System and method to combine beam currents of multiple ion sources for high throughput ion beam processing

Abstract

A system of generating a high throughput ion beam includes ion sources, beam steering devices, a shared beam line, an acceleration device, and a target chamber. Each pulsed ion beam is associated with a corresponding ion source and a corresponding beam steering device. The method implemented by this system includes the following steps. Each pulsed ion beam is generated with the corresponding ion source. Each pulsed ion beam is then guided into the shared beam line with the corresponding beam steering device. A pulse width of each pulsed ion beam is then synchronized to enter the shared beam line without intersecting the pulse width of any other pulsed ion beam. A combined beam complied from the pulsed ion beams is then accelerated to a final beam energy with the acceleration device. The combined beam is then bombarded into a target within the target chamber.

Description

[0001] System and Method to Combine Beam Currents of Multiple Ion Sources for High Throughput Ion Beam Processing

[0002] The current application claims a priority to the U.S. provisional patent application serial number 63 / 679,993 filed on August 6, 2025.

[0003] FIELD OF THE INVENTION

[0004] The present invention generally relates to an ion source complex that is capable of combining ion currents from each source without any loss of ion beam in order to ensure a powerful ion source.

[0005] BACKGROUND OF THE INVENTION

[0006] Ion beam technology plays a pivotal role in various applications related to materials synthesis, modification, doping, and irradiation testing. Specifically, it offers precise control over the implantation of ions into materials, facilitating advancements in semiconductor manufacturing, surface engineering, and the synthesis of novel materials. Examples of its application include the doping of semiconductors for electronic device fabrication, modification of material properties to enhance hardness or corrosion resistance, and the creation of thin films with specific characteristics.

[0007] A particularly critical application of ion beam technology is in the production of isotopes for use in nuclear imaging and radiation therapy. This process requires ion beams of specific energies and ion species to generate particular isotopes essential for medical diagnostics and treatment. The efficacy of these applications is heavily dependent on the strength of the ion beam, as a more potent beam increases the yield of radioactive isotopes per batch, enhancing the efficiency and effectiveness of the synthesis process. Despite the significant benefits offered by ion beam technology, its potential is often constrained by the limitations of current ion sources. These limitations, both physical and instrumental, restrict the achievable beam intensity and, consequently, the efficiency of isotope production and other materials processing applications. To address these challenges, we introduce an innovative technique designed to maximize the effective beam current by utilizing multiple ion accelerators in a novel configuration, thereby overcoming the existing limitations of ion source technology.

[0008] In U.S. patent no. 4,812,775 entitled “Electrostatic Ion Accelerator”, a method is described for creating high-energy and high-current ions for isotope production. The accelerator system includes a single ion source and a charge exchange device. However, this method is limited by relatively low beam currents, which consequently restricts the yields of isotope production. Furthermore, the method employs a so-called tandem design, and the final beam energy, typically a few MeV, is insufficient for creating many isotopes of industrial interest.

[0009] In U.S. patent no. 6,444,990 Bl entitled “Multiple Target, Multiple Energy Radioisotope Production”, a method for producing isotopes is introduced, featuring a device with parallel-positioned target chambers. This arrangement allows for the production of different isotopes in separate target chambers. However, the use of only one ion source limits the isotope production yield due to the beam current constraints of a single source.

[0010] For the Superconducting Super Collider project, a high-performance ion source was developed, featuring 35 kV and 30 mA H- beams. The pulse width ranges from 7 to 35 microseconds, with a repetition rate of 10 Hz. The design details were published by K. Saadatmand, J.E. Hebert, and N.C. Okay in “RF Volume H- Ion Source for the Superconducting Super Collider”, AIP Conference Proceedings 287, pages 448-457 (1992). However, the accelerator system utilized only one ion source, which means the effective beam current remains limited.

[0011] SUMMARY OF THE INVENTION The present invention aims to create an ion source complex capable of combining ion currents from each source without any loss of ion beam, thus ensuring a powerful ion source. This guarantees the strong beam current necessary for ion beam processing or ion beam synthesis. The ion source complex can be applied to any ion accelerator systems as an all-purpose, high-current ion source. The ion source complex operates as a separable component and can be linked to various accelerator designs. The key function of the ion source complex is to combine beam currents from each ion source into a sharing single beam line. The final beam current is proportional to the number of individual ion sources in the ion source complex. The invented ion source complex has the following features:

[0012] • Multiple Ion Source System - A system configuration involving multiple ion sources arranged in parallel to the ion beam line, either on one or both sides, designed to increase the effective beam current through coordinated operation.

[0013] • Pulsed Beam Operation - The system operates each ion source in a pulsed mode, producing periodic, non-continuous beam currents that exhibit box-like or spike-like temporal profiles. This approach ensures that the beam from each source is emitted in distinct phases, with one source active at any given time while others remain inactive.

[0014] • Phase-Synchronized Bending Magnets - Positioned between each ion source and the beam line, bending magnets are synchronized with the operational phase of their respective ion sources. This synchronization allows the magnet to direct the beam from its ion source into the beam line when active, without interfering with beams from other sources.

[0015] • Non-Overlapping Phase Operation - The system's design prevents the overlap of beam currents from multiple sources by coordinating the operation phases of each ion source-magnet pair. This ensures that each beam contributes to the overall beam current without loss, effectively aggregating the currents from all sources.

[0016] The system’s design prevents the destructive overlapping of beam currents from multiple sources at any given time. This is achieved by coordinating not only the phases of each ion source-magnet pair but also the phase patterns of all ion source-magnet pairs. The coordination is necessary since, when one ion beam is bent by a magnet to join the main beam, the same magnet will steer the beam already in the main beam off the beam line. To avoid this, the phases of all components are controlled in a way that when one magnet steers the ion current from its pairing ion source into the main beam line, there are no beam currents in the main beam, avoiding beam loss. The technique combines all beam currents together.

[0017] By introducing a system capable of overcoming the limitations of current ion source technology through multiplexed operation and synchronized bending magnets, the present invention is a significant advancement in the field of ion beam synthesis. The present invention enhances the efficiency of isotope production for medical applications and improves the performance of materials synthesis, modification, and doping processes, thereby offering broad benefits across multiple industries.

[0018] The present invention is particularly advantageous for isotope production for nuclear imaging and radiation therapy, where the enhanced beam current directly translates to higher yields of specific isotopes, improving the efficiency and effectiveness of these medical applications.

[0019] BRIEF DESCRIPTION OF THE DRAWINGS

[0020] FIG. 1 is a flowchart illustrating an overall process for the method of the present invention.

[0021] FIG. 2 is a flowchart illustrating a subprocess for using a central controller.

[0022] FIG. 3 shows schematic representations that illustrate the method of the invention.

[0023] FIG. 4 is a schematic diagram of a bending magnet when it is on the “off’ state, without being activated / energized.

[0024] FIG. 5 is a schematic diagram of a bending magnet when it is on the “on” state, being activated / energized .

[0025] FIG. 6 is a schematic diagram of an integrated system for controlling ion sources and bending magnets in a synchronized manner. FIG. 7 shows the beam current received at the target as a function of time, wherein white represents the current from the first ion source, the gray box refers to the currents from the second ion source, and the black box corresponds to the current from the third ion source.

[0026] FIG. 8 shows the electric currents over time for creating magnetic fields in the bending magnets.

[0027] DETAILED DESCRIPTION OF THE INVENTION

[0028] All illustrations of the drawings are for the purpose of describing selected versions of the present invention and are not intended to limit the scope of the present invention.

[0029] The present invention is a system and method to combine beam currents of multiple ion sources for high throughput ion beam processing. The system used to implement the method of the present invention includes a plurality of ion sources, a plurality of beam steering devices, a shared beam line, an acceleration device, and a target chamber (Step A). A plurality of pulsed ion beams is produced by the ion sources, and, consequently, each pulsed ion beam is associated with a corresponding ion source from the plurality of ion sources. Each pulsed ion beam is also associated with a corresponding beam steering devices from the plurality of beam steering devices. Each beam steering device can be, but is not limited to, a bending magnet or an electrostatic beam deflector. The acceleration device preferably includes, but is not limited to, at least one drift tube accelerator and / or at least one radio frequency quadrupole accelerator.

[0030] As can be seen in FIG. 1, the method of the present invention follows an overall process to efficiently and effectively generate a high throughput ion beam. The overall process begins by generating each pulsed ion beam with the corresponding ion source (Step B). The overall process continues by guiding each pulsed ion beam into the shared beam line with the corresponding beam steering device (Step C). Moreover, a pulse width of each pulsed ion beam is synchronized to enter the shared beam line without intersecting the pulse width of any other pulsed ion beam from the plurality of pulsed ion beams during Steps B and C by coordinating an activation timing of each ion source and an activation timing of each beam steering device (Step D). The overall process continues by accelerating a combined beam to a final beam energy with the acceleration device (Step E). The final beam energy preferably ranges from 1 Mega-electron-volts (MeV) to 1 Giga-electron-volts (GeV). The combined beam is a compilation of the pulsed ion beams in the shared beam line. The overall process concludes by bombarding the combined beam into a target within the target chamber (Step F).

[0031] The system of the present invention may further be provided with a plurality of individual beam lines, which optimizes the synchronization of the pulsed ion beams entering the shared beam line during Step D. Thus, each pulsed ion beam needs to travel from the corresponding ion source to the corresponding beam steering device through a corresponding individual beam line from the plurality of individual beam lines. The individual beam lines are arranged on one lateral side of the shared beam line and are arranged in parallel.

[0032] As can be seen in FIG. 2, the system of the present invention may further be provided with a central controller, which is used to manage digital instructions and feedback sent amongst the electronic components of the present invention. Thus, each ion source and each beam steering device are communicably coupled with the central controller so that the central controller is able to coordinate the activation timing of each ion source and the activation timing of each beam steering device with the central controller during Step D.

[0033] A variety of aspects may be configured about the present invention in order to further optimize the synchronization of the pulsed ion beams entering the shared beam line during Step D. One such aspect is the pulse width of each pulsed ion beam that preferably ranges from 1 microsecond to 100 seconds. Another such aspect is a pulse interval of each pulsed ion beam that preferably ranges from 1 microsecond to 100 seconds. Another such aspect is a pulse height of each pulsed ion beam that preferably is greater than 10 milliamperes (mA). Another such aspect is a duty factor of the combined beam that preferably is greater than 5%. Moreover, a definition of the duty factor is a fraction of time that the combined beam is bombarding the target.

[0034] A composition of the pulsed ion beams can be altered to accommodate a desired practical application of the present invention. The pulsed ion beams are preferably composed of proton ions, deuterium ions, tritium ions, helium ions, a combination of proton ions and deuterium ions, or a combination of deuterium ions and helium ions. The pulse ion beams can alternatively be composed of any other kind of ions. The pulsed ion beams can also be composed of single ions or molecular ions. Moreover, the pulsed ion beams are composed of different ions during different periods of an operation cycle. For example, the pulsed ion beams can be composed of proton ion for the first 20 seconds but then be composed of helium ions for the second 20 seconds.

[0035] Supplemental Description

[0036] FIG. 3 shows an ion source complex 10, which includes a first ion source 20, a second ion source 30, and a third ion source 40. The first ion source 20 creates a first ion beam 22 along a first beam line 24. A first beam steering device 26 is positioned after the first ion source 20 to bend the first ion beam 22 to join a shared beam line 50. The second ion source 30 creates a second ion beam 32 along a second beam line 34. A second beam steering device 36 is positioned after the second ion source 30 to bend the second ion beam 32 to join the shared beam line 50. The third ion source 40 creates a third ion beam 42 along a third beam line 44. A third beam steering device 46 is positioned after the third ion source 40 to bend the third ion beam 42 to join the shared beam line 50.

[0037] FIG. 4 illustrates a typical design of a beam steering device (i.e., also known as a bending magnet or dipole magnet) for its “off’ state when deactivated. Being deactivated means that there is an electric current introduced to create a magnetic field. The bending magnet 60 features a chamber equipped with inlet and outlet beam lines to facilitate beam transport in a vacuum. There are two beam lines, one of which is a beam line 70 originating from ion source 80 and another of which is a shared beam line 100. When the bending magnet is off, no ion beam is emitted from the beam line 70. Concurrently, a beam 90 from the shared beam line 100 continues to travel along the shared beam line 100. Due to the absence of a magnetic field in the bending magnet 60, there is no alteration in the trajectory of the ion beam. Thus, the beam 90 moving along the shared beam line 100 maintains a straight trajectory by passing through the bending magnet 60 and entering into beam line 100. The straight trajectory of the beam 90 then continues by being accelerated through an acceleration device 110. The straight trajectory of the beam 90 concludes by eventually bombarding a target in a target chamber 120.

[0038] FIG. 5 illustrates a situation of when the bending magnet 200 is in the 'on' state, also referred to as activated or energized. In a typical design, a constant electron current flows through the bending magnet in multiple coil configurations, creating a north pole 210 and a south pole 220. Within the chamber of the bending magnet 200, a vertical magnetic field 230 is generated between the north pole 210 and the south pole 220. The charged ions from a beam line 250 originating from ion source 260 bend their trajectory and enter into a shared beam line 240 (i.e., the section of the shared beam line after the bending magnet 200). Those charged ions are then accelerated through an acceleration device 280. Those charged ions finally bombard a target in a target chamber 290. When the bending device is in the 'on' state, there is no beam in the shared beam line 270 (i.e., the section of the shared beam line before the bending magnet 200). The beam that is accelerated after the bending device 200 is contributed solely by the beam originating from ion source 260.

[0039] FIG. 6 illustrates an integrated system capable of controlling ion sources and bending magnets in a synchronized manner. This is the key step to combining beams from each individual ion source. Thus, first ion source 320 creates a first ion beam 322 along a first beam line 324. A first beam steering device 326 is positioned after the first ion source 320 to bend the first ion beam 322 to join a shared beam line 350. The first ion source 320 communicates with a central control system 310 through a first sourcecontrolling electronic connection 352. The first beam steering device 326 communicates with the central control system 310 through a first magnet-controlling electronic connection 328. Moreover, a second ion source 330 creates a second ion beam 332 along a second beam line 334. A second beam steering device 336 is positioned after the second ion source 330 to bend the second ion beam 332 to join the shared beam line 350. The second ion source 330 communicates with the central control system 310 through a first source-controlling electronic connection 354. The second beam steering device 336 communicates with the central control system 310 through a second magnet-controlling electronic connection 338. Furthermore, a third ion source 340 creates a third ion beam 342 along a third beam line 344. A third beam steering device 346 is positioned after the third ion source 340 to bend the third ion beam 342 to join the shared beam line 350. The third ion source 340 communicates with the central control system 310 through a third source-controlling electronic connection 356. The third beam steering device 346 communicates with the central control system 310 through a third magnet-controlling electronic connection 348. Finally, the combined beam from the first ion beam 322, the second ion beam 332, and the third ion beam 342 is accelerated through an acceleration device 360 and eventually bombards a target in a target chamber 370.

[0040] FIG. 7 shows the beam current as a function of time as collected in the target chamber 370. This function represents the combined beam from the first ion beam 322, the second ion beam 332, and the third ion beam 342. The beam from each individual ion source appears as a pulsed beam and lasts only a short time period. There is a phase difference among all ion sources, in a way that each pulse is evenly spaced as a function of time.

[0041] FIG. 8 plots the electric current for powering the first beam steering device 328, the second beam steering device 338, and the third beam steering device 348. As indicated by dashed lines, the beam current from an ion source and the electric current for powering the corresponding bending magnet are synchronized. When the beam is on, the bending magnet is on. Therefore, the first ion beam 322, the second ion beam 332, and the third ion beam 342 are steered to the shared beam line 350. When one individual beam from a specific ion source is steered into the shared beam line, there are no other beams in the shared beam line, and steering will not cause any beam loss.

[0042] It is crucial for the present invention that each ion source operates as a pulsed beam, rather than a continuous beam. If each ion source were to create a continuous beam, steering one beam from one ion source into the shared beam line would steer any preexisting beam in the beam line off. Consequently, the combined beam would always equal the beam from one individual ion source, instead of a combination of three sources.

[0043] The examples provided above serve to illustrate the present invention. In practical applications, the number of ion sources and bending magnets is not limited to three but can increase significantly, for instance, up to 20. Moreover, it is not essential for all beam currents from the same source to be spaced evenly between consecutive pulses. Similarly, the electric current for bending magnets does not need to have the same pulse frequency and pulse width as the beam current from the ion source. The pulse width of the electric current for the bending magnet can be wider than that of the ion beam current from the corresponding ion sources. Additionally, it is not necessary for each pulse to follow a box-like shape; pulses can have spike-like shapes.

[0044] Some exemplary embodiments are described in the following:

[0045] • High-Frequency, Low Duty Cycle Configuration: In one embodiment, each ion source operates with a 5% duty factor at 100 Hertz (Hz), generating beam pulses every 0.1 seconds with an active duration of approximately 0.005 seconds. This setup allows for up to 20 pulses in each 0.1 -second interval, with one pulse per ion source and the possibility of including up to 19 additional sources, thereby potentially increasing the duty factor to near 100%.

[0046] • Three-Source Combined Duty Factor Enhancement: In another embodiment, three linked ion sources each have a 4% duty factor, with an active pulse duration of 0.04 seconds followed by an off period of 0.96 seconds. The collective operation of these three sources elevates the combined beam duty factor to 12%, significantly enhancing the system's efficiency.

[0047] • Optimized Beam Pattern: After combining outputs from multiple sources, the system achieves an optimized beam pattern characterized by continuous operation, where the beam is on for 0.04 seconds within every cycle defined by the sum of active and inactive periods. This pattern results in an improved, more efficient beam delivery for targeted applications.

[0048] Acceleration devices positioned after the ion source complexes are used to increase the beam energies up to 1 GeV. For isotope production, the typical beam energy is greater than 1 MeV. The acceleration devices can be drift tube accelerators, radiofrequency quadrupole accelerators, or a combination of both radiofrequency quadrupole and drift tube accelerators. Another option includes a tandem-based accelerator, in which the ion is accelerated to the center of the tank and then continuously accelerated after switching the charge status from negative to positive. The ion beam eventually bombards the target for various ion beam applications. To ensure high beam quality, beam focusing systems can be added immediately after the ion source complex or after the acceleration device. It is not necessary to have the target chamber positioned directly at the end of the shared beam line. In practice, a bending magnet is used to direct the beam to a specific target chamber. It is also feasible to have multiple target chambers in parallel configurations, allowing the beam to be steered into one specific target chamber.

[0049] Using a bending magnet to steer beams has certain limitations on device switching speed and frequencies. The magnet-based approach cannot switch at an ultrafast speed. Alternatively, an electric field-based beam deflector can be used. In comparison with magnetic bending, the electrostatic field deflector can switch at a high speed.

[0050] The current design applies to two applications. In one, all ion sources deliver the same kind of ion species, resulting in a combined ion beam containing only one type of ion species. In the other application, each ion source can deliver different ion species, and the combined ion beam is a mixture of different types.

[0051] The drift tube accelerator is specific to ion species. However, the design allows the possibility to accelerate two different kinds of species. Examples include proton and deuteron, or deuteron and helium. Therefore, the ion source can potentially provide a strong beam of a single ion species to the target or a strong beam of a mixture containing two different ion species.

[0052] The beam bending magnet can selectively bend the desired ion species through specific settings, filtering out the unwanted species. In another embodiment, the bending magnet can switch from one setup to another to catch all pulse beams of different kinds. For a specific target chamber attached to one beamline after the bending magnet, it is feasible to switch from one kind of ion species to another during the same cycle of isotope production.

[0053] Aspects of Invention A first aspect disclosed about the present invention is a method for creating a high-current ion accelerator, which comprises the steps of: positioning multiple ion sources, each ion source capable of producing a pulsed ion beam; using bending magnets to bend the ion beams from each individual ion source into a shared beam line; activating the bending magnet positioned after a specific ion source to steer its beam into the shared beam line, ensuring no other beams are present in the shared beam line when steering occurs; both ion sources and bending magnets are operated under a pulsed model; synchronizing the bending magnets and ion sources through a centralized or distributed control system, allowing the combination of ion beams from each individual ion source into the shared beam line; and accelerating the combined beam in the shared beam line through an acceleration device to a final beam energy and bombarding the beam with targets.

[0054] A second aspect based on the first aspect is that positioning multiple ion sources includes positioning multiple ion sources in parallel, at least on one side of the shared beam line.

[0055] A third aspect based on the first aspect is that the pulsed beam from an individual ion source has a pulse width ranging from 1 microsecond to 100 seconds, wherein the time duration between two neighboring pulses ranges from 1 microsecond to 100 seconds.

[0056] A fourth aspect based on the first aspect is that the pulsed beams are produced from ions selected from the group consisting of proton, deuterium, helium, and tritium.

[0057] A fifth aspect based on the first aspect is that the pulsed beams are produced from ions selected from a combination of the groups consisting of proton and deuterium.

[0058] A sixth aspect based on the first aspect is that the pulsed beams are produced from ions selected from a combination of the groups consisting of deuterium and helium.

[0059] A seventh aspect based on the first aspect is that the pulsed beams are produced from ions selected from a group or combination of the groups changes one or more times during a given operation cycle.

[0060] An eighth aspect based on the first aspect is that the beam consists of negatively charged ions. A ninth aspect based on the first aspect is that the ions consist of either single ions or molecular ions.

[0061] A tenth aspect based on the first aspect is that the final beam energy ranges from 1 MeV (Mega-electron-volts) to 1 GeV (Giga-electron-volts).

[0062] An eleventh aspect based on the first aspect is that the acceleration device includes at least one drift tube accelerator.

[0063] A twelfth aspect based on the first aspect is that the acceleration device includes at least one radio frequency quadrupole accelerator.

[0064] A thirteenth aspect based on the first aspect is that the beam current pulse height from each individual ion source is at least 10 milliamperes.

[0065] A fourteenth aspect based on the first aspect is that the combined beam possesses a duty factor greater than 5%, wherein the duty factor is defined as the fraction of time during which there is a beam bombarding the target.

[0066] A fifteenth aspect disclosed about the present invention is that a method for creating a high-current ion accelerator, which comprises the steps of: positioning multiple ion sources, each ion source capable of producing a pulsed ion beam; using electrostatic beam deflectors to bend the ion beams from each individual ion source into a shared beam line; activating the electrostatic beam deflector positioned after a specific ion source to steer its beam into the shared beam line, ensuring no other beams are present in the shared beam line when steering occurs; both ion sources and electrostatic beam deflectors are operated under a pulsed model; synchronizing the electrostatic beam deflectors and ion sources through a centralized control system, allowing the combination of ion beams from each individual ion source into the shared beam line; and accelerating the combined beam in the shared beam line through an acceleration device to a final beam energy and bombarding the beam with targets.

[0067] Although the invention has been explained in relation to its preferred embodiment, it is to be understood that many other possible modifications and variations can be made without departing from the spirit and scope of the invention as hereinafter claimed. REFERENCES

[0068] Robert E. Klinkowstein, Ruth Shefer, "Electrostatic Ion Accelerator", U.S. Patent 4,812,775, March 14, 1989.

[0069] I. L. Morgan, F. D. McDaniel, P. Grande, J. M. Watson, "Multiple Target, Multiple Energy Radioisotope Production", U.S. Patent 6,444,990 Bl, September 3, 2002. K. Saadatmand, J.E. Hebert, and N.C. Okay in "RF Volume H- Ion Source for the

[0070] Superconducting Super Collider", AIP Conference Proceedings 287, pages 448-457 (1992).

Claims

What is claimed is:

1. A method of generating a high throughput ion beam, the method comprising the steps of:(A) providing a plurality of ion sources, a plurality of beam steering devices, a shared beam line, an acceleration device, and a target chamber, wherein a plurality of pulsed ion beams is produced by the ion sources, and wherein each pulsed ion beam is associated with a corresponding ion source from the plurality of ion sources and a corresponding beam steering devices from the plurality of beam steering devices;(B) generating each pulsed ion beam with the corresponding ion source;(C) guiding each pulsed ion beam into the shared beam line with the corresponding beam steering device;(D) synchronizing a pulse width of each pulsed ion beam to enter the shared beam line without intersecting the pulse width of any other pulsed ion beam from the plurality of pulsed ion beams during steps (B) and (C) by coordinating an activation timing of each ion source and an activation timing of each beam steering device;(E) accelerating a combined beam to a final beam energy with the acceleration device, wherein the combined beam is a compilation of the pulsed ion beams in the shared beam line; and(F) bombarding the combined beam into a target within the target chamber.

2. The method as claimed in claim 1, wherein a plurality of individual beam lines is provided with the plurality of pulsed ion beams, and wherein each pulsed ion beam travels from the corresponding ion source to the corresponding beam steering device through a corresponding individual beam line from the plurality of individual beam lines, and wherein the plurality of individual beam lines is arranged on one lateral side of the shared beam line, and wherein the plurality of individual beam lines is arranged in parallel.

3. The method as claimed in claim 1 further comprising the steps of:providing a central controller, wherein each ion source and each beam steering device are communicably coupled with the central controller; and coordinating the activation timing of each ion source and the activation timing of each beam steering device with the central controller during step (D).

4. The method as claimed in claim 1, wherein the pulse width of each pulsed ion beam ranges from 1 microsecond to 100 seconds.

5. The method as claimed in claim 1, wherein a pulse interval of each pulsed ion beam ranges from 1 microsecond to 100 seconds.

6. The method as claimed in claim 1, wherein the pulsed ion beams are composed of proton ions.

7. The method as claimed in claim 1, wherein the pulsed ion beams are composed of deuterium ions.

8. The method as claimed in claim 1, wherein the pulsed ion beams are composed of tritium ions.

9. The method as claimed in claim 1, wherein the pulsed ion beams are composed of helium ions.

10. The method as claimed in claim 1, wherein the pulsed ion beams are composed of a combination of proton ions and deuterium ions.

11. The method as claimed in claim 1, wherein the pulsed ion beams are composed of a combination of deuterium ions and helium ions.

12. The method as claimed in claim 1, wherein the pulsed ion beams are composed of different ions during different periods of an operation cycle.

13. The method as claimed in claim 1, wherein the pulsed ion beams are composed of single ions or molecular ions.

14. The method as claimed in claim 1, wherein the final beam energy ranges from 1 Mega-electron-volts (MeV) to 1 Giga-electron-volts (GeV).

15. The method as claimed in claim 1, wherein the acceleration device includes at least one drift tube accelerator.

16. The method as claimed in claim 1, wherein the acceleration device includes at least one radio frequency quadrupole accelerator.

17. The method as claimed in claim 1, wherein a pulse height of each pulsed ion beam is greater than 10 milliamperes (mA).

18. The method as claimed in claim 1, wherein a duty factor of the combined beam is greater than 5%, and wherein a definition of the duty factor is a fraction of time that the combined beam is bombarding the target.

19. The method as claimed in claim 1, wherein each beam steering device is a bending magnet.

20. The method as claimed in claim 1, wherein each beam steering device is an electrostatic beam deflector.

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