Light exposure device

Abstract

The purpose of the present invention is to, when a substrate (or substrates) is (are) disposed on a substrate holder for holding the substrate(s), detect the position(s) of the substrate(s) disposed in various forms, in which, for example, the substrate(s) is disposed with the orientation thereof changed or a plurality of substrates are disposed.　This light exposure device is provided with: a holding part (201) which holds a plurality of substrates; a plurality of first sensors (210) which detect the respective positions of the plurality of substrates with respect to the holding part (201); a stage part (121) on which the plurality of substrates are disposed; and a plurality of second sensors (150) which detect the respective positions of the plurality of substrates with respect to the stage part (121). The number of the plurality of second sensors (150) is less than the number of the plurality of first sensors (210).

Description

exposure equipment

[0001] This relates to an exposure device.

[0002] In the photolithography process for manufacturing semiconductor elements, liquid crystal display elements, etc., a step-and-repeat projection exposure apparatus (a so-called stepper) or a step-and-scan projection exposure apparatus (a so-called scanning stepper (also called a scanner)) is mainly used.

[0003] In such an exposure apparatus, when placing substrates on a substrate holder that holds the substrates, the substrates may be placed with their orientations changed, or multiple substrates may be placed (see, for example, Patent Document 1). There is a need to detect the positions of substrates placed in such various ways.

[0004] Japanese Patent Application Laid-Open No. 2020-194007

[0005] According to one aspect of the disclosure, the exposure apparatus comprises a holding section that holds a plurality of substrates, a plurality of first sensors that detect the position of each of the plurality of substrates relative to the holding section, a stage section on which the plurality of substrates are placed, and a plurality of second sensors that detect the position of each of the plurality of substrates relative to the stage section, wherein the number of the plurality of second sensors is less than the number of the plurality of first sensors.

[0006] According to another disclosed aspect, the exposure apparatus comprises a holding section for holding a substrate, a plurality of first sensors for detecting the position of the substrate relative to the holding section, a stage section on which the substrate is placed, and a plurality of second sensors for detecting the position of the substrate relative to the stage section, wherein the number of the plurality of second sensors is less than the number of the plurality of first sensors.

[0007] The configurations of the embodiments described below may be modified as appropriate, and at least a portion of the configuration may be replaced with other components. Furthermore, components that are not particularly limited in terms of their placement may be placed in any position that can achieve their function, not limited to the placement disclosed in the embodiments.

[0008] FIG. 1(A) is a schematic diagram of an exposure apparatus according to the first embodiment, as viewed from above. FIG. 1(B) is a schematic diagram of the exposure apparatus as viewed from the side. FIGS. 2(A) to 2(C) are diagrams illustrating the arrangement of substrates on a holder in the first embodiment. FIG. 3 is a diagram illustrating the arrangement of line sensors in the first embodiment. FIG. 4(A) is a diagram illustrating a line sensor that detects the position of a substrate when placed on a holder as shown in FIG. 2(A). FIG. 4(B) is a diagram illustrating a line sensor that detects the position of a substrate when placed on a holder as shown in FIG. 2(B). FIG. 4(C) is a diagram illustrating a line sensor that detects the position of two substrates when placed on a holder as shown in FIG. 2(C). FIGS. 5(A) and 5(B) are diagrams illustrating problems that arise from detecting the position of an edge of a substrate on a holder that corresponds to a side that is not the reference side. FIGS. 6(A) to 6(D) are diagrams illustrating combinations of two substrates placed on a holder. FIG. 7 is a diagram illustrating the arrangement of potentiometers in the first embodiment. FIG. 8(A) is a diagram illustrating a potentiometer for detecting the position of a substrate when the substrate is placed on the substrate holder as shown in FIG. 2(A). FIG. 8(B) is a diagram illustrating a potentiometer for detecting the position of a substrate when the substrate is placed on the substrate holder as shown in FIG. 2(B). FIG. 8(C) is a diagram illustrating a potentiometer for detecting the position of each substrate when two substrates are placed on the substrate holder as shown in FIG. 2(C). FIGS. 9(A) and 9(B) are diagrams for explaining a method for detecting the rotation amount of a substrate in the θz direction in the first embodiment. FIG. 10(A) is a diagram illustrating the arrangement of line sensors in the second embodiment, and FIG. 10(B) is a diagram illustrating the line sensors for detecting the position of each substrate when two substrates are placed on the holder. FIG. 11(A) is a diagram illustrating the arrangement of potentiometers in the second embodiment, and FIG. 11(B) is a diagram illustrating the potentiometer for detecting the position of each substrate when two substrates are placed on the substrate holder. 12A and 12B are diagrams for explaining a method for detecting the amount of rotation of the substrate in the θz direction in the second embodiment.FIGS. 13(A) and 13(B) are diagrams showing the arrangement of line sensors and potentiometers according to Modification 1. FIGS. 14(A) to 14(F) are diagrams showing the arrangement of line sensors and potentiometers according to Modification 2. FIGS. 15(A) to 15(F) are diagrams showing another example of the arrangement of line sensors and potentiometers according to Modification 2. FIGS. 16(A) to 16(F) are diagrams showing the arrangement of line sensors and potentiometers according to Modification 3. FIGS. 17(A) to 17(F) are diagrams showing the arrangement of line sensors and potentiometers according to Modification 4. FIGS. 18(A) to 18(F) are diagrams showing another example of the arrangement of line sensors and potentiometers according to Modification 4. FIGS. 19(A) to 19(F) are diagrams showing the arrangement of line sensors and potentiometers according to Modification 5. FIGS. 20(A) to 20(F) are diagrams showing the arrangement of line sensors and potentiometers according to Modification 6. Figures 21(A) to 21(F) are diagrams showing the arrangement of line sensors and potentiometers according to Modification 7. Figures 22(A) to 22(F) are diagrams showing the arrangement of line sensors and potentiometers according to Modification 8. Figures 23(A) to 23(F) are diagrams showing the arrangement of line sensors and potentiometers in the third embodiment. Figures 24(A) and 24(B) are diagrams showing the arrangement of line sensors and potentiometers according to Modification 9.

[0009] First Embodiment FIG. 1A is a schematic diagram of an exposure apparatus EX according to a first embodiment, seen from above, and FIG. 1B is a schematic diagram of the exposure apparatus EX, seen from the side.

[0010] The exposure apparatus EX is used, for example, when manufacturing an organic EL display, to form a TP (Touch Panel) circuit or a CF (Color Filter) circuit on the upper surface of a substrate P. The substrate P is, for example, a glass plate on which TFTs (Thin Film Transistors) are formed by vapor deposition or the like and then sealed, but is not limited to this.

[0011] As shown in FIGS. 1A and 1B, the exposure apparatus EX includes a main body 100, a transport device 200, a first control device 300, and a second control device 400.

[0012] In the following description, the direction in which the mask M and substrate P, which will be described later, are scanned relative to the projection optical system 116 during exposure will be referred to as the X-axis direction, the direction perpendicular to the X-axis in the horizontal plane as the Y-axis direction, and the direction perpendicular to the X-axis and Y-axis as the Z-axis direction, and the directions of rotation (tilt) around the X-axis, Y-axis, and Z-axis will be referred to as the θx, θy, and θz directions, respectively.

[0013] <Transportation Device 200> The transport device 200 transfers the substrate P between an external device 1000 such as a coater / developer and the main body 100. The external device 1000 has, for example, a fork-shaped robot hand RH, and can transport the substrate P placed on the robot hand RH from the external device 1000 into the transport device 200.

[0014] The transport device 200 includes a holder 201, a transport mechanism 202, an alignment mechanism 203, a stand 204, and a first sensor 210. Note that Fig. 1A illustrates a portion of the first sensor 210 included in the transport device 200. In Fig. 1B, the first sensor 210 is not illustrated.

[0015] The holder 201 is placed on the base 204. The substrate P placed on the robot hand RH is transported from the external device 1000 into the transport device 200, and placed on the holder 201 placed on the base 204.

[0016] The holding part 201 is a carrier used when transporting and installing the substrate P inside the main body part 100, and the substrate P is placed on the upper surface of the holding part 201. The holding part 201 is, for example, a lattice-shaped member.

[0017] The holding section 201 is large enough to accommodate, for example, a G6 (1850 x 1500 mm) size substrate P without it protruding from the holding section 201. In other words, the holding section 201 is large enough to accommodate two G6 half-size substrates P, which are formed by dividing a G6 (1850 x 1500 mm) size substrate P in half. The size of the substrate P placed on the holding section 201 is not limited to the G6 size, and may be larger or smaller than the G6 size. When the size of the substrate P placed on the holding section 201 is larger than the G6 size, the size of the holding section 201 is designed so that the substrate P can be placed without protruding from the holding section 201. The number of substrates P placed on the holding section 201 is not limited to one or two, but may be three or more.

[0018] The first sensor 210 detects the position of the substrate P relative to the holding part 201. Specifically, the first sensor 210 detects the position of the edge face of the substrate P placed on the holding part 201, thereby detecting the position of the substrate P relative to the holding part 201. The position of the substrate P includes the position of the substrate P in the X-axis direction (the amount of shift of the substrate P in the X-axis direction), the position of the substrate P in the Y-axis direction (the amount of shift of the substrate P in the Y-axis direction), and the amount of rotation of the substrate P in the θz direction.

[0019] The first sensor 210 is provided, for example, in the holding unit 201. The first sensor 210 may also be provided in the stand unit 204 on which the holding unit 201 is placed. In this embodiment, the first sensor 210 is a non-contact sensor, for example, a line sensor. Hereinafter, the first sensor 210 will be described as a line sensor, and the first sensor 210 will be referred to as a line sensor LS. By using a non-contact line sensor LS, the position of the substrate P on the holding unit 201 can be detected without coming into contact with the substrate P, and therefore, it is possible to prevent the position of the substrate P from shifting on the holding unit 201 when the position of the substrate P is detected.

[0020] When the line sensor LS is provided in the holding part 201, the substrate P is directly aligned with respect to the holding part 201. In this case, the line sensor LS is transported together with the holding part 201 into the main body part 100 by the transport mechanism 202. For this reason, it is preferable to use, for example, a wireless line sensor as the line sensor LS.

[0021] When the line sensor LS is provided on the stand 204, the substrate P is aligned with respect to the stand 204. Here, the holder 201 is held at a predetermined position on the stand 204. Therefore, even when the line sensor LS is provided on the stand 204, the substrate P is aligned indirectly with respect to the holder 201.

[0022] Next, the arrangement of the line sensor LS in the first embodiment will be described. First, the arrangement of the substrate on the holder 201 in this embodiment will be described with reference to Figures 2(A) to 2(C). As described above, the holder 201 is transported into the main body 100, and the substrate transported by the holder 201 is placed on the substrate holder 121 of the main body 100, which will be described later. Therefore, Figures 2(A) to 2(C) also show the arrangement of the substrate on the substrate holder 121.

[0023] In this embodiment, as shown in Figure 2(A), one substrate P is placed on the holding portion 201, as shown in Figure 2(B), the substrate P in the state shown in Figure 2(A) is rotated 90 degrees clockwise and placed on the holding portion 201, and further, substrates P1 and P2, which are half the size of substrate P, may be placed on the holding portion 201.

[0024] In this embodiment, a line sensor LS is arranged in the transport device 200 so that the position of each substrate relative to the holder 201 can be detected in any of the arrangements shown in Figures 2(A) to 2(C).

[0025] Fig. 3 shows the arrangement of line sensors LS in the first embodiment. As shown in Fig. 3, eleven line sensors LS-1 to LS-11 are provided in the first embodiment. Here, we will explain how the position of the substrate arranged as shown in Figs. 2(A) to 2(C) is detected using the eleven line sensors LS-1 to LS-11.

[0026] Figure 4(A) is a diagram illustrating the line sensor LS that detects the position of substrate P when it is placed on holding portion 201 as shown in Figure 2(A). In Figure 4(A), the line sensor LS that detects the position of substrate P is shown filled in black. This is the same in the subsequent figures. The position of one substrate P placed as shown in Figure 2(A) can be detected by line sensors LS-1 and LS-2 that are provided relative to reference edge S1 of substrate P, and line sensor LS-3 that is provided relative to reference edge S4 of substrate P. In addition to line sensors LS-1, LS-2, and LS-3, line sensor LS-9 that is provided relative to reference edge S4 of substrate P may also be used to detect the position of substrate P.

[0027] The reference side is a side of the sides S1 to S4 of the rectangular substrate P that has a smaller straightness (for example, 20 to 40 μm) than the straightness (for example, 500 μm) of the non-reference sides. In other words, the flatness of the end face corresponding to the reference side of the substrate P is higher than the flatness of the end face corresponding to the non-reference side. In Figure 4(A), the reference side is shown with a thick line, and the symbol indicating the reference side is underlined. This is the same in the subsequent figures.

[0028] Line sensors LS-1 and LS-2 can detect the position in the Y axis direction of the edge surface corresponding to the reference side S1 of substrate P, i.e., the amount of shift in the Y axis direction of substrate P. Here, when two line sensors LS-1 and LS-2 are used to detect the position of the edge surface corresponding to the reference side S1 of substrate P, the average value of the positions detected by line sensors LS-1 and LS-2 can be taken as the position of the edge surface corresponding to the reference side S1. Note that, for example, the position detected by one of line sensors LS-1 and LS-2 may also be taken as the position of the edge surface corresponding to the reference side S1. The same applies to other cases.

[0029] Furthermore, line sensor LS-3 can detect the position in the X-axis direction of the end face corresponding to reference side S4 of substrate P, i.e., the amount of shift in the X-axis direction of substrate P. Furthermore, line sensors LS-1 and LS-2 can detect the amount of rotation around the Z-axis (θz direction) of substrate P. Note that, for example, the amount of rotation around the Z-axis (θz direction) of substrate P may be detected using line sensors LS-10 and LS-11 provided with respect to reference side S1, but the longer the distance between the line sensors LS that detect the amount of rotation, the more accurately the amount of rotation can be detected, so it is preferable to detect the amount of rotation around the Z-axis (θz direction) of substrate P using line sensors LS-1 and LS-2.

[0030] Figure 4(B) is a diagram illustrating the line sensor LS that detects the position of substrate P when substrate P in the state of Figure 2(A) is rotated 90 degrees clockwise and positioned as shown in Figure 2(B). The position of substrate P positioned as shown in Figure 2(B) can be detected by line sensors LS-4 and LS-5 provided relative to reference edge S1 of substrate P, and line sensor LS-6 provided relative to reference edge S4 of substrate P.

[0031] Specifically, line sensors LS-4 and LS-5 can detect the position in the X axis direction of the end face corresponding to reference side S1 of substrate P, i.e., the amount of shift in the X axis direction of substrate P. Furthermore, line sensor LS-6 can detect the position in the Y axis direction of the end face corresponding to reference side S4 of substrate P, i.e., the amount of shift in the Y axis direction of substrate P. Furthermore, line sensors LS-4 and LS-5 can detect the amount of rotation of substrate P in the θz direction.

[0032] FIG. 4C is a diagram illustrating the line sensor LS that detects the positions of the two substrates P1 and P2 when they are placed on the holder 201 as shown in FIG. 2C.

[0033] The position of substrate P1 can be detected by line sensors LS-1 and LS-10 provided for reference side S11 of substrate P1, and line sensors LS-7 and LS-8 provided for side S12.

[0034] Specifically, line sensors LS-1 and LS-10 can detect the position in the Y axis direction of the end face corresponding to the reference side S11 of substrate P1, i.e., the amount of shift in the Y axis direction of substrate P1. Furthermore, line sensors LS-7 and LS-8 can detect the position in the X axis direction of the end face corresponding to side S12, which is not the reference side of substrate P1, i.e., the amount of shift in the X axis direction of substrate P1.

[0035] Furthermore, the amount of rotation of substrate P1 in the θz direction can be detected by line sensors LS-1 and LS-10. Here, the reason why the amount of rotation of substrate P1 in the θz direction is detected by line sensors LS-1 and LS-10 provided for reference edge S11, rather than by line sensors LS-7 and LS-8 provided for S12, which is not the reference edge, will be explained.

[0036] Figures 5(A) and 5(B) are diagrams illustrating problems that arise from detecting the position of the end face corresponding to the side S12, which is not the reference side, of substrate P on holding unit 201. Figure 5(A) shows line sensors LS-7 and LS-8 that are provided for the side S12, which is not the reference side, of substrate P1 on holding unit 201. Figure 5(B) shows substrate P1 when substrate P1 shown in Figure 5(A) is positioned by alignment mechanism 203 based on the amount of rotation in the θz direction detected by line sensors LS-7 and LS-8, and placed on substrate holder 121. Note that in Figures 5(A) and 5(B), the pattern PTN that was previously formed on substrate P1 is shown by hatching.

[0037] The straightness of the non-reference edge S12 is greater than the straightness of the reference edge S11. In other words, the edge surface corresponding to edge S12 is less flat than the edge surface corresponding to reference edge S11. Therefore, if the amount of rotation of substrate P1 in the θz direction is calculated based on the position detection results of the edge surface corresponding to edge S12 by line sensors LS-7 and LS-8, and substrate P1 is positioned based on this amount of rotation, as shown in FIG. 5(A), even though the actual amount of rotation of substrate P1 in the θz direction is almost zero, as shown in FIG. 5(B), there is a risk that substrate P1 will be placed on substrate holder 121 (described later) in a state rotated in the θz direction, as shown in FIG. 5(B). Furthermore, in this case, when the position of the edge surface corresponding to edge S12 is detected by potentiometers PM-7 and PM-8 (described later), the amount of rotation of substrate P1 in the θz direction will be detected as zero, and therefore substrate P1 will be positioned while still rotated in the θz direction. In this way, if the substrate P1 is positioned based on the position detection results of the end surface corresponding to the side S12 that is not the reference side, the positioning accuracy of the substrate P1 will deteriorate.

[0038] Therefore, the amount of rotation of substrate P1 in the θz direction is calculated from the detection results of line sensors LS-1 and LS-10 provided relative to reference side S11.

[0039] For substrate P2, the position of substrate P2 can be detected by line sensors LS-2 and LS-11 provided for reference side S21, and line sensors LS-3 and LS-9 provided for side S24.

[0040] Specifically, line sensors LS-2 and LS-11 can detect the position in the Y axis direction of the end face of substrate P2 corresponding to reference side S21, i.e., the amount of shift in the Y axis direction of substrate P2, and line sensors LS-3 and LS-9 can detect the position in the X axis direction of the end face of substrate P2 corresponding to reference side S24, i.e., the amount of shift in the X axis direction of substrate P2. In addition, line sensors LS-2 and LS-11 can detect the amount of rotation of substrate P2 in the θz direction.

[0041] Note that because side S24 of substrate P2 shown in FIG. 4C is the reference side, it is conceivable that line sensors LS-3 and LS-9 would detect the amount of rotation of substrate P2 in the θz direction, but the side detected by line sensors LS-3 and LS-9 is not always the reference side. That is, there are four possible combinations of two substrates placed on holder 201, as shown in FIGS. 6A to 6D. However, as shown in FIGS. 6B and 6D, there are cases where the side detected by line sensors LS-3 and LS-9 is not the reference side. Therefore, for substrate P2, the amount of rotation of substrate P2 in the θz direction is detected by line sensors LS-2 and LS-11, which are provided relative to reference side S21. Note that line sensors LS-4, LS-5, and LS-6 are omitted from illustration in FIGS. 6A to 6D.

[0042] 1(B), the alignment mechanism 203 positions the substrate P or the substrates P1 and P2 relative to the holding part 201, based on the position of the substrate P or the substrates P1 and P2 detected by the line sensor LS. The substrate P or the substrates P1 and P2 is transported into the main body part 100 while placed on the holding part 201. If the position of the substrate P or the substrates P1 and P2 is misaligned with respect to the holding part 201 at this time, the alignment process of the substrate P or the substrates P1 and P2 in the main body part 100 will not be performed correctly, resulting in a decrease in productivity due to the exposure process being stopped or the substrate P or the substrates P1 and P2 having to be re-carried in. To prevent this, the alignment mechanism 203 has the role of aligning the substrate P or the substrates P1 and P2 relative to the holding part 201.

[0043] As described above, multiple substrates may be placed on the holder 201, and therefore the alignment mechanism 203 has at least the function of being able to individually adjust the positions of the multiple substrates placed on the holder 201. As the alignment mechanism 203, for example, the configuration described in Japanese Patent Application No. 2022-058723 can be adopted, but other configurations may also be adopted.

[0044] The transport mechanism 202 transports the holding part 201 holding the positioned substrate P or substrates P1 and P2 to the main body part 100. Alternatively, the holding part 201 arranged inside the main body part 100 is removed from the main body part 100. The transport mechanism 202, for example, grips the holding part 201 from both sides in the Y-axis direction. In this state, the transport mechanism 202 moves along the X-axis direction by a movement mechanism (not shown). In this way, the holding part 201 is transported by the transport mechanism 202.

[0045] The detection of the position of substrate P or substrates P1 and P2 by the line sensor LS described above, the positioning by the alignment mechanism 203, and the transport of the holder 201 by the transport mechanism 202 are controlled by a second control device 400.

[0046] <Main Body 100> Next, we will explain the configuration of the main body 100. As shown in Fig. 1(B) , the main body 100 includes an illumination system 112, a mask stage 114 that holds a mask M on which a circuit pattern or the like is formed, a projection optical system 116, an optical surface plate 118, and a substrate stage device 120 that holds a substrate P or substrates P1 and P2.

[0047] The illumination system 112 has a configuration similar to that of the illumination system disclosed in, for example, U.S. Patent No. 5,729,331, etc. The illumination system 112 irradiates the mask M with light emitted from a light source (e.g., a mercury lamp) (not shown) via a reflecting mirror, a dichroic mirror, a shutter, a wavelength selection filter, various lenses, etc. (not shown), as exposure illumination light (illumination light) IL.

[0048] The mask stage 114 holds a light-transmitting mask M. The mask stage 114 drives the mask M by a predetermined stroke in the X-axis direction (scanning direction) relative to the illumination system 112 (illumination light IL) via a drive system (not shown) including, for example, a linear motor, and also drives the mask M slightly in the Y-axis direction and the θz direction. Position information of the mask M in the horizontal plane is obtained by a mask stage position measurement system (not shown) including, for example, a laser interferometer or an encoder.

[0049] The projection optical system 116 is disposed below the mask stage 114. The projection optical system 116 is a so-called multi-lens projection optical system having a configuration similar to that of the projection optical system disclosed in, for example, U.S. Pat. No. 6,552,775, and includes, for example, a plurality of optical systems that form an erect, normal image in a double-telecentric, equal-magnification system.

[0050] In the main body 100, when an illumination area on the mask M is illuminated by illumination light IL from the illumination system 112, the illumination light that has passed through the mask M forms a projected image (partial erect image) of the circuit pattern of the mask M within that illumination area in an illumination light irradiation area (exposure area) that is conjugate to the illumination area on the substrate P or the substrates P1 and P2 via the projection optical system 116. Then, as the mask M moves relative to the illumination area (illumination light IL) in the scanning direction and the substrate P or the substrates P1 and P2 moves relative to the exposure area (illumination light IL) in the scanning direction, scanning exposure of one shot area on the substrate P or the substrates P1 and P2 is performed, and the pattern formed on the mask M is transferred to that shot area.

[0051] The optical surface plate 118 supports the mask stage 114 and the projection optical system 116 .

[0052] The substrate stage device 120 is used to position the substrate P or the substrates P1 and P2 with high precision relative to the projection optical system 116 (illumination light IL), and drives the substrate P or the substrates P1 and P2 at a predetermined stroke along the horizontal plane (X-axis direction and Y-axis direction), and also finely drives the substrate P or the substrates P1 and P2 in six degrees of freedom. There are no particular limitations on the configuration of the substrate stage device 120, but it is preferable to use a stage device with a so-called coarse / fine movement configuration that includes a gantry-type two-dimensional coarse movement stage and a fine movement stage that is finely driven relative to the two-dimensional coarse movement stage, as disclosed in, for example, Japanese Patent Laid-Open No. 2004-14915 or U.S. Patent Application Publication No. 2012 / 0057140.

[0053] Substrate stage device 120 is equipped with a substrate holder 121 that holds substrate P or substrates P1 and P2. An X-movable mirror (bar mirror) 124X having a reflective surface orthogonal to the X-axis is fixed to the -X-side side of substrate holder 121, and a Y-movable mirror 124Y having a reflective surface orthogonal to the Y-axis is fixed to the +Y-side side.

[0054] First and second laser interferometers (not shown) are attached to the optical surface plate 118 to measure the X-axis and Y-axis positions, respectively, of the substrate holder 121 holding the substrate P or the substrates P1 and P2.

[0055] The first laser interferometer irradiates a measurement beam onto X movable mirror 124X and an X fixed mirror (not shown) that is fixed near projection optical system 116. The first laser interferometer measures position information of substrate holder 121 in the X axis direction using the position of the X fixed mirror as a reference.

[0056] Furthermore, the second laser interferometer irradiates a measurement beam onto Y movable mirror 124Y and a Y fixed mirror (not shown) fixed near projection optical system 116. The second laser interferometer measures position information of substrate holder 121 in the Y axis direction using the position of the Y fixed mirror as a reference.

[0057] The substrate holder 121 includes an accommodation portion 121a. The accommodation portion 121a is a groove provided in the substrate holder 121, and accommodates the holding portion 201. As a result, when the holding portion 201 holding the substrate P or the substrates P1 and P2 is accommodated in the accommodation portion 121a, the substrate P or the substrates P1 and P2 are disposed on the upper surface of the substrate holder 121. The upper surface of the substrate holder 121 is approximately parallel to the XY plane, and the direction perpendicular to the upper surface of the substrate holder 121 is approximately parallel to the Z-axis direction. Note that the direction perpendicular to the upper surface of the substrate holder 121 being approximately parallel to the Z-axis direction means that the upper surface of the substrate holder 121 is allowed to tilt with respect to the XY plane when the substrate holder 121 is slightly driven in the θx direction and the θy direction.

[0058] As described in Figures 2(A) to 2(C), in this embodiment, when one substrate P is placed on the substrate holder 121, when the substrate P shown in Figure 2(A) is rotated 90 degrees and placed on the substrate holder 121, substrates P1 and P2, which are half the size of the substrate P, may be placed on the substrate holder 121.

[0059] In this embodiment, in any of the arrangements shown in Figures 2(A) to 2(C), a second sensor 150 is disposed on the substrate holder 121 so that the position of each substrate relative to the substrate holder 121 can be detected. Note that Figure 1(A) illustrates only a portion of the second sensor 150. Also, Figure 1(B) omits the illustration of the second sensor 150.

[0060] In this embodiment, the second sensor 150 is a contact sensor, such as a potentiometer. In the following description, the second sensor 150 is assumed to be a potentiometer, and will be referred to as a potentiometer PM.

[0061] Fig. 7 shows the arrangement of the potentiometer PM in the first embodiment. Note that the housing portion 121a is not shown in Fig. 7. This also applies to the subsequent figures.

[0062] 7, in this embodiment, nine potentiometers PM-1 to PM-9 are provided for the substrate holder 121. In this way, the number of potentiometers PM provided for the substrate holder 121 is fewer than the number of line sensors LS provided for the holding unit 201. The potentiometers PM-1 to PM-9 are arranged such that the positions of the potentiometers PM-1 to PM-9 correspond to the positions of the line sensors LS-1 to LS-9, respectively. More specifically, when the potentiometers PM-1 to PM-9 and the line sensors LS-1 to LS-9 are virtually arranged on a predetermined coordinate system, the positions of the potentiometers PM-1 to PM-9 and the line sensors LS-1 to LS-9 are aligned, respectively.

[0063] Here, a description will be given of how the position of the substrate arranged as shown in FIGS. 2(A) to 2(C) is detected using nine potentiometers PM.

[0064] Figure 8(A) is a diagram illustrating the potentiometer PM that detects the position of substrate P when substrate P is placed on substrate holder 121 as shown in Figure 2(A). In Figure 8(A), the potentiometer PM that detects the position of substrate P is indicated by a black circle. This is the same in the subsequent figures. The position of one substrate P placed as shown in Figure 2(A) can be detected by potentiometers PM-1 and PM-2 provided relative to the reference edge S1 of substrate P, and potentiometer PM-3 provided relative to the reference edge S4.

[0065] Specifically, potentiometers PM-1 and PM-2 can detect the position in the Y axis direction of the end face corresponding to reference side S1 of substrate P (the amount of shift in the Y axis direction of substrate P). Furthermore, potentiometer PM-3 can detect the position in the X axis direction of the end face corresponding to reference side S4 of substrate P (the amount of shift in the X axis direction of substrate P). Furthermore, potentiometers PM-1 and PM-2 can detect the amount of rotation of substrate P in the θz direction.

[0066] Figure 8(B) is a diagram illustrating the potentiometer PM that detects the position of substrate P when one substrate P in the state of Figure 8(A) is rotated 90 degrees clockwise and placed. The position of substrate P placed as shown in Figure 8(B) can be detected by potentiometers PM-4 and PM-5 provided with respect to reference edge S1, and potentiometer PM-6 provided with respect to reference edge S4.

[0067] Specifically, potentiometers PM-4 and PM-5 can detect the position in the X axis direction of the end face corresponding to reference side S1 of substrate P (the amount of shift in the X axis direction of substrate P). Furthermore, potentiometer PM-6 can detect the position in the Y axis direction of the end face corresponding to reference side S4 of substrate P (the amount of shift in the Y axis direction of substrate P). Furthermore, potentiometers PM-4 and PM-5 can detect the amount of rotation of substrate P in the θz direction.

[0068] 8(C) is a diagram illustrating the potentiometers PM that detect the positions of substrates P1 and P2 when the two substrates P1 and P2 are placed on the substrate holder 121, as shown in FIG. 2(C). The positions of substrates P1 and P2 on the substrate holder 121 are detected by potentiometers PM-1, PM-7, PM-8, PM-2, PM-3, and PM-9. Here, the positions of substrates P1 and P2 on the holding unit 201 are detected by line sensors LS-1, LS-10, LS-7, LS-8, LS-2, LS-11, LS-3, and LS-9. In this way, the number of potentiometers PM that detect the positions of substrates P1 and P2 on the substrate holder 121 is smaller than the number of line sensors LS that detect the positions of substrates P1 and P2 on the holding unit 201.

[0069] The positions of the substrate P1 in the X-axis and Y-axis directions can be detected by a potentiometer PM-1 provided for the reference side S11, and potentiometers PM-7 and PM-8 provided for the side S12.

[0070] Specifically, potentiometer PM-1 can detect the position in the Y axis direction of the end face corresponding to reference side S11 of substrate P1 (the amount of shift in the Y axis direction of substrate P1). Potentiometers PM-7 and PM-8 can detect the position in the X axis direction of the end face corresponding to side S12, which is not the reference side of substrate P1 (the amount of shift in the X axis direction of substrate P1).

[0071] In this embodiment, the amount of rotation of substrate P1 in the θz direction is calculated as follows. As explained with reference to Figures 5(A) and 5(B), if the amount of rotation of substrate P1 in the θz direction is detected using a sensor provided on an edge that is not the reference edge, it is not possible to detect an accurate amount of rotation of substrate P1 in the θz direction. In other words, if potentiometers PM-7 and PM-8 provided on edge S12, which is not the reference edge, are used, it is not possible to accurately detect the amount of rotation of substrate P1 in the θz direction.

[0072] Therefore, it is conceivable to provide two potentiometers PM with respect to the reference side S11, and each detect the amount of rotation of the substrate P1 in the θz direction. That is, the potentiometer PM-21 is placed at the position shown by the dotted line in Figure 8(C). In this way, the amount of rotation of the substrate P1 in the θz direction can be detected using the potentiometers PM-1 and PM-21 provided with respect to the reference side S11.

[0073] However, since substrate P may be placed on substrate holder 121 in a state rotated by 90 degrees (the state shown in FIG. 8(B)), potentiometer PM-21 cannot be provided because substrate P positioned as shown in FIG. 8(B) would interfere with potentiometer PM-21.

[0074] Therefore, in this embodiment, the position of substrate P1 detected by line sensor LS in transport device 200 is used to detect the amount of rotation of substrate P1 on substrate holder 121 in the θz direction.

[0075] 9A and 9B are diagrams for explaining a method for detecting the amount of rotation in the θz direction of the substrate P1 on the substrate holder 121 in the first embodiment.

[0076] 9(A), the amount of rotation in the θz direction of substrate P1 detected by line sensors LS-7 and LS-8 provided for side S12, i.e., the amount of rotation in the θz direction of substrate P1 based on detection positions DP7 and DP8 of the edge surface corresponding to side S12, is defined as θcut. Furthermore, the amount of rotation in the θz direction of substrate P detected by line sensors LS-1 and LS-10 provided for the reference edge S11, i.e., the amount of rotation in the θz direction of substrate P1 based on detection positions DP1 and DP10 of the edge surface corresponding to the reference edge S11, is defined as θbase. Furthermore, in FIG. 9(B), the amount of rotation in the θz direction of substrate P1 detected by potentiometers PM-7 and PM-8 provided for side S12, i.e., the amount of rotation in the θz direction of substrate P1 based on detection positions DP17 and DP18 of the edge surface corresponding to side S12, is defined as φcut. Here, since only one potentiometer PM-1 is provided for the reference edge S11 in the substrate holder 121, it is not possible to detect the amount of rotation φbase of the substrate P1 based on the detected position of the edge surface corresponding to the reference edge S11. This is because, in order to detect the amount of rotation φbase, it is necessary to detect the positions of at least two locations on the edge surface corresponding to the reference edge S11.

[0077] Therefore, in the first embodiment, φbase is calculated as follows. When there is no measurement error in the line sensor LS and the potentiometer PM, the following holds: θcut - θbase = φcut - φbase (1) From the above equation (1), φbase = φcut - (θcut - θbase) = (φcut - θcut) + θbase Here, the line sensors LS-7, LS-8, and LS-1 and the potentiometers PM-7, PM-8, and PM-1 are arranged in corresponding positions (the same position), so (φcut - θcut) eliminates the influence of the straightness of the side S12, which is not the reference side. If Δθ = φcut - θcut, then φbase = θbase + Δθ. Δθ is the placement error.

[0078] In this way, the amount of rotation in the θz direction of substrate P1 on substrate holder 121 can be calculated based on the position detection results of substrate P1 by the four line sensors LS in transport device 200 and the position detection results of substrate P1 by the three potentiometers PM in substrate holder 121. In other words, even if there is only one potentiometer PM provided with respect to reference edge S11, the amount of rotation in the θz direction of substrate P1 can be calculated.

[0079] The same is true for substrate P2. That is, if potentiometer PM-22 could be positioned with respect to reference edge S21 of substrate P2 as shown in Figure 8(C), the amount of rotation of substrate P2 in the θz direction could be detected by potentiometers PM-2 and PM-22, but potentiometer PM-22 cannot be positioned because it would interfere with substrate P positioned as shown in Figure 8(B). Therefore, for substrate P2 as well, as with substrate P1, the amount of rotation in the θz direction of substrate P2 on substrate holder 121 is calculated based on the position detection results of substrate P2 by the four line sensors LS-3, LS-9, LS-2, and LS-11 in transport device 200 and the position detection results of substrate P2 by the three potentiometers PM-3, PM-9, and PM-2 in substrate holder 121. As shown in Figure 8(C), if the side S24 of substrate P2 detected by potentiometers PM-3 and PM-9 is the reference side, it is possible to use potentiometers PM-3 and PM-9 to detect the amount of rotation in the θz direction of substrate P2 on substrate holder 121. However, as shown in Figures 6(B) and 6(D), the side detected by potentiometers PM-3 and PM-9 is not necessarily the reference side. Therefore, the amount of rotation in the θz direction of substrate P2 on substrate holder 121 is calculated using the same method as for substrate P1.

[0080] The calculation of the amount of rotation of substrates P1 and P2 in the θz direction based on the position detection results of substrates P1 and P2 on holding unit 201 by line sensor LS and the position detection results of substrates P1 and P2 on substrate holder 121 by potentiometer PM is performed by first control device 300. In this case, first control device 300 only needs to acquire the position detection results of substrates P1 and P2 by line sensor LS from second control device 400. The first control device 300 and second control device 400 may be a single control device. The first control device 300 is an example of a first calculation unit, a second calculation unit, and a third calculation unit.

[0081] The substrate stage device 120 positions the substrate P or the substrates P1 and P2 relative to the projection optical system 116 (illumination light IL) based on the position detection results of the substrate P or the substrates P1 and P2.

[0082] Thereafter, an optical device (for example, a microscope) provided in the main body 100 detects the positions of the alignment marks formed on the substrate P or the substrates P1 and P2. The substrate stage device 120 drives the substrate holder 121 based on the detection results of the alignment marks so that the pattern formed on the mask M is transferred to predetermined areas of the substrate P or the substrates P1 and P2.

[0083] The first control device 300 not only detects the position of the substrate P or the substrates P1 and P2 on the substrate holder 121 as described above, but also controls the driving of the substrate holder 121 by the substrate stage device 120, controls related to the scanning exposure process, and the like.

[0084] As explained in detail above, according to the first embodiment, the exposure apparatus EX comprises a holding part 201 that holds a plurality of substrates P1 and P2, a plurality of line sensors LS that detect the position of each of the plurality of substrates P1 and P2 relative to the holding part 201, a substrate holder 121 on which the plurality of substrates P1 and P2 are arranged, and a plurality of potentiometers PM that detect the position of each of the plurality of substrates P1 and P2 relative to the substrate holder 121, the number of the plurality of potentiometers PM being less than the plurality of line sensors LS. This makes it possible to detect the position of the substrate P or substrates P1 and P2 arranged on the substrate holder 121 in a variety of ways.

[0085] Furthermore, according to the first embodiment, the position of each of the multiple potentiometers PM corresponds to the position of one of the multiple line sensors LS. This makes it possible to eliminate the influence of the straightness of the sides S12 and S24, which are not the reference sides, when calculating the amount of rotation in the θz direction of each of the two substrates P1 and P2 arranged on the substrate holder 121.

[0086] Furthermore, according to the first embodiment, the exposure apparatus EX is equipped with a first control device 300 that calculates the amount of rotation φbase of each of the multiple substrates P1 and P2 on the substrate holder 121 around the direction perpendicular to the top surface of the substrate holder 121 (the Z-axis direction) based on the detection results of the positions of each of the multiple substrates P1 and P2 on the holding unit 201 relative to the holding unit 201 by the multiple line sensors LS, and the detection results of the positions of the multiple substrates P1 and P2 on the substrate holder 121 relative to the substrate holder 121 by the multiple potentiometers PM. This makes it possible to calculate the amount of rotation φbase of each of the substrates P1 and P2 placed on the substrate holder 121, even if the number of potentiometers PM provided for the substrate holder 121 is smaller than the number of line sensors LS provided for the holding unit 201.

[0087] Furthermore, according to the first embodiment, the exposure apparatus EX is equipped with an alignment mechanism 203 that positions each of the multiple substrates P1 and P2 with respect to the holding unit 201, based on detection results of the positions of each of the multiple substrates P1 and P2 on the holding unit 201 relative to the holding unit 201 by the multiple line sensors LS, a projection optical system 116 that projects a pattern onto each of the multiple substrates P1 and P2, and a substrate stage device 120 that positions each of the multiple substrates P1 and P2 with respect to the projection optical system 116, based on detection results of the positions of each of the multiple substrates P1 and P2 on the substrate holder 121 relative to the substrate holder 121 by the multiple potentiometers PM and the calculated amount of rotation of each of the multiple substrates P1 and P2. This makes it possible to position the substrates P1 and P2 placed on the substrate holder 121 with respect to the projection optical system 116.

[0088] Furthermore, according to the first embodiment, the multiple line sensors LS include four line sensors LS-1, LS-10, LS-7, and LS-8 that detect the position of substrate P1 on holding portion 201 relative to holding portion 201, and four line sensors LS-2, LS-11, LS-3, and LS-9 that detect the position of substrate P2 relative to holding portion 201. Two line sensors LS-1 and LS-10 are provided with respect to the reference edge S11 of substrate P1, and two line sensors LS-7 and LS-8 are provided with respect to the edge S12 that intersects with the reference edge S11 of substrate P1. Furthermore, two line sensors LS-2 and LS-11 are provided with respect to the reference edge S21 of substrate P2, and two line sensors LS-3 and LS-9 are provided with respect to the edge S24 that intersects with the reference edge S21 of substrate P2. The multiple potentiometers PM also include three potentiometers PM-1, PM-7, and PM-8 that detect the position of substrate P1 on substrate holder 121 relative to substrate holder 121, and three potentiometers PM-2, PM-3, and PM-9 that detect the position of substrate P2 relative to substrate holder 121. One potentiometer PM-1 is provided with respect to the reference edge S11 of substrate P1, and two potentiometers PM-7 and PM-8 are provided with respect to the edge S12 that intersects with the reference edge S11 of substrate P1. Also, one potentiometer PM-2 is provided with respect to the reference edge S21 of substrate P2, and two potentiometers PM-3 and PM-9 are provided with respect to the edge S24 that intersects with the reference edge S21 of substrate P2. By arranging the line sensor LS and potentiometer PM in this manner, it is possible to arrange the substrates on the substrate holder 121 in various ways, and it is possible to detect the position of each substrate in any arrangement.

[0089] Furthermore, in the present first embodiment, the first control device 300 calculates the amount of rotation in the θz direction of substrate P1 on substrate holder 121 based on the detection results of the position of substrate P1 on holding unit 201 relative to holding unit 201 by line sensors LS-1, LS-10, LS-7, and LS-8, and the detection results of the position of substrate P1 on substrate holder 121 relative to substrate holder 121 by potentiometers PM-1, PM-7, and PM-8. The first control device 300 also calculates the amount of rotation in the θz direction of substrate P2 on substrate holder 121 based on the detection results of the position of substrate P1 on holding unit 201 relative to holding unit 201 by line sensors LS-2, LS-11, LS-3, and LS-9, and the detection results of the position of substrate P2 on substrate holder 121 relative to substrate holder 121 by potentiometers PM-2, PM-3, and PM-9. This makes it possible to calculate (detect) the amount of rotation in the θz direction of each of the substrates P1 and P2, even if only one potentiometer PM is provided for each of the reference edges S11 of the substrate P1 and the reference edges S21 of the substrate P2.

[0090] Second Embodiment In the second embodiment, on the assumption that the shift amounts in the X-axis direction and the Y-axis direction can be ignored as errors, the number of line sensors LS in the conveying device 200 and the number of potentiometers PM in the main body 100 are made smaller than those in the first embodiment.

[0091] Fig. 10A is a diagram showing the arrangement of line sensors LS in the second embodiment. As shown in Fig. 10A, in the second embodiment, line sensors LS-8 and LS-9 in Fig. 3 are omitted, and a total of nine line sensors LS are arranged.

[0092] Since the position detection of the substrate P arranged as shown in FIGS. 2A and 2B is the same as in the first embodiment, a detailed description will be omitted and the position detection of the substrates P1 and P2 will be described.

[0093] FIG. 10B is a diagram for explaining position detection of two substrates P1 and P2 when the two substrates P1 and P2 are placed on the holder 201.

[0094] The position of substrate P1 can be detected by line sensors LS-1 and LS-10 provided for reference side S11, and line sensor LS-7 provided for side S12. Specifically, line sensors LS-1 and LS-10 can detect the position in the Y axis direction of the end face corresponding to reference side S11, and line sensor LS-7 can detect the position in the X axis direction of the end face corresponding to side S12. In addition, line sensors LS-1 and LS-10 can detect the amount of rotation of substrate P1 in the θz direction.

[0095] Furthermore, the position of substrate P2 can be detected by line sensors LS-2 and LS-11 provided for reference side S21, and line sensor LS-3 provided for side S24. Specifically, line sensors LS-2 and LS-11 can detect the position in the Y axis direction of the end face corresponding to reference side S21, and line sensor LS-3 can detect the position in the X axis direction of the end face corresponding to side S24. Furthermore, line sensors LS-2 and LS-11 can detect the amount of rotation of substrate P2 in the θz direction.

[0096] 11A is a diagram showing the arrangement of the potentiometers PM in the second embodiment. In the second embodiment, the potentiometers PM-8 and PM-9 are omitted, and a total of seven potentiometers PM are arranged.

[0097] Since the position detection of the substrate P arranged as shown in FIGS. 2A and 2B is the same as in the first embodiment, a detailed description will be omitted and the position detection of the substrates P1 and P2 will be described.

[0098] FIG. 11B is a diagram for explaining position detection of two substrates P1 and P2 when the two substrates P1 and P2 are placed on the substrate holder 121.

[0099] The positions of substrate P1 in the X-axis direction and Y-axis direction can be detected by potentiometer PM-1 provided for reference side S11 and potentiometer PM-7 provided for side S12. Specifically, potentiometer PM-1 can detect the position of the end face corresponding to reference side S11 in the Y-axis direction, and potentiometer PM-7 can detect the position of the end face corresponding to side S12 in the X-axis direction.

[0100] Next, detection of the amount of rotation of substrate P1 in the θz direction will be described. In the second embodiment, as shown in FIG. 10(B), only one line sensor LS-7 is provided for side S12, so it is not possible to calculate the amount of rotation θcut in the θz direction of substrate P1 on holding unit 201 based on the position detection results of the edge surface corresponding to side S12. Also, as shown in FIG. 11(B), only one potentiometer PM-7 is provided for side S12, so it is not possible to calculate the amount of rotation φcut in the θz direction of substrate P1 on substrate holder 121 based on the position detection results of the edge surface corresponding to side S12. Therefore, it is not possible to calculate the amount of rotation φbase in the θz direction of substrate P1 on substrate holder 121 based on the above-mentioned equation (1).

[0101] Therefore, in the second embodiment, the amount of rotation φbase in the θz direction of the substrate P1 on the substrate holder 121 is calculated by the method shown below.

[0102] 12(A) and 12(B) are diagrams for explaining a method for detecting the amount of rotation in the θz direction of substrate P1 on substrate holder 121 in the second embodiment. Fig. 12(A) is a diagram for explaining position detection of substrate P1 on holding part 201, and Fig. 12(B) is a diagram for explaining calculation of the amount of rotation in the θz direction of substrate P1 on substrate holder 121.

[0103] In the second embodiment as well, potentiometers PM-7 and PM-1 are provided at positions corresponding to line sensors LS-7 and LS-1, respectively. For this reason, triangle TR1 formed by connecting detection positions DP7, DP1, and DP10 of the edge surface of substrate P1 by line sensors LS-7, LS-1, and LS-10 should be identical (congruent) to triangle TR2 formed by connecting detection positions DP17 and DP11 of the edge surface of substrate P1 by potentiometers PM-7 and PM-1, and detection position VP1 of the edge surface of substrate P1 obtained when potentiometer PM-10 is virtually provided in a position corresponding to line sensor LS-10.

[0104] Therefore, by calculating the position of the virtual detection position VP1 where triangle TR2 is identical to triangle TR1, the amount of rotation φbase in the θz direction of substrate P1 on substrate holder 121 can be calculated.

[0105] Similarly, for substrate P2, the triangle formed by connecting the detected positions of the edge face of substrate P2 by line sensors LS-3, LS-2, and LS-11 is the same as the triangle formed by connecting potentiometers PM-3 and PM-2 and the detected position of the edge face of substrate P2 that would be obtained if a virtual potentiometer were provided at a position corresponding to line sensor LS-11. Therefore, the amount of rotation φbase in the θz direction of substrate P2 on substrate holder 121 can be calculated based on the detected positions of the edge face of substrate P2 by line sensors LS-3, LS-2, and LS-11 and the detected positions of the edge face of substrate P2 by potentiometers PM-3 and PM-2.

[0106] As explained in detail above, according to the second embodiment, the multiple line sensors LS include three line sensors LS-1, LS-10, and LS-7 that detect the position of substrate P1 on holding portion 201 relative to holding portion 201, and three line sensors LS-2, LS-11, and LS-3 that detect the position of substrate P2 relative to holding portion 201. Two line sensors LS-1 and LS-10 are provided relative to the reference edge S11 of substrate P1, and one line sensor LS-7 is provided relative to the edge S12 that intersects with the reference edge S11 of substrate P1. Furthermore, two line sensors LS-2 and LS-11 are provided relative to the reference edge S21 of substrate P2, and one line sensor LS-3 is provided relative to the edge S24 that intersects with the reference edge S21 of substrate P2. The multiple potentiometers PM also include two potentiometers PM-1 and PM-7 that detect the position of substrate P1 on substrate holder 121 relative to substrate holder 121, and two potentiometers PM-2 and PM-3 that detect the position of substrate P2 relative to substrate holder 121. One potentiometer PM-1 is provided with respect to the reference edge S11 of substrate P1, and one potentiometer PM-7 is provided with respect to the edge S12 that intersects with the reference edge S11 of substrate P1. Furthermore, one potentiometer PM-2 is provided with respect to the reference edge S21 of substrate P2, and one potentiometer PM-3 is provided with respect to the edge S24 that intersects with the reference edge S21 of substrate P2. By arranging the line sensors LS and potentiometers PM in this way, substrates can be arranged in a variety of ways on substrate holder 121, and the position of each substrate can be detected in any of the arrangement ways. Furthermore, since the number of line sensors LS and potentiometers PM can be reduced compared to the first embodiment, the cost of parts for the exposure apparatus EX can be reduced.

[0107] It should be noted that, although the second embodiment described above is based on the premise that the shift amounts in the X-axis direction and the Y-axis direction can be ignored as errors, the present invention is not limited to this. The second embodiment can also be applied to cases where the shift amounts in the X-axis direction and the Y-axis direction of substrate P or substrates P1 and P2 are specified by a measurement system different from the measurement system including the potentiometer provided in substrate holder 121, and the rotation amount in the θz direction is determined by the potentiometer provided in substrate holder 121.

[0108] (Variation 1) In the second embodiment described above, the detection method according to the second embodiment may be used to detect the position (amount of rotation in the θz direction) of substrate P arranged on substrate holder 121 as shown in FIG. 2B. FIGS. 13A and 13B respectively show the arrangement of line sensor LS and potentiometer PM according to Variation 1. The arrangement of line sensor LS is the same as in the second embodiment, and therefore description thereof will be omitted. In FIG. 13B, potentiometer PM-5 in the second embodiment is omitted. In this way, even if potentiometer PM-5 is omitted, the amount of rotation in the θz direction of substrate P on substrate holder 121 can be detected using the detection method according to the second embodiment based on the detected position of the edge of substrate P on holding unit 201 by line sensors LS-4, LS-5, and LS-6, and the detected position of the edge of substrate P on substrate holder 121 by potentiometers PM-4 and PM-6. Because the potentiometer PM-5 is omitted, the parts cost of the exposure apparatus EX can be reduced more than in the second embodiment.

[0109] In the above first and second embodiments, the second sensor 150 provided in the main body 100 has been described as being a potentiometer PM, which is a contact sensor, but the second sensor 150 may also be a non-contact sensor. In the case of a non-contact sensor, the second sensor 150 can be provided at a position corresponding to the line sensors LS-10 and LS-11, but by arranging the second sensor 150 as in the first and second embodiments, the number of second sensors 150 can be reduced, and the component costs of the exposure apparatus EX can be reduced.

[0110] Furthermore, the arrangement of the substrate on the holding unit 201 and the substrate holder 121, and the arrangement of the line sensor LS and the potentiometer PM are not limited to those in the first and second embodiments. Below, in Modifications 2 to 8, other examples of the arrangement of the line sensor LS and the potentiometer PM will be described.

[0111] (Variation 2) Figures 14(A) to 14(F) are diagrams showing the arrangement of the line sensor LS and potentiometer PM according to Variation 2. In Variation 2, as shown in Figures 14(E) and 14(F), substrates P1 and P2 are arranged side by side in the Y-axis direction. The method of detecting the position of substrate P in Figures 14(A) to 14(D) is the same as in the first embodiment, and therefore a detailed description thereof will be omitted.

[0112] In Modification 2, line sensors LS-4 and LS-42 are provided for reference edge S11 of substrate P1 on holding unit 201, and line sensor LS-41 is provided for edge S12. Furthermore, line sensors LS-5 and LS-43 are provided for reference edge S21 of substrate P2 on holding unit 201, and line sensor LS-6 is provided for edge S24.

[0113] Furthermore, a potentiometer PM-4 is provided for the reference edge S11 of the substrate P1 on the substrate holder 121, and a potentiometer PM-41 is provided for the edge S12. Furthermore, a potentiometer PM-5 is provided for the reference edge S21 of the substrate P2 on the substrate holder 121, and a potentiometer PM-6 is provided for the edge S24.

[0114] In Modification 2, the potentiometer PM-41 provided for side S12 of substrate P1 can detect the position of substrate P1 in the Y axis direction on substrate holder 121, and the potentiometer PM-4 provided for reference side S11 can detect the position of substrate P1 in the X axis direction on substrate holder 121. Furthermore, the amount of rotation in the θz direction of substrate P1 on substrate holder 121 can be detected by the detection method according to the second embodiment, based on the detected position of the edge of substrate P1 on holding unit 201 by line sensor LS-41 provided for side S12 of substrate P1 and line sensors LS-4 and LS-42 provided for reference side S11, and the detected position of the edge of substrate P1 on substrate holder 121 by potentiometer PM-41 and potentiometer PM-4.

[0115] Furthermore, the potentiometer PM-6 provided for side S24 of substrate P2 can detect the position in the Y axis direction of substrate P2 on substrate holder 121, and the potentiometer PM-5 provided for reference side S21 can detect the position in the X axis direction of substrate P2 on substrate holder 121. Furthermore, the amount of rotation in the θz direction of substrate P2 on substrate holder 121 can be detected by the detection method according to the second embodiment, based on the detected position of the edge of substrate P2 on holding unit 201 by line sensor LS-6 provided for side S24 of substrate P2 and line sensors LS-43 and LS-5 provided for reference side S21, and the detected position of the edge of substrate P2 on substrate holder 121 by potentiometer PM-6 and potentiometer PM-5.

[0116] Figures 15(A) to 15(F) are diagrams showing other examples of the arrangement of the line sensors LS and potentiometers PM in Modification 2. In addition to the line sensors LS and potentiometers PM shown in Figures 14(A) to 14(F), line sensors LS-44 and LS-45 may be provided for sides S12 and S24, respectively, as shown in Figure 15(E), and potentiometers PM-44 and PM-45 may be provided for sides S12 and S24, respectively, as shown in Figure 15(F). In this case, the amount of rotation of substrate P1 on substrate holder 121 in the θz direction can be detected using the detection method of the first embodiment based on the detection position of the edge surface of substrate P1 by line sensors LS-41 and LS-44 provided for side S12 and line sensors LS-4 and LS-42 provided for reference side S11, and the detection position of the edge surface of substrate P1 by potentiometers PM-41 and PM-44 provided for side S12 and potentiometer PM-4 provided for reference side S11. Furthermore, based on the detection position of the edge surface of substrate P2 by line sensors LS-43 and LS-5 provided for reference edge S21 and line sensors LS-45 and LS-6 provided for edge S24, and the detection position of the edge surface of substrate P2 by potentiometer PM-5 provided for reference edge S21 and potentiometers PM-45 and PM-6 provided for edge S24, the amount of rotation of substrate P2 in the θz direction on substrate holder 121 can be detected using the detection method of the first embodiment.

[0117] (Modification 3) FIGS. 16A to 16F are diagrams showing the arrangement of the line sensor LS and potentiometer PM according to Modification 3. The arrangement of substrate P and substrates P1 and P2 is the same as in Modification 2. In Modification 3, the potentiometer PM-2 of Modification 2 is omitted. Therefore, the amount of rotation in the θz direction of substrate P on substrate holder 121 arranged as shown in FIGS. 16A and 16B is detected using the detection method according to the second embodiment. Specifically, the amount of rotation in the θz direction of substrate P on substrate holder 121 is detected using the detection method according to the second embodiment based on the detected position of the edge of substrate P on holding unit 201 by line sensors LS-1, LS-2, and LS-3, and the detected position of the edge of substrate P on substrate holder 121 by potentiometers PM-1 and PM-3. Because the number of potentiometers PM can be reduced, the parts cost of the exposure apparatus EX can be reduced compared to Modification 2. The position detection of the board in other arrangements is the same as in Modification 2, and therefore a description thereof will be omitted.

[0118] (Variation 4) Figures 17(A) to 17(F) are diagrams showing the arrangement of line sensors LS and potentiometers PM according to Variation 4. In Variation 4, four substrates P1 to P4 are arranged, as shown in Figures 17(E) and 17(F). The method of detecting the position of substrate P in Figures 17(A) to 17(D) is the same as in the first embodiment, and therefore a detailed description will be omitted.

[0119] In Modification 4, line sensors LS-51 and LS-52 are provided for side S13 of substrate P1 on holding unit 201, and line sensor LS-53 is provided for side S12. Furthermore, line sensor LS-59 is provided for side S23 of substrate P2 on holding unit 201, and line sensors LS-3 and LS-58 are provided for reference side S24. Furthermore, line sensor LS-54 is provided for side S32 of substrate P3 on holding unit 201, and line sensors LS-1 and LS-55 are provided for reference side S31. Furthermore, line sensors LS-2 and LS-56 are provided for reference side S41 of substrate P4 on holding unit 201, and line sensor LS-57 is provided for reference side S44.

[0120] Furthermore, a potentiometer PM-52 is provided for the side S13 of substrate P1 on the substrate holder 121, and a potentiometer PM-53 is provided for the side S12. Furthermore, potentiometers PM-3 and PM-58 are provided for the reference side S24 of substrate P2 on the substrate holder 121. Furthermore, a potentiometer PM-54 is provided for the side S32 of substrate P3 on the substrate holder 121, and a potentiometer PM-1 is provided for the reference side S31. Furthermore, a potentiometer PM-2 is provided for the reference side S41 of substrate P4 on the substrate holder 121, and a potentiometer PM-57 is provided for the reference side S44.

[0121] In Modification 4, the potentiometer PM-53 provided for side S12 of substrate P1 can detect the position in the X axis direction of substrate P1 on substrate holder 121, and the potentiometer PM-52 provided for side S13 can detect the position in the Y axis direction of substrate P1 on substrate holder 121. Furthermore, the amount of rotation in the θz direction of substrate P1 on substrate holder 121 can be detected by the detection method according to the second embodiment, based on the detected position of the edge of substrate P1 on holding unit 201 by line sensors LS-51 and LS-52 provided for side S13 of substrate P1 and line sensor LS-53 provided for side S12, and the detected position of the edge of substrate P1 on substrate holder 121 by potentiometer PM-52 and potentiometer PM-53.

[0122] Furthermore, potentiometers PM-3 and PM-58 provided for side S24 of substrate P2 can detect the position of substrate P2 in the X axis direction on substrate holder 121. Furthermore, based on the detected position of the edge face of substrate P2 on holding unit 201 by line sensors LS-3 and LS-58 provided for side S24 of substrate P2 and line sensor LS-59 provided for side S23, and the detected position of the edge face of substrate P2 on substrate holder 121 by potentiometer PM-3 and potentiometer PM-58, the detection method according to the second embodiment can detect the position of substrate P2 in the Y axis direction on substrate holder 121 and the amount of rotation in the θz direction.

[0123] Furthermore, the potentiometer PM-1 provided for side S31 of substrate P3 can detect the position of substrate P3 in the Y axis direction on substrate holder 121, and the potentiometer PM-54 provided for side S32 can detect the position of substrate P3 in the X axis direction on substrate holder 121. Furthermore, the amount of rotation in the θz direction of substrate P3 on substrate holder 121 can be detected by the detection method according to the second embodiment, based on the detected position of the edge of substrate P3 on holding unit 201 by line sensors LS-1 and LS-55 provided for side S31 of substrate P3 and line sensor LS-54 provided for side S32, and the detected position of the edge of substrate P3 on substrate holder 121 by potentiometer PM-1 and potentiometer PM-54.

[0124] Furthermore, the potentiometer PM-2 provided for side S41 of substrate P4 can detect the position of substrate P4 in the Y axis direction on substrate holder 121, and the potentiometer PM-57 provided for side S44 can detect the position of substrate P4 in the X axis direction on substrate holder 121. Furthermore, the amount of rotation in the θz direction of substrate P4 on substrate holder 121 can be detected by the detection method according to the second embodiment based on the detected position of the edge of substrate P4 on holding unit 201 by line sensors LS-2 and LS-56 provided for side S41 of substrate P4 and line sensor LS-57 provided for side S44, and the detected position of the edge of substrate P4 on substrate holder 121 by potentiometer PM-2 and potentiometer PM-57. In this way, the number of substrates placed on holding unit 201 and substrate holder 121 is not limited to two, but may be three or more. Even in such a case, the position of each substrate can be detected by appropriately arranging the line sensor LS and the potentiometer PM.

[0125] Figures 18(A) to 18(F) are diagrams showing other examples of the arrangement of the line sensors LS and potentiometers PM in Modification 4. In addition to the line sensors LS and potentiometers PM shown in Figures 17(A) to 17(F), as shown in Figure 18(E), line sensors LS-71, LS-72, LS-73, and LS-74 may be provided for sides S12, S32, S44, and S23, respectively, and as shown in Figure 18(F), potentiometers PM-71, PM-72, PM-73, and PM-74 may be provided for sides S12, S32, S44, and S23, respectively. In this case, the amount of rotation of substrate P1 on substrate holder 121 in the θz direction can be detected using the detection method of the first embodiment based on the detection position of the end face of substrate P1 by line sensors LS-51 and LS-52 provided for side S13 and line sensors LS-71 and LS-53 provided for side S12, and the detection position of substrate P1 by potentiometer PM-52 provided for side S13 and potentiometers PM-71 and PM-53 provided for side S12. Furthermore, based on the detection position of the edge surface of substrate P2 by line sensors LS-59 and LS-74 provided for side S23 and line sensors LS-3 and LS-58 provided for side S24, and the detection position of the edge surface of substrate P2 by potentiometer PM-74 provided for side S23 and potentiometers PM-3 and PM-58 provided for side S24, the amount of rotation of substrate P2 on substrate holder 121 in the θz direction can be detected using the detection method of the first embodiment. Furthermore, based on the detection position of the edge surface of substrate P3 by line sensors LS-54 and LS-72 provided for side S32 and line sensors LS-1 and LS-55 provided for side S31, and the detection position of the edge surface of substrate P3 by potentiometers PM-54 and PM-72 provided for side S32 and potentiometer PM-1 provided for side S31, the amount of rotation of substrate P3 on substrate holder 121 in the θz direction can be detected using the detection method of the first embodiment.Furthermore, based on the detection position of the edge surface of substrate P4 by line sensors LS-56 and LS-2 provided for side S41 and line sensors LS-57 and LS-73 provided for side S44, and the detection position of the edge surface of substrate P4 by potentiometer PM-2 provided for side S41 and potentiometers PM-57 and PM-73 provided for side S44, the amount of rotation in the θz direction of substrate P4 on substrate holder 121 can be detected using the detection method of the first embodiment.

[0126] 19(A) to 19(F) are diagrams showing the arrangement of line sensor LS and potentiometer PM according to Modification 5. The arrangement of substrate P and substrates P1 to P4 is the same as in Modification 4. In Modification 5, potentiometer PM-5 of Modification 4 is omitted. Therefore, the amount of rotation in the θz direction of substrate P on substrate holder 121 arranged as shown in FIGS. 19(A) and 19(B) is detected using the detection method according to the second embodiment. Specifically, the amount of rotation in the θz direction of substrate P on substrate holder 121 is detected using the detection method according to the second embodiment based on the detected position of the edge of substrate P on holding unit 201 by line sensors LS-4, LS-5, and LS-6, and the detected position of the edge of substrate P on substrate holder 121 by potentiometers PM-4 and PM-6. In the fifth modification, the number of potentiometers PM can be reduced more than in the fourth modification, and therefore the parts cost of the exposure apparatus EX can be reduced more than in the fourth modification.

[0127] (Variation 6) Variation 6 is an example in which the line sensor LS for detecting the positions of substrates P1 and P2 on the holding portion 201 is shared in Variation 1. FIGS. 20(A) to 20(F) are diagrams showing the arrangement of the line sensor LS and potentiometer PM according to Variation 6. In Variation 6, the line sensors LS-10 and LS-11 (see FIG. 13(A)) of Variation 1 are omitted, and as shown in FIG. 20(E), a line sensor LS-61 is provided so as to overlap with both substrates P1 and P2. The line sensor LS-61 detects the position of the edge surface corresponding to side S14 of substrate P1 and the position of the edge surface corresponding to side S22 of substrate P2. The arrangement of the potentiometer PM is the same as in Variation 1.

[0128] In variant example 6, the amount of rotation of substrate P1 on substrate holder 121 in the θz direction can be detected using the detection method of the second embodiment based on the detection position of the edge surface of substrate P1 on holding portion 201 by line sensors LS-7, LS-1, and LS-61 and the detection position of the edge surface of substrate P1 on substrate holder 121 by potentiometers PM-7 and PM-1.

[0129] Furthermore, the amount of rotation in the θz direction of substrate P2 on substrate holder 121 can be detected by the detection method according to the second embodiment, based on the detected position of the edge face of substrate P2 on holding unit 201 by line sensors LS-3, LS-2, and LS-61, and the detected position of the edge face of substrate P2 on substrate holder 121 by potentiometers PM-3 and PM-2. In variant 6, the number of line sensors LS can be reduced more than in variant 1, and therefore the parts cost of the exposure apparatus EX can be reduced more than in variant 1.

[0130] (Variation 7) Variation 7 is an example in which the line sensor LS for detecting the positions of substrates P1 and P2 on the holding portion 201 is shared in Variation 3. FIGS. 21A to 21F are diagrams showing the arrangement of the line sensor LS and potentiometer PM according to Variation 7. In Variation 7, the line sensors LS-42 and LS-43 (see FIG. 16E) of Variation 3 are omitted, and as shown in FIG. 21E, line sensor LS-62 is provided so as to overlap with both substrates P1 and P2. Line sensor LS-62 detects the position of the edge surface corresponding to side S14 of substrate P1 and the position of the edge surface corresponding to side S22 of substrate P2. The arrangement of the potentiometer PM is the same as in Variation 3.

[0131] In variant example 7, the amount of rotation in the θz direction of substrate P1 on substrate holder 121 can be detected using the detection method of the second embodiment based on the detection position of the edge surface of substrate P1 on holding portion 201 by line sensors LS-41, LS-4, and LS-62, and the detection position of the edge surface of substrate P1 on substrate holder 121 by potentiometers PM-41 and PM-4.

[0132] Furthermore, the amount of rotation in the θz direction of substrate P2 on substrate holder 121 can be detected by the detection method according to the second embodiment, based on the detected position of the edge face of substrate P2 on holding unit 201 by line sensors LS-6, LS-5, and LS-62, and the detected position of the edge face of substrate P2 on substrate holder 121 by potentiometers PM-6 and PM-5. In Modification 7, the number of line sensors LS can be reduced more than in Modification 3, and therefore the parts cost of the exposure apparatus EX can be reduced more than in Modification 3.

[0133] (Variation 8) Variation 8 is an example in which the line sensor LS for detecting the positions of substrates P1 to P4 on the holding portion 201 is shared in Variation 5. FIGS. 22(A) to 22(F) are diagrams showing the arrangement of the line sensor LS and potentiometer PM according to Variation 8. In Variation 8, the line sensors LS-51, LS-59, LS-55, and LS-56 (see FIG. 19(E)) of Variation 5 are omitted, and as shown in FIG. 22(E), line sensor LS-63 is provided so as to overlap with both substrates P1 and P2, and line sensor LS-64 is provided so as to overlap with both substrates P3 and P4. Line sensor LS-63 detects the position of the edge surface corresponding to side S14 of substrate P1 and the position of the edge surface corresponding to side S22 of substrate P2. Furthermore, line sensor LS-64 detects the position of the edge surface corresponding to side S34 of substrate P3 and the position of the edge surface corresponding to side S42 of substrate P4. The arrangement of potentiometer PM is the same as in modified example 5.

[0134] In variant example 8, the amount of rotation of substrate P1 on substrate holder 121 in the θz direction can be detected using the detection method of the second embodiment based on the detected position of the edge surface of substrate P1 on holding portion 201 by line sensors LS-52, LS-53, and LS-63, and the detected position of the edge surface of substrate P1 on substrate holder 121 by potentiometers PM-52 and PM-53.

[0135] Furthermore, based on the detected position of the edge surface of substrate P2 on holding portion 201 by line sensors LS-3, LS-58, and LS-63, and the detected position of the edge surface of substrate P2 on substrate holder 121 by potentiometers PM-3 and PM-58, the amount of rotation in the θz direction of substrate P2 on substrate holder 121 can be detected by the detection method of the second embodiment.

[0136] Furthermore, based on the detected position of the edge surface of substrate P3 on holding portion 201 by line sensors LS-54, LS-1, and LS-64 and the detected position of the edge surface of substrate P3 on substrate holder 121 by potentiometers PM-54 and PM-1, the detection method of the second embodiment can detect the amount of rotation of substrate P3 on substrate holder 121 in the θz direction.

[0137] Furthermore, the amount of rotation in the θz direction of substrate P4 on substrate holder 121 can be detected by the detection method according to the second embodiment, based on the detected position of the edge face of substrate P4 on holding unit 201 by line sensors LS-2, LS-57, and LS-64, and the detected position of the edge face of substrate P4 on substrate holder 121 by potentiometers PM-2 and PM-57. In variant 8, the number of line sensors LS can be reduced more than in variant 5, and therefore the parts cost of the exposure apparatus EX can be reduced more than in variant 5.

[0138] Third Embodiment In the first and second embodiments, when substrate P is placed on substrate holder 121 as shown in Fig. 8(A), the reference side S1 of substrate P does not coincide with the -Y side end of substrate holder 121, and when substrate P is placed on substrate holder 121 as shown in Fig. 8(B), the reference side S4 of substrate P does not coincide with the -Y side end of substrate holder 121. Furthermore, when substrates P1 and P2 are placed on substrate holder 121 as shown in Fig. 8(C), the reference side S11 of substrate P1 and the reference side S21 of substrate P2 do not coincide with the -Y side end of substrate holder 121.

[0139] In the third embodiment, substrate P or substrates P1 and P2 are placed on substrate holder 121 so that at least one reference edge of substrate P and each of the reference edges of substrates P1 and P2 coincide with the -Y side end of substrate holder 121.

[0140] Any method may be used to arrange substrate P or substrates P1 and P2 on substrate holder 121 so that the reference sides of substrate P and substrates P1 and P2 coincide with the end of substrate holder 121 on the -Y side.

[0141] 23A to 23F show the arrangement of the line sensors LS and potentiometers PM for detecting the position of each substrate in the third embodiment.

[0142] In the third embodiment, one of the reference edges S1 and S4 of substrate P, the reference edge S11 of substrate P1, and the reference edge S21 of substrate P2 are positioned so as to coincide with the -Y side end of holding portion 201 and the -Y side end of substrate holder 121, and therefore it is possible to provide potentiometer PM-37 for detecting the amount of rotation in the θz direction of substrate P1 and potentiometer PM-38 for detecting the amount of rotation in the θz direction of substrate P2, which could not be arranged in the first and second embodiments.

[0143] Furthermore, line sensors LS-31 and LS-32, which are provided relative to the reference edge S1 of substrate P arranged as shown in Fig. 23(A) and which detect the position of the end face corresponding to reference edge S1 of substrate P and the amount of rotation in the θz direction of substrate P, can be used as line sensors LS which detect the position of the end face corresponding to reference edge S2 of substrate P arranged as shown in Fig. 23(B) and the amount of rotation in the θz direction of substrate P. This makes it possible to reduce the number of line sensors LS compared to the first embodiment. The same applies to potentiometer PM.

[0144] In the third embodiment, potentiometers PM-37 and PM-38 may be omitted, and the amount of rotation of substrates P1 and P2 on substrate holder 121 in the θz direction may be calculated using the method according to the first embodiment.

[0145] In addition, in the third embodiment, the line sensors LS-36 and LS-39 may be omitted, and the potentiometers PM-37 and PM-38 may be omitted, and the amount of rotation of substrates P1 and P2 in the θz direction on substrate holder 121 may be calculated using the method according to the second embodiment.

[0146] (Variant 9) Furthermore, in the first to third embodiments described above, for example, if only one substrate P is placed in the holding portion 201 or substrate holder 121 as shown in FIG. 2(A) and no other arrangements are made, line sensors LS-1 to LS-3 may be arranged as shown in FIG. 24(A), and potentiometers PM-1 and PM-3 may be arranged as shown in FIG. 24(B) (potentiometer PM-2 may be omitted), and the amount of rotation of substrate P in the θz direction may be calculated using the method according to the second embodiment.

[0147] Furthermore, in the above first to third embodiments, the exposure apparatus EX has been described as an exposure apparatus that uses a mask M, but the exposure apparatus EX may also be a so-called maskless exposure apparatus that forms a pattern using, for example, a spatial light modulator instead of a mask M.

[0148] The above-described embodiment is a preferred example of the present invention, but the present invention is not limited to this and can be modified in various ways without departing from the spirit of the present invention.

[0149] 100 Main body 120 Substrate stage device 121 Substrate holder 200 Transport device 201 Holding section 203 Alignment mechanism 300 First control device LS, LS-1 to LS-11 Line sensors PM, PM-1 to PM-9 Potentiometer EX Exposure device P, P1, P2 Substrate S1, S11, S21 Reference edge S12, S24 Edge

Claims

1. A holder for holding a plurality of substrates; a plurality of first sensors that detect the position of each of the plurality of substrates relative to the holder; a stage portion on which the plurality of substrates are placed; a plurality of second sensors that detect the positions of the plurality of substrates relative to the stage portion; Equipped with The number of the plurality of second sensors is less than the number of the plurality of first sensors. Exposure equipment.

2. a position of each of the plurality of second sensors corresponds to a position of any of the plurality of first sensors; 2. The exposure apparatus according to claim 1.

3. each of the second sensors is disposed such that, when the second sensors and the corresponding first sensors are virtually disposed on a predetermined coordinate system, positions of the second sensors coincide with positions of the corresponding first sensors, respectively; The exposure apparatus according to claim 2 .

4. a first calculation unit that calculates an amount of rotation of each of the plurality of substrates on the stage unit about a direction perpendicular to an upper surface of the stage unit, based on a detection result of a position of each of the plurality of substrates on the holding unit relative to the holding unit by the plurality of first sensors and a detection result of a position of each of the plurality of substrates on the stage unit relative to the stage unit by the plurality of second sensors; The exposure apparatus according to claim 1 , further comprising:

5. a first alignment mechanism that positions each of the plurality of substrates with respect to the holder based on a detection result of a position of each of the plurality of substrates on the holder with respect to the holder by the plurality of first sensors; a projection optical system that projects a pattern onto each of the plurality of substrates; a second alignment mechanism that positions each of the plurality of substrates with respect to the projection optical system based on detection results of positions of each of the plurality of substrates on the stage unit with respect to the stage unit by the plurality of second sensors and on the basis of calculated amounts of rotation of each of the plurality of substrates; The exposure apparatus according to claim 4 .

6. each of the plurality of first sensors is a non-contact sensor; Each of the plurality of second sensors is a contact type sensor.

4. The exposure apparatus according to claim 1.

7. each of the plurality of first sensors is a line sensor; each of the plurality of second sensors is a potentiometer; 7. The exposure apparatus according to claim 6.

8. the plurality of substrates includes at least a first substrate and a second substrate; the plurality of first sensors include at least three third sensors that detect a position of the first substrate on the holder relative to the holder, and at least three fourth sensors that detect a position of the second substrate on the holder relative to the holder; the plurality of second sensors include at least two fifth sensors that detect a position of the first substrate on the stage portion relative to the stage portion, and at least two sixth sensors that detect a position of the second substrate on the stage portion relative to the stage portion; the number of the fifth sensors is less than the number of the third sensors; the number of the sixth sensors is less than the number of the fourth sensors; The exposure apparatus according to any one of claims 1 to 3.

9. At least two of the third sensors are provided with respect to a reference side of the first substrate; At least two of the fourth sensors are provided with respect to a reference edge of the second substrate. The exposure apparatus according to claim 8.

10. The number of the third sensors is four, two of which are provided for a first side of the first substrate, and the other two are provided for a second side of the first substrate that intersects with the first side, the number of the fourth sensors is four, two of which are provided for a third side of the second substrate, and the other two are provided for a fourth side of the second substrate intersecting with the third side; the number of the fifth sensors is three, one of which is provided for the first side of the first substrate, and the other two are provided for the second side of the first substrate that intersects with the first side; the number of the sixth sensors is three, one of which is provided for the third side of the second substrate, and the other two are provided for the fourth side intersecting with the third side of the second substrate; The exposure apparatus according to claim 8.

11. the number of the third sensors is three, two of which are provided for a first side of the first substrate, and the other is provided for a second side of the first substrate that intersects with the first side; the number of the fourth sensors is three, two of which are provided for a third side of the second substrate, and the other is provided for a fourth side of the second substrate intersecting with the third side; the number of the fifth sensors is two, one of which is provided for the first side of the first substrate and the other of which is provided for the second side intersecting with the first side of the first substrate; the number of the sixth sensors is two, one of which is provided for the third side of the second substrate, and the other of which is provided for the fourth side intersecting with the third side of the second substrate; The exposure apparatus according to claim 8.

12. the first edge of the first substrate is a reference edge of the first substrate, The third side of the second substrate is a reference side of the second substrate. The exposure apparatus according to claim 10.

13. a second calculation unit that calculates a rotation amount of the first substrate on the stage unit about a direction perpendicular to an upper surface of the stage unit based on a detection result of a position of the first substrate on the holder with respect to the holder by the third sensor and a detection result of a position of the first substrate on the stage unit with respect to the stage unit by the fifth sensor; a third calculation unit that calculates a rotation amount of the second substrate on the stage unit about a direction perpendicular to an upper surface of the stage unit based on a detection result of a position of the second substrate on the holder with respect to the holder by the fourth sensor and a detection result of a position of the second substrate on the stage unit with respect to the stage unit by the sixth sensor; The exposure apparatus according to claim 8 .

14. A holder for holding the substrate; a plurality of first sensors for detecting a position of the substrate relative to the holder; a stage portion on which the substrate is placed; a plurality of second sensors for detecting a position of the substrate relative to the stage portion; Equipped with The number of the plurality of second sensors is less than the number of the plurality of first sensors. Exposure equipment.