channel 30a of the third sub-segment wall 236a is located.

[0048] In some embodiments, the total volume per unit length of the elongated conduits and the outlet channels within each of the first zone Z1, the second zone Z2, and the third zone Z3 gradually decreases. Specifically, as shown in FIG. 7, the core 20a in the first zone Z1 includes four outlet channels 30a and three elongated conduits 261a, 262a, and 263a. The core 20a in the second zone Z2 includes four outlet channels 30a and two elongated conduits 262a and 263a. The core 20a in the third zone Z3 includes four outlet channels 30a and one elongated conduit 263a. As a result, the total volume per unit length of the elongated conduits in the first zone Z1 is larger than that in the second zone Z2, and the total volume per unit length of the elongated conduits in the second zone Z2 is larger than that in the third zone Z3.

[0049] The core 20a can be made from any chemically inert polymeric material, such as polymers, copolymers, and other materials useful in CMP cleaning processes. In some embodiments, the core 20a is manufactured by three-dimensional printing techniques, and the materials used for the core 20a can include, for example, acrylonitrile butadiene styrene (ABS) or polycarbonate. In some embodiments, the core 20a includes several layers nested within each other, but the core 20a still has sufficient rigidity to maintain cleaning uniformity.

[0050] FIG. 10 is a longitudinal perspective cross-sectional view of a core 20b according to a third exemplary embodiment. In an exemplary embodiment, the core 20b has a first end 21b and a second end 22b opposite the first end 21b in the longitudinal direction L of the core 20b. The core 20b includes a peripheral portion 23b centered about a rotational axis R1 of the core 20b to form a hollow cylindrical shape. An elongated conduit 26b is defined by an inner surface 231b of the peripheral portion 23b. The elongated conduit 26b enables the flow of a cleaning liquid along the longitudinal direction L of the core 20b.

[0051] An inlet opening 25b is formed at first end 21b to allow entry of cleaning fluid into elongated conduit 26b. Core 20b further includes a closed end portion 24b that connects to surrounding portion 23b at second end 22b of core 20b. Second end 22b of core 20b is sealed by closed end portion 24b, and therefore cleaning fluid is not allowed to pass through second end 22b of core 20b. A flange 28b may be formed on an outer surface of closed end portion 24b for connection of core 20b to a tool spindle (not shown).

[0052] Several outlet channels 30b are formed in the peripheral portion 23b of the core 20b and are configured to discharge cleaning fluid from the elongated conduit 26b to the brush member 40 (FIGS. 1 and 2) surrounding the core 20b. Each of the outlet channels 30b passes through the peripheral portion 23b of the core 20b and extends from the inner surface 231b to the outer surface 232b of the peripheral portion 23b. Several groups of outlet channels 30b are arranged sequentially along the longitudinal direction L of the core 20b, at a constant or varying pitch. The outlet channels 30b in each group are arranged around the rotation axis R1 of the core 20b. According to an exemplary embodiment of the present disclosure, each of the groups, such as groups G1, G2, and G3, consists of four outlet channels 30b arranged around the rotation axis R1 of the core 20b (only three outlet channels in each group are shown in FIG. 10).

[0053] In some embodiments, the inner surface 231b of the peripheral portion 23b is tapered along the longitudinal direction L of the core 20b from the inlet opening 25b to the closed end portion 24b. Accordingly, the thickness of the peripheral portion 23b gradually increases in a direction away from the inlet opening 25b, and the outlet channels 30b arranged along the longitudinal direction L have a gradually increasing volume. For example, the outlet channel 30b of group G3 has a larger volume than that of the outlet channel 30b of group G2. Further, the outlet channel 30b of group G2 has a larger volume than that of the outlet channel 30b of group G1. In the embodiment shown in FIG. 10, groups G1, G2, and G3 are three groups of outlet channels arranged in order along the longitudinal direction of the core 20b.

[0054] FIG. 11 is an enlarged view of a region M2 of the core 20b shown in FIG. 10, in which the brush member 40b covers the outer surface 232b of the core 20b. In some embodiments, each of the outlet channels 30b has an upstream section 31b and a downstream section 32b. The upstream section 31b extends from the inner surface 231b of the core 20b and is connected to the downstream section 32b. The end of the upstream section 31b formed on the inner surface 231b of the core 20b defines an inlet hole 311b of the outlet channel 30b. The downstream section 32b extends from the outer surface 232b of the core 20b and is connected to the upstream section 31b. The end of the downstream section 32b formed on the outer surface 232b of the core 20b defines an outlet hole 322b of the outlet channel 30b.

[0055] In some embodiments, the outlet channels 30b have a cross-section that varies along their length. For example, as shown in FIG. 11, the upstream section 31b includes an outwardly tapered rounded corner or chamfer and has an inner wall inclined with respect to the inner surface 231b of the peripheral portion 23b. The downstream section 32b is perpendicular to the outer surface 232b of the peripheral portion 23b. As a result, a first width W31 of the inlet hole 311b is larger than a second width W32 of the outlet hole 322b.

[0056] It should be understood that the width of the outlet channel 30b and the number of the outlet channels 30b can be varied and should not be limited to the above embodiments. Further, the geometry, shape and size of the outlet channel 30b can be selectively varied along the length of the core 20b as long as uniform pressurization can be obtained.

[0057] The core 20b can be made from any chemically inert polymeric material such as polymers, copolymers, and other materials useful in CMP cleaning processes, and can be formed by using an injection molding process. In some embodiments, as shown in FIG. 11, the brush member 40b is formed on the outer surface 232b of the core 20b and covers all of the outlet holes 322b of the outlet channel 30b. In an exemplary embodiment, the brush member 40b is applied in liquid form onto the outer surface 232b of the core 20b and then cured. During the formation of the brush member 40b, the material of the brush member 40b fills the entire volume of the outlet channel 30b. In some embodiments, the brush member 40b includes polyvinyl alcohol (PVA) or other suitable materials. In some embodiments, the peripheral portion of the core 20b has a varying thickness, but the core 20b still has sufficient rigidity to maintain cleaning uniformity.

[0058] In some embodiments, as shown in FIG. 10, the elongated conduit 26b is tapered along the longitudinal direction L of the core 20b, so that the volume of the elongated conduit 26b per unit length of the core 20b gradually decreases. In some embodiments, the first zone Z1, the second zone Z2, and the third zone Z3 of the core 20b are defined in order along the direction from the inlet opening 25b to the closed end portion 24b. The first zone Z1, the second zone Z2, and the third zone Z3 have equal distances in the longitudinal direction L of the core 20b and each include three groups of outlet channels 30b spaced apart from each other by a constant pitch. Due to the gradient of the flowing volume along the length of the core 20b, more outlet flow can be discharged in the first half of the core, and thus a uniform fluid distribution can be achieved.

[0059] FIG. 12 is a plot of the outlet volume of the cleaning liquid from the core as a function of the distance of the outlet channel from the inlet opening according to one embodiment of the present disclosure. From FIG. 12, it is clear that the core 20 exhibits a constant (stable within + / - 5 ml / min) outlet volume along the length direction of the core 20. The core 20a exhibits an outlet volume that varies between approximately 145 (ml / min) and approximately 180 (ml / min) in the first half of the length of the core 20a and reaches a stable outlet volume in the second half of the length of the core 20a. The core 20b exhibits an outlet volume that varies between approximately 95 (ml / min) and approximately 180 (ml / min) in the first half of the length of the core 20b, and the core 20b exhibits a stable outlet volume that varies between approximately 180 (ml / min) and approximately 205 (ml / min) in the second half of the length of the core 20b. In contrast, as shown by the dashed line in FIG. 12, a conventional core exhibits an unacceptable increase in flow towards its closed end.

[0060] FIG. 13 is a longitudinal perspective cross-sectional view of the core 20c according to a fourth exemplary embodiment. In an exemplary embodiment, the core 20c has a first end 21c and a second end 22c opposite the first end 21c in the longitudinal direction L of the core 20c. The core 20c includes a peripheral portion 23c centered about the axis of rotation R1 of the core 20c to form a hollow cylindrical shape. An elongated conduit 26c is defined by the inner surface 231c of the peripheral portion 23c. The elongated conduit 26c allows for the flow of a cleaning fluid along the longitudinal direction L of the core 20c.

[0061] An inlet opening 25c is formed at the first end 21c to allow the entry of the cleaning fluid into the elongated conduit 26c. The core 20c further includes a closed end portion 24c that connects to the peripheral portion 23c at the second end 22c of the core 20c. The second end 22c of the core 20c is sealed by the closed end portion 24c, and thus the cleaning fluid is not allowed to pass through the second end 22c of the core 20c. A flange 28c may be formed on the outer surface of the closed end portion 24c for connection of the core 20c to a tool spindle (not shown in the figure).

[0062] A number of outlet channels 30c are formed in the peripheral portion 23c of the core 20c and are configured to discharge the cleaning fluid from the elongated conduit 26c to a brush member 40 (FIGS. 1 and 2) surrounding the core 20c. Each of the outlet channels 30c passes through the peripheral portion 23c of the core 20c and extends from the inner surface 231c to the outer surface 232c of the peripheral portion 23c. A number of groups of the outlet channels 30c are arranged along the longitudinal direction L of the core 20c, and the outlet channels 30c in each group are arranged about the axis of rotation R1 of the core 20c. According to an exemplary embodiment of the present disclosure, each of the groups consists of four outlet channels 30c arranged about the axis of rotation R1 of the core 20c (only three of the outlet channels of each group are shown in FIG. 13).

[0063] In some embodiments, some of the outlet channels 30c have a varying cross-section along their length, while some of the outlet channels 30c have a consistent cross-sectional shape. For example, as shown in FIG. 13, one of the outlet channels 30c has an upstream section 31c and a downstream section 32c. The upstream section 31c extends from the inner surface 231c of the core 20c and is connected to the downstream section 32c. The downstream section 32c extends from the outer surface 232c of the core 20c and is connected to the upstream section 31b. The upstream section 31c includes a rounded corner portion that is inclined with respect to the inner surface 231c of the peripheral portion 23c, and the downstream section 32c is perpendicular to the outer surface 232c of the peripheral portion 23c.

[0064] In some embodiments, a first zone Z1, a second zone Z2, and a third zone Z3 of the core 20c are defined in order along the direction from the inlet opening 25c to the closed end portion 24c. The first zone Z1, the second zone Z2, and the third zone Z3 each include a plurality of groups of outlet channels 30c that are spaced apart from each other by a constant pitch. Specifically, the outlet channels 30c in the first zone Z1 are spaced apart from each other by a first pitch P1, the outlet channels 30c in the second zone Z2 are spaced apart from each other by a second pitch P2, and the outlet channels 30c in the third zone Z3 are spaced apart from each other by a third pitch P3.

[0065] In an exemplary embodiment, the first pitch P1, the second pitch P2, and the third pitch P3 are different from each other. For example, the pitch P2 of the outlet channel 30c in the second zone Z2 is greater than the pitch P1 of the outlet channel 30c in the first zone Z1. Further, the pitch P3 of the outlet channel 30c in the third zone Z3 is greater than the pitch P2 of the outlet channel 30c in the second zone Z2. Thus, in the unit length of the core 20c, the total volume of the elongated conduit 26c and the outlet channel 30c in the zone Z1 is greater than that in the zone Z2 because the number of outlet channels 30c in the zone Z1 is greater than the number of outlet channels 30c in the zone Z2. Further, in the unit length of the core 20c, the total volume of the elongated conduit 26c and the outlet channel 30c in the zone Z2 is greater than that in the zone Z3 because the number of outlet channels 30c in the zone Z2 is greater than the number of outlet channels 30c in the zone Z3. In an exemplary embodiment, the ratio of the pitches P1, P2, and P3 is about 1:2:4.

[0066] It should be understood that the width of the outlet channel 30c and the number of the outlet channels 30c can be varied and should not be limited to the above embodiments. Further, the geometry, shape, and size of the outlet channel 30c can be selectively varied along the length of the core 20c as long as uniform pressurization can be obtained. For example, the outlet channels 30c in the zones Z1, Z2, and Z3 have widths W41, W42, and W43, respectively. In an exemplary embodiment, although not shown in FIG. 13, the width W43 can be greater than the width W42, and the width W42 can be greater than the width W41.

[0067] FIG. 14 is a longitudinal perspective cross-sectional view of the core 20d according to the fifth exemplary embodiment. In an exemplary embodiment, the core 20d has a first end 21d and a second end 22d opposite the first end 21d in the longitudinal direction L of the core 20d. The core 20d includes a peripheral portion 23d centered about the rotation axis R1 of the core 20d to form a hollow cylindrical shape. An elongated conduit 26d is defined by the inner surface 231d of the peripheral portion 23d. The elongated conduit 26d allows for the flow of a cleaning fluid along the longitudinal direction L of the core 20d.

[0068] An inlet opening 25d is formed at the first end 21d to allow the entry of the cleaning fluid into the elongated conduit 26d. The core 20d further includes a closed-end portion 24d that connects to the peripheral portion 23d at the second end 22d of the core 20d. The second end 22d of the core 20d is sealed by the closed-end portion 24d, and thus the cleaning fluid is not allowed to pass through the second end 22d of the core 20d. A flange 28d may be formed on the outer surface of the closed-end portion 24d for connection of the core 20d to a tool spindle (not shown in the figure).

[0069] Several outlet channels 30d are formed in the peripheral portion 23d of the core 20d and are configured to discharge the cleaning fluid from the elongated conduit 26d to a brush member 40 (FIGS. 1 and 2) surrounding the core 20d. Each of the outlet channels 30d passes through the peripheral portion 23d of the core 20d and extends from the inner surface 231d to the outer surface 232d of the peripheral portion 23d. Two ends of the outlet channel 30d form an inlet hole 31d and an outlet hole 32d on the inner surface 231d and the outlet surface 232d of the core 23d. Several groups of the outlet channels 30d are arranged along the longitudinal direction L of the core 20d at a fixed or variable pitch, and the outlet channels 30d in each group are arranged about the rotation axis R1 of the core 20d. According to an exemplary embodiment of the present disclosure, each of the groups consists of four outlet channels 30d arranged about the rotation axis R1 of the core 20d (only three outlet channels of each group are shown in FIG. 14).

[0070] In some embodiments, the outlet channel 30d is inclined outwardly toward the closed end portion 24d. Specifically, the outlet channel 30d closest to the inlet opening 25d extends along the extension axis E5 and is inclined with respect to the inner surface 231d of the peripheral portion 23d. The extension axis E5 forms an inclination angle A5 with respect to the rotation axis R1. The outlet channel 30d closest to the closed end portion 24d extends along the extension axis E6 and is inclined with respect to the inner surface 231d of the peripheral portion 23d. The extension axis E6 forms an inclination angle A6 with respect to the rotation axis R1. The inclination angles A5 and A6 can be in the range of about 20 degrees to about 90 degrees, preferably in the range of about 30 degrees to about 60 degrees. In an exemplary embodiment, the inclination angles A5 and A6 are about 45 degrees. As shown in FIG. 14, due to the inclined arrangement, the inlet hole 31d of the outlet channel 30d has an oval shape. The purpose of inclining the outlet channel 30d toward the closed end portion (i.e., aligning with the flow direction) is to reduce the resistance to the flow of fluid in the core 20d so that more flow rate exits from the outlet channel 30d compared to an outlet channel that is perpendicular to the flow direction.

[0071] In some embodiments, the inclination angle of the outlet channel 30d near the closed end portion 24d is steeper than the inclination angle of the outlet channel 30d near the inlet opening 25d. For example, the inclination angle A6 can be greater than the inclination angle A5. In an exemplary embodiment, although not shown in FIG. 14, the inclination angle A5 is about 20 degrees and the inclination angle A6 is about 90 degrees. In such an arrangement, the uniformity of the fluid distribution in the core 20d can be further improved.

[0072] It should be understood that the width of the outlet channel 30d and the number of the outlet channels 30d can be varied and should not be limited to the above embodiments. Further, the geometry, shape and size of the outlet channel 30d can be selectively varied along the length of the core 20d as long as uniform pressurization can be obtained. For example, the outlet channel 30d closest to the inlet opening 25d has a width W51, and the outlet channel 30d closest to the closed end portion 24d has a width W52. The width W51 can be greater than the width W52.

[0073] FIG. 15 is a block diagram of a CMP module 7 and a processing apparatus 9 for a process subsequent to the CMP process according to some embodiments. In some embodiments, the CMP module 7 includes a CMP module known in the art and a post-CMP cleaning module such as the post-CMP cleaning module 1 as shown in FIG. 1. The post-CMP cleaning module 1 is positioned downstream of the CMP module 7 to receive the wafer from the CMP module. The processing apparatus 9 can be any processing tool for performing a suitable process on the semiconductor wafer after the CMP process. For example, the processing apparatus 9 can be a tool for forming a film on the semiconductor wafer by CVD, PVD, ALD, or any other suitable method.

[0074] During operation, the CMP process is performed on the semiconductor wafer by the CMP module 7, and then the wafer is cleaned in the post-CMP cleaning module 1. In some embodiments, prior to loading the wafer into the post-CMP cleaning module 1, a cleaning liquid is supplied into the core of any embodiment of the present disclosure to rinse the brush member 40 to remove particles thereon. After the brush member 40 is cleaned, the wafer is loaded into the post-CMP cleaning module 1 for the post-CMP cleaning process. In the post-CMP cleaning process, the cleaning liquid is supplied into the core to rinse the brush member 40, and the cleaning brush 10 is rotated to clean the surface of the wafer by the brush member 40. After completion of the post-CMP cleaning process, the wafer is removed from the post-CMP cleaning module 1, and the cleaning liquid is supplied into the core again to rinse the brush member 40 to remove particles adhering to the brush member during the post-CMP cleaning process. The wafer can be further processed in the processing apparatus 9.

[0075] In the CMP post - cleaning module 1, since its core has excellent uniform fluid distribution along the length of the core, the CMP post - cleaning module 1 exhibits higher particle removal efficiency over the length of the brush member and over the entire surface of the semiconductor wafer compared to conventional cleaning modules. As a result, the time period required to clean the brush member or the wafer can be reduced, which results in a reduction in water consumption and an environmentally friendly manufacturing process. Further, by comprehensively cleaning the brush member before and after the cleaning process, the number of defects on the wafer, which is used to monitor the state of the brush member, can be controlled. Thus, the life of the cleaning brush can be extended and the manufacturing cost can be reduced. Further, since contaminants are sufficiently removed from the semiconductor wafer, the product yield of the semiconductor wafer can be improved.

[0076] The following embodiments specified by letters and numbers further illustrate the present disclosure but should not be construed as overly limiting the present disclosure.

[0077] A1. A cleaning brush, comprising: a peripheral portion surrounding the rotation axis of the present cleaning brush and defining an inlet opening for receiving fluid; a closed - end portion connected to an end of the peripheral portion on the opposite side of the inlet opening along the rotation axis; a core comprising: at least one elongated conduit defined within the core, in fluid communication with the inlet opening, the peripheral portion including a plurality of outlet channels for passing therethrough and being in fluid communication with the elongated conduit, the outlet channels being inclined outwardly towards the closed - end portion; a brush member connected to the outer surface of the peripheral portion and covering all of the plurality of outlet channels; wherein the cleaning brush is provided.

[0078] A2. The cleaning brush according to embodiment A1, wherein the outlet channels are inclined towards the closed - end portion by an inclination angle in the range from about 20 degrees to about 90 degrees.

[0079] A3. A cleaning brush as described in embodiment A2, wherein the multiple outlet channels include a first outlet channel and a second outlet channel located closer to the closed end portion than the first outlet channel, and the inclination angle of the second outlet channel is greater than the inclination angle of the first outlet channel.

[0080] A4. A cleaning brush as described in embodiments A1 to A3, wherein each of the outlet channels includes an upstream section connected to the inner surface of the peripheral portion and at least one downstream section connecting the upstream section to the outer surface of the peripheral portion, the upstream section being inclined with respect to the inner surface of the peripheral portion and the downstream section being perpendicular to the outer surface of the peripheral portion.

[0081] A5. A cleaning brush as described in embodiment A4, wherein each of the outlet channels includes two downstream sections branching from the upstream section and extending to the outer surface of the peripheral portion, and the width of the two downstream sections is smaller than the width of the upstream section.

[0082] A6. The width (D) of the elongated conduit, the width (W11) of the upstream section of one of the outlet channels, and the width (W13) of the downstream section satisfy the following equations (1) and (2): TIFF0007714819000002.tif18170 where k is the total number of upstream sections and i is the total number of downstream sections. A cleaning brush according to embodiment A4.

[0083] A7. A cleaning brush as described in embodiments A1 to A6, wherein each of the outlet channels includes an upstream section connected to the inner surface of the peripheral portion and at least one downstream section connecting the upstream section to the outer surface of the peripheral portion, and the cross-sectional shape of the upstream section is different from the cross-sectional shape of the downstream section.

[0084] A8. A cleaning brush as described in embodiments A1 to A7, wherein the multiple outlet channels include a first outlet channel and a second outlet channel located farther from the inlet opening than the first outlet channel, and the cross-sectional shape or dimensions of the first outlet channel are different from the cross-sectional shape or dimensions of the second outlet channel.

[0085] A9. The cleaning brush of any one of embodiments A1-A8, wherein the peripheral portion includes rounded corners or chamfers at the intersection of at least one of the outlet channels with the elongate conduit.

[0086] B1. A cleaning brush, a peripheral portion surrounding the axis of rotation of the cleaning brush and defining an inlet opening for receiving a fluid; a closed end portion connected to an end of the peripheral portion opposite the inlet opening along the axis of rotation; and A core comprising: at least one elongated conduit is defined within the core and in fluid communication with the inlet opening, the peripheral portion including a plurality of outlet channels therethrough for fluid communication with the elongated conduit; a core having first, second, and third zones defined in sequence along a direction from the inlet opening to the closed end portion, the total volume per unit length of the core of the elongated conduits and outlet channels within each of the first, second, and third zones gradually decreasing; a brush member connected to the outer surface of the peripheral portion and covering all of the plurality of outlet channels; A cleaning brush.

[0087] B2. The cleaning brush according to Embodiment B1, comprising at least one inlet opening arranged adjacent to each other and concentrically arranged with respect to the rotation axis of the cleaning brush, including a first inlet opening, a second inlet opening, and a third inlet opening, and at least one elongated conduit comprising a first elongated conduit, a second elongated conduit, and a third elongated conduit, wherein the first elongated conduit, the second elongated conduit, and the third elongated conduit are each in fluid communication with at least one of the outlet channels of the core, and the outlet volume of the outlet channel connected to the first elongated conduit is different from the outlet volume of the outlet channel connected to the second elongated conduit or the third elongated conduit so as to provide a preferential flow or a target flow at different positions of the core.

[0088] B3. The cleaning brush according to Embodiment B2, wherein the distance between two adjacent outlet channels gradually increases or gradually decreases in a direction away from the inlet opening.

[0089] B4. The cleaning brush according to Embodiment B3, wherein the distance between the first two of the outlet channels closest to the inlet opening is the smallest, and the distance between the last two of the outlet channels farthest from the inlet opening is the largest.

[0090] B5. The cleaning brush according to Embodiment B1, wherein the thickness of the peripheral portion gradually increases in a direction away from the inlet opening such that the outlet channel located close to the closed end portion has the largest length in the radial direction of the core perpendicular to the rotation axis.

[0091] C1. A CMP (Chemical Mechanical Planarization) apparatus, comprising a CMP module configured to perform a CMP process on a semiconductor wafer, and a post-CMP cleaning module positioned downstream of the CMP module, comprising a core and a brush material surrounding the core, and configured to perform a cleaning process on the semiconductor wafer. The apparatus comprises An inlet opening, an elongated conduit, and a plurality of outlet channels are disposed in a core to guide liquid flowing in the core to the brush material through the inlet opening, through the elongated conduit and the outlet channels, and at least one of the following parameters of a first outlet channel and a second outlet channel of the outlet channels spaced apart from the inlet opening by different distances, namely, the width of the outlet channel, and the cross-sectional shape of the outlet channel, and the inclination angle of the outlet channel with respect to the longitudinal direction of the core of at least one of them is different such that a preferential flow distribution or a target flow distribution of the liquid in the core is presented, a CMP (Chemical Mechanical Planarization) apparatus.

[0092] C2. The cleaning brush according to Embodiment C1, wherein the second outlet channel is located farther from the inlet opening than the first outlet channel, and the width of the second outlet channel is smaller than the width of the first outlet channel.

[0093] C3. The cleaning brush according to Embodiments C1 to C2, wherein the second outlet channel is located farther from the inlet opening than the first outlet channel, and the inclination angle of the second outlet channel is larger than the inclination angle of the first outlet channel.

[0094] C4. The cleaning brush according to Embodiments C1 to C3, wherein the first outlet channel and the second outlet channel are the first two of the outlet channels closest to the inlet opening, the distance between the first outlet channel and the second outlet channel is the smallest, and the distance between two of the outlet channels farthest from the inlet opening is the largest.

[0095] C5. The cleaning brush according to Embodiments C1 to C4, wherein either the first outlet channel or the second outlet channel has a cross-sectional area that varies along its length.

[0096] C6. The width (D) of the elongated conduit and the width (W) of one of the outlet channels satisfy the following formula, where n is the total number of outlet channels. TIFF0007714819000003.tif15170 Here, k is the total number of outlet channels. The cleaning brush according to Embodiments C1 to C5.

[0097] The examples disclosed in this application should be regarded as illustrative rather than restrictive in every respect. The scope of the present invention is shown not by the above description but by the appended claims, and all changes that occur within the meaning and equivalent scope of the claims of the patent are included herein.

[0098] The technical terms used herein are for the purpose of describing particular embodiments and are not limiting. The terms "a", "an", and "the" include the plural form unless specifically stated otherwise. The terms "comprises" and / or "comprising" used herein specify the presence of the described features, integers, steps, operations, elements, and / or components, but do not preclude the presence or addition of one or more other features, integers, steps, operations, elements, and / or components.

[0099] Regarding the above description, it should be understood that changes can be made in detail, particularly with respect to the constituent materials employed and the shape, size, and arrangement of the parts, without departing from the scope of the present disclosure. The present specification and the described embodiments are merely illustrative, and the true scope and spirit of the present disclosure are shown by the following claims.

Claims

1. A cleaning brush, comprising a peripheral portion surrounding the rotation axis of the cleaning brush and defining an inlet opening for receiving fluid, and a closed-end portion connected to an end of the peripheral portion opposite the inlet opening along the rotation axis forming a core, wherein at least one elongated conduit is defined within the core and in fluid communication with the inlet opening, and the peripheral portion includes a plurality of outlet channels passing through the peripheral portion for fluid communication with the elongated conduit, and the outlet channels are inclined outwardly towards the closed-end portion, and a core; a brush member connected to an outer surface of the peripheral portion of the core and covering all of the plurality of outlet channels forming a cleaning brush.

2. The cleaning brush according to claim 1, wherein the outlet channels are inclined towards the closed-end portion by an inclination angle in the range of about 20 degrees to about 90 degrees.

3. The cleaning brush according to claim 2, wherein the plurality of outlet channels includes a first outlet channel and a second outlet channel located closer to the closed-end portion than the first outlet channel, and the inclination angle of the second outlet channel is greater than the inclination angle of the first outlet channel.

4. Each of the outlet channels includes an upstream section connected to an inner surface of the peripheral portion, and at least one downstream section connecting the upstream section to the outer surface of the peripheral portion forming a cleaning brush according to claim 1, wherein the upstream section is inclined with respect to the inner surface of the peripheral portion, and the downstream section is perpendicular to the outer surface of the peripheral portion.

5. The cleaning brush according to claim 4, wherein each of the outlet channels includes two downstream sections branching from the upstream section and extending to the outer surface of the peripheral portion, and the widths of the two downstream sections are smaller than the width of the upstream section.

6. The width (D) of the elongated conduit, the width (W11) of one of the upstream sections of the outlet channels, and the width (W13) of the downstream section satisfy the following formulas (1) and (2), where k is the total number of the upstream sections and i is the total number of the downstream sections. The cleaning brush according to claim 4.

7. Each of the outlet channels includes an upstream section connected to an inner surface of the peripheral portion, at least one downstream section connecting the upstream section to the outer surface of the peripheral portion The cleaning brush according to claim 1, comprising: wherein a cross-sectional shape of the upstream section is different from a cross-sectional shape of the downstream section.

8. The cleaning brush according to claim 1, wherein the plurality of outlet channels include a first outlet channel and a second outlet channel located farther from the inlet opening than the first outlet channel, and a cross-sectional shape or dimension of the first outlet channel is different from a cross-sectional shape or dimension of the second outlet channel.

9. The cleaning brush according to claim 1, wherein the peripheral portion includes a rounded corner portion or a chamfered portion at an intersection of at least one of the outlet channels and the elongated conduit.

10. The first zone, the second zone, and the third zone of the core are defined in order along a direction from the inlet opening to the closed end portion, and a total volume per unit length of the core of the elongated conduit and the outlet channels in each of the first zone, the second zone, and the third zone gradually decreases. The cleaning brush according to claim 1.

11. A CMP (Chemical Mechanical Planarization) apparatus, a CMP module configured to perform a CMP process on a semiconductor wafer, a post-CMP cleaning module positioned downstream of the CMP module and comprising the cleaning brush according to any one of claims 1 to 10 A CMP (Chemical Mechanical Planarization) apparatus comprising.

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