Light beam calibration and adjustment assembly and device, and photoetching apparatus

Abstract

Disclosed in the embodiments of the present application are a light beam calibration and adjustment assembly and device, and a photoetching apparatus. The light beam calibration and adjustment assembly comprises a frame part, an optical element, light receiving components and an analysis component. The frame part comprises a pipeline main structure and a pipeline branch structure, wherein the pipeline main structure is connected to a light outlet of a light beam steering device, a reflecting mirror is provided in the pipeline main structure, and the axis of the pipeline main structure intersects with the axis of the pipeline branch structure at the central point of the reflecting mirror. In the present application, by means of the light beam calibration and adjustment assembly being arranged downstream of a light path of the light beam steering device, the reflecting mirror can split an initial light beam emitted by the light beam steering device into two groups, and after being filtered and focused by the optical element, the two groups of light beams can be respectively imaged on two groups of light receiving components, the two groups of light receiving components can send acquired image information to a processor, and the processor can determine the step length of an electric motor to be adjusted by means of a built-in algorithm, such that calibration and adjustment of the light beam steering device can be quickly and accurately completed.

Description

Beam calibration adjustment component, device and lithography equipment

[0001] CROSS-REFERENCE TO RELATED APPLICATIONS

[0002] This application claims priority to Chinese patent application No. 202420365284.3, filed on February 27, 2024, entitled “Beam calibration adjustment component, device and lithography equipment,” the entire contents of which are incorporated herein by reference. Technical Field

[0003] The present application relates to the field of semiconductor lithography technology, and in particular to a beam calibration and adjustment component, device, and lithography equipment. Background Art

[0004] Photolithography is one of the key operations in the semiconductor manufacturing process. Photolithography technology includes ultraviolet lithography and deep ultraviolet lithography. In the ultraviolet lithography and deep ultraviolet lithography processes, ultraviolet light and deep ultraviolet light are irradiated onto the wafer through the hollow patterns on the photomask to form specific patterns. A well-calibrated light path can significantly improve the performance indicators of the photolithography tool, such as the critical dimensions and depth of focus. However, the adjustment and calibration process of the light path is relatively complicated. During the calibration process of the light path, the adjustment of the beam steering angle and position is particularly time-consuming. In photolithography technology, the beam steering system is the starting point of the light path. The beam steering system can control the position and incident angle of ultraviolet light and deep ultraviolet light so that it passes through the optical elements correctly. The beam steering system uses four motor axes to control two reflectors. During the calibration and adjustment of the optical path, the beam shape needs to be precisely adjusted using an OEM adjustment tool. This adjustment process relies on human observation. Strong fluorescence and scattering will reduce the accuracy of the adjustment. During the adjustment process, the motor step size of the four motor axes needs to be modified. However, the relationship between the motor step size and the position and angle of the light is unclear, which requires a lot of time for trial and error, which is not conducive to production efficiency.

[0005] Summary of the Invention

[0006] The embodiments of the present application provide a beam calibration and adjustment component, device, and lithography equipment, which can accurately obtain the imaging position of the branched light beam in a predefined coordinate system, and determine the motor step size that needs to be adjusted for each motor through processor analysis.

[0007] In the first aspect, an embodiment of the present application provides a light beam calibration and adjustment component, which includes a frame part, an optical element, a light receiving part and an analysis part. The frame part includes a pipeline main structure and a pipeline branch structure that are intersecting and interconnected. The pipeline main structure is connected to the light outlet of the light beam steering device. The first port of the frame part is located at the pipeline main structure, and the second port is located at one end of the pipeline branch structure away from the pipeline main structure. A reflector is arranged inside the pipeline main structure, and the axis of the pipeline main structure and the axis of the pipeline branch structure intersect at the center point of the reflector.

[0008] The optical element is arranged at the first port and the second port, and includes a scintillator and a focusing element arranged in sequence along the propagation direction of the light beam. The light receiving component is arranged on the side of the optical element facing away from the reflector, and can match the imaging with the focusing element. The analysis component includes a processor electrically connected to the light receiving component, and the processor is suitable for receiving image information monitored by the light receiving component and determining the imaging position of the graphic information in a predefined coordinate system.

[0009] According to the first aspect of the embodiment of the present application, the pipeline main body structure also has a third port opposite to the first port, and is connected to the light outlet port of the light beam steering device through the third port. The two-dimensional extension surface corresponding to the first port is orthogonal to the light outlet direction of the light beam steering device.

[0010] According to the first aspect of the embodiment of the present application, the initial light beam emitted by the light beam steering device is at least one of ultraviolet light and deep ultraviolet light, the reflector is an amorphous material reflector and is arranged at an angle of 45 degrees to the light output direction of the light beam steering device, and the transmittance of the reflector to the ultraviolet light and the deep ultraviolet light is 50% so as to evenly divide the initial light beam into two groups of branch light beams.

[0011] According to the first aspect of the embodiment of the present application, the frame member further includes a temperature stabilizing plate and a valve seat, the temperature stabilizing plate is arranged adjacent to the light receiving component, and the valve seat is connected to the light outlet of the light beam steering device and is detachably connected to the third port.

[0012] According to the first aspect of an embodiment of the present application, the optical component also includes a first filter element stacked with the scintillator, the two-dimensional extension surface corresponding to the first filter element is orthogonal to the axial direction of the pipeline branch structure, and the first filter element is clamped between the scintillator and the focusing element to adjust the light beam intensity to avoid overexposure of the light receiving component.

[0013] According to a first aspect of an embodiment of the present application, the scintillator and the focusing element are stacked on each other along the propagation direction of the light beam and a gap is set, and the optical element also includes a second filter element, which is located downstream of the focusing element along the corresponding light beam propagation direction.

[0014] According to the first aspect of the embodiment of the present application, the first filter element is a neutral density filter or a transparent plate with a neutral density filter coating on at least one side, and the second filter element is a bandpass filter to absorb part of the light beam in a specific band that is not eliminated by the scintillator.

[0015] According to the first aspect of the embodiment of the present application, the focusing component includes two or more focusing lenses of different specifications, each of which can be rotated on one side of the scintillator to adjust the imaging size of the branch light beam on the light receiving component, and the light receiving component is a CCD detector.

[0016] In the second aspect, an embodiment of the present application provides a light beam calibration and adjustment device, which includes a light beam steering device and a light beam calibration and adjustment component of any of the aforementioned items, the light beam steering device having a light outlet connected to the pipeline main structure, and the light beam steering device including a first motor group and a second motor group; wherein, the first motor group is connected to a reflector transmission through a first motor shaft group to adjust the incident position of the initial light beam in the calibration and adjustment component, and the second motor group is connected to another reflector transmission through a second motor shaft group to adjust the incident angle of the initial light beam in the calibration and adjustment component.

[0017] In a third aspect, an embodiment of the present application provides a lithography device, which includes a variable attenuator, a light homogenizer, a blade imaging device, a lens, and the aforementioned beam calibration and adjustment device, wherein the variable attenuator is arranged at a downstream position of the optical path of the calibration and adjustment device to adjust the light energy transmittance and exposure energy, the light homogenizer includes an integral pump and a quartz rod arranged at a downstream position of the variable attenuator to uniformly process the light spot, the blade imaging device has a boundary control module to cover at least part of the light spot, and the lens is connected to the blade imaging device and is located between the chip and the blade imaging device.

[0018] The embodiments of the present application provide a beam calibration adjustment component, device and lithography equipment, wherein the beam calibration adjustment component is arranged downstream of the optical path of the beam steering device, and a reflector is provided at the intersection of the pipeline main structure and the pipeline branch structure of the frame member, which can divide the initial light beam emitted by the beam steering device into two groups. The two groups of light beams can be imaged on two groups of light receiving components respectively after filtering and focusing by optical elements. The two groups of light receiving components can send the acquired image information to the processor, and the processor can determine the motor step size that needs to be adjusted through the built-in algorithm; since the imaging position at the second port is only affected by the incident position of the initial light beam, and the imaging position at the first port is affected by the comprehensive influence of the incident position and incident angle of the initial light beam, during the adjustment process, the imaging position at the second port and the imaging position at the first port can be adjusted and reviewed in turn based on the analysis results of the processor, thereby completing the calibration adjustment of the beam steering device quickly and accurately. BRIEF DESCRIPTION OF THE DRAWINGS

[0019] The features, advantages and technical effects of exemplary embodiments of the present application will be described below with reference to the accompanying drawings.

[0020] FIG1 is a schematic structural diagram of a beam calibration and adjustment device in the related art;

[0021] FIG2 is a schematic diagram of an imaging device for adjusting an OED used in a beam calibration and adjustment device in the related art;

[0022] FIG3 is a schematic structural diagram of a beam calibration and adjustment assembly provided in an embodiment of the present application;

[0023] FIG4 is a schematic diagram of a partial structure of a frame member provided in an embodiment of the present application;

[0024] FIG5 is a schematic diagram of an exemplary CCD detector imaging and a schematic diagram of an analysis result of a processor provided in an embodiment of the present application;

[0025] FIG6 is a schematic diagram of the composition of the lithography machine provided in an embodiment of the present application.

[0026] In the accompanying drawings, the drawings are not necessarily drawn to scale.

[0027] Figure numerals: frame member 1; pipeline main structure 11; pipeline branch structure 12; reflector 13; temperature stabilizing plate 14; valve seat 15; beam steering device 2; first motor shaft group 21; reflector 22; second motor shaft group 23; optical element 3; scintillator 31; focusing element 32; first filter element 33; second filter element 34; light receiving component 4; variable attenuator 5; light homogenizer 6; integral pump 61; quartz rod 62; blade imaging device 7; lens 8; chip 9; beam calibration adjustment device 10; first port A; second port B; third port C. DETAILED DESCRIPTION

[0028] To make the purpose, technical solutions, and advantages of the embodiments of this application more clear, the technical solutions in the embodiments of this application will be clearly described below in conjunction with the drawings in the embodiments of this application. Obviously, the described embodiments are part of the embodiments of this application, not all of the embodiments. Based on the embodiments in this application, all other embodiments obtained by ordinary technicians in this field without making creative efforts are within the scope of protection of this application.

[0029] Unless otherwise defined, all technical and scientific terms used in this application have the same meanings as commonly understood by those skilled in the art to which this application belongs. The terms used in the specification of this application are for the purpose of describing specific embodiments only and are not intended to limit this application. The terms "including" and "having" and any variations thereof in the specification and claims of this application and the above-mentioned drawings are intended to cover non-exclusive inclusions. The terms "first" and "second" in the specification and claims of this application or the above-mentioned drawings are used to distinguish different objects, rather than to describe a specific order or a primary-secondary relationship.

[0030] This application is based on the inventor's discovery and understanding of the following facts and problems:

[0031] In the ultraviolet lithography and deep ultraviolet lithography processes, ultraviolet light and deep ultraviolet light are irradiated onto the wafer through the hollow pattern on the photomask to form a specific pattern. In the lithography process, the optical path of the lithography equipment needs to be calibrated first. A well-calibrated optical path can significantly improve the accuracy of the lithography equipment when processing wafers. However, the optical path adjustment and calibration process of the lithography equipment is relatively complicated. During the calibration of the optical path, it is particularly time-consuming to adjust the beam steering angle and position of the beam steering device. In lithography technology, the beam steering system corresponding to the beam steering device is the starting point of the optical path. The beam steering system can control the position and incident angle of ultraviolet light and deep ultraviolet light so that it passes through the optical element correctly. The beam steering system uses four motor axes to control two mirrors.

[0032] In the related art, during the calibration and adjustment of the optical path, refer to FIG1 . The beam shape needs to be monitored and calibrated using an OEM adjustment tool 2 '. Two sets of OEM adjustment tools 2 ' are symmetrically connected to the two ends of a cylindrical tube 1 '. The tube 1 ' is connected to the beam steering device 2 through the OEM adjustment tool 2 ' provided at its bottom. During the process of the light beam being processed and redirected by the beam steering device 2 , the imaging results of the OEM adjustment tool 2 ' can be used to determine whether the optical path calibration meets the standards. Refer to FIG2 , which is a schematic diagram of an exemplary imaging of the OEM adjustment tool 2 '. The OEM adjustment tool 2 ' has a gridded coordinate plane. The deviation dX and dY of any point on the coordinate plane relative to the coordinate origin can be intuitively determined. However, this adjustment process relies on human observation. Strong fluorescence and scattering will reduce the accuracy of the adjustment. During the adjustment process, the motor step lengths of the four motor axes need to be modified. However, the relationship between the motor step length and the position and angle of the light is unclear, requiring a lot of time for trial and error.

[0033] In order to solve the above problems, an embodiment of the present application provides a beam calibration adjustment component, device and lithography equipment. The beam calibration adjustment component, device and lithography equipment provided in the embodiment of the present application are described in detail below in conjunction with Figures 1-6.

[0034] Please refer to Figure 3. An embodiment of the present application provides a light beam calibration adjustment component, which includes a frame member 1, an optical element 3, a light receiving component 4 and an analysis component. The frame member 1 includes a pipeline main structure 11 and a pipeline branch structure 12 that are intersecting, connected and interconnected. It can be understood that the frame member 1 is T-shaped in overall structure, and the pipeline main structure 11 is connected to the light outlet of the light beam steering device 2. The first port A of the frame member 1 is located at the pipeline main structure 11, and the second port B is located at the end of the pipeline branch structure 12 away from the pipeline main structure 11. It can be understood that after the light enters the pipeline main structure 11 from the light outlet of the light beam steering device 2, it can pass through the first port A and the second port B.

[0035] Specifically, as shown in Figure 3, a reflector 13 is provided inside the pipeline main structure 11, and the axis of the pipeline main structure 11 and the axis of the pipeline branch structure 12 intersect at the center point of the reflector 13. The optical element 3 is arranged at the first port A and the second port B, and includes a scintillator 31 and a focusing element 32 arranged in sequence along the propagation direction of the light beam. The light receiving component 4 is arranged on the side of the optical element 3 facing away from the reflector 13, and can match the imaging with the focusing element 32. The analysis component includes a processor electrically connected to the light receiving component 4, and the processor is suitable for receiving image information monitored by the light receiving component 4 and determining the imaging position of the graphic information in a predefined coordinate system.

[0036] It can be understood that after the light passes through the first port A and the second port B, it will pass through the scintillator 31 and the focusing element 32 in sequence. The scintillator 31 is a material that can absorb high-energy particles or rays and then emit light. By setting the scintillator 31, the fluorescence in the light beam passing through it can be filtered, which is beneficial to improve the imaging accuracy of the light beam on the light receiving component 4. In addition, by setting the focusing element 32, the light beam can be gathered and projected onto the light receiving component 4. The inner diameter of the light spot is smaller than the radial size of the light beam, which is beneficial for the light spot to be completely inside the light receiving component 4, and can prevent the outer edge of the light spot from falling partially outside the light receiving component 4.

[0037] In some embodiments, as shown in Figure 4, the pipeline main body structure 11 also has a third port C opposite to the first port A. The pipeline main body structure 11 is connected to the light outlet of the light beam steering device 2 through the third port C, and the two-dimensional extension surface corresponding to the first port A is orthogonal to the light outlet direction of the light beam steering device 2.

[0038] It can be understood that the pipeline main structure 11 is a cylindrical tube and its radial size remains unchanged. The light beam processed by the light beam steering device 2 enters the pipeline main structure 11 from the third port C. The light beam entering the pipeline main structure 11 can be diverted to the pipeline branch structure 12 under the action of the reflector 13.

[0039] In some embodiments, the initial light beam emitted by the beam steering device 2 is at least one of ultraviolet light and deep ultraviolet light. Please refer to Figures 3 and 4 together. The reflector 13 is set at a 45-degree angle to the light output direction of the beam steering device 2. The transmittance of the reflector 12 to ultraviolet light and deep ultraviolet light is 50% to evenly divide the initial light beam into two groups of branch light beams.

[0040] It can be understood that in the process in which the photolithography equipment emits a light beam through a light source and irradiates it onto the wafer in cooperation with the hollow pattern on the photomask to form a specific pattern, the light source used by the photolithography equipment can be ultraviolet light or deep ultraviolet light. Based on this, when calibrating and adjusting the light beam steering device 2, in order to evenly divide the initial light beam entering the pipeline main structure 11 into two groups of branch light beams, the reflector 13 is constructed so that it forms a 45-degree angle with the light output direction of the beam steering device 2. In addition, the transmittance of the reflector 12 to ultraviolet light and deep ultraviolet light is 50%, so that the first group of branch light beams passing through the reflector 12 and the second group of branch light beams reflected into the pipeline branch structure 12 have the same size and intensity distribution.

[0041] In one example, the reflector 13 is a reflector made of amorphous material. It can be understood that the ultraviolet light or deep ultraviolet light used in the lithography equipment is a highly coherent laser beam. This highly coherent laser beam is prone to birefringence when passing through a crystalline optical device. This birefringence effect will affect the imaging quality of the light spot on the light receiving component 4 and the calibration accuracy of the beam steering device. Based on this, the reflector 13 in the embodiment of the present application uses an amorphous material reflector to avoid the birefringence effect.

[0042] In some embodiments, referring to FIG3 , the frame member 1 further includes a temperature stabilizing plate 14 and a valve seat 15 . The temperature stabilizing plate 14 is arranged adjacent to the light receiving component 4 . The valve seat 15 is connected to the light outlet of the light beam steering device 2 and is detachably connected to the third port C.

[0043] It is understood that, to minimize the impact of ambient temperature on the calibration process, a temperature stabilization plate 14 is provided on one side of the light receiving element 4 to balance the temperature field in the area adjacent to the light receiving element 4, maintaining a stable temperature field and preventing temperature fluctuations on the light receiving element 4 from causing deviations in the light spot imaging. Furthermore, a valve seat 15 is detachably connected to the third port C of the pipeline main structure 11. This valve seat 15 is also detachably connected to the light outlet of the beam steering device 2. This allows for flexible installation and removal of the pipeline main structure 11 and the beam steering device 2, tailored to the requirements of the lithographic apparatus at different stages of the calibration and adjustment process.

[0044] In some embodiments, please refer to Figure 3, the optical element 3 also includes a first filter element 33 stacked with the scintillator 31, and the two-dimensional extension surface corresponding to the first filter element 33 is orthogonal to the axial direction of the pipeline branch structure 12. The first filter element 33 is clamped between the scintillator 31 and the focusing element 32. The scintillator 31 and the focusing element 32 are stacked on each other along the propagation direction of the light beam and a gap is set. The optical element 3 also includes a second filter element 34, and the second filter element 34 is located downstream of the focusing element 32 along the corresponding light beam propagation direction.

[0045] It is understood that the provision of the first filter 33 and the second filter 34 allows for adjustment of the light beam intensity, thereby preventing overexposure of the light receiving element 4. Furthermore, the two-dimensional extension surface corresponding to the first filter 33 is arranged orthogonally to the axial direction of the pipeline branch structure 12, and the scintillator 31, focusing element 32, and second filter 34 are all stacked with the first filter 33. This prevents significant refraction of the light beam during its contact with the scintillator 31, focusing element 32, first filter 33, and second filter 34.

[0046] In one example, the first filter 33 is a neutral density filter or a transparent plate with a neutral density filter coating on at least one side, and the second filter 34 is a bandpass filter to absorb part of the light beam in a specific wavelength band that is not eliminated by the scintillator 31.

[0047] In some optional embodiments, any two or more of the scintillator 31 , the first filter 33 , the focusing element 32 and the second filter 34 may be stacked on top of each other along the propagation direction of the light beam and abut against each other or be arranged with gaps therebetween.

[0048] It can be understood that no matter whether the scintillator 31, the first filter 33, the focusing element 32 and the second filter 34 are in contact with each other or set with a gap, the branch light beams passing through the pipeline branch structure 12 can pass through the scintillator 31, the first filter 33, the focusing element 32 and the second filter 34 in sequence and realize fluorescence filtering, focusing and light filtering of specific bands of the branch light beams.

[0049] In some embodiments, the focusing element 32 includes two or more focusing lenses of different specifications, and each focusing lens can be rotated and arranged on one side of the scintillator 31 to adjust the imaging size of the branch light beam on the light receiving component 4.

[0050] It can be understood that focusing lenses of different specifications have different focusing ratios on the light beam. During the calibration and adjustment of the light beam steering device 2, focusing lenses of different specifications can be set between the first filter 33 and the second filter 34 as needed to adjust the imaging spot size of the branch light beam on the light receiving component 4.

[0051] In one example, the focusing lens in the focusing element 32 may be a super lens, and the light beam may exhibit an obvious focusing phenomenon when passing through the super lens.

[0052] In one example, the light receiving component 4 can preferably be a CCD detector, which can send the monitored image information to a processor electrically connected to the light receiving component 4, and the processor can receive the image information monitored by the light receiving component 4 and determine the imaging position of the light spot contour in the graphic information in a predefined coordinate system.

[0053] It can be understood that in addition to measuring the spot size, the CCD detector can also measure the beam intensity distribution data; the processor has a built-in calibration analysis algorithm. During the operation of the processor, the processor can calculate the relationship between the motor step and the spot position through the calibration analysis algorithm, and determine the movement position that needs to be adjusted for each motor step based on the current data of the four motor axes input; the processor can also compare the acquired beam intensity distribution data with the theoretical data to determine the fit between the beam intensity distribution data and the theoretical data. In the process of adjusting the motor step, the fit can indicate whether the movement position of each motor step has been adjusted.

[0054] Based on the aforementioned beam calibration and adjustment component, an embodiment of the present application also provides a beam calibration and adjustment device. Please refer to Figures 1 and 3. The beam calibration and adjustment device includes a beam steering device 2 and any of the aforementioned beam calibration and adjustment components. Specifically, the pipe 1' and two sets of OEM adjustment tools 2' in Figure 1 are replaced with the beam calibration adjustment component shown in Figure 3 to obtain the beam calibration and adjustment device provided in an embodiment of the present application.

[0055] In some embodiments, please refer to Figure 1 and Figure 3 together. The light beam steering device 2 has a light outlet that can be connected to the pipeline main structure 11, and the light beam steering device 2 includes a first motor group and a second motor group; wherein, the first motor group is connected to a reflector 22 through a first motor shaft group 21 to adjust the incident position of the initial light beam in the calibration adjustment component, and the second motor group is connected to another reflector 22 through a second motor shaft group 23 to adjust the incident angle of the initial light beam in the calibration adjustment component.

[0056] It can be understood that after obtaining the image information monitored by two groups of CCD detectors and determining the motor step sizes that need to be adjusted for the two motor shafts in the first motor shaft group 21 and the motor step sizes that need to be adjusted for the two motor shafts in the second motor shaft group 23 through processor analysis, the beam steering device 2 can be accurately calibrated.

[0057] Specifically, please refer to Figures 3 and 4 together. The spot position of the CCD detector at the second port B is only affected by the incident position of the initial light beam, and the incident position is controlled by the first motor shaft group 21, while the spot position of the CCD detector at the first port A is affected by the comprehensive influence of the incident position and incident angle of the initial light beam, and the incident angle is controlled by the second motor shaft group 23. Based on this, during the calibration process of the beam steering device 2, the motor step size corresponding to the first motor shaft group 21 can be adjusted separately based on the analysis results determined by the processor. After determining that the spot position of the CCD detector at the second port B is in the ideal position, the motor step size corresponding to the second motor shaft group 23 is adjusted separately until the spot position of the CCD detector at the first port A is in the ideal position.

[0058] In one example, please refer to FIG5 , which shows an exemplary CCD detector imaging schematic diagram and a schematic diagram of the analysis results of the processor. The shaped light spots monitored by the two groups of CCD detectors in FIG5 are not at the center position of the preset coordinate system, so the beam steering device 2 needs to be calibrated. The processor can determine the step size that needs to be adjusted for each motor axis through the built-in calibration analysis algorithm. As shown in FIG5 , the motor axis a and the motor axis b correspond to the first motor axis group 21, and the motor axis c and the motor axis d correspond to the second motor axis group 23. The step size that needs to be adjusted for motor axis a is 1100 bits, the step size that needs to be adjusted for motor axis b is 660 bits, the step size that needs to be adjusted for motor axis c is 500 bits, and the step size that needs to be adjusted for motor axis d is 480 bits. The processor can also evaluate the imaging quality and the fit between the current imaging light spot position and the ideal position through the calibration analysis algorithm.

[0059] Based on the aforementioned beam calibration and adjustment device, an embodiment of the present application provides a lithography device, as shown in Figure 6, the lithography device includes a variable attenuator 5, a light homogenizer 6, a blade imaging device 7, a lens 8 and the aforementioned beam calibration and adjustment device, wherein the variable attenuator 5 is arranged at a downstream position of the optical path of the calibration and adjustment device to adjust the light energy transmittance and exposure energy, the light homogenizer 6 includes an integral pump 61 and a quartz rod 62 arranged at a downstream position of the variable attenuator 5 to uniformly process the light spot, the blade imaging device 7 has a boundary control module to cover at least part of the light spot, and the lens 8 is connected to the blade imaging device 7 and is located between the chip 9 and the blade imaging device 7.

[0060] In summary, the beam calibration adjustment component, device and lithography equipment provided in the embodiments of the present application are arranged in a T-shape and are located downstream of the optical path of the beam steering device 2. A reflector 13 is provided at the intersection of the pipeline main structure 11 and the pipeline branch structure 12 of the frame member 1. The reflector 13 can divide the initial light beam emitted by the beam steering device 2 into two groups. The two groups of light beams can be imaged on two groups of light receiving components 4 respectively after filtering and focusing by the optical element 3. The two groups of light receiving components 4 can send the acquired image information to the processor. The processor can determine the motor step size that needs to be adjusted through the built-in algorithm; since the imaging position at the second port B is only affected by the incident position of the initial light beam, the imaging position at the first port A is affected by the combined influence of the incident position and incident angle of the initial light beam, during the adjustment process, the motor step size corresponding to the first motor shaft group 21 and the motor step size corresponding to the second motor shaft group 23 can be adjusted successively based on the analysis results of the processor, thereby successively realizing the adjustment and determination of the imaging position at the second port B and the imaging position at the first port A. Based on this, the entire calibration and adjustment process of the beam steering device 2 can be implemented quickly and accurately.

[0061] References to "embodiments" in this application mean that a particular feature, structure, or characteristic described in connection with the embodiment may be included in at least one embodiment of the application. The appearance of this phrase in various places in the specification does not necessarily refer to the same embodiment, nor does it constitute an independent or alternative embodiment that is mutually exclusive of other embodiments.

[0062] In the description of this application, it should be noted that, unless otherwise expressly specified or limited, the terms "mounted," "connected," "connected," and "attached" should be understood in a broad sense. For example, they may refer to fixed connections, detachable connections, or integral connections; they may refer to direct connections, indirect connections through an intermediate medium, or internal connections between two components. Those skilled in the art will understand the specific meanings of the above terms in this application based on specific circumstances.

[0063] In the embodiments of this application, the same reference numerals represent the same components, and for the sake of brevity, detailed descriptions of the same components in different embodiments are omitted. It should be understood that the thickness, length, width, and other dimensions of the various components in the embodiments of this application, as well as the overall thickness, length, width, and other dimensions of the integrated device shown in the drawings are merely illustrative and should not constitute any limitation on this application.

[0064] The term "plurality" used in this application refers to more than two, including two.

[0065] Although the present application has been described with reference to preferred embodiments, various modifications may be made thereto and components may be replaced with equivalents without departing from the scope of the present application. In particular, the various technical features described in the various embodiments may be combined in any manner as long as there are no structural conflicts. The present application is not limited to the specific embodiments disclosed herein, but includes all technical solutions within the scope of the claims.

Claims

1. A beam calibration and adjustment assembly, comprising: A frame member (1) comprises a pipeline main structure (11) and a pipeline branch structure (12) that are intersecting, connected, and interconnected. The pipeline main structure (11) is connected to a light outlet of a light beam steering device (2). A first port (A) of the frame member (1) is located on the pipeline main structure (11), and a second port (B) is located on an end of the pipeline branch structure (12) that is away from the pipeline main structure (11). A reflector (13) is provided inside the pipeline main structure (11), and an axis of the pipeline main structure (11) and an axis of the pipeline branch structure (12) intersect at a center point of the reflector (13). An optical element (3) is arranged at the first port (A) and the second port (B), and comprises a scintillator (31) and a focusing element (32) arranged in sequence along a light beam propagation direction; a light receiving component (4), arranged on a side of the optical element (3) facing away from the reflector (13), and capable of matching with the focusing component (32) to form an image; and The analyzing component comprises a processor electrically connected to the light receiving component (4), wherein the processor is adapted to receive image information monitored by the light receiving component (4) and determine an imaging position of the image information in a predefined coordinate system.

2. The beam calibration adjustment assembly of claim 1, wherein: The pipeline main body structure (11) also has a third port (C) opposite to the first port (A), and is connected to the light outlet of the light beam steering device (2) through the third port (C), and the two-dimensional extension surface corresponding to the first port (A) is orthogonal to the light outlet direction of the light beam steering device (2).

3. The beam calibration adjustment assembly of claim 1, wherein: The initial light beam emitted by the light beam steering device (2) is at least one of ultraviolet light and deep ultraviolet light, the reflector (13) is an amorphous material reflector and is arranged at an angle of 45 degrees to the light output direction of the light beam steering device (2), and the reflector (12) has a transmittance of 50% for the ultraviolet light and the deep ultraviolet light so as to evenly divide the initial light beam into two groups of branch light beams.

4. The beam calibration adjustment assembly of claim 2, wherein: The frame member (1) further comprises a temperature stabilizing plate (14) and a valve seat (15), wherein the temperature stabilizing plate (14) is arranged adjacent to the light receiving component (4), and the valve seat (15) is communicated with the light outlet of the light beam steering device (2) and is detachably connected to the third port (C).

5. The beam calibration adjustment assembly of claim 1, wherein: The optical element (3) further includes a first filter element (33) stacked with the scintillator (31), wherein a two-dimensional extension surface corresponding to the first filter element (33) is orthogonal to the axial direction of the pipeline branch structure (12), and the first filter element (33) is sandwiched between the scintillator (31) and the focusing element (32) to adjust the light beam intensity to avoid overexposure of the light receiving component (4).

6. The beam calibration adjustment assembly of claim 5, wherein: The scintillator (31) and the focusing element (32) are stacked on each other along the propagation direction of the light beam and are arranged with a gap. The optical element (3) also includes a second filter element (34), which is located downstream of the focusing element (32) along the corresponding light beam propagation direction.

7. The beam calibration adjustment assembly of claim 6, wherein: The first filter (33) is a neutral density filter or a light-transmitting plate with a neutral density filter coating on at least one side, and the second filter (34) is a bandpass filter for absorbing a portion of the light beam in a specific wavelength band that is not eliminated by the scintillator (31).

8. The beam calibration adjustment assembly of claim 3, wherein: The focusing member (32) includes two or more focusing lenses of different specifications, each of which can be rotatably arranged on one side of the scintillator (31) to adjust the imaging size of the branched light beam on the light receiving component (4), and the light receiving component (4) is a CCD detector.

9. A light beam calibration and adjustment device, comprising: A beam calibration and adjustment component, which is the beam calibration and adjustment component according to any one of claims 1 to 8; A light beam steering device (2) having a light outlet communicated with the pipeline main structure (11), the light beam steering device (2) comprising a first motor group and a second motor group; The first motor group is connected to a reflector (22) via a first motor shaft group (21) to adjust the incident position of the initial light beam in the calibration adjustment component, and the second motor group is connected to another reflector (22) via a second motor shaft group (23) to adjust the incident angle of the initial light beam in the calibration adjustment component.

10. A lithographic apparatus comprising: A light beam calibration and adjustment device, which is the light beam calibration and adjustment device according to claim 9; a variable attenuator (5) disposed at a position downstream of the optical path of the calibration adjustment device to adjust light energy transmittance and exposure energy; A light homogenizer (6) comprising an integral pump (61) and a quartz rod (62) disposed downstream of the variable attenuator (5) to uniformly process the light spot; A leaf imaging device (7) having a boundary control module for covering at least part of the light spot; and A lens (8) is connected to the blade imaging device (7) and is located between the chip (9) and the blade imaging device (7).

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