Workbench for transferring semiconductor wafer cassette

Abstract

Embodiments of the present application provide a workbench for transferring a semiconductor wafer cassette. The workbench comprises a support part, a steering assembly, and a limiting assembly. The steering assembly is fixed to a support surface by means of a fixing part. A base is provided on the fixing part and is rotatably arranged around a first direction, the first direction intersecting the support surface. The base is used for placing a wafer cassette and driving the wafer cassette to rotate. The limiting assembly comprises limiting parts fixed to the base and locking parts fixed to the fixing part. The at least two locking parts are provided at a first position and a second position, so that when the base rotates, the limiting parts and the locking parts are snap-fitted with each other at the first position and / or the second position.

Description

Workbench for transferring semiconductor wafer cassettes

[0001] CROSS-REFERENCE TO RELATED APPLICATIONS

[0002] This application claims priority to Chinese patent application No. 202420316362.0, filed on February 20, 2024, entitled “Workbench for transferring semiconductor wafer boxes,” the entire contents of which are incorporated herein by reference. Technical Field

[0003] The present application relates to the field of semiconductor technology, and in particular to a workbench for transferring semiconductor wafer boxes. Background Art

[0004] During the open-cassette semiconductor wafer transfer process, wafers are transported in cassettes. To proceed to the next process, operators must open the cassettes, remove the wafers, and place them into process tools. During the wafer production process, the cassettes are opened and closed an average of hundreds of times. This process of changing cassettes can easily generate debris that contaminates the wafers, resulting in lower wafer yields.

[0005] Utility Model Content

[0006] An embodiment of the present application provides a workbench for transferring semiconductor wafer boxes, aiming to improve the yield rate of wafers during the semiconductor wafer manufacturing process.

[0007] An embodiment of the first aspect of the present application provides a workbench for transferring semiconductor wafer boxes, the workbench comprising: a supporting portion having a supporting surface; a steering assembly arranged on the supporting surface, the steering assembly comprising a fixing portion and a base, the fixing portion being fixedly connected to the supporting surface, the base being used to place a carrying tool, and the base being rotatable around a first direction, the first direction intersecting with the supporting surface; a limiting assembly comprising a plurality of limiting portions fixed to the base and a locking portion fixed to the fixing portion, at least two locking portions being arranged at a first position and a second position, so that when the base rotates, the limiting portion and the locking portion snap fit with each other at the first position and / or the second position.

[0008] According to the implementation of the first aspect of the present application, the limiting portion is provided with a limiting groove, and the locking portion includes a protruding portion. When the limiting portion is located at the first position and / or the second position, the protruding portion and the limiting groove are snap-fitted with each other.

[0009] According to any embodiment of the first aspect of the present application, the locking portion further includes a mounting portion, the mounting portion includes a receiving space opening toward the base, and the protrusion is arranged in the receiving space and is movably arranged relative to the mounting portion along the first direction.

[0010] According to any one of the aforementioned embodiments of the first aspect of the present application, the locking portion further includes an elastic member that can be reciprocally deformed along the first direction, and the protrusion is arranged in the accommodating space through the elastic member.

[0011] According to any embodiment of the first aspect described above in the present application, the mounting portion further includes two through holes perpendicular to the first direction, the raised portion is a cam and includes a main portion and sub-portions located on both sides of the main portion, the main portion is located in the accommodating space, the sub-portions are located in the two through holes, and the sub-portions are movably arranged in the through holes along the first direction.

[0012] According to any implementation of the first aspect described above in the present application, the limiting portion includes a first surface facing away from the base, the first surface is recessed toward the base to form a limiting groove, the first surfaces on both sides of the limiting groove protrude toward the base to form two first arc surfaces, and the limiting groove includes a second arc surface.

[0013] According to any embodiment of the first aspect of the present application, the fixing portion includes a center point, and the angle between the line connecting the first position and the center point and the line connecting the second position and the rotation center is 85 degrees to 95 degrees.

[0014] According to any implementation of the first aspect described above in the present application, the steering assembly further includes a dustproof plate, which is fixedly connected to the base and is located on the side of the base away from the support portion, and the dustproof plate is provided with a positioning block, which is located on the side of the dustproof plate away from the base, and the positioning block is used to limit the movement of the carrying tool.

[0015] According to any one of the aforementioned embodiments of the first aspect of the present application, a handle is further provided on the dustproof plate.

[0016] According to the implementation scheme of any of the aforementioned first aspects of the present application, a wall portion is provided on one side of the support surface, the wall portion is spaced apart from the steering assembly, a stop block is provided between the wall portion and the steering assembly, the height of the stop block is less than the height of the wall portion, and the side of the stop block facing the steering assembly includes an inclined surface, and the distance between the inclined surface and the steering assembly gradually increases in a first direction and in a direction away from the support surface.

[0017] The workbench for transferring semiconductor wafer cassettes, as implemented in the present application, comprises a support portion, a steering assembly, and a limiting assembly. The support surface of the support portion serves as a platform for transferring the wafer cassette during the process. The steering assembly is secured to the support surface via a fixing portion. The base is disposed on the fixing portion and is rotatable about a first direction intersecting the support surface. The first direction intersects the support surface. The base is used to position the wafer cassette and drive its rotation. The limiting assembly is used to limit the rotation angle of the rotating assembly. The limiting assembly comprises a limiting portion fixed to the base and a locking portion fixed to the fixing portion. At least two locking portions are configured in first and second positions. When the base is rotated, the limiting and locking portions engage with each other in the first and / or second positions, thereby limiting the base from rotating between the first and second positions. The workbench for transferring semiconductor wafer cassettes provided in the embodiments of the present application rotates the wafer cassette along with the base, while the wafer cassette does not rotate relative to the base. This indirectly reduces the possibility of wafer contamination caused by friction between the bottom of the wafer cassette and the workbench, thereby improving the yield of wafer production. BRIEF DESCRIPTION OF THE DRAWINGS

[0018] In order to more clearly illustrate the technical solutions of the embodiments of the present application, the following is a brief introduction to the drawings required for use in the embodiments of the present application. For ordinary technicians in this field, other drawings can be obtained based on these drawings without any creative work.

[0019] FIG1 is a schematic diagram of a structure of a workbench for transferring a semiconductor wafer box according to an embodiment of the present application;

[0020] FIG2 is a second structural schematic diagram of a workbench for transferring semiconductor wafer boxes provided in an embodiment of the present application;

[0021] FIG3 is a third structural schematic diagram of a workbench for transferring semiconductor wafer boxes provided in an embodiment of the present application;

[0022] FIG4 is a fourth structural schematic diagram of a workbench for transferring semiconductor wafer boxes provided in an embodiment of the present application;

[0023] FIG5 is a fifth structural schematic diagram of a workbench for transferring semiconductor wafer boxes provided in an embodiment of the present application.

[0024] Reference numerals:

[0025] 000, support portion; 001, support surface; 002, wall portion; 003, stopper; 004, inclined surface;

[0026] 100. Steering assembly; 101. Fixing part; 102. Base; 103. Dustproof plate; 104. Positioning block; 105. Handle; 106. Bearing; 107. Protective cover;

[0027] 200, limit assembly; 201, limit portion; 201a, first surface; 201b, first arc surface; 202, limit groove; 202a, second arc surface; 203, locking portion; 204, mounting portion; 205, raised portion; 206, elastic member; 207, through hole; 208, sub-portion;

[0028] 300, wafer box;

[0029] X, first direction; A, first position; B, second position; O, center point. DETAILED DESCRIPTION

[0030] The features and exemplary embodiments of various aspects of the present application will be described in detail below. In the detailed description below, many specific details are set forth in order to provide a comprehensive understanding of the present application. However, it will be apparent to those skilled in the art that the present application can be implemented without some of these specific details. The following description of the embodiments is merely intended to provide a better understanding of the present application by illustrating examples of the present application. In the accompanying drawings and the following description, at least some of the well-known structures and technologies are not shown in order to avoid unnecessary ambiguity in the present application; and, for clarity, the sizes of some structures may be exaggerated. In addition, the features, structures, or characteristics described below may be combined in any suitable manner in one or more embodiments.

[0031] In the description of this application, it should be noted that, unless otherwise specified, "plurality" means more than two; terms such as "upper," "lower," "left," "right," "inner," and "outer" indicating directions or positional relationships are merely for the purpose of facilitating the description of this application and simplifying the description. They do not indicate or imply that the devices or components referred to must have a specific orientation, be constructed, or operate in a specific orientation, and therefore should not be construed as limiting this application. Furthermore, terms such as "first" and "second" are used for descriptive purposes only and should not be construed as indicating or implying relative importance.

[0032] The directional words appearing in the following description are all directions shown in the figures, and do not limit the specific structure of the embodiments of this application. In the description of this application, it should also be noted that, unless otherwise clearly specified and limited, the terms "installation" and "connection" should be understood in a broad sense. For example, it can be a fixed connection, a detachable connection, or an integral connection; it can be directly connected or indirectly connected. For ordinary technicians in this field, the specific meanings of the above terms in this application can be understood according to the specific circumstances.

[0033] During the semiconductor wafer manufacturing process, a return air system is installed at the bottom of the workshop to prevent dust particles generated during production from contaminating the wafers. The airflow from this system aligns with the direction of dust particles settling, allowing dust particles to be smoothly discharged toward the return air outlet. Therefore, the workbench is usually designed with multiple small holes to facilitate the discharge of dust particles toward the return air outlet, thereby reducing the problem of dust accumulation.

[0034] However, the porous worktable used to hold wafers in a wafer cassette generates significant friction when rotated. The sharp corners of the cassette's bottom and the small holes rub against each other, generating a large amount of debris particles. When operators repeatedly open and close the cassette, these particles can easily contaminate the wafers, affecting wafer yield. Therefore, the present application provides a worktable for transferring semiconductor wafer cassettes to address this issue.

[0035] In order to better understand the present application, the workbench of the embodiment of the present application is described in detail below with reference to Figures 1 to 5.

[0036] Figure 1 is one of the structural schematic diagrams of a workbench for transferring semiconductor wafer boxes provided in an embodiment of the present application, Figure 2 is a second structural schematic diagram of a workbench for transferring semiconductor wafer boxes 300 provided in an embodiment of the present application, Figure 3 is a third structural schematic diagram of a workbench for transferring semiconductor wafer boxes 300 provided in an embodiment of the present application, Figure 4 is a fourth structural schematic diagram of a workbench for transferring semiconductor wafer boxes 300 provided in an embodiment of the present application, and Figure 5 is a fifth structural schematic diagram of a workbench for transferring semiconductor wafer boxes 300 provided in an embodiment of the present application.

[0037] Referring to Figures 1 to 3 , an embodiment of the first aspect of the present application provides a workbench for transferring a semiconductor wafer cassette 300. The workbench includes a support portion 000, a steering assembly 100, and the support portion 000. The support portion 000 has a support surface 001, and the steering assembly 100 is disposed on the support surface 001. The steering assembly 100 includes a fixing portion 101 and a base 102. The fixing portion 101 is fixedly connected to the support portion 000. The base 102 is used to place a carrier and is rotatable about a first direction X, which intersects the support surface 001. The limiting assembly 200 includes a limiting portion 201 fixed to the base 102 and a locking portion 203 fixed to the fixing portion 101. At least two locking portions 203 are disposed in a first position A and a second position B, so that when the base 102 rotates, the limiting portion 201 and the locking portion 203 engage with each other in the first position A and / or the second position B.

[0038] According to the embodiments of the first aspect of the present application, the workbench comprises: a support portion 000, a steering assembly 100, and a limiting assembly 200. The support surface 001 of the support portion 000 serves as a platform for transferring the wafer cassette 300 carrying the tool during the process. The steering assembly 100 is secured to the support surface 001 via a fixing portion 101. A base 102 is disposed on the fixing portion 101 and is rotatable about a first direction X, which intersects the support surface 001. The base 102 is used to position the wafer cassette 300 and drive its rotation. The limiting assembly 200 is used to limit the rotation angle of the rotating assembly. The limiting assembly 200 includes a limiting portion 201 fixed to the base 102 and a locking portion 203 fixed to the fixing portion 101, and at least two locking portions 203 are arranged at a first position A and a second position B, so that when the base 102 rotates, in the first position A and / or the second position B, the limiting portion 201 and the locking portion 203 snap fit with each other, thereby limiting the rotation of the base between the first position A and the second position B.

[0039] An embodiment of the present application provides a workbench for transferring a semiconductor wafer box 300. During the process of rotating the wafer box 300, the wafer box 300 rotates relative to the support surface 001 along with the base 102, and the wafer box 300 and the base 102 do not rotate relative to each other, thereby indirectly reducing the possibility of wafer contamination caused by debris generated due to friction between the bottom of the wafer box 300 and the support surface 001, thereby improving the yield of wafer production.

[0040] Optionally, the fixing portion 101 includes a center point O, and the rotation of the base between the first position A and the second position B can be understood as: limiting the rotation of the base 102 within the angle range between the line connecting the first position A and the center point O and the line connecting the second position B and the rotation center.

[0041] Optionally, a bearing 106 is further provided between the base 102 and the fixing portion 101, wherein a portion of the bearing 106 is fixedly provided with the base 102, and another portion of the bearing 106 is fixedly provided with the fixing portion 101. At the same time, one portion of the bearing 106 can rotate relative to the other portion, thereby causing the base 102 to rotate relative to the fixing portion 101.

[0042] Optionally, the bearing 106 includes a rotating shaft, wherein there may be multiple limiting portions 201 , and a line connecting the limiting portion 201 and the rotating shaft forms a reference line, and an angle between the reference lines corresponding to two adjacent limiting portions 201 may be 85 degrees to 95 degrees.

[0043] Optionally, there may be two or four limiting portions 201. When there are two limiting portions, the angle between the reference lines corresponding to the two limiting portions 201 may be 90 degrees. When there are four limiting portions 201, the four limiting portions 201 may be evenly spaced around the circumference of the rotating shaft.

[0044] In some optional embodiments, as shown in Figure 3, the limiting portion 201 is provided with a limiting groove 202, and the locking portion 203 includes a protrusion 205. When the limiting portion 201 is located in the first position A and / or the second position B, the protrusion 205 and the limiting groove 202 are snap-fitted with each other.

[0045] In these optional embodiments, the limiting portion 201 is provided with a limiting groove 202, and the locking portion 203 has a protrusion 205. When the base 102 is rotated to rotate the limiting portion 201 to the first position A and / or the second position B, as shown in FIG4 , the limiting groove 202 can interlock with the protrusion 205 located at the first position A and / or the second position B, thereby restricting further rotation of the base 102. The interlocking structure of the protrusion 205 and the limiting groove 202 is simple and easy to use.

[0046] Optionally, when the rotating base 102 causes the limiting portion 201 to rotate to the first position A and / or the second position B, the limiting groove 202 can engage with the protrusion 205 located at the first position A and / or the second position B, thereby limiting the base 102 from continuing to rotate in the original direction.

[0047] As described above, the limiting assembly 200 can limit the base 102 to the first position A or the second position B.

[0048] In some optional embodiments, as can be seen from Figures 2 to 4, the locking portion 203 also includes a mounting portion 204, the mounting portion 204 includes a receiving space opening toward the base 102, and the protrusion 205 is arranged in the receiving space and is movably arranged along the first direction X relative to the mounting portion 204.

[0049] In these optional embodiments, the locking portion 203 further includes a mounting portion 204, which includes a receiving space opening toward the base 102. The protrusion 205 is disposed in the receiving space, and the protrusion 205 is movable relative to the mounting portion 204 along the first direction X. When the limiting portion 201 moves to the first position A and / or the second position B, the protrusion 205 can extend out of the receiving space along the first direction X and interlock with the limiting groove 202. Simultaneously, the top of the protrusion 205 abuts the limiting groove 202, generating frictional resistance between the protrusion 205 and the limiting groove 202, thereby restricting the base 102 from further rotation in the original direction of rotation.

[0050] In some optional embodiments, the locking portion 203 further includes an elastic member 206 that can be reciprocally deformed along the first direction X, and the protrusion 205 is disposed in the accommodating space through the elastic member 206 .

[0051] In these optional embodiments, the locking portion 203 further includes an elastic member 206 that is reciprocally deformable along the first direction X. The protrusion 205 is positioned within the accommodation space by the elastic member 206. When the limiting portion 201 moves toward the first position A and / or the second position B, the protrusion 205 is pressed downward by the limiting portion 201, thereby interlocking with the limiting groove 202. Simultaneously, under the action of the rebound force of the elastic member 206, the protrusion 205 tightly abuts the limiting groove 202, increasing the resistance between the protrusion 205 and the limiting groove 202, further restricting the continued rotation of the base 102.

[0052] Optionally, the elastic member 206 may be a spring. The structure of the elastic member 206 is not particularly limited, as long as the structure can enable the protrusion 205 to generate an upward rebound force after moving downward.

[0053] In some optional embodiments, the mounting portion 204 further includes two through holes 207 perpendicular to the first direction X, the raised portion 205 is a cam and includes a main portion and sub-portions 208 located on both sides of the main portion, the main portion is located in the accommodating space, the sub-portions 208 are located in the two through holes 207, and the sub-portions 208 are movably arranged in the through holes 207 along the first direction X.

[0054] In these optional embodiments, the mounting portion 204 further includes two through holes 207 perpendicular to the first direction X. The protrusion 205 may be a cam, which includes a main body and sub-parts 208 located on either side of the main body. The main body is located in the accommodating space. By arranging the cam sub-parts 208 in the two through holes 207, when the limiting portion 201 rotates toward the first position A and / or the second position B, the cam moves downward in the through holes 207 along the first direction X, thereby engaging with the limiting groove 202. The cam then rebounds upward in the through holes 207 along the first direction X under the action of the elastic member 206 and tightly abuts against the limiting groove 202, thereby increasing the resistance between the cam and the limiting groove 202 and further limiting the continued rotation of the base 102.

[0055] Optionally, the section 208 may be a screw, which may pass through the two through holes 207 and fix the cam in the accommodation space.

[0056] In some optional embodiments, the limiting portion 201 includes a first surface 201a on the side facing away from the base 102, the first surface 201a is recessed toward the direction close to the base 102 to form a limiting groove 202, the first surfaces 201a on both sides of the limiting groove 202 protrude toward the side of the base 102 to form two first arc surfaces 201b, and the limiting groove 202 includes a second arc surface 202a.

[0057] In these optional embodiments, the limiting portion 201 includes a first surface 201a on a side facing away from the base 102. The first surface 201a is recessed toward the base 102 to form a limiting groove 202. The first surfaces 201a on either side of the limiting groove 202 protrude toward the base 102 to form two first curved surfaces 201b. The first curved surfaces 201b are smooth surfaces that facilitate the cam's entry into the limiting groove 202, allowing the cam to engage with the limiting groove 202 under the action of the elastic member 206.

[0058] At the same time, the limiting groove 202 includes a second curved surface 202a, which is recessed toward the base 102. The first curved surface 201b and the second curved surface 202a have a smooth transition. In other words, when the limiting portion 201 rotates toward the first position A and / or the second position B, and the cam just contacts the limiting portion 201, the first curved surface 201b gradually presses the cam downward. As the limiting portion 201 continues to rotate, the cam of the second curved surface 202a gradually embeds deeper into the limiting groove 202, and the pressing force of the limiting portion 201 on the cam gradually decreases. The cam moves upward under the action of the rebound force of the elastic member 206, but the elastic member 206 is still in a tense state, and the cam is engaged with the limiting groove 202.

[0059] Optionally, when the limiting portion 201 rotates out of the first position A and / or the second position B, the cam is gradually pressed downward and gradually rotated out relative to the limiting slot 202 .

[0060] In some optional embodiments, the angle between the line connecting the first position A and the center point O and the line connecting the second position B and the rotation center is 85 degrees to 95 degrees.

[0061] In these optional embodiments, the angle between the line connecting the first position A and the center point O and the line connecting the second position B and the rotation center can be 85 to 95 degrees. In other words, the rotation angle of the base 102 is limited to 85 to 95 degrees to perform subsequent operations of wafer fabrication.

[0062] Optionally, the angle between the line connecting the first position A and the center point O and the line connecting the second position B and the rotation center may be 90 degrees.

[0063] In some optional embodiments, the steering assembly 100 further includes a dustproof plate 103, which is fixedly connected to the base 102 and is located on the side of the base 102 away from the support portion 000. The dustproof plate 103 is provided with a positioning block 104, which is located on the side of the dustproof plate 103 away from the base 102. The positioning block 104 is used to limit the movement of the carrying tool.

[0064] In these optional embodiments, as shown in Figures 1 and 2, the steering assembly 100 further includes a dust shield 103 to prevent dust from falling into the base 102. The dust shield 103 is fixedly connected to the base 102 and is located on the side of the base 102 facing away from the support portion 000. When the base 102 is rotated, the weight of the carrier may cause a certain amount of relative displacement between the carrier and the base 102. Therefore, a positioning block 104 can be provided on the dust shield 103. The positioning block 104 is located on the side of the dust shield 103 facing away from the base 102 and serves to further limit the movement of the carrier.

[0065] Optionally, there may be multiple positioning blocks 104 , and multiple positioning blocks 104 located around the carrier tool can further limit the relative movement between the carrier tool and the base 102 in various directions.

[0066] In some optional embodiments, a handle 105 is further provided on the dustproof plate 103 .

[0067] In these optional embodiments, the handle 105 can be provided on the dustproof plate 103, and the dustproof plate 103 is fixed to the base 102. When the protrusion 205 and the limiting groove 202 are engaged with each other, the operator can use the handle 105 to continue to rotate the base 102 in the locked state.

[0068] In some optional embodiments, as can be seen from Figure 5, a wall portion 002 is provided on one side of the support surface 001, and the wall portion 002 is spaced apart from the steering assembly 100. A stopper 003 is provided between the wall portion 002 and the steering assembly 100, and the height of the stopper 003 is less than the height of the wall portion 002. The side of the stopper 003 facing the steering assembly 100 includes a slope 004, and the distance between the slope 004 and the steering assembly 100 gradually increases in the first direction X and in the direction away from the support surface 001.

[0069] In these optional embodiments, a wall portion 002 is provided on one side of the support surface 001, and the wall portion 002 is spaced apart from the steering assembly 100. A stopper 003 is provided between the wall portion 002 and the steering assembly 100, and the height of the stopper 003 is less than that of the wall portion 002. The side of the stopper 003 facing the steering assembly 100 includes an inclined surface 004, and the distance of the inclined surface 004 from the steering assembly 100 gradually increases in the first direction X and away from the support surface 001. Therefore, the stopper 003 can separate the wafer cassette 300 from the wall portion 002, while the inclined surface 004 of the stopper 003 will not scratch the carrier, thereby alleviating the problem of the wafer cassette 300 colliding with the wall portion 002 and thus scratching the wafer cassette 300 when the carrier is placed on the base 102.

[0070] Optionally, the workbench further includes two protective covers 107. The two protective covers 107 are located on the support portion 000 and enclose the support surface 001 to form a storage space. The steering assembly 100 is located in the storage space so that the steering assembly 100 and the protective covers 107 form a working plane, which is more aesthetically pleasing. The protective covers 107 also provide protection for the steering assembly 100, extending the service life of the steering assembly 100.

[0071] The above description is only a specific embodiment of the present application. Those skilled in the art will clearly understand that for the convenience and brevity of description, the specific working processes of the systems, modules and units described above can refer to the corresponding processes in the aforementioned method embodiments, and will not be repeated here. It should be understood that the scope of protection of the present application is not limited thereto. Any person skilled in the art can easily think of various equivalent modifications or replacements within the technical scope disclosed in the present application, and these modifications or replacements should be included in the scope of protection of the present application.

Claims

1. A workbench for transferring semiconductor wafer cassettes, wherein: The workbench comprises: a support portion having a support surface; a steering assembly disposed on the support surface, the steering assembly comprising a fixing portion and a base, the fixing portion being fixedly connected to the support surface, the base being used to place a carrying tool, and the base being rotatable about a first direction, the first direction intersecting the support surface; The limiting assembly includes a limiting portion fixed to the base and a locking portion fixed to the fixing portion, and at least two of the locking portions are arranged in a first position and a second position so that when the base rotates, the limiting portion and the locking portion are snap-fitted with each other in the first position and / or the second position.

2. The workbench according to claim 1, wherein The limiting portion is provided with a limiting groove, and the locking portion includes a protruding portion. When the limiting portion is located at the first position and / or the second position, the protruding portion and the limiting groove are snap-fitted with each other.

3. The workbench according to claim 2, wherein: The locking portion further includes a mounting portion, wherein the mounting portion includes a receiving space with an opening facing the base, and the protrusion is disposed in the receiving space and is movably disposed relative to the mounting portion along the first direction.

4. The workbench according to claim 3, wherein: The locking portion further includes an elastic member that can be reciprocally deformed along the first direction, and the protrusion is arranged in the accommodating space through the elastic member.

5. The workbench according to claim 3, wherein: The mounting portion also includes two through holes perpendicular to the first direction. The protrusion is a cam and includes a main body and sub-parts located on both sides of the main body. The main body is located in the accommodating space, and the two sub-parts are located in the two through holes. The sub-parts are movably arranged in the through holes along the first direction.

6. The workbench according to claim 2, wherein: The limiting portion includes a first surface facing away from the base, the first surface is recessed toward the base to form the limiting groove, the first surfaces on both sides of the limiting groove protrude toward the base to form two first arc surfaces, and the limiting groove includes a second arc surface.

7. The workbench according to claim 1, wherein: The fixing portion includes a center point, and an angle between a line connecting the first position and the center point and a line connecting the second position and the rotation center is 85 degrees to 95 degrees.

8. The workbench according to claim 1, wherein The steering assembly also includes a dustproof plate, which is fixedly connected to the base and located on the side of the base away from the support part. The dustproof plate is provided with a positioning block, which is located on the side of the dustproof plate away from the base. The positioning block is used to limit the movement of the carrying tool.

9. The workbench according to claim 8, wherein: The dustproof plate is also provided with a handle.

10. The workbench according to claim 1, wherein A wall portion is provided on one side of the support surface, and the wall portion is spaced apart from the steering assembly. A stop block is provided between the wall portion and the steering assembly, and the height of the stop block is smaller than the height of the wall portion. The side of the stop block facing the steering assembly includes an inclined surface, and the distance between the inclined surface and the steering assembly gradually increases in a first direction and in a direction away from the support surface.

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