Reaction device for cleaning surface of silicon carbide ring

Abstract

The invention discloses a reaction device for cleaning the surface of a silicon carbide ring, and relates to the technical field of polycrystalline silicon production. Comprising a reaction assembly, the reaction assembly comprises a tank body and further comprises a lifting assembly, the lifting assembly comprises an annular block and a mounting plate, the annular block is rotatably arranged in the tank body, an annular gear is fixed below the annular block, the mounting plate is fixed in the tank body, and a plurality of threaded rods are rotatably arranged between the mounting plate and the bottom of the tank body; driven gears are fixed to the ends of the multiple threaded rods, a lifting motor is fixed to the bottom of the tank body, an output shaft of the lifting motor is connected with the threaded rods through couplings, a lifting circular plate is connected to the multiple threaded rods in a threaded mode, a placing assembly is arranged on the lifting circular plate, a circulating assembly is arranged in the tank body, and a plurality of rotating assemblies are arranged above the tank body; the contact area with the circular ring plate can be reduced, meanwhile, the rubber block can drive the silicon carbide ring to rotate, the contact part is prevented from being blocked, and the cleaning efficiency of the silicon carbide ring is improved.

Description

Technical Field

[0001] The invention relates to the technical field of polysilicon production, in particular to a reaction device for cleaning the surface of a silicon carbide ring. Background Art

[0002] Silicon carbide ring is a high-performance sealing element, mainly made of silicon carbide material. With the continuous development of industrial technology, silicon carbide rings are used more and more widely in various fields, especially in the chemical, petroleum, machinery and electronics industries. Silicon carbide rings have gradually replaced traditional sealing materials with their outstanding performance advantages.

[0003] Silicon carbide rings are used on reduction furnace electrodes. During the production process, materials are adsorbed on the ring surface. To ensure the reusable assembly dimensions, the silicon carbide needs to be cleaned after each use.

[0004] A reaction device for cleaning the surface of a silicon carbide ring, with application publication number CN118162077A, comprises a mixing component for mixing a reaction liquid; a reaction component including an ultrasonic vibrator and a support frame, the support frame being used to fix the silicon carbide ring; a transmission component simultaneously connected to the mixing component and the reaction component and connected to a waste treatment device; a recovery component connected to the reaction component for recovering gas generated by the reaction; and a controller electrically connected to the mixing component, the reaction component, the transmission component, and the recovery component.

[0005] In modern industrial production, the cleaning of silicon carbide rings usually needs to match the entire production line. Therefore, the cleaning process is mostly batch cleaning. During the cleaning process, the silicon carbide rings need to be placed in special cleaning baskets or partitioned trays. These carrying devices are usually provided with slots suitable for the shape and size of the silicon carbide rings, which can ensure that the silicon carbide rings do not collide or roll with each other during the cleaning process to avoid friction and damage between them. However, these carrying devices need to support or limit the silicon carbide rings, so they will contact the surface of the silicon carbide rings, thereby resisting the contact parts and affecting the cleaning efficiency of the silicon carbide rings. Summary of the Invention

[0006] The object of the present invention is to provide a reaction device for cleaning the surface of a silicon carbide ring to solve the problems raised in the above background technology.

[0007] To achieve the above-mentioned purpose, the present invention provides the following technical solutions: a reaction device for cleaning the surface of a silicon carbide ring, comprising a reaction component, the reaction component comprising a tank body, and a lifting component, the lifting component comprising an annular block, an L-shaped plate and a mounting plate, the annular block is rotatably arranged inside the tank body, a ring gear is fixed below the annular block, the mounting plate is fixed inside the tank body, a plurality of threaded rods are rotatably arranged between the mounting plate and the bottom of the tank body, the ends of the plurality of threaded rods extend through the tank body, the ends of the plurality of threaded rods are all fixed with driven gears, the driven gears are meshed with the annular gear, the L-shaped plate is fixed to the bottom of the tank body, a lifting motor is fixed on the L-shaped plate, the output shaft of the lifting motor is connected to one of the threaded rods through a coupling, a lifting circular plate is threadedly connected to the plurality of threaded rods, a plurality of limit rods are fixed on the lifting circular plate, a placement component is provided on the lifting circular plate, a circulation component is provided inside the tank body, and a plurality of rotating components are provided above the tank body.

[0008] The interior of the tank body is provided with a funnel and a filter screen in sequence from top to bottom, a connecting pipe is provided at the bottom of the funnel, the connecting pipe extends through the interior of the filter screen, a plurality of legs are fixed at the bottom of the tank body, a fixing plate is fixed below the plurality of legs, a cover plate is provided above the tank body, a plurality of rotating covers are provided above the cover plate, an exhaust pipe is provided on the side of the tank body, and a control valve 1 is provided on the exhaust pipe.

[0009] The lifting assembly further comprises a liquid discharge pipe, on which a second control valve is provided.

[0010] The rotating assembly includes a rotating motor and a rotating shaft. The rotating shaft is rotatably arranged on the cover plate. Several fixed blocks are fixed on the rotating shaft. Several rubber blocks are rotatably arranged on the fixed blocks. The rotating motor is fixed above the cover plate. The output shaft of the rotating motor is connected to the rotating shaft through a coupling.

[0011] The circulation component includes a spray arc plate and a submersible pump. The spray arc plate is fixed inside the tank body, and the submersible pump is fixed above the filter. The water outlet of the submersible pump is connected to a liquid infusion pipe, and the end of the liquid infusion pipe is connected to the spray arc plate.

[0012] The placement component includes a circular plate, a plurality of limiting holes are opened on the circular plate, a plurality of support rods are fixed above the circular plate, a plurality of second ball bearings are arranged on the circular plate, and a first ball bearing is arranged on the support rod.

[0013] Compared with the prior art, the present invention has the following beneficial effects:

[0014] A reaction device for cleaning the surface of a silicon carbide ring. The device cooperates with a circular ring plate, a limiting rod, a first ball, a second ball, a fixed block and a rubber block. The first ball and the second ball can limit the silicon carbide ring during the cleaning process, reducing the contact area with the circular ring plate. At the same time, the rubber block can drive the silicon carbide ring to rotate, avoiding resistance to the contact part, thereby improving the cleaning efficiency of the silicon carbide ring.

[0015] By cooperating with the threaded rod, lifting circular plate, limiting rod and rotating cover, the lifting circular plate and limiting rod can be driven to rise to the rotating cover, thereby facilitating the placement of the silicon carbide ring and placement assembly on the lifting circular plate, facilitating loading and unloading.

[0016] By cooperating with a submersible pump, a liquid infusion pipe and a spray arc plate, the reaction liquid inside the tank can be driven to circulate, so that the concentration of the reaction liquid in each part tends to be the same. At the same time, the reaction liquid is transported from the side to the side of the silicon carbide ring. The flowing reaction liquid can come into contact with the silicon carbide ring more frequently, thereby accelerating the reaction speed. BRIEF DESCRIPTION OF THE DRAWINGS

[0017] Figure 1 It is a schematic diagram of the upper three-dimensional structure of the present invention;

[0018] Figure 2 It is a schematic diagram of the bottom three-dimensional structure of the present invention;

[0019] Figure 3 Schematic diagram of the internal structure of the present invention;

[0020] Figure 4 It is a front view structural schematic diagram of the present invention;

[0021] Figure 5 for Figure 3 Schematic diagram of the enlarged structure at point A in the middle.

[0022] In the figure: 1. Rotating assembly; 101. Rotating motor; 102. Rotating shaft; 103. Fixed block; 104. Rubber block; 2. Reaction assembly; 201. Rotating cover; 202. Fixed plate; 203. Support legs; 204. Tank; 205. Cover plate; 206. Filter screen; 207. Funnel; 208. Control valve 1; 209. Exhaust pipe; 210. Connecting pipe; 3. Lifting assembly; 301. Driven gear; 302. Ring block; 30 3. Control valve 2; 304. Drain pipe; 305. Lifting motor; 306. L-shaped plate; 307. Ring gear; 308. Threaded rod; 309. Lifting circular plate; 310. Limit rod; 311. Mounting plate; 4. Circulation assembly; 401. Spray arc plate; 402. Infusion pipe; 403. Submersible pump; 5. Placement assembly; 501. Limit hole; 502. Ball 1; 503. Support rod; 504. Ring plate; 505. Ball 2. DETAILED DESCRIPTION

[0023] The following will clearly and completely describe the technical solutions in the embodiments of the present invention in conjunction with the accompanying drawings. Obviously, the described embodiments are only part of the embodiments of the present invention, not all of the embodiments. Based on the embodiments of the present invention, all other embodiments obtained by ordinary technicians in this field without making creative efforts are within the scope of protection of the present invention.

[0024] like Figure 1-Figure 5 As shown, the present invention provides a technical solution: a reaction device for cleaning the surface of a silicon carbide ring, comprising a reaction assembly 2, the reaction assembly 2 comprising a tank body 204, and further comprising a lifting assembly 3, the lifting assembly 3 comprising an annular block 302, an L-shaped plate 306 and a mounting plate 311, the annular block 302 being rotatably arranged inside the tank body 204, a ring gear 307 being fixed below the annular block 302, the mounting plate 311 being fixed inside the tank body 204, a plurality of threaded rods 308 being rotatably arranged between the mounting plate 311 and the bottom of the tank body 204, the ends of the plurality of threaded rods 308 extending through the tank body 204, and the plurality of threaded rods 308 extending through the tank body 204. The ends of the threaded rods 308 are fixed with driven gears 301, which are engaged with the ring gear 307. The L-shaped plate 306 is fixed to the bottom of the tank body 204. The lifting motor 305 is fixed on the L-shaped plate 306. The output shaft of the lifting motor 305 is connected to one of the threaded rods 308 through a coupling. Several threaded rods 308 are threadedly connected with lifting circular plates 309, and several limiting rods 310 are fixed on the lifting circular plates 309. A placement component 5 is provided on the lifting circular plate 309. A circulation component 4 is provided inside the tank body 204, and several rotating components 1 are provided above the tank body 204.

[0025] It should be noted that the lifting motor 305 drives one of the threaded rods 308 to rotate through the output shaft, the threaded rod 308 drives the driven gear 301 to rotate, the driven gear 301 drives the ring gear 307 to rotate, and the ring gear 307 drives other driven gears 301 to rotate, thereby driving several threaded rods 308 to rotate synchronously, and several threaded rods 308 drive the lifting circular plate 309 to rise, and several limit rods 310 are fixed on the lifting circular plate 309 to rise.

[0026] A funnel 207 and a filter screen 206 are sequentially arranged inside the tank body 204 from top to bottom. A connecting pipe 210 is provided at the bottom of the funnel 207, and the connecting pipe 210 extends into the interior of the filter screen 206. A plurality of legs 203 are fixed below the tank body 204, and a fixing plate 202 is fixed below the plurality of legs 203. A cover plate 205 is provided above the tank body 204, and a plurality of rotating covers 201 are provided above the cover plate 205. An exhaust pipe 209 is provided on the side of the tank body 204, and a control valve 208 is provided on the exhaust pipe 209.

[0027] It should be noted that the interior of the tank body 204 is provided with a reaction liquid and an ultrasonic cleaner. The reaction liquid and the ultrasonic cleaner cooperate to enable the reaction liquid to fully react with the impurities on the surface of the silicon carbide ring. The rotating cover 201 can be rotated open, and several rotating covers 201 are located on the placement components 5 at corresponding positions, which is convenient for placing the placement components 5 above the lifting circular plate 309. The exhaust pipe 209 and the control valve 208 cooperate to discharge the gas generated by the reaction. The precipitate and impurities generated by the reaction fall into the interior of the connecting pipe 210 through the funnel 207, and the connecting pipe 210 transports the precipitate and impurities to the bottom of the tank body 204.

[0028] The lifting assembly 3 further includes a drain pipe 304 , on which a second control valve 303 is provided.

[0029] It should be noted that the drain pipe 304 is connected to a water pump, which can cooperate with the control valve 2 303 through the drain pipe 304 to extract the precipitate and impurities generated by the reaction from the bottom of the tank body 204.

[0030] The rotating assembly 1 includes a rotating motor 101 and a rotating shaft 102. The rotating shaft 102 is rotatably set on the cover plate 205. Several fixed blocks 103 are fixed on the rotating shaft 102. Several rubber blocks 104 are rotatably set on the fixed blocks 103. The rotating motor 101 is fixed above the cover plate 205. The output shaft of the rotating motor 101 is connected to the rotating shaft 102 through a coupling.

[0031] It should be noted that the rubber block 104 is made of fluororubber. The rotating motor 101 drives the rotating shaft 102 to rotate through the output shaft. The rotating shaft 102 drives the fixed blocks 103 to rotate. The fixed blocks 103 drive the rubber blocks 104 to rotate. The rubber blocks 104 intermittently squeeze the side of the silicon carbide ring, thereby driving the silicon carbide ring to rotate on the ball 1 505 and the ball 2 502 to avoid blocking the contact parts.

[0032] The circulation assembly 4 includes a spray arc plate 401 and a submersible pump 403. The spray arc plate 401 is fixed inside the tank 204, and the submersible pump 403 is fixed above the filter 206. The water outlet of the submersible pump 403 is connected to a liquid infusion pipe 402, and the end of the liquid infusion pipe 402 is connected to the spray arc plate 401.

[0033] It should be noted that the submersible pump 403 pumps the reaction liquid at the bottom of the tank body 204 to the infusion pipe 402, the infusion pipe 402 transports the reaction liquid to the spray arc plate 401, and the spray arc plate 401 transports the reaction liquid to the sides of several silicon carbide rings, driving the reaction liquid inside the tank body 204 to circulate, so that the concentration of the reaction liquid in each part tends to be the same. At the same time, the flowing reaction liquid can come into contact with the silicon carbide rings more frequently, thereby accelerating the reaction speed.

[0034] The placement component 5 includes a circular plate 504, which has a plurality of limiting holes 501 formed thereon. A plurality of support rods 503 are fixed above the circular plate 504. A plurality of second balls 502 are provided on the circular plate 504, and a first ball 505 is provided on the support rods 503. A plurality of limiting grooves are provided at the bottom of the circular plate 504.

[0035] It should be noted that ball one 505 and several ball twos 502 can rotate, thereby facilitating the rotation of the silicon carbide ring. Several limit grooves can facilitate the stacking of multiple circular plates 504, and several support rods 503 below can be easily inserted into the limit grooves at the corresponding positions.

[0036] Working principle:

[0037] The rotating covers 201 are opened, and the lifting motor 305 drives one of the threaded rods 308 to rotate via the output shaft. The threaded rod 308 drives the driven gear 301 to rotate, and the driven gear 301 drives the ring gear 307 to rotate. The ring gear 307 drives the other driven gears 301 to rotate, thereby driving the threaded rods 308 to rotate synchronously. The threaded rods 308 drive the lifting circular plate 309 to rise. The limiting rods 310 fixed to the lifting circular plate 309 rise and move the limiting rods 310 to the rotating covers 201.

[0038] The silicon carbide ring to be cleaned is placed on top of the circular plate 504, and the ball 1 505 and the plurality of ball 2 502 support and limit the silicon carbide ring to reduce the contact area with the silicon carbide ring. The circular plate 504 is placed on the lifting circular plate 309, and the plurality of limiting rods 310 are inserted into the limiting holes 501 at the corresponding positions to limit and fix the circular plate 504 at the bottom. Then, the second circular plate 504 is placed on top of the plurality of supporting rods 503, so that the plurality of limiting grooves of the second circular plate 504 are sleeved on the supporting rods 503 of the first circular plate 504. After the placement is completed, the lifting motor 305 rotates in the opposite direction, and the lifting motor 305 drives the lifting circular plate 309 to descend. The lifting circular plate 309 drives the silicon carbide ring and the circular plate 504 to descend to the interior of the tank body 204, and the plurality of rotating covers 201 are closed.

[0039] The ultrasonic cleaner and the reaction liquid cooperate to react with the surface of the silicon carbide ring, thereby removing impurities on the surface. The rotating motor 101 drives the rotating shaft 102 to rotate via the output shaft. The rotating shaft 102 drives the plurality of fixed blocks 103 to rotate. The plurality of fixed blocks 103 drive the plurality of rubber blocks 104 to rotate. The plurality of rubber blocks 104 intermittently squeeze the side of the silicon carbide ring, thereby driving the silicon carbide ring to rotate on the ball 1 505 and the plurality of ball 2 502, avoiding resistance contact parts.

[0040] The submersible pump 403 pumps the reaction liquid at the bottom of the tank body 204 to the liquid delivery pipe 402, and the liquid delivery pipe 402 delivers the reaction liquid to the spray arc plate 401. The spray arc plate 401 delivers the reaction liquid to the sides of several silicon carbide rings, driving the reaction liquid inside the tank body 204 to circulate, so that the concentration of the reaction liquid in each part tends to be the same. At the same time, the flowing reaction liquid can come into contact with the silicon carbide rings more frequently, accelerating the reaction speed and improving the cleaning efficiency of the silicon carbide rings.

[0041] Although embodiments of the present invention have been shown and described, it will be understood by those skilled in the art that various changes, modifications, substitutions and variations may be made to these embodiments without departing from the principles and spirit of the invention, and that the scope of the invention is limited by the accompanying embodiments and their equivalents.

Claims

1. A reaction device for cleaning the surface of a silicon carbide ring, comprising a reaction assembly (2), the reaction assembly (2) comprising a tank (204), characterized in that: The lifting assembly (3) further comprises an annular block (302), an L-shaped plate (306) and a mounting plate (311). The annular block (302) is rotatably arranged inside the tank body (204). A ring gear (307) is fixed below the annular block (302). The mounting plate (311) is fixed inside the tank body (204). A plurality of threaded rods (308) are rotatably arranged between the mounting plate (311) and the bottom of the tank body (204). The ends of the plurality of threaded rods (308) extend through the tank body (204). The ends of the plurality of threaded rods (308) are all fixed with driven gears (301). The driven gears ( 301) is meshed with a ring gear (307), an L-shaped plate (306) is fixed to the bottom of the tank body (204), a lifting motor (305) is fixed on the L-shaped plate (306), an output shaft of the lifting motor (305) is connected to one of the threaded rods (308) through a coupling, a lifting circular plate (309) is threadedly connected to the plurality of threaded rods (308), a plurality of limiting rods (310) are fixed to the lifting circular plate (309), a placement component (5) is provided on the lifting circular plate (309), a circulation component (4) is provided inside the tank body (204), and a plurality of rotating components (1) are provided above the tank body (204).

2. The reaction device for cleaning the surface of a silicon carbide ring according to claim 1, characterized in that: The interior of the tank body (204) is provided with a funnel (207) and a filter screen (206) in sequence from top to bottom. A connecting pipe (210) is provided at the bottom of the funnel (207), and the connecting pipe (210) penetrates and extends into the interior of the filter screen (206). A plurality of legs (203) are fixed below the tank body (204), and a fixing plate (202) is fixed below the plurality of legs (203). A cover plate (205) is provided above the tank body (204), and a plurality of rotating covers (201) are provided above the cover plate (205). An exhaust pipe (209) is provided on the side of the tank body (204), and a control valve (208) is provided on the exhaust pipe (209).

3. The reaction device for cleaning the surface of a silicon carbide ring according to claim 1, characterized in that: The lifting assembly (3) further comprises a liquid discharge pipe (304), and a second control valve (303) is provided on the liquid discharge pipe (304).

4. The reaction device for cleaning the surface of a silicon carbide ring according to claim 1, characterized in that: The rotating assembly (1) comprises a rotating motor (101) and a rotating shaft (102); the rotating shaft (102) is rotatably arranged on a cover plate (205); a plurality of fixed blocks (103) are fixed on the rotating shaft (102); a plurality of rubber blocks (104) are rotatably arranged on the fixed blocks (103); the rotating motor (101) is fixed above the cover plate (205); and the output shaft of the rotating motor (101) is connected to the rotating shaft (102) via a coupling.

5. The reaction device for cleaning the surface of a silicon carbide ring according to claim 1, characterized in that: The circulation assembly (4) comprises a spray arc plate (401) and a submersible pump (403), wherein the spray arc plate (401) is fixed inside the tank body (204), and the submersible pump (403) is fixed above the filter screen (206). The water outlet of the submersible pump (403) is connected to a liquid infusion pipe (402), and the end of the liquid infusion pipe (402) is connected to the spray arc plate (401).

6. The reaction device for cleaning the surface of a silicon carbide ring according to claim 1, characterized in that: The placement assembly (5) includes a circular plate (504), a plurality of limiting holes (501) are opened on the circular plate (504), a plurality of support rods (503) are fixed above the circular plate (504), a plurality of second ball bearings (502) are arranged on the circular plate (504), and a first ball bearing (505) is arranged on the support rod (503).

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