Stage apparatus, exposure apparatus, and method for manufacturing an article

Abstract

To provide a stage device capable of highly accurately measuring a position of a stage.SOLUTION: A stage device includes: a stage having a first reflection surface perpendicular in a first direction, and configured so as to be driven in the first direction; a first measurement part for measuring a position of the stage in the first direction by emitting first measurement light to the first reflection surface followed by receiving the first measurement light reflected by the first reflection surface; a second measurement part for measuring a wave length of second measurement light propagating in a first atmospheric area; and a control part for correcting a measurement result of the first measurement part based on a first table which shows a time change of the wave length of the second measurement light in accordance with atmospheric fluctuation in the first atmospheric area, generated when the stage is driven along the first direction in a predetermined drive condition.SELECTED DRAWING: Figure 4

Description

[Technical Field]

[0001] The present invention relates to a stage apparatus, an exposure apparatus, and a method for manufacturing an article. [Background technology]

[0002] Conventionally, a stage device equipped with an interferometer is known that measures the position of a stage by emitting measurement light toward a reflecting surface provided on the stage and then receiving the measurement light reflected by the reflecting surface. In this case, if the refractive index of the atmosphere in the space through which the measurement light travels between the interferometer and the reflecting surface fluctuates due to changes in the environment, i.e., temperature, humidity, air pressure, etc., the wavelength of the measurement light will change, causing an error in the position measurement value of the stage.

[0003] Patent Document 1 discloses a stage device that can correct the wavelength of measurement light, and thus the position measurement value of the stage, by detecting fluctuations in the refractive index of the atmosphere in the space through which measurement light from an interferometer also travels by traveling correction light in the space. [Prior art documents] [Patent documents]

[0004] [Patent Document 1] Japanese Patent Application Laid-Open No. 2003-65712 Summary of the Invention [Problem to be solved by the invention]

[0005] For example, in order to achieve high productivity, a substrate stage provided in an exposure apparatus may perform both step driving and scan driving in two directions that are perpendicular to each other. Therefore, atmospheric fluctuations occur in both of these two directions in the space around the substrate stage.

[0006] On the other hand, the stage device disclosed in Patent Document 1 can measure, by using the correction light traveling through space, the fluctuations in the refractive index of the atmosphere that correspond to the environmental fluctuations in the space, including the temperature, humidity, and air pressure, and the atmospheric fluctuations in the direction parallel to the traveling direction of the correction light. Therefore, when attempting to measure the position of such a substrate stage using this stage device, atmospheric fluctuations also occur in the space in a direction perpendicular to the direction of travel of the correction light, resulting in errors being included in the measured fluctuations in the refractive index of the atmosphere.

[0007] If the fluctuation in the refractive index of the atmosphere in the space obtained by the correction light when the stage moves in two mutually perpendicular directions is used as is to correct the wavelength of the measurement light in the interferometer, the position measurement value of the stage measured by the interferometer will also contain an error.

[0008] SUMMARY OF THE INVENTION It is therefore an object of the present invention to provide a stage device that can measure the position of a stage with high precision. [Means for solving the problem]

[0009] A stage device according to the present invention includes a stage having a first reflecting surface arranged perpendicular to a first direction and capable of being driven in the first direction; a first measurement unit that receives first measurement light reflected by the first reflecting surface and measures the position of the stage in the first direction; and a second measurement unit that measures the wavelength of second measurement light propagating through a first atmospheric region. Under given driving conditions The atmospheric fluctuations in the first atmospheric region that occur when the stage is driven in the first direction cormorant, Wavelength of the second measurement light Information on time changes and a control unit that corrects the measurement result of the first measurement unit based on the result. [Effects of the Invention]

[0010] According to the present invention, it is possible to provide a stage device that can measure the position of the stage with high precision. [Brief explanation of the drawings]

[0011] [Figure 1] FIG. 2 is a schematic projection view of an XZ cross section of an exposure apparatus that includes a stage apparatus according to the present embodiment. [Figure 2] 2A and 2B are schematic diagrams illustrating the configuration of a stage device according to the first embodiment and a schematic diagram for explaining the configuration of a wavelength compensator. [Figure 3] FIG. 10 is a diagram showing the change over time in the measurement value obtained by the wavelength compensator. [Figure 4] 10 is a flowchart showing a process for creating a table in the stage device according to the first embodiment, and a flowchart showing a process for calculating the amount of movement of the stage. [Figure 5] 10 is a flowchart showing a process for creating a table in a stage device according to a second embodiment, and a flowchart showing a process for calculating a movement amount of a stage. [Figure 6] FIG. 10 is a schematic configuration diagram of a stage device according to a third embodiment. [Figure 7] 10 is a flowchart showing exposure processing in an exposure apparatus that is equipped with a stage apparatus according to a fourth embodiment. DETAILED DESCRIPTION OF THE INVENTION

[0012] The stage device according to this embodiment will be described in detail below with reference to the accompanying drawings. Note that the drawings shown below are drawn at a different scale than the actual scale in order to facilitate understanding of this embodiment. Furthermore, the embodiment described below is an example of a means for realizing the present embodiment, and should be modified or changed as appropriate depending on the configuration of the device to which the present embodiment is applied and various conditions. In the following, the direction perpendicular to the substrate mounting surface of the substrate stage is referred to as the Z direction, and the two directions that are perpendicular to each other within a cross section (first cross section) parallel to the substrate mounting surface are referred to as the X direction (second direction) and the Y direction (first direction).

[0013] [First embodiment] Position measuring devices using interferometers are widely used in fields where high-precision positioning control is required. In such position measurement devices, the interferometer measures position based on the wavelength of the laser, but if the refractive index of the atmosphere fluctuates depending on the temperature, humidity, and air pressure in the position measurement space, causing the wavelength of the laser, i.e., the measurement beam, to change, an error will occur in the position measurement value of the measurement object.

[0014] To reduce such errors, it is necessary to correct the position measurements based on changes in the wavelength of the laser. As a method for correcting the position measurement value in an interferometer, for example, the following method is available.

[0015] That is, a sensor is provided to detect the environment of the position measurement space, that is, at least one of temperature, humidity, and atmospheric pressure, and the change in the refractive index of the atmosphere in the position measurement space is calculated from the value detected by the sensor. Then, the position measurement value can be corrected based on the calculated change in the refractive index of the atmosphere.

[0016] In addition, by measuring the same object after traveling the measurement beam in both the vacuum space and the atmospheric space, the wavelength of the measurement beam in each of the vacuum space and the atmospheric space is calculated, thereby determining the change in the refractive index of the atmosphere in the atmospheric space. There is also a method of correcting the position measurement value obtained by the interferometer based on the change in the refractive index of the atmosphere. A measurement device that determines the change in the refractive index of the atmosphere in the atmospheric space from the difference in the wavelength of the measurement beam in the vacuum space and the atmospheric space is called a wavelength compensator or a wavelength tracker.

[0017] As described above, the wavelength of the measurement beam emitted from the interferometer and traveling through the position measurement space changes over time in response to environmental fluctuations in the position measurement space, including temperature, humidity, and air pressure, and fluctuations in the refractive index of the atmosphere due to atmospheric fluctuations that occur in response to the movement of the measurement object. The wavelength compensator can measure fluctuations in the refractive index of the atmosphere due to environmental fluctuations in atmospheric space and atmospheric fluctuations that occur as the measurement object moves in a direction parallel to the direction of travel of the measurement beam.

[0018] On the other hand, for example, a substrate stage provided in an exposure apparatus may perform both step driving and scan driving in two mutually perpendicular directions in order to achieve high productivity. Therefore, atmospheric fluctuations occur in both of these two directions in the space around the substrate stage.

[0019] Therefore, when the substrate stage is driven in this manner, atmospheric fluctuations also occur in the atmospheric space within the wavelength compensator in a direction perpendicular to the direction of travel of the measurement beam, which results in an error being included in the fluctuations in the refractive index of the atmosphere in that atmospheric space being measured.

[0020] If the fluctuations in the refractive index of the atmosphere obtained by the wavelength compensator when the stage moves in two mutually perpendicular directions are used as is to correct the time change in the wavelength of the measurement light in the interferometer, an error will also be included in the position measurement value of the stage measured by the interferometer. Furthermore, in recent years, in order to further improve productivity in exposure apparatuses, substrate stages and original stages have come to be driven at high speeds and high accelerations, which increases atmospheric fluctuations in the position measurement space and therefore increases the above-mentioned errors.

[0021] Therefore, an object of this embodiment is to provide a stage device that can correct the position measurement value of the stage with high precision.

[0022] FIG. 1 shows a schematic XZ cross-sectional projection view of an exposure apparatus 1 equipped with a stage apparatus according to this embodiment.

[0023] As shown in Figure 1, the exposure apparatus 1 is a projection exposure apparatus that projects a pattern formed on a reticle 20 (master) onto a wafer 40 (substrate) using a step-and-scan method, and is suitable for lithography processes at sub-micron and quarter-micron levels or less. The exposure apparatus 1 includes an illumination device 10 , a reticle stage 25 , a projection optical system 30 , a wafer stage 45 , a control system 60 , an alignment detection system 70 , and a focus / tilt detection system 150 .

[0024] The exposure apparatus 1 also includes an interferometer system for detecting the positions of the reticle stage 25 and the wafer stage 45 in the XY plane (see FIG. 2). That is, the stage device according to this embodiment is composed of the reticle stage 25 or wafer stage 45 and the interferometer system.

[0025] The illumination device 10 is composed of a light source unit 12 and an illumination optical system 14, and illuminates a reticle 20 on which a pattern to be transferred onto a wafer 40 is formed. The light source unit 12 is configured to emit laser light, and can use, for example, a light source such as a KrF excimer laser with a wavelength of approximately 248 nm or an ArF excimer laser with a wavelength of approximately 193 nm. The light source used in the light source section 12 is not limited to the excimer laser described above, but may be an F2 laser with a wavelength of approximately 157 nm or an EUV (Extreme Ultra Violet) light with a wavelength of 20 nm or less.

[0026] The illumination optical system 14 is an optical system that guides the light beam emitted from the light source unit 12 to the reticle 20. Specifically, the illumination optical system 14 shapes the light beam emitted from the light source unit 12 into a light beam having a slit shape optimal for exposure, and then guides the light beam to the reticle 20. The illumination optical system 14 is composed of lenses, mirrors, an optical integrator, a diaphragm, and the like. Specifically, the illumination optical system 14 includes, in order from the light source unit 12 side to the reticle stage 25 side, a condenser lens, a fly's-eye lens, an aperture stop, a condenser lens, a slit, and an imaging optical system.

[0027] The illumination optical system 14 can guide the light beam emitted from the light source unit 12 to the reticle 20 regardless of whether it is an on-axis light beam or an off-axis light beam. The optical integrator used in the illumination optical system 14 includes a fly-eye lens and an integrator configured by stacking two pairs of cylindrical lens array (or lenticular lens) plates. However, the present invention is not limited to this, and an optical rod or a diffraction element can also be used as the optical integrator.

[0028] The reticle stage 25 is configured to hold the reticle 20 via a reticle chuck (not shown), and is connected to a movement mechanism configured by a linear motor (not shown) or the like. This allows the reticle stage 25 to be driven and controlled in translational directions parallel to the X-axis, Y-axis, and Z-axis, as well as in rotational directions around the X-axis, Y-axis, and Z-axis, thereby moving the reticle 20 and reticle chuck in the translational directions and rotational directions.

[0029] The projection optical system 30 has the function of converging a light beam from an object plane onto an image plane, that is, converging the diffracted light diffracted by the pattern formed on the reticle 20 onto the wafer 40 . The wafer stage 45 is configured to hold the wafer 40 by a wafer chuck 46, and is connected to a moving mechanism configured by a linear motor or the like (not shown). This allows the wafer stage 45 to be driven and controlled in translational directions parallel to the X-axis, Y-axis, and Z-axis, as well as in rotational directions around the X-axis, Y-axis, and Z-axis, thereby moving the wafer 40 and the wafer chuck 46 in the translational directions and rotational directions.

[0030] The reticle stage 25 and the wafer stage 45 are driven at a predetermined speed ratio, and their respective positions are measured by an interferometer as will be described later. The reticle stage 25 and the projection optical system 30 are mounted on a barrel base (not shown) that is supported via dampers on a base frame placed on the floor or the like. The wafer stage 45 is mounted on a stage base (not shown) that is supported on a floor or the like via a damper having a vibration isolation function.

[0031] The focus / tilt detection system 150 is composed of a light projecting unit 152 and a light receiving unit 154. The light beam emitted from the light projecting unit 152 is reflected by the wafer 40 and then received by the light receiving unit 154, thereby making it possible to detect the focus of the projection optical system 30 relative to the wafer 40 and the tilt of the wafer 40.

[0032] The control system 60 is composed of a CPU, memory, etc., and is electrically connected to the illumination device 10, reticle stage 25, wafer stage 45, alignment detection system 70, and focus tilt detection system 150, thereby controlling the operation of the entire exposure apparatus 1. The alignment detection system 70 detects positional deviation of the wafer 40 in directions parallel to the X and Y axes, and is configured so that its optical axis is shifted from the optical axis of the projection optical system 30 within the XY plane. That is, the alignment detection system 70 is a so-called off-axis optical system that uses non-exposure light.

[0033] The reticle 20 used in the exposure apparatus 1 is made of, for example, quartz, and a circuit pattern to be transferred onto the wafer 40 is formed on the reticle 20 . The reticle 20 is held by a reticle stage 25, and is moved when the reticle stage 25 is driven.

[0034] The wafer 40 is a processing object, for example, a silicon substrate coated with photoresist, and is also a detection object for position detection by the alignment detection system 70 and the focus / tilt detection system 150.

[0035] As described above, in the exposure apparatus 1, the exposure light emitted from the light source unit 12 is guided to the reticle 20 by the illumination optical system . The diffracted light produced by the pattern formed on the reticle 20 is guided onto the wafer 40 by the projection optical system 30, whereby the pattern is projected (transferred) onto the wafer 40.

[0036] In the exposure apparatus 1, the reticle stage 25 and the wafer stage 45 are arranged so that the reticle 20 and the wafer 40 are in an optically conjugate relationship with each other with respect to the projection optical system 30. The pattern formed on the reticle 20 is transferred onto the wafer 40 by scanning the reticle stage 25 and the wafer stage 45 at a speed ratio corresponding to the reduction magnification ratio of the pattern.

[0037] Although the above describes an exposure apparatus 1 that employs the step-and-scan method, the stage device according to this embodiment, which will be described in detail below, can also be applied to exposure apparatuses that employ the step-and-repeat method.

[0038] Next, the stage device according to this embodiment will be described.

[0039] FIG. 2(a) shows a schematic configuration diagram of a stage device 100 according to this embodiment.

[0040] Stage device 100 according to this embodiment includes a Y mirror 33, a Y interferometer 34 (first measurement unit), a Y optical pickup 37, a Y detection unit 38, and a Y wavelength compensator 39 (second measurement unit). The stage device 100 according to this embodiment includes a Y stage 41 (stage, first stage), an X stage 42 (second stage), and a control unit. The control unit also includes a signal processing unit 61, a sequence control unit 81, and a Y wavelength correction unit 82.

[0041] As shown in FIG. 2( a ), a stage 45 , for example a wafer stage 45 , has a Y stage 41 and an X stage 42 , and more specifically, the X stage 42 is disposed on the Y stage 41 . The Y stage 41 is configured to be drivable in the Y direction, and the X stage 42 is configured to be drivable in the X direction, so that the stage 45 is configured to be drivable within the XY cross section.

[0042] Furthermore, Y mirror 33 is disposed on Y stage 41, and has a reflecting surface (first reflecting surface) perpendicular to the Y direction. Y measurement beam 35 (first measurement light) emitted from Y interferometer 34 is incident on the reflecting surface of Y mirror 33. Then, Y measurement beam 35 reflected by the reflecting surface of Y mirror 33 interferes with a reference beam (reference light) not shown in Y interferometer 34, thereby generating Y interference beam 36. Furthermore, Y mirror 33 may be configured integrally with Y stage 41, and Y stage 41 may be configured to have a reflecting surface perpendicular to the Y direction.

[0043] Next, Y interference beam 36 emitted from Y interferometer 34 is incident on Y optical pickup 37, whereby Y interference beam 36 is photoelectrically converted, and an interference signal is output from Y optical pickup 37. Then, Y detection unit 38 provided on a length measurement board (not shown) detects the phase difference between the interference signal and a reference signal from a laser head provided on Y interferometer 34 . As a result, the distance Y0 in the Y direction between the Y interferometer 34 and the Y mirror 33, that is, the position measurement value Δm Y can be output.

[0044] Here, the wavelength of Y measurement beam 35 emitted from Y interferometer 34 varies depending on the environment of the position measurement space, i.e., the space between Y interferometer 34 and Y mirror 33, specifically, changes in temperature, humidity, air pressure, etc. Therefore, the position measurement value Δm output from the Y detection unit 38 Y In this case, an error occurs according to fluctuations in the wavelength of the Y measurement beam 35.

[0045] Therefore, in the stage device 100 according to this embodiment, such a position measurement value ΔmY A Y wavelength compensator 39 is provided to correct the wavelength of the Y measurement beam 35 so as to correct the error.

[0046] FIG. 2(b) is a schematic diagram illustrating the configuration of the Y wavelength compensator 39.

[0047] As shown in FIG. 2( b ), an interferometer 401 and a mirror 402 are provided within the Y wavelength compensator 39 . Furthermore, between interferometer 401 and mirror 402, vacuum region 403 and atmospheric region 404 (first atmospheric region, second atmospheric region) are provided so as to be aligned in a direction perpendicular to the traveling direction of the measurement beam.

[0048] In the Y wavelength compensator 39, the measurement beam emitted from the interferometer 401 and reflected by the mirror 402 interferes with a reference beam (not shown), and the wavelength λ of the measurement beam in each of the vacuum region 403 and the atmospheric region 404 is v and λ a is measured. At this time, the wavelength λ of the measurement beams (the second measurement beam, the fourth measurement beam, and the fifth measurement beam) in the vacuum region 403 is v and wavelength λ in atmospheric region 404 a The relationship between the refractive index n of the atmosphere in the atmosphere region 404 can be expressed as the following equation (1): λ a =λ v / n ···(1)

[0049] In other words, in Y wavelength compensator 39, the measurement result of mirror 402 (predetermined target) by the measurement beam propagating through atmospheric region 404 and the measurement result of mirror 402 by the measurement beam propagating through vacuum region 403 are compared with each other.

[0050] As a result, the wavelength λ of the measurement beam in the atmospheric region 404 a By acquiring the refractive index n of the atmosphere in the atmospheric region 404, the refractive index n can be measured. In the stage device 100 according to this embodiment, the refractive index n of the atmosphere obtained by the Y wavelength compensator 39 is used to calculate the fluctuation in the wavelength of the Y measurement beam 35 emitted from the Y interferometer 34, and thus the position measurement value Δm Y The error can be corrected.

[0051] Specifically, the wavelength correction amount ΔC corresponding to the change in the refractive index n of the atmosphere obtained when the Y stage 41 is moved in the Y direction according to each of the multiple stage drive conditions is input from the Y wavelength compensator 39 to the Y wavelength correction unit 82. Then, the Y wavelength correction unit 82 calculates a table ΔC for each stage driving condition from the wavelength correction amount ΔC for the various stage driving conditions that have been input. Y '(First table) is created and saved.

[0052] That is, in the stage device 100 according to this embodiment, the position measurement value Δm Y In accordance with the driving conditions of the Y stage 41 when the driving conditions are acquired, the sequence control unit 81 transmits the driving conditions to the Y wavelength correction unit 82. Then, the Y wavelength correction unit 82 calculates the table ΔC corresponding to the driving conditions based on the received driving conditions. Y ' to the signal processing unit 61. The stage drive conditions referred to here include the type of drive, such as step drive or scan drive, the magnitude of the speed and acceleration, the drive profile, and other setting conditions.

[0053] As a result, the signal processing unit 61 detects the position measurement value Δm Y The Y wavelength compensator 39 is used to calculate the table ΔC Y By performing correction using ', the amount of movement ΔY of the Y stage 41 in the Y direction can be output.

[0054] The refractive index n of the atmosphere in the atmospheric region 404 of the Y wavelength compensator 39, that is, the space between the Y interferometer 34 and the Y mirror 33, can be expressed by Edlen's empirical formula shown in the following equation (2).

number

[0055] In other words, if at least one of the temperature T, humidity H, and air pressure P changes over time t in the space between the Y interferometer 34 and the Y mirror 33, the refractive index n of the atmosphere in that space and, ultimately, the wavelength of the Y measurement beam 35 emitted from the Y interferometer 34 will change over time.

[0056] Next, in the stage device 100 according to this embodiment, the position measurement value Δm of the time change in the refractive index n of the air in the space between the Y interferometer 34 and the Y mirror 33 Y A method for correcting the influence of Specifically, the position measurement value Δm of the time change in the refractive index n of the air in the space between the Y interferometer 34 and the Y mirror 33 when the Y stage 41 moves in the Y direction is Y In order to correct the influence of the Y wavelength correction unit 82, a table ΔC Y This explains how to obtain '.

[0057] As described above, the refractive index n of the atmosphere in the atmospheric region 404 measured by the Y wavelength compensator 39 changes over time according to the equation (2) in response to the time fluctuations of the temperature T, humidity H, and pressure P of the atmosphere in the atmospheric region 404. Furthermore, the refractive index n of the atmosphere in the atmosphere region 404 also changes over time due to atmospheric fluctuations that occur in the atmosphere region 404 when the Y stage 41 is driven in the Y direction. Furthermore, noise is also superimposed when the Y wavelength compensator 39 measures the refractive index n of the atmosphere in the atmospheric region 404, and such noise changes over time depending on the busyness of the drive of the Y stage 41, that is, the movement of the Y stage 41.

[0058] At this time, if the space in which the stage device 100 according to this embodiment is installed is air-conditioned, it can be assumed that the temperature T and humidity H of the atmosphere in the atmospheric region 404 will not change for a sufficiently long time. Therefore, the refractive index n of the atmosphere in the atmospheric region 404 measured by the Y wavelength compensator 39 is considered to change over time depending on the air pressure P in the atmospheric region 404, i.e., the time fluctuation of the atmospheric pressure, atmospheric fluctuations due to the driving of the Y stage 41, and time-varying noise.

[0059] FIG. 3(a) shows a time change 501 of the measurement value corresponding to the refractive index n of the air in the atmospheric region 404 measured by the Y wavelength compensator 39 when the Y stage 41 is driven in a predetermined manner.

[0060] As described above, the time change 501 of the measurement value shown in FIG. 3(a) includes components due to the time fluctuation of the atmospheric pressure in the atmospheric region 404, atmospheric fluctuations caused by driving the Y stage 41, and time-varying noise. At this time, it can be considered that the atmospheric pressure in the atmospheric region 404 fluctuates over time at a frequency that is sufficiently lower than the atmospheric fluctuations caused by driving the Y stage 41 and the time-varying noise.

[0061] Therefore, in the stage device 100 according to this embodiment, the time variation 501 of the acquired measurement value is input to a low-pass filter, thereby separating the component due to the time variation of the atmospheric pressure. In other words, in the stage device 100 according to this embodiment, the time change 501 of the measurement value is input to a low-pass filter, thereby obtaining components (first component, fourth component, sixth component) in the first frequency region corresponding to the low frequency region of the time change 501 of the measurement value.

[0062] FIG. 3(b) shows the time change 601 of the measurement value that accompanies the time fluctuation of the atmospheric pressure thus obtained.

[0063] In the stage device 100 according to this embodiment, the difference between the time change 501 and the time change 601 can be taken to obtain the remaining component, namely the time change 701 of the measurement value associated with atmospheric fluctuations due to the driving of the Y stage 41 and time-varying noise.

[0064] FIG. 3(c) shows the time change 701 of the measurement value obtained in this way, which is caused by atmospheric fluctuations due to the driving of the Y stage 41 and time-varying noise.

[0065] Furthermore, it can be considered that the noise superimposed in the measurement of the Y wavelength compensator 39 fluctuates over time at a frequency sufficiently higher than that of atmospheric fluctuations caused by driving the Y stage 41. Therefore, in the stage device 100 according to this embodiment, the time change 701 of the acquired measurement value is then input to a high-cut filter to remove components due to time-varying noise. In other words, in the stage device 100 according to this embodiment, the acquired change in measurement value over time 701 is input to a high-cut filter, thereby removing the components (second component, third component, fifth component) in the second frequency range corresponding to the high frequency range of the change in measurement value over time 701.

[0066] This makes it possible to obtain a measurement value, that is, a time change in the refractive index n of the atmosphere in the atmospheric region 404, that is, a change that occurs only due to atmospheric fluctuations caused by driving the Y stage 41. In the stage device 100 according to this embodiment, the dependency of the refractive index n of the atmosphere on time t obtained in this manner is calculated using the table ΔC Y ' and store it.

[0067] FIG. 4A shows the table ΔC under various stage driving conditions by the Y wavelength correction unit 82 in the stage device 100 according to this embodiment. Y 10 is a flowchart showing a process for creating a '.

[0068] First, the environmental sensor 90 (third measurement unit) measures the atmospheric temperature T, humidity H, and air pressure P in the space near the atmospheric region 404 of the Y wavelength compensator 39, and the signal processing unit 61 stores the measured temperature T, humidity H, and air pressure P (step S301).

[0069] Next, the signal processing unit 61 calculates the refractive index n of the atmosphere in the atmosphere region 404 by substituting the acquired temperature T, humidity H, and air pressure P into equation (2). Then, the signal processing unit 61 determines the calculated value as the initial value n0 of the refractive index of the atmosphere in the atmospheric region 404 of the Y wavelength compensator 39 (step S302).

[0070] Next, the sequence control unit 81 subsequently calculates the table ΔC Y In order to create the stage drive conditions, the stage drive conditions are set (step S303). The stage drive conditions set here include the type of drive (such as step drive or scan drive), the magnitude of the speed and acceleration, and the drive profile, which are preferable in limiting the effects of atmospheric fluctuations caused by movement of the Y stage 41 in the Y direction.

[0071] Then, the sequence control unit 81 drives the Y stage 41 based on the stage driving conditions set in step S303, while adjusting the wavelength λ of the measurement beam in the atmospheric region 404 by the Y wavelength compensator 39. a The change over time is measured (step S304). Next, the Y wavelength correction unit 82 removes components due to time fluctuations in atmospheric pressure from the time change in the measurement value acquired in step S304 by inputting the time change in the measurement value acquired in step S304 into a low-pass filter (step S305).

[0072] Next, in step S305, the Y wavelength correction unit 82 inputs the time change in the measurement value, from which the component due to the time fluctuation of the atmospheric pressure has been removed, into a high-cut filter, thereby removing the component due to the time-varying noise. As a result, the Y wavelength correction unit 82 corrects the wavelength λ of the measurement beam caused by atmospheric fluctuations in the atmospheric region 404 when the Y stage 41 is driven under predetermined stage drive conditions. a , i.e., a table ΔC showing the time variation of the refractive index n of the atmosphere Y ' can be created (step S306).

[0073] Then, the sequence control unit 81 determines whether the table ΔC Y It is determined whether to create a new file (step S307). If the table ΔC Y If a ".DELTA. ... On the other hand, under all stage drive conditions, the table ΔC Y If ".dat" is created (No in step S307), the process ends.

[0074] FIG. 4B is a flowchart showing the processing for calculating the movement amount ΔY of the Y stage 41 under predetermined stage driving conditions by the signal processing unit 61 in the stage device 100 according to this embodiment.

[0075] First, when the sequence control unit 81 starts driving the Y stage 41 under predetermined stage driving conditions, the Y wavelength compensator 39 adjusts the wavelength λ of the measurement beam in the atmospheric region 404. a The time change of is measured (step S308). Next, the Y wavelength correction unit 82 inputs the time change of the measurement value acquired in step S308 into a low-pass filter, thereby acquiring the component due to the time fluctuation of the atmospheric pressure from the time change of the measurement value acquired in step S308. The signal processing unit 61 then calculates the table ΔC corresponding to the predetermined stage driving conditions based on the acquired component due to the time variation of the atmospheric pressure. Y By adding up the wavelengths λ of the Y measurement beam 35 under the specified stage driving conditions, a The time change of is determined (step S309).

[0076] Furthermore, the signal processing unit 61 detects the position measurement value Δm by the Y interferometer 34 when the Y stage 41 is driven under the predetermined stage driving conditions. Y Get. Then, the signal processing unit 61 calculates the acquired position measurement value Δm Yis corrected using the time change in wavelength λa of the measurement beam determined in step S309, thereby calculating the movement amount ΔY of Y stage 41 (step S310).

[0077] Then, the unit state of the interferometer 401 is checked (step S311). If the interferometer 401 is operating normally (Yes in step S311), the position measurement is repeated, that is, the process returns to step S308 to continue the position measurement. On the other hand, if a malfunction such as a breakdown has occurred in the unit state of interferometer 401 (No in step S311), the process ends.

[0078] As described above, in the stage device 100 according to this embodiment, when the Y stage 41 is driven under predetermined drive conditions, the wavelength λ of the measurement beam caused by atmospheric fluctuations in the atmospheric region through which the measurement beam travels is a , i.e., a table ΔC showing the time variation of the refractive index n of the atmosphere Y ' should be created in advance. Then, the position measurement value Δm by the Y interferometer 34 when the Y stage 41 is driven under the predetermined driving conditions Y The created table ΔC Y By performing the correction using ', the movement amount ΔY of the Y stage 41 in the Y direction can be obtained with high precision. This allows the position of the Y stage 41 to be measured with high precision.

[0079] Although the above describes driving of the Y stage 41 constituting the wafer stage 45 in the Y direction, the present invention is not limited to this and can be similarly applied to driving of the X stage 42 in the X direction. Moreover, the present invention is not limited to the wafer stage 45, and can be similarly applied to driving the reticle stage 25 in the Y direction and the X direction. Furthermore, in the above, a low-pass filter and a high-cut filter are used as filters, but a band-pass filter may be used instead.

[0080] Furthermore, the stage device 100 according to this embodiment is not limited to use in the exposure apparatus 1 described above, but can also be used in pattern forming apparatuses such as imprint apparatuses and drawing apparatuses. Here, an imprinting device is a device that brings an imprinting material and a mold material supplied onto a substrate into contact with each other, and then applies energy for hardening to the imprinting material to form a pattern of the hardened material to which the mold pattern has been transferred. A drawing device is a device that forms a pattern (latent image pattern) on a substrate by drawing on the substrate with a charged particle beam (electron beam) or a laser beam.

[0081] [Second embodiment] FIG. 5(a) shows the table ΔC under various stage driving conditions by the Y wavelength correction unit 82 in the stage device according to the second embodiment. Y 10 is a flowchart showing a process for creating a '. The stage device according to this embodiment has the same configuration as the stage device 100 according to the first embodiment, so the same members are given the same reference numerals and descriptions thereof will be omitted.

[0082] First, the environmental sensor 90 measures the temperature T, humidity H, and air pressure P of the atmosphere in the space near the atmospheric region 404 of the Y wavelength compensator 39, and the signal processing unit 61 stores the measured temperature T, humidity H, and air pressure P (step S801).

[0083] Next, the signal processing unit 61 calculates the refractive index n of the atmosphere in the atmosphere region 404 by substituting the acquired temperature T, humidity H, and air pressure P into equation (2). Then, the signal processing unit 61 determines the calculated value as the initial value n0 of the refractive index of the atmosphere in the atmospheric region 404 of the Y wavelength compensator 39 (step S802).

[0084] Next, the sequence control unit 81 subsequently calculates the table ΔC Y In order to create the stage drive conditions, the stage drive conditions are set (step S803). The stage drive conditions set here include the type of drive (such as step drive or scan drive), the magnitude of the speed and acceleration, and the drive profile, which are preferable in limiting the effects of atmospheric fluctuations caused by movement of the Y stage 41 in the Y direction.

[0085] Then, while the sequence control unit 81 drives the Y stage 41 based on the stage drive conditions set in step S803, the Y wavelength compensator 39 adjusts the wavelength λ of the measurement beam in the atmospheric region 404. a The change over time is measured (step S804). Next, the Y wavelength correction unit 82 removes components due to time fluctuations in atmospheric pressure from the time change in the measurement value acquired in step S804 by inputting the time change in the measurement value acquired in step S804 into a low-pass filter (step S805).

[0086] Next, in step S805, the Y wavelength correction unit 82 inputs the time change in the measurement value, from which the component due to the time fluctuation of the atmospheric pressure has been removed, into a high-cut filter, thereby removing the component due to the time-varying noise. As a result, the Y wavelength correction unit 82 corrects the wavelength λ of the measurement beam caused by atmospheric fluctuations in the atmospheric region 404 when the Y stage 41 is driven under predetermined stage drive conditions. a , i.e., a table ΔC showing the time variation of the refractive index n of the atmosphere Y ' can be created (step S806).

[0087] In the stage device according to this embodiment, the Y wavelength correction unit 82 uses the table ΔC acquired in step S806 Y The dependence of the refractive index n of the atmosphere at ' on time t is fitted with a function related to time t. As a result, an approximate function n(t) is obtained and stored (step S807).

[0088] Then, the sequence control unit 81 determines whether the table ΔC Y ' and determine whether to obtain the approximate function n(t) (step S808). If the table ΔC Y If the approximate function n(t) is to be calculated (Yes in step S808), the process returns to step S803. On the other hand, under all stage drive conditions, the table ΔC Y If the approximate function n(t) is obtained (No in step S808), the process ends.

[0089] FIG. 5B is a flowchart showing the process of calculating the movement amount ΔY of the Y stage 41 under predetermined stage driving conditions by the signal processing unit 61 in the stage device according to this embodiment.

[0090] First, when the sequence control unit 81 starts driving the Y stage 41 under predetermined stage driving conditions, the Y wavelength compensator 39 adjusts the wavelength λ of the measurement beam in the atmospheric region 404. a The change over time is measured (step S809). Next, the Y wavelength correction unit 82 inputs the time change of the measurement value acquired in step S809 into a low-pass filter, thereby acquiring the component due to the time fluctuation of the atmospheric pressure from the time change of the measurement value acquired in step S809. The signal processing unit 61 then sums the acquired component due to the time variation of the atmospheric pressure with an approximation function n(t) corresponding to the predetermined stage driving condition, thereby obtaining the wavelength λ of the Y measurement beam 35 under the predetermined stage driving condition. a The time change of is determined (step S810).

[0091] Furthermore, signal processing unit 61 acquires position measurement value Δm by Y interferometer 34 when Y stage 41 is driven under the predetermined stage driving conditions. Then, the signal processing unit 61 calculates the acquired position measurement value Δm Y The wavelength λ of the measurement beam determined in step S810 a By correcting the change in the Y-axis direction with time, the movement amount ΔY of the Y-stage 41 is calculated (step S811).

[0092] Then, the unit state of the interferometer 401 is checked (step S812). If the interferometer 401 is operating normally (Yes in step S812), the process returns to step S809 to perform repeated position measurements. On the other hand, if a malfunction such as a breakdown has occurred in the unit state of interferometer 401 (No in step S812), the process ends.

[0093] As described above, in the stage device according to this embodiment, when the Y stage 41 is driven under predetermined drive conditions, the wavelength λ of the measurement beam caused by atmospheric fluctuations in the atmospheric region through which the measurement beam travels is a That is, an approximate function n(t) showing the time change of the refractive index n of the atmosphere is created in advance. Then, the position measurement value Δm by the Y interferometer 34 when the Y stage 41 is driven under the predetermined driving conditions Y By correcting using the created approximation function n(t), the movement amount ΔY of the Y stage 41 in the Y direction can be found with high precision. This allows the position of the Y stage 41 to be measured with high precision.

[0094] In the stage device according to this embodiment, the table ΔC Y Instead of using ' as it is, we use the table ΔC Y ' is used to obtain the approximate function n(t). As a result, even if the stage driving conditions such as the stage movement speed and the driving profile associated with the layout during exposure are changed, the wavelength λ of the Y measurement beam 35 under the predetermined stage driving conditions can be obtained without acquiring a new table. a The time evolution of can be determined.

[0095] Specifically, for example, if a given stage drive condition simply changes the magnitude of the stage movement speed compared to another stage drive condition, the coefficient related to time t is changed in the approximate function n(t) obtained under the other stage drive condition. This makes it possible to obtain the approximate function n(t) under the predetermined stage driving conditions. In this way, in the stage device according to this embodiment, the use of the approximation function n(t) simplifies the processing, thereby improving the throughput.

[0096] [Third embodiment] FIG. 6 shows a schematic configuration diagram of a stage device 300 according to the third embodiment.

[0097] Stage device 300 according to this embodiment includes a Y mirror 33, a Y interferometer 34 (first measurement unit), a Y optical pickup 37, a Y detection unit 38, and a Y wavelength compensator 39 (second measurement unit). Furthermore, stage device 300 according to this embodiment is equipped with an X mirror 53, an X interferometer 54 (fourth measurement unit), an X optical pickup 57, an X detection unit 58, and an X wavelength compensator 59 (fifth measurement unit). The stage device 300 according to this embodiment also includes a stage 45 and a control unit. The control unit also includes a signal processing unit 61, a sequence control unit 81, a Y wavelength correction unit 82, and an X wavelength correction unit 83.

[0098] As shown in FIG. 6, a stage 45, for example a wafer stage 45, has a Y stage and an X stage (not shown), and specifically, the X stage is placed on the Y stage. Furthermore, Y mirror 33 is disposed on the Y stage, and has a reflecting surface (first reflecting surface) perpendicular to the Y direction. Y measurement beam 35 (first measurement light) emitted from Y interferometer 34 is incident on the reflecting surface of Y mirror 33. Then, Y measurement beam 35 reflected by the reflecting surface of Y mirror 33 interferes with a reference beam (not shown) in Y interferometer 34, generating Y interference beam 36. Alternatively, Y mirror 33 may be configured integrally with the Y stage, and the Y stage may be configured to have a reflecting surface perpendicular to the Y direction.

[0099] Next, Y interference beam 36 emitted from Y interferometer 34 is incident on Y optical pickup 37, whereby Y interference beam 36 is photoelectrically converted, and an interference signal is output from Y optical pickup 37. Then, Y detection unit 38 provided on a length measurement board (not shown) detects the phase difference between the interference signal and a reference signal from a laser head provided on Y interferometer 34 . As a result, the distance Y0 in the Y direction between the Y interferometer 34 and the Y mirror 33, that is, the position measurement value Δm Y can be output.

[0100] Similarly, X mirror 53 is placed on the X stage, and has a reflecting surface (second reflecting surface) perpendicular to the X direction. X measurement beam 55 (third measurement light) emitted from X interferometer 54 is incident on the reflecting surface of X mirror 53. Then, X measurement beam 55 reflected by the reflective surface of X mirror 53 interferes with a reference beam (not shown) in X interferometer 54, generating X interference beam 56. Furthermore, X mirror 53 may be configured integrally with the X stage, and the X stage may be configured to have a reflective surface perpendicular to the X direction.

[0101] Next, X interference beam 56 emitted from X interferometer 54 is incident on X optical pickup 57, whereby X interference beam 56 is photoelectrically converted, and an interference signal is output from X optical pickup 57. Then, an X detector 58 provided on a length measurement board (not shown) detects the phase difference between the interference signal and a reference signal from a laser head provided on the X interferometer 54 . As a result, the distance X0 in the X direction between the X interferometer 54 and the X mirror 53, that is, the position measurement value Δm X can be output.

[0102] Furthermore, Y wavelength compensator 39 is closer to the optical path of Y measurement beam 35 between Y interferometer 34 and Y mirror 33 than X wavelength compensator 59 . Furthermore, X wavelength compensator 59 is closer to the optical path of X measurement beam 55 between X interferometer 54 and X mirror 53 than Y wavelength compensator 39 .

[0103] Next, the position measurement value Δm is calculated based on the wavelength correction amount ΔC obtained from the Y wavelength compensator 39. Y and corrects the position measurement value Δm based on the wavelength correction amount ΔC obtained from the X wavelength compensator 59. X Consider the process of correcting the above. At this time, it should be noted that the stage driving conditions when acquiring the wavelength correction amount ΔC are not limited to driving the X stage along the X direction and driving the Y stage along the Y direction, but may involve both.

[0104] For example, in the Y wavelength compensator 39, as shown in the stage devices of the first and second embodiments, when the Y stage is driven in the Y direction, atmospheric fluctuations caused by the drive affect the time change in the measurement value corresponding to the refractive index n of the atmosphere. However, as in the stage device 300 according to this embodiment, when both the X stage and the Y stage are driven in the X direction and the Y direction, respectively, atmospheric fluctuations caused by both drives generate turbulence in the atmospheric region 404 of the Y wavelength compensator 39.

[0105] If such turbulence occurs in the atmospheric region 404, a large error occurs in the measurement value corresponding to the refractive index n of the atmosphere, that is, in the wavelength correction amount ΔC. Therefore, the wavelength correction amount ΔC is obtained based on the value measured by the Y wavelength compensator 39, and the obtained wavelength correction amount ΔC is used as is to calculate the position measurement value Δm Y If an attempt is made to correct this, a large error will occur in the calculated movement amount ΔY of the Y stage. The occurrence of such a large error can be prevented by directly using the wavelength correction amount ΔC obtained by the X wavelength compensator 59 to obtain the position measurement value Δm X The same problem occurs when the movement amount ΔX of the X stage is calculated by correcting the above.

[0106] Therefore, in the stage device 300 according to this embodiment, similar to the stage devices according to the first and second embodiments, the table ΔC Y ', and the table ΔC when the X stage is driven along the X direction X ' should be created in advance. When both the X stage and the Y stage are driven in the X direction and the Y direction, the table ΔC Y ' and ΔC X ' is used to calculate the movement amount ΔY of the Y stage and the movement amount ΔX of the X stage.

[0107] Specifically, when the X stage is driven stepwise along the X direction while the Y stage is kept stationary (first drive condition), the table ΔC X (first table) is created by the X wavelength compensator 59 and the Y wavelength compensator 39 in accordance with steps S301 to S306. In addition, the table ΔC when the Y stage is step-driven along the Y direction while the X stage is stationary Y (1) is created by the X wavelength compensator 59 and the Y wavelength compensator 39 in accordance with steps S301 to S306.

[0108] In addition, when the X stage is kept stationary and the Y stage is driven to scan along the Y direction (second drive condition), the table ΔC Y (2) (second table) is created by the X wavelength compensator 59 and the Y wavelength compensator 39 in accordance with steps S301 to S306. In this way, the table ΔC obtained by each of the X wavelength compensator 59 and the Y wavelength compensator 39 under a plurality of stage driving conditions is X , ΔC Y(1) and ΔC Y (2) is stored in the Y wavelength correction unit 82 and the X wavelength correction unit 83.

[0109] Then, for example, consider a stage drive condition in which the X stage moves stepwise along the X direction while the Y stage moves in a scanning manner along the Y direction. In other words, consider a stage driving condition (predetermined driving condition) in which the stage 45 is driven in a direction (third direction) non-parallel to both the X direction and the Y direction in the XY cross section. In this case, when calculating the movement amount ΔY of the Y stage, the wavelength λ of the Y measurement beam 35 in the atmospheric region 404 is first calculated by the Y wavelength compensator 39. aY By measuring the change over time, the wavelength correction amount ΔC is obtained.

[0110] Next, the acquired wavelength correction amount ΔC is input to a high-cut filter to remove noise that varies with time from the acquired wavelength correction amount ΔC. In other words, the acquired wavelength correction amount ΔC is input to a high-cut filter to remove the component (third component) in the second frequency range corresponding to the high frequency range from the wavelength correction amount ΔC. Then, for the wavelength correction amount ΔC from which the time-varying noise has been removed, the table ΔC obtained by the Y wavelength compensator 39 when the X stage is driven stepwise along the X direction is X is multiplied by a predetermined coefficient and then the difference is taken.

[0111] As a result, the table ΔC Y ' and get the table ΔC Y ', the wavelength λ of the Y measurement beam 35 emitted from the Y interferometer 34 aY The time evolution of can be determined. The predetermined coefficient used here is determined based on the degree of atmospheric fluctuation that occurs in the atmospheric region 404 of the Y wavelength compensator 39 as the X stage is step-driven along the X direction. That is, it is determined from the drive conditions for step driving of the X stage along the X direction, including the magnitude of the speed and acceleration in step driving of the X stage along the X direction, and the drive profile.

[0112] The position measurement value Δm by the Y interferometer 34 when both the X stage and the Y stage constituting the stage 45 are driven under the above stage drive conditions is Y Get. Then, the obtained position measurement value Δm Y The table ΔC obtained as above Y By correcting using ', the movement amount ΔY of the Y stage can be calculated.

[0113] Similarly, when calculating the movement amount ΔX of the X stage, the wavelength λ of the X measurement beam 55 in the atmospheric region 404 is calculated by the X wavelength compensator 59. aX By measuring the change over time, the wavelength correction amount ΔC is obtained.

[0114] Next, the acquired wavelength correction amount ΔC is input to a high-cut filter to remove noise that varies with time from the acquired wavelength correction amount ΔC. In other words, the acquired wavelength correction amount ΔC is input to a high-cut filter to remove the component (fifth component) in the second frequency range corresponding to the high frequency range from the wavelength correction amount ΔC. Then, for the wavelength correction amount ΔC from which the time-varying noise has been removed, the table ΔC obtained by the X wavelength compensator 59 when the Y stage is scanned along the Y direction is Y (2) is multiplied by a specified coefficient and then the difference is taken.

[0115] As a result, the table ΔC X ' and get the table ΔC X ', the wavelength λ of the X measurement beam 55 emitted from the X interferometer 54 aX The time evolution of can be determined. The predetermined coefficient used here is determined based on the degree of atmospheric fluctuation that occurs in the atmospheric region 404 of the X wavelength compensator 59 as the Y stage is driven to scan along the Y direction. That is, it is determined from the drive conditions for scan driving of the Y stage along the Y direction, including the magnitude of the speed and acceleration in scan driving of the Y stage along the Y direction, and the drive profile.

[0116] The position measurement value Δm by the X interferometer 54 when both the X stage and the Y stage constituting the stage 45 are driven under the above-mentioned stage drive conditions is X Get. Then, the obtained position measurement value Δm X The table ΔC obtained as above X By correcting using ', the movement amount ΔX of the X stage can be calculated.

[0117] As described above, in stage device 300 according to this embodiment, the wavelength λ of the measurement beam caused by atmospheric fluctuations in the atmospheric region through which the measurement beam travels when stage 45 is driven under predetermined drive conditions is a That is, a table showing the time change of the refractive index n of the atmosphere is created in advance. Then, by using the created table to correct the position measurement value obtained by the interferometer when the stage is driven under the predetermined drive conditions, the amount of movement of the stage 45 can be determined with high precision. This allows the position of the stage 45 to be measured with high precision.

[0118] Specifically, the table ΔC when the Y stage is driven along the Y direction while the X stage is stationary. Y , and the table ΔC when the X stage is driven along the X direction while the Y stage is stationary X Get. When both the X stage and the Y stage are driven in the X direction and the Y direction, the table ΔC Y and ΔC XThe error included in the wavelength correction amount ΔC is removed using the formula below to calculate the movement amount ΔY of the Y stage and the movement amount ΔX of the X stage. This makes it possible to measure the positions of the X stage and Y stage that make up stage 45 with high accuracy, even when both the X stage is driven along the X direction and the Y stage is driven along the Y direction.

[0119] [Fourth embodiment] FIG. 7 is a flowchart showing the processing by the exposure apparatus 1 equipped with the stage apparatus according to the fourth embodiment when exposure is performed by the stage apparatus. The stage device according to this embodiment has the same configuration as the stage device according to any one of the first to third embodiments, so the same members are given the same reference numerals and descriptions thereof will be omitted.

[0120] In a typical production line, multiple wafers 40, each coated with resist, that make up a given lot are transported in sequence to the exposure apparatus 1 by an inline transport device (not shown), and the exposure apparatus 1 performs wafer exposure processing of the same process on a large number of wafers on a lot-by-lot basis.

[0121] As shown in FIG. 7, in the exposure apparatus 1 equipped with the stage device according to this embodiment, when a predetermined wafer 40 is loaded onto the wafer stage 45 (step S1001), it is determined whether the loaded wafer 40 is the first wafer of a predetermined lot (step S1002).

[0122] If the loaded wafer 40 is the first wafer in a predetermined lot (Yes in step S1002), a calibration process including alignment offset and focus offset is performed on the wafer 40. In recent years, there has been a trend in calibration processing for the first wafer 40 in a lot to measure all shot areas on the wafer 40 in order to achieve high overlay accuracy and exposure focus accuracy for all wafers 40 that make up the lot.

[0123] Also, while the above calibration process is being performed, a table is created to correct the measurement values ​​from the interferometer in accordance with the stage drive conditions when exposing each of the wafers 40 that make up the lot, just as in the stage device according to any of the first to third embodiments. Then, the created table is stored (step S1003), and the process proceeds to step S1004. On the other hand, if the loaded wafer 40 is not the first wafer of the predetermined lot (No in step S1002), the process proceeds to step S1004 without performing step S1003.

[0124] Next, alignment measurement is performed on the loaded wafer 40 to adjust (correct) the exposure position with high precision (step S1004). At this time, as with the stage apparatus according to any one of the first to third embodiments, the movement amounts of the X stage and Y stage are calculated with high precision by correcting the measurement values ​​from the interferometer using the table created in step S1003 and the measurement values ​​from the wavelength compensator.

[0125] Then, the wafer 40 after the alignment process is scanned in synchronization with the reticle 20, and exposure is performed for each shot area, thereby transferring the circuit pattern formed on the reticle 20 onto the wafer 40 (step S1005). At this time, the measurement values ​​by the interferometer are corrected using a table corresponding to the position of the shot area where exposure is performed and the stage drive conditions including the drive profile of the stage during exposure, and the measurement values ​​by the wavelength compensator.

[0126] After all shot areas in the wafer 40 have been exposed, the wafer 40 is carried out to the outside of the exposure apparatus 1 (step S1006). Here, the exposed wafer 40 is generally transported to a developing treatment device by an in-line transport device.

[0127] Next, it is determined whether exposure has been performed on all wafers 40 in the lot (step S1007). If all wafers 40 in the lot have been exposed (Yes in step S1007), the process ends. On the other hand, if exposure has not been performed on all wafers 40 in the lot (No in step S1007), the process returns to step S1001, and exposure processing is performed sequentially on the remaining wafers 40 in the lot.

[0128] As described above, in the stage device according to this embodiment, the wavelength λ of the measurement beam caused by atmospheric fluctuations in the atmospheric region through which the measurement beam travels when the stage is driven under predetermined drive conditions is a That is, a table showing the time change of the refractive index n of the atmosphere is created in advance. Then, by using the created table to correct the position measurement values ​​obtained by the interferometer when the stage is driven under the predetermined drive conditions, the amount of movement of the stage can be determined with high precision. This allows the position of the stage to be measured with high precision.

[0129] Furthermore, the stage device according to this embodiment is configured so that the process of creating the table is carried out simultaneously with the calibration process including the alignment offset and focus offset for the first wafer 40 in the lot in the exposure apparatus 1. This makes it possible to improve the throughput when performing exposure processing on each wafer 40 in the lot.

[0130] [Production method] Next, a method for manufacturing an article according to this embodiment will be described.

[0131] A method for manufacturing articles such as semiconductor IC elements, liquid crystal display elements, and MEMS includes a step of exposing a substrate, such as a wafer or glass substrate, coated with a photosensitive agent using an exposure apparatus 1 equipped with a stage device according to any one of the first to fourth embodiments. The method also includes the steps of developing the exposed substrate (photosensitive material) and other well-known steps of processing the developed substrate. The other well-known processes mentioned here include etching, photosensitive material removal, dicing, bonding, packaging, and the like. According to the method for manufacturing an article according to this embodiment, it is possible to manufacture an article of higher quality than conventional methods.

[0132] Although the preferred embodiments have been described above, the present invention is not limited to these embodiments and various modifications and changes are possible within the scope of the gist thereof. [Explanation of symbols]

[0133] 33 Y mirror (first reflective surface) 34 Y interferometer (first measurement unit) 35 Y measurement beam (first measurement beam) 39 Y wavelength compensator (second measurement unit) 41 Y Stage (Stage) 61 Signal processing unit (control unit) 81 Sequence control unit (control unit) 82 Y wavelength correction unit (control unit) 100 Stage Equipment 404 Atmospheric Region (First Atmospheric Region)

Claims

1. a stage having a first reflecting surface disposed perpendicular to a first direction and capable of being driven in the first direction; a first measurement unit that receives the first measurement light reflected by the first reflecting surface and measures the position of the stage in the first direction; a second measurement unit that measures a wavelength of the second measurement light propagating through the first atmospheric region; a control unit that corrects the measurement result of the first measurement unit based on information about a change over time in the wavelength of the second measurement light due to atmospheric fluctuations in the first atmospheric region that occur when the stage is driven along the first direction under predetermined drive conditions; and A stage device comprising:

2. The control unit measuring a change over time in wavelength of the second measurement light by the second measurement unit while driving the stage along the first direction under the predetermined drive condition; acquiring a first component in a first frequency domain by inputting the measured change in wavelength of the second measurement light into a low-pass filter; determining a time change in the wavelength of the first measurement light under the predetermined driving condition based on the acquired first component and a first table indicating a time change in the wavelength of the second measurement light; 2. The stage apparatus according to claim 1, wherein the measurement result of the first measurement unit is corrected based on the time change in the wavelength of the first measurement light that has been determined.

3. 3. The stage device according to claim 2, wherein the control unit determines the change in wavelength of the first measurement light over time by adding up the acquired first component and the first table.

4. 3. The stage device according to claim 2, wherein the control unit determines the change in wavelength of the first measurement light over time by adding up the acquired first component and an approximation function acquired from the first table.

5. a third measurement unit that measures the temperature, humidity, and air pressure of the space in which the stage device is installed; The control unit determining an initial value of the refractive index of the atmosphere in the first atmosphere region based on the measurement result of the third measurement unit; measuring a change over time in wavelength of the second measurement light by the second measurement unit while driving the stage along the first direction under the predetermined drive condition; the measured change in wavelength of the second measurement light over time is input to a low-pass filter and a high-cut filter, respectively, to acquire the first component in the first frequency domain and the second component in the second frequency domain; 3. The stage device according to claim 2, wherein the first table is created by removing the first component and the second component from the measured change over time in wavelength of the second measurement light.

6. 5. The stage apparatus according to claim 4, wherein the control unit acquires the approximate function by performing fitting on the created first table.

7. a stage having a first reflecting surface disposed perpendicular to a first direction, the stage being movable within a first cross section parallel to the first direction and a second direction perpendicular to the first direction; a first measurement unit that receives the first measurement light reflected by the first reflecting surface and measures the position of the stage in the first direction; a second measurement unit that measures a wavelength of the second measurement light propagating through the first atmospheric region; a control unit that corrects a measurement result of the first measurement unit acquired when the stage is driven along a third direction non-parallel to each of the first direction and the second direction within the first cross section, based on information about a change over time in the wavelength of the second measurement light associated with atmospheric fluctuations in the first atmospheric region that occurs when the stage is driven along the second direction; and A stage device comprising:

8. 8. The stage device according to claim 7, wherein the control unit corrects the measurement result of the first measurement unit, which is acquired when the stage is driven along the third direction under predetermined drive conditions, based on a first table that indicates a change over time in the wavelength of the second measurement light due to atmospheric fluctuations in the first atmospheric region that occur when the stage is driven along the second direction under first drive conditions.

9. The control unit measuring a change over time in wavelength of the second measurement light by the second measurement unit while driving the stage along the third direction under the predetermined drive condition; acquiring a third component in a second frequency region by inputting the measured change in wavelength of the second measurement light into a high-cut filter; determining a time change in the wavelength of the first measurement light under the predetermined driving condition by removing the third component from the measured time change in the wavelength of the second measurement light and then taking a difference between the time change in the wavelength of the second measurement light and the first table multiplied by a predetermined coefficient; 9. The stage apparatus according to claim 8, wherein the measurement result of the first measurement unit is corrected based on the time change in the wavelength of the first measurement light that has been determined.

10. a third measurement unit that measures the temperature, humidity, and air pressure of the space in which the stage device is installed; The control unit determining an initial value of the refractive index of the atmosphere in the first atmosphere region based on the measurement result of the third measurement unit; measuring a change over time in wavelength of the second measurement light by the second measurement unit while driving the stage along the second direction under the first driving condition; a fourth component in a first frequency domain and a third component in the second frequency domain are obtained by inputting the measured change in wavelength of the second measurement light to a low-pass filter and a high-cut filter, respectively; 10. The stage apparatus according to claim 9, wherein the first table is created by removing the third component and the fourth component from the measured change over time in the wavelength of the second measurement light.

11. the stage has a second reflecting surface disposed perpendicular to the second direction; The stage device a fourth measurement unit that measures the position of the stage in the second direction by receiving the third measurement light reflected by the second reflecting surface; a fifth measurement unit that measures a wavelength of the fourth measurement light propagating through the second atmospheric region; Equipped with 11. The stage device according to claim 8, wherein the control unit corrects the measurement result of the fourth measurement unit, which is acquired when the stage is driven along the third direction under the predetermined drive condition, based on a second table that indicates a change over time in the wavelength of the fourth measurement light due to atmospheric fluctuations in the second atmospheric region that occur when the stage is driven along the first direction under a second drive condition.

12. The control unit measuring a change over time in wavelength of the fourth measurement light by the fifth measurement unit while driving the stage along the third direction under the predetermined drive condition; acquiring a fifth component in a second frequency domain by inputting the measured change in wavelength of the fourth measurement light into a high-cut filter; determining a time change in the wavelength of the third measurement light under the predetermined driving condition by removing the fifth component from the measured time change in the wavelength of the fourth measurement light and then taking a difference between the time change in the wavelength of the fourth measurement light and the second table multiplied by a predetermined coefficient; 12. The stage apparatus according to claim 11, wherein the measurement result of the fourth measurement unit is corrected based on the time change in the wavelength of the determined third measurement light.

13. a third measurement unit that measures the temperature, humidity, and air pressure of the space in which the stage device is installed; The control unit determining an initial value of the refractive index of the atmosphere in the second atmosphere region based on the measurement result of the third measurement unit; measuring a change over time in the wavelength of the fourth measurement light by the fifth measurement unit while driving the stage along the first direction under the second driving condition; a sixth component in a first frequency domain and a fifth component in the second frequency domain are obtained by inputting the measured change in wavelength of the fourth measurement light to a low-pass filter and a high-cut filter, respectively; 13. The stage apparatus according to claim 12, wherein the second table is created by removing the fifth component and the sixth component from the measured change over time in the wavelength of the fourth measurement light.

14. the first atmospheric region is closer to an optical path of the first measurement light than the second atmospheric region; 14. The stage apparatus according to claim 11, wherein the second atmospheric region is closer to the optical path of the third measurement light than the first atmospheric region.

15. A stage device according to any one of claims 1 to 14, characterized in that the first measurement unit is an interferometer that measures the distance between the first measurement unit and the first reflecting surface from interference between the first measurement light reflected by the first reflecting surface and a reference light.

16. 16. The stage device according to claim 1, wherein the second measurement unit is a wavelength compensator that measures a wavelength of the second measurement light by comparing a measurement result of a predetermined object by the second measurement light propagating through the first atmospheric region with a measurement result of the predetermined object by the fifth measurement light propagating through a vacuum region.

17. 17. A stage device according to claim 1, wherein the stage includes a first stage that is driven along the first direction and a second stage that is driven along a second direction perpendicular to the first direction.

18. a stage having a first reflecting surface disposed perpendicular to a first direction and capable of being driven in the first direction; a first measurement unit that receives the first measurement light reflected by the first reflecting surface and measures the position of the stage in the first direction; a second measurement unit that measures a wavelength of the second measurement light propagating through the first atmospheric region; a control unit that corrects the measurement result of the first measurement unit based on a wavelength of the second measurement light that changes due to atmospheric fluctuations in the first atmospheric region that occur when the stage is driven along the first direction, the second measurement unit is a wavelength compensator that measures a wavelength of the second measurement light by comparing a measurement result of the predetermined object by the second measurement light propagating through the first atmospheric region with a measurement result of the predetermined object by the third measurement light propagating through a vacuum region.

19. 1. An exposure apparatus that exposes a substrate to light so as to transfer a pattern formed on an original onto the substrate, An exposure apparatus comprising: a stage device according to claim 1 that drives a substrate stage on which the substrate is placed.

20. 20. The exposure apparatus according to claim 19, wherein the substrate stage performs scanning movement in the first direction and step movement in a second direction perpendicular to the first direction when exposing the substrate.

21. The exposure apparatus according to claim 19 or 20, characterized in that the control unit creates a first table which is information on the change in wavelength of the second measurement light over time when a calibration process is performed on the substrate at the head of a predetermined lot placed on the substrate stage.

22. exposing the substrate using an exposure apparatus according to any one of claims 19 to 21; developing the exposed substrate; manufacturing an article from the developed substrate; A method for manufacturing an article, comprising:

23. A method for controlling driving of a stage using a stage device including: a stage having a first reflecting surface arranged perpendicular to a first direction and movable in the first direction; a first measurement unit that receives first measurement light reflected by the first reflecting surface and measures a position of the stage in the first direction; and a second measurement unit that measures a wavelength of second measurement light propagating through a first atmospheric region, a step of correcting the measurement result of the first measurement unit based on information about a change in wavelength of the second measurement light due to atmospheric fluctuations in the first atmospheric region that occur when the stage is driven along the first direction under predetermined drive conditions.

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