Processing liquid supply device and processing liquid supply method

Abstract

The present disclosure explains a processing liquid supply device and a processing liquid supply method with which processing of a substrate can be continued even during replacement of a processing liquid.　The processing liquid supply device comprises: first and second storage units; a circulation unit configured to return a processing liquid discharged from the first and second storage units to the first and second storage units through a circulation line; a detection unit; and a control unit. The control unit is configured to execute: a first process in which the circulation unit is controlled to stop transmission, from the first storage unit, of the processing liquid circulating through the circulation line and the first storage unit, and to transmit the processing liquid stored in the second storage unit to the circulation line to push out the processing liquid remaining in the circulation line to the first storage unit; and a second process in which when, after the first process, the detection unit detects that all of the processing liquid remaining in the circulation line has flowed into the first storage unit, the circulation unit is controlled to return the processing liquid stored in the second storage unit to the second storage unit through the circulation line.

Description

Processing liquid supply device and processing liquid supply method

[0001] The present disclosure relates to a treatment liquid supplying apparatus and a treatment liquid supplying method.

[0002] Patent Document 1 discloses a substrate processing apparatus including a storage tank for storing a processing liquid, a circulation line for returning the processing liquid sent from the storage tank to the storage tank, and a branch line connecting the circulation line to a discharge nozzle for discharging the processing liquid onto substrates. In this substrate processing apparatus, the processing liquid circulating through the storage tank and the circulation line needs to be periodically replaced, and therefore substrate processing is stopped during the processing liquid replacement work.

[0003] Japanese Patent Application Laid-Open No. 2020-107841

[0004] The present disclosure describes a processing liquid supplying apparatus and a processing liquid supplying method that allow substrate processing to continue even when the processing liquid is replaced.

[0005] An example of a processing liquid supply device includes a first reservoir and a second reservoir configured to store a processing liquid for processing a substrate, a circulation unit configured to return the processing liquid exiting the first reservoir and the processing liquid exiting the second reservoir to the first reservoir and the second reservoir through a circulation line including upstream ends branching and connected to the bottoms of the first reservoir and the second reservoir, respectively, and downstream ends branching and connected to the tops of the first reservoir and the second reservoir, respectively, a processing unit configured to process a substrate by discharging the processing liquid onto the substrate, a supply unit configured to supply the processing liquid to the processing unit, a detection unit configured to detect the amount of processing liquid flowing into the first reservoir through the circulation line, and a control unit. The control unit is configured to perform a first process of controlling the circulation unit to stop the processing liquid circulating through the circulation line and the first storage unit from being sent out from the first storage unit, and to send the processing liquid stored in the second storage unit to the circulation line, thereby pushing the processing liquid remaining in the circulation line into the first storage unit; a second process of controlling the circulation unit to return the processing liquid stored in the second storage unit to the second storage unit through the circulation line when the detection unit detects that all of the processing liquid remaining in the circulation line has flowed into the first storage unit after the first process; and a third process of controlling the supply unit to eject the processing liquid being circulated onto the substrate when the processing liquid is circulating through the circulation line and the second storage unit as a result of the second process.

[0006] According to the processing liquid supply device and processing liquid supply method of the present disclosure, it is possible to continue processing the substrate even when the processing liquid is being replaced.

[0007] FIG. 1 is a plan view schematically illustrating an example of a substrate processing system. FIG. 2 is a view schematically illustrating an example of a processing liquid supply unit. FIG. 3 is a block diagram illustrating an example of a main part of a substrate processing system. FIG. 4 is a schematic view illustrating an example of a hardware configuration of a controller. FIG. 5 is a flowchart for explaining a processing liquid exchange operation. FIG. 6 is a view for explaining a processing liquid exchange operation. FIG. 7 is a view for explaining a processing liquid exchange operation. FIG. 8 is a view for explaining a processing liquid exchange operation. FIG. 9 is a view for explaining a processing liquid exchange operation. FIG. 10 is a view for explaining a processing liquid exchange operation. FIG. 11 is a view for explaining a processing liquid exchange operation. FIG. 12 is a view for explaining a processing liquid exchange operation.

[0008] In the following description, the same elements or elements having the same functions will be designated by the same reference numerals, and redundant explanations will be omitted. Note that in this specification, when referring to the top, bottom, right, and left of a figure, the directions of the reference numerals in the figure will be used as the reference.

[0009] 1, a substrate processing system 1 configured to process a substrate W will be described. The substrate processing system 1 includes a loading / unloading station 2, a processing station 3, and a controller Ctr (controller). The loading / unloading station 2 and the processing station 3 may be arranged in a line in the horizontal direction, for example.

[0010] The substrate W may be disk-shaped or may be a plate-shaped other than a circle, such as a polygon. The substrate W may have a cutout portion cut out of a portion. The cutout portion may be, for example, a notch (a U-shaped, V-shaped groove, or the like) or a linear portion extending linearly (a so-called orientation flat). The substrate W may be, for example, a semiconductor substrate (silicon wafer), a glass substrate, a mask substrate, an FPD (Flat Panel Display) substrate, or any other type of substrate. The diameter of the substrate W may be, for example, approximately 200 mm to 450 mm.

[0011] The loading / unloading station 2 includes a mounting section 4, a loading / unloading section 5, and a shelf unit 6. The mounting section 4 includes a plurality of mounting tables (not shown) lined up in the width direction (the vertical direction in FIG. 1 ). Each mounting table is configured to be able to mount a carrier 7 thereon. The carrier 7 is configured to accommodate at least one substrate W in a sealed state. The carrier 7 includes an opening / closing door (not shown) for loading and unloading the substrate W.

[0012] The loading / unloading section 5 is disposed adjacent to the mounting section 4 in the direction in which the loading / unloading stations 2 and the processing stations 3 are lined up (the left-right direction in FIG. 1 ). The loading / unloading section 5 includes an opening / closing door (not shown) provided for the mounting section 4. When the carrier 7 is placed on the mounting section 4, the opening / closing door of the carrier 7 and the opening / closing door of the loading / unloading section 5 are both opened, thereby connecting the interior of the loading / unloading section 5 to the interior of the carrier 7.

[0013] The loading / unloading section 5 incorporates a transport arm A1 and a shelf unit 6. The transport arm A1 is configured to be able to move horizontally in the width direction of the loading / unloading section 5, move up and down in the vertical direction, and pivot about a vertical axis. The transport arm A1 is configured to take out substrates W from the carrier 7 and pass them on to the shelf unit 6, and also to receive substrates W from the shelf unit 6 and return them into the carrier 7. The shelf unit 6 is located near the processing station 3 and is configured to store substrates W.

[0014] The processing station 3 includes a transport unit 8 and a processing liquid supply device 10. The transport unit 8 extends horizontally, for example, in the direction in which the loading / unloading station 2 and the processing station 3 are lined up (the left-right direction in FIG. 1 ). The transport unit 8 incorporates a transport arm A2 (transport unit). The transport arm A2 is configured to be able to move horizontally in the longitudinal direction of the transport unit 8, move up and down in the vertical direction, and pivot about a vertical axis. The transport arm A2 is configured to remove substrates W from the shelf unit 6 and transfer them to the liquid processing units U, and to receive substrates W from the liquid processing units U and return them to the shelf unit 6.

[0015] The processing liquid supplying apparatus 10 includes a plurality of liquid processing units U (processing sections). The processing liquid supplying apparatus 10 is configured to supply a processing liquid L to the plurality of liquid processing units U, and perform a predetermined process (e.g., a process for removing dirt or foreign matter, an etching process, a cleaning process, etc.) on the substrate W in each liquid processing unit U. The plurality of liquid processing units U are arranged on both sides of the transporting section 8 so as to be aligned in a line along the longitudinal direction of the transporting section 8 (the left-right direction in FIG. 1 ).

[0016] The controller Ctr is configured to partially or entirely control the substrate processing system 1 .

[0017] [Treatment Liquid Supply Apparatus] Next, the treatment liquid supply apparatus 10 will be described in detail with reference to Fig. 2. The treatment liquid supply apparatus 10 includes a plurality of liquid treatment units U and a treatment liquid supply part 11.

[0018] The liquid processing unit U is configured to discharge a processing liquid L onto the substrate W to process the substrate W. The liquid processing unit U includes a chamber U1 and a spin holder U2.

[0019] The chamber U1 is a housing configured to allow the substrate W to be loaded into and unloaded from the chamber U1. A loading / unloading port (not shown) is formed in a side wall of the chamber U1. The substrate W is transported into and out of the chamber U1 by the transport arm A2 through the loading / unloading port.

[0020] The rotation holding unit U2 may be configured to operate based on an operation signal from the controller Ctr and to rotate the substrate W around a rotation center axis perpendicular to the surface of the substrate W while the substrate W is in an approximately horizontal position.

[0021] The processing liquid supply unit 11 is configured to supply the processing liquid L to the surface of the substrate W. The processing liquid supply unit 11 includes a supply unit 20, a circulation unit 30, a branching unit 40 (supply unit), a drainage unit 50, and a cooling unit 60.

[0022] The supply unit 20 includes a liquid source 21, pipes D1 to D13, and valves V1 and V2. The liquid source 21 is a supply source of the processing liquid L. The processing liquid L may be, for example, an acid-based chemical liquid, an alkaline-based chemical liquid, or an organic-based chemical liquid. Examples of the acid-based chemical liquid include SC-2 liquid (a mixture of hydrochloric acid, hydrogen peroxide, and pure water), SPM (a mixture of sulfuric acid and hydrogen peroxide water), HF liquid (hydrofluoric acid), DHF liquid (dilute hydrofluoric acid), and HNO ３ +HF solution (a mixed solution of nitric acid and hydrofluoric acid), etc. The alkaline chemical solution may include, for example, SC-1 solution (a mixed solution of ammonia, hydrogen peroxide, and pure water), hydrogen peroxide water, etc.

[0023] The upstream end of the pipe D1 is connected to the liquid source 21. The downstream end of the pipe D1 branches into pipes D2 and D3.

[0024] The downstream end of the pipe D2 is connected to a storage tank T1 (first storage unit) described below. The downstream end of the pipe D2 may be connected to, for example, the ceiling wall of the storage tank T1. The pipe D2 is provided with a valve V1.

[0025] The downstream end of the pipe D3 is connected to a storage tank T2 (second storage unit) described later. The downstream end of the pipe D3 may be connected to, for example, the ceiling wall of the storage tank T2. The pipe D3 is provided with a valve V2.

[0026] Valves V1 and V2 are each configured to operate based on an operating signal from controller Ctr and transition between an open state that allows fluid to flow through pipes D2 and D3 and a closed state that prevents fluid from flowing through pipes D2 and D3.

[0027] Circulation unit 30 includes storage tanks T1 and T2, pipes D4 to D8, pump P1, filter F1, heater HT1, valves V3 to V6, and sensors SE11 to SE14 and SE21 to SE24. Storage tanks T1 and T2 are supply sources of processing liquid L to liquid processing unit U, and are configured to temporarily store processing liquid L.

[0028] The upstream end of the pipe D4 is connected to the storage tank T1. The upstream end of the pipe D4 may be connected to, for example, the bottom wall of the storage tank T1. The pipe D4 is provided with a valve V3. The downstream end of the pipe D4 is connected to the upstream end of the pipe D6.

[0029] The upstream end of pipe D5 is connected to storage tank T2. The upstream end of pipe D5 may be connected to, for example, the bottom wall of storage tank T2. Pipe D5 is provided with valve V4. The downstream end of pipe D5 is connected to the upstream end of pipe D6.

[0030] The downstream end of the pipe D6 branches into pipes D7 and D8. The pipe D6 is provided with a pump P1, a filter F1, and a heater HT1 in this order from the upstream side.

[0031] The downstream end of the pipe D7 is connected to the storage tank T1. The downstream end of the pipe D7 may be connected to, for example, the ceiling wall of the storage tank T1. The pipe D7 is provided with a valve V5.

[0032] The downstream end of the pipe D8 is connected to the storage tank T2. The downstream end of the pipe D8 may be connected to, for example, the ceiling wall of the storage tank T2. The pipe D8 is provided with a valve V6.

[0033] The pump P1 operates based on an operation signal from the controller Ctr, and is configured to return the processing liquid L sucked from the storage tanks T1, T2 to the storage tanks T1, T2 via the pipes D4 to D8 and the valves V3 to V6. That is, the pipes D4 to D8 form a circulation line through which the processing liquid L discharged from the storage tanks T1, T2 returns to the storage tanks T1, T2. Therefore, the pipes D4 and D5 correspond to the upstream end of the circulation line, and the pipes D7 and D8 correspond to the downstream end of the circulation line.

[0034] The filter F1 is configured to collect foreign matter (e.g., particles) contained in the processing liquid L flowing through the pipe D6. The heater HT1 is configured to operate based on an operation signal from the controller Ctr and to heat the processing liquid L flowing through the pipe D6. By heating the processing liquid L with the heater HT1, the processing liquid L reaches a temperature suitable for processing the substrate W. By heating the processing liquid L immediately before discharging the processing liquid L onto the substrate W, elution of foreign matter (e.g., particles) from each component of the processing liquid supplying apparatus 10 into the processing liquid L is suppressed, thereby making it possible to increase the cleanliness of the processing liquid L supplied to the substrate W.

[0035] Each of the valves V3 to V6 operates based on an operating signal from the controller Ctr and is configured to transition between an open state that allows fluid to flow through the pipes D4, D5, D7, and D8, and a closed state that prevents fluid from flowing through the pipes D4, D5, D7, and D8.

[0036] The sensors SE11 to SE14 are arranged in this order from bottom to top in the storage tank T1. Specifically, the sensor SE11 is arranged near the bottom of the storage tank T1. The sensor SE11 is used to detect the level of the processing liquid L in the storage tank T1, thereby determining whether the processing liquid L in the storage tank T1 is below a lower limit amount. The sensor SE11 is configured to transmit the detection result of the presence or absence of the processing liquid L to the controller Ctr.

[0037] Sensor SE12 (another detection unit) is disposed in storage tank T1 so as to be located above sensor SE11. That is, sensor SE12 detects a liquid level higher than the liquid level detected by sensor SE11. Sensor SE12 is used to detect the liquid level of the treatment liquid L in storage tank T1, thereby determining whether the liquid level of the treatment liquid L is at the level that should be maintained in storage tank T1 while the treatment liquid L is circulating through the circulation line and storage tank T1. Sensor SE12 is configured to transmit the detection result of the presence or absence of treatment liquid L to controller Ctr.

[0038] The sensor SE13 (detection unit) is disposed in the storage tank T1 so as to be located above the sensor SE12. That is, the sensor SE13 detects a liquid level higher than the liquid level detected by the sensor SE12. The sensor SE13 is used to detect the liquid level of the processing liquid L in the storage tank T1, thereby determining whether or not the processing liquid L (old liquid) remaining in the circulation line has been recovered when replacing the processing liquid L in the storage tank T1. The sensor SE13 is configured to transmit the detection result of the presence or absence of the processing liquid L to the controller Ctr.

[0039] The sensor SE14 is located higher than the sensor SE13 and is disposed near the top of the storage tank T1. That is, the sensor SE14 detects a liquid level higher than the liquid level detected by the sensor SE13. The sensor SE14 is used to determine whether the treatment liquid L in the storage tank T1 exceeds an upper limit by detecting the liquid level of the treatment liquid L in the storage tank T1. The sensor SE14 is configured to transmit the detection result of the presence or absence of the treatment liquid L to the controller Ctr.

[0040] The sensors SE21 to SE24 are arranged in this order from the bottom up in the storage tank T2. The sensors SE21 to SE24 have the same configurations and functions as the sensors SE11 to SE14, respectively, and therefore detailed explanations of the sensors SE21 to SE24 will be omitted.

[0041] Branching section 40 includes pipes D9 and D10 and valves V7 and V8. The upstream ends of pipes D9 and D10 are connected to pipe D6. The downstream end of pipe D9 is connected to one of the liquid processing units U. Pipes D9 and D10 are provided with valves V7 and V8, respectively.

[0042] Valves V7 and V8 are each configured to operate based on an operation signal from controller Ctr and transition between an open state that allows fluid to flow through pipes D9 and D10 and a closed state that prevents fluid from flowing through pipes D9 and D10. Therefore, branching section 40 (pipes D9 and D10 and valves V7 and V8) configures a supply section that supplies processing liquid L, which is delivered from storage tanks T1 and T2 and circulating through the circulation line, to one liquid processing unit U.

[0043] The drainage section 50 includes pipes D11 to D16, a pump P2, a filter F2, a heater HT2, and valves V9 to V13.

[0044] The upstream end of the pipe D11 is connected to the storage tank T1. The upstream end of the pipe D11 may be connected to, for example, the bottom wall of the storage tank T1. The pipe D11 is provided with a valve V9. The downstream end of the pipe D11 is connected to the upstream end of the pipe D13.

[0045] The upstream end of the pipe D12 is connected to the storage tank T2. The upstream end of the pipe D12 may be connected to, for example, the bottom wall of the storage tank T2. The pipe D12 is provided with a valve V10. The downstream end of the pipe D12 is connected to the upstream end of the pipe D13.

[0046] The downstream end of the pipe D13 branches into pipes D14 and D15. The pipe D13 is provided with a pump P2, a filter F2, and a heater HT2 in this order from the upstream side.

[0047] The downstream end of the pipe D14 is connected to the storage tank T1. The downstream end of the pipe D14 may be connected to, for example, the ceiling wall of the storage tank T1. The pipe D14 is provided with a valve V11.

[0048] The downstream end of the pipe D15 is connected to the storage tank T2. The downstream end of the pipe D15 may be connected to, for example, the ceiling wall of the storage tank T2. The pipe D15 is provided with a valve V12.

[0049] The upstream end of the pipe D16 is connected to the pipe D13 downstream of the pump P2. The upstream end of the pipe D16 may be connected to the pipe D13 between the pump P2 and the filter F2, for example. The downstream end of the pipe D16 may be connected to a drain port (not shown), for example.

[0050] The pump P2 operates based on an operation signal from the controller Ctr, and is configured to return the treatment liquid L sucked from the storage tanks T1, T2 to the storage tanks T1, T2 via the pipes D11 to D15 and the valves V9 to V12. That is, the pipes D11 to D15 form a sub-circulation line through which the treatment liquid L discharged from the storage tanks T1, T2 returns to the storage tanks T1, T2. Therefore, the pipes D11 and D12 correspond to the upstream end of the sub-circulation line, and the pipes D14 and D15 correspond to the downstream end of the sub-circulation line.

[0051] The filter F2 is configured to collect foreign matter (e.g., particles) contained in the processing liquid L flowing through the pipe D13. The heater HT2 is configured to operate based on an operation signal from the controller Ctr and to heat the processing liquid L flowing through the pipe D13. Heating the processing liquid L with the heater HT2 suppresses a decrease in the temperature of the processing liquid L circulating through the sub-circulation line. Heating the processing liquid L circulating through the sub-circulation line suppresses elution of foreign matter (e.g., particles) from each component of the processing liquid supply apparatus 10 into the processing liquid L, thereby making it possible to increase the cleanliness of the processing liquid L supplied to the substrate W.

[0052] Each of the valves V9 to V13 operates based on an operation signal from the controller Ctr, and is configured to transition between an open state that allows fluid to flow through the pipes D11, D12, and D14 to D16, and a closed state that prevents fluid from flowing through the pipes D11, D12, and D14 to D16. Therefore, when the valves V11 and V12 are closed and the valve V13 is open, if the valves V9 and V10 are opened, the treatment liquid L in the storage tanks T1 and T2 is discharged to the outside of the treatment liquid supplying apparatus 10 through the pipes D11 to D13 and D16.

[0053] The cooling unit 60 is configured to cool the processing liquid L that is discharged to the outside of the processing liquid supplying apparatus 10 through the pipe D16. The cooling unit 60 may be provided, for example, on the pipe D16 downstream of the valve V13. The cooling unit 60 may be, for example, a heat exchanger configured to cool the processing liquid L by flowing a cooling liquid (e.g., water) around the pipe D16 to perform heat exchange between the processing liquid L and the cooling liquid. The cooling unit 60 may cool the processing liquid L at, for example, about 120°C to, for example, about 30°C or below.

[0054] [Details of the Controller] Next, the controller Ctr will be described in more detail with reference to Figure 3. The controller Ctr has a reading unit M1, a memory unit M2, a processing unit M3, and an instruction unit M4 as functional modules. These functional modules are merely a division of the functions of the controller Ctr into multiple modules for convenience, and do not necessarily mean that the hardware constituting the controller Ctr is divided into such modules. Each functional module is not limited to being realized by executing a program, but may also be realized by a dedicated electric circuit (e.g., a logic circuit) or an integrated circuit (ASIC: Application Specific Integrated Circuit) that integrates such a circuit.

[0055] The reading unit M1 is configured to read a program from a computer-readable recording medium RM. The recording medium RM stores a program for operating each unit of the substrate processing system 1. The recording medium RM may be, for example, a semiconductor memory, an optical recording disk, a magnetic recording disk, or a magneto-optical recording disk. In this specification, each unit of the substrate processing system 1 may include, for example, a rotation holding unit U2, pumps P1 and P2, valves V1 to V13, heaters HT1 and HT2, sensors SE11 to SE14, and SE21 to SE24.

[0056] The memory unit M2 is configured to store various data. For example, the memory unit M2 may store a program read from the recording medium RM by the reader M1, setting parameters (so-called processing recipes) for operating each part of the substrate processing system 1, setting data input by an operator via an external input device (not shown), etc. The memory unit M2 may receive data on the liquid levels measured by the sensors SE11 to SE14 and SE21 to SE24 and store the data.

[0057] The processing unit M3 is configured to process various types of data, and may be configured to generate operation signals for operating each unit of the substrate processing system 1, based on the various types of data stored in the storage unit M2, for example.

[0058] The instruction unit M4 is configured to transmit the operation signal generated in the processing unit M3 to each unit of the substrate processing system 1.

[0059] The hardware of the controller Ctr may be configured, for example, by one or more control computers. As shown in FIG. 4 , the controller Ctr may include a circuit Ctr1 as a hardware configuration. The circuit Ctr1 may be configured by electric circuit elements. The circuit Ctr1 may include, for example, a processor Ctr2, a memory Ctr3, a storage Ctr4, a driver Ctr5, and an input / output port Ctr6.

[0060] The processor Ctr2 may be configured to execute a program in cooperation with at least one of the memory Ctr3 and the storage Ctr4 and to implement each of the above-mentioned functional modules by inputting and outputting signals via the input / output port Ctr6. The memory Ctr3 and the storage Ctr4 may function as the memory unit M2. The driver Ctr5 may be a circuit configured to drive each component of the substrate processing system 1. The input / output port Ctr6 may be configured to mediate the input and output of signals between the driver Ctr5 and each component of the substrate processing system 1.

[0061] The substrate processing system 1 may include a single controller Ctr, or may include a controller group (controller) composed of multiple controllers Ctr. When the substrate processing system 1 includes a controller group, each of the above-described functional modules may be implemented by a single controller Ctr or by a combination of two or more controllers Ctr. When the controller Ctr is composed of multiple computers (circuits Ctr1), each of the above-described functional modules may be implemented by a single computer (circuit Ctr1) or by a combination of two or more computers (circuits Ctr1). The controller Ctr may include multiple processors Ctr2. In this case, each of the above-described functional modules may be implemented by a single processor Ctr2 or by a combination of two or more processors Ctr2.

[0062] 5 to 12, a method for replacing the processing liquid L in the storage tank T1 (a method for supplying the processing liquid L to the substrate W and a method for replacing the processing liquid L) after processing the substrate W with the processing liquid L will be described. In FIGS. 6 to 12, the thick solid lines indicate the processing liquid L delivered from the storage tank T1, and the thick dashed lines indicate the processing liquid L delivered from the storage tank T2.

[0063] First, the circulation of the processing liquid L is started in the storage tank T1 and the circulation line (see step S11 in FIG. 5 ). Specifically, as illustrated in FIG. 6 , the controller Ctr instructs the valves V3 and V5, the pump P1, and the heater HT1 to open the valves V3 and V5, and circulates the processing liquid L (new liquid) in the storage tank T1 while heating it in the storage tank T1 and the circulation line (see the thick solid lines in FIG. 6 ). In this state, the controller Ctr instructs the valves V7 and V8 to appropriately control the opening and closing of the valves V7 and V8. When the valves V7 and V8 are opened, the processing liquid L (new liquid) from the storage tank T1 is supplied to the substrates W in the liquid processing unit U, and the substrates W are processed with the processing liquid L (see step S11 in FIG. 5 and the thick solid lines in FIG. 6 ).

[0064] At this time, if the sensor SE12 detects that the liquid level in the storage tank T1 has fallen below the position of the sensor SE12 as the processing liquid L is supplied to the substrate W, the sensor SE12 transmits the detection result to the controller Ctr. Upon receiving the detection result, the controller Ctr instructs the valve V1 to open the valve V1 and replenishes the storage tank T1 with the processing liquid L (new liquid) from the liquid source 21 until the sensor SE12 detects that the liquid level in the storage tank T1 has reached the position of the sensor SE12. This replenishment process of the processing liquid L is performed appropriately based on the detection result of the sensor SE12 while the processing liquid L is circulating in the storage tank T1 and the circulation line and while the processing liquid L is being supplied to the substrate W.

[0065] Meanwhile, during the circulation of the processing liquid L in the storage tank T1 and the circulation line, the processing liquid L is also circulated in the storage tank T2 and the sub-circulation line. Specifically, as illustrated in Fig. 6, the controller Ctr instructs the valves V10 and V12, the pump P2, and the heater HT2 to open the valves V10 and V12, and circulates the processing liquid L (new liquid) in the storage tank T2 while heating it in the storage tank T2 and the sub-circulation line (see the thick dashed line in Fig. 6).

[0066] Next, the controller Ctr determines whether a predetermined time has elapsed since the start of circulation, as the timing for replacing the processing liquid L circulating in the storage tank T1 and the circulation line due to deterioration (see step S12 in FIG. 5). If the controller Ctr determines that the predetermined time has not elapsed (see "NO" in step S12 in FIG. 5), it is not time to replace the processing liquid L circulating in the storage tank T1 and the circulation line, and therefore continues circulating the processing liquid L in the storage tank T1 and the circulation line and supplying the processing liquid L to the substrates W.

[0067] On the other hand, when the controller Ctr determines that the predetermined time has elapsed (see "YES" in step S12 in FIG. 5), the controller Ctr instructs the valves V10 and V12, the pump P2, and the heater HT2, as illustrated in FIG. 7. As a result, the valves V10 and V12 are closed, and the operation of the pump P2 and the heater HT2 is stopped, thereby stopping the circulation of the treatment liquid L in the storage tank T2 and the sub-circulation line (see step S13 in FIG. 5).

[0068] Next, as illustrated in Fig. 8, the controller Ctr instructs the valves V3 and V4 to close the valve V3 and open the valve V4. This stops the transfer of the processing liquid L from the storage tank T1 to the circulation line, and starts the transfer of the processing liquid L from the storage tank T2 to the circulation line (see step S14 in Fig. 5). Therefore, as illustrated in Fig. 9, the processing liquid L (old liquid) from the storage tank T1 remaining in the circulation line is pushed into the storage tank T1 by the processing liquid L (new liquid) transferred from the storage tank T2, and is stored in the storage tank T1.

[0069] Next, the controller Ctr determines whether or not it has received a detection result from the sensor SE13 indicating that the liquid level in the storage tank T1 has reached the position of the sensor SE13 (see step S15 in FIG. 5). If the controller Ctr determines that it has not received the detection result (see "NO" in step S15 in FIG. 5), it continues to send the treatment liquid L from the storage tank T2 to the circulation line. This also continues the pushing of the old treatment liquid L into the storage tank T1 by the new treatment liquid.

[0070] On the other hand, when the controller Ctr determines that it has received the detection result (see "YES" in step S15 of FIG. 5), it determines that all of the processing liquid L (old liquid) from the storage tank T1 remaining in the circulation line has been recovered to the storage tank T1, as illustrated in FIG. 10. Therefore, as illustrated in FIG. 11, the controller Ctr instructs the valves V5 and V6 to close the valve V5 and open the valve V6. This completes the replacement process of the processing liquid L, and the circulation of the processing liquid L begins in the storage tank T2 and the circulation line (see step S16 of FIG. 5). In this state, the controller Ctr instructs the valves V7 and V8 to appropriately control the opening and closing of the valves V7 and V8. When the valves V7 and V8 are opened, the processing liquid L (new liquid) from the storage tank T2 is supplied to the substrate W in the liquid processing unit U, and the substrate W is processed with the processing liquid L (see step S16 of FIG. 5 and the thick dashed line in FIG. 11). 8 to 10, even during the process of replacing the old liquid with the new liquid, the controller Ctr may instruct the valves V7 and V8 to appropriately control the opening and closing of the valves V7 and V8. In this case, the old liquid or the new liquid is supplied to the substrate W depending on the state of the old liquid being pushed out by the new liquid.

[0071] 12, the controller Ctr instructs the valves V9, V13 and the pump P2 to open the valves V9, V13, and discard the processing liquid L (old liquid) in the storage tank T1 while cooling it in the cooling unit 60 (see step S17 in FIG. 5). After this discarding process, the controller Ctr instructs the valve V1 to open the valve V1, and replenishes the storage tank T1 with the processing liquid L (new liquid) from the liquid source 21 until the sensor SE12 detects that the liquid level in the storage tank T1 has reached the position of the sensor SE12. Although not described further, the processing liquid L circulating through the storage tank T2 and the circulation line is replaced using the same procedure as above.

[0072] [Operation] According to the above example, the processing liquid L (old liquid) remaining in the circulation line is pushed out by the processing liquid L (new liquid) stored in the storage tank T2 and recovered in the storage tank T1. When all of the processing liquid (old liquid) remaining in the circulation line is recovered in the storage tank T1, the processing liquid (new liquid) stored in the storage tank T2 begins to circulate through the circulation line and the storage tank T2 and is used to process the substrates W. Therefore, the recovery of the old liquid and the circulation of the new liquid are carried out without stopping the processing of the substrates W. Therefore, it is possible to continue the processing of the substrates W even when the processing liquid L is being replaced.

[0073] According to the above example, the sensor SE13 may be a level sensor configured to detect the liquid level of the processing liquid L stored in the storage tank T1. In this case, for example, by installing the sensor SE13 at a position in the storage tank T1 that can detect the liquid level reached when all of the processing liquid L (old liquid) remaining in the circulation line has been recovered in the storage tank T1, it becomes possible to automatically determine whether all of the old liquid has been recovered in the storage tank T1.

[0074] According to the above example, the liquid level detected by sensor SE13 can be set higher than the liquid level detected by sensor SE12. In this case, even if the liquid level of the processing liquid L in the storage tank T1 drops as a result of the processing liquid L being supplied to the substrate W, the drop in liquid level is detected by sensor SE12. Therefore, based on the detection by sensor SE12, it is possible to automatically replenish the storage tank T1 with the amount of processing liquid L used to process the substrate W.

[0075] According to the above example, after the sensor SE13 detects that all of the processing liquid L remaining in the circulation line has flowed into the storage tank T1, the controller Ctr controls the valves V9, V13 and the pump P2 to execute a process of discharging the processing liquid L from the storage tank T1. In this case, the processing liquid L (old liquid) remaining in the circulation line can be discharged from the storage tank T1 to the outside through the pipes D11, D13, and D16.

[0076] According to the above example, the processing liquid L to be discarded from the storage tank T1 can be cooled by the cooling unit 60. In this case, it is possible to discard the processing liquid L in a state in which evaporation of the processing liquid L is suppressed.

[0077] [Modifications] The disclosure in this specification should be considered to be illustrative in all respects and not restrictive. Various omissions, substitutions, modifications, etc. may be made to the above examples without departing from the scope and spirit of the claims.

[0078] (1) Instead of or in addition to the sensor SE13, a flow rate sensor configured to detect the flow rate of the processing liquid L flowing through the circulation line may be provided in the circulation line. In this case, for example, by setting the flow rate sensor and the controller Ctr so as to detect the integrated flow rate when all of the processing liquid L (old liquid) remaining in the circulation line has flowed into the storage tank T1, it becomes possible to automatically determine whether all of the old liquid has been recovered into the storage tank T1.

[0079] (2) After the controller Ctr starts pushing out the processing liquid L remaining in the circulation line into the storage tank T1, it can control the valves V9, V13 and the pump P2 to execute a process of discharging the processing liquid L from the storage tank T1. In this case, the entire amount (residual liquid amount) of the processing liquid L (old liquid) remaining in the circulation line is discarded to the outside without being stored in the storage tank T1. Therefore, even if the amount of residual liquid is large compared to the capacity of the storage tank T1, it is possible to discard the old liquid to the outside before the storage tank T1 becomes full with the recovered old liquid.

[0080] (3) The processing liquid supply unit 11 may include two or more circulation lines. When the processing liquid supply unit 11 includes multiple circulation lines, the processing liquid L may be supplied to at least one liquid processing unit U from each circulation line.

[0081] (4) The processing liquid supply unit 11 may include three or more storage tanks.

[0082] (5) In the above examples, the controller Ctr determines whether a predetermined time has elapsed since the start of circulation as the timing for replacement due to deterioration of the processing liquid L circulating in the storage tank T1 and the circulation line. However, the controller Ctr may determine whether a predetermined number of substrates W have been processed as the timing for replacement. Alternatively, a sensor capable of detecting the deterioration state of the processing liquid L flowing through the circulation line may be installed in the circulation line, and the controller Ctr may determine whether the deterioration state detected by the sensor has exceeded a predetermined degree of deterioration as the timing for replacement.

[0083] [Other Examples] Example 1. One example of a processing liquid supply device includes a first reservoir and a second reservoir configured to store a processing liquid for processing a substrate, a circulation unit configured to return the processing liquid discharged from the first reservoir and the processing liquid discharged from the second reservoir to the first reservoir and the second reservoir through a circulation line including upstream ends branching and connected to the bottoms of the first reservoir and the second reservoir, respectively, and downstream ends branching and connected to the tops of the first reservoir and the second reservoir, respectively, a processing unit configured to process a substrate by discharging the processing liquid onto the substrate, a supply unit configured to supply the processing liquid from the circulation line to the processing unit, a detection unit configured to detect the amount of processing liquid flowing into the first reservoir through the circulation line, and a control unit. The control unit is configured to execute a first process of controlling the circulation unit to stop the delivery of the processing liquid circulating through the circulation line and the first reservoir from the first reservoir and to deliver the processing liquid stored in the second reservoir to the circulation line to push the processing liquid remaining in the circulation line into the first reservoir, a second process of controlling the circulation unit to return the processing liquid stored in the second reservoir to the second reservoir through the circulation line when the detection unit detects that all of the processing liquid remaining in the circulation line has flowed into the first reservoir after the first process, and a third process of controlling the supply unit to discharge the circulating processing liquid from the circulation line onto the substrate while the processing liquid is circulating through the circulation line and the second reservoir by the second process. In this case, the processing liquid (old liquid) remaining in the circulation line is pushed out by the processing liquid (new liquid) stored in the second reservoir and recovered in the first reservoir. When the processing liquid (old liquid) remaining in the circulation line is completely collected in the first storage section, the processing liquid (new liquid) stored in the second storage section begins to circulate through the circulation line and the second storage section and is used to process substrates. Therefore, the collection of the old liquid and the circulation of the new liquid are performed without stopping the processing of substrates. Therefore, it is possible to continue processing substrates even when the processing liquid is being replaced.

[0084] Example 2. In the apparatus of Example 1, the detection unit may be a level sensor configured to detect the liquid level of the treatment liquid stored in the first storage unit. In this case, for example, by setting the detection unit to be able to detect the liquid level reached when all of the treatment liquid (old liquid) remaining in the circulation line has been collected in the first storage unit, it becomes possible to automatically determine whether all of the old liquid has been collected in the first storage unit.

[0085] Example 3 The apparatus of Example 2 may further include another detector that is a level sensor that indicates the level of the processing liquid to be maintained in the first reservoir when the processing liquid circulates through the circulation line and the first reservoir. The liquid level detected by the detector may be set higher than the liquid level detected by the other detector. In this case, even if the level of the processing liquid in the first reservoir drops as a result of the processing liquid being supplied to the substrate, the drop in the liquid level is detected by the other detector. Therefore, based on the detection by the other detector, it is possible to automatically replenish the first reservoir with the amount of processing liquid used to process the substrate.

[0086] Example 4. In the apparatus of Example 1, the detection unit may be a flow sensor configured to detect the flow rate of the treatment liquid flowing from the circulation line into the first storage unit. In this case, for example, by setting the detection unit to be able to detect the integrated flow rate when all of the treatment liquid (old liquid) remaining in the circulation line has flowed into the first storage unit, it becomes possible to automatically determine whether all of the old liquid has been recovered in the first storage unit.

[0087] Example 5. The apparatus of any of Examples 1 to 4 may further include a drainage unit configured to drain the treatment liquid from the first reservoir. The control unit may be configured to further execute a fourth process of controlling the drainage unit to drain the treatment liquid from the first reservoir after the process liquid remaining in the circulation line starts to be pushed into the first reservoir, or after the detection unit detects that all of the treatment liquid remaining in the circulation line has flowed into the first reservoir. In this case, the treatment liquid (old liquid) remaining in the circulation line can be discarded from the first reservoir to the outside via the drainage unit.

[0088] Example 6 The apparatus of Example 5 may further include a cooling unit configured to cool the treatment liquid discharged from the drainage unit. In this case, the treatment liquid can be disposed of in a state where evaporation of the treatment liquid is suppressed.

[0089] Example 7. An example of a processing liquid supply method includes a first step of stopping the delivery from the first storage unit of the processing liquid that has been delivered from the first storage unit and circulating to return to the first storage unit through a circulation line, and delivering the processing liquid stored in the second storage unit to the circulation line to push the processing liquid remaining in the circulation line into the first storage unit, a second step of returning the processing liquid stored in the second storage unit to the second storage unit through the circulation line when a detection unit detects that all of the processing liquid remaining in the circulation line has flowed into the first storage unit after the first step, and a third step of discharging the circulating processing liquid from the circulation line onto a substrate while the processing liquid is circulating through the circulation line and the second storage unit as a result of the second step, thereby treating the substrate with the processing liquid. In this case, the same effects as those of the apparatus of Example 1 can be obtained.

[0090] Example 8 In the method of Example 7, the detection unit may be a level sensor configured to detect the level of the treatment liquid stored in the first storage unit. In this case, the same effects as those of the device of Example 2 can be obtained.

[0091] Example 9 In the method of Example 8, the liquid level detected by the detection unit may be set higher than the liquid level detected by another detection unit. The another detection unit may be a level sensor that indicates the liquid level of the treatment liquid to be maintained in the first reservoir when the treatment liquid circulates through the circulation line and the first reservoir. In this case, the same effects as those of the device of Example 3 can be obtained.

[0092] Example 10 In the method of Example 7, the detection unit may be a flow rate sensor configured to detect the flow rate of the treatment liquid flowing from the circulation line into the first storage unit. In this case, the same effects as those of the device of Example 4 can be obtained.

[0093] Example 11. Any of the methods of Examples 7 to 10 may further include a fourth step of draining the treatment liquid in the first reservoir through the drainage section after the treatment liquid remaining in the circulation line starts to be pushed out into the first reservoir, or after the detection section detects that all of the treatment liquid remaining in the circulation line has flowed into the first reservoir. In this case, the same effects as those of the device of Example 5 can be obtained.

[0094] Example 12 In the method of Example 11, the fourth step may include cooling the treated liquid discharged from the drainage part by a cooling part. In this case, the same effects as those of the device of Example 6 can be obtained.

[0095] 10...treatment liquid supply device, 11...treatment liquid supply section, 30...circulation section, 40...branching section (supply section), 50...drainage section, 60...cooling section, Ctr...controller (control section), D4 to D8...piping (circulation line), D4, D5...piping (upstream end), D7, D8...piping (downstream end), L...treatment liquid, SE12...sensor (another detection section), SE13...sensor (detection section), T1...storage tank (first storage section), T2...storage tank (second storage section), U...liquid processing unit (processing section), W...substrate.

Claims

1. A first storage unit and a second storage unit configured to store a processing liquid for processing a substrate, an upstream end portion branched and connected to the bottom portions of the first storage unit and the second storage unit respectively, and a downstream end portion branched and connected to the upper portions of the first storage unit and the second storage unit respectively. A circulation unit configured to return the processing liquid discharged from the first storage unit and the processing liquid discharged from the second storage unit to the first storage unit and the second storage unit through a circulation line including the above; a processing unit configured to process the substrate by discharging the processing liquid onto the substrate; a supply unit configured to supply the processing liquid from the circulation line to the processing unit; a detection unit configured to detect the amount of the processing liquid flowing into the first storage unit through the circulation line; and a control unit. The control unit controls the circulation unit to stop the delivery of the processing liquid circulating in the circulation line and the first storage unit from the first storage unit, and to send the processing liquid stored in the second storage unit to the circulation line to push out the processing liquid remaining in the circulation line into the first storage unit, which is the first process. After the first process, when the detection unit detects that all the processing liquid remaining in the circulation line has flowed into the first storage unit, the control unit controls the circulation unit to return the processing liquid stored in the second storage unit to the second storage unit through the circulation line, which is the second process. When the processing liquid is circulating in the circulation line and the second storage unit by the second process, the control unit controls the supply unit to execute a third process of discharging the circulating processing liquid from the circulation line onto the substrate. A processing liquid supply device configured as described above.

2. The device according to claim 1, wherein the detection unit is a level sensor configured to detect the liquid level of the processing liquid stored in the first storage unit.

3. The device according to claim 2, further comprising another detection unit which is a level sensor indicating the liquid level of the processing liquid to be maintained in the first storage unit when the processing liquid is circulating in the circulation line and the first storage unit. The liquid level detected by the detection unit is set higher than the liquid level detected by the other detection unit.

4. The apparatus according to claim 1, wherein the detection unit is a flow rate sensor configured to detect the flow rate of the processing liquid flowing from the circulation line into the first storage unit.

5. The apparatus according to any one of claims 1 to 4, further comprising a drainage unit configured to discharge the processing liquid in the first storage unit, wherein the control unit controls the drainage unit to further execute a fourth process of discharging the processing liquid in the first storage unit after the extrusion of the processing liquid remaining in the circulation line into the first storage unit is started, or after the detection unit detects that all of the processing liquid remaining in the circulation line has flowed into the first storage unit.

6. The apparatus according to claim 5, further comprising a cooling unit configured to cool the processing liquid discharged from the drainage unit.

7. A processing liquid supply method including: a first step of stopping the sending of the processing liquid from the first storage unit that circulates back to the first storage unit through the circulation line after being sent out from the first storage unit, sending the processing liquid stored in the second storage unit to the circulation line, and extruding the processing liquid remaining in the circulation line into the first storage unit; a second step of, after the first step, when the detection unit detects that all of the processing liquid remaining in the circulation line has flowed into the first storage unit, returning the processing liquid stored in the second storage unit to the second storage unit through the circulation line; and a third step of, when the processing liquid is circulating through the circulation line and the second storage unit in the second step, discharging the circulating processing liquid from the circulation line onto the substrate to process the substrate with the processing liquid.

8. The method according to claim 7, wherein the detection unit is a level sensor configured to detect the liquid level of the processing liquid stored in the first storage unit.

9. The method according to claim 8, wherein the liquid level detected by the detection unit is set higher than the liquid level detected by another detection unit, and the another detection unit is a level sensor indicating the liquid level of the processing liquid to be maintained in the first storage unit when the processing liquid is circulating through the circulation line and the first storage unit.

10. The method according to claim 7, wherein the detection unit is a flow rate sensor configured to detect the flow rate of the processing liquid flowing from the circulation line into the first storage unit.

11. The method according to any one of claims 7 to 10, further comprising a fourth step of discharging the processing liquid in the first storage unit through a drainage unit after the extrusion of the processing liquid remaining in the circulation line into the first storage unit is started, or after the detection unit detects that all of the processing liquid remaining in the circulation line has flowed into the first storage unit.

12. The method according to claim 11, wherein the fourth step includes cooling the processing liquid discharged from the drainage unit by a cooling unit.

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