Fractal showerhead for flow uniformity

Abstract

A showerhead is described. The showerhead includes a gas distribution plate and an upper electrode located below the gas distribution plate. The upper electrode interfaces with the gas distribution plate via a thermally conductive layer. The gas distribution plate includes a plurality of zones. Each of the plurality of zones has an input and a plurality of outputs. The input connects to a gas supply line to receive one or more gases from the gas supply line. The input is coupled to the plurality of outputs via a plurality of tubular paths to form a plurality of distances between the input and the plurality of outputs. The plurality of distances between the input and the plurality of outputs are within a predetermined range from each other to facilitate uniformity in outputting the one or more gases from the plurality of outputs towards a gap situated below the upper electrode.

Description

FRACTAL SHOWERHEAD FOR FLOW UNIFORMITYField

[0001] The present embodiments relate to a fractal showerhead for flow uniformity.Background

[0002] The background description provided herein is for the purposes of generally presenting the context of the disclosure. Work of the presently named inventors, to the extent it is described in this background section, as well as aspects of the description that may not otherwise qualify as prior art at the time of filing, are neither expressly nor impliedly admitted as prior art against the present disclosure.

[0003] In a plasma processing system, a radio frequency (RF) generator, an impedance matching circuit, and a plasma chamber are provided. The RF generator is coupled to the impedance matching circuit, which is coupled to the plasma chamber. A semiconductor wafer is placed within the plasma chamber. After the semiconductor wafer is placed, the RF generator generates an RF signal, which is supplied via the impedance matching circuit to the plasma chamber. When a gas is supplied to the plasma chamber in addition to the RF signal, plasma is generated within the plasma chamber for processing the substrate. However, it is difficult to process the substrate in a desirable manner.Summary

[0004] Embodiments of the disclosure provide systems, apparatus, and methods for providing a fractal showerhead to achieve flow uniformity. It should be appreciated that the present embodiments can be implemented in numerous ways, e.g., a process, an apparatus, a system, a device, or a method on a computer readable medium. Several embodiments are described below.

[0005] In an embodiment, a gas distribution plate (GDP) is provided. Differences in multiple path lengths from a source, such as a GDP inlet, to destinations, such as upper electrode (UE) outlet holes interfacing with a process region, of all flow pathways are minimized using fractal features of the fractal showerhead. Substantially equal path lengths of various gas distribution plenums leading up to the UE outputs from the GDP are provided. This results in a highly uniform flow output from the UE towards a gap below the UE. By applying the fractal features and working under constraints of other elements in the GDP, such as cooling, the GDP provides the highly uniform flow.

[0006] In one embodiment, a showerhead is described. The showerhead includes a gas distribution plate and an upper electrode located below the gas distribution plate. The upper electrode interfaces with the gas distribution plate via a thermally conductive layer. The gasdistribution plate includes a plurality of zones. Each of the plurality of zones has an input and a plurality of outputs. The input connects to a gas supply line to receive one or more gases from the gas supply line. The input is coupled to the plurality of outputs via a plurality of tubular paths to form a plurality of distances between the input and the plurality of outputs. The plurality of distances between the input and the plurality of outputs are within a predetermined range from each other to facilitate uniformity in outputting the one or more gases from the plurality of outputs towards a gap situated below the upper electrode.

[0007] In an embodiment, a gas distribution plate is described. The gas distribution plate includes a plurality of zones. Each of the plurality of zones has a plurality of tubular paths. The plurality of tubular paths has an input and a plurality of outputs. The input connects to a gas supply line to receive one or more gases from the gas supply line. The input is coupled to the plurality of outputs via the plurality of tubular paths to form a plurality of distances. The plurality of distances between the input and the plurality of outputs are within a predetermined range to facilitate uniformity in outputting the one or more gases from the plurality of outputs to a thermal pad layer.

[0008] In one embodiment, a plasma system is described. The plasma system includes a radio frequency generator that generates a radio frequency signal. The plasma system further includes an impedance matching circuit coupled to the radio frequency generator to receive the radio frequency signal to output a modified radio frequency signal. The plasma system includes a plasma chamber coupled to the impedance matching circuit to receive the modified radio frequency signal. The plasma chamber includes a showerhead. The showerhead includes a gas distribution plate and an upper electrode located below the gas distribution plate. The upper electrode interfaces with the gas distribution plate via a thermally conductive layer. The gas distribution plate includes a plurality of zones. Each of the plurality of zones has an input and a plurality of outputs. The input connects to a gas supply line to receive one or more gases from the gas supply line. The input is coupled to the plurality of outputs via a plurality of tubular paths to form a plurality of distances between the input and the plurality of outputs. The plurality of distances between the input and the plurality of outputs are within a pre-determined range to facilitate uniformity in outputting the one or more gases from the plurality of outputs towards a gap situated below the upper electrode.

[0009] Some advantages of the herein described systems and methods include providing multiple paths of a zone of the GDP from an output of a gas supply line to outputs of the GDP. The multiple paths of the zone of the GDP have distances that are within a predetermined range from each other. For example, the distances are substantially equal with each other. By providing the distances within the predetermined range, uniformity in flow of theone or more process gases to the gap below the UE is achieved. The uniformity in flow facilitates processing a substrate in a uniform manner.

[0010] Other aspects will become apparent from the following detailed description, taken in conjunction with the accompanying drawings.BRIEF DESCRIPTION OF THE DRAWINGS

[0011] The embodiments may best be understood by reference to the following description taken in conjunction with the accompanying drawings.

[0012] Figure 1 is a diagram of an embodiment of a showerhead.

[0013] Figure 2 is a diagram of an embodiment of a system to illustrate multiple zones of a gas distribution plate (GDP) of the showerhead.

[0014] Figure 3 is a diagram of an embodiment of a system to illustrate a fractal feature of an inner zone of the GDP.

[0015] Figure 4A is an isometric view of an embodiment of a system to illustrate a middle-inner zone of the GDP.

[0016] Figure 4B is a zoom-in view of a portion of the system of Figure 4A.

[0017] Figure 4C is a zoom-in view of another portion of the system of Figure 4A.

[0018] Figure 5A is an isometric view of an embodiment of a system to illustrate a fractal feature of a middle-outer zone of the GDP.

[0019] Figure 5B is a zoom-in view of a portion of the middle-outer zone.

[0020] Figure 5C is a zoom-in view of another portion of the middle-outer zone.

[0021] Figure 6A is an isometric view of an embodiment of a system to illustrate a fractal feature of an outer zone of the GDP.

[0022] Figure 6B is a zoom-in view of a portion of the outer zone.

[0023] Figure 6C is a zoom-in view of another portion of the outer zone.

[0024] Figure 7 is a diagram of an embodiment of a system to illustrate use of the showerhead in a plasma chamber.DETAILED DESCRIPTION

[0025] The following embodiments describe systems and methods for providing a fractal showerhead to achieve flow uniformity. It will be apparent that the present embodiments may be practiced without some or all of these specific details. In other instances, well known process operations have not been described in detail in order not to unnecessarily obscure the present embodiments.

[0026] Figure 1 is a diagram of an embodiment of a showerhead 100. The showerhead 100 includes a gas distribution plate (GDP) 102 and an upper electrode 104. Anexample of the GDP 102 is a circular plate that can be fabricated from a metal, such as aluminum or an alloy of aluminum. Also, as an example, the upper electrode 104 is fabricated from the metal. Between the showerhead 102 and the GDP 102 is a pad 106, which is a thermally conductive layer. The pad 106 is sometimes referred to herein as a thermal pad layer. An example of the thermally conductive layer is a layer fabricated from a thermally conductive metal, such as aluminum or aluminum coated with aluminum oxide. The pad 106 is a part of the showerhead 100. The upper electrode 104 is located below the pad 106, which is located below the GDP 102. For example, the pad 106 is adjacent to the GDP 102 and the upper electrode 104 is adjacent to the pad 106 for the upper electrode 104 to interface with the GDP 102 via the pad 106. To illustrate, there is no other layer of the showerhead 100 between the GDP 102 and the pad 106 and no other layer of the showerhead 100 between the pad 106 and the upper electrode 104. The upper electrode 104, the pad 106, and the GDP 102 are aligned in a vertical direction along a y-axis. Within the GDP 102, a plenum space 108 is located. A major portion of the plenum space 108 extends along x and z axes to reach a gap 110 formed between portions of the pad 106. The z-axis is perpendicular to the x-axis and to the y-axis and the y-axis is perpendicular to the x-axis. Also, within the upper electrode 104, tubular spaces 112, 114, and 116 are formed. The tubular spaces 112, 114, 116 are a part of a set 118 of holes.

[0027] One or more process gases, such as a fluorine-containing gas, or an oxygencontaining gas, or a combination thereof, are supplied from a gas supply via the plenum space 108, the gap 110, and the tubular spaces 112, 114, 116 to a gap below the showerhead 100 for processing a substrate, such as semiconductor wafer.

[0028] Figure 2 is a diagram of an embodiment of a system 200 to illustrate multiple zones of the GDP 102. The system 200 includes the GDP 102 and multiple gas supply lines 202, 204, 206, and 208. The zones of the GDP 102 include four zones, such as an inner zone (IZ) 210, a middle-inner zone (MIZ) 212, a middle-outer zone (MOZ) 214, and an outer zone (OZ) 216.

[0029] The inner zone 210 is surrounded by the middle-inner zone 212. The middle- inner zone 212 is surrounded by the middle-outer zone 214, which is surrounded by the outer zone 216. The gas supply line 202 is coupled to the inner zone 210 and the gas supply line 204 is coupled to the middle-inner zone 212. Also, the gas supply line 206 is coupled to the middleouter zone 214 and the gas supply line 208 is coupled to the outer zone 216.

[0030] One or more process gases are supplied via the gas supply line 202 to the inner zone 210. Also, one or more process gases are supplied via the gas supply line 204 to the middle-inner zone 212 and one or more process gases are supplied via the gas supply line 206 to the middle-outer zone 214. One or more process gases are supplied via the gas supply line 208 to the outer zone 216. For example, the same one or more process gases are supplied via the gassupply lines 202, 204, 206, and 208 to the zones 210, 212, 214, and 216. As another example, a process gas supplied via one of the gas supply lines 202, 204, 206, and 208 is different from a process gas supplied remaining ones of the gas supply lines 202, 204, 206, and 208. To illustrate, a process gas supplied via the gas supply line 202 to the inner zone 210 is different from a process gas supplied via the gas supply line 204 to the middle-inner zone 212.

[0031] In one embodiment, the GDP 102 includes any other number of zones, such as two zones or five zones or a single zone.

[0032] Figure 3 is a diagram of an embodiment of a system 300 to illustrate a fractal feature of the inner zone 210. The system 300 includes the gas supply line 202 and the inner zone 210. The inner zone 210 includes arms 302, 304, 306, and 308. In some examples, the gas supply line 202 is perpendicular to the arms 302, 304, 306 and 308. The inner zone 210 further includes arms 310, 312, 314, 316, 318, 320, 322, and 324. It should be noted that the arms 310, 312, 314, 316, 310, 320, 322, and 324, are coupled to each other to form a ring-shaped pattern303, such as a circular or a round pattern. As an example, an arm, as used herein, of the GDP 102 includes a surface of the GDP 102 and a plenum space, such as a hole, that is surrounded lengthwise by the surface. The plenum space is an example of the plenum space 108 (Figure 1). To illustrate, the arm 302 includes a tube formed by a surface of the GDP 102 and a plenum space that is located inside the tube. As another illustration, the arm includes one or more bends in the arm. As yet another illustration, the arm is formed by two or more sub-arms that are connected to each other.

[0033] The gas supply line 202 is coupled to, such as connected to, the arms 302,304, 306, and 308, at a point 326. As used herein, examples of a point between two objects, include a connection between the two objects, such as one or more connectors coupling the two objects, a weld between the two objects, an integration of the two objects, or a bond formed between the two objects by melting and then solidifying the bond. An example of the integration of the two objects includes forming a bend, such as an acute angle or a right angle or an obtuse angle, within a single object to form the two objects. In the example, the two objects are coupled to, such as integrated with, each other at the bend. Examples of the two objects include a gas supply line and an arm of the GDP 102 or an arm of the GDP 102 and a location of the pad 106 or a location of the pad 106 and an arm of the upper electrode 104 or a first arm of the GDP 102 and a second arm of the GDP 102. The second arm of the GPD 102 is coupled to the first arm of the GDP 102. Illustrations of locations of the pad 106 are provided below.

[0034] The point 326 is sometimes referred to herein as an input of the inner zone 210. The arms 302, 304, 306, and 308 extend in different directions from the point 326. For example, the arm 302 extends from the point 326 in a first direction and the arm 306 extendsfrom the point 326 and a second direction, and the first direction is opposite to the second direction. Further, in the example, the arm 304 extends from the point 326 in a third direction and the arm 308 extends from the point 326 and a fourth direction, and the third direction is opposite to the fourth direction. Each of the arms 302, 304, 306, and 308 extends towards a circumferential edge region of the showerhead 100. The point 326 is located in a central region of the showerhead 100 and the central region is exclusive of the circumferential edge region.

[0035] It should be noted that an angle between any two arms, such as the arms 302 and 304 or the arms 304 and 306 or the arms 306 and 308 or the arms 302 and 312 or the arms 304 and 316, of the inner zone 210 that are coupled to each other at a point varies. For example, an angle between the arms 302 and 304 is 90 degrees to form a right angle. As another example, an angle between the arms 302 and 304 is other than 90 degrees, such as acute angle or an obtuse angle. To illustrate, an angle between the arms 302 and 304 is 75 degrees or 87 degrees or 94 degrees or 105 degrees.

[0036] It should further be noted that two arms, such as the arms 302 and 304 or the arms 304 and 306 or the arms 306 and 308 or the arms 302 and 312 or the arms 304 and 316, of the inner zone 210 that are coupled to each other at a point lie in the same horizontal plane or in different horizontal planes. For example, the arms 302 and 304 lie in the same horizontal plane. As another example, the arm 312 lies in a horizontal plane below the arm 302. To illustrate, the point 328 extends vertically below the arm 302 to couple to the arm 312. A horizontal plane is formed between the x-axis and the z-axis.

[0037] Also, it should be noted that an angle between the gas supply line 202 and any of the arms 302, 304, 306, and 308 varies. For example, an angle between the gas supply line 202 and the arm 302 is 90 degrees. As another example, an angle between the gas supply line 202 and the arm 302 is other than 90 degrees, such as an obtuse angle or an acute angle.

[0038] The arm 302 splits at a point 328, such as via one or more connectors, into the arms 310 and 312. As an example, the arm 302 is coupled via one or more connectors at the point 328 to the arms 310 and 312. In the example, the arm 310 extends in an opposite direction from the point 328 compared to a direction of extension of the arm 312 from the point 328. Similarly, the arm 304 splits at a point 330, such as via one or more connectors, into the arms 314 and 316. For example, the arm 314 is coupled via one or more connectors at the point 330 to the arms 314 and 316. In the example, the arm 314 extends in an opposite direction from the point 330 compared to a direction of extension of the arm 316 from the point 330. Also, the arm 306 splits at a point 332, such as via one or more connectors, into the arms 318 and 320 and the arm 308 splits at a point 334 into the arms 322 and 324. For example, the arm 318 extends in an opposite direction from the point 332 compared to a direction of extension of the arm 320 fromthe point 332. Also, in the example, the arm 322 extends in an opposite direction from the point 334 compared to a direction of extension of the arm 324 from the point 334.

[0039] The arm 310 extends from the point 328 to a point Al l and the arm 312 extends from the point 328 to a point A12. The point Al 1 is located is a direction with respect to the point 328 opposite to a direction in which the point A12 is located with respect to the point 328. Similarly, the arm 314 extends from the point 330 to a point A13 and the arm 316 extends from the point 330 to a point A14. The point A13 is located is a direction with respect to the point 330 opposite to a direction in which the point A14 is located with respect to the point 330.

[0040] Also, the arm 318 extends from the point 332 to a point Al 5 and the arm 320 extends from the point 332 to a point A16. The point A15 is located is a direction with respect to the point 332 opposite to a direction in which the point A16 is located with respect to the point 332. The arm 322 extends from the point 334 to a point Al 7 and the arm 324 extends from the point 334 to a point Al 8. The point Al 8 is located is a direction with respect to the point 334 opposite to a direction in which the point A17 is located with respect to the point 334. The points Al l through Al 8 extend along a circumference of the GDP 102 to form a circumference of the inner zone 210.

[0041] The inner zone 210 extends radially and circumferentially from the point 326 to the points Al 1 through A18. For example, the arm 302 of the GDP 102 extends radially from the point 326 to the point 328, the arm 310 of the GDP 102 extends circumferentially from the point 328 to the point Al l, and the arm 312 of the GDP 102 extends circumferentially from the point 328 to the point A12. Similarly, the arm 304 of the GDP 102 extends radially from the point 326 to the point 330, the arm 314 of the GDP 102 extends circumferentially from the point 330 to the point A13, and the arm 316 of the GDP 102 extends circumferentially from the point 330 to the point A14. The arm 306 of the GDP 102 extends radially from the point 326 to the point 332, the arm 318 of the GDP 102 extends circumferentially from the point 332 to the point Al 5, and the arm 320 of the GDP 102 extends circumferentially from the point 332 to the point A16. The arm 308 of the GDP 102 extends radially from the point 326 to the point 334, the arm 322 of the GDP 102 extends circumferentially from the point 334 to the point A17, and the arm 324 of the GDP 102 extends circumferentially from the point 334 to the point A18.

[0042] At each of the points Al 1 through Al 8, the GDP 102 is coupled to an arm of pad 106 (Figure 1) that is coupled to the upper electrode 104 (Figure 1). For example, the GDP 102 is coupled at the point Al l to an arm Bl l, which includes a first gap in the pad 106. As another example, the GDP 102 is coupled at the point A12 to an arm B12, which includes a second gap in the pad 106, and the GDP 102 is coupled at the point A13 to an arm B13, which includes a third gap in the pad 106. Also, the GDP 102 is coupled at the point A14 to an armB14, which includes a fourth gap in the pad 106, and the GDP 102 is coupled at the point A15 to an arm Bl 5, which includes a fifth gap in the pad 106. The GDP 102 is coupled at the point Al 6 to an arm Bl 6, which includes a sixth gap in the pad 106, and the GDP 102 is coupled at the point Al 7 to an arm Bl 7, which includes a seventh gap in the pad 106. The GDP 102 is coupled at the point Al 8 to an arm Bl 86, which includes an eighth gap in the pad 106. Each of the first through eighth gaps is an example of the gap 110 (Figure 1). The points Al l through Al 8 are sometimes referred to herein as outputs of the inner zone 210.

[0043] As an example, an arm, as used herein, of the pad 106 includes a surface of the thermal conductive layer of the pad 106 and a gap, such as a hole, that is surrounded lengthwise by the surface. The gap is an example of the gap 110. To illustrate, the arm Bl l includes a tube formed by a surface of the thermal conductive layer of the pad 106 and a gap that is located inside the tube.

[0044] Each arm of the pad 106 is coupled at a location to multiple arms of the upper electrode 104. For example, the arm Bl 1 is coupled at a location 336 to arms Cl 1, C12, and C13 of the upper electrode 104. Also, as illustrated in a zoom-in view 301, the arm B12 is coupled at a location 338 to arms C14, C15, and C16 of the upper electrode 104. In a similar manner, the remaining arms B13 through B18 are coupled at additional locations to arms of the upper electrode 104. To illustrate, the locations of the upper electrode 104 at which the arms Bl l through B18 are coupled extend along a circumference of the upper electrode 104 to form a circumference that is associated with the inner zone 210. As an example, an arm, as used herein, of the upper electrode 104 includes a surface of the upper electrode 104 and a tubular space, such as a hole, that is surrounded lengthwise by the surface. The tubular space within the arm Cl l is an example of the tubular space 112 (Figure 1), the tubular space within the arm C12 is an example of the tubular space 114 (Figure 1), and the tubular space within the arm C13 is an example of the tubular space 116 (Figure 1). To illustrate, the arm Cl l includes a tube formed by a surface of the upper electrode 104 and a tubular space that is located inside the tube.

[0045] It should be noted that an angle formed between an arm of the pad 106, and an arm of the upper electrode 104 varies. For example, an angle between the arm 310 and the arm Bl l is 90 degrees. As another example, an angle between the arm 310 and the arm Bl l is other than 90 degrees, such as an obtuse angle or an acute angle.

[0046] Uniformity in applying the one or more process gases is achieved by the fractal feature of the showerhead 100 (Figure 1). For example, a first path having a first distance from the point 326 to the point Al 1 is within a predetermined range from, such as substantially equal to, a second path having a second distance from the point 326 to the point Al 2. As used herein, as an example, a distance is substantially equal to another distance when the distance iswithin 15% from the other distance. To further illustrate, the first distance is greater or less than the second distance by 15% to be substantially equal to the second distance. As another further illustration, the first distance is equal to the second distance. In the example, the first path extends from the point 326 via the arm 302, the point 328, and the arm 310 to the point Al l. Further, in the example, the second path extends from the point 326 via the arm 302, the point 328, and the arm 312 to the point A12.

[0047] Also, in the example, a third path having a third distance from the point 326 to the point Al 3 is within the predetermined range from, such as substantially equal to, a fourth path having a fourth distance from the point 326 to the point Al 4. To illustrate, the third distance is within 15% from the fourth distance to be substantially equal to the fourth distance. As an illustration, the third distance is equal to the fourth distance. As another illustration, the third distance is greater than or less than the fourth distance by at most 15%. In the example, the third path extends from the point 326 via the arm 304, the point 330, and the arm 314 to the point A13. Further, in the example, the fourth path extends from the point 326 via the arm 304, the point 330, and the arm 316 to the point A14. Also, in the example, the third distance is substantially equal to the second distance. As an illustration, the third distance is equal to the second distance. As another illustration, the third distance is greater than or less than the second distance by 15%.

[0048] Further, in the example, a fifth path having a fifth distance from the point 326 to the point Al 5 is within the predetermined range from, such as substantially equal to, a sixth path having a sixth distance from the point 326 to the point Al 6. To illustrate, the fifth distance is within 15% from the sixth distance. To further illustrate, the fifth distance is equal to the sixth distance. As another further illustration, the fifth distance is greater than or less than the sixth distance by 15%. In the example, the fifth path extends from the point 326 via the arm 306, the point 332, and the arm 318 to the point A15. Further, in the example, the sixth path extends from the point 326 via the arm 306, the point 332, and the arm 320 to the point A16. Also, in the example, the fifth distance is substantially equal to the third distance. As an illustration, the fifth distance is equal to the third distance. As another illustration, the fifth distance is greater than or less than the third distance by 15%.

[0049] In the example, a seventh path having a seventh distance from the point 326 to the point Al 7 is within the predetermined range from, such as substantially equal to, an eighth path having an eighth distance from the point 326 to the point Al 8. To illustrate, the seventh distance is within 15% from the eighth distance. To further illustrate, the seventh distance is equal to the eighth distance. As another further illustration, the seventh distance is greater than or less than the eighth distance by 15%. In the example, the seventh path extends from the point326 via the arm 308, the point 334, and the arm 322 to the point A17. Further, in the example, the eighth path extends from the point 326 via the arm 308, the point 334, and the arm 324 to the point Al 8. Also, in the example, the seventh distance is substantially equal to the fifth distance.

[0050] In the example, when the first through eighth distances are within the predetermined range from, such as substantially equal to, each other, the uniformity in application of the one or more process gases is achieved to achieve uniformity in processing of the substrate across a portion of the substrate below the inner zone 210. For example, when fast switching from a first process gas to a second process gas in the gas supply line 202 occurs, the fractal feature, such as the substantially equal first through eighth distances, facilitate achieving uniformity in a combination of the first and second process gases while the first process gases being switched with the second process gas. To further illustrate, during the switching, there is a transition from application of 100% of the first process gas from the gas supply line 202 via the inner zone 210 (Figure 2) to 100% of the second process gas via the inner zone 210. The first and second process gases are supplied via the inner zone 210 to the gap below the showerhead 100 (Figure 1). During a first time period of the transition, because of the fractal feature, 90% of the first process gas and 10% of the second process gases is transferred via the inner zone 210 to apply the percentages of the first and second process gases to the gap below the showerhead 100. The first time period is immediately followed by a second time period. Within the second time period, because of the fractal feature, 70% of the first process gas and 30% of the second process gases is transferred via the inner zone 210 to apply the percentages of the first and second process gases to the gap below the showerhead 100. The second time period is immediately followed by a third time period. Within the third time period, because of the fractal feature, 30% of the first process gas and 70% of the second process gases is transferred via the inner zone 210 to apply the percentages of the first and second process gases to the gap below the showerhead 100. In this manner, the application of the first process gas to the gap below the showerhead 100 transitions to the application of the second process gas to the gap below the showerhead 100 in a uniform manner. The uniformity in application of the first and second process gases during the switching facilitates achieving uniform gas density on a top surface of the substrate to process the substrate in the uniform manner. In the example, the first through eighth paths include the point 326 and form the inner zone 210.

[0051] It should be noted that in an embodiment, to achieve the first through eighth distances that are within the predetermined range from each other, a distance between a first point at which an arm of the inner zone 210 of the GDP 102 splits into two or more arms and a second point at which one of the two or more arms is coupled to an arm of the pad 106 is equal to a distance between the first point and a third point at which another one of the two or morearms is coupled to another arm of the pad 106. For example, a distance between the point 328 and the point Al l is equal to a distance between the point 328 and the point A12. As another example, a distance between the point 330 and the point A13 is equal to a distance between the point 330 and the point Al 4.

[0052] Also, the one or more process gases flow from the gas supply line 202 via the first through eighth paths of the inner zone 210 to the arms Bl l through Bl 8. The one or more process gases further flow from the arms Bl l through B18 to arms of the upper electrode 104 and flow from the arms of the upper electrode 104 to reach the gap between the upper electrode 105 and an electrostatic chuck. The electrostatic chuck is located below the upper electrode 105. The gap between the upper electrode 105 and an electrostatic chuck is the gap below the showerhead 100.

[0053] It should be noted that a number of arms of the upper electrode 104 extending from a location that is coupled to the pad 106 is equal to a number of arms of the upper electrode extending from any other location that is coupled to the pad 106 and the upper electrode 104. The pad 106 is coupled to the inner zone 210. For example, the arms C14 through C16 are equal in number to a number of arms at any other locations coupled to the pad 106 and the upper electrode 104.

[0054] In an embodiment, a number of arms of the upper electrode 104 that are coupled to an arm of the pad 106 at a location is different from that illustrated in Figure 3. The pad 106 is coupled to the inner zone 210. For example, instead of the arms C14 through C16, the upper electrode 104 includes two arms or four arms.

[0055] In some embodiments, a point is sometimes referred to herein as a joint.

[0056] Figure 4A is an isometric view of an embodiment of a system 400 to illustrate the middle-inner zone 212 of the GDP 102. Figure 4B is a zoom-in view of a portion of the system 400 of Figure 4A and Figure 4C is a zoom-in view of another portion of the system 400 of Figure 4 A.

[0057] With reference to Figure 4A, the system 400 includes the gas supply line 204 and the middle-inner zone 212. The middle-inner zone 212 is divided into and includes multiple sections 402, 404, 406, and 408. With reference to Figure 4B, the gas supply line 204 is coupled at a point 410 to arms 412 and 414. The point 410 is sometimes referred to herein as an input of the middle-inner zone 212. The arm 412 extends from the point 410 to a point 416 and the arm 414 extends from the point 410 to a point 418. For example, the arm 412 extends in a different direction, such as an opposite direction, compared to a direction of extension of the arm 414.

[0058] At the point 416, the arm 412 splits into arms 420 and 422. For example, at the point 416, the arm 412 is coupled to the arms 420 and 422 of the middle-inner zone 212. Toillustrate, the arms 420 and 422 extend in different directions, such as opposite directions, with respect each other.

[0059] The arm 420 extends from the point 416 to a point 424. At the point 424, the arm 420 splits into arms 426 and 428. For example, the arm 420 is coupled to arms 426 and 428 at the point 424. To illustrate, the arm 426 extends in a different direction, such as opposite direction, compared to a direction of extension of the arm 428. The arm 426 extends from the point 424 to a point 430 and the arm 428 extension from the point 424 to a point 432.

[0060] At the point 430, the arm 426 splits into arms 434, 436, 438, and 440. For example, at the point 430, the arm 426 is coupled to the arms 434, 436, 438, and 440. The arms 434, 436, 438, and 440 extend from the point 430 in different directions. For example, a direction of extension of the arm 434 is different, such as opposite to, a direction of extension of the arm 438. Also, a direction of extension of the arm 436 is different, such as opposite to, a direction of extension of the arm 440.

[0061] At the point 432, the arm 428 splits into arms 442, 444, 446, and 448. For example, at the point 432, the arm 428 is coupled to arms 442, 444, 446, and 448. The arms 442, 444, 446, and 448 extend from the point 432 in different directions. For example, a direction of extension of the arm 442 is different, such as opposite to, a direction of extension of the arm 446. Also, a direction of extension of the arm 444 is different, such as opposite to, a direction of extension of the arm 448. It should be noted that the arms 412, 414, 420, 422, 426, 428, 434, 436, 438, 440, 442, 444, 446, and 448 are parts of the middle-inner zone 212.

[0062] The arm 440 is coupled at a point Dl l to an arm El l and the arm 448 is coupled at a point D12 to an arm E12. Also, the arm 434 is coupled at a point D13 to an arm E13 and the arm 438 is coupled at a point D14 to an arm E14. The arm 442 is coupled at a point D15 to an arm E15 and the arm 446 is coupled at a point D16 to an arm E16. Moreover, the arm 436 is coupled at a point D17 to an arm El 7 and the arm 446 is coupled at a point DI 8 to an arm E18. The points Dl l through D18 and additional points, similar to points Dl l through D18, of the remaining sections 404, 406, and 408 are sometimes referred to herein as outputs of the middle-inner zone 212. The points Dl l through D18 and the additional points of the remaining sections 404, 406, and 408 extend along a circumference of the GDP 102 to form a circumference of the middle-inner zone 212. The additional points of the remaining sections 404, 406, and 408 are located at an interface between the middle-inner zone 212 and the pad 106.

[0063] The arms El l through E18 are parts of the pad 106 (Figure 1). For example, each arm El l through El 8 includes a surface of the thermal conductive layer of the pad 106 anda gap, such as a hole, in the pad 106. In the example, the gap is bounded by the surface. To illustrate, each arm El 1 through El 8 is a tube through which the gap extends.

[0064] Each arm of the pad 106 is coupled at a location to multiple arms of the upper electrode 104. For example, as illustrated in the zoom-in view 401, the arm El l is coupled at a location 403 to arms Fl 1, F12, and F13 of the upper electrode 104. Similarly, the arm E12 is coupled at a location to arms of the upper electrode 104, the arm E13 is coupled at a location to arms of the upper electrode 104, El 4 is coupled at a location to arms of the upper electrode 104, the arm E15 is coupled at a location to arms of the upper electrode 104, the arm E16 is coupled at a location to arms of the upper electrode 104, the arm El 7 is coupled at a location to arms of the upper electrode 104, and the arm El 8 is coupled at a location to arms of the upper electrode 104. In a similar manner, remaining arms of the pad 106 are coupled at additional locations to arms of the upper electrode 104. To illustrate, the locations of the upper electrode 104 at which the arms El l through El 8 and the remaining arms of the pad 106 are coupled extend along a circumference of the upper electrode 104 to form a circumference that is associated with the middle-inner zone 212.

[0065] The tubular space within the arm Fl l is an example of the tubular space 112 (Figure 1), the tubular space within the arm F12 is an example of the tubular space 114 (Figure 1), and the tubular space within the arm F13 is an example of the tubular space 116 (Figure 1). To illustrate, the arm Fl l includes a tube formed by a surface of the upper electrode 104 and a tubular space that is located inside the tube.

[0066] The arms 420 and 422, the point 424, the arms 426 and 428, the points 430 and 432, and the arms 434, 436, 438, 440, 442, 444, 446, and 448 are parts of the section 402. Each section 404, 406, and 408 has the same structure as that the section 402. For example, the arm 422 of the section 404 is coupled at a point to two arms, such as a first arm and a second arm, of the section 404. The first arm is coupled at a point to a first set of four arms of the section 404 and the second arm is coupled at a point to a second set of four arms of the section 404. Each arm of the first set is coupled via an arm of the pad 106 to four arms of the upper electrode 104. Similarly, in the example, each arm of the second set via an arm of the pad 106 to four arms of the upper electrode 104.

[0067] The middle-inner zone 212 provides a fractal feature. For example, a first path has a first distance from the point 410 via the arm 412, the point 416, the arm 420, the point 424, the arm 426, the point 430, and the arm 434 to the point D13. Further, in the example, a second path has a second distance from the point 410 via the arm 412, the point 416, the arm 420, the arm 426, the point 430, and the arm 436 to the point D17. Also in the example, a third path has a third distance from the point 410 via the arm 412, the point 416, the arm 420, the arm 426, thepoint 430, and the arm 438 to the point DI 4. Also, a fourth path has a fourth distance from the point 410 via the arm 412, the point 416, the arm 420, the arm 426, the point 430, and the arm 440 to the point Dl l. In a similar manner, the section 402 includes fifth, sixth, seventh, and eighth paths from the point 410 to the points D12, D15, D16, and D18. In the example, the first through eighth distances are within a predetermined range from each other, such as substantially equal to each other. To illustrate, any of the first through seventh distances has a value that is within 15% from a value of the eighth distance. Further, in a similar manner, the section 404 includes ninth, tenth, eleventh, twelfth, thirteenth, fourteenth, fifteenth, and sixteenth paths. The ninth path has a ninth distance, the tenth path has a tenth distance, the eleventh path has an eleventh distance, the twelfth path has a twelfth distance, the thirteenth path has a thirteenth distance, the fourteenth path has a fourteenth distance, the fifteenth path has a fifteenth distance, and the sixteenth path has a sixteenth distance. In the example, the ninth through sixteenth distances are within a predetermined range from each other, such as substantially equal to each other. To illustrate, any of the sixteenth through fifteenth distances has a value that is within 15% from a value of the sixteenth distance.

[0068] Also, similarly, with reference to Figure 4C, the section 406 includes seventeenth, eighteenth, nineteenth, twentieth, twenty-first, twenty-second, twenty-third, and twenty-fourth paths. The seventeenth path has a seventeenth distance, the eighteenth path has an eighteenth distance, the nineteenth path has a nineteenth distance, the twentieth path has a twentieth distance, the twenty-first path has a twenty-first distance, the twenty-second path has a twenty-second distance, the twenty-third path has a twenty-third distance, and the twenty-fourth path has a twenty-fourth distance. In the example, the seventeenth through twenty-fourth distances are within a predetermined range from each other, such as substantially equal to each other. To illustrate, any of the seventeenth through twenty -third distances has a value that is within 15% from a value of the twenty -fourth distance.

[0069] Also, the section 408 includes twenty-fifth, twenty-sixth, twenty-seventh, twenty-eighth, twenty-ninth, thirtieth, thirty-first, and thirty-second paths. The twenty-fifth path has a twenty-fifth distance, the twenty-sixth path has a twenty-sixth distance, the twenty-seventh path has a twenty-seventh distance, the twenty-eighth path has a twenty-eighth distance, the twenty-ninth path has a twenty-ninth distance, the thirtieth path has a thirtieth distance, the thirty -first path has a thirty-first distance, and the thirty-second path has a thirty-second distance. In the example, the twenty-fifth through thirty-second distances are within a predetermined range from each other, such as substantially equal to each other. To illustrate, any of the twentyfifth through thirty-first distances has a value that is within 15% from a value of the thirty- second distance.

[0070] Continuing with the example, the first distance is within the predetermined range from, such as substantially equal to, any of the fifth through thirty-second distances to achieve uniformity in a flow of the one or more process gases that are supplied from the gas supply line 204 to the middle-inner zone 212. In the example, the first through thirty-second paths of the middle-inner zone 212 include the point 410 and form the middle-inner zone 212.

[0071] It should be noted that in an embodiment, to achieve the first through thirty- second distances of the middle-inner zone 212, a distance between a first point at which an arm of the middle-inner zone 212 of the GDP 102 splits into two or more arms and a second point at which one of the two or more arms is coupled to another arm of the middle-inner zone 212 or coupled to an arm of the pad 106 is equal to a distance between the first point and a third point at which another one of the two or more arms is coupled to yet another arm of the middle-inner zone 212 or coupled to another arm of the pad 106. For example, a distance between the point 410 and the point 416 is equal to a distance between the point 410 and the point 418. In the example, a first arm of the middle-inner zone 212 extends from the point 410 to the point 416 and a second arm of the middle-inner zone 212 extends from the point 410 to the point 418. As another example, a distance between the point 430 and the point Dl l is equal to a distance between the point 430 and the point D13. In the example, a first arm of the middle-inner zone 212 extends from the point 430 to the point Dl l and a second arm of the middle-inner zone 212 extends from the point 430 to the point D13.

[0072] It should be noted that an angle between any two arms, such as the arms 412 and 420 or the arms 420 and 426 or the arms 426 and 436, of the middle-inner zone 212 of the GDP 102 that are coupled at a point varies. For example, an angle between the arms 412 and 420 is 90 degrees to form a right angle. As another example, an angle between the arms 412 and 420 is other than 90 degrees, such as acute angle or an obtuse angle. To illustrate, an angle between the arms 412 and 420 is 75 degrees or 87 degrees or 94 degrees or 105 degrees.

[0073] It should further be noted that two arms, such as the arms 412 and 420 or the arms 420 and 426 or the arms 426 and 436, of the middle-inner zone 212 that are coupled to each other at a point lie in the same horizontal plane or in different horizontal planes. For example, the arms 420 and 426 lie in the same horizontal plane. As another example, the arm 436 lies in a horizontal plane below the arm 426. To illustrate, the point 430 extends vertically below the arm 426 to couple to the arm 436.

[0074] One or more process gases that are received from the gas supply line 204, are transferred via the first through thirty-second paths of the middle-inner zone 212 via the arms of the pad 106 that are coupled to the middle-inner zone 212 and the arms of the upper electrode 104 that are coupled to the arms of the pad 106 to the gap between the upper electrode 104 andthe electrostatic chuck. When the first through thirty-second distances of the middle-inner zone 212 are within the predetermined range from, such as substantially equal to each other, the uniformity in application of the one or more process gases is achieved across a portion of the substrate below the middle-inner zone 212 to achieve uniformity processing of the substrate.

[0075] With reference back to Figure 4A, multiple ring-shaped patterns 450, 452, and 454 are formed by arms of the middle-inner zone 212. For example, the ring-shaped pattern 450 includes the points Dl l and D12, the ring-shaped pattern 452 includes the points 430 and 432 (Figure 4B), and the ring-shaped pattern 454 includes the points D17 and DI 8 (Figure 4B). The ring-shaped patterns 450, 452, and 454 have a greater diameter than a diameter of the ringshaped pattern 303 (Figure 3) of the inner zone 210. Also, a diameter of the ring-shaped pattern 452 is greater than a diameter of the ring-shaped pattern 450 and a diameter of the ring-shaped pattern 454 is greater than the diameter of the ring-shaped pattern 452.

[0076] It should be noted that number of arms of the upper electrode 104 extending from a location that is coupled to the pad 106 is equal to the number of arms of the upper electrode 104 extending from any other location that is coupled to the pad 106. The pad 106 is coupled to the inner zone 210. For example, the three arms Fl 1 through F13 are equal in number to a number of arms at any other locations coupled to the pad 106.

[0077] In an embodiment, a number of arms of the upper electrode 104 that are coupled to an arm of the pad 106 at a location is different from that illustrated in Figures 4A-4C. The pad 106 is coupled to the mid-inner zone 212. For example, instead of the arms Fl 1 through Fl 3, the upper electrode 104 includes two arms or four arms coupled to the location 403 (Figure 4B).

[0078] Figure 5A is an isometric view of an embodiment of a system 500 to illustrate a fractal feature of the middle-outer zone 214. Figure 5B is a zoom-in view of a portion of the middle-outer zone 214. Figure 5C is a zoom-in view of another portion of the middle-outer zone 214. The system 500 includes the gas supply line 206 and the middle-outer zone 214. The gas supply line 206 is coupled to arms 502 and 504 of the GDP 102 at a point 506. The point 506 is sometimes referred to herein as an input of the middle-outer zone 214. The arm 502 extends from the point 506 in a different direction, such as an opposite direction, to the direction of extension of the arm 504 from the point 506.

[0079] The arm 502 extends from the point 506 to a point 508. Similarly, the arm 504 extends from the point 506 to a point 510. At the point 508, the arm 502 splits into arms 512 and 514. For example, the arm 502 is coupled to arms 512 and 514 at the point 508. To illustrate, the arm 512 extends from the point 508 in a different direction, such as an opposite direction, to the direction of extension of the arm 514 from the point 508. Similarly, at the point 510, the arm504 splits into arms 516 and 518. For example, at the point 510, the arm 504 is coupled to arms 516 and 518. To illustrate, the arm 516 extends from the point 510 in a different direction, such as an opposite direction, to the direction of extension of the arm 518 from the point 510.

[0080] The arm 512 extends from the point 508 to a point 520. At the point 520, the arm 512 splits into an arm 522 and an arm 524. For example, at the point 520, the arm 512 is coupled to the arms 522 and 524. The arm 522 extends from the point 520 to a point 526 and the arm 524 extends from the point 520 to a point 528. At the point 528, the arm 524 splits into arms Fl l and F12. For example, at the point 528, the arm 524 is coupled to arms Fl l and F12. The arm Fl l extends from the point 528 in a different direction, such as opposite direction, compared to the direction of extension of the arm F12. The arm Fl l extends from the point 528 to a point 530 and the arm F12 extends from the point 528 to a point 532. The arm Fl l splits into arms 534 and 536 at the point 530. For example, the arm Fl l is coupled at the point 530 to arms 534 and 536. To illustrate, the arm 534 extends in a different direction, such as an opposite direction, compared to a direction of extension of the arm 536.

[0081] The arm 534 extends from the point 530 to a point Gi l and the arm 536 extends from the point 530 to a point G12. At the point Gi l, the arm 534 is coupled to an arm Hl 1 of the pad 106 (Figure 1) and the arm Hl 1 is coupled to arms JI 1, J12, and J13 of the upper electrode 104 at a location Il l. As an example, the arm Hl 1 extends vertically, along the y-axis, from the point G11. Similarly, at the point G12, the arm 536 is coupled to an arm H12 of the pad 106 (Figure 1) and the arm H12 is coupled to arms J14, J15, and J16 of the upper electrode 104 at a location 112.

[0082] With reference to Figure 5B, the arm F12 splits at the point 532 into arms 538 and 540. For example, the arm F12 is coupled at the point 532 to arms 538 and 540. To illustrate, the arm 538 extends in a different direction, such as an opposite direction, compared to a direction of extension of the arm 540. The arm 538 extends from the point 532 to a point G13 and the arm 540 extends from the point 532 to a point G14. At the point G14, the arm 538 is coupled to an arm Hl 3 of the pad 106 and the arm Hl 3 is coupled to arms JI 7, JI 8, and JI 9 of the upper electrode 104 at a location 113. As an example, the arm H13 extends vertically, along the y-axis, from the point G13. Similarly, at the point G14, the arm 540 is coupled to an arm H14 of the pad 106 and the arm H14 is coupled to arms J20, J21, and J22 of the upper electrode 104 at a location 114.

[0083] With reference to Figure 5C, at the point 526, the arm 522 splits into an arm F13 and an arm F14. For example, at the point 526, the arm 522 is coupled to the arms F13 and F14. The arm F13 extends from the point 526 in a different direction, such as opposite direction, compared to the direction of extension of the arm F14 from the point 526. The arm F13 extendsfrom the point 526 to a point 542 and the arm F14 extends from the point 526 to a point 544. The arm F13 splits into arms 546 and 548 at the point 542. For example, the arm F13 is coupled at the point 542 to the arms 546 and 548. To illustrate, the arm 546 extends in a different direction, such as an opposite direction, compared to a direction of extension of the arm 548.

[0084] The arm 546 extends from the point 542 to a point G15 and the arm 548 extends from the point 542 to a point G16. At the point G15, the arm 546 is coupled to an arm H15 of the pad 106 and the arm H15 is coupled to arms J23, J24, and J25 of the upper electrode 104 at a location 115. As an example, the arm H15 extends vertically, along the y-axis, from the point G15. Similarly, at the point G16, the arm 548 is coupled to an arm Hl 6 of the pad 106 and the arm H16 is coupled to arms J26, J27, and J28 of the upper electrode 104 at a location 116.

[0085] The arm F14 splits at the point 544 into arms 550 and 552. For example, the arm F14 is coupled at the point 544 to the arms 550 and 552. To illustrate, the arm 552 extends in a different direction, such as an opposite direction, compared to a direction of extension of the arm 550. The arm 550 extends from the point 544 to a point G17 and the arm 552 extends from the point 544 to a point G18. At the point G17, the arm 550 is coupled to an arm H17 of the pad 106 and the arm H17 is coupled to arms J29, J30, and J31 of the upper electrode 104 at a location 117. As an example, the arm H17 extends vertically, along the y-axis, from the point G17. Similarly, at the point G18, the arm 552 is coupled to an arm H18 of the pad 106 and the arm H18 is coupled to arms J32, J33, and J34 of the upper electrode 104 at a location 118.

[0086] In a similar manner, the middle-outer zone 214 includes additional points to which remaining arms of the pad 106 are coupled. Also, the remaining arms of the pad 106 are coupled at additional locations to arms of the upper electrode 104. To illustrate, the locations of the upper electrode 104 at which the arms Hl l through Hl 8 and the remaining arms of the pad 106 are coupled extend along a circumference of the upper electrode 104 to form a circumference that is associated with the mid-outer zone 214. The points Gi l through G18 and the additional points are sometimes referred to herein as outputs of the middle-outer zone 214. The points Gi l through G18 and the additional points of the middle-outer zone 212 extend along a circumference of the GDP 102 to form a circumference of the middle-outer zone 212. The additional points of the middle-outer zone 214 are located at an interface between the middle-inner zone 212 and the pad 106.

[0087] With reference back to Figure 5A, the middle-outer zone 214 is divided into four sections, such as a first section, a second section, a third section, and a fourth section. The first section extends from the point 506 to the points Gi l through G18. For example, the first section includes a first path having a first distance from the point 506 via the arm 502, the point 508, the arm 512, the point 520, the arm 522, the point 526, the arm F13 (Figure 5C), the point542 (Figure 5C), and the arm 546 (Figure 5C) to the point G15 (Figure 5C). The first section also includes a second path having a second distance from the point 506 via the arm 502, the point 508, the arm 512, the point 520, the arm 522, the point 526, the arm F13 (Figure 5C), the point 542 (Figure 5C), and the arm 548 (Figure 5C) to the point G16 (Figure 5C). The first section further includes a third path having a third distance from the point 506 via the arm 502, the point 508, the arm 512, the point 520, the arm 522, the point 526, the arm F14 (Figure 5C), the point 544 (Figure 5C), and the arm 550 (Figure 5C) to the point G17 (Figure 5C). The first section includes a fourth path having a fourth distance from the point 506 via the arm 502, the point 508, the arm 512, the point 520, the arm 522, the point 526, the arm F14 (Figure 5C), the point 544 (Figure 5C), and the arm 552 (Figure 5C) to the point G18 (Figure 5C).

[0088] Continuing with the example, the first section includes a fifth path having a fifth distance from the point 506 via the arm 502, the point 508, the arm 512, the point 520, the arm 524, the point 528, the arm Fl 1, the point 530, and the arm 534 to the point Gi l. The first section also includes a sixth path having a sixth distance from the point 506 via the arm 502, the point 508, the arm 512, the point 520, the arm 524, the point 528, the arm Fl 1, the point 530, and the arm 536 to the point G12. The first section further includes a seventh path having a seventh distance from the point 506 via the arm 502, the point 508, the arm 512, the point 520, the arm 524, the point 528, the arm F12, the point 532, and the arm 538 (Figure 5B) to the point G13 (Figure 5B). The first section includes an eighth path having an eighth distance from the point 506 via the arm 502, the point 508, the arm 512, the point 520, the arm 524, the point 528, the arm F12, the point 532, and the arm 540 (Figure 5B) to the point G14 (Figure 5B). In the example, the first through eighth paths are within a predetermined range from, such as substantially equal to, each other. For example, the first through eighth distances are substantially of the same magnitude. To illustrate, any of the first through seven distances is within 15% from the eighth distance. As another illustration, the first through eighth distances are equal to each other.

[0089] Similarly, the middle-outer zone 214 has a second section having eight paths, a third section having eight paths, and a fourth section having eight paths. Each of the eight paths in each of the second through fourth sections of the middle-outer zone 214 has eight distances. In the example, the first through eighth paths of each section of the middle-outer zone 214 include the point 506 and form the middle-outer zone 214. The paths of the first through fourth sections of the middle-outer zone 214 are within a predetermined range from, such as substantially equal to, each other to have the fraction feature. The fractal feature facilitates achieving uniformity in a flow of the one or more process gases received from the gas supply line 206 via the middle-outer zone 214, the arms of the pad 106 coupled to the middle-outer zone214, and the arms of the upper electrode 104 coupled to the arms of the pad 106 to the gap between the upper electrode 104 and electrostatic chuck.

[0090] It should be noted that in an embodiment, to achieve distances of the first through eighth paths of each section of the middle-outer zone 214, a distance between a first point at which an arm of the middle-outer zone 214 of the GDP 102 splits into two or more arms and a second point at which one of the two or more arms is coupled to another arm of the middle-outer zone 214 or coupled to an arm of the pad 106 is equal to a distance between the first point and a third point at which another one of the two or more arms is coupled to yet another arm of the middle-outer zone 214 or coupled to another arm of the pad 106. For example, a distance between the point 506 and the point 508 is equal to a distance between the point 506 and the point 510. In the example, a first arm of the middle-outer zone 214 extends from the point 506 to the point 508 and a second arm of the middle-outer zone 214 extends from the point 506 to the point 510. To illustrate, the first arm includes a bend between a horizontally extending portion, along the x-axis, of the first arm and a vertically extending portion, along the y-axis, of the first arm. As another illustration, the first arm includes a first sub-arm and a second sub-arm that are connected with each other. The first sub-arm horizontally extends along the x- axis and the second sub-arm vertically extends along the y-axis. As another example, a distance between the point 520 and the point 526 is equal to a distance between the point 520 and the point 528. In the example, a first arm of the middle-inner zone 212 extends from the point 520 to the point 526 and a second arm of the middle-inner zone 212 extends from the point 520 to the point 526. As yet another example, a distance between the points 532 and G13 is equal to a distance between the points 532 and G14.

[0091] It should be noted that an angle between any two arms, such as the arms 502 and 512 or the arms 512 and 522 or the arms 522 and F13 or the arms F13 and 546, of the middle-outer zone 214 of the GDP 102 that are coupled at a point varies. For example, an angle between the arms 502 and 512 is 90 degrees to form a right angle. As another example, an angle between the arms 502 and 512 is other than 90 degrees, such as acute angle or an obtuse angle. To illustrate, an angle between the arms 502 and 512 is 75 degrees or 87 degrees or 94 degrees or 105 degrees.

[0092] It should further be noted that two arms, such as the arms 502 and 512 or the arms 512 and 522 or the arms 522 and F13 or the arms F13 and 546, of the middle-outer zone 214 that are coupled to each other at a point lie in the same horizontal plane or in different horizontal planes. For example, the arms 512 and 514 lie in the same horizontal plane. As another example, the arm 522 lies in a horizontal plane below the arm 512. To illustrate, the point 520 extends vertically below the arm 512 to couple to the arm 522.

[0093] It should be noted that number of arms of the upper electrode 104 extending from a location that is coupled to the pad 106 is equal to the number of arms of the upper electrode 104 extending from any other location that is coupled to the pad 106. The pad 106 is coupled to the middle-outer zone 214. For example, the three arms J17 through J19 extending from the location Il l are equal in number to a number of arms, of the upper electrode 104, extending from any other locations coupled to the pad 106.

[0094] In one embodiment, one or more arms of the pad 106 do not extend vertically from the GDP 102. For example, the arm Hl l extends obliquely or vertically and then horizontally from the point G11.

[0095] In an embodiment, a number of arms of the upper electrode 104 that are coupled to an arm of the pad 106 at a location is different from that illustrated in Figures 5A-5C. The pad 106 is coupled to the middle-outer zone 214. For example, instead of the arms J23 through J25, the upper electrode 104 includes two arms or four arms.

[0096] Figure 6A is an isometric view of an embodiment of a system 600 to illustrate a fractal feature of the outer zone 216. Figure 6B is a zoom-in view of a portion of the outer zone 216. Figure 6C is a zoom-in view of another portion of the outer zone 216. The system 600 includes the gas supply line 208 and the outer zone 216. The gas supply line 208 is coupled to arms 602 and 604 of the GDP 102 at a point 606. The point 606 is sometimes referred to herein as an input of the outer zone 216. The arm 602 extends from the point 606 in a different direction, such as an opposite direction, to the direction of extension of the arm 604 from the point 606.

[0097] The arm 602 extends from the point 606 to a point 608. Similarly, the arm 604 extends from the point 606 to a point 610. At the point 608, the arm 602 splits into arms 612 and 614. For example, the arm 602 is coupled to the arms 612 and 614 at the point 602. To illustrate, the arm 612 extends from the point 608 in a different direction, such as an opposite direction, to the direction of extension of the arm 614 from the point 608. Similarly, at the point 610, the arm 604 splits into arms 616 and 618. For example, the arm 604 is coupled to arms 616 and 618 at the point 610. To illustrate, the arm 616 extends from the point 610 in a different direction, such as an opposite direction, to the direction of extension of the arm 618 from the point 610.

[0098] The arm 612 extends from the point 608 to a point 620. At the point 620, the arm 612 splits into an arm 622 and an arm 624. For example, the arm 612 is coupled to the arm 622 and 624 at the point 620. The arm 622 extends from the point 620 to a point 626 and the arm 624 extends from the point 620 to a point 628. With reference to Figure 6B, at the point 628, the arm 624 splits into arms KI 1 and K12. For example, the arm 624 is coupled to the arms KI 1 andK12 at the point 628. The arm Kl l extends from the point 628 in a different direction, such as opposite direction, compared to the direction of extension of the arm K12. The arm KI 1 extends from the point 628 to a point 630 and the arm K12 extends from the point 628 to a point 632. The arm KI 1 splits into arms 634 and 636 at the point 630. For example, the point 630, the arm Kl l is coupled to the arms 634 and 636. To illustrate, the arm 634 extends in a different direction, such as an opposite direction, compared to a direction of extension of the arm 636.

[0099] The arm 634 extends from the point 630 to a point Li l and the arm 636 extends from the point 630 to a point L12. At the point Li l, the arm 634 is coupled to an arm Ni l of the pad 106 (Figure 1) and the arm Ni l is coupled to arms Mi l, M12, and M13 of the upper electrode 104 at a location 011. As an example, the arm N11 extends vertically, along the y-axis, from the point LI 1. Similarly, at the point L12, the arm 636 is coupled to an arm L12 of the pad 106 and the arm L12 is coupled to arms M14, M15, and M16 of the upper electrode 104 at a location 012.

[0100] The arm K12 splits into arms 638 and 640 at the point 632. For example, the arm K12 is coupled at the point 632 to the arms 638 and 640. For example, the arm 638 extends in a different direction, such as an opposite direction, compared to a direction of extension of the arm 640. The arm 638 extends from the point 632 to a point LI 3 and the arm 640 extends from the point 632 to a point L14. At the point L13, the arm 638 is coupled to an arm N13 of the pad 106 and the arm N13 is coupled to arms M17, M18, and M19 of the upper electrode 104 at a location 013. As an example, the arm N13 extends vertically, along the y-axis, from the point L13. Similarly, at the point L14, the arm 640 is coupled to an arm N14 of the pad 106 and the arm N14 is coupled to arms M20, M21, and M22 of the upper electrode 104 at a location 014.

[0101] With reference to Figure 6C, at the point 626, the arm 624 splits into arms K13 and K14. For example, the arm 624 is coupled to arms K13 and K14 at the point 626. The arm KI 3 extends from the point 626 in a different direction, such as opposite direction, compared to the direction of extension of the arm K14. The arm K13 extends from the point 626 to a point 642 and the arm K14 extends from the point 626 to a point 644. The arm KI 3 splits into arms 646 and 648 at the point 642. For example, the arm K13 is coupled at the point 642 to the arms 646 and 648. To illustrate, the arm 646 extends in a different direction, such as an opposite direction, compared to a direction of extension of the arm 648.

[0102] The arm 646 extends from the point 642 to a point LI 5 and the arm 648 extends from the point 642 to a point LI 6. At the point LI 5, the arm 646 is coupled to an arm N15 of the pad 106 and the arm N15 is coupled to arms M23, M24, and M25 of the upper electrode 104 at a location 015. As an example, the arm N15 extends vertically, along the y- axis, from the point L15. Similarly, at the point LI 6, the arm 648 is coupled to an arm N16 ofthe pad 106 and the arm N16 is coupled to arms M26, M27, and M28 of the upper electrode 104 at a location 016.

[0103] The arm K14 splits into arms 650 and 652 at the point 644. For example, the arm K14 is coupled at the point 644 to the arms 650 and 652. To illustrate, the arm 652 extends in a different direction, such as an opposite direction, compared to a direction of extension of the arm 650. The arm 650 extends from the point 644 to a point L17 and the arm 652 extends from the point 644 to a point L18. At the point L17, the arm 650 is coupled to an arm N17 of the pad 106 and the arm N17 is coupled to arms M29, M30, and M31 of the upper electrode 104 at a location 017. As an example, the arm N17 extends vertically, along the y-axis, from the point L17. Similarly, at the point L18, the arm 652 is coupled to an arm N18 of the pad 106 and the arm N17 is coupled to arms M32, M33, and M34 of the upper electrode 104 at a location 018.

[0104] In a similar manner, the outer zone 216 includes additional points to which remaining arms of the pad 106 are coupled, and the remaining arms of the pad 106 are coupled at additional locations to arms of the upper electrode 104. To illustrate, the locations of the upper electrode 104 at which the arms Ni l through N18 and the remaining arms of the pad 106 are coupled extend along a circumference of the upper electrode 104 to form a circumference that is associated with the outer zone 216. The points Li l through L18 and additional points are sometimes referred to herein as outputs of the outer zone 216. The points Li l through L18 and the additional points of the outer zone 216 extend along a circumference of the GDP 102 to form a circumference of the outer zone 216. The additional points of the outer zone 216 are located at an interface between the outer zone 216 and the pad 106.

[0105] It should be noted that the circumference, of the upper electrode 104, associated with the outer zone 216 is greater than the circumference, of the upper electrode 104, associated with the middle-outer zone 214. Also, the circumference, of the upper electrode 104, associated with the middle-outer zone 214 is greater than the circumference, of the upper electrode 104, associated with the middle-inner zone 212. The circumference, of the upper electrode 104, associated with the middle- inner zone 212 is greater than the circumference, of the upper electrode 104, associated with the inner zone 210 to facilitate the uniformity in a flow of the one or more process gases on a top surface of the substrate.

[0106] With reference back to Figure 6A, the outer zone 216 is divided into four sections, such as a first section, a second section, a third section, and a fourth section. The first section extends from the point 606 to the points Li l through LI 8. For example, the first section includes a first path having a first distance from the point 606 via the arm 602, the point 608, the arm 612, the point 620, the arm 624, the point 626, the arm KI 3 (Figure 6C), the point 642 (Figure 6C), and the arm 646 (Figure 6C) to the point LI 5 (Figure 6C). The first section alsoincludes a second path having a second distance from the point 606 via the arm 602, the point 608, the arm 612, the point 620, the arm 624, the point 626, the arm K13 (Figure 6C), the point 642 (Figure 6C), and the arm 648 (Figure 6C) to the point L16 (Figure 6C). The first section further includes a third path having a third distance from the point 606 via the arm 602, the point 608, the arm 612, the point 620, the arm 622, the point 626, the arm K14 (Figure 6C), the point 644 (Figure 6C), and the arm 650 (Figure 6C) to the point L17 (Figure 6C). The first section includes a fourth path having a fourth distance from the point 606 via the arm 602, the point 608, the arm 612, the point 620, the arm 622, the point 626, the arm K14 (Figure 6C), the point 644 (Figure 6C), and the arm 652 (Figure 6C) to the point LI 8 (Figure 6C).

[0107] Continuing with the example, with reference back to Figure 6A, the first section includes a fifth path having a fifth distance from the point 606 via the arm 602, the point 608, the arm 612, the point 620, the arm 622, the point 628, the arm Kl l (Figure 6B), the point 630 (Figure 6B), and the arm 634 (Figure 6B) to the point LI 1 (Figure 6B). The first section also includes a sixth path having a sixth distance from the point 606 via the arm 602, the point 608, the arm 612, the point 620, the arm 622, the point 628, the arm Kl l (Figure 6B), the point 630 (Figure 6B), and the arm 636 (Figure 6B) to the point L12 (Figure 6B). The first section further includes a seventh path having a seventh distance from the point 606 via the arm 602, the point 608, the arm 612, the point 620, the arm 622, the point 628, the arm K12 (Figure 6B), the point 632 (Figure 6B), and the arm 638 (Figure 6B) to the point L13 (Figure 6B). The first section includes an eighth path having an eighth distance from the point 606 via the arm 602, the point 608, the arm 612, the point 620, the arm 622, the point 628, the arm K12 (Figure 6B), the point 632 (Figure 6B), and the arm 640 (Figure 6B) to the point L14 (Figure 6B). In the example, each of the first through eighth paths are within the predetermined range from, such as substantially equal to, each other. For example, the first through eighth distances are substantially of the same magnitude. To illustrate, any of the first through seventh distances is within 15% from the eighth distance.

[0108] Similarly, the outer zone 216 has a second section having eight paths, a third section having eight paths, and a fourth section having eight paths. Each of the eight paths in each of the second through fourth sections of the outer zone 216 has eight distances. In the example, the first through eight paths of each section of the outer zone 216 include the point 606 and form the outer zone 216. The paths of the first through fourth sections of the outer zone 216 are within a predetermined range from, such as substantially equal to, each other to have the fraction feature. The fractal feature facilitates achieving uniformity in a flow of the one or more process gases received from the gas supply line 208 via the outer zone 216, the arms of the pad106 coupled to the outer zone 216, and the arms of the upper electrode 104 coupled to the arms of the pad 106 to the gap between the upper electrode 104 and electrostatic chuck.

[0109] A path, as used herein, is sometimes referred to herein as a tubular path. For example, each path of the inner zone 210 (Figure 2), or the middle-inner zone 212 (Figure 2), or the middle-outer zone 214 (Figure 2), or the outer zone 216 is a tubular path. To illustrate, a path of the inner zone 210 includes surfaces of arms of the GDP 102 that extend from the point 326 to any of the points Al l through Al 8 and spaces bounded by the surfaces to facilitate the flow of the one or more process gases. As another illustration, a path of the middle-inner zone 212 includes surfaces of arms of the GDP 102 that extend from the point 410 (Figure 4 A) to any of the points Dl l through DI 8 and the additional points of the middle-inner zone 212 and spaces bounded by the surfaces to facilitate the flow of the one or more process gases. As yet another illustration, a path of the middle-outer zone 214 includes surfaces of arms of the GDP 102 that extend from the point 506 (Figure 5 A) to any of the points Gi l through G18 (Figures 5A-5C) and the additional points of the middle-outer zone 214 and spaces bounded by the surfaces to facilitate the flow of the one or more process gases. As still another illustration, a path of the outer zone 216 includes surfaces of arms of the GDP 102 that extend from the point 606 (Figure 6A) to any of the points LI 1 through L18 (Figures 6A-6C) and the additional points of the outer zone 216 and spaces bounded by the surfaces to facilitate the flow of the one or more process gases.

[0110] It should be noted that in an embodiment, to achieve distances of the first through eighth paths of each section of the outer zone 216, a distance between a first point at which an arm of the outer zone 216 of the GDP 102 splits into two or more arms and a second point at which one of the two or more arms is coupled to another arm of the outer zone 216 or coupled to an arm of the pad 106 is equal to a distance between the first point and a third point at which another one of the two or more arms is coupled to yet another arm of the outer zone 216 or coupled to another arm of the pad 106. For example, a distance between the point 606 and the point 608 is equal to a distance between the point 606 and the point 610. In the example, a first arm of the outer zone 216 extends from the point 606 to the point 608 and a second arm of the outer zone 216 extends from the point 606 to the point 610. To illustrate, the first arm includes multiple bends between a vertically extending portion, along the y-axis, of the first arm and a horizontally extending portion, along the x-axis, of the first arm. Also, the second arm includes multiple bends between a vertically extending portion, along the y-axis, of the second arm and another vertically extending portion, along the y-axis, of the second arm. As another example, a distance between the point 620 and the point 626 is equal to a distance between the point 620 and the point 628. In the example, a first arm of the outer zone 216 extends from the point 620 tothe point 626 and a second arm of the outer zone 216 extends from the point 620 to the point 628. As yet another example, a distance between the points 630 and Li l is equal to a distance between the points 630 and L12.

[0111] It should be noted that an angle between any two arms, such as the arms 602 and 612 or the arms 612 and 624 or the arms 624 and KI 3 or the arms KI 3 and 648, of the outer zone 216 of the GDP 102 that are coupled at a point varies. For example, an angle between the arms 602 and 612 is 90 degrees to form a right angle. As another example, an angle between the arms 602 and 612 is other than 90 degrees, such as acute angle or an obtuse angle. To illustrate, an angle between the arms 602 and 612 is 75 degrees or 87 degrees or 94 degrees or 105 degrees.

[0112] It should further be noted that two arms, such as the arms 602 and 612 or the arms 612 and 624 or the arms 624 and KI 3 or the arms KI 3 and 648, of the outer zone 216 that are coupled to each other at a point lie in the same horizontal plane or in different horizontal planes. For example, the arms Kl l and 636 (Figure 6B) lie in the same horizontal plane. As another example, the arm KI 1 lies in a horizontal plane below the arm 622 (Figure 6B).

[0113] It should be noted that a number of arms of the upper electrode 104 extending from a location that is coupled to the pad 106 is equal to the number of arms of the upper electrode 104 extending from any other location that is coupled to the pad 106. The pad 106 is coupled to the outer zone 216. For example, the three arms M23 through M25 are equal in number to a number of arms at any other locations coupled to the pad 106.

[0114] In one embodiment, one or more arms of the pad 106 does not extend vertically from the GDP 102. For example, the arm N11 extends obliquely or vertically and then horizontally from the point Li l.

[0115] In an embodiment, a number of arms of the upper electrode 104 that are coupled to an arm of the pad 106 at a location is different from that illustrated in Figures 6A-6C. The pad 106 is coupled to the outer zone 216. For example, instead of the arms M23 through M25, the upper electrode 104 includes two arms or four arms.

[0116] In one embodiment, a number of arms of a portion of the upper electrode 104 that is coupled to one of the zones 210, 212, 214, and 216 is different from, such as unequal to, a number of arms of one or more remaining portions of the upper electrode 104 coupled to remaining one or more of the zones 210, 212, 214, and 216. For example, a number of arms of the upper electrode 104 that are coupled to the inner zone 210 and extending from the location 338 (Figure 3) is two and a number of arms of the upper electrode 104 that are coupled to the middle-inner zone 212 and extending from the location 403 (Figure 4B) is three or four.

[0117] Figure 7 is a diagram of an embodiment of a system 700 to illustrate use of the showerhead 100 in a plasma chamber 702. The system 700 includes a host computer 704, a process gas source system 706, the plasma chamber 702, an impedance matching network (IMN) 708, and a radio frequency (RF) generator system 710. An example of host computer 704 includes a desktop computer or a laptop computer. An example of the RF generator system 710 includes one or more RF generators. An example of the process gas system 706 includes one or more gas storages, such as gas containers, for storing the one or more process gases. An example of the impedance matching network 708 includes a network of capacitors, or inductors or a combination thereof.

[0118] The plasma chamber 702 includes the showerhead 100 and an electrostatic chuck 712. The electrostatic chuck 712 is located below the showerhead 100. A substrate S, such as a semiconductor wafer, is placed on a top surface of the electrostatic chuck 712. The host computer 704 is coupled to the RF generator system 710. The RF generator system 710 is coupled via one or more RF cables 714 to one or more inputs of the impedance matching network 708. An output of the impedance matching network 708 is coupled via an RF transmission line 716 to a lower electrode embedded within the electrostatic chuck 712. The process gas system 706 is coupled to the showerhead 100 via gas lines 701, such as the gas line 202, the gas line 204, the gas line 206, and the gas line 208 (Figure 2).

[0119] The host computer 704 sends recipe information to the RF generator system 710. After receiving the recipe information, the one or more RF generators generate one or more RF signals 718. The one or more RF signals 718 are sent from the RF generator system 710 via the one or more RF cables 714 to the one or more inputs of the impedance matching network 708. Upon receiving the one or more RF signals 718, the impedance matching network 708 matches an impedance of a load coupled to the output of impedance matching network 708 with an impedance of a source coupled to the one or more inputs of the impedance matching network 708 to provide a modified RF signal 720. The modified RF signal 720 is sent from the output of the impedance matching network 708 via the RF transmission line 716 to the lower electrode within the electrostatic chuck 712.

[0120] Also, the process gas system 706 supplies the one or more process gases via the showerhead 100 via the gas lines 701 to the zones 210, 212, 214, and 216 (Figure 2) of the showerhead 100. The one or more process gases are transferred from the zones 210, 212, 214, and 216 via the arms of the pad 106 (Figure 1) and the arms of the upper electrode 104 (Figure 1) to a gap 722 between the showerhead 100 and the electrostatic chuck 712.

[0121] When the modified RF signal 712 is supplied in conjunction with the one or more process gases to the plasma chamber 702, plasma is stricken are generated within the gap722. The plasma formed within the gap 722 processes the substrate S. For example, processing of the substrate S includes depositing one or more materials on the substrate S, or etching the substrate S, or cleaning the substrate, or a combination thereof. When the one or more process gases are applied in the uniform manner using the fractal features of these zones 210, 212, 214, and 216, the substrate S is processed in a uniform manner.

[0122] In an embodiment, the RF generator system 710 is coupled to the upper electrode 104 (Figure 1) within the showerhead 100 via the impedance matching network 708 instead of being coupled to the lower electrode. The lower electrode is coupled to a ground potential.

[0123] In one embodiment, the upper electrode 104 is coupled to an RF generator system via an impedance matching network and the lower electrode is coupled to the RF generator system 710 via the impedance matching network 708.

[0124] Embodiments described herein may be practiced with various computer system configurations including hand-held hardware units, microprocessor systems, microprocessor-based or programmable consumer electronics, minicomputers, mainframe computers and the like. The embodiments can also be practiced in distributed computing environments where tasks are performed by remote processing hardware units that are linked through a network.

[0125] In some embodiments, a controller, described herein, is a part of a system, which may be part of the above-described examples. Such systems include semiconductor processing equipment, including a processing tool or tools, chamber or chambers, a platform or platforms for processing, and / or specific processing components (a wafer pedestal, a gas flow system, etc.). These systems are integrated with electronics for controlling their operation before, during, and after processing of a semiconductor wafer or substrate. The electronics is referred to as the “controller,” which may control various components or subparts of the system or systems. The controller, depending on the processing requirements and / or the type of system, is programmed to control any of the processes disclosed herein, including the delivery of process gases, temperature settings (e.g., heating and / or cooling), pressure settings, vacuum settings, power settings, RF generator settings, RF matching circuit settings, frequency settings, flow rate settings, fluid delivery settings, positional and operation settings, wafer transfers into and out of a tool and other transfer tools and / or load locks coupled to or interfaced with a system.

[0126] Broadly speaking, in a variety of embodiments, the controller is defined as electronics having various integrated circuits, logic, memory, and / or software that receive instructions, issue instructions, control operation, enable cleaning operations, enable endpoint measurements, and the like. The integrated circuits include chips in the form of firmware thatstore program instructions, digital signal processors (DSPs), chips defined as Application Specific Integrated Circuits (ASICs), Programmable Logic Devices (PLDs), and / or one or more microprocessors, or microcontrollers that execute program instructions (e.g., software). The program instructions are instructions communicated to the controller in the form of various individual settings (or program files), defining the parameters, the factors, the variables, etc., for carrying out a particular process on or for a semiconductor wafer or to a system. The program instructions are, in some embodiments, a part of a recipe defined by process engineers to accomplish one or more processing steps during the fabrication of one or more layers, materials, metals, oxides, silicon, silicon dioxide, surfaces, circuits, and / or dies of a wafer.

[0127] The controller, in some embodiments, is a part of or coupled to a computer that is integrated with, coupled to the system, otherwise networked to the system, or a combination thereof. For example, the controller is in a “cloud” or all or a part of a fab host computer, which allows for remote access of the wafer processing. The computer enables remote access to the system to monitor current progress of fabrication operations, examines a history of past fabrication operations, examines trends or performance metrics from a plurality of fabrication operations, to change parameters of current processing, to set processing steps to follow a current processing, or to start a new process.

[0128] In some embodiments, a remote computer (e.g. a server) provides process recipes to a system over a network, which includes a local network or the Internet. The remote computer includes a user interface that enables entry or programming of parameters and / or settings, which are then communicated to the system from the remote computer. In some examples, the controller receives instructions in the form of data, which specify the parameters, factors, and / or variables for each of the processing steps to be performed during one or more operations. It should be understood that the parameters, factors, and / or variables are specific to the type of process to be performed and the type of tool that the controller is configured to interface with or control. Thus as described above, the controller is distributed, such as by including one or more discrete controllers that are networked together and working towards a common purpose, such as the processes and controls described herein. An example of a distributed controller for such purposes includes one or more integrated circuits on a chamber in communication with one or more integrated circuits located remotely (such as at the platform level or as part of a remote computer) that combine to control a process on the chamber.

[0129] Without limitation, in various embodiments, example systems to which the methods are applied include a plasma etch chamber or module, a deposition chamber or module, a spin-rinse chamber or module, a metal plating chamber or module, a clean chamber or module, a bevel edge etch chamber or module, a physical vapor deposition (PVD) chamber or module, achemical vapor deposition (CVD) chamber or module, an atomic layer deposition (ALD) chamber or module, an atomic layer etch (ALE) chamber or module, an ion implantation chamber or module, a track chamber or module, and any other semiconductor processing systems that is associated or used in the fabrication and / or manufacturing of semiconductor wafers.

[0130] It is further noted that in some embodiments, the above-described operations apply to several types of plasma reactor chambers, e.g., a plasma chamber including an inductively coupled plasma (ICP) reactor, a capacitively coupled plasma (CCP) reactor, a transformer coupled plasma reactor, conductor tools, dielectric tools, a plasma chamber including an electron cyclotron resonance (ECR) reactor, etc. For example, one or more RF generators are coupled to an inductor within the ICP reactor. Examples of a shape of the inductor include a solenoid, a dome-shaped coil, a flat-shaped coil, etc.

[0131] As noted above, depending on the process step or steps to be performed by the tool, the host computer communicates with one or more of other tool circuits or modules, other tool components, cluster tools, other tool interfaces, adjacent tools, neighboring tools, tools located throughout a factory, a main computer, another controller, or tools used in material transport that bring containers of wafers to and from tool locations and / or load ports in a semiconductor manufacturing factory.

[0132] With the above embodiments in mind, it should be understood that some of the embodiments employ various computer-implemented operations involving data stored in computer systems. These operations are those physically manipulating physical quantities. Any of the operations described herein that form part of the embodiments are useful machine operations.

[0133] Some of the embodiments also relate to a hardware unit or an apparatus for performing these operations. The apparatus is specially constructed for a special purpose computer. When defined as a special purpose computer, the computer performs other processing, program execution or routines that are not part of the special purpose, while still being capable of operating for the special purpose.

[0134] In some embodiments, the operations may be processed by a computer selectively activated or configured by one or more computer programs stored in a computer memory, cache, or obtained over the computer network. When data is obtained over the computer network, the data may be processed by other computers on the computer network, e.g., a cloud of computing resources.

[0135] One or more embodiments can also be fabricated as computer-readable code on a non-transitory computer-readable medium. The non-transitory computer-readable mediumis any data storage hardware unit, e.g., a memory device, etc., that stores data, which is thereafter be read by a computer system. Examples of the non-transitory computer-readable medium include hard drives, network attached storage (NAS), read-only memory (ROM), random access memory (RAM), compact disc-ROMs (CD-ROMs), CD-recordables (CD-Rs), CD-rewritables (CD-RWs), magnetic tapes and other optical and non-optical data storage hardware units. In some embodiments, the non-transitory computer-readable medium includes a computer-readable tangible medium distributed over a network-coupled computer system so that the computer- readable code is stored and executed in a distributed fashion.

[0136] Although the method operations above were described in a specific order, it should be understood that in various embodiments, other housekeeping operations are performed in between operations, or the method operations are adjusted so that they occur at slightly different times, or are distributed in a system which allows the occurrence of the method operations at various intervals, or are performed in a different order than that described above.

[0137] It should further be noted that in an embodiment, one or more features from any embodiment described above are combined with one or more features of any other embodiment without departing from a scope described in various embodiments described in the present disclosure.

[0138] Although the foregoing embodiments have been described in some detail for purposes of clarity of understanding, it will be apparent that certain changes and modifications can be practiced within the scope of appended claims. Accordingly, the present embodiments are to be considered as illustrative and not restrictive, and the embodiments are not to be limited to the details given herein.

Claims

IN THE CLAIMS1. A showerhead comprising: a gas distribution plate; and an upper electrode located below the gas distribution plate, wherein the upper electrode interfaces with the gas distribution plate via a thermally conductive layer, wherein the gas distribution plate includes a plurality of zones, wherein each of the plurality of zones has an input and a plurality of outputs, wherein the input is configured to connect to a gas supply line to receive one or more gases from the gas supply line, wherein the input is coupled to the plurality of outputs via a plurality of tubular paths to form a plurality of distances between the input and the plurality of outputs, wherein the plurality of distances between the input and the plurality of outputs are within a predetermined range from each other to facilitate uniformity in outputting the one or more gases from the plurality of outputs towards a gap situated below the upper electrode.

2. The showerhead of claim 1, wherein the plurality of outputs include a first output and a second output, wherein the plurality of distances include a first distance between the input and the first output and a second distance between the input and the second output, wherein the first distance is within the predetermined range from the second distance.

3. The showerhead of claim 2, wherein the first distance is greater than or less than the first distance by at most fifteen percent to be within the predetermined range.

4. The showerhead of claim 1, wherein the upper electrode includes a plurality of holes extending from a plurality of locations along a circumference of the upper electrode, wherein the plurality of holes of the upper electrode are configured to receive the one or more gases from the plurality of outputs to provide the one or more gases to the gap.

5. The showerhead of claim 1, wherein the plurality of zones include a first zone and a second zone.

6. The showerhead of claim 5, wherein the first zone is an inner zone, wherein the plurality of tubular paths of the inner zone include a first path and a second path, wherein the first path extends from the input in a first direction to form a first arm and the second path extends from the input in a second direction different from the first direction to form a second arm, wherein the first arm splits into two arms of the first path to provide a first set of the plurality of outputs and the second arm splits into two arms of the second path to provide a second set of the plurality of outputs.

7. The showerhead of claim 5, wherein the second zone is a middle-inner zone, wherein the plurality of tubular paths of the middle-inner zone include a first path and a second path, wherein the first path extends from the input in a first direction to form a first arm andthe second path extends from the input in a second direction different from the first direction to form a second arm, wherein the first arm splits for a number of times to form a first set of the plurality of outputs, wherein the second arms splits for the number of times to form a second set of the plurality of outputs.

8. The showerhead of claim 5, wherein the plurality of zones include a third zone, wherein the third zone is a middle-outer zone, wherein the plurality of tubular paths of the middle-outer zone include a first path and a second path, wherein the first path extends from the input in a first direction to form a first arm and the second path extends from the input in a second direction different from the first direction to form a second arm, wherein the first arm splits for a number of times to form a first set of the plurality of outputs, wherein the second arms splits for the number of times to form a second set of the plurality of outputs.

9. The showerhead of claim 5, wherein the plurality of zones include a third zone and a fourth zone, wherein the fourth zone is an outer zone, wherein the plurality of tubular paths of the outer zone include a first path and a second path, wherein the first path extends from the input in a first direction to form a first arm and the second path extends from the input in a second direction different from the first direction to form a second arm, wherein the first arm splits for a number of times to form a first set of the plurality of outputs, wherein the second arms splits for the number of times to form a second set of the plurality of outputs.

10. The showerhead of claim 1, wherein the plurality of distances facilitate achieving uniformity in application of the one or more process gases and an application of additional one or more process gases during switching from the one or more process gases to the additional one or more process gases.

11. The showerhead of claim 1, wherein the input is connected to two or more points of the zone.

12. The showerhead of claim 11, wherein the two or more points include a first point and a second point, wherein the input is connected to the first point via a first distance and to the second point via a second distance, wherein the first distance is equal to the second distance.

13. A gas distribution plate comprising: a plurality of zones, wherein each of the plurality of zones has a plurality of tubular paths, wherein the plurality of tubular paths has an input and a plurality of outputs, wherein the input is configured to connect to a gas supply line to receive one or more gasesfrom the gas supply line, wherein the input is coupled to the plurality of outputs via the plurality of tubular paths to form a plurality of distances, wherein the plurality of distances between the input and the plurality of outputs are within a predetermined range to facilitate uniformity in outputting the one or more gases from the plurality of outputs to a thermal pad layer.

14. The gas distribution plate of claim 13, wherein the plurality of outputs include a first output and a second output, wherein the plurality of distances include a first distance between the input and the first output and a second distance between the input and the second output, wherein the first distance is within the predetermined range from the second distance.

15. The gas distribution plate of claim 14, wherein the first distance is greater than or less than the first distance by at most fifteen percent to be within the predetermined range.

16. The gas distribution plate of claim 13, wherein the thermal pad layer is situated below the plurality of zones.

17. The gas distribution plate of claim 13, wherein the plurality of zones include a first zone and a second zone.

18. The gas distribution plate of claim 17, wherein the first zone is an inner zone, wherein the plurality of tubular paths of the inner zone include a first path and a second path, wherein the first path extends from the input in a first direction to form a first arm and the second path extends from the input in a second direction different from the first direction to form a second arm, wherein the first arm splits into two arms of the first path to provide a first set of the plurality of outputs and the second arm splits into two arms of the second path to provide a second set of the plurality of outputs.

19. The gas distribution plate of claim 17, wherein the second zone is a middle-inner zone, wherein the plurality of tubular paths of the middle-inner zone include a first path and a second path, wherein the first path extends from the input in a first direction to form a first arm and the second path extends from the input in a second direction different from the first direction to form a second arm, wherein the first arm splits for a number of times to form a first set of the plurality of outputs, wherein the second arms splits for the number of times to form a second set of the plurality of outputs.

20. The gas distribution plate of claim 17, wherein the plurality of zones include a third zone, wherein the third zone is a middle-outer zone, wherein the plurality of tubular paths of the middle-outer zone include a first path and a second path, wherein the first path extends from the input in a first direction to form a first arm and the second path extends from the input in a second direction different from the first direction to form a secondarm, wherein the first arm splits for a number of times to form a first set of the plurality of outputs, and the second arms splits for the number of times to form a second set of the plurality of outputs.

21. The gas distribution plate of claim 17, wherein the plurality of zones include a third zone and a fourth zone, wherein the fourth zone is an outer zone, wherein the plurality of tubular paths of the outer zone include a first path and a second path, wherein the first path extends from the input in a first direction to form a first arm and the second path extends from the input in a second direction different from the first direction to form a second arm, wherein the first arm splits for a number of times to form a first set of the plurality of outputs, and the second arms splits for the number of times to form a second set of the plurality of outputs.

22. A plasma system comprising: a radio frequency generator configured to generate a radio frequency signal; an impedance matching circuit coupled to the radio frequency generator to receive the radio frequency signal to output a modified radio frequency signal; and a plasma chamber coupled to the impedance matching circuit to receive the modified radio frequency signal, wherein the plasma chamber includes: a showerhead including: a gas distribution plate; and an upper electrode located below the gas distribution plate, wherein the upper electrode interfaces with the gas distribution plate via a thermally conductive layer, wherein the gas distribution plate includes a plurality of zones, wherein each of the plurality of zones has an input and a plurality of outputs, wherein the input is configured to connect to a gas supply line to receive one or more gases from the gas supply line, wherein the input is coupled to the plurality of outputs via a plurality of tubular paths to form a plurality of distances between the input and the plurality of outputs, wherein the plurality of distances between the input and the plurality of outputs are within a pre-determined range to facilitate uniformity in outputting the one or more gases from the plurality of outputs towards a gap situated below the upper electrode.

23. The plasma system of claim 22, wherein the plurality of outputs include a first output and a second output, wherein the plurality of distances include a first distance between theinput and the first output and a second distance between the input and the second output, wherein the first distance is within the predetermined range from the second distance.

24. The plasma system of claim 23, wherein the first distance is greater than or less than the first distance by at most fifteen percent to be within the predetermined range.

Images