Lanthanum gallium silicon thin film material substrate and preparation method thereof

Abstract

The invention relates to the technical field of thin film materials, and discloses a lanthanum gallium silicon thin film material substrate and a preparation method thereof.The preparation method comprises the steps that styrene modified benzoxazine, styrene, a gallium silicon liquid gold compound and lanthanum are added into a double-screw extruder, melt extrusion is conducted, the mixture is added into a model machine, cooling is conducted, and the lanthanum gallium silicon thin film material substrate is obtained; according to the present invention, the rigid benzoxazine structure is introduced into the polyethylene to increase the rigidity of the polyethylene, and is subjected to blending modification with the gallium-silicon liquid gold compound and the lanthanum to improve the mechanical property of the polyethylene, and the benzoxazine can form the heat-resistant phenolic resin structure at the high temperature so as to provide the high thermal decomposition temperature and the high temperature resistance of the lanthanum gallium-silicon film material substrate;

Description

Technical Field

[0001] This invention relates to the field of lanthanum thin film materials technology, specifically to a gallium lanthanide silicon thin film material substrate and its preparation method. Background Technology

[0002] Gallium lanthanide silicon alloys have good hardness and are widely used in thin film materials, aerospace, and industrial fields. However, thin film material substrates have poor mechanical properties and flame retardant properties. Improving their performance is the key to solving the problem. For example, patent CN108102072B, "A castor oil modified benzoxazine resin and its preparation method", discloses the reaction of diisocyanate, castor oil and dihydroxymethylbenzoxazine monomer to form castor oil-based polyurethane benzoxazine prepolymer, which is then crosslinked and cured. The resulting modified benzoxazine polyurethane resin has good compatibility, flexibility and excellent dielectric properties. Summary of the Invention

[0003] (a) Technical problems to be solved To address the shortcomings of existing technologies, this invention provides a gallium lanthanide silicon thin film material substrate and its preparation method, which exhibits good heat resistance and mechanical properties.

[0004] (II) Technical Solution To achieve the above objectives, the present invention provides the following technical solution: a gallium lanthanide silicon thin film material substrate, wherein the gallium lanthanide silicon thin film material substrate comprises the following weight components: 50-100 parts by weight of styrene-modified benzoxazine, 80-100 parts by weight of styrene, 50-100 parts by weight of gallium silicon liquid gold compound, and 80-120 parts by weight of lanthanum.

[0005] Preferably, the preparation method of the styrene-modified benzoxazine includes the following steps: (1) Add p-nitroaniline, pentaerythritol methylsilicate modified phenol, and an aqueous solution of formaldehyde to toluene solvent to carry out a cyclization reaction. After the reaction, distill under reduced pressure and wash with distilled water and methanol in sequence. The crude product is recrystallized with dichloromethane to obtain silanoxazine. (2) Add silane-containing benzoxazine to 1,4-dioxane solvent, stir evenly, then add iron powder and acetic acid aqueous solution, heat to 70-100℃, and react the reaction system under reflux for 6-12h. After the reaction, add 0.1-0.5mol / L sodium hydroxide dropwise for neutralization, concentrate under reduced pressure to remove solvent, filter, wash the filter cake with distilled water and methanol in sequence, and recrystallize the crude product with dichloromethane to obtain amino-modified benzoxazine; (3) Add polyethylene resin to toluene, then add an aqueous solution containing OP-10, stir evenly, add acrylic acid and benzoyl peroxide, purge with nitrogen, react at 60-80℃ for 3-6h, concentrate under reduced pressure after reaction, wash with ethanol to obtain carboxylated polyethylene. (4) Add amino-modified benzoxazine and carboxylated polyethylene to N,N-dimethylformamide, stir to dissolve, and then add 2-(7-azabenzotriazole)-N,N,N',N'-tetramethylurea hexafluorophosphate and N,N-diisopropylethylamine dropwise. React at 20-40℃ for 12-24h. After the reaction, add distilled water and ethyl acetate, extract and separate the organic layer, add anhydrous sodium sulfate to dry, filter and distill the filtrate under reduced pressure. Recrystallize the crude product with ethanol and dry to obtain styrene-modified benzoxazine.

[0006] Preferably, the mass ratio of p-nitroaniline, pentaerythritol methylsilicate modified phenol, and formaldehyde in (1) is 1:1.2-1.4:2.2-2.5.

[0007] Preferably, the preparation method of the methylpene silicate-modified phenol in (1) is as follows: add methylpene silicate, hexamethylene diisocyanate and hydroquinone to N,N-dimethylformamide solvent and add to the reactor, stir evenly, react at 90-120℃ for 5-10h, after which vacuum distillation, filter and dry to obtain methylpene silicate-modified phenol.

[0008] Preferably, the mass ratio of pentaerythritol methyl silicate, hexamethylene diisocyanate, and hydroquinone is 1.1-1.3:1:1.2-1.5.

[0009] Preferably, (2) contains silanoxazine, iron powder, and acetic acid in a ratio of 1.1-1.3:1:2.1-2.4.

[0010] Preferably, the mass ratio of polyethylene resin, OP-10, acrylic acid and benzoyl peroxide in (3) is 1:0.3-0.5:1.1-1.3:0.05-0.06.

[0011] Preferably, the mass ratio of aminobenzoxazine, carboxylated polyethylene, 2-(7-azabenzotriazole)-N,N,N',N'-tetramethylurea hexafluorophosphate and N,N-diisopropylethylamine in (4) is 1.2-1.5:1:0.02-0.04:0.01-0.03.

[0012] Preferably, the preparation method of the gallium lanthanide silicon thin film material substrate includes the following steps: adding styrene-modified benzoxazine, styrene, gallium silicon liquid gold compound, and lanthanum into a twin-screw extruder, melting and extruding at 150-160°C, adding to a molding machine, cooling, and obtaining the gallium lanthanide silicon thin film material substrate.

[0013] (iii) Beneficial technical effects This invention involves adding styrene-modified benzoxazine, styrene, gallium silicon liquid gold compound, and lanthanum into a twin-screw extruder, melting and extruding the mixture, then feeding it into a molding machine and cooling it to obtain a gallium silicon lanthanide thin film material substrate.

[0014] Cyclization reaction of p-nitroaniline, pentaerythritol methylsilicate-modified phenol, and formaldehyde aqueous solution yields silane-containing benzoxazine; reaction of silane-containing benzoxazine, iron powder, and acetic acid aqueous solution, followed by neutralization with sodium hydroxide, yields aminated benzoxazine; reaction of polyethylene resin with acrylic acid yields carboxylated polyethylene; reaction of aminated benzoxazine and carboxylated polyethylene in the presence of 2-(7-azabenzotriazole)-N,N,N',N'-tetramethylurea hexafluorophosphate and N,N-diisopropylethylamine yields styrene-modified benzoxazine.

[0015] Introducing a rigid benzoxazine structure into polyethylene increases its rigidity, and blending it with gallium silicon liquid gold compounds and lanthanum improves its mechanical properties. Furthermore, benzoxazine forms a heat-resistant phenolic resin structure at high temperatures, enabling the lanthanide gallium silicon thin film material substrate to exhibit higher thermal decomposition temperature and high-temperature resistance. Detailed Implementation Example

[0016] (1) The preparation method of pentaerythritol methyl silicate modified phenol is as follows: pentaerythritol methyl silicate, hexamethylene diisocyanate and hydroquinone are added to N,N-dimethylformamide solvent and added to the reactor, wherein the mass ratio of pentaerythritol methyl silicate, hexamethylene diisocyanate and hydroquinone is 1.1:1:1.2. After stirring evenly, the reaction is carried out at 90℃ for 5h. After the reaction is completed, the mixture is distilled under reduced pressure, filtered and dried to obtain pentaerythritol methyl silicate modified phenol; (2) Add an aqueous solution of p-nitroaniline, pentaerythritol methyl silicate modified phenol, and formaldehyde to toluene solvent, wherein the mass ratio of p-nitroaniline, pentaerythritol methyl silicate modified phenol, and formaldehyde is 1:1.2:2.2, to carry out a cyclization reaction. After the reaction, distill under reduced pressure and wash with distilled water and methanol in sequence. The crude product is recrystallized with dichloromethane to obtain silanoxazine. (3) Add silanized benzoxazine to 1,4-dioxane solvent, stir evenly, then add iron powder and acetic acid aqueous solution, wherein the ratio of silanized benzoxazine, iron powder and acetic acid is 1.1:1:2.1, heat to 70℃, and react the reaction system under reflux for 6 hours. After the reaction, add 0.1 mol / L sodium hydroxide dropwise for neutralization, concentrate under reduced pressure to remove solvent, filter, wash the filter cake with distilled water and methanol in sequence, and recrystallize the crude product with dichloromethane to obtain amino-modified benzoxazine; (4) Polyethylene resin was added to toluene, and then an aqueous solution containing OP-10 was added. After stirring evenly, acrylic acid and benzoyl peroxide were added. The mass ratio of polyethylene resin, OP-10, acrylic acid and benzoyl peroxide was 1:0.3:1.1:0.05. Nitrogen gas was introduced and the reaction was carried out at 60°C for 3 hours. After the reaction, the mixture was concentrated under reduced pressure and washed with ethanol to obtain carboxylated polyethylene. (5) Add aminobenzoxazine and carboxylated polyethylene to N,N-dimethylformamide, stir to dissolve, and then add 2-(7-azabenzotriazole)-N,N,N',N'-tetramethylurea hexafluorophosphate and N,N-diisopropylethylamine dropwise. The mass ratio of aminobenzoxazine, carboxylated polyethylene, 2-(7-azabenzotriazole)-N,N,N',N'-tetramethylurea hexafluorophosphate and N,N-diisopropylethylamine is 1.2:1:0.02:0.01. React at 20°C for 12 h. After the reaction, add distilled water and ethyl acetate, extract and separate the organic layer, add anhydrous sodium sulfate to dry, filter and distill the filtrate under reduced pressure. Recrystallize the crude product with ethanol and dry to obtain styrene-modified benzoxazine. (6) 50 parts by weight of styrene-modified benzoxazine, 80 parts by weight of styrene, 50 parts by weight of gallium silicon liquid gold compound, and 80 parts by weight of lanthanum were added to a twin-screw extruder, melt-extruded at 150°C, added to a molding machine, and cooled to obtain a gallium silicon lanthanide thin film material substrate. Example

[0017] (1) The preparation method of methylpene silicate modified phenol is as follows: methylpene silicate, hexamethylene diisocyanate, and hydroquinone are added to N,N-dimethylformamide solvent and then added to a reactor, wherein the mass ratio of methylpene silicate, hexamethylene diisocyanate, and hydroquinone is 1.3:1:1.5. The mixture is stirred evenly and reacted at 120℃ for 10 h. After the reaction is completed, the mixture is distilled under reduced pressure, filtered, and dried to obtain methylpene silicate modified phenol. (2) Add an aqueous solution of p-nitroaniline, pentaerythritol methyl silicate modified phenol, and formaldehyde to toluene solvent, wherein the mass ratio of p-nitroaniline, pentaerythritol methyl silicate modified phenol, and formaldehyde is 1:1.4:2.5, to carry out a cyclization reaction. After the reaction, distill under reduced pressure and wash with distilled water and methanol in sequence. The crude product is recrystallized with dichloromethane to obtain silanoxazine. (3) Add silanized benzoxazine to 1,4-dioxane solvent, stir evenly, then add iron powder and acetic acid aqueous solution, wherein the ratio of silanized benzoxazine, iron powder and acetic acid is 1.3:1:2.4, heat to 100℃, and react the reaction system under reflux for 12h. After the reaction, add 0.5mol / L sodium hydroxide dropwise for neutralization, concentrate under reduced pressure to remove solvent, filter, wash the filter cake with distilled water and methanol in sequence, and recrystallize the crude product with dichloromethane to obtain amino-modified benzoxazine; (4) Polyethylene resin was added to toluene, and then an aqueous solution containing OP-10 was added. After stirring evenly, acrylic acid and benzoyl peroxide were added. The mass ratio of polyethylene resin, OP-10, acrylic acid and benzoyl peroxide was 1:0.5:1.3:0.06. Nitrogen gas was introduced and the reaction was carried out at 80°C for 6 hours. After the reaction, the mixture was concentrated under reduced pressure and washed with ethanol to obtain carboxylated polyethylene. (5) Add amino-modified benzoxazine and carboxylated polyethylene to N,N-dimethylformamide, stir to dissolve, and then add 2-(7-azabenzotriazole)-N,N,N',N'-tetramethylurea hexafluorophosphate and N,N-diisopropylethylamine dropwise. The mass ratio of amino-modified benzoxazine, carboxylated polyethylene, 2-(7-azabenzotriazole)-N,N,N',N'-tetramethylurea hexafluorophosphate and N,N-diisopropylethylamine is 1.5:1:0.04:0.03. React at 40℃ for 24 h. After the reaction, add distilled water and ethyl acetate, extract and separate the organic layer, add anhydrous sodium sulfate to dry, filter and distill the filtrate under reduced pressure. Recrystallize the crude product with ethanol and dry to obtain styrene-modified benzoxazine. (6) 100 parts by weight of styrene-modified benzoxazine, 100 parts by weight of styrene, 100 parts by weight of gallium silicon liquid gold compound and 120 parts by weight of lanthanum were added to a twin-screw extruder, melt-extruded at 160°C, added to a molding machine, cooled, and lanthanide gallium silicon thin film material substrate was obtained. Example

[0018] (1) The preparation method of methylpene silicate modified phenol is as follows: methylpene silicate, hexamethylene diisocyanate, and hydroquinone are added to N,N-dimethylformamide solvent and then added to a reactor, wherein the mass ratio of methylpene silicate, hexamethylene diisocyanate, and hydroquinone is 1.2:1:1.35. The mixture is stirred evenly and reacted at 105℃ for 7.5 h. After the reaction is completed, the mixture is distilled under reduced pressure, filtered, and dried to obtain methylpene silicate modified phenol. (2) Add an aqueous solution of p-nitroaniline, pentaerythritol methyl silicate modified phenol, and formaldehyde to toluene solvent, wherein the mass ratio of p-nitroaniline, pentaerythritol methyl silicate modified phenol, and formaldehyde is 1:1.3:2.35, to carry out a cyclization reaction. After the reaction, distill under reduced pressure and wash with distilled water and methanol in sequence. The crude product is recrystallized with dichloromethane to obtain silanoxazine. (3) Add silanized benzoxazine to 1,4-dioxane solvent, stir evenly, then add iron powder and acetic acid aqueous solution, wherein the ratio of silanized benzoxazine, iron powder and acetic acid is 1.2:1:2.25, heat to 85℃, and react the reaction system under reflux for 9 hours. After the reaction, add 0.3 mol / L sodium hydroxide dropwise for neutralization, concentrate under reduced pressure to remove solvent, filter, wash the filter cake with distilled water and methanol in sequence, and recrystallize the crude product with dichloromethane to obtain amino-modified benzoxazine; (4) Polyethylene resin was added to toluene, and then an aqueous solution containing OP-10 was added. After stirring evenly, acrylic acid and benzoyl peroxide were added. The mass ratio of polyethylene resin, OP-10, acrylic acid and benzoyl peroxide was 1:0.4:1.2:0.055. Nitrogen gas was introduced and the reaction was carried out at 70°C for 4.5 h. After the reaction, the mixture was concentrated under reduced pressure and washed with ethanol to obtain carboxylated polyethylene. (5) Add amino-modified benzoxazine and carboxylated polyethylene to N,N-dimethylformamide, stir to dissolve, and then add 2-(7-azabenzotriazole)-N,N,N',N'-tetramethylurea hexafluorophosphate and N,N-diisopropylethylamine dropwise. The mass ratio of amino-modified benzoxazine, carboxylated polyethylene, 2-(7-azabenzotriazole)-N,N,N',N'-tetramethylurea hexafluorophosphate and N,N-diisopropylethylamine is 1.35:1:0.03:0.02. React at 30°C for 18 h. After the reaction, add distilled water and ethyl acetate, extract and separate the organic layer, add anhydrous sodium sulfate to dry, filter and distill the filtrate under reduced pressure. Recrystallize the crude product with ethanol and dry to obtain styrene-modified benzoxazine. (6) 75 parts by weight of styrene-modified benzoxazine, 90 parts by weight of styrene, 75 parts by weight of gallium silicon liquid gold compound and 100 parts by weight of lanthanum were added to a twin-screw extruder, melt-extruded at 155°C, added to a molding machine, cooled, and lanthanide gallium silicon thin film material substrate was obtained. Example

[0019] (1) The preparation method of pentaerythritol methyl silicate modified phenol is as follows: pentaerythritol methyl silicate, hexamethylene diisocyanate and hydroquinone are added to N,N-dimethylformamide solvent and added to the reactor, wherein the mass ratio of pentaerythritol methyl silicate, hexamethylene diisocyanate and hydroquinone is 1.1:1:1.2. After stirring evenly, the reaction is carried out at 90℃ for 5h. After the reaction is completed, the mixture is distilled under reduced pressure, filtered and dried to obtain pentaerythritol methyl silicate modified phenol; (2) Add an aqueous solution of p-nitroaniline, pentaerythritol methyl silicate modified phenol, and formaldehyde to toluene solvent, wherein the mass ratio of p-nitroaniline, pentaerythritol methyl silicate modified phenol, and formaldehyde is 1:1.2:2.2, to carry out a cyclization reaction. After the reaction, distill under reduced pressure and wash with distilled water and methanol in sequence. The crude product is recrystallized with dichloromethane to obtain silanoxazine. (3) Add silanized benzoxazine to 1,4-dioxane solvent, stir evenly, then add iron powder and acetic acid aqueous solution, wherein the ratio of silanized benzoxazine, iron powder and acetic acid is 1.3:1:2.4, heat to 100℃, and react the reaction system under reflux for 12h. After the reaction, add 0.5mol / L sodium hydroxide dropwise for neutralization, concentrate under reduced pressure to remove solvent, filter, wash the filter cake with distilled water and methanol in sequence, and recrystallize the crude product with dichloromethane to obtain amino-modified benzoxazine; (4) Polyethylene resin was added to toluene, and then an aqueous solution containing OP-10 was added. After stirring evenly, acrylic acid and benzoyl peroxide were added. The mass ratio of polyethylene resin, OP-10, acrylic acid and benzoyl peroxide was 1:0.5:1.3:0.06. Nitrogen gas was introduced and the reaction was carried out at 80°C for 6 hours. After the reaction, the mixture was concentrated under reduced pressure and washed with ethanol to obtain carboxylated polyethylene. (5) Add amino-modified benzoxazine and carboxylated polyethylene to N,N-dimethylformamide, stir to dissolve, and then add 2-(7-azabenzotriazole)-N,N,N',N'-tetramethylurea hexafluorophosphate and N,N-diisopropylethylamine dropwise. The mass ratio of amino-modified benzoxazine, carboxylated polyethylene, 2-(7-azabenzotriazole)-N,N,N',N'-tetramethylurea hexafluorophosphate and N,N-diisopropylethylamine is 1.35:1:0.03:0.02. React at 30°C for 18 h. After the reaction, add distilled water and ethyl acetate, extract and separate the organic layer, add anhydrous sodium sulfate to dry, filter and distill the filtrate under reduced pressure. Recrystallize the crude product with ethanol and dry to obtain styrene-modified benzoxazine. (6) 75 parts by weight of styrene-modified benzoxazine, 90 parts by weight of styrene, 75 parts by weight of gallium silicon liquid gold compound and 100 parts by weight of lanthanum were added to a twin-screw extruder, melt-extruded at 155°C, added to a molding machine, cooled, and lanthanide gallium silicon thin film material substrate was obtained. Example

[0020] (1) The preparation method of methylpene silicate modified phenol is as follows: methylpene silicate, hexamethylene diisocyanate, and hydroquinone are added to N,N-dimethylformamide solvent and then added to a reactor, wherein the mass ratio of methylpene silicate, hexamethylene diisocyanate, and hydroquinone is 1.3:1:1.5. The mixture is stirred evenly and reacted at 120℃ for 10 h. After the reaction is completed, the mixture is distilled under reduced pressure, filtered, and dried to obtain methylpene silicate modified phenol. (2) Add an aqueous solution of p-nitroaniline, pentaerythritol methyl silicate modified phenol, and formaldehyde to toluene solvent, wherein the mass ratio of p-nitroaniline, pentaerythritol methyl silicate modified phenol, and formaldehyde is 1:1.4:2.5, to carry out a cyclization reaction. After the reaction, distill under reduced pressure and wash with distilled water and methanol in sequence. The crude product is recrystallized with dichloromethane to obtain silanoxazine. (3) Add silanized benzoxazine to 1,4-dioxane solvent, stir evenly, then add iron powder and acetic acid aqueous solution, wherein the ratio of silanized benzoxazine, iron powder and acetic acid is 1.2:1:2.25, heat to 85℃, and react the reaction system under reflux for 9 hours. After the reaction, add 0.3 mol / L sodium hydroxide dropwise for neutralization, concentrate under reduced pressure to remove solvent, filter, wash the filter cake with distilled water and methanol in sequence, and recrystallize the crude product with dichloromethane to obtain amino-modified benzoxazine; (4) Polyethylene resin was added to toluene, and then an aqueous solution containing OP-10 was added. After stirring evenly, acrylic acid and benzoyl peroxide were added. The mass ratio of polyethylene resin, OP-10, acrylic acid and benzoyl peroxide was 1:0.4:1.2:0.055. Nitrogen gas was introduced and the reaction was carried out at 70°C for 4.5 h. After the reaction, the mixture was concentrated under reduced pressure and washed with ethanol to obtain carboxylated polyethylene. (5) Add aminobenzoxazine and carboxylated polyethylene to N,N-dimethylformamide, stir to dissolve, and then add 2-(7-azabenzotriazole)-N,N,N',N'-tetramethylurea hexafluorophosphate and N,N-diisopropylethylamine dropwise. The mass ratio of aminobenzoxazine, carboxylated polyethylene, 2-(7-azabenzotriazole)-N,N,N',N'-tetramethylurea hexafluorophosphate and N,N-diisopropylethylamine is 1.2:1:0.02:0.01. React at 20°C for 12 h. After the reaction, add distilled water and ethyl acetate, extract and separate the organic layer, add anhydrous sodium sulfate to dry, filter and distill the filtrate under reduced pressure. Recrystallize the crude product with ethanol and dry to obtain styrene-modified benzoxazine. (6) 50 parts by weight of styrene-modified benzoxazine, 80 parts by weight of styrene, 50 parts by weight of gallium silicon liquid gold compound, and 80 parts by weight of lanthanum were added to a twin-screw extruder, melt-extruded at 150°C, added to a molding machine, and cooled to obtain a gallium silicon lanthanide thin film material substrate.

[0021] Comparative Example 1 Compared to Example 5, no styrene-modified benzoxazine was added, while other raw materials remained the same.

[0022] Hardness testing was conducted according to the method of GB / T 3903.4-2017; tensile properties testing was conducted according to the method of GB / T 1040.1-2018; tear strength testing was conducted according to the method of GB / T 3903.12-2021. The test results are shown in Table 1.

[0023] Table 1: Mechanical property tests.

[0024] As shown in Table 1, the lanthanide gallium silicon thin film material substrates of Examples 1-5 of the present invention have better mechanical properties than Comparative Example 1.

[0025] Lanthanum gallium silicon thin film material substrates were made into 5 cm × 5 cm samples, and thermogravimetric analysis was performed using a thermogravimetric analyzer under nitrogen atmosphere, with a heating rate of 10 ℃ / min and a temperature range of 20-800 ℃. The test results are shown in Table 2.

[0026] Table 2: Heat resistance test.

[0027] As shown in Table 2, the lanthanide gallium silicon thin film material substrates of the present invention in Examples 1-5 have better heat resistance than Comparative Example 1.

[0028] The preferred embodiments of the present invention disclosed above are merely illustrative of the invention. These preferred embodiments do not exhaustively describe all details, nor do they limit the invention to the specific implementations described. Clearly, many modifications and variations can be made based on the content of this specification. This specification selects and specifically describes these embodiments to better explain the principles and practical applications of the invention, thereby enabling those skilled in the art to better understand and utilize the invention. The invention is limited only by the claims and their full scope and equivalents.

Claims

1. A gallium lanthanide silicon thin film material substrate, characterized in that, The gallium lanthanide silicon thin film material substrate comprises the following weight components: 50-100 parts by weight of styrene-modified benzoxazine, 80-100 parts by weight of styrene, 50-100 parts by weight of gallium silicon liquid gold compound, and 80-120 parts by weight of lanthanum.

2. The gallium lanthanide silicon thin film material substrate according to claim 1, characterized in that, The preparation method of the styrene-modified benzoxazine includes the following steps: (1) Add p-nitroaniline, pentaerythritol methylsilicate modified phenol, and an aqueous solution of formaldehyde to toluene solvent to carry out a cyclization reaction. After the reaction, distill under reduced pressure and wash with distilled water and methanol in sequence. The crude product is recrystallized with dichloromethane to obtain silanoxazine. (2) Add silane-containing benzoxazine to 1,4-dioxane solvent, stir evenly, then add iron powder and acetic acid aqueous solution, heat to 70-100℃, and react the reaction system under reflux for 6-12h. After the reaction, add 0.1-0.5mol / L sodium hydroxide dropwise for neutralization, concentrate under reduced pressure to remove solvent, filter, wash the filter cake with distilled water and methanol in sequence, and recrystallize the crude product with dichloromethane to obtain amino-modified benzoxazine; (3) Add polyethylene resin to toluene, then add an aqueous solution containing OP-10, stir evenly, add acrylic acid and benzoyl peroxide, purge with nitrogen, react at 60-80℃ for 3-6h, concentrate under reduced pressure after reaction, wash with ethanol to obtain carboxylated polyethylene. (4) Add amino-modified benzoxazine and carboxylated polyethylene to N,N-dimethylformamide, stir to dissolve, and then add 2-(7-azabenzotriazole)-N,N,N',N'-tetramethylurea hexafluorophosphate and N,N-diisopropylethylamine dropwise. React at 20-40℃ for 12-24h. After the reaction, add distilled water and ethyl acetate, extract and separate the organic layer, add anhydrous sodium sulfate to dry, filter and distill the filtrate under reduced pressure. Recrystallize the crude product with ethanol and dry to obtain styrene-modified benzoxazine.

3. The gallium lanthanide silicon thin film material substrate according to claim 2, characterized in that, The mass ratio of p-nitroaniline, pentaerythritol methylsilicate modified phenol, and formaldehyde in (1) is 1:1.2-1.4:2.2-2.

5.

4. The gallium lanthanide silicon thin film material substrate according to claim 2, characterized in that, The preparation method of the methylpene silicate-modified phenol in (1) is as follows: add methylpene silicate, hexamethylene diisocyanate and hydroquinone to N,N-dimethylformamide solvent and add to the reactor, stir evenly, react at 90-120℃ for 5-10h, distill under reduced pressure after the reaction, filter and dry to obtain methylpene silicate-modified phenol.

5. The gallium lanthanide silicon thin film material substrate according to claim 4, characterized in that, The mass ratio of pentaerythritol methyl silicate, hexamethylene diisocyanate, and hydroquinone is 1.1-1.3:1:1.2-1.

5.

6. The gallium lanthanide silicon thin film material substrate according to claim 2, characterized in that, The (2) contains silanoxazine, iron powder, and acetic acid in a ratio of 1.1-1.3:1:2.1-2.

4.

7. The gallium lanthanide silicon thin film material substrate according to claim 2, characterized in that, The mass ratio of polyethylene resin, OP-10, acrylic acid, and benzoyl peroxide in (3) is 1:0.3-0.5:1.1-1.3:0.05-0.

06.

8. The gallium lanthanide silicon thin film material substrate according to claim 1, characterized in that, The mass ratio of aminobenzoxazine, carboxylated polyethylene, 2-(7-azabenzotriazole)-N,N,N',N'-tetramethylurea hexafluorophosphate and N,N-diisopropylethylamine in (4) is 1.2-1.5:1:0.02-0.04:0.01-0.

03.

9. A method for preparing a gallium lanthanide silicon thin film material substrate as described in any one of claims 1-8, characterized in that, The method for preparing the gallium lanthanide silicon thin film material substrate includes the following steps: adding styrene-modified benzoxazine, styrene, gallium silicon liquid gold compound, and lanthanum into a twin-screw extruder, melting and extruding at 150-160°C, adding to a molding machine, cooling, and obtaining the gallium lanthanide silicon thin film material substrate.