A target material side automatic polishing device and use method thereof

Abstract

The present invention relates to the technical field of automatic polishing of target side edges, and in particular, to an automatic polishing device for target side edges and a method for using the device. The device comprises a processing support base, a rotating movable guide assembly is provided on the surface of the processing support base, the rotating movable guide assembly is used to set a lateral placement point for target polishing, and an anti-deviating block is installed at the lateral placement point, thereby limiting the friction between the lateral placement point and the target; a movable side polishing processing assembly is provided on the surface of the rotating movable guide assembly, and the movable side polishing processing assembly is used to polish the side of the target; when the connecting frame rotates, the friction block is driven to move along the side of the target, and the debris on the side of the target is cleaned during the movement of the friction block, thereby improving the polishing quality of the polisher, and the pressing plate and the friction block are respectively located at the four corners of the side of the target, and the lateral movement of the target is limited, thereby offsetting the driving force generated during the polisher processing, so that the target is continuously in a stable state.

Description

Technical Field

[0001] The invention relates to the technical field of automatic polishing of target side edges, and in particular to a device for automatic polishing of target side edges and a method for using the device. Background Art

[0002] At present, impurities and foreign matter on the main surface of LCD targets are mainly removed by polishing with polishers. However, foreign matter, oxides, and non-target materials on the sides of LCD targets are mainly removed by using manual sandpaper or pneumatic polishers. It is difficult to remove copper rust by sandpaper polishing, and the efficiency is low. In addition, direct polishing with sandpaper or pneumatic polishers results in unstable roughness and large fluctuations, which leads to unstable quality and makes it difficult to meet the current total production volume and quality requirements.

[0003] There are many existing technologies for automatic polishing of the target side, such as:

[0004] Chinese patent publication number CN113021166B discloses an automatic target side polishing device and a method of using the same, wherein the polishing device comprises a polishing platform, a polishing robot, a robot ground rail, a circuit control cabinet and a tool platform; there are two polishing platforms, which are arranged in parallel on both sides of the robot ground rail; the circuit control cabinet is located between the two polishing platforms and is arranged at either end of the robot ground rail; the tool platform is arranged on the circuit control cabinet; the polishing robot is placed on the robot ground rail; the polishing robot comprises a main body and a mechanical arm, a clamping hole is arranged at the front end of the mechanical arm, and a polishing head is connected to the clamping hole; a target is placed on the polishing platform; the polishing device realizes the automatic polishing function of the target side through the optimized design of multiple structures, and the method of use is simple, which significantly improves the production efficiency and product qualification rate, and has a good industrial application prospect.

[0005] Chinese patent publication number CN217097172U discloses a target surface polishing device, including a base, corresponding polishing mechanisms are provided on both sides of the base, two slide rails are provided in the middle of the base, and clamping mechanisms are provided on the two slide rails. The utility model has a simple structure and a novel design. The two specially designed polishing mechanisms can grind the target material at the same time, and polishing liquid will be continuously sprayed during polishing to facilitate the polishing of the target surface, thereby improving the polishing efficiency.

[0006] It can be seen that most target side polishing devices place the target vertically, drive the target to rotate and polish the side of the target at the same time, but the side of the target that needs to be polished is uneven. When rotating, the circular movement restriction of the clamping device blocks the rotation path of the target. The target will be deformed when forced to rotate, resulting in the scrapping of the target. At the same time, when the polishing machine contacts the target for polishing, the polishing machine applies a driving force to the target, resulting in the target being stuck in the polishing device when rotating due to the convex points on the surface. The target cannot pass through the clamping device and cannot complete automatic polishing. If the target thickness is low, it is easy to deform, and the side of the target may be uneven and the curve may be uneven.

[0007] In view of this, the present invention provides a target side automatic polishing device and a method for using the same.

[0008] The object of the present invention is to provide a target material side automatic polishing device and a use method thereof to solve the problems raised in the above background technology.

[0009] To achieve the above-mentioned purpose, one of the purposes of the present invention is to provide an automatic polishing device for the side of a target material, which places the target material horizontally and limits the target material in all directions during polishing. At the same time, it avoids the need for multiple cycles of polishing due to the low polishing quality of one-time polishing. Polishing will clean the protruding part of the target material, but the cleaned debris will adhere to the side of the target material, affecting the subsequent polishing quality of the target material.

[0010] It includes a processing support base, a surface of which is provided with a rotational movable guide assembly, the rotational movable guide assembly is used to set a lateral placement point for target polishing, and an anti-deviating block is installed at the lateral placement point to limit the friction between the lateral placement point and the target;

[0011] The surface of the rotating movable guide component is provided with a movable side polishing processing component, and the movable side polishing processing component is used to polish the side of the target material, and the processing range is adjusted according to the size of the target material. The surface of the rotating movable guide component is provided with a target material fixing clamping component, and the target material fixing clamping component is used to limit the vertical movement of the target material. At the same time, the target material fixing clamping component forms support points at the front end, the rear end and the left end of the target material. The processing position of the movable side polishing processing component is at the right end of the target material, which is used to offset the force generated by the movable side polishing processing component colliding with the target material, and limit the lateral movement of the target material. The movable side polishing processing component drives the target material fixing clamping component to rotate in a circular cycle along the rotating movable guide component to complete the polishing of the side of the target material.

[0012] The target side automatic polishing device according to claim 1 is characterized in that: the rotation and movement guide assembly includes a first elastic member, the first elastic member is installed inside the processing support base, the other end of the first elastic member is connected to an anti-deviation block, and the surface of the processing support base is provided with a circular guide rail;

[0013] The movable side polishing processing assembly comprises a connecting frame, the connecting frame is slidably connected to the processing support base and the circular guide rail, and is used to limit the moving path of the connecting frame, and an electric rotating wheel is installed at the bottom of the connecting frame;

[0014] A mechanical arm is installed on the surface of the connecting frame, a first motor for rotation is installed on the surface of the mechanical arm, a polisher is installed on the surface of the first motor, and a polishing disc is provided on the surface of the polisher;

[0015] The target material fixing and clamping assembly comprises a fixing rod, the fixing rod is mounted on the surface of the connecting frame, a threaded rod is rotatably connected to the surface of the connecting frame, and a second motor for driving the threaded rod to rotate is mounted on the surface of the fixing rod;

[0016] A fixing frame is threadedly connected to the surface of the threaded rod, and the fixing frame and the fixing rod are slidably connected to limit the moving path of the fixing frame;

[0017] A pressing plate is slidably connected inside the fixing frame, and an anti-sliding block is provided at the bottom of the pressing plate, and the anti-sliding block and the anti-deviating block are respectively attached to the top and bottom of the target material to limit the vertical movement of the target material;

[0018] A second elastic member is installed inside the connecting frame, and the other end of the second elastic member is connected to the moving frame. The moving frame and the connecting frame are slidably connected to limit the moving path of the moving frame;

[0019] A third elastic member is installed inside the movable frame, and the other end of the third elastic member is connected to a friction block. The friction block and the movable frame are slidably connected to limit the moving path of the friction block.

[0020] The second object of the present invention is to provide a method for using a device for automatically polishing the side edge of a target material, comprising the following method steps:

[0021] S1. Place the target material on the processing support base, and rotate the movable guide assembly and the target material fixing clamping assembly to limit the vertical and lateral movement of the target material;

[0022] S2. Then move the side polishing processing assembly to drive the target material fixing clamping assembly to rotate, and complete the polishing of the target material side.

[0023] Compared with the prior art, the present invention has the following beneficial effects:

[0024] 1. In the automatic target side polishing device and its use method, when the connecting frame rotates, the friction block will be driven to move along the side of the target material. During the movement of the friction block, the debris on the side of the target material is cleaned, thereby improving the polishing quality of the polisher. The pressing plate and the friction block are respectively located at the four corners of the side of the target material to limit the lateral movement of the target material, thereby offsetting the driving force generated during the polisher processing, so that the target material is continuously in a stable state.

[0025] 2. In the automatic target side polishing device and its use method, the electric rotary wheel is moved to move the mechanical arm along the circular guide rail, so that the polishing disk contacts all positions on the target side and completes the polishing, avoiding the target material and the clamping device from getting stuck during processing, causing the target material to be deformed due to force, and improving the stability of the target material during processing by this device.

[0026] In the target material side automatic polishing device and the use method thereof, the pressing plate is moved downward so that the anti-sliding block on its surface fits the top of the target material, thereby the anti-deviating block fits the bottom of the target material and the pressing plate fits the top of the target material, thereby limiting the vertical movement of the target material, so that the target material is quickly fixed on the surface of the processing support base and cannot be detached. BRIEF DESCRIPTION OF THE DRAWINGS

[0027] Figure 1 It is a schematic diagram of the overall structure of the present invention;

[0028] Figure 2 It is a schematic diagram of the structural anti-deviating block of the present invention;

[0029] Figure 3 It is a schematic diagram of the first elastic member of the structure of the present invention;

[0030] Figure 4 It is a schematic diagram of the second elastic member of the structure of the present invention;

[0031] Figure 5 It is a schematic diagram of the second motor structure of the present invention;

[0032] Figure 6 The structure of the present invention Figure 5 Schematic diagram at A;

[0033] Figure 7 It is a schematic diagram of the structural pressing plate of the present invention;

[0034] Figure 8 It is a schematic diagram of the structural fixing frame of the present invention.

[0035] The meaning of each number in the figure is:

[0036] 11. Processing support base;

[0037] 20. Rotational movement guide assembly; 21. First elastic member; 22. Anti-deviation block; 23. Circular guide rail;

[0038] 30. Mobile side polishing processing assembly; 31. Connecting frame; 32. Electric rotating wheel; 33. Mechanical arm; 34. First motor; 35. Polisher; 36. Polishing disc;

[0039] 40. Target material fixing and clamping assembly; 41. Fixed rod; 42. Threaded rod; 43. Second motor; 44. Fixed frame; 45. Pressing plate; 46. Second elastic member; 47. Moving frame; 48. Third elastic member; 49. Friction block. DETAILED DESCRIPTION

[0040] The following will be combined with the drawings in the embodiments of the present invention to clearly and completely describe the technical solutions in the embodiments of the present invention. Obviously, the described embodiments are only part of the embodiments of the present invention, not all of the embodiments. Based on the embodiments of the present invention, all other embodiments obtained by ordinary technicians in this field without creative work are within the scope of protection of the present invention.

[0041] In the description of the present invention, it should be understood that the terms "center", "longitudinal", "lateral", "length", "width", "thickness", "up", "down", "front", "back", "left", "right", "vertical", "horizontal", "top", "bottom", "inside", "outside", "clockwise", "counterclockwise" and the like indicate orientations or positional relationships based on the orientations or positional relationships shown in the accompanying drawings, and are only for the convenience of describing the present invention and simplifying the description, and do not indicate or imply that the referred device or element must have a specific orientation, be constructed and operated in a specific orientation, and therefore should not be understood as a limitation on the present invention.

[0042] In addition, the terms "first" and "second" are used for descriptive purposes only and should not be understood as indicating or implying relative importance or implicitly indicating the number of the indicated technical features. Therefore, the features defined as "first" and "second" may explicitly or implicitly include one or more of the features. In the description of the present invention, the meaning of "plurality" is two or more, unless otherwise clearly and specifically defined.

[0043] Impurities and foreign matter on the main surface of the target are mainly removed by polishing with a polishing machine. However, foreign matter, oxides, and non-target material on the side of the LCD target are mainly removed by using manual sandpaper or pneumatic polishers. It is difficult to remove copper rust by sandpaper polishing, and the efficiency is low. In addition, polishing directly with sandpaper or pneumatic polishers will result in unstable roughness and large fluctuations, resulting in unstable quality, which is difficult to meet the current total production volume and quality requirements.

[0044] See also Figure 1-Figure 8As shown, one of the purposes of this embodiment is to provide an automatic polishing device for the side edge of a target;

[0045] It includes a processing support base 11, a surface of the processing support base 11 is provided with a rotational movement guide assembly 20, the rotational movement guide assembly 20 is used to set a lateral placement point for target polishing, and an anti-deviating block 22 is installed at the lateral placement point to limit the friction between the lateral placement point and the target;

[0046] A movable side polishing processing component 30 is provided on the surface of the rotating movable guide component 20. The movable side polishing processing component 30 is used to polish the side of the target material and adjust the processing range according to the size of the target material. A target material fixing clamping component 40 is provided on the surface of the rotating movable guide component 20. The target material fixing clamping component 40 is used to limit the vertical movement of the target material. At the same time, the target material fixing clamping component 40 forms support points at the front end, rear end and left end of the target material. The processing position of the movable side polishing processing component 30 is at the right end of the target material, which is used to offset the force generated by the movable side polishing processing component 30 colliding with the target material and limit the lateral movement of the target material. The movable side polishing processing component 30 drives the target material fixing clamping component 40 to rotate in a circular cycle along the rotating movable guide component 20 to complete the polishing of the side of the target material.

[0047] When the target material rotates, the circular movement restriction of the clamping device blocks the target material's rotation path. The target material is deformed when it is forced to rotate, causing the target material to be scrapped. At the same time, when the polishing machine contacts the target material for polishing, the polishing machine applies a driving force to the target material, causing the target material to be stuck in the polishing device when it rotates because the surface convex points cannot pass through the clamping device, and the automatic polishing cannot be completed. If the target material is thin, it is easy to deform, and the side of the target material may be uneven and the curve is uneven. Therefore, the rotating and moving guide assembly 20 includes a first elastic member 21, and the first elastic member 21 is installed on the processing support Inside the support base 11, the other end of the first elastic member 21 is connected to an anti-deviating block 22, a circular guide rail 23 is provided on the surface of the processing support base 11, and a movable side polishing processing assembly 30 includes a connecting frame 31, the connecting frame 31 is slidably connected with the processing support base 11 and the circular guide rail 23, and is used to limit the moving path of the connecting frame 31, an electric turntable 32 is installed at the bottom of the connecting frame 31, a mechanical arm 33 is installed on the surface of the connecting frame 31, a first motor 34 for rotation is installed on the surface of the mechanical arm 33, a polisher 35 is installed on the surface of the first motor 34, and a polishing disc 36 is provided on the surface of the polisher 35;

[0048] Depend on Figure 3-Figure 7As shown, when the side polishing of the target material needs to be fixed, the target material is first placed on top of the anti-drift block 22. The anti-drift block 22 is subjected to the pressure of the target material to compress the first elastic member 21 downward, and then the second motor 43 is started to work. The operation of the second motor 43 drives the threaded rod 42 to rotate. The rotation of the threaded rod 42 causes the fixing frame 44 to move downward. The downward movement of the fixing frame 44 drives the pressing plate 45 to move downward. The pressing plate 45 moves downward so that the anti-sliding block on its surface fits the top of the target material, thereby the anti-drift block 22 fits the bottom of the target material, and the pressing plate 45 fits the top of the target material, so that the vertical movement of the target material is limited, so that the target material is quickly fixed on the surface of the processing support base 11 and cannot be detached.

[0049] Depend on Figure 2 and Figure 8 As shown, when the side of the target material needs to be polished, the electric wheel 32 is started to work, and the electric wheel 32 drives the connecting frame 31 to rotate. While the connecting frame 31 rotates, the first motor 34 is started to work, and the first motor 34 drives the mechanical arm 33 to rotate. The mechanical arm 33 rotates to adjust the angle of the polisher 35. When the first motor 34 drives the polishing disc 36 to contact the side of the target material, the polisher 35 is started to work, and the polisher 35 drives the polishing disc 36 to polish the side of the target material. At the same time, the electric wheel 32 moves to move the mechanical arm 33 along the circular guide rail 23, so that the polishing disc 36 contacts all positions on the side of the target material and completes the polishing, thereby avoiding the target material and the clamping device from getting stuck during processing, causing the target material to be deformed due to force, and improving the stability of the target material during processing by the device.

[0050] When the target is polished, the polishing quality of one-time polishing is low, so multiple cycles of polishing are required. Polishing will clean the protruding part of the target, but the cleaned debris will adhere to the side of the target, affecting the subsequent polishing quality of the target. Therefore, the target fixing and clamping assembly 40 includes a fixing rod 41, which is installed on the surface of the connecting frame 31, and the surface of the connecting frame 31 is rotatably connected with a threaded rod 42. The surface of the fixing rod 41 is installed with a second motor 43 for driving the threaded rod 42 to rotate, and the surface of the threaded rod 42 is threadedly connected with a fixing frame 44, and the fixing frame 44 and the fixing rod 41 are slidably connected to limit the moving path of the fixing frame 44. A pressing plate 45 is slidably connected inside the fixed frame 44, and an anti-sliding block is provided at the bottom of the pressing plate 45. The anti-sliding block and the anti-deviating block 22 are respectively attached to the top and bottom of the target material to limit the vertical movement of the target material. A second elastic member 46 is installed inside the connecting frame 31, and the other end of the second elastic member 46 is connected to a moving frame 47. The moving frame 47 is slidably connected to the connecting frame 31, and is used to limit the moving path of the moving frame 47. A third elastic member 48 is installed inside the moving frame 47, and the other end of the third elastic member 48 is connected to a friction block 49. The friction block 49 is slidably connected to the moving frame 47, and is used to limit the moving path of the friction block 49.

[0051] Depend on Figure 5-Figure 8 As shown, when it is necessary to clean the side of the target material, when the target material is placed on the surface of the processing support base 11, the side of the target material will squeeze the friction block 49, and the friction block 49 squeezes the movable frame 47 to move, and the movement of the movable frame 47 causes the second elastic member 46 to be stretched. When the second elastic member 46 rebounds, it will pull the movable frame 47 to reset, thereby driving the friction block 49 to fit the side of the target material through the movable frame 47. When the connecting frame 31 rotates, it will drive the friction block 49 to move along the side of the target material. During the movement of the friction block 49, the debris on the side of the target material is cleaned, thereby improving the polishing quality of the polisher 35. The pressing plate 45 and the friction block 49 are respectively located at the four corners of the side of the target material to limit the lateral movement of the target material, thereby offsetting the driving force generated during the processing of the polisher 35, so that the target material is continuously in a stable state.

[0052] The second purpose of this embodiment is to provide a method for using a device for automatically polishing the side edge of a target material, comprising the following method steps:

[0053] S1, placing the target material on the processing support base 11, and rotating the moving guide assembly 20 and the target material fixing clamping assembly 40 to limit the vertical and lateral movement of the target material;

[0054] S2. Then, the side polishing processing assembly 30 is moved to drive the target material fixing and clamping assembly 40 to rotate, so as to complete the polishing of the target material side.

[0055] The above shows and describes the basic principles, main features and advantages of the present invention. Those skilled in the art should understand that the present invention is not limited by the above embodiments. The above embodiments and descriptions are only preferred examples of the present invention and are not intended to limit the present invention. Without departing from the spirit and scope of the present invention, the present invention may have various changes and improvements, which fall within the scope of the present invention. The scope of protection of the present invention is defined by the attached claims and their equivalents.

Claims

1. A target side automatic polishing device, characterized in that: The processing support base (11) comprises a rotationally movable guide assembly (20) provided on the surface of the processing support base (11), the rotationally movable guide assembly (20) being used to set a lateral placement point for target material polishing, and an anti-deviating block (22) being installed at the lateral placement point, thereby limiting the friction between the lateral placement point and the target material; The surface of the rotating movable guide component (20) is provided with a movable side polishing processing component (30), and the movable side polishing processing component (30) is used to polish the side of the target material, and the processing range is adjusted according to the size of the target material. The surface of the rotating movable guide component (20) is provided with a target material fixing clamping component (40), and the target material fixing clamping component (40) is used to limit the vertical movement of the target material. At the same time, the target material fixing clamping component (40) forms support points at the front end, the rear end and the left end of the target material. The processing position of the movable side polishing processing component (30) is located at the right end of the target material, which is used to offset the force generated by the movable side polishing processing component (30) colliding with the target material, and limit the lateral movement of the target material. The movable side polishing processing component (30) drives the target material fixing clamping component (40) to rotate in a circular cycle along the rotating movable guide component (20) to complete the polishing of the side edge of the target material. The rotational movement guide assembly (20) comprises a first elastic member (21), the first elastic member (21) being installed inside the processing support base (11), the other end of the first elastic member (21) being connected to an anti-deviating block (22), and a circular guide rail (23) being provided on the surface of the processing support base (11); The movable side polishing processing assembly (30) comprises a connecting frame (31), the connecting frame (31) being slidably connected to a processing support base (11) and a circular guide rail (23) and used to limit the moving path of the connecting frame (31), and an electric rotating wheel (32) being installed at the bottom of the connecting frame (31); A mechanical arm (33) is mounted on the surface of the connecting frame (31); a first motor (34) for rotation is mounted on the surface of the mechanical arm (33); a polisher (35) is mounted on the surface of the first motor (34); and a polishing disc (36) is provided on the surface of the polisher (35); The target material fixing and clamping assembly (40) comprises a fixing rod (41), the fixing rod (41) being mounted on the surface of a connecting frame (31), a threaded rod (42) being rotatably connected to the surface of the connecting frame (31), and a second motor (43) for driving the threaded rod (42) to rotate is mounted on the surface of the fixing rod (41); A fixing frame (44) is threadedly connected to the surface of the threaded rod (42), and the fixing frame (44) and the fixing rod (41) are slidably connected to limit the moving path of the fixing frame (44); A pressing plate (45) is slidably connected inside the fixing frame (44), and an anti-sliding block is provided at the bottom of the pressing plate (45). The anti-sliding block and the anti-deviating block (22) are respectively attached to the top and bottom of the target material, thereby limiting the vertical movement of the target material. A second elastic member (46) is installed inside the connecting frame (31); the other end of the second elastic member (46) is connected to a moving frame (47); the moving frame (47) and the connecting frame (31) are slidably connected to limit the moving path of the moving frame (47); A third elastic member (48) is installed inside the movable frame (47); the other end of the third elastic member (48) is connected to a friction block (49); the friction block (49) and the movable frame (47) are slidably connected to limit the moving path of the friction block (49).

2. A method for using the target side automatic polishing device as claimed in claim 1, characterized in that: The method comprises the following steps: S1, placing a target material on a processing support base (11), and rotating and moving the guide assembly (20) and the target material fixing and clamping assembly (40) to limit the vertical and lateral movement of the target material; S2. Then, the side polishing processing assembly (30) is moved to drive the target material fixing and clamping assembly (40) to rotate, thereby completing the polishing of the target material side.

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