Joint control system and method for oxidizing agent, reforming agent and gas film gas in reforming reactor

Abstract

The invention belongs to the technical field of industrial reactors, and particularly relates to a joint control system and method for an oxidizing agent, a reforming agent and gas film gas in a carbon-containing substance conversion reforming reactor / process. According to the joint control system and method for the oxidizing agent, the reforming agent and the gas film gas in the reforming reactor, the adding amount and the adding proportion of the oxidizing agent and the reforming agent are adjusted by correlating reactor outlet product gas components and the temperature, reaction heat is fully utilized, certain flexibility and adjustability of the reactor product gas components are achieved, and the reaction efficiency is improved. Meanwhile, the gas flow of the gas film is regulated and controlled by correlating the temperature of the gas film device, and the gas film agent forms a radial pressure gradient, so that gas film thermal resistance is formed along the wall direction, a refractory material is protected, the service life of internal components of the reactor is prolonged, and the problem of frequent burning loss of the internal components in the prior art is solved.

Description

Technical Field

[0001] The present invention belongs to the technical field of industrial reactors, and in particular relates to a system and method for controlling an oxidant, a reforming agent and a gas film gas in a carbon-containing material conversion reforming reactor / process. Background Art

[0002] Coal occupies a dominant position in primary energy production and consumption and this will not change in the long run. Therefore, how to convert coal into gaseous fuel will make it more economical to transport and more efficient to utilize.

[0003] At present, among the technologies for converting carbon-containing substances such as coal into gaseous fuels, representative processes include fixed-bed dry ash discharge gasification technology and fixed-bed slag gasification technology. The gasification temperature of the fixed-bed dry ash discharge gasification technology must be lower than the softening temperature of the raw coal, and a large amount of steam must be used to reduce the oxidation temperature. There are problems such as large steam consumption, large amount of wastewater, high carbon content of the discharged ash, low carbon conversion efficiency, and high operating cost. Compared with the dry ash discharge gasification technology, the fixed-bed slag gasification technology has achieved liquid slag discharge, improved the shortcomings of the dry ash discharge gasification technology, increased the conversion temperature and carbon conversion efficiency, and reduced steam consumption; however, the temperature in its conversion area is relatively high, and the heat in the furnace is often not fully and reasonably utilized. The efficiency of graded utilization of carbon-containing substances, especially low-order carbon-containing substances, is not high, and the methane content in the product gas cannot be guaranteed. In addition, whether it is the dry ash discharge gasification technology or the fixed-bed slag gasification technology, the properties of the carbon-containing substances as raw materials play a decisive role in the gas composition of the converted products, and the conversion gas composition is limited by the properties of the carbon-containing substances, which affects the product gas composition and cannot be adjusted.

[0004] A carbon-containing material conversion reforming reactor has been designed and developed in this field. Carbon-containing particles are used as raw materials, and steam, oxygen, carbon dioxide and mixtures thereof are used as oxidants. A mixed bed is formed by a non-cylindrical variable diameter design of the reactor, and reforming agents such as steam, oxygen, carbon dioxide, hydrogen, tar and mixtures thereof are added to realize secondary conversion reforming. The product gas components are adjusted according to the predetermined product process route and the reactor efficiency is improved. Composite air film bricks with catalytic functions are used to introduce air film gas. While the air film gas is used to cool the air film bricks to protect the furnace wall, the air film gas is heated and heated by the air film bricks, and the chain is broken and converted. The air film gas absorbs the heat transferred from the high-temperature medium in the reactor to the air film bricks, and is activated by the active catalytic components highly dispersed on the surface of the air film bricks. Mixing with the reforming agent improves the reaction efficiency with the upward oxidizing gas. The carbon-containing material conversion reforming reactor combines the advantages of the existing fixed bed gasification technology and solves the shortcomings of the existing fixed bed gasification technology. While improving the working conditions of the furnace wall and extending the service life of the furnace wall, the furnace wall is added with the catalytic conversion function of the process reaction, thereby improving the overall efficiency of the reactor. Summary of the invention

[0005] To this end, the technical problem to be solved by the present invention is to provide a joint control system for oxidant, reforming agent and gas film gas in a carbon-containing material conversion reforming reactor / process;

[0006] The second technical problem to be solved by the present invention is to provide a method for the joint control of the oxidant, the reforming agent and the gas membrane gas in a carbon-containing material conversion reforming reactor / process.

[0007] In order to solve the above technical problems, the present invention provides a joint control system for an oxidant, a reforming agent and a gas film gas in a reforming reactor, the system comprising:

[0008] The product gas component monitor is used to monitor the CO contained in the product gas component of the reforming reactor. 2 , CO, H 2 , CH 4 , O 2 Conduct online testing;

[0009] Oxidant ratio controller, used to adjust the ratio and amount of oxidant in real time;

[0010] Reformer ratio controller, used to adjust the ratio and dosage of reformer in real time;

[0011] A joint control controller, used for joint control of the oxidant ratio controller and the reforming agent ratio controller, to adjust the ratio of the oxidant to the reforming agent;

[0012] Air film gas controller, used to adjust the amount of air film gas in real time;

[0013] A reactor outlet temperature control element, used for online monitoring of the temperature at the outlet of the reforming reactor;

[0014] Air film insulation device temperature control element, used for online monitoring of the temperature of air molded bricks; and,

[0015] Control loop.

[0016] Specifically, the joint control system of the oxidant, reforming agent and gas film gas in the reforming reactor further comprises a first oxidant controller and a second oxidant controller respectively connected to the oxidant ratio controller; wherein,

[0017] The second oxidant is an independent variable, the first oxidant is a dependent variable, and the first oxidant is adjusted according to a set ratio with the second oxidant;

[0018] Preferably, the oxidant ratio controller regulates the oxidant through a pre-set algorithm of a distributed control system (DCS).

[0019] Specifically, the joint control system of the oxidant, reforming agent and gas film gas in the reforming reactor further comprises a first reforming agent controller and a second reforming agent controller respectively connected to the reforming agent ratio controller; wherein,

[0020] The first reforming agent is an independent variable, the second reforming agent is a dependent variable, and the second reforming agent is adjusted according to a set ratio with the first reforming agent;

[0021] Preferably, the reforming agent ratio controller regulates the reforming agent through a pre-set algorithm of a distributed control system (DCS).

[0022] The present invention also discloses a method for joint control of an oxidant, a reforming agent and a gas film gas in a reforming reactor, including a method for joint control of the oxidant, the reforming agent and the gas film gas in the reforming reactor by using the system;

[0023] Specifically, the method includes the following steps of joint control:

[0024] (1) a step of regulating the ratio of the oxidant;

[0025] (2) a step of regulating the ratio of the reforming agent;

[0026] (3) a step of regulating the air flow rate of the air film;

[0027] (4) A step for regulating the reactor outlet temperature.

[0028] Specifically, in the method for jointly controlling the oxidant, reforming agent and film gas in the reforming reactor, in the step (1), the oxidant ratio controller performs oxidant ratio adjustment, using a distributed control system (DCS) pre-set algorithm of R1=F1:F2, the ratio control range is a molar ratio of 0.8-1.6, and the preferred ratio is 1.18.

[0029] Specifically, in the method for jointly controlling the oxidant, reforming agent and film gas in the reforming reactor, in the step (2), the reforming agent ratio controller performs reforming agent ratio adjustment, using the distributed control system (DCS) pre-set algorithm as R2=F4:F3, the ratio control range is the molar ratio of 0.05-0.15, and the preferred ratio is 0.11.

[0030] Specifically, the method for joint control of the oxidant, reforming agent and film gas in the reforming reactor, the steps (1) and (2), the joint control controller performs the ratio adjustment of the oxidant and the reforming agent, with the oxidant as the independent variable and the reforming agent as the dependent variable, and the reforming agent is set to adjust with the change of the oxidant according to the set ratio, and the preset algorithm of the control distributed control system (DCS) is R2=(F1+F3):F1, and the ratio control range is the molar ratio of 0.8-3.2, and preferably 2.8.

[0031] Specifically, in the method for jointly controlling the oxidant, reforming agent and film gas in the reforming reactor, in the step (3), the film gas flow rate is adjusted to 20-200 Kmol / h, and the temperature of the film insulation device is controlled to be less than 250°C and maintained above the dew point temperature.

[0032] Specifically, in the method for joint control of the oxidant, reforming agent and film gas in the reforming reactor, in the step (4), the reactor outlet temperature is controlled to be ≤350°C by coupling the product gas component monitor and the reactor outlet temperature control element to the control joint controller and the reforming agent ratio controller.

[0033] Specifically, the method for joint control of the oxidant, the reforming agent and the gas film gas in the reforming reactor further comprises: 2 , CO 2 , CH 4 Or a group of components of water vapor, after calculation by the built-in algorithm, after a certain period of time t, the trend is judged to decide whether to adjust the ratio within a certain range;

[0034] Preferably, the time t is a function of the oxidant input amount, and the distributed control system (DCS) pre-sets an algorithm, F 2 =f(t), the set time is 5-15min, the oxidant controller controls the input amount of the second oxidant to adjust 5Kmol-20Kmol until the oxidant reaches the pre-designed normal operating amount;

[0035] Preferably, the certain time t is controlled to be 5-15 minutes, and a relatively stable trend is maintained during the time, that is, the fluctuation range is 3-8%, then an adjustment signal is sent to the joint control controller, and the control ratio adjustment range is 0.05-0.2.

[0036] Specifically, in the joint control method of the oxidant, reforming agent and gas film gas in the reforming reactor, the adjustable range (mol%) of the product gas is: CO 2 : 6.5%-22%, CO: 33%-56%, H 2 :25%-37%,CH 4 : 6.5%-13%.

[0037] The joint control system of the oxidant, reforming agent and gas film gas in the reforming reactor of the present invention includes monitoring and control instrumentation such as a product gas component monitor, a reactor outlet temperature control element, a first oxidant controller, a second oxidant controller, a first reforming agent controller, a second reforming agent controller, and a gas film insulation device temperature control element. The joint control system of the present invention controls the addition amount and proportion of the oxidant and reforming agent through a certain component monitored by the product gas component monitor and the reactor outlet temperature control element coupling and correlation regulation joint control controller and reforming agent ratio controller, so as to realize flexible adjustment of the reactor product gas group within a certain range.

[0038] The method for joint control of the oxidant, reforming agent and film gas in the reforming reactor described in the present invention adjusts the dosage and dosage ratio of the oxidant and reforming agent by associating the product gas components and temperature at the reactor outlet, fully utilizes the reaction heat, and realizes a certain degree of flexible adjustment of the reactor product gas components. At the same time, the film gas flow rate is regulated by associating the temperature of the film device, and the film agent forms a radial pressure gradient, so that a film thermal resistance is formed along the wall direction, thereby protecting the refractory material, extending the service life of the internal components of the reactor, and solving the problem of frequent burning of internal components in the prior art.

[0039] The present invention provides a method for the associated joint regulation and control of an oxidant, a reforming agent and a gas film gas in a carbon-containing material conversion reforming reactor / process. The associated joint regulation method preliminarily sets a logic control program in a distributed control system (DCS), and associates the reactor outlet product gas components and temperature to adjust the oxidant and reforming agent dosages and dosage ratios, thereby making full use of the reaction heat to achieve flexible adjustment of the reactor product gas components. At the same time, the gas film gas flow rate is regulated by the temperature of the associated gas film device, and the gas film agent forms a radial pressure gradient, so that a gas film thermal resistance is formed along the wall direction, thereby protecting the refractory material, extending the service life of the reactor internal components, and solving the problem of frequent burning of the internal components in the prior art. BRIEF DESCRIPTION OF THE DRAWINGS

[0040] In order to make the content of the present invention more clearly understood, the present invention is further described in detail below according to specific embodiments of the present invention in conjunction with the accompanying drawings, wherein:

[0041] Figure 1 is a schematic diagram of the joint control system of the present invention;

[0042] Figure 2 is a schematic diagram of the joint control method of the present invention;

[0043] Figure 3 It is a schematic diagram of another joint control method of the present invention. DETAILED DESCRIPTION

[0044] The technical solutions in the embodiments of the present invention are described clearly and completely below. Obviously, the described embodiments are only a part of the embodiments of the present invention, not all of the embodiments. Based on the embodiments of the present invention, all other embodiments obtained by ordinary technicians in this field without creative work are within the protection scope of the present invention.

[0045] The following is a detailed description of a method for controlling the correlation of an oxidant, a gas film gas and a reforming agent provided by the present invention. The contents not described in detail in the embodiments of the present invention belong to the prior art known to professionals in the field.

[0046] Example 1

[0047] As attached Figure 1 The system schematic diagram shown in the embodiment shows that the joint control system of this embodiment is provided at the outlet of the reforming reactor to control CO 2 , CO, H 2 , CH 4 , O 2 Online analyzer for analyzing product gas of five gas components (ψCO 2 , ψCO, ψH 2 , ψCH 4 , ψO 2 ), CO in the product gas can be 2 , CO, H 2 , CH 4 , O 2 In the system described in this embodiment, the monitoring and control instrument equipment all have the function of monitoring signal feedback. The product gas component monitor should have CO 2 , CO, H 2 , CH 4 , O 2 More than 5 online monitoring capabilities.

[0048] As attached Figure 1 The system schematic diagram shown in FIG. 2 shows, two reactor outlet temperature control elements (T 1-2 ) is used to measure the temperature at the reactor outlet. The temperature controller can be used in combination with either of the two. The reactor outlet temperature is ≤350℃ through the product gas component monitor, the reactor outlet temperature control element coupling and the reforming agent ratio controller.

[0049] As attached Figure 1The system schematic diagram shown in the figure, the system is also provided with a first oxidant controller (F1) and its flow control loop and a second oxidant controller (F2) and its flow control loop, the first oxidant controller and the second oxidant controller are regulated by an oxidant ratio controller. The oxidant ratio controller can be pre-set by a distributed control system (DCS), and the oxidant ratio controller FFIC1 is set to proportionally adjust the parameters such as the flow of the first oxidant and the second oxidant.

[0050] In this embodiment, in the oxidant ratio controller, the oxidant ratio regulator performs oxidant ratio adjustment, using a distributed control system (DCS) pre-set algorithm of R1=F1:F2, the ratio control range is a molar ratio of 0.8-1.6, and the preferred ratio is 1.18.

[0051] In this embodiment, the oxidant controller controls the second oxidant input amount to adjust 5Kmol-20Kmol until the oxidant reaches the pre-designed normal operating amount, preferably 14Kmol in 10 minutes.

[0052] As attached Figure 1 The system schematic diagram shown in the figure, the system is also provided with a first reforming agent controller (F3) and its flow control loop and a second reforming agent controller (F4) and its flow control loop, the first reforming agent controller and the second reforming agent controller are regulated by a reforming agent ratio controller. The reforming agent ratio controller can be preset by a distributed control system (DCS), and the reforming agent ratio controller FFIC2 is set to proportionally adjust the parameters such as the flow rate of the first reforming agent and the second reforming agent.

[0053] In this embodiment, the reforming agent ratio controller performs reforming agent ratio adjustment, using the distributed control system (DCS) pre-set algorithm as R2=F4:F3, the ratio control range is a molar ratio of 0.05-0.15, and the preferred ratio is 0.11.

[0054] As attached Figure 1 The system schematic diagram shown in the figure shows that the system is also provided with a joint control controller FFIC3 and its logic control loop. The distributed control system (DCS) pre-sets the algorithm, F 2 =f(t), specifically every 5-15 minutes. The oxidant ratio controller and the reforming agent ratio controller are jointly controlled by a joint control controller to achieve the control and monitoring of the oxidant and reforming agent ratio.

[0055] In this embodiment, the joint controller performs ratio adjustment of the oxidant and the reforming agent, with the oxidant as the independent variable and the reforming agent as the dependent variable. The reforming agent is adjusted according to the set ratio as the oxidant changes. The preset algorithm of the distributed control system (DCS) is R2=(F1+F3):F1, and the ratio control range is the molar ratio of 0.8-3.2, and preferably 2.8.

[0056] In this embodiment, a certain component monitored by the product gas component monitor and the reactor outlet temperature control element are coupled and regulated by the joint control controller and the reforming agent ratio controller to control the amount and ratio of the oxidant and reforming agent added, so as to achieve flexible adjustment of the reactor product gas group within a certain range.

[0057] As attached Figure 1 The system schematic diagram shown in FIG. 1 further includes a temperature control element (T 3-6 ), usually, a total of 6 temperature control elements are provided, but usually one out of the six is ​​used. In this embodiment, a control loop is formed by the temperature control element of the air film insulation device to adjust the air film gas flow, control the temperature of the air film insulation device to be less than 250°C, and the air film gas flow is 20-200Kmol / h, and is maintained above the dew point temperature.

[0058] As attached Figure 1 As shown in the system schematic diagram, the system is also provided with a gas film gas controller (F5) and its control circuit, which can realize the flow control of the gas film gas in the reforming reaction.

[0059] In the application of the system of the present invention, a certain component monitored by the gas component monitor is H in the outlet product gas. 2 , CO 2 , CH 4 Or a group of components of water vapor, after calculation by the built-in algorithm, after a certain period of time t, the trend is judged to decide whether to adjust the ratio within a certain range.

[0060] In the application of the system of the present invention, a certain component monitored by the product gas component monitor, the reactor outlet temperature control element coupling and correlation control joint control controller, and the reforming agent ratio controller are used to control the amount and ratio of the oxidant and reforming agent, so as to realize the flexible adjustment of the reactor product gas group within a certain range. A certain component monitored by the gas component monitor is H in the outlet product gas. 2 , CO 2 , CH 4 Or a group of components of water vapor, after calculation by the built-in algorithm, after a certain period of time t, the trend is judged to decide whether to adjust the ratio within a certain range.

[0061] In the application of the system of the present invention, the adjustable range of the product gas (mol%) is: CO 2: 6.5%-22%, CO: 33%-56%, H 2 :25%-37%,CH 4 : 6.5%-13%.

[0062] In the application of the system of the present invention, it is preferred that the detection component in the product gas is H 2 , time is 5-15min, preferably 10min, fluctuation range is less than 3%-8%, preferably 5%, and ratio adjustment range is 0.05-0.2, preferably 0.1.

[0063] Furthermore, if a relatively stable trend is maintained for 10 minutes, that is, the fluctuation range is less than 5%, an adjustment signal is sent to the joint control controller, and the proportional adjustment amplitude is 0.1.

[0064] In application, the system of the present invention obtains the actual product gas composition by analyzing the analysis results of the product gas composition, and then uses the joint control controller to provide feedback and intelligently adjust the feed ratio of the oxidant and the feed ratio of the reforming agent, and adjusts the feed situation of the film gas by monitoring the temperature of the film gas and other information.

[0065] Example 2

[0066] The method for controlling the correlation among the oxidant, the reforming agent and the gas film gas in the carbonaceous material reforming reactor described in this embodiment is based on the attached Figure 1 The system is linked and regulated. The specific joint control process is as shown in the attached Figure 2 shown.

[0067] In this embodiment, the first oxidant is selected as oxygen, the second oxidant is selected as superheated water vapor, the first reforming agent is selected as superheated water vapor, and the second reforming agent is selected as oxygen.

[0068] In this embodiment, the analysis of carbon-containing substances in the conversion and reforming reaction raw materials is shown in Table 1 below.

[0069] Table 1 Carbon-containing substances analysis results

[0070] project Mt St,ar Mad Aar Vdaf FCar Car Har unit ％ ％ ％ ％ ％ ％ ％ ％ Numeric 24.2 0.355 9.48 5.75 32.075 47.555 54.865 2.675 project Nar Oar Qgr,ar Qnet,ar DT ST HT FT unit ％ ％ MJ / kg MJ / kg ℃ ℃ ℃ ℃ Numeric 0.57 11.58 21.305 20.19 1120 1185 1195 1200

[0071] In this embodiment, the main components of the product gas (dry gas) at the outlet of the conversion reforming reactor are shown in Table 2 below.

[0072] Table 2 Product gas composition (mol%)

[0073] composition <![CDATA[CO 2 ]]> CO <![CDATA[H 2 ]]> <![CDATA[CH 4 ]]> <![CDATA[O 2 ]]> composition% 20.20 33.46 33.00 12.04 0.01

[0074] In this embodiment, the distributed control system (DCS) is used to pre-set the logic control program F 2 =f(t)=F1*FFIC 1Then the flow rates of oxidant, reformer and film gas are regulated.

[0075] In this embodiment, the molar ratio range of the first oxidant and the second oxidant using the oxidant ratio controller FFIC1 is 1.18:1.

[0076] In this embodiment, the initial design value of the first oxidant (F1) is set to 130Kol / h, and the maximum value is set to 400Kol / h. When the first oxidant (F1) enters the initial design value operation, the setting time is 10min, and the first oxidant control loop is adjusted to increase 14Kmol of the first oxidant until the first oxidant reaches 400Kol / h. The second oxidant is adjusted by the control signal sent by the oxidant ratio controller FFIC1.

[0077] In this embodiment, the molar ratio of the first reforming agent to the second reforming agent is controlled by the reforming agent ratio controller FFIC2 to be in the range of 0.11:1.

[0078] In this embodiment, the joint controller algorithm FFIC3 is set to control the molar ratio of the total amount of the first oxidant and the first reforming agent to the first oxidant to be in the range of 2.8:1.

[0079] In this embodiment, the initial flow rate of the air film gas flow is set to 90Kmol / h, the temperature of the air film insulation device is used as 6 out of 1, the temperature of the air film insulation device is set to 150°C, the air flow regulating loop is controlled, and the air film gas flow rate of 200Kmol / h is set as a high alarm value.

[0080] In this embodiment, the online analyzer ψH of the reactor outlet product gas 2 and the reactor outlet temperature (one of the two can be selected) to couple and regulate FFIC3 and FFIC2 for 10 min; ψH 2 Fluctuation range: ±3%; FFIC3 ratio adjustment range: -(±0.1), i.e. ψH 2 The fluctuation range decreased by 3% and the FFIC3 ratio adjustment increased by 0.1.

[0081] In this embodiment, the reactor outlet temperature is set to 350°C, the outlet temperature fluctuates by ±20°C, the FFIC3 ratio is adjusted by ±0.1, and the outlet temperature has priority.

[0082] In this embodiment, the reactor temperature and the product gas are adjusted by the above-mentioned regulation, and the outlet temperature is (350±5)℃, ψH 2 (33±1)%, adjust the temperature of the air film insulation device to (150±5)℃, and stabilize the operating conditions of the reactor.

[0083] Example 3

[0084] The method for controlling the correlation among the oxidant, the reforming agent and the gas film gas in the carbonaceous material reforming reactor described in this embodiment is based on the attached Figure 1 The system is linked and regulated. The specific joint control process is as shown in the attached Figure 3 shown.

[0085] In this embodiment, the first oxidant is selected as oxygen, the second oxidant is selected as superheated steam, the first reforming agent is selected as high-pressure carbon dioxide, and the second reforming agent is selected as oxygen.

[0086] In this embodiment, the analysis of carbon-containing substances in the conversion and reforming reaction raw materials is the same as in Example 2.

[0087] In this embodiment, the main components of the product gas (dry gas) at the outlet of the conversion reforming reactor are shown in Table 3 below.

[0088] Table 3 Product gas composition (mol%)

[0089] composition <![CDATA[CO 2 ]]> CO <![CDATA[H 2 ]]> <![CDATA[CH 4 ]]> <![CDATA[O 2 ]]> composition% 16.12％ 43.43％ 28.37％ 11.98％ 0.01

[0090] In this embodiment, the distributed control system (DCS) is used to pre-set the logic control program F 2 =f(t)=F1*FFIC 1 , and then regulate the flow of oxidant, reformer and film gas.

[0091] In this embodiment, the molar ratio range of the first oxidant and the second oxidant using the oxidant ratio controller FFIC1 is 1.24:1.

[0092] In this embodiment, the initial design value of the first oxidant (F1) is set to 130Kol / h, and the maximum value is set to 400Kol / h. When the first oxidant (F1) enters the initial design value operation, the set value is that every 5 minutes, the first oxidant control loop is adjusted to increase 5Kmol of the first oxidant, which is set to 14Kmol until the first oxidant reaches 400Kol / h. The second oxidant is adjusted by the control signal sent by the oxidant ratio controller FFIC1.

[0093] In this embodiment, the molar ratio of the first reforming agent to the second reforming agent is controlled by the reforming agent ratio controller FFIC2 to be in the range of 0.05:1.

[0094] In this embodiment, the molar ratio range controlled by the joint controller algorithm FFIC3 is set to 2.32:1.

[0095] In this embodiment, the initial flow rate of the air film gas flow is set to 90Kmol / h, the temperature of the air film insulation device is used as 6 out of 1, the temperature of the air film insulation device is set to 150°C, the air flow regulating loop is controlled, and the air film gas flow rate of 200Kmol / h is set as a high alarm value.

[0096] In this embodiment, the online analyzer of the product gas at the reactor outlet ψCO 2 and reactor outlet temperature (one of the two can be used) to couple and regulate FFIC3 and FFIC2 for 10 min; ψCO 2 Fluctuation range: ±2%; FFIC3 ratio adjustment range: -(±0.1), i.e. ψH 2 The fluctuation range decreased by 2% and the FFIC3 ratio adjustment increased by 0.1.

[0097] In this embodiment, the reactor outlet temperature is set to 350°C, the outlet temperature fluctuates by ±20°C, the FFIC3 ratio is adjusted by ±0.1, and the outlet temperature has priority.

[0098] In this embodiment, the above-mentioned regulation is used to realize the joint control of the reactor temperature and the product gas, the outlet temperature is (350±5)℃, ψCO (16±1)%, and the temperature of the air film insulation device is adjusted to (150±5)℃ to stabilize the operating conditions of the reactor.

[0099] Example 4

[0100] The method for controlling the correlation among the oxidant, the reforming agent and the gas film gas in the carbonaceous material reforming reactor described in this embodiment is based on the attached Figure 1 The system is linked and regulated. The specific joint control process is as shown in the attached Figure 2 shown.

[0101] In this embodiment, the first oxidant is selected as oxygen, the second oxidant is selected as superheated water vapor, the first reforming agent is selected as superheated water vapor, and the second reforming agent is selected as oxygen.

[0102] In this embodiment, the analysis of carbon-containing substances in the conversion and reforming reaction raw materials is shown in Table 4 below.

[0103] Table 4 Carbon-containing material analysis results

[0104] project Mt St,ar Mad Aar Vdaf FCar Car Har unit ％ ％ ％ ％ ％ ％ ％ ％ Numeric 36 0.8 8.26 8.84 53.19 26.02 38.8 3.0 project Nar Oar Qgr,ar Qnet,ar DT ST HT FT unit ％ ％ MJ / kg MJ / kg ℃ ℃ ℃ ℃ Numeric 1.4 15.56 15.82 14.36 1190 1270 1295 1300

[0105] In this embodiment, the main components of the product gas (dry gas) at the outlet of the conversion reforming reactor are shown in Table 5 below.

[0106] Table 5 Product gas composition (mol%)

[0107] composition <![CDATA[CO 2 ]]> CO <![CDATA[H 2 ]]> <![CDATA[CH 4 ]]> <![CDATA[O 2 ]]> composition% 15.21 45.07 28.21 11.50 0.01

[0108] In this embodiment, the distributed control system (DCS) is used to pre-set the logic control program F 2 =f(t)=F1*FFIC 1 Then the flow rates of oxidant, reformer and film gas are regulated.

[0109] In this embodiment, the molar ratio range of the first oxidant and the second oxidant using the oxidant ratio controller FFIC1 is 1.18:1.

[0110] In this embodiment, the initial design value of the first oxidant (F1) is set to 130Kol / h, and the maximum value is set to 355Kol / h. When the first oxidant (F1) enters the initial design value operation, the setting time is 10min, and the first oxidant control loop is adjusted to increase 14Kmol of the first oxidant until the first oxidant reaches 355Kol / h. The second oxidant is adjusted by the control signal sent by the oxidant ratio controller FFIC1.

[0111] In this embodiment, the molar ratio of the first reforming agent to the second reforming agent is controlled by the reforming agent ratio controller FFIC2 to be in the range of 0.05:1.

[0112] In this embodiment, the joint controller algorithm FFIC3 is set to control the molar ratio of the total amount of the first oxidant and the first reforming agent to the first oxidant to be in the range of 1.5:1.

[0113] In this embodiment, the initial flow rate of the air film gas flow is set to 90Kmol / h, the temperature of the air film insulation device is used as 6 out of 1, the temperature of the air film insulation device is set to 150°C, the air flow regulating loop is controlled, and the air film gas flow rate of 100Kmol / h is set as a high alarm value.

[0114] In this embodiment, the online analyzer ψH of the reactor outlet product gas 2 and the reactor outlet temperature (one of the two can be selected) to couple and regulate FFIC3 and FFIC2 for 10 min; ψH 2 Fluctuation range: ±3%; FFIC3 ratio adjustment range: -(±0.1), i.e. ψH 2 The fluctuation range decreased by 3% and the FFIC3 ratio adjustment increased by 0.1.

[0115] In this embodiment, the reactor outlet temperature is set to 250°C, the outlet temperature fluctuates by ±20°C, the FFIC3 ratio is adjusted by ±0.1, and the outlet temperature has priority.

[0116] In this embodiment, the reactor temperature and the product gas are adjusted by the above-mentioned regulation, and the outlet temperature is (250±5)℃, ψH 2(28±1)%, adjust the temperature of the air film insulation device to (150±5)℃, and stabilize the operating conditions of the reactor.

[0117] In summary, the method for joint control of the oxidant, reforming agent and film gas in the reforming reactor described in the present invention adjusts the dosage and dosage ratio of the oxidant and reforming agent by associating the product gas components and temperature at the reactor outlet, fully utilizes the reaction heat, and realizes a certain degree of flexible adjustment of the reactor product gas components. At the same time, the film gas flow rate is regulated by associating the temperature of the film device, and the film agent forms a radial pressure gradient, so that a film thermal resistance is formed along the wall direction, thereby protecting the refractory material, extending the service life of the internal components of the reactor, and solving the problem of frequent burning of internal components in the prior art.

[0118] Obviously, the above embodiments are merely examples for the purpose of clear explanation, and are not intended to limit the implementation methods. For those skilled in the art, other different forms of changes or modifications can be made based on the above description. It is not necessary and impossible to list all the implementation methods here. The obvious changes or modifications derived therefrom are still within the scope of protection of the invention.

Claims

1. A joint control system for oxidant, reforming agent and film gas in a reforming reactor, characterized in that: The system comprises: A product gas component monitor, used for online detection of at least CO2, CO, H2, CH4, and O2 contained in the product gas components of the reforming reactor; Oxidant ratio controller, used to adjust the ratio and amount of oxidant in real time; Reformer ratio controller, used to adjust the ratio and dosage of reformer in real time; A joint control controller, used for joint control of the oxidant ratio controller and the reforming agent ratio controller, to adjust the ratio of the oxidant to the reforming agent; Air film gas controller, used to adjust the amount of air film gas in real time; A reactor outlet temperature control element, used for online monitoring of the temperature at the outlet of the reforming reactor; Air film insulation device temperature control element, used for online monitoring of the temperature of air molded bricks; and, Control loop.

2. The joint control system of the oxidant, reforming agent and film gas in the reforming reactor according to claim 1, characterized in that: The system further comprises a first oxidant controller and a second oxidant controller respectively connected to the oxidant ratio controller; wherein, The second oxidant is an independent variable, the first oxidant is a dependent variable, and the first oxidant is adjusted according to a set ratio with the second oxidant; Preferably, the oxidant ratio controller regulates the oxidant through a pre-set algorithm of a distributed control system (DCS).

3. The joint control system of the oxidant, reforming agent and film gas in the reforming reactor according to claim 1 or 2, characterized in that: The system further comprises a first reforming agent controller and a second reforming agent controller respectively connected to the reforming agent ratio controller; wherein, The first reforming agent is an independent variable, the second reforming agent is a dependent variable, and the second reforming agent is adjusted according to a set ratio with the first reforming agent; Preferably, the reforming agent ratio controller regulates the reforming agent through a pre-set algorithm of a distributed control system (DCS).

4. A method for joint control of oxidant, reforming agent and film gas in a reforming reactor, characterized in that: A method for jointly controlling the oxidant, reforming agent and gas film gas in the reforming reactor by using the system according to any one of claims 1 to 3; Specifically, the method includes the following steps of joint control: (1) a step of regulating the ratio of the oxidant; (2) a step of regulating the ratio of the reforming agent; (3) a step of regulating the air flow rate of the air film; (4) A step for regulating the reactor outlet temperature.

5. The method for joint control of oxidant, reforming agent and film gas in a reforming reactor according to claim 4, characterized in that: In the step (1), the oxidant ratio controller performs oxidant ratio adjustment, using a distributed control system (DCS) pre-set algorithm of R1=F1:F2, with a ratio control range of 0.8-1.6 molar ratio, and a preferred ratio of 1.

18.

6. The method for joint control of oxidant, reforming agent and film gas in a reforming reactor according to claim 4 or 5, characterized in that: In the step (2), the reforming agent ratio controller performs reforming agent ratio adjustment, using the distributed control system (DCS) pre-set algorithm as R2=F4:F3, the ratio control range is the molar ratio of 0.05-0.15, and the preferred ratio is 0.

11.

7. The method for joint control of oxidant, reforming agent and film gas in a reforming reactor according to any one of claims 4 to 6, characterized in that: In the steps (1) and (2), the joint control controller performs the ratio adjustment of the oxidant and the reforming agent, with the oxidant as the independent variable and the reforming agent as the dependent variable, and the reforming agent is set to adjust according to the set ratio as the oxidant changes. The preset algorithm of the control distributed control system (DCS) is R3=(F1+F3):F1, and the ratio control range is the molar ratio of 0.8-3.2, and preferably 2.

8.

8. The method for joint control of oxidant, reforming agent and film gas in a reforming reactor according to any one of claims 4 to 7, characterized in that: In the step (3), the air film gas flow rate is adjusted to 20-200 Kmol / h, and the temperature of the air film insulation device is controlled to be less than 250° C. and maintained above the dew point temperature.

9. The method for joint control of oxidant, reforming agent and film gas in a reforming reactor according to any one of claims 4 to 8, characterized in that: In the step (4), the reactor outlet temperature is controlled to be ≤350° C. by coupling the control joint controller and the reforming agent ratio controller through the product gas component monitor and the reactor outlet temperature control element; Preferably, the adjustable range (mol%) of the product gas is: CO2: 6.5%-22%, CO: 33%-56%, H2: 25%-37%, CH4: 6.5%-13%.

10. The method for joint control of oxidant, reforming agent and film gas in a reforming reactor according to any one of claims 4 to 9, characterized in that: The method also includes the step of determining whether to adjust the ratio within a certain range based on a group of components, such as H2, CO2, CH4 or water vapor in the outlet product gas, after calculating through a built-in algorithm and judging the trend over a certain period of time t; Preferably, the time t is a function of the oxidant input amount, the distributed control system (DCS) pre-sets an algorithm, F2=f(t), the set time is 5-15min, and the oxidant controller controls the input amount of the second oxidant to adjust 5Kmol-20Kmol until the oxidant reaches the pre-designed normal operating amount; Preferably, the certain time t is controlled to be 5-15 minutes, and a relatively stable trend is maintained during the time, that is, the fluctuation range is 3-8%, then an adjustment signal is sent to the joint control controller, and the control ratio adjustment range is 0.05-0.2.

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