Sulfur hexafluoride conversion device and method based on double-anode thermal plasma

Abstract

The invention relates to the technical field of sulfur hexafluoride degradation, in particular to a sulfur hexafluoride conversion device and a sulfur hexafluoride conversion method based on double-anode thermal plasmas, the sulfur hexafluoride conversion device comprises a ventilation component, a gas mixing component, a gas distribution component, a gas distribution component and a gas distribution component, the degradation assembly comprises a reaction part and a degradation part, the reaction part is arranged on the gas mixing part, and the degradation part is arranged on the reaction part; and the cooling and exhausting assembly comprises a cooling piece and a tail gas piece, the cooling piece is arranged on the reaction piece, the tail gas piece is arranged on the cooling piece, high-concentration SF6 degradation can be achieved, the degradation efficiency is high, and the degradation rate is high. The content of degraded components can be visually displayed, and data investigation is very convenient; the arc length and the arc voltage of the arc striking anode are increased, and low-current input and high-power output are realized; the main product after degradation is tungsten hexafluoride, so that the tail gas after degradation also has availability.

Description

Technical Field

[0001] The present invention relates to the technical field of sulfur hexafluoride (greenhouse gas) degradation, and in particular to a sulfur hexafluoride conversion device and method based on dual-anode thermal plasma. Background Art

[0002] Sulfur hexafluoride (SF6) is a colorless, odorless, non-toxic, non-flammable, non-explosive inert gas. In recent years, many commonly used methods for treating environmental waste gas have been used to degrade SF6 gas, including thermal catalytic degradation, photolysis, electrolysis, etc. As a very popular waste gas treatment method in recent years, thermal plasma treatment technology has the advantages of convenience, simplicity, low energy consumption, and thorough treatment. It has a very broad application prospect. At the same time, related technologies have been reported to be applied in the treatment of SF6 waste gas.

[0003] At present, there are patents for the treatment of sulfur hexafluoride gas, such as the "Sulfur hexafluoride recovery and treatment process" with publication number CN 104386652A on March 4, 2015, and the "A sulfur hexafluoride gas recovery and filling device" with publication number CN 107588325A on January 16, 2018. These patents are mainly used for the collection, purification and storage of sulfur hexafluoride gas, and the SF6 waste gas is treated by thermal cracking and water washing.

[0004] In order to explore the efficient degradation of SF6 waste gas that has not reached the new gas standard for purification and recovery, is difficult to reuse or is about to be retired, in the process of studying the effects of different methods on its degradation effect, it was found that thermal plasma has a good degradation effect on SF6, and the structure of a dual anode reactor with an arc starting voltage can greatly improve the degradation efficiency of SF6. On this basis, a sulfur hexafluoride conversion method and device based on dual anode thermal plasma was prepared. Summary of the invention

[0005] In view of the above-mentioned existing problems of efficiently degrading SF6 waste gas that has not reached the new gas standard for purification and recovery, is difficult to reuse or is about to be retired, the present invention is proposed.

[0006] Therefore, the object of the present invention is to provide a sulfur hexafluoride conversion device based on dual anode thermal plasma.

[0007] In order to solve the above technical problems, the present invention provides the following technical solutions: a sulfur hexafluoride conversion device based on dual anode thermal plasma, comprising:

[0008] A ventilation assembly, comprising an air mixing element and a control element, wherein the control element is arranged on the air mixing element; and

[0009] A degradation component, comprising a reaction part and a degradation part, wherein the reaction part is arranged on the gas mixing part, and the degradation part is arranged on the reaction part; and

[0010] The cooling exhaust component comprises a cooling component and an exhaust component. The cooling component is arranged on the reaction component, and the exhaust component is arranged on the cooling component.

[0011] As a preferred solution of a sulfur hexafluoride conversion device based on dual anode thermal plasma of the present invention, the gas mixing component includes a first gas cylinder and a second gas cylinder, a gas distribution and mixing device connected to the first gas cylinder and the second gas cylinder, the first gas cylinder and the second gas cylinder are arranged horizontally, the first gas cylinder contains a certain amount of SF6, and the second gas cylinder contains a certain amount of inert gas.

[0012] As a preferred solution of a sulfur hexafluoride conversion device based on dual anode thermal plasma of the present invention, the control component includes a first solenoid valve arranged on the first gas cylinder, a second solenoid valve arranged on the second gas cylinder, and a third solenoid valve arranged on the gas distribution and mixing instrument.

[0013] As a preferred solution of the sulfur hexafluoride conversion device based on dual anode thermal plasma of the present invention, the reaction component includes a thermal plasma reactor arranged on the gas distribution and mixing instrument, and an arc-starting anode and a cathode tube arranged in the thermal plasma reactor.

[0014] As a preferred solution of the sulfur hexafluoride conversion device based on dual anode thermal plasma of the present invention, the degradation component includes an air pump arranged on the thermal plasma reactor and a tungsten powder tank arranged on the air pump.

[0015] As a preferred solution of the sulfur hexafluoride conversion device based on dual anode thermal plasma of the present invention, the cooling component includes a water cooler arranged on the thermal plasma reactor.

[0016] As a preferred solution of the sulfur hexafluoride conversion device based on dual anode thermal plasma of the present invention, the tail gas component includes a cooling machine arranged on the thermal plasma reactor, a concentration detector arranged on the cooling machine, and a tail gas recovery device on the concentration detector.

[0017] As a preferred solution of the sulfur hexafluoride conversion device based on dual-anode thermal plasma of the present invention, there are two arc-striking anodes, and a cathode tube is arranged between the two arc-striking anodes.

[0018] A sulfur hexafluoride conversion device and method based on dual anode thermal plasma, comprising the above-mentioned sulfur hexafluoride conversion device based on dual anode thermal plasma, comprising the following steps:

[0019] The dilution ratio is controlled by a solenoid valve to configure the mixed gas;

[0020] The mixed gas and tungsten powder are introduced into the reactor for degradation;

[0021] Use water cooling to cool down and monitor the degradation efficiency of SF6 waste gas in real time.

[0022] As a preferred embodiment of the present invention, a sulfur hexafluoride conversion device and method based on dual anode thermal plasma, wherein: a reactor is used to achieve low current input and high power output, and the plasma area is expanded, thereby completing the conversion treatment of SF6.

[0023] Beneficial effects of the present invention: The present invention can be connected to SF6 gas and Ar gas cylinders, which can not only improve the degradation efficiency of SF6 and realize the treatment of high-concentration SF6, but also accelerate the degradation rate of SF6 under high temperature conditions, and the tail gas after degradation is also usable. In addition, an SF6 concentration detector is installed, which can visually and quickly observe the degradation efficiency of SF6. The water cooling device installed on the periphery of the reactor and the cooling device at the reactor outlet can protect the equipment, and the gas released by the high-temperature and high-heat reaction of the reactor will not cause damage to the experimental equipment and detection equipment.

[0024] The present invention has the following advantages:

[0025] (1) It can achieve high-concentration SF6 degradation with high degradation efficiency and fast degradation rate;

[0026] (2) It can visually display the content of degradation components, making data investigation very convenient;

[0027] (3) During the SF6 degradation process, even in a high temperature environment, no damage will be caused to the experimental equipment;

[0028] (4) The arc-starting anode increases the arc length and arc voltage, achieving low current input and high power output;

[0029] (5) The main product after degradation is tungsten hexafluoride, so the exhaust gas after degradation is also usable. BRIEF DESCRIPTION OF THE DRAWINGS

[0030] In order to more clearly illustrate the technical solutions of the embodiments of the present invention, the following briefly introduces the drawings required for use in the description of the embodiments. Obviously, the drawings described below are only some embodiments of the present invention. For ordinary technicians in this field, other drawings can be obtained based on these drawings without creative work.

[0031] Figure 1 The figure is a schematic diagram of the overall structure of a sulfur hexafluoride conversion device based on dual anode thermal plasma according to the present invention.

[0032] Figure 2 The figure is a schematic diagram of the structural connections of a sulfur hexafluoride conversion device based on dual anode thermal plasma according to the present invention. DETAILED DESCRIPTION

[0033] In order to make the above-mentioned objects, features and advantages of the present invention more obvious and easy to understand, the specific implementation methods of the present invention are described in detail below in conjunction with the accompanying drawings.

[0034] In the following description, many specific details are set forth to facilitate a full understanding of the present invention, but the present invention may also be implemented in other ways different from those described herein, and those skilled in the art may make similar generalizations without violating the connotation of the present invention. Therefore, the present invention is not limited to the specific embodiments disclosed below.

[0035] Secondly, the term "one embodiment" or "embodiment" as used herein refers to a specific feature, structure, or characteristic that may be included in at least one implementation of the present invention. The term "in one embodiment" that appears in different places in this specification does not necessarily refer to the same embodiment, nor is it a separate or selective embodiment that is mutually exclusive with other embodiments.

[0036] Secondly, the present invention is described in detail with reference to the schematic diagram. When describing the embodiments of the present invention in detail, for the sake of convenience, the cross-sectional diagrams showing the device structure will not be partially enlarged according to the general scale, and the schematic diagrams are only examples, which should not limit the scope of protection of the present invention. In addition, in actual production, the three-dimensional dimensions of length, width and depth should be included.

[0037] Example 1

[0038] Reference Figure 1 - Figure 2 , which is the first embodiment of the present invention, provides a sulfur hexafluoride conversion device based on dual anode thermal plasma, the device comprising a ventilation assembly 100, including a gas mixing component 101 and a control component 102, the control component 102 is arranged on the gas mixing component 101; and

[0039] The degradation component 200 includes a reaction component 201 and a degradation component 202. The reaction component 201 is arranged on the gas mixing component 101, and the degradation component 202 is arranged on the reaction component 201. The degradation of SF6 can be completed through the ventilation component 100 and the degradation component 200.

[0040] Specifically, the gas mixing element 101 includes a first gas cylinder 101a and a second gas cylinder 101b, a gas distribution and mixing device 101c connected to the first gas cylinder 101a and the second gas cylinder 101b, the first gas cylinder 101a and the second gas cylinder 101b are fixedly connected to the gas distribution and mixing device 101c at the same height, the first gas cylinder 101a and the second gas cylinder 101b are arranged horizontally, and there is a certain amount of inert gas in the first gas cylinder 101a and a certain amount of inert gas in the second gas cylinder 101b;

[0041] The inert gas may be Ar or the like.

[0042] Furthermore, the control component 102 includes a first solenoid valve 102a provided on the first gas cylinder 101a, a second solenoid valve 102b provided on the second gas cylinder 101b, and a third solenoid valve 102c provided on the gas mixing device 101c. The flow rates of Ar and SF6 are controlled by the first solenoid valve 102a and the second solenoid valve 102b, thereby achieving a matching ratio of the two gases.

[0043] Furthermore, the reaction element 201 includes a thermal plasma reactor 201a arranged on the gas distribution and mixing instrument 101c, an arc-starting anode 201b and a cathode tube 201c arranged in the thermal plasma reactor 201a, and the thermal plasma reactor 201a has a special structure. There are two arc-starting anodes 201b, and a cathode tube 201c is arranged between the two arc-starting anodes 201b. Two anodes are introduced into the thermal plasma reactor 201a, and a cathode is inserted between the two anodes. Its structure can achieve low current input and high power output, which greatly improves the degradation efficiency. The existence of the arc-starting anode 201b can reduce the arc-starting voltage of the plasma torch. The arc-starting anode 201b increases the arc length and arc pressure, expands the plasma area, and promotes the degradation effect.

[0044] Furthermore, the degradation component 202 includes an air pump 202a arranged on the thermal plasma reactor 201a, and a tungsten powder tank 202b arranged on the air pump 202a. One side of the air pump 202a is fixedly connected to one side of the thermal plasma reactor 201a, and the other side of the air pump 202a is fixedly connected to the tungsten powder tank 202b containing tungsten powder. The tungsten powder is blown into the thermal plasma reactor 201a through the air pump 202a to participate in the reaction and degrade SF6.

[0045] During operation, each gas cylinder is connected to the gas distribution and mixing device through a solenoid valve, and gas is distributed in the gas distribution and mixing device. The power is turned on, and the mixed gas is introduced into the thermal plasma reactor 201a. At the same time, the gas pump 202a is turned on to blow tungsten powder into the reactor to fully react with the mixed gas. The gas cylinder includes SF6 waste gas and Ar. SF6 waste gas is generally also collected in a gas cylinder. During use, the gas in the gas cylinder is discharged through the solenoid valve, and the gas circuit can be shut off. When using the device, first open the main valve of the carrier gas bottle, the initial absolute pressure is about 0.1Mpa, and then open the solenoid valve to release the gas, allowing the gas to enter the gas distribution and mixing device. After the gas distribution is completed, the mixed gas is introduced into the thermal plasma reactor 201a, and the tungsten powder is also blown into the reactor through the air pump 202a to participate in the reaction. The reactor is powered by a power supply. The core of the thermal plasma reactor 201a is a thermal plasma torch, which is composed of two arc-striking anodes 201b, and a cathode is inserted between the two anodes. During the reaction, the power supply first generates an overvoltage between the cathode and the arc-striking anode 201b to ignite the arc, and then provides a stable current between the cathode and the arc-striking anode 201b to maintain the thermal plasma.

[0046] Example 2

[0047] Reference Figure 1 - Figure 2 , which is the second embodiment of the present invention, provides a sulfur hexafluoride conversion device based on dual anode thermal plasma, and the device includes a cooling and exhaust assembly 300, including a cooling part 301 and a tail gas part 302, the cooling part 301 is arranged on the reaction part 201, and the tail gas part 302 is arranged on the cooling part 301. By using the cooling and exhaust assembly 300, the temperature of the reaction process equipment is reduced, which is beneficial to continuous use and the discharge of tail gas.

[0048] Specifically, the cooling component 301 includes a water cooler 301a disposed on the thermal plasma reactor 201a. The water cooler 301a is connected to the outside of the thermal plasma reactor 201a, and can achieve cooling when a reaction is carried out in the thermal plasma reactor 201a, thereby ensuring the safety of experimenters and experimental equipment.

[0049] Furthermore, the exhaust component 302 includes a cooling machine 302a arranged on the thermal plasma reactor 201a, a concentration detector 302b arranged on the cooling machine 302a, and an exhaust gas recovery device 302c on the concentration detector 302b. The cooling machine 302a is fixedly connected to the thermal plasma reactor 201a, and the concentration detector 302b is fixedly connected to the exhaust gas circulation position on the rear side of the cooling machine 302a for exhaust gas detection. The exhaust gas recovery device 302c is installed on the rear side of the concentration detector 302b for the final recovery of the exhaust gas, and is located at the circulation position after the SF6 reaction to cool the generated exhaust gas, and then the concentration of the exhaust gas is detected by the concentration detector 302b. Finally, the exhaust gas recovery device 302c can be used to recover the exhaust gas.

[0050] During the operation, the water cooling device is turned on to cool the reactor. After the reaction is completed, the reacted gas is passed from the gas chamber inside the reactor to the cooling device. After the cooling treatment, the gas is passed to the SF6 concentration detector 302b for concentration monitoring. Finally, the tail gas is discharged and the tail gas is recovered;

[0051] When SF6 is injected into the plasma torch, the arc voltage increases significantly, making it difficult to ignite and maintain. During the high-temperature reaction, the water cooling device is also turned on to maintain the temperature of the reactor within the ideal range. After passing through the thermal plasma reactor 201a, the high-temperature gas will be discharged from the gas chamber inside the reactor to the cooling device to prevent the high-temperature gas from damaging the experimental equipment. After the cooling is completed, the gas will be introduced into the SF6 concentration detector 302b, which can intuitively reflect the degree of SF6 degradation. After the treatment is completed, the tail gas will be collected and processed.

[0052] Example 3

[0053] Reference Figure 1 - Figure 2 , which is the third embodiment of the present invention, provides a sulfur hexafluoride conversion device and method based on dual anode thermal plasma, including the following contents:

[0054] S1. Control the dilution ratio through the solenoid valve and configure the mixed gas in the gas distribution and mixing device;

[0055] S2, passing the mixed gas into the thermal plasma reactor 201a, and blowing the tungsten powder into the reactor through the air pump 202a;

[0056] S3, turning on the power supply to degrade the mixed gas;

[0057] S4. During the degradation process, the reactor is cooled using a water cooling system to control the temperature within a reasonable range;

[0058] S5. After the reaction is completed, the gas is discharged through the gas chamber at the bottom of the reactor, and after passing through the cooling device, it is introduced into the SF6 detector to monitor the degradation efficiency of the SF6 waste gas in real time.

[0059] When connecting the equipment, the order should be followed: gas connection first, then circuit connection. In the gas connection, each level can be connected to a gas flow through a three-way valve for detection, so that the operating status of each level of equipment can be monitored in real time.

[0060] After the device is finished running, it should also be closed in the order of gas circuit first and then circuit. Because there is an uncertain reaction device in the middle of the device, only the gas circuit closing situation of the device is described here. First, the main valve of the SF6 gas cylinder should be closed, and then the solenoid valve should be closed. At the same time, the gas pump 202a should be closed, and tungsten powder should no longer be blown into the reactor. After that, wait for a few minutes until the reaction device completely degrades the remaining SF6 mixed gas in it before turning off the power. Note that the carrier gas circuit should be closed last, because the carrier gas needs to clean the remaining SF6 gas in the gas pipe and the reaction device. Finally, close the valve of the carrier gas, and the closing order is consistent with the SF6 gas circuit.

[0061] Importantly, it should be noted that the construction and arrangement of the present application shown in a plurality of different exemplary embodiments are only exemplary. Although only a few embodiments are described in detail in this disclosure, it should be readily understood by those who refer to this disclosure that many modifications are possible (e.g., the size, scale, structure, shape and proportion of various elements, as well as parameter values, mounting arrangements, use of materials, color, directional changes, etc.) without substantially departing from the novel teachings and advantages of the subject matter described in the application. For example, the element shown as integrally formed can be composed of multiple parts or elements, the position of the element can be inverted or otherwise changed, and the nature or number or position of the discrete element can be changed or changed. Therefore, all such modifications are intended to be included in the scope of the present invention. The order or sequence of any process or method steps can be changed or reordered according to alternative embodiments. In the claims, any "device plus function" clause is intended to cover the structure described herein that performs the function, and is not only structurally equivalent but also equivalent structure. Without departing from the scope of the present invention, other replacements, improvements, changes and omissions can be made in the design, operating conditions and arrangement of the exemplary embodiments. Therefore, the invention is not limited to a specific embodiment, but extends to numerous modifications still falling within the scope of the appended claims.

[0062] Additionally, in order to provide a concise description of exemplary embodiments, all features of an actual embodiment (ie, those features that are not relevant to the best mode presently contemplated for carrying out the invention or those that are not relevant to implementing the invention) may not be described.

[0063] It should be understood that in the development of any actual implementation, as in any engineering or design project, numerous implementation-specific decisions may be made. Such a development effort may be complex and time-consuming, but for those of ordinary skill having the benefit of this disclosure, without undue experimentation, the development effort will be a routine task of design, fabrication, and production.

[0064] It should be noted that the above embodiments are only used to illustrate the technical solutions of the present invention rather than to limit it. Although the present invention has been described in detail with reference to the preferred embodiments, those skilled in the art should understand that the technical solutions of the present invention may be modified or replaced by equivalents without departing from the spirit and scope of the technical solutions of the present invention, which should all be included in the scope of the claims of the present invention.

Claims

1. A sulfur hexafluoride conversion device based on dual anode thermal plasma, characterized in that: include, A ventilation assembly (100) comprises an air mixing element (101) and a control element (102), wherein the control element (102) is arranged on the air mixing element (101); as well as A degradation component (200) comprises a reaction component (201) and a degradation component (202), wherein the reaction component (201) is arranged on the gas mixing component (101), and the degradation component (202) is arranged on the reaction component (201); and The cooling exhaust component (300) comprises a cooling component (301) and an exhaust component (302), wherein the cooling component (301) is arranged on the reaction component (201), and the exhaust component (302) is arranged on the cooling component (301).

2. The sulfur hexafluoride conversion device based on dual anode thermal plasma according to claim 1, characterized in that: The gas mixing component (101) comprises a first gas cylinder (101a) and a second gas cylinder (101b), a gas distribution and mixing device (101c) connected to the first gas cylinder (101a) and the second gas cylinder (101b), the first gas cylinder (101a) and the second gas cylinder (101b) are arranged horizontally, a certain amount of SF6 is contained in the first gas cylinder (101a), and a certain amount of inert gas is contained in the second gas cylinder (101b).

3. The sulfur hexafluoride conversion device based on dual anode thermal plasma according to claim 2, characterized in that: The control component (102) comprises a first solenoid valve (102a) provided on the first gas cylinder (101a), a second solenoid valve (102b) provided on the second gas cylinder (101b), and a third solenoid valve (102c) provided on the gas distribution and mixing device (101c).

4. The sulfur hexafluoride conversion device based on dual anode thermal plasma according to claim 3, characterized in that: The reaction element (201) comprises a thermal plasma reactor (201a) arranged on the gas distribution and mixing device (101c), and an arc-starting anode (201b) and a cathode tube (201c) arranged in the thermal plasma reactor (201a).

5. The sulfur hexafluoride conversion device based on dual anode thermal plasma according to claim 4, characterized in that: The degradation component (202) comprises an air pump (202a) arranged on the thermal plasma reactor (201a), and a tungsten powder tank (202b) arranged on the air pump (202a).

6. The sulfur hexafluoride conversion device based on dual anode thermal plasma according to claim 4 or 5, characterized in that: The temperature-reducing component (301) comprises a water cooler (301a) arranged on the thermal plasma reactor (201a).

7. The sulfur hexafluoride conversion device based on dual anode thermal plasma according to claim 6, characterized in that: The tail gas component (302) comprises a cooling machine (302a) arranged on the thermal plasma reactor (201a), a concentration detector (302b) arranged on the cooling machine (302a), and a tail gas recovery device (302c) on the concentration detector (302b).

8. The sulfur hexafluoride conversion device based on dual anode thermal plasma according to claim 7, characterized in that: There are two arc-striking anodes (201b), and a cathode tube (201c) is arranged between the two arc-striking anodes (201b).

9. A sulfur hexafluoride conversion device and method based on dual anode thermal plasma, characterized in that: The sulfur hexafluoride conversion device based on dual anode thermal plasma as claimed in any one of claims 1 to 8 comprises the following steps: The dilution ratio is controlled by a solenoid valve to configure the mixed gas; The mixed gas and tungsten powder are introduced into the reactor for degradation; Use water cooling to cool down and monitor the degradation efficiency of SF6 waste gas in real time.

10. The sulfur hexafluoride conversion device and method based on dual anode thermal plasma according to claim 9, characterized in that: The reactor is used to achieve low current input and high power output, expand the plasma area, and complete the conversion process of SF6.

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