Automatic beam current adjustment method for electron accelerator, and electron accelerator

By adjusting the interval and voltage values in segments, the beam current deviation of the electronic accelerator is automatically adjusted, which solves the problem of beam current instability in the prior art and achieves high-precision beam current regulation.

WO2025161245A1PCT designated stage Publication Date: 2025-08-07CGN DASHENG ELECTRON ACCELERATOR TECH
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Patent Information

Application Number
PCT/CN2024/101309
Authority / Receiving Office
WO · WO
Patent Type
Applications
Current Assignee / Owner
Priority Date
2024-02-02
Filing Date
2024-06-25
Publication Date
2025-08-07

AI Technical Summary

Technical Problem

After the existing electronic accelerator is used for a long time or after the hardware equipment is replaced, the changes in hardware characteristics such as filament lead to unstable beam current, and the existing beam current regulation devices cannot accurately adjust the beam current deviation of the electronic accelerator.

Method used

The method of adjusting the interval and voltage value in segments is adopted. By setting the beam current setting value, the maximum beam current value, the beam current deviation range and the voltage adjustment coefficient, the filament voltage is automatically adjusted to accurately adjust the beam current, including setting multiple adjustment intervals and adjustment coefficients, and combining the beam current real-time value and the filament voltage real-time value for precise control.

Benefits of technology

It improves the adjustment accuracy of beam current deviation of electronic accelerator, ensures beam current stability and accuracy, reduces manual intervention, and adapts to equipment changes.

✦ Generated by Eureka AI based on patent content.

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Abstract

The present invention relates to an automatic beam current adjustment method for an electron accelerator, and an electron accelerator. In part, the automatic beam current adjustment method for an electron accelerator comprises the step of: S1, setting a beam current set value A, setting a maximum beam current value B of an electron accelerator, and segmenting from 0 to the maximum beam current value B to form two or more first adjustment intervals α, different first adjustment voltage values C being correspondingly set in each of the first adjustment intervals α. According to the present invention, the two or more first adjustment intervals α are set, and the different first adjustment voltage values C are correspondingly set in each of the first adjustment intervals α. By using a segmentation method, the corresponding first adjustment voltage values C are determined on the basis of a segment in which a real-time beam current value is located, and a voltage adjustment coefficient F is set. During adjustment of a filament voltage, C×F is used as an adjustment value of the filament voltage, so that the adjustment precision of the filament voltage is improved, thereby further improving the adjustment precision of the beam current deviation of the electron accelerator.
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Description

Electron accelerator beam automatic adjustment method and electron accelerator

[0001] This application is based on the Chinese patent application with application number 202410153819.5 and application date of February 2, 2024, and claims the priority of the Chinese patent application. The entire content of the above patent application is hereby introduced into this application as a reference. Technical Field

[0002] The present application relates to an electron accelerator beam automatic adjustment method and an electron accelerator. Background Art

[0003] During the irradiation process of an existing electron accelerator, the characteristics of hardware devices such as the filament will change after the electron accelerator has been used for a long time or after the hardware devices such as the filament have been replaced. There is a large difference between the real-time filament voltage and the set filament voltage, which often causes the equipment beam current to be unstable. There is a large deviation between the real-time beam current value and the set beam current value. The common method in the existing technology uses manual on-site real-time monitoring of the beam current and adjusts the filament voltage based on experience, thereby adjusting the difference between the set beam current value and the feedback value.

[0004] The manual adjustment method is relatively inconvenient, therefore, a beam adjustment device is often set up to automatically adjust the beam size.

[0005] However, existing beam current adjustment devices cannot accurately adjust the electron beam current deviation of the electron accelerator.

[0006] The reference to any prior art in the specification is not an acknowledgement or suggestion that the prior art forms part of the common general knowledge in any jurisdiction, or that it could reasonably be expected that the person skilled in the art would understand, consider relevant and / or combine with other prior art. Summary of the Invention

[0007] The purpose of this application is to provide an electron accelerator beam automatic adjustment method and an electron accelerator, so as to achieve precise adjustment of the electron beam deviation of the electron accelerator.

[0008] To achieve one of the above-mentioned objectives, an embodiment of the present invention provides a method for automatically adjusting the beam current of an electron accelerator, comprising the following steps:

[0009] S1, setting a beam current setting value A and a maximum beam current value B of the electron accelerator, segmenting the range from 0 to the maximum beam current value B to form two or more first adjustment intervals α, each of which corresponds to a different first adjustment voltage value C; setting a beam current deviation range value [D, E], where the minimum value D of the beam current deviation range value is ≤ 0 and the maximum value E of the beam current deviation range value is ≥ 0; and setting a voltage adjustment coefficient F;

[0010] S2, collects the real-time value of the electron accelerator beam current G and the real-time value of the filament voltage H;

[0011] S3, obtaining a beam current real-time deviation value I=AG through calculation; and determining the first adjustment interval α in which the beam current real-time value G is located, and obtaining the corresponding first adjustment voltage value C;

[0012] S4, determining whether the real-time beam deviation value I is within the beam deviation range [D, E]. If the real-time beam deviation value I is within the beam deviation range [D, E], returning to S2. If the real-time beam deviation value F is not within the beam deviation range, and I>E, proceeding to S5. If the real-time beam deviation value F is not within the beam deviation range, and I<D, proceeding to S6.

[0013] S5, obtaining a first adjustment voltage J=H+(C×F) by calculation, controlling the real-time value H of the filament voltage to be adjusted to the first adjustment voltage J, and then returning to S2;

[0014] S6 , obtaining a second adjustment voltage K=H−(C×F) through calculation, controlling the real-time value H of the filament voltage to be adjusted to the second adjustment voltage K, and then returning to S2 .

[0015] As a further improvement to the embodiment of this application,

[0016] In S1, the numerical interval (0, +∞) is segmented to form two or more second adjustment intervals β, each of which corresponds to a different second adjustment interval coefficient L;

[0017] In S3, after obtaining the beam current real-time deviation value I, the absolute value of the beam current real-time deviation value I is taken to obtain |I|; after completing S3, the process proceeds to S31;

[0018] S31, determine whether |I| is within the second adjustment interval β; if |I| is not within the second adjustment interval β, return to S2; if |I| is within the second adjustment interval β, enter S32;

[0019] S32 , determining the second adjustment interval β where |I| is located, obtaining the corresponding second adjustment interval coefficient L, assigning the second adjustment interval coefficient L to the voltage adjustment coefficient F, and then entering S4 .

[0020] As a further improvement of the embodiment of this application,

[0021] In S1, the numerical interval (-∞, +∞) is segmented to form two or more third adjustment intervals γ, each of which corresponds to a different third adjustment interval coefficient M;

[0022] After completing S32, enter S33;

[0023] S33, determining the third adjustment interval γ in which the value of I is located, obtaining the corresponding third adjustment interval coefficient M, and then proceeding to S34;

[0024] S34 , obtaining a first temporary adjustment coefficient N=L×M through calculation, assigning the first temporary adjustment coefficient N to the voltage adjustment coefficient F, and then entering S4 .

[0025] As a further improvement to the embodiment of this application,

[0026] In S1, the filament voltage setting value P, the fourth adjustment interval coefficient Q and the fifth adjustment interval coefficient R are set simultaneously;

[0027] After completing S2, go to S21;

[0028] S21, determine the size of the filament voltage setting value P and the filament voltage real-time value H. If P=H, return to S2; if P>H, extract the fourth adjustment interval coefficient Q, and go to S3; if P<H, extract the fifth adjustment interval coefficient R, and go to S3;

[0029] After completing S34, enter S35;

[0030] S35, if P>H, obtain the second temporary adjustment coefficient S=N×Q by calculation, assign the second temporary adjustment coefficient S to the voltage adjustment coefficient F, and then enter S4; if P<H, obtain the third temporary adjustment coefficient T=N×R by calculation, assign the third temporary adjustment coefficient T to the voltage adjustment coefficient F, and then enter S4.

[0031] As a further improvement of the embodiment of the present application, there are two second adjustment intervals β, namely, the interval (0, 1] and the interval (1, +∞).

[0032] As a further improvement of the implementation manner of the present application, there are two third adjustment intervals, namely the interval (-∞, 0) and the interval [0, +∞).

[0033] As a further improvement to the implementation manner of the present application, D=E=0.

[0034] An embodiment of the present invention further discloses an electron accelerator, which adopts the above-mentioned electron accelerator beam automatic adjustment method.

[0035] As a further improvement of the implementation mode of the present application, it includes a collector, a display panel and a control program, the collector is used to collect the real-time value G of the beam current and the real-time value H of the filament voltage, the control program includes an adjustment interval coefficient, the adjustment interval coefficient includes the second adjustment interval coefficient L, the third adjustment interval coefficient M, the fourth adjustment interval coefficient Q and the fifth adjustment interval coefficient R, at least one of the adjustment interval coefficients can be adjusted in the display panel.

[0036] As a further improvement of the embodiment of the present application, the fourth adjustment interval coefficient Q and the fifth adjustment interval coefficient R can both be adjusted in the display panel, and the second adjustment interval coefficient L and the third adjustment interval coefficient M are fixed values.

[0037] Compared with the prior art, the beneficial effect of the present application lies in: by setting more than two first adjustment intervals α, each of the first adjustment intervals α is respectively provided with a different first adjustment voltage value C, and a segmented method is adopted to determine the corresponding first adjustment voltage value C according to the segment where the real-time value of the beam is located, and set the voltage adjustment coefficient F. When adjusting the filament voltage, C×F is used as the adjustment value of the filament voltage, thereby improving the adjustment accuracy of the filament voltage, thereby improving the adjustment accuracy of the electron accelerator beam deviation.

[0038] As used herein, the term "comprise" and variations of the term, such as "comprises," "comprised," "comprising," "including," and "containing" do not exclude other features, components, elements, or steps unless the context clearly requires otherwise. BRIEF DESCRIPTION OF THE DRAWINGS

[0039] FIG1 is a flow chart of a first embodiment of a method for automatically adjusting an electron accelerator beam current according to the present invention;

[0040] FIG2 is a flow chart of a second embodiment of a method for automatically adjusting an electron accelerator beam current according to the present invention;

[0041] 3 is a flow chart of a third embodiment of a method for automatically adjusting an electron accelerator beam current according to the present invention;

[0042] FIG4 is a flow chart of a fourth embodiment of a method for automatically adjusting an electron accelerator beam current according to the present invention;

[0043] FIG5 is a flow chart of a fifth embodiment of a method for automatically adjusting the electron accelerator beam current according to the present invention. DETAILED DESCRIPTION

[0044] In order to have a clearer understanding of the technical features, purposes and effects of the present invention, specific embodiments of the present invention are now described with reference to the accompanying drawings.

[0045] Example 1:

[0046] As shown in FIG1 , in order to improve the adjustment accuracy of electron accelerator beam deviation, the present invention discloses an electron accelerator beam automatic adjustment method, comprising the following steps:

[0047] Step S1, set the beam current setting value A (unit: milliampere), set the maximum beam current value B (unit: milliampere) of the electron accelerator. For different electron accelerators, the beam current setting value A and the maximum beam current value B may be different. In this embodiment, the beam current setting value A may be 10 milliamperes, and the maximum beam current value B may be 50 milliamperes. In addition, the range from 0 to the maximum beam current value B is segmented to form two or more first adjustment intervals α, and different first adjustment voltage values ​​C are respectively provided in each of the α1 and the adjustment interval α. In this embodiment, the first adjustment interval α may be provided with six, namely α1, α2, α3, α4, α5, and α6, and the first adjustment voltage values ​​C corresponding to them are C1, C2, C3, C4, C5, and C6, respectively. Specifically,

[0048] α1: (0, 7 mA], the corresponding C1 can be 5 volts;

[0049] α2: (7,13 mA], the corresponding C2 can be 6 volts;

[0050] α3: (13,23 mA], the corresponding C3 can be 7 volts;

[0051] α4: (23,33 mA], the corresponding C4 can be 8 volts;

[0052] α5: (33,43 mA], the corresponding C5 can be 9 volts;

[0053] α6: (43,50 mA], the corresponding C6 can be 10 volts.

[0054] At the same time, the beam current deviation range value [D, E] is set, wherein the minimum value D of the beam current deviation range value is ≤ 0, and the maximum value E of the beam current deviation range value is ≥ 0; and the voltage adjustment coefficient F is set. In this embodiment, because the electron accelerator beam current automatic adjustment method of the present invention is controlled by a computer program, and computer programs are often prone to defects or errors during programming, in order to address possible defects or errors, the minimum value D of the beam current deviation range value and the maximum value E of the beam current deviation range value are not set to 0. In this embodiment, the minimum value D of the beam current deviation range value can be -4 mA, and the maximum value E of the beam current deviation range value can be 6 mA. In this embodiment, the voltage adjustment coefficient F can be a constant of 0.02. In other embodiments, to achieve precise adjustment of the electron accelerator beam current size, the minimum value D of the beam current deviation range value and the maximum value E of the beam current deviation range value are both set to 0. After completing step S1, step S2 is entered.

[0055] Step S2: Collect the real-time beam current value G and the real-time filament voltage value H of the electron accelerator. In this embodiment, assume that the real-time beam current value G is 15 mA and the real-time filament voltage value H is 20 V. After completing step S2, proceed to step S3.

[0056] In step S3, a real-time beam current deviation value I = AG is calculated. The first adjustment interval α within which the real-time beam current value G lies is determined, and the corresponding first adjustment voltage value C is obtained. Therefore, the real-time beam current deviation value I = -5 mA. When the real-time beam current value G lies within interval α3, the corresponding first adjustment voltage value C is 7 V. After completing step S3, the process proceeds to step S4.

[0057] Step S4: Determine whether the real-time beam current deviation value I is within the beam current deviation range [D, E]. In this embodiment, the real-time beam current deviation value I = -5 mA, which is not within the beam current deviation range [-4, 6]. If the real-time beam current deviation value I is within the beam current deviation range [D, E], it indicates that the real-time beam current deviation value I is small, so there is no need to control the beam current of the electron accelerator, and the process returns to step S2. If the real-time beam current deviation value F is not within the beam current deviation range, and I>E, it indicates that the real-time beam current value I is much smaller than the beam current setting value A. Therefore, it is necessary to increase the real-time filament voltage value H, and the process returns to step S5. If the real-time beam current deviation value F is not within the beam current deviation range, and I<D, it indicates that the real-time beam current value I is much larger than the beam current setting value A. Therefore, it is necessary to decrease the real-time filament voltage value H, and the process returns to step S6. In this embodiment, after determining whether the beam current real-time deviation value I is within the beam current deviation range [D, E], the process proceeds to step S6 because the beam current real-time deviation value I (-5 mA) is less than the minimum value D (-4 mA) of the beam current deviation range.

[0058] Step S5 , obtaining a first adjustment voltage J=H+(C×F) by calculation, controlling the real-time value H of the filament voltage to be adjusted to the first adjustment voltage J, ie, increasing the filament voltage, and returning to step S2 .

[0059] Step S6 calculates a second adjusted voltage K = H - (C × F). After adjusting the real-time filament voltage value H to the second adjusted voltage K, the filament voltage is reduced, and the process returns to step S2. In this embodiment, the second adjusted voltage K is calculated as 20 - (7 × 0.02) = 19.86 volts. After adjusting the real-time filament voltage value H from 20 volts to 19.86 volts, step S2 is repeated.

[0060] The present invention sets two or more first adjustment intervals α, each of which corresponds to a different first adjustment voltage value C. A segmented method is adopted to determine the corresponding first adjustment voltage value C and set the voltage adjustment coefficient F according to the segment in which the real-time beam current value is located. Different electron accelerators are respectively set with different first adjustment voltage values ​​C and voltage adjustment coefficients F. When adjusting the filament voltage, C×F is used as the adjustment value of the filament voltage, thereby effectively improving the adjustment accuracy of the filament voltage and thereby improving the adjustment accuracy of the electron accelerator beam current deviation.

[0061] Example 2:

[0062] As shown in FIG2 , this embodiment is a further refinement of the first embodiment. Specifically, step S21 is added between step S2 and step S3, step S30 is added between step S3 and step S4, and setting contents are added to step S1, wherein:

[0063] In step S1 , the filament voltage setting value P, the fourth adjustment interval coefficient Q, and the fifth adjustment interval coefficient R are simultaneously set. In this embodiment, the filament voltage setting value P may be 15V, the fourth adjustment interval coefficient Q may be a constant of 0.03, and the fifth adjustment interval coefficient R may be a constant of 0.04.

[0064] After completing step S2, the process does not proceed to step S3 but to step S21.

[0065] Step S21 determines the difference between the filament voltage set value P and the real-time filament voltage value H. If P = H, the process returns to step S2, indicating that the filament voltage does not deviate from the set value, and thus, the electron accelerator beam current has little or no deviation from the set value. In this embodiment, the filament voltage set value P is set to a fixed value. In other embodiments, a filament voltage set range value may be used instead of the filament voltage set value P. If P > H, the fourth adjustment interval coefficient Q is extracted, and the process returns to step S3. If P < H, the fifth adjustment interval coefficient R is extracted, and the process returns to step S3.

[0066] After completing step S3, the process does not proceed to step S4 but proceeds to step S30.

[0067] In step S30, if P>H, the fourth adjustment interval coefficient Q is assigned to the voltage adjustment coefficient F, and then the process proceeds to S4. If P<H, the fifth adjustment interval coefficient R is assigned to the voltage adjustment coefficient F, and then the process proceeds to S4.

[0068] Therefore, in this embodiment, because P (15 volts) < H (20 volts), the fifth adjustment interval coefficient R (0.04) is assigned to the voltage adjustment coefficient F. And because I < D in step S4, the process proceeds to step S6. In step S6, the second adjustment voltage K is calculated to be K = 20 - (7 × 0.04) = 19.72 volts.

[0069] In this embodiment, the electron accelerator beam current automatic adjustment method of the present invention adjusts the voltage adjustment coefficient F by comparing the real-time filament voltage value H and the set filament voltage value P. The voltage adjustment coefficient F is adjusted based on the filament voltage and beam current, and the adjustment value of the filament voltage is adjusted from two dimensions: the filament voltage and the beam current. This further improves the adjustment accuracy of the filament voltage, thereby further improving the adjustment accuracy of the electron accelerator beam current deviation.

[0070] Example 3:

[0071] As shown in FIG3 , this embodiment is a further refinement of the first embodiment. Specifically, setting contents are added to step S1, and steps S31 and S32 are added between steps S3 and S4, wherein:

[0072] In step S1, the numerical interval (0, +∞) is segmented to form two or more second adjustment intervals β, each of which corresponds to a different second adjustment interval coefficient L. In this embodiment, there are two second adjustment intervals β, namely β1 and β2, which correspond to the second adjustment interval coefficients L as L1 and L2 respectively. Specifically,

[0073] β1: (0,1], the corresponding L1 can be a constant of 0.05;

[0074] β2: (1, +∞), corresponding to L2, which can be a constant of 0.06.

[0075] In step S3, after obtaining the beam current real-time deviation value I, the absolute value of the beam current real-time deviation value I is taken to obtain |I|. In this embodiment, |I|=5. After completing step S3, the process does not proceed to step S4, but proceeds to step S31.

[0076] Step S31 determines whether |I| is within the second adjustment range β. If |I| is not within the second adjustment range β, that is, |I| = 0, this indicates that the real-time beam current value does not deviate from the set beam current value, so the process returns to step S2. If |I| is within the second adjustment range β, the process proceeds to step S32. In this embodiment, step S32 is required.

[0077] Step S32 determines the second adjustment interval β in which |I| lies, obtains the corresponding second adjustment interval coefficient L, and assigns the second adjustment interval coefficient L to the voltage adjustment coefficient F, then proceeds to step S4. In this embodiment, since |I| = 5, it corresponds to interval β2, and the corresponding second adjustment interval coefficient L is 0.06. The value 0.06 is assigned to the voltage adjustment coefficient F. Therefore, when calculating the second adjustment voltage K in step S6, K = 20 - (7 × 0.06) = 19.58 volts.

[0078] In this embodiment, the electron accelerator beam automatic adjustment method of the present invention sets the second adjustment interval β, and then performs a first segmentation on the voltage adjustment coefficient F according to the numerical value of |I|, thereby obtaining a more accurate voltage adjustment coefficient F, further improving the adjustment accuracy of the filament voltage, and further improving the adjustment accuracy of the electron accelerator beam deviation.

[0079] Example 4:

[0080] As shown in FIG4 , this embodiment is a further refinement of the third embodiment. Specifically, setting contents are added to step S1, and steps S33 and S34 are added between steps S32 and S4, wherein:

[0081] In step S1, the numerical interval (-∞, +∞) is segmented to form two or more third adjustment intervals γ, each of which corresponds to a different third adjustment interval coefficient M. In this embodiment, there are four third adjustment intervals γ, namely γ1, γ2, γ3 and γ4, which correspond to the second adjustment interval coefficients M as M1, M2, M3 and M4 respectively. Specifically,

[0082] When |I| is in the interval β1:(0,1], it corresponds to the interval γ1 and the interval γ2, where,

[0083] γ1: (-∞, 0), the corresponding M1 can be a constant 7;

[0084] γ2: [0, +∞), the corresponding M2 can be a constant 8;

[0085] When |I| is in the interval β2: (1, ﹢∞), it corresponds to the interval γ3 and the interval γ4, where

[0086] γ3: (-∞, 0), the corresponding M3 can be a constant 7;

[0087] γ4: [0, +∞), the corresponding M4 can be a constant 8.

[0088] In this embodiment, γ1=γ3, γ2=γ4. In other embodiments, the intervals of γ1, γ2, γ3 and γ4 may be different.

[0089] After completing step S32, the process does not proceed to step S4 but proceeds to step S33.

[0090] Step S33 determines the third adjustment interval γ in which the beam current real-time value I lies, obtains the corresponding third adjustment interval coefficient M, and then proceeds to S34. In this embodiment, because the beam current real-time value I is -5 mA, |I| = 5, the range falls into interval γ3, and the corresponding third adjustment interval coefficient M is 7.

[0091] In step S34, a first temporary adjustment coefficient N = L × M is calculated and assigned to the voltage adjustment coefficient F, followed by the flow of steps S4. In this embodiment, the first temporary adjustment coefficient N = 0.06 × 7 = 0.42. Therefore, when calculating the second adjustment voltage K in step S6, K = 20 - (7 × 0.42) = 17.06 volts.

[0092] In this embodiment, the electron accelerator beam automatic adjustment method of the present invention sets the third adjustment interval γ, and then divides the voltage adjustment coefficient F into second segments according to the size of the beam real-time value I, and further obtains the accurate voltage adjustment coefficient F, thereby further improving the adjustment accuracy of the filament voltage, and further improving the adjustment accuracy of the electron accelerator beam deviation.

[0093] Embodiment 5:

[0094] As shown in FIG5 , this embodiment is a further refinement of the fourth embodiment. Specifically, setting contents are added to step S1, and step S35 is added between step S34 and step S4, wherein:

[0095] In step S1, the filament voltage setting value P, the fourth adjustment interval coefficient Q, and the fifth adjustment interval coefficient R are set simultaneously. In this embodiment, the filament voltage setting value P can also be set to 15V, the fourth adjustment interval coefficient Q can be a constant of 1.2, and the fifth adjustment interval coefficient R can be a constant of 1.3.

[0096] After completing step S2, the process does not proceed to step S3 but to step S21.

[0097] Step S21 determines the difference between the set filament voltage value P and the real-time filament voltage value H. If P = H, the set filament voltage value and the real-time filament voltage value are the same, and no beam current adjustment is required. The process returns to step S2. If P > H, the set filament voltage value and the real-time filament voltage value differ. In this case, the fourth adjustment interval coefficient Q is extracted, and the process returns to step S3. If P < H, the set filament voltage value and the real-time filament voltage value differ. In this case, the fifth adjustment interval coefficient R is extracted, and the process returns to step S3.

[0098] After completing step S34, the process skips step S4 and proceeds to step S35. In step S35, if P > H, a second temporary adjustment coefficient S = N × Q is calculated and assigned to the voltage adjustment coefficient F, and the process then proceeds to step S4. If P < H, a third temporary adjustment coefficient T = N × R is calculated and assigned to the voltage adjustment coefficient F, and the process then proceeds to step S4. In this embodiment, since P (15 volts) < H (20 volts), the third temporary adjustment coefficient T is calculated to be 0.42 × 1.3 = 0.546. Therefore, when calculating the second adjustment voltage K in step S6, K = 20 - (7 × 0.546) = 16.118 volts.

[0099] In this embodiment, the electron accelerator beam automatic adjustment method of the present invention sets the filament voltage set value P, the fourth adjustment interval coefficient Q, and the fifth adjustment interval coefficient R, thereby considering the real-time value of the beam current as well as the real-time value of the filament voltage. The data of the real-time value of the beam current and the real-time value of the filament voltage are integrated and continuously segmented to adjust the adjustment value of the filament voltage, thereby further improving the adjustment accuracy of the filament voltage and further improving the adjustment accuracy of the electron accelerator beam deviation.

[0100] The present invention also discloses an electron accelerator that utilizes the electron accelerator beam current automatic adjustment method of this embodiment to adjust beam current size. Specifically, the electron accelerator includes a collector, a display panel, and a control program. The collector is used to collect the real-time beam current value G and the real-time filament voltage value H. The control program includes adjustment interval coefficients, including the second adjustment interval coefficient L, the third adjustment interval coefficient M, the fourth adjustment interval coefficient Q, and the fifth adjustment interval coefficient R. At least one of the adjustment interval coefficients is adjustable on the display panel. In this embodiment, both the fourth adjustment interval coefficient Q and the fifth adjustment interval coefficient R are adjustable on the display panel, while the second adjustment interval coefficient L and the third adjustment interval coefficient M are fixed values. By setting the adjustable adjustment interval coefficients on the display panel, the electron accelerator can quickly adjust the adjustment interval coefficients after replacing the filament, thereby facilitating control of the adjustment accuracy of the filament voltage.

[0101] In summary, the present invention provides an automatic electron accelerator beam current adjustment method by setting two or more first adjustment intervals α, each corresponding to a different first adjustment voltage value C. A segmented approach is employed to determine the corresponding first adjustment voltage value C and set the voltage adjustment coefficient F based on the segment in which the real-time beam current value falls. Different electron accelerators are provided with different first adjustment voltage values ​​C and voltage adjustment coefficients F. When adjusting the filament voltage, C×F is used as the filament voltage adjustment value, effectively improving the adjustment accuracy of the filament voltage and, consequently, the adjustment accuracy of the electron accelerator beam current deviation. The voltage adjustment coefficient F is adjusted by comparing the real-time filament voltage value H with the set filament voltage value P. The filament voltage adjustment value is adjusted based on both the filament voltage and beam current, further improving the adjustment accuracy of the filament voltage and, consequently, the adjustment accuracy of the electron accelerator beam current deviation. By setting the second adjustment interval β, the voltage adjustment coefficient F is first segmented according to the value of |I|, obtaining a more accurate voltage adjustment coefficient F, further improving the adjustment accuracy of the filament voltage, and thereby further improving the adjustment accuracy of the electron accelerator beam current deviation. By setting the third adjustment interval γ, the voltage adjustment coefficient F is further segmented according to the real-time beam current value I, further obtaining a more accurate voltage adjustment coefficient F, further improving the adjustment accuracy of the filament voltage, and thereby further improving the adjustment accuracy of the electron accelerator beam current deviation. By setting the filament voltage set value P, the fourth adjustment interval coefficient Q, and the fifth adjustment interval coefficient R, the real-time beam current value is considered in addition to the real-time filament voltage value. By integrating the real-time beam current and filament voltage values, the filament voltage adjustment value is continuously segmented and adjusted, further improving the adjustment accuracy of the filament voltage, and thereby further improving the adjustment accuracy of the electron accelerator beam current deviation. At the same time, the electron accelerator of the present invention sets the adjustable adjustment interval coefficient in the display panel, so that the electron accelerator can quickly adjust the adjustment interval coefficient after the filament is replaced, which facilitates the control of the adjustment accuracy of the filament voltage.

[0102] The above is only an illustrative embodiment of the present invention and is not intended to limit the scope of the present invention. Any equivalent changes and modifications made by those skilled in the art without departing from the concept and principle of the present invention should fall within the scope of protection of the present invention.

Claims

1. A method for automatically adjusting the beam current of an electron accelerator, characterized in that: The following steps are involved: S1, setting a beam current setting value A and a maximum beam current value B of the electron accelerator, segmenting the range from 0 to the maximum beam current value B to form two or more first adjustment intervals α, each of which corresponds to a different first adjustment voltage value C; setting a beam current deviation range value [D, E], where the minimum value D of the beam current deviation range value is ≤ 0 and the maximum value E of the beam current deviation range value is ≥ 0; and setting a voltage adjustment coefficient F; S2, collects the real-time value of the electron accelerator beam current G and the real-time value of the filament voltage H; S3, obtaining a beam current real-time deviation value I=AG through calculation; and determining the first adjustment interval α in which the beam current real-time value G is located, and obtaining the corresponding first adjustment voltage value C; S4, determining whether the real-time beam deviation value I is within the beam deviation range [D, E]. If the real-time beam deviation value I is within the beam deviation range [D, E], returning to S2. If the real-time beam deviation value F is not within the beam deviation range, and I>E, proceeding to S5. If the real-time beam deviation value F is not within the beam deviation range, and I<D, proceeding to S6. S5, obtaining a first adjustment voltage J=H+(C×F) by calculation, controlling the real-time value H of the filament voltage to be adjusted to the first adjustment voltage J, and then returning to S2; S6 , obtaining a second adjustment voltage K=H−(C×F) through calculation, controlling the real-time value H of the filament voltage to be adjusted to the second adjustment voltage K, and then returning to S2 .

2. The electron accelerator beam automatic adjustment method according to claim 1, characterized in that: In S1, the numerical interval (0, +∞) is segmented to form two or more second adjustment intervals β, each of which corresponds to a different second adjustment interval coefficient L; In S3, after obtaining the beam current real-time deviation value I, the absolute value of the beam current real-time deviation value I is taken to obtain |I|; after completing S3, the process proceeds to S31; S31, determine whether |I| is within the second adjustment interval β; if |I| is not within the second adjustment interval β, return to S2; if |I| is within the second adjustment interval β, enter S32; S32 , determining the second adjustment interval β where |I| is located, obtaining the corresponding second adjustment interval coefficient L, assigning the second adjustment interval coefficient L to the voltage adjustment coefficient F, and then entering S4 .

3. The electron accelerator beam automatic adjustment method according to claim 2, characterized in that: In S1, the numerical interval (-∞, +∞) is segmented to form two or more third adjustment intervals γ, each of which corresponds to a different third adjustment interval coefficient M; After completing S32, enter S33; S33, determining the third adjustment interval γ in which the value of I is located, obtaining the corresponding third adjustment interval coefficient M, and then proceeding to S34; S34 , obtaining a first temporary adjustment coefficient N=L×M through calculation, assigning the first temporary adjustment coefficient N to the voltage adjustment coefficient F, and then entering S4 .

4. The electron accelerator beam automatic adjustment method according to claim 3, characterized in that: In S1, the filament voltage setting value P, the fourth adjustment interval coefficient Q and the fifth adjustment interval coefficient R are set simultaneously; After completing S2, go to S21; S21, determine the size of the filament voltage setting value P and the filament voltage real-time value H. If P=H, return to S2; if P>H, extract the fourth adjustment interval coefficient Q, and go to S3; if P<H, extract the fifth adjustment interval coefficient R, and go to S3; After completing S34, enter S35; S35 , if P>H, obtain a second temporary adjustment coefficient S=N×Q through calculation, assign the second temporary adjustment coefficient S to the voltage adjustment coefficient F, and then enter S4 ; If P<H, a third temporary adjustment coefficient T=N×R is obtained through calculation, and the third temporary adjustment coefficient T is assigned to the voltage adjustment coefficient F, and then the process enters S4.

5. The electron accelerator beam automatic adjustment method according to claim 4, characterized in that: There are two second adjustment intervals β, namely, the interval (0, 1] and the interval (1, +∞).

6. The electron accelerator beam automatic adjustment method according to claim 5, characterized in that: There are two third adjustment intervals, namely the interval (-∞, 0) and the interval [0, +∞).

7. The electron accelerator beam automatic adjustment method according to claim 1, characterized in that: D=E=0.

8. An electron accelerator, characterized in that: The electron accelerator beam automatic adjustment method described in any one of claims 4 to 7 is adopted.

9. The electron accelerator according to claim 8, characterized in that It includes a collector, a display panel and a control program. The collector is used to collect the real-time value G of the beam current and the real-time value H of the filament voltage. The control program includes an adjustment interval coefficient. The adjustment interval coefficient includes the second adjustment interval coefficient L, the third adjustment interval coefficient M, the fourth adjustment interval coefficient Q and the fifth adjustment interval coefficient R. At least one of the adjustment interval coefficients can be adjusted in the display panel.

10. The electron accelerator according to claim 9, characterized in that The fourth adjustment interval coefficient Q and the fifth adjustment interval coefficient R can both be adjusted in the display panel, and the second adjustment interval coefficient L and the third adjustment interval coefficient M are fixed values.

Citation Information

Patent Citations

  • Control method and system for electron gun to emit beams in medical linear accelerator

    CN101807506A

  • Wide-scope high-precision micro beam adjustment circuit

    CN106170171A

  • Electron beam generating system power supply device of electron-beam furnace

    CN201123151Y

  • Electron beam irradiating apparatus

    JP1996162295A

  • Electron beam processing device, control method, and program

    JP2010232098A