Scanning electron microscope with measurement function

a scanning electron microscope and function technology, applied in the direction of material analysis using wave/particle radiation, semiconductor/solid-state device testing/measurement, instruments, etc., can solve the problems of difficult to check, troublesome to revise and check stored amp data, etc., to achieve efficient and easy measurement

US20080109755A1Inactive Publication Date: 2008-05-08OJIMA YUUKI +3
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Patent Information

Authority / Receiving Office
US · United States
Patent Type
Applications(United States)
Current Assignee / Owner
Publication Date
2008-05-08
Estimated Expiration
Not applicable · inactive patent

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Abstract

A scanning electron microscope which efficiently makes measurements for plural measurement items at a time and allows easy entry, confirmation and revision of auto measurement parameters. Parameters for creation of a line profile from an image captured by the scanning electron microscope are entered as auto measurement parameters (AMP) to be used as common conditions for all measurement items. Also, plural combinations of edge detection methods and measurement calculation methods are entered as auto measurement parameters to make measurements for plural items.
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Description

CROSS-REFERENCE TO RELATED CASES

[0001] The present application is a continuation of U.S. application Ser. No. 11 / 398,522, filed Apr. 6, 2006, which is a continuation of U.S. application Ser. No. 10 / 779,848, filed Feb. 18, 2004, now U.S. Pat. No. 7,053,371, issued May 30, 2006, which claims the benefit of Japanese Application No. 2003-044290, filed on Feb. 21, 2003, the disclosures of which are herewith incorporated by reference in their entirety.FIELD OF THE INVENTION

[0002] The present invention relates to a scanning electron microscope with a measurement function and a measurement method which uses it. BACKGROUND OF THE INVENTION

[0003] The following patent documents (gazettes) describe conventional techniques in this field:

[0004] Patent Document 1: JP-A No. 347246 / 1994

[0005] Patent Document 2: JP-A No. 22794 / 1996

[0006] Patent Document 3: JP-A No. 237231 / 1999

[0007] Patent Document 4: JP-A No. 213427 / 1998

[0008] Patent Document 5: JP-A No. 201919 / 1999

[0009] A scanning electro...

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Embodiment Construction

[0036] Next, preferred embodiments of the present invention will be described referring to the accompanying drawings.

[0037]FIG. 15 shows the general structure of a scanning electron microscope with a measurement function according to an embodiment of the present invention (see Patent Document 1). An electron beam 2 emitted from an electron gun 1 is narrowed by an objective lens 6 and thrown on a sample 7. The objective lens 6 is excited by an objective lens power supply 11. A deflecting signal generator 14 sends a deflecting signal depending on a scanning area or scanning position of the electron beam 2 as indicated by a computer 21 through a deflecting amplifier 10 to a deflecting coil 5 to excite it so that the sample 7 is scanned with the electron beam 2 two-dimensionally.

[0038] A secondary signal (secondary electron signal, reflection electron signal, etc.), which is generated from the sample 7 in response to irradiation of the electron beam 2, is detected by a detector 12 and...