Composition, film, optical filter, solid-state image sensing device, image display, infrared sensor, camera module, and compound

Abstract

This composition contains a coloring material, a curable compound, and a solvent. The coloring material contains a compound represented by formula (1). Also provided are a film, an optical filter, a solid-state image sensing device, an image display, an infrared sensor, and a camera module, each comprising the composition.

Description

Composition, film, optical filter, solid-state imaging device, image display device, infrared sensor, camera module, and compound

[0001] The present invention relates to a composition containing a colorant. The present invention also relates to a film, an optical filter, a solid-state imaging device, an image display device, an infrared sensor, and a camera module using the composition containing the colorant. The present invention also relates to a compound.

[0002] BACKGROUND ART Optical filters such as infrared cut filters are produced using compositions containing coloring materials.

[0003] Patent Document 1 describes the use of a cyanine compound that has a maximum absorption in the wavelength range of 400 nm to 1100 nm in methanol in an optical filter.

[0004] Japanese Patent Application Laid-Open No. 2008-088426

[0005] Since the band gap of a dye compound narrows as the absorption wavelength shifts to longer wavelengths, it has been difficult to achieve a HOMO (Highest Occupied Molecular Orbital)-LUMO (Lowest Unoccupied Molecular Orbital) level that allows for compatibility with various resistances (heat, light, radicals, oxidation, reduction, etc.) Therefore, further improvements in the heat resistance of films obtained using dye compounds, such as infrared-absorbing colorants, whose maximum absorption wavelengths are at longer wavelengths are desired.

[0006] Therefore, an object of the present invention is to provide a composition capable of forming a film having excellent heat resistance. Another object of the present invention is to provide a film, an optical filter, a solid-state imaging device, an image display device, an infrared sensor, a camera module, and a compound.

[0007] The present invention provides the following:

[0008] <1> A composition comprising a colorant, a curable compound, and a solvent, wherein the colorant comprises a compound represented by formula (1); In formula (1), R １ ~R ６ each independently represents a hydrogen atom or a substituent; １ and X２ are each independently N or C—R Ｘ１ represents R Ｘ１ represents an electron-withdrawing group, Ar １ and Ar ２ each independently represents an aryl group or a heteroaryl group; １ and Y ２ are each independently a hydrogen atom, an alkyl group, an aryl group, a heteroaryl group, or —BR Ｙ１ R Ｙ２ or a metal atom, R Ｙ１ and R Ｙ２ each independently represents a hydrogen atom or a substituent, R Ｙ１ and R Ｙ２ may be bonded to form a ring. １ and Y ２ are each independently a hydrogen atom or -BR Ｙ１ R Ｙ２ <3> The composition according to <1>, wherein Y in the above formula (1) is １ and Y ２ However, each independently -BR Ｙ１ R Ｙ２ <4> The composition according to any one of <1> to <3>, wherein the maximum absorption wavelength of the compound represented by formula (1) is in the wavelength range of 800 to 1400 nm. <5> A film obtained using the composition according to any one of <1> to <4>. <6> An optical filter having the film according to <5>. <7> A solid-state imaging device having the film according to <5>. <8> An image display device having the film according to <5>. <9> An infrared sensor having the film according to <5>. <10> A camera module having the film according to <5>. <11> A compound represented by formula (1); In formula (1), R １ ~R ６ each independently represents a hydrogen atom or a substituent; １ and X ２ are each independently N or C—R Ｘ１ represents R Ｘ１ represents an electron-withdrawing group, Ar １ and Ar２ each independently represents an aryl group or a heteroaryl group; １ and Y ２ are each independently a hydrogen atom, an alkyl group, an aryl group, a heteroaryl group, or —BR Ｙ１ R Ｙ２ or a metal atom, R Ｙ１ and R Ｙ２ each independently represents a hydrogen atom or a substituent, R Ｙ１ and R Ｙ２ may be bonded to form a ring.

[0009] According to the present invention, a composition capable of forming a film having excellent heat resistance can be provided. Furthermore, according to the present invention, a film, an optical filter, a solid-state imaging device, an image display device, an infrared sensor, a camera module, and a compound can be provided.

[0010] FIG. 1 is a schematic diagram illustrating an embodiment of an infrared sensor.

[0011] The present invention will be described in detail below. In this specification, the term "to" is used to mean that the numerical values ​​before and after the term are included as the lower and upper limits. In the description of groups (atomic groups) in this specification, a term without specifying whether it is substituted or unsubstituted encompasses both unsubstituted groups (atomic groups) and substituted groups (atomic groups). For example, the term "alkyl group" encompasses not only unsubstituted alkyl groups (unsubstituted alkyl groups) but also substituted alkyl groups (substituted alkyl groups). In this specification, unless otherwise specified, "exposure" includes not only exposure using light but also drawing using particle beams such as electron beams and ion beams. Examples of light used for exposure include the bright line spectrum of a mercury lamp, far ultraviolet light typified by excimer lasers, extreme ultraviolet light (EUV light), X-rays, electron beams, and other actinic rays or radiation. As used herein, "(meth)acrylate" refers to either or both of acrylate and methacrylate, "(meth)acrylic" refers to either or both of acrylic and methacrylic, and "(meth)acryloyl" refers to either or both of acryloyl and methacryloyl. In the structural formulae herein, Me refers to a methyl group, Et refers to an ethyl group, Bu refers to a butyl group, and Ph refers to a phenyl group. As used herein, infrared radiation refers to light (electromagnetic waves) with a wavelength of 700 to 2500 nm. As used herein, weight-average molecular weight and number-average molecular weight are polystyrene-equivalent values ​​measured by GPC (gel permeation chromatography). As used herein, total solids refers to the total mass of all components of a composition excluding the solvent. As used herein, pigment refers to a colorant that is difficult to dissolve in a solvent. In this specification, the term "process" includes not only an independent process but also a process that cannot be clearly distinguished from other processes as long as the intended effect of the process is achieved.

[0012] <Composition> The composition of the present invention contains a colorant, a curable compound, and a solvent, and is characterized in that the colorant contains a compound represented by formula (1).

[0013] The composition of the present invention can form a film with excellent heat resistance. The reason for this effect is presumed to be as follows. The composition of the present invention contains a compound represented by formula (1), and it is presumed that this compound can form strong associations in the film due to the high planarity of the mother nucleus. For this reason, it is presumed that the composition of the present invention can form a film with excellent heat resistance.

[0014] Furthermore, since the compound represented by formula (1) can form strong aggregates in a film, a film having excellent light resistance can be formed by using the composition of the present invention.

[0015] The composition of the present invention is preferably used as a composition for an optical filter. Examples of optical filters include color filters, infrared transmission filters, and infrared cut filters. Since the compound represented by formula (1) has excellent visible transparency and infrared shielding properties, the composition of the present invention is particularly preferably used as a composition for an infrared cut filter.

[0016] The solids concentration of the composition of the present invention is preferably 5 to 30% by mass. The lower limit is preferably 7.5% by mass or more, more preferably 10% by mass or more. The upper limit is preferably 25% by mass or less, more preferably 20% by mass or less, and even more preferably 15% by mass or less.

[0017] Each component used in the composition of the present invention will be described below.

[0018] <<Colorant>> The composition of the present invention contains a colorant.

[0019] (Specific Compound) The composition of the present invention contains a compound represented by formula (1) as a coloring material. The compound represented by formula (1) is also the compound of the present invention. Hereinafter, the compound represented by formula (1) will also be referred to as the specific compound. In formula (1), R １ ~R ６ each independently represents a hydrogen atom or a substituent; １ and X ２ are each independently N or C—R Ｘ１ represents R Ｘ１represents an electron-withdrawing group, Ar １ and Ar ２ each independently represents an aryl group or a heteroaryl group; １ and Y ２ are each independently a hydrogen atom, an alkyl group, an aryl group, a heteroaryl group, or —BR Ｙ１ R Ｙ２ or a metal atom, R Ｙ１ and R Ｙ２ each independently represents a hydrogen atom or a substituent, R Ｙ１ and R Ｙ２ may be bonded to form a ring.

[0020] -R １ ~R ６ Regarding - R in formula (1) １ ~R ６ R each independently represents a hydrogen atom or a substituent. １ ~R ６ Examples of the substituent represented by include the groups exemplified as the substituent T described later and the group represented by formula (R-100) described later.

[0021] R in formula (1) １ and R ２ are each independently preferably an alkyl group, an aryl group or a heteroaryl group, and more preferably an aryl group. １ and R ２ The number of carbon atoms in the alkyl group in the formula (R) is preferably 1 to 30, and more preferably 1 to 20. The alkyl group may have a substituent or may be unsubstituted. Examples of the substituent include the groups listed as the substituent T described later and the group represented by formula (R-100) described later. R １ and R ２The number of carbon atoms in the aryl group in the formula (R-100) is preferably 6 to 40, more preferably 6 to 30, and even more preferably 6 to 20. The aryl group may have a substituent or may be unsubstituted. Examples of the substituent include the groups listed as substituent T described later and a group represented by formula (R-100) described later, and an alkyl group, an alkoxy group, a hydroxy group, or a group represented by formula (R-100) described later is preferred. The aryl group preferably has a substituent, and is more preferably an aryl group having an alkyl group, an alkoxy group, a hydroxy group, or a group represented by formula (R-100) described later as a substituent. R １ and R ２ The number of carbon atoms constituting the ring of the heteroaryl group in the formula (I) is preferably 1 to 15, and more preferably 1 to 10. Examples of heteroatoms constituting the ring of the heteroaryl group include a nitrogen atom, an oxygen atom, and a sulfur atom. The number of heteroatoms constituting the ring of the heteroaryl group is preferably 1 to 3. The heteroaryl group may be a monocyclic ring or a fused ring. The heteroaryl group may have a substituent or may be unsubstituted. Examples of the substituent include the groups exemplified as the substituent T described below and the group represented by formula (R-100) described below, and an alkyl group, an alkoxy group, a hydroxy group, or a group represented by formula (R-100) described below is preferred.

[0022] R in formula (1) ３ ~R ６ are each preferably independently a hydrogen atom, an alkyl group, an aryl group, a heteroaryl group, or a group represented by formula (R-100) described below, and more preferably a hydrogen atom.

[0023] -X １ and X ２ Regarding - X in formula (1) １ and X ２ are each independently N or C—R Ｘ１ represents R Ｘ１ represents an electron-withdrawing group.

[0024] R Ｘ１Examples of the electron-withdrawing group represented by are groups having a Hammett's substituent constant σp value of 0.25 or more, preferably a group having a σp value of 0.30 or more, and more preferably a group having a σp value of 0.35 or more. There is no particular upper limit for the σp value, but it is preferably 0.80 or less.

[0025] Hammett's substituent constant σ value will be explained. Hammett's rule is an empirical rule proposed by L. P. Hammett in 1935 to quantitatively discuss the influence of substituents on the reaction or equilibrium of benzene derivatives, and it is now widely recognized as valid. The substituent constants calculated by Hammett's rule include σp and σm values, and these values ​​can be found in many general textbooks. For example, see "Lange's Handbook of Chemistry," 12th Edition, 1979 (McGraw-Hill), edited by J. A. Dean; "Chemical Domain" Special Edition, No. 122, pp. 96-103, 1979 (Nankodo); and Chem. Rev., Vol. 91, pp. 165-195, 1991. Hammett's substituent constant σp value is described in detail in Hansch et al. , Chemical Reviews, 1991, Vol. 91, No. 2, 165-195) can be referenced. Furthermore, the Hammett's substituent constant σp value can be calculated from the difference in pKa from benzoic acid using ACD / ChemSketch (ACD / Labs 8.00 Release Product Version: 8.08). In this specification, the Hammett's substituent constant σp value for a substituent is the value described in the above-mentioned document. On the other hand, for the value of Hammett's substituent constant σp value for a substituent not described in the above document, a value calculated from the difference with the pKa of benzoic acid using ACD / ChemSketch (ACD / Labs 8.00 Release Product Version: 8.08) is used.

[0026] R Ｘ１ The electron-withdrawing group represented by is a cyano group, a nitro group, a carboxy group, a sulfo group, a phosphate group, -SR ｉ１ , -SO ２ R ｉ１, -OSO ２ R ｉ１ Alternatively, it is preferably a halogen atom, and more preferably a cyano group. ｉ１ represents a substituent. ｉ１ The substituent represented by the formula (I) includes an alkyl group, an aryl group, and a heteroaryl group.

[0027] -Ar １ and Ar ２ Regarding Ar in formula (1) １ and Ar ２ are each independently an aryl group or a heteroaryl group, and are preferably a heteroaryl group. These groups may have a substituent or may be unsubstituted. Examples of the substituent include the groups listed as substituent T described later and a group represented by formula (R-100) described later, and are preferably a halogen atom, an alkyl group, an alkoxy group, an aryl group, an aryloxy group, a heteroaryl group, a heteroaryloxy group, a hydroxy group, or a group represented by formula (R-100) described later.

[0028] Ar １ and Ar ２ The aryl group represented by the formula (I) preferably has 6 to 40 carbon atoms, more preferably 6 to 30 carbon atoms, and even more preferably 6 to 20 carbon atoms.

[0029] Ar １ and Ar ２ The number of carbon atoms constituting the ring of the heteroaryl group represented by is preferably 1 to 15, and more preferably 1 to 10. Types of heteroatoms constituting the ring of the heteroaryl group include a nitrogen atom, an oxygen atom, and a sulfur atom. The number of heteroatoms constituting the ring of the heteroaryl group is preferably 1 to 3. The heteroaryl group may be a monocyclic ring or a fused ring.

[0030] Ar １ and Ar ２ The heteroaryl group represented by is preferably a group represented by the following formula (Har-1) to formula (Har-10).

[0031] In the formula, R ａ１ ~R ａ４９Each independently represents a hydrogen atom or a substituent, and * represents a linking hand. ａ１ ~R ａ４９ Examples of the substituent represented by include the groups exemplified as the substituent T described later and the group represented by formula (R-100) described later, and are preferably a halogen atom, an alkyl group, an alkoxy group, an aryl group, an aryloxy group, a heteroaryl group, a heteroaryloxy group, a hydroxy group, or a group represented by formula (R-100) described later.

[0032] In formula (Har-1), R ａ１ and R ａ２ , R ａ２ and R ａ３ , R ａ３ and R ａ４ may be bonded to each other to form a ring. ａ５ and R ａ６ , R ａ６ and R ａ７ , R ａ７ and R ａ８ may be bonded to each other to form a ring. ａ９ and R ａ１０ , R ａ１０ and R ａ１１ , R ａ１１ and R ａ１２ , R ａ１２ and R ａ１３ may be bonded to each other to form a ring. ａ１５ and R ａ１６ , R ａ１６ and R ａ１７ , R ａ１７ and R ａ１８ may be bonded to each other to form a ring. ａ１９ and R ａ２０ , R ａ２０ and R ａ２１ , R ａ２１ and R ａ２２ , R ａ２２ and R ａ２３ , R ａ２３ and R ａ２４ may be bonded to each other to form a ring. ａ２５ and R ａ２６ , R ａ２６and R ａ２７ may be bonded to each other to form a ring. ａ２８ and R ａ２９ , R ａ２９ and R ａ３０ , R ａ３０ and R ａ３１ may be bonded to each other to form a ring. ａ３２ and R ａ３３ , R ａ３３ and R ａ３４ , R ａ３４ and R ａ３５ , R ａ３５ and R ａ３６ , R ａ３６ and R ａ３７ may be bonded to each other to form a ring. ａ３８ and R ａ３９ , R ａ３９ and R ａ４０ , R ａ４０ and R ａ４１ , R ａ４１ and R ａ４２ , R ａ４２ and R ａ４３ may be bonded to each other to form a ring. ａ４４ and R ａ４５ , R ａ４５ and R ａ４６ , R ａ４６ and R ａ４７ , R ａ４７ and R ａ４８ , R ａ４８ and R ａ４９ may be bonded to each other to form a ring.

[0033] In formulae (Har-1) to (Har-10), the ring formed by bonding the above groups together is preferably a 5-membered or 6-membered ring.

[0034] -Y １ and Y ２ Regarding Y in formula (1) １ and Y ２ are each independently a hydrogen atom, an alkyl group, an aryl group, a heteroaryl group, or —BR Ｙ１ R Ｙ２ or a metal atom, R Ｙ１ and RＹ２ each independently represents a hydrogen atom or a substituent, R Ｙ１ and R Ｙ２ may be bonded to form a ring.

[0035] Y １ and Y ２ The number of carbon atoms in the alkyl group represented by is preferably 1 to 30, more preferably 1 to 20, even more preferably 1 to 10, still more preferably 1 to 5, and particularly preferably 1 to 3. The alkyl group may be linear, branched, or cyclic, but is preferably linear or branched, and more preferably linear. The alkyl group may have a substituent or may be unsubstituted. Examples of the substituent include the groups listed as substituent T described below and the group represented by formula (R-100) described below.

[0036] Y １ and Y ２ The number of carbon atoms in the aryl group represented by is preferably 6 to 30, more preferably 6 to 20, and still more preferably 6 to 12. The aryl group may have a substituent or may be unsubstituted. Examples of the substituent include the groups exemplified as the substituent T described later and the group represented by formula (R-100) described later.

[0037] Y １ and Y ２ The number of carbon atoms constituting the ring of the heteroaryl group represented by is preferably 1 to 15, and more preferably 1 to 10. Types of heteroatoms constituting the ring of the heteroaryl group include a nitrogen atom, an oxygen atom, and a sulfur atom. The number of heteroatoms constituting the ring of the heteroaryl group is preferably 1 to 3. The heteroaryl group may be a monocyclic ring or a fused ring. The heteroaryl group may have a substituent or may be unsubstituted. Examples of the substituent include the groups listed as substituent T described below and the group represented by formula (R-100) described below.

[0038] Y １ and Y ２Examples of the metal atom represented by include magnesium, aluminum, calcium, barium, zinc, tin, vanadium, iron, cobalt, nickel, copper, palladium, iridium and platinum, and aluminum, zinc, vanadium, iron, copper, palladium, iridium or platinum is preferred.

[0039] -BR Ｙ１ R Ｙ２ R in the group represented by Ｙ１ and R Ｙ２ Each of R independently represents a hydrogen atom or a substituent. Examples of the substituent include the groups listed as the substituent T described below. Ｙ１ and R Ｙ２ are each independently preferably a hydrogen atom, a halogen atom, an alkyl group, an alkenyl group, an aryl group, a heteroaryl group, an alkoxy group, an aryloxy group, or a heteroaryloxy group, more preferably a halogen atom, an alkyl group, an aryl group, or a heteroaryl group, further preferably a halogen atom, an alkyl group, or an aryl group, and particularly preferably an aryl group.

[0040] R Ｙ１ and R Ｙ２ Examples of the halogen atom represented by R include a fluorine atom, a chlorine atom, a bromine atom, and an iodine atom, and a fluorine atom is preferred. Ｙ１ and R Ｙ２ The number of carbon atoms in the alkyl group and alkoxy group represented by R is preferably 1 to 40, more preferably 1 to 30, and even more preferably 1 to 20. The alkyl group and alkoxy group may be linear, branched, or cyclic, but linear or branched groups are preferred. The alkyl group and alkoxy group may have a substituent or may be unsubstituted. Examples of the substituent include an aryl group, a heteroaryl group, and a halogen atom. R Ｙ１ and R Ｙ２ The number of carbon atoms in the alkenyl group represented by R is preferably 2 to 40, more preferably 2 to 30, and even more preferably 2 to 20. The alkenyl group may have a substituent or may be unsubstituted. Examples of the substituent include an alkyl group, an alkoxy group, an aryl group, a heteroaryl group, and a halogen atom. Ｙ１and R Ｙ２ The number of carbon atoms in the aryl group and aryloxy group represented by R is preferably 6 to 20, and more preferably 6 to 12. The aryl group and aryloxy group may have a substituent or may be unsubstituted. Examples of the substituent include an alkyl group, an alkoxy group, and a halogen atom. Ｙ１ and R Ｙ２ The number of carbon atoms constituting the ring of the heteroaryl group and heteroaryloxy group represented by is preferably 1 to 15, and more preferably 1 to 10. Types of heteroatoms constituting the ring of the heteroaryl group and heteroaryloxy group include a nitrogen atom, an oxygen atom, and a sulfur atom. The number of heteroatoms constituting the ring of the heteroaryl group and heteroaryloxy group is preferably 1 to 3, and more preferably 1 to 2. The heteroaryl group and heteroaryloxy group may be a monocyclic ring or a fused ring. The heteroaryl group and heteroaryloxy group may have a substituent or may be unsubstituted. Examples of the substituent include an alkyl group, an alkoxy group, and a halogen atom.

[0041] -BR Ｙ１ R Ｙ２ R of a group represented by Ｙ１ and R Ｙ２ may be bonded to each other to form a ring. Examples of the ring formed include structures shown in the following formulae (B-1) to (B-5). In the following, Rb represents a substituent, and Rb １ ~Rb ４ each independently represents a hydrogen atom or a substituent, b1 to b3 each independently represents an integer of 0 to 4, b4 represents an integer of 0 to 6, and * represents a linking bond. Rb and Rb １ ~Rb ４ Examples of the substituent represented by include the groups exemplified as the substituent T described later and the group represented by formula (R-100) described later, and a halogen atom, an alkyl group or an alkoxy group is preferred.

[0042] Y in formula (1) １ and Y ２ are each independently a hydrogen atom or -BR Ｙ１ RＹ２ It is preferable that the compound is -BR because it has good heat resistance and light resistance, and furthermore, the maximum absorption wavelength is on the longer wavelength side, and a film having excellent infrared shielding properties can be formed. Ｙ１ R Ｙ２ It is more preferable that:

[0043] -Regarding the Substituent T- Examples of the substituent T include the following groups: a halogen atom (for example, a fluorine atom, a chlorine atom, a bromine atom, or an iodine atom), an alkyl group (preferably an alkyl group having 1 to 30 carbon atoms), a cycloalkyl group (preferably a cycloalkyl group having 5 to 30 carbon atoms), an alkenyl group (preferably an alkenyl group having 2 to 30 carbon atoms), an alkynyl group (preferably an alkynyl group having 2 to 30 carbon atoms), an aryl group (preferably an aryl group having 6 to 30 carbon atoms), a heteroaryl group (preferably a heteroaryl group having 1 to 30 carbon atoms), an amino group (preferably an amino group having 0 to 30 carbon atoms), and an alkoxy group. (preferably an alkoxy group having 1 to 30 carbon atoms), an aryloxy group (preferably an aryloxy group having 6 to 30 carbon atoms), a heteroaryloxy group (preferably a heteroaryloxy group having 1 to 30 carbon atoms), an acyl group (preferably an acyl group having 2 to 30 carbon atoms), an alkoxycarbonyl group (preferably an alkoxycarbonyl group having 2 to 30 carbon atoms), an aryloxycarbonyl group (preferably an aryloxycarbonyl group having 7 to 30 carbon atoms), a heteroaryloxycarbonyl group (preferably a heteroaryloxycarbonyl group having 2 to 30 carbon atoms), a carbonyl group), an acyloxy group (preferably an acyloxy group having 2 to 30 carbon atoms), an acylamino group (preferably an acylamino group having 2 to 30 carbon atoms), an aminocarbonylamino group (preferably an aminocarbonylamino group having 2 to 30 carbon atoms), an alkoxycarbonylamino group (preferably an alkoxycarbonylamino group having 2 to 30 carbon atoms), an aryloxycarbonylamino group (preferably an aryloxycarbonylamino group having 7 to 30 carbon atoms), a sulfamoyl group (preferably a sulfamoyl group having 0 to 30 carbon atoms), a sulfamoyl group an arylamino group (preferably a sulfamoylamino group having 0 to 30 carbon atoms), a carbamoyl group (preferably a carbamoyl group having 1 to 30 carbon atoms), an alkylthio group (preferably an alkylthio group having 1 to 30 carbon atoms), an arylthio group (preferably an arylthio group having 6 to 30 carbon atoms), a heteroarylthio group (preferably a heteroarylthio group having 1 to 30 carbon atoms), an alkylsulfonyl group (preferably an alkylsulfonyl group having 1 to 30 carbon atoms), an alkylsulfonylamino group (preferably an alkylsulfonylamino group having 1 to 30 carbon atoms),An arylsulfonyl group (preferably an arylsulfonyl group having 6 to 30 carbon atoms), an arylsulfonylamino group (preferably an arylsulfonylamino group having 6 to 30 carbon atoms), a heteroarylsulfonyl group (preferably a heteroarylsulfonyl group having 1 to 30 carbon atoms), a heteroarylsulfonylamino group (preferably a heteroarylsulfonylamino group having 1 to 30 carbon atoms), an alkylsulfinyl group (preferably an alkylsulfinyl group having 1 to 30 carbon atoms), an arylsulfinyl group (preferably an arylsulfonylamino group having 6 to 30 carbon atoms), a phenyl group), a heteroarylsulfinyl group (preferably a heteroarylsulfinyl group having 1 to 30 carbon atoms), a ureido group (preferably a ureido group having 1 to 30 carbon atoms), a hydroxy group, a nitro group, a carboxy group, a sulfo group, a phosphate group, a carboxylic acid amide group, a sulfonic acid amide group, an imido group, a phosphino group, a mercapto group, a cyano group, an alkylsulfino group, an arylsulfino group, an arylazo group, a heteroarylazo group, a phosphinyl group, a phosphinyloxy group, a phosphinylamino group, a silyl group, a hydrazino group, and an imino group. When these groups are further substitutable, they may further have a substituent. Examples of the substituent include the groups described above for the substituent T and a group represented by formula (R-100).

[0044] -Regarding the group represented by formula (R-100)- -L ｔ１ - (A ｔ１ ) ｎ ...(R-100) In formula (R-100), L ｔ１ represents a single bond or an (n+1)-valent linking group; ｔ１ represents an acid group or a basic group, n represents an integer of 1 to 4, L ｔ１ is a single bond, then n is 1.

[0045] L in formula (R-100) ｔ１ represents a single bond or an (n+1)-valent linking group. ｔ１ When is a basic group, L ｔ１ is preferably an (n+1)-valent linking group.

[0046] L ｔ１The n+1-valent linking group represented by the formula (I) includes an aliphatic hydrocarbon group, an aromatic hydrocarbon group, a heterocyclic group, —O—, —S—, —CO—, —COO—, —OCO—, —SO ２ -, -NR Ｌ１０ -, -N<, -NR Ｌ１０ CO-, -CONR Ｌ１０ -, -NR Ｌ１０ SO ２ -, -SO ２ NR Ｌ１０ - and groups formed by combinations thereof. Ｌ１０ represents a hydrogen atom, an alkyl group, or an aryl group.

[0047] The aliphatic hydrocarbon group may be a saturated aliphatic hydrocarbon group or an unsaturated aliphatic hydrocarbon group. The aliphatic hydrocarbon group may be linear, branched, or cyclic. The aliphatic hydrocarbon group preferably has 1 to 30 carbon atoms, more preferably 1 to 20, even more preferably 1 to 10, and particularly preferably 1 to 5. The aromatic hydrocarbon group preferably has 6 to 20 carbon atoms, more preferably 6 to 12, and even more preferably 6. The heterocyclic group is preferably a monocyclic ring or a fused ring with 2 to 4 condensed rings. The number of heteroatoms constituting the ring of the heterocyclic group is preferably 1 to 3. The heteroatoms constituting the ring of the heterocyclic group are preferably nitrogen atoms, oxygen atoms, or sulfur atoms. The number of carbon atoms constituting the ring of the heterocyclic group is preferably 3 to 30, more preferably 3 to 18, and even more preferably 3 to 12. The aliphatic hydrocarbon group, aromatic hydrocarbon group, and heterocyclic group may have a substituent. Examples of the substituent include an alkyl group and an aryl group.

[0048] A in formula (R-100) ｔ１ represents an acid group or a basic group. ｔ１ Examples of the acid group represented by include a carboxy group, a sulfo group, a phosphate group, a boronic acid group, an imidic acid group, and salts thereof. The atoms or atomic groups constituting the salt include alkali metal ions (Li ＋ , Na ＋ , K. ＋ etc.), alkaline earth metal ions (Ca ２＋ , Mg ２＋Examples of the imide acid group include an ammonium ion, an imidazolium ion, a pyridinium ion, and a phosphonium ion. ２ NHSO ２ R Ａ１ , -CONHSO ２ R Ａ２ , -CONHCOR Ａ３ or -SO ２ NHCOR Ａ４ is preferred, and —SO ２ NHSO ２ R Ａ１ , -CONHSO ２ R Ａ２ , or -SO ２ NHCOR Ａ４ is more preferred, and —SO ２ NHSO ２ R Ａ１ or -CONHSO ２ R Ａ２ is more preferred. Ａ１ ~R Ａ４ R each independently represents an alkyl group or an aryl group. Ａ１ ~R Ａ４ The alkyl group and aryl group represented by R may have a substituent. The substituent is preferably a halogen atom, more preferably a fluorine atom. Ａ１ ~R Ａ４ are each independently preferably an alkyl group containing a fluorine atom or an aryl group containing a fluorine atom, and more preferably an alkyl group containing a fluorine atom. The number of carbon atoms in the alkyl group containing a fluorine atom is preferably 1 to 10, more preferably 1 to 5, and even more preferably 1 to 3. The number of carbon atoms in the aryl group containing a fluorine atom is preferably 6 to 20, more preferably 6 to 12, and even more preferably 6.

[0049] A ｔ１ Examples of the basic group represented by include an amino group, a pyridinyl group and its salts, an ammonium salt, and a phthalimidomethyl group. Examples of the atom or atomic group that constitutes the salt include a hydroxide ion, a halogen ion, a carboxylate ion, a sulfonate ion, and a phenoxide ion. Examples of the amino group include -NR Ａ１１ R Ａ１２and a cyclic amino group.

[0050] -NR Ａ１１ R Ａ１２ In the group represented by Ａ１１ and R Ａ１２ are each independently a hydrogen atom, an alkyl group, or an aryl group, and are preferably an alkyl group. That is, the amino group is preferably a dialkylamino group. The alkyl group preferably has 1 to 10 carbon atoms, more preferably 1 to 5, and even more preferably 1 to 3. The alkyl group may be linear, branched, or cyclic, but is preferably linear or branched, and more preferably linear. The alkyl group may have a substituent. Examples of the substituent include the substituent T described above. The aryl group preferably has 6 to 30 carbon atoms, more preferably 6 to 20, and even more preferably 6 to 12. The aryl group may have a substituent. Examples of the substituent include the substituent T described above.

[0051] Examples of the cyclic amino group include a pyrrolidine group, a piperidine group, a piperazine group, and a morpholine group. These groups may further have a substituent. Examples of the substituent include the substituent T described above.

[0052] In formula (R-100), n represents an integer of 1 to 4, preferably 1 or 2, and more preferably 1.

[0053] The specific compound may be a pigment or a dye. The specific compound may also be a pigment derivative. When the specific compound is used as a pigment derivative, it is preferable that the specific compound is a compound having a group represented by formula (R-100) as a substituent.

[0054] The maximum absorption wavelength of the specific compound is preferably in the wavelength range of 800 to 1400 nm, more preferably in the wavelength range of 850 to 1300 nm, and even more preferably in the wavelength range of 900 to 1200 nm.

[0055] The maximum absorption wavelength of a specific compound can be determined by dissolving the specific compound in a solvent to prepare a solution and measuring the absorbance of the solution. Examples of solvents used to prepare the solution include chloroform, dimethyl sulfoxide (DMSO), and tetrahydrofuran (THF). If the specific compound is a compound that dissolves in chloroform, chloroform is used as the solvent. If the specific compound is a compound that does not dissolve in chloroform but dissolves in dimethyl sulfoxide (DMSO) or tetrahydrofuran (THF), dimethyl sulfoxide (DMSO) or tetrahydrofuran (THF) is used as the solvent.

[0056] Specific examples of the specific compound include compounds IR1 to IR42 described in the Examples below.

[0057] (Other Colorants) The colorants used in the composition of the present invention may further include colorants other than the specific compounds described above. Examples of other colorants include chromatic colorants, black colorants, and infrared absorbing colorants. Pigment derivatives may also be used as the other colorants. Examples of pigment derivatives include compounds having a structure in which an acid group or a basic group is bonded to a dye skeleton. Details of pigment derivatives will be described later.

[0058] The other coloring material may be a pigment or a dye. A pigment and a dye may be used in combination. The pigment may be either an inorganic pigment or an organic pigment, but an organic pigment is preferred from the viewpoints of ease of dispersion, safety, and the like. When a pigment and a dye are used in combination, the content of the dye is preferably 5 to 100 parts by mass per 100 parts by mass of the pigment. The upper limit is preferably 80 parts by mass or less, and more preferably 60 parts by mass or less. The lower limit is preferably 10 parts by mass or more, and more preferably 15 parts by mass or more.

[0059] The average primary particle diameter of the pigment and pigment derivative is preferably 1 to 200 nm. The lower limit is preferably 5 nm or more, more preferably 10 nm or more. The upper limit is preferably 180 nm or less, more preferably 150 nm or less, and even more preferably 100 nm or less. In this specification, the primary particle diameter of the pigment and pigment derivative can be determined from a photograph obtained by observing the primary particles of the pigment and pigment derivative using a transmission electron microscope. Specifically, the projected area of ​​the primary particles of the pigment is determined, and the corresponding circle-equivalent diameter is calculated as the primary particle diameter of the pigment. In addition, the average primary particle diameter in the present invention is the arithmetic mean value of the primary particle diameters of 400 primary particles of the pigment. Furthermore, primary particles of the pigment refer to independent particles without aggregation. The same applies to the average primary particle diameter of pigment derivatives.

[0060] The crystallite size of the pigment and pigment derivative is preferably 0.1 to 50 nm, more preferably 0.5 to 30 nm, and even more preferably 1 to 15 nm. The crystallite size can be determined from the half-width of the diffraction angle peak using an X-ray diffractometer and calculated using the Scherrer equation. The crystallite size of the pigment and pigment derivative can be adjusted by known methods such as adjusting the production conditions or pulverizing the pigment after production.

[0061] The specific surface area of ​​pigments and pigment derivatives is 1 to 300 m ２ / g. The lower limit is 10 m ２ / g or more, and ２ / g or more is more preferable. ２ / g or less, and ２ The value of the specific surface area can be determined according to the BET (Brunauer, Emmett and Teller) method in accordance with DIN 66131: Determination of the specific surface area of ​​solids by gas adsorption.

[0062] Chromatic coloring materials include coloring materials having a maximum absorption wavelength in the wavelength range of 400 to 700 nm, such as green coloring materials, red coloring materials, yellow coloring materials, purple coloring materials, blue coloring materials, and orange coloring materials.

[0063] Examples of the red colorant include a diketopyrrolopyrrole compound, an anthraquinone compound, an azo compound, a naphthol compound, an azomethine compound, a xanthene compound, a quinacridone compound, a perylene compound, and a thioindigo compound, and the like, preferably a diketopyrrolopyrrole compound, an anthraquinone compound, or an azo compound, and more preferably a diketopyrrolopyrrole compound. The red colorant is preferably a pigment (red pigment), and more preferably a diketopyrrolopyrrole pigment.

[0064] Specific examples of red colorants include C.I. (Color Index) Pigment Red 1, 2, 3, 4, 5, 6, 7, 9, 10, 14, 17, 22, 23, 31, 38, 41, 48:1, 48:2, 48:3, 48:4, 49, 49:1, 49:2, 52:1, 52:2, 53:1, 57:1, 60:1, 63:1, 66, 67, 81:1, 81:2, 81:3, 83, 88, 90, 105, 112, 119, 122, 123, 144, 146, 149, Examples of red pigments include 150,155,166,168,169,170,171,172,175,176,177,178,179,184,185,187,188,190,200,202,206,207,208,209,210,216,220,224,226,242,246,254,255,264,269,270,272,279,291,294,295,296,297. In addition, as a red colorant, a compound described in paragraph 0034 of WO 2022 / 085485, or a brominated diketopyrrolopyrrole compound described in JP-A-2020-085947 can also be used.

[0065] As the red colorant, C.I. Pigment Red 122, 177, 224, 254, 255, 264, 269, 272, and 291 are preferred, C.I. Pigment Red 254, 264, and 272 are more preferred, and C.I. Pigment Red 254 and 264 are even more preferred.

[0066] Examples of the green colorant include phthalocyanine compounds and squarylium compounds, and the phthalocyanine compounds are preferred. The green colorant is preferably a pigment (green pigment), and more preferably a phthalocyanine pigment.

[0067] Specific examples of green colorants include green pigments such as C.I. Pigment Green 7, 10, 36, 37, 58, 59, 62, 63, 64, 65, and 66. Furthermore, as a green colorant, a halogenated zinc phthalocyanine pigment having an average of 10 to 14 halogen atoms, an average of 8 to 12 bromine atoms, and an average of 2 to 5 chlorine atoms per molecule can also be used. Specific examples include the compounds described in WO 2015 / 118720. Furthermore, as a green colorant, the compounds described in paragraph 0029 of WO 2022 / 085485, the aluminum phthalocyanine compounds described in JP-A 2020-070426, and the diarylmethane compounds described in JP-A 2020-504758 can also be used.

[0068] As the green colorant, C.I. Pigment Green 7, 36, 58, 62, and 63 are preferred.

[0069] Examples of orange colorants include diketopyrrolopyrrole compounds and azo compounds. The orange colorant is preferably a pigment (orange pigment). Specific examples of orange colorants include orange pigments such as C.I. Pigment Orange 2, 5, 13, 16, 17:1, 31, 34, 36, 38, 43, 46, 48, 49, 51, 52, 55, 59, 60, 61, 62, 64, 71, and 73.

[0070] Examples of the yellow colorant include an azo compound, an azomethine compound, an isoindoline compound, a pteridine compound, a quinophthalone compound, and a perylene compound. The yellow colorant is preferably a pigment (yellow pigment). Specific examples of the yellow colorant include C.I. Pigment Yellow 1, 2, 3, 4, 5, 6, 10, 11, 12, 13, 14, 15, 16, 17, 18, 20, 24, 31, 32, 34, 35, 35:1, 36, 36:1, 37, 37:1, 40, 42, 43, 53, 55, 60, 61, 62, 63, 65, 73, 74, 77, 81, 83, 86, 93, 94, 95, 97, 98, 100, 101, 104, 106, 108, 109, 110, 113, 114, 115, 116, 117, 118, 119, 120, 123, 125 , 126, 127, 128, 129, 137, 138, 139, 147, 148, 150, 151, 152, 153, 154, 155, 156, 161, 162, 164, 166, 167, 168, 169, 170, 171, 172, 173, 174, 175, 176, 177, 179, 180, 181, 182, 185, 187, 188, 193, 194, 199, 213, 214, 215, 228, 231, 232, 233, 234, 235, 236 and the like.

[0071] As the yellow coloring material, an azobarbituric acid nickel complex having the following structure can also be used.

[0072] As the yellow colorant, the compounds described in paragraphs 0031 to 0033 of WO 2022 / 085485, the methine dyes described in JP-A 2019-073695, and the methine dyes described in JP-A 2019-073696 can be used.

[0073] Examples of the purple colorant include an oxazine compound, a quinacridone compound, a perylene compound, and an indigo compound, and the oxazine compound is preferred. The purple colorant is preferably a pigment (purple pigment). Specific examples of the purple colorant include purple pigments such as C.I. Pigment Violet 1, 19, 23, 27, 32, 37, 42, 60, and 61.

[0074] Examples of blue colorants include phthalocyanine compounds and squarylium compounds, with phthalocyanine compounds being preferred. The blue colorant is preferably a pigment (blue pigment). Specific examples of blue colorants include blue pigments such as C.I. Pigment Blue 1, 2, 15, 15:1, 15:2, 15:3, 15:4, 15:6, 16, 22, 29, 60, 64, 66, 79, 80, 87, and 88. Furthermore, aluminum phthalocyanine compounds having phosphorus atoms can also be used as blue colorants. Specific examples include the compounds described in paragraphs 0022 to 0030 of JP-A No. 2012-247591 and paragraph 0047 of JP-A No. 2011-157478.

[0075] Dyes can also be used as chromatic colorants. There are no particular limitations on the dyes, and known dyes can be used. Examples include pyrazole azo dyes, anilino azo dyes, triarylmethane dyes, anthraquinone dyes, anthrapyridone dyes, benzylidene dyes, oxonol dyes, pyrazolotriazole azo dyes, pyridone azo dyes, cyanine dyes, phenothiazine dyes, pyrrolopyrazole azomethine dyes, xanthene dyes, phthalocyanine dyes, benzopyran dyes, indigo dyes, and pyrromethene dyes. The dye is preferably a xanthene dye.

[0076] A dye polymer can also be used as a chromatic colorant. The dye polymer is preferably a dye dissolved in a solvent when used. The dye polymer may also form particles. When the dye polymer is particulate, it is typically used in a dispersed state in a solvent. A particulate dye polymer can be obtained, for example, by emulsion polymerization, and specific examples of the compounds and production methods described in JP-A 2015-214682 include those described in JP-A 2015-214682. The dye polymer has two or more dye structures in one molecule, preferably three or more dye structures. The upper limit is not particularly limited, but can be 100 or less. The multiple dye structures in one molecule may be the same dye structure or different dye structures. The weight-average molecular weight (Mw) of the dye polymer is preferably 2,000 to 50,000. The lower limit is more preferably 3,000 or more, and even more preferably 6,000 or more. The upper limit is more preferably 30,000 or less, and even more preferably 20,000 or less. As the dye multimer, compounds described in JP-A-2011-213925, JP-A-2013-041097, JP-A-2015-028144, JP-A-2015-030742, WO 2016 / 031442, etc. can also be used.

[0077] Examples of chromatic colorants include triarylmethane dye polymers described in Korean Patent Publication No. 10-2020-0028160, xanthene compounds described in JP 2020-117638 A, phthalocyanine compounds described in WO 2020 / 174991 A, isoindoline compounds or salts thereof described in JP 2020-160279 A, ​​compounds represented by formula 1 described in Korean Patent Publication No. 10-2020-0069442 A, compounds represented by formula 1 described in Korean Patent Publication No. 10-2020-0069730 A, and compounds represented by formula 1 described in Korean Patent Publication No. 10-2020-0069730 A. Compounds represented by formula 1 described in Korean Patent Publication No. 10-2020-0069070, compounds represented by formula 1 described in Korean Patent Publication No. 10-2020-0069067, compounds represented by formula 1 described in Korean Patent Publication No. 10-2020-0069062, halogenated zinc phthalocyanine pigments described in Japanese Patent No. 6809649, isoindoline compounds described in JP 2020-180176, phenothiazine compounds described in JP 2021-187913, halogenated zinc phthalocyanines described in WO 2022 / 004261, WO Halide zinc phthalocyanine described in Korean Patent Publication No. 10-2020-0030759, quinophthalone compound represented by formula 1 in Korean Patent Publication No. 10-2020-0061793, polymer dye described in Korean Patent Publication No. 10-2020-0061793, chromatic colorant described in JP-A-2022-029701, isoindoline compound described in WO 2022 / 014635, aluminum phthalocyanine compound described in WO 2022 / 024926, compound described in JP 2022-045895, WO 2022 / 05005 Compounds described in JP-A-2020-090676, compounds described in JP-A-2020-055956, compounds described in JP-A-2021-031681, compounds described in JP-A-2022-056354, compounds described in US Patent Application Publication No. 2021 / 0355327, compounds described in WO 2022 / 065357, compounds described in JP-A-2020-045436, compounds described in Korean Patent Publication No. 10-2021-0146726, compounds described in JP-A-2018-178039,Compounds described in Chinese Patent Application Publication No. 113881244, compounds described in Chinese Patent Application Publication No. 113881245, compounds described in Chinese Patent Application Publication No. 113881246, compounds described in JP 2022-104822 A, compounds described in JP 2022-096701 A, compounds described in JP 2020-023652 A, green pigments described in the Journal of the Japan Color Materials Association (published in 2022) pages 80 to 84, compounds described in JP 2022-143135 A, compounds described in JP 2022-140287 A, compounds described in WO 2014 / 014906 Compounds described in Patent Publication No. 2022 / 136308, perylene compounds described in Chinese Patent Application Publication No. 113061349, cyan pigments described in Korean Patent Publication No. 10-2017-0018993, isoindoline compounds described in JP 2020-180176, compounds described in JP 2023-013209, compounds described in JP 2023-013166, xanthene compounds described in WO 2023 / 286526, compounds described in JP 2021-155746, compounds described in JP 2021-155747, JP Compounds described in JP-A-2021-155748, compounds described in JP-A-2021-155749, compounds described in WO 2018 / 051876, compounds described in JP-A-2020-083981, compounds described in JP-A-2023-056463, compounds described in JP-T-2023-515473, dioxane compounds described in JP-T-2022-549530, pigment preparations described in JP-A-2022-061494, diketopyrrolopyrrole pigments described in JP-A-2023-057917, and JP-A-2023-061273 Diketopyrrolopyrrole compounds described in JP-A-2023-519314, phthalocyanines described in JP-A-2023-080419, quinophthalones described in JP-A-2023-103177, phthalocyanine compounds described in JP-A-2023-103177, isoindoline compounds described in JP-A-2020-026521, squarylium compounds described in Korean Patent Publication No. 10-2023-0043000, squarylium compounds described in Korean Patent Publication No. 10-2023-0050069, diketopyrrolopyrrole compounds described in JP-A-2023-127878,Triarylmethane compounds described in JP 2023-150459 A, triarylmethane compounds described in JP 2023-149735 A, core-shell dyes described in JP 2023-123349 A, xanthene compounds described in JP-T-2023-543717 A, compounds described in Chinese Patent Application Publication No. 116102441 A, compounds described in JP 2023-150459 A, compounds described in JP 2023-167345 A, Korean Patent Publication Compounds described in Japanese Patent No. 10-2023-0061078, compounds described in Japanese Patent Application Publication No. 2020-183509, colorants described in Japanese Patent Application Publication No. 2020-079395, compounds represented by formula (1) described in U.S. Patent Application Publication No. 2022 / 0119643, dyes described in Japanese Patent Application Publication No. 2023-048989, compounds described in Japanese Patent Application Publication No. 2024-014738, pigments described in Chinese Patent Application Publication No. 115873417, and the like can also be used. Furthermore, the chromatic colorant may be a rotaxane. The dye skeleton may be used in the cyclic structure of the rotaxane, in the rod-shaped structure, or in both structures.

[0078] Two or more chromatic colorants may be used in combination. When two or more chromatic colorants are used in combination, the combination of the two or more chromatic colorants may form a black color. Examples of such combinations include the following embodiments (1) to (7). When a composition contains two or more chromatic colorants and exhibits a black color through the combination of the two or more chromatic colorants, the composition can be preferably used as a composition for forming an infrared transmission filter. (1) An embodiment containing a red colorant and a blue colorant. (2) An embodiment containing a red colorant, a blue colorant, and a yellow colorant. (3) An embodiment containing a red colorant, a blue colorant, a yellow colorant, and a purple colorant. (4) An embodiment containing a red colorant, a blue colorant, a yellow colorant, a purple colorant, and a green colorant. (5) An embodiment containing a red colorant, a blue colorant, a yellow colorant, and a green colorant. (6) An embodiment containing a red colorant, a blue colorant, and a green colorant. (7) An embodiment containing a yellow coloring material and a purple coloring material.

[0079] -Black Colorant- The black colorant is not particularly limited, and known materials can be used. The black colorant may be an inorganic black colorant or an organic black colorant. The black colorant is preferably a pigment. In this specification, the black colorant refers to a colorant that exhibits absorption over the entire wavelength range of 400 to 700 nm.

[0080] Examples of inorganic black colorants include carbon black, titanium black, graphite, etc., with carbon black and titanium black being preferred, and titanium black being more preferred. Titanium black is a black particle containing titanium atoms, and low-order titanium oxide or titanium oxynitride is preferred. As the titanium black, the titanium black described in paragraph 0044 of WO 2022 / 085485 can be used. As the inorganic black colorant, zirconium nitride powder described in JP 2023-048173 A can also be used.

[0081] Examples of organic black colorants include bisbenzofuranone compounds, azomethine compounds, perylene compounds, and azo compounds, with bisbenzofuranone compounds and perylene compounds being preferred. The organic black colorant may be a compound described in paragraph 0166 of International Publication No. 2022 / 065215. Furthermore, as the organic black colorant, perylene black (such as Lumogen Black FK4280) described in paragraphs 0016 to 0020 of JP-A-2017-226821 or a black azo pigment described in JP-A-2022-121935 may also be used.

[0082] The black coloring material may be any of those described in pages 294 to 307 of the Journal of the Color Materials Association, Vol. 96, No. 9, 2023.

[0083] -Infrared-absorbing colorant- Examples of the infrared-absorbing colorant include pyrrolopyrrole compounds, squarylium compounds, croconium compounds, polymethine compounds, indigo compounds, phthalocyanine compounds, naphthalocyanine compounds, iminium compounds, quaterrylene compounds, aminium compounds, azo compounds, anthraquinone compounds, porphyrin compounds, oxonol compounds, and hexaphyrin compounds, and at least one selected from pyrrolopyrrole compounds, squarylium compounds, polymethine compounds, indigo compounds, phthalocyanine compounds, and naphthalocyanine compounds is preferred. Specific examples of these include the compounds described in paragraph 0114 of WO 2022 / 065215. Other examples of the infrared absorber include the compounds described in paragraph 0121 of WO 2022 / 065215, the compounds described in Table 1 of U.S. Pat. No. 1,126,172, the compounds described in paragraphs 0188 to 0192 of WO 2022 / 181422, the squarylium compounds described in JP 2020-075959 A, and the compounds described in Korean Patent Publication No. 10-2019-01 Copper complexes described in JP-A-35217, croconic acid compounds described in JP-A-2021-195515, infrared absorbing dyes described in JP-A-2022-022070, croconium compounds described in WO 2019 / 021767, compounds described in JP-A-2019-127549, compounds described in WO 2022 / 059619, JP-A-2022-151682 compounds described in JP-A-2022-188858, squarylium compounds described in JP-A-2022-184710, compounds described in JP-A-2022-189736, squarylium compounds described in JP-A-2023-004570, squarylium compounds described in WO 2019 / 230660, squarylium compounds described in WO 2020 / 218615 compounds described in JP-A-2023-068643, diiminium compounds described in JP-A-2023-052770, squarylium compounds described in JP-A-2023-052770, phthalocyanine compounds described in Korean Patent Publication No. 10-2022-0163680, indigo monoboron complexes described in JP-A-2023-073064, phthalocyanine compounds described in JP-A-2023-066025,Phthalocyanine compounds described in JP 2020-041127 A, indigo compounds described in JP 2023-073064 A, indigo compounds described in Korean Patent Publication No. 10-2023-0016355 A, squarylium compounds described in WO 2019 / 230570 A, diiminium compounds described in JP 2023-095824 A, compounds described in JP 2023-159964 A, compounds described in JP 2023-176615 A, compounds described in JP 2024-500537 A Compounds described in Japanese Patent Laid-Open No. 2024-019936, phthalocyanine compounds described in Korean Patent Registration No. 10-2575190, polymethine compounds described in Japanese Patent Laid-Open No. 2024-017061, boron derivatives described in Chinese Patent Publication No. 116715690, phthalocyanine compounds described in Japanese Patent Laid-Open No. 2024-020454, compounds described in Chinese Patent Publication No. 116891482, and compounds described in Japanese Translation of PCT International Publication No. 2024-511242 can also be used.

[0084] Pigment Derivatives Examples of pigment derivatives include compounds having a structure in which an acid group or a basic group is bonded to a pigment skeleton.

[0085] Examples of the dye structure include a quinoline dye structure, a benzimidazolone dye structure, a benzisoindole dye structure, a benzothiazole dye structure, an iminium dye structure, a squarylium dye structure, a croconium dye structure, an oxonol dye structure, a pyrrolopyrrole dye structure, a diketopyrrolopyrrole dye structure, an azo dye structure, an azomethine dye structure, a phthalocyanine dye structure, a naphthalocyanine dye structure, an anthraquinone dye structure, a quinacridone dye structure, a dioxazine dye structure, a perinone dye structure, a perylene dye structure, a thiazineindigo dye structure, a thioindigo dye structure, an isoindoline dye structure, an isoindolinone dye structure, a quinophthalone dye structure, a dithiol dye structure, a triarylmethane dye structure, and a pyrromethene dye structure.

[0086] Examples of the acid group possessed by the pigment derivative include a carboxy group, a sulfo group, a phosphate group, a boronic acid group, an imidic acid group, and salts thereof. Examples of the atom or atomic group constituting the salt include an alkali metal ion (Li ＋ , Na ＋ , K. ＋ etc.), alkaline earth metal ions (Ca ２＋ , Mg ２＋ etc.), ammonium ion, imidazolium ion, pyridinium ion, phosphonium ion, etc.

[0087] Examples of basic groups possessed by the pigment derivative include amino groups, pyridinyl groups and their salts, ammonium salts, and phthalimidomethyl groups. Examples of atoms or atomic groups that constitute the salts include hydroxide ions, halogen ions, carboxylate ions, sulfonate ions, and phenoxide ions.

[0088] Specific examples of pigment derivatives include the compounds described in paragraph 0124 of WO 2022 / 085485, the benzimidazolone compounds or salts thereof described in JP 2018-168244 A, the compounds having an isoindoline skeleton described in general formula (1) of Japanese Patent No. 6996282 A, the compounds described in JP 2019-172968 A, and the compounds described in Chinese Patent Publication No. 115124889 A.

[0089] The content of the above-mentioned specific compound in the total solid content of the composition is preferably 10 to 90% by mass. The lower limit is preferably 15% by mass or more, and more preferably 30% by mass or more. The upper limit is preferably 80% by mass or less, and more preferably 70% by mass or less. Only one type of specific compound may be used, or two or more types may be used. When two or more types are used, it is preferable that the total amount be in the above range.

[0090] The content of the colorant in the total solid content of the composition is preferably 10 to 90% by mass. The lower limit is preferably 15% by mass or more, and more preferably 30% by mass or more. The upper limit is preferably 80% by mass or less, and more preferably 70% by mass or less. Only one type of colorant may be used, or two or more types may be used. When two or more types are used, it is preferable that the total amount be in the above range.

[0091] The content of the specific compound in the colorant contained in the composition is preferably 1 to 100% by mass, more preferably 10 to 100% by mass, and even more preferably 30 to 100% by mass.

[0092] <<Curable Compound>> The composition of the present invention contains a curable compound. Examples of the curable compound include polymerizable compounds and resins. The resin may be a non-polymerizable resin (a resin without a polymerizable group) or a polymerizable resin (a resin with a polymerizable group). Examples of the polymerizable group include an ethylenically unsaturated bond-containing group, a cyclic ether group, a methylol group, and an alkoxymethyl group. Examples of the ethylenically unsaturated bond-containing group include a vinyl group, a vinylphenyl group, a (meth)allyl group, a (meth)acryloyl group, a (meth)acryloyloxy group, and a (meth)acryloylamide group. Preferred are a (meth)allyl group, a (meth)acryloyl group, and a (meth)acryloyloxy group, and more preferred are a (meth)acryloyloxy group. Examples of the cyclic ether group include an epoxy group and an oxetanyl group, and preferred is an epoxy group.

[0093] As the curable compound, it is preferable to use one that contains at least a resin. Furthermore, when the composition of the present invention is used as a composition for photolithography, it is preferable to use, as the curable compound, a resin and a polymerizable compound (preferably a polymerizable monomer that is a monomer-type polymerizable compound), and it is more preferable to use a resin and a polymerizable monomer having an ethylenically unsaturated bond-containing group (a monomer-type polymerizable compound).

[0094] (Polymerizable Compound) Examples of the polymerizable compound include a compound having an ethylenically unsaturated bond-containing group, a compound having a cyclic ether group, a compound having a methylol group, and a compound having an alkoxymethyl group. A compound having an ethylenically unsaturated bond-containing group can be preferably used as a radical polymerizable compound. In addition, a compound having a cyclic ether group can be preferably used as a cationically polymerizable compound.

[0095] Examples of resin-type polymerizable compounds include resins containing repeating units having polymerizable groups.

[0096] The molecular weight of the monomer-type polymerizable compound (polymerizable monomer) is preferably less than 2,000, and more preferably 1,500 or less. The lower limit of the molecular weight of the polymerizable monomer is preferably 100 or more, and more preferably 200 or more. The weight-average molecular weight (Mw) of the resin-type polymerizable compound is preferably 2,000 to 2,000,000. The upper limit of the weight-average molecular weight is preferably 1,000,000 or less, and more preferably 500,000 or less. The lower limit of the weight-average molecular weight is preferably 3,000 or more, and more preferably 5,000 or more.

[0097] The compound having an ethylenically unsaturated bond-containing group as a polymerizable monomer is preferably a trifunctional to 15-functional (meth)acrylate compound, more preferably a trifunctional to 6-functional (meth)acrylate compound. Specific examples include the compounds described in paragraphs 0075 to 0083 of WO 2022 / 065215 and the compounds described in Taiwan Patent Application Publication No. 201832008.

[0098] Examples of the compound having an ethylenically unsaturated bond-containing group include dipentaerythritol tri(meth)acrylate (commercially available product: KAYARAD D-330; manufactured by Nippon Kayaku Co., Ltd.), dipentaerythritol tetra(meth)acrylate (commercially available product: KAYARAD D-320; manufactured by Nippon Kayaku Co., Ltd.), dipentaerythritol penta(meth)acrylate (commercially available product: KAYARAD D-310; manufactured by Nippon Kayaku Co., Ltd.), and dipentaerythritol hexa(meth)acrylate (commercially available product: KAYARAD DPHA (manufactured by Nippon Kayaku Co., Ltd.), NK Ester A-DPH-12E (manufactured by Shin-Nakamura Chemical Co., Ltd.), and compounds in which the (meth)acryloyl group of these compounds is bonded via an ethylene glycol and / or propylene glycol residue (for example, SR454 and SR499, commercially available from Sartomer). Examples of compounds having an ethylenically unsaturated bond-containing group include diglycerin EO (ethylene oxide)-modified (meth)acrylate (commercially available product is M-460, manufactured by Toagosei Co., Ltd.), pentaerythritol tetraacrylate (NK Ester A-TMMT, manufactured by Shin-Nakamura Chemical Co., Ltd.), and 1,6-hexanediol diacrylate (KAYARAD, manufactured by Nippon Kayaku Co., Ltd.). HDDA), RP-1040 (manufactured by Nippon Kayaku Co., Ltd.), Aronix TO-2349 (manufactured by Toagosei Co., Ltd.), NK Oligo UA-7200 (manufactured by Shin-Nakamura Chemical Co., Ltd.), DPHA-40H (manufactured by Nippon Kayaku Co., Ltd.), UA-306H, UA-306T, UA-306I, AH-600, T-600, AI-600, LINC-202UA (manufactured by Kyoeisha Chemical Co., Ltd.), 8UH-1006, 8UH-1012 (all manufactured by Taisei Fine Chemical Co., Ltd.), Light Acrylate POB-A0 (manufactured by Kyoeisha Chemical Co., Ltd.), and the like can also be used.

[0099] As the compound having an ethylenically unsaturated bond-containing group, it is also preferable to use a trifunctional (meth)acrylate compound such as trimethylolpropane tri(meth)acrylate, trimethylolpropane propylene oxide-modified tri(meth)acrylate, trimethylolpropane ethylene oxide-modified tri(meth)acrylate, isocyanuric acid ethylene oxide-modified tri(meth)acrylate, or pentaerythritol tri(meth)acrylate. Commercially available trifunctional (meth)acrylate compounds include Aronix M-309, M-310, M-321, M-350, M-360, M-313, M-315, M-306, M-305, M-303, M-452, and M-450 (manufactured by Toagosei Co., Ltd.), NK Ester A9300, A-GLY-9E, A-GLY-20E, A-TMM-3, A-TMM-3L, A-TMM-3LM-N, A-TMPT, and TMPT (manufactured by Shin-Nakamura Chemical Co., Ltd.), KAYARAD GPO-303, TMPTA, THE-330, TPA-330, and PET-30 (manufactured by Nippon Kayaku Co., Ltd.).

[0100] It is also preferable to use a compound having an ethylenically unsaturated bond-containing group and a urethane bond (hereinafter also referred to as a polymerizable compound having a urethane bond) as the compound having an ethylenically unsaturated bond-containing group. By using such a compound, the heat resistance of the obtained film can be further improved. The reason for this effect is presumed to be that the urethane bond portion forms a physical crosslinked structure due to intermolecular hydrogen bonding.

[0101] Examples of the polymerizable compound having a urethane bond include urethane (meth)acrylates obtained by reacting a (meth)acrylate having a hydroxy group with a polyfunctional isocyanate, and urethane (meth)acrylates obtained by reacting a polyhydric alcohol with a polyfunctional isocyanate and further reacting the resulting mixture with a (meth)acrylate having a hydroxy group.

[0102] Examples of the (meth)acrylate having a hydroxy group include 2-hydroxyethyl (meth)acrylate, 4-hydroxybutyl (meth)acrylate, trimethylolpropane di(meth)acrylate, pentaerythritol tri(meth)acrylate, ditrimethylolpropane tri(meth)acrylate, dipentaerythritol penta(meth)acrylate, dipentaerythritol ethylene oxide-modified penta(meth)acrylate, dipentaerythritol propylene oxide-modified penta(meth)acrylate, dipentaerythritol caprolactone-modified penta(meth)acrylate, glycerol acrylate methacrylate, glycerol dimethacrylate, 2-hydroxy-3-acryloylpropyl methacrylate, a reaction product of an epoxy group-containing compound and a carboxy(meth)acrylate, and a hydroxy group-containing polyol polyacrylate.

[0103] Examples of the polyfunctional isocyanate include aliphatic diisocyanates such as trimethylene diisocyanate, tetramethylene diisocyanate, and hexamethylene diisocyanate; alicyclic diisocyanates such as isophorone diisocyanate; aromatic diisocyanates such as tolylene diisocyanate, diphenylmethylene diisocyanate, and xylene diisocyanate; and biuret derivatives, isocyanate nurate derivatives, and trimethylolpropane adducts thereof.

[0104] As the polymerizable compound having a urethane bond, the compounds described in paragraphs 0308 to 0315 of JP-A No. 2022-173080 can also be used.

[0105] The compound having an ethylenically unsaturated bond-containing group may also be a compound having an acid group such as a carboxyl group, a sulfo group, or a phosphate group. Commercially available products of such compounds include Aronix M-305, M-510, M-520, and Aronix TO-2349 (manufactured by Toagosei Co., Ltd.).

[0106] As the compound having an ethylenically unsaturated bond-containing group, a compound having a caprolactone structure can also be used. For compounds having a caprolactone structure, please refer to the description in paragraphs 0042 to 0045 of JP 2013-253224 A, the contents of which are incorporated herein by reference. Examples of compounds having a caprolactone structure include DPCA-20, DPCA-30, DPCA-60, and DPCA-120, which are commercially available from Nippon Kayaku Co., Ltd. as the KAYARAD DPCA series.

[0107] The compound having an ethylenically unsaturated bond-containing group may also be a compound having an ethylenically unsaturated bond-containing group and an alkyleneoxy group. Such a compound is preferably a compound having an ethylenically unsaturated bond-containing group and an ethyleneoxy group and / or a propyleneoxy group, more preferably a compound having an ethylenically unsaturated bond-containing group and an ethyleneoxy group, and even more preferably a tri- to hexa-functional (meth)acrylate compound having 4 to 20 ethyleneoxy groups. Examples of commercially available products include SR-494, a tetrafunctional (meth)acrylate having four ethyleneoxy groups manufactured by Sartomer Corporation, and KAYARAD TPA-330, a trifunctional (meth)acrylate having three isobutyleneoxy groups manufactured by Nippon Kayaku Co., Ltd.

[0108] The compound having an ethylenically unsaturated bond-containing group may also be a polymerizable compound having a fluorene skeleton. Commercially available products include OGSOL EA-0200 and EA-0300 (manufactured by Osaka Gas Chemicals Co., Ltd., (meth)acrylate monomers having a fluorene skeleton).

[0109] It is also preferable to use a compound having an ethylenically unsaturated bond-containing group that is substantially free of environmentally restricted substances such as toluene. Commercially available products of such compounds include KAYARAD DPHA LT and KAYARAD DPEA-12 LT (manufactured by Nippon Kayaku Co., Ltd.).

[0110] Examples of compounds having a cyclic ether group include compounds having an epoxy group and compounds having an oxetanyl group, with compounds having an epoxy group being preferred. Examples of compounds having an epoxy group include compounds having 1 to 100 epoxy groups per molecule. The upper limit of the number of epoxy groups can be, for example, 10 or less, or 5 or less. The lower limit of the number of epoxy groups is preferably 2 or more.

[0111] The compound having a cyclic ether group may be a low molecular weight compound (e.g., a molecular weight of less than 1,000) or a high molecular weight compound (macromolecule) (e.g., a molecular weight of 1,000 or more, and in the case of a polymer, a weight average molecular weight of 1,000 or more). The weight average molecular weight of the cyclic ether group is preferably 200 to 100,000, more preferably 500 to 50,000. The upper limit of the weight average molecular weight is preferably 10,000 or less, more preferably 5,000 or less, and even more preferably 3,000 or less.

[0112] As the compound having a cyclic ether group, the compounds described in paragraphs 0034 to 0036 of JP-A-2013-011869, the compounds described in paragraphs 0147 to 0156 of JP-A-2014-043556, the compounds described in paragraphs 0085 to 0092 of JP-A-2014-089408, and the compounds described in JP-A-2017-179172 can also be used.

[0113] Commercially available compounds having a cyclic ether group include Denacol EX-212L, EX-212, EX-214L, EX-214, EX-216L, EX-216, EX-321L, EX-321, EX-850L, and EX-850 (all manufactured by Nagase ChemteX Corporation), ADEKA RESIN EP-4000S, EP-4003S, EP-4010S, EP-4011S (all manufactured by ADEKA Corporation), NC-2000, NC-3000, NC-7300, XD-1000, EPPN-501, EPPN-502 (all manufactured by ADEKA Corporation), Celloxide 2021P, Celloxide 2081, Celloxide 2083, Celloxide 2085, EHPE3150, EPOLEAD PB 3600, PB 4700 (all manufactured by Daicel Corporation), Cyclomer P ACA 200M, ACA 230AA, ACA Z250, ACA Z251, ACA Z300, ACA Z320 (all manufactured by Daicel Corporation), jER1031S, jER157S65, jER152, jER154, jER157S70 (all manufactured by Mitsubishi Chemical Corporation), Aron Oxetane OXT-121, OXT-221, OX-SQ, PNOX (all manufactured by Toagosei Co., Ltd.), Adeka Glycirol Examples of such monomers include ED-505 (manufactured by ADEKA Corporation, epoxy group-containing monomer), Marproof G-0150M, G-0105SA, G-0130SP, G-0250SP, G-1005S, G-1005SA, G-1010S, G-2050M, G-01100, and G-01758 (manufactured by NOF Corporation, epoxy group-containing polymers), OXT-101, OXT-121, OXT-212, and OXT-221 (manufactured by Toagosei Co., Ltd., oxetanyl group-containing monomers), and OXE-10 and OXE-30 (manufactured by Osaka Organic Chemical Industry Ltd., oxetanyl group-containing monomers).

[0114] Compounds having a methylol group (hereinafter also referred to as methylol compounds) include compounds in which a methylol group is bonded to a nitrogen atom or a carbon atom forming an aromatic ring. Compounds having an alkoxymethyl group (hereinafter also referred to as alkoxymethyl compounds) include compounds in which an alkoxymethyl group is bonded to a nitrogen atom or a carbon atom forming an aromatic ring. Preferred compounds in which an alkoxymethyl group or a methylol group is bonded to a nitrogen atom include alkoxymethylated melamine, methylolated melamine, alkoxymethylated benzoguanamine, methylolated benzoguanamine, alkoxymethylated glycoluril, methylolated glycoluril, alkoxymethylated urea, and methylolated urea. Compounds described in paragraphs 0134 to 0147 of JP 2004-295116 A and paragraphs 0095 to 0126 of JP 2014-089408 A can also be used.

[0115] (Resin) The composition of the present invention can use a resin as the curable compound. It is preferable to use a curable compound that contains at least a resin. Resins are blended, for example, for purposes such as dispersing pigments and the like in the composition or as binders. Resins used primarily to disperse pigments and the like in the composition are also called dispersants. However, these uses of resins are merely examples, and resins can also be used for purposes other than these uses. Resins having polymerizable groups also fall under the category of polymerizable compounds.

[0116] The weight average molecular weight of the resin is preferably 3,000 to 2,000,000. The upper limit is preferably 1,000,000 or less, and more preferably 500,000 or less. The lower limit is preferably 4,000 or more, and more preferably 5,000 or more.

[0117] Examples of the resin include (meth)acrylic resin, epoxy resin, ene-thiol resin, polycarbonate resin, polyether resin, polyarylate resin, polysulfone resin, polyethersulfone resin, polyphenylene resin, polyarylene ether phosphine oxide resin, polyimide resin, polyamide resin, polyamideimide resin, polyolefin resin, cyclic olefin resin, polyester resin, styrene resin, vinyl acetate resin, polyvinyl alcohol resin, polyvinyl acetal resin, polyurethane resin, and polyurea resin. One of these resins may be used alone, or two or more of them may be mixed and used. From the viewpoint of improving heat resistance, norbornene resin is preferred as the cyclic olefin resin. Examples of commercially available norbornene resins include the ARTON series (e.g., ARTON F4520) manufactured by JSR Corporation. Also, as the resin, the resins described in paragraph numbers 0091 to 0099 of International Publication No. 2022 / 065215, the block polyisocyanate resin described in Japanese Patent Application Laid-Open No. 2016-222891, the resin described in Japanese Patent Application Laid-Open No. 2020-122052, the resin described in Japanese Patent Application Laid-Open No. 2020-111656, the resin described in Japanese Patent Application Laid-Open No. 2020-139021, the resin containing a structural unit having a ring structure in the main chain and a structural unit having a biphenyl group in the side chain described in Japanese Patent Application Laid-Open No. 2017-138503, the resins described in paragraphs 0199 to 0233 of Japanese Patent Application Laid-Open No. 2020-186373, the alkali-soluble resin described in Japanese Patent Application Laid-Open No. 2020-186325, the resin represented by Formula 1 described in Korean Patent Publication No. 10-2020-0078339, the copolymer containing an epoxy group and an acid group described in International Publication No. 2022 / 030445, the resins described in paragraphs 0199 to 0233 of Japanese Patent Application Laid-Open No. 2020-186373, the alkali-soluble resin described in Japanese Patent Application Laid-Open No. 2020-186325, the resin represented by Formula 1 described in Korean Patent Publication No. 10-2020-0078339, the resin described in Japanese Patent Application Laid-Open No. 2021-134350, and the copolymer described in Japanese Patent Application Laid-Open No. 2020-041046 can also be used. Further, as the resin, a resin having a fluorene skeleton can also be preferably used.Examples of resins having a fluorene skeleton include those described in U.S. Patent Application Publication No. 2017 / 0102610. Examples of resins include those described in paragraphs 0199 to 0233 of JP-A-2020-186373, alkali-soluble resins described in JP-A-2020-186325, resins represented by formula 1 described in Korean Patent Publication No. 10-2020-0078339, resins described in JP-A-2021-134350, and resins described in JP-A-2022-174597.

[0118] It is preferable to use a resin having an acid group as the resin. Examples of the acid group include a carboxy group, a phosphate group, a sulfo group, and a phenolic hydroxy group. These acid groups may be of one type or two or more types. The resin having an acid group can also be used as a dispersant. The acid value of the resin having an acid group is preferably 30 to 500 mgKOH / g. The lower limit is preferably 50 mgKOH / g or more, and more preferably 70 mgKOH / g or more. The upper limit is preferably 400 mgKOH / g or less, more preferably 200 mgKOH / g or less, even more preferably 150 mgKOH / g or less, and most preferably 120 mgKOH / g or less.

[0119] It is also preferable to use a resin having a polymerizable group as the resin. The polymerizable group is preferably an ethylenically unsaturated bond-containing group or a cyclic ether group, and more preferably an ethylenically unsaturated bond-containing group.

[0120] The resin preferably contains a resin as a dispersant. Examples of dispersants include acidic dispersants (acidic resins) and basic dispersants (basic resins). Here, the term "acidic dispersant (acidic resin)" refers to a resin in which the amount of acid groups is greater than the amount of basic groups. As the acidic dispersant (acidic resin), a resin in which the amount of acid groups is 70 mol% or more is preferred when the total amount of the acid groups and the basic groups is taken as 100 mol%. The acid group possessed by the acidic dispersant (acidic resin) is preferably a carboxy group. The acid value of the acidic dispersant (acidic resin) is preferably 10 to 105 mgKOH / g. Furthermore, the term "basic dispersant (basic resin)" refers to a resin in which the amount of basic groups is greater than the amount of acid groups. As the basic dispersant (basic resin), a resin in which the amount of basic groups is greater than 50 mol% is preferred when the total amount of the acid groups and the basic groups is taken as 100 mol%. The basic group possessed by the basic dispersant is preferably an amino group.

[0121] The resin used as the dispersant is preferably a graft resin. For details of the graft resin, please refer to the description in paragraphs 0025 to 0094 of JP 2012-255128 A, the contents of which are incorporated herein by reference.

[0122] The resin used as the dispersant is preferably a polyimine-based dispersant containing a nitrogen atom in at least one of the main chain and the side chain. The polyimine-based dispersant is preferably a resin having a main chain with a partial structure containing a functional group with a pKa of 14 or less and a side chain having 40 to 10,000 atoms, and having a basic nitrogen atom in at least one of the main chain and the side chain. There are no particular restrictions on the basic nitrogen atom, as long as it is a nitrogen atom that exhibits basicity. For details about polyimine-based dispersants, please refer to the description in paragraphs 0102 to 0166 of JP 2012-255128 A, the contents of which are incorporated herein by reference.

[0123] The resin used as a dispersant is preferably a resin having a structure in which multiple polymer chains are bonded to a core portion. Examples of such resins include dendrimers (including star-shaped polymers). Specific examples of dendrimers include polymer compounds C-1 to C-31 described in paragraphs 0196 to 0209 of JP-A-2013-043962.

[0124] The resin used as a dispersant is also preferably a resin containing a repeating unit having an ethylenically unsaturated bond-containing group in a side chain. The content of the repeating unit having an ethylenically unsaturated bond-containing group in a side chain is preferably 10 mol % or more, more preferably 10 to 80 mol %, and even more preferably 20 to 70 mol %, of all repeating units of the resin.

[0125] As the dispersant, the resin described in JP 2018-087939 A, the block copolymers (EB-1) to (EB-9) described in paragraphs 0219 to 0221 of Japanese Patent No. 6432077 A, polyethyleneimine having a polyester side chain described in WO 2016 / 104803, block copolymers described in WO 2019 / 125940 A, block polymers having an acrylamide structural unit described in JP 2020-066687 A, block polymers having an acrylamide structural unit described in JP 2020-066688 A, dispersants described in WO 2016 / 104803, and the like can also be used.

[0126] Dispersants are also available as commercially available products, and specific examples thereof include the DISPERBYK series manufactured by BYK-Chemie, the SOLSPERSE series manufactured by Lubrizol Japan, the Efka series manufactured by BASF, and the AJISPER series manufactured by Ajinomoto Fine-Techno Co., Ltd. In addition, the products described in paragraph 0129 of JP 2012-137564 A and the products described in paragraph 0235 of JP 2017-194662 A can also be used as dispersants.

[0127] The content of the curable compound in the total solid content of the composition is preferably 1 to 95% by mass. The lower limit is preferably 2% by mass or more, more preferably 5% by mass or more, even more preferably 7% by mass or more, and particularly preferably 10% by mass or more. The upper limit is preferably 94% by mass or less, more preferably 90% by mass or less, even more preferably 85% by mass or less, and particularly preferably 80% by mass or less.

[0128] When the composition of the present invention contains a polymerizable compound as a curable compound, the content of the polymerizable compound in the total solid content of the composition is preferably 1 to 85% by mass. The lower limit is preferably 2% by mass or more, more preferably 3% by mass or more, and even more preferably 5% by mass or more. The upper limit is preferably 80% by mass or less, more preferably 70% by mass or less.

[0129] When the composition of the present invention contains a polymerizable monomer as a curable compound, the content of the polymerizable monomer in the total solid content of the composition is preferably 1 to 50% by mass. The lower limit is preferably 2% by mass or more, more preferably 3% by mass or more, and even more preferably 5% by mass or more. The upper limit is preferably 30% by mass or less, more preferably 20% by mass or less.

[0130] When the composition of the present invention contains a compound having an ethylenically unsaturated bond-containing group as a curable compound, the content of the compound having an ethylenically unsaturated bond-containing group in the total solid content of the composition is preferably 1 to 70% by mass. The lower limit is preferably 2% by mass or more, more preferably 3% by mass or more, and even more preferably 5% by mass or more. The upper limit is preferably 65% ​​by mass or less, more preferably 60% by mass or less.

[0131] When the composition of the present invention contains a compound having a cyclic ether group as a curable compound, the content of the compound having a cyclic ether group in the total solid content of the composition is preferably 1 to 95% by mass. The lower limit is preferably 2% by mass or more, more preferably 3% by mass or more, and even more preferably 5% by mass or more. The upper limit is preferably 80% by mass or less, more preferably 70% by mass or less, and even more preferably 60% by mass or less.

[0132] When the composition of the present invention contains a resin as a curable compound, the content of the resin in the total solid content of the composition is preferably 1 to 85% by mass. The lower limit is preferably 2% by mass or more, more preferably 5% by mass or more, even more preferably 7% by mass or more, and particularly preferably 10% by mass or more. The upper limit is preferably 80% by mass or less, more preferably 75% by mass or less, even more preferably 70% by mass or less, and particularly preferably 40% by mass or less.

[0133] When the composition of the present invention contains a resin as a dispersant, the content of the resin as a dispersant in the total solid content of the composition is preferably 0.1 to 40% by mass. The upper limit is preferably 25% by mass or less, and more preferably 20% by mass or less. The lower limit is preferably 0.5% by mass or more, and more preferably 1% by mass or more. Furthermore, the content of the resin as a dispersant is preferably 1 to 100 parts by mass per 100 parts by mass of the pigment. The upper limit is preferably 80 parts by mass or less, and more preferably 75 parts by mass or less. The lower limit is preferably 2.5 parts by mass or more, and more preferably 5 parts by mass or more.

[0134] The composition of the present invention may contain only one type of curable compound or may contain two or more types of curable compounds. When two or more types of curable compounds are contained, the total amount thereof is preferably within the above range.

[0135] <<Solvent>> The composition of the present invention contains a solvent. Examples of the solvent include water and organic solvents, and organic solvents are preferred. Examples of organic solvents include ester solvents, ketone solvents, alcohol solvents, amide solvents, ether solvents, and hydrocarbon solvents. For details, see paragraph 0223 of WO 2015 / 166779, the contents of which are incorporated herein by reference. Furthermore, ester solvents substituted with a cyclic alkyl group and ketone solvents substituted with a cyclic alkyl group can also be preferably used. Specific examples of organic solvents include polyethylene glycol monomethyl ether, dichloromethane, methyl 3-ethoxypropionate, ethyl 3-ethoxypropionate, ethyl cellosolve acetate, ethyl lactate, diethylene glycol dimethyl ether, butyl acetate, methyl 3-methoxypropionate, 2-heptanone, 2-pentanone, 3-pentanone, 4-heptanone, cyclohexanone, 2-methylcyclohexanone, 3-methylcyclohexanone, 4-methylcyclohexanone, cycloheptanone, cyclooctanone, cyclohexyl acetate, cyclopentanone, ethyl carbitol acetate, butyl carbitol acetate, propylene glycol monomethyl ether ... Examples of suitable ethylene glycol monomethyl ether acetate include 3-methoxy-N,N-dimethylpropanamide, 3-butoxy-N,N-dimethylpropanamide, propylene glycol diacetate, 3-methoxybutanol, methyl ethyl ketone, gamma butyrolactone, sulfolane, anisole, 1,4-diacetoxybutane, diethylene glycol monoethyl ether acetate, butane-1,3-diyl diacetate, dipropylene glycol methyl ether acetate, diacetone alcohol (also known as diacetone alcohol, 4-hydroxy-4-methyl-2-pentanone), 2-methoxypropyl acetate, 2-methoxy-1-propanol, and isopropyl alcohol.However, it may be preferable to reduce the amount of aromatic hydrocarbons (benzene, toluene, xylene, ethylbenzene, etc.) used as organic solvents for environmental reasons (for example, the amount may be 50 ppm by mass (parts per million) or less, 10 ppm by mass or less, or 1 ppm by mass or less, relative to the total amount of organic solvents).

[0136] The metal content of the organic solvent is preferably low. The metal content of the organic solvent is preferably, for example, 10 parts per billion (ppb) by mass or less. If necessary, an organic solvent having a metal content of ppt (parts per trillion) by mass may be used, and such an organic solvent is provided, for example, by Toyo Gosei Co., Ltd. (The Chemical Daily, November 13, 2015).

[0137] Methods for removing impurities such as metals from organic solvents include, for example, distillation (molecular distillation, thin-film distillation, etc.) and filtration using a filter. The pore size of the filter used for filtration is preferably 10 μm or less, more preferably 5 μm or less, and even more preferably 3 μm or less. The filter material is preferably polytetrafluoroethylene, polyethylene, or nylon.

[0138] The organic solvent may contain isomers (compounds having the same number of atoms but different structures). The organic solvent may contain only one type of isomer or multiple types of isomers.

[0139] The organic solvent preferably has a peroxide content of 0.8 mmol / L or less, and more preferably contains substantially no peroxide.

[0140] The content of the solvent in the composition is preferably 10 to 97% by mass. The lower limit is preferably 30% by mass or more, more preferably 40% by mass or more, even more preferably 50% by mass or more, still more preferably 60% by mass or more, and particularly preferably 70% by mass or more. The upper limit is preferably 96% by mass or less, more preferably 95% by mass or less. The composition may contain only one type of solvent, or may contain two or more types. When two or more types are contained, the total amount thereof is preferably within the above range.

[0141] <<Photopolymerization initiator>> The composition of the present invention may contain a photopolymerization initiator. When the composition of the present invention contains a polymerizable compound, it is preferable that the composition of the present invention further contains a photopolymerization initiator. The photopolymerization initiator is preferably a photoradical polymerization initiator.

[0142] Examples of the photopolymerization initiator include halogenated hydrocarbon derivatives (e.g., compounds having a triazine skeleton, compounds having an oxadiazole skeleton, etc.), acylphosphine compounds, hexaarylbiimidazole compounds, oxime compounds, organic peroxides, thio compounds, ketone compounds, aromatic onium salts, α-hydroxyketone compounds, α-aminoketone compounds, etc. The photopolymerization initiator is preferably a trihalomethyltriazine compound, a benzyl dimethyl ketal compound, an α-hydroxyketone compound, an α-aminoketone compound, an acylphosphine compound, a phosphine oxide compound, a metallocene compound, an oxime compound, a hexaarylbiimidazole compound, an onium compound, a benzothiazole compound, a benzophenone compound, an acetophenone compound, a cyclopentadiene-benzene-iron complex, a halomethyloxadiazole compound, or a 3-aryl-substituted coumarin compound, more preferably an oxime compound, an α-hydroxyketone compound, an α-aminoketone compound, or an acylphosphine compound, even more preferably an α-aminoketone compound or an oxime compound, and particularly preferably an oxime compound.

[0143] Examples of the photopolymerization initiator include the compounds described in paragraphs 0065 to 0111 of JP-A No. 2014-130173, the compounds described in Japanese Patent No. 6301489, and the compounds described in MATERIAL STAGE 37-60pp, vol. 19, No. peroxide-based photopolymerization initiators described in JP-A-2019-3, 2019, photopolymerization initiators described in WO 2018 / 221177, photopolymerization initiators described in WO 2018 / 110179, photopolymerization initiators described in JP-A-2019-043864, photopolymerization initiators described in JP-A-2019-044030, peroxide-based initiators described in JP-A-2019-167313, aminoacetophenone-based initiators having an oxazolidine group described in JP-A-2020-055992, Oxime-based photopolymerization initiators described in JP-A-2020-190459, polymers described in JP-A-2020-172619, compounds represented by formula 1 described in WO 2020 / 152120, compounds described in JP-A-2021-181406, photopolymerization initiators described in JP-A-2022-013379, compounds represented by formula (1) described in JP-A-2022-015747, fluorine-containing fluorene oxime ester-based photoinitiators described in JP-T-2021-507058, Chinese Patent Application Publication No. 11 Initiators described in Patent Publication No. 0764367, initiators described in JP-T-2022-518535, initiators described in WO 2021 / 175855, compounds described in Taiwan Patent Application Publication No. 202200534, compounds described in JP-A-2022-078550, compounds described in Korean Patent Publication No. 10-2017-0087330, compounds described in WO 2022 / 075452, oxime ester compounds described in Chinese Patent Application Publication No. 110066225, Compounds described in Japanese Patent Application Laid-Open No. 10-2022-0076157, compounds having a triarylamine or N-arylcarbazole skeleton described in paragraphs 0042 to 0062 of International Publication No. 2019 / 013112, oxime ester-based photopolymerization initiators described in Japanese Patent Application Laid-Open No. 7219378, photopolymerization initiators described in Korean Patent Publication No. 10-2021-0146174, photopolymerization initiators described in International Publication No. 2019 / 013112, photopolymerization initiators described in JP-A No. 2023-033731,Initiators described in JP-T-2022-515524, initiators described in JP-T-2023-517304, initiators described in Chinese Patent Application Publication No. 114149517, aminoketone compounds described in Chinese Patent Application Publication No. 115925596, compounds described in JP-A-2023-159489, compounds described in JP-A-2023-159487, compounds described in Taiwan Patent Application Publication No. 202336003, compounds described in Chinese Patent Application Publication No. 113527138, organosilicon compounds described in JP-T-2022-502526, and the like.

[0144] Specific examples of the hexaarylbiimidazole compound include 2,2',4-tris(2-chlorophenyl)-5-(3,4-dimethoxyphenyl)-4,5-diphenyl-1,1'-biimidazole.

[0145] Commercially available α-hydroxyketone compounds include Omnirad 184, Omnirad 1173, Omnirad 2959, and Omnirad 127 (all manufactured by IGM Resins B.V.), and Irgacure 184, Irgacure 1173, Irgacure 2959, and Irgacure 127 (all manufactured by BASF). Commercially available α-aminoketone compounds include Omnirad 907, Omnirad 369, Omnirad 369E, Omnirad 379EG (all manufactured by IGM Resins B.V.), Irgacure 907, Irgacure 369, Irgacure 369E, Irgacure 379EG (all manufactured by BASF), etc. Commercially available acylphosphine compounds include Omnirad 819, Omnirad TPO (all manufactured by IGM Resins B.V.), Irgacure 819, Irgacure TPO (all manufactured by BASF), etc.

[0146] Examples of the oxime compound include the compounds described in paragraph 0142 of WO 2022 / 085485, the compounds described in Japanese Patent No. 5430746, the compounds described in Japanese Patent No. 5647738, the compounds represented by the general formula (1) of JP-A-2021-173858, and the compounds described in paragraphs 0022 to 0024, and the compounds represented by the general formula (1) of JP-A-2021-170089 and the compounds described in paragraphs 0117 to 0120. Specific examples of the oxime compound include 3-benzoyloxyiminobutan-2-one, 3-acetoxyiminobutan-2-one, 3-propionyloxyiminobutan-2-one, 2-acetoxyiminopentan-3-one, 2-acetoxyimino-1-phenylpropan-1-one, 2-benzoyloxyimino-1-phenylpropan-1-one, 3-(4-toluenesulfonyloxy)iminobutan-2-one, 2-ethoxycarbonyloxyimino-1-phenylpropan-1-one, 1-[4-(phenylthio)phenyl]-3-cyclohexyl-propane-1,2-dione-2-(O-acetyloxime), and the like. Commercially available products include Irgacure OXE01, Irgacure OXE02, Irgacure OXE03, Irgacure OXE04, Irgacure OXE05 (all manufactured by BASF), TR-PBG-301, TR-PBG-304, TR-PBG-305, TR-PBG-309, TR-PBG-3054, TR-PBG-3057, TR-PBG-314, TR-PBG-327, TR-PBG-345, TR-PBG-346, TR- Examples of the oxime compound include PBG-358, TR-PBG-365, TR-PBG-380, TR-PBG-610, TR-PBG-A, and TR-PBG-B (all manufactured by TRONLY Corporation), and ADEKA OPTOMER N-1919 (manufactured by ADEKA Corporation; photopolymerization initiator 2 described in JP 2012-014052 A). In addition, it is also preferable to use, as the oxime compound, a compound that is not colorable or a compound that is highly transparent and does not easily discolor. Commercially available products include ADEKA ARCLES NCI-730, NCI-831, NCI-831E, and NCI-930 (all manufactured by ADEKA Corporation).

[0147] As the photopolymerization initiator, an oxime compound having a fluorene ring, an oxime compound having a skeleton in which at least one benzene ring of a carbazole ring is replaced with a naphthalene ring, an oxime compound having a fluorine atom, an oxime compound having a nitro group, an oxime compound having a benzofuran skeleton, an oxime compound in which a substituent having a hydroxy group is bonded to a carbazole skeleton, or a compound described in paragraphs 0143 to 0149 of WO 2022 / 085485 can also be used.

[0148] As the photopolymerization initiator, a compound represented by formula (OX-1) can also be used.

[0149] In formula (OX-1), X １ａ represents a divalent linking group containing at least one ring selected from the group consisting of an aromatic ring and a heterocyclic ring; １ａ represents a hydrogen atom or an acyl group; R ２ａ represents an alkyl group or an aryl group; R ３ａ and R ４ａ each independently represents a hydrogen atom or an alkyl group; Alk １ and Alk ２ each independently represents an alkyl group; R ３ａ and R ４ａ may be bonded to form a ring, Alk １ and Alk ２ may be bonded to form a ring, and n represents 0 or 1.

[0150] X in formula (OX-1) １ａ Examples of the divalent linking group represented by include a divalent aromatic ring group, a divalent heterocyclic group, a divalent group in which two or more aromatic ring groups are bonded together via a single bond or a linking group, a divalent group in which two or more heterocyclic groups are bonded together via a single bond or a linking group, and a divalent group in which an aromatic ring group and a heterocyclic group are bonded together via a single bond or a linking group. Examples of the linking group that bonds the above-mentioned aromatic ring groups together, heterocyclic groups together, or an aromatic ring group and a heterocyclic group include -CH ２ -, -O-, -CO-, -S-, -NR ｘ - and groups combining these. ｘrepresents a hydrogen atom, an alkyl group, an alkenyl group, an alkynyl group, an aryl group, or a heterocyclic group.

[0151] X in formula (OX-1) １ａ is preferably a group represented by any one of formulas (X-1) to (X-13), more preferably a group represented by formula (X-1), formula (X-2), formula (X-4), formula (X-6) or formula (X-8), and further preferably a group represented by formula (X-2) or formula (X-6).

[0152] In the formula R Ｘ１ ~R Ｘ９ each independently represents a hydrogen atom, an alkyl group, an alkenyl group, an alkynyl group, an aryl group, or a heteroaryl group, and * represents a bond.

[0153] R Ｘ１ ~R Ｘ９ The number of carbon atoms in the alkyl group represented by is preferably 1 to 15, and more preferably 1 to 10. The alkyl group may be linear, branched, or cyclic. The alkyl group may have a substituent. Examples of the substituent include a halogen atom, an aryl group, and a heteroaryl group.

[0154] R Ｘ１ ~R Ｘ９ The number of carbon atoms in the alkenyl group represented by is preferably 2 to 15, and more preferably 2 to 10. The alkenyl group may be linear, branched, or cyclic. The alkenyl group may have a substituent. Examples of the substituent include a halogen atom, an aryl group, and a heteroaryl group.

[0155] R Ｘ１ ~R Ｘ９ The number of carbon atoms in the alkynyl group represented by is preferably 2 to 15, and more preferably 2 to 10. The alkynyl group may be linear, branched, or cyclic. The alkynyl group may have a substituent. Examples of the substituent include a halogen atom, an aryl group, and a heteroaryl group.

[0156] R Ｘ１ ~R Ｘ９The number of carbon atoms in the aryl group represented by is preferably 6 to 20, more preferably 6 to 12, still more preferably 6 to 10, and particularly preferably 6. The aryl group may have a substituent. Examples of the substituent include a halogen atom, an alkyl group, an alkenyl group, an alkynyl group, and a heteroaryl group.

[0157] R Ｘ１ ~R Ｘ９ The heteroaryl group represented by is preferably a 5-membered or 6-membered ring. The heteroatoms contained in the heteroaryl group are preferably oxygen atoms, nitrogen atoms, and sulfur atoms. The number of heteroatoms contained in the heteroaryl group is preferably 1 to 3. The heteroaryl group may have a substituent. Examples of the substituent include a halogen atom, an alkyl group, an alkenyl group, an alkynyl group, and an aryl group.

[0158] R in formula (OX-1) １ａ represents a hydrogen atom or an acyl group, and is preferably an acyl group.

[0159] R in formula (OX-1) ２ａ represents an alkyl group or an aryl group, and is preferably an alkyl group because the reactivity of the generated radical is high. ２ａ The number of carbon atoms in the alkyl group represented by is preferably 1 to 15, more preferably 1 to 10, even more preferably 1 to 5, and even more preferably 1 to 3. The alkyl group may be linear, branched, or cyclic, but is preferably linear or branched, and more preferably linear. The alkyl group may have a substituent, but is preferably an unsubstituted alkyl group. R ２ａ The alkyl group represented by R is preferably an unsubstituted linear or branched alkyl group, and more preferably an unsubstituted linear alkyl group. ２ａ The number of carbon atoms in the aryl group represented by is preferably 6 to 20, more preferably 6 to 12, still more preferably 6 to 10, and particularly preferably 6. The aryl group may have a substituent, but is preferably an unsubstituted aryl group.

[0160] R in formula (OX-1) ３ａ and R ４ａR each independently represents a hydrogen atom or an alkyl group, and is preferably a hydrogen atom. ３ａ and R ４ａ The number of carbon atoms in the alkyl group represented by is preferably 1 to 15, more preferably 1 to 10, even more preferably 1 to 5, and even more preferably 1 to 3. The alkyl group may be linear, branched, or cyclic, but is preferably linear or branched, and more preferably linear. The alkyl group may have a substituent, but is preferably an unsubstituted alkyl group. R ３ａ and R ４ａ may be bonded to form a ring. The ring formed is preferably a 5- or 6-membered ring, and more preferably a 5- or 6-membered aliphatic hydrocarbon ring.

[0161] Alk of formula (OX-1) １ and Alk ２ each independently represents an alkyl group. The number of carbon atoms in the alkyl group is preferably 1 to 15, more preferably 1 to 10, even more preferably 1 to 5, and even more preferably 1 to 3. The alkyl group may be linear, branched, or cyclic, but is preferably linear or branched, and more preferably linear. The alkyl group may have a substituent, but is preferably an unsubstituted alkyl group. Alk １ and Alk ２ may be bonded to form a ring, and preferably form a ring. The ring formed is preferably a 5- or 6-membered ring, more preferably a 5- or 6-membered aliphatic hydrocarbon ring, and more preferably a cyclopentane ring or a cyclohexane ring.

[0162] In formula (OX-1), n ​​represents 0 or 1, and is preferably 0.

[0163] Specific examples of the compound represented by formula (OX-1) include the compounds described in paragraphs 0092 to 0096 of JP-A No. 2012-113104 and the compound described in paragraph 0041 of JP-A No. 2012-189997.

[0164] As the photopolymerization initiator, a compound represented by formula (OX-2) can also be used.

[0165]

[0166] In formula (OX-2), R １ｂ and R ２ｂ each independently represents a substituent, R ３ｂ ~R ７ｂ each independently represents a hydrogen atom or a substituent, Ar １ｂ represents an aryl group which may have a substituent or a heteroaryl group which may have a substituent; n represents 0 or 1;

[0167] R １ｂ and R ２ｂ Examples of the substituent represented by include an alkyl group and an aryl group, and an alkyl group is preferred. The alkyl group preferably has 1 to 15 carbon atoms, and more preferably 1 to 10 carbon atoms. The alkyl group may be linear, branched, or cyclic. The alkyl group may have a substituent. Examples of the substituent include a halogen atom, an aryl group, an alkenyl group, an alkynyl group, and a heteroaryl group. The aryl group preferably has 6 to 20 carbon atoms, more preferably 6 to 12 carbon atoms, even more preferably 6 to 10 carbon atoms, and particularly preferably 6 carbon atoms. The aryl group may have a substituent. Examples of the substituent include a halogen atom, an alkyl group, an alkenyl group, an alkynyl group, and a heteroaryl group.

[0168] R ３ｂ ~R ７ｂ Examples of the substituent represented by R include a halogen atom, an alkyl group, and an aryl group. Examples of the alkyl group and the aryl group include those described above. ３ｂ ~R ７ｂ is preferably a hydrogen atom.

[0169] Ar １ｂ represents an aryl group which may have a substituent or a heteroaryl group which may have a substituent, Ar １ｂis preferably an aryl group which may have a substituent. The number of carbon atoms in the aryl group is preferably 6 to 20, more preferably 6 to 12, still more preferably 6 to 10, and particularly preferably 6. Examples of the substituent include a halogen atom, an alkyl group, an alkoxy group, an aryl group, an aryloxy group, an alkylthio group, an arylthio group, a nitro group, and an acyl group, and an acyl group is preferred.

[0170] As the photopolymerization initiator, a compound represented by formula (OX-3) can also be used.

[0171]

[0172] In formula (OX-3), Ar １ｃ represents a (k+m+1)-valent aromatic ring group or a (k+m+1)-valent heterocyclic group; Ar ２ｃ represents a (k+2)-valent aromatic ring group or a (k+2)-valent heterocyclic group; R １ｃ ~R ３ｃ each independently represents a substituent; １ｃ is a single bond or CR １１ｃ R １２ｃ represents R １１ｃ and R １２ｃ each independently represents a hydrogen atom, an alkyl group, or an aryl group; １ｃ Ha-CH ２ represents -, -N-, -O- or -S-; k represents 0 or 1; m represents an integer of 0 to 4; and n represents 0 or 1.

[0173] R １ｃ and R ２ｃExamples of the substituent represented by include an alkyl group and an aryl group, and an alkyl group is preferred. The alkyl group preferably has 1 to 15 carbon atoms, and more preferably 1 to 10 carbon atoms. The alkyl group may be linear, branched, or cyclic. The alkyl group may have a substituent. Examples of the substituent include a halogen atom, an aryl group, an alkenyl group, an alkynyl group, and a heteroaryl group. The aryl group preferably has 6 to 20 carbon atoms, more preferably 6 to 12 carbon atoms, even more preferably 6 to 10 carbon atoms, and particularly preferably 6 carbon atoms. The aryl group may have a substituent. Examples of the substituent include a halogen atom, an alkyl group, an alkenyl group, an alkynyl group, and a heteroaryl group. R ２ｃ is preferably an alkyl group having a branched or cyclic structure.

[0174] R ３ｃ Examples of the substituent represented by include a halogen atom, an alkyl group, an alkoxy group, an aryl group, an aryloxy group and an acyl group, and an acyl group is preferred.

[0175] L １ｃ is a single bond or CR １１ｃ R １２ｃ represents R １１ｃ and R １２ｃ R each independently represents a hydrogen atom, an alkyl group, or an aryl group. １１ｃ and R １２ｃ The alkyl group and aryl group in R １ｃ and R ２ｃ When k is 1, L １ｃ is preferably a single bond.

[0176] X １ｃ is -CH ２ It represents -, -N-, -O- or -S-, and is preferably -O- or -S-.

[0177] Ar １ｃrepresents a (k+m+1)-valent aromatic ring group or a (k+m+1)-valent heterocyclic group, and is preferably a (k+m+1)-valent aromatic ring group. The aromatic ring group is preferably a benzene ring group or a naphthalene ring group, and more preferably a benzene ring group.

[0178] Ar ２ｃ represents a (k+2)-valent aromatic ring group or a (k+2)-valent heterocyclic group, and is preferably a (k+2)-valent aromatic ring group. The aromatic ring group is preferably a benzene ring group or a naphthalene ring group, and more preferably a benzene ring group.

[0179] k represents 0 or 1, and is preferably 0. m represents an integer of 0 to 4, and is preferably 0 or 1, and more preferably 1. n represents 0 or 1, and is preferably 0.

[0180] As the photopolymerization initiator, a ketoxime ester compound having an aryloxy group at the ortho position, represented by formula (OX-4), can also be suitably used. Examples of such compounds include the compounds described in Chinese Patent Application Publication No. 117342977.

[0181] In formula (OX-4), R １ｄ and R ２ｄ each independently represents an alkyl group, an aryl group, or a heterocyclic group; R ３ｄ , R ４ｄ , R ５ｄ , R ６ｄ are each independently a hydrogen atom, a halogen atom, CN, or NO ２ , C.F. ３ ,R,OR,SR,SOR,SO ２ R or NRR', R and R' each independently represent an alkyl group or an aryl group, and when R and R' are present at the same time, R and R' may be bonded to form a ring, and one or more -CH in the alkyl group or aryl group represented by R and R' ２ - may be independently substituted with -O-, -N-, -S-, -CO-, -COO-, -OCO- or a benzene ring; R ７ｄ , R８ｄ and R ９ｄ each independently represents a hydrogen atom or a methyl group.

[0182] The photopolymerization initiator may also be a compound represented by formula (OX-5). Examples of such a compound include the compounds described in WO 2024 / 101219.

[0183] In formula (OX-5), R １ｅ ~R ｅ５ each independently represents a hydrocarbon group which may have a substituent; n represents an integer of 0 to 4.

[0184] Specific examples of the oxime compound include the compounds shown below.

[0185]

[0186]

[0187]

[0188]

[0189]

[0190] As the photopolymerization initiator, a bifunctional or trifunctional or higher functional photopolymerization initiator may be used. Specific examples of the bifunctional or trifunctional or higher functional photopolymerization initiator include the compounds described in paragraph 0148 of WO 2022 / 065215.

[0191] The content of the photopolymerization initiator in the total solid content of the composition is preferably 0.1 to 30% by mass. The lower limit is preferably 0.5% by mass or more, and more preferably 1% or more. The upper limit is preferably 25% by mass or less, more preferably 20% by mass or less, and even more preferably 15% by mass or less. Only one type of photopolymerization initiator may be used, or two or more types may be used. When two or more types are used, it is preferable that the total amount thereof be within the above range.

[0192] <<Curing Agent>> When the composition of the present invention contains a compound having a cyclic ether group, it is preferable that the composition of the present invention further contains a curing agent. Examples of curing agents include amine compounds, acid anhydride compounds, amide compounds, phenolic compounds, polycarboxylic acids, and thiol compounds. Specific examples of curing agents include succinic acid, trimellitic acid, pyromellitic acid, N,N-dimethyl-4-aminopyridine, and pentaerythritol tetrakis(3-mercaptopropionate). The curing agent may also be a compound described in paragraphs 0072 to 0078 of JP 2016-075720 A or a compound described in JP 2017-036379 A. The content of the curing agent is preferably 0.01 to 20 parts by mass, more preferably 0.01 to 10 parts by mass, and even more preferably 0.1 to 6.0 parts by mass, per 100 parts by mass of the compound having a cyclic ether group.

[0193] <<Ultraviolet Absorber>> The composition of the present invention may contain an ultraviolet absorber. Examples of the ultraviolet absorber include conjugated diene compounds, aminodiene compounds, salicylate compounds, benzophenone compounds, benzotriazole compounds, acrylonitrile compounds, hydroxyphenyltriazine compounds, indole compounds, triazine compounds, and dibenzoyl compounds. Examples of ultraviolet absorbers include compounds described in paragraphs 0038 to 0052 of JP 2009-217221 A, compounds described in paragraphs 0052 to 0072 of JP 2012-208374 A, compounds described in paragraphs 0317 to 0334 of JP 2013-068814 A, compounds described in paragraphs 0061 to 0080 of JP 2016-162946 A, compounds described in paragraphs 0059 to 0076 of WO 2016 / 181987 A, compounds described in paragraphs 0052 and 0074 of WO 2021 / 131355 A, and compounds described in paragraphs 0021 / 132247 A. The compounds described in paragraphs 0022 to 0024 of the same publication, the compounds described in paragraph 0179 of International Publication No. 2022 / 085485, the reactive triazine ultraviolet absorbers described in JP 2021-178918 A, the ultraviolet absorbers described in JP 2022-007884 A, the compounds described in Korean Patent Publication No. 10-2022-0014454 A, the compounds described in JP 2023-013321 A, the compounds described in paragraphs 0049 to 0059 of Japanese Patent No. 6268967 A, the compounds described in JP 2023-178225 A can also be used. Commercially available ultraviolet absorbers include the Tinuvin series and Uvinul (Uvinal) series manufactured by BASF Corporation. Further, examples of benzotriazole compounds include the MYUA series manufactured by Miyoshi Oil & Fats (The Chemical Daily, February 1, 2016). The content of the ultraviolet absorber in the total solid content of the composition is preferably 0.01 to 30% by mass. The lower limit is preferably 0.05% by mass or more. The upper limit is preferably 25% by mass or less, more preferably 20% by mass or less, even more preferably 10% by mass or less, and particularly preferably 5% by mass or less. Only one type of ultraviolet absorber may be used, or two or more types may be used.When two or more types are used, the total amount thereof is preferably within the above range.

[0194] <<Polymerization Inhibitor>> The composition of the present invention may contain a polymerization inhibitor. Examples of polymerization inhibitors include hydroquinone, p-methoxyphenol, di-tert-butyl-p-cresol, pyrogallol, tert-butylcatechol, benzoquinone, 4,4'-thiobis(3-methyl-6-tert-butylphenol), 2,2'-methylenebis(4-methyl-6-t-butylphenol), N-nitrosophenylhydroxyamine salts (ammonium salts, cerous salts, etc.), and 2,2,6,6-tetramethylpiperidine 1-oxyl, with p-methoxyphenol being preferred. The content of the polymerization inhibitor in the total solids content of the composition is preferably 0.0001 to 5% by mass. Only one type of polymerization inhibitor may be used, or two or more types may be used. When two or more types are used, it is preferable that the total amount thereof be within the above range.

[0195] <<Silane Coupling Agent>> The composition of the present invention can contain a silane coupling agent. The silane coupling agent is preferably a silane compound having a hydrolyzable group, and more preferably a silane compound having a hydrolyzable group and other functional groups. The hydrolyzable group refers to a substituent directly bonded to a silicon atom that can form a siloxane bond by at least one of a hydrolysis reaction and a condensation reaction. Examples of the hydrolyzable group include a halogen atom, an alkoxy group, and an acyloxy group, with an alkoxy group being preferred. The silane coupling agent is preferably a compound having an alkoxysilyl group. Furthermore, examples of functional groups other than the hydrolyzable group include a vinyl group, a styrene group, a (meth)acryloyl group, a mercapto group, an epoxy group, an oxetanyl group, an amino group, a ureido group, a sulfide group, an isocyanate group, and a phenyl group, with a (meth)acryloyl group and an epoxy group being preferred. Examples of silane coupling agents include the compounds described in paragraph 0177 of WO 2022 / 085485 and the compounds described in JP 2019-183020 A. The content of the silane coupling agent in the total solid content of the composition is preferably 0.1 to 15% by mass. The upper limit is preferably 10% by mass or less, more preferably 5% by mass or less. The lower limit is preferably 0.5% by mass or more, more preferably 1% by mass or more. Only one type of silane coupling agent may be used, or two or more types may be used. When two or more types are used, it is preferable that the total amount thereof is within the above range.

[0196] <<Surfactant>> The composition of the present invention may contain a surfactant. As the surfactant, various surfactants such as a fluorine-based surfactant, a nonionic surfactant, a cationic surfactant, an anionic surfactant, and a silicone-based surfactant may be used. The surfactant is preferably a silicone-based surfactant or a fluorine-based surfactant. For details of the surfactant, reference may be made to the surfactants described in paragraphs 0238 to 0245 of WO 2015 / 166779, the contents of which are incorporated herein by reference.

[0197] As the fluorine-based surfactant, the compounds described in paragraphs 0167 to 0173 of WO 2022 / 085485 can be used.

[0198] Examples of nonionic surfactants include the compounds described in paragraph 0174 of WO 2022 / 085485.

[0199] Examples of silicone surfactants include SH8400, SH8400 FLUID, FZ-2122, 67 Additive, 74 Additive, M Additive, and SF 8419. OIL (all manufactured by Dow Toray Industries, Inc.), TSF-4440, TSF-4300, TSF-4445, TSF-4460, TSF-4452 (all manufactured by Momentive Performance Materials), KP-341, KF-6000, KF-6001, KF-6002, KF-6003 (all manufactured by Shin-Etsu Chemical Co., Ltd.), BYK-307, BYK-322, BYK-323, BYK-330, BYK-3760, BYK-UV3510 (all manufactured by BYK-Chemie). As the silicone surfactant, compounds having the following structure can also be used.

[0200] The content of the surfactant in the total solid content of the composition is preferably 0.001 to 5% by mass. The lower limit is preferably 0.005% by mass or more. The upper limit is preferably 3% by mass or less, more preferably 1% by mass or less, even more preferably 0.5% by mass or less, and particularly preferably 0.2% by mass or less. Only one type of surfactant may be used, or two or more types may be used. When two or more types are used, it is preferable that the total amount thereof is within the above range.

[0201] <<Antioxidant>> The composition of the present invention may contain an antioxidant. Examples of antioxidants include phenolic antioxidants, amine antioxidants, phosphorus-based antioxidants, and sulfur-based antioxidants. Examples of phenolic antioxidants include hindered phenol compounds. The phenolic antioxidant is preferably a compound having a substituent at the position adjacent to the phenolic hydroxy group (ortho position). The substituent is preferably a substituted or unsubstituted alkyl group having 1 to 22 carbon atoms. The antioxidant is also preferably a compound having a phenol group and a phosphite ester group in the same molecule. Examples of phosphorus-based antioxidants include tris[2-[[2,4,8,10-tetrakis(1,1-dimethylethyl)dibenzo[d,f][1,3,2]dioxaphosphepin-6-yl]oxy]ethyl]amine, tris[2-[(4,6,9,11-tetra-tert-butyldibenzo[d,f][1,3,2]dioxaphosphepin-2-yl)oxy]ethyl]amine, ethyl bis(2,4-di-tert-butyl-6-methylphenyl)phosphite, and tris(2,4-di-tert-butylphenyl)phosphite. Examples of commercially available antioxidants include ADK STAB AO-20, ADK STAB AO-30, ADK STAB AO-40, ADK STAB AO-50, ADK STAB AO-50F, ADK STAB AO-60, ADK STAB AO-60G, ADK STAB AO-80, ADK STAB AO-330, ADK STAB AO-412S, ADK STAB 2112, ADK STAB PEP-36, ADK STAB HP-10 (all manufactured by ADEKA Corporation), and JP-650 (manufactured by Johoku Chemical Industry Co., Ltd.). The antioxidant may be a compound described in paragraphs 0023 to 0048 of Japanese Patent No. 6268967, a compound described in International Publication No. WO 2017 / 006600, a compound described in International Publication No. WO 2017 / 164024, or a compound described in Korean Patent Publication No. 10-2019-0059371. The content of the antioxidant in the total solid content of the composition is preferably 0.01 to 20% by mass. The lower limit is preferably 0.3% by mass or more, and more preferably 0.5% by mass or more. The upper limit is preferably 15% by mass or less, and more preferably 10% by mass or less.The antioxidant may be used alone or in combination of two or more kinds. When two or more kinds are used, the total amount thereof is preferably within the above range.

[0202] <<Other Components>> The composition of the present invention may contain, as necessary, sensitizers, fillers, heat curing accelerators, plasticizers, and other auxiliary agents (e.g., conductive particles, antifoaming agents, flame retardants, leveling agents, release accelerators, fragrances, surface tension modifiers, chain transfer agents, latent antioxidants, etc.). By appropriately incorporating these components, properties such as film physical properties can be adjusted. As these components, compounds described in paragraph 0182 of WO 2022 / 085485 can be used. In addition, as chain transfer agents, thiol compounds described in JP 2020-109068 A can be used. In addition, as other components, compounds having two or more triethoxysilyl groups described in JP 2023-180607 A can be used.

[0203] The composition of the present invention preferably has a free metal content of 100 ppm or less, more preferably 50 ppm or less. The free halogen content is preferably 100 ppm or less, more preferably 50 ppm or less. Methods for reducing the free metals and halogens in the composition include washing with ion-exchanged water, filtration, ultrafiltration, purification with an ion-exchange resin, and purification with an inorganic adsorbent such as hydrotalcite.

[0204] From the standpoint of environmental regulations, the use of perfluoroalkyl sulfonic acids and their salts, and perfluoroalkyl carboxylic acids and their salts may be restricted. When the content of the above-mentioned compounds in the composition of the present invention is reduced, the content of perfluoroalkyl sulfonic acids (particularly perfluoroalkyl sulfonic acids having a perfluoroalkyl group with 6 to 8 carbon atoms) and their salts, and perfluoroalkyl carboxylic acids (particularly perfluoroalkyl carboxylic acids having a perfluoroalkyl group with 6 to 8 carbon atoms) and their salts is preferably in the range of 0.01 ppb to 1,000 ppb, more preferably in the range of 0.05 ppb to 500 ppb, and even more preferably in the range of 0.1 ppb to 300 ppb, based on the total solids content of the composition. The composition of the present invention may be substantially free of perfluoroalkyl sulfonic acids and their salts, and perfluoroalkyl carboxylic acids and their salts. For example, by using a compound that can replace perfluoroalkyl sulfonic acid and its salt, and a compound that can replace perfluoroalkyl carboxylic acid and its salt, a composition that is substantially free of perfluoroalkyl sulfonic acid and its salt, and perfluoroalkyl carboxylic acid and its salt may be selected. Examples of compounds that can replace restricted compounds include compounds that are exempt from restrictions due to differences in the number of carbon atoms in the perfluoroalkyl group. However, the above does not preclude the use of perfluoroalkyl sulfonic acid and its salt, and perfluoroalkyl carboxylic acid and its salt. The composition of the present invention may contain perfluoroalkyl sulfonic acid and its salt, and perfluoroalkyl carboxylic acid and its salt within the maximum allowable range.

[0205] From the viewpoint of environmental regulations, the content of the fluorine-containing compound in the composition may be 5% by mass or less, 1% by mass or less, 100 ppm by mass or less, or 1 ppm by mass or less, or may be substantially free of the fluorine-containing compound.

[0206] <Storage container> The storage container for the composition of the present invention is not particularly limited, and a known storage container can be used. In addition, the container described in paragraph 0187 of WO 2022 / 085485 can be used as the storage container.

[0207] <Method for Preparing Composition> The composition of the present invention can be prepared by mixing the above-mentioned components. When preparing the composition, all components may be simultaneously dissolved or dispersed in a solvent to prepare the composition, or, if necessary, two or more solutions or dispersions in which the respective components are appropriately blended may be prepared in advance, and these may be mixed at the time of use (at the time of application) to prepare the composition.

[0208] The preparation of the composition may include a process for dispersing the pigment. In the process for dispersing the pigment, mechanical forces used to disperse the pigment include compression, squeezing, impact, shear, and cavitation. Specific examples of these processes include a bead mill, a sand mill, a roll mill, a ball mill, a paint shaker, a microfluidizer, a high-speed impeller, a sand grinder, a flow jet mixer, high-pressure wet atomization, and ultrasonic dispersion. Furthermore, when grinding the pigment in a sand mill (bead mill), it is preferable to use small-diameter beads, increase the bead packing ratio, or otherwise increase the grinding efficiency under such conditions. Furthermore, it is preferable to remove coarse particles after the grinding process by filtration, centrifugation, or the like. In addition, the process and disperser for dispersing pigments can be suitably used, for example, the process and disperser described in "Dispersion Technology Encyclopedia," published by Joho Kiko Co., Ltd., July 15, 2005, or "Comprehensive Collection of Dispersion Technology and Industrial Applications Focused on Suspension (Solid / Liquid Dispersion System)," published by the Management Development Center Publishing Department, October 10, 1978, or paragraph 0022 of JP 2015-157893 A. In addition, in the process for dispersing pigments, the pigment may be subjected to a salt milling process to refine the pigment. For details of the materials, equipment, processing conditions, etc. used in the salt milling process, see, for example, JP 2015-194521 A and JP 2012-046629 A. Examples of materials for beads used in dispersion include zirconia, agate, quartz, titania, tungsten carbide, silicon nitride, alumina, stainless steel, and glass. The beads may also be made of an inorganic compound having a Mohs hardness of at least 2. The composition may contain 1 to 10,000 ppm of the beads.

[0209] When preparing the composition, it is preferable to filter the composition with a filter for the purpose of removing foreign matter, reducing defects, etc. Examples of the types of filters and filtration methods used for filtration include the filters and filtration methods described in paragraphs 0196 to 0199 of WO 2022 / 085485.

[0210] <Film> Next, the film of the present invention will be described. The film of the present invention is obtained from the composition of the present invention described above. The film of the present invention can be preferably used as an optical filter. The use of the optical filter is not particularly limited, but examples include infrared cut filters and infrared transmission filters. Examples of infrared cut filters include infrared cut filters on the light-receiving side of a solid-state imaging device (e.g., as an infrared cut filter for a wafer-level lens), infrared cut filters on the back side (opposite the light-receiving side) of a solid-state imaging device, and infrared cut filters for ambient light sensors (e.g., an illuminance sensor that senses the illuminance and color tone of the environment in which an information terminal device is placed and adjusts the color tone of the display, or a color correction sensor that adjusts the color tone). In particular, it can be preferably used as an infrared cut filter on the light-receiving side of a solid-state imaging device. Examples of infrared transmission filters include filters that block visible light and selectively transmit infrared rays of a specific wavelength or more.

[0211] The film of the present invention may have a pattern or may be a film without a pattern (flat film). The film of the present invention may be used by being laminated on a support, or may be used by being peeled off from the support. Examples of the support include semiconductor substrates such as silicon substrates and transparent substrates.

[0212] A charge-coupled device (CCD), a complementary metal oxide semiconductor (CMOS), a photoelectric conversion layer, a transparent conductive film, or the like may be formed on the semiconductor substrate used as a support. Furthermore, a partition wall is formed on the semiconductor substrate to separate each pixel. Examples of the partition wall include a metal, a metal oxide, and a black matrix. Furthermore, if necessary, an undercoat layer may be provided on the semiconductor substrate to improve adhesion with an upper layer, prevent diffusion of substances, or flatten the substrate surface.

[0213] The transparent substrate used as the support is not particularly limited as long as it is made of a material that can transmit at least visible light. Examples of substrates include substrates made of glass, resin, and the like. Examples of resins include polyester resins such as polyethylene terephthalate and polybutylene terephthalate; polyolefin resins such as polyethylene, polypropylene, and ethylene-vinyl acetate copolymer; acrylic resins such as norbornene resin, polyacrylate, and polymethyl methacrylate; urethane resin, vinyl chloride resin, fluororesin, polycarbonate resin, polyvinyl butyral resin, and polyvinyl alcohol resin. Examples of glass include soda-lime glass, borosilicate glass, alkali-free glass, quartz glass, and copper-containing glass. Examples of copper-containing glass include copper-containing phosphate glass and copper-containing fluorophosphate glass. Commercially available copper-containing glass can also be used. Examples of commercially available copper-containing glass include NF-50 (manufactured by AGC Technoglass Co., Ltd.).

[0214] The thickness of the film of the present invention can be adjusted appropriately depending on the purpose. The thickness of the film can be 200 μm or less, 150 μm or less, 120 μm or less, 20 μm or less, 10 μm or less, or 5 μm or less. The lower limit of the film thickness is preferably 0.1 μm or more, more preferably 0.2 μm or more.

[0215] When the film of the present invention is used as an infrared cut filter, the film of the present invention preferably has a maximum absorption wavelength in the wavelength range of 650 to 1500 nm (preferably 660 to 1200 nm, more preferably 660 to 1000 nm). The average transmittance in the wavelength range of 400 to 550 nm is preferably 86% or more, more preferably 89% or more, even more preferably 92% or more, and particularly preferably 95% or more. The transmittance over the entire wavelength range of 420 to 550 nm is preferably 50% or more, more preferably 70% or more, and even more preferably 80% or more. The transmittance at at least one point in the wavelength range of 650 to 1500 nm (preferably 660 to 1200 nm, more preferably 660 to 1000 nm) is preferably 10% or less, more preferably 7% or less, even more preferably 4% or less, and particularly preferably 2% or less. Furthermore, when the absorbance at the maximum absorption wavelength of the film of the present invention is taken as 1, the average absorbance in the wavelength range of 400 to 550 nm is preferably less than 0.030, more preferably less than 0.025.

[0216] When the film of the present invention is used as an infrared transmission filter, it is preferable that the film of the present invention has, for example, any one of the following spectral characteristics (i1) to (i3). (i1): A filter having a maximum transmittance of 20% or less (preferably 15% or less, more preferably 10% or less) in the wavelength range of 400 to 850 nm, and a minimum transmittance of 70% or more (preferably 75% or more, more preferably 80% or more) in the wavelength range of 1000 to 1500 nm. A film having such spectral characteristics can block light in the wavelength range of 400 to 850 nm and transmit light with wavelengths longer than 950 nm. (i2): A filter having a maximum transmittance of 20% or less (preferably 15% or less, more preferably 10% or less) in the wavelength range of 400 to 950 nm, and a minimum transmittance of 70% or more (preferably 75% or more, more preferably 80% or more) in the wavelength range of 1100 to 1500 nm. A film having such spectral characteristics can block light in the wavelength range of 400 to 950 nm and transmit light with wavelengths longer than 1050 nm. (i3): A filter having a maximum transmittance of 20% or less (preferably 15% or less, more preferably 10% or less) in the wavelength range of 400 to 1050 nm and a minimum transmittance of 70% or more (preferably 75% or more, more preferably 80% or more) in the wavelength range of 1200 to 1500 nm. A film having such spectral characteristics can block light in the wavelength range of 400 to 1050 nm and transmit light with wavelengths longer than 1150 nm.

[0217] The film of the present invention can be used in various devices such as solid-state imaging devices such as CCDs (charge-coupled devices) and CMOSs ​​(complementary metal-oxide semiconductors) (the imaging section can be made of compound semiconductors such as InGaAs, organic semiconductors, quantum dots, etc., in addition to Si), infrared sensors, light-emitting elements, optical communication devices (for both transmission and reception), and image display devices.

[0218] <Method for Producing Film> The film of the present invention can be produced through a step of applying the composition of the present invention.

[0219] Examples of the support include those described above. As a method for applying the composition, a known method such as spin coating can be used. For example, the application method described in paragraph 0207 of WO 2022 / 085485 can be used.

[0220] The composition layer formed by applying the composition may be dried (prebaked). When prebaking is performed, the prebaking temperature is preferably 150°C or lower, more preferably 120°C or lower, and even more preferably 110°C or lower. The lower limit can be, for example, 50°C or higher, or can be 80°C or higher. The prebaking time is preferably 10 seconds to 3000 seconds, more preferably 40 to 2500 seconds, and even more preferably 80 to 220 seconds. Drying can be performed using a hot plate, an oven, or the like.

[0221] The film manufacturing method may further include a step of forming a pattern. Examples of the pattern forming method include a pattern forming method using a photolithography method and a pattern forming method using a dry etching method, and a pattern forming method using a photolithography method is preferred. Note that when the film of the present invention is used as a flat film, the step of forming a pattern does not need to be performed. The step of forming a pattern will be described in detail below.

[0222] (When forming a pattern by photolithography) The pattern formation method by photolithography preferably includes a step of patternwise exposing a composition layer formed by applying the composition of the present invention (exposure step), and a step of developing and removing the unexposed portions of the composition layer to form a pattern (development step). If necessary, a step of baking the developed pattern (post-baking step) may be provided. Each step will be described below.

[0223] In the exposure step, the composition layer is exposed to light in a pattern. For example, the composition layer can be exposed to light in a pattern by using a stepper exposure machine, a scanner exposure machine, or the like, through a mask having a predetermined mask pattern. This allows the exposed portion to be cured.

[0224] Examples of radiation (light) that can be used for exposure include g-line and i-line. Light with a wavelength of 300 nm or less (preferably light with a wavelength of 180 to 300 nm) can also be used. Examples of light with a wavelength of 300 nm or less include KrF line (wavelength 248 nm) and ArF line (wavelength 193 nm), with KrF line (wavelength 248 nm) being preferred. Long-wave light sources of 300 nm or more can also be used.

[0225] The exposure may be performed by continuous irradiation with light or by pulsed irradiation (pulse exposure), which is an exposure method in which light irradiation and pauses are repeated in short cycles (e.g., milliseconds or less).

[0226] The irradiation amount (exposure amount) is, for example, 0.03 to 2.5 J / cm ２ is preferred, and 0.05 to 1.0 J / cm ２ The oxygen concentration during exposure can be appropriately selected. In addition to exposure in the atmosphere, exposure may be performed in a low-oxygen atmosphere with an oxygen concentration of 19% by volume or less (e.g., 15% by volume, 5% by volume, or substantially oxygen-free), or in a high-oxygen atmosphere with an oxygen concentration of more than 21% by volume (e.g., 22% by volume, 30% by volume, or 50% by volume). The exposure illuminance can be appropriately set, and is usually 1000 W / m ２ ~100000W / m ２ (For example, 5000 W / m ２ , 15000W / m ２ , or 35,000 W / m ２ The oxygen concentration and exposure illuminance may be appropriately combined. For example, an oxygen concentration of 10% by volume and an illuminance of 10,000 W / m ２ , oxygen concentration 35% by volume, illuminance 20,000 W / m ２ etc.

[0227] Next, the unexposed portions of the composition layer after exposure are developed and removed to form a pattern. The unexposed portions of the composition layer can be developed and removed using a developer. As a result, the unexposed portions of the composition layer in the exposure step are dissolved into the developer, and only the photocured portions remain on the support. The temperature of the developer is preferably, for example, 20 to 30°C. The development time is preferably 20 to 180 seconds. Furthermore, to improve residue removability, the process of shaking off the developer every 60 seconds and then supplying fresh developer may be repeated several times.

[0228] Examples of the developer include organic solvents and alkaline developers, and alkaline developers are preferably used. Regarding the developer and the washing (rinsing) method after development, the developer and washing method described in paragraph 0214 of WO 2022 / 085485 can be used.

[0229] After development and drying, it is preferable to perform additional exposure treatment or heating treatment (post-baking). The additional exposure treatment or post-baking is a post-development curing treatment to ensure complete curing. The heating temperature in post-baking is preferably, for example, 100 to 240°C, more preferably 200 to 240°C. Post-baking can be performed continuously or batchwise using a heating means such as a hot plate, convection oven (hot air circulation dryer), or high-frequency heater to achieve the above conditions for the developed film. When additional exposure treatment is performed, it is preferable that the light used for exposure has a wavelength of 400 nm or less. The additional exposure treatment may also be performed by the method described in Korean Patent Publication No. 10-2017-0122130.

[0230] (When forming a pattern by a dry etching method) Pattern formation by a dry etching method can be performed by a method in which the composition of the present invention is applied to a support to form a composition layer, the composition layer is cured to form a cured layer, a patterned photoresist layer is then formed on the cured layer, and the patterned photoresist layer is then used as a mask to dry etch the cured layer using an etching gas. In forming the photoresist layer, it is preferable to perform a pre-bake treatment. For pattern formation by a dry etching method, the description in paragraphs 0010 to 0067 of JP 2013-064993 A can be referred to, and the contents of this specification are incorporated herein by reference.

[0231] <Optical Filter> The optical filter of the present invention has the above-described film of the present invention. Types of optical filters include infrared cut filters and infrared transmission filters.

[0232] In addition to the above-described film of the present invention, the optical filter of the present invention may further include a copper-containing layer, a dielectric multilayer film, an ultraviolet absorbing layer, etc. Examples of ultraviolet absorbing layers include the absorbing layers described in paragraphs 0040 to 0070 and 0119 to 0145 of International Publication No. 2015 / 099060. Examples of dielectric multilayer films include the dielectric multilayer films described in paragraphs 0255 to 0259 of Japanese Patent Application Laid-Open No. 2014-041318. Examples of copper-containing layers include glass substrates made of copper-containing glass (copper-containing glass substrates) and layers containing copper complexes (copper complex-containing layers). Examples of copper-containing glass substrates include copper-containing phosphate glass and copper-containing fluorophosphate glass. Commercially available copper-containing glass products include NF-50 (manufactured by AGC Technoglass Co., Ltd.), BG-60, and BG-61 (all manufactured by Schott Corporation), and CD5000 (manufactured by HOYA Corporation).

[0233] The optical filter of the present invention may be formed on a support. Examples of the support include those described above. Preferred substrates include transparent substrates made of materials such as glass and resin. Examples of resins include polyester resins such as polyethylene terephthalate and polybutylene terephthalate; polyolefin resins such as polyethylene, polypropylene, and ethylene-vinyl acetate copolymer; acrylic resins such as norbornene resin, polyacrylate, and polymethyl methacrylate; urethane resin, vinyl chloride resin, fluororesin, polycarbonate resin, polyvinyl butyral resin, and polyvinyl alcohol resin. Examples of glass include soda-lime glass, borosilicate glass, alkali-free glass, quartz glass, and copper-containing glass. Furthermore, the optical filter may be formed directly on various elements.

[0234] <Solid-state imaging device> The film of the present invention can be used for a solid-state imaging device. The configuration of the solid-state imaging device is not particularly limited as long as it has a configuration including the film of the present invention and functions as a solid-state imaging device. For example, the following configurations can be mentioned.

[0235] The solid-state imaging device has a support on which a plurality of photodiodes constituting a light-receiving area and transfer electrodes made of polysilicon or the like are disposed; a light-shielding film made of tungsten or the like is disposed on the photodiodes and transfer electrodes, with only the light-receiving portions of the photodiodes being opened; a device protective film made of silicon nitride or the like is disposed on the light-shielding film so as to cover the entire light-shielding film and the light-receiving portions of the photodiodes; and a film of the present invention is disposed on the device protective film. Furthermore, the device protective film may have a light-focusing means (e.g., a microlens, etc.; the same applies hereinafter) disposed below the film of the present invention (on the side closer to the support), or a light-focusing means disposed on the film of the present invention. Furthermore, the color filter may have a structure in which a film forming each pixel is embedded in a space partitioned, for example, in a lattice pattern, by partition walls. In this case, the partition walls preferably have a lower refractive index than each pixel. Examples of imaging devices having such a structure include the devices described in JP 2012-227478 A and JP 2014-179577 A.

[0236] <Image Display Device> The film of the present invention can also be used in an image display device. Examples of image display devices include liquid crystal display devices and organic electroluminescence (organic EL) display devices. Definitions and details of image display devices are described, for example, in "Electronic Display Devices" (written by Akio Sasaki, published by Kogyo Chosakai Co., Ltd. in 1990) and "Display Devices" (written by Nobuaki Ibuki, published by Sangyo Tosho Co., Ltd. in 1989). Liquid crystal display devices are described, for example, in "Next Generation Liquid Crystal Display Technology" (edited by Tatsuo Uchida, published by Kogyo Chosakai Co., Ltd. in 1994). There are no particular limitations on the liquid crystal display device to which the present invention can be applied, and the present invention can be applied to various types of liquid crystal display devices described in the above-mentioned "Next Generation Liquid Crystal Display Technology." The image display device may include a white organic EL element. The white organic EL element preferably has a tandem structure. The tandem structure of organic EL elements is described in, for example, JP 2003-045676 A and Akiyoshi Mikami, editor, "The Frontline of Organic EL Technology Development - High Brightness, High Precision, Long Life, and Know-How Collection," Technical Information Association, pp. 326-328, 2008. The spectrum of white light emitted by the organic EL element preferably has strong maximum emission peaks in the blue region (430-485 nm), green region (530-580 nm), and yellow region (580-620 nm). It is more preferable that the spectrum has a maximum emission peak in the red region (650-700 nm) in addition to these emission peaks. The film of the present invention can also be used as an infrared-transmitting film provided in an opening for infrared communication formed in the frame portion of a protective plate for a display device.

[0237] <Infrared Sensor> The film of the present invention can also be used in an infrared sensor. The configuration of the infrared sensor is not particularly limited as long as it functions as an infrared sensor. Hereinafter, one embodiment of the infrared sensor will be described with reference to the drawings.

[0238] 1 , reference numeral 110 denotes a solid-state imaging element. An infrared cut filter 111 and an infrared transmission filter 114 are disposed on an imaging region of the solid-state imaging element 110. A color filter 112 is disposed on the infrared cut filter 111. A microlens 115 is disposed on the incident light hν side of the color filter 112 and the infrared transmission filter 114. A planarization layer 116 is formed to cover the microlens 115.

[0239] The infrared cut filter 111 can be formed using the composition of the present invention. The color filter 112 is a color filter formed with pixels that transmit and absorb light of specific wavelengths in the visible range, and is not particularly limited, and a conventionally known color filter for forming pixels can be used. For example, a color filter formed with red (R), green (G), and blue (B) pixels can be used. For example, the description in paragraphs 0214 to 0263 of JP 2014-043556 A can be referred to, and the contents of this document are incorporated herein. The characteristics of the infrared transmission filter 114 are selected according to the emission wavelength of the infrared LED used. The infrared transmission filter 114 can be formed using the composition of the present invention.

[0240] In the infrared sensor shown in FIG. 1 , an infrared cut filter (another infrared cut filter) other than the infrared cut filter 111 may be disposed on the planarization layer 116. Examples of the other infrared cut filter include those having a copper-containing layer and / or a dielectric multilayer film. Details of these filters are as described above. Furthermore, a dual bandpass filter may be used as the other infrared cut filter.

[0241] <Camera Module> The film of the present invention can also be used in a camera module. The configuration of the camera module is not particularly limited as long as it has the film of the present invention and functions as a camera module. For example, a camera module can be configured to have a solid-state image sensor, a lens, and a circuit for processing images obtained from the solid-state image sensor. Known lenses and circuits for processing images obtained from the solid-state image sensor used in the camera module can be used. Examples of camera modules include the camera modules described in JP 2016-006476 A and JP 2014-197190 A, the contents of which are incorporated herein by reference.

[0242] <Light-emitting element> The film of the present invention can also be used for a light-emitting element. The configuration of the light-emitting element is not particularly limited as long as it functions as a light-emitting element, and examples thereof include light-emitting diodes (LEDs), organic light-emitting diodes (OLEDs), quantum dot light-emitting diodes (QLEDs), and vertical-cavity surface-emitting lasers (VISELs). The film of the present invention may be formed directly on the light-emitting element, or may be disposed on the light-emitting path.

[0243] <Optical Communication Element> The film of the present invention can also be used in an optical communication element. The configuration of the optical communication element is not particularly limited as long as it functions as an optical communication element, and it may be a transmitting element or a receiving element. Examples of optical communication elements include infrared remote controls, infrared transceivers, optical interposers, and optical interconnections. The film of the present invention may be formed directly on a receiving element, or may be formed directly on a transmitting element, or may be disposed on a transmitting / receiving path.

[0244] The present invention will be explained in more detail below with reference to examples. The materials, amounts used, ratios, treatment details, treatment procedures, etc. shown in the following examples can be changed as appropriate without departing from the spirit of the present invention. In addition, in the structural formulas shown below, Me is a methyl group, Boc is a tert-butoxycarbonyl group, Ms is a methanesulfonyl group, and Ph is a phenyl group. ｉ C ８ H １７represents a branched alkyl group having 8 carbon atoms, ｉ C １０ H ２１ represents an alkyl group having 10 carbon atoms and a branched structure.

[0245] <Synthesis Examples> (Synthesis Example 1) Synthesis of Compound IR1 -Synthesis Process of Compound (a-5)- Compound (a-5) is synthesized according to the method described in the literature (Macromol. Chem Phys. 2017, 218, 1600617).

[0246] -Synthesis process of compound (b-3)- Compound (b-2) is synthesized according to the method described in Japanese Patent No. 6760805. 19 parts by mass of compound (b-2), 6.9 parts by mass of potassium carbonate (Fujifilm Wako Pure Chemical Industries, Ltd.), 10 parts by mass of p-phenolboronic acid pinacol ester (Fujifilm Wako Pure Chemical Industries, Ltd.), 15 parts by mass of toluene, and 15 parts by mass of dimethylacetamide are placed in a flask and stirred at 90°C for 24 hours. After the reaction, 40 parts by mass of hexane, 20 parts by mass of ethyl acetate, and 60 parts by mass of water are added and stirred for 15 minutes. Thereafter, the aqueous layer is removed by a separation operation, and then 60 parts by mass of a 1N aqueous sodium hydroxide solution is added, followed by stirring and separation again and the aqueous layer is removed. The organic layer is concentrated using a rotary evaporator to obtain 22 parts by mass of compound (b-3).

[0247] -Synthesis step of compound (c)- 8 parts by mass of compound (a-5), 13 parts by mass of compound (b-3), 32 parts by mass of cesium carbonate (manufactured by Fujifilm Wako Pure Chemical Industries, Ltd.), 0.8 parts by mass of bis[di-tert-butyl(4-dimethylaminophenyl)phosphine]dichloropalladium(II) (manufactured by Tokyo Chemical Industry Co., Ltd.), 16 parts by mass of toluene, and 1.6 parts by mass of water were placed in a flask and stirred at 100°C for 3 hours. After the reaction, 8 parts by mass of toluene and 24 parts by mass of water were added and stirred for 15 minutes. Thereafter, the aqueous layer was removed by a separation operation, and the organic layer was concentrated using a rotary evaporator. The resulting residue was purified by column chromatography (chloroform:hexane = 1:1) to obtain 4.8 parts by mass of compound (c).

[0248] -Synthesis process of compound (e)- 13 parts by mass of compound (c) was placed in a flask and heated at 220°C for 10 minutes. After cooling to room temperature, 80 parts by mass of orthodichlorobenzene and 14 parts by mass of phosphorus oxychloride (manufactured by Fujifilm Wako Pure Chemical Industries, Ltd.) were added to the flask and stirred at 100°C for 0.5 hours. 4.1 parts by mass of compound (d) was then added and stirred at 100°C for 1 hour. After the reaction, 140 parts by mass of methanol was added at 30°C, and the crystals were filtered off. The resulting crystals were dried with a blower at 50°C to obtain 3.8 parts by mass of compound (e). A solution of compound (e) dissolved in chloroform showed a maximum absorption wavelength (λmax) of 868 nm when measured by spectroscopic analysis using a UV-visible-near-infrared spectrophotometer (U-4100, manufactured by Hitachi High-Tech Corporation). The results of mass analysis by MALDI TOF-MASS (time-of-flight mass spectrometry) of the obtained crystals are as follows, and the crystals can be identified as compound (e). MALDI TOF-MASS: Calc. for [M+]: 1444.8 Found: 1444.7

[0249] —Synthesis Process of Compound IR1— 30 parts by mass of compound (e), 100 parts by mass of 2-aminoethyl diphenylborinate (manufactured by Tokyo Chemical Industry Co., Ltd., compound (f)), 60 parts by mass of titanium tetrachloride, and 1,000 parts by mass of ortho-dichlorobenzene were placed in a flask and stirred at 100°C for 5 minutes. After the reaction, 2,000 parts by mass of methanol was added at 30°C, and the crystals were then filtered off. The resulting crystals were purified by silica gel chromatography (hexane / chloroform=1:1) to obtain 3.7 parts by mass of compound IR1 (yield: 10%). A solution of compound IR1 dissolved in chloroform showed a maximum absorption wavelength (λmax) of 950 nm when measured by spectroscopic analysis using a UV-visible-near-infrared spectrophotometer (U-4100, manufactured by Hitachi High-Tech Corporation). The results of mass analysis by MALDI TOF-MASS (time-of-flight mass spectrometry) of the obtained crystals are as follows, and the crystals can be identified as compound IR1. MALDI TOF-MASS: Calc. for [M+H]: 1774.0 found: 1774.0

[0250] Synthesis Examples 2 to 33 Synthesis of Compounds IR2 to IR33 Compounds IR2 to IR19, IR21, and IR24 to IR33 can be synthesized by performing the same steps as in Synthesis Example 1, except that the types of compound (a-1), compound (b-1), compound (d), and compound (f) in Synthesis Example 1 are changed. Compounds IR20, IR22, and IR23 can be synthesized by performing the same steps as in Synthesis Example 1, except that the types of compound (a-1), compound (b-1), compound (d), and compound (f) in Synthesis Example 1 are changed and titanium tetrachloride is not used. Solutions obtained by dissolving each compound in chloroform or dimethyl sulfoxide exhibit a maximum absorption wavelength (λmax) of 800 nm or longer when measured by spectroscopic analysis using an ultraviolet-visible-near-infrared spectrophotometer (U-4100, manufactured by Hitachi High-Tech Corporation).

[0251]

[0252]

[0253]

[0254]

[0255] Synthesis Examples 34 to 42: Synthesis of Compounds IR34 to IR42 Compounds IR34 to IR42 can be synthesized by subjecting compounds IR27 to IR29 to the process described in WO 2018 / 230387. Solutions of each compound dissolved in chloroform or dimethyl sulfoxide exhibit a maximum absorption wavelength (λmax) of 800 nm or longer when measured by spectroscopic analysis using a UV-Vis-NIR spectrophotometer (U-4100, manufactured by Hitachi High-Tech Corporation).

[0256] The structures of compounds IR1 to IR42 are as follows:

[0257] <Preparation of Dispersions> The pigments, derivatives, dispersing resins, and solvents of the types shown in the table below were mixed in the parts by mass shown below, and 117 parts by mass of zirconia beads having a diameter of 0.3 mm were added. The mixture was dispersed for 5 hours using a paint shaker, and the beads were separated by filtration to prepare dispersions 1 to 15, B1, Y1, and Bk1.

[0258]

[0259] The materials listed in the table above are as follows: (Pigments) IR27 to IR33: The above-mentioned compounds IR27 to IR33 PB15:6: C.I. Pigment Blue 15:6 (phthalocyanine compound, blue pigment) PY150: C.I. Pigment Yellow 150 (azo compound, yellow pigment) PR254: C.I. Pigment Red 254 (diketopyrrolopyrrole compound, red pigment)

[0260] (Derivatives) IR34 to IR42: the above-mentioned compounds IR34 to IR42 A1: a compound having the following structure

[0261] (Dispersants) D3: Resin having the following structure (the number attached to the main chain represents the molar ratio, and the number attached to the side chain represents the number of repeating units. Weight average molecular weight: 25,000) D4: Resin having the following structure (the number attached to the main chain represents the molar ratio, and the number attached to the side chain represents the number of repeating units. Weight average molecular weight: 32,000) D5: Resin having the following structure (the number attached to the main chain represents the molar ratio, and the number attached to the side chain represents the number of repeating units. Weight average molecular weight: 15,000) D6: Resin having the following structure (the number attached to the main chain represents the molar ratio, and the number attached to the side chain represents the number of repeating units. Weight average molecular weight: 15,000)

[0262] (Solvent) S1: Cyclopentanone

[0263] <Preparation of Composition> The materials shown in the table below are mixed and stirred in the proportions shown in the table below, and the mixture is filtered through a nylon filter with a pore size of 0.45 μm (manufactured by Nippon Pall Co., Ltd.) to prepare a composition.

[0264]

[0265]

[0266]

[0267] The materials listed in the table above are as follows:

[0268] (Dyes) IR1 to IR26: the above-mentioned compounds IR1 to IR26 C1: a compound having the following structure

[0269] (Pigment Dispersion) Dispersion 1 to 15, Bk1, B1, Y1: Dispersion 1 to 15, Bk1, B1, Y1 described above

[0270] (Resins) D1: Resin having the following structure (numbers added to the main chain indicate molar ratios. Weight-average molecular weight: 41,000) D2: Resin having the following structure (numbers added to the main chain indicate molar ratios. Weight-average molecular weight: 25,000) D3: Resin having the following structure (numbers added to the main chain indicate molar ratios, and numbers added to the side chains indicate the number of repeating units. Weight-average molecular weight: 25,000)

[0271] (Polymerizable Compound) M1: A mixture of compounds having the following structure (the molar ratio of the compound on the left side to the compound on the right side is 7:3) M2: a compound having the following structure

[0272] (Photopolymerization initiator) F1: Irgacure OXE01 (manufactured by BASF, oxime compound) F2: Omnirad 1316 (manufactured by IGM Resins B.V., oxime compound)

[0273] (Polymerization inhibitor) H1: p-methoxyphenol

[0274] (Surfactants) W1: X-22-4741 (Shin-Etsu Chemical Co., Ltd., silicone surfactant) W2: X-22-2445 (Shin-Etsu Chemical Co., Ltd., silicone surfactant) W3: Compound having the following structure (weight average molecular weight: 14,000; in the following formula, % indicating the proportion of repeating units is mol %)

[0275] (Solvent) S1: Cyclopentanone S2: Propylene glycol monomethyl ether acetate (PGMEA)

[0276] <Production of Film> Each composition was applied to a glass substrate by spin coating and heated at 100°C for 2 minutes using a hot plate to form a composition layer. The resulting composition layer was exposed to an i-line stepper exposure system FPA-3000i5+ (manufactured by Canon Corporation) at 1000 mJ / cm ２ Then, the film is heated at 180° C. for 5 minutes using a hot plate to produce a film having a thickness of 1.0 μm.

[0277] <Evaluation of Heat Resistance> The transmittance of the glass substrate on which the above film has been formed is measured in the wavelength range of 400 to 1600 nm using an ultraviolet-visible-near-infrared spectrophotometer (U-4100, manufactured by Hitachi High-Tech Corporation). Next, the glass substrate on which the above film has been formed is heated at 200°C for 5 minutes using a hot plate. The change in transmittance (ΔT) in the wavelength range of 400 to 1600 nm for the film before and after heating is calculated using the following formula, and the heat resistance is evaluated based on the value at the wavelength with the largest ΔT among all measured wavelengths using the following criteria. The smaller the ΔT value, the better the heat resistance. Change in transmittance (ΔT) = |Transmittance of film before heating - Transmittance of film after heating| A: ΔT < 5% B: 5 ≦ ΔT < 10% C: 10 ≦ ΔT%

[0278] <Evaluation of Lightfastness> The transmittance of the glass substrate on which the above film has been formed is measured in the wavelength range of 400 to 1600 nm using an ultraviolet-visible-near-infrared spectrophotometer (U-4100, manufactured by Hitachi High-Tech Corporation). Next, the glass substrate on which the above film has been formed is irradiated with 100,000 lux for 20 hours (equivalent to 2,000,000 lux h) using a xenon lamp, and the transmittance of the film after xenon lamp irradiation is measured. The change in transmittance (ΔT) in the wavelength range of 400 to 1600 nm for the film before and after xenon lamp irradiation is calculated using the following formula, and the lightfastness is evaluated based on the value at the wavelength where ΔT is largest among all measured wavelengths, according to the following criteria. The smaller the ΔT value, the better the lightfastness. Change in transmittance (ΔT) = |Transmittance of film before xenon lamp irradiation - Transmittance of film after xenon lamp irradiation| A: ΔT < 5% B: 5 ≦ ΔT < 10% C: 10 ≦ ΔT%

[0279]

[0280] As shown in the above table, the examples can form films with excellent heat resistance and light resistance.

[0281] 110: solid-state imaging element, 111: infrared cut filter, 112: color filter, 114: infrared transmission filter, 115: microlens, 116: planarization layer

Claims

1. A composition comprising a colorant, a curable compound, and a solvent, wherein the colorant comprises a compound represented by formula (1); In formula (1), R １ ~R ６ each independently represents a hydrogen atom or a substituent; １ and X ２ are each independently N or C—R Ｘ１ represents R Ｘ１ represents an electron-withdrawing group, Ar １ and Ar ２ each independently represents an aryl group or a heteroaryl group; １ and Y ２ are each independently a hydrogen atom, an alkyl group, an aryl group, a heteroaryl group, or —BR Ｙ１ R Ｙ２ or a metal atom, R Ｙ１ and R Ｙ２ each independently represents a hydrogen atom or a substituent, R Ｙ１ and R Ｙ２ may be bonded to form a ring.

2. Y in the formula (1) １ and Y ２ are each independently a hydrogen atom or -BR Ｙ１ R Ｙ２ The composition of claim 1 , 3. Y in the formula (1) １ and Y ２ However, each independently -BR Ｙ１ R Ｙ２ The composition of claim 1 , 4. The composition according to any one of claims 1 to 3, wherein the maximum absorption wavelength of the compound represented by formula (1) is in the wavelength range of 800 to 1400 nm.

5. A film obtained using the composition according to any one of claims 1 to 3.

6. An optical filter having the film according to claim 5.

7. A solid-state imaging device having the film according to claim 5.

8. An image display device having the film according to claim 5.

9. An infrared sensor having the film according to claim 5.

10. A camera module comprising a membrane according to claim 5.

11. A compound represented by formula (1); In formula (1), R １ ~R ６ each independently represents a hydrogen atom or a substituent; １ and X ２ are each independently N or C—R Ｘ１ represents R Ｘ１ represents an electron-withdrawing group, Ar １ and Ar ２ each independently represents an aryl group or a heteroaryl group; １ and Y ２ are each independently a hydrogen atom, an alkyl group, an aryl group, a heteroaryl group, or —BR Ｙ１ R Ｙ２ or a metal atom, R Ｙ１ and R Ｙ２ each independently represents a hydrogen atom or a substituent, R Ｙ１ and R Ｙ２ may be bonded to form a ring.

Images