Detergent composition and concentrate for the detergent composition

Abstract

To provide a detergent composition having excellent flux cleaning and handling properties and reduced metallic effects and volatile organic compounds (VOC), and a concentrate solution for the detergent composition.SOLUTION: A detergent composition comprises a hydrophilic glycol ether compound, an organic acid, a first compound, and water. The first compound is a hydrophilic nitrogen-containing organic compound and / or a hydrophilic quaternary ammonium salt, the content of the water is 20 mass% or more, and the molar ratio of the first compound to the organic acid is 1 or greater and 35 or smaller.SELECTED DRAWING: None

Description

[Technical Field]

[0001] The present invention relates to a detergent composition and a concentrate for a detergent composition. [Background technology]

[0002] It has been known for some time that when electronic components such as integrated circuits (ICs) and capacitors are soldered to printed circuit boards, camera module components, etc., flux scatters from the solder paste and adheres to the periphery of the electrodes as residue (hereinafter, the above-mentioned flux residue may be referred to as "flux residue").

[0003] Flux residue can cause corrosion at solder joints, poor bonding during wire bonding, and poor adhesion with mold resin during resin sealing. Therefore, flux residue needs to be removed with a cleaner, and various cleaners have been proposed (Patent Documents 1, 2, and 3). [Prior art documents] [Patent documents]

[0004] [Patent Document 1] Japanese Patent Application Publication No. 05-105899 [Patent Document 2] Japanese Patent Application Laid-Open No. 2002-201492 [Patent Document 3] Japanese Patent Application Publication No. 05-043897 Summary of the Invention [Problem to be solved by the invention]

[0005] In recent years, there has been a demand for cleaning compositions with improved cleaning properties and ease of handling for flux residue. Furthermore, from the viewpoint of environmental safety, there has also been a demand for cleaning compositions with reduced volatile organic compounds (VOCs). However, with conventional cleaning compositions, it has sometimes been difficult to achieve both improved cleaning properties and ease of handling for flux residue and reduced volatile organic compounds (VOCs). Even when a cleaning composition has excellent cleaning properties and ease of handling for flux residue and reduced volatile organic compounds (VOCs), the organic acids contained in the cleaning composition can easily cause corrosion of metals (e.g., zinc (Zn) and iron (Fe)) contained in the object to be cleaned (in other words, "metal effects").

[0006] The present invention has been made in view of the above circumstances, and aims to provide a cleaning composition and a concentrate for the cleaning composition that have excellent flux removal properties and handleability, and that have reduced metal effects and volatile organic compounds (VOCs). [Means for solving the problem]

[0007] A cleaning composition according to one embodiment of the present disclosure includes a hydrophilic glycol ether compound, an organic acid, a first compound, and water, the first compound is a hydrophilic nitrogen-containing organic compound and / or a hydrophilic quaternary ammonium salt; The water content is 20% by mass or more, The molar ratio of the first compound to the organic acid is 1 or more and 35 or less.

[0008] A stock solution for a cleaning composition according to one embodiment of the present disclosure is the stock solution for the cleaning composition described above, the content of the hydrophilic glycol ether compound is 40% by mass or more and 98.8% by mass or less, the content of the organic acid is 0.1% by mass or more and 20% by mass or less, the content of the first compound is 1.1% by mass or more and 40% by mass or less, Dilute with water between 1.1 and 20 times before use. [Effects of the Invention]

[0009] The present invention makes it possible to provide a cleaning composition and a concentrate for the cleaning composition that have excellent flux removal properties and easy handling, and that have reduced metal effects and volatile organic compounds (VOCs). DETAILED DESCRIPTION OF THE INVENTION

[0010] [Description of the embodiments of the present disclosure] First, embodiments of the present disclosure will be listed and described. [1] The cleaning composition of the present disclosure comprises: A cleaning composition comprising a hydrophilic glycol ether compound, an organic acid, a first compound, and water, the first compound is a hydrophilic nitrogen-containing organic compound and / or a hydrophilic quaternary ammonium salt; The water content is 20% by mass or more, The molar ratio of the first compound to the organic acid is 1 or more and 35 or less.

[0011] This makes it possible to provide a cleaning composition that is excellent in flux removal properties and handling properties, and that has reduced metal effects and volatile organic compounds (VOCs).

[0012] [2] In the above item [1], the pH of the cleaning composition is preferably 8.0 or more and 12.0 or less, which makes it possible to provide a cleaning composition that is more excellent in flux removal performance and handling properties, and that has further reduced metal effects and volatile organic compounds (VOCs).

[0013] [3] In the above [1] or [2], the content of the organic acid is 0.1% by mass or more and 4.0% by mass or less; The content of the first compound is preferably 1% by mass or more and 20% by mass or less, which makes it possible to provide a cleaning composition that is more excellent in flux removal performance and handling properties, and that further reduces the influence on metals and volatile organic compounds (VOCs).

[0014] [4] In any of the above items [1] to [3], the cleaning composition preferably has a uniform appearance at temperatures of 25°C and 50°C. This makes it possible to provide a cleaning composition with even better flux removal properties and handling properties, as well as reduced metal effects and volatile organic compounds (VOCs).

[0015] [5] In any of the above items [1] to [4], the organic acid is preferably an organic acid having one or more carboxyl groups in one molecule or an organic acid having one or more phosphonic acid groups in one molecule. This makes it possible to provide a cleaning composition with even better flux removal properties and handling properties, as well as reduced metal effects and volatile organic compounds (VOCs).

[0016] [6] In any of the above [1] to [5], the hydrophilic glycol ether compound is preferably a compound represented by formula (1) and having a water solubility of more than 50 mass% in an environment at 20°C, or a compound represented by formula (2) and having a water solubility of more than 50 mass% in an environment at 20°C. [ka] (In formula (1), R 1 , R 2 and R 3 each independently represents a hydrogen atom, a methyl group, or an ethyl group; R 4 represents a linear and / or cyclic hydrocarbon group having 1 to 11 carbon atoms, and —CH2— contained in the hydrocarbon group may be replaced with —O—; in formula (2), R 5 and R 6 each independently represents a hydrogen atom or a methoxy group, and 5 and the R 6 is a methoxy group, and R 7 represents a hydrogen atom or a methyl group.) This makes it possible to provide a detergent composition that is even easier to handle.

[0017] [7] In the above [6], the hydrophilic glycol ether compound is preferably at least one compound selected from the group consisting of ethylene glycol monomethyl ether, ethylene glycol monobutyl ether, ethylene glycol monoallyl ether, propylene glycol monopropyl ether, ethylene glycol monoisobutyl ether, ethylene glycol mono-tert-butyl ether, propylene glycol monomethyl ether, dipropylene glycol monomethyl ether, tripropylene glycol monomethyl ether, diethylene glycol monomethyl ether, diethylene glycol monobutyl ether, diethylene glycol monoisobutyl ether, diethylene glycol monoisopropyl ether, diethylene glycol monobenzyl ether, ethylene glycol dimethyl ether, diethylene glycol dimethyl ether, diethylene glycol ethyl methyl ether, diethylene glycol diethyl ether, diethylene glycol isopropyl methyl ether, triethylene glycol monomethyl ether, triethylene glycol monobutyl ether, triethylene glycol dimethyl ether, diethylene glycol monohexyl ether, ethylene glycol monoisopropyl ether, 2-methoxybutanol, 3-methoxybutanol, 3-methoxy-3-methylbutanol, and propyl cellosolve. This makes it possible to provide a detergent composition that is easier to handle.

[0018] [8] In any one of the above [1] to [7], the organic acid is a hydrophilic acid and / or a hydrophobic acid; the hydrophilic acid is at least one hydrophilic acid selected from the group consisting of nitrilotris(methylenephosphonic acid), tartaric acid, citric acid, malic acid, glycolic acid, propionic acid, 2-phosphonobutane-1,2,4-tricarboxylic acid, 1-hydroxyethane-1,1-diphosphonic acid, glycine, phytic acid, 1H-benzotriazole-4-carboxylic acid, 1H-benzotriazole-5-carboxylic acid, and p-toluenesulfonic acid; The hydrophobic acid may be diethylenetriaminepentaacetic acid, bicine, ethylenediaminetetra(methylenephosphonic acid), octanoic acid, nonanoic acid, decanoic acid, undecanoic acid, lauric acid, acetylacetonate ... At least one hydrophobic acid selected from the group consisting of lendronic acid and 1-amino-2-naphthol-4-sulfonic acid is preferred, which makes it possible to provide a cleaning composition with even better flux removal properties and handling properties, as well as reduced metal effects and volatile organic compounds (VOCs).

[0019] [9] In any of [1] to [8] above, The hydrophilic nitrogen-containing organic compound is a compound represented by formula (3) and having a water solubility of more than 50 mass% in an environment at 20°C, or a compound represented by formula (4) and having a water solubility of more than 50 mass% in an environment at 20°C, The hydrophilic quaternary ammonium salt is preferably a compound represented by formula (5) and having a water solubility of more than 50% by mass in a 20°C environment. [ka] (In formula (3), R 8 represents a -CH2CH2OH group, a -CH2CH(OH)CH3 group, a -CH2CH2CH2NH2 group, or a chain hydrocarbon group having 1 to 4 carbon atoms; R 9 represents a hydrogen atom, a -CH2CH2OH group, a -CH2CH2CH2NH2 group, or a -CH2CH(OH)CH3 group, and R 10 represents a hydrogen atom, a -CH2CH2OH group, or a methyl group, and in formula (4), R 15 , R 16 , R 17 each independently represents a hydrogen atom or a methyl group, and in formula (5), R 11 , R 12 , R 13 , R 14each independently represents a hydrocarbon group having 1 to 2 carbon atoms.) This makes it possible to provide a cleaning composition that is even more excellent in flux removal properties and handling properties, and that further reduces the effect on metals and volatile organic compounds (VOCs).

[0020]

[10] In the above [9], the hydrophilic nitrogen-containing organic compound is at least one hydrophilic compound selected from the group consisting of monoisopropanolamine, 3,3'-diamino-N-methyldipropylamine, 3,3'-diaminodipropylamine, N-ethylethanolamine, diisopropanolamine, diethanolamine, Nn-butyldiethanolamine, triethanolamine, methyldiethanolamine, and 2-methylimidazole. It is a nitrogen-containing organic compound, The hydrophilic quaternary ammonium salt is preferably tetraethylammonium hydroxide, which makes it possible to provide a cleaning composition that is superior in flux removal performance and handling, and further reduces the influence on metals and volatile organic compounds (VOCs).

[0021]

[11] Furthermore, the concentrate for a cleaning composition of the present disclosure is the concentrate for a cleaning composition according to any one of [1] to

[10] above, the content of the hydrophilic glycol ether compound is 40% by mass or more and 98.8% by mass or less, the content of the organic acid is 0.1% by mass or more and 20% by mass or less, the content of the first compound is 1.1% by mass or more and 40% by mass or less, Dilute with water between 1.1 and 20 times before use.

[0022] This makes it possible to provide a cleaning composition that is excellent in flux removal properties and handling properties, and that has reduced metal effects and volatile organic compounds (VOCs).

[0023] [Details of the embodiments of the present disclosure] An embodiment of the present disclosure (hereinafter also referred to as "the present embodiment") will be described. However, the present embodiment is not limited thereto. In this specification, the notation in the format "A to Z" means the upper and lower limits of a range (i.e., A or more and Z or less). When no unit is specified for A and a unit is specified only for Z, the unit of A and the unit of Z are the same.

[0024] [Embodiment 1: Cleaning composition] A cleaning agent composition according to one embodiment of the present disclosure will be described. The cleaning composition according to one embodiment of the present disclosure (hereinafter also referred to as "the present embodiment") comprises: A cleaning composition comprising a hydrophilic glycol ether compound, an organic acid, a first compound, and water, the first compound is a hydrophilic nitrogen-containing organic compound and / or a hydrophilic quaternary ammonium salt; The water content is 20% by mass or more, The molar ratio of the first compound to the organic acid is 1 or more and 35 or less.

[0025] The present disclosure makes it possible to provide a cleaning composition that is excellent in flux removal properties and ease of handling, and that has reduced metal effects and volatile organic compounds (VOCs). The reasons for this are presumed to be as follows.

[0026] (a1) The cleaning composition of the present disclosure comprises a hydrophilic glycol ether compound, an organic acid, a first compound, and water. The first compound is a hydrophilic nitrogen-containing organic compound and / or a hydrophilic quaternary ammonium salt, and the molar ratio of the first compound to the organic acid is 1 or more and 35 or less. The combination of the organic acid and the first compound (hydrophilic nitrogen-containing organic compound and / or hydrophilic quaternary ammonium salt) easily creates a polar environment. This increases the stability of the salt formed with the organic acid during cleaning. As a result, not only does the first compound swell and dissolve flux residue, but the formation of the salt improves the defluxing ability of the organic acid. Furthermore, the organic acid is less likely to adsorb to metals contained in the object to be cleaned, thereby reducing the metal impact.

[0027] In addition, since the hydrophilic glycol ether and the first compound are hydrophilic, the solubility of the hydrophobic compound in water in the cleaning composition can be increased. In addition, as described above, the organic acid and the first compound (hydrophilic nitrogen-containing organic compound and / or hydrophilic quaternary ammonium compound) can be used in combination. By combining the first compound with an organic acid (a hydrophobic compound), a salt is formed between the first compound and the organic acid, further improving the hydrophilicity of the first compound. Therefore, even when a hydrophobic compound is added to the cleaning composition, the cleaning composition as a whole tends to become homogeneous, and the cleaning composition has excellent handleability. In this application, the "handleability" of a cleaning composition is defined as being excellent when no additional work such as stirring due to separation is required or when there are no restrictions on use due to the low safety of the cleaning composition.

[0028] (b1) Furthermore, the content of water in the cleaning composition is 20% by mass or more. This ensures that the content of water in the cleaning composition is sufficiently high, thereby reducing VOCs.

[0029] As described above, the cleaning composition according to this embodiment has excellent flux removal properties and handling properties, and can reduce the influence of metals and volatile organic compounds (VOCs).

[0030] <Composition of cleaning composition> <Hydrophilic glycol ether compound> The cleaning composition contains a hydrophilic glycol ether compound. This can suppress separation from water in the cleaning composition. In this embodiment, the term "glycol ether compound" refers to an ether compound of a dihydric alcohol. In this embodiment, "hydrophilic" refers to a property in which the solubility of water in the target compound exceeds 50% by mass at 20°C. Incidentally, "hydrophobic" refers to a property in which the solubility of water in the target compound is 50% by mass or less at 20°C. The hydrophilic glycol ether compound may be synthesized from known starting materials by known methods. Commercially available hydrophilic glycol ether compounds may be used as they are.

[0031] The hydrophilic glycol ether compound is preferably a compound represented by formula (1) and having a water solubility of more than 50 mass% in an environment at 20°C, or a compound represented by formula (2) and having a water solubility of more than 50 mass% in an environment at 20°C. [ka] (In formula (1), R 1 , R 2 and R 3 each independently represents a hydrogen atom, a methyl group, or an ethyl group; R 4 represents a linear and / or cyclic hydrocarbon group having 1 to 11 carbon atoms, and —CH2— contained in the hydrocarbon group may be replaced with —O—. In formula (2), R 5 and R 6 each independently represents a hydrogen atom or a methoxy group, and the R 5 and the R 6 is a methoxy group, and R 7 represents a hydrogen atom or a methyl group.

[0032] The hydrophilic glycol ether compounds include ethylene glycol monomethyl ether (MG), ethylene glycol monobutyl ether (BC), ethylene glycol monoallyl ether (AG), propylene glycol monopropyl ether (PFG), ethylene glycol monoisobutyl ether (iBG), ethylene glycol mono-tert-butyl ether (ETB), propylene glycol monomethyl ether (MFG), dipropylene glycol monomethyl ether (MFDG), tripropylene glycol monomethyl ether (MFTG), diethylene glycol monomethyl ether (MDG), diethylene glycol monobutyl ether (BDG), diethylene glycol monoisobutyl ether (iBDG), diethylene glycol monoisopropyl ether (iPDG), diethylene glycol monobenzyl ether (BzDG), ethylene glycol dimethyl ether (DMG), diethylene glycol dimethyl ether (DMDG), diethylene ...G), diethylene glycol monomethyl ether (MFTG), diethylene glycol monomethyl ether (MDG), diethylene glycol monomethyl ether (BDG), diethylene glycol monoisobutyl ether (iBDG), diethylene glycol monoisopropyl ether (iPDG), diethylene glycol monobenzyl ether (BzDG), ethylene glycol dimethyl ether (DMG), diethylene glycol dimethyl ether (DMDG), diethylene glycol monomethyl ether (MFG), diethylene glycol monomethyl ether (MFG), diethylene glycol monomethyl ether (MFG), diethylene glycol monomethyl ether (MFG), diethylene glycol monomethyl ether (MFG), diethylene glycol monomethyl ether (MDG), diethylene glycol monomethyl ether (BDG), diethylene glycol monoisobutyl ether (iBDG), diethylene glycol monoisopropyl ether (iPDG), diethylene glycol mono The ethylene glycol monoisopropyl ether is preferably at least one compound selected from the group consisting of diethylene glycol ethyl methyl ether (MEDG), diethylene glycol diethyl ether (DEDG), diethylene glycol isopropyl methyl ether (IPDM), triethylene glycol monomethyl ether (MTG), triethylene glycol monobutyl ether (BTG), triethylene glycol dimethyl ether (DMTG), diethylene glycol monohexyl ether (HeDG), ethylene glycol monoisopropyl ether (iPG), 2-methoxybutanol (2MB), 3-methoxybutanol (3MB), 3-methoxy-3-methylbutanol (MMB), and propyl cellosolve (PC), and more preferably at least one compound selected from the group consisting of propyl cellosolve, 3-methoxy-3-methylbutanol, dipropylene glycol monomethyl ether, diethylene glycol ethyl methyl ether, and triethylene glycol monobutyl ether.

[0033] The content of the hydrophilic glycol ether compound is preferably 5% by mass or more and 78% by mass or less. This further improves the cleaning ability for flux residue. The lower limit of the content of the hydrophilic glycol ether compound is preferably 5% by mass or more, more preferably 15% by mass or more, and even more preferably 20% by mass or more. The upper limit of the content of the hydrophilic glycol ether compound is preferably 78% by mass or less, more preferably 50% by mass or less, and even more preferably 30% by mass or less. The content of the hydrophilic glycol ether compound is preferably 5% by mass or more and 78% by mass or less, more preferably 15% by mass or more and 50% by mass or less, and even more preferably 20% by mass or more and 30% by mass or less.

[0034] The content of the hydrophilic glycol ether compound can be determined by gas chromatography analysis under the following conditions. (Conditions of analysis) Equipment: Gas chromatograph GC-14B (Shimadzu Corporation) Detector: Thermal conductivity detector (TCD) Column: Thermon-3000 (Shinwa Chemical Co., Ltd.) Vaporization chamber temperature: 160℃ Detector temperature: 160℃

[0035] <Organic acid> The cleaning composition contains an organic acid. In this embodiment, the term "organic acid" refers to an acidic organic compound containing a carboxy group, a phosphonic acid group, a sulfo group, or the like. The organic acid may be synthesized from a known starting material by a known method. A commercially available organic acid may be used as is.

[0036] The organic acid is an organic acid having one or more carboxyl groups in one molecule, or an organic acid having one or more carboxyl groups in one molecule. It is preferable that the organic acid has at least one phosphonic acid group, which exerts a chelating effect on the metal salt in the flux residue and forms a stable salt with the first compound, so that the cleaning composition of this embodiment has excellent flux removal performance and handleability, and can reduce the influence of metals.

[0037] The organic acid is a hydrophilic acid and / or a hydrophobic acid, and the hydrophilic acid is preferably at least one selected from the group consisting of nitrilotris(methylenephosphonic acid), tartaric acid, citric acid, malic acid, glycolic acid, propionic acid, 2-phosphonobutane-1,2,4-tricarboxylic acid, 1-hydroxyethane-1,1-diphosphonic acid (HEDP), glycine, phytic acid, 1H-benzotriazole-4-carboxylic acid, 1H-benzotriazole-5-carboxylic acid, and p-toluenesulfonic acid, and the hydrophobic acid is preferably at least one selected from the group consisting of diethylenetriaminepentaacetic acid (DTPA), bicine (DHEG), ethylenediaminetetra(methylenephosphonic acid) (EDTMP), octanoic acid, nonanoic acid, decanoic acid, undecanoic acid, lauric acid, alendronic acid, and 1-amino-2-naphthol-4-sulfonic acid. This allows the compound to exert a chelating effect on the metal salt in the flux residue and form a stable salt with the first compound, so the cleaning composition of this embodiment has excellent flux removal properties and handleability, and can reduce the influence of metals. The organic acid is a hydrophilic acid and / or a hydrophobic acid, and the hydrophilic acid is at least one hydrophilic acid selected from the group consisting of nitrilotris(methylenephosphonic acid), tartaric acid, citric acid, malic acid, glycolic acid, propionic acid, 2-phosphonobutane-1,2,4-tricarboxylic acid, 1-hydroxyethane-1,1-diphosphonic acid (HEDP), glycine, phytic acid, 1H-benzotriazole-4-carboxylic acid, and 1H-benzotriazole-5-carboxylic acid. It is more preferable that the hydrophobic acid is at least one hydrophobic acid selected from the group consisting of diethylenetriaminepentaacetic acid (DTPA), bicine (DHEG), ethylenediaminetetra(methylenephosphonic acid) (EDTMP), octanoic acid, nonanoic acid, decanoic acid, undecanoic acid, lauric acid, and alendronic acid.These hydrophilic and hydrophobic acids are organic acids having one or more carboxyl groups in one molecule or one or more phosphonic acid groups in one molecule, and therefore they exert a chelating effect on metal salts in flux residues and form stable salts with the first compound. As a result, the cleaning composition of this embodiment has excellent flux removal performance and handleability, and can reduce the influence of metals.

[0038] The organic acid content is preferably 0.1% by mass or more and 4.0% by mass or less. This provides even better flux removal and handling properties, and further reduces metal influence. The lower limit of the organic acid content is preferably 0.1% by mass or more, more preferably 0.3% by mass or more, and even more preferably 0.5% by mass or more. The upper limit of the organic acid content is preferably 4.0% by mass or less, more preferably 2.0% by mass or less, and even more preferably 1.0% by mass or less. The organic acid content is preferably 0.1% by mass or more and 4.0% by mass or less, more preferably 0.3% by mass or more and 2.0% by mass or less, and even more preferably 0.5% by mass or more and 1.0% by mass or less.

[0039] The content of the organic acid can be determined by potentiometric titration under the following conditions: (conditions) Apparatus: Automatic potentiometric titrator Model AT-710M (Kyoto Electronics Manufacturing Co., Ltd.) Measurement temperature: 20℃

[0040] <First compound> The cleaning composition includes a first compound, and the first compound is a hydrophilic nitrogen-containing organic compound and and / or a hydrophilic quaternary ammonium salt. The saponification action of the hydrophilic nitrogen-containing organic compound and the hydrophilic quaternary ammonium salt breaks the molecular structure of the resin that constitutes the flux, making the resin more soluble. This results in improved flux cleaning and handling, and further reduces the metal influence. The "first compound" may be synthesized from known starting materials by known methods. A commercially available product may also be used as the "first compound."

[0041] The hydrophilic nitrogen-containing organic compound is preferably a compound represented by formula (3) and having a water solubility of more than 50 mass% in an environment at 20°C, or a compound represented by formula (4) and having a water solubility of more than 50 mass% in an environment at 20°C. [ka] (In formula (3), R 8 represents a -CH2CH2OH group, a -CH2CH(OH)CH3 group, a -CH2CH2CH2NH2 group, or a chain hydrocarbon group having 1 to 4 carbon atoms; R 9 represents a hydrogen atom, a -CH2CH2OH group, a -CH2CH2CH2NH2 group, or a -CH2CH(OH)CH3 group, and R 10 represents a hydrogen atom, a -CH2CH2OH group, or a methyl group, and in formula (4), R 15 , R 16 , R 17 each independently represents a hydrogen atom or a methyl group.

[0042] The hydrophilic nitrogen-containing organic compound is preferably at least one selected from the group consisting of monoisopropanolamine (primary amine), 3,3'-diamino-N-methyldipropylamine (primary amine), 3,3'-diaminodipropylamine (primary amine), N-ethylethanolamine (secondary amine), diisopropanolamine (secondary amine), diethanolamine (secondary amine), Nn-butyldiethanolamine (tertiary amine), triethanolamine (tertiary amine), methyldiethanolamine (tertiary amine), and 2-methylimidazole. This compound swells and dissolves the flux residue, resulting in improved flux cleaning and handling properties and further reduced metal effects.

[0043] The hydrophilic quaternary ammonium salt is preferably a compound represented by formula (5) and having a water solubility of more than 50% by mass in a 20°C environment. [ka] (In formula (5), R 11 , R 12 , R 13 , R 14 each independently represents a hydrocarbon group having 1 to 2 carbon atoms.)

[0044] The hydrophilic quaternary ammonium salt is preferably tetraethylammonium hydroxide (TEAH), which swells and dissolves the flux residue, resulting in better flux cleaning and handling, and further reducing the influence of metals.

[0045] The content of the first compound is preferably 1% by mass or more and 20% by mass or less. A content of less than 1% by mass tends to result in reduced cleaning performance and increased susceptibility to metal contamination. A content of more than 20% by mass tends to increase the pH, potentially compromising worker safety. Therefore, by adjusting the content of the first compound within the above range, the flux cleaning performance and handling properties can be further improved, and the metal contamination can be further reduced. The lower limit of the content of the first compound is preferably 1% by mass or more, more preferably 2% by mass or more, and even more preferably 4% by mass or more. The upper limit of the content of the first compound is preferably 20% by mass or less, more preferably 15% by mass or less, and even more preferably 10% by mass or less. The content of the first compound is preferably 1% by mass or more and 20% by mass or less, more preferably 2% by mass or more and 15% by mass or less, and even more preferably 4% by mass or more and 10% by mass or less.

[0046] The content of the first compound can be determined by potentiometric titration under the same analytical conditions as those for the "organic acid content" described above.

[0047] The molar ratio of the first compound to the organic acid is 1 or more and 35 or less. This ensures that the amount of the first compound relative to the organic acid is sufficient, and the organic acid bonds with the first compound, preventing the organic acid from affecting metals in the object to be cleaned. The lower limit of the molar ratio is preferably 1 or more, more preferably 5 or more, and even more preferably 10 or more. The upper limit of the molar ratio is preferably 35 or less, more preferably 30 or less, and even more preferably 25 or less. The molar ratio is preferably 1 or more and 35 or less, more preferably 5 or more and 30 or less, and even more preferably 10 or more and 25 or less.

[0048] The molar ratio can be determined by calculation based on the "content of the first compound" determined by the above-mentioned method and the "content of the organic acid" determined by the above-mentioned method.

[0049] <Water> The cleaning composition contains water. The water is not particularly limited as long as it is water used as a raw material for various industrial products, tap water, or the like. The water may be distilled water or ion-exchanged water. In one aspect of the present embodiment, the water may have an electrical conductivity of 1 to 300 μS / cm or 1 to 100 μS / cm.

[0050] The water content is 20% by mass or more. This allows for reduced VOCs in the cleaning composition according to this embodiment. The lower limit of the water content is preferably 25% by mass or more, more preferably 40% by mass or more, and even more preferably 60% by mass or more. The upper limit of the water content is preferably 93% by mass or less, more preferably 80% by mass or less, and even more preferably 75% by mass or less. The water content is preferably 20% by mass or more and 93% by mass or less, more preferably 40% by mass or more and 80% by mass or less, and even more preferably 60% by mass or more and 75% by mass or less.

[0051] The water content can be determined by analysis using a Karl Fischer moisture meter. The conditions for analysis using the L. Fischer moisture meter are as follows: (Analysis conditions for Karl Fischer moisture meter) Device: Karl Fischer moisture meter MKS-500 (Kyoto Electronics Manufacturing Co., Ltd.) Measurement method: volumetric titration method Measurement temperature: 20℃

[0052] <Other ingredients> The cleaning composition according to this embodiment may further contain other components as long as the effects of the present invention are achieved. Examples of the other components include surfactants, rust inhibitors, pH adjusters, chelating agents, thickeners, wetting agents, evaporation retarders, antioxidants, UV absorbers, pigments, fragrances, and preservatives.

[0053] <Characteristics of the cleaning composition> <ph> The pH of the cleaning composition is preferably 8.0 or higher and 12.0 or lower. If the pH is lower than 8.0, the cleaning performance and metal contamination tend to be more likely to be observed in the cleaning composition, while if the pH is higher than 12.0, the safety of workers tends to be compromised. Therefore, by adjusting the pH of the cleaning composition within the above range, the flux cleaning performance and handleability can be further improved, and the metal contamination can be further reduced. The lower limit of the pH of the cleaning composition is preferably 8.0 or higher, more preferably 8.5 or higher, and even more preferably 9.0 or higher. The upper limit of the pH of the cleaning composition is preferably 12.0 or lower, more preferably 11.0 or lower, and even more preferably 10.0 or lower. The pH of the cleaning composition is preferably 8.0 or higher and 12.0 or lower, more preferably 8.5 or higher and 11.0 or lower, and even more preferably 9.0 or higher and 10.0 or lower.

[0054] The pH of the above-mentioned cleaning composition can be determined by the following method: That is, it can be determined by measuring at a measurement temperature of 25°C using a pH meter (Docu-PH, manufactured by Sartorius K.K.).

[0055] <Appearance> The cleaning composition is preferably uniform in appearance at 25°C and 50°C. This facilitates handling by facilitating storage, transportation, and use without special restrictions such as stirring. Here, "uniform in appearance" means that the cleaning composition does not visually separate into two or more layers when left standing. "When left standing" refers to the state in which the cleaning composition is maintained for four hours without being subjected to external forces other than gravity. More specifically, "when left standing" can be understood as the state in which the cleaning composition is maintained for four hours without being shaken, rotated, or stirred. In one aspect of this embodiment, the cleaning composition may be uniform in appearance or may be separated into two or more layers at temperatures other than 25°C and 50°C.

[0056] <Method for producing cleaning composition> The method for producing the cleaning composition according to this embodiment includes the steps of preparing the hydrophilic glycol ether compound, the organic acid, the first compound, and the water, and adding the hydrophilic glycol ether compound, the organic acid, and the first compound to the water. Any method may be used for the adding step. Examples of the adding step include adding the hydrophilic glycol ether compound, the organic acid, the first compound, and the water to a flask, and adding the hydrophilic glycol ether compound, the organic acid, the first compound, and the water on an industrial scale in a chemical plant or the like.

[0057] <How to clean the object> The method for cleaning an object to be cleaned according to this embodiment includes the steps of: A method for cleaning an object to be cleaned, comprising contacting the above-mentioned cleaning agent composition with the surface or gap of the object to be cleaned.

[0058] The method for contacting the cleaning composition with the surface or gap of the object to be cleaned is not particularly limited. Examples of such methods include immersion, coating, and spraying or showering, in the atmosphere, under reduced pressure, or under pressure, at room temperature or under heating. When the cleaning composition is contacted with the surface or gap of the object to be cleaned by immersion, stirring, ultrasonic treatment, bubbling, shaking, or the like may be performed as necessary. In this method, the object to be cleaned is preferably immersed in a cleaning tank containing the heated cleaning composition. The immersion time is preferably 1 minute to 60 minutes.

[0059] In one aspect of the present embodiment, when cleaning gaps in the object to be cleaned, it is preferable to immerse the object to be cleaned in the agitated cleaning composition. In this case, the load on the object to be cleaned tends to be reduced compared to shower cleaning and ultrasonic cleaning.

[0060] In the method for cleaning an object to be cleaned of this embodiment, the temperature of the detergent composition is preferably 20 to 70°C, more preferably 30 to 60°C, and even more preferably 40 to 50°C.

[0061] Thereafter, the object to be cleaned may be rinsed with water, a water-containing alcohol, or a water-containing glycol ether, and then dried to remove the cleaning composition from the object to be cleaned.

[0062] The cleaning composition according to this embodiment can be suitably used to remove flux residue. That is, the cleaning composition is preferably used for removing flux.

[0063] [Embodiment 2: Stock solution for cleaning composition] A concentrate for a cleaning composition according to one embodiment of the present disclosure will be described. The concentrate for a cleaning composition according to one embodiment of the present disclosure (hereinafter also referred to as "the present embodiment") comprises: A concentrate for a cleaning composition according to the first embodiment, the content of the hydrophilic glycol ether compound is 40% by mass or more and 98.8% by mass or less, the content of the organic acid is 0.1% by mass or more and 20% by mass or less, the content of the first compound is 1.1% by mass or more and 40% by mass or less, Dilute with water between 1.1 and 20 times before use.

[0064] The present disclosure makes it possible to provide a cleaning composition that is excellent in flux removal properties and handling, and that has reduced metal effects and volatile organic compounds (VOCs). The cleaning composition according to embodiment 1 can be obtained by diluting the above-mentioned stock solution for the cleaning composition at the above-mentioned ratio (volume ratio). [Example]

[0065] The present invention will be described in detail below with reference to examples, but the present invention is not limited to these examples.

[0066] <Preparation of cleaning composition> Cleaning compositions according to Samples 1 to 31, 33 to 54, 101 to 106, 110, and 111 were prepared as follows.

[0067] <Preparation process> As raw materials for producing the cleaning compositions of Samples 1 to 31, 33 to 54, 101 to 106, 110, and 111, the following hydrophilic glycol ether compound, the following organic acid, the following hydrophilic nitrogen-containing organic compound, the following quaternary ammonium salt, and the following water were prepared. (hydrophilic glycol ether compound) Propyl cellosolve: manufactured by Dow Chemical Japan Co., Ltd. 3-Methoxy-3-methylbutanol: Kuraray Co., Ltd. Dipropylene glycol monomethyl ether: Nippon Nyukazai Co., Ltd. Diethylene glycol ethyl methyl ether: Nippon Nyukazai Co., Ltd. Triethylene glycol monobutyl ether: Nippon Nyukazai Co., Ltd. (organic acid) Nitrilotrismethylenephosphonic acid (hydrophilic acid): manufactured by Cherest Co., Ltd. Citric acid (hydrophilic acid): Fujifilm Wako Pure Chemical Industries, Ltd. Malic acid (hydrophilic acid): Fujifilm Wako Pure Chemical Industries, Ltd. Glycolic acid (hydrophilic acid): Chemours Propionic acid (hydrophilic acid): Fujifilm Wako Pure Chemical Industries, Ltd. 2-Phosphonobutane-1,2,4-tricarboxylic acid: Chelest Co., Ltd. HEDP (hydrophilic acid): Manufactured by Kirest Co., Ltd. Glycine (hydrophilic acid): Fujifilm Wako Pure Chemical Industries, Ltd. p-Toluenesulfonic acid monohydrate (hydrophilic acid): Fujifilm Wako Pure Chemical Industries, Ltd. DTPA: manufactured by Cherest Co., Ltd. DHEG: Manufactured by Cherest Co., Ltd. EDTMP: Manufactured by Cherest Co., Ltd. Lauric acid: Fujifilm Wako Pure Chemical Industries, Ltd. Alendronic acid: manufactured by Tokyo Chemical Industry Co., Ltd. 1-Amino-2-naphthol-4-sulfonic acid: Fujifilm Wako Pure Chemical Industries, Ltd. (Hydrophilic nitrogen-containing organic compound) Monoisopropanolamine (primary amine): manufactured by Tokyo Chemical Industry Co., Ltd. 3,3'-Diamino-N-methyldipropylamine (primary amine): manufactured by Tokyo Chemical Industry Co., Ltd. N-ethylethanolamine (secondary amine): Nippon Nyukazai Co., Ltd. 2-Methylimidazole: Tokyo Chemical Industry Co., Ltd. Nn-butyldiethanolamine (tertiary amine): Nippon Nyukazai Co., Ltd. Triethanolamine (tertiary amine): Tokyo Chemical Industry Co., Ltd. (Quaternary ammonium salts) TEAH: Manufactured by Tokyo Chemical Industry Co., Ltd. (Hydrophobic nitrogen-containing organic compound) Dimethylstearylamine: Fujifilm Wako Pure Chemical Industries, Ltd. n-Dodecylamine: Fujifilm Wako Pure Chemical Industries, Ltd. Di-n-butylamine: Fujifilm Wako Pure Chemical Industries, Ltd. 1,2,3-Benzotriazole: Tokyo Chemical Industry Co., Ltd. (hydrophobic solvent) Propylene glycol monobutyl ether: Nippon Nyukazai Co., Ltd. Dipropylene glycol dimethyl ether: Nippon Nyukazai Co., Ltd. Dipropylene glycol monobutyl ether: Nippon Nyukazai Co., Ltd. Benzyl alcohol: manufactured by Tokyo Ohka Kogyo Co., Ltd. (water) Distilled water

[0068] <Adding step> Next, the above-mentioned raw materials other than the distilled water (water) were added to the distilled water (water) in the compositions shown in Tables 1 to 4. In the column of "Blending composition [mass %]" in Tables 1 to 4, the components marked with "-" indicate that the component was not contained in the sample.

[0069] [Table 1]

[0070] [Table 2]

[0071] [Table 3]

[0072] [Table 4]

[0073] By carrying out the above steps, cleaning compositions according to Samples 1 to 31, Samples 33 to 54, Samples 101 to 106, Sample 110, and Sample 111, each having the configuration shown in Tables 1 to 4, were prepared.

[0074] <Evaluation of cleaning agent composition characteristics> The "pH" of each sample of the detergent composition was measured, and the "appearance," "cleaning ability," "effect on metals," and "handling ease" were evaluated.

[0075] <ph> The pH of each sample cleaning composition was determined by the method described in Embodiment 1. The results are shown in the column "pH (when diluted 100 times with water)" in Tables 1 to 4.

[0076] <Appearance> The appearance of each sample of the cleaning composition was determined by the method described in the first embodiment. The appearance of each sample of the cleaning composition was evaluated both immediately after the sample was prepared and one week after the sample was prepared. The results are shown in the "Appearance" column of Tables 1 to 4.

[0077] <Cleaning ability> The cleaning properties of each sample of the cleaning composition were evaluated according to the following procedure.

[0078] (Preparing the test piece) Test pieces for evaluating cleaning properties were prepared in the following manner. First, a 20 mm x 40 mm copper plate (manufactured by Standard Test Piece Co., Ltd.) was prepared. "MB-T100" (manufactured by Senju Metal Industry Co., Ltd.) was printed as a paste. The copper plate was then left to stand on a hot plate at 250°C for 3 minutes to allow reflow. Test pieces were prepared using the above procedure.

[0079] (Cleaning performance evaluation test) The cleaning performance of each sample cleaning composition was evaluated using the following procedure. First, 400 ml of the cleaning composition was added to a 500 ml beaker and heated to 50°C. Next, the heated cleaning composition was stirred at 500 rpm to disperse the aqueous and organic phases. While maintaining the dispersed state, the test piece was immersed in the cleaning composition. After a predetermined time had elapsed since immersion, the test piece was removed, washed with water, and dried. The surface was observed using a stereomicroscope (magnification: 40x). The time required for complete removal of the flux residue was measured, and the cleaning performance was evaluated according to the following criteria. A cleaning performance rating of A or B indicates that the cleaning composition had high cleaning performance. The results are shown in the "Cleanability" column of Tables 1 to 4. However, the areas with burnt flux were excluded from the evaluation. (Evaluation criteria) A: The cleaning time is less than 10 minutes. B: The cleaning time is between 10 and 15 minutes. C: The cleaning time is 15 minutes or more but less than 20 minutes. D: The cleaning time is between 20 and 25 minutes. E: The cleaning time is 25 minutes or more.

[0080] The cleaning compositions of Samples 1 to 31 and Samples 33 to 54 correspond to Examples. On the other hand, the cleaning compositions of Samples 101 to 106, 110, and 111 correspond to Comparative Examples. It was confirmed that the cleaning compositions of Samples 1 to 31 and Samples 33 to 54 (Examples) have superior cleaning properties compared to Samples 101 to 104 and Sample 110 (Comparative Example).

[0081] <Metallic effects> The metal influence of each sample of the cleaning composition was evaluated by the following procedure. (Effect on iron (Fe)) Cold-rolled steel sheet SPCC (JIS G 3141:2017) was degreased by immersion in acetone for 20 minutes. The degreased SPCC was then immersed in each sample of the cleaning composition at 50°C for 30 minutes. After rinsing the SPCC with water, the SPCC was visually inspected for changes in appearance, and the impact on iron (Fe) was evaluated in accordance with the "Criteria for evaluating metal impact" below. (Effect on zinc (Zn)) A pure zinc plate was immersed in each sample of the cleaning composition for 30 minutes at 50°C. After rinsing with water, the change in appearance was observed under a stereomicroscope (magnification: 40x), and the effect on zinc (Zn) was evaluated in accordance with the "Criteria for evaluating the effect on metals" below. (Criteria for assessing the impact of metals) A: No change was observed for more than 60 minutes. B: Changes are observed between 45 and 60 minutes. C: Changes observed in 30 minutes or more but less than 45 minutes. D: Changes are observed in 15 minutes or more but less than 30 minutes. E: Changes observed in less than 15 minutes.

[0082] It was confirmed that the cleaning compositions (Examples) of Samples 1 to 31 and Samples 33 to 54 had reduced metal effects compared to Sample 101, Samples 104 to 106, and Sample 111 (Comparative Examples).

[0083] <Ease of handling> The uniform appearance of a cleaning composition means that the cleaning composition has excellent "handling properties." Here, excellent "handling properties" particularly means that no additional work, such as stirring, is required to prevent separation. It was found that the cleaning compositions (Examples) of Samples 1 to 31 and Samples 33 to 54 had a uniform appearance, while the cleaning composition (Comparative Example) of Sample 102 did not have a uniform appearance (in other words, separation occurred). Therefore, it was found that the cleaning compositions (Examples) of Samples 1 to 31 and Samples 33 to 54 had excellent "handling properties" compared to the cleaning composition (Comparative Example) of Sample 102.

[0084] <Reduction of VOCs> In the cleaning agent composition, a water content of 20% by mass or more means a high water content and also means that volatile organic compounds (VOCs) are reduced. In the cleaning agent compositions (Examples) according to Samples 1 to 31 and Samples 33 to 54, since the water content is 20% by mass or more, it was found that the VOCs were reduced.

[0085] From the above, it was found that the cleaning agent compositions (Examples) according to Samples 1 to 31 and Samples 33 to 54 are excellent in flux cleaning performance and handling properties, and also have reduced metal influence and volatile organic compounds (VOCs).

[0086] Although the embodiments and examples of the present invention have been described as above, it was initially planned to appropriately combine the configurations of the above-described embodiments and examples.

[0087] The embodiments and examples disclosed this time should be considered as illustrative in all respects and not restrictive. The scope of the present invention is shown not by the above-described embodiments and examples but by the claims, and it is intended that all modifications within the meaning and scope equivalent to the claims are included.< / ph> < / ph>

Claims

[Claim 1] A cleaning composition comprising a hydrophilic glycol ether compound, an organic acid, a first compound, and water, The first compound is a hydrophilic nitrogen-containing organic compound, The water content is 20% by mass or more, a molar ratio of the first compound to the organic acid is 1 or more and 35 or less; The hydrophilic glycol ether compound is a compound represented by formula (1) and having a water solubility of more than 50 mass% in an environment at 20°C, or a compound represented by formula (2) and having a water solubility of more than 50 mass% in an environment at 20°C, the hydrophilic glycol ether compound is at least one compound selected from the group consisting of ethylene glycol monomethyl ether, ethylene glycol monobutyl ether, propylene glycol monopropyl ether, ethylene glycol monoisobutyl ether, ethylene glycol mono-tert-butyl ether, propylene glycol monomethyl ether, dipropylene glycol monomethyl ether, tripropylene glycol monomethyl ether, diethylene glycol monomethyl ether, diethylene glycol monobutyl ether, diethylene glycol monoisobutyl ether, diethylene glycol monoisopropyl ether, ethylene glycol dimethyl ether, diethylene glycol dimethyl ether, diethylene glycol ethyl methyl ether, diethylene glycol diethyl ether, diethylene glycol isopropyl methyl ether, triethylene glycol monomethyl ether, triethylene glycol monobutyl ether, triethylene glycol dimethyl ether, diethylene glycol monohexyl ether, ethylene glycol monoisopropyl ether, and propyl cellosolve; The organic acid is an organic acid having one or more carboxy groups in one molecule, the hydrophilic nitrogen-containing organic compound is a compound represented by formula (4) and has a solubility in water of more than 50 mass % at 20°C. 【Chemistry 1】 (In formula (1), R 1 , R 2 and R 3 each independently represent a hydrogen atom, a methyl group or an ethyl group; R 4 represents a linear and / or cyclic hydrocarbon group having 1 to 11 carbon atoms, and —CH 2 — contained in the hydrocarbon group may be replaced with —O—; in formula (2), R 5 and R 6 each independently represent a hydrogen atom or a methoxy group, and either R 5 or R 6 is a methoxy group; and R 7 represents a hydrogen atom or a methyl group.) 【Chemistry 2】 (In formula (4), R 15 , R 16 , and R 17 each independently represent a hydrogen atom or a methyl group.)

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