Display apparatus and electronic device

Abstract

The present application provides a display apparatus and an electronic device. The display apparatus comprises a substrate, a planarization layer, an anode layer, a pixel definition layer, a light emitting layer, and a cathode layer; the planarization layer is located on the substrate, and the planarization layer has recesses; the anode layer is located on the planarization layer, the anode layer at least covers bottom surfaces of the recesses and side walls of the recesses, and the side walls of the recesses are obliquely arranged relative to the bottom surfaces of the recesses; the pixel definition layer is located on the planarization layer, and the pixel definition layer avoids the recesses; the light emitting layer is located on the anode layer; and the cathode layer is located on the pixel definition layer and the light emitting layer. In the present application, light emitted by the light emitting layer can be reflected by the inclined surfaces of the anode layer, so that more light exits in a forward direction, thereby improving the light output efficiency of the display apparatus.

Description

Display device and electronic device

[0001] This application claims priority to the Chinese patent application filed with the State Intellectual Property Office of China on January 31, 2024, with application number 202410138328.3 and application name “Display device and electronic device”, the entire contents of which are incorporated by reference into this application. Technical Field

[0002] The present application relates to a semiconductor display, and more particularly, to a display device and an electronic device. Background Art

[0003] Organic light-emitting diode (OLED) displays have many advantages, such as being thin and light, high contrast, high response speed, flexible and foldable. With the development and upgrading of high dynamic range (HDR) technology and the demand for outdoor use, consumers are demanding higher brightness of display products. Currently, OLED display modules are limited by factors such as the luminous efficiency of electroluminescence (EL) materials, the external quantum efficiency (EQE) of the device, and the size of the pixel definition layer (PDL). There is still much room for improvement in brightness. Due to factors such as surface plasmon polaritons (SPP) losses at the cathode and anode interfaces of the device, waveguide losses within the device, and material absorption, the EQE of display devices is less than 20%.

[0004] Therefore, how to reduce the light propagation loss of OLED displays and improve the light extraction efficiency of OLED displays has become an urgent problem to be solved.

[0005] Summary of the Invention

[0006] The present application provides a display device and an electronic device, which can reduce the propagation loss of light in the display device and improve the light extraction efficiency of the display device.

[0007] In a first aspect, a display device is provided, which includes a substrate, a planarization layer, an anode layer, a pixel definition layer, a light-emitting layer and a cathode layer, wherein the planarization layer is located on the substrate, and the planarization layer has a recess; the anode layer is located on the planarization layer, and the anode layer at least covers the bottom surface of the recess and the side walls of the recess, and the side walls of the recess are inclined to the bottom surface of the recess; the pixel definition layer is located on the planarization layer, and the pixel definition layer avoids the recess; the light-emitting layer is located on the anode layer; and the cathode layer is located on the pixel definition layer and the light-emitting layer.

[0008] It should be understood that the pixel definition layer includes an opening, and the light-emitting layer is located within the opening of the pixel definition layer. The light-emitting layer can be located on the anode layer within the opening of the pixel definition layer. The light-emitting layer and the pixel definition layer are spaced apart. That is, the area covered by the pixel definition layer is a non-light-emitting area, and the area not covered by the pixel definition layer is a light-emitting area. The light-emitting area can include, for example, a red light-emitting area, a green light-emitting area, and a blue light-emitting area. Light-emitting areas of different colors can be separated by the pixel definition layer. For example, the red light-emitting area and the green light-emitting area can be separated by the pixel definition layer, and the green light-emitting area and the blue light-emitting area can also be separated by the pixel definition layer.

[0009] It should also be understood that the pixel definition layer avoiding the recess can be specifically understood as: the projection of the pixel definition layer on the substrate along a first direction perpendicular to the plane of the substrate does not overlap with the projection of the recess along the first direction. In other words, the pixel definition layer does not cover the inclined portion formed by the anode layer on the sidewall of the recess, thereby reducing the pixel definition layer's absorption of light emitted by the light-emitting layer.

[0010] Exemplarily, an inclination angle between the sidewall of the recess and the first plane (ie, the first inclination angle) ranges from 20° to 60°, and the first plane is parallel to the plane where the substrate is located.

[0011] Illustratively, along a first direction, a height between a highest point of a sidewall of the recess and a bottom surface of the recess is in a range of 0.3 to 3 μm, and the first direction is perpendicular to a plane where the substrate is located.

[0012] The display device provided herein has a planarization layer having a concave portion, and an anode layer covering at least the bottom surface and sidewalls of the concave portion, wherein the sidewalls of the concave portion are inclined relative to the bottom surface of the concave portion. The portion of the anode layer covering the sidewalls of the concave portion can form an inclined surface (or inclined portion) having a first inclination angle. The light-emitting layer is located on the anode layer, so that light emitted by the light-emitting layer can be reflected by the inclined surface of the anode layer, allowing more light to be emitted in a forward direction, thereby reducing light propagation loss within the display device and improving the light extraction efficiency of the display device.

[0013] In one possible implementation, the planarization layer has a boss, the boss is located in the recess, the bottom surface of the boss is connected to the bottom surface of the recess, the anode layer covers the side walls and top surface of the boss, and the side walls of the boss are inclined to the bottom surface of the boss.

[0014] Illustratively, the inclination angle between the sidewall of the boss and the first plane (ie, the second inclination angle) ranges from 10° to 30°, and the first plane is parallel to the plane where the substrate is located.

[0015] Exemplarily, along the first direction, the height between the top surface of the boss and the bottom surface of the boss ranges from 0.5 to 2 μm, the projection length of the top surface of the boss on the substrate along the first direction ranges from 1 to 20 μm, and the first direction is perpendicular to the plane of the substrate.

[0016] By providing a platform structure within the concave structure of the planarization layer, and with the anode layer covering the top surface and sidewalls of the platform, the sidewalls of the platform are inclined relative to the bottom surface of the platform. The portion of the sidewall of the anode layer covering the platform can form an inclined surface. Furthermore, the portion of the sidewall of the anode layer covering the concave portion can also form an inclined surface. Thus, the anode layer can form multiple inclined surfaces. The light-emitting layer is located on the anode layer, and the light emitted by the light-emitting layer can be reflected by the multiple inclined surfaces formed by the anode layer, thereby allowing more light to be emitted in the forward direction, further improving the light extraction efficiency of the display device.

[0017] In a possible implementation, a projection of the boss on the substrate along a first direction is in the shape of any one of a circle, an annular shape, a rectangle, and a diamond shape, and the first direction is perpendicular to the plane where the substrate is located.

[0018] In a possible implementation, the pixel definition layer has a concave-convex structure.

[0019] By providing a pixel definition layer with a concave-convex structure, the surface of the pixel definition layer also has a concave-convex structure, thereby reducing the waveguide mode propagation loss, allowing more light to be emitted from the forward direction, and further improving the light extraction efficiency of the display device.

[0020] In one example, the pixel definition layer includes a plurality of convex units, each of the plurality of convex units includes a plurality of convex portions, and the plurality of convex portions are arranged at intervals.

[0021] By providing a certain interval between the plurality of protrusions, the waveguide mode propagation loss can be further reduced, thereby allowing more light to be emitted in the forward direction, further improving the light extraction efficiency of the display device.

[0022] Exemplarily, a projection length of the protrusion unit (one protrusion unit) on the substrate along a first direction ranges from 10 to 30 μm, and the first direction is perpendicular to the plane of the substrate.

[0023] Exemplarily, the multiple protrusions include at least a first protrusion and a second protrusion, the projection length of the first protrusion along the first direction on the substrate ranges from 2 to 10 μm, the projection length of the second protrusion along the first direction on the substrate ranges from 3 to 24 μm, the interval between the projections of the first protrusion and the second protrusion along the first direction on the substrate ranges from 0 to 6 μm, and the first direction is perpendicular to the plane of the substrate.

[0024] It should be noted that the interval between the projections of the first protrusion and the second protrusion along the first direction on the substrate is zero, which is equivalent to the multiple protrusions being arranged continuously.

[0025] Exemplarily, along the first direction, the height between the highest point of the plurality of protrusion units and the second plane ranges from 1 to 4 μm, the first direction is perpendicular to the plane of the substrate, and the second plane is the contact surface between the plurality of protrusion units and the planarization layer.

[0026] In a possible implementation, the planarization layer includes a first planarization layer having a flat surface and a second planarization layer having an inclined portion, so that a concave portion and / or a convex portion structure can be formed on the planarization layer.

[0027] In a possible implementation, the display device further includes an encapsulation layer, where the encapsulation layer is located on a side of the cathode layer away from the substrate.

[0028] In a possible implementation, the display device further includes a color filter and a black matrix, the color filter and the black matrix are located on a side of the encapsulation layer away from the substrate, the color filter corresponds to the anode layer, and the black matrix is ​​arranged between the color filters.

[0029] In a possible implementation, the display device further includes a polarizer, and the polarizer is located on a side of the encapsulation layer away from the substrate.

[0030] In a possible implementation, the display device further includes a cover glass, and the cover glass is located on a side of the polarizer away from the substrate, or the cover glass is located on a side of the color film and the black matrix away from the substrate.

[0031] In a second aspect, a display device is provided, which includes a substrate, a planarization layer, an anode layer, a pixel definition layer, a light-emitting layer and a cathode layer, wherein the planarization layer is located on the substrate, and the planarization layer has a boss; the anode layer is located on the planarization layer, and the anode layer at least covers the side walls of the boss and the top surface of the boss, and the side walls of the boss are inclined to the bottom surface of the boss; the pixel definition layer is located on the planarization layer, and the pixel definition layer includes an opening, and the part of the anode layer covering the boss is located in the opening; the light-emitting layer is located on the anode layer in the opening; and the cathode layer is located on the pixel definition layer and the light-emitting layer.

[0032] It should be understood that the pixel definition layer includes an opening region, and the light-emitting layer is located within the opening region of the pixel definition layer. The light-emitting layer can be located on the anode layer within the opening region of the pixel definition layer. The light-emitting layer and the pixel definition layer are spaced apart. That is, the area covered by the pixel definition layer is a non-light-emitting area, and the area not covered by the pixel definition layer is a light-emitting area. The light-emitting areas can include, for example, a red light-emitting area, a green light-emitting area, and a blue light-emitting area. Light-emitting areas of different colors can be separated by the pixel definition layer. For example, the red light-emitting area and the green light-emitting area can be separated by the pixel definition layer, and the green light-emitting area and the blue light-emitting area can also be separated by the pixel definition layer.

[0033] Illustratively, the inclination angle between the sidewall of the boss and the first plane (ie, the second inclination angle) ranges from 10° to 30°, and the first plane is parallel to the plane where the substrate is located.

[0034] Exemplarily, along the first direction, the height between the top surface of the boss and the bottom surface of the boss ranges from 0.5 to 2 μm, and the projection length of the top surface of the boss on the substrate along the first direction ranges from 1 to 20 μm, and the first direction is perpendicular to the plane of the substrate.

[0035] The display device provided herein has a planarization layer having a boss, and an anode layer covering at least the top surface and sidewalls of the boss, with the sidewalls of the boss being inclined relative to the bottom surface of the boss. The portion of the sidewall of the boss covered by the anode layer may form an inclined surface (or inclined portion) having a second inclination angle. The light-emitting layer is located on the anode layer, so that light emitted by the light-emitting layer can be reflected by the inclined surface of the anode layer, allowing more light to be emitted in a forward direction, thereby reducing light propagation loss within the display device and improving the light extraction efficiency of the display device.

[0036] In one possible implementation, the planarization layer has a recess, the boss is located in the recess, the bottom surface of the recess is connected to the bottom surface of the boss, and the side walls of the recess are inclined to the bottom surface of the recess; the anode layer covers the side walls and bottom surface of the recess, and the part of the anode layer covering the side walls of the recess forms the inclined surface of the anode layer; the pixel definition layer at least covers the inclined surface of the anode layer.

[0037] Exemplarily, an inclination angle between the sidewall of the recess and the first plane (ie, the first inclination angle) ranges from 20° to 60°, and the first plane is parallel to the plane where the substrate is located.

[0038] Illustratively, along a first direction, a height between a highest point of a sidewall of the recess and a bottom surface of the recess is in a range of 0.3 to 3 μm, and the first direction is perpendicular to a plane where the substrate is located.

[0039] By providing a concave structure and a convex structure on the planarization layer, the convex structure is located within the concave structure, and the anode layer covers the bottom surface and side walls of the concave, and the side walls of the concave are arranged at an angle relative to the bottom surface of the concave. The side wall portion of the anode layer covering the convex can form an inclined surface having a second inclination angle. In addition, the side wall portion of the anode layer covering the concave can also form an inclined surface having a first inclination angle. Therefore, the anode layer can form multiple inclined surfaces. The light-emitting layer is located on the anode layer, and the light emitted by the light-emitting layer can be reflected by the multiple inclined surfaces formed by the anode layer, so that more light is emitted in the forward direction, which can further improve the light extraction efficiency of the display device.

[0040] In a possible implementation, a projection of the boss on the substrate along a first direction is in the shape of any one of a circle, an annular shape, a rectangle, and a diamond shape, and the first direction is perpendicular to the plane where the substrate is located.

[0041] In a possible implementation, the pixel definition layer has a concave-convex structure.

[0042] By providing a pixel definition layer with a concave-convex structure, the surface of the pixel definition layer also has a concave-convex structure, thereby reducing the waveguide mode propagation loss, allowing more light to be emitted from the forward direction, and further improving the light extraction efficiency of the display device.

[0043] In one example, the pixel definition layer includes a plurality of convex units, each of the plurality of convex units includes a plurality of convex portions, and the plurality of convex portions are arranged at intervals.

[0044] By providing a certain interval between the plurality of protrusions, the waveguide mode propagation loss can be further reduced, thereby allowing more light to be emitted in the forward direction, further improving the light extraction efficiency of the display device.

[0045] Exemplarily, a projection length of the protrusion unit (one protrusion unit) on the substrate along a first direction ranges from 10 to 30 μm, and the first direction is perpendicular to the plane of the substrate.

[0046] Exemplarily, the multiple protrusions include at least a first protrusion and a second protrusion, the projection length of the first protrusion along the first direction on the substrate ranges from 2 to 10 μm, the projection length of the second protrusion along the first direction on the substrate ranges from 3 to 24 μm, the multiple protrusions include at least a first protrusion and a second protrusion, the interval between the projections of the first protrusion and the second protrusion along the first direction on the substrate ranges from 0 to 6 μm, and the first direction is perpendicular to the plane of the substrate.

[0047] It should be noted that the interval between the projections of the first protrusion and the second protrusion along the first direction on the substrate is zero, which is equivalent to the multiple protrusions being arranged continuously.

[0048] Exemplarily, along the first direction, the height between the highest point of the plurality of protrusion units and the second plane ranges from 1 to 4 μm, the first direction is perpendicular to the plane of the substrate, and the second plane is the contact surface between the plurality of protrusion units and the planarization layer.

[0049] In a possible implementation, the planarization layer includes a first planarization layer having a flat surface and a second planarization layer having an inclined portion, so that a concave portion and / or a convex portion structure can be formed on the planarization layer.

[0050] In a possible implementation, the display device further includes an encapsulation layer, where the encapsulation layer is located on a side of the cathode layer away from the substrate.

[0051] In a possible implementation, the display device further includes a color filter and a black matrix, the color filter and the black matrix are located on a side of the encapsulation layer away from the substrate, the color filter corresponds to the anode layer, and the black matrix is ​​arranged between the color filters.

[0052] In a possible implementation, the display device further includes a polarizer, and the polarizer is located on a side of the encapsulation layer away from the substrate.

[0053] In a possible implementation, the display device further includes a cover glass, and the cover glass is located on a side of the polarizer away from the substrate, or the cover glass is located on a side of the color film and the black matrix away from the substrate.

[0054] In a third aspect, a method for manufacturing a display device is provided, which includes: forming a planarization layer having a concave portion on a substrate, wherein the sidewalls of the concave portion are inclined relative to the bottom surface of the concave portion; forming an anode layer on the planarization layer, wherein the anode layer at least covers the bottom surface and sidewalls of the concave portion; forming a pixel definition layer in a non-concave area on the planarization layer; forming a light-emitting layer on the anode layer; and forming a cathode layer on the pixel definition layer and the light-emitting layer.

[0055] It should be understood that the pixel definition layer includes an opening, and the light-emitting layer is located within the opening of the pixel definition layer. The light-emitting layer can be located on the anode layer within the opening of the pixel definition layer. The light-emitting layer and the pixel definition layer are spaced apart. That is, the area covered by the pixel definition layer is a non-light-emitting area, and the area not covered by the pixel definition layer is a light-emitting area. The light-emitting area can include, for example, a red light-emitting area, a green light-emitting area, and a blue light-emitting area. Light-emitting areas of different colors can be separated by the pixel definition layer. For example, the red light-emitting area and the green light-emitting area can be separated by the pixel definition layer, and the green light-emitting area and the blue light-emitting area can also be separated by the pixel definition layer.

[0056] It should also be understood that forming the pixel definition layer in the non-recessed area on the planarization layer can be specifically understood as: the projection of the pixel definition layer on the substrate along a first direction perpendicular to the plane of the substrate does not overlap with the projection of the recessed area on the substrate. In other words, the pixel definition layer does not cover the inclined portion formed by the anode layer on the sidewall of the recessed area, thereby reducing the pixel definition layer's absorption of light emitted by the light-emitting layer.

[0057] Exemplarily, an inclination angle between the sidewall of the recess and the first plane (ie, the first inclination angle) ranges from 20° to 60°, and the first plane is parallel to the plane where the substrate is located.

[0058] Illustratively, along a first direction, a height between a highest point of a sidewall of the recess and a bottom surface of the recess is in a range of 0.3 to 3 μm, and the first direction is perpendicular to a plane where the substrate is located.

[0059] The present application provides a method for manufacturing a display device, wherein a planarization layer having a concave portion is formed on a substrate, and an anode layer covers at least the bottom surface and sidewalls of the concave portion, wherein the sidewalls of the concave portion are inclined relative to the bottom surface of the concave portion. The portion of the anode layer covering the sidewall of the concave portion can form an inclined surface (or inclined portion) having a first inclination angle. The light-emitting layer is located on the anode layer, so that light emitted by the light-emitting layer can be reflected by the inclined surface of the anode layer, which can allow more light to be emitted in a forward direction, thereby reducing light propagation loss within the display device and improving the light extraction efficiency of the display device.

[0060] In a possible implementation, forming the planarization layer having the concave portion includes: forming a planarization layer on a top surface of the substrate; and forming the concave portion in the planarization layer.

[0061] In one possible implementation, the method further includes forming a boss within the concave portion of the planarization layer, wherein the sidewalls of the boss are inclined relative to the bottom surface of the boss, wherein the bottom surface of the boss is in contact with the bottom surface of the concave portion, and the anode layer covers the sidewalls and top surface of the boss.

[0062] Illustratively, the inclination angle between the sidewall of the boss and the first plane (ie, the second inclination angle) ranges from 10° to 30°, and the first plane is parallel to the plane where the substrate is located.

[0063] Exemplarily, along the first direction, the height between the top surface of the boss and the bottom surface of the boss ranges from 0.5 to 2 μm, the projection length of the top surface of the boss on the substrate along the first direction ranges from 1 to 20 μm, and the first direction is perpendicular to the plane of the substrate.

[0064] The manufacturing method provided in the present application forms a boss in the concave portion of the planarization layer, so that the anode layer can form multiple inclined surfaces (or inclined portions), so that the light emitted by the light-emitting layer can be reflected by the multiple inclined surfaces formed by the anode layer, so that more light is emitted from the forward direction, which can further improve the light output efficiency of the display device.

[0065] In a possible implementation, the projection of the boss on the substrate along a first direction is in the shape of any one of a circle, an annular shape, a rectangle, and a diamond shape, and the first direction is perpendicular to the plane where the substrate is located.

[0066] In a possible implementation, forming the pixel definition layer in the non-concave region on the planarization layer includes: forming the pixel definition layer having a concavo-convex structure in the non-concave region on the planarization layer through film formation, exposure, and development processes.

[0067] The manufacturing method provided in the present application forms a pixel definition layer with a concave-convex structure on a planarization layer, so that the surface of the pixel definition layer also has a concave-convex structure, thereby reducing the waveguide mode propagation loss, allowing more light to be emitted from the forward direction, and further improving the light output efficiency of the display device.

[0068] In one example, the pixel definition layer includes a plurality of convex units, each of the plurality of convex units includes a plurality of convex portions, and the plurality of convex portions are arranged at intervals.

[0069] By providing a certain interval between the plurality of protrusions, the waveguide mode propagation loss can be further reduced, thereby allowing more light to be emitted in the forward direction, further improving the light extraction efficiency of the display device.

[0070] Exemplarily, a projection length of the protrusion unit (one protrusion unit) on the substrate along a first direction ranges from 10 to 30 μm, and the first direction is perpendicular to the plane of the substrate.

[0071] Exemplarily, the multiple protrusions include at least a first protrusion and a second protrusion, the projection length of the first protrusion along the first direction on the substrate ranges from 2 to 10 μm, the projection length of the second protrusion along the first direction on the substrate ranges from 3 to 24 μm, the multiple protrusions include at least a first protrusion and a second protrusion, the interval between the projections of the first protrusion and the second protrusion along the first direction on the substrate ranges from 0 to 6 μm, and the first direction is perpendicular to the plane of the substrate.

[0072] It should be noted that the interval between the projections of the first protrusion and the second protrusion along the first direction on the substrate is zero, which is equivalent to the multiple protrusions being arranged continuously.

[0073] Exemplarily, along the first direction, the height between the highest point of the plurality of protrusion units and the second plane ranges from 1 to 4 μm, the first direction is perpendicular to the plane of the substrate, and the second plane is the contact surface between the plurality of protrusion units and the planarization layer.

[0074] In a possible implementation, forming the planarization layer includes forming a first planarization layer having a flat surface and forming a second planarization layer having an inclined portion, thereby forming a concave portion and / or a convex portion structure on the planarization layer.

[0075] In a possible implementation, the method further includes: forming an encapsulation layer on a side of the cathode layer away from the substrate.

[0076] In a possible implementation, the method further includes: laminating a color film and a black matrix on a side of the encapsulation layer away from the substrate, wherein the color film corresponds to the anode layer, and the black matrix is ​​arranged between the color films.

[0077] In a possible implementation, the method further includes: attaching a polarizer to a side of the encapsulation layer away from the substrate.

[0078] In a possible implementation, the method further includes: attaching a cover glass to a side of the polarizer away from the substrate, or attaching a cover glass to a side of the color filter and the black matrix away from the substrate.

[0079] In a fourth aspect, a method for manufacturing a display device is provided, which includes: forming a planarization layer having a boss on a substrate, wherein the side wall of the boss is inclined to the bottom surface of the boss; forming an anode layer on the planarization layer, wherein the anode layer at least covers the top surface and side wall of the boss; forming a pixel definition layer on the planarization layer; forming a light-emitting layer on the anode layer; and forming a cathode layer on the pixel definition layer and the light-emitting layer.

[0080] It should be understood that the pixel definition layer includes an opening, and the light-emitting layer is located within the opening of the pixel definition layer. The light-emitting layer can be attached to the anode layer within the opening of the pixel definition layer. The light-emitting layer and the pixel definition layer are spaced apart. That is, the area covered by the pixel definition layer is a non-light-emitting area, and the area not covered by the pixel definition layer is a light-emitting area. The light-emitting areas can include, for example, a red light-emitting area, a green light-emitting area, and a blue light-emitting area. Light-emitting areas of different colors can be separated by the pixel definition layer. For example, the red light-emitting area and the green light-emitting area can be separated by the pixel definition layer, and the green light-emitting area and the blue light-emitting area can also be separated by the pixel definition layer.

[0081] It should also be understood that the projection of the pixel definition layer on the substrate along the first direction does not overlap with the projection of the light emitting layer on the substrate along the first direction, and the first direction is perpendicular to the plane of the substrate.

[0082] Illustratively, the inclination angle between the sidewall of the boss and the first plane (ie, the second inclination angle) ranges from 10° to 30°, and the first plane is parallel to the plane where the substrate is located.

[0083] Exemplarily, along the first direction, the height between the top surface of the boss and the bottom surface of the boss ranges from 0.5 to 2 μm, and the projection length of the top surface of the boss on the substrate along the first direction ranges from 1 to 20 μm, and the first direction is perpendicular to the plane of the substrate.

[0084] The present application provides a device method, wherein a planarization layer having a protrusion is formed on a substrate, and an anode layer covers at least the top surface and sidewalls of the protrusion, and the sidewalls of the protrusion are inclined relative to the bottom surface of the protrusion. The portion of the sidewall of the anode layer covering the protrusion can form an inclined surface (or inclined portion), and the inclined surface has a second inclination angle. The light-emitting layer is attached to the anode layer. Therefore, the light emitted by the light-emitting layer can be reflected by the inclined surface of the anode layer, which can allow more light to be emitted in the forward direction, thereby reducing the propagation loss of light in the display device and improving the light extraction efficiency of the display device.

[0085] In a possible implementation, forming the planarization layer having the concave portion includes: forming the planarization layer on the top surface of the substrate; and forming the protrusion in the planarization layer.

[0086] In one possible implementation, forming a planarization layer having protrusions on a substrate specifically includes: forming a planarization layer having recesses on the substrate; and forming the protrusions within the recesses. The bottom surface of the recesses adjoins the bottom surface of the protrusions, and the sidewalls of the recesses are inclined relative to the bottom surface of the recesses. The anode layer covers the sidewalls and bottom surface of the recesses, with the portion of the anode layer covering the sidewalls of the recesses forming an inclined surface of the anode layer. The pixel definition layer covers at least the inclined surface of the anode layer.

[0087] Exemplarily, an inclination angle between the sidewall of the recess and the first plane (ie, the first inclination angle) ranges from 20° to 60°, and the first plane is parallel to the plane where the substrate is located.

[0088] Illustratively, along a first direction, a height between a highest point of a sidewall of the recess and a bottom surface of the recess is in a range of 0.3 to 3 μm, and the first direction is perpendicular to a plane where the substrate is located.

[0089] The manufacturing method provided in the present application forms recesses and protrusions on the planarization layer, so that the anode layer can form multiple inclined surfaces (or inclined portions), so that the light emitted by the light-emitting layer can be reflected by the multiple inclined surfaces formed by the anode layer, so that more light is emitted from the forward direction, which can further improve the light output efficiency of the display device.

[0090] In a possible implementation, a projection of the boss on the substrate along a first direction is in the shape of any one of a circle, an annular shape, a rectangle, and a diamond shape, and the first direction is perpendicular to the plane where the substrate is located.

[0091] In a possible implementation, forming the pixel definition layer on the planarization layer includes: forming the pixel definition layer having a concavo-convex structure on the planarization layer through film formation, exposure, and development processes.

[0092] The manufacturing method provided in the present application forms a pixel definition layer with a concave-convex structure on a planarization layer, so that the surface of the pixel definition layer also has a concave-convex structure, thereby reducing the waveguide mode propagation loss, allowing more light to be emitted from the forward direction, and further improving the light output efficiency of the display device.

[0093] In one example, the pixel definition layer includes a plurality of convex units, each of the plurality of convex units includes a plurality of convex portions, and the plurality of convex portions are arranged at intervals.

[0094] By providing a certain interval between the plurality of protrusions, the waveguide mode propagation loss can be further reduced, thereby allowing more light to be emitted in the forward direction, further improving the light extraction efficiency of the display device.

[0095] Exemplarily, a projection length of the protrusion unit (one protrusion unit) on the substrate along a first direction ranges from 10 to 30 μm, and the first direction is perpendicular to the plane of the substrate.

[0096] Exemplarily, the multiple protrusions include at least a first protrusion and a second protrusion, the projection length of the first protrusion along the first direction on the substrate ranges from 2 to 10 μm, the projection length of the second protrusion along the first direction on the substrate ranges from 3 to 24 μm, the multiple protrusions include at least a first protrusion and a second protrusion, the interval between the projections of the first protrusion and the second protrusion along the first direction on the substrate ranges from 0 to 6 μm, and the first direction is perpendicular to the plane of the substrate.

[0097] It should be noted that the interval between the projections of the first protrusion and the second protrusion along the first direction on the substrate is zero, which is equivalent to the multiple protrusions being arranged continuously.

[0098] Exemplarily, along the first direction, the height between the highest point of the plurality of protrusion units and the second plane ranges from 1 to 4 μm, the first direction is perpendicular to the plane of the substrate, and the second plane is the contact surface between the plurality of protrusion units and the planarization layer.

[0099] In a possible implementation, forming the planarization layer includes forming a first planarization layer having a flat surface and forming a second planarization layer having an inclined portion, thereby forming a concave portion and / or a convex portion structure on the planarization layer.

[0100] In a possible implementation, the method further includes: forming an encapsulation layer on a side of the cathode layer away from the substrate.

[0101] In a possible implementation, the method further includes: laminating a color film and a black matrix on a side of the encapsulation layer away from the substrate, wherein the color film corresponds to the anode layer, and the black matrix is ​​arranged between the color films.

[0102] In a possible implementation, the method further includes: attaching a polarizer to a side of the encapsulation layer away from the substrate.

[0103] In a possible implementation, the method further includes: attaching a cover glass to a side of the polarizer away from the substrate, or attaching a cover glass to a side of the color filter and the black matrix away from the substrate.

[0104] In a fifth aspect, an electronic device is provided, which includes a housing and the display device described in the first aspect and any one of the first aspects; or, the electronic device includes a housing and the display device described in the second aspect and any one of the second aspects, wherein the display device is mounted on the housing.

[0105] Among them, the beneficial effects of the fifth aspect can refer to the beneficial effects of the first or second aspect, and will not be repeated here. BRIEF DESCRIPTION OF THE DRAWINGS

[0106] FIG1 is a schematic diagram of the cross-sectional structure of an OLED display provided in an embodiment of the present application.

[0107] 2 to 9 are schematic cross-sectional views of display devices according to embodiments of the present application.

[0108] FIG10 is a schematic diagram of a top view of the structure of a display device provided in an embodiment of the present application.

[0109] 11 and 12 are schematic cross-sectional views of another display device according to an embodiment of the present application.

[0110] 13 and 14 are schematic diagrams of a method for manufacturing a display device provided in this application. DETAILED DESCRIPTION

[0111] The technical solution in this application will be described below with reference to the accompanying drawings.

[0112] In the embodiments of the present application, the terms "first" and "second" are used for descriptive purposes only and should not be understood as indicating or implying relative importance or implicitly indicating the number of technical features indicated. Therefore, features defined as "first" and "second" can sensibly or implicitly include one or more features. In addition, in the description of the embodiments of the present application, "multiple" means two or more than two, and "at least one" and "one or more" mean one, two or more. The singular expressions "one", "a", "said", "above", "the" and "this" are intended to also include expressions such as "one or more", unless the context clearly indicates otherwise. The size of the sequence numbers of the processes below does not mean the order of execution. The order of execution of each process should be determined by its function and internal logic, and should not constitute any limitation on the implementation process of the embodiments of the present application. For example, in the embodiments of the present application, words such as "110", "210", and "310" are only used for the convenience of description and do not limit the order of execution of the steps.

[0113] References to "one embodiment" or "some embodiments" in this specification mean that a particular feature, structure, or characteristic described in conjunction with that embodiment is included in one or more embodiments of the present application. Thus, phrases such as "in one embodiment," "in some embodiments," "in other embodiments," and "in yet other embodiments" appearing in various places in this specification do not necessarily refer to the same embodiment, but rather mean "one or more but not all embodiments," unless otherwise specifically emphasized. The terms "including," "comprising," "having," and variations thereof mean "including but not limited to," unless otherwise specifically emphasized.

[0114] In the description of the embodiments of the present application, the terms "upper", "lower", "inside", "outside", etc. indicate orientations or positional relationships that are defined relative to the orientations or positions of the components schematically placed in the drawings. It should be understood that these directional terms are relative concepts. They are used for relative descriptions and clarifications, rather than indicating or implying that the device or component referred to must have a specific orientation, or be constructed and operated in a specific orientation. They may change accordingly according to changes in the orientation of the components placed in the drawings, and therefore cannot be understood as limitations on the present application.

[0115] Organic light-emitting diode (OLED) displays are widely recognized by the industry as the most promising display devices due to their numerous advantages, including self-luminescence, rich colors, fast response, wide viewing angle, light weight, thinness, low power consumption, and the ability to achieve flexible displays and large-area full-color displays. OLED displays, manufactured using OLED display panels, are considered to have enormous application prospects, particularly in the field of flat-panel displays, where they are considered a development trend.

[0116] An OLED display panel is provided with a plurality of pixels arranged in an array. Each pixel includes a corresponding number of sub-pixels according to the color matching mode of the OLED display panel. For example, when the OLED display panel adopts the red-green-blue (RGB) color matching mode, each pixel may include three sub-pixels, wherein one sub-pixel is an R sub-pixel, one sub-pixel is a G sub-pixel, and one sub-pixel is a B sub-pixel. Each sub-pixel includes a light-emitting element. The light-emitting layer in the light-emitting element is excited by the excitons formed by the combination of holes and electrons to emit light of the corresponding color. That is, the R sub-pixel, the G sub-pixel, and the B sub-pixel emit red, green, and blue light, respectively.

[0117] In actual applications, OLED display panels can also adopt a red-green-blue-white (RGBW) color matching mode. At this time, each pixel includes four sub-pixels, including an R sub-pixel that can display red light, a G sub-pixel that can display green light, a B sub-pixel that can display blue light, and a W sub-pixel that can display white light.

[0118] With the development and upgrading of high dynamic range (HDR) technology and the demand for outdoor use, consumers are demanding higher brightness in display products. Current OLED display devices are limited by factors such as the luminous efficiency of electroluminescence (EL) materials, the external quantum efficiency (EQE) of the device, and the size of the pixel definition layer (PDL), and there is still much room for improvement in brightness. Due to factors such as surface plasmon polaritons (SPP) losses at the cathode and anode interfaces of the device, waveguide losses within the device, and material absorption, the EQE of display devices is less than 20%.

[0119] Figure 1 shows a schematic cross-sectional structure of an OLED display. As shown in Figure 1 , the OLED display may include: a substrate 110, a planarization layer (PLN) 120, an anode layer 130, a PDL layer 140, a light-emitting layer 150, and a cathode and encapsulation layer 160. It should be understood that the cathode and encapsulation layer 160 may specifically include a cathode layer and an encapsulation layer. The cathode layer is located between the encapsulation layer and the light-emitting layer 150. Figure 1 shows the cathode layer and the encapsulation layer combined. The encapsulation layer may be a thin film encapsulation (TFE) layer.

[0120] The PLN layer 120 is disposed on one side of the substrate 110. The anode layer 130 and the PDL layer 140 are located on the side of the PLN layer 120 away from the substrate 110, and the anode layer 130 is divided into pixels by the PDL layer 140. The light-emitting layer 150 is located on the side of the anode layer 130 away from the substrate 110. For example, the light-emitting layer 150 can be divided into a red light-emitting layer, a green light-emitting layer, and a blue light-emitting layer by the PDL layer 140. The cathode and encapsulation layer 160 is located on the side of the PDL layer 140 and the light-emitting layer 150 away from the substrate 110 and can cover the surface of the entire structure.

[0121] It should be understood that the PDL layer 140 can be made of a black, opaque material with multiple openings formed therein. Each opening is provided with a sub-pixel light-emitting unit (i.e., the light-emitting layer 150). The side of the light-emitting layer 150 facing the substrate 110 is provided with an anode layer 130, which is also located within the openings defined by the PDL layer 140. The side of the light-emitting layer 150 facing away from the substrate 110 is provided with a cathode layer. The cathode layer has sufficient light transmittance to allow light emitted by the light-emitting layer 150 to pass through the cathode layer and be emitted outward. A thin film encapsulation layer is located on the side of the cathode layer away from the substrate 110 to prevent moisture or oxygen from invading and damaging the light-emitting layer 150.

[0122] In the OLED display shown in Figure 1 , light is typically generated in the light-emitting layer 150. Some of this light is emitted externally through the top surface, while some is lost. This light loss primarily involves loss in the PDL layer 140 and loss in the TFE layer. As indicated by the arrows in Figure 1 , loss in the PDL layer 140 refers to a portion of the light generated by the light-emitting layer 150 that travels laterally and directly into the PDL layer 140, where it is dissipated and thus cannot be emitted in the forward direction. Loss in the TFE layer refers to a portion of the light generated by the light-emitting layer 150 that is lost along the waveguide mode of the TFE layer and thus cannot be emitted in the forward direction.

[0123] To solve the above problems, embodiments of the present application provide a display device and an electronic device, which can reduce the propagation loss of light in the display device and improve the light extraction efficiency of the display device.

[0124] Specifically, the embodiments of the present application can mainly start from the following two aspects to reduce the propagation loss of light in the display device and improve the light extraction efficiency of the display device. On the one hand, the loss of light in the PDL layer can be blocked. It is mainly through setting a concave-convex structure in the pixel light-emitting edge area and / or the pixel light-emitting middle area, so that part of the light generated by the light-emitting layer is reflected by the inclined surface of the anode layer and emitted from the forward direction, thereby improving the light extraction efficiency. At the same time, by setting the concave-convex structure, the pixel light-emitting area can also be increased. On the other hand, the loss of light in the TFE layer can be blocked. The patterned PDL structure makes the TFE layer produce an undulating structure, thereby reducing the waveguide mode propagation loss in the TFE layer and allowing more light to be emitted from the forward direction. The undulating structure is set in the pixel light-emitting middle area, which also reduces the waveguide loss in the pixel and achieves higher light extraction efficiency.

[0125] It should be understood that the display device provided in the present application includes but is not limited to a display panel, for example, it may be the aforementioned OLED display panel, and it may also be a display panel with a structure such as quantum dot lighting emission diodes (QLED), micro light-emitting diodes (micro-LED), etc., but is not limited thereto.

[0126] The structure of the display device provided in the embodiments of the present application will be described in detail below with reference to Figures 2 to 12. Figures 2 to 5, 7 to 8, and 11 to 12 are schematic cross-sectional views of different display devices provided in the embodiments of the present application, Figures 6 and 9 illustrate parameters of various structures of the display device, and Figure 10 illustrates a schematic top view of the display device.

[0127] As shown in FIG2 , the display device 200 includes a substrate 210, a PLN layer 220, an anode layer 230, a PDL layer 240, a light-emitting layer 250, and an anode layer 260. The PLN layer 220 is located on the substrate 210 and has a recess. The anode layer 230 is located on the PLN layer 220 and covers at least the bottom surface and sidewalls of the recess, with the sidewalls of the recess being inclined relative to the bottom surface of the recess. The PDL layer 240 is located on the PLN layer 220 and avoids the recess. The light-emitting layer 250 is located on the anode layer 230. The cathode layer 260 is located on the PDL layer 240 and the light-emitting layer 250.

[0128] Illustratively, the PDL layer 240 may include an opening, and the light-emitting layer 250 is located within the opening of the PDL layer 240. The light-emitting layer 250 may be located on the anode layer 230 within the opening of the PDL layer 240. The light-emitting layer 250 and the PDL layer 240 are spaced apart. That is, the area covered by the PDL layer 240 is a non-light-emitting area, and the area not covered by the PDL layer 240 is a light-emitting area. The light-emitting areas may include, for example, a red light-emitting area, a green light-emitting area, and a blue light-emitting area. Light-emitting areas of different colors may be separated by the PDL layer 240. For example, the red light-emitting area and the green light-emitting area may be separated by the PDL layer 240, and the green light-emitting area and the blue light-emitting area may also be separated by the PDL layer 240.

[0129] The portion of the anode layer 230 covering the side wall of the recess may form an inclined surface (denoted as the first inclined surface) or an inclined portion (denoted as the first inclined portion) of the anode layer. As shown in FIG6 , the anode layer 230 (the first inclined surface or the first inclined portion) located on the side wall of the recess may have an inclination angle (i.e., a first inclination angle θ1) that is actually the same as or similar to the side wall of the recess. The first inclination angle θ1 is the angle between the side wall of the recess and the first plane, and the first plane is parallel to the plane where the substrate 210 is located. In other words, the inclination angle formed by the side wall of the recess and the first plane is the same as or similar to the inclination angle formed by the first inclined surface of the anode layer and the first plane. Exemplarily, in order to facilitate the processing and manufacturing of the display device, the value range of the first inclination angle θ1 may be 20 to 60°. Exemplarily, in order to facilitate the processing and manufacturing of the display device, along the first direction, the height f of the highest point of the side wall of the recess and the bottom surface of the recess is in the range of 0.3 to 3 μm, and the first direction is perpendicular to the plane where the substrate 210 is located.

[0130] It should be noted that the PDL layer 240 avoiding the concave portion can be specifically understood as: the projection of the PDL layer 240 on the substrate 210 along a first direction perpendicular to the plane of the substrate 210 does not overlap with the projection of the concave portion on the substrate 210 along the first direction. In other words, the PDL layer 240 does not cover the first inclined surface of the anode layer 230, thereby reducing the PDL layer 240's absorption of light emitted by the light-emitting layer 250. In addition, light emitted by the light-emitting layer 250 can be reflected by the first inclined surface of the anode layer 230, allowing more light to be emitted in the forward direction, thereby reducing light propagation losses within the display device 200 and improving the light extraction efficiency of the display device 200.

[0131] In some embodiments, the PDL layer 240 can be made of a black opaque material with multiple opening areas formed inside. A sub-pixel light-emitting unit (i.e., the light-emitting layer 250) is provided in each opening area. The light-emitting layer 250 is provided with an anode layer 230 on the side facing the substrate 210. The anode layer 230 is also located in the opening area defined by the PDL layer 240. The light-emitting layer 250 is provided with a cathode layer 260 on the side facing away from the substrate 210. The cathode layer 260 has sufficient light transmittance so that the light emitted by the light-emitting layer 250 can be emitted to the outside of the device through the cathode layer 260.

[0132] It should be understood that when powered on, the light-emitting layer 250 can emit light in a direction away from the substrate 210. For example, the vertical upward direction in Figure 2 or 3 is the emission direction of the light generated by the light-emitting layer 250, and the upper side of the light-emitting layer 250 is the light-emitting side.

[0133] In some embodiments, the PDL layer 240 may have a concavo-convex structure. It should be understood that by providing a PDL layer 240 having a concavo-convex structure, the surface of the PDL layer 240 also has a concavo-convex structure, thereby reducing the waveguide mode propagation loss, allowing more light to be emitted from the forward direction, and further improving the light extraction efficiency of the display device 200. Referring to Figure 1, it can be seen that part of the light emitted by the light-emitting layer 250 will enter the cathode and the encapsulation layer. Since the PDL layer 240 is set to a patterned structure (i.e., a concavo-convex structure), the surfaces of the cathode and the encapsulation layer will also have undulations. Therefore, when the light propagates inside the cathode and the encapsulation layer, it will be scattered at different angles, so that part of the light can also be emitted from the forward direction.

[0134] In one example, the PDL layer 240 may include a plurality of protrusion units, each of which includes a plurality of protrusions, and the plurality of protrusions are spaced apart. It should be understood that by providing a certain spacing between the plurality of protrusions, the waveguide mode propagation loss can be further reduced, thereby allowing more light to be emitted in the forward direction, further improving the light extraction efficiency of the display device 200.

[0135] For example, to facilitate the processing and manufacturing of the display device, as shown in FIG6 , the projection length a of a protrusion unit of the PDL layer 240 along the first direction onto the substrate 210 can range from 10 to 30 μm. The multiple protrusions can include at least a first protrusion and a second protrusion, the first and second protrusions having different sizes. The projection length b of the first protrusion along the first direction onto the substrate 210 can range from 2 to 10 μm, the projection length d of the second protrusion along the first direction onto the substrate 210 can range from 3 to 24 μm, and the spacing c between the projections of the first and second protrusions along the first direction onto the substrate 210 can range from 0 to 6 μm. Along the first direction, the height e between the highest point of the multiple protrusion units and a second plane perpendicular to the plane of the substrate 210 can range from 1 to 4 μm. The second plane is the contact surface between the multiple protrusion units and the PLN layer 220.

[0136] It should be noted that the interval between the projections of the first and second protrusions along the first direction on the substrate 210 is zero, which is equivalent to the multiple protrusions being arranged continuously. In this case, the structure of the PDL layer 240 can refer to Figure 4, and the multiple protrusions included in a protrusion unit of the PDL layer 240 can be distributed continuously without interruption.

[0137] In some embodiments, as shown in Figure 3, the PLN layer 220 may also have a boss, which is located in the recess of the PLN layer 220, the bottom surface of the boss is connected to the bottom surface of the recess, and the anode layer 230 covers the side walls and the top surface of the boss, and the side walls of the boss are inclined to the bottom surface of the boss.

[0138] It should be understood that the portion of the anode layer 230 that covers the sidewall of the protrusion can also form an inclined surface (denoted as the second inclined surface) or an inclined portion (denoted as the second inclined portion) of the anode layer. As shown in Figure 6, the anode layer 230 (the second inclined surface or second inclined portion) located on the sidewall of the protrusion can have an inclination angle (i.e., a second inclination angle θ2) that is substantially the same as or similar to that of the sidewall of the recess. This second inclination angle θ2 is the angle between the sidewall of the protrusion and a first plane parallel to the plane of the substrate 210. In other words, the inclination angle formed by the sidewall of the protrusion and the first plane is the same as or similar to the inclination angle formed by the second inclined surface of the anode layer and the first plane. Therefore, light emitted by the light-emitting layer 250 can also be reflected by the second inclined surface of the anode layer 230, allowing more light to be emitted in the forward direction, thereby reducing light propagation losses within the display device and improving the light extraction efficiency of the display device. Furthermore, by providing the protrusion within the recess, the flatness of the PLN layer can be improved, thereby enhancing the overall flatness of the display device and achieving better diffraction uniformity.

[0139] For example, to facilitate the manufacture of the display device, as shown in FIG6 , the inclination angle between the sidewall of the boss and the first plane (i.e., the second inclination angle θ2) can range from 10 to 30°, and the first plane is parallel to the plane of the substrate 210. Along the first direction, the height h between the top surface of the boss and the bottom surface of the boss ranges from 0.5 to 2 μm, and the projection length k of the top surface of the boss on the substrate 210 along the first direction perpendicular to the plane of the substrate 210 can range from 1 to 20 μm.

[0140] In some embodiments, as shown in Figures 2 to 4 , the PLN layer 220 is an integrally formed structure, and the surface of the PLN layer 220 away from the substrate 210 has recesses and / or protrusions. In other embodiments, as shown in Figure 5 , the PLN layer 220 may include a first planarization layer 221 having a flat surface and a second planarization layer 222 having an inclined portion. For example, the second planarization layer 222 may be a protrusion, the bottom surface of which is in contact with the planarized top surface of the first planarization layer 221, thereby forming a PLN layer 220 having recesses and / or protrusions.

[0141] In some embodiments, the display device 200 may not have a recess, but may have a protrusion in the light emitting area (ie, the area not covered by the PDL layer 240 ), which can also improve the light extraction efficiency of the display device.

[0142] As shown in Figure 7, the display device 200 may include a substrate 210, a PLN layer 220, an anode layer 230, a PDL layer 240, a light-emitting layer 250 and a cathode layer 260, wherein the PLN layer 220 is located on the substrate 210, and the PLN layer 220 has a boss; the anode layer 230 is located on the PLN layer 220, and the anode layer 230 at least covers the side walls and the top surface of the boss, and the side walls of the boss and the bottom surface of the boss are inclined; the PDL layer 240 is located on the PLN layer 220, and the PDL layer 240 includes an opening, and the part of the anode layer 230 that is attached to the boss is located in the opening, that is, the part of the anode layer 230 that covers the boss is located inside the opening; the light-emitting layer 250 is located on the anode layer 230 in the opening; the cathode layer 260 is located on the PDL layer 240 and the light-emitting layer 250.

[0143] It should be understood that the portion of the anode layer 230 covering the sidewall of the protrusion can form an inclined surface (i.e., a second inclined surface) of the anode layer 230. Light emitted by the light-emitting layer 250 can be reflected by the inclined surface of the anode layer 230, allowing more light to be emitted in the forward direction, thereby reducing light propagation loss within the display device and improving the light extraction efficiency of the display device.

[0144] For example, as shown in FIG8 , the PLN layer 220 may further include a concave portion, the boss being located within the concave portion, the bottom surface of the concave portion being in contact with the bottom surface of the boss, and the sidewalls of the concave portion being inclined relative to the bottom surface of the concave portion. The anode layer 230 covers the sidewalls and bottom surface of the concave portion, and the portion of the anode layer 230 covering the sidewalls of the concave portion forms an inclined surface (i.e., a first inclined surface) of the anode layer 230. The PDL layer 240 at least covers the inclined surface (i.e., the first inclined surface) of the anode layer 230. In this case, light emitted by the light-emitting layer 250 can be reflected by the multiple inclined surfaces formed by the anode layer 230, thereby allowing more light to be emitted in the forward direction, further improving the light extraction efficiency of the display device.

[0145] 9 , the PDL layer 240 may cover the first slope and part of the bottom surface of the anode layer 230 , and a projection length g of the anode layer 230 on the recess along a first direction perpendicular to the plane of the substrate 310 may be in the range of 0.5 to 5 μm.

[0146] In some embodiments, the projection of the undulating structure (including protrusions and / or recesses) of the PLN layer 220 onto the plane of the substrate 210 is a symmetrical structure. For example, along a direction perpendicular to the plane of the substrate, the projection of the undulating structure of the PLN layer 220 onto the plane of the substrate 210 can be in the shape of a circle, annular, rectangular, diamond, or the like.

[0147] For example, as shown in FIG10 , FIG10 (a) shows a schematic cross-sectional structure diagram of a display device 200, and FIG10 (b) shows a top view of the display device 200 shown in FIG10 (a) as viewed from the light-emitting layer 250. It can be seen from FIG10 (a) and FIG10 (b) that the light-emitting layer 250 may include a protrusion 251 and a groove 252, wherein the protrusion 251 corresponds to the boss of the PLN layer 220, and the groove 252 corresponds to the recess of the PLN layer 220. That is, the projection of the protrusion 251 along the first direction on the substrate 210 overlaps with the projection of the boss of the PLN layer 220 along the first direction on the substrate 210, and the projection of the groove 252 along the first direction on the substrate 210 overlaps with the projection of the recess of the PLN layer 220 along the first direction on the substrate 210, and the first direction is perpendicular to the plane where the substrate 310 is located.

[0148] As shown in FIG10( b ), the projection of the raised portion 251 of the light-emitting layer 250 onto the plane of the substrate 210 may be circular, and the number of the raised portion 251 may be one. The raised portion 251 of the light-emitting layer 250 may be located inside the groove portion 252 of the light-emitting layer 250 , or the groove portion 252 of the light-emitting layer 250 may surround the outer periphery of the raised portion 251 , and the groove portion 252 may form a circular ring shape in a top view.

[0149] In some other embodiments, the top view of the display device may be as shown in FIG. 10( c ), where the light-emitting layer 250 may include a raised portion 251 and a recessed portion 252. The projection of the raised portion 251 of the light-emitting layer 250 onto the plane of the substrate 210 may be in the shape of a ring, and the number of raised portions 251 may be one. The recessed portion 252 of the light-emitting layer 250 may surround the outer periphery of the raised portion 251, and the recessed portion 252 may form a ring shape in the top view.

[0150] In some other embodiments, a top view of the display device may be as shown in FIG. 10( d ), where the light-emitting layer 250 may include a raised portion 251 and a recessed portion 252 . The projection of the raised portion 251 of the light-emitting layer 250 onto the plane of the substrate 210 may be circular, and the number of raised portions 251 may be multiple, such as four. The recessed portion 252 of the light-emitting layer 250 may surround the outer periphery of the raised portion 251 .

[0151] It should be noted that the embodiment of the present application does not limit the number of undulating structures of the light-emitting layer 250 or the PLN layer 220. For example, the number of the convex parts 251 of the light-emitting layer 250 can be 1 to 10.

[0152] In some embodiments, as shown in FIG. 11 and FIG. 12 , the display device 200 may further include an encapsulation layer 310 . The encapsulation layer 310 may be located on a side of the cathode layer 260 away from the substrate 310 .

[0153] It should be understood that OLED can be used with an anti-reflection structure, for example, it can be used with a color on encapsulation (COE) anti-reflection structure, or it can be used with a polarizer (POL) anti-reflection structure, thereby reducing the reflection loss on the surface of the optical device, improving the transmittance, and enhancing the performance of the optical system.

[0154] In one example, as shown in FIG11 , the display device 300 may further include a color filter 320 and a black matrix (BM) 330 . The color filter 320 and the black matrix 330 may be located on a side of the encapsulation layer 310 away from the substrate 210 . The color filter 320 corresponds to the anode layer 230 , and the black matrix 330 is disposed between the color filters 320 .

[0155] For example, the display device 300 may further include a cover glass 340 . The cover glass 340 may be located on a side of the color filter 320 and the black matrix 330 away from the substrate 210 .

[0156] The color filter 320 can solve the problems of reflection and light transmission. When external light enters the screen, the unnecessary light will be absorbed by the BM 330, and the rest will be incident through the RGB in the color filter 320. Then the RGB pixels will display color and reflect. Part of the reflection process will be blocked by the BM 330, and the rest will be absorbed by the color filter 320. Polarizer-free technology can achieve lower screen power consumption at the same display brightness; or brighter screen brightness at the same power consumption. In addition, since the color filter 320 is usually only about 10 microns, it can greatly reduce the thickness of the screen compared to the polarizer, which is beneficial to extend the life of the folding screen and reduce the cost of using polarizers.

[0157] In other words, the COE architecture light extraction solution will result in a decrease in the color gamut at normal viewing angles. The COE architecture can achieve an improvement in the color gamut and achieve product goals. In addition, the COE architecture solution can convert reflected light incident on the screen into scattered light, thereby locking it within the screen and reducing reflectivity. In addition, the display device 300 provided in this application can also improve light extraction efficiency. Compared with the current mass-produced device structure, the EQE of the display device 300 provided in this application can be improved by at least 15%.

[0158] In another example, the color filter 320 and the BM 330 in the display device 300 may be replaced with a polarizer 410 to form the display device 400 shown in FIG12. That is, the display device 400 may further include a polarizer 410, which may be located on a side of the encapsulation layer 310 away from the substrate 210.

[0159] For example, as shown in FIG. 12 , the display device 400 may further include a cover glass 340 . The cover glass 340 may be located on a side of the polarizer 410 away from the substrate 210 .

[0160] It should be noted that FIG11 or FIG12 shows a schematic cross-sectional view of a display device having a single pixel light-emitting unit. The light-emitting layer 250 may include any one or more of a red light-emitting layer 253, a green light-emitting layer 254, and a blue light-emitting layer 255. In other words, a single pixel light-emitting unit may include three sub-pixel light-emitting units: a red sub-pixel light-emitting unit (i.e., the red light-emitting layer 253) that can display (emit) red light; a green sub-pixel light-emitting unit (i.e., the green light-emitting layer 254) that can display green light; and a blue sub-pixel light-emitting unit (i.e., the blue light-emitting layer 255) that can display blue light.

[0161] The specific structure of the light-emitting layer 250 may vary depending on the type of display device. In the embodiment of the present application, the display device may be an OLED display panel, and the light-emitting layer 250 is an organic light-emitting layer. In this case, the sub-pixel light-emitting unit includes an organic light-emitting diode.

[0162] The specific structure of the display device provided by the embodiment of the present application is described in detail above with reference to Figures 2 to 12. The schematic diagram of the manufacturing method of the display device provided by the embodiment of the present application will be described below with reference to Figures 13 and 14.

[0163] FIG13 is a schematic diagram of a method for manufacturing a display device provided in the present application. As shown in FIG13 , the method for manufacturing a display device provided in the present application may include steps 101 to 106 .

[0164] Step 101 , obtaining a substrate 210 .

[0165] Among them, the substrate 210 can be a thin-film transistor (TFT) substrate, which includes a base material and a TFT circuit and a peripheral driving circuit arranged on the base material. The channel material of the TFT can be a thin-film transistor such as LTPS, Oxide, LTPO, a-Si and Organic. The base material can be made of any material such as glass, ceramic, plastic, metal or rubber, and this application does not limit this.

[0166] In some embodiments, the substrate can be made of a flexible material, such as polyimide (PI), so that the substrate 210 can be bent and deformed, thereby enabling the display device 200 to meet the usage requirements of a foldable terminal device (such as a foldable mobile phone).

[0167] Step 102 : forming a PLN layer 220 having an undulating structure on a substrate 210 .

[0168] Specifically, this step may include: forming a PLN layer 220 having recesses and / or protrusions on the substrate 210. The material of the PLN layer 220 may be an organic polymer such as polyimide, siloxane, polyamide, acrylic acid, etc.

[0169] The PLN layer 220 can be fabricated using a half-tone process, with a single masking step completing the entire process. In other words, the PLN layer 220 is formed in one piece. Furthermore, the surface of the PLN layer 220 facing away from the substrate 210 has an undulating structure, namely, recesses and / or protrusions.

[0170] In one example, the PLN layer 220 has a recess 201, which includes sidewalls and a bottom surface. The sidewalls of the recess 201 are inclined relative to the bottom surface of the recess 201. The inclination angle (i.e., first inclination angle θ1) between the sidewalls of the recess 201 and a first plane can range from 20° to 60°, and the first plane is parallel to the plane of the substrate 210. The depth of the recess 201 can range from 0.3 to 3 μm. In other words, the height f between the highest point of the sidewalls of the recess 201 and the bottom surface of the recess 201 ranges from 0.3 to 3 μm, and the first direction is perpendicular to the plane of the substrate 210.

[0171] In another example, the PLN layer 220 includes a boss 202, which includes a bottom surface, a top surface, and sidewalls. The sidewalls of the boss 202 are inclined relative to the bottom surface of the boss 202. The angle of inclination between the sidewalls of the boss 202 and a first plane (i.e., a second inclination angle θ2) can range from 10 to 30°, and the first plane is parallel to the plane of the substrate 210. The height of the boss 202 can range from 0.5 to 2 μm. In other words, along the first direction, the height h between the top surface of the boss 202 and the bottom surface of the boss 202 ranges from 0.5 to 2 μm. The length k of the projection of the top surface of the boss 202 onto the substrate 210 along the first direction perpendicular to the plane of the substrate 210 can range from 1 to 20 μm.

[0172] In another example, the PLN layer 220 has a recess 201 and a protrusion 202. The protrusion 202 is located within the recess 201, and the bottom surface of the protrusion 202 is connected to the bottom surface of the recess 201. The recess 201 includes sidewalls and a bottom surface, and the sidewalls of the recess 201 are arranged at an angle to the bottom surface of the recess 201; the protrusion 202 includes a bottom surface, a top surface, and sidewalls, and the sidewalls of the protrusion 202 are arranged at an angle to the bottom surface of the protrusion.

[0173] In some embodiments, to improve the flatness of the PLN layer 220 formed on the substrate 210, a planarization process may be performed on the substrate 210. For example, a chemical mechanical polishing (CMP) process, an etch-back process, etc. may be applied to the substrate 210 so that the substrate 210 has a flat surface, for example, the substrate 210 has a flat upper surface.

[0174] In some embodiments, the PLN layer 220 may be formed on the substrate 210 by using a spin coating process, a printing process, a sputtering process, a chemical vapor deposition (CVD) process, an atomic layer deposition (ALD) process, a plasma enhanced chemical vapor deposition (PECVD) process, a high density plasma chemical vapor deposition (HDP-CVD) process, or a vacuum deposition process depending on the material used.

[0175] In step 103 , an anode layer 230 is formed on a side of the PLN layer 220 away from the substrate 210 .

[0176] For example, the anode layer 230 can be formed on a side of the PLN layer 220 away from the substrate 210, and then patterned to form the anode layer 230 on certain portions of the PLN layer 220. The anode layer 230 can be formed by, for example, a sputtering process, a vacuum deposition process, a chemical vapor deposition process, a pulsed laser deposition process, a printing process, or an atomic layer deposition process. The material of the anode layer 230 can be a metal, metal oxide, or alloy such as silver, aluminum, or indium tin oxide.

[0177] It should be understood that in this step, the anode layer 230 may be formed on the PLN layer 220 by film formation, exposure, etching, development, etc. The edge of the anode layer 230 may cover the sidewall of the concave portion of the PLN layer 220.

[0178] In one example, if the PLN layer 220 has a recess 201, the anode layer 230 may cover at least the bottom surface and sidewalls of the recess 201. The portion of the anode layer 230 covering the sidewall of the recess 201 may form an inclined surface (denoted as a first inclined surface) or an inclined portion (denoted as a first inclined portion) of the anode layer 230. Furthermore, the inclination angle formed between the sidewall of the recess 201 and the first plane is the same as or similar to the inclination angle formed between the first inclined surface of the anode layer 203 and the first plane, and the first plane is parallel to the plane of the substrate 210. It should be understood that the thickness of the anode layer 230 is uniform along the first direction, which is perpendicular to the plane of the substrate 210.

[0179] In another example, if the PLN layer 220 has a boss 202, the anode layer 230 may cover at least the top surface and sidewalls of the boss 202. The portion of the anode layer 230 covering the sidewall of the boss 202 may form an inclined surface (denoted as a second inclined surface) or an inclined portion (denoted as a second inclined portion) of the anode layer 230. Furthermore, the inclination angle formed by the sidewall of the boss 202 and the first plane is the same as or similar to the inclination angle formed by the second inclined surface of the anode layer 203 and the first plane, and the first plane is parallel to the plane of the substrate 210. It should be understood that the thickness of the anode layer 230 is uniform along a first direction, which is perpendicular to the plane of the substrate 210.

[0180] In another example, if the PLN layer 220 has a recess 201 and a protrusion 202, the anode layer 230 may cover at least the bottom surface and sidewalls of the recess 201, the sidewalls of the protrusion 202, and the top surface of the protrusion 202. The portion of the anode layer 230 covering the sidewalls of the recess 201 may form a slope (denoted as a first slope) or an inclined portion (denoted as a first inclined portion) of the anode layer 230. The portion of the anode layer 230 covering the sidewalls of the protrusion 202 may form a slope (denoted as a second slope) or an inclined portion (denoted as a second inclined portion) of the anode layer 230. Furthermore, the inclination angle formed by the sidewalls of the recess 201 and the first plane is the same as or similar to the inclination angle formed by the first slope of the anode layer 203 and the first plane, and the inclination angle formed by the sidewalls of the protrusion 202 and the first plane is the same as or similar to the inclination angle formed by the second slope of the anode layer 203 and the first plane. The first plane is parallel to the plane of the substrate 210. It should be understood that the thickness of the anode layer 230 is uniform along a first direction, and the first direction is perpendicular to the plane where the substrate 210 is located.

[0181] In step 104 , a PDL layer 240 is formed on a side of the PLN layer 220 away from the substrate 210 .

[0182] The PDL layer 240 may be formed of an organic material or an inorganic material. For example, the PDL layer 240 may include an organic material selected from photoresist, siloxane, acrylic, polypropylene, polyimide, and acryl resins, and an inorganic material such as a silicon compound.

[0183] Illustratively, a material for forming the PDL is fully coated onto the PLN layer 220 and the anode layer 230, and is partially etched to form the PDL layer 240, thereby exposing a portion of the anode layer 230. For example, the anode layer 230 may be exposed using a photolithography process or an etching process using an additional etching mask to produce an exposed electrode.

[0184] In some embodiments, the PDL layer 240 may not cover the first inclined surface of the anode layer 230. That is, the projection of the PDL layer 240 on the substrate 210 along the first direction does not overlap with the projection of the recess 201 on the substrate 210 along the first direction perpendicular to the plane of the substrate 210.

[0185] In other embodiments, the PDL layer 240 may cover the first inclined surface of the anode layer 230. That is, the projection of the PDL layer 240 on the substrate 210 along a first direction at least partially overlaps with the projection of the recess 201 on the substrate 210 along the first direction, where the first direction is perpendicular to the plane of the substrate 210.

[0186] For example, in this step, a patterned PDL layer 240 can be formed on the PLN layer 220 and the anode layer 230 through film formation, exposure, and development processes. In other words, the PDL layer 240 can have a concave-convex structure. It should be understood that by providing the PDL layer 240 with a concave-convex structure, the surface of the PDL layer 240 also has a concave-convex structure, thereby reducing waveguide mode propagation losses, allowing more light to be emitted in the forward direction, and further improving the light extraction efficiency of the display device.

[0187] Step 105 : forming a light emitting layer 250 on the anode layer 230 .

[0188] The formation of the PDL layer 240 defines the light-emitting region and the non-light-emitting region of the display device 200. Specifically, the region excluding the PDL layer 240 corresponds to the light-emitting region (i.e., the light-emitting layer 250), while the region including the PDL layer 240 corresponds to the non-light-emitting region. In other words, in this step, the light-emitting layer 250 can be disposed on the side of the anode layer 230 facing away from the substrate 210, and the light-emitting layer 250 and the PDL layer 240 do not overlap.

[0189] The light emitting layer 250 may be formed of a light emitting material capable of emitting light of different colors (eg, red light, green light, and blue light) according to each pixel of the OLED display.

[0190] The light-emitting layer 250 includes a plurality of pixel light-emitting units arranged in an array, each pixel light-emitting unit including at least three sub-pixel light-emitting units, each of which can display light of a single color. For example, each pixel light-emitting unit may include three sub-pixel light-emitting units, namely, a red sub-pixel light-emitting unit (i.e., a red light-emitting layer) that can display (emit) red light, a green sub-pixel light-emitting unit (i.e., a green light-emitting layer) that can display green light, and a blue sub-pixel light-emitting unit (i.e., a blue light-emitting layer) that can display blue light.

[0191] The specific structure of the light-emitting layer 250 may vary depending on the type of display device 200. In the embodiment of the present application, the display device 200 may be an OLED display panel, and the light-emitting layer 250 is an organic light-emitting layer. In this case, the sub-pixel light-emitting unit includes an organic light-emitting diode.

[0192] In other embodiments, the plurality of sub-pixel light-emitting units may further include the aforementioned W sub-pixel light-emitting unit capable of displaying white light. That is, in this case, the display device 200 may be in an RGBW color matching mode.

[0193] In other embodiments, the display device 200 may be a micro-LED display panel, in which case the sub-pixel light-emitting units include micron-sized light-emitting diodes. Alternatively, the display device 200 may be a QLED display panel, in which case the sub-pixel light-emitting units include quantum dot light-emitting diodes.

[0194] In step 106 , a cathode layer 260 is formed on the light emitting layer 250 and the PDL layer 240 .

[0195] The cathode layer 260 may be formed on the PDL layer 240 and the light emitting layer 250 with a uniform or non-uniform thickness. When the display device 200 adopts a top emission method, the cathode layer 260 may be formed of a light-transmitting conductive material. For example, the cathode layer 260 may include at least one of indium tin oxide, indium zinc oxide, zinc tin oxide, zinc oxide, tin oxide, gallium oxide, or a combination thereof.

[0196] In an embodiment of the present application, the cathode layer 260 may extend from the light-emitting region to the non-light-emitting region, that is, the cathode layer 260 may cover the light-emitting layer 250 and the PDL layer 240. In other embodiments, the cathode layer 260 may be located only on the light-emitting region. For example, the cathode layer 260 may be disposed on the light-emitting layer 250 and on a portion of the PDL layer 240. In this case, the cathode layer 260 may be selectively disposed only in the light-emitting region by forming a cathode layer (not shown) on the entire surface of the light-emitting layer 250 and the PDL layer 240 and then patterning the cathode layer.

[0197] It should be noted that light is usually generated in the light-emitting layer, and only about 30% of the generated light is emitted to the outside through the top surface, while the remaining 70% of the generated light is dissipated mainly through total reflection. In order to reduce the amount of dissipated light, in the display device 200 shown in Figure 2 or Figure 3, on the one hand, the embodiment of the present application provides an undulating structure in the pixel light-emitting edge area (i.e., the edge area of ​​the light-emitting area 250) and the pixel light-emitting middle area (i.e., the middle area of ​​the light-emitting area 250), so that the light is reflected by the inclined surface (first inclined surface and / or second inclined surface) of the anode layer 230 and emitted from the forward direction. The direction of light emission can refer to the direction indicated by the arrow in Figure 2 or Figure 7, thereby improving the light extraction efficiency and increasing the area of ​​the pixel light-emitting area (i.e., the light-emitting area 250); on the other hand, by providing a patterned PDL 240, the surface of the PDL 240 also has a concave-convex undulating structure, thereby reducing the waveguide mode propagation loss, allowing more light to be emitted from the forward direction, and improving the light extraction efficiency.

[0198] In some embodiments, the manufacturing method may further include: forming an encapsulation layer on the cathode layer 260 , that is, forming an encapsulation layer on a side of the cathode layer 260 away from the substrate 210 . The encapsulation layer may be the aforementioned TFE layer.

[0199] For example, the manufacturing method may further include: attaching a polarizer to a side of the encapsulation layer away from the substrate 210 .

[0200] For another example, the manufacturing method may further include: laminating a color film and a black matrix on a side of the encapsulation layer away from the substrate 210 , wherein the color film corresponds to the anode layer 230 , and the black matrix is ​​disposed between the color films.

[0201] In some embodiments, the manufacturing method may further include: attaching a cover glass to a side of the polarizer away from the substrate 210 , or attaching a cover glass to a side of the color filter and the black matrix away from the substrate 210 .

[0202] FIG14 is a schematic diagram of another method for manufacturing a display device provided in the present application. As shown in FIG14 , the method may include steps 201 to 206 .

[0203] Step 201 , obtaining a substrate 210 .

[0204] The specific content of this step can be referred to step 101 and will not be repeated here.

[0205] In step 202 , a PLN layer 220 having an undulating structure is formed on a substrate 210 .

[0206] The main difference between this step and step 102 is that a first planarization layer 221 and a second planarization layer 222 can be sequentially formed on the substrate 210. Specifically, a first PLN layer 221 having a planarized surface can be first formed on the substrate 210, and then a second PLN layer 222 having an inclined portion can be formed on a side of the first PLN layer 221 away from the substrate 210. The first planarization layer 221 and the second planarization layer 222 can be formed of substantially the same or similar materials.

[0207] Exemplarily, step 201 can be formed by two mask processes, one mask completes the production of the first PLN layer 221, and the other mask completes the production of the second PLN layer 222, and the second PLN layer 222 provides a base for the reflective slope of the anode layer 230.

[0208] In step 203 , an anode layer 230 is formed on a side of the PLN layer 220 away from the substrate 210 .

[0209] In step 204 , a PDL layer 240 is formed on a side of the PLN layer 220 away from the substrate 210 .

[0210] Step 205 : forming a light emitting layer 250 on the anode layer 230 .

[0211] In step 206 , a cathode layer 260 is formed on the light emitting layer 250 and the PDL layer 240 .

[0212] It should be noted that steps 203 to 206 may refer to steps 103 to 106 respectively, and will not be repeated here.

[0213] In some embodiments, the manufacturing method may further include: forming an encapsulation layer on the cathode layer 260 , that is, forming an encapsulation layer on a side of the cathode layer 260 away from the substrate 210 . The encapsulation layer may be the aforementioned TFE layer.

[0214] For example, the manufacturing method may further include: attaching a polarizer to a side of the encapsulation layer away from the substrate 210 .

[0215] For another example, the manufacturing method may further include: laminating a color film and a black matrix on a side of the encapsulation layer away from the substrate 210 , wherein the color film corresponds to the anode layer 230 , and the black matrix is ​​disposed between the color films.

[0216] In some embodiments, the manufacturing method may further include: attaching a cover glass to a side of the polarizer away from the substrate 210 , or attaching a cover glass to a side of the color filter and the black matrix away from the substrate 210 .

[0217] In addition, an embodiment of the present application further provides an electronic device, which may include a housing and a display device as shown in Figures 2 to 12, wherein the display device may be mounted on the housing. The electronic device may be, for example, an electronic device with a display screen, such as a mobile phone, a computer, or a smartwatch.

[0218] The above description is merely a specific embodiment of the present application, but the scope of protection of the present application is not limited thereto. Any changes or substitutions that can be easily conceived by a person skilled in the art within the technical scope disclosed in this application should be included in the scope of protection of this application. Therefore, the scope of protection of this application should be based on the scope of protection of the claims.

Claims

1. A display device, characterized in that: include: substrate; a planarization layer located on the substrate, the planarization layer having a concave portion; an anode layer, located on the planarization layer, the anode layer at least covering the bottom surface and sidewalls of the recess, wherein the sidewalls of the recess are inclined relative to the bottom surface of the recess; a pixel definition layer, located on the planarization layer, wherein the pixel definition layer avoids the concave portion; a light-emitting layer, located on the anode layer; The cathode layer is located on the pixel definition layer and the light emitting layer.

2. The display device according to claim 1, wherein The planarization layer has a boss, which is located in the recess, and the bottom surface of the boss is connected to the bottom surface of the recess. The anode layer covers the side wall and the top surface of the boss, and the side wall and the bottom surface of the boss are inclined.

3. The display device according to claim 2, wherein: The inclination angle between the side wall of the boss and the first plane is in the range of 10 to 30 degrees, and the first plane is parallel to the plane where the substrate is located.

4. The display device according to claim 2 or 3, characterized in that Along the first direction, the height between the top surface of the boss and the bottom surface of the boss ranges from 0.5 to 2 μm, and the projection length of the top surface of the boss on the substrate along the first direction ranges from 1 to 20 μm. The first direction is perpendicular to the plane of the substrate.

5. The display device according to any one of claims 1 to 4, characterized in that The pixel definition layer has a concavo-convex structure.

6. The display device according to claim 5, wherein: The pixel definition layer includes a plurality of convex units, each of the plurality of convex units includes a plurality of convex portions, and the plurality of convex portions are arranged at intervals.

7. The display device according to claim 6, wherein: The projection length of the protrusion unit on the substrate along a first direction ranges from 10 to 30 μm, and the first direction is perpendicular to the plane where the substrate is located.

8. The display device according to claim 6 or 7, characterized in that The multiple protrusions include at least a first protrusion and a second protrusion, the projection length of the first protrusion along the first direction on the substrate ranges from 2 to 10 μm, the projection length of the second protrusion along the first direction on the substrate ranges from 3 to 24 μm, the interval between the projections of the first protrusion and the second protrusion along the first direction on the substrate ranges from 0 to 6 μm, and the first direction is perpendicular to the plane of the substrate.

9. The display device according to any one of claims 6 to 8, characterized in that Along the first direction, the height between the highest point of the plurality of protrusion units and the second plane ranges from 1 to 4 μm. The first direction is perpendicular to the plane of the substrate. The second plane is the contact surface between the plurality of protrusion units and the planarization layer.

10. The display device according to any one of claims 1 to 9, characterized in that The inclination angle between the sidewall of the concave portion and the first plane is in a range of 20 to 60 degrees, and the first plane is parallel to the plane where the substrate is located.

11. The display device according to any one of claims 1 to 10, characterized in that Along a first direction, a height between a highest point of a sidewall of the concave portion and a bottom surface of the concave portion ranges from 0.3 to 3 μm, and the first direction is perpendicular to a plane where the substrate is located.

12. A display device, characterized in that: include: substrate; a planarization layer, located on the substrate, the planarization layer having a protrusion; an anode layer, located on the planarization layer, the anode layer at least covering the sidewalls and the top surface of the boss, the sidewalls and the bottom surface of the boss being arranged obliquely; a pixel definition layer, located on the planarization layer, the pixel definition layer comprising an opening, and a portion of the anode layer covering the boss being located within the opening; a light-emitting layer located on the anode layer in the opening; The cathode layer is located on the pixel definition layer and the light emitting layer.

13. The display device according to claim 12, wherein: The planarization layer has a concave portion, the boss is located in the concave portion, the bottom surface of the concave portion is in contact with the bottom surface of the boss, and the sidewall of the concave portion is arranged obliquely to the bottom surface of the concave portion; The anode layer covers the sidewalls and bottom surface of the recess, and the portion of the anode layer covering the sidewalls of the recess forms an inclined surface of the anode layer; The pixel definition layer at least covers the inclined surface of the anode layer.

14. The display device according to claim 13, wherein: The inclination angle between the sidewall of the concave portion and the first plane is in a range of 20 to 60 degrees, and the first plane is parallel to the plane where the substrate is located.

15. The display device according to claim 13 or 14, characterized in that Along a first direction, a height between a highest point of a sidewall of the concave portion and a bottom surface of the concave portion ranges from 0.3 to 3 μm, and the first direction is perpendicular to a plane where the substrate is located.

16. The display device according to any one of claims 13 to 15, characterized in that The projection length of the anode layer on the concave portion along a first direction is in a range of 0.5 to 5 μm, and the first direction is perpendicular to the plane where the substrate is located.

17. The display device according to any one of claims 12 to 16, characterized in that: The pixel definition layer has a concavo-convex structure.

18. The display device according to claim 17, wherein: The pixel definition layer includes a plurality of convex units, each of the plurality of convex units includes a plurality of convex portions, and the plurality of convex portions are arranged at intervals.

19. The display device according to claim 18, wherein The projection length of the protrusion unit on the substrate along a first direction ranges from 10 to 30 μm, and the first direction is perpendicular to the plane where the substrate is located.

20. The display device according to claim 18 or 19, characterized in that The multiple protrusions include at least a first protrusion and a second protrusion, the projection length of the first protrusion along the first direction on the substrate ranges from 2 to 10 μm, the projection length of the second protrusion along the first direction on the substrate ranges from 3 to 24 μm, the interval between the projections of the first protrusion and the second protrusion along the first direction on the substrate ranges from 0 to 6 μm, and the first direction is perpendicular to the plane of the substrate.

21. The display device according to any one of claims 18 to 20, characterized in that Along the first direction, the height between the highest point of the plurality of protrusion units and the second plane ranges from 1 to 4 μm. The first direction is perpendicular to the plane of the substrate. The second plane is the contact surface between the plurality of protrusion units and the planarization layer.

22. The display device according to any one of claims 12 to 21, characterized in that The inclination angle between the side wall of the boss and the first plane is in the range of 10 to 30 degrees, and the first plane is parallel to the plane where the substrate is located.

23. The display device according to any one of claims 12 to 22, characterized in that Along the first direction, the height between the top surface of the boss and the bottom surface of the boss ranges from 0.5 to 2 μm, and the projection length of the top surface of the boss on the substrate along the first direction ranges from 1 to 20 μm. The first direction is perpendicular to the plane of the substrate.

24. An electronic device, characterized in that: include: case; The display device according to any one of claims 1 to 11, or the display device according to any one of claims 12 to 23, wherein the display device is mounted on the housing.

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