Control method for VHP vaporization apparatus and sterilization device

Abstract

Provided in the present application are a control method for a VHP vaporization apparatus and a sterilization device. The control method comprises: detecting the concentration of gaseous hydrogen peroxide and the concentration of gaseous water at an air outlet of the VHP vaporization apparatus, so as to obtain a measured value of the concentration of gaseous hydrogen peroxide output by the VHP vaporization apparatus and a measured value of the concentration of gaseous water output by the VHP vaporization apparatus; according to the concentration of a hydrogen peroxide liquid added to the VHP vaporization apparatus, calculating and obtaining a theoretical value of the concentration of gaseous hydrogen peroxide and a theoretical value of the concentration of gaseous water that should be output by the VHP vaporization apparatus; according to the measured value and the theoretical value of the concentration of gaseous hydrogen peroxide, and the measured value and the theoretical value of the concentration of gaseous water, calculating and obtaining a decomposition rate of hydrogen peroxide, and / or a vaporization efficiency of hydrogen peroxide, and / or a recovery rate of hydrogen peroxide; and according to the calculated decomposition rate of hydrogen peroxide, and / or vaporization efficiency of hydrogen peroxide, and / or recovery rate of hydrogen peroxide, evaluating the VHP vaporization apparatus.

Description

Control method of VHP vaporization device and sterilization equipment TECHNICAL FIELD

[0001] The present application relates to the technical field of VHP vaporization, in particular to a control method of VHP vaporization device and sterilization equipment. BACKGROUND

[0002] In the sterilization equipment with the VHP vaporization device, if there is a place in the sterilization chamber below the dew point temperature, the sterilization effect will be affected; if the relative saturation degree in the sterilization chamber is unstable, the sterilization effect will also be affected.

[0003] However, the existing sterilization equipment is difficult to obtain a relatively stable relative saturation degree output, and it is also difficult to control the actual temperature in the sterilization chamber. SUMMARY

[0004] The main purpose of the present application is to provide a control method of VHP vaporization device and sterilization equipment, so as to obtain a relatively stable relative saturation degree output; and according to the obtained dew point temperature in the sterilization chamber, the actual temperature in the sterilization chamber is controlled.

[0005] In order to achieve the above-mentioned purpose, according to one aspect of the present application, a control method of VHP vaporization device is provided, the gas outlet of the VHP vaporization device is used to communicate with the sterilization chamber, so as to deliver sterilization gas to the sterilization chamber, the sterilization gas includes gaseous hydrogen peroxide and gaseous water; the control method comprises: detecting the concentration of gaseous hydrogen peroxide and the concentration of gaseous water at the gas outlet of the VHP vaporization device, so as to obtain the measured value of the gaseous hydrogen peroxide concentration output by the VHP vaporization device and the measured value of the gaseous water concentration output by the VHP vaporization device; according to the concentration of hydrogen peroxide liquid added to the VHP vaporization device, the theoretical value of the gaseous hydrogen peroxide concentration and the theoretical value of the gaseous water concentration that the VHP vaporization device should output are calculated; according to the measured value and the theoretical value of the gaseous hydrogen peroxide concentration, and the measured value and the theoretical value of the gaseous water concentration, the decomposition rate of hydrogen peroxide, and / or the vaporization efficiency of hydrogen peroxide, and / or the recovery rate of hydrogen peroxide are calculated; according to the calculated decomposition rate of hydrogen peroxide, and / or the vaporization efficiency of hydrogen peroxide, and / or the recovery rate of hydrogen peroxide, the VHP vaporization device is evaluated.

[0006] Further, the decomposition rate of hydrogen peroxide = (the measured value of the gaseous water concentration - the theoretical value of the gaseous water concentration) / the theoretical value of the gaseous hydrogen peroxide concentration.

[0007] Further, the vaporization efficiency of hydrogen peroxide = (the measured value of the gaseous hydrogen peroxide concentration + the decomposition value of hydrogen peroxide) / the theoretical value of the gaseous hydrogen peroxide concentration.

[0008] Further, the recovery rate of hydrogen peroxide = the measured value of the concentration of gaseous hydrogen peroxide / the theoretical value of the concentration of gaseous hydrogen peroxide.

[0009] Further, the control method further comprises: adding the hydrogen peroxide liquid to the VHP vaporization device at a plurality of different dosing speeds respectively, to obtain the decomposition rate of hydrogen peroxide, the vaporization efficiency of hydrogen peroxide and the recovery rate of hydrogen peroxide corresponding to each dosing speed, thereby evaluating the VHP vaporization device.

[0010] Further, the outlet of the VHP vaporization device and the sterilization chamber are communicated through a connecting pipeline; the first end of the connecting pipeline is used to connect with the outlet of the VHP vaporization device; the first detection position is arranged on the connecting pipeline; the first detection position is arranged close to the first end of the connecting pipeline; the control method further comprises: detecting the concentration of gaseous hydrogen peroxide and the concentration of gaseous water in the pipeline cavity at the first detection position of the connecting pipeline, to obtain the concentration of gaseous hydrogen peroxide and the concentration of gaseous water at the outlet of the VHP vaporization device. Alternatively, the VHP vaporization device has an outlet passage, and the outer port of the outlet passage is the outlet of the VHP vaporization device; the second detection position close to the outer port of the outlet passage is arranged in the outlet passage; the control method further comprises: detecting the concentration of gaseous hydrogen peroxide and the concentration of gaseous water at the second detection position in the outlet passage, to obtain the concentration of gaseous hydrogen peroxide and the concentration of gaseous water at the outlet of the VHP vaporization device.

[0011] Further, the control method further comprises: detecting the concentration of gaseous hydrogen peroxide and the concentration of gaseous water in the sterilization chamber, to obtain the relative saturation and / or the dew point temperature in the sterilization chamber; and adjusting at least one of the plurality of setting parameters of the VHP vaporization device according to the obtained relative saturation and / or the dew point temperature in the sterilization chamber; wherein the plurality of setting parameters of the VHP vaporization device include the dosing speed of adding the hydrogen peroxide liquid to the VHP vaporization device, the concentration of hydrogen peroxide in the hydrogen peroxide liquid added to the VHP vaporization device, the temperature and humidity of the carrier gas blowing out the sterilization gas formed by the VHP vaporization device from the VHP vaporization device, and the flow rate of the carrier gas.

[0012] Further, the dosing speed of adding the hydrogen peroxide liquid to the VHP vaporization device is positively correlated with the relative saturation in the sterilization chamber.

[0013] Further, the concentration of hydrogen peroxide in the hydrogen peroxide liquid added to the VHP vaporization device is positively correlated with the relative saturation in the sterilization chamber.

[0014] Further, the temperature and humidity of the carrier gas are positively correlated with the relative saturation in the sterilization chamber.

[0015] Further, the flow rate of the carrier gas is negatively correlated with the relative saturation in the sterilization chamber.

[0016] Further, the feeding rate of the hydrogen peroxide liquid to the VHP vaporization device is positively correlated with the dew point temperature in the sterilization chamber.

[0017] Further, the concentration of hydrogen peroxide in the hydrogen peroxide liquid fed to the VHP vaporization device is positively correlated with the dew point temperature in the sterilization chamber.

[0018] Further, the temperature and humidity of the carrier gas are positively correlated with the dew point temperature in the sterilization chamber.

[0019] Further, the flow rate of the carrier gas is negatively correlated with the dew point temperature in the sterilization chamber.

[0020] Further, the outlet of the VHP vaporization device is connected to the sterilization chamber through a connecting pipeline; the control method further comprises: adjusting the chamber temperature of the sterilization chamber and / or the lumen temperature of the connecting pipeline according to the obtained relative saturation of hydrogen peroxide and / or the dew point temperature in the sterilization chamber.

[0021] Further, the chamber temperature of the sterilization chamber is negatively correlated with the relative saturation in the sterilization chamber.

[0022] Further, the lumen temperature of the connecting pipeline is negatively correlated with the relative saturation in the sterilization chamber.

[0023] Further, the chamber temperature at each location in the sterilization chamber is higher than the dew point temperature in the sterilization chamber.

[0024] Further, the lumen temperature at each location of the connecting pipeline is higher than the dew point temperature in the sterilization chamber.

[0025] According to another aspect of the present application, a sterilization device is provided, which comprises a VHP vaporization device and a sterilization chamber, and the outlet of the VHP vaporization device is connected to the sterilization chamber; the sterilization device is suitable for the above-mentioned control method.

[0026] Further, the sterilization device further comprises a first gas concentration analyzer, at least part of the first gas concentration analyzer is arranged in the lumen at a first detection position of the connecting pipeline to detect the concentration of gaseous hydrogen peroxide and the concentration of gaseous water in the lumen at the first detection position; or, at least part of the first gas concentration analyzer is arranged at a second detection position in the outlet passage of the VHP vaporization device to detect the concentration of gaseous hydrogen peroxide and the concentration of gaseous water in the lumen at the second detection position.

[0027] Further, the sterilization device further comprises a second gas concentration analyzer, at least part of the second gas concentration analyzer is arranged in the sterilization chamber to detect the concentration of gaseous hydrogen peroxide and the concentration of gaseous water in the sterilization chamber.

[0028] According to a third aspect of the present application, a control method of a VHP vaporization device is provided, an outlet of the VHP vaporization device is configured to communicate with a sterilization chamber to deliver sterilization gas into the sterilization chamber, the sterilization gas comprising gaseous hydrogen peroxide and gaseous water; the control method comprises: detecting a concentration of the gaseous hydrogen peroxide and a concentration of the gaseous water in the sterilization chamber to obtain a relative saturation degree and / or a dew point temperature in the sterilization chamber; adjusting at least one of a plurality of setting parameters of the VHP vaporization device according to the obtained relative saturation degree and / or the dew point temperature in the sterilization chamber; wherein the plurality of setting parameters of the VHP vaporization device comprises a dosing speed of hydrogen peroxide liquid added to the VHP vaporization device, a concentration of hydrogen peroxide in the hydrogen peroxide liquid added to the VHP vaporization device, a temperature and humidity of a carrier gas blowing out the sterilization gas formed by the VHP vaporization device from the VHP vaporization device, and a flow rate of the carrier gas.

[0029] According to the above technical solution, the outlet of the VHP vaporization device is configured to communicate with the sterilization chamber to deliver the sterilization gas into the sterilization chamber, the sterilization gas comprising gaseous hydrogen peroxide and gaseous water. The control method comprises: detecting the concentration of the gaseous hydrogen peroxide and the concentration of the gaseous water in the sterilization chamber to obtain the relative saturation degree and / or the dew point temperature in the sterilization chamber. At least one of the plurality of setting parameters of the VHP vaporization device is adjusted according to the obtained relative saturation degree and / or the dew point temperature in the sterilization chamber to obtain a relatively stable relative saturation degree output. In addition, the actual temperature in the sterilization chamber is controlled according to the calculated dew point temperature in the sterilization chamber to avoid the temperature in the sterilization chamber being lower than the dew point temperature thereof. The plurality of setting parameters of the VHP vaporization device comprises the dosing speed of the hydrogen peroxide liquid added to the VHP vaporization device, the concentration of the hydrogen peroxide in the hydrogen peroxide liquid added to the VHP vaporization device, the temperature and humidity of the carrier gas blowing out the sterilization gas formed by the VHP vaporization device from the VHP vaporization device, and the flow rate of the carrier gas.

[0030] Further, the dosing speed of the hydrogen peroxide liquid added to the VHP vaporization device is positively correlated with the relative saturation degree in the sterilization chamber.

[0031] Further, the concentration of the hydrogen peroxide in the hydrogen peroxide liquid added to the VHP vaporization device is positively correlated with the relative saturation degree in the sterilization chamber.

[0032] Further, the temperature and humidity of the carrier gas are positively correlated with the relative saturation degree in the sterilization chamber.

[0033] Further, the flow rate of the carrier gas is negatively correlated with the relative saturation degree in the sterilization chamber.

[0034] Further, the dosing speed of the hydrogen peroxide liquid added to the VHP vaporization device is positively correlated with the dew point temperature in the sterilization chamber.

[0035] Further, the concentration of hydrogen peroxide in the liquid hydrogen peroxide added to the VHP vaporization device is positively correlated with the dew point temperature in the sterilization chamber.

[0036] Further, the temperature and humidity of the carrier gas are positively correlated with the dew point temperature in the sterilization chamber.

[0037] Further, the flow rate of the carrier gas is negatively correlated with the dew point temperature in the sterilization chamber.

[0038] Further, the outlet of the VHP vaporization device is connected to the sterilization chamber through a connecting pipeline; the control method further comprises adjusting the chamber temperature of the sterilization chamber and / or the lumen temperature of the connecting pipeline according to the obtained relative saturation and / or dew point temperature of hydrogen peroxide in the sterilization chamber.

[0039] Further, the chamber temperature of the sterilization chamber is negatively correlated with the relative saturation in the sterilization chamber.

[0040] Further, the lumen temperature of the connecting pipeline is negatively correlated with the relative saturation in the sterilization chamber.

[0041] Further, the chamber temperature of the sterilization chamber is higher than the dew point temperature in the sterilization chamber.

[0042] Further, the lumen temperature of the connecting pipeline is higher than the dew point temperature in the sterilization chamber.

[0043] According to a fourth aspect of the present application, a sterilization device is provided, which comprises a VHP vaporization device, a sterilization chamber and a second gas concentration analyzer, the outlet of the VHP vaporization device is connected to the sterilization chamber; at least part of the second gas concentration analyzer is arranged in the sterilization chamber to detect the concentration of gaseous hydrogen peroxide and the concentration of gaseous water in the sterilization chamber; the sterilization device is suitable for the above-mentioned control method. BRIEF DESCRIPTION OF DRAWINGS

[0044] The drawings accompanying the specification of the present application form a part thereof, serve to provide further understanding of the present application, and together with the description of the present application, serve to explain the present application, and do not constitute improper limitations to the present application. In the drawings:

[0045] Fig. 1 shows a structural schematic diagram of an embodiment of a sterilization device according to the present application;

[0046] Fig. 2 shows the variation trend of sterilization time with gaseous hydrogen peroxide concentration;

[0047] Fig. 3 shows the variation trend of relative saturation and gaseous hydrogen peroxide concentration with test time;

[0048] Fig. 4 shows the variation trend of relative saturation and gaseous hydrogen peroxide concentration with test time.

[0049] wherein the above drawing comprises the following reference signs: 10, VHP vaporization device; 20, sterilization chamber; 30, connecting pipeline; 40, first gas concentration analyzer; 50, second gas concentration analyzer. DETAILED DESCRIPTION

[0050] It should be noted that the embodiments and features in the embodiments in the present application can be combined with each other without conflict. The present application will be described in detail below with reference to the drawings and in combination with the embodiments.

[0051] It should be noted that the following detailed description is exemplary and is intended to provide further explanation of the present application. Unless otherwise specified, all technical and scientific terms used herein have the same meaning as commonly understood by one of ordinary skill in the art to which the present application belongs.

[0052] It should be noted that the terms used herein are only for the purpose of describing specific embodiments and are not intended to limit the exemplary embodiments according to the present application. As used herein, the singular form is intended to include the plural form unless the context clearly indicates otherwise, and it should also be understood that when the terms "comprise" and / or "include" are used in the specification, there is a presence of the features, steps, operations, devices, components and / or combinations thereof.

[0053] The present application provides a control method of a VHP vaporization device. Referring to FIG. 1, the gas outlet of the VHP vaporization device 10 is used to communicate with the sterilization chamber 20 to deliver sterilization gas into the sterilization chamber 20, and the sterilization gas comprises gaseous hydrogen peroxide and gaseous water.

[0054] The control method comprises: detecting the concentration of gaseous hydrogen peroxide and the concentration of gaseous water in the sterilization chamber 20 to obtain the relative saturation degree and / or the dew point temperature in the sterilization chamber 20. According to the obtained relative saturation degree and / or the dew point temperature in the sterilization chamber 20, at least one of the multiple setting parameters of the VHP vaporization device 10 is adjusted to obtain a relatively stable relative saturation degree output; in addition, according to the calculated dew point temperature in the sterilization chamber 20, the actual temperature in the sterilization chamber 20 is controlled to avoid the temperature in the sterilization chamber 20 being lower than the dew point temperature thereof; wherein the multiple setting parameters of the VHP vaporization device 10 include the dosing speed of adding hydrogen peroxide liquid to the VHP vaporization device 10, the concentration of hydrogen peroxide in the hydrogen peroxide liquid added to the VHP vaporization device 10, the temperature and humidity of the carrier gas blowing out the sterilization gas formed by the VHP vaporization device 10, and the flow rate of the carrier gas.

[0055] It should be noted that, since the sterilization gas includes gaseous hydrogen peroxide and gaseous water, and hydrogen peroxide and water have similar molecular structures, both of them can affect the condensation point of the air in the sterilization chamber 20, and the relative saturation in the sterilization chamber 20 represents the content of gaseous hydrogen peroxide and gaseous water in the air in the sterilization chamber 20. The dew point temperature in the sterilization chamber 20 refers to the temperature at which gaseous hydrogen peroxide and gaseous water are saturated and condensed.

[0056] Specifically, the addition rate of hydrogen peroxide liquid to the VHP vaporization device 10 is positively correlated with the relative saturation in the sterilization chamber 20; the concentration of hydrogen peroxide in the hydrogen peroxide liquid added to the VHP vaporization device 10 is positively correlated with the relative saturation in the sterilization chamber 20; the temperature and humidity of the carrier gas are positively correlated with the relative saturation in the sterilization chamber 20; and the flow rate of the carrier gas is negatively correlated with the relative saturation in the sterilization chamber 20.

[0057] Specifically, the addition rate of hydrogen peroxide liquid to the VHP vaporization device 10 is positively correlated with the dew point temperature in the sterilization chamber 20; the concentration of hydrogen peroxide in the hydrogen peroxide liquid added to the VHP vaporization device 10 is positively correlated with the dew point temperature in the sterilization chamber 20; the temperature and humidity of the carrier gas are positively correlated with the dew point temperature in the sterilization chamber 20; and the flow rate of the carrier gas is negatively correlated with the dew point temperature in the sterilization chamber 20.

[0058] Specifically, the dew point temperature in the sterilization chamber 20 is positively correlated with the concentration of gaseous hydrogen peroxide and the concentration of gaseous water in the sterilization chamber 20.

[0059] In the present application, the outlet of the VHP vaporization device 10 and the sterilization chamber 20 are communicated through the connecting pipeline 30; the control method further comprises: adjusting the chamber temperature of the sterilization chamber 20 and / or the lumen temperature of the connecting pipeline 30 according to the obtained relative saturation and / or dew point temperature of hydrogen peroxide in the sterilization chamber 20, so as to avoid the chamber temperature of the sterilization chamber 20 and the lumen temperature of the connecting pipeline 30 being lower than the dew point temperature. If the lumen temperature of the connecting pipeline 30 and the chamber temperature of the sterilization chamber 20 are lower than the dew point temperature, gaseous hydrogen peroxide and gaseous water will be condensed, so it is necessary to ensure that the lumen temperature of the connecting pipeline 30 and the chamber temperature of the sterilization chamber 20 are all higher than the dew point temperature in the sterilization chamber 20, so as to avoid condensation in the system.

[0060] Specifically, the chamber temperature of the sterilization chamber 20 is negatively correlated with the relative saturation in the sterilization chamber 20. The lumen temperature of the connecting pipeline 30 is negatively correlated with the relative saturation in the sterilization chamber 20.

[0061] Specifically, the connecting pipeline 30 is insulated or heated to ensure that the temperature of the lumen of the connecting pipeline 30 is higher than the dew point temperature in the sterilization chamber 20, so as to avoid the condensation of gaseous hydrogen peroxide and gaseous water in the lumen of the connecting pipeline 30, thereby affecting the concentration of gaseous hydrogen peroxide.

[0062] Optionally, when the gas outlet of the VHP vaporization device 10 is communicated with a plurality of sterilization chambers 20 to deliver sterilization gas into the plurality of sterilization chambers 20, the concentration of gaseous hydrogen peroxide and the concentration of gaseous water in at least one of the sterilization chambers 20 are detected to adjust at least one of the plurality of setting parameters of the VHP vaporization device 10.

[0063] Further, when the gas outlet of the VHP vaporization device 10 is communicated with a plurality of sterilization chambers 20, a plurality of connecting pipelines 30 are provided, and the plurality of connecting pipelines 30 are arranged in one-to-one correspondence with the plurality of sterilization chambers 20, and the gas outlet of the VHP vaporization device 10 and each sterilization chamber 20 are communicated through the corresponding connecting pipeline 30.

[0064] In the present application, the control method further comprises: detecting the concentration of gaseous hydrogen peroxide and the concentration of gaseous water at the gas outlet of the VHP vaporization device 10 to obtain the measured value of the concentration of gaseous hydrogen peroxide output by the VHP vaporization device 10 and the measured value of the concentration of gaseous water output by the VHP vaporization device 10; calculating the theoretical value of the concentration of gaseous hydrogen peroxide and the theoretical value of the concentration of gaseous water that should be output by the VHP vaporization device 10 according to the concentration of hydrogen peroxide liquid added to the VHP vaporization device 10; calculating the decomposition rate of hydrogen peroxide, and / or the vaporization efficiency of hydrogen peroxide, and / or the recovery rate of hydrogen peroxide according to the measured value and the theoretical value of the concentration of gaseous hydrogen peroxide, and the measured value and the theoretical value of the concentration of gaseous water; and evaluating the VHP vaporization device 10 according to the calculated decomposition rate of hydrogen peroxide, and / or the vaporization efficiency of hydrogen peroxide, and / or the recovery rate of hydrogen peroxide.

[0065] Specifically, the decomposition rate of hydrogen peroxide = ((measured value of the concentration of gaseous water - theoretical value of the concentration of gaseous water) / theoretical value of the concentration of gaseous hydrogen peroxide) * 100%.

[0066] Specifically, the vaporization efficiency of hydrogen peroxide = ((measured value of the concentration of gaseous hydrogen peroxide + decomposition value of hydrogen peroxide) / theoretical value of the concentration of gaseous hydrogen peroxide) * 100%.

[0067] Specifically, the recovery rate of hydrogen peroxide = (measured value of the concentration of gaseous hydrogen peroxide / theoretical value of the concentration of gaseous hydrogen peroxide) * 100%.

[0068] Specifically, the smaller the decomposition rate of hydrogen peroxide, the higher the vaporization efficiency of hydrogen peroxide and the higher the recovery rate of hydrogen peroxide, and the better the performance of the VHP vaporization device 10.

[0069] In the present application, the control method further comprises: adding hydrogen peroxide liquid to the VHP vaporization device 10 at a plurality of different dosing speeds respectively, so as to obtain the decomposition rate of hydrogen peroxide, the vaporization efficiency of hydrogen peroxide and the recovery rate of hydrogen peroxide corresponding to each dosing speed, thereby evaluating the VHP vaporization device 10. Among them, the dosing speed is the only variable, and the rest of the parameters remain unchanged.

[0070] In the present application, the first way of detecting the concentration of gaseous hydrogen peroxide and the concentration of gaseous water at the gas outlet of the VHP vaporization device 10 is: the first end of the connecting pipeline 30 is used to connect with the gas outlet of the VHP vaporization device 10; the first detection position is arranged on the connecting pipeline 30; the first detection position is arranged close to the first end of the connecting pipeline 30; the control method further comprises: detecting the concentration of gaseous hydrogen peroxide and the concentration of gaseous water in the lumen at the first detection position of the connecting pipeline 30, so as to obtain the concentration of gaseous hydrogen peroxide and the concentration of gaseous water at the gas outlet of the VHP vaporization device 10.

[0071] In the present application, the second way of detecting the concentration of gaseous hydrogen peroxide and the concentration of gaseous water at the gas outlet of the VHP vaporization device 10 is: the VHP vaporization device 10 has a gas outlet channel, and the outer port of the gas outlet channel is the gas outlet of the VHP vaporization device 10; the second detection position close to the outer port of the gas outlet channel is arranged in the gas outlet channel; the control method further comprises: detecting the concentration of gaseous hydrogen peroxide and the concentration of gaseous water at the second detection position in the gas outlet channel, so as to obtain the concentration of gaseous hydrogen peroxide and the concentration of gaseous water at the gas outlet of the VHP vaporization device 10.

[0072] The present application also provides a sterilization equipment, which comprises the VHP vaporization device 10 and the sterilization chamber 20, and the gas outlet of the VHP vaporization device 10 is communicated with the sterilization chamber 20; the sterilization equipment is suitable for the control method of the VHP vaporization device described above.

[0073] In the present application, the sterilization equipment further comprises the second gas concentration analyzer 50, at least part of which is arranged in the sterilization chamber 20 to detect the concentration of gaseous hydrogen peroxide and the concentration of gaseous water in the sterilization chamber 20.

[0074] Optionally, the sterilization equipment comprises a plurality of sterilization chambers 20, and the gas outlet of the VHP vaporization device 10 is communicated with the plurality of sterilization chambers 20. At least part of the second gas concentration analyzer 50 is arranged in one of the sterilization chambers 20 to detect the concentration of gaseous hydrogen peroxide and the concentration of gaseous water in the sterilization chamber 20.

[0075] In the present application, the sterilization equipment further comprises the first gas concentration analyzer 40.

[0076] Optionally, the first gas concentration analyzer 40 is arranged in the first detection position of the connecting pipeline 30, and the first gas concentration analyzer 40 is arranged in the second detection position of the outlet channel of the VHP vaporization device 10.

[0077] Optionally, the first gas concentration analyzer 40 is arranged in the first detection position of the connecting pipeline 30, and the first gas concentration analyzer 40 is arranged in the second detection position of the outlet channel of the VHP vaporization device 10.

[0078] Optionally, the first gas concentration analyzer 40 and the second gas concentration analyzer 50 are both the gas concentration analyzer mentioned in the patent CN106645024A.

[0079] The following experiments are all taken as an example of a sterilization chamber 20.

[0080] For example, the temperature of the lumen of the connecting pipeline 30 is set to 60 degrees, the carrier gas flow rate is 100 L / min, and the carrier gas pressure is normal pressure. The VHP vaporization device is started to run, and after the temperature of the lumen of the connecting pipeline 30 and the temperature of the chamber of the sterilization chamber 20 are stabilized, 0.5 g / min to 3.6 g / min of 35% H2O2 standard solution is added to the VHP vaporization device, and the concentration of gaseous hydrogen peroxide and the concentration of gaseous water at the gas outlet of the VHP vaporization device, as well as the concentration change trend of gaseous hydrogen peroxide and the concentration change trend of gaseous water, can be directly read through the data output port of the first gas concentration analyzer 40. Each dosing speed lasts for half an hour, and the concentration of gaseous hydrogen peroxide and the concentration of gaseous water at the gas outlet of the VHP vaporization device are recorded.

[0081] When recording, the average concentration in the period from 10 minutes to 20 minutes after each dosing speed is selected. The stabilization of 10 minutes is to ensure the stability of the measurement, so as to ensure that the concentration fluctuation is stable.

[0082] The specific implementation operation process is: 1, power-on check; 2, system preheating; 3, dosing test; 4, data recording; 5, residual blowing; 6, power-off and shutdown.

[0083] Tables 1 to 4 are some experimental data. According to Tables 1 to 3, under the same test conditions, different VHP vaporization devices have different hydrogen peroxide recovery rates, and the higher the hydrogen peroxide recovery rate, the better the hydrogen peroxide vaporization effect of the VHP vaporization device, the less the hydrogen peroxide decomposition, and the better the performance of the VHP vaporization device.

[0084] Table 1

[0085] Table 2

[0086] Table 3

[0087] Table 4

[0088] As shown in Table 4, based on the hydrogen peroxide recovery rate and vaporization efficiency of the three different VHP vaporization units, a higher-quality VHP vaporization unit can be selected. Furthermore, this provides a clear and intuitive understanding of the various performance indicators of the VHP vaporization unit, playing a crucial role in its performance evaluation. This solves the current problem of being unable to determine the quality of VHP vaporization units in production and use.

[0089] By detecting the concentrations of gaseous hydrogen peroxide and gaseous water, the dew point temperature and relative saturation can be accurately calculated. Under the conditions that the temperature, pressure, and sterilization gas flow rate are constant in the sterilization chamber 20 and connecting pipeline 30, the relative saturation and dew point temperature are constant. If the added hydrogen peroxide is oversaturated, adding too much hydrogen peroxide will cause condensation of the gaseous hydrogen peroxide, resulting in a rapid decrease in the concentration of gaseous hydrogen peroxide and no improvement in sterilization effect. By measuring the concentrations of gaseous hydrogen peroxide and gaseous water, the optimal dosage of hydrogen peroxide can be calculated to achieve the best sterilization effect and avoid problems such as low vaporization efficiency due to overdosing, insufficient dosing, or incomplete sterilization due to condensation.

[0090] For example, based on the experimental data in Table 5, under constant temperature and pressure conditions in sterilization chamber 20 and connecting pipe 30, vaporized gaseous hydrogen peroxide was introduced into sterilization chamber 20 via carrier gas for sterilization testing. If the dosage of 35% hydrogen peroxide was 5 ml / min, the dew point temperature was already as high as approximately 59.6℃. There was an inevitable deviation in the uniformity of temperature distribution within connecting pipe 30 and sterilization chamber 20. If the temperature at any point in the scenario was lower than the dew point temperature, the gaseous hydrogen peroxide would condense internally, affecting the sterilization effect. Simultaneously, controlling the concentration of gaseous water also significantly impacted the data. Furthermore, if the dosage increased further, the saturation would exceed 100%, at which point the sterilization effect would worsen with increasing dosage. Therefore, detecting the concentration of gaseous hydrogen peroxide is essential.

[0091] The sterilization effect test data of different gaseous hydrogen peroxide concentrations and different relative saturations of the sterilization chamber 20, as shown in Table 5 and Table 6, in combination with Figs. 2 to 4, show that, at the same chamber temperature and the same relative saturation, the gaseous hydrogen peroxide concentration is exponentially related to the sterilization time D value; the higher the gaseous hydrogen peroxide concentration, the smaller the D value, and the better the sterilization effect; the higher the relative saturation, the smaller the D value, and the better the sterilization effect; therefore, when the gaseous hydrogen peroxide concentration is constant, maintaining a high relative saturation is an effective method to improve the sterilization effect.

[0092] It should be noted that RS represents the relative saturation. The horizontal axis coordinate in Fig. 2 is the gaseous hydrogen peroxide concentration, and Fig. 2 is a test conducted at a chamber temperature of 25 degrees of the sterilization chamber 20. The horizontal axis coordinate in Figs. 3 and 4 is the test time, in min; the left vertical axis coordinate is the relative saturation; and the right vertical axis coordinate is the gaseous hydrogen peroxide concentration, in ppm; 500 ppm in Figs. 3 and 4 is the expected value of the gaseous hydrogen peroxide concentration, 90% RS in Figs. 3 and 4 is the expected value of the relative saturation, and Figs. 3 and 4 are both tests conducted at a chamber temperature of 25 degrees of the sterilization chamber 20. Fig. 3 is the trend of the relative saturation and the gaseous hydrogen peroxide concentration with the test time according to the experimental data of the same experiment. Fig. 4 is the trend of the relative saturation and the gaseous hydrogen peroxide concentration with the test time according to the experimental data of the same experiment. Figs. 3 and 4 are two experiments conducted under the same test conditions.

[0093] It should be noted that the fitting formula of the uppermost curve in Fig. 2 is y = 18.784415e(0.002954)x and R 2 = 0.879285; the fitting formula of the middle curve in Fig. 2 is y = 25.981691e(0.004367)x and R 2 = 0.986557; and the fitting formula of the lowermost curve in Fig. 2 is y = 2.779862e(0.002925)x and R 2 = 0.875869.

[0094] Table 5

[0095] Table 6

[0096] Example 1

[0097] The present example provides a control method of a VHP vaporization device 10, an outlet of the VHP vaporization device 10 is used to communicate with a sterilization chamber 20 to deliver sterilization gas into the sterilization chamber 20, and the sterilization gas includes gaseous hydrogen peroxide and gaseous water.

[0098] In the embodiment, the control method comprises: detecting the concentration of gaseous hydrogen peroxide and the concentration of gaseous water at the gas outlet of the VHP vaporization device 10 to obtain the measured value of the concentration of gaseous hydrogen peroxide output by the VHP vaporization device 10 and the measured value of the concentration of gaseous water output by the VHP vaporization device 10; calculating the theoretical value of the concentration of gaseous hydrogen peroxide and the theoretical value of the concentration of gaseous water that should be output by the VHP vaporization device 10 according to the concentration of hydrogen peroxide liquid added to the VHP vaporization device 10; calculating the decomposition rate of hydrogen peroxide, and / or the vaporization efficiency of hydrogen peroxide, and / or the recovery rate of hydrogen peroxide according to the measured value and the theoretical value of the concentration of gaseous hydrogen peroxide and the measured value and the theoretical value of the concentration of gaseous water; and evaluating the VHP vaporization device 10 according to the calculated decomposition rate of hydrogen peroxide, and / or the vaporization efficiency of hydrogen peroxide, and / or the recovery rate of hydrogen peroxide.

[0099] Specifically, the decomposition rate of hydrogen peroxide = ((measured value of the concentration of gaseous water - theoretical value of the concentration of gaseous water) / theoretical value of the concentration of gaseous hydrogen peroxide) * 100%.

[0100] Specifically, the vaporization efficiency of hydrogen peroxide = ((measured value of the concentration of gaseous hydrogen peroxide + decomposition value of hydrogen peroxide) / theoretical value of the concentration of gaseous hydrogen peroxide) * 100%.

[0101] Specifically, the recovery rate of hydrogen peroxide = (measured value of the concentration of gaseous hydrogen peroxide / theoretical value of the concentration of gaseous hydrogen peroxide) * 100%.

[0102] Specifically, the smaller the decomposition rate of hydrogen peroxide, the higher the vaporization efficiency of hydrogen peroxide and the higher the recovery rate of hydrogen peroxide, the better the performance of the VHP vaporization device 10.

[0103] In the embodiment, the control method further comprises: adding hydrogen peroxide liquid to the VHP vaporization device 10 at a plurality of different dosing speeds respectively to obtain the decomposition rate of hydrogen peroxide, the vaporization efficiency of hydrogen peroxide and the recovery rate of hydrogen peroxide corresponding to each dosing speed, thereby evaluating the VHP vaporization device 10. Among them, the dosing speed is the only variable, and the rest of the parameters remain unchanged.

[0104] In the embodiment, the first way of detecting the concentration of gaseous hydrogen peroxide and the concentration of gaseous water at the gas outlet of the VHP vaporization device 10 is that the first end of the connecting pipeline 30 is used to connect with the gas outlet of the VHP vaporization device 10; the first detection position is arranged on the connecting pipeline 30; and the first detection position is arranged close to the first end of the connecting pipeline 30. The control method further comprises: detecting the concentration of gaseous hydrogen peroxide and the concentration of gaseous water in the lumen at the first detection position of the connecting pipeline 30 to obtain the concentration of gaseous hydrogen peroxide and the concentration of gaseous water at the gas outlet of the VHP vaporization device 10.

[0105] In the present embodiment, the second way of detecting the concentration of gaseous hydrogen peroxide and the concentration of gaseous water at the gas outlet of the VHP vaporization device 10 is that the VHP vaporization device 10 has a gas outlet channel, the outer port of the gas outlet channel is the gas outlet of the VHP vaporization device 10; the gas outlet channel is provided with a second detection position close to the outer port thereof; the control method further comprises: detecting the concentration of gaseous hydrogen peroxide and the concentration of gaseous water at the second detection position in the gas outlet channel to obtain the concentration of gaseous hydrogen peroxide and the concentration of gaseous water at the gas outlet of the VHP vaporization device 10.

[0106] Embodiment Two

[0107] The present embodiment provides a control method of a VHP vaporization device, and the present embodiment is a further limitation based on Embodiment One.

[0108] In the present embodiment, the control method comprises: detecting the concentration of gaseous hydrogen peroxide and the concentration of gaseous water in the sterilization chamber 20 to obtain the relative saturation degree and / or the dew point temperature in the sterilization chamber 20. According to the obtained relative saturation degree and / or the dew point temperature in the sterilization chamber 20, at least one of the plurality of setting parameters of the VHP vaporization device 10 is adjusted to obtain a relatively stable relative saturation degree output; in addition, according to the calculated dew point temperature in the sterilization chamber 20, the actual temperature in the sterilization chamber 20 is controlled to avoid the temperature in the sterilization chamber 20 being lower than the dew point temperature thereof; wherein the plurality of setting parameters of the VHP vaporization device 10 include the dosing speed of adding hydrogen peroxide liquid to the VHP vaporization device 10, the concentration of hydrogen peroxide in the hydrogen peroxide liquid added to the VHP vaporization device 10, the temperature and humidity of the carrier gas and the carrier gas flow rate of the sterilization gas formed by the VHP vaporization device 10 and blown out of the VHP vaporization device 10.

[0109] Specifically, the dosing speed of adding hydrogen peroxide liquid to the VHP vaporization device 10 is positively correlated with the relative saturation degree in the sterilization chamber 20; the concentration of hydrogen peroxide in the hydrogen peroxide liquid added to the VHP vaporization device 10 is positively correlated with the relative saturation degree in the sterilization chamber 20; the temperature and humidity of the carrier gas is positively correlated with the relative saturation degree in the sterilization chamber 20; and the carrier gas flow rate is negatively correlated with the relative saturation degree in the sterilization chamber 20.

[0110] Specifically, the dosing speed of adding hydrogen peroxide liquid to the VHP vaporization device 10 is positively correlated with the dew point temperature in the sterilization chamber 20; the concentration of hydrogen peroxide in the hydrogen peroxide liquid added to the VHP vaporization device 10 is positively correlated with the dew point temperature in the sterilization chamber 20; the temperature and humidity of the carrier gas is positively correlated with the dew point temperature in the sterilization chamber 20; and the carrier gas flow rate is negatively correlated with the dew point temperature in the sterilization chamber 20.

[0111] Specifically, the dew point temperature in the sterilization chamber 20 is positively correlated with both the concentration of gaseous hydrogen peroxide and the concentration of gaseous water in the sterilization chamber 20.

[0112] In this embodiment, the outlet of the VHP vaporization device 10 and the sterilization chamber 20 are connected through the connecting pipeline 30; the control method further comprises: adjusting the chamber temperature of the sterilization chamber 20 and / or the lumen temperature of the connecting pipeline 30 according to the obtained relative saturation of hydrogen peroxide and / or the dew point temperature in the sterilization chamber 20, so as to avoid the chamber temperature of the sterilization chamber 20 and the lumen temperature of the connecting pipeline 30 being lower than the dew point temperature. If the lumen temperature of the connecting pipeline 30 and the chamber temperature of the sterilization chamber 20 are lower than the dew point temperature, gaseous hydrogen peroxide and gaseous water will condense, so it is necessary to ensure that the lumen temperature of the connecting pipeline 30 and the chamber temperature of the sterilization chamber 20 are all higher than the dew point temperature in the sterilization chamber 20, so as to avoid condensation in the system.

[0113] Specifically, the chamber temperature of the sterilization chamber 20 is negatively correlated with the relative saturation in the sterilization chamber 20. The lumen temperature of the connecting pipeline 30 is negatively correlated with the relative saturation in the sterilization chamber 20.

[0114] Specifically, the connecting pipeline 30 is insulated or heated, so as to ensure that the lumen temperature of the connecting pipeline 30 is higher than the dew point temperature in the sterilization chamber 20, and avoid condensation of gaseous hydrogen peroxide and gaseous water in the lumen of the connecting pipeline 30, thereby affecting the concentration of gaseous hydrogen peroxide.

[0115] In this embodiment, when the outlet of the VHP vaporization device 10 is connected to multiple sterilization chambers 20 to deliver sterilization gas into the multiple sterilization chambers 20, the concentration of gaseous hydrogen peroxide and the concentration of gaseous water in at least one sterilization chamber 20 are detected, so as to adjust at least one of the multiple setting parameters of the VHP vaporization device 10.

[0116] In this embodiment, when the outlet of the VHP vaporization device 10 is connected to multiple sterilization chambers 20, multiple connecting pipelines 30 are provided, and the multiple connecting pipelines 30 are arranged in one-to-one correspondence with the multiple sterilization chambers 20, and the outlet of the VHP vaporization device 10 and each sterilization chamber 20 are connected through the corresponding connecting pipeline 30.

[0117] Embodiment Three

[0118] This embodiment provides a sterilization device, which comprises a VHP vaporization device 10 and a sterilization chamber 20, and the outlet of the VHP vaporization device 10 is connected to the sterilization chamber 20; the sterilization device is suitable for the control method of the VHP vaporization device in Embodiment One.

[0119] In this embodiment, the sterilization device further comprises a first gas concentration analyzer 40.

[0120] Optionally, the first gas concentration analyzer 40 is arranged in a first mode as shown in FIG. 1, at least a portion of the first gas concentration analyzer 40 is arranged in the lumen at the first detection position of the connecting pipeline 30 to detect the concentration of gaseous hydrogen peroxide and the concentration of gaseous water in the lumen at the first detection position.

[0121] Optionally, the first gas concentration analyzer 40 is arranged in a second mode, at least a portion of the first gas concentration analyzer 40 is arranged in the outflow channel of the VHP vaporization device 10 at a second detection position to detect the concentration of gaseous hydrogen peroxide and the concentration of gaseous water in the lumen at the second detection position.

[0122] Optionally, the first gas concentration analyzer 40 is the gas concentration analyzer mentioned in patent CN106645024A.

[0123] Embodiment Four

[0124] The present embodiment provides a sterilization device comprising a VHP vaporization device 10 and a sterilization chamber 20, the outflow port of the VHP vaporization device 10 is in communication with the sterilization chamber 20; the sterilization device is suitable for the control method of the VHP vaporization device in Embodiment One or Embodiment Two.

[0125] In the present embodiment, the sterilization device further comprises a first gas concentration analyzer 40.

[0126] Optionally, the first gas concentration analyzer 40 is arranged in a first mode as shown in FIG. 1, at least a portion of the first gas concentration analyzer 40 is arranged in the lumen at the first detection position of the connecting pipeline 30 to detect the concentration of gaseous hydrogen peroxide and the concentration of gaseous water in the lumen at the first detection position.

[0127] Optionally, the first gas concentration analyzer 40 is arranged in a second mode, at least a portion of the first gas concentration analyzer 40 is arranged in the outflow channel of the VHP vaporization device 10 at a second detection position to detect the concentration of gaseous hydrogen peroxide and the concentration of gaseous water in the lumen at the second detection position.

[0128] In the present embodiment, the sterilization device further comprises a second gas concentration analyzer 50, at least a portion of the second gas concentration analyzer 50 is arranged in the sterilization chamber 20 to detect the concentration of gaseous hydrogen peroxide and the concentration of gaseous water in the sterilization chamber 20.

[0129] Optionally, the sterilization device comprises a plurality of sterilization chambers 20, and the outlet of the VHP vaporization device 10 is in communication with the plurality of sterilization chambers 20. At least part of the second gas concentration analyzer 50 is arranged in one of the sterilization chambers 20 to detect the concentration of gaseous hydrogen peroxide and the concentration of gaseous water in the sterilization chamber 20.

[0130] In this embodiment, the first gas concentration analyzer 40 and the second gas concentration analyzer 50 are both optionally the gas concentration analyzer mentioned in patent CN106645024A.

[0131] Embodiment five

[0132] The present embodiment provides a control method of a VHP vaporization device, the outlet of the VHP vaporization device 10 is used to communicate with a sterilization chamber 20 to deliver sterilization gas to the sterilization chamber 20, and the sterilization gas comprises gaseous hydrogen peroxide and gaseous water.

[0133] In this embodiment, the control method comprises: detecting the concentration of gaseous hydrogen peroxide and the concentration of gaseous water in the sterilization chamber 20 to obtain the relative saturation degree and / or the dew point temperature in the sterilization chamber 20. According to the obtained relative saturation degree and / or the dew point temperature in the sterilization chamber 20, at least one of a plurality of setting parameters of the VHP vaporization device 10 is adjusted to obtain a relatively stable relative saturation degree output; in addition, according to the calculated dew point temperature in the sterilization chamber 20, the actual temperature in the sterilization chamber 20 is controlled to avoid the temperature in the sterilization chamber 20 being lower than the dew point temperature thereof; wherein the plurality of setting parameters of the VHP vaporization device 10 comprises the dosing speed of adding hydrogen peroxide liquid to the VHP vaporization device 10, the concentration of hydrogen peroxide in the hydrogen peroxide liquid added to the VHP vaporization device 10, the temperature and humidity of the carrier gas blowing out the sterilization gas formed by the VHP vaporization device 10, and the flow rate of the carrier gas.

[0134] Specifically, the dosing speed of adding hydrogen peroxide liquid to the VHP vaporization device 10 is positively correlated with the relative saturation degree in the sterilization chamber 20; the concentration of hydrogen peroxide in the hydrogen peroxide liquid added to the VHP vaporization device 10 is positively correlated with the relative saturation degree in the sterilization chamber 20; the temperature and humidity of the carrier gas is positively correlated with the relative saturation degree in the sterilization chamber 20; and the flow rate of the carrier gas is negatively correlated with the relative saturation degree in the sterilization chamber 20.

[0135] Specifically, the dosing speed of adding hydrogen peroxide liquid to the VHP vaporization device 10 is positively correlated with the dew point temperature in the sterilization chamber 20; the concentration of hydrogen peroxide in the hydrogen peroxide liquid added to the VHP vaporization device 10 is positively correlated with the dew point temperature in the sterilization chamber 20; the temperature and humidity of the carrier gas is positively correlated with the dew point temperature in the sterilization chamber 20; and the flow rate of the carrier gas is negatively correlated with the dew point temperature in the sterilization chamber 20.

[0136] Specifically, the dew point temperature in the sterilization chamber 20 is positively correlated with both the concentration of gaseous hydrogen peroxide and the concentration of gaseous water in the sterilization chamber 20.

[0137] In this embodiment, the outlet of the VHP vaporization device 10 and the sterilization chamber 20 are connected through the connecting pipeline 30; the control method further comprises: adjusting the chamber temperature of the sterilization chamber 20 and / or the lumen temperature of the connecting pipeline 30 according to the obtained relative saturation of hydrogen peroxide and / or the dew point temperature in the sterilization chamber 20, so as to avoid the chamber temperature of the sterilization chamber 20 and the lumen temperature of the connecting pipeline 30 being lower than the dew point temperature. If the lumen temperature of the connecting pipeline 30 and the chamber temperature of the sterilization chamber 20 are lower than the dew point temperature, gaseous hydrogen peroxide and gaseous water will condense, so it is necessary to ensure that the lumen temperature of the connecting pipeline 30 and the chamber temperature of the sterilization chamber 20 are all higher than the dew point temperature in the sterilization chamber 20, so as to avoid condensation in the system.

[0138] Specifically, the chamber temperature of the sterilization chamber 20 is negatively correlated with the relative saturation in the sterilization chamber 20. The lumen temperature of the connecting pipeline 30 is negatively correlated with the relative saturation in the sterilization chamber 20.

[0139] Specifically, the connecting pipeline 30 is insulated or heated, so as to ensure that the lumen temperature of the connecting pipeline 30 is higher than the dew point temperature in the sterilization chamber 20, and avoid condensation of gaseous hydrogen peroxide and gaseous water in the lumen of the connecting pipeline 30, thereby affecting the concentration of gaseous hydrogen peroxide.

[0140] In this embodiment, when the outlet of the VHP vaporization device 10 is connected to multiple sterilization chambers 20 to deliver sterilization gas into the multiple sterilization chambers 20, the concentration of gaseous hydrogen peroxide and the concentration of gaseous water in at least one sterilization chamber 20 are detected, so as to adjust at least one of the multiple setting parameters of the VHP vaporization device 10.

[0141] In this embodiment, when the outlet of the VHP vaporization device 10 is connected to multiple sterilization chambers 20, multiple connecting pipelines 30 are provided, and the multiple connecting pipelines 30 are arranged in one-to-one correspondence with the multiple sterilization chambers 20, and the outlet of the VHP vaporization device 10 and each sterilization chamber 20 are connected through the corresponding connecting pipeline 30.

[0142] Embodiment Six

[0143] This embodiment provides a sterilization device, which comprises a VHP vaporization device 10 and a sterilization chamber 20, and the outlet of the VHP vaporization device 10 is connected to the sterilization chamber 20; the sterilization device is suitable for the control method of the VHP vaporization device in Embodiment Five.

[0144] In the present embodiment, the sterilization apparatus further comprises a second gas concentration analyzer 50, at least a part of the second gas concentration analyzer 50 is arranged in the sterilization chamber 20 to detect the concentration of gaseous hydrogen peroxide and the concentration of gaseous water in the sterilization chamber 20.

[0145] Optionally, the sterilization apparatus comprises a plurality of sterilization chambers 20, the gas outlet of the VHP vaporization device 10 is in communication with the plurality of sterilization chambers 20. At least a part of the second gas concentration analyzer 50 is arranged in one of the sterilization chambers 20 to detect the concentration of gaseous hydrogen peroxide and the concentration of gaseous water in the sterilization chamber 20.

[0146] Optionally, the second gas concentration analyzer 50 adopts the gas concentration analyzer mentioned in patent CN106645024A.

[0147] It should be noted that the terms "first", "second", and the like in the description and claims of the application and the above drawings are used to distinguish similar objects, and do not necessarily have to be used to describe a specific order or sequence. It should be understood that the data thus used can be interchanged under appropriate circumstances, so that the embodiments of the application described herein can be implemented in an order other than that illustrated or described herein. In addition, the terms "include" and "have" and any variations thereof are intended to cover non-exclusive inclusion, for example, a process, method, system, product or device including a series of steps or units does not have to be limited to those steps or units clearly listed, but can include other steps or units not clearly listed or inherent to these processes, methods, products or devices.

[0148] For ease of description, spatial relative terms such as "over", "above", "upper surface", "upper", etc. can be used herein to describe the spatial positional relationship of one device or feature with respect to other devices or features as shown in the drawings. It should be understood that the spatial relative terms are intended to include different orientations in use or operation in addition to the orientation of the devices as described in the drawings. For example, if the devices in the drawings are inverted, the device described as "above" or "over" other devices or structures will be positioned "below" or "under" the other devices or structures. Thus, the exemplary term "above" can include both "above" and "below" orientations. The devices can also be positioned in other different ways (rotated 90 degrees or in other orientations), and the spatial relative descriptions used herein are interpreted accordingly.

[0149] The above descriptions are only the preferred embodiments of the present application, and are not intended to limit the present application. The present application can have various modifications and changes for those skilled in the art. Any modifications, equivalent replacements, improvements, etc. made within the spirit and principle of the present application shall be included in the protection scope of the present application.

Claims

1. A control method of a VHP vaporization device, an outlet of the VHP vaporization device being configured to communicate with a sterilization chamber (20) to deliver a sterilization gas into the sterilization chamber (20), the sterilization gas comprising gaseous hydrogen peroxide and gaseous water; characterized in that, The control method comprises: detecting the concentration of gaseous hydrogen peroxide and the concentration of gaseous water at the gas outlet of the VHP vaporization device to obtain the measured value of the concentration of gaseous hydrogen peroxide output by the VHP vaporization device and the measured value of the concentration of gaseous water output by the VHP vaporization device; calculating the theoretical value of the concentration of gaseous hydrogen peroxide and the theoretical value of the concentration of gaseous water that should be output by the VHP vaporization device according to the concentration of hydrogen peroxide liquid added to the VHP vaporization device; calculating the decomposition rate of hydrogen peroxide, and / or the vaporization efficiency of hydrogen peroxide, and / or the recovery rate of hydrogen peroxide according to the measured value and the theoretical value of the concentration of gaseous hydrogen peroxide, and the measured value and the theoretical value of the concentration of gaseous water; evaluating the VHP vaporization device according to the calculated decomposition rate of hydrogen peroxide, and / or the vaporization efficiency of hydrogen peroxide, and / or the recovery rate of hydrogen peroxide.

2. The control method of the VHP vaporization device according to claim 1, wherein the decomposition rate of hydrogen peroxide = (measured value of the concentration of gaseous water - theoretical value of the concentration of gaseous water) / theoretical value of the concentration of gaseous hydrogen peroxide; and / or the vaporization efficiency of hydrogen peroxide = (measured value of the concentration of gaseous hydrogen peroxide + decomposition value of hydrogen peroxide) / theoretical value of the concentration of gaseous hydrogen peroxide; and / or the recovery rate of hydrogen peroxide = measured value of the concentration of gaseous hydrogen peroxide / theoretical value of the concentration of gaseous hydrogen peroxide. The control method further comprises: adding hydrogen peroxide liquid to the VHP vaporization device at a plurality of different dosing speeds respectively to obtain the decomposition rate of hydrogen peroxide, the vaporization efficiency of hydrogen peroxide and the recovery rate of hydrogen peroxide corresponding to each dosing speed, thereby evaluating the VHP vaporization device.

4. The control method of the VHP vaporization device according to claim 1, wherein the gas outlet of the VHP vaporization device is communicated with the sterilization chamber (20) through a connecting pipeline (30); the first end of the connecting pipeline (30) is used to connect with the gas outlet of the VHP vaporization device; the connecting pipeline (30) is provided with a first detection position; the first detection position is arranged close to the first end of the connecting pipeline (30); the control method further comprises: detecting the concentration of gaseous hydrogen peroxide and the concentration of gaseous water in the lumen of the first detection position of the connecting pipeline (30) to obtain the concentration of gaseous hydrogen peroxide and the concentration of gaseous water at the gas outlet of the VHP vaporization device; or 3. The control method of the VHP vaporization apparatus according to claim 1, characterized by, the VHP vaporization device has a gas outlet channel, the outer port of the gas outlet channel is the gas outlet of the VHP vaporization device; the gas outlet channel is provided with a second detection position close to the outer port thereof; the control method further comprises: detecting the concentration of gaseous hydrogen peroxide and the concentration of gaseous water at the second detection position in the gas outlet channel to obtain the concentration of gaseous hydrogen peroxide and the concentration of gaseous water at the gas outlet of the VHP vaporization device. The control method further comprises: ​ ​ ​ 5. The control method of the VHP vaporization apparatus according to claim 1, characterized by, ​ detecting the concentration of gaseous hydrogen peroxide and the concentration of gaseous water in the sterilization chamber (20) to obtain the relative saturation and / or the dew point temperature in the sterilization chamber (20); adjusting at least one of the multiple setting parameters of the VHP vaporizer according to the obtained relative saturation and / or the dew point temperature in the sterilization chamber (20); wherein the multiple setting parameters of the VHP vaporizer include the dosing speed of hydrogen peroxide liquid added to the VHP vaporizer, the concentration of hydrogen peroxide in the hydrogen peroxide liquid added to the VHP vaporizer, the temperature and humidity of the carrier gas blowing out the sterilization gas formed by the VHP vaporizer from the VHP vaporizer, and the flow rate of the carrier gas.

6. The control method of the VHP vaporizer according to claim 5, wherein, the dosing speed of hydrogen peroxide liquid added to the VHP vaporizer is positively correlated with the relative saturation in the sterilization chamber (20); and / or the concentration of hydrogen peroxide in the hydrogen peroxide liquid added to the VHP vaporizer is positively correlated with the relative saturation in the sterilization chamber (20); and / or the temperature and humidity of the carrier gas is positively correlated with the relative saturation in the sterilization chamber (20); and / or the flow rate of the carrier gas is negatively correlated with the relative saturation in the sterilization chamber (20); and / or the dosing speed of hydrogen peroxide liquid added to the VHP vaporizer is positively correlated with the dew point temperature in the sterilization chamber (20); and / or the concentration of hydrogen peroxide in the hydrogen peroxide liquid added to the VHP vaporizer is positively correlated with the dew point temperature in the sterilization chamber (20); and / or the temperature and humidity of the carrier gas is positively correlated with the dew point temperature in the sterilization chamber (20); and / or the flow rate of the carrier gas is negatively correlated with the dew point temperature in the sterilization chamber (20).

7. The control method of the VHP vaporization apparatus according to claim 5, characterized by, the outlet of the VHP vaporizer and the sterilization chamber (20) are communicated through a connecting pipeline (30); the control method further comprises: adjusting the chamber temperature of the sterilization chamber (20) and / or the lumen temperature of the connecting pipeline (30) according to the obtained relative saturation and / or the dew point temperature of hydrogen peroxide in the sterilization chamber (20).

8. The control method of the VHP vaporizer according to claim 7, wherein, the chamber temperature of the sterilization chamber (20) is negatively correlated with the relative saturation in the sterilization chamber (20); and / or the lumen temperature of the connecting pipeline (30) is negatively correlated with the relative saturation in the sterilization chamber (20); and / or the chamber temperature at each location in the sterilization chamber (20) is higher than the dew point temperature in the sterilization chamber (20); and / or the lumen temperature at each location of the connecting pipeline (30) is higher than the dew point temperature in the sterilization chamber (20).

9. Sterilization apparatus, characterized in that a sterilization device comprising a VHP vaporizer and a sterilization chamber (20), the outlet of the VHP vaporizer is communicated with the sterilization chamber (20); the sterilization device is suitable for the control method of any one of claims 1 to 8.

10. Sterilization apparatus according to claim 9, characterized in that The sterilization apparatus further comprises a first gas concentration analyzer (40), At least part of the first gas concentration analyzer (40) is arranged in the lumen at a first detection position of the connecting pipeline (30) to detect the concentration of gaseous hydrogen peroxide and the concentration of gaseous water in the lumen at the first detection position; or At least part of the first gas concentration analyzer (40) is arranged in the lumen at a second detection position of the gas outlet channel of the VHP vaporization device to detect the concentration of gaseous hydrogen peroxide and the concentration of gaseous water in the lumen at the second detection position.

11. Sterilization apparatus according to claim 9, characterized in that The sterilization apparatus further comprises a second gas concentration analyzer (50), at least part of which is arranged in the sterilization chamber (20) to detect the concentration of gaseous hydrogen peroxide and the concentration of gaseous water in the sterilization chamber (20).

12. A control method of a VHP vaporization device, an outlet of the VHP vaporization device being configured to communicate with a sterilization chamber (20) to deliver a sterilization gas into the sterilization chamber (20), the sterilization gas comprising gaseous hydrogen peroxide and gaseous water; characterized in that, The control method comprises: detecting the concentration of gaseous hydrogen peroxide and the concentration of gaseous water in the sterilization chamber (20) to obtain the relative saturation and / or dew point temperature in the sterilization chamber (20); adjusting at least one of the multiple setting parameters of the VHP vaporization device according to the obtained relative saturation and / or dew point temperature in the sterilization chamber (20); wherein the multiple setting parameters of the VHP vaporization device include the dosing speed of hydrogen peroxide liquid added to the VHP vaporization device, the concentration of hydrogen peroxide in the hydrogen peroxide liquid added to the VHP vaporization device, the temperature and humidity of the carrier gas blowing out the sterilization gas formed by the VHP vaporization device from the VHP vaporization device, and the carrier gas flow rate.

13. The control method of the VHP vaporization device according to claim 12, wherein, the dosing speed of hydrogen peroxide liquid added to the VHP vaporization device is positively correlated with the relative saturation in the sterilization chamber (20); and / or the concentration of hydrogen peroxide in the hydrogen peroxide liquid added to the VHP vaporization device is positively correlated with the relative saturation in the sterilization chamber (20); and / or the temperature and humidity of the carrier gas are positively correlated with the relative saturation in the sterilization chamber (20); and / or the carrier gas flow rate is negatively correlated with the relative saturation in the sterilization chamber (20); and / or the dosing speed of hydrogen peroxide liquid added to the VHP vaporization device is positively correlated with the dew point temperature in the sterilization chamber (20); and / or the concentration of hydrogen peroxide in the hydrogen peroxide liquid added to the VHP vaporization device is positively correlated with the dew point temperature in the sterilization chamber (20); and / or the temperature and humidity of the carrier gas are positively correlated with the dew point temperature in the sterilization chamber (20); and / or the carrier gas flow rate is negatively correlated with the dew point temperature in the sterilization chamber (20).

14. The control method of the VHP vaporization apparatus according to claim 12, characterized in that, The gas outlet of the VHP vaporization device and the sterilization chamber (20) are communicated through a connecting pipeline (30); the control method further comprises: adjusting the chamber temperature of the sterilization chamber (20) and / or the lumen temperature of the connecting pipeline (30) according to the obtained relative saturation and / or dew point temperature of hydrogen peroxide in the sterilization chamber (20).

15. The control method of the VHP vaporizer device according to claim 14, wherein, the chamber temperature of the sterilization chamber (20) is negatively correlated with the relative saturation in the sterilization chamber (20); and / or the lumen temperature of the connecting pipeline (30) is negatively correlated with the relative saturation in the sterilization chamber (20); and / or the chamber temperature everywhere in the sterilization chamber (20) is higher than the dew point temperature in the sterilization chamber (20); and / or the lumen temperature everywhere in the connecting pipeline (30) is higher than the dew point temperature in the sterilization chamber (20).

16. Sterilization apparatus characterized in that, The sterilization device comprises a VHP vaporizer device, a sterilization chamber (20) and a second gas concentration analyzer (50), the gas outlet of the VHP vaporizer device is communicated with the sterilization chamber (20); at least part of the second gas concentration analyzer (50) is arranged in the sterilization chamber (20) to detect the concentration of gaseous hydrogen peroxide and the concentration of gaseous water in the sterilization chamber (20); the sterilization device is suitable for the control method of any one of claims 12 to 15.

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