A kind of pharmaceutical intermediate synthesis process waste gas continuous treatment equipment and method

Abstract

The invention discloses a device and method for continuously treating waste gas from a pharmaceutical intermediate synthesis process, and relates to the technical field of waste gas treatment. In the invention, a spray component is arranged inside a supporting shell, a liquid inlet end of the spray component is connected to an absorption liquid supply pipe, a plurality of spray adsorption chambers and a piston pressurizing chamber, so that the waste gas flows in an adsorption box and undergoes corresponding absorption treatment; when the flow rate of the waste gas in the adsorption box is reduced and the air pressure is insufficient, resulting in the waste gas in the air guide area not being easy to enter the spray adsorption chamber on the downstream side, the distance state of the second piston is changed by a distance sensor, and a telescopic device is correspondingly controlled to drive the first piston and the second piston to move, so as to achieve a pressurizing effect in the air guide area, thereby efficiently pressing the waste gas into the spray adsorption chamber on the downstream side, assisting the waste gas in the spray adsorption chamber on the downstream side to smoothly pass through the adsorbent filling area, thereby ensuring the flow rate of the waste gas in the multi-stage adsorbent filling area in the adsorption box, and improving the waste gas treatment efficiency.

Description

Technical Field

[0001] The invention relates to the technical field of waste gas treatment, and in particular to a device and method for continuously treating waste gas from a pharmaceutical intermediate synthesis process. Background Art

[0002] Waste gas treatment equipment mainly refers to an environmental protection equipment that uses different process technologies to recycle or remove and reduce harmful components in exhaust gas to protect the environment and purify the air, so that the external atmospheric environment is not polluted. Waste gas treatment is also called waste gas purification. Waste gas treatment refers to the pretreatment of waste gas generated in industrial sites and factory workshops before external discharge to meet the standards for external discharge of waste gas. General waste gas treatment includes organic waste gas treatment, dust waste gas treatment, acid and alkali waste gas treatment, odor waste gas treatment and air sterilization, disinfection and purification.

[0003] In the actual production process, in order to adsorb the waste gas generated during the processing of pharmaceutical intermediates, the activated carbon adsorption method is usually used. The waste gas is discharged into multi-stage activated carbon and adsorbed in sequence until the harmful gases in the waste gas are completely adsorbed, and the remaining gases are then discharged.

[0004] During adsorption, since the adsorption device is filled with a large amount of adsorbent fillers, when the exhaust gas flows through the multi-stage adsorbent fillers in sequence, the gas is easily slowed down due to insufficient air pressure during the flow process, thereby reducing the adsorption and filtration efficiency of the entire device.

[0005] The existing treatment method is to pressurize the exhaust gas at the air inlet when the exhaust gas enters. However, since the exhaust gas flows in the multi-stage adsorbent filler, when the exhaust gas is pressurized, it can pass through the adsorbent filler area close to the pressurized air inlet. When pressurized, the pressurized air flow gradually flows to the downstream adsorbent filler area, and there is a delay in air pressure transmission. In addition, regardless of whether the downstream adsorbent filler area is blocked, the flow air pressure in the adsorbent filler area is forcibly increased, which will have a certain impact on the actual adsorption effect of the adsorbent filler area. Simply pressurizing directly through the air inlet may not only cause a substantial waste of air pressure supply energy, but may also have an adverse effect on the overall adsorption effect of the adsorbent filler area.

[0006] In view of the above, how to effectively solve the contradiction between the flow rate of the exhaust gas in the adsorbent filler and the gas pressure required for the exhaust gas to flow has become a problem that needs to be solved. Summary of the invention

[0007] In order to solve the above technical problems, the present invention provides a continuous treatment equipment for waste gas from a pharmaceutical intermediate synthesis process. When the waste gas flows, the air pressure state of the adsorbent filler area on the downstream side is correspondingly regulated, thereby ensuring the flow rate of the waste gas in the multi-stage adsorbent filler area in the adsorption box and improving the waste gas treatment efficiency.

[0008] To achieve the above-mentioned purpose, the present invention provides the following technical scheme: a kind of continuous treatment equipment for waste gas from pharmaceutical intermediate synthesis process, comprising an adsorption box, a support shell and a collection shell, the surface of the adsorption box is connected with an air inlet pipe and an air outlet pipe, a spray assembly is arranged inside the support shell, the liquid inlet end of the spray assembly is connected with an absorption liquid supply pipe, and an absorption liquid supply device is connected upstream of the absorption liquid supply pipe.

[0009] The adsorption box is provided with multiple spray adsorption chambers arranged in parallel with each other, and booster cylinders are arranged in parallel between adjacent spray adsorption chambers. A group of nozzles connected to the spray assembly are arranged above each spray adsorption chamber. The air inlet end of the first spray adsorption chamber is connected to the air inlet pipe, and the air outlet end of the last spray adsorption chamber is connected to the air outlet pipe. The air outlet ends of the non-last spray adsorption chambers are all provided with one-way valves.

[0010] Wherein, between two adjacent spray adsorption chambers: an air guide area is provided between the one-way valve of the upstream spray adsorption chamber and the air inlet end of the downstream spray adsorption chamber.

[0011] A piston boosting chamber is provided in the boosting cylinder, one end of which is connected to the air guide area. Each boosting cylinder is independently equipped with a group of piston assemblies, which include a telescopic device fixedly connected to the adsorption box, a first piston located in the piston boosting chamber, and a second piston elastically connected to the first piston, wherein the first piston is fixedly connected to the output shaft of the telescopic device. A distance sensor for detecting the moving distance of the second piston in the piston boosting chamber is also provided in the adsorption box.

[0012] As a preferred technical solution of the waste gas continuous treatment equipment in the present invention: multiple spray adsorption chambers are filled with adsorbent fillers for adsorbing harmful gases in the waste gas.

[0013] As a preferred technical solution for the continuous waste gas treatment equipment in the present invention: the spray assembly is provided with multiple spray installation assemblies, a spray adsorption chamber is equipped with a group of nozzles that spray liquid toward the spray adsorption chamber, and the upper and lower surfaces of the adsorption box are provided with open grooves for water flow.

[0014] As a preferred technical solution of the waste gas continuous treatment equipment in the present invention: open slots are arranged on the upper and lower sides of multiple spray adsorption chambers, and multiple spray installation components are arranged directly above the open slots.

[0015] As a preferred technical solution of the waste gas continuous treatment equipment in the present invention: the gas outlet direction of the one-way valve is toward the gas guide area.

[0016] As a preferred technical solution for the waste gas continuous treatment equipment in the present invention: a tension spring is arranged between the first piston and the second piston, wherein one end of the tension spring is fixedly connected to the first piston, and the other end of the tension spring is fixedly connected to the second piston.

[0017] As a preferred technical solution for the waste gas continuous treatment equipment in the present invention: the distance sensor is fixedly mounted on the wall of the air guide area, and the distance detection direction of the distance sensor is directly opposite to the piston boosting chamber.

[0018] The present invention provides a method for continuously treating waste gas from a pharmaceutical intermediate synthesis process, comprising the following steps:

[0019] S1. The waste gas generated during the processing of pharmaceutical intermediates is discharged into the adsorption box from the air inlet pipe, the spray assembly starts to work, the nozzle sprays multiple spray adsorption chambers, and the sprayed liquid flows into the collection shell through the adsorption box.

[0020] S2. The waste gas after spray absorption treatment in the spray adsorption chamber is discharged into the air guide area from the one-way valve, and the gas in the air guide area is divided into the piston booster chamber connected to the air guide area and the downstream spray adsorption chamber.

[0021] S3. The distance sensor detects the distance of the second piston in the piston booster chamber and detects that the real-time distance of the second piston is L x .

[0022] Take the distance sensor as the distance reference: Assume that the travel range of the first piston driven by the telescopic device is [L 末端 , L 初始 ], where L 初始 is the initial position of the first piston close to the telescopic device, L 末端 is the maximum travel position of the first piston away from the telescopic device. Because the initial position of the first piston is far away from the distance sensor, L 初始 On the contrary, it is bigger.

[0023] When the gas flowing into the piston pressurizing chamber squeezes the second piston, L x ≥L max hour.

[0024] S3.1. The distance sensor transmits the signal to the system, and the system controls the telescopic device to work, pushing the first piston, the tension spring and the second piston to move, squeezing the gas in the piston booster chamber into the gas guide area, and the gas then flows from the gas guide area into the spray adsorption chamber on the downstream side.

[0025] S3.2. Until the real-time distance L moved by the second piston x ≤L min When the telescopic device drives the first piston to move back to the initial position.

[0026] S3.3. If the real-time distance L moved by the second piston x ≤L mid , the telescopic device stops driving.

[0027] S3.4. If the real-time distance L moved by the second piston at this time x >L mid , after the system counts n seconds, L x Still greater than L mid , repeat the contents of S3.1 and S3.2.

[0028] Among them, L min <L mid <L max , L min <L 末端 <L max <L 初始 .

[0029] Among them, L min The reference distance value of the second piston propulsion stroke preset by the system. The reference distance value of the propulsion stroke refers to the distance when the distance sensor detects that the distance of the second piston reaches L min , which means that the gas in the piston boosting chamber is pushed out and squeezes the gas in the gas guide area, that is, the gas pressure in the gas guide area is enhanced, and the exhaust gas that is originally difficult to enter the downstream spray adsorption chamber can enter the downstream spray adsorption chamber more efficiently.

[0030] Among them, L max The extrusion stroke reference distance value of the second piston preset by the system. The extrusion stroke reference distance value refers to the distance when the distance sensor detects that the distance of the second piston reaches L max , indicating that the gas entering the piston booster chamber creates a strong air pressure on the second piston, that is, the exhaust gas in the air guide area is not easy to enter the downstream spray adsorption chamber, L max This means that the spray adsorption chamber on the downstream side may not be unobstructed. At this time, it is necessary to start pushing the second piston to push the gas in the piston booster chamber into the gas guide area in the opposite direction, and force the exhaust gas into the spray adsorption chamber on the downstream side to ensure efficient circulation and treatment of the exhaust gas.

[0031] Among them, L mid It is the system preset reference distance value of the normal position of the second piston. The reference distance value of the normal position is to ensure that the gas in the gas guide area is sufficiently pressurized so that the downstream spray adsorption chamber is truly unobstructed. Sometimes, the unobstructed effect of the downstream spray adsorption chamber may not be ideal by only relying on the second piston advancement method once. As long as the downstream spray adsorption chamber is still blocked, the second piston is required to apply pressure to the gas guide area multiple times. The reference distance value of the normal position is a reference value for deciding whether to stop the repeated pressure application.

[0032] S4. The exhaust gas subsequently entering the air guide area and the piston boost chamber is compressed and driven according to the methods in S3 and S3.1 to S3.4.

[0033] The present invention provides a continuous treatment device for waste gas from a pharmaceutical intermediate synthesis process, which has the following beneficial effects:

[0034] The present invention sets a plurality of spray adsorption chambers and piston boosting chambers to allow the waste gas to flow in the adsorption box and perform corresponding absorption treatment; when the flow rate of the waste gas in the adsorption box is reduced and the air pressure is insufficient, resulting in the waste gas in the air guide area not being easy to enter the spray adsorption chamber on the downstream side, the waste gas entering the piston boosting chamber increases significantly and causes squeezing of the second piston, and the distance state of the second piston is changed by the distance sensor, and the telescopic device is controlled to drive the first piston and the second piston to move, so as to achieve the boosting effect of the air guide area, thereby efficiently pressing the waste gas into the spray adsorption chamber on the downstream side, and assisting the waste gas in the spray adsorption chamber on the downstream side to pass smoothly through the adsorbent filling area, thereby ensuring the flow rate of the waste gas in the multi-stage adsorbent filling area in the adsorption box, and improving the waste gas treatment efficiency. BRIEF DESCRIPTION OF THE DRAWINGS

[0035] Figure 1 It is a schematic diagram of the overall structure of the present invention.

[0036] Figure 2 It is a schematic diagram of the overall structure explosion of the present invention.

[0037] Figure 3 It is a schematic diagram of the cross-sectional structure of the support shell and the adsorption box of the present invention.

[0038] Figure 4 It is a schematic diagram of the explosion structure of the adsorption box of the present invention.

[0039] Figure 5 It is a schematic diagram of the cross-sectional structure of the booster cylinder of the present invention.

[0040] Figure 6 It is a schematic diagram of the structure of the exhaust gas flow direction in the adsorption box of the present invention.

[0041] In the figure: 1. adsorption box, 101. open groove, 102. air guide area, 103. air inlet pipe, 104. spray adsorption chamber, 105. air outlet pipe; 2. support shell; 3. collection shell; 4. spray assembly, 401. spray installation assembly, 402. nozzle, 403. absorption liquid supply pipe; 5. piston assembly, 501. first piston, 502. telescopic device, 503. tension spring, 504. second piston; 6. booster cylinder, 601. piston booster chamber; 7. distance sensor; 8. one-way valve. DETAILED DESCRIPTION

[0042] The technical solutions in the embodiments of the present invention will be described clearly and completely below in conjunction with the accompanying drawings in the embodiments of the present invention.

[0043] Embodiment 1: The present invention designs a multi-stage absorption treatment device for continuously treating waste gas from a pharmaceutical intermediate synthesis process. The main structural configuration of the device is as follows:

[0044] Combination Figure 1 , Figure 2 , Figure 3 , an adsorption box 1, a support shell 2 and a collection shell 3, the surface of the adsorption box 1 is connected with an air inlet pipe 103 and an air outlet pipe 105, a spray component 4 is arranged inside the support shell 2, the liquid inlet end of the spray component 4 is connected with an absorption liquid supply pipe 403, the upstream of the absorption liquid supply pipe 403 is connected with an absorption liquid supply device, the spray component 4 is provided with a plurality of spray installation components 401, a spray adsorption chamber 104 is provided with a group of nozzles 402 spraying liquid toward the spray adsorption chamber 104, the upper and lower surfaces of the adsorption box 1 are provided with open grooves 101 for water flow, the open grooves 101 are arranged on the upper and lower sides of the plurality of spray adsorption chambers 104, and the plurality of spray installation components 401 are arranged directly above the open grooves 101.

[0045] Combination Figure 4 , Figure 5 , Figure 6 A plurality of spray adsorption chambers 104 arranged in parallel to each other are arranged in the adsorption box 1, and the plurality of spray adsorption chambers 104 are filled with adsorbent fillers for adsorbing harmful gases in the exhaust gas. A booster cylinder 6 is sandwiched in parallel between adjacent spray adsorption chambers 104, and a group of nozzles 402 are arranged above each spray adsorption chamber 104, and the nozzles 402 are connected to the spray assembly 4, wherein the air inlet end of the first spray adsorption chamber 104 is connected to the air inlet pipe 103, and the air outlet end of the last spray adsorption chamber 104 is connected to the air outlet pipe 105, and the air outlet ends of the non-last spray adsorption chambers 104 are all provided with check valves 8.

[0046] Combination Figure 5 , Figure 6, between two adjacent spray adsorption chambers 104: an air guide area 102 is provided between the one-way valve 8 of the upstream spray adsorption chamber 104 and the air inlet end of the downstream spray adsorption chamber 104, a piston boosting chamber 601 is provided inside the boosting cylinder 6, and the piston boosting chamber 601 is communicated with the air guide area 102, each boosting cylinder 6 is independently configured with a group of piston assemblies 5, the piston assembly 5 includes a telescopic device 502 fixedly connected to the adsorption box 1, the output end of the telescopic device 502 is fixedly connected to the first piston 501, and one side of the first piston 501 A tension spring 503 is fixedly installed, one end of the tension spring 503 is fixedly connected to the second piston 504, and the first piston 501, the tension spring 503 and the second piston 504 are all arranged in the piston boosting chamber 601. The adsorption box 1 is also provided with a distance sensor 7 for detecting the moving distance of the second piston 504 in the piston boosting chamber 601. The distance sensor 7 is fixedly installed on the wall of the air guide area 102, the distance sensor 7 is opposite to the piston boosting chamber 601, and the air outlet direction of the one-way valve 8 is toward the air guide area 102.

[0047] Embodiment 2: The present invention also designs a control method for continuously treating waste gas from a pharmaceutical intermediate synthesis process, and the specific working principle is as follows:

[0048] First, the waste gas generated during the processing of pharmaceutical intermediates is discharged into the adsorption box 1 from the air inlet pipe 103, the spray component 4 starts to work, and the absorption liquid supply pipe 403 transports the liquid in the absorption liquid supply device from the outside to the nozzle 402. The nozzle 402 sprays multiple spray adsorption chambers 104, and the sprayed liquid flows through the spray adsorption chamber 104, and then flows into the collection shell 3 from the open groove 101 below the adsorption box 1.

[0049] Then, the waste gas after spray absorption treatment in the spray adsorption chamber 104 is discharged into the air guide area 102 from the one-way valve 8, and the gas in the air guide area 102 is divided into the piston booster chamber 601 connected to the air guide area 102 and the downstream spray adsorption chamber 104 respectively.

[0050] The distance sensor 7 detects that the real-time distance of the second piston 504 is L x , the gas flowing into the piston pressurizing chamber 601 begins to squeeze the second piston 504 .

[0051] Case 1: When the second piston 504 is squeezed, the real-time distance L x ≥L max When the distance sensor 7 transmits a signal to the system, the system controls the telescopic device 502 to work, pushes the first piston 501, the tension spring 503 and the second piston 504 to move, and squeezes the gas in the piston boosting chamber 601 into the gas guiding area 102. The squeezed gas then flows from the gas guiding area 102 into the spray adsorption chamber 104 on the downstream side.

[0052] Situation 2: When the real-time distance L moved by the second piston 504 x ≤L min When the distance sensor 7 transmits a signal to the system, the system controls the telescopic device 502 to drive the first piston 501 to move back to the initial position.

[0053] Case 3: If the real-time distance L moved by the second piston 504 x ≤L mid , the telescopic device 502 stops driving.

[0054] Scenario 4: When the first piston 501 moves back to the initial position, there is still gas in the piston booster chamber 601, and the remaining gas will continue to squeeze the second piston 504. The real-time distance L moved by the second piston 504 is x >L mid , after the system counts n seconds, L x Still greater than L mid The telescopic device 502 repeats the steps in the above situation to achieve efficient circulation of the exhaust gas.

[0055] Among them, they are sorted according to the distance from the distance sensor 7: L min <L mid <L max , L min <L 末端 <L max <L 初始 .

[0056] The waste gas that subsequently continuously enters the air guide area 102 is subjected to the corresponding air pressure control method according to the above-mentioned control method, and efficiently enters the downstream spray adsorption chamber 104, so that the waste gas can flow efficiently in the multi-stage adsorbent filler area in the adsorption box 1, thereby improving the waste gas treatment efficiency.

[0057] Although embodiments of the present invention have been shown and described, it will be appreciated by those skilled in the art that various changes, modifications, substitutions and variations may be made to the embodiments without departing from the principles and spirit of the present invention, and that the scope of the present invention is defined by the appended claims and their equivalents.

Claims

1. A pharmaceutical intermediate synthesis process waste gas continuous treatment device, comprising an adsorption box (1), a support shell (2) and a collection shell (3), wherein the surface of the adsorption box (1) is connected to an air inlet pipe (103) and an air outlet pipe (105), a spray assembly (4) is arranged inside the support shell (2), an absorption liquid supply pipe (403) is connected to the liquid inlet end of the spray assembly (4), and an absorption liquid supply device is connected to the upstream of the absorption liquid supply pipe (403), characterized in that: The adsorption box (1) is provided with a plurality of spray adsorption chambers (104) arranged in parallel with each other, a booster cylinder (6) is sandwiched in parallel between adjacent spray adsorption chambers (104), and a group of spray heads (402) connected to the spray assembly (4) are arranged above each spray adsorption chamber (104); The air inlet end of the first spray adsorption chamber (104) is connected to the air inlet pipe (103), the air outlet end of the last spray adsorption chamber (104) is connected to the air outlet pipe (105), and the air outlet ends of the non-last spray adsorption chambers (104) are all provided with one-way valves (8); Between two adjacent spray adsorption chambers (104): an air guide area (102) is provided between the one-way valve (8) of the upstream spray adsorption chamber (104) and the air inlet end of the downstream spray adsorption chamber (104); The boosting cylinder (6) has a piston boosting chamber (601) in one end thereof connected to the air guide area (102). Each boosting cylinder (6) is independently provided with a group of piston assemblies (5). The piston assemblies (5) include a telescopic device (502) fixedly connected to the adsorption box (1), a first piston (501) located in the piston boosting chamber (601), and a second piston (504) elastically connected to the first piston (501). Wherein, the first piston (501) is fixedly connected to the output shaft of the telescopic device (502); The adsorption box (1) is also provided with a distance sensor (7) for detecting the moving distance of the second piston (504) in the piston pressurizing chamber (601).

2. The continuous treatment equipment for waste gas from the synthesis process of pharmaceutical intermediates according to claim 1 is characterized by: The plurality of spray adsorption chambers (104) are filled with adsorbent fillers for adsorbing harmful gases in the exhaust gas.

3. The continuous treatment equipment for waste gas from a pharmaceutical intermediate synthesis process according to claim 1 is characterized by: The spray assembly (4) is provided with a plurality of spray installation assemblies (401); a spray adsorption chamber (104) is provided with a group of spray heads (402) for spraying liquid toward the spray adsorption chamber (104); and the upper surface and the lower surface of the adsorption box (1) are both provided with open grooves (101) for water flow.

4. The continuous treatment equipment for waste gas from the synthesis process of pharmaceutical intermediates according to claim 3 is characterized by: The open groove (101) is arranged on the upper and lower sides of the plurality of spray adsorption chambers (104), and the plurality of spray installation components (401) are arranged directly above the open groove (101).

5. The continuous treatment equipment for waste gas from the pharmaceutical intermediate synthesis process according to claim 1 is characterized by: The gas outlet direction of the one-way valve (8) is toward the gas guide area (102).

6. The continuous treatment equipment for waste gas from the synthesis process of pharmaceutical intermediates according to claim 1 is characterized by: A tension spring (503) is arranged between the first piston (501) and the second piston (504); One side end of the tension spring (503) is fixedly connected to the first piston (501), and the other side end of the tension spring (503) is fixedly connected to the second piston (504).

7. The continuous treatment equipment for waste gas from the synthesis process of pharmaceutical intermediates according to claim 1 is characterized by: The distance sensor (7) is fixedly mounted on the wall surface of the air guide area (102), and the distance detection direction of the distance sensor (7) is directly opposite to the piston pressurizing chamber (601).

8. A method for continuously treating waste gas from a pharmaceutical intermediate synthesis process, characterized in that: A pharmaceutical intermediate synthesis process waste gas continuous treatment device according to any one of claims 1 to 7, comprising the following contents: S1. The waste gas generated during the processing of the pharmaceutical intermediate is discharged from the air inlet pipe (103) into the adsorption box (1), the spray assembly (4) starts to work, the spray head (402) sprays the multiple spray adsorption chambers (104), and the sprayed liquid flows into the collection shell (3) through the adsorption box (1); S2. The waste gas in the spray adsorption chamber (104) after spray absorption treatment is discharged from the one-way valve (8) into the gas guide area (102), and the gas in the gas guide area (102) is divided and respectively enters the piston booster chamber (601) connected to the gas guide area (102) and the downstream spray adsorption chamber (104); S3. The distance sensor (7) detects the distance of the second piston (504) in the piston booster chamber (601) and detects that the real-time distance of the second piston (504) is L x : Taking the distance sensor (7) as the distance reference: Assume that the travel range of the telescopic device (502) driving the first piston (501) is [L 末端 , L 初始 ], where L 初始 is the initial position of the first piston (501) close to the telescopic device (502), L 末端 The maximum stroke position of the first piston (501) away from the telescopic device (502); When L x ≥L max hour: S3.

1. The telescopic device (502) is activated, pushing the first piston (501), the tension spring (503), and the second piston (504) forward and moving toward the distance sensor (7); S3.

2. Until L x ≤L min , the telescopic device (502) drives the first piston (501) in the reverse direction to retreat to the initial position of the first piston (501); S3.

3. If L x ≤L mid , the telescopic device (502) stops driving; S3.

4. If L x >L mid , after the system counts n seconds, L x Still greater than L mid , repeat the contents of S3.1 and S3.2; Among them, L min The reference distance value of the advancement stroke of the second piston (504) preset by the system, L max The reference distance value of the extrusion stroke of the second piston (504) preset by the system, L mid A reference distance value of the normal position of the second piston (504) preset by the system; Among them, L min <L mid <L max , L min <L 末端 <L max <L 初始 ; S4. The exhaust gas subsequently entering the air guide area (102) and the piston booster chamber (601) is compressed and driven according to the methods in S3 and S3.1 to S3.4.

Images